Motorized shutter module of sputtering ion source

Abstract

A motorized shutter module of a sputtering ion source may be provided according to one aspect of the present invention, the motorized shutter module comprising: a first shutter installed to open and close a target at a front side of a sputtering ion source; a first opening and closing device unit to which one end of the first shutter is connected and which operates the first shutter to open and close in a direction orthogonal to the target; and a first motor providing power to the first opening and closing device unit.

Description

Motorized shutter module of sputtering ion source

[0001] The present invention relates to an electric shutter module of a sputtering ion source, and more specifically, to an electric shutter module of a sputtering ion source that can be used only with electricity because the movement of the shutter is controlled using electricity, and that can be operated in any location without being restricted by a construction location by excluding existing pneumatic utilities, thereby implementing a portable system.

[0002] In general, sputtering devices are used to form various types of thin films, such as conductive films, dielectric films, or semiconductor films. In particular, magnetron sputtering devices are widely used in the field of thin film forming because they can secure a high film formation speed by confining high-density plasma near the target and can form stable plasma with little impurity contamination in a high vacuum.

[0003] Fig. 1 is a conceptual diagram showing the configuration of a conventional magnetron sputtering ion source. The magnetron sputtering ion source as shown in Fig. 1 is largely composed of an ion source body, a permanent magnet, a Cu plate, a sputtering target, a shield, a power line, cooling water, and a shutter.

[0004] This ion source is a magnetron sputtering device, and its principle is explained as follows: when argon (Ar) gas at an appropriate pressure is injected into the sputtering chamber and a strong electric field is applied vertically around the sputtering target, the argon gas dissociates into a plasma state and becomes argon ions (Ar+). The argon (Ar) gas in the plasma state rotates due to the magnetic field generated by the permanent magnet and the applied electric field, and collides with argon (Ar) gas or argon ions (Ar+) within the system to maintain a plasma discharge state. At this time, the argon ions (Ar+) generated by the collision are accelerated to the cathode of the sputtering target and collide with the target material to deposit it as a sample.

[0005] At this time, pre-sputtering is performed for several minutes with the shutter closed to remove foreign substances or impurities adsorbed on the target before deposition, and then the target is cleaned before deposition is performed. At this time, the shutter is configured to be opened or closed by air pressure.

[0006] However, the magnetron sputtering ion source of the prior art has a problem of having restrictions on utility facilities / construction because it requires utility construction facilities and equipment such as a compressor as the shutter is opened or closed using pneumatic means.

[0007] Additionally, there was the problem of high costs associated with installing / building pneumatic utilities.

[0008] The present invention has been devised to solve the problems of the prior art, and its purpose is to provide an electric shutter module of a sputtering ion source that can be used only with electricity because it controls the movement of the shutter using electricity, and can be operated in any place without being restricted by the construction location by excluding the existing pneumatic utility, thereby implementing a portable system.

[0009] Another object of the present invention is to provide an electric shutter module of a sputtering ion source that can be applied to vacuum equipment including shutters or valves, such as dry etching equipment (ion milling, reactive ion etching equipment, etc.) and deposition equipment (sputter, electron beam evaporator, thermal evaporator, etc.), and that can be installed and operated without restrictions on the construction location as well as reducing the cost of construction equipment.

[0010] According to one aspect of the present invention, a motorized shutter module of a sputtering ion source may be provided, characterized in that it includes: a first shutter installed to open and close a target in front of a sputtering ion source; a first opening and closing device unit to which one end of the first shutter is connected and which operates to open and close the first shutter in a direction orthogonal to the target; and a first motor that provides power to the first opening and closing device unit.

[0011] In addition, the first opening / closing device unit can transmit the rotational power of the first motor to the first shutter, and when power is applied, rotate the first shutter in a vertical direction to open the target, and when power is not applied, rotate the first shutter in a horizontal direction to close the target.

[0012] According to another aspect of the present invention, an electric shutter module of a sputtering ion source may be provided, characterized in that it includes: a second shutter installed to open and close a target in front of a sputtering ion source; a second opening and closing device unit to which one end of the second shutter is connected and which allows the second shutter to open and close in a direction parallel to the target; and a second motor that provides power to the second opening and closing device unit.

[0013] In addition, the second shutter may include a plurality of blades that are mutually slidable and are installed in an overlapping manner to expand or contract in the sliding direction, and the second opening / closing device may include a power transmission member that converts the rotational motion of the second motor into linear motion and transmits it to the second shutter, and a pulley that rotates in conjunction with the second motor and on which the power transmission member is wound.

[0014] In addition, the second opening / closing device unit transmits the rotational power of the second motor to the second shutter, and when power is applied, the second shutter overlaps in the horizontal direction to open the target, and when power is not applied, the second shutter unfolds in the horizontal direction to close the target.

