Methods and apparatus for manufacturing a substrate

Abstract

A substrate manufacturing apparatus includes a support apparatus extending along an alignment axis that can receive a plurality of substrates and a plurality of spacers. The plurality of spacers extend circumferentially around the support apparatus. The substrate manufacturing apparatus includes an alignment apparatus contacting the support apparatus and extending along the alignment axis. The alignment apparatus contacts inner radial substrate surfaces of the plurality of substrates such that the inner radial substrate surfaces are spaced a uniform first distance from the alignment axis. The alignment apparatus contacts inner radial spacer surfaces of the plurality of spacers such that the inner radial spacer surfaces are spaced a uniform second distance from the alignment axis. Methods of manufacturing a substrate are provided.

Description

METHODS AND APPARATUS FOR MANUFACTURING A SUBSTRATECROSS-REFERENCE TO RELATED APPLICATIONS

[0001] This application claims the benefit of priority under 35 U.S. C. §119 of U.S. Provisional Application Serial No. 63 / 592676 filed on October 24, 2023, the content of which is relied upon and incorporated herein by reference in its entirety.FIELD

[0002] The present disclosure relates generally to apparatus and methods for manufacturing a substrate and, more particularly, to methods for manufacturing a substrate with a substrate manufacturing apparatus.BACKGROUND

[0003] It is known to manufacture a substrate. However, during the manufacturing process, the substrate may not comprise the desired dimensions or edge shape. Treating edges of the substrate, for example, by grinding, to achieve a desired shape can be timeconsuming and costly.SUMMARY

[0004] The following presents a simplified summary of the disclosure to provide a basic understanding of some aspects described in the detailed description.

[0005] In aspects, a substrate manufacturing apparatus comprises a support apparatus extending along an alignment axis and configured to receive a plurality of substrates and a plurality of spacers such that the plurality of substrates and the plurality of spacers extend circumferentially around the support apparatus. The substrate manufacturing apparatus comprises an alignment apparatus in contact with the support apparatus and extending along the alignment axis. The alignment apparatus is configured to contact inner radial substrate surfaces of the plurality of substrates such that the inner radial substrate surfaces are spaced a uniform first distance from the alignment axis. Thealignment apparatus is configured to contact inner radial spacer surfaces of the plurality of spacers such that the inner radial spacer surfaces are spaced a uniform second distance from the alignment axis.

[0006] In aspects, the alignment apparatus comprises one or more of a first alignment apparatus extending parallel to the alignment axis and along a first side of the support apparatus. The first alignment apparatus comprises a first elastomeric wall surrounding a first chamber. The alignment apparatus comprises a second alignment apparatus extending parallel to the alignment axis and along a second side of the support apparatus that is spaced circumferentially from the first side. The second alignment apparatus comprises a second elastomeric wall surrounding a second chamber. The alignment apparatus comprises a third alignment apparatus extending parallel to the alignment axis and along a third side of the support apparatus that is spaced circumferentially apart from the first side and the second side. The third alignment apparatus comprises a third elastomeric wall surrounding a third chamber.

[0007] In aspects, the support apparatus comprises a hollow chamber in fluid communication with the first chamber, the second chamber, and the third chamber. The support apparatus is further in fluid communication with a gas apparatus that is configured to transmit air through the hollow chamber, the first chamber, the second chamber, and the third chamber.

[0008] In aspects, the first alignment apparatus, the second alignment apparatus, and third alignment apparatus are configured to move between a deflated position, in which the first elastomeric wall, the second elastomeric wall, and the third elastomeric wall are spaced apart from, and not in contact with, the inner radial spacer surfaces and the inner radial substrate surfaces, and an inflated position, in which the first elastomeric wall, the second elastomeric wall, and the third elastomeric wall are in contact with the inner radial spacer surfaces and the inner radial substrate surfaces.

[0009] In aspects, the substrate manufacturing apparatus comprises a shaft extending along an axis. The support apparatus defines an elongated chamber configured to receive the shaft such that the support apparatus is configured to move relative to the shaft.

[0010] In aspects, the shaft comprises a non-constant cross-sectional size along a length of the shaft such that a cross-sectional size of the support apparatus is configured to increase as the support apparatus moves along the length of the shaft.

[0011] In aspects, the alignment apparatus is attached to, and extends circumferentially around, the support apparatus. The alignment apparatus comprises an elastomeric material such that as the cross-sectional size of the support apparatus increases, the alignment apparatus is configured to increase from a first diameter, in which the alignment apparatus is spaced apart from, and not in contact with, the inner radial spacer surfaces and the inner radial substrate surfaces, to a second diameter, in which the alignment apparatus is in contact with the inner radial spacer surfaces and the inner radial substrate surfaces.

[0012] In aspects, the substrate manufacturing apparatus comprises a first support fin attached to the support apparatus and projecting radially outwardly from the support apparatus. The first support fin extends parallel to the alignment axis and along a first side of the support apparatus. The substrate manufacturing apparatus comprises a second support fin attached to the support apparatus and projecting radially outwardly from the support apparatus. The second support fin extends parallel to the alignment axis and along a second side of the support apparatus that is spaced circumferentially apart from the first side. The substrate manufacturing apparatus comprises a third support fin attached to the support apparatus and projecting radially outwardly from the support apparatus. The third support fin extends parallel to the alignment axis and along a third side of the support apparatus that is spaced circumferentially apart from the first side and the second side.

[0013] In aspects, the alignment apparatus comprises a first portion of granules positioned between the first support fin and the second support fin, a second portion of granules positioned between the second support fin and the third support fin, and a third portion of granules positioned between the first support fin and the third support fin.

[0014] In aspects, the first portion of granules, the second portion of granules, and the third portion of granules are configured to contact the inner radial substrate surfaces and the inner radial spacer surfaces.

[0015] In aspects, a substrate manufacturing apparatus comprises a first spacer attached to a first surface of a first substrate. The first spacer comprises a first spaceropening and a second spacer opening. The substrate manufacturing apparatus comprises a second spacer attached to a first surface of a second substrate. The second spacer comprises a first spacer projection and a second spacer projection. The first spacer projection is received within the first spacer opening, and the second spacer projection is received within the second spacer opening. The first spacer, second spacer, the first substrate, and the second substrate extend circumferentially around an alignment axis such that inner radial substrate surfaces of the first substrate and the second substrate are spaced a uniform first distance from the alignment axis, and inner radial spacer surfaces of the first spacer and the second spacer are spaced a uniform second distance from the alignment axis.

[0016] In aspects, an opening angle between the first spacer opening and the second spacer opening about the alignment axis is within a range from about 100 degrees to 140 degrees.

[0017] In aspects, a projection angle between the first spacer projection and the second spacer projection about the alignment axis is substantially equal to the opening angle.

[0018] In aspects, the first spacer is attached to the first surface of the first substrate by one or more of roll coating, screen printing, inkjet printing, or masked spraying.

[0019] In aspects, methods of manufacturing a substrate comprise positioning a plurality of substrates in contact with a plurality of spacers along alignment axis such that one or more spacers of the plurality of spacers are positioned between adjacent substrates of the plurality of substrates. The plurality of substrates comprises inner radial substrate surfaces, and the plurality of spacers comprises inner radial spacer surfaces. Methods comprise contacting one or more of the plurality of substrates or the plurality of spacers with an alignment apparatus. Methods comprise aligning the inner radial substrate surfaces with the alignment apparatus such that the inner radial substrate surfaces are spaced a uniform first distance from the alignment axis.

[0020] In aspects, methods comprise positioning the plurality of substrates and the plurality of spacers around a support apparatus that extends along the alignment apparatus. Methods comprise aligning the inner radial spacer surfaces with the alignment apparatus such that the inner radial spacer surfaces are spaced a uniform second distance from the alignment axis.

[0021] In aspects, the contacting comprises inflating the alignment apparatus such that the alignment apparatus expands and contacts the plurality of substrates and plurality of spacers.

[0022] In aspects, the contacting comprises sliding the support apparatus along a shaft comprising a non-constant cross-sectional size such that as the support apparatus moves relative to the shaft, the support apparatus and the alignment apparatus radially expand, and the alignment apparatus contacts the plurality of substrates and the plurality of spacers.

[0023] In aspects, the contacting comprises depositing a plurality of granules around the support apparatus such that the plurality of granules contacts the plurality of substrates and the plurality of spacers.

