Display device, method for manufacturing same, and electronic apparatus

Abstract

Provided is a display device capable of suppressing a decrease in the reliability of a display device.　The display device comprises an organic matter-containing layer that is provided across an effective pixel region and a peripheral region outside the effective pixel region and includes an organic light-emitting layer. The organic matter-containing layer includes at least one of a modified part or a cavity part.

Description

Display device, manufacturing method thereof, and electronic device

[0001] The present disclosure relates to a display device, a manufacturing method thereof, and an electronic device.

[0002] Display devices having an organic-containing layer including an organic light-emitting layer (e.g., OLED (Organic Light Emitting Diode) display devices) are widely used. In this type of display device, damage (changes in characteristics) can spread from a defect (e.g., a particle attached during manufacturing). If such damage spreads, there is a risk of the reliability of the display device being reduced. In particular, moisture contained in the particle itself or its surroundings, and moisture that penetrates into the effective pixel area from outside the display device via the particle, are major causes of reduced reliability of the display device.

[0003] For example, Patent Document 1 discloses a technique for preventing penetration of external moisture and oxygen by covering the first display area DA1, the second display area DA2, and the non-display area with a thin-film sealing layer 500.

[0004] Japanese Patent Application Laid-Open No. 2021-63983

[0005] An object of the present disclosure is to provide a display device capable of suppressing a decrease in the reliability of the display device, a manufacturing method thereof, and an electronic device.

[0006] In order to solve the above-mentioned problems, a first display device according to the present disclosure includes an organic-material-containing layer including an organic light-emitting layer, the organic-material-containing layer being disposed across an effective pixel region and a peripheral region outside the effective pixel region, and the organic-material-containing layer includes at least one of a modified portion and a hollow portion.

[0007] A second display device according to the present disclosure includes, in an effective pixel area, one or both of an organic-containing layer including an organic light-emitting layer and an organic protective layer, and one or both of the organic-containing layer and the organic protective layer includes at least one of a modified portion and a cavity portion.

[0008] A first method for manufacturing a display device according to the present disclosure includes: a step of forming an organic-substance-containing layer including an organic light-emitting layer; and a step of forming at least one of a modified portion and a hollow portion in a part of the organic-substance-containing layer by irradiating the organic-substance-containing layer with laser light.

[0009] A second manufacturing method of a display device according to the present disclosure includes the steps of: forming one or both of an organic-containing layer including an organic light-emitting layer and an organic protective layer; and forming at least one of a modified portion and a cavity portion in one or both of the organic-containing layer and the organic protective layer by irradiating laser light to one or both of the organic-containing layer and the organic protective layer.

[0010] FIG. 1 is a plan view illustrating the moisture diffusion process in a conventional display device. FIG. 2 is a cross-sectional view taken along line II-II in FIG. 1. FIG. 3 is a plan view of a display device according to a first embodiment. FIG. 4 is an enlarged plan view of region RE in FIG. 3. FIG. 5 is a cross-sectional view taken along line V-V in FIG. 4. FIG. 6A is a cross-sectional view of an OLED layer having a single layer of light-emitting units. FIG. 6B is a cross-sectional view of an OLED layer having two layers of light-emitting units. FIG. 7A is a cross-sectional view schematically illustrating the state of an OLED layer before the formation of a modified portion or a cavity. FIG. 7B is a cross-sectional view schematically illustrating the state of an OLED layer after the formation of a modified portion. FIG. 8A is a cross-sectional view schematically illustrating the state of an OLED layer after the formation of a modified portion. FIG. 8B is a cross-sectional view schematically illustrating the state of an OLED layer after the formation of a cavity. FIG. 9A is an image of a TEM (Transmission Electron Microscope) cross-sectional image of a portion without a cavity. FIG. 9B is an image of a TEM cross-sectional image of a portion with a cavity. FIG. 10 is a flowchart of a manufacturing process of the display device according to the first embodiment. FIG. 11 is an enlarged plan view of an effective pixel region of the display device according to the second embodiment. FIG. 12 is an enlarged plan view of a peripheral region of the display device according to Modification 1. FIG. 13 is an enlarged plan view of a peripheral region of the display device according to Modification 2. FIG. 14 is an enlarged plan view of a peripheral region of the display device according to Modification 3. FIG. 15 is an enlarged plan view of a peripheral region of the display device according to Modification 4. FIG. 16 is a flowchart of a manufacturing process of the display device according to Modification 4. FIG. 17 is a flowchart of a manufacturing process of the display device according to Modification 6. FIG. 18 is an enlarged plan view of an effective pixel region of the display device according to Modification 7. FIG. 19 is an enlarged plan view of an effective pixel region of the display device according to Modification 8. FIG. 20 is an enlarged plan view of an effective pixel region of the display device according to Modification 8. FIG. 21 is a cross-sectional view of a display device according to Modification 10. FIG. 22 is a cross-sectional view of a first example of a leakage suppression structure. FIG. 23 is a cross-sectional view of a second example of a leakage suppression structure. FIG. 24 is a cross-sectional view of a third example of a leakage suppression structure. Fig. 25 is a cross-sectional view of a fourth example of the leak suppression structure, Fig. 26 is a cross-sectional view of a fifth example of the leak suppression structure, and Fig. 27 is a cross-sectional view of a sixth example of the leak suppression structure.28 is a cross-sectional view of a seventh example of a leak suppression structure. FIG. 29 is an enlarged cross-sectional view of the groove shown in FIG. 28. FIG. 30 is a cross-sectional view of an eighth example of a leak suppression structure. FIG. 31 is a cross-sectional view of a ninth example of a leak suppression structure. FIG. 32 is a plan view for explaining the arrangement of a first electrode and a third electrode. FIGS. 33A, 33B, and 33C are conceptual diagrams for explaining the relationship between a normal line LN passing through the center of the light-emitting section, a normal line LN' passing through the center of the lens member, and a normal line LN" passing through the center of the wavelength selection section, respectively. FIG. 34 is a conceptual diagram for explaining the relationship between a normal line LN passing through the center of the light-emitting section, a normal line LN' passing through the center of the lens member, and a normal line LN" passing through the center of the wavelength selection section. 35A and 35B are conceptual diagrams for explaining the relationship between a normal LN passing through the center of the light-emitting section, a normal LN' passing through the center of the lens member, and a normal LN" passing through the center of the wavelength selecting section. FIG. 36 is a conceptual diagram for explaining the relationship between a normal LN passing through the center of the light-emitting section, a normal LN' passing through the center of the lens member, and a normal LN" passing through the center of the wavelength selecting section. FIG. 37A is a schematic cross-sectional view for explaining a first example of a resonator structure. FIG. 37B is a schematic cross-sectional view for explaining a second example of a resonator structure. FIG. 38A is a schematic cross-sectional view for explaining a third example of a resonator structure. FIG. 38B is a schematic cross-sectional view for explaining a fourth example of a resonator structure. FIG. 39A is a schematic cross-sectional view for explaining a fifth example of a resonator structure. FIG. 39B is a schematic cross-sectional view for explaining a sixth example of a resonator structure. FIG. 40 is a schematic cross-sectional view for explaining a seventh example of a resonator structure. FIG. 41A is a front view of a digital still camera. Fig. 41B is a rear view of a digital still camera. Fig. 42 is a perspective view of a head-mounted display. Fig. 43 is a perspective view of a television device. Fig. 44 is a perspective view of a see-through head-mounted display. Fig. 45 is a perspective view of a smartphone. Fig. 46A is a diagram showing the interior of a vehicle from the rear to the front of the vehicle. Fig. 46B is a diagram showing the interior of a vehicle from diagonally rear to diagonally front of the vehicle. Fig. 47 is a cross-sectional view for explaining the process of moisture diffusion in a display device according to Reference Example 1. Fig. 48 is a cross-sectional view of a display device according to a third embodiment.FIG. 49A is a cross-sectional view schematically showing the state of the organic protective layer before the formation of a modified portion or a cavity. FIG. 49B is a cross-sectional view schematically showing the state of the organic protective layer after the formation of a modified portion. FIG. 49C is a cross-sectional view schematically showing the state of the organic protective layer after the formation of a cavity. FIG. 50 is an enlarged plan view of an effective pixel region of a display device according to a third embodiment. FIG. 51 is a flowchart of a manufacturing process of a display device according to the third embodiment. FIG. 52 is a cross-sectional view for explaining the process of moisture diffusion in a display device according to Reference Example 2. FIG. 53 is a cross-sectional view of a display device according to a fourth embodiment. FIG. 54 is an enlarged plan view of an effective pixel region of a display device according to Modification Example 16.

[0011] Embodiments of the present disclosure will be described in the following order. 1. General Description of the First Display Device According to the Present Disclosure, the Second Display Device According to the Present Disclosure, the Manufacturing Method of the First Display Device According to the Present Disclosure, and the Manufacturing Method of the Second Display Device According to the Present Disclosure 2. Background to the Creation of the First Embodiment of the Present Disclosure 3. First Embodiment (Example of a Display Device) 4. Second Embodiment (Example of a Display Device) 5. Background to the Creation of the Third Embodiment of the Present Disclosure 6. Third Embodiment (Example of a Display Device) 7. Background to the Creation of the Fourth Embodiment of the Present Disclosure 8. Fourth Embodiment (Example of a Display Device) 9. Modifications 10. Example of a Leakage Suppression Structure 11. Relationship of Normals Passing Through the Centers of the Light-Emitting Section, the Lens Member, and the Wavelength Selecting Section 12. Example of a Resonator Structure 13. Application Example (Example of an Electronic Device) The embodiments described below are preferred specific examples of the present disclosure, and the contents of the present disclosure are not limited to these embodiments. Note that in all of the drawings of the following embodiments, the same or corresponding parts are designated by the same reference numerals. In addition, in order to prevent the illustrations from becoming too complicated, reference symbols may be assigned to only some of the components, the illustrations may be simplified, or the illustrations may be enlarged or reduced in size.

[0012] <1. General Description of the First Display Device According to the Present Disclosure, the Second Display Device According to the Present Disclosure, the Manufacturing Method of the First Display Device According to the Present Disclosure, and the Manufacturing Method of the Second Display Device According to the Present Disclosure>

[0013] In the first display device, the second display device, the manufacturing method for the first display device, and the manufacturing method for the second display device, it is preferable that the modified section is configured to be able to suppress or delay moisture diffusion in an in-plane direction of the organic substance-containing layer, thereby suppressing or delaying the progress of moisture diffusion through the organic substance-containing layer as a medium.

[0014] In the first display device, the second display device, the manufacturing method of the first display device, and the manufacturing method of the second display device, a pixel may be a sub-pixel or a pixel composed of a plurality of sub-pixels. In the first display device, the second display device, the manufacturing method of the first display device, and the manufacturing method of the second display device, a pixel block is composed of two or more pixels.

[0015] In the first display device, in order to suppress or delay the diffusion of moisture from the outside into the effective pixel region, it is preferable that at least one of the modified portion and the cavity portion be provided continuously or intermittently along the periphery of the effective pixel region. When at least one of the modified portion and the cavity portion is provided continuously, the intrusion of moisture from the outside can be uniformly suppressed. On the other hand, when at least one of the modified portion and the cavity portion is provided intermittently, the intrusion path of moisture can be controlled by the formation position of the intermittent portion.

[0016] In the first display device, in order to suppress or delay the diffusion of moisture from the outside into the effective pixel area, it is preferable that at least one of the modified portion and the cavity portion be arranged in a staggered pattern along the periphery of the effective pixel area.

[0017] In the first display device, in order to suppress or delay the diffusion of moisture from the outside into the effective pixel region, it is preferable that at least one of the modified portions and the cavity portions be arranged in a two-dimensional pattern in the peripheral region.

[0018] In the first display device, the peripheral region preferably has a region in which the density of at least one of the modified portions and the hollow portions decreases from the inner periphery to the outer periphery of the peripheral region, thereby guiding moisture diffusion in the direction of lower density (outside the peripheral region).

[0019] In the first display device, in order to suppress or delay the diffusion of moisture from the outside to the effective pixel area, it is preferable that at least one of the modified portion and the cavity portion is provided between the periphery of the effective pixel area and a defect contained in the peripheral area.

[0020] In the first display device, in order to suppress or delay the diffusion of moisture from the outside into the effective pixel region, it is preferable that at least one of the modified portion and the cavity portion surround defects contained in the peripheral region.

[0021] The first display device includes a first electrode and a second electrode sandwiching an organic substance-containing layer, and one of the first electrode and the second electrode is preferably provided continuously from the effective pixel region to the peripheral region, which simplifies the configuration of the display device compared to a display device in which both the first electrode and the second electrode are separated for each pixel.

[0022] In the second display device, at least one of the modified portion and the cavity portion is preferably provided between adjacent pixels, thereby making it possible to suppress deterioration of pixel characteristics due to the formation of at least one of the modified portion and the cavity portion.

[0023] In the second display device, it is preferable that at least one of the modified portion and the cavity portion is provided along the pixel or pixel block, thereby making it possible to suppress the diffusion of moisture into the pixel or pixel block.

[0024] In the second display device, at least one of the modified section and the cavity section preferably surrounds the pixel or pixel block, thereby making it possible to suppress the diffusion of moisture into the pixel or pixel block.

[0025] In the second display device, at least one of the modified portion and the cavity portion preferably selectively surrounds a pixel or pixel block containing a defect. This makes it possible to suppress moisture diffusion from a pixel containing a defect to its surrounding pixels, or from a pixel block to its surrounding pixels. Furthermore, since the range in which at least one of the modified portion and the cavity portion is formed is limited to a portion of the effective pixel area, it is possible to suppress deterioration in the characteristics of the display device due to the formation of at least one of the modified portion and the cavity portion.

[0026] In the second display device, it is preferable that the organic material-containing layer is sandwiched between first and second electrodes, and one of the first and second electrodes is provided continuously across the effective pixel area, which simplifies the configuration of the display device compared to a display device in which both the first and second electrodes are separated for each pixel.

[0027] In the second display device, when both the organic substance-containing layer and the organic protective layer are provided, the organic protective layer is provided, for example, above the organic substance-containing layer.

[0028] In the second display device, from the viewpoint of suppressing the intrusion of moisture and the like into the organic protective layer, it is preferable that a first inorganic protective layer and a second inorganic protective layer are further provided in the effective pixel area, and that the organic protective layer is sandwiched between the first inorganic protective layer and the second inorganic protective layer.

[0029] In the second display device, both the organic substance-containing layer and the organic protective layer are preferably provided in the effective pixel region, and both the organic substance-containing layer and the organic protective layer include at least one of a modified portion and a cavity, and at least one of the modified portion and the cavity included in the organic substance-containing layer and at least one of the modified portion and the cavity included in the organic protective layer are preferably arranged so as to overlap in the thickness direction of the display device. In this case, the diffusion of moisture that has penetrated into the organic protective layer can be suppressed or delayed by at least one of the modified portion and the cavity, and the diffusion of moisture that has penetrated into the organic substance-containing layer can be suppressed or delayed by at least one of the modified portion and the cavity. Therefore, a decrease in the reliability of the display device can be further suppressed.

[0030] In the first and second display device manufacturing methods, the organic substance-containing layer is preferably formed continuously from the effective pixel region to a peripheral region outside the effective pixel region, and the peripheral region is preferably irradiated with laser light. By irradiating the peripheral region with laser light, at least one of a modified portion and a cavity portion can be formed in the portion of the organic substance-containing layer located in the peripheral region. Therefore, moisture diffusion through the organic substance-containing layer can be suppressed or delayed in the peripheral region.

[0031] In the first and second display device manufacturing methods, the organic-substance-containing layer is preferably formed continuously in the effective pixel region, and the laser light is preferably irradiated between pixels in the effective pixel region. This allows at least one of modified portions and cavities to be formed between pixels in the effective pixel region. Therefore, it is possible to suppress or delay the intrusion of moisture into the pixels while suppressing deterioration of the display device's characteristics due to the formation of at least one of modified portions and cavities.

[0032] The first and second display device manufacturing methods preferably further include a step of inspecting for defects in at least one of the effective pixel region and the peripheral region outside the effective pixel region, and the laser light is selectively irradiated around the defect based on the inspection results, thereby suppressing the effects of the laser light irradiation on pixels other than those containing the defect.

[0033] The first display device and the second display device may be an OLED (Organic Light Emitting Diode) display device, an LED (Light Emitting Diode) display device, or other display devices.

[0034] The first display device and the second display device may be provided in an electronic device. For example, the first display device and the second display device may be provided in an eyewear device such as a virtual reality (VR) device, a mixed reality (MR) device, or an augmented reality (AR) device, or may be provided in an electronic viewfinder (EVF), a small projector, etc. Eyewear devices also include headsets.

[0035] In the present disclosure, "on object A" in expressions such as "object B is provided on object A" indicates the relative positional relationship between object A and object B, and includes not only a state in which object B is located directly on object A without any other objects in between, but also a state in which object B is located on object A with at least one other object in between.

[0036] <2 Background to the Creation of the First Embodiment of the Present Disclosure> Even if a defect is located in a peripheral region outside the effective pixel region, damage (changes in characteristics) may spread from the defect to the effective pixel region, thereby reducing the reliability of the display device. However, while it is easy to screen display devices having defects within the effective pixel region through inspection, it is difficult to screen display devices having defects in the peripheral region outside the effective pixel region through inspection. For this reason, display devices having defects in the peripheral region outside the effective pixel region are likely to be defective in the market. Therefore, a display device that can suppress the reduction in reliability of the display device even when defects such as particles exist in the peripheral region outside the effective pixel region is desired. Below, the mechanism of the reduction in reliability of a display device having defects in the peripheral region is described in detail.

[0037] FIG. 1 is a plan view illustrating the process of moisture diffusion in a conventional display device 103. FIG. 2 is a cross-sectional view taken along line II-II in FIG. 1. In FIG. 1, concentric lines 32 indicate the gradual expansion of the moisture diffusion range. Similarly, in other figures such as FIG. 4, the concentric lines 32 indicate the gradual expansion of the moisture diffusion range. In FIGS. 1 and 2, arrows 33 indicate the moisture diffusion path. Similarly, in other figures such as FIG. 4 and 5, the arrows 33 indicate the moisture diffusion path.

[0038] The sub-pixels 1R, 1G, and 1B of each color arranged in the effective pixel region RE1 are effective sub-pixels that contribute to display. On the other hand, the sub-pixels 2R, 2G, and 2B of each color arranged in the peripheral region RE2 are dummy sub-pixels that do not contribute to display. In this specification, when the sub-pixels 1R, 1G, and 1B are referred to collectively without any particular distinction, they may be simply referred to as sub-pixel 1. Similarly, when the sub-pixels 2R, 2G, and 2B are referred to collectively without any particular distinction, they may be simply referred to as sub-pixel 2.

[0039] As described above, even if a defect exists in the peripheral region RE2, damage (change in characteristics) may spread from the defect to the effective pixel region RE1, thereby reducing the reliability of the display device 103. Examples of defects include, but are not limited to, particles 31 that adhere during the manufacturing process and voids that occur during the manufacturing process.

