Clean room facility
The cleanroom facility's innovative chambered design with a single supply and exhaust duct system addresses layout restrictions, reducing duct counts and costs while maintaining airtightness and preventing gas recirculation.
Patent Information
- Application Number
- PCT/JP2024/001524
- Authority / Receiving Office
- WO · WO
- Patent Type
- Applications
- Current Assignee / Owner
- Filing Date
- 2024-01-19
- Publication Date
- 2025-07-24
AI Technical Summary
Existing cleanroom facilities face limitations in layout flexibility due to the presence of numerous ducts in the ceiling space, restricting the arrangement of equipment and increasing spatial restrictions and construction costs.
The cleanroom facility design includes a first chamber above the ceiling for air supply and a second chamber below for exhaust, with a single supply duct and exhaust duct, allowing for reduced duct count and increased layout freedom, and an all-exhaust system to prevent air recirculation, enhancing airtightness and maintenance.
This design reduces spatial restrictions, lowers construction costs, improves airtightness, and prevents the recirculation of gases, ensuring efficient and flexible cleanroom operation.
Smart Images

Figure JP2024001524_24072025_PF_FP_ABST
Abstract
Description
Clean Room Facility
[0001] The present disclosure relates to clean room facilities.
[0002] Clean rooms with high levels of air purity are used in regenerative medicine, pharmaceutical manufacturing, etc. For example, Patent Document 1 describes a configuration of such clean rooms that includes "a HEPA filter that finally purifies the supply air sent from the main supply air duct through the branch supply air duct."
[0003] Patent No. 7046642
[0004] In the technology described in Patent Document 1, a main air supply duct and branch air supply ducts are installed above the ceiling of the clean room. As a result, a large number of ducts are installed in the limited space above the ceiling, which limits the layout when arranging equipment such as air supply fans and exhaust fans. As such, the technology described in Patent Document 1 has room for improvement in terms of ensuring layout freedom.
[0005] Therefore, an object of the present disclosure is to provide a clean room facility with a high degree of freedom in layout.
[0006] In order to solve the above-mentioned problems, the clean room facility of the present disclosure comprises an air conditioner, at least one clean room, a first chamber provided above the ceiling of the clean room, an air supply duct that guides air blown out from the air conditioner to the first chamber, an air supply fan that supplies air from the first chamber to the clean room, an exhaust duct through which air exhausted from the clean room flows, and a first exhaust fan provided downstream of the exhaust duct, and the air exhausted from the clean room flows through the exhaust duct without returning to the air conditioner.
[0007] According to the present disclosure, a clean room facility with a high degree of freedom in layout can be provided.
[0008] 4A . An explanatory diagram of a clean room facility according to the first embodiment. An explanatory diagram of a clean room facility according to a first modified example of the first embodiment. An explanatory diagram of a clean room facility according to a second modified example of the first embodiment. A plan view showing the floor plan of a clean room facility according to a second modified example of the first embodiment. A schematic side cross-sectional view of the clean room facility according to the second modified example of the first embodiment, taken along line III-III in FIG. 4A . An explanatory diagram of a clean room facility according to a first modified example of the second embodiment. An explanatory diagram of a clean room facility according to a second modified example of the second embodiment. A plan view showing the floor plan of a clean room facility according to a third modified example of the second embodiment. An explanatory diagram of a clean room facility according to a fourth modified example of the second embodiment. An explanatory diagram of a clean room facility according to the third embodiment. An explanatory diagram of a clean room facility according to the fourth embodiment. An explanatory diagram of a clean room facility according to a first modified example of the fourth embodiment. An explanatory diagram of a clean room facility according to a second modified example of the fourth embodiment. An explanatory diagram of a clean room facility according to a combination of the third and fourth embodiments. An explanatory diagram of a clean room facility according to the first reference embodiment. An explanatory diagram of a clean room facility according to the second reference embodiment. An explanatory diagram of a clean room facility according to the third reference embodiment. An explanatory diagram of a clean room facility according to a comparative example.
[0009] First Embodiment Configuration of Clean Room Facility Fig. 1 is an explanatory diagram of a clean room facility 100 according to a first embodiment. The clean room facility 100 is a facility for adjusting the temperature, room pressure, cleanliness, etc. of a clean room R1. In such a clean room facility 100, for example, organic solvents, DNA, RNA, and radioactive materials are handled, and cell culture processing and the production of sterile preparations (vaccines, injections, eye drops, etc.) are carried out.
[0010] 1, the clean room facility 100 includes an air conditioner 10, an air supply duct D1, an air supply damper 2, a first chamber C1, air supply-side fan filter units 31 and 32, and a clean room R1. In addition to the components described above, the clean room facility 100 also includes an exhaust-side fan filter unit 41, a second chamber C2, an exhaust duct D2, an exhaust damper 5, and an exhaust fan 6 (first exhaust fan).
[0011] The air conditioner 10 is a device that adjusts the temperature, humidity, etc. of air taken in through the air intake member E1. For example, an air handling unit or a package air conditioner is used as this air conditioner 10. As shown in Fig. 1, the air conditioner 10 includes a filter 11, a heat exchanger 12, and a fan 13.
[0012] The filter 11, which collects dust particles from the air flowing toward the heat exchanger 12, is located upstream of the heat exchanger 12 in the airflow direction. Heat exchange occurs between the air that has passed through the filter 11 and the refrigerant flowing through the heat transfer tube (not shown) of the heat exchanger 12. The heat exchanger 12 may be, for example, a cooling coil, or may be one that can switch between cooling and heating, or one that cools and dehumidifies before heating. Note that multiple heat exchangers may be provided, or a humidifier (not shown) may be separately provided. The fan 13 is a blower that sends the air that has exchanged heat in the heat exchanger 12 into the first chamber C1 via the air supply duct D1.
[0013] The air supply duct D1 is an air conduit for guiding air blown out from the air conditioner 10 to the first chamber C1. In the example of FIG. 1 , the downstream end of the air supply duct D1 is connected to an opening (not shown) in the side panel C1c of the first chamber C1. This allows for more space in the ceiling of the clean room R1 than when the air supply duct D1 is connected to an opening in the top panel C1b of the first chamber C1. Furthermore, even when the air supply duct D1 is connected to an opening in the top panel C1b, fewer ducts are required, resulting in more space and easier installation.
[0014] An intake air damper 2 is also installed in the intake air duct D1. The intake air damper 2 is set to a predetermined opening degree during a test run of the air conditioner 10 and is maintained at the predetermined opening degree during subsequent air conditioning operation. The first chamber C1 is a space provided above the ceiling of the clean room R1. As shown in FIG. 1 , the first chamber C1 is formed by a ceiling plate C1a, an upper plate C1b, and side plates C1c and C1d. The ceiling plate C1a is a plate that forms the ceiling of the clean room R1 and is arranged horizontally. The upper plate C1b is higher than the ceiling plate C1a and is arranged approximately parallel to the ceiling plate C1a. The side plates C1c and C1d are plates that connect the edge of the upper plate C1b to the edge of the ceiling plate C1a and extend in the vertical direction. The side plate C1d extends downward from the top plate C1b to the floor of the clean room R1, since it is used to form the second chamber C2 in addition to the first chamber C1.