[0024] In aspects, the contacting comprises providing a first spacer attached to a first surface of a first substrate of the plurality of substrates. The first spacer comprises a first spacer opening and a second spacer opening. The contacting comprises providing a second spacer attached to a first surface of a second substrate of the plurality of substrates. The second spacer comprises a first spacer projection and a second spacer projection. The first spacer projection is received within the first spacer opening and the second spacer projection is received within the second spacer opening.

[0025] Additional features and advantages of the aspects disclosed herein will be set forth in the detailed description that follows, and in part will be clear to those skilled in the art from that description or recognized by practicing the aspects described herein, including the detailed description which follows, the claims, as well as the appended drawings. It is to be understood that both the foregoing general description and the following detailed description present aspects intended to provide an overview or framework for understanding the nature and character of the aspects disclosed herein. The accompanying drawings are included to provide further understanding and are incorporated into and constitute a part of this specification. The drawings illustrate various aspects of the disclosure, and together with the description explain the principles and operations thereof.BRIEF DESCRIPTION OF THE DRAWINGS

[0026] These and other features, aspects and advantages are better understood when the following detailed description is read with reference to the accompanying drawings, in which:

[0027] FIG. 1 schematically illustrates a side view of a substrate manufacturing apparatus in accordance with aspects of the disclosure;

[0028] FIG. 2 illustrates a side view of the substrate manufacturing apparatus in accordance with aspects of the disclosure;

[0029] FIG. 3 illustrates a top-down view of the substrate manufacturing apparatus along lines 3-3 of FIG. 2 in accordance with aspects of the disclosure;

[0030] FIG. 4 illustrates a top-down view of the substrate manufacturing apparatus similar to FIG. 3 in accordance with aspects of the disclosure;

[0031] FIG. 5 illustrates a side view of an alignment apparatus in contact with inner radial surfaces in accordance with aspects of the disclosure;

[0032] FIG. 6 schematically illustrates a side view of another embodiment of a substrate manufacturing apparatus in accordance with aspects of the disclosure;

[0033] FIG. 7 illustrates a sectional view of the substrate manufacturing apparatus along lines 7-7 of FIG. 6 in accordance with aspects of the disclosure;

[0034] FIG. 8 illustrates a sectional view of the substrate manufacturing apparatus along lines 8-8 of FIG. 6 in accordance with aspects of the disclosure;

[0035] FIG. 9 schematically illustrates a side view of another embodiment of a substrate manufacturing apparatus in accordance with aspects of the disclosure;

[0036] FIG. 10 illustrates a top-down view of the substrate manufacturing apparatus along lines 10-10 of FIG. 9 in accordance with aspects of the disclosure;

[0037] FIG. 11 illustrates a close-up view of the substrate manufacturing apparatus at focus circle 11 of FIG. 9 in accordance with aspects of the disclosure;

[0038] FIG. 12 illustrates a top-down view of another embodiment of a first substrate of a substrate manufacturing apparatus in accordance with aspects of the disclosure;

[0039] FIG. 13 illustrates a top-down view of another embodiment of a second substrate of the substrate manufacturing apparatus in accordance with aspects of the disclosure;

[0040] FIG. 14 illustrates a side view of the first substrate spaced apart from the second substrate in accordance with aspects of the disclosure; and

[0041] FIG. 15 illustrates a side view of the first substrate in contact with the second substrate in accordance with aspects of the disclosure.DETAILED DESCRIPTION

[0042] Aspects will now be described more fully hereinafter with reference to the accompanying drawings in which example aspects are shown. Whenever possible, the same reference numerals are used throughout the drawings to refer to the same or like parts. However, this disclosure may be embodied in many different forms and should not be construed as limited to the aspects set forth herein.

[0043] As used herein, the term “about” means that amounts, sizes, formulations, parameters, and other quantities and characteristics are not, and need not be, exact, but may be approximate and / or larger or smaller, as desired, reflecting tolerances, conversion factors, rounding off, measurement error and the like, and other factors known to those of skill in the art.

[0044] Ranges can be expressed herein as from “about” one value, and / or to “about” another value. When such a range is expressed, aspects include from the one value to the other value. Similarly, when values are expressed as approximations by use of the antecedent “about,” it will be understood that the value forms another aspect. It will be further understood that the endpoints of each of the ranges are significant both in relation to the other endpoint, and independently of the other endpoint.

[0045] Directional terms as used herein - for example up, down, right, left, front, back, top, bottom, upper, lower, etc. - are made only with reference to the figures as drawn and are not intended to imply absolute orientation.

[0046] Unless otherwise expressly stated, it is in no way intended that any methods set forth herein be construed as requiring that its steps be performed in a specific order, nor that with any apparatus, specific orientations be required. Accordingly, where a method claim does not actually recite an order to be followed by its steps, or that any apparatus claim does not actually recite an order or orientation to individual components, or it is not otherwise specifically stated in the claims or description that the steps are to be limited toa specific order, or that a specific order or orientation to components of an apparatus is not recited, it is in no way intended that an order or orientation be inferred in any respect. This holds for any possible non-express basis for interpretation, including matters of logic relative to arrangement of steps, operational flow, order of components, or orientation of components; plain meaning derived from grammatical organization or punctuation, and; the number or type of aspects described in the specification.

[0047] As used herein, the singular forms "a," "an" and "the" include plural references unless the context clearly dictates otherwise. Thus, for example, reference to “a” component includes aspects having two or more such components, unless the context clearly indicates otherwise.

[0048] The word “exemplary,” “example,” or various forms thereof are used herein to mean serving as an example, instance, or illustration. Any aspect or design described herein as “exemplary” or as an “example” should not be construed as preferred or advantageous over other aspects or designs. Furthermore, examples are provided solely for purposes of clarity and understanding and are not meant to limit or restrict the disclosed subject matter or relevant portions of this disclosure in any manner. It can be appreciated that a myriad of additional or alternate examples of varying scope could have been presented but have been omitted for purposes of brevity.

[0049] As used herein, the terms “comprising” and “including”, and variations thereof, shall be construed as synonymous and open-ended, unless otherwise indicated. A list of elements following the transitional phrases comprising or including is a nonexclusive list, such that elements in addition to those specifically recited in the list may also be present.

[0050] The terms “substantial,” “substantially,” and variations thereof as used herein are intended to represent that a described feature is equal or approximately equal to a value or description. For example, a “substantially planar” surface is intended to denote a surface that is planar or approximately planar. Moreover, “substantially” is intended to denote that two values are equal or approximately equal. The term “substantially” may denote values within about 10% of each other, for example, within about 5% of each other, or within about 2% of each other.

[0051] Modifications may be made to the instant disclosure without departing from the scope or spirit of the claimed subject matter. Unless specified otherwise, “first,” “second,” or the like are not intended to imply a temporal aspect, a spatial aspect, an ordering, etc. Rather, such terms are merely used as identifiers, names, etc. for features, elements, items, etc. For example, a first end and a second end generally correspond to end A and end B or two different ends.

[0052] The present disclosure relates to a substrate manufacturing apparatus and methods for manufacturing a substrate. For purposes of this application, the substrate (e.g., substrates 101 illustrated in FIG. 1) can be used as part of an electronic apparatus employed in a variety of display and non-display applications comprising, but not limited to, liquid crystal displays (LCDs), electrophoretic displays (EPD), organic light emitting diode displays (OLEDs), plasma display panels (PDPs), microLED displays, miniLED displays, display backlight units, organic light emitting diode lighting, light emitting diode lighting, augmented reality (AR), virtual reality (VR), touch sensors, photovoltaics, foldable phones, or other applications. The substrates 101 may comprise glass (e.g., a glass substrate), for example, one or more of soda-lime glass, borosilicate glass, alumino- borosilicate glass, alkali-containing glass, alkali-free glass, aluminosilicate, boroaluminosilicate, glass-ceramic, or other materials comprising glass. In aspects, the substrates 101 can comprise one or more of lithium fluoride (LiF), magnesium fluoride (MgF2), calcium fluoride (CaF2), barium fluoride (BaF2), sapphire (AI2O3), zinc selenide (ZnSe), germanium (Ge) or other materials. The substrates 101 can alternatively comprise a ceramic, a polymer, a composite, a metal, a multi-layer stack, or a composite of materials. In aspects, the substrates 101 can comprise a thickness that is within a range from about 0.05 millimeters (mm) to about 1 mm. For example, the substrates 101 can comprise a thickness within a range from about 0.1 mm to about 1 mm, or from about 0.2 mm to about 0.7 mm, or about 0.5 mm. The substrates 101 can comprise a quadrilateral shape, for example, a rectangular shape, a square shape, etc. In aspects, the substrates 101 can be used in the manufacture of memory discs.