[0040] The above-described deterioration in reliability of the display device 103 is likely to occur in a display device 103 in which the OLED layer 122 (an organic-material-containing layer including an organic light-emitting layer) is provided from the effective pixel region RE1 to its peripheral region RE2. Specifically, it is believed to occur due to the following processes. In FIGS. 1 and 2 , region RE3 represents the formation region of the OLED layer 22. (1) During the manufacturing process, particles 31 adhere to the peripheral region RE2 outside the effective pixel region RE1. (2) Defective film formation occurs in the protective layer 14 formed after the particles 31 adhere (i.e., the particles 31 deteriorate the coverage (embedding) of the protective layer 14, forming a leak path), or defects occur due to poor exposure during photolithography caused by the particles 31, resulting in defective film formation in the subsequently formed protective layer 14. (3) When moisture penetrates into the display device 103 from the outside through a defective film formation portion and reaches the OLED layer 122, the subpixel (dummy subpixel) 2 near the particle 31 is damaged. (4) When moisture diffuses from the subpixel 2 near the particle 31 to the surrounding subpixels 2 using the OLED layer 122 as a diffusion medium, the range of damage expands. (5) When moisture continuously penetrates into the display device 103 from the outside, the range of moisture diffusion (i.e., the range of damage) further expands, and when moisture reaches the effective pixel region RE1 from the surrounding region RE2 using the OLED layer 122 as a diffusion medium, the subpixel 1 in the effective pixel region RE1 is damaged, causing an emission abnormality in the subpixel 1. Specific examples of an emission abnormality in the subpixel 1 include, for example, partial non-emission of the subpixel 1, uneven emission of the subpixel 1, and non-illumination of the subpixel 1, but the emission abnormality is not limited to these. In the above explanation, the process by which abnormal light emission occurs due to the adhesion of particles 31 during the manufacturing process of the display device 103 has been described, but it is believed that abnormal light emission due to defects other than particles 31 also occurs through approximately the same process.

[0041] The inventors of the present invention have considered the process by which the above-described light emission abnormality occurs and have conducted extensive research into a technology capable of suppressing a decrease in reliability in a display device 103 in which an OLED layer 122 is provided from an effective pixel region RE1 to its peripheral region RE2. As a result, they have discovered that the expansion of the moisture diffusion range (the range of damage) can be suppressed by providing at least one of a modified portion and a cavity portion in a portion of the OLED layer 122 located in the peripheral region RE2.

[0042] 3 First Embodiment [Schematic Configuration of Display Device 101] Fig. 3 is a plan view of a display device 101 according to a first embodiment. The display device 101 has an effective pixel region RE1 and a peripheral region RE2 provided around the effective pixel region RE1. In the first embodiment, an example will be described in which the display device 101 is a top-emission OLED display device, but the type and format of the display device 101 are not limited to this example. The display device 101 may also be a microdisplay.

[0043] In this specification, the first and second directions that are orthogonal to each other within the display surface of the display device 101 are referred to as the X-axis direction and the Y-axis direction, respectively, and the third direction that is perpendicular to the display surface of the display device 101 is referred to as the Z-axis direction. In the first embodiment, an example will be described in which the X-axis direction is the horizontal direction of the display surface and the Y-axis direction is the vertical direction of the display surface.

[0044] 4 is an enlarged plan view of the region RE in FIG. 3. A plurality of sub-pixels 1R, 1G, and 1B are two-dimensionally arranged in a predetermined arrangement pattern within the effective pixel region RE1. A plurality of sub-pixels 2R, 2G, and 2B are two-dimensionally arranged in a predetermined arrangement pattern within the peripheral region RE2. In the first embodiment, an example in which the predetermined arrangement pattern is a square arrangement will be described, but the arrangement pattern is not limited to this example. A pad section, a driver for video display (neither of which is shown), and the like are provided in the peripheral region RE2. A flexible printed circuit (FPC) may be connected to the pad section.

[0045] Sub-pixel 1R can emit red light (first light). Sub-pixel 1G can emit green light (second light). Sub-pixel 1B can emit blue light (third light). One pixel (one pixel) is made up of, for example, a plurality of adjacent sub-pixels 1R, 1G, and 1B. However, the configuration of one pixel is not limited to this example.

[0046] [Layer Structure of Display Device 101] Fig. 5 is a cross-sectional view taken along line V-V in Fig. 4. The display device 101 includes a drive substrate 11, a plurality of light-emitting elements 12a, a plurality of light-emitting elements 12b, an insulating layer 13, a protective layer 14, a color filter 15, a filling resin layer 16, a contact portion 17, a sealing portion 18, and a sealing glass 19.

[0047] In this specification, of the two surfaces of each layer constituting the display device 101, the surface facing the display surface (top side) of the display device 101 may be referred to as the first surface (upper surface), and the surface facing the opposite side (bottom side) of the display device 101 from the display surface may be referred to as the second surface (lower surface). In this specification, the peripheral edge of the effective pixel region RE1 refers to a portion having a predetermined width extending inward from the peripheral edge of the effective pixel region RE1. In this specification, the peripheral edge of the first surface refers to a portion having a predetermined width extending inward from the peripheral edge of the first surface. In this specification, the peripheral edge of the second surface refers to a portion having a predetermined width extending inward from the peripheral edge of the second surface. In this specification, the term "planar view" refers to a planar view when an object is viewed from a direction perpendicular to the first surface or the second surface.

[0048] (Drive Substrate 11) The drive substrate 11 is a so-called backplane, and is capable of driving the plurality of light-emitting elements 12a. The drive substrate 11 includes, for example, a substrate and an insulating layer in this order.

[0049] A plurality of drive transistors (not shown) and the like are provided on the first surface side of the substrate. The substrate may be, for example, a semiconductor substrate on which the plurality of drive transistors and the like can be easily formed, or a glass substrate or resin substrate with low moisture and oxygen permeability. The semiconductor substrate includes, for example, amorphous silicon, polycrystalline silicon, or single crystal silicon. The glass substrate includes, for example, high strain point glass, soda glass, borosilicate glass, forsterite, lead glass, or quartz glass. The resin substrate includes, for example, at least one selected from the group consisting of polymethyl methacrylate, polyvinyl alcohol, polyvinyl phenol, polyether sulfone, polyimide, polycarbonate, polyethylene terephthalate, and polyethylene naphthalate.

[0050] The insulating layer is provided on the first surface of the substrate and covers the plurality of drive transistors and the like. The insulating layer contains a plurality of contact plugs and a plurality of wirings (neither of which is shown). The contact plugs and wirings electrically connect the light emitting elements 12 and the drive transistors. The contact plugs contain at least one metal selected from the group consisting of, for example, copper (Cu) and titanium (Ti). The wirings are made of, for example, a metal layer. The metal layer contains at least one metal selected from the group consisting of, for example, tungsten (W) and copper (Cu). A barrier metal may be provided on the surface of the wirings. The barrier metal may be, for example, tantalum (Ta) or tantalum nitride (TaN). ｘ ) etc.

[0051] The insulating layer is, for example, an organic insulating layer, an inorganic insulating layer, or a laminate thereof. The organic insulating layer contains, for example, at least one selected from the group consisting of polyimide-based resins, acrylic-based resins, and novolac-based resins. The inorganic insulating layer is, for example, silicon oxide (SiO ｘ ), silicon nitride (SiN ｘ ) and silicon oxynitride (SiO ｘ N ｙ ) and the like.

[0052] (Light-emitting element 12a, 12b) The light-emitting element 12a is included in the sub-pixel 1 as an effective sub-pixel. That is, the light-emitting element 12a is a light-emitting element that contributes to display. The light-emitting element 12a is connected to a drive circuit and can emit white light under the control of the drive circuit.

[0053] The light-emitting element 12b is included in the sub-pixel 2 as a dummy sub-pixel. That is, the light-emitting element 12b is a dummy light-emitting element that does not contribute to display. The light-emitting element 12b is connected to a drive circuit and is not able to emit light.

[0054] In the first embodiment, the light-emitting elements 12 a and 12 b are organic light-emitting diode elements (OLED elements). In the following description, when the light-emitting elements 12 a and 12 b are referred to collectively without any particular distinction, the light-emitting elements 12 a and 12 b may be simply referred to as the light-emitting element 12.

[0055] The plurality of light-emitting elements 12 are two-dimensionally arranged in a predetermined arrangement pattern on the first surface of the drive substrate 11. The predetermined arrangement pattern is as described above as the predetermined arrangement pattern of the plurality of sub-pixels 1 and 2. The plurality of light-emitting elements 12 have a first electrode 121, an OLED layer 122, and a second electrode 123, which are arranged in this order on the first surface of the drive substrate 11.

[0056] (First electrode 121) The first electrode 121 is provided on the second surface side of the OLED layer 122. The first electrode 121 is an individual electrode provided individually for each of the plurality of light-emitting elements 12. That is, the first electrode 121 is divided between adjacent light-emitting elements 12 in the in-plane direction of the first surface of the drive substrate 11. The first electrode 121 is an anode. When a voltage is applied between the first electrode 121 and the second electrode 123, holes are injected from the first electrode 121 into the OLED layer 122.

[0057] The first electrode 121 may be composed of, for example, a metal layer, or may be composed of a metal layer and a transparent conductive oxide layer. When the first electrode 121 is composed of a metal layer and a transparent conductive oxide layer, it is preferable that the transparent conductive oxide layer be provided on the OLED layer 122 side, from the viewpoint of having a layer having a high work function adjacent to the OLED layer 122.

[0058] The metal layer may function as a reflective layer that reflects light emitted by the OLED layer 122. The metal layer may contain at least one metal element selected from the group consisting of chromium (Cr), gold (Au), platinum (Pt), nickel (Ni), copper (Cu), molybdenum (Mo), titanium (Ti), tantalum (Ta), aluminum (Al), magnesium (Mg), iron (Fe), tungsten (W), and silver (Ag). The metal layer may contain at least one metal element as a constituent element of an alloy. Specific examples of the alloy include an aluminum alloy and a silver alloy. Specific examples of the aluminum alloy include AlNd and AlCu.

[0059] An underlayer (not shown) may be provided adjacent to the second surface side of the metal layer. The underlayer may be capable of improving the crystal orientation of the metal layer during deposition. The underlayer may contain, for example, at least one metal element selected from the group consisting of titanium (Ti) and tantalum (Ta). The underlayer may contain the at least one metal element as a constituent element of an alloy.

[0060] The transparent conductive oxide layer contains a transparent conductive oxide, for example, at least one selected from the group consisting of transparent conductive oxides containing indium (hereinafter referred to as "indium-based transparent conductive oxides"), transparent conductive oxides containing tin (hereinafter referred to as "tin-based transparent conductive oxides"), and transparent conductive oxides containing zinc (hereinafter referred to as "zinc-based transparent conductive oxides").

[0061] Examples of indium-based transparent conductive oxides include indium tin oxide (ITO), indium zinc oxide (IZO), indium gallium oxide (IGO), indium gallium zinc oxide (IGZO), and fluorine-doped indium oxide (IFO). Among these transparent conductive oxides, indium tin oxide (ITO) is particularly preferred. Indium tin oxide (ITO) has a particularly low work function barrier for hole injection into the OLED layer 122, allowing the driving voltage of the display device 101 to be particularly low. Examples of tin-based transparent conductive oxides include tin oxide, antimony-doped tin oxide (ATO), and fluorine-doped tin oxide (FTO). Examples of zinc-based transparent conductive oxides include zinc oxide, aluminum-doped zinc oxide (AZO), boron-doped zinc oxide, and gallium-doped zinc oxide (GZO).

[0062] (OLED Layer 122) The OLED layer 122 can emit white light. The OLED layer 122 is an example of an organic-material-containing layer that includes an organic light-emitting layer. The OLED layer 122 is sandwiched between a plurality of first electrodes 121 and one second electrode 123. The OLED layer 122 is provided across the effective pixel region RE1 and the peripheral region RE2. The OLED layer 122 is a layer common to a plurality of light-emitting elements 12 included in the effective pixel region RE1 and the peripheral region RE2.

[0063] The OLED layer 122 may be configured as a laminate including an organic light-emitting layer, in which case some layers of the laminate (e.g., an electron injection layer) may be inorganic. The OLED layer 122 may be an OLED layer having a single light-emitting unit U as shown in FIG. 6A , an OLED layer having two light-emitting units U1 and U2 (tandem structure) as shown in FIG. 6B , or an OLED layer having a structure other than these. The OLED layer 122 having a single light-emitting unit U has a configuration in which, for example, a hole injection layer 1221, a hole transport layer 1222, a red light-emitting layer 1220R, an emission separation layer 1223, a blue light-emitting layer 1220B, a green light-emitting layer 1220G, an electron transport layer 1224, and an electron injection layer 1225 are stacked in this order from the first electrode 121 to the second electrode 123. The OLED layer having two light-emitting units U1 and U2 has a configuration in which, for example, a hole injection layer 1221, a hole transport layer 1222, a blue light-emitting layer 1220B, an electron transport layer 1226, a charge generation layer 1227, a hole transport layer 1228, a yellow light-emitting layer 1220Y, an electron transport layer 1224, and an electron injection layer 1225 are laminated in this order from the first electrode 121 to the second electrode 123.

[0064] The hole injection layer 1221 can increase the efficiency of hole injection into the light-emitting layers 1220R, 1220G, and 1220B and suppress leakage. The hole transport layers 1222 and 1228 can increase the efficiency of hole transport into the light-emitting layers 1220R, 1220B, and 1220Y. The electron injection layer 1225 can increase the efficiency of electron injection into the light-emitting layers 1220G and 1220Y. The electron transport layers 1224 and 1226 can increase the efficiency of electron transport into the light-emitting layers 1220G, 1220B, and 1220Y. The emission separation layer 1223 is a layer for adjusting the injection of carriers into the light-emitting layers 1220R, 1220G, and 1220B. The balance of light emission of each color is adjusted by injecting electrons and holes into the light-emitting layers 1220R, 1220G, and 1220B via the emission separation layer 1223. The charge generating layer 1227 can supply electrons and holes to the blue light emitting layer 1220B and the yellow light emitting layer 1220Y, which are disposed so as to sandwich the charge generating layer 1227, respectively.

[0065] When an electric field is applied to the red light-emitting layer 1220R, the green light-emitting layer 1220G, the blue light-emitting layer 1220B, and the yellow light-emitting layer 1220Y, recombination occurs between holes injected from the first electrode 121 or the charge generation layer 1227 and electrons injected from the second electrode 123 or the charge generation layer 1227, and the red light, green light, blue light, and yellow light can be emitted.

[0066] The OLED layer 122 includes a modified / cavity portion 122a in the peripheral region RE2. １ (See FIG. 7B), modified section 122a ２ (See FIG. 8A) or a void a ３ (See FIG. 8B )". The peripheral region RE2 includes the boundary between the effective pixel region RE1 and the peripheral region RE2, and the outer periphery of the OLED layer 122. The OLED layer 122 is provided continuously in the in-plane direction of the first surface of the drive substrate 11 in a portion excluding the modified / hollow portion 122 a.

[0067] Modified section 122a １ The modified portion 122a is a modified portion of the OLED layer 122. ２ The modified portion 122a of the OLED layer 122 is １ The hollow portion 122a is modified to a state different from that of the hollow portion 122a. ３ is formed by the disappearance and / or shrinkage of a part of the OLED layer 122. In this specification, "and / or" means at least one of the following, for example, "X and / or Y" means X only, Y only, or both X and Y.

[0068] Modified section 122a １ and the modified section 122a ２ The modification in this case means that the structure or constituent materials of the OLED layer 122 are changed to make it difficult for moisture to diffuse at least in the in-plane direction of the OLED layer 122. １ and the modified section 122a ２ is a moisture diffusion suppression portion configured to be able to suppress or delay moisture diffusion at least in the in-plane direction of the OLED layer 122.

[0069] The modified / hollow portion 122a has a linear shape in a plan view. While Fig. 4 shows an example in which the modified / hollow portion 122a has a linear shape, the shape of the modified / hollow portion 122a is not limited to this example, and may be, for example, a serpentine, curved, or bent line. Specific examples of a serpentine shape include, but are not limited to, a wavy line and a zigzag line.

[0070] In the first embodiment, the modified / void portion 122a is provided continuously along the periphery of the effective pixel region RE1, surrounding the periphery of the effective pixel region RE1. The modified / void portion 122a may be arranged so as to pass between adjacent sub-pixels 2, as shown in Fig. 4. Note that the arrangement of the modified / void portion 122a is not limited to the example shown in Fig. 4, and the modified / void portion 122a may be arranged so as to cross over the sub-pixels 2.

[0071] From the viewpoint of suppressing a decrease in brightness of the display device 101, it is preferable that the resistance of the subpixel 1 to the cathode power supply after the formation of the reformed / hollow portion 122a is not more than twice the resistance of the subpixel 1 to the cathode power supply before the formation of the reformed / hollow portion 122a. From the viewpoint of suppressing a decrease in brightness of the display device 101, it is preferable that the voltage drop of the subpixel 1 from the cathode power supply after the formation of the reformed / hollow portion 122a is not more than 1 V.

[0072] 7A, 7B, 8A, and 8B, the modified portion 122a １ , modified section 122a ２ and cavity 122a ３ This article explains:

[0073] 7A is a cross-sectional view schematically illustrating the state of the OLED layer 122 before the formation of the modified / cavity portion 122a. The OLED layer 122 before the formation of the modified / cavity portion 122a can serve as a medium for diffusing the moisture 34 in the in-plane direction of the OLED layer 122. Therefore, there is a risk that the moisture 34 will easily diffuse from the peripheral region RE2 to the effective pixel region RE1 through the OLED layer 122.

[0074] FIG. 7B shows the modified portion 122a １12 is a cross-sectional view schematically illustrating a state of the OLED layer 122 after the modified portion 122a is formed. １ For example, the modified portion 122a has a state in which the layer structure of the OLED layer 122 is destroyed. １ can suppress or delay moisture diffusion in the in-plane direction of the OLED layer 122. Although Fig. 7B shows an example in which all layers constituting the OLED layer 122 are modified, the above-described function of suppressing or delaying moisture diffusion can be obtained as long as at least one of the multiple layers constituting the OLED layer 122 is modified.

[0075] FIG. 8A shows the modified portion 122a. ２ 12 is a cross-sectional view schematically illustrating a state of the OLED layer 122 after the modified portion 122a is formed. ２ For example, the modified portion 122a has a state in which the molecular structure of the OLED layer 122 has been changed. ２ can suppress or delay moisture diffusion in the in-plane direction of the OLED layer 122 and in the thickness direction of the OLED layer 122. Although Fig. 8A shows an example in which all layers constituting the OLED layer 122 are modified, the above-described function of suppressing or delaying moisture diffusion can be obtained as long as at least one of the multiple layers constituting the OLED layer 122 is modified.

[0076] FIG. 8B shows the cavity 122a ３ 1 is a cross-sectional view schematically illustrating a state of the OLED layer 122 after the formation of the cavity 122a. ３ The cavity 122a is formed, for example, by the disappearance and / or shrinkage of the constituent material of the OLED layer 122. ３ The process for forming the cavity 122a is not limited to this example. ３ The cavity 122a may be formed by the disappearance and / or shrinkage of the material of the OLED layer 122 and the disappearance of the material of the second electrode 123. ３ The cavity 122a can increase the diffusion resistance against the moisture 34 diffusing in the in-plane direction of the OLED layer 122. ３8B shows an example in which all layers constituting the OLED layer 122 are eliminated and / or shrunk, but the function of increasing the diffusion resistance and the pooling effect can be obtained if at least one layer of the multiple layers constituting the OLED layer 122 is eliminated and / or shrunk.

[0077] Modified section 122a １ , 122a ２ and cavity 122a ３ The modified portion 122a is formed by, for example, laser processing the OLED layer 122. １ , 122a ２ and cavity 122a ３ The modified portions 122a can be selectively formed by, for example, adjusting the heating temperature of the OLED layer 122 by laser light irradiation. １ The modified portion 122a can be formed at a heating temperature of, for example, 150° C. or higher and lower than 350° C. ２ is the modified portion 122a １ The modified portion 122a can be formed at a higher heating temperature than when the modified portion 122a is formed. ２ The cavity 122a can be formed at a heating temperature of, for example, 350° C. or higher. ３ is the modified portion 122a ２ It is possible to form the film at a higher heating temperature than when forming the film.

