Substrate information acquisition device and substrate processing device including same
By employing an asymmetric pattern and a moving mechanism, the device overcomes the challenge of reflected light interference, ensuring accurate substrate information acquisition and improved transportation efficiency.
Patent Information
- Application Number
- PCT/JP2024/043564
- Authority / Receiving Office
- WO · WO
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2024-01-18
- Filing Date
- 2024-12-10
- Publication Date
- 2025-07-24
AI Technical Summary
Conventional substrate information acquisition devices struggle to accurately acquire information due to the influence of reflected light on substrate surfaces, particularly when there is warpage, leading to difficulties in distinguishing the boundary between the substrate and background, which can hinder substrate transportation.
The device incorporates a pattern that is asymmetric in the vertical direction with respect to the substrate surface, allowing the photographing unit to capture images that are less affected by reflected light, and includes a moving mechanism to adjust the photographing position, ensuring accurate acquisition of substrate information.
This configuration enables precise acquisition of substrate information by clearly delineating the boundary between the substrate and background, enhancing the accuracy of substrate positioning and transportation processes.
Smart Images

Figure JP2024043564_24072025_PF_FP_ABST
Abstract
Description
Substrate information acquisition device and substrate processing apparatus equipped with the same
[0001] The present invention relates to a substrate information acquisition device that acquires substrate information including the position of a substrate such as a semiconductor substrate, a substrate for an FPD (Flat Panel Display) such as a substrate for a liquid crystal display or an organic EL (Electroluminescence) display device, a glass substrate for a photomask, or a substrate for an optical disk, and a substrate processing apparatus equipped with the same.
[0002] Conventionally, this type of device includes a robot arm, a substrate holding hand, an imaging unit, and a control unit (see, for example, Patent Document 1).
[0003] The substrate holding hand is attached to the tip of the robot arm. The substrate holding hand moves toward and away from the carrier that stores multiple substrates stacked and spaced apart by extending and retracting the robot arm. The substrate holding hand moves toward and away from the substrate to be transported. The photographing unit is attached to the substrate holding hand. The photographing unit photographs the multiple substrates stored in the carrier. The control unit acquires substrate information, including the vertical position where the substrates are stored and the shape of the substrate, such as warpage, based on the images taken by the photographing unit. Based on this substrate information, the control unit determines the gap between the substrates stored in the carrier, and advances the substrate holding hand into the carrier according to the gap.
[0004] Japanese Patent Application Laid-Open No. 2023-30876
[0005] However, the conventional example having such a configuration has the following problem. That is, the conventional device has a problem in that it is not possible to accurately acquire substrate information based on the image captured by the image capturing unit due to the influence of reflected light on the substrate surface, etc. For example, if the warp is located deeper than the peripheral edge of the substrate located on the imaging unit side, the boundary between the substrate and the background cannot be accurately distinguished, and therefore, substrate information cannot be accurately acquired. Therefore, the gap cannot be accurately determined, which may cause problems when transporting the substrate.
[0006] The present invention has been made in consideration of the above circumstances, and aims to provide a substrate information acquisition device that can accurately acquire substrate information by making the boundary between the substrate and the background more apparent, and a substrate processing apparatus equipped with the same.
[0007] In order to achieve the above object, the present invention has the following configuration: That is, the invention described in claim 1 is a substrate information acquisition device for acquiring substrate information, including vertical positions, of substrates stored in a container that can store a plurality of horizontally oriented substrates at a distance from each other and that can load and unload substrates through a load / unload opening formed on one side of the container, the substrate information acquisition device comprising: an image capturing unit that is arranged on the opposite side of the load / unload opening across the substrates stored in the container in a plan view, and that captures an image of the pattern from the load / unload opening side, and an information acquisition unit that acquires the substrate information of the substrates stored in the container based on an image captured by the image capturing unit.
[0008] [Operation and Effect] According to the invention described in claim 1, the photographing unit photographs the pattern from the loading / unloading port side. The pattern is asymmetrical above and below the surface of the substrate when viewed from the loading / unloading port. Therefore, if the substrate shape is not warped, the pattern will appear as is in the image in areas other than the substrate. On the other hand, if the substrate shape is warped, the pattern will not appear in the image, or will appear upside down due to the pattern being reflected by the surface of the substrate. Therefore, the image captured by the photographing unit is less susceptible to the influence of light reflected from the substrate surface, making it possible to clearly identify the boundary between the substrate and the background. As a result, substrate information can be accurately acquired based on the image captured by the photographing unit.
[0009] In addition, in the present invention, it is preferable that a moving mechanism for moving the imaging unit in the direction in which the plurality of substrates are stacked is further provided (claim 2).
[0010] The moving mechanism can move the photographing unit for each substrate, so that the photographing unit can photograph an image using a central photographing area with less distortion, thereby improving the accuracy of substrate information.
[0011] In the present invention, the pattern is preferably disposed on the outside of the outer surface of the container that faces the loading / unloading port (claim 3).
[0012] The pattern can be placed on the outside of the container, so commercially available containers can be used as they are.
[0013] In addition, in the present invention, it is preferable that the container further comprises a light source that irradiates light from outside the container toward the outer surface, and a standing member that is arranged between the light source and the container and transmits the light from the light source, and that the pattern is formed on the standing member (Claim 4).
[0014] Light from the light source is irradiated onto the standing member. This allows the pattern formed on the standing member to be positioned on the outer surface of the container, and the pattern can be photographed with the photographing unit from the loading / unloading port. This is useful when the container is made of a material that transmits the light from the light source.
[0015] In addition, in the present invention, it is preferable that an image display unit is disposed outside the container, emits light, and displays an arbitrary image on the outer surface side, and the pattern is displayed on the image display unit (claim 5).
[0016] The image displayed on the image display unit is arranged on the outer surface of the container. This allows the pattern displayed on the image display unit to be arranged on the outer surface of the container, and the pattern can be photographed by the photographing unit through the loading / unloading port. This is useful when the container is made of a material that transmits light from the light source. Furthermore, the pattern displayed on the image display unit can be easily changed. Therefore, the pattern can be easily changed to one that is suitable for making the boundary between the substrate and the background more apparent, depending on the shape of the substrate.