[0015] The air supply side fan filter units 31, 32 are devices that supply air from the first chamber C1 to the clean room R1, and are fitted into openings (reference numerals not shown) in the ceiling panel C1a. As shown in Figure 1, the air supply side fan filter unit 31 includes an air supply fan 31a and a filter 31b. The air supply fan 31a is a blower that supplies air from the first chamber C1 to the clean room R1.
[0016] The filter 31b is provided on the outlet side of the air supply fan 31a and serves to capture dust particles from the air flowing from the first chamber C1 to the clean room R1. For example, a HEPA (High Efficiency Particulate Air Filter) or a ULPA (Ultra Low Penetration Air Filter) is used as the filter 31b. The other fan filter unit 32 has a similar configuration.
[0017] The clean room R1 is a room where sample preparation and the like are carried out. Examples of such "samples" include, but are not limited to, organic solvents, DNA, RNA, radioactive materials, cells, and sterile preparations. Furthermore, the use of the clean room R1 is not limited to a preparation room, but may also be a pre-treatment room, an operation room, a synthesis room, a manufacturing room, a changing room, an airlock, and the like. The clean room R1 is used as a positive pressure room or a negative pressure room.
[0018] For example, when an organic solvent used in vaccine production evaporates into a gas, the gas molecules may pass through a high-performance air filter such as a HEPA or ULPA filter. Therefore, in the first embodiment, the air supplied to the clean room R1 from the air conditioner 10 is exhausted through the second chamber C2 without being returned to the air conditioner 10 (i.e., an all-fresh exhaust system is adopted). This prevents gases such as organic solvents used in the clean room R1 from returning to the clean room R1 through the first chamber C1 or flowing into other rooms.
[0019] The second chamber C2 is a space adjacent to the clean room R1. In the example of FIG. 1, the second chamber C2 is formed by side plates C1d and W1, a floor, and a top plate C1b. The side plate C1d separates the clean room R1 from the second chamber C2. The other side plate W1 forms the outer surface of the second chamber C2 and is disposed parallel to the side plate C1d. These side plates C1d and W1 extend vertically from the floor of the second chamber C2 to the top plate C1b. The top plate C1b extends horizontally to form the top surfaces of the first chamber C1 and the second chamber C2.
[0020] The first chamber C1 and the second chamber C2 are separated by a side plate C1d (first partition plate). By separating the first chamber C1 and the second chamber C2 in this manner, it is possible to prevent the gaseous organic solvent or the like exhausted from the clean room R1 to the second chamber C2 from returning to the clean room R1 via the first chamber C1 or flowing into other rooms.
[0021] The first chamber C1 and the second chamber C2 have their upper surfaces at the same height (the height of the upper plate C1b). The upper portion of the second chamber C2 is positioned adjacent to the first chamber C1. This allows the upper plate C1b and the side plate C1d to be shared when forming the first chamber C1 and the second chamber C2. It is also possible to form the first chamber C1 and the second chamber C2 using part of the structure of the clean room facility 100. In the example shown in FIG. 1, the upper surface of the second chamber C2 is at the same height as the upper plate C1b, but it may also be at the same height as the ceiling plate C1a or at another specified height. As described below, if a damper 9 (see FIG. 2) is provided on the side plate C1d separating the first chamber C1 and the second chamber C2, it is preferable that the upper surface of the second chamber C2 be at the same height as the upper plate C1b. It is also possible to arrange the second chamber C2 so that the upper portion thereof is not adjacent to the first chamber C1.
[0022] The exhaust-side fan filter unit 41, which exhausts air from the clean room R1 to the second chamber C2, is fitted into an opening (not shown) in the side panel C1d. As shown in FIG. 1 , the exhaust-side fan filter unit 41 includes an exhaust fan 41a (second exhaust fan) and a filter 41b. The exhaust fan 41a is a blower that exhausts air from the clean room R1 and is located in the second chamber C2. The filter 41b is located on the intake side of the exhaust fan 41a and captures dust from the air flowing from the clean room R1 to the second chamber C2. Furthermore, by locating the exhaust fan 41a below the clean room R1, air within the clean room R1 flows from above to below. This allows air to circulate throughout the clean room R1, creating an optimal environment.
[0023] The exhaust duct D2 is an air duct through which air exhausted from the clean room R1 flows. The upstream end of the exhaust duct D2 is inserted into an opening in the side panel W2. The downstream end of the exhaust duct D2 is connected to the suction side of the exhaust fan 6. Air is guided from the clean room R1 to the exhaust fan 6 via the second chamber C2 and the exhaust duct D2 in that order. As described above, the air exhausted from the clean room R1 flows through the exhaust duct D2 without returning to the air conditioner 10. More specifically, the air exhausted from the clean room R1 passes through the second chamber C2 before flowing through the exhaust duct D2.
[0024] An exhaust damper 5 is installed in the exhaust duct D2. The exhaust damper 5 has the function of adjusting the chamber pressure in the second chamber C2 by adjusting the opening degree thereof. The exhaust fan 6 is a fan for exhausting the air flowing through the exhaust duct D2, and is installed downstream of the exhaust duct D2. For example, a sirocco fan is used as this exhaust fan 6.
[0025] The equipment including the fan filter units 31, 32, and 41 may be controlled by a single control device (not shown), or multiple control devices (not shown) may be provided corresponding to each of them.
[0026] 1, the clean room R1 is provided with a temperature sensor 71 and a pressure sensor 72. The air conditioner 10 is controlled so that the value detected by the temperature sensor 71 (room temperature) approaches a predetermined target temperature. The rotation speed of the exhaust fan 41a of the fan filter unit 41 is adjusted so that the value detected by the pressure sensor 72 (room pressure) approaches a predetermined target pressure.
[0027] Furthermore, if the pressure in the second chamber C2 fluctuates, this may affect the pressure in the clean room R1, so a pressure sensor 73 may also be provided in the second chamber C2. At least one of the opening of the exhaust damper 5 and the rotation speed of the exhaust fan 6 is adjusted so that the detected value of the pressure sensor 72 approaches a predetermined target pressure.
[0028] <Comparative Example> Fig. 17 is an explanatory diagram of a clean room facility 100Z according to a comparative example. Note that the comparative example of Fig. 17 does not include the first chamber C1 (see Fig. 1), and the downstream end of the air supply duct D1 is connected to the filter unit 37. Furthermore, the comparative example of Fig. 17 does not include the second chamber C2 (see Fig. 1), and the upstream end of the exhaust duct D2 is connected to the filter unit 44.
[0029] In this configuration, the air supply duct D1 is installed above the ceiling of the clean room R1, which increases spatial constraints when installing the exhaust duct D2 above the ceiling. Since the same number of air supply ducts as the number of filter units on the air supply side are required, the greater the number of filter units on the air supply side, the greater the spatial constraints. Furthermore, spatial constraints also arise when installing equipment such as a local exhaust unit (not shown) in the clean room R1, which reduces the degree of freedom in layout when installing the equipment.