[0078] Modified section 122a １ It can be confirmed, for example, as follows that the modified portion 122a is formed in the OLED layer 122. First, the composition distribution in the depth direction of the OLED layer 122 is analyzed at one location in the effective pixel region RE1. At this time, the analysis location is selected from a portion of the OLED layer 122 located between the first electrode 121 and the second electrode 123. Next, the composition distribution in the depth direction of the OLED layer 122 is analyzed in the peripheral region RE2. At this time, the composition analysis of the OLED layer 122 is performed at multiple locations from the inner periphery to the outer periphery of the peripheral region RE2. １In order to prevent overlooking of the above, it is preferable to make the intervals between the analysis positions as narrow as possible. Next, the analysis results (composition distribution in the thickness direction) of the effective pixel region RE1 and the peripheral region RE2 are compared to determine whether there is a portion in the peripheral region RE2 that has a composition distribution different from that of the effective pixel region RE1. In the portion that has a different composition distribution, the layer structure of the OLED layer 122 is destroyed, and the modified portion 122a １ As a method for analyzing the composition of the OLED layer 122, an analysis method that can select a specific measurement area and has depth resolution, such as time-of-flight secondary ion mass spectrometry (hereinafter referred to as "TOF-SIMS"), can be used.

[0079] Modified section 122a ２ The formation of the modified portion 122a in the OLED layer 122 can be confirmed, for example, as follows. １ In the same manner as in the confirmation method of (1), the composition distribution in the depth direction of the OLED layer 122 is analyzed in the effective pixel region RE1 and the peripheral region RE2. Next, the analysis results (composition distribution in the depth direction) of the effective pixel region RE1 and the peripheral region RE2 are compared to determine whether or not there is a portion in the peripheral region RE2 that contains a material having a molecular structure different from that of the effective pixel region RE1. In the portion that contains a material having a different molecular structure, the molecular structure of the OLED layer 122 is changed, and the modified portion 122a ２ is thought to be formed.

[0080] Cavity part 122a ３ It can be confirmed, for example, as follows that the cavity 122a is formed in the OLED layer 122. First, a cross section (a cross section parallel to the thickness direction of the display device 101) of the display device 101 is cut out from the peripheral region RE2 by cryo-FIB (Focused Ion Beam) processing or the like to prepare a thin section. Next, the prepared thin section is observed by a TEM to obtain a cross-sectional TEM image. Next, it is determined whether or not there is a cavity in the OLED layer 122 in the obtained cross-sectional TEM image. FIG. 9A shows the cavity 122a. ３9B shows a TEM cross-sectional image of a portion where the cavity 122a is not provided. ３ The above measurement is performed at multiple locations from the inner periphery to the outer periphery of the peripheral region RE2. ３ In order to prevent oversight of the check, it is preferable to make the intervals between the analysis positions as narrow as possible.

[0081] From the viewpoint of improving the function of the modified / hollow portion 122a in suppressing moisture diffusion, the carbon concentration in the modified / hollow portion 122a is preferably 20% or more lower than the carbon concentration in the OLED layer 122 in the effective pixel region RE1.

[0082] The carbon concentration of the OLED layer 122 in the effective pixel region RE1 and the carbon concentration of the modified / cavity portion 122a are measured as follows. First, the composition distribution in the depth direction of the OLED layer 122 in the effective pixel region RE1 is analyzed. In this case, the analysis location is selected from the portion of the OLED layer 122 located between the first electrode 121 and the second electrode 123. Then, the carbon content of the OLED layer 122 in the effective pixel region RE1 is calculated from the analysis results (composition distribution in the depth direction) in the effective pixel region RE1. Next, the composition distribution in the depth direction of the modified / cavity portion 122a in the peripheral region RE2 is analyzed. Then, the carbon content of the modified / cavity portion 122a in the peripheral region RE2 is calculated from the analysis results (composition distribution in the depth direction) in the peripheral region RE2.

[0083] Cavity part 122a ３ The void ratio of the OLED layer 122 at the formation position of the cavity 122a ３ From the viewpoint of improving the function of suppressing moisture diffusion and the pooling effect, it is preferably 50% or more.

[0084] Cavity part 122a ３ The void ratio of the OLED layer 122 at the formation position of the cavity 122a is measured, for example, as follows. First, a cross section of the display device 101 is cut out from the peripheral region RE2 by cryo-FIB processing or the like to prepare a thin section. At this time, the cross section is parallel to the thickness direction of the display device 101 and has the cavity 122a. ３Next, the prepared thin piece is observed by TEM to obtain a cross-sectional TEM image (see FIG. 9B). ３ Next, the area Sa of the cavity 122a in the cross-sectional TEM image is measured. ３ The positions P1 and P2 of both ends of the hollow portion 122a are identified. ３ Next, the distance W between the first electrode 121 and the second electrode 123 is measured at the midpoint P3 between the positions P1 and P2. ３ If the second electrode 123 is missing at the midpoint P3, the distance W between the first electrode 121 and the protective layer 14 is measured. Next, the length L and the distance W are used to calculate the area Sb (=L×W), and this area Sb is used as the area of ​​the cavity 122a. ３ Next, the area Sa and the area Sb are used to calculate the area of ​​the OLED layer 122 before the formation of the cavity 122a. ３ The void ratio ((Sa / Sb)×100) of the OLED layer 122 at the formation position is calculated.

[0085] (Second electrode 123) The second electrode 123 is provided on the first surface side of the OLED layer 122. The second electrode 123 is provided continuously from the effective pixel region RE1 to the peripheral region RE2. The second electrode 123 is connected between adjacent light-emitting elements 12 in the in-plane direction of the first surface of the drive substrate 11, and is an electrode common to the plurality of light-emitting elements 12.

[0086] The second electrode 123 is a cathode. When a voltage is applied between the first electrode 121 and the second electrode 123, electrons are injected from the second electrode 123 into the OLED layer 122. The second electrode 123 is translucent to the white light emitted from the OLED layer 122. The second electrode 123 is preferably a transparent electrode that is transparent to visible light. In this specification, visible light refers to light in a wavelength range of 360 nm or more and 780 nm or less.

[0087] In order to improve luminous efficiency, it is preferable that the second electrode 123 be made of a material that is as transparent as possible and has a small work function. The second electrode 123 is made of, for example, at least one layer of a metal layer and a transparent conductive oxide layer. More specifically, the second electrode 123 is made of a single layer film of a metal layer or a transparent conductive oxide layer, or a laminate film of a metal layer and a transparent conductive oxide layer. When the second electrode 123 is made of a laminate film, the metal layer may be provided on the OLED layer 122 side, or the transparent conductive oxide layer may be provided on the OLED layer 122 side. However, from the viewpoint of having a layer with a low work function adjacent to the OLED layer 122, it is preferable that the metal layer be provided on the OLED layer 122 side.

[0088] The metal layer contains, for example, at least one metal element selected from the group consisting of magnesium (Mg), aluminum (Al), silver (Ag), calcium (Ca), and sodium (Na). The metal layer may contain the at least one metal element as a constituent element of an alloy. Specific examples of the alloy include an MgAg alloy, an MgAl alloy, and an AlLi alloy. The transparent conductive oxide layer contains a transparent conductive oxide. Examples of the transparent conductive oxide include the same materials as the transparent conductive oxide of the first electrode 121 described above.

[0089] (Insulating Layer 13) The insulating layer 13 is provided on the first surface of the drive substrate 11 in a portion between the separated first electrodes 121. The insulating layer 13 is an insulating layer for element isolation and can insulate the first electrodes 121 adjacent in the in-plane direction of the first surface of the drive substrate 11. The insulating layer 13 has a plurality of openings 13a. The plurality of openings 13a are provided corresponding to the respective light-emitting elements 12. The plurality of openings 13a may be provided on the first surface (the surface facing the OLED layer 122) of each first electrode 121. In other words, the peripheral portion of the first surface of each first electrode 121 may be covered by the insulating layer 13. The first electrode 121 and the OLED layer 122 come into contact with each other through the openings 13a. The shape of the openings 120 in a plan view is not particularly limited, and may be, for example, a substantially rectangular, a substantially circular, or a substantially elliptical shape.

[0090] The insulating layer 13 is, for example, an organic insulating layer, an inorganic insulating layer, or a laminate thereof. The organic insulating layer contains, for example, at least one selected from the group consisting of polyimide-based resins, acrylic-based resins, and novolac-based resins. The inorganic insulating layer is, for example, silicon oxide (SiO ｘ ), silicon nitride (SiN ｘ ) and silicon oxynitride (SiO ｘ N ｙ ) and the like.

[0091] (Protective Layer 14) The protective layer 14 is provided on the first surface of the second electrode 123 and covers the plurality of light-emitting elements 12. The protective layer 14 is translucent to white light emitted from the light-emitting elements 12. The protective layer 14 can protect the plurality of light-emitting elements 12 and the like. For example, the protective layer 14 can prevent moisture from entering the plurality of light-emitting elements 12 and the like from the external environment. Furthermore, when the second electrode 123 is formed of a metal layer, the protective layer 14 may have a function of preventing oxidation of this metal layer.

[0092] The protective layer 14 contains, for example, at least one of an inorganic material and an organic material having low moisture absorption. The protective layer 14 may have a single layer structure or a multilayer structure. When the thickness of the protective layer 14 is increased, a multilayer structure is preferable. This is because the internal stress in the protective layer 14 can be alleviated. The inorganic material can be, for example, silicon oxide (SiO ｘ ), silicon nitride (SiN ｘ ), silicon oxynitride (SiO ｘ N ｙ ), titanium oxide (TiO ｘ ) and aluminum oxide (AlO ｘ The organic material includes at least one selected from the group consisting of thermosetting resin compositions, photosensitive resin compositions, and the like. The photosensitive resin composition includes, for example, an ultraviolet-curable resin composition. Specific examples of the organic material include at least one selected from the group consisting of acrylic resins, polyimide resins, novolac resins, epoxy resins, norbornene resins, parylene resins, and the like.

[0093] The protective layer 14 preferably includes a deposition layer in which atomic layers are deposited. The deposition layer may be an ALD (Atomic Layer Deposition) layer. When the protective layer 14 includes a deposition layer, the effect of the protective layer 14 in suppressing moisture penetration can be improved. The protective layer 14 includes, for example, a metal oxide or a metal nitride. The metal oxide is, for example, aluminum oxide (AlO ｘ ) or titanium oxide (TiO ｘ Metal nitrides include, for example, titanium nitride (TiN ｘ ) is included.

[0094] (Color Filter 15) The color filter 15 is a so-called on-chip color filter (OCCF). The color filter 15 is provided above the plurality of light-emitting elements 12. More specifically, the color filter 15 is provided on the first surface of the protective layer 14. The color filter 15 includes, for example, a plurality of colored layers 151R, a plurality of colored layers 151G, and a plurality of colored layers 151B. In the following description, when the colored layers 151R, 151G, and 151B are referred to collectively without any particular distinction, the colored layers 151R, 151G, and 151B may be simply referred to as colored layers 151.

[0095] The plurality of colored layers 151 are two-dimensionally arranged on the first surface of the protective layer 14 in a predetermined arrangement pattern. The predetermined arrangement pattern is as described above for the plurality of sub-pixels 1 and 2. Each colored layer 151 is provided above a light-emitting element 12. Sub-pixel 1R is composed of a light-emitting element 12a and a colored layer 151R provided above the light-emitting element 12a. Sub-pixel 1G is composed of a light-emitting element 12a and a colored layer 151G provided above the light-emitting element 12a. Sub-pixel 1B is composed of a light-emitting element 12a and a colored layer 151B provided above the light-emitting element 12a. Sub-pixel 2R is composed of a light-emitting element 12b and a colored layer 151R provided above the light-emitting element 12b. Sub-pixel 2G is composed of a light-emitting element 12b and a colored layer 151G provided above the light-emitting element 12b. The sub-pixel 2B is composed of a light-emitting element 12b and a colored layer 151B provided above the light-emitting element 12b.

[0096] The coloring layer 151R has a red color. The coloring layer 151R transmits the red light component of the white light emitted from the light-emitting element 12a but can absorb visible light components other than red light. The coloring layer 151G has a green color. The coloring layer 151G transmits the green light component of the white light emitted from the light-emitting element 12a but can absorb visible light components other than green light. The coloring layer 151B has a blue color. The coloring layer 151B transmits the blue light component of the white light emitted from the light-emitting element 12a but can absorb visible light components other than blue light.

[0097] The colored layer 151R includes, for example, a red color resist, the colored layer 151G includes, for example, a green color resist, and the colored layer 151B includes, for example, a blue color resist.

[0098] (Filled Resin Layer 16) The filled resin layer 16 is filled between the color filter 15 and the sealing glass 19. The filled resin layer 16 is translucent to the light of each color emitted from the color filter 15. The filled resin layer 16 is preferably transparent to visible light. The filled resin layer 16 may also function as an adhesive layer that bonds the color filter 15 and the sealing glass 19 together.

[0099] The filled resin layer 16 includes, for example, a curable resin. The curable resin includes at least one type selected from the group consisting of a thermosetting resin, an ultraviolet curable resin, etc. Note that the filled resin layer 16 is not limited to a thermosetting resin or an ultraviolet curable resin, and may include a type of curable resin other than a thermosetting resin or an ultraviolet curable resin.

[0100] (Contact portion 17) The contact portion 17 is provided on the peripheral portion of the first surface of the drive substrate 11. The contact portion 17 is an auxiliary electrode that connects the second electrode 123 to an underlying wiring or the like (not shown). The first surface of the contact portion 17 is connected to the peripheral portion of the second surface of the second electrode 123. Meanwhile, the second surface of the contact portion 17 is connected to the underlying wiring or the like via a contact plug. The contact portion 17 may have a closed loop shape surrounding the display region R1 in a plan view, but the shape of the contact portion 17 is not limited to a closed loop shape.

[0101] The contact portion 17 may be composed of a metal layer, or may be composed of a metal layer and a transparent conductive oxide layer. Examples of materials constituting the metal layer and the transparent conductive oxide layer include the same materials as those of the metal layer and the transparent conductive oxide layer of the first electrode 121. The contact portion 17 may have the same configuration as the first electrode 121.

[0102] (Sealing portion 18) The sealing portion 18 is provided between the peripheral edge of the first surface of the protective layer 14 and the peripheral edge of the second surface of the sealing glass 19, and covers the side surface of the filling resin layer 16. The sealing portion 18 bonds the peripheral edge of the first surface of the protective layer 14 and the peripheral edge of the second surface of the sealing glass 19 together, thereby sealing the gap between these peripheral edges.

[0103] The sealing portion 18 includes, for example, a curable resin. The curable resin includes, for example, at least one selected from the group consisting of a thermosetting resin, an ultraviolet curing resin, etc. More specifically, for example, the curable resin includes at least one selected from the group consisting of an epoxy resin, an acrylic resin, etc. Note that the curable resin is not limited to a thermosetting resin and an ultraviolet curing resin, and may include a type of curable resin other than a thermosetting resin and an ultraviolet curing resin.

[0104] (Sealing Glass 19) The sealing glass 19 is provided on the first surface of the filling resin layer 16 and on the first surface of the sealing portion 18. The sealing glass 19 seals the first surface side of the drive substrate 11 on which each component such as the plurality of light emitting elements 12 is provided. The sealing glass 19 is translucent to the light of each color emitted from the color filter 15. It is preferable that the sealing glass 19 is transparent to visible light. The sealing glass 19 is made of, for example, a glass substrate.

[0105] [Method for Manufacturing Display Device 101] Hereinafter, an example of a method for manufacturing the display device 101 according to the first embodiment will be described with reference to FIG.

[0106] (Step S11 of forming the driving substrate 11) First, a plurality of driving transistors are formed on the first surface of the substrate, and then an insulating layer including a plurality of contact plugs and a plurality of wirings is formed on the first surface of the substrate, thereby obtaining the driving substrate 11.

[0107] (Step S12 of forming first electrodes 121) Next, a metal layer and a metal oxide layer are sequentially formed on the first surface of the drive substrate 11 by, for example, sputtering, and then the metal layer and the metal oxide layer are patterned by, for example, photolithography. As a result, a plurality of first electrodes 121 are formed on the first surface of the drive substrate 11.

[0108] (Step S13 of forming insulating layer 13) Next, for example, by CVD (Chemical Vapor Deposition), the insulating layer 13 is formed on the first surface of the drive substrate 11 so as to cover the plurality of first electrodes 121. Next, for example, by photolithography, the insulating layer 13 is processed to form openings 13 a on the first surface of each first electrode 121.

[0109] (Step S14 of Forming OLED Layer 122) Next, for example, by vapor deposition, the hole injection layer 1221, the hole transport layer 1222, the red light-emitting layer 1220R, the emission separation layer 1223, the blue light-emitting layer 1220B, the green light-emitting layer 1220G, the electron transport layer 1224, and the electron injection layer 1225 are laminated in this order on the first surfaces of the plurality of first electrodes 121 and on the first surface of the insulating layer 13. This forms the OLED layer 122 having a single light-emitting unit U. When forming the OLED layer 122, the OLED layer 122 is continuously formed from the effective pixel region RE1 to the peripheral region RE2. Here, the step of forming the OLED layer 122 has been described as an example of the step of forming the OLED layer 122 having a single light-emitting unit U. However, the OLED layer 122 is not limited to having a single light-emitting unit U, and may have two light-emitting units U1 and U2, or may have other layer structures.

[0110] (Step S15 of forming second electrode 123) Next, the second electrode 123 is formed on the first surface of the OLED layer 122 by, for example, vapor deposition or sputtering. As a result, a plurality of light-emitting elements 12 are formed on the first surface of the drive substrate 11.

[0111] (Step S16 of Forming Protective Layer 14) Next, the protective layer 14 is formed on the first surface of the second electrode 123 by, for example, CVD or vapor deposition.

[0112] (Color filter 15 formation process S17) Next, a green color resist is applied to the first surface of the protective layer 14, and is pattern-exposed by ultraviolet irradiation through a photomask, and then developed, thereby forming a green colored layer 160G. Next, a red color resist is applied to the first surface of the protective layer 14, and is pattern-exposed by ultraviolet irradiation through a photomask, and then developed, thereby forming a red colored layer 160R. Next, a blue color resist is applied to the first surface of the protective layer 14, and is pattern-exposed by ultraviolet irradiation through a photomask, and then developed, thereby forming a blue colored layer 160B. In this way, the color filter 15 is formed on the first surface of the protective layer 14.

[0113] (Assembly Process S18) Next, a sealant is applied to the peripheral portion of the first surface of the protective layer 14 in the shape of a closed loop surrounding the effective pixel region RE1, forming a frame, and then a filling resin is applied inside this frame. Next, a sealing glass 19 is placed on the filling resin and sealant. Next, the sealant and filling resin are hardened by at least one of a heat treatment and an ultraviolet light irradiation treatment, for example. The sealing glass 19 and the exposed portion 14a are bonded together by a sealing portion 18, which is the hardened sealant, and a filling resin layer 16, which is the hardened filler resin, is formed inside the sealing portion 18. Note that the hardening method of the filling resin and sealant is not limited to a heat treatment and an ultraviolet light irradiation treatment, and hardening methods other than a heat treatment and an ultraviolet light irradiation treatment may also be used.

[0114] (Laser processing step S19) Next, a laser processing device continuously irradiates the peripheral region RE2 with laser light along the periphery of the effective pixel region RE1. As a result, a linear, closed-loop modified / cavity portion 122a is formed in the portion of the OLED layer 122 located in the peripheral region RE2. The laser processing device used is one that can irradiate laser light in a wavelength range that is absorbed by the constituent material of the OLED layer 122. It is preferable to use a laser processing device that can irradiate laser light in a wavelength range that does not have an absorption edge or is lowly absorbed by layers above the OLED layer 122, such as the second electrode 123, the protective layer 14, and the color filter 15, and for example, a short-pulse laser or the like is used.