[0053] In aspects, a sheet, for example, a glass sheet, can be cut into a desired shape that produces one or more substrates (e.g., substrates 101). The sheet can be cut as part of a process that comprises a laser making perforations in the material outlining a desired partshape, followed by separating the substrates by a subsequent thermal laser or mechanical process. In this way, the substrates 101 can be formed via a laser singulation process. Edges of the substrates 101 may be subjected to a finishing process to remove residual imperfections, improve surface quality, and, in aspects, to impart an edge profile shape (e.g., chamfer, bull nose, etc.). Edges of the substrates 101 can be finished, for example, by grinding, polishing, etc.

[0054] As described below, the substrates 101 can be stacked in a damage-free manner in preparation for subsequent treatment of inner radial surfaces and outer radial surfaces of the substrates 101. The treatment of the surfaces of the substrates 101 can comprise, for example, polishing, grinding, etc. In aspects, substrates 101 can be stacked and passively aligned with a plurality of spacers 109 interleaved between substrates 101, wherein the spacers 109 can comprise a smaller outer diameter than the substrates 101, but a larger inner diameter than the substrates. That is, after stacking, outer radial spacer surfaces of the spacers 109 can comprise a smaller diameter than outer radial substrate surfaces of the substrates 101. Likewise, after stacking, inner radial spacer surfaces of the spacers 109 can comprise a larger diameter than inner radial substrate surfaces of the substrates 101. In this way, after the substrates 101 have been stacked and passively aligned, the spacer surfaces (e.g., inner radial spacers surfaces and outer radial spacer surfaces) of the spacers 109 can be misaligned from the substrate surfaces (e.g., inner radial substrate surfaces and outer radial substrate surfaces) of the substrates 101. Accordingly, the inner radial substrate surfaces and the outer radial substrate surfaces can be simultaneously polished while the substrates 101 are in the stacked formation. As used herein, simultaneous polishing can comprise polishing of the inner radial substrate surfaces concurrently with, and at the same time as, polishing of the outer radial substrate surfaces.

[0055] The substrate manufacturing apparatus 103 can comprise a base 107 upon which components of the substrate manufacturing apparatus 103 can be attached and / or upon which the plurality of substrates 101 and / or a plurality of spacers 109 can rest upon (e.g., or be supported by). In aspects, the base 107 can comprise a substantially planar surface 111 upon which the plurality of substrates 101 and the plurality of spacers 109 can rest upon.

[0056] The substrate manufacturing apparatus 103 can comprise a support apparatus 113 that is attached to the base 107. The support apparatus 113 can extend along an alignment axis 115, with an end 116 of the support apparatus 113 attached to the base 107 and an opposing end of the support apparatus 113 spaced a distance apart from the base 107 along the alignment axis 115. In aspects, the support apparatus 113 may comprise a hollow chamber 117 through which a gas (e.g., air, etc.) can flow through the support apparatus 113. In aspects, the hollow chamber 117 may extend through the end 116 of the support apparatus 113 that is attached to the base 107, and may extend at least partially along a length of the support apparatus 113 along the alignment axis 115 toward the opposing end of the support apparatus 113. The hollow chamber 117 can comprise a main chamber 121 that extends along the alignment axis 115, for example, by extending substantially parallel to and / or co-axial with the alignment axis 115. The hollow chamber 117 can comprise one or more lateral chambers 123 that are attached to and in fluid communication with the main chamber 121. The one or more lateral chambers 123 can extend at an angle relative to the main chamber 121 and the alignment axis 115, such as by extending from the main chamber 121 outwardly away from the alignment axis 115 in a direction that may be substantially perpendicular to the alignment axis 115.

[0057] In aspects, the substrate manufacturing apparatus 103 can comprise a gas apparatus 125 in fluid communication with the hollow chamber 117. The gas apparatus 125 can comprise, for example, a gas supply apparatus (e.g., a pump, a cannister, a cartridge, a boiler, a compressor, a pressure vessel, etc.) and / or a gas vacuum that can withdraw or remove gas. In this way, the gas apparatus 125 can deliver gas to the hollow chamber 117 (e.g., through the main chamber 121 and the one or more lateral chambers 123), for example, when the gas apparatus 125 functions as a gas supply apparatus. In addition, the gas apparatus 125 can remove gas from the hollow chamber 117 (e.g., through the main chamber 121 and the one or more lateral chambers 123), for example, when the gas apparatus 125 functions as vacuum. By being in fluid communication, the gas apparatus 125 can be attached to the support apparatus 113 via one or more conduits (e.g., tubes, hoses, pipes) through which gas can flow between the gas apparatus 125 and the support apparatus 113. The gas can comprise, for example, one or more of air, nitrogen, helium, argon, carbon dioxide, etc.

[0058] FIG. 1 illustrates the plurality of substrates 101 and the plurality of spacers 109 in a spaced apart and detached configuration relative to the support apparatus 113. For example, the plurality of substrates 101 and the plurality of spacers 109 may initially be positioned over the support apparatus 113. The plurality of substrates 101 can each comprise a substrate opening 131 and the plurality of spacers 109 can each comprise a spacer opening 133. The plurality of substrates 101 and the plurality of spacers 109 can be moved in a movement direction 135 toward the base 107, such that the plurality of substrates 101 and the plurality of spacers 109 can be received by the support apparatus 113. For example, by being received by the support apparatus 113, the support apparatus 113 can extend through the substrate openings 131 of the plurality of substrates 101 and the spacer openings 133 of the plurality of spacers 109. In this way, the plurality of substrates 101 and the plurality of spacers 109 can be positioned to circumferentially surround the support apparatus 113. Accordingly, the support apparatus 113 can receive the plurality of substrates 101 and the plurality of spacers 109 such that the plurality of substrates 101 and the plurality of spacers 109 extend circumferentially around the support apparatus 113.

[0059] In aspects, the plurality of substrates 101 and the plurality of spacers 109 can be positioned in an alternating configuration, with spacers interleaved between substrates. For example, a spacer of the plurality of spacers 109 may be positioned between two adjacent and neighboring substrates of the plurality of substrates 101. Likewise, a substrate of the plurality of substrates 101 may be positioned between two adjacent and neighboring spacers of the plurality of spacers 109. In this way, the substrates 101 and the spacers 109 can be positioned in alternating positions, with a spacer adjacent to, and in contact with, two substrates, and a substrate adjacent to, and in contact with, two spacers. While the plurality of substrates 101 are illustrated as comprising two substrates, any number (e.g., three substrates, four substrates, etc.) may be provided. Likewise, while the plurality of spacers 109 are illustrated as comprising two spacers, any number (e.g., three spacers, four spacers, etc.) may be provided. Therefore, methods of manufacturing a substrate can comprise positioning the plurality of substrates 101 in contact with the plurality of spacers 109 along the alignment axis 115 such that one or more spacers of the plurality of spacers 109 are positioned between adjacent substrates of the plurality ofsubstrates 101. The plurality of substrates 101 can comprise inner radial substrate surfaces 139 and the plurality of spacers 109 can comprise inner radial spacer surfaces 141.

[0060] FIG. 2 illustrates the substrate manufacturing apparatus 103 after the plurality of substrates 101 and the plurality of spacers 109 have moved in the movement direction 135 and have been received by the support apparatus 113. For example, methods can comprise positioning the plurality of substrates 101 and the plurality of spacers 109 around the support apparatus 113 that extends along the alignment axis 115. As illustrated in FIGS. 1-2, in aspects, the substrate manufacturing apparatus 103 can comprise an alignment apparatus 137 in contact with the support apparatus 113 and extending at least partially along, and parallel to, the alignment axis 115. While FIGS. 1-2 illustrates a single alignment apparatus 137, the substrate manufacturing apparatus 103 is not limited to one alignment apparatus, but, rather, can comprise a plurality of alignment apparatuses (e.g., the alignment apparatus 137 illustrated in FIG. 1, a second alignment apparatus 301 and a third alignment apparatus 303 illustrated in FIG. 3, etc).

