Apparatus for processing substrates using double bellows equipped with linear actuator

Abstract

Disclosed is an apparatus for processing substrates using double bellows equipped with a linear actuator, the apparatus precisely controlling vertical movements of a lower container and significantly reducing processing time while blocking noise generated by rapid piston movements and inducing smooth movements. The apparatus comprises: an inner container comprising upper and lower containers; a substrate chuck provided inside the inner container; a first stretchable unit disposed below the inner container and comprising a first driving unit for vertically moving the substrate chuck by using a first bellows; and a second stretchable unit disposed below the inner container and comprising a second driving unit for vertically moving the lower container by using a second bellows, wherein the first and second stretchable units are disposed separated from each other.

Description

Substrate handling device using a double bellows with a linear actuator

[0001] The present invention relates to a substrate processing device, and more particularly, to a substrate processing device that effectively and precisely moves a container for processing a substrate by means of a double bellows using a linear actuator.

[0002] Substrate processing equipment manufactures various thin films on substrates such as semiconductor wafers and glass substrates. In particular, plasma can be used to lower process temperatures and increase deposition rates. Plasma uses active species such as radicals and ions to perform micro-processing, such as etching, on the substrate surface. These processing equipment requires precise control of process variables within the chamber, such as gas flow, temperature distribution, and plasma state, to achieve the desired conditions. However, substrate entrances and exits are formed on some of the chamber's sidewalls, which cause asymmetry in the gas flow and temperature distribution within the chamber. This asymmetry results in uneven film thickness and quality, deteriorating the physical properties of various devices.

[0003] Korean Patent No. 10-2317402 proposes a substrate processing device utilizing a double bellows that precisely moves the inner container up and down, and prevents the substrate chuck from shaking during the movement. To block noise caused by rapid piston movement and ensure smooth operation, a known pneumatic cylinder is used as the second drive unit. However, the known pneumatic cylinder does not provide precise control over the vertical movement of the lower container, and therefore, a second drive unit that can address this issue is needed. Conventional methods require multiple steps, resulting in a relatively long process time. This increased process time reduces substrate throughput.

[0004] The problem to be solved by the present invention is to provide a substrate processing device using a double bellows linear actuator that blocks noise generated by rapid movement of a piston, induces smooth movement, precisely controls the up-and-down movement of a lower container, and significantly reduces process time, thereby increasing the throughput of substrates.

[0005] A substrate processing device using a double bellows using a linear actuator for solving the problem of the present invention comprises: an inner container built into a chamber and comprising an upper container and a lower container; a substrate chuck installed inside the inner container; a first expansion unit disposed at a lower portion of the inner container and including a first driving unit for moving the substrate chuck up and down using a first bellows; and a second expansion unit disposed at a lower portion of the inner container and including a second driving unit for moving the lower container up and down using a second bellows. At this time, the first expansion unit and the second expansion unit are disposed separately.

[0006] In the device of the present invention, the first and second expansion units can operate simultaneously. The first and second expansion units include a movable unit that reciprocates linearly along a guide. The movable unit includes a frame that moves in conjunction with each other. The first and second driving units may be formed of a precision motor. The movable unit may be formed of an electromagnet or a permanent magnet, and the first and second driving units may be formed of a permanent magnet or an electromagnet.

[0007] According to the present invention, a substrate processing device using a double bellows linear motor utilizes a precisely operating linear actuator, thereby blocking noise generated by rapid piston movement and inducing smooth operation, while enabling precise control of the vertical movement of the lower container. Furthermore, since the substrate chuck and lower container operate simultaneously, process time can be significantly reduced, thereby increasing substrate processing capacity.

[0008] Fig. 1 is a cross-sectional view showing an open state of a substrate processing device according to the present invention.

[0009] Figure 2 is a cross-sectional view showing the process state of a substrate processing device according to the present invention.

[0010] Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the attached drawings. The embodiments described below may be modified in various other forms, and the scope of the present invention is not limited to the embodiments described below. The embodiments of the present invention are provided to more completely explain the present invention to those skilled in the art. In the drawings, exaggerated representations are used for convenience of explanation. Meanwhile, terms indicating positions such as "upper," "lower," and "front" are only related to those shown in the drawings. In practice, the processing device can be used in any optional direction, and the spatial direction during actual use varies depending on the orientation and rotation of the processing device.

[0011] An embodiment of the present invention proposes a substrate processing device using a double bellows that utilizes a precisely operating linear actuator to block noise caused by rapid movement of a piston, induce smooth operation, precisely control the vertical movement of a lower container, and significantly reduce process time, thereby increasing the throughput of substrates. To this end, a substrate processing device using a double bellows equipped with a linear actuator will be described in detail, and a process of moving the lower container up and down by the linear actuator will be described in detail. The substrate processing device according to an embodiment of the present invention is used to form various thin films on substrates such as semiconductor wafers and glass substrates or to perform micro-processing to manufacture micro-elements, and also utilizes plasma.