[0115] An example of laser light irradiation conditions is shown below. Laser light source: Femtosecond laser CARBIDE Femtosecond Lasers - LIGHT CONVERSION CARBIDE - Phototechnica Co., Ltd. (phototechnica.co.jp) Laser wavelength: 515 nm (green laser) Pulse width: 290.7 fs Repetition frequency: 60 kHz Division: 1 Pulse energy: Approximately 80 to 190 nJ / pulse (output setting: 54%) Number of pulses: 1 to 8 pulses Number of shots: 1 to 2 Slit size: G, R = 4 x 5 um, B = 8 x 2.5 um

[0116] (Modularization step S20) Next, the drive substrate 11 on which each layer has been formed as described above is cut out and separated into individual pieces to obtain the display device 101. Next, a flexible printed wiring board is connected to the pad portion of the drive substrate 11 as necessary.

[0117] (Inspection Step S21) Next, various inspections are performed on the display device 101.

[0118] [Effects] As described above, in the display device 101 according to the first embodiment, the modified / cavity portion 122a is continuously provided in the OLED layer (organic material-containing layer serving as a moisture diffusion medium) 122 along the periphery of the effective pixel region RE1. As a result, when moisture penetrates the display device 101 from the outside through a film formation defect and diffuses from the effective pixel region RE1 toward the peripheral region RE2 using the OLED layer 122 as a moisture diffusion medium, the modified / cavity portion 122a can suppress or delay the moisture diffusion (see arrows 33 (moisture diffusion path) in Figures 4 and 5 ). This can prevent a decrease in the reliability of the display device 101. This can reduce field defects of the display device 101.

[0119] If moisture is contained in the sub-pixel 2 of the peripheral region RE2 during the manufacturing process, etc., the modified / hollow portion 122a can prevent this moisture from diffusing toward the peripheral region RE2 using the OLED layer 122 as a moisture diffusion medium.

[0120] 4. Second Embodiment In the first embodiment, an example in which the modified / hollow portion 122 a is provided in the peripheral region RE2 is described. In the second embodiment, an example in which the modified / hollow portion 122 a is provided in the effective pixel region RE1 is described.

[0121] 11 is an enlarged plan view showing a portion of the effective pixel region RE1 of the display device 102 according to the second embodiment. The modified / void portion 122a is provided within the effective pixel region RE1 and between adjacent sub-pixels 1. By providing the modified / void portion 122a between the sub-pixels 1 in this manner, damage to the sub-pixels 1 caused by the formation of the modified / void portion 122a (i.e., laser light irradiation) can be suppressed.

[0122] In the second embodiment, the modified / void portion 122a surrounds each subpixel 1B and also surrounds each subpixel pair formed by subpixels 1G and 1R. That is, with respect to subpixel 1B, the modified / void portion 122a is provided along the subpixel 1B on a subpixel-by-subpixel basis, and with respect to subpixels 1R and 1G, the modified / void portion 122a is provided along the subpixel pair on a subpixel-by-subpixel basis. However, the configuration of the modified / void portion 122a is not limited to this example. For example, the modified / void portion 122a may surround each of the subpixels 1B, 1G, and 1R, or may surround each of the subpixel blocks formed by two or more or three or more subpixels 1.

[0123] The modified / cavity portion 122a has a predetermined two-dimensional pattern in plan view. The modified / cavity portion 122a having the two-dimensional pattern is preferably provided over the entire effective pixel region RE1, but may be provided in a part of the effective pixel region RE1. Specifically, for example, the modified / cavity portion 122a having the two-dimensional pattern may be provided in the peripheral portion of the effective pixel region RE1.

[0124] When the two-dimensional pattern modified / cavity portion 122a is provided over the entire effective pixel region RE1 or in the peripheral portion of the effective pixel region RE1, the following advantage can be obtained: That is, when moisture diffuses from the peripheral region RE2 toward the effective pixel region RE1 using the OLED layer 122 as a moisture diffusion medium, the diffusion of the moisture can be suppressed or delayed at the boundary between the effective pixel region RE1 and the peripheral region RE2.

[0125] In the second embodiment, an example will be described in which the two-dimensional pattern of the modified / void portions 122a has a lattice shape corresponding to the arrangement pattern (square arrangement) of the sub-pixels 1, but the two-dimensional pattern of the modified / void portions 122a is not limited to this example. The modified / void portions 122a having such a two-dimensional pattern are formed, for example, by irradiating laser light between the sub-pixels 1 in the effective pixel region RE1.

[0126] The modified / void portion 122a may also be provided between subpixel 1, which is an effective subpixel, and subpixel 2, which is a dummy subpixel, i.e., between the effective pixel region RE1 and the peripheral region RE2. In the second embodiment, the modified / void portion 122a may or may not be provided in the peripheral region RE2. When the modified / void portion 122a is provided in the peripheral region RE2, the modified / void portion 122a may have the same shape (two-dimensional pattern) as the modified / void portion 122a provided in the effective pixel region RE1, or may have the same shape (closed loop) as the modified / void portion 122a in the first embodiment.

[0127] [Effects] As described above, in the display device 102 according to the second embodiment, the modified / void portion 122a is provided within the effective pixel region RE1 and between adjacent subpixels 1. This makes it possible to prevent moisture 34 contained in a subpixel 1 in the effective pixel region RE1 from diffusing from that subpixel 1 to surrounding subpixels 1 (see FIG. 11 ). This makes it possible to prevent the spread of dark dots and abnormal characteristics, thereby preventing a decrease in the reliability of the display device 102. This makes it possible to reduce field defects of the display device 102.

[0128] When moisture diffuses from the peripheral region RE2 toward the effective pixel region RE1 using the OLED layer 122 as a moisture diffusion medium, the modified / cavity portion 122a can also suppress or delay the diffusion of the moisture into the sub-pixel 1.

[0129] 47 is a cross-sectional view illustrating the process of moisture diffusion in a display device 104A according to Reference Example 1. The display device 104A according to Reference Example 1 includes a three-layer protective layer 14. The three-layer protective layer 14 includes a first inorganic protective layer 141, an organic protective layer 142, and a second inorganic protective layer 143, which are arranged in this order on a first surface of a second electrode 123.

[0130] In the display device 104A having the above configuration, moisture within the display device 104A or moisture entering from outside the display device 104A may spread from particles adhering to the protective layer 14 or other layers during the manufacturing process of the display device 104A or defects occurring in the protective layer 14 or other layers during the manufacturing process of the display device 104A, potentially reducing the reliability of the display device 104A. To ensure reliability, the protective layer 14 is composed of a highly embeddable organic protective layer 142 and a highly sealing first inorganic protective layer 141 and second inorganic protective layer 143. However, if a leak path 143a exists in part of the second inorganic protective layer 143, moisture may enter the organic protective layer 142 and diffuse through the organic protective layer 142, which has a high diffusion rate. This moisture diffusion may reduce the reliability of the display device 104A.

[0131] The present inventors have considered the moisture diffusion process and conducted extensive research into a technology that can suppress a decrease in reliability in the display device 103 that is provided with the laminated protective layer 14. As a result, they have discovered that the expansion of the moisture diffusion range (the range of damage) can be suppressed by providing at least one of a modified portion and a cavity portion in the organic protective layer 142 of the three-layered protective layer 14.

[0132] 48 is a cross-sectional view of a display device 104 according to a third embodiment. The display device 104 according to the third embodiment differs from the display device 101 according to the first embodiment in that it includes a protective layer 14 having a three-layer structure.

[0133] The protective layer 14 includes a first inorganic protective layer 141, an organic protective layer 142, and a second inorganic protective layer 143, arranged in this order on the first surface of the second electrode 123. The organic protective layer 142 is sandwiched between the first inorganic protective layer 141 and the second inorganic protective layer 143. The organic protective layer 142, the first inorganic protective layer 141, and the second inorganic protective layer 143 are provided from the effective pixel region RE1 to the peripheral region RE2. The peripheral edge of the first surface of the first inorganic protective layer 141 and the peripheral edge of the second surface of the second inorganic protective layer 143 are in contact in the peripheral region RE2. This seals the organic protective layer 142 with the first inorganic protective layer 141 and the second inorganic protective layer 143. This prevents moisture from penetrating into the organic protective layer 142 from the side of the display device 104A.

[0134] The organic protective layer 142 includes a modified / hollow portion 142a in the effective pixel region RE1. １ (See FIG. 49B) or void 142a ２ (See FIG. 49C)”. In the third embodiment, the effective pixel region RE1 may include the boundary between the effective pixel region RE1 and the peripheral region RE2.

[0135] Modified section 142a １ The cavity 142a is a portion of the organic protective layer 142 that has been modified. ２ is formed by a portion of the organic protective layer 142 disappearing and / or shrinking.

[0136] Modified section 142a １ The modification in this case refers to making it difficult for moisture to diffuse at least in the in-plane direction of the organic protective layer 142 by changing the structure or constituent materials of the organic protective layer 142. １is a moisture diffusion suppression portion configured to be able to suppress or delay moisture diffusion at least in the in-plane direction of the organic protective layer 142 .

[0137] 49A, 49B, and 49C, the modified portion 142a １ and cavity 142a ２ This article explains:

[0138] 49A is a cross-sectional view schematically illustrating the state of the organic protective layer 142 before the formation of the modified / cavity portion 142a. The organic protective layer 142 before the formation of the modified / cavity portion 142a can serve as a medium for diffusing moisture 34 in the in-plane direction of the organic protective layer 142. Therefore, if a leak path 143a exists in part of the second inorganic protective layer 143, moisture that penetrates into the organic protective layer 142 may diffuse within the organic protective layer 142.

[0139] FIG. 49B shows the modified portion 142a １ 10 is a cross-sectional view schematically illustrating the state of the organic protective layer 142 after the formation of the modified portion 142a. １ For example, the modified portion 142a has a state in which the molecular structure of the organic protective layer 142 has been changed. １ The modified portion 142a can suppress or delay moisture diffusion in the in-plane direction of the organic protective layer 142 and in the thickness direction of the organic protective layer 142. １ can be formed at a heating temperature of, for example, 350° C. or higher.

[0140] Figure 49B shows an example in which the entire organic protective layer 142 is modified from the first surface side of the first inorganic protective layer 141 to the second surface side of the second inorganic protective layer 143, but if only a portion of the range from the first surface side of the first inorganic protective layer 141 to the second surface side of the second inorganic protective layer 143 is modified, the above-mentioned moisture diffusion suppression or delay function can be obtained.

[0141] FIG. 49C shows the cavity 142a ２ 10 is a cross-sectional view schematically illustrating the state of the organic protective layer 142 after the formation of the cavity 142a. ２ The hollow portion 142a is formed, for example, by disappearance and / or shrinkage of the constituent material of the organic protective layer 142. ２The cavity 142a can increase the diffusion resistance against the moisture 34 diffusing in the in-plane direction of the organic protective layer 142. ２ has the effect of pooling the moisture 34 that has entered the organic protective layer 142 via the leak path 143a or the like (pooling effect).

[0142] Figure 49C shows an example in which the entire organic protective layer 142 from the first surface side of the first inorganic protective layer 141 to the second surface side of the second inorganic protective layer 143 has disappeared and / or shrunk, but the above-mentioned function of increasing diffusion resistance and pool effect can be obtained if only a portion of the range from the first surface side of the first inorganic protective layer 141 to the second surface side of the second inorganic protective layer 143 has disappeared and / or shrunk.

[0143] Modified section 142a １ and cavity 142a ２ The modified portion 142a is formed by, for example, laser processing the organic protective layer 142. １ and cavity 142a ２ The hollow portion 142a can be selectively formed by, for example, adjusting the heating temperature of the organic protective layer 142 by laser light irradiation. ２ For example, the modified portion 142a １ It is possible to form the film at a higher heating temperature than when forming the film.

[0144] 50 , the modified / void portion 142a is selectively provided around a defect such as a particle 31 present in the effective pixel region RE1. More specifically, the modified / void portion 142a is provided between adjacent sub-pixels 1 so as to selectively surround the defect such as a particle 31 present in the effective pixel region RE1 in a plan view. The modified / void portion 142a preferably has a closed loop shape in a plan view. From the viewpoint of suppressing the influence on the light emission of the sub-pixel 1, the modified / void portion 142a is preferably provided between adjacent sub-pixels 1.

[0145] In the third embodiment, an example will be described in which the modified / cavity portion 142a is selectively provided around a defect such as a particle 31 present in the effective pixel region RE1, but the formation position of the modified / cavity portion 142a is not limited to this example. For example, the modified / cavity portion 142a may be selectively provided around a defect such as a particle 31 present in the peripheral region RE2.

[0146] The first inorganic protective layer 141 and the second inorganic protective layer 143 contain an inorganic material. The inorganic material is, for example, silicon oxide (SiO ｘ ), silicon nitride (SiN ｘ ), silicon oxynitride (SiO ｘ N ｙ ), titanium oxide (TiO ｘ ) and aluminum oxide (AlO ｘ ) and the like. The inorganic materials contained in the first inorganic protective layer 141 and the second inorganic protective layer 143 may be the same material or different materials. The first inorganic protective layer 141 and the second inorganic protective layer 143 may include a deposition layer in which atomic layers are deposited. The deposition layer may be an ALD (Atomic Layer Deposition) layer.

[0147] The organic protective layer 142 includes, for example, an organic material. The organic material includes, for example, a cured product of at least one resin selected from the group consisting of a thermosetting resin composition and a photosensitive resin composition. The photosensitive resin composition includes, for example, an ultraviolet-curable resin composition. Specifically, the organic material includes, for example, at least one resin selected from the group consisting of an acrylic resin, a polyimide resin, a novolac resin, an epoxy resin, a norbornene resin, and a parylene resin.

[0148] In the above description, with reference to FIG. 50 , the arrangement pattern of the plurality of sub-pixels 2R, 2G, and 2B has been described as a square arrangement. However, the technical idea described in the third embodiment is not limited to a square arrangement. For example, the technical idea described in the third embodiment can also be applied to a display device 104 in which the plurality of sub-pixels 2R, 2G, and 2B are arranged in a delta configuration.

[0149] [Method for manufacturing display device 104] Hereinafter, an example of a method for manufacturing the display device 104 according to the third embodiment will be described with reference to Fig. 51. The steps other than the step S24 for forming the first inorganic protective layer 141 to the laser processing step S28 are the same as the method for manufacturing the display device 101 according to the first embodiment, and therefore only these steps will be described here.

[0150] (Step S24 of Forming First Inorganic Protective Layer 141) After the second electrode 123 is formed, the first inorganic protective layer 141 is formed on the first surface of the second electrode 123 by, for example, CVD or vapor deposition.

[0151] (Step S25 of forming organic protective layer 142) Next, a resin composition is applied onto the first surface of the first inorganic protective layer 141. Next, the resin composition is cured by, for example, at least one of a heat treatment and an ultraviolet irradiation treatment, to form the organic protective layer 142. Note that the method for curing the resin composition is not limited to the heat treatment and the ultraviolet irradiation treatment, and a curing method other than the heat treatment and the ultraviolet irradiation treatment may also be used.

[0152] (Step S26 of Forming Second Inorganic Protective Layer 143) Next, the second inorganic protective layer 143 is formed on the first surface of the organic protective layer 142 by, for example, CVD or vapor deposition.

[0153] (Inspection step S27) Next, the inspection device inspects the effective pixel region RE1 for defects. If the inspection device detects a defect such as a particle 31 in the effective pixel region RE1, it transmits defect-related information (information on the position and size of the defect, etc.) to the laser light irradiation device. The inspection step S27 is performed at least once after the formation step S26 of the second inorganic protective layer 143 and before the laser processing step S28.

[0154] (Laser processing step S28) Next, based on the defect-related information, the laser light irradiation device irradiates the organic protective layer 142 in the effective pixel region RE1 with laser light so as to surround the periphery of the defect such as the particle 31. As a result, a modified / cavity portion 142a is formed.

[0155] [Effects] As described above, in the display device 104 according to the third embodiment, the organic protective layer 142 includes modified / void portions 142a selectively provided around defects such as particles 31. This allows the modified / void portions 142a to suppress or delay the diffusion of moisture that would otherwise infiltrate the organic protective layer 142 via the leak path 143a (see arrows 33 (moisture diffusion path) in FIG. 48 ) even if a leak path 143a is formed in part of the second inorganic protective layer 143 due to a defect such as a particle 31. Therefore, a decrease in the reliability of the display device 101 can be suppressed.

[0156] In the manufacturing method of the display device 104 according to the third embodiment, based on the results of the defect inspection, laser light is selectively irradiated around defects such as particles 31 that pose a risk of reducing reliability (for example, a risk of increasing the number of dark spots), thereby forming a modified / hollow portion 142a.

[0157] 52 is a cross-sectional view illustrating the process of moisture diffusion in a display device 105A according to Reference Example 2. Moisture that has infiltrated into the organic protective layer 142 via a leak path 143 a in the second inorganic protective layer 143 diffuses through the organic protective layer 142, and then may infiltrate into the OLED layer 122 via a portion of the first inorganic protective layer 141 near the particle 31 (e.g., a defective portion near the particle 31) where coverage is poor, and may then diffuse throughout the OLED layer 122 over time. The portion of the OLED layer 122 into which moisture has infiltrated may potentially become a non-light-emitting area. Therefore, if moisture diffuses into the organic protective layer 142 and the OLED layer 122 as described above, the reliability of the display device 105A may be reduced.

[0158] The present inventors have considered the moisture diffusion process and conducted extensive research into a technique capable of suppressing a decrease in reliability in the display device 103 provided with the laminated protective layer 14. As a result, they have discovered that by providing at least one of a modified portion and a cavity portion in both the organic protective layer 142 and the OLED layer 122, it is possible to suppress the spread of the moisture diffusion range (the range of damage) in both the organic protective layer 142 and the OLED layer 122.

[0159] 53 is a cross-sectional view of a display device 105 according to a fourth embodiment. The display device 105 according to the fourth embodiment differs from the display device 104 according to the third embodiment in that it includes an OLED layer 122 that includes a modified / cavity portion 122a.

[0160] The modified / hollow portion 122a is provided so as to overlap the modified / hollow portion 142a in the thickness direction of the display device 104. That is, the modified / hollow portion 122a is located below the modified / hollow portion 142a. The modified / hollow portion 122a may have substantially the same shape as the modified / hollow portion 142a in a planar view. Specifically, the modified / hollow portion 122a may have substantially the same closed loop shape as the modified / hollow portion 142a in a planar view. From the viewpoint of suppressing the influence on the light emission of the subpixel 1, it is preferable that the modified / hollow portion 122a be provided between adjacent subpixels 1. The modified / hollow portion 122a may be similar to the modified / hollow portion 122a of the first embodiment in all other respects.

[0161] [Method for manufacturing display device 105] The method for manufacturing display device 105 is the same as the method for manufacturing display device 104 according to the third embodiment, except that modified / hollow portion 142a and modified / hollow portion 122a are formed simultaneously by irradiating laser light simultaneously to organic protective layer 142 and OLED layer 122 in effective pixel region RE1.

[0162] [Effects] As described above, in the display device 105 according to the fourth embodiment, the organic protective layer 142 includes a modified / void portion 142a selectively provided around a defect such as a particle 31, and the OLED layer 122 includes a modified / void portion 122a provided so as to overlap the modified / void portion 142a in the thickness direction of the display device 104. This configuration allows the modified / void portion 142a to suppress or delay the diffusion of moisture that has infiltrated into the organic protective layer 142. Furthermore, the modified / void portion 142a can also suppress or delay the diffusion of moisture that has infiltrated into the OLED layer 122 via a portion of the first inorganic protective layer 141 near the particle 31 (e.g., a defect near the particle 31) where coverage is poor (see arrow 33 (the moisture diffusion path) in FIG. 53 ). This further reduces the deterioration of the reliability of the display device 101.