[0030] In contrast, in the first embodiment, as shown in FIG. 1 , air is supplied to the first chamber C1 above the ceiling via an air supply duct D1. Therefore, even if there are multiple fan filter units on the air supply side (fan filter units 31 and 32 in the example of FIG. 1 ), only one air supply duct D1 is required. Furthermore, in the first embodiment, air is exhausted from the clean room R1 through the second chamber C2. Therefore, even if there are multiple fan filter units on the exhaust side (fan filter unit 41 in the example of FIG. 1 ), only one exhaust duct D2 is required. As a result, fewer ducts are required in the space above the ceiling of the clean room R1, reducing the labor and cost required for duct installation. Furthermore, this provides greater flexibility in installing equipment such as air supply fans, exhaust fans, and local exhaust units (not shown). Furthermore, because duct installation is difficult and can affect airtightness depending on the skill of the technician, reducing the number of ducts improves airtightness.
[0031] 17 (duct system), when forming the first chamber C1 (see FIG. 1) and the second chamber C2 (see FIG. 1) in the first embodiment, minute gaps are sealed with a sealant after assembling multiple panels, which not only improves the airtightness of the clean room facility 100 but also makes it easier to maintain the equipment.
[0032] Furthermore, in the first embodiment, the air in the clean room R1 is configured not to be returned to the air conditioner 10. In other words, a total exhaust system is adopted in which all of the air in the clean room R1 is exhausted. Therefore, even if a gaseous organic solvent or the like that permeates a high-performance filter is used in the clean room R1, the organic solvent or the like exhausted from the clean room R1 can be prevented from returning to the clean room R1 via the first chamber C1 or flowing into other rooms.
[0033] <<First Modification of First Embodiment>> Fig. 2 is an explanatory diagram of a clean room facility 100A according to a first modification of the first embodiment. As shown in Fig. 2, a damper 9 may be provided on a side plate C1d (first partition plate) that separates the first chamber C1 and the second chamber C2. The damper 9 switches between communication between the first chamber C1 and the second chamber C2 and blocking communication therebetween. As such a damper 9, for example, a non-leak damper (airtight damper) that is highly airtight in a closed state may be used.
[0034] During normal operation when the air conditioner 10, the fan filter units 31, 32, 41, and the exhaust fan 6 are running, the damper 9 is maintained in a closed state, thereby preventing the gaseous solvent (e.g., organic solvent) that has flowed from the clean room R1 into the second chamber C2 from returning to the clean room R1 via the first chamber C1 or from flowing into other rooms.
[0035] On the other hand, when sterilizing the clean room R1, the air conditioner 10 and exhaust fan 6 are kept stopped, and the intake air damper 2 and exhaust damper 5 are kept closed. A sterilization gas generator (not shown) that generates a predetermined sterilization gas (hydrogen peroxide gas, etc.) is also installed in the clean room R1. Alternatively, the sterilization gas generator may be located outside the clean room R1, and the sterilization gas may be supplied to the clean room R1 from this sterilization gas generator via a hose.
[0036] Then, while the damper 9 is maintained in an open state, the air supply-side fan filter units 31, 32 and the air exhaust-side fan filter unit 41 are driven. This allows the sterilizing gas to circulate from the clean room R1 through the second chamber C2 and the first chamber C1 in sequence. As a result, not only can the clean room R1 be sterilized, but the filters of the air supply-side fan filter units 31, 32 and the air exhaust-side fan filter unit 41 can also be sterilized. Furthermore, there is no need to separately provide a circulator (not shown) for circulating air, which contributes to cost reduction.
[0037] Second Modification of First Embodiment Figure 3 is an explanatory diagram of a clean room facility 100B according to a second modification of the first embodiment. In the second modification shown in Figure 3, a first chamber C3 is provided as a common space above the ceiling of multiple clean rooms R2 and R3. Air supply-side fan filter units 33 and 34 are provided above the ceiling of the clean room R2. Similarly, air supply-side fan filter units 35 and 36 are also provided above the ceiling of the other clean room R3.
[0038] A second chamber C4 is provided adjacent to the clean rooms R2 and R3 as a common space. The second chamber C4 is provided with exhaust-side fan filter units 42 and 43. One fan filter unit 42 is a device that exhausts air from the clean room R2. The other fan filter unit 43 is a device that exhausts air from another clean room R3.
[0039] The air supplied from the air conditioner 10 to each of the clean rooms R2 and R3 via the first chamber C3 merges in the second chamber C4, and the merged air flows toward the exhaust fan 6 via the exhaust duct D2. In other words, air exhausted from multiple clean rooms R2 and R3 flows through the second chamber C4. This configuration prevents, for example, solvent gas generated in one clean room R2 from flowing into the other clean room R3 when the exhaust fan 6 is operating. This allows different types of solvents to be used in the clean rooms R2 and R3. Furthermore, because the first chamber C1 and the second chamber C2 are shared between the clean rooms R2 and R3, the number of ducts in the ceiling space can be reduced, increasing layout flexibility.
[0040] 3 is not a cross-sectional view of the clean room facility 100B, but is an explanatory diagram of the air flow. In reality, the two clean rooms R2 and R3 are adjacent to each other, as shown in the next Figure 4A.
[0041] 4A is a plan view showing the layout of the clean room facility 100B. As shown in FIG. 4A, two clean rooms R2 and R3 are adjacent to each other, separated by a side panel W2. Each of the two clean rooms R2 and R3 is adjacent to a second chamber C4 via a side panel W3. The area of the clean rooms R2 and R3 projected upward defines the area of the first chamber C3 (see FIG. 3) in a plan view.
[0042] 3, the exhaust duct D2 appears to penetrate the upper plate C3b of the first chamber C3, but in reality, the exhaust duct D2 is appropriately installed so as not to penetrate the upper plate C3b. For example, the exhaust duct D2 (see FIG. 3) may be inserted into an opening in a side plate W4 (see FIGS. 4A and 4B) that forms the outer surface of the second chamber C2.
[0043] Fig. 4B is a schematic cross-sectional side view taken along line III-III in Fig. 4A. As shown in Fig. 4B, the second chamber C4 is provided in the vertical range from the floor surface to the upper plate C3b of the first chamber C3. The upper part of the second chamber C4 is adjacent to the first chamber C3 via the side plate W3.
[0044] The number of clean rooms that share the first chamber C3 and the second chamber C4 is not limited to two and may be three or more. Furthermore, the clean rooms R2 and R3 do not necessarily have to be adjacent to each other and may be separated from each other.
[0045] Alternatively, a second chamber (not shown) into which air from the clean room R2 flows and another second chamber (not shown) into which air from the clean room R3 flows may be separated by a partition (not shown). In this case, air exhausted from the clean rooms R2 and R3 via the respective second chambers (not shown) joins together, and an exhaust duct (not shown) is provided so that the joined air flows toward the exhaust fan 6.
[0046] Second Embodiment In the second embodiment, the second chamber C2 (see FIG. 1) described in the first embodiment is not provided, and an exhaust duct D2 (see FIG. 5) is connected to an exhaust-side filter unit 44 (see FIG. 5). Note that other points are the same as in the first embodiment. Therefore, only the points that differ from the first embodiment will be described, and a description of the overlapping points will be omitted.