[0015] Additionally, the electric shutter module can be installed at one end of the body of the sputtering ion source.

[0016] Additionally, the electric shutter module can be installed so as to be positioned in the insertion section of the chamber into which the sputtering ion source is loaded.

[0017] Additionally, the above electric shutter module can be installed so as to be positioned on the upper cover of the chamber into which the sputtering ion source is loaded.

[0018] The electric shutter module according to the present invention controls the movement of the shutter using electricity, so it can be used as long as electricity is available, and since it has a structure that excludes existing pneumatic utilities, it is not restricted by the installation location, so it has the effect of implementing a portable system that can be used anywhere.

[0019] In addition, the electric shutter module according to the present invention can be applied to vacuum equipment including shutters or valves, such as dry etching equipment (ion milling, reactive ion etching equipment, etc.) and deposition equipment (sputter, electron beam evaporator, thermal evaporator, etc.), and has the effect of reducing the cost of equipment construction as well as enabling convenient installation and operation.

[0020] Figure 1 is a conceptual diagram showing the configuration of a typical magnetron sputtering ion source.

[0021] FIG. 2 is a conceptual diagram illustrating an electric shutter module of a sputtering ion source according to one embodiment of the present invention.

[0022] FIG. 3 is a conceptual diagram illustrating an electric shutter module of a sputtering ion source according to the second embodiment of the present invention.

[0023] FIG. 4 is a conceptual diagram illustrating an electric shutter module of a sputtering ion source according to the third embodiment of the present invention.

[0024] FIG. 5 is a conceptual diagram illustrating an electric shutter module of a sputtering ion source according to the fourth embodiment of the present invention.

[0025] Figure 6 is a conceptual diagram illustrating a portable system of a sputtering ion source to which an electric shutter module according to the present invention is applied.

[0026] Hereinafter, with reference to the attached drawings, the present invention will be described in detail according to a preferred embodiment. Herein, the same reference numerals will be used for identical components, and repetitive descriptions or detailed descriptions of well-known functions and components that may unnecessarily obscure the gist of the invention will be omitted. The embodiments of the invention are provided to more fully explain the present invention to those of ordinary skill in the art. Therefore, the shapes and sizes of elements in the drawings may be exaggerated for clearer description.

[0027] FIG. 2 is a conceptual diagram illustrating an electric shutter module of a sputtering ion source according to a first embodiment of the present invention, FIG. 3 is a conceptual diagram illustrating an electric shutter module of a sputtering ion source according to a second embodiment of the present invention, FIG. 4 is a conceptual diagram illustrating an electric shutter module of a sputtering ion source according to a third embodiment of the present invention, and FIG. 5 is a conceptual diagram illustrating an electric shutter module of a sputtering ion source according to a fourth embodiment of the present invention.

[0028] Referring to FIG. 2, the electric shutter module (100) according to the present invention may include a first shutter (110a), a first opening / closing device (120a), and a first motor (130a).

[0029] The above first shutter (110a) is installed to open and close the target (11) in front of the sputtering ion source (10). At this time, the first shutter (110a) can be formed with a width that can cover the entire body of the sputtering ion source (10) and can be manufactured as a single plate.

[0030] The above first shutter (110a) can be opened and closed by the first opening and closing device (120a).

[0031] The first opening / closing device (120a) is connected to one end of the first shutter (110a) and operates so that the first shutter (110a) opens / closes in a direction orthogonal to the target (11).

[0032] The above first opening / closing device (120a) is a rotation device that operates at an angle of 0 to 90 degrees, and the structure of a rotation device used in a general circuit breaker can be applied.

[0033] In addition, the first opening / closing device (120a) transmits the rotational force of the first motor (130a) to the first shutter (110a), and when power is applied, rotates the first shutter (110a) in a vertical direction to open the target (11), and when power is not applied, rotates the first shutter (110a) in a horizontal direction to close the target (11).

[0034] At this time, the first opening / closing device (120a) can be connected to the first motor (130a) to receive power. The first motor (130a) can be a stepping motor capable of controlling the opening / closing speed of the first shutter (110a).

[0035] The magnetron sputtering ion source (10) to which the electric shutter module (100) according to the present invention is applied may include an ion source body, a permanent magnet, a Cu plate, a sputtering target, a shield, a power line, and a cooling water line.

[0036]

[0037] Fig. 3 is a conceptual diagram illustrating an electric shutter module of a sputtering ion source according to a second embodiment of the present invention. Referring to Fig. 3, an electric shutter module (100) according to the present invention may include a second shutter (110b), a second opening / closing device (120b), and a second motor (130b).