[0017] In addition, in the present invention, it is preferable that the photographing unit is capable of detecting infrared light and includes an infrared light source that irradiates light including infrared light from outside the container toward the outer surface, and a standing member that is arranged between the infrared light source and the container and transmits the infrared light from the infrared light source, and that the pattern is formed on the standing member (Claim 6).
[0018] Light from an infrared light source is irradiated onto the standing member. This allows the pattern formed on the standing member to be positioned on the outer surface of the container, and the pattern can be photographed by the photographing unit through the loading / unloading opening. This is useful when the container is made of a material that has low transmittance for visible light but high transmittance for infrared light. It is also suitable for obtaining substrate information for substrates on which a photosensitive coating is formed to ultraviolet light.
[0019] In addition, in the present invention, it is preferable that the photographing unit is capable of detecting infrared light and is equipped with a heating wire that irradiates light including infrared light from outside the container toward the outer surface, and that the pattern is formed by the arrangement of the heating wire (Claim 7).
[0020] Electricity is passed through the heating wire, and the pattern of the heating wire is irradiated onto the standing member. This allows the pattern formed on the standing member to be placed on the outer surface of the container, and the pattern can be photographed with the photographing unit from the loading / unloading port. This is useful when the container is made of a material that has low transmittance for visible light but high transmittance for infrared light. It is also suitable for obtaining substrate information for substrates that have a coating that is photosensitive to ultraviolet light. Furthermore, since the heating wire also serves as the light source, it is possible to achieve a thinner device.
[0021] In the present invention, the pattern is preferably disposed on an inner surface of the container facing the loading / unloading port (claim 8).
[0022] Since the pattern is placed on the inner surface of the container, it is not affected by the container material. Also, since the pattern is photographed without passing through the components of the container, the pattern can be photographed with high contrast. This improves the accuracy of the substrate information. Also, there is no need to attach a new component to the mounting table on which the container is placed. As a result, commercially available mounting tables can be used, which reduces costs.
[0023] In the present invention, it is preferable that a projection unit that projects an image from the loading / unloading port side toward the inner surface is provided, and the pattern is formed by the image of the projection unit (claim 9).
[0024] The projection unit projects an image from the loading / unloading port side onto the inner surface to form a pattern. Therefore, there is no need to attach a new component to the mounting table on which the container is placed. As a result, commercially available mounting tables can be used, which helps reduce costs.
[0025] In the present invention, it is preferable that the pattern has a linear shape inclined from the vertical direction (claim 10).
[0026] Since the pattern is simple, it can be easily formed, and the inverted pattern can be easily identified on the substrate surface.
[0027] Furthermore, in the present invention, it is preferable that the device comprises any of the substrate information acquisition devices described above, a processing unit that performs a predetermined process on the substrate, a hand that holds the substrate, a hand drive unit that drives the hand toward and away from the container and drives the hand up and down in the vertical direction to transport the substrate to be processed by the processing unit, and a control unit that operates the hand drive unit based on the substrate information acquired by the substrate information acquisition device (claim 11).
[0028] When the substrate is transported to the processing section by the hand, the control section operates the hand driving section based on the substrate information acquired by the substrate information acquisition device, so that the substrate can be transported appropriately.
[0029] According to the substrate information acquisition device of the present invention, the photographing unit photographs a pattern from the loading / unloading port side. The pattern is asymmetrical above and below the surface of the substrate when viewed from the loading / unloading port. Therefore, if the substrate shape is not warped, the pattern will appear as is in the image in areas other than the substrate. On the other hand, if the substrate shape is warped, the pattern will not appear in the image, or will appear upside down due to reflection from the surface of the substrate. Therefore, the image captured by the photographing unit is less susceptible to the influence of light reflected from the substrate surface, making it possible to clearly identify the boundary between the substrate and the background. As a result, substrate information can be accurately acquired based on the image captured by the photographing unit.
[0030] FIG. 1 is a plan view showing the overall configuration of a substrate processing apparatus according to Example 1. FIG. 2 is a view of the substrate processing apparatus of FIG. 1 as seen from the rear X. FIG. 3 is a side view showing the main parts of Example 1. FIG. 4 is a plan view showing the main parts of Example 1. FIG. 5 is a view showing details of a pattern. FIG. 6 is a schematic view showing an example of a pattern as viewed from the camera side. FIG. 6 is a plan view showing a modified example of Example 1. FIG. 7 is a side view showing the main parts of Example 2. FIG. 8 is a side view showing the main parts of Example 3. FIG. 9 is a side view showing the main parts of Example 4. FIG. 10 is a side view showing the main parts of Example 5. FIG. 11 is a side view showing the main parts of Example 6. FIG. 12 is a plan view showing the main parts of Example 6.
[0031] The invention will now be described with reference to various examples.
[0032] A first embodiment of the present invention will be described below with reference to the drawings. Fig. 1 is a plan view showing the overall configuration of a substrate processing apparatus according to the first embodiment. Fig. 2 is a view of the substrate processing apparatus of Fig. 1 as seen from the rear X.
[0033] <1. Overall structure>
[0034] The substrate processing apparatus 1 includes a loading / unloading block 3, an indexer block 5, and a processing block 7.
[0035] The substrate processing apparatus 1 processes substrates W. The substrates W have, for example, a circular shape in a plan view. The substrate processing apparatus 1 performs, for example, a cleaning process on the substrates W. The substrate processing apparatus 1 processes the substrates W in a single-wafer manner in a processing block 7. In the single-wafer manner, each substrate W is processed one by one in a horizontal position.
[0036] For convenience, in this specification, the direction in which the load-unload block 3, indexer block 5, and processing block 7 are aligned is referred to as the "front-to-back direction X." The front-to-back direction X is horizontal. Within the front-to-back direction X, the direction from the processing block 7 toward the load-unload block 3 is referred to as the "front." The direction opposite to the front is referred to as the "rear." The horizontal direction perpendicular to the front-to-back direction X is referred to as the "width direction Y." One direction in the "width direction Y" is referred to as the "right" as appropriate. The direction opposite to the right is referred to as the "left." The direction perpendicular to the horizontal direction is referred to as the "vertical direction Z." For reference, in each figure, front, rear, right, left, top, and bottom are indicated as appropriate.