[0163] 9. Modifications [Modification 1] In the first embodiment, an example has been described in which the modified / hollow portion 122a is provided continuously along the periphery of the effective pixel region RE1 (see FIG. 4). However, the modified / hollow portion 122a is not limited to this example, and may be provided intermittently along the periphery of the effective pixel region RE1, as shown in FIG.

[0164] The modified / hollow portion 122a is composed of a plurality of fragments 122b arranged at a distance from each other. The fragments 122b are arranged in a staggered pattern to form two rows. More specifically, the fragments 122b form two rows, and the fragments 122b included in the first row are arranged offset in the circumferential direction of the peripheral region RE2 relative to the fragments 122b included in the second row. The ends of the fragments 122b included in the first row and the ends of the fragments 122b included in the second row may be arranged to face each other in a plan view.

[0165] In the display device 101 according to the first modification, the fragments 122b can prevent and divert moisture from diffusing from the effective pixel region RE1 toward the peripheral region RE2 (see arrow 33 (the moisture diffusion path) in FIG. 12 ). Therefore, the diffusion of moisture from the effective pixel region RE1 to the peripheral region RE2 can be delayed, and a decrease in the reliability of the display device 101 can be suppressed.

[0166] The configuration in which the modified / cavity portions 122a are provided intermittently is particularly effective when the second electrode 123 includes a metal layer. When the second electrode 123 includes a metal layer (e.g., a metal layer containing magnesium (Mg) and silver (Ag)), holes or the like may be formed in the metal layer in the laser processing step S19 (see FIG. 10 ) located above the modified / cavity portions 122a. By providing the modified / cavity portions 122a intermittently, even when holes or the like are formed in the metal layer, a voltage drop in the second electrode 123 can be suppressed. Therefore, a decrease in brightness of the display device 101 can be suppressed.

[0167] 13, the modified / hollow portion 122a may have a predetermined two-dimensional pattern in plan view. Examples of the two-dimensional pattern include a mesh pattern, a geometric pattern, a lattice pattern, and a stripe pattern, but the two-dimensional pattern is not limited to these shapes.

[0168] In the display device 101 of variant example 2, as in the display device 101 of variant example 1, the diffusion of moisture from the effective pixel region RE1 to the peripheral region RE2 can be delayed, thereby suppressing a decrease in the reliability of the display device 101.

[0169] [Variation 3] As shown in Figure 14, the peripheral region RE2 may include a region where the density of the modified / hollow portions 122a decreases from the inner periphery to the outer periphery of the peripheral region RE2. By including such a region in the peripheral region RE2, it is possible to guide moisture diffusion in the direction of the lower density of the modified / hollow portions 122a. The modified / hollow portions 122a may or may not be provided in the region where the density of the modified / hollow portions 122a is lowest. Note that Figure 14 shows an example in which the peripheral region RE2 includes a first region where the density D of the modified / hollow portions 122a is a predetermined value (D > 0) and a second region where the density D of the modified / hollow portions 122a is D = 0.

[0170] [Variation 4] As shown in Figure 15, the modified / cavity section 122a may be selectively provided in a portion of the peripheral region RE2 where defects such as particles 31 exist, and may surround the defects such as particles 31 in a planar view.

[0171] The modified / hollow portion 122a may have a closed or open loop shape in plan view. Here, the open loop shape refers to a loop shape in which a portion of the side facing the outer periphery of the peripheral region RE2 is open in plan view. Specific examples of closed loop shapes include, but are not limited to, a substantially circular shape, a substantially polygonal shape (e.g., a substantially rectangular shape), a substantially elliptical shape, etc. Specific examples of open loop shapes include, but are not limited to, a substantially U-shape, a substantially V-shape, a substantially semicircular shape, a substantially semielliptical shape, etc. Note that FIG. 15 shows an example in which the modified / hollow portion 122a has a substantially U-shaped open loop shape in plan view.

[0172] 16, an example of a manufacturing method of the display device 101 according to Modification 4 will be described. Since the steps other than the defect inspection step S22 and the laser processing step S23 are the same as those in the manufacturing method of the display device 101 according to the first embodiment, only the defect inspection step S22 and the laser processing step S23 will be described here.

[0173] In the defect inspection process S22, the inspection device inspects the effective pixel region RE1 and the peripheral region RE2 for defects. Note that the inspection device may inspect only the peripheral region RE2 for defects. If the inspection device detects a defect such as a particle 31 in the peripheral region RE2, it transmits information such as the position and size of the defect (hereinafter referred to as "defect-related information") to the laser light irradiation device. The defect inspection process S22 is performed at least once after the OLED layer 122 formation process S14 and before the laser processing process S23.

[0174] In the laser processing step S23, the laser light irradiation device irradiates the peripheral region RE2 with laser light based on the defect-related information so as to surround the periphery of the defect such as the particle 31. As a result, a modified / cavity portion 122a surrounding the periphery of the defect such as the particle 31 is formed in the OLED layer 122.

[0175] In the display device 101 according to variant example 4, the modified / hollow portion 122a surrounds defects such as particles 31 in a planar view, thereby suppressing the spread of damage (damage due to moisture diffusion) originating from defects such as particles 31.

[0176] [Variation 5] In Variation 4, an example was described in which the modified / void portion 122a is selectively provided in a portion of the peripheral region RE2 where a defect such as a particle 31 exists, and surrounds the defect such as the particle 31 in a planar view. However, the shape of the modified / void portion 122a selectively provided in the portion where a defect exists is not limited to this example, and the modified / void portion 122a does not have to surround the defect. For example, the modified / void portion 122a may be provided only in a portion that is on the effective pixel region RE1 side when viewed from the defect such as the particle 31. In this case, the shape of the modified / void portion 122a in a planar view may be, for example, a straight line parallel to the outer periphery of the effective pixel region RE1 or a curved line protruding toward the outer periphery of the effective pixel region RE1, but is not limited to these shapes.

[0177] [Modification 6] In the first embodiment, an example (see FIG. 10) has been described in which the laser processing step S19 is provided between the assembly step S18 and the modularization step S20. However, the timing of the laser processing step S19 is not limited to this example, and for example, as shown in FIG. 17, the laser processing step S19 may be provided between the modularization step S20 and the inspection step S21.

[0178] Similarly, in the manufacturing method of the display device 101 according to Modification 4, the laser processing step S23 may be provided between the modularization step S20 and the inspection step S21. In this case, the defect inspection step S22 is performed at least once after the OLED layer 122 formation step S14 and before the laser processing step S23.

[0179] [Variation 7] In the first and second embodiments, an example was described in which the plurality of subpixels 1R, 1G, and 1B and the plurality of subpixels 2R, 2G, and 2B are arranged in a square array (see FIGS. 4 and 11). Also, in the third and fourth embodiments, an example was described in which the plurality of subpixels 1R, 1G, and 1B are arranged in a square array (see FIG. 50). However, the arrangement pattern of the plurality of subpixels 1R, 1G, and 1B and the plurality of subpixels 2R, 2G, and 2B is not limited to this example, and may be, for example, a delta array, a stripe array, a mosaic array, or any other arrangement.

[0180] In the second embodiment, an example has been described in which the modified / cavity portion 122a has a lattice pattern corresponding to the square arrangement of the plurality of sub-pixels 1R, 1G, and 1B. However, the shape pattern of the modified / cavity portion 122a is not limited to this example and may be selected corresponding to the arrangement pattern of the plurality of sub-pixels 1R, 1G, and 1B. For example, when the plurality of sub-pixels 1R, 1G, and 1B are arranged in a delta configuration, the modified / cavity portion 122a may have a honeycomb pattern. When the plurality of sub-pixels 1R, 1G, and 1B are arranged in a stripe configuration or a mosaic configuration, the modified / cavity portion 122a may have a lattice or stripe pattern.

[0181] 18 shows an example of subpixels 1R, 1G, and 1B arranged in a delta configuration. The modified / cavity portion 122a is provided for each subpixel so as to surround each of the delta-arranged subpixels 1. The modified / cavity portion 122a has a honeycomb shape in plan view.

[0182] In the above example, the modified / void portion 122a is provided on a sub-pixel basis so as to surround each sub-pixel 1. However, the unit in which the modified / void portion 122a is provided is not limited to a sub-pixel basis. For example, the modified / void portion 122a may be provided on a pixel basis so as to surround each pixel formed by a predetermined number of adjacent sub-pixels 1 (e.g., each pixel formed by three sub-pixels 1R, 1G, and 1B), or may be provided on a sub-pixel block basis so as to surround each sub-pixel block formed by a predetermined number of adjacent sub-pixels 1. In other words, the modified / void portion 122a may be provided along the pixel or sub-pixel block. In this case, it is possible to prevent moisture contained in the pixel or sub-pixel block from diffusing from the pixel or sub-pixel block to surrounding sub-pixels 1.

[0183] [Variation 8] In the second embodiment, an example (see FIG. 11 ) has been described in which the modified / cavity portion 122a having a two-dimensional pattern is provided in the effective pixel region RE1, but the modified / cavity portion 122a provided in the effective pixel region RE1 is not limited to this example. For example, as shown in FIG. 19 , the modified / cavity portion 122a may be selectively provided around a defect such as a particle 31 present in the effective pixel region RE1. More specifically, the modified / cavity portion 122a may be provided between adjacent sub-pixels 1 so as to selectively surround a defect such as a particle 31 present in the effective pixel region RE1 in a plan view. It is preferable that the modified / cavity portion 122a have a closed loop shape in a plan view.

[0184] In the display device 102 according to the eighth modification, the modified / void portion 122a is selectively provided around a defect such as a particle 31, and therefore it is possible to suppress a deterioration in the characteristics of the display device 102 caused by the formation of the modified / void portion 122a. In addition, it is possible to shorten the time required for the laser processing step S23 (see FIG. 16 ), thereby suppressing a decrease in productivity of the display device 102 caused by the formation of the modified / void portion 122a.

[0185] The manufacturing method of the display device 102 according to Modification 8 is the same as the manufacturing method of the display device 101 according to Modification 4 (see FIG. 16 ), except for the following points: In a defect inspection step S22, if the inspection device detects a defect such as a particle 31 in the effective pixel region RE1, the inspection device transmits defect-related information to a laser light irradiation device. In a laser processing step S23, the laser light irradiation device irradiates the effective pixel region RE1 with laser light so as to surround the defect such as the particle 31, based on the defect-related information.

[0186] In the manufacturing method of the display device 102 according to variant example 8, based on the results of the defect inspection, laser light can be selectively irradiated around defects such as particles 31 that pose a risk of reducing reliability (for example, a risk of increasing the number of dark spots), thereby forming a modified / hollow portion 122a.

[0187] In the above description, with reference to Fig. 19 , the arrangement pattern of the plurality of sub-pixels 1R, 1G, and 1B has been described as a square arrangement. However, the technical idea described in Modification 8 is not limited to the arrangement pattern of the plurality of sub-pixels 1R, 1G, and 1B. For example, as shown in Fig. 20 , the technical idea described in Modification 8 can also be applied to a display device 101 in which the plurality of sub-pixels 1R, 1G, and 1B are arranged in a delta configuration.

[0188] [Modification 9] In the first and second embodiments, the OLED layer 122 has the modified portion 122a. １ (See FIG. 7B), modified section 122a ２ (See FIG. 8A) or a void 122a ３However, the configuration of the OLED layer 122 is not limited to this example. １ , modified section 122a ２ and a void 122a ３ may contain at least one of the following:

[0189] 21 , a display device 101 according to Modification 10 differs from the display device 101 according to the first embodiment in that it further includes a lens array 20. Note that the lens array 20 may be included in the display device 102 according to the second embodiment, the display device 103 according to the third embodiment, and the display device 104 according to the fourth embodiment.

[0190] The lens array 20 is provided on the first surface of the color filter 15. The lens array 20 includes a plurality of lenses 201. The lenses 201 can collect light emitted upward from the light-emitting elements 12 and incident through the colored layer 151 in a forward direction. The lenses 201 are convex lenses having a convex collecting surface on the side opposite the light-emitting elements 12. The collecting surface of the lenses 201 preferably has a convex curved surface shape. The plurality of lenses 201 are so-called on-chip microlenses (OCLs), and are two-dimensionally arranged on the first surface of the color filter 15 in a predetermined arrangement pattern. The predetermined arrangement pattern is as described above for the predetermined arrangement pattern of the plurality of sub-pixels 1 and 2. The center of the lens 201 may substantially coincide with the center of the light-emitting region of the light-emitting element 12 in a planar view.

[0191] The refractive index n of the lens 201 １ is the refractive index n of the filled resin layer 16 ２ is preferably higher than (n ２ <n １ The refractive index n of the lens 201 １ is the refractive index n of the filled resin layer 16 ２ , the light can be refracted and focused at the interface between the lens 201 and the filling resin layer 16. Therefore, the light extraction function can be improved.

[0192] The lens 201 includes, for example, an organic material or an inorganic material that is transparent to visible light. The organic material includes, for example, a cured product of a photosensitive resin composition such as an ultraviolet curable resin composition. The inorganic material includes, for example, silicon nitride (SiN ｘ ) and silicon oxynitride (SiO ｘ N ｙ The lens 201 may contain a filler. By adjusting the content of the filler contained in the lens 201, the refractive index n １ The filler may be an inorganic filler. The inorganic filler may be, for example, aluminum oxide (AlO ｘ ), titanium oxide (TiO ｘ ) and zirconium oxide (ZrO ｘ The filler may be a hollow filler.

[0193] [Variation 11] Throughout the effective pixel region RE1, the center of the colored layer 151 may be approximately aligned with the center of the light-emitting region of the light-emitting element 12 in the in-plane direction. However, the positional relationship between the colored layer 151 and the light-emitting element 12 is not limited to this example. For example, in the central portion of the effective pixel region RE1, the center of the colored layer 151 may be approximately aligned with the center of the light-emitting region of the light-emitting element 12 in the in-plane direction, whereas in the peripheral portion of the effective pixel region RE1, the center of the colored layer 151 may be shifted toward the outer periphery of the effective pixel region RE1 in the in-plane direction relative to the center of the light-emitting region of the light-emitting element 12. In this case, the principal ray axis in the peripheral portion of the effective pixel region RE1 can be tilted outward from the effective pixel region RE1 relative to the normal (Z-axis) to the display surface. This allows the display device 101 to have a wide FOV (Field Of View).

[0194] As described in variant example 10, when the display device 101 includes a lens array 20, in the central part of the effective pixel area RE1, the centers of the colored layer 151 and the lens 201 are approximately aligned with the center of the light-emitting area of ​​the light-emitting element 12 in the in-plane direction, whereas in the peripheral part of the effective pixel area RE1, the centers of the colored layer 151 and the lens 201 may be shifted toward the outer periphery of the effective pixel area RE1 in the in-plane direction with reference to the center of the light-emitting area of ​​the light-emitting element 12.

[0195] The technical idea described in Modification 11 can also be applied to the display device 102 according to the second embodiment, the display device 103 according to the third embodiment, and the display device 104 according to the fourth embodiment.

[0196] [Modification 12] From the viewpoint of improving light extraction efficiency and / or improving color purity, the light emitting element 12 may have a resonator structure.

[0197] When the first electrode 121 is a reflective electrode that functions as a reflective layer, a resonator structure may be formed by the first electrode 121 and the second electrode 123. In this case, the optical distance between the first electrode 121 and the second electrode 123 may be set by the thickness of the OLED layer 122, by selecting the material of the first electrode 121, or by a combination of these.

[0198] When the first electrode 121 is a transparent electrode, a reflective layer may be provided below the transparent electrode, and a resonator structure may be formed by the reflective layer and the second electrode 123. In this case, the optical distance between the reflective layer and the second electrode 123 may be set by the thickness of the OLED layer 122, by selecting the material of the reflective layer, by the thickness of an insulating layer provided between the first electrode 121 (transparent electrode) and the reflective layer, or by a combination of two or more of these.

[0199] [Variation 13] In the first and second embodiments, examples have been described in which the display devices 101 and 102 include a plurality of light-emitting elements 12 capable of emitting white light and a color filter 15, and a combination of these elements is used to display a color image. However, the colorization method of the display devices 101 and 102 is not limited to this. For example, the display devices 101 and 102 may include a plurality of light-emitting elements capable of emitting red light, a plurality of light-emitting elements capable of emitting green light, and a plurality of light-emitting elements capable of emitting blue light, instead of the plurality of light-emitting elements 12 capable of emitting white light. In this case, the color filter 15 is not an essential component and may or may not be included.

[0200] The light-emitting element capable of emitting light of a predetermined color (red light, green light, or blue light) is, for example, (1) a light-emitting element including a light-emitting layer capable of emitting light of a predetermined color (red light, green light, or blue light); (2) a light-emitting element including a light-emitting layer capable of emitting white light and capable of resonating and emphasizing light of a predetermined wavelength (red light, green light, or blue light) contained in the white light emitted by the light-emitting layer using a resonator structure; or (3) a light-emitting element including a light-emitting layer capable of emitting light of a predetermined color (red light, green light, or blue light) and capable of resonating and emphasizing light of a predetermined wavelength contained in the light of a predetermined color emitted by the light-emitting layer using a resonator structure.

[0201] The technical idea described in Modification 13 can also be applied to the display device 103 according to the third embodiment and the display device 104 according to the fourth embodiment.

[0202] [Modification 14] In the first and second embodiments, examples in which the color filter 15 is provided have been described. However, a quantum dot layer may be provided instead of the color filter 15, or a quantum dot layer may be provided together with the color filter 15. The quantum dot layer is a color conversion layer that contains quantum dots (semiconductor particles) and can convert the color of light emitted from the plurality of light-emitting elements 12. In this case, the plurality of light-emitting elements 12 may be configured to emit blue light.

[0203] The technical idea described in Modification 14 can also be applied to the display device 103 according to the third embodiment and the display device 104 according to the fourth embodiment.

[0204] [Modification 15] In the first and second embodiments, examples have been described in which the light-emitting elements 12 are OLED elements. However, the light-emitting elements 12 are not limited to these examples and may be, for example, self-luminous light-emitting elements such as LED (Light Emitting Diode) elements, inorganic electroluminescence (IEL) elements, quantum dot light-emitting diode (QLED) elements, or semiconductor laser elements. Two or more types of light-emitting elements selected from these light-emitting elements may be provided in the display devices 101 and 102.

[0205] The technical idea described in Modification 15 can also be applied to the display device 103 according to the third embodiment and the display device 104 according to the fourth embodiment.

[0206] [Modification 16] In the third embodiment, an example has been described in which the modified / cavity portions 142a are selectively provided around defects such as particles 31 present in the effective pixel region RE1 in a plan view. However, the modified / cavity portions 142a provided in the effective pixel region RE1 are not limited to this example. For example, as shown in FIG. 54 , the modified / cavity portions 142a may be provided in a two-dimensional pattern in the effective pixel region RE1. The modified / cavity portions 142a may also be provided in a two-dimensional pattern in the peripheral region RE2. The shape of the two-dimensional pattern of the modified / cavity portions 142a may be the same as the two-dimensional pattern of the modified / cavity portions 122a in the second embodiment. For example, the two-dimensional pattern of the modified / cavity portions 142a may have a lattice shape corresponding to the arrangement pattern (square arrangement) of the subpixels 1.