[0061] FIG. 3 illustrates a top-down view of the substrate manufacturing apparatus 103 along lines 3-3 of FIG. 2. As illustrated in FIG. 3, the substrate manufacturing apparatus 103 can comprise the alignment apparatus 137 (e.g., the first alignment apparatus 137), the second alignment apparatus 301, and the third alignment apparatus 303. The alignment apparatus 137 can extend parallel to the alignment axis 115 along a first side 305 of the support apparatus 113. The alignment apparatus 137 can comprise a first elastomeric wall 307 surrounding a first chamber 309. In aspects, the alignment apparatus 137 can move between a deflated position (e.g., illustrated in FIG. 3) and an inflated position (e.g., illustrated in FIG. 4). For example, the alignment apparatus 137 can be attached to the first side 305 of the support apparatus 113 such that the first chamber 309 can be in fluid communication with the lateral chamber 123 of the chamber 117. In this way, the alignment apparatus 137 can receive gas from the chamber 117 (e.g., via the gas apparatus 125 and through the main chamber 121 and the lateral chamber 123), such that the gas can cause the alignment apparatus 137 to move from the deflated position (e.g., illustrated in FIG. 3) to the inflated position (e.g., illustrated in FIG. 4). Alternatively, the gas apparatus 125 can function as a vacuum to remove gas from the first chamber 309, such that gas can flow from the first chamber 309, through the lateral chamber 123, andthrough the main chamber 121, such that the alignment apparatus 137 can move from the inflated position to the deflated position. As used herein, a deflated position is one in which the chamber is less than fully inflated, thus causing shrinking or collapse of the chamber, such that the chamber may not exert a force upon the substrates 101 and / or the spacers 109. As used herein, an inflated position is one in which the chamber is either fully inflated or is less than fully inflated but is inflated to a degree that the chamber can expand and exert a force upon the substrates 101 and the spacers 109 to cause the substrates 101 and the spacers 109 to move into alignment.

[0062] The second alignment apparatus 301 can extend parallel to the alignment axis 115 along a second side 315 of the support apparatus 113 that is spaced circumferentially apart from the first side 305. In aspects, the second alignment apparatus 301 can be spaced apart from the alignment apparatus 137, with an angle defined between the second alignment apparatus 301 and the alignment apparatus 137 defined about the alignment axis 115. The angle can be within a range from about 90 degrees to about 150 degrees, or from about 100 degrees to about 140 degrees, or about 120 degrees. The second alignment apparatus 301 can comprise a second elastomeric wall 317 surrounding a second chamber 319. In aspects, the second alignment apparatus 301 can move between a deflated position (e.g., illustrated in FIG. 3) and an inflated position (e.g., illustrated in FIG. 4). For example, the second alignment apparatus 301 can be attached to the second side 315 of the support apparatus 113 such that the second chamber 319 can be in fluid communication with a second lateral chamber 321 of the chamber 117. The second lateral chamber 321 may be substantially identical to the lateral chamber 123, but for the second lateral chamber 321 extending between the main chamber 121 and the second side 315 of the support apparatus 113. In this way, the second alignment apparatus 301 can receive gas from the chamber 117 (e.g., via the gas apparatus 125 and through the main chamber 121 and the second lateral chamber 321), such that the gas can cause the second alignment apparatus 301 to move from the deflated position (e.g., illustrated in FIG. 3) to the inflated position (e.g., illustrated in FIG. 4). Alternatively, the gas apparatus 125 can function as a vacuum to remove gas from the second chamber 319, such that gas can flow from the second chamber 319, through the second lateral chamber 321, and through the mainchamber 121, such that the second alignment apparatus 301 can move from the inflated position to the deflated position.

[0063] The third alignment apparatus 303 can extend parallel to the alignment axis 115 along a third side 325 of the support apparatus 113 that is spaced circumferentially apart from the first side 305 and the second side 315. In aspects, the third alignment apparatus 303 can be spaced apart from the alignment apparatus 137, with an angle defined between the third alignment apparatus 303 and the alignment apparatus 137 defined about the alignment axis 115, with the angle within a range from about 90 degrees to about 150 degrees, or from about 100 degrees to about 140 degrees, or about 120 degrees. The third alignment apparatus 303 can comprise a third elastomeric wall 327 surrounding a third chamber 329. In aspects, the third alignment apparatus 303 can move between a deflated position (e.g., illustrated in FIG. 3) and an inflated position (e.g., illustrated in FIG. 4). For example, the third alignment apparatus 303 can be attached to the third side 325 of the support apparatus 113 such that the third chamber 329 can be in fluid communication with a third lateral chamber 331 of the chamber 117. The third lateral chamber 331 may be substantially identical to the lateral chamber 123, but for the third lateral chamber 331 extending between the main chamber 121 and the third side 325 of the support apparatus 113. In this way, the third alignment apparatus 303 can receive gas from the chamber 117 (e.g., via the gas apparatus 125 and through the main chamber 121 and the third lateral chamber 331), such that the gas can cause the third alignment apparatus 303 to move from the deflated position (e.g., illustrated in FIG. 3) to the inflated position (e.g., illustrated in FIG. 4). Alternatively, the gas apparatus 125 can function as a vacuum to remove gas from the third chamber 329, such that gas can flow from the third chamber 329, through the third lateral chamber 331, and through the main chamber 121, such that the third alignment apparatus 303 can move from the inflated position to the deflated position. Accordingly, the hollow chamber 117 can be in fluid communication with the first chamber 309, the second chamber 319, and the third chamber 329, with the support apparatus 113 in fluid communication with the gas apparatus 125. The gas apparatus 125 can transmit gas or air through the chamber 117, the first chamber 309, the second chamber 319, and the third chamber 329.

[0064] FIG. 4 illustrates the alignment apparatuses 137, 301, 303 in the inflated position. As illustrated, the first alignment apparatus 137, the second alignment apparatus 301, and the third alignment apparatus 303 can move between the deflated position, in which the first elastomeric wall 307, the second elastomeric wall 317, and the third elastomeric wall 327 may be spaced apart from, and not in contact with, the inner radial spacer surfaces 141 and the inner radial substrate surfaces 139, and an inflated position, in which the first elastomeric wall 307, the second elastomeric wall 317, and the third elastomeric wall 327 are in contact with the inner radial spacer surfaces 141 and the inner radial substrate surfaces 139. For example, FIG. 5 illustrates the alignment apparatus 137 in contact with the inner radial spacer surfaces 141 and the inner radial substrate surfaces 139. The contact between the second alignment apparatus 301 and the inner radial spacer surfaces 141 and the inner radial substrate surfaces 139 may be substantially identical to FIG. 5. Likewise, the contact between the third alignment apparatus 303 and the inner radial spacer surfaces 141 and the inner radial substrate surfaces 139 may be substantially identical to FIG. 5. In aspects, the substrates 101 and the spacers 109 can initially be received by the support apparatus 113 when the alignment apparatuses 137, 301, 303 are in the deflated position (e.g., illustrated in FIG. 3) or in a partially deflated position. Further, the substrates 101 and the spacers 109 can be received by the support apparatus 113 all at once (e.g., all of the substrates 101 and the spacers 109 are moved onto the support apparatus 113 simultaneously), or one at a time (e.g., one substrate is positioned on the support apparatus, followed by one spacer, followed by a second substrate, followed by a second spacer, etc.).

[0065] As illustrated in FIG. 5, methods can comprise contacting the plurality of substrates 101 and the plurality of spacers 109 with the alignment apparatus 137. In particular, contacting the plurality of substrates 101 and the plurality of spacers 109 with the alignment apparatus 137 can comprise inflating the alignment apparatus 137 such that the alignment apparatus 137 expands and contacts the plurality of substrates 101 and the plurality of spacers 109. The second alignment apparatus 301 and the third alignment apparatus 303 can function in a similar manner as the alignment apparatus 137. For example, due to the contact between the alignment apparatuses 137, 301, 303 and the inner radial substrate surfaces 139, the inner radial substrate surfaces 139 of the plurality ofsubstrates 101 can move into an aligned orientation in which the inner radial substrate surfaces 139 can be spaced a uniform first distance 501 from the alignment axis 115. That is, each substrate of the plurality of substrates 101 can be spaced the first distance 501 from the alignment axis 115. Accordingly, methods can comprise aligning the inner radial substrate surfaces 139 with the alignment apparatuses 137, 301, 303 such that the inner radial substrate surfaces 139 are spaced the uniform first distance 501 from the alignment axis 115. Due to the contact between the alignment apparatuses 137, 301, 303 and the inner radial spacer surfaces 141, the inner radial spacer surfaces 141 of the plurality of spacers 109 can move into an aligned orientation in which the inner radial spacer surfaces 141 can be spaced a uniform second distance 503 from the alignment axis 115. That is, each spacer of the plurality of spacers 109 can be spaced the second distance 503 from the alignment axis 115. Accordingly, methods can comprise aligning the inner radial spacer surfaces 141 with the alignment apparatuses 137, 301, 303 such that the inner radial spacer surfaces 141 are spaced the uniform second distance 503 from the alignment axis 115. In aspects, the outer radial substrate surfaces of the substrates 101 may likewise be aligned. Following the alignment and stacking of the plurality of substrates 101, a compressive axial force can be applied to the substrates 101 (e.g., in the form of a clamp or other fastening device that applies inward pressure on a top substrate and a bottom substrate) to hold the substrates 101 in place. The substrate manufacturing apparatus 103 can be removed, and inner and outer radial substrate surfaces of the substrates 101 can then be simultaneously polished without interference from the spacers 109 due to the inner and outer radial spacer surfaces being offset from the inner and outer radial substrate surfaces.