[0037] <2. Loading / unloading block>
[0038] The carry-in / out block 3 includes an input section 9 and an output section 11. The input section 9 and the output section 11 are arranged in the width direction Y. A plurality of substrates W (e.g., 25 substrates) are stored in a single carrier C in a horizontal orientation, stacked at regular intervals. The carrier C storing unprocessed substrates W is placed in the input section 9. The input section 9 includes, for example, two mounting tables 13 on which the carriers C are placed. The carrier C stores the substrates W one by one, with the substrates W surfaces spaced apart. The carrier C stores the substrates W, for example, with their front surfaces facing upward. An example of a carrier C is a front-opening unify pod (FOUP). A FOUP is a sealed container. The carrier C may be of any type, and may be an open container. Depending on the material, the carrier C may have high or low visible light transmittance. Depending on the material, the carrier C may have low visible light transmittance but high infrared light transmittance.
[0039] The unloading unit 11 is disposed on the opposite side of the input unit 9 across the center of the width direction Y of the substrate processing apparatus 1. The unloading unit 11 is located to the left Y of the input unit 9. The unloading unit 11 stores processed substrates W in carriers C and unloads the carriers C. Like the input unit 9, the unloading unit 11 that functions in this manner includes, for example, two mounting tables 13 for placing the carriers C. The input unit 9 and the unloading unit 11 are also called load ports.
[0040] <3. Indexer Block>
[0041] The indexer block 5 is disposed adjacent to the rear X of the carry-in / out block 3 in the substrate processing apparatus 1. The indexer block 5 includes an indexer robot IR and a transfer unit 15.
[0042] The indexer robot IR is configured to be rotatable about a rotation axis parallel to the vertical direction Z. The indexer robot IR is configured to be movable in the width direction Y. The indexer robot IR includes a first hand 19 and a second hand 21. For illustrative purposes, only one hand is shown in FIG. 1 . The first hand 19 and the second hand 21 each hold one substrate W. The first hand 19 and the second hand 21 are configured to be independently movable forward and backward in the forward and backward direction X. The indexer robot IR moves in the width direction Y and rotates about the vertical direction Z, moving the first hand 19 and the second hand 21 forward and backward to transfer substrates W to and from each cassette C. In a similar manner, the indexer robot IR transfers substrates W to and from the transfer section 15. The direction in which the first hand 19 and the second hand 21 move when transferring substrates W to and from the carrier C is defined as the forward and backward direction FD.
[0043] The transfer section 15 is disposed on the boundary between the indexer block 5 and the processing block 7. The transfer section 15 is disposed, for example, at the center in the width direction Y. As shown in FIG. 2 , the transfer section 15 is formed long in the vertical direction Z.
[0044] The transfer section 15 includes, from bottom to top in the vertical direction Z, a first reversing unit 23 , a path section 25 , a path section 27 , and a second reversing unit 29 .
[0045] The first inversion unit 23 inverts the substrate W received from the indexer block 5 upside down. The first inversion unit 23 inverts the horizontal position of the substrate W. The second inversion unit 29 performs the reverse operation. In other words, the second inversion unit 29 inverts the substrate W received from the processing block 7 upside down.
[0046] The inversion directions of the first inversion unit 23 and the second inversion unit 29 may be opposite to each other. That is, the first inversion unit 23 changes the orientation of the substrate W so that the front surface faces upward. The second inversion unit 29 changes the orientation of the substrate W so that the back surface faces upward.
[0047] The path sections 25 and 27 are used to transfer substrates W between the indexer block 5 and the processing block 7. The path section 25 is used, for example, to transport substrates W from the processing block 7 to the indexer block 5. The path section 27 is used, for example, to transport substrates W from the indexer block 5 to the processing block 7. The transport directions of substrates W in the path sections 25 and 27 may be opposite to each other.
[0048] <4. Processing Block>
[0049] The processing block 7 performs, for example, a cleaning process on the substrate W. The cleaning process is, for example, a process using a brush in addition to a processing liquid. As shown in FIG. 1 , the processing block 7 is divided, for example, into a first row R1, a second row R2, and a third row R3 in the width direction Y. In detail, the first row R1 is disposed on the left side Y. The second row R2 is disposed in the center of the width direction Y. In other words, the second row R2 is disposed on the right side Y of the first row R1. The third row R3 is disposed on the right side Y of the second row R2.
[0050] <4-1. 1st column>
[0051] The first row R1 of the processing block 7 includes a plurality of processing sections 31. The first row R1 includes, for example, four processing sections 31. The first row R1 has the four processing sections 31 stacked in the vertical direction Z. Each processing section 31 is, for example, a cleaning unit. The cleaning unit cleans the substrate W. The cleaning units include, for example, a front surface cleaning unit that cleans the front surface of the substrate W, and a back surface cleaning unit that cleans the back surface of the substrate W.
[0052] <4-2. 2nd column>
[0053] The second row R2 of the processing block 7 is equipped with a center robot CR. The center robot CR is configured to be rotatable around a rotation axis parallel to the vertical direction Z. The center robot CR is configured to be able to move up and down in the vertical direction Z. The center robot CR is equipped with, for example, a first hand 33 and a second hand 35. The first hand 33 and the second hand 35 each hold one substrate W. The first hand 33 and the second hand 35 are configured to be able to move forward and backward independently in the front-rear direction X and the width direction Y.
[0054] <4-3. 3rd column>
[0055] The third column R3 of the processing block 7 has the same configuration as the first column R1. That is, the third column R3 includes a plurality of processing sections 31. The third column R3 includes, for example, four processing sections 31. The four processing sections 31 are stacked in the vertical direction Z in the third column R3. Each processing section 31 in the first column R1 and each processing section 31 in the third column R3 are arranged opposite each other in the width direction Y. This allows the center robot CR to access each of the opposing processing sections 31 in the first column R1 and the third column R3 at the same height in the vertical direction Z.
[0056] The processing block 7 is configured as described above. An example of the operation of the center robot CR will now be briefly described. The center robot CR receives a substrate W, for example, from the first reversal unit 23. The center robot CR transports the substrate W to one of the processing units 31 in the first row R1 or the third row R3 to process the substrate W. The center robot CR receives the substrate W that has been processed in one of the processing units 31 in the first row R1 or the third row R3. The center robot CR transports the substrate W to the second reversal unit 29.