[0047] 5 is an explanatory diagram of a clean room facility 100C according to a second embodiment. As shown in FIG. 5, the clean room facility 100C includes an air conditioner 10, an air supply duct D1, an air supply damper 2, a first chamber C5, air supply-side fan filter units 31 and 32, and a clean room R5. In addition to the components described above, the clean room facility 100C also includes an exhaust-side filter unit 44, an exhaust duct D2, an exhaust damper 5, and an exhaust fan 6.
[0048] The exhaust-side filter unit 44, which exhausts air from the clean room R5, is fitted into an opening (not shown) in the side panel W1. As shown in FIG. 5 , the filter unit 44 includes a filter 44a. This filter 44a may be a HEPA or ULPA filter, a prefilter, or a medium-performance filter. The filter 44a may also be omitted. The upstream end of the exhaust duct D2 is connected to the outlet side of the filter 44a. Air exhausted from the clean room R5 flows through the exhaust duct D2 without returning to the air conditioner 10. The room pressure in the clean room R5 is adjusted by adjusting at least one of the opening of the exhaust damper 5 and the rotational speed of the exhaust fan 6.
[0049] According to the second embodiment, air from the air conditioner 10 is supplied to the first chamber C5 via the air supply duct D1. Therefore, even when multiple clean rooms are provided, only one air supply duct D1 is required, reducing the number of ducts required above the ceiling of the clean rooms and increasing layout flexibility. Furthermore, since there is no need to provide the second chamber C2 (see FIG. 1 ) as in the first embodiment, there is no need to adjust the pressure in the second chamber C2. Therefore, compared to the first embodiment, the process of room pressure control can be simplified.
[0050] <<First Modification of Second Embodiment>> FIG. 6 is an explanatory diagram of a clean room facility 100D according to a first modification of the second embodiment. As shown in FIG. 6 , a local exhaust unit 8 may be provided in the clean room R5. The local exhaust unit 8 is a device for exhausting harmful gases and volatile harmful substances. For example, a draft chamber (also called a fume hood) is used as such a local exhaust unit 8. Although not shown, the draft chamber includes a housing, a transparent plate provided in the housing, and an exhaust port for exhausting air from the interior space of the transparent plate. It should be noted that a person can insert and remove their hands from the interior space of the transparent plate while handling a predetermined sample.
[0051] The exhaust duct D8 shown in Fig. 6 is an air guide pipe for guiding air from the local exhaust unit 8 to the exhaust fan 6. As shown in Fig. 6, the exhaust duct D8 is provided with an exhaust damper 52. The upstream end of the exhaust duct D8 is inserted into the exhaust port of the local exhaust unit 8. The downstream end of the exhaust duct D8 is connected to the downstream side of the exhaust damper 51 in another exhaust duct D2. A predetermined filter (not shown) may be provided downstream of the local exhaust unit 8.
[0052] Second Modification of Second Embodiment FIG. 7 is an explanatory diagram of a clean room facility 100E according to a second modification of the second embodiment. In the example of FIG. 7 , a first chamber C6 is provided as a common space above the ceiling of two clean rooms R6 and R7. A local exhaust unit 8 is also provided in the clean room R6. An exhaust duct D8 shown in FIG. 7 is an air guide pipe for guiding air from the local exhaust unit 8 to the exhaust fan 6. The exhaust duct D6 is connected to the outlet side of the exhaust-side filter unit 46. Similarly, another exhaust duct D7 is connected to the outlet side of the filter unit 47. The downstream ends of these exhaust ducts D6 and D7 are connected to a predetermined location of the exhaust duct D8. The air flowing through the exhaust ducts D6 and D7 merges at the exhaust duct D8.
[0053] 7, exhaust duct D8 is provided with an exhaust damper 51 upstream of the connection points with other exhaust ducts D6 and D7, and another exhaust damper 5 is provided downstream of the connection points (at the junction pipe). Exhaust duct D6 is also provided with an exhaust damper 52. Another exhaust duct D7 is also provided with an exhaust damper 53. There is no particular need to provide a space between the clean rooms R6 and R7 for the filter unit 46 and exhaust duct D6, and although not shown in the floor plan, the clean rooms R6 and R7 are adjacent to each other.
[0054] <<Third Modification of Second Embodiment>> Figure 8 is a plan view showing the layout of a clean room facility 100F according to a third modification of the second embodiment. The air supply duct D11 shown in Figure 8 is an air conduit for guiding air from an air conditioner (not shown) to the first chamber C8. Clean air is then supplied from the first chamber C8 to the clean rooms R81 and R82 (first clean rooms). In other words, the first chamber C8 is provided as a common space above the ceiling of the "first zone," which is the area where the clean rooms R81 and R82 (first clean rooms) are located. These clean rooms R81 and R82 may be, for example, a designated work room and an adjacent annex room. It is assumed that the clean rooms R81 and R82 share the same type of solvent or the same type of work.
[0055] The air supply duct D12 shown in FIG. 8 is an air conduit for directing air from an air conditioner (not shown) to another first chamber C9. Clean air is then supplied from the first chamber C9 to the clean rooms R91 and R92 (second clean rooms). In other words, another first chamber C9 is provided as a common space above the ceiling of the "second zone," which is the area where the clean rooms R91 and R92 (second clean rooms) are located. These clean rooms R91 and R92 may be, for example, a designated work room and an adjacent annex room. The clean rooms R91 and R92 share the same type of solvent or work content (although this may be different from the first zone).
[0056] As shown in Figure 8, a first chamber C1 corresponding to the "first zone" and another first chamber C9 corresponding to the "second zone" are separated by a partition plate W20 (second partition plate). In this way, the first chambers C8 and C9 are separated according to the "first zone" and "second zone," which differ in the type of solvent and the type of work. This prevents, for example, gaseous solvent used in clean room R81 of the "first zone" from flowing into clean room R91 of the "second zone."
[0057] The lower configuration of the first chambers C8 and C9 is the same as that shown in Fig. 5. The air in each of the clean rooms R81, R82, R91, and R92 is individually exhausted by a filter unit (not shown) on the exhaust side.
[0058] Fourth Modification of the Second Embodiment FIG. 9 is an explanatory diagram of a clean room facility 100G according to a fourth modification of the second embodiment. In the fourth modification of FIG. 9 , a duct shaft DS1 is provided adjacent to the clean room R10. The duct shaft DS1 is an air guide tube that guides air flowing out of the clean room R10 to an exhaust duct D2 and extends vertically. The lower end of the duct shaft DS1 is higher than the floor of the clean room R10. The filter 48 shown in FIG. 9 captures dust from the air flowing from the clean room R10 toward the duct shaft DS1 and is fitted near the lower end of the duct shaft DS1. For example, a Saran Net filter or a Filedon filter may be used as such a filter 48. The exhaust duct D2 is connected near the upper end of the duct shaft DS1 (i.e., the downstream end of the air flow).