[0066] FIGS. 6-8 illustrate additional embodiments of the substrate manufacturing apparatus 103. In aspects, and as illustrated in FIG. 6, the substrate manufacturing apparatus 103 can comprise a support apparatus 601 that can extend along an alignment axis 603. The support apparatus 601 can comprise an elongated, hollow chamber 605 through which a shaft 607 can be positioned to removably extend. In this way, the elongated chamber 605 can receive the shaft 607 such that the support apparatus 601 can move relative to the shaft 607. In aspects, the elongated chamber 605 can extend along the alignment axis 603 and may extend along an entire length of the support apparatus 601 and through opposing ends of the support apparatus 601. The support apparatus 601 canreceive the plurality of substrates 101 and the plurality of spacers 109 such that the plurality of substrates 101 and the plurality of spacers 109 can extend circumferentially around the support apparatus 601 (e.g., illustrated in FIGS. 7-8).

[0067] The shaft 607 can extend along a shaft axis 613 and may comprise a circular cross-sectional shape. The shaft 607 can comprise a non-constant cross-sectional size (e.g. , diameter) along a length of the shaft 607. For example, the shaft 607 can extend between a first shaft end 615 and a second shaft end 617. The first shaft end 615 and the second shaft end 617 can comprise different cross-sectional sizes (e.g., diameters). For example, the first shaft end 615 can comprise a first cross-sectional size 619 and the second shaft end 617 can comprise a second cross-sectional size 621, with the first cross-sectional size 619 different than the second cross-sectional size 621. In aspects, the first cross-sectional size 619 may be smaller than the second cross-sectional size 621, such that the shaft 607 can comprise an increasing cross-sectional size from the first shaft end 615 to the second shaft end 617.

[0068] In aspects, the elongated chamber 605 of the support apparatus 601 may be sized to receive the shaft 607 such that the support apparatus 601 can move relative to the shaft 607. For example, the elongated chamber 605 can comprise a chamber cross- sectional size 625 (e.g., diameter). In aspects, the elongated chamber 605 can comprise a cross-sectional shape that matches the cross-sectional shape of the shaft 607. As such, the elongated chamber 605 can comprise a circular shape to match the circular shape of the shaft 607. In aspects, the chamber cross-sectional size 625 may be larger than the first cross-sectional size 619 of the first shaft end 615 and smaller than the second cross- sectional size 621 of the second shaft end 617. In aspects, the support apparatus 601 can comprise an expansion opening 629 that extends from a first end 631 toward an opposing second end 633 of the support apparatus 601. The expansion opening 629 defines a gap, space, channel, passageway, etc. through the support apparatus 601 from an inner radial side (e.g., at the chamber 605) to an outer radial side. In this way, the expansion opening 629 can facilitate radial expansion or contraction of the support apparatus 601 as the support apparatus 601 moves along the shaft 607. That is, the cross-sectional size of the support apparatus 601 can increase as the support apparatus 601 moves along the length of the shaft 607 from the first shaft end 615 toward the second shaft end 617. The expansionopening 629 can initially comprise a first width (e.g., distance between opposing walls that define the expansion opening 629). The expansion opening 629 can increase in size from the first width to a second width as the support apparatus 601 moves toward the second shaft end 617 to accommodate the increasing cross-sectional size of the shaft 607.

[0069] In aspects, the substrate manufacturing apparatus 103 can comprise an alignment apparatus 641 attached to, and extending circumferentially around, the support apparatus 601. The alignment apparatus 641 can comprise a plurality of compliant structures, such as, for example, a first compliant structure 643, a second compliant structure 645, a third compliant structure 647, etc. The compliant structures 643, 645, 647 may be spaced circumferentially apart about the alignment axis 603, and may be attached to an outer radial surface of the support apparatus 601. In aspects, the compliant structures 643, 645, 647 may be positioned to extend substantially parallel to the alignment axis 603 and parallel to one another along a length of the support apparatus 601 between the first end 631 and the second end 633. While FIG. 6 illustrates the alignment apparatus 641 as comprising a total of five compliant structures 643, 645, 647, etc., any number of compliant structures (e.g., one or more) can be provided. In aspects, the alignment apparatus 641 can comprise a single compliant structure that extends partially or completely around the outer radial surface of the support apparatus 601. Alternatively, and as illustrated in FIG. 6, the alignment apparatus 641 can comprise separate and discrete compliant structures that are spaced apart, for example, spaced evenly apart, around the outer radial surface of the support apparatus 601. The alignment apparatus 641 (e.g., the compliant structures 643, 645, 647) can comprise an elastomeric material that can bend, flex, contract, expand, etc. in response to a pressure applied to the alignment apparatus 641. In aspects, the alignment apparatus 641 (e.g., the compliant structures 643, 645, 647) can comprise a material such as rubber, an elastomeric wall surrounding a gas-filled chamber, etc.

[0070] FIG. 7 illustrates a sectional view along lines 7-7 of FIG. 6 at a first location 605 where the support apparatus 601 receives the shaft 607 within the chamber 605. The first location 651 is located along a length of the shaft 607 and may be located approximately at a midpoint between a center of the shaft 607 along the shaft axis 613 and the first shaft end 615. FIG. 7 illustrates two spacers and two substrates, though, in aspects, the plurality of substrates 101 can comprise additional substrates and spacers. In aspects,at the first location 651, the shaft 607 can comprise the first cross-sectional size 619. In this way, the alignment apparatus 641 may initially comprise a first diameter 701 as measured between outer radial surfaces of the alignment apparatus 641. When the alignment apparatus 641 comprises the first diameter 701, the alignment apparatus 641 may be spaced apart from, and not in contact with, the inner radial substrate surfaces 139 and the inner radial spacer surfaces 141. In this way, the alignment apparatus 641 may not alter a position of the plurality of substrates 101, and the plurality of spacers 109 by applying a force to the inner radial substrate surfaces 139 and the inner radial spacer surfaces 141. Alternatively, the alignment apparatus 641 can comprise the first diameter 701 with the alignment apparatus 641 in contact with the inner radial substrate surfaces 139 and the inner radial spacer surfaces 141. However, the alignment apparatus 641 may not apply a sufficient force to the inner radial substrate surfaces 139 and the inner radial spacer surfaces 141 to cause movement of the plurality of substrates 101, and the plurality of spacers 109. Accordingly, when the support apparatus 601 initially receives the shaft 607, the support apparatus 601 may not be radially expanded to a diameter that causes the alignment apparatus 641 to move and / or align the plurality of substrates 101 and the plurality of spacers 109.

[0071] FIG. 8 illustrates a sectional view along lines 8-8 of FIG. 6 after the support apparatus 601 has moved relative to the shaft 607 from the first location 651 to a second location 653. For example, FIG. 8 illustrates the support apparatus 601, the shaft 607, the alignment apparatus 641, the plurality of substrates 101, and the plurality of spacers 109 at the second location 653 (e.g., illustrated in FIG. 6) along a length of the shaft 607. The second location 653 may be located approximately at a midpoint between a center of the shaft 607 along the shaft axis 613 and the second shaft end 617. In this way, the distance between the second shaft end 617 and the second location 653 is less than the distance between the second shaft end 617 and the first location 651. In aspects, as the cross- sectional size of the support apparatus 601 increases, the alignment apparatus 641 can increase from the first diameter 701, in which the alignment apparatus 641 is spaced apart from, and not in contact with, the inner radial substrate surfaces 139 and the inner radial spacer surfaces 141, to a second diameter 801, in which the alignment apparatus 641 is in contact with the inner radial substrate surfaces 139 and the inner radial spacer surfaces 141.For example, methods can comprise contacting the plurality of substrates 101 and the plurality of spacers 109 with the alignment apparatus 641. In particular, contacting the plurality of substrates 101 and the plurality of spacers 109 with the alignment apparatus 137 can comprise sliding the support apparatus 601 along the shaft 607. The shaft 607 comprises the non-constant cross-sectional size such that as the support apparatus 601 moves relative to the shaft 607 from the first location 651 to the second location 653, the support apparatus 601 and the alignment apparatus 641 radially expand and the alignment apparatus 641 contacts the plurality of substrates 101 and the plurality of spacers 109.