[0057] <5. Mounting table>
[0058] As shown in FIG. 1, the loading / unloading block 3 includes a mounting table 13 and a lid opening / closing mechanism 41 .
[0059] The carrier C is placed on the mounting table 13. The carrier C has a loading / unloading opening CT. The loading / unloading opening CT is formed on one side of the carrier C. The carrier C is equipped with a lid (not shown). The lid is configured to be detachable from the loading / unloading opening CT of the carrier C. The lid seals the inside of the carrier C. When the lid is attached to the carrier C, the atmosphere outside the carrier C is isolated.
[0060] The lid opening / closing mechanism 41 removes the lid from the carrier C and attaches the lid to the carrier C. The lid opening / closing mechanism 41 can fully open the loading / unloading opening CT of the carrier C by descending while holding the lid.
[0061] <6. Control System>
[0062] Here, the control system of the substrate processing apparatus 1 will be described. The substrate processing apparatus 1 is controlled overall by a control unit CU. The control unit CU includes a control unit CU, a CPU, a memory, etc. The control unit CU operates according to a pre-stored program. The control unit CU controls the lid attachment / detachment operation by the lid opening / closing mechanism 41 and the lifting / lowering operation of the lid opening / closing mechanism 41. The control unit CU controls the indexer robot IR. Specifically, the control unit CU controls the movement of the first hand 19 and the second hand 21 of the indexer robot IR in the forward / backward direction FD, the movement of the first hand 19 and the second hand 21 in the vertical direction Z, and the rotation of the indexer robot IR about the vertical direction Z. The control unit CU controls the processing of substrates W in the processing unit 31. The control unit CU controls the center robot CR.
[0063] 7. Indexer robot and mounting table
[0064] Next, the indexer robot IR and the mounting table 13 will be described in detail with reference to Fig. 3. Fig. 3 is a side view showing the main parts of the first embodiment.
[0065] Here, the first hand 19 of the indexer robot IR will be described as an example, but the second hand 21 has a similar configuration. Note that Fig. 3 shows the carrier C with the lid removed, and the multiple grooves that abut and support the substrate W at both ends in the front X and width direction Y are omitted.
[0066] In the indexer robot IR, the hand driving unit 43 performs the lifting and lowering operations, the turning operation, and the advancing and retreating operation in the advancing and retreating direction FD of the first hand 19. The indexer robot IR is equipped with a position output unit 45. The position output unit 45 outputs position information such as height position information in the vertical direction Z, front-rear position information in the front-rear direction X, and left-right position information in the width direction Y to the control unit CU. The control unit CU operates the hand driving unit 43 based on the position information from the position output unit 45. In this way, the first hand 19 is controlled by the control unit CU.
[0067] The first hand 19 is provided with a camera 47 at its base end (rear in the forward / backward direction X). The camera 47 is sensitive to visible light. The camera 47 has, for example, a predetermined field of view. The predetermined field of view includes, for example, a single substrate W when viewed directly from the loading / unloading port CT, and includes an area above and below in the vertical direction Z that is at least the storage pitch of the substrates W in the carrier C. In other words, when viewed facing a single substrate W in the forward / backward direction FD, the field of view includes the substrate W and at least the area of the substrate W arranged adjacent to the single substrate W. The camera 47 has an imaging area in the ZY plane consisting of the vertical direction Z and the width direction Y. Note that, in the width direction Y, the field of view preferably extends at least to the inside of the grooves on both ends of the width direction Y. Furthermore, the camera 47 is preferably object-side telecentric. This reduces distortion of the photographed substrate W, thereby improving the accuracy of substrate information.
[0068] The camera 47 is connected to an information acquisition unit 49. The information acquisition unit 49 is connected to the control unit CU. The position output unit 45 is connected to the information acquisition unit 49. The information acquisition unit 49 controls the imaging conditions and imaging timing of the camera 47. The information acquisition unit 49 acquires substrate information including the position of the substrate W in the vertical direction Z based on the image output from the camera 47. How the substrate information is acquired will be described in detail below.
[0069] The mounting table 13 is equipped with a pattern 51 and a light source 53. The pattern 51 and the light source 53 are provided upright on the mounting table 13. The light source 53 emits light rearward in the front-rear direction X. The light emitted by the light source 53 includes visible light. The pattern 51 and the light source 53 are arranged in front of the carrier C in the front-rear direction X. The pattern 51 is arranged between the light source 53 and an outer surface of the carrier C on the front side in the front-rear direction X. The pattern 51 is arranged outside the outer surface of the carrier C that faces the loading / unloading port CT in the front-rear direction X. In a plan view, the pattern 51 is arranged on the opposite side of the loading / unloading port CT across the substrate W stored in the carrier C. The pattern 51 and the light source 53 are arranged at positions on the mounting table 13 so as not to interfere with the carrier C. The pattern 51 and the light source 53 are arranged slightly spaced apart in the front-rear direction X.
[0070] The light source 53 may be turned on by the control unit CU only when capturing an image FG, as will be described later, and may be turned off when not capturing an image, thereby achieving power saving.
[0071] 4 and 5 are referenced here. Fig. 4 is a plan view showing the main part of Example 1. Fig. 5 is a diagram showing the details of the pattern.
[0072] The pattern 51 includes a member body 55 and a pattern body 57. The member body 55 is made of a material that transmits light from the light source 53. The pattern body 57 is provided behind the member body 55 in the front-rear direction X. The pattern body 57 is made of a material that has low transmittance for the light from the light source 53. In other words, the pattern body 57 blocks the light from the light source 53.
[0073] The pattern body 57 has a linear shape of a predetermined width. The pattern body 57 is inclined with respect to the vertical direction Z. The pattern body 57 is inclined downward to the left with respect to the vertical direction Z. The pattern body 57 is continuous without interruption in the inclination direction. The inclination angle of the pattern body 57 is, for example, 45°. A plurality of pattern bodies 57 are formed. Each of the plurality of pattern bodies 57 is arranged at intervals. The intervals between the pattern bodies 57 are, for example, constant. When the substrate W is viewed horizontally from the loading / unloading port CT, the pattern body 57 is asymmetrical above and below with respect to the outer peripheral surface extending in the width direction Y of the substrate W, as shown by the two-dot chain line in FIG. 5 .