[0207] As described above, in the display device 104 according to Modification 16, the modified / cavity portion 142a having a two-dimensional pattern is provided in the effective pixel region RE1. This makes it possible to prevent moisture 34 contained in a subpixel 1 in the effective pixel region RE1 from diffusing from that subpixel 1 to surrounding subpixels 1 (see FIG. 54 ). This makes it possible to prevent the spread of dark dots and characteristic anomalies, thereby preventing a decrease in the reliability of the display device 104. This in turn makes it possible to reduce field defects of the display device 104.

[0208] [Modification 17] In the fourth embodiment, an example has been described in which the modified / cavity portions 142a and the modified / cavity portions 122a are selectively provided around defects such as particles 31 present in the effective pixel region RE1 in a plan view. However, the modified / cavity portions 142a and the modified / cavity portions 122a provided in the effective pixel region RE1 are not limited to this example. For example, the modified / cavity portions 142a and the modified / cavity portions 122a having two-dimensional patterns may be provided in the effective pixel region RE1. The modified / cavity portions 142a and the modified / cavity portions 122a having two-dimensional patterns may also be provided in the peripheral region RE2. The shapes of the two-dimensional patterns of the modified / cavity portions 142a and the modified / cavity portions 122a may be the same as the shapes of the two-dimensional patterns of the modified / cavity portions 122a in the second embodiment. For example, the two-dimensional pattern of the modified / cavity portions 142a and the two-dimensional pattern of the modified / cavity portions 122a may have a lattice shape corresponding to the arrangement pattern of the subpixels 1 (square arrangement).

[0209] As described above, in the display device 105 according to the seventeenth modification, the two-dimensional pattern modified / cavity portion 142a and the two-dimensional pattern modified / cavity portion 122a are provided in the effective pixel region RE1. This further suppresses a decrease in the reliability of the display device 104. Therefore, the number of defective products in the market of the display device 104 can be further reduced.

[0210] [Variation 18] In Variation 16, an example was described in which the modified / cavity portion 122a has a lattice pattern corresponding to the square arrangement of the subpixels 1R, 1G, and 1B. However, the shape pattern of the modified / cavity portion 122a is not limited to this example. The two-dimensional pattern of the modified / cavity portion 142a can be selected to correspond to the arrangement pattern of the subpixels 1R, 1G, and 1B. For example, when the subpixels 1R, 1G, and 1B are arranged in a delta configuration, the modified / cavity portion 142a may be provided on a subpixel-by-subpixel basis to surround each subpixel 1 and have a honeycomb pattern. When the subpixels 1R, 1G, and 1B are arranged in a stripe or mosaic configuration, the modified / cavity portion 142a may be provided on a subpixel-by-subpixel basis to surround each subpixel 1 and have a lattice or stripe pattern.

[0211] In the above example, the modified / void portion 142a is provided on a sub-pixel basis so as to surround each sub-pixel 1. However, the unit in which the modified / void portion 142a is provided is not limited to a sub-pixel basis. For example, the modified / void portion 142a may be provided on a pixel basis so as to surround each pixel formed by a predetermined number of adjacent sub-pixels 1 (e.g., each pixel formed by three sub-pixels 1R, 1G, and 1B), or may be provided on a sub-pixel block basis so as to surround each sub-pixel block formed by a predetermined number of adjacent sub-pixels 1. In other words, the modified / void portion 142a may be provided along the pixel or sub-pixel block. In this case, it is possible to prevent moisture contained in the pixel or sub-pixel block from diffusing from the pixel or sub-pixel block to surrounding sub-pixels 1.

[0212] The technical idea explained in Modification 18 can be applied to both the modified / hollow portion 142a and the modified / hollow portion 122a in Modification 17.

[0213] [Modification 19] In the third and fourth embodiments, examples have been described in which the protective layer 14 has a three-layer structure. However, the number of layers in the protective layer 14 is not limited to this example. For example, the protective layer 14 may be a single-layer protective layer made of an organic protective layer, or a protective layer having a two-layer structure or a stacked structure of four or more layers. When the protective layer 14 has a two-layer structure, the two-layer protective layer includes, for example, an organic protective layer and an inorganic protective layer. When the protective layer 14 has a stacked structure of four or more layers, the stacked protective layer includes at least one organic protective layer. From the viewpoint of suppressing the intrusion of moisture and the like into the organic protective layer, it is preferable that the at least one organic protective layer be sandwiched between a first inorganic protective layer and a second inorganic protective layer.

[0214] [Variation 20] In the fourth embodiment, an example has been described in which the modified / hollow portion 122a is arranged to overlap the modified / hollow portion 142a in the thickness direction of the display device 104. However, the positional relationship between the modified / hollow portion 122a and the modified / hollow portion 142a is not limited to this example. For example, the modified / hollow portion 122a and the modified / hollow portion 142a may be concentric in a planar view. More specifically, the modified / hollow portion 122a may be arranged to surround the modified / hollow portion 142a in a planar view, or the modified / hollow portion 142a may be arranged to surround the modified / hollow portion 122a in a planar view.

[0215] Furthermore, in the fourth embodiment, an example was described in which the modified / hollow portion 122a and the modified / hollow portion 142a have the same shape when viewed in a plane, but the modified / hollow portion 122a and the modified / hollow portion 142a may have shapes different from each other when viewed in a plane.

[0216] [Other Modifications] The first, second, third, and fourth embodiments of the present disclosure and their modifications (hereinafter referred to as "first embodiment, etc.") have been specifically described above, but the present disclosure is not limited to the first embodiment, etc., and various modifications based on the technical ideas of the present disclosure are possible.

[0217] For example, the configurations, methods, processes, shapes, materials, and numerical values, etc., given in the first embodiment, etc., are merely examples, and different configurations, methods, processes, shapes, materials, and numerical values, etc., may be used as necessary.

[0218] The configurations, methods, steps, shapes, materials, numerical values, etc. of the first embodiment etc. can be combined with each other as long as they do not deviate from the gist of this disclosure.

[0219] Unless otherwise specified, the materials exemplified in the first embodiment and the like can be used singly or in combination of two or more.

[0220] It is possible to combine two or more of the configurations of Modifications 1 to 15. It is also possible to combine two or more of the configurations of Modifications 1 to 20.

[0221] The present disclosure may also employ the following configurations. (1) A display device comprising an organic-material-containing layer including an organic light-emitting layer, the organic-material-containing layer being provided from an effective pixel area to a peripheral area outside the effective pixel area, the organic-material-containing layer including at least one of a modified portion and a cavity. (2) The display device according to (1), wherein the modified portion is configured to be able to suppress or delay moisture diffusion in an in-plane direction of the organic-material-containing layer. (3) The display device according to (1) or (2), wherein at least one of the modified portion and the cavity is provided continuously or intermittently along the periphery of the effective pixel area. (4) The display device according to (1) or (2), wherein at least one of the modified portion and the cavity is arranged in a staggered pattern along the periphery of the effective pixel area. (5) The display device according to (1) or (2), wherein at least one of the modified portion and the cavity is arranged in a two-dimensional pattern in the peripheral area. (6) The display device according to (1), (2), or (5), wherein the peripheral region has a region in which the density of at least one of the modified portion and the cavity portion decreases from the inner periphery to the outer periphery of the peripheral region. (7) The display device according to (1) or (2), wherein at least one of the modified portion and the cavity portion is provided between the periphery of the effective pixel region and a defect included in the peripheral region. (8) The display device according to (1) or (2), wherein at least one of the modified portion and the cavity portion surrounds the defect included in the peripheral region. (9) The display device according to any one of (1) to (8), comprising a first electrode and a second electrode sandwiching the organic substance-containing layer, wherein one of the first electrode and the second electrode is provided continuously from the effective pixel region to the peripheral region. (10) A display device comprising, in the effective pixel region, an organic substance-containing layer including an organic light-emitting layer, wherein the organic substance-containing layer includes at least one of a modified portion and a cavity portion. (11) The display device according to (10), wherein at least one of the modified portion and the cavity portion is provided between adjacent pixels. (12) The display device according to (10) or (11), wherein at least one of the modified portion and the cavity portion is provided along a pixel or a pixel block.(13) The display device according to (10) or (11), wherein at least one of the modified portion and the cavity portion surrounds a pixel or a pixel block. (14) The display device according to (10) or (11), wherein at least one of the modified portion and the cavity portion selectively surrounds a pixel or a pixel block including a defect. (15) The display device according to any one of (10) to (14), comprising a first electrode and a second electrode sandwiching the organic-substance-containing layer, wherein one of the first electrode and the second electrode is provided continuously across the effective pixel area. (16) An electronic device comprising the display device according to any one of (1) to (15). (17) A method for manufacturing a display device, comprising: a step of forming an organic-substance-containing layer including an organic light-emitting layer; and a step of irradiating the organic-substance-containing layer with laser light to form at least one of a modified portion and a cavity portion in a part of the organic-substance-containing layer. (18) The method for manufacturing a display device according to (17), wherein the organic-substance-containing layer is continuously formed from an effective pixel region to a peripheral region outside the effective pixel region, and the peripheral region is irradiated with the laser light. (19) The method for manufacturing a display device according to (17), wherein the organic-substance-containing layer is continuously formed in the effective pixel region, and the laser light is irradiated between pixels in the effective pixel region. (20) The method for manufacturing a display device according to (17), further comprising a step of inspecting defects included in at least one of the effective pixel region and a peripheral region outside the effective pixel region, and the laser light is selectively irradiated around the defects based on inspection results.

[0222] (21) A display device comprising, in an effective pixel region, one or both of an organic-containing layer including an organic light-emitting layer and an organic protective layer, wherein one or both of the organic-containing layer and the organic protective layer include at least one of a modified portion and a cavity. (22) The display device according to (21), wherein at least one of the modified portion and the cavity is provided between adjacent pixels. (23) The display device according to (21) or (22), wherein at least one of the modified portion and the cavity surrounds a pixel or a pixel block. (24) The display device according to (21) or (22), wherein at least one of the modified portion and the cavity selectively surrounds a pixel or a pixel block including a defect. (25) The display device according to any one of (21) to (24), further comprising, in the effective pixel region, a first inorganic protective layer and a second inorganic protective layer, wherein the organic protective layer is sandwiched between the first inorganic protective layer and the second inorganic protective layer. (26) The display device according to any one of (21) to (25), wherein both the organic substance-containing layer and the organic protective layer are provided in the effective pixel region, both the organic substance-containing layer and the organic protective layer include at least one of the modified portion and the cavity, and at least one of the modified portion and the cavity included in the organic substance-containing layer and at least one of the modified portion and the cavity included in the organic protective layer are provided to overlap in a thickness direction of the display device. (27) An electronic device comprising the display device according to any one of (21) to (26). (28) A method for manufacturing a display device, comprising: a step of forming one or both of an organic substance-containing layer and an organic protective layer including an organic light-emitting layer, and a step of forming at least one of a modified portion and a cavity in one or both of the organic substance-containing layer and the organic protective layer by irradiating one or both of the organic substance-containing layer and the organic protective layer with laser light.

[0223] <10 Examples of Leakage Suppression Structures> The OLED layer 122 of the display device 101 according to the first embodiment and its modified examples, the display device 102 according to the second embodiment and its modified examples, the display device 104 according to the third embodiment and its modified examples, and the display device 105 according to the fourth embodiment and its modified examples (hereinafter referred to as the "display device 101 according to the first embodiment, etc.") is connected between adjacent light-emitting elements 12 in the in-plane direction of the first surface of the drive substrate 11, forming a common layer for multiple light-emitting elements 12. For this reason, in the display device 101 according to the first embodiment, etc., there is a risk of current leakage between adjacent light-emitting elements 12. Below, examples of leakage suppression structures for suppressing such current leakage between light-emitting elements 12 will be described. Note that the following first to seventh examples will describe examples in which the OLED layer 122 has two light-emitting units U1 and U2.

[0224] (Leakage Suppression Structure: First Example) Fig. 22 is a cross-sectional view of a first example of the leakage suppression structure. Note that in Fig. 22, layers above the second electrode 123 are not shown. Similarly, in the cross-sectional views for explaining the leakage suppression structures of the second to ninth examples, layers above the second electrode 123 are not shown.

[0225] The insulating layer 13 has openings 13a above each first electrode 121, and covers the periphery of the first surface of the first electrode 121 and the side surfaces (end surfaces) of the first electrodes 121. Specifically, the insulating layer 13 has side wall portions 13b and extension portions 13c. The side wall portions 13b are erected perpendicular to the first surface of the drive substrate 11 and cover the side surfaces of the first electrodes 121. The extension portions 13c extend from the upper ends of the inner circumferential surfaces of the side wall portions 13b toward the center of the first surface of the first electrodes 121 and cover the periphery of the first surfaces of the first electrodes 121.

[0226] The inner periphery of the opening 13a in the insulating layer 13 has a canopy-like protruding portion 132b that protrudes toward the center of the opening 13a. The protruding portion 132b is spaced apart from the first surface of the first electrode 121. The protruding portion 132b is preferably provided around the entire periphery of the opening 13a, but may be provided on a portion of the entire periphery of the opening 13a.

[0227] The light-emitting unit U1 and the charge generation layer 1227 included in the OLED layer 122 are disconnected or made highly resistant by the overhanging portion 132b (region A shown in FIG. 22 ). This makes it possible to suppress current leakage between adjacent light-emitting elements 12. Here, "high resistance" refers to the light-emitting unit U1 and the charge generation layer 1227 becoming extremely thin at the overhanging portion 132b, resulting in high resistance. The disconnection or high resistance of the light-emitting unit U1 and the charge generation layer 1227 caused by the overhanging portion 132b can occur due to the shadowing effect of the overhanging portion 132b during film formation of the OLED layer 122. A gap 132c may be formed between the overhanging portion 132b and the first electrode 121.

[0228] The insulating layer 13 has a first insulating layer 131 and a second insulating layer 132, which are arranged in this order on the first surface of the drive substrate 11 and the first surface of the first electrode 121. The first insulating layer 131 has a plurality of first openings 131a. The second insulating layer 132 has a plurality of second openings 132a. The opening 13a is composed of overlapping first openings 131a and second openings 132a. The inner periphery of the second opening 132a in the second insulating layer 132 protrudes further inward from the opening 13a than the inner periphery of the first opening 131a in the first insulating layer 131, forming a protruding portion 132b.

[0229] 23 is a cross-sectional view of a second example of the leakage suppression structure. The second example differs from the first example in that the insulating layer 13 includes a third insulating layer 133 in addition to the first insulating layer 131 and the second insulating layer 132.

[0230] The third insulating layer 133 is provided between the drive substrate 11 and the first insulating layer 131, and between the first electrode 121 and the first insulating layer 131. The third insulating layer 133 has a third opening 133a on the first surface of the first electrode 121. In the second example, the opening 13a is composed of a first opening 131a, a second opening 132a, and a third opening 133a that are overlapped with each other. The inner periphery of the third opening 133a protrudes further inward than the inner periphery of the first opening 131a. A gap 132c may be formed between the protruding portion 132b and the third insulating layer 133.

[0231] (Leakage Suppression Structure: Third and Fourth Examples) In the first and second examples, examples have been described in which the inner periphery of the opening 13a in the insulating layer 13 has one protruding portion 132b. However, the number of protruding portions that the inner periphery of the opening 13a in the insulating layer 13 has is not limited to these examples, and the inner periphery of the opening 13a in the insulating layer 13 may have two or more protruding portions. Below, an example (third example) in which the inner periphery of the opening 13a in the insulating layer 13 has two protruding portions and an example (fourth example) in which the inner periphery of the opening 13a in the insulating layer 13 has three protruding portions will be described.

[0232] 24 is a cross-sectional view of a third example of the leakage suppression structure. The third example differs from the second example in that insulating layer 13 has fourth insulating layer 134 and fifth insulating layer 135, in that order, on the first surface of second insulating layer 132, and that the inner periphery of opening 13a in insulating layer 13 has two eave-shaped protrusions 132b and 135b.

[0233] The light-emitting unit U1 and the charge generation layer 1227 included in the OLED layer 122 are cut or made highly resistant by the overhanging portion 132b and the overhanging portion 135b. The overhanging portion 135b is provided at a higher position than the overhanging portion 132b with respect to the first surface of the first electrode 121, and is spaced apart from the first surface of the second insulating layer 132. The overhanging portion 135b is set back more away from the center of the opening 13a than the overhanging portion 132b.

[0234] The fourth insulating layer 134 has a fourth opening 134a. The fifth insulating layer 135 has a fifth opening 135a. In the third example, the opening 13a is composed of a first opening 131a, a second opening 132a, a third opening 133a, a fourth opening 134a, and a fifth opening 135a that are overlapping each other. The inner periphery of the fourth opening 134a is recessed in a direction away from the center of the opening 13a relative to the inner peripheries of the second opening 132a and the fifth opening 135a. The inner periphery of the fifth opening 135a protrudes more inward from the opening 13a than the fourth opening 134a, forming a protruding portion 135b.

[0235] 25 is a cross-sectional view of a fourth example of the leakage suppression structure. The fourth example differs from the third example in that insulating layer 13 has sixth insulating layer 136 and seventh insulating layer 137 in this order on the first surface of fifth insulating layer 135, and the inner periphery of opening 13a in insulating layer 13 has three eave-like protrusions 132b, 135b, and 137b.

[0236] The light-emitting unit U1 and the charge generation layer 1227 included in the OLED layer 122 are cut or made highly resistant by the overhanging portion 132b, the overhanging portion 135b, and the overhanging portion 137b. The overhanging portion 137b is provided at a higher position than the overhanging portion 135b with respect to the first surface of the first electrode 121, and is spaced apart from the first surface of the fifth insulating layer 135. The overhanging portion 137b is set back more away from the center of the opening 13a than the overhanging portion 135b.

[0237] The sixth insulating layer 136 has a sixth opening 136a. The seventh insulating layer 137 has a seventh opening 137a. In the fourth example, the opening 13a is composed of a first opening 131a, a second opening 132a, a third opening 133a, a fourth opening 134a, a fifth opening 135a, a sixth opening 136a, and a seventh opening 137a, which are all overlapping each other. The inner periphery of the sixth opening 136a is recessed in a direction away from the center of the opening 13a from the inner peripheries of the fifth opening 135a and the seventh opening 137a. The inner periphery of the seventh opening 137a protrudes inward from the sixth opening 136a, forming a protruding portion 137b.

[0238] 26 is a cross-sectional view of a fifth example of a leakage suppression structure. The fifth example differs from the second example in that insulating layer 13 includes first insulating layer 131, second insulating layer 132, and third insulating layer 133, as well as eighth insulating layer 138, and that the inner periphery of opening 13a in insulating layer 13 includes two eave-shaped protrusions 132b and 133b.

[0239] The light-emitting unit U1 and the charge generation layer 1227 included in the OLED layer 122 are cut or made highly resistant by the overhanging portion 132b and the overhanging portion 133b. The overhanging portion 133b overhangs more inwardly of the opening 13a than the overhanging portion 132b. The overhanging portion 133b is located at a lower position than the overhanging portion 132b with respect to the first surface of the first electrode 121. The overhanging portion 133b is spaced apart from the first surface of the first electrode 121.

[0240] The eighth insulating layer 138 is provided between the drive substrate 11 and the third insulating layer 133, and between the first electrode 121 and the third insulating layer 133. The eighth insulating layer 138 has an eighth opening 138a. In the fifth example, the opening 13a is composed of a first opening 131a, a second opening 132a, a third opening 133a, and an eighth opening 138a, which are overlapped with each other. The inner periphery of the third opening 133a in the third insulating layer 133 protrudes further inward from the opening 13a than the inner periphery of the eighth opening 138a in the eighth insulating layer 138, thereby forming a protruding portion 133b.