[0012] Fig. 1 is a cross-sectional view showing an open state of a substrate processing device (100) according to an embodiment of the present invention. However, it is not a drawing in the strict sense, and there may be components not shown in the drawing for the convenience of explanation.

[0013] According to FIG. 1, a substrate processing device (100) includes a chamber (10), a substrate chuck (12), an internal vessel (bowl, 20), and a double-extension part (30, 40). The chamber (10) has an internal vessel (20) built in, and a showerhead (11) is mounted on the upper portion. The substrate chuck (12) is a plate of a predetermined thickness that supports a substrate (S), and has a shape similar to that of the substrate (S), but is not limited thereto and may be changed into various shapes. The substrate chuck (12) is installed horizontally inside the internal vessel (20). A heating element (not shown) is provided inside the substrate chuck (12) to heat the substrate (S) placed on the upper portion of the substrate chuck (12). The heating element may be installed in various ways and structures, and is not particularly limited. In addition, the substrate chuck (12) may also be used as a lower electrode for forming plasma. For example, the substrate chuck (12) may be grounded and power may be applied to the showerhead (11), thereby forming plasma between the substrate chuck (12) and the showerhead (11).

[0014] On the side of the chamber (10), there are located an entrance (14) through which a substrate (S) enters and exits, and a gate (15) for opening and closing the entrance (14). The substrate (S) is loaded onto a substrate chuck (12) located inside an internal container (20) through the entrance (14). After the substrate (S) is loaded, various processes for manufacturing micro-devices, such as thin film formation and micro-machining, are performed on the substrate. The substrate (S) is seated on a lift pin (13). The chamber (10), showerhead (11), substrate chuck (12), entrance (14), and gate (15) are known in the art and can be modified in various ways within the scope of the present invention. However, due to the entrance (14) of the chamber (10), the symmetry of the internal space of the chamber (10) is lost. At this time, the double expansion parts (30, 40) are each composed of a first expansion part (30) and a second expansion part (40).

[0015] The inner container (20) is composed of a lower container (21) that reciprocates and an upper container (23) from which the lower container (21) is detached. The upper surface of the lower container (21) is brought into close contact with or separated from the lower surface of the upper container (23) by a second elastic member (40). The upper container (23) is fixed to the upper side of the chamber (10) and may be arranged to surround the inner wall of the upper side of the chamber (10). For example, the upper container (23) may be in the shape of an annular ring. The lower container (21) has a container shape and includes a bottom surface spaced apart from the lower surface of the substrate chuck (12) at a constant interval and a side wall spaced apart from the side surface of the substrate chuck (12) at a constant interval. The lower container (21) has a symmetrical structure with respect to the center of the substrate chuck (12).

[0016] Optionally, a connecting portion (22) may be provided on the upper surface of the lower container (21) and the lower surface of the upper container (23). The connecting portion (22) may have a protrusion on the upper surface of the lower container (21) and a groove on the lower surface of the upper container (23) into which the protrusion can be inserted. In some cases, the protrusion and the groove may be positioned in opposite directions. The connecting portion (22) improves the adhesion between the lower container (21) and the upper container (23) and facilitates the connecting. At least one or both of the lower container (21) and the upper container (23) may be made of a ceramic material. The ceramic has excellent heat retention, thermal stability, and corrosion resistance, and is therefore preferable as a material for the inner container (20) in which the process of manufacturing the micro-device is performed.

[0017] In the double expansion unit (30, 40), the first expansion unit (30) is coupled to the substrate chuck (12), and the second expansion unit (40) is coupled to the lower container (21). That is, the first expansion unit (30) controls the vertical movement of the substrate chuck (12), and the second expansion unit (40) controls the vertical movement of the lower container (21). Controlling the vertical movement serves to ensure that the substrate chuck (12) and the lower container (21) move stably, and to limit the distance that the substrate chuck (12) and the lower container (21) move.

[0018] The first expansion member (30) includes a first guide (31), a first driving member (32), a first linear actuator (33), a first frame (34), a first fixing member (35), a first bellows (36), a first bracket (37), and a chuck support member (38). The first guide (31) provides a path along which the first linear actuator (33) moves. The first linear actuator (33) reciprocates linearly along the first guide (31). Any known actuator within the scope of the present invention can be applied to the first linear actuator (33).

[0019] The first frame (34) is linked to the movement of the first linear actuator (33). Specifically, when the first linear actuator (33) rises, the first frame (34) also rises, and when the first linear actuator (33) descends, the first frame (34) also descends. To this end, the first linear actuator (33) and the first frame are connected by a first fixing member (35), such as a bolt. The first bellows (36) is accommodated in the first bracket (37), and the first bellows (36) and the first bracket (37) are connected to the first frame (34). The first frame (34) is connected to the chamber (10).