[0074] The camera 47 attached to the hand 19 has a photographing center C1. The photographing center C1 is the center of the lens (not shown) of the camera 47 and the center of the image output by the camera 47. The camera 47 is preferably attached to the hand 19 so that the photographing center C1 and the center cp of the substrate W coincide in the width direction Y in a planar view. This is because the photographed image is obtained through an optical system, and therefore distortion is smaller toward the center. This is because, for substrates W having deformation such as warping, the center cp of the substrate W is more important when determining the distance between them in the vertical direction Z based on substrate information. The angle of view of the camera 47 in a planar view is set so as to include both end edges in the width direction Y. In FIG. 4, the angle of view is indicated by a two-dot chain line extending from the camera 47 in the front-rear direction X.
[0075] <8. Images>
[0076] Here, reference is made to Fig. 6. Fig. 6 is a schematic diagram showing an example of a pattern viewed from the camera side.
[0077] 6 shows the pattern 51 as viewed from the loading / unloading port CT side through three substrates W. Of the three substrates W, substrate W1 has no deformation such as warpage. Substrate W2 has upward convex warpage (so-called umbrella-shaped deformation). Substrate W3 has downward convex warpage (so-called bowl-shaped deformation).
[0078] When viewed horizontally from the loading / unloading port CT through these substrates W1 to W3, only the outer peripheral surface of the undeformed substrate W1 is visible in shadow. Neither the top nor bottom surface of the unwarped substrate W1 is visible. Therefore, the pattern body 57 is visible as is at the top and bottom of the outer peripheral surface of the substrate W1. In other words, only the pattern body 57 tilted downward and to the left is visible above and below the outer peripheral surface of the substrate W1. Note that a substrate W that is shifted from the imaging center C1 will be imaged obliquely even if there is no deformation in the substrate W itself. As a result, the pattern body 57 is inverted.
[0079] For substrate W2 with a convex deformation on the top, its outer peripheral surface appears as a shadow. Furthermore, for substrate W2 with a convex deformation on the top, an inverted image 61, which is upside down from the pattern body 57, is visible above the shadow of the outer peripheral surface. In other words, for substrate W2 with a convex deformation on the top, an inverted image 61 is visible above the shadow of the outer peripheral surface. The inverted image 61 is tilted downward to the right, opposite to the pattern body 57. The pattern body 57 located in the convex portion of substrate W2 (the pattern body 57 located in front of the convex portion of substrate W2) is not visible from the transfer port CT side. However, the pattern body 57 located above the convex portion of substrate W2 appears reflected by the convex portion. Therefore, the pattern body 57 appears as an inverted image 61 on the convex portion of substrate W2.
[0080] For substrate W3 with a convex-shaped deformation downward, its outer peripheral surface appears as a shadow. Furthermore, for substrate W3 with a convex-shaped deformation downward, an inverted image 61 is visible below the shadow of the outer peripheral surface. In other words, for substrate W3 with a convex-shaped deformation downward, an inverted image 61 is visible below the shadow of the outer peripheral surface. The inverted image 61 is inclined downward to the right, opposite to the pattern body 57. The pattern body 57 located in the convex portion of substrate W3 cannot be seen from the carry-in / outlet CT side. However, the pattern body 57 located below the convex portion of substrate W3 is reflected by the convex portion and appears to be reflected. Therefore, the pattern body 57 appears as an inverted image 61 on the convex portion of substrate W3.
[0081] When the substrate W2 is positioned at the imaging center C1, the camera 47 captures an image FG indicated by the two-dot chain line. As described above with respect to the field of view, the image FG includes, for example, one substrate W when viewed directly from the loading / unloading port CT, and also includes an area above and below in the vertical direction Z that is at least the storage pitch of the substrates W in the carrier C. However, in FIG. 6 , the two-dot chain line representing the image FG is drawn in a slightly smaller area to make it easier to recognize. The information acquisition unit 49 receives the image FG from the camera 47. The information acquisition unit 49 receives height position information from the position output unit 45. Based on the substrate W, the pattern main body 57, and the inverted image 61 in the image FG, the information acquisition unit 49 acquires substrate information such as the shape of the substrate W, such as warpage, and the spacing of the substrates W in the vertical direction Z.
[0082] <9. Obtaining board information>
[0083] The substrate information is acquired prior to processing the plurality of substrates W stored in the carrier C. That is, as shown in Fig. 3, after a lid (not shown) is removed from the carrier C, the substrate information is acquired while the indexer robot IR is moved in the vertical direction Z. Specifically, the control unit CU, for example, images the uppermost substrate W at the imaging center C1, and then moves the indexer robot IR downward in the vertical direction Z by a distance equal to the storage pitch of the substrates W in the carrier C, and acquires an image FG of each substrate W. The information acquisition unit 49 then acquires the substrate information based on the image FG and the height position information from the position output unit 45.
[0084] The substrate information acquired by the information acquisition unit 49 is used by the control unit CU. Specifically, the control unit CU operates the indexer robot IR to sequentially unload each substrate W from the carrier C. At that time, the control unit CU adjusts the height at which the first hand 19 (second hand 21) of the indexer robot IR enters the carrier C based on the substrate information. For example, when unloading the substrate W1 in Figure 6, the substrate W2 below it is warped upward in a convex shape, so the entry height of the first hand 19 (second hand 21) is set higher than the normal height based on the substrate information.
[0085] According to this embodiment, the camera 47 captures the pattern 51 from the loading / unloading port CT side. The pattern 51 is asymmetrical above and below the surface of the substrate W when viewed from the loading / unloading port CT. Therefore, if the shape of the substrate W is free of warpage or the like, the pattern is captured as is in the image FG in an area other than the substrate W. On the other hand, if the shape of the substrate W is free of warpage or the like, the pattern 51 is not captured in the image FG, or the pattern 51 is reflected by the surface of the substrate W, resulting in an inverted image 61. Therefore, the image FG captured by the camera 47 is less susceptible to the influence of light reflected from the surface of the substrate W, and the boundary between the substrate W and the background can be made apparent. As a result, the information acquisition unit 49 can accurately acquire substrate information based on the image FG captured by the camera 47.