[0072] Due to the contact between the alignment apparatus 641 and the inner radial substrate surfaces 139, the inner radial substrate surfaces 139 of the plurality of substrates 101 can move into an aligned orientation in which the inner radial substrate surfaces 139 can be spaced the uniform first distance 501 from the alignment axis 115. That is, each substrate of the plurality of substrates 101 can be spaced the first distance 501 from the alignment axis 115. Accordingly, methods can comprise aligning the inner radial substrate surfaces 139 with the alignment apparatus 641 such that the inner radial substrate surfaces 139 are spaced the uniform first distance 501 from the alignment axis 603. Due to the contact between the alignment apparatus 641 and the inner radial spacer surfaces 141, the inner radial spacer surfaces 141 of the plurality of spacers 109 can move into an aligned orientation in which the inner radial spacer surfaces 141 can be spaced the uniform second distance 503 from the alignment axis 603. That is, each spacer of the plurality of spacers 109 can be spaced the second distance 503 from the alignment axis 603. Accordingly, methods can comprise aligning the inner radial spacer surfaces 141 with the alignment apparatus 641 such that the inner radial spacer surfaces 141 are spaced the uniform second distance 503 from the alignment axis 603. In aspects, the outer radial substrate surfaces of the substrates 101 may likewise be aligned. Following the alignment and stacking of the plurality of substrates 101, a compressive axial force can be applied to the substrates 101 (e.g., in the form of a clamp or other fastening device that applies inward pressure on a top substrate and a bottom substrate) to hold the substrates 101 in place. The substrate manufacturing apparatus 103 can be removed, and inner and outer radial substrate surfaces of the substrates 101 can then be simultaneously polished without interference from thespacers 109 due to the inner and outer radial spacer surfaces being offset from the inner and outer radial substrate surfaces.

[0073] FIGS. 9-11 illustrate additional embodiments of the substrate manufacturing apparatus 103. In aspects, and as illustrated in FIG. 9, the substrate manufacturing apparatus 103 can comprise the base 107 and the support apparatus 113. The substrate manufacturing apparatus 103 can further comprise one or more support fins 901 and an alignment apparatus 903. The one or more support fins 901 can comprise, for example, a first support fin 907, a second support fin 1001 (e.g., illustrated in FIG. 10), and a third support fin 1003 (e.g., illustrated in FIG. 10). The first support fin 907 is attached to the support apparatus 113 and can project radially outwardly from the support apparatus 113. In aspects, the first support fin 907 can extend substantially parallel to the alignment axis 115 and along the first side 305 of the support apparatus 113. FIG. 10 illustrates a top-down view of the substrate manufacturing apparatus 103 along lines 10-10 of FIG. 9. The second support fin 1001 and the third support fin 1003 may be substantially identical to the first support fin 907. For example, the second support fin 1001 can be attached to the support apparatus 113 and can project radially outwardly from the support apparatus 113. The second support fin 1001 can extend substantially parallel to the alignment axis 115 and along the second side 315 of the support apparatus 113 that is spaced circumferentially apart from the first side 305. The third support fin 1003 can be attached to the support apparatus 113 and can project radially outwardly from the support apparatus 113. The third support fin 1003 can extend substantially parallel to the alignment axis 115 and along the third side 325 of the support apparatus 113 that is spaced circumferentially apart from the first side 305 and the second side 315. The support fins 907, 1001, 1003 can define spaces within which one or more granules can be positioned. For example, a first space 1005 can be defined between the first support fin 907 and the second support fin 1001, a second space 1007 can be defined between the second support fin 1001 and the third support fin 1003, and a third space 1009 can be defined between the third support fin 1003 and the first support fin 907.

[0074] FIG. 11 illustrates the substrate manufacturing apparatus 103 at focus circle 11 of FIG. 9. Referring to FIGS. 10-11, the substrate manufacturing apparatus 103 can comprise the alignment apparatus 903 that is in contact with the support apparatus 113 andcan extend at least partially along the alignment axis 115. The alignment apparatus 903 can contact the inner radial substrate surfaces 139 such that the inner radial substrate surfaces 139 may be spaced the uniform first distance 501 from the alignment axis 115, and the alignment apparatus 903 can also contact the inner radial spacer surfaces 141 such that the inner radial spacer surfaces 141 may be spaced the uniform first distance 501 from the alignment axis 115. As illustrated in FIG. 10, the alignment apparatus 903 can comprise a first portion of granules 1017, a second portion of granules 1019, and a third portion of granules 1021. The plurality of granules 1017, 1019, 1021 can comprise spherical or near-spherical shaped structures that can contact and exert a force upon the substrates 101 and the spacers 109. The first portion of granules 1017 can be positioned in the first space 1005 between the first support fin 907 and the second support fin 1001. The second portion of granules 1019 can be positioned in the second space 1007 between the second support fin 1001 and the third support fin 1003. The third portion of granules 1021 can be positioned in the third space 1009 between the first support fin 907 and the third support fin 1003. In aspects, the plurality of granules 1017, 1019, 1021 can be poured or otherwise deposited into the spaces 1005, 1007, 1009.

[0075] In aspects, methods can comprise contacting the plurality of substrates 101 and the plurality of spacers 109 with the alignment apparatus 903. In particular, contacting the plurality of substrates 101 and the plurality of spacers 109 with the alignment apparatus 903 can comprise depositing the plurality of granules 1017, 1019, 1021 around the support apparatus 113 such that the plurality of granules 1017, 1019, 1021 contact the plurality of substrates 101 and the plurality of spacers 109. As illustrated in FIG. 11, the plurality of granules 1017, 1019, 1021 can contact the inner radial substrate surfaces 139 and the inner radial spacer surfaces 141. As the plurality of granules 1017, 1019, 1021 fill the spaces 1005, 1007, 1009, the plurality of granules 1017, 1019, 1021 can apply a force to the inner radial surfaces 139, 141 to cause movement of the plurality of substrates 101, and the plurality of spacers 109. In aspects, to further facilitate the applied force and movement of the plurality of substrates 101 and the plurality of spacers 109, the substrate manufacturing apparatus 103, the substrates 101, the spacers 109, and the plurality of granules 1017, 1019, 1021 can be vibrated at an amplitude that allows for simultaneous filling and spread of the plurality of granules 1017, 1019, 1021.

[0076] The plurality of granules 1017, 1019, 1021 can cause the plurality of substrates 101 to move into an aligned position, such that the inner radial substrate surfaces 139 are aligned and spaced the uniform first distance 501 from the alignment axis 115. That is, each substrate of the plurality of substrates 101 can be spaced the first distance 501 from the alignment axis 115. Likewise, the plurality of granules 1017, 1019, 1021 can cause the plurality of spacers 109 to move into an aligned position, such that the inner radial spacer surfaces 141 are aligned and spaced the uniform second distance 503 from the alignment axis 115. That is, each spacer of the plurality of spacers 109 can be spaced the second distance 503 from the alignment axis 115. In aspects, the outer radial substrate surfaces of the substrates 101 may likewise be aligned. Following the alignment and stacking of the plurality of substrates 101, a compressive axial force can be applied to the substrates 101 (e.g., in the form of a clamp or other fastening device that applies inward pressure on a top substrate and a bottom substrate) to hold the substrates 101 in place. The substrate manufacturing apparatus 103 can be removed, and inner and outer radial substrate surfaces of the substrates 101 can then be simultaneously polished without interference from the spacers 109 due to the inner and outer radial spacer surfaces being offset form the inner and outer radial substrate surfaces.