[0241] (Leakage Suppression Structure: Sixth Example) Figure 27 is a cross-sectional view of a sixth example of a leakage suppression structure. The sixth example differs from the first example in that the insulating layer 13 has a protruding portion 13b1 on the outer periphery of the side wall portion 13b instead of having a protruding portion 132b on the inner periphery of the opening 13a. Although Figure 27 shows an example in which the insulating layer 13 has a single-layer structure, it may also have a laminated structure of two or more layers.

[0242] The protruding portion 13b1 protrudes outward from the outer periphery of the side wall portion 13b. A recess 13b2 is provided at a position a predetermined distance below the upper end of the outer periphery of the side wall portion 13b. By providing the recess 13b2 on the outer periphery of the side wall portion 13b in this manner, the protruding portion 13b1 is configured at the upper end of the outer periphery of the side wall portion 13b. The protruding portion 13b1 and the recess 13b2 are preferably provided around the entire periphery of the side wall portion 13b, but may be provided on a portion of the entire periphery of the side wall portion 13b.

[0243] The light-emitting unit U1 and the charge generating layer 1227 included in the OLED layer 122 are cut or made highly resistant by the protruding portion 132b (area A shown in FIG. 27 ), which makes it possible to suppress current leakage between adjacent light-emitting elements 12.

[0244] In the sixth example, the outer periphery of the side wall portion 13b has one protrusion 13b1 and one recess 13b2. However, the number of protrusions 13b1 and recesses 13b2 on the outer periphery of the side wall portion 13b is not limited to this example, and the outer periphery of the side wall portion 13b may have two or more protrusions 13b1 and two or more recesses 13b2. In this case, the two or more recesses 13b2 may be arranged sequentially at a predetermined distance from the upper end to the lower end of the outer periphery of the side wall portion 13b.

[0245] (Leakage Suppression Structure: Seventh Example) Fig. 28 is a cross-sectional view of a seventh example of the leakage suppression structure. A groove 13Gv is provided between adjacent light-emitting elements 12. The groove 13Gv may be provided between light-emitting elements 12 adjacent in a predetermined direction (e.g., the Y-axis direction), or may be provided so as to surround the light-emitting element 12. The groove 13Gv is formed across the insulating layer 13 and the insulating layer 112.

[0246] The light-emitting unit U1 and the charge generation layer 1227 included in the OLED layer 122 are cut or made highly resistive by the groove 13Gv. This makes it possible to suppress current leakage between adjacent light-emitting elements 12. Here, "high resistance" means that the light-emitting unit U1 and the charge generation layer 1227 have extremely thin film thicknesses within the groove 13Gv, thereby making them highly resistive, as shown in FIG. 29 . Of the layers included in the OLED layer 122, the light-emitting unit U2 located above the charge generation layer 1227 straddles the groove 13Gv.

[0247] (Leakage Suppression Structure: Eighth Example) FIG. 30 is a cross-sectional view of an eighth example of the leakage suppression structure. A plurality of wirings 112a, a plurality of contact plugs 112b, and a plurality of contact electrodes 112c are provided in the insulating layer 112. Each contact plug 112b electrically connects the first electrode 121 and the wiring 112a. A groove 13Gv is provided between adjacent light-emitting elements 12. The bottom surface of the groove 13Gv is formed by the first surface of the contact electrode 112c. An auxiliary electrode 112d is provided on the side surface of each groove 13Gv. The auxiliary electrode 112d is in contact with the first surface of the contact electrode 112c.

[0248] The OLED layer 122 is cut by the grooves 13Gv. While FIG. 30 shows an example in which the second electrode 123 is also cut by the grooves 13Gv, the second electrode 123 may not be cut by the grooves 13Gv and may be connected between adjacent light-emitting elements 12. The second electrode 123 is in contact with the auxiliary electrode 112d on the side surface of the groove 13Gv. The second electrode 123 is in contact with the contact electrode 112c on the bottom surface of the groove 13Gv. A protective layer 14 may be provided on the first surface of the second electrode 123 so as to follow the shape of the second electrode 123.

[0249] In the eighth example, the leakage current between adjacent light emitting elements 12 can be drawn into the auxiliary electrode 112d and the contact electrode 112c. Therefore, the current leakage between adjacent light emitting elements 12 can be suppressed.

[0250] (Leakage Suppression Structure: Ninth Example) Fig. 31 is a cross-sectional view of a ninth example of the leakage suppression structure. In the ninth example, the display device 101 includes a plurality of third electrodes 125. The plurality of third electrodes 125 are provided on the second surface side of the OLED layer 122, similar to the plurality of first electrodes 121. Each third electrode 125 is disposed between adjacent first electrodes 121.

[0251] 32 is a plan view illustrating the arrangement of the first electrodes 121 and the third electrodes 125. The multiple third electrodes 125 are a group of island-shaped electrodes having an area smaller than that of the first electrodes 121. The multiple third electrodes 125 are regularly arranged so as to be equally spaced from adjacent first electrodes 121 in plan view. From another perspective, the multiple third electrodes 125 are arranged at a predetermined distance from each first electrode 121 and so as to surround it in plan view.

[0252] A plurality of wirings 112a, a plurality of wirings 112e, a plurality of contact plugs 112b, and a plurality of contact plugs 112f are provided in the insulating layer 112. Each contact plug 112b electrically connects the first electrode 121 to the wiring 112a. Each contact plug 112f electrically connects the third electrode 125 to the wiring 112e.

[0253] The plurality of third electrodes 125 are connected to the internal circuitry of the display device 101 via contact plugs 112f, wiring 112e, etc., and are set to a common constant potential. Specifically, when a voltage is applied to the OLED layer 122, the potential of the third electrodes 125 is set to be smaller than the sum of the potential of the second electrodes 123 and the threshold voltage for the OLED layer 122. As a result, even if a voltage is applied to the OLED layer 122 by the first electrodes 121 and the second electrodes 123, causing a leakage current from the first electrodes 121, the leakage current flows preferentially to the third electrodes 125. This prevents the leakage current from flowing from the first electrodes 121 to adjacent first electrodes 121.

[0254] (Leakage Suppression Structure: Other Examples) In the first to seventh examples, the OLED layer 122 has two light-emitting units U1 and U2. However, the configuration of the OLED layer 122 is not limited to these examples, and the OLED layer 122 may have a single light-emitting unit U, or may have three or more light-emitting units U.

[0255] In the first to seventh examples, the light-emitting unit U1 and the charge generation layer 1227 included in the OLED layer 122 are cut or made highly resistant by the overhanging portions 132b, 133b, 135b, 137b, and 13b1 and the grooves 13Gv (hereinafter referred to as "overhanging portions 132b and grooves 13Gv, etc."). However, the layers that are cut or made highly resistant by the overhanging portions 132b and grooves 13Gv, etc. are not limited to these examples. For example, the hole injection layer 1221 or the hole transport layer 1222 included in the OLED layer 122 may be cut or made highly resistant by the overhanging portions 132b and grooves 13Gv, etc., or both the hole injection layer 1221 and the hole transport layer 1222 included in the OLED layer 122 may be cut or made highly resistant by the overhanging portions 132b and grooves 13Gv, etc. When the OLED layer 122 has three or more light-emitting units U, two or more light-emitting units U and two or more charge generating layers 1227 included in the OLED layer 122 may be cut or made highly resistant by the protrusion 132b and the groove 13Gv, etc.

[0256] <11 Relationship between normals passing through the centers of the light-emitting unit, lens member, and wavelength selection unit> Below, the relationship between the normal LN passing through the center of the light-emitting unit, the normal LN' passing through the center of the lens member, and the normal LN" passing through the center of the wavelength selection unit will be described. Here, the light-emitting unit is, for example, the light-emitting element 12 in the display device 101 according to the first embodiment. The lens member is, for example, the lens 201 in the display device 101 according to the tenth modification. The wavelength selection unit is, for example, the colored layer 151 in the display device 101 according to the first embodiment.

[0257] The size of the wavelength selecting section may be changed as appropriate in accordance with the light emitted by the light emitting section, or in the case where a light absorbing section (e.g., a black matrix section) is provided between the wavelength selecting sections of adjacent light emitting sections, the size of the light absorbing section may be changed as appropriate in accordance with the light emitted by the light emitting section. Also, the size of the wavelength selecting section may be determined by the distance (offset amount) d between the normal line passing through the center of the light emitting section and the normal line passing through the center of the wavelength selecting section. ０ The planar shape of the wavelength selection section may be the same as, similar to, or different from the planar shape of the lens member.

[0258] Below, with reference to Figures 33A, 33B, 33C, and 34, we will explain the relationship between the normals passing through the centers of the light-emitting unit 51, wavelength selection unit 52, and lens member 53 when they are arranged in this order.

[0259] As shown in FIG. 33A, the normal line LN passing through the center of the light emitting unit 51, the normal line LN″ passing through the center of the wavelength selecting unit 52, and the normal line LN′ passing through the center of the lens member 53 may coincide with each other. That is, D ０ = 0, d ０ = 0. However, D ０ represents the distance (offset amount) between the normal line LN passing through the center of the light-emitting portion 51 and the normal line LN′ passing through the center of the lens member 53, and d ０ represents the distance (offset amount) between the normal line LN passing through the center of the light emitting section 51 and the normal line LN″ passing through the center of the wavelength selecting section 52.

[0260] As shown in FIG. 33B, the normal line LN passing through the center of the light-emitting unit 51 and the normal line LN" passing through the center of the wavelength selecting unit 52 are aligned, but the normal line LN passing through the center of the light-emitting unit 51 and the normal line LN" passing through the center of the wavelength selecting unit 52 may not be aligned with the normal line LN' passing through the center of the lens member 53. That is, D ０ >0, d ０ = 0.

[0261] As shown in FIG. 33C, the normal line LN passing through the center of the light emitting unit 51, the normal line LN" passing through the center of the wavelength selecting unit 52, and the normal line LN' passing through the center of the lens member 53 do not coincide with each other, and the normal line LN" passing through the center of the wavelength selecting unit 52 and the normal line LN' passing through the center of the lens member 53 may coincide with each other. That is, D ０ >0, d ０ >0, D ０ = d ０ may be.

[0262] As shown in FIG. 34, a configuration may be adopted in which the normal line LN passing through the center of the light-emitting unit 51, the normal line LN″ passing through the center of the wavelength selecting unit 52, and the normal line LN′ passing through the center of the lens member 53 do not coincide with each other. That is, D ０ >0, d ０ >0, D０ ≠d ０ Here, it is preferable that the center of the wavelength selection unit 52 (position indicated by a black square in FIG. 34) is located on a straight line LL connecting the center of the light emitting unit 51 and the center of the lens member 53 (position indicated by a black circle in FIG. 34). Specifically, the distance between the center of the light emitting unit 51 and the center of the wavelength selection unit 52 in the thickness direction (vertical direction in FIG. 34) is LL. １ , the distance in the thickness direction between the center of the wavelength selection unit 52 and the center of the lens member 53 is LL ２ When this is done, D ０ >d ０ >0, and taking into account manufacturing variations, d ０ :D ０ =LL １ : (LL １ +LL ２ Here, the thickness direction refers to the thickness direction of the light emitting section 51, the wavelength selecting section 52, and the lens member 53.

[0263] Below, with reference to Figures 35A, 35B, and 36, we will explain the relationship between the normals passing through the centers of the light-emitting unit 51, lens member 53, and wavelength selection unit 52 when they are arranged in this order.

[0264] As shown in FIG. 35A, a normal line LN passing through the center of the light emitting section 51, a normal line LN″ passing through the center of the wavelength selecting section 52, and a normal line LN′ passing through the center of the lens member 53 may be configured to coincide with each other. That is, D ０ >0, d ０ = 0.

[0265] As shown in FIG. 35B, the normal line LN passing through the center of the light emitting unit 51, the normal line LN" passing through the center of the wavelength selecting unit 52, and the normal line LN' passing through the center of the lens member 53 do not coincide with each other, and the normal line LN" passing through the center of the wavelength selecting unit 52 and the normal line LN' passing through the center of the lens member 53 may coincide with each other. That is, D ０ >0, d ０ >0, D ０ = d ０ may be.

[0266] As shown in FIG. 36 , a configuration may be adopted in which the normal line LN passing through the center of the light-emitting section 51, the normal line LN″ passing through the center of the wavelength selecting section 52, and the normal line LN′ passing through the center of the lens member 53 do not all coincide. Here, it is preferable that the center of the lens member 53 (the position indicated by the black circle in FIG. 36 ) is located on a straight line LL connecting the center of the light-emitting section 51 and the center of the wavelength selecting section 52 (the position indicated by the black square in FIG. 36 ). Specifically, the distance between the center of the light-emitting section 51 and the center of the lens member 53 in the thickness direction (the vertical direction in FIG. 36 ) is defined as LL. ２ , the distance in the thickness direction between the center of the lens member 53 and the center of the wavelength selection unit 52 is LL １ When this is the case, d ０ >D ０ >0, and taking into account manufacturing variations, D ０ :d ０ =LL ２ : (LL １ +LL ２ Here, the thickness direction refers to the thickness direction of the light emitting section 51, the wavelength selecting section 52, and the lens member 53.

[0267] <12 Example of Resonator Structure> The subpixel 1 included in the display device 101 according to the first embodiment may be configured to have a resonator structure that resonates light generated by the light-emitting element 12. The resonator structure will be described below with reference to the drawings. In the following description, the first surface of each layer may be referred to as the upper surface.

[0268] (Resonator Structure: First Example) Fig. 37A is a schematic cross-sectional view illustrating a first example of a resonator structure. In the following description, when the light-emitting elements provided corresponding to the sub-pixels 1R, 1G, and 1B are referred to collectively without any particular distinction, these light-emitting elements may be referred to as light-emitting elements 12. When the light-emitting elements provided corresponding to the sub-pixels 1R, 1G, and 1B are to be distinguished from one another, these light-emitting elements may be referred to as light-emitting elements 12. Ｒ , 12 Ｇ , 12 Ｂ The portions of the OLED layer 122 corresponding to the sub-pixels 1R, 1G, and 1B are called the OLED layer 122 Ｒ, OLED layer 122 Ｇ , OLED layer 122 Ｂ This is what happens.

[0269] In the first example, the first electrode 121 is formed to have a common film thickness in each light emitting element 12. The same is true for the second electrode 123.

[0270] A reflector 71 is disposed below the first electrode 121 of the light-emitting element 12, with an optical adjustment layer 72 sandwiched therebetween. A resonator structure that resonates the light generated by the OLED layer 122 is formed between the reflector 71 and the second electrode 123. In the following description, the optical adjustment layers 72 provided corresponding to the sub-pixels 1R, 1G, and 1B are referred to as the optical adjustment layers 72. Ｒ , 72 Ｇ , 72 Ｂ This is what happens.

[0271] The reflector 71 is formed to have a common film thickness for each light-emitting element 12. The film thickness of the optical adjustment layer 72 varies depending on the color to be displayed by the sub-pixel. Ｒ , 72 Ｇ , 72 Ｂ By having different film thicknesses, it is possible to set the optical distance that produces optimum resonance for the wavelength of light corresponding to the color to be displayed.

[0272] In the example shown in FIG. 37A, the light emitting element 12 Ｒ , 12 Ｇ , 12 Ｂ As described above, the film thickness of the optical adjustment layer 72 differs depending on the color to be displayed by the sub-pixel, so the position of the upper surface of the second electrode 123 is aligned with the light emitting element 12. Ｒ , 12 Ｇ , 12 Ｂ It varies depending on the type of

[0273] The reflector 71 can be made of a metal such as aluminum (Al), silver (Ag), or copper (Cu), or an alloy containing any of these as its main component.

[0274] The optical adjustment layer 72 is made of silicon nitride (SiN ｘ ), silicon oxide (SiO ｘ), silicon oxynitride (SiO ｘ N ｙ The optical adjustment layer 72 may be formed using an inorganic insulating material such as acrylic resin or polyimide resin, or an organic resin material such as acrylic resin or polyimide resin. The optical adjustment layer 72 may be a single layer or a laminated film made of a plurality of these materials. The number of laminated layers may vary depending on the type of light-emitting element 12.

[0275] The first electrode 121 can be formed using a transparent conductive material such as indium tin oxide (ITO), indium zinc oxide (IZO), or zinc oxide (ZnO).

[0276] The second electrode 123 needs to function as a semi-transmissive reflective film. The second electrode 123 can be formed using magnesium (Mg) or silver (Ag), a magnesium-silver alloy (MgAg) containing these as main components, or an alloy containing an alkali metal or an alkaline earth metal.

[0277] (Resonator Structure: Second Example) FIG. 37B is a schematic cross-sectional view for explaining a second example of the resonator structure.

[0278] In the second example, the first electrode 121 and the second electrode 123 are also formed to have the same film thickness in each light emitting element 12 .

[0279] Also in the second example, a reflector 71 is disposed below the first electrode 121 of the light-emitting element 12, with an optical adjustment layer 72 sandwiched therebetween. A resonator structure that resonates the light generated by the OLED layer 122 is formed between the reflector 71 and the second electrode 123. As in the first example, the reflector 71 is formed to have the same film thickness for each light-emitting element 12, and the film thickness of the optical adjustment layer 72 differs depending on the color to be displayed by the sub-pixel.

[0280] In the first example shown in FIG. 37A, the light emitting element 12 Ｒ , 12 Ｇ , 12 Ｂ The upper surfaces of the reflectors 71 are aligned, and the upper surface of the second electrode 123 is positioned so that the light emitting element 12 Ｒ , 12 Ｇ , 12 Ｂ It differed depending on the type of

[0281] In contrast, in the second example shown in FIG. 37B, the upper surface of the second electrode 123 is Ｒ , 12 Ｇ , 12 Ｂ In order to align the upper surfaces of the second electrodes 123, the light emitting elements 12 Ｒ , 12 Ｇ , 12 Ｂ The upper surface of the reflector 71 is Ｒ , 12 Ｇ , 12 Ｂ Therefore, the lower surface of the reflector 71 (in other words, the upper surface of the base layer (insulating layer) 73) has a stepped shape according to the type of the light emitting element 12.

[0282] The materials constituting the reflector 71, the optical adjustment layer 72, the first electrode 121 and the second electrode 123 are the same as those described in the first example, and therefore description thereof will be omitted.

[0283] (Cavity Resonator Structure: Third Example) Fig. 38A is a schematic cross-sectional view illustrating a third example of the cavity resonator structure. In the following description, the reflectors 71 provided corresponding to the sub-pixels 1R, 1G, and 1B are referred to as "reflectors 71" Ｒ , 71 Ｇ , 71 Ｂ This is what happens.

[0284] In the third example, the first electrode 121 and the second electrode 123 are also formed to have the same film thickness in each light emitting element 12 .

[0285] Also in the third example, a reflector 71 is disposed below the first electrode 121 of the light-emitting element 12, with an optical adjustment layer 72 sandwiched therebetween. A resonator structure that resonates the light generated by the OLED layer 122 is formed between the reflector 71 and the second electrode 123. As in the first and second examples, the film thickness of the optical adjustment layer 72 varies depending on the color to be displayed by the sub-pixel. As in the second example, the position of the upper surface of the second electrode 123 is located above the first electrode 121 of the light-emitting element 12. Ｒ , 12 Ｇ , 12 Ｂ are arranged to align.

[0286] In the second example shown in FIG. 38B, the lower surface of the reflector 71 has a stepped shape according to the type of light emitting element 12 in order to align the upper surface of the second electrode 123 .