[0059] As shown in Figure 9, the upper end of a side panel W10 is connected to a predetermined location on the top panel C10b of the first chamber C10. This side panel W10 extends vertically and forms the first chamber C10, the clean room R10, and the duct shaft DS1. The height position of the lower end of the side panel W10 is higher than the height position of the floor of the clean room R10. The other side panel W11 extends vertically from the floor of the clean room R10 to the top panel C10b. This side panel W11 forms the side surface of the duct shaft DS1 and also forms part of the side surface of the clean room R10.
[0060] Air supplied from the first chamber C10 to the clean room R10 flows into the duct shaft DS1 through the filter 48 and then flows through the exhaust duct D2 toward the exhaust fan 6. This configuration allows the duct shaft DS1 to be formed using the top plate C10b and side plates W10 and W11 of the first chamber C10 and the clean room R10, thereby reducing material costs. It also makes it possible to form the duct shaft DS1 using part of the framework of the clean room facility 100G.
[0061] Third Embodiment The third embodiment differs from the first embodiment in that the first chamber C11 (see FIG. 10) and the second chambers C21 and C22 (see FIG. 10) are connected to each other. The remaining features are the same as those of the first embodiment. Therefore, only the differences from the first embodiment will be described, and a description of the overlapping features will be omitted.
[0062] FIG. 10 is an explanatory diagram of a clean room facility 100H according to a third embodiment. As shown in FIG. 10, the clean room facility 100H includes an air conditioner 10, an air supply duct D1, an air supply damper 2, a first chamber C11, second chambers C21 and C22, and air supply-side fan filter units 33 to 35. In addition to the components described above, the clean room facility 100 also includes clean rooms R11 and R12, exhaust-side fan filter units 41 and 42, an exhaust duct D2, an exhaust damper 5, and an exhaust fan 6. It is assumed that the types of solvents used and the types of work performed are the same in the clean rooms R11 and R12.
[0063] The first chamber C11 is provided as a single common space above the ceiling of the clean rooms R11 and R12. Air supply fan filter units 33 and 34 are provided above the ceiling of one of the clean rooms R11. Similarly, an air supply fan filter unit 35 is provided above the ceiling of the other clean room R12. Air supplied from the air conditioner 10 via the air supply duct D1 is supplied to each of the clean rooms R11 and R12 via the first chamber C11.
[0064] The second chamber C21 is a space for allowing air flowing out of the clean room R11 to rise toward the first chamber C11, and is adjacent to the clean room R11. The same applies to the second chamber C22 provided corresponding to the other clean room R12. The second chambers C21 and C22 may be provided separately, or may be provided integrally, similar to the second chamber C4 in FIG. 4A. In this way, the second chambers C21 and C22 are provided adjacent to the multiple clean rooms R11 and R12.
[0065] 10, the exhaust-side fan filter unit 41 includes an exhaust fan 41a (second exhaust fan) and a filter 41b. The exhaust fan 41a is a device that exhausts air from the clean room R11 and is provided in the second chamber C21. The filter 41b is a device that collects dust from the air flowing from the clean room R11 to the second chamber C21 and is provided on the suction side of the exhaust fan 41a. The other fan filter unit 42 has a similar configuration.
[0066] As shown in FIG. 10 , the first chamber C11 and the second chambers C21 and C22 are connected to each other. That is, a portion of the air rising through each of the second chambers C21 and C22 is returned to the clean rooms R11 and R12 via the first chamber C11, and the remaining air is exhausted via the exhaust duct D2. That is, the air exhausted from the clean rooms R11 and R12 flows through the second chambers C21 and C22 without returning to the air conditioner 10 and then flows through the exhaust duct D2. As described above, the clean rooms R11 and R12 share the same type of solvent and the same work content. Therefore, for example, even if a gaseous solvent used in the clean room R11 flows into the other clean room R12 via the second chamber C21 and the first chamber C11 in sequence, there is no particular risk of any problems.
[0067] The method of adjusting the pressure in the clean rooms R11 and R12 and the method of adjusting the pressure in the second chambers C21 and C22 are the same as in the first embodiment, and therefore a description thereof will be omitted.
[0068] According to the third embodiment, since the first chamber C11 and the second chambers C21 and C22 are connected to each other, the highly clean air flowing out from the clean rooms R11 and R12 can be reused. Therefore, the air volume of the air conditioner 10 and the like can be reduced, thereby reducing the amount of power consumed in the clean room facility 100H.
[0069] Fourth Embodiment The fourth embodiment differs from the third embodiment in that the first chamber and the second chamber are separated in a plurality of clean rooms R13, R14 (see FIG. 11 ). The remaining features are the same as those of the third embodiment. Therefore, only the differences from the third embodiment will be described, and a description of the overlapping features will be omitted.
[0070] FIG. 11 is an explanatory diagram of a clean room facility 100K according to a fourth embodiment. As shown in FIG. 11, the clean room facility 100K includes an air conditioner 10, intake ducts D11 and D12, intake dampers 21 and 22, first chambers C13 and C14, second chambers C23 and C24, and intake-side fan filter units 31-33. In addition to the components described above, the clean room facility 100 also includes clean rooms R13 and R14, exhaust-side fan filter units 41 and 42, exhaust ducts D21 and D22, exhaust dampers 51 and 52, and an exhaust fan 6. Note that the types of solvents or the types of work performed may differ between the clean rooms R13 and R14.
[0071] The air supply duct D11 is an air guide pipe that guides air blown out from the air conditioner 10 to the first chamber C13. An air supply damper 21 is installed at a predetermined location of the air supply duct D11. The other air supply duct D12 is an air guide pipe that guides air blown out from the air conditioner 10 to the first chamber C14 and is connected to the air supply duct D11. An air supply damper 22 is installed at a predetermined location of the air supply duct D12. Note that the air supply duct D12 does not necessarily have to be installed on the ceiling surface of the first chamber C14; it may be installed on, for example, a side wall of the first chamber C14. In this case, fewer ducts need to be installed in the space above the ceiling of the clean room, thereby reducing the labor and costs required for duct installation.
[0072] Furthermore, a plurality of first chambers C13, C14 are provided corresponding to the plurality of clean rooms R13, R14. Specifically, a first chamber C13 is provided above the ceiling of the clean room R13. Another first chamber C14 is provided above the ceiling of the clean room R14. The first chambers C13, C14 are adjacent to each other and are separated from each other by a side panel W30 (third partition panel).
[0073] Additionally, a plurality of second chambers C23, C24 are provided adjacent to the respective clean rooms R13, R14 in correspondence with the plurality of clean rooms R13, R14. Specifically, the second chamber C23 is provided adjacent to the clean room R13. Another second chamber C24 is provided adjacent to the clean room R14. These second chambers C23, C24 are also partitioned from each other.
[0074] The exhaust-side fan filter unit 41 includes an exhaust fan 41a (second exhaust fan) and a filter 41b. The exhaust fan 41a is a device that exhausts air from the clean room R13 and is individually installed in the second chamber C23. The filter 41b is a device that collects dust from the air flowing from the clean room R13 to the second chamber C21 and is installed on the suction side of the exhaust fan 41a. The other fan filter unit 42 installed in the second chamber C24 has a similar configuration.