[0077] FIGS. 12-15 illustrate additional embodiments of the substrate manufacturing apparatus 103. FIG. 12 illustrates a top-down view of a first surface 1201 of a first substrate 1203 of the plurality of substrates 101. In aspects, a first spacer 1207 can be attached to the first surface 1201 of the first substrate 1203. The first spacer 1207 can comprise one or more spacer openings, such as, for example, a first spacer opening 1211, a second spacer opening 1213, and a third spacer opening 1215. In aspects, the spacer openings 1211, 1213, 1215 can be spaced apart about the alignment axis 115. For example, an opening angle 1221 can be defined between the first spacer opening 1211 and the second spacer opening 1213 about the alignment axis 115. The opening angle 1221 may be within a range from about 100 degrees to about 140 degrees, or about 120 degrees. A similar or identical opening angle 1221 may likewise be defined between the second spacer opening 1213 and the third spacer opening 1215, and between the first spacer opening 1211 and the third spacer opening 1215.

[0078] In aspects, the radial distance between the alignment axis 115 and the spacer openings 1211, 1213, 1215 may be substantially constant for each of the spacer openings 1211, 1213, 1215, for example, with the radial distance in a range from about 10 mm to about 70 mm, or about 30 mm to about 50 mm, or about 40 mm. The spacer openings 1211, 1213, 1215 can define regions of the first spacer 1207 that do not comprise spacer material, such that an axis, parallel to the alignment axis 115, may pass through the spacer openings 1211, 1213, 1215 while not passing through spacer material of the first spacer 1207. The first spacer 1207 can be attached to the first surface 1201 in several ways, for example, by one or more of roll coating, screen printing, inkjet printing, masked spraying, etc. While the spacer openings 1211, 1213, 1215 are illustrated as comprising a circular shape, other shapes are possible, such as, for example, quadrilateral shapes (e.g., square, rectangle, etc.), triangular shapes, other rounded shapes, etc.

[0079] FIG. 13 illustrates a top-down view of a first surface 1301 of a second substrate 1303 of the plurality of substrates 101. In aspects, a second spacer 1307 can be attached to the first surface 1301 of the second substrate 1303. The second spacer 1307 can comprise one or more spacer projections, such as, for example, a first spacer projection 1311, a second spacer projection 1313, and a third spacer projection 1315. In aspects, the spacer projections 1311, 1313, 1315 can be spaced apart about the alignment axis 115 and may substantially match a position, size, and shape of the spacer openings 1211, 1213, 1215. For example, a projection angle 1321 can be defined between the first spacer projection 1311 and the second spacer projection 1313 about the alignment axis 115. The projection angle 1321 may be within a range from about 100 degrees to about 140 degrees, or about 120 degrees. A similar or identical projection angle 1321 may likewise be defined between the second spacer projection 1313 and the third spacer projection 1315, and between the first spacer projection 1311 and the third spacer projection 1315. In addition, the radial distance between the alignment axis 115 and the spacer projection 1311, 1313, 1315 may be substantially constant for each of the spacer projections 1311, 1313, 1315, for example, with the radial distance in a range from about 10 mm to about 70 mm, or about 30 mm to about 50 mm, or about 40 mm. Accordingly, in this way, the projection angle 1321 can be substantially equal to the opening angle 1221, and the radial distance between the alignment axis 115 and the spacer openings 1211, 1213, 1215 can besubstantially equal to the radial distance between the alignment axis 115 and the spacer projections 1311, 1313, 1315. The spacer projections 1311, 1313, 1315 may be spaced apart and not in contact with one another, such that the second spacer 1307 forms a discontinuous layer comprising separate and discrete areas that cover a portion of the first surface 1301.

[0080] The spacer projections 1311, 1313, 1315 can define regions of the second spacer 1307 that comprise a spacer material. The second spacer 1307 can be attached to the first surface 1301 in several ways, for example, by one or more of roll coating, screen printing, inkjet printing, masked spraying, etc. The spacer projections 1311, 1313, 1315 can comprise a size and shape that substantially matches the size and shape of the spacer openings 1211, 1213, 1215. For example, FIG. 14 illustrates a side view of the first substrate 1203 and the second substrate 1303 in a spaced apart position. The first substrate 1203 can be moved in a first movement direction 1401 toward the second substrate 1303 and / or the second substrate 1303 can be moved in an opposing second movement direction 1403 toward the first substrate 1203. The spacer projections 1311, 1313, 1315 are sized, shaped, and positioned to be received within the spacer openings 1211, 1213, 1215. For example, the first spacer projection 1311 can be received within the first spacer opening 1211, the second spacer projection 1313 can be received within the second spacer opening 1213, and the third spacer projection 1315 can be received within the third spacer opening 1215. Accordingly, the first spacer 1207, the second spacer 1307, the first substrate 1203, and the second substrate 1303 can extend circumferentially around the alignment axis 115 such that inner radial substrate surfaces 139 of the first substrate 1203 and the second substrate 1303 are spaced the uniform first distance 501 from the alignment axis 115.

[0081] FIG. 14 illustrates a side view of the first substrate 1203 and the second substrate 1303 spaced apart and moving toward one another. For example, the first substrate 1203 can be moved in a first movement direction 1401 toward the second substrate 1303. In addition, or in the alternative, the second substrate 1303 can be moved in a second movement direction 1403, which is opposite the first movement direction 1401, toward the first substrate 1203. As the substrates 1203, 1303 move toward each other in the respective movement directions 1401, 1403, the spacer projections 1311, 1313, 1315 can be received within the spacer openings 1211, 1213, 1215. For example, the first spacerprojection 1311 can be received within the first spacer opening 1211, the second spacer projection 1313 can be received within the second spacer opening 1213, and the third spacer projection 1315 can be received within the third spacer opening 1215. As illustrated in FIG. 14, the first substrate 1203 can comprise the first surface 1201 and an opposing second surface 1407. The second surface 1407 can comprise a spacer material 1408 that is substantially identical to the second spacer 1307 in position, size, and shape. Similarly, the second substrate 1303 can comprise the first surface 1301 and an opposing second surface 1409. The second surface 1409 can comprise a spacer material 1410 that is substantially identical to the first spacer 1207 in position, size, and shape. In this way, each substrate can comprise a spacer on both opposing surfaces, such that the substrates 101 can be arranged in a stacked and aligned orientation (e.g., illustrated in FIG. 15).

[0082] FIG. 15 illustrates a side view of the first substrate 1203 aligned relative to the second substrate 1303 after movement in the movement directions 1401, 1403. For example, the first spacer 1207, the second spacer 1307, the first substrate 1203, and the second substrate 1303 can extend circumferentially around the alignment axis 115. As such, the inner radial substrate surfaces 139 (e.g., illustrated with dashed lines in FIG. 15) of the substrates 101, 1203, 1303 can be aligned and spaced the uniform first distance 501 from the alignment axis 115. Likewise, the inner radial spacer surfaces 141 (e.g., illustrated with dashed lines in FIG. 15) of the spacers 109, 1207, 1307 can be spaced the uniform second distance 503 from the alignment axis 115. Accordingly, the spacers 1207, 1307 can function as an alignment apparatus such that methods can comprise contacting the plurality of substrates 101 with the alignment apparatus (e.g., the spacers 1207, 1307) and aligning the inner radial substrate surfaces 139 such that the inner radial substrate surfaces 139 are spaced the uniform first distance 501 from the alignment axis 115.

[0083] In aspects, methods can comprise providing the first spacer 1207 attached to the first surface 1201 of the first substrate 1203, with the first spacer 1207 comprising the first spacer opening 1211 and the second spacer opening 1213. Methods can further comprise providing the second spacer 1307 attached to the first surface 1301 of the second substrate 1303, with the second spacer 1307 comprising the first spacer projection 1311 and the second spacer projection 1313. The first spacer projection 1311 can be received within the first spacer opening 1211 and the second spacer projection 1313 can be receivedwithin the second spacer opening 1213. In aspects, the outer radial substrate surfaces of the substrates 101 may likewise be aligned. Following the alignment and stacking of the plurality of substrates 101, a compressive axial force can be applied to the substrates 101 (e.g., in the form of a clamp or other fastening device that applies inward pressure on a top substrate and a bottom substrate) to hold the substrates 101 in place. The substrate manufacturing apparatus 103 can be removed, and inner and outer radial substrate surfaces of the substrates 101 can then be simultaneously polished without interference from the spacers 109 due to the inner and outer radial spacer surfaces being offset form the inner and outer radial substrate surfaces.