[0020] The first driving unit (32) provides power to move the first linear actuator (33). The first driving unit (32) is preferably a precision motor that can be precisely controlled, such as a servo motor or a stepping motor. The servo motor is an electric motor that converts an input voltage into a rotation angle, and a two-phase AC or DC servo motor is used. The stepping motor is also called a pulse motor because it rotates an angle proportional to a given number of pulses by giving a sequence to step-state pulses. Since the precision motor precisely controls the vertical movement of the substrate chuck (12), it allows the substrate chuck (12) to move stably while minimizing shaking of the substrate chuck (12). Any well-known method can be adopted for implementing the operation of the first linear actuator (33) by the first driving unit (32). Although not shown in the drawing, the first driving unit (32) is fixed to a predetermined position of the substrate processing device (100), for example, to a motor mounting portion.

[0021] Meanwhile, the first expansion member (30) may utilize a magnetic linear actuator in which the first guide (31) is formed of an electromagnet and the first linear actuator (33) is formed of a permanent magnet. In some cases, the first guide (31) may be formed of a permanent magnet and the first linear actuator (33) may be formed of an electromagnet. In this case, a control unit that controls the electromagnet is used instead of the first driving unit (32). Specifically, the first guide (31) includes a plurality of electromagnets, and the first linear actuator (33) has permanent magnets arranged therein. Linear kinetic energy is obtained by the magnetic force acting between the electromagnet of the first guide (31) and the permanent magnet of the first linear actuator (33). The linear kinetic energy allows the first linear actuator (33) to move along the first guide (31).

[0022] The first guide (31) and the first linear actuator (33) can all be applied using known methods, and are merely conceptually simplified for the convenience of explanation. The magnetic linear actuator precisely controls the vertical movement of the substrate chuck (12), thereby allowing the substrate chuck (12) to move stably while minimizing shaking of the substrate chuck (12).

[0023] The second expansion member (40) includes a second guide (41), a second driving member (42), a second linear actuator (43), a second frame (44), a second fixing member (45), a second bellows (46), a second bracket (47), and a container support member (48). The second guide (41) provides a path along which the second linear actuator (43) moves. The second linear actuator (43) performs a linear reciprocating motion along the second guide (41). The second frame (44) is linked to the movement of the second linear actuator (43). Specifically, when the second linear actuator (43) rises, the second frame (44) also rises, and when the second linear actuator (43) lowers, the second frame (44) also lowers. For this purpose, the second linear actuator (43) and the second frame are connected by a second fixing member (45), such as a bolt. The second bellows (46) is accommodated in the second bracket (47), and the second bellows (46) and the second bracket (47) are connected to the second frame (44). The second frame (44) is connected to the chamber (10).

[0024] The second driving unit (42) provides power to move the second linear actuator (43). The second driving unit (42) may be applied with a precision motor that is precisely controlled, just like the first driving unit (32). In addition, the second expansion unit (40) may be applied with a magnetic linear actuator, just like the first expansion unit (30). Since the precision motor and the magnetic linear actuator precisely control the vertical movement of the lower container (21), they allow the lower container (21) to move stably while minimizing shaking of the lower container (21).

[0025] Here, the open state in which the inner container (20) is open is expressed. When the inner container (20) is opened, the lower container (21) and the upper container (23) are spaced apart, and a gap (G) exists between the lower container (21) and the upper container (23). The substrate (S) for manufacturing a micro-device is fed into the substrate chuck (12) through the entrance (14) and the gap (G). For this purpose, the first bellows (36) has a first gap (D1), and the second bellows (46) has a second gap (D2). The first and second gaps (D1, D2) are controlled by the first and second expansion and contraction parts (30, 40), respectively.

[0026] The first and second expansion units (30, 40) of the substrate processing device (100) of the present invention are arranged spaced apart from each other. As illustrated, they can be arranged on both sides of the substrate chuck (12). The first and second expansion units (30, 40) arranged spaced apart from each other are referred to as separately arranged double expansion units. In addition, the first and second expansion units (30, 40) operate independently. The first and second expansion units (30, 40) can operate individually or simultaneously. When they operate individually, the substrate chuck (12) and the lower container (21) individually rise or fall, and when they operate simultaneously, the substrate chuck (12) and the lower container (21) rise or fall simultaneously.

[0027] Fig. 2 is a cross-sectional view showing the process state of a substrate processing device (100) according to an embodiment of the present invention. At this time, the substrate processing device (100) will be referred to Fig. 1.