[0075] 11 , the first chamber C13 and the second chamber C23 provided for the clean room R13 are in communication with each other. Similarly, the first chamber C14 and the second chamber C24 provided for the clean room R14 are in communication with each other. In other words, among the multiple first chambers C13, C14 and the multiple second chambers C23, C24, those that correspond to a common clean room are in communication with each other to form a "common chamber." Furthermore, the "common chamber" corresponding to the clean room R13 and the "common chamber" corresponding to another clean room R13 are adjacent to each other and are separated by a side panel W30 (third partition panel).
[0076] A portion of the air that flows out from the clean room R13 to the second chamber C23 is guided to the exhaust fan 6 via the exhaust duct D21, and the remaining air is returned to the clean room R13 via the first chamber C13. The same applies to the air flow through the other clean room R14. The air exhausted from the clean rooms R13 and R14 flows through the exhaust ducts D21 and D22 without returning to the air conditioner 10.
[0077] The "third partition plate" separating the two "common chambers" may be formed by extending the side plate W30 of the specified clean room R14 upward. In other words, the side plate W30 may be extended in the height direction to a position higher than the ceiling of the clean room R14 (the position of the upper plate C1b). This prevents minute gaps from forming at the bottom end of the "third partition plate" separating the two "common chambers." In other words, it prevents the two "common chambers" from communicating with each other via minute gaps. The connection between the side plate W30 and the upper plate C1b is sealed with a sealant such as a silicone seal.
[0078] 11 is a duct that guides air from a first chamber C13 to the exhaust fan 6. The other exhaust duct D22 is a duct that guides air from another first chamber C14 to the exhaust fan 6. The air flowing through the exhaust ducts D21 and D22 joins together, and the joined air flows toward the exhaust fan 6.
[0079] In the example of Fig. 11, the upstream end of exhaust duct D21 is inserted into an opening (reference numeral not shown) in the upper plate C1b of the first chamber C13. Similarly, the upstream end of exhaust duct D22 is inserted into an opening in the upper plate C1b of the first chamber C14. Note that the arrangement of exhaust ducts D21 and D22 shown in Fig. 11 is just an example, and as will be described later, the arrangement may be changed as appropriate (see Figs. 12A and 12B).
[0080] Furthermore, a predetermined plate member (not shown) may be provided to narrow the flow path between the first chamber C13 and the second chamber 23 while communicating the first chamber C13 and the second chamber 23. For example, a predetermined plate member (not shown) may be disposed so as to extend upward from the ceiling board of the clean room R13. Alternatively, a predetermined plate member (not shown) may be disposed so as to extend downward from the upper board C1b of the clean room R13. This makes it possible to reduce the amount of gaseous solvent circulated while reusing clean air flowing out of the clean room R13.
[0081] The method of adjusting the chamber pressures of the clean rooms R13 and R14 and the two "common chambers" is the same as in the first embodiment, and therefore a description thereof will be omitted.
[0082] According to the fourth embodiment, the "common chamber" is separated for each of the clean rooms R13 and R14, which use different types of solvents and perform different tasks. This prevents, for example, gaseous solvents used in the clean room R13 from flowing into the other clean room R14. Furthermore, for example, a portion of the clean air flowing out of the clean room R13 can be reused, which reduces the number of ventilation cycles per unit time for the clean room R13 while maintaining the clean room R13 in a clean state (the same applies to the other clean room R14).
[0083] First Modification of the Fourth Embodiment FIG. 12A is an explanatory diagram of a clean room facility 100L according to a first modification of the fourth embodiment. As shown in FIG. 12A , the upstream end of the exhaust duct D22 may be connected near the exhaust-side fan filter unit 42. Specifically, the upstream end of the exhaust duct D22 may be connected to the side panel W24 forming the outer surface of the second chamber C24 near a region including the intersection with the rotation axis of the exhaust fan 42a. The same applies to the connection position of the upstream end of the other exhaust duct D21. This allows, for example, most of the air blown out from the exhaust fan 42a to be exhausted through the exhaust duct D22. As a result, it is possible to prevent air supplied to a "common chamber" including the first chamber C14 and the second chamber C24 from being exhausted through the exhaust duct D22 without being supplied to the clean room R14.
[0084] <<Second Modification of Fourth Embodiment>> Fig. 12B is an explanatory diagram of a clean room facility 100M according to a second modification of the fourth embodiment. As shown in Fig. 12B, the upstream end of the exhaust duct D21 may be disposed in the internal space of the second chamber C23. This allows most of the air blown out from the fan filter unit 41 to be exhausted through the exhaust duct D21, thereby reducing the amount of gaseous solvent circulated when returning to the clean room R13. The exhaust duct D21 may be disposed so as to penetrate the upper plate C1b of the first chamber C13, or may be disposed so as to penetrate a predetermined side plate (not shown) (the same applies to the other exhaust duct D22).
[0085] The exhaust ducts D21 and D22 may be fixed near their upstream ends with a predetermined fixing member (not shown).The exhaust duct D21 may be fixed near its upstream end in contact with the wall surface of the second chamber 23 (the same applies to the other exhaust duct D22).
[0086] <Combination of Third and Fourth Embodiments> Figure 13 is an explanatory diagram of a clean room facility 100N relating to a combination of the third and fourth embodiments. The clean room facility 100N shown in Figure 13 is configured to include a clean room unit U1 having a configuration similar to that of the third embodiment (see Figure 10) and a clean room unit U2 having a configuration similar to that of the fourth embodiment (see Figure 11). In the example of Figure 13, the two clean room units U1 and U2 are separated from each other, but they may also be adjacent to each other.
[0087] In the clean room unit U1, the first chamber C11 is connected to the second chambers C21 and C22. Note that the types of solvents and the operations used in the clean rooms R11 and R12 are the same, so there is no particular problem even if, for example, the gaseous solvent used in the clean room R11 flows into the clean room R12.
[0088] In the other clean room unit U2, a "common chamber" (first chamber C13 and second chamber C23) corresponding to clean room R13 and a "common chamber" (first chamber C14 and second chamber C24) corresponding to clean room R14 are separated by a side panel W30. Note that the types of solvents and work contents used in clean rooms R13 and R14 may be different. As described above, because the two "common chambers" are separated by the side panel W30, it is possible to prevent, for example, gaseous solvents used in clean room R13 from flowing into clean room R14.
[0089] First Reference Embodiment The first reference embodiment differs from the first embodiment (see FIG. 1) in that a first chamber is not specifically provided above the ceiling of the clean room R1 (see FIG. 14). That is, the first reference embodiment differs from the first embodiment in that air is directly guided from the air conditioner 10 (see FIG. 14) to the filter unit 37 (see FIG. 14) via the air supply duct D1 (see FIG. 14). Note that the rest of the configuration is the same as the first embodiment. Therefore, only the differences from the first embodiment will be described, and a description of the overlapping portions will be omitted.