[0287] In contrast, in the third example shown in FIG. 38A, the film thickness of the reflector 71 is Ｒ , 12 Ｇ , 12 Ｂ More specifically, the reflector 71 is set to have a different reflecting surface depending on the type of the reflector 71. Ｒ , 71 Ｇ , 71 Ｂ The film thickness is set so that the bottom surfaces of the

[0288] The materials constituting the reflector 71, the optical adjustment layer 72, the first electrode 121 and the second electrode 123 are the same as those described in the first example, and therefore description thereof will be omitted.

[0289] (Fourth Example of Resonator Structure) Fig. 38B is a schematic cross-sectional view illustrating a fourth example of the resonator structure. In the following description, the first electrodes 121 provided corresponding to the sub-pixels 1R, 1G, and 1B are referred to as first electrodes 121 Ｒ , 121 Ｇ , 121 Ｂ This is what happens.

[0290] 38A , the first electrodes 121 and second electrodes 123 of each light-emitting element 12 are formed to the same film thickness. A reflector 71 is disposed below the first electrodes 121 of the light-emitting elements 12, with an optical adjustment layer 72 sandwiched therebetween.

[0291] In contrast, in the fourth example shown in FIG. 38B, the optical adjustment layer 72 is omitted, and the film thickness of the first electrode 121 is set to the same as that of the light emitting element 12 Ｒ , 12 Ｇ , 12 Ｂ The settings were different depending on the type of

[0292] The reflector 71 is formed to have a common thickness for each light-emitting element 12. The thickness of the first electrode 121 varies depending on the color to be displayed by the sub-pixel. Ｒ , 121 Ｇ , 121 ＢBy having different film thicknesses, it is possible to set the optical distance that produces optimum resonance for the wavelength of light corresponding to the color to be displayed.

[0293] The materials constituting the reflector 71, the optical adjustment layer 72, the first electrode 121 and the second electrode 123 are the same as those described in the first example, and therefore will not be described again.

[0294] (Resonator Structure: Fifth Example) FIG. 39A is a schematic cross-sectional view for explaining a fifth example of the resonator structure.

[0295] 37A , the first electrode 121 and the second electrode 123 are formed to have the same film thickness in each light-emitting element 12. A reflector 71 is disposed below the first electrode 121 of the light-emitting element 12 with an optical adjustment layer 72 sandwiched therebetween.

[0296] 39A, the optical adjustment layer 72 is omitted, and instead, an oxide film 74 is formed on the surface of the reflector 71. The thickness of the oxide film 74 is Ｒ , 12 Ｇ , 12 Ｂ In the following description, the oxide films 74 provided corresponding to the sub-pixels 1R, 1G, and 1B are referred to as oxide films 74 Ｒ , 74 Ｇ , 74 Ｂ This is what happens.

[0297] The thickness of the oxide film 74 varies depending on the color to be displayed by the sub-pixel. Ｒ , 74 Ｇ , 74 Ｂ By having different film thicknesses, it is possible to set the optical distance that produces optimum resonance for the wavelength of light corresponding to the color to be displayed.

[0298] The oxide film 74 is a film obtained by oxidizing the surface of the reflector 71, and is made of, for example, aluminum oxide, tantalum oxide, titanium oxide, magnesium oxide, zirconium oxide, etc. The oxide film 74 functions as an insulating film for adjusting the optical path length (optical distance) between the reflector 71 and the second electrode 123.

[0299] Light-emitting element 12Ｒ , 12 Ｇ , 12 Ｂ The oxide film 74, which has a thickness that varies depending on the type of material, can be formed, for example, as follows.

[0300] First, a container is filled with an electrolyte, and the substrate on which the reflector 71 is formed is immersed in the electrolyte. An electrode is disposed so as to face the reflector 71.

[0301] Then, a positive voltage is applied to the reflector 71 with the electrode as a reference, and the reflector 71 is anodized. The thickness of the oxide film formed by anodization is proportional to the voltage value applied to the electrode. Ｒ , 71 Ｇ , 71 Ｂ Anodic oxidation is performed while a voltage according to the type of light emitting element 12 is applied to each of the layers 71 and 72. This allows oxide films 74 with different thicknesses to be formed all at once.

[0302] The materials constituting the reflector 71, the first electrode 121 and the second electrode 123 are the same as those described in the first example, and therefore will not be described again.

[0303] (Resonator Structure: Sixth Example) FIG. 39B is a schematic cross-sectional view for explaining a sixth example of the resonator structure.

[0304] In the sixth example, the light emitting element 12 is configured by laminating a first electrode 121, an OLED layer 122, and a second electrode 123. However, in the sixth example, the first electrode 121 is formed so as to function both as an electrode and a reflector. The first electrode (also serving as a reflector) 121 is formed so as to function as a light emitting element 12. Ｒ , 12 Ｇ , 12 Ｂ The first electrode (also serving as a reflector) 121 is formed of a material having an optical constant selected according to the type of color to be displayed. By varying the phase shift due to the first electrode (also serving as a reflector) 121, it is possible to set the optical distance that produces the optimum resonance for the wavelength of light according to the color to be displayed.

[0305] The first electrode (also serving as a reflector) 121 can be made of a single metal such as aluminum (Al), silver (Ag), gold (Au), or copper (Cu), or an alloy containing these as a main component. ＲFirst electrode (also serving as a reflector) 121 Ｒ is formed of copper (Cu), and the light emitting element 12 Ｇ First electrode (also serving as a reflector) 121 Ｇ and light-emitting element 12 Ｂ First electrode (also serving as a reflector) 121 Ｂ The insulating film 11 may be made of aluminum.

[0306] The material constituting the second electrode 123 is the same as that described in the first example, and therefore a description thereof will be omitted.

[0307] (Resonator Structure: Seventh Example) FIG. 40 is a schematic cross-sectional view for explaining a seventh example of the resonator structure.

[0308] The seventh example is basically the same as the light emitting element 12 Ｒ , 12 Ｇ The sixth example is applied to the light emitting element 12 Ｂ In this configuration, the optical distance that generates the optimum resonance for the wavelength of light corresponding to the color to be displayed can also be set.

[0309] Light-emitting element 12 Ｒ , 12 Ｇ First electrode (also serving as a reflector) 121 used in Ｒ , 121 Ｇ The electrode can be made of a single metal such as aluminum (Al), silver (Ag), gold (Au), or copper (Cu), or an alloy containing any of these as a main component.

[0310] Light-emitting element 12 Ｂ Reflector 71 used in Ｂ , optical adjustment layer 72 Ｂ and the first electrode 121 Ｂ The materials constituting the second embodiment are the same as those described in the first embodiment, and therefore will not be described here.

[0311] <13 Application Examples> (Electronic Devices) The display device 101 etc. according to the first embodiment may be provided in various electronic devices. The display device 101 etc. according to the first embodiment is particularly suitable for eyewear devices such as head-mounted displays, or electronic viewfinders for video cameras or single-lens reflex cameras that require high resolution and are used in close proximity to the eyes with magnification.

[0312] 41A and 41B show an example of the appearance of a digital still camera 310. This digital still camera 310 is an interchangeable lens single-lens reflex type, and has an interchangeable taking lens unit (interchangeable lens) 312 located approximately in the center of the front of a camera main body 311, and a grip part 313 for the photographer to hold on the left side of the front.

[0313] A monitor 314 is provided at a position shifted to the left from the center on the back of the camera body 311. An electronic viewfinder (eyepiece window) 315 is provided above the monitor 314. By looking through the electronic viewfinder 315, the photographer can visually confirm the optical image of the subject guided by the photographing lens unit 312 and determine the composition. The electronic viewfinder 315 includes any of the display devices 101 according to the first embodiment.

[0314] 42 shows an example of the appearance of a head-mounted display 320. The head-mounted display 320 is an example of an eyewear device. The head-mounted display 320 has, for example, ear hooks 322 on both sides of a glasses-shaped display unit 321 for wearing on the user's head. The display unit 321 includes any one of the display devices 101 according to the first embodiment, etc.

[0315] 43 shows an example of the appearance of a television device 330. This television device 330 has, for example, an image display screen unit 331 including a front panel 332 and a filter glass 333, and this image display screen unit 331 includes any one of the display devices 101 according to the first embodiment, etc.

[0316] 44 shows an example of the appearance of a see-through head mounted display 340. The see-through head mounted display 340 is an example of an eyewear device. The see-through head mounted display 340 includes a main body 341, an arm 342, and a lens barrel 343.

[0317] The main body 341 is connected to the arm 342 and the glasses 350. Specifically, an end of the long side of the main body 341 is coupled to the arm 342, and one side of the main body 341 is connected to the glasses 350 via a connecting member. The main body 341 may also be worn directly on the head of a human body.

[0318] The main body 341 incorporates a control board for controlling the operation of the see-through head mounted display 340 and a display unit. The arm 342 connects the main body 341 to the lens barrel 343 and supports the lens barrel 343. Specifically, the arm 342 is coupled to an end of the main body 341 and an end of the lens barrel 343, respectively, and fixes the lens barrel 343. The arm 342 also incorporates a signal line for communicating data related to images provided from the main body 341 to the lens barrel 343.

[0319] The lens barrel 343 projects image light provided from the main body 341 via the arm 342, through an eyepiece 351, toward the eyes of a user wearing the see-through head mounted display 340. In this see-through head mounted display 340, the display unit of the main body 341 includes any one of the display devices 101 according to the first embodiment.

[0320] 45 shows an example of the appearance of a smartphone 360. The smartphone 360 ​​includes a display unit 361 that displays various information, an operation unit 362 that includes buttons and the like that accept operation inputs from the user, and the like. The display unit 361 includes any of the display devices 101 and the like according to the first embodiment.

[0321] (Specific Example 6) The display device 101 according to the first embodiment and the like may be provided in various displays provided in vehicles.

[0322] 46A and 46B are diagrams showing an example of the internal configuration of a vehicle 500 equipped with various displays. Specifically, Fig. 46A is a diagram showing an example of the internal appearance of the vehicle 500 from the rear to the front of the vehicle 500, and Fig. 46B is a diagram showing an example of the internal appearance of the vehicle 500 from diagonally rear to diagonally front of the vehicle 500.

[0323] The vehicle 500 includes a center display 501, a console display 502, a head-up display 503, a digital rearview mirror 504, a steering wheel display 505, and a rear entertainment display 506. At least one of these displays includes any of the display devices 101, etc. according to the first embodiment. For example, all of these displays may include any of the display devices 101, etc. according to the first embodiment.

[0324] The center display 501 is disposed in a portion of the dashboard facing the driver's seat 508 and the passenger seat 509. While FIGS. 46A and 46B show an example of a horizontally elongated center display 501 extending from the driver's seat 508 to the passenger seat 509, the screen size and location of the center display 501 are arbitrary. The center display 501 can display information detected by various sensors. As a specific example, the center display 501 can display an image captured by an image sensor, a distance image to obstacles in front of or to the side of the vehicle 500 measured by a ToF sensor, the body temperature of a passenger detected by an infrared sensor, and the like. The center display 501 can be used to display, for example, at least one of safety-related information, operation-related information, a life log, health-related information, authentication / identification-related information, and entertainment-related information.

[0325] The safety-related information includes information such as detection of drowsiness, distraction, child mischief, whether a seatbelt is fastened, and whether a passenger has been abandoned. This information is detected, for example, by a sensor placed on the rear side of the center display 501. The operation-related information is obtained by detecting gestures related to passenger operations using a sensor. The detected gestures may include operations of various equipment within the vehicle 500. For example, operations of the air conditioning system, navigation system, AV system, lighting system, etc. are detected. The life log includes life logs of all passengers. For example, the life log includes a record of each passenger's actions while on board. By acquiring and saving the life log, the condition of the passenger at the time of the accident can be confirmed. The health-related information is obtained by detecting the passenger's body temperature using a sensor such as a temperature sensor, and inferring the passenger's health condition based on the detected body temperature. Alternatively, an image sensor may be used to capture an image of the passenger's face, and the passenger's health condition may be inferred from the facial expression in the image. Furthermore, the system may have an automated voice conversation with the occupant and estimate the occupant's health condition based on the occupant's responses. The authentication / identification-related information includes a keyless entry function that uses a sensor to perform facial authentication, a function that automatically adjusts seat height and position using facial recognition, etc. The entertainment-related information includes a function that uses a sensor to detect operation information of an AV device by the occupant, a function that recognizes the occupant's face using a sensor and provides content suitable for the occupant via the AV device, etc.

[0326] The console display 502 can be used to display, for example, life log information. The console display 502 is disposed near a shift lever 511 on a center console 510 between a driver's seat 508 and a passenger seat 509. Information detected by various sensors can also be displayed on the console display 502. Furthermore, the console display 502 may display an image of the vehicle's surroundings captured by an image sensor, or an image showing the distance to an obstacle around the vehicle.

[0327] The head-up display 503 is virtually displayed behind the windshield 512 in front of the driver's seat 508. The head-up display 503 can be used to display, for example, at least one of safety-related information, operation-related information, a life log, health-related information, authentication / identification-related information, and entertainment-related information. Because the head-up display 503 is often virtually located in front of the driver's seat 508, it is suitable for displaying information directly related to the operation of the vehicle 500, such as the speed of the vehicle 500 and the remaining fuel (battery) level.

[0328] The digital rearview mirror 504 can not only display the rear of the vehicle 500 but also the status of passengers in the rear seats. Therefore, by placing a sensor on the back side of the digital rearview mirror 504, it can be used to display life log information, for example.

[0329] The steering wheel display 505 is disposed near the center of the steering wheel 513 of the vehicle 500. The steering wheel display 505 can be used to display, for example, at least one of safety-related information, operation-related information, a life log, health-related information, authentication / identification-related information, and entertainment-related information. In particular, because the steering wheel display 505 is located near the driver's hands, it is suitable for displaying life log information such as the driver's body temperature, and for displaying information related to the operation of AV equipment, air conditioning equipment, etc.

[0330] The rear entertainment display 506 is attached to the back side of the driver's seat 508 and the passenger seat 509 and is intended for viewing by rear seat passengers. The rear entertainment display 506 can be used to display, for example, at least one of safety-related information, operation-related information, a life log, health-related information, authentication / identification-related information, and entertainment-related information. In particular, since the rear entertainment display 506 is located directly in front of the rear seat passengers, information related to the rear seat passengers is displayed on the rear entertainment display 506. For example, the rear entertainment display 506 may display information related to the operation of an AV device or an air conditioning system, or may display the results of measuring the body temperature of the rear seat passengers using a temperature sensor.

[0331] A sensor may be arranged on the rear surface of the display device 101 or the like, so that the distance to a surrounding object can be measured. Optical distance measurement methods are broadly divided into passive and active types. Passive types measure distance by receiving light from an object without projecting light from the sensor onto the object. Passive types include the lens focusing method, the stereo method, and the monocular vision method. Active types measure distance by projecting light onto an object and receiving reflected light from the object with a sensor. Active types include the optical radar method, the active stereo method, the photometric stereo method, the moire topography method, and the interferometry method. The display device 101 or the like according to the first embodiment can be applied to any of these distance measurement methods. The above-mentioned passive or active distance measurement can be performed by using a sensor arranged on the rear surface of the display device 101 or the like according to the first embodiment.

[0332] 1R, 1G, 1B subpixels (effective subpixels) 2R, 2G, 2B subpixels (dummy subpixels) 11 drive substrate 12a light emitting element 12b light emitting element (dummy light emitting element) 121 first electrode 122 OLED layer 122a modified / cavity portion 122a １ , 122a ２ Modification section 122a ３ Cavity 122b Fragment 123 Second electrode 13 Insulating layer 13a Opening 14 Protective layer 141 First inorganic protective layer 142 Organic protective layer 142a Modified / cavity 142a １ Modified section 142a ２Cavity 143 Second inorganic protective layer 15 Color filter 151R, 151G, 151B Colored layer 16 Filled resin layer 17 Contact portion 18 Sealing portion 19 Sealing glass 20 Lens array 201 Lens 31 Particles 101, 102, 103, 104, 104A, 105, 105A Display device 310 Digital still camera 320 Head mounted display 330 Television device 340 See-through head mounted display 360 Smartphone 500 Vehicle U1, U2 Light emitting unit RE1 Effective pixel area RE2 Peripheral area RE3 OLED layer formation area

Claims

1. A display device comprising: an organic-substance-containing layer including an organic light-emitting layer, the organic-substance-containing layer being provided across an effective pixel area to a peripheral area outside the effective pixel area; the organic-substance-containing layer including at least one of a modified portion and a cavity portion.

2. The display device according to claim 1, wherein the modified section is configured to be able to suppress or delay moisture diffusion in an in-plane direction of the organic substance-containing layer.

3. The display device according to claim 1, wherein at least one of the modified portion and the cavity portion is provided continuously or discontinuously along the periphery of the effective pixel area.

4. The display device according to claim 1, wherein at least one of the modified portions and the hollow portions is arranged in a staggered pattern along the periphery of the effective pixel area.

5. The display device according to claim 1, wherein at least one of the modified portions and the hollow portions is arranged in a two-dimensional pattern in the peripheral region.

6. The display device according to claim 1, wherein the peripheral region has a region in which the density of at least one of the modified portions and the hollow portions decreases from the inner periphery toward the outer periphery of the peripheral region.

7. The display device according to claim 1, wherein at least one of the modified portion and the cavity portion is provided between the periphery of the effective pixel region and a defect included in the peripheral region.

8. The display device according to claim 1, wherein at least one of the modified portion and the cavity portion surrounds a defect included in the peripheral region.

9. A display device comprising, in an effective pixel area, one or both of an organic-containing layer including an organic light-emitting layer and an organic protective layer, wherein one or both of the organic-containing layer and the organic protective layer includes at least one of a modified portion and a cavity portion.

10. The display device according to claim 9, wherein at least one of the modified portion and the cavity portion is provided between adjacent pixels.

11. The display device according to claim 9, wherein at least one of the modified portion and the cavity portion surrounds a pixel or a pixel block.

12. The display device according to claim 9, wherein at least one of the modified portion and the cavity portion selectively surrounds a pixel or pixel block including a defect.

13. The display device according to claim 9, further comprising a first inorganic protective layer and a second inorganic protective layer in the effective pixel area, wherein the organic protective layer is sandwiched between the first inorganic protective layer and the second inorganic protective layer.

14. The display device according to claim 9, wherein both the organic substance-containing layer and the organic protective layer are provided in the effective pixel region, both the organic substance-containing layer and the organic protective layer include at least one of the modified portion and the hollow portion, and at least one of the modified portion and the hollow portion included in the organic substance-containing layer and at least one of the modified portion and the hollow portion included in the organic protective layer are arranged to overlap in the thickness direction of the display device.

15. An electronic device comprising the display device according to claim 1.

16. A method for manufacturing a display device, comprising: a step of forming an organic substance-containing layer including an organic light-emitting layer; and a step of forming at least one of a modified portion and a cavity portion in a part of the organic substance-containing layer by irradiating the organic substance-containing layer with laser light.

17. The method for manufacturing a display device according to claim 16, wherein the organic substance-containing layer is formed continuously from an effective pixel area to a peripheral area outside the effective pixel area, and the laser light is irradiated onto the peripheral area.

18. The method for manufacturing a display device according to claim 16, wherein the organic material-containing layer is formed continuously in an effective pixel area, and the laser light is irradiated between pixels in the effective pixel area.

19. The method for manufacturing a display device according to claim 16, further comprising a step of inspecting defects in at least one of an effective pixel area and a peripheral area outside the effective pixel area, wherein the laser light is selectively irradiated around the defect based on the inspection results.

20. A method for manufacturing a display device, comprising: a step of forming one or both of an organic substance-containing layer including an organic light-emitting layer and an organic protective layer; and a step of forming at least one of a modified portion and a cavity portion in one or both of the organic substance-containing layer and the organic protective layer by irradiating laser light to one or both of the organic substance-containing layer and the organic protective layer.

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