[0028] According to FIG. 2, the substrate processing device (100) includes first and second expansion and contraction sections (30, 40). Here, a process state in which the inner container (20) is sealed is expressed. In order for the inner container (20) to be sealed, the lower container (21) and the upper container (23) are combined. To this end, the second expansion and contraction section (40) elevates the lower container (21). At the same time, the first expansion and contraction section (30) elevates the substrate chuck (12) in order to perform a micro-device manufacturing process. To this end, the first expansion and contraction section (30) elevates the substrate chuck (12) to the process position. At this time, the first bellows (36) has a third gap (D3), and the second bellows (46) has a fourth gap (D4). The third and fourth gaps (D3, D4) are controlled by the first and second expansion and contraction sections (30, 40), respectively. In the process state, the substrate chuck (12) and the lower container (21) rise, so the third and fourth gaps (D3, D4) are smaller than the first and second gaps (D1, D2) in the open state.

[0029] When the rise of the substrate chuck (12) is completed, a first space (a) is formed between the chamber (10) and the lower container (21), and a second space (b) is provided inside the inner container (20). The first space (a) has no symmetry near the entrance (14) through which the substrate (S) enters and exits. On the other hand, the second space (b) of the inner container (20) has a symmetrical structure with respect to the center of the substrate chuck (12). Since the second space (b) maintains symmetry, when the substrate chuck (12) is heated, the substrate chuck (12) and its surroundings are maintained at a uniformly high temperature. That is, the second space (b) is blocked from the first space (a), symmetry is maintained, and heat retention is excellent, so the substrate (S) is uniformly processed. When the substrate (S) is uniformly processed, a microdevice with excellent physical properties can be manufactured. Additionally, the second space (b) has a smaller volume than the first space (a). If the volume of the second space (b) is smaller, the processing gas flowing into the second space (b) can quickly reach the substrate (S), thereby improving the processing speed and reducing the amount of processing gas required.

[0030] The substrate processing device (100) according to an embodiment of the present invention can increase the throughput of the substrate (S) because the substrate chuck (12) and the lower container (21) are raised simultaneously. Conventionally, the lower container (21) is raised first, and then the lower container (21) is raised together with the substrate chuck (12) secondarily. However, the substrate processing device (100) of the present invention controls the first and second bellows (36, 46) separately, so that the first and second expansion units (30, 40) can be operated simultaneously. When the first and second expansion units (30, 40) are operated simultaneously, the time required for a unit process in the present invention is shortened compared to the conventional process. Specifically, the process time required for a unit process is reduced from 17 seconds in the conventional process to 11 seconds in the present invention. When the process time is reduced, the throughput of the substrate (S) in a unit time is significantly increased.

[0031] Above, the present invention has been described in detail with reference to preferred embodiments, but the present invention is not limited to the above embodiments, and various modifications are possible by a person having ordinary skill in the art within the scope of the technical idea of ​​the present invention.

[0032] *Explanation of symbols

[0033] 10; Chamber 11; Showerhead

[0034] 12; substrate chuck 13; lift pin

[0035] 14; Entrance 15; Gate

[0036] 20; inner container 21; lower container

[0037] 22; joint 23; upper container

[0038] 30, 40; first and second expansion joints

[0039] 31, 41; Guides 1 and 2

[0040] 32, 42; first and second driving units

[0041] 33, 43; first and second linear actuators

[0042] 34, 44; first and second frames

[0043] 35, 45; first and second driving units

[0044] 36, 46; first and second bellows

[0045] 37, 47; first and second brackets

[0046] 38; spine support 48; container support

Claims

1. An inner container built into the interior of the chamber and consisting of an upper container and a lower container; A substrate chuck installed inside the above inner container; A first expansion member, which is disposed at the lower portion of the inner container and includes a first driving member that moves the substrate chuck up and down using a first bellows; and A second expansion member is disposed at the lower portion of the inner container and includes a second driving member that moves the lower container up and down using a second bellows, A substrate processing device using a double bellows linear actuator, characterized in that the first expansion portion and the second expansion portion are arranged separately.

2. A substrate processing device using a double bellows linear actuator, characterized in that in the first paragraph, the first expansion portion and the second expansion portion operate simultaneously.

3. A substrate processing device using a double bellows linear actuator, characterized in that in the first paragraph, the first expansion portion and the second expansion portion include a movable portion that reciprocates linearly along a guide.

4. A substrate processing device using a double bellows linear actuator, characterized in that in the third paragraph, the movable part includes a frame that moves in conjunction with each other.

5. A substrate processing device using a double bellows linear actuator, characterized in that in the first paragraph, the first driving unit and the second driving unit are formed of precision motors.

6. A substrate processing device using a double bellows linear actuator, characterized in that in the third paragraph, the movable part is made of an electromagnet or a permanent magnet, and the first driving part and the second driving part are made of permanent magnets or electromagnets.

Images