[0090] 14 is an explanatory diagram of a clean room facility 100P according to the first embodiment. As shown in FIG. 14, the clean room facility 100P includes an air conditioner 10, an intake duct D1, an intake damper 2, an intake-side filter unit 37, and a clean room R1. In addition to the components described above, the clean room facility 100 also includes an exhaust-side fan filter unit 41, a second chamber C2, an exhaust duct D2, an exhaust damper 5, and an exhaust fan 6.
[0091] As shown in Figure 14, the downstream end of the air supply duct D1 is connected to an air supply-side filter unit 37. The filter unit 37 is fitted into an opening in the ceiling board C1a of the clean room R1. Air from the air conditioner 10 is supplied to the clean room R1 via the air supply duct D1 through the filter unit 37. An exhaust-side fan filter unit 41 is provided in the second chamber C2 adjacent to the clean room R1. Air is sent from the clean room R1 to the exhaust fan 6 via the second chamber C2 and the exhaust duct D2 in this order.
[0092] The method for adjusting the chamber pressure in the clean room R1 and the method for adjusting the pressure in the second chamber C2 are the same as those in the first embodiment, and therefore a description thereof will be omitted.
[0093] According to the first reference embodiment, the clean room R1 is configured as a total exhaust system in which all of the air in the clean room R1 is exhausted, so that even if a gaseous solvent is used in the clean room R1, it is possible to prevent a portion of the solvent exhausted from the clean room R1 from returning to the clean room R1 or flowing into other rooms.
[0094] <<Second Referential Embodiment>> Figure 15 is an explanatory diagram of a clean room facility 100Q according to a second referential embodiment. In the example of Figure 15, an air supply fan filter unit 32 is provided above the ceiling of clean room R2. Similarly, an air supply fan filter unit 33 is also provided above the ceiling of the other clean room R3. In addition, the downstream side of air supply duct D1 branches into two, one downstream end connected to filter unit 38 and the other downstream end connected to another filter unit 39.
[0095] As shown in Figure 15, a common second chamber C4 is provided adjacent to two clean rooms R2 and R3. The second chamber C4 is provided with exhaust-side fan filter units 42 and 43. One fan filter unit 42 is a device for exhausting air from the clean room R2. The other fan filter unit 43 is a device for exhausting air from another clean room R3. The two clean rooms R2 and R3 may be adjacent to each other via a side panel.
[0096] According to the second embodiment, only one exhaust duct D2 is required compared to the two exhaust-side fan filter units 42, 43. This reduces the effort and cost required to install the exhaust duct D2.
[0097] <<Third Reference Embodiment>> Fig. 16 is an explanatory diagram of a clean room facility 100R according to a third reference embodiment. As shown in Fig. 16, the clean room facility 100R includes an air conditioner 10, an air supply duct D1, an air supply damper 2, a first chamber C1, air supply-side fan filter units 31 and 32, a clean room R1, and an exhaust-side filter unit 44. The clean room R1 is also provided with a temperature sensor 71 and a pressure sensor 72.
[0098] The first chamber C1 is a space above the ceiling of the clean room R1. When multiple clean rooms are installed, the first chamber may be installed as a single common space above the ceilings of these clean rooms, or the above-the-ceiling space may be partitioned as appropriate. As the fan filter units 31 and 32 are driven, air from the air conditioner 10 is supplied to the clean room R1. The air in the clean room R1 is exhausted through the filter unit 44 without returning to the air conditioner 10.
[0099] According to the third embodiment, air is supplied to the first chamber C1 above the ceiling via the air supply duct D1. This allows for only one air supply duct D1, reducing the labor and costs required for duct construction. Furthermore, there is no need to install an exhaust duct or exhaust fan downstream of the filter unit 44, simplifying the configuration and reducing construction costs. Furthermore, because the clean room R1 is configured as a total exhaust system in which all air is exhausted, gaseous organic solvents that pass through high-performance filters can be handled in the clean room R1.
[0100] Other Modifications The clean room facility 100 and the like according to the present disclosure have been described above in the embodiments and the reference embodiments, but are not limited to these descriptions and various modifications can be made. For example, in the first embodiment, the number of clean rooms is described as one (see FIG. 1 ) or two (see FIG. 3 ), but the number of clean rooms can be changed as appropriate. That is, at least one clean room may be provided. The same can be said for the second to fourth embodiments and the first and second reference embodiments.
[0101] Furthermore, in the second embodiment (see FIG. 8 ), the number of "first clean rooms" (clean rooms R81 and R82) provided in the "first zone" and the number of "second clean rooms" (clean rooms R91 and R92) provided in the "second zone" are two, but this is not limited to the above. That is, the clean rooms may include at least one "first clean room" and at least one "second clean room." In this case, a first chamber is provided as a common space above the ceiling of the "first zone," which is the area where at least one "first clean room" exists. Furthermore, another first chamber is provided as a common space above the ceiling of the "second zone," which is the area where at least one "second clean room" exists. Even with this configuration, the same effects as those of the second embodiment can be achieved. Furthermore, the above-described configuration can also be applied to the first, third, and fourth embodiments and the first and second reference embodiments.
[0102] Furthermore, in the first embodiment, the following control may be performed. That is, the exhaust fan 6 may continue to be driven even when the air conditioning operation or room pressure control for the clean room R1 (see FIG. 1) is temporarily stopped. That is, the exhaust fan 6 (first exhaust fan) may continue to be driven even when the air conditioner 10, the air supply fans 31a and 32a, and the exhaust fan 41a (second exhaust fan) are stopped. In this case, the exhaust damper 5 is maintained in an open state. This prevents gaseous solvent remaining in the second chamber C2 from flowing into the clean room R1 while the air conditioning operation or the like is stopped. The same applies to the second to fourth embodiments and the first and second reference embodiments.
[0103] In the first embodiment, the fan filter units 31 and 32 (see FIG. 1) on the air supply side are described as having fans, but these fans may be omitted as appropriate. The same applies to the second to fourth embodiments. In the second embodiment (see FIG. 5), the filter unit 44 is provided on the exhaust side of the clean room R4. Instead, a fan filter unit having an exhaust fan may be provided. The same applies to the third embodiment (see FIG. 16). In the first embodiment, the fan filter unit 41 (see FIG. 1) on the exhaust side is described as having a filter 41b. However, the filter 41b may be omitted, and a filter (not shown) may be provided in the exhaust duct D2. The same applies to the second to fourth embodiments and the first and second embodiments.
[0104] In the first embodiment, the second chamber C2 (see FIG. 1) is described as being provided in a range from the floor surface to the upper plate C1b in the vertical direction, but this is not limiting. For example, the height position of the second chamber C2 may be lower than the upper plate C1b. In the first embodiment, the exhaust fan 41a may be omitted from the exhaust-side fan filter unit 41 (see FIG. 1) as appropriate. The same applies to the second embodiment and the first and second reference embodiments.
[0105] In the first embodiment, the pressure in the second chamber C2 (see FIG. 1) is adjusted. However, the pressure in the first chamber C1 may be adjusted instead of the pressure in the second chamber C2. In this case, at least one of the opening degree of the exhaust damper 5, the rotation speed of the exhaust fan 6, and the rotation speed of the fan 13 of the air conditioner 10 is adjusted so that the detected pressure value in the first chamber C1 approaches a predetermined target value. This suppresses pressure fluctuations in the first chamber C1, making it easier to maintain the pressure in the clean room R1 at the predetermined target value.