[0086] The correspondence between the above-described first embodiment and the present invention is as follows.
[0087] The carrier C corresponds to the "container" in the present invention. The camera 47 corresponds to the "photographing unit" in the present invention. The indexer robot IR corresponds to the "moving mechanism" in the present invention. The member main body 55 corresponds to the "standing member" in the present invention. The camera 47, the information acquisition unit 49, and the pattern 51 correspond to the "substrate information acquisition device" in the present invention.
[0088] The present invention is not limited to the above-described embodiment, but can be modified as follows.
[0089] (1) In the first embodiment, the substrate processing apparatus 1 having the configuration shown in Figures 1 and 2 has been described as an example. However, the present invention is not limited to this configuration. In other words, the configuration of the indexer block 5 and the processing block 7 is not important. For example, the indexer block 5 does not need to have the first hand 19 and the second hand 21, but may have at least one hand.
[0090] (2) In the present embodiment 1, the substrate processing apparatus 1 has a built-in substrate information acquisition device of the present invention, which includes the camera 47, the information acquisition unit 49, and the pattern 51. However, the present invention is not limited to this embodiment. That is, the substrate information acquisition device may be configured as a separate device, which includes the camera 47, the information acquisition unit 49, and the pattern 51. In this case, the substrate information acquisition device acquires substrate information for each substrate W in the carrier C, transmits the substrate information to the substrate processing apparatus 1, and uses the substrate information when unloading the substrate W from the carrier C.
[0091] (3) In the first embodiment, the first hand 19 (second hand 21) is provided with one camera 47. However, the present invention is not limited to this configuration.
[0092] Here, reference is made to Fig. 7. Fig. 7 is a plan view showing a modified example of the first embodiment.
[0093] In this modification, the first hand 19 is equipped with cameras 47L and 47R. The cameras 47L and 47R have the same angle of view. This allows the use of cameras with the same specifications, thereby reducing costs. However, cameras 47L and 47R with different angles of view may be used. The camera 47R has an angle of view extending from a position beyond the right end of the substrate W in the width direction Y to the inside of the left end in the width direction Y. The camera 47L has an angle of view extending from a position beyond the left end of the substrate W in the width direction Y to the inside of the right end in the width direction Y. The information acquisition unit 49 acquires substrate information by, for example, combining images FG-R and FG-L captured by the cameras 47R and 47L. With this configuration, the angles of view of the cameras 47R and 47L can be narrower than in the above-described embodiment. Therefore, distortion of the images FG-R and FG-L can be suppressed, and improved accuracy of the substrate information can be expected.
[0094] (4) In the first embodiment, the light source 53 and the pattern 51 are disposed apart from each other in the front-rear direction X. However, in the present invention, the light source 53 and the pattern 51 may be disposed in close contact with each other. Furthermore, the size of the light source 53 and the pattern 51 may be limited to the size of the photographing area of the camera 47. In this case, the light source 53 and the pattern 51 may be moved in conjunction with the movement of the camera 47 while facing the camera 47.
[0095] Next, a second embodiment of the present invention will be described with reference to the drawings. Fig. 8 is a side view showing the main parts of the second embodiment. Note that the same components as those in the first embodiment are designated by the same reference numerals and detailed descriptions thereof will be omitted.
[0096] In this embodiment, the image display unit 71 is provided on the mounting table 13. Between the image display unit 71 and the outer surface of the carrier C, no other components are arranged.
[0097] The image display unit 71 can display any image. The image display unit 71 emits light. The image display unit 71 irradiates light toward the outer surface of the carrier C. The image display unit 71 is configured, for example, with a liquid crystal display device or an organic EL display device. The image display unit 71 displays the pattern body 57 as an image of the pattern 51 under the control of the control unit CU. As a result, the pattern 51 on the image display unit 71 is photographed by the camera 47.
[0098] According to this embodiment, it is possible to easily change the pattern 51 displayed on the image display unit 71. Therefore, in addition to the effects of the first embodiment described above, this embodiment can easily change the pattern 51 to one suitable for making the boundary between the substrate W and the background more visible, depending on the shape of the substrate W. As a result, it is possible to accurately obtain substrate information based on the captured image, regardless of the form of deformation of the substrate W.
[0099] The correspondence between the above-described second embodiment and the present invention is as follows.
[0100] The carrier C corresponds to the "container" in this invention. The camera 47 corresponds to the "photographing unit" in this invention. The indexer robot IR corresponds to the "moving mechanism" in this invention. The camera 47, the information acquisition unit 49, the pattern 51, and the image display unit 71 correspond to the "substrate information acquisition device" in this invention.
[0101] The present invention is not limited to the above-described embodiment, but can be modified as in (1) to (3) in the first embodiment.
[0102] Next, a third embodiment of the present invention will be described with reference to the drawings. Fig. 9 is a side view showing the main parts of the third embodiment. Note that the same components as those in the first embodiment are designated by the same reference numerals and detailed descriptions thereof will be omitted.
[0103] In this embodiment, a pattern 51A and a light source 53A are provided on the outer surface of the carrier C. The first hand 19 is provided with a camera 47A.
[0104] The pattern 51A and the light source 53A are provided upright on the mounting table 13. The pattern 51A and the light source 53A are disposed in front of the carrier C in the front-rear direction X. The light source 53A emits infrared light. The light source 53A mainly emits infrared light. The light emitted by the light source 53A may include visible light. In the pattern 51A, the pattern body 57A is opaque to infrared light. The member body 55A is transparent to infrared light. In other words, the pattern body 57A has low transmittance to infrared light, and the member body 55A has high transmittance to infrared light. The pattern body 57A is similar to the above-described pattern body 57 except for its opaque property to infrared light. The member body 55A is similar to the above-described body member 55 except for its transparent property to infrared light.
[0105] The camera 47A is capable of detecting infrared light and has high sensitivity to infrared light, and captures an image FG of the pattern body 57A of the pattern 51A.