[0084] As described herein, several ways to stack the substrates 101 using the spacers 109 are disclosed. The substrates 101 can be stacked in a damage-free manner, with the inner radial substrate surfaces aligned with one another, and the outer radial substrate surfaces aligned with one another. The inner and outer radial spacer surfaces of the spacers 109 may be offset from the substrate surfaces. As such, after stacking, the inner radial substrate surfaces and the outer radial substrate surfaces can be polished. By providing for simultaneous polishing of the inner and outer radial substrate surfaces, the finishing costs of the manufacturing process can be reduced, while superior quality (e.g., mechanical edge strength, dimensional control, low edge defectivity, etc.) can be provided. Additional benefits can comprise stacking of the substrates 101 without the loss of concentricity about the alignment axis 115. Further, the present disclosure can replace deterministic edge profiling by mechanical means (e.g., mechanical singulation of a substrate followed by edge grinding). The present disclosure can provide precise stacking of the substrates 101, which can allow for dimensional capability and control due to slow removal characteristics of a chemical-mechanical polishing process. In addition, a variety of substrate materials can be used, for example, glass, glass laminates, silicon, composite materials, strengthened glass, etc.

[0085] It should be understood that while various aspects have been described in detail relative to certain illustrative and specific examples thereof, the present disclosure should not be considered limited to such, as numerous modifications and combinations of the disclosed features are possible without departing from the scope of the following claims.

Claims

What is claimed is:

1. A substrate manufacturing apparatus comprising: a support apparatus extending along an alignment axis and configured to receive a plurality of substrates and a plurality of spacers such that the plurality of substrates and the plurality of spacers extend circumferentially around the support apparatus; and an alignment apparatus in contact with the support apparatus and extending at least partially along the alignment axis, the alignment apparatus configured to contact inner radial substrate surfaces of the plurality of substrates such that the inner radial substrate surfaces are spaced a uniform first distance from the alignment axis, the alignment apparatus configured to contact inner radial spacer surfaces of the plurality of spacers such that the inner radial spacer surfaces are spaced a uniform second distance from the alignment axis.

2. The substrate manufacturing apparatus of claim 1 , wherein the alignment apparatus comprises one or more of: a first alignment apparatus extending parallel to the alignment axis and along a first side of the support apparatus, the first alignment apparatus comprising a first elastomeric wall surrounding a first chamber; a second alignment apparatus extending parallel to the alignment axis and along a second side of the support apparatus that is spaced circumferentially apart from the first side, the second alignment apparatus comprising a second elastomeric wall surrounding a second chamber; or a third alignment apparatus extending parallel to the alignment axis and along a third side of the support apparatus that is spaced circumferentially apart from the first side and the second side, the third alignment apparatus comprising a third elastomeric wall surrounding a third chamber.

3. The substrate manufacturing apparatus of claim 2, wherein the support apparatus comprises a hollow chamber in fluid communication with the first chamber, the second chamber, and the third chamber, the support apparatus in fluid communication with a gasapparatus that is configured to transmit air through the hollow chamber, the first chamber, the second chamber, and the third chamber.

4. The substrate manufacturing apparatus of claim 3, wherein the first alignment apparatus, the second alignment apparatus, and the third alignment apparatus are configured to move between a deflated position, in which the first elastomeric wall, the second elastomeric wall, and the third elastomeric wall are spaced apart from, and not in contact with, the inner radial spacer surfaces and the inner radial substrate surfaces, and an inflated position, in which the first elastomeric wall, the second elastomeric wall, and the third elastomeric wall are in contact with the inner radial spacer surfaces and the inner radial substrate surfaces.

5. The substrate manufacturing apparatus of claim 1, further comprising a shaft extending along a shaft axis, the support apparatus defining an elongated chamber configured to receive the shaft such that the support apparatus is configured to move relative to the shaft.

6. The substrate manufacturing apparatus of claim 5, wherein the shaft comprises a non-constant cross-sectional size along a length of the shaft such that a cross-sectional size of the support apparatus is configured to increase as the support apparatus moves along the length of the shaft.

7. The substrate manufacturing apparatus of claim 6, wherein the alignment apparatus is attached to, and extends circumferentially around, the support apparatus, the alignment apparatus comprising an elastomeric material such that as the cross-sectional size of the support apparatus increases, the alignment apparatus is configured to increase from a first diameter, in which the alignment apparatus is spaced apart from, and not in contact with, the inner radial spacer surfaces and the inner radial substrate surfaces, to a second diameter, in which the alignment apparatus is in contact with the inner radial spacer surfaces and the inner radial substrate surfaces.

8. The substrate manufacturing apparatus of claim 1, further comprising one or more of: a first support fin attached to the support apparatus and projecting radially outwardly from the support apparatus, the first support fin extending parallel to the alignment axis and along a first side of the support apparatus; a second support fin attached to the support apparatus and projecting radially outwardly from the support apparatus, the second support fin extending parallel to the alignment axis and along a second side of the support apparatus that is spaced circumferentially apart from the first side; and a third support fin attached to the support apparatus and projecting radially outwardly from the support apparatus, the third support fin extending parallel to the alignment axis and along a third side of the support apparatus that is spaced circumferentially apart from the first side and the second side.

9. The substrate manufacturing apparatus of claim 8, wherein the alignment apparatus comprises a first portion of granules positioned between the first support fin and the second support fin, a second portion of granules positioned between the second support fin and the third support fin, and a third portion of granules positioned between the first support fin and the third support fin.

10. The substrate manufacturing apparatus of claim 9, wherein the first portion of granules, the second portion of granules, and the third portion of granules are configured to contact the inner radial substrate surfaces and the inner radial spacer surfaces.

11. A substrate manufacturing apparatus comprising: a first spacer attached to a first surface of a first substrate, the first spacer comprising a first spacer opening and a second spacer opening; and a second spacer attached to a first surface of a second substrate, the second spacer comprising a first spacer projection and a second spacer projection, the first spacer projection received within the first spacer opening and the second spacer projection received within the second spacer opening, wherein the first spacer, the second spacer,the first substrate, and the second substrate extend circumferentially around an alignment axis such that inner radial substrate surfaces of the first substrate and the second substrate are spaced a uniform first distance from the alignment axis, and inner radial spacer surfaces of the first spacer and the second spacer are spaced a uniform second distance from the alignment axis.

12. The substrate manufacturing apparatus of claim 11, wherein an opening angle between the first spacer opening and the second spacer opening about the alignment axis is within a range from about 100 degrees to about 140 degrees.

13. The substrate manufacturing apparatus of claim 12, wherein a projection angle between the first spacer projection and the second spacer projection about the alignment axis is substantially equal to the opening angle.

14. The substrate manufacturing apparatus of any one of claims 11-13, wherein the first spacer is attached to the first surface of the first substrate by one or more of roll coating, screen printing, inkjet printing, or masked spraying.

15. A method of manufacturing a substrate, comprising: positioning a plurality of substrates in contact with a plurality of spacers along an alignment axis such that one or more spacers of the plurality of spacers are positioned between adjacent substrates of the plurality of substrates, the plurality of substrates comprising inner radial substrate surfaces and the plurality of spacers comprising inner radial spacer surfaces; contacting one or more of the plurality of substrates or the plurality of spacers with an alignment apparatus; and aligning the inner radial substrate surfaces with the alignment apparatus such that the inner radial substrate surfaces are spaced a uniform first distance from the alignment axis.

16. The method of claim 15, further comprising:positioning the plurality of substrates and the plurality of spacers around a support apparatus that extends along the alignment axis; and aligning the inner radial spacer surfaces with the alignment apparatus such that the inner radial spacer surfaces are spaced a uniform second distance from the alignment axis.

17. The method of claim 16, wherein the contacting comprises inflating the alignment apparatus such that the alignment apparatus expands and contacts the plurality of substrates and the plurality of spacers.

18. The method of claim 16, wherein the contacting comprises sliding the support apparatus along a shaft comprising a non-constant cross-sectional size such that as the support apparatus moves relative to the shaft, the support apparatus and the alignment apparatus radially expand and the alignment apparatus contacts the plurality of substrates and the plurality of spacers.

19. The method of claim 16, wherein the contacting comprises depositing a plurality of granules around the support apparatus such that the plurality of granules contact the plurality of substrates and the plurality of spacers.

20. The method of claim 15, wherein the contacting comprises: providing a first spacer attached to a first surface of a first substrate of the plurality of substrates, the first spacer comprising a first spacer opening and a second spacer opening; and providing a second spacer attached to a first surface of a second substrate of the plurality of substrates, the second spacer comprising a first spacer projection and a second spacer projection, the first spacer projection received within the first spacer opening and the second spacer projection received within the second spacer opening.

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