[0106] In addition, in the second embodiment, a case where the local exhaust unit 8 (see FIG. 6) is installed in the clean room R5 (see FIG. 6) has been described, but this configuration can also be applied to the first, third, and fourth embodiments and the first and second reference embodiments.
[0107] In the fourth embodiment, the "partition plate" separating the two common chambers is formed by extending the side plate W30 of the clean room R14 upward, but this is not limiting. That is, the "partition plate" separating the two common chambers may be a separate member from the side plate W30. In this case, the gap at the connection point of the "partition plate" may be sealed with a sealant.
[0108] Furthermore, the respective embodiments can be combined as appropriate. For example, the first embodiment and the second embodiment can be combined so that the clean room R1 of the clean room facility 100A (first embodiment) shown in FIG. 1 and the clean room R5 of the clean room facility 100C (second embodiment) shown in FIG. 5 are adjacent to each other. In this case, air is supplied from the air conditioner 10 to the clean rooms R1 and R5 via the supply air duct D1, and air is exhausted from the clean rooms R1 and R5 via the exhaust duct D2. Various other combinations are possible, such as a combination of the first embodiment with the third embodiment, a combination of the first embodiment with the fourth embodiment, or a combination of the second embodiment with the third embodiment. Furthermore, the first to fourth embodiments, the first reference embodiment, and the second reference embodiment can be combined with clean room facilities of known configurations.
[0109] In the first embodiment, the clean room R1 is used as a positive pressure room, but depending on the application, the clean room R1 may be used as a negative pressure room. The same applies to the second to fourth embodiments and the first and second reference embodiments.
[0110] In addition, although each embodiment has been described with reference to cases where the clean room facility 100 is used for cell culture processing or pharmaceutical manufacturing, the present invention is not limited to this. For example, each embodiment can be applied to various fields such as the manufacturing of semiconductors, precision machinery, and liquid crystal panels, the food industry, the cosmetics industry, and experiments using radioactive materials.
[0111] Furthermore, each embodiment has been described in detail to clearly explain the present disclosure, and is not necessarily limited to having all of the described configurations. Furthermore, some of the configurations of the embodiments can be added to, deleted from, or replaced with other configurations. For example, the local exhaust unit 8 shown in FIG. 6 according to the first modification of the second embodiment may be added to the clean room facility 100 according to the first or third embodiment. Furthermore, the above-described mechanisms and configurations are those considered necessary for explanation, and do not necessarily represent all of the mechanisms and configurations of the product.
[0112] DESCRIPTION OF SYMBOLS 2, 21, 22 Air intake damper 5, 51, 52 Exhaust damper 6 Exhaust fan (first exhaust fan) 8 Local exhaust unit 9 Damper 10 Air conditioner 31a, 32a Air intake fan 41a Exhaust fan (second exhaust fan) 71 Temperature sensor 72, 73 Pressure sensor 100, 100A, 100B, 100C, 100D, 100E, 100F, 100G, 100H, 100K, 100L, 100M, 100N, 100P, 100Q, 100R Clean room facility C1, C3, C5, C10, C11 First chamber C13, C14 First chamber (common chamber) C1d Side panel (first partition plate) C2, C4, C21, C22 Second chamber C23, C24 Second chamber (common chamber) D1, D11, D12 Air supply duct D2, D21, D22 Exhaust duct R1, R2, R3, R5, R10, R11, R12, R13, R14 Clean room R81, R82 Clean room (first clean room, first zone) R91, R92 Clean room (second clean room, second zone) W20 Partition plate (second partition plate) W30 Side plate (third partition plate)
Claims
1. An air conditioner, at least one clean room, a first chamber provided above the ceiling of the clean room, an air supply duct for guiding the air blown out from the air conditioner to the first chamber, an air supply fan for supplying air from the first chamber to the clean room, an exhaust duct through which the air exhausted from the clean room flows, and a first exhaust fan provided on the downstream side of the exhaust duct, wherein the air exhausted from the clean room flows through the exhaust duct without returning to the air conditioner, a clean room facility.
2. The clean room facility according to claim 1, further comprising a second chamber provided adjacent to the clean room, and a first partition plate for partitioning the first chamber and the second chamber, wherein the air exhausted from the clean room flows through the exhaust duct after passing through the second chamber.
3. The clean room facility according to claim 2, further comprising a damper provided on the first partition plate for switching the communication or cutoff between the first chamber and the second chamber.
4. The clean room facility according to claim 2, wherein a plurality of clean rooms are provided, the first chamber is provided as a common space above the ceilings of the plurality of clean rooms, the second chamber is provided as a common space adjacent to the plurality of clean rooms, and the air exhausted from the plurality of clean rooms flows through the second chamber.
5. The clean room facility according to claim 1, further comprising a second exhaust fan for exhausting air from the clean room, and the upstream end of the exhaust duct is connected to the blowing side of the second exhaust fan.
6. The clean room includes at least one first clean room and at least one second clean room. The first chamber is provided as a common space above the ceiling of the first zone, which is the area where at least one of the first clean rooms exists. Another first chamber is provided as a common space above the ceiling of the second zone, which is the area where at least one of the second clean rooms exists. The first chamber corresponding to the first zone and another first chamber corresponding to the second zone are partitioned by a second partition plate. The clean room facility according to claim 1, characterized in that.
7. A plurality of the clean rooms are provided. The first chamber is provided as a common space above the ceilings of the plurality of clean rooms. A second chamber is provided adjacent to the plurality of clean rooms. A second exhaust fan is provided in the second chamber for exhausting air from the clean rooms. The first chamber and the second chamber are in communication with each other. The air exhausted from the plurality of clean rooms flows through the second chamber. The clean room facility according to claim 1, characterized in that.
8. A plurality of the clean rooms are provided. A plurality of the first chambers are provided corresponding to the plurality of clean rooms. A plurality of second chambers are provided adjacent to the respective clean rooms corresponding to the plurality of clean rooms. A second exhaust fan is provided individually in the plurality of second chambers for exhausting air from the clean rooms. Among the plurality of the first chambers and the plurality of the second chambers, those corresponding to a common clean room form a common chamber communicating with each other. Among the plurality of the common chambers adjacent to each other, they are partitioned from each other by a third partition plate. The clean room facility according to claim 1, characterized in that.
9. The third partition plate is formed by extending the side plate of a predetermined clean room upward. The clean room facility according to claim 8, characterized in that.
10. The first exhaust fan continues to be driven even when the air conditioner and the supply air fan are stopped. The clean room facility according to claim 1, characterized in that.
Citation Information
Patent Citations
Clean room and method for adjusting exhaust volume of clean room
JP7046642B2
Clean room facility
JP2000356379A
Clean room facility and method of operating the same
JP2010133566A
Air conditioning system for clean room
JP2017048940A
Air handling system for clean room
US20120190287A1