[0106] This embodiment is useful when the carrier C is made of a material that has low transmittance for visible light but high transmittance for infrared light, and is also suitable for obtaining substrate information for a substrate W on which a coating that is photosensitive to ultraviolet light is formed.
[0107] The correspondence between the above-described third embodiment and the present invention is as follows.
[0108] The carrier C corresponds to the "container" in this invention. The camera 47A corresponds to the "photographing unit" in this invention. The indexer robot IR corresponds to the "moving mechanism" in this invention. The member main body 55A corresponds to the "standing member" in this invention. The light source 53A corresponds to the "infrared light source" in this invention. The camera 47A, the information acquisition unit 49, the pattern 51A, and the light source 53A correspond to the "substrate information acquisition device" in this invention. The pattern main body 57A corresponds to the "pattern" in this invention.
[0109] The present invention is not limited to the above-described embodiment, but can be modified as in (1) to (4) in the first embodiment.
[0110] Next, a fourth embodiment of the present invention will be described with reference to the drawings. Fig. 10 is a side view showing the main parts of the fourth embodiment. Note that the same components as those in the first embodiment are designated by the same reference numerals, and detailed descriptions thereof will be omitted.
[0111] In this embodiment, a pattern 51B is provided on the outer surface of the carrier C. The first hand 19 is equipped with a camera 47A.
[0112] The pattern 51B includes a heating wire 73. The heating wire 73 constitutes an inclined pattern body 57B similar to the pattern body 57 in the above-described first embodiment. When a current is applied to the heating wire 73, the heating wire 73 generates heat and radiates infrared light.
[0113] The camera 47A is capable of detecting infrared light and has high sensitivity to infrared light, and captures an image FG of the pattern body 57B of the pattern 51B.
[0114] This embodiment is useful when the carrier C is made of a material that has low transmittance for visible light but high transmittance for infrared light. It is also suitable for obtaining substrate information for a substrate W on which a coating that is photosensitive to ultraviolet light is formed. Furthermore, since the heating wire 73 also serves as a light source, a thinner device can be achieved.
[0115] The correspondence between the above-described fourth embodiment and the present invention is as follows.
[0116] The carrier C corresponds to the "container" in this invention. The camera 47A corresponds to the "photographing unit" in this invention. The indexer robot IR corresponds to the "moving mechanism" in this invention. The camera 47A, the information acquisition unit 49, the pattern 51B, and the heating wire 73 correspond to the "substrate information acquisition device" in this invention. The heating wire 73 corresponds to the "pattern" in this invention.
[0117] The present invention is not limited to the above-described embodiment, but can be modified as in (1) to (3) in the first embodiment.
[0118] Next, a fifth embodiment of the present invention will be described with reference to the drawings. Fig. 11 is a side view showing the main parts of the fifth embodiment. Note that the same components as those in the first embodiment are designated by the same reference numerals and detailed descriptions thereof will be omitted.
[0119] In this embodiment, a pattern 51C is provided on the inner surface of the carrier C. The pattern 51C is erected along the inner surface facing the loading / unloading port CT of the carrier C in the front-rear direction X. The pattern 51C is attached before the substrate W is stored in the carrier C. In a plan view, the pattern 51C is arranged on the opposite side of the loading / unloading port CT, sandwiching the substrate W stored in the carrier C. The pattern 51C includes a pattern body 57C. The pattern body 57C has the same configuration as the pattern body 51 of the first embodiment described above. The pattern body 57C is arranged behind the pattern 51 in the front-rear direction X.
[0120] The first hand 19 is equipped with a camera 47. An irradiation light source 75 is disposed above the camera 47. The irradiation light source 75 irradiates the pattern 51C with light. The irradiation light source 75 illuminates the pattern 51C with an illuminance that allows the camera 47 to capture the pattern body 57C as an image FG. The irradiation light source 75 is preferably operated by the control unit CU so that it irradiates in accordance with the timing of the image capture by the camera 47. This allows for power saving.
[0121] According to this embodiment, the pattern 51C is disposed on the inner surface of the carrier C, and is therefore not affected by the material of the carrier C. Furthermore, the pattern 51C is photographed without passing through the carrier C, and therefore the pattern 51C can be photographed with high contrast. This improves the accuracy of the substrate information.
[0122] The correspondence between the above-described fifth embodiment and the present invention is as follows.
[0123] The carrier C corresponds to the "container" in this invention. The camera 47 corresponds to the "photographing unit" in this invention. The indexer robot IR corresponds to the "moving mechanism" in this invention. The camera 47, the information acquisition unit 49, and the pattern 51C correspond to the "substrate information acquisition device" in this invention. The pattern main body 57C corresponds to the "pattern" in this invention.
[0124] The present invention is not limited to the above-described embodiment, but can be modified as in (1) to (3) in the first embodiment.
[0125] Next, a sixth embodiment of the present invention will be described with reference to the drawings. Fig. 12 is a side view showing the main parts of the sixth embodiment. Fig. 13 is a plan view showing the main parts of the sixth embodiment. Note that the same components as those of the first embodiment are designated by the same reference numerals, and detailed description thereof will be omitted.
[0126] In this embodiment, the first hand 19 is equipped with a camera 47 and a projection unit 77. The camera 47 photographs the inner surface of the carrier C facing the carrier C's loading / unloading port CT in the front-rear direction X. The photographing center C1 of the camera 47 does not coincide with the center cp of the substrate W in the width direction Y. The camera 47 is located to the left of the center cp of the substrate W in the width direction Y. The projection unit 77 is located to the right of the center cp of the substrate W in the width direction Y.
[0127] The projection unit 77 projects an image. The projection unit 77 projects an image onto the inner surface of the carrier C. The projection unit 77 projects a pattern 51D as an image. The pattern 51D is projected into at least the space above and below the substrate W that is the subject of image capture by the camera 47. The space above and below includes the space between the lower surface of the substrate W that is positioned above the substrate W that is the subject of image capture, and the space between the upper surface of the substrate W that is positioned below the substrate W that is the subject of image capture. The pattern 51D includes a pattern body (not shown), similar to the first embodiment described above.
[0128] The correspondence between the above-described sixth embodiment and the present invention is as follows.
[0129] The carrier C corresponds to the "container" in the present invention. The camera 47 corresponds to the "photographing unit" in the present invention. The indexer robot IR corresponds to the "moving mechanism" in the present invention. The camera 47D, the information acquisition unit 49, and the projection unit 77 correspond to the "substrate information acquisition device" in the present invention.
[0130] The present invention is not limited to the above-described embodiment, but can be modified as in (1) to (3) in the first embodiment.
[0131] The present invention is not limited to the above-described embodiment, but can be modified as follows.
[0132] (1) In each of the above-described Examples 1 to 6, the substrate W is described as having a circular shape in a plan view, but the present invention is not limited to such a substrate W. For example, the substrate W may be rectangular in a plan view. In addition, the substrate W has been described as having an umbrella-like or bowl-like warp. However, the present invention is also applicable to acquiring substrate information for a substrate W that is three-dimensionally deformed due to other warpage, such as a half-pipe-like warp.
[0133] (2) In each of the above-described embodiments 1 to 6, the movement mechanism is configured as the indexer robot IR. However, a configuration may be adopted in which a movement mechanism separate from the indexer robot IR is provided to move an image capturing unit such as the camera 47 in the vertical direction Z.
[0134] (3) In each of the above-described Examples 1 to 6, the camera 47 moves only in the vertical direction Z. However, the present invention is not limited to this configuration. In other words, if the camera 47 has a narrow angle of view and can only capture a portion of the center of the substrate W, the camera 47 may be moved in the width direction Y to capture multiple images of one substrate W, which are then combined to obtain a single image FG.
[0135] (4) In each of the above-described Examples 1 to 6, the pattern is inclined in the vertical direction Z and exhibits a continuous linear shape with a predetermined width. However, the present invention is not limited to such a shape. That is, it may be a discontinuous linear shape with a dotted line. Furthermore, any pattern may be used as long as it has an asymmetrical shape above and below the surface of the substrate when viewed horizontally from the loading / unloading port CT side. Furthermore, the inclination angle of the pattern main body 57 is not limited to 45°. Furthermore, the spacing between the pattern main bodies 57 is not limited to a fixed spacing.
[0136] (5) In each of the above-described Examples 1 to 6, a camera 47 having a field of view in the vertical direction Z is used as the imaging unit. However, the present invention is not limited to this configuration. For example, a line sensor having a field of view only in the width direction Y may be used as the imaging unit. In this case, the line sensor may be moved in the vertical direction Z to acquire one image FG.
[0137] (6) In each of the above-described Examples 1 to 6, the camera 47, which is the imaging unit, is assumed to be object-side telecentric. However, the present invention is not limited to this configuration. In other words, the camera 47 may be object-side non-telecentric. However, distortion occurs in the image FG in areas other than the imaging center. Therefore, it is preferable to acquire board information using only the image FG near the imaging center. Furthermore, conversion processing may be performed on the areas other than the imaging center of the image FG to acquire board information.
[0138] W... substrate 1... substrate processing apparatus 3... load / unload block 5... indexer block 7... processing block X... front-rear direction Y... width direction Z... vertical direction C... carrier 13... placement table IR... indexer robot 19... first hand 21... second hand FD... forward / backward direction 31... processing unit CR... center robot CT... load / unload port 43... hand drive unit 45... position output unit 47... camera 49... information acquisition unit 51... pattern 53... light source 55... member body 57... pattern body C1... photographing center cp... center of substrate 61... inverted image FG... image
Claims
1. A container capable of storing a plurality of substrates in a horizontal posture with a space therebetween and allowing the substrates to be carried in and out through a carry-in / out port formed on one side surface, and a substrate information acquisition device for acquiring substrate information including the vertical position of the substrates stored in the container. In the substrate information acquisition device, it is disposed on the opposite side of the carry-in / out port across the substrates stored in the container in a plan view, and has an asymmetrical pattern in the vertical direction with respect to the plane of the substrates as viewed from the carry-in / out port. It further includes a photographing unit for photographing the pattern from the carry-in / out port side, and an information acquisition unit for acquiring the substrate information about the substrates stored in the container based on the image photographed by the photographing unit. The substrate information acquisition device is characterized by comprising these components.
2. The substrate information acquisition device according to claim 1, further comprising a moving mechanism for moving the photographing unit in the direction in which the plurality of substrates are stacked.
3. The substrate information acquisition device according to claim 1, wherein the pattern is disposed outside the outer surface of the container facing the carry-in / out port.
4. The substrate information acquisition device according to claim 3, further comprising a light source for irradiating light from the outside of the container toward the outer surface, and a standing member disposed between the light source and the container and transmitting the light of the light source. The pattern is formed on the standing member.
5. The substrate information acquisition device according to claim 3, further comprising an image display unit disposed outside the container, emitting light and displaying an arbitrary image on the outer surface side. The pattern is displayed on the image display unit.
6. The substrate information acquisition device according to claim 3, wherein the photographing unit is capable of detecting infrared light, and further comprising an infrared light source for irradiating light including infrared light from the outside of the container toward the outer surface, and a standing member disposed between the infrared light source and the container and transmitting the infrared light of the infrared light source. The pattern is formed on the standing member.
7. The substrate information acquisition device according to claim 3, wherein the imaging unit is capable of detecting infrared light, and includes a heating wire that irradiates light including infrared light from the outside of the container toward the outer surface, and the pattern is formed by the arrangement of the heating wire.
8. The substrate information acquisition device according to claim 1, wherein the pattern is disposed on the inner surface of the container facing the carry-in outlet.
9. The substrate information acquisition device according to claim 1, further comprising a projection unit that projects an image from the carry-in outlet side toward the inner surface, and the pattern is formed by the image of the projection unit.
10. The substrate information acquisition device according to claim 1, wherein the pattern is linear and inclined from the vertical direction.
11. A substrate processing apparatus comprising: the substrate information acquisition device according to any one of claims 1 to 10; a processing unit that performs a predetermined process on the substrate; a hand that holds the substrate; a hand driving unit that drives the hand to advance and retract with respect to the container and drives the hand to move up and down in the vertical direction to convey the substrate to be processed by the processing unit; and a control unit that operates the hand driving unit based on the substrate information acquired by the substrate information acquisition device.
Citation Information
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