[0038] The second shutter (110b) is installed to open and close the target (11) in front of the sputtering ion source (10). At this time, the second shutter (110b) may be formed with a width that can cover the front of the body of the sputtering ion source (10), and may be manufactured as a plurality of blade assemblies that are operated by overlapping slides.

[0039] The above second shutter (110b) can be opened and closed by the second opening and closing device (120b).

[0040] The second opening / closing device (120b) is connected to one end of the second shutter (110b), and can be opened / closed in a direction parallel to the target (11).

[0041] At this time, the second shutter (110b) has a plurality of blades that can slide each other installed in an overlapping manner and are opened or contracted in a sliding direction in conjunction with the second opening / closing device (120b), and the second opening / closing device (120b) may include a power transmission member (121) that converts the rotational motion of the second motor (130b) into a linear motion and transmits it to the second shutter (110b), and a pulley (122) that rotates in conjunction with the second motor (130b) and on which the power transmission member (121) is wound.

[0042] At this time, the power transmission member (121) may be composed of a plurality of pipes with different diameters overlapped to form a variable arm for expansion and contraction operation and a steel wire built into the variable arm and linked to the expansion and contraction operation of the variable arm.

[0043] For example, depending on the rotation direction of the droid (122), the steel wire is unwound or wound, and the length of the pull-out is varied. As the pipe slidably coupled to the leading end of the variable arm is coupled to the steel wire, the length of the variable arm can be varied.

[0044] At the tip of such a variable arm, a blade that is slidably connected to the tip of the second shutter (110b) is connected and can be opened and closed in conjunction with the expansion and contraction of the variable arm.

[0045] The above power transmission member (121) is not limited to the configuration described above, and may include a configuration that allows such operation.

[0046] At this time, the second opening / closing device (120b) transmits the rotational power of the second motor (130b) to the second shutter (110b), and when power is applied, overlaps the second shutter (110b) in the horizontal direction to open the target (11), and when power is not applied, unfolds the second shutter (110b) in the horizontal direction to close the target (11).

[0047] At this time, the second opening / closing device (120b) can be connected to a second motor (130b) to receive power. The second motor (130b) can be a stepping motor capable of controlling the opening / closing speed of the second shutter (110b).

[0048] The magnetron sputtering ion source (10) to which the electric shutter module (100) according to the present invention is applied may include an ion source body, a permanent magnet, a Cu plate, a sputtering target, a shield, a power line, and a cooling water line.

[0049] The electric shutter module (100) described above can be installed so as to be positioned at one end of the body of the sputtering ion source (10) as shown in FIGS. 2 and 3.

[0050] In addition, the electric shutter module (100) can be installed so as to be positioned in the insertion section (21) of the chamber (20) into which the sputtering ion source (10) is loaded, as shown in FIG. 4.

[0051] In addition, the electric shutter module (100) can be installed so as to be positioned on the upper cover (22) of the chamber (20) into which the sputtering ion source (10) is loaded, as shown in FIG. 5.

[0052] At this time, when the electric shutter module (100) is installed in the chamber (20) as shown in FIGS. 4 and 5, the load burden applied to the sputtering ion source (10) can be reduced, thereby providing the advantage of stable device operation.

[0053] A sputtering ion source with an electric shutter module applied as in the present invention enables construction of a portable system with free movement.

[0054] Figure 6 is a conceptual diagram illustrating a portable system of a sputtering ion source to which an electric shutter module according to the present invention is applied.

[0055] Referring to FIG. 6, a portable system (1) of a sputtering ion source to which an electric shutter module (100) according to the present invention is applied forms a vacuum device unit (2) including a vacuum valve, a vacuum gauge, and a pump inside a main body (4) having a moving means (5), and a control device unit (3) including a regulator for controlling pressure, gas amount, and vacuum gauge within a chamber, a DC / RF power, a pneumatic device, a chiller, and a gas cylinder is formed on one side of the vacuum device unit (2), and a sputtering ion source (10) to which an electric shutter module according to the present invention is applied can be installed on the upper part of the main body (4).

[0056] The electric shutter module (100) according to the present invention uses electricity to control the movement of the shutter, so it can be used as long as electricity is available, and since it has a structure that excludes existing pneumatic utilities, it is not limited to a construction location, so it can implement a portable system that can be used anywhere.

[0057] In addition, the electric shutter module (100) according to the present invention can be applied to vacuum equipment including shutters or valves, such as dry etching equipment (ion milling, reactive ion etching equipment, etc.) and deposition equipment (sputter, electron beam evaporator, thermal evaporator, etc.), and can provide the advantage of reducing the cost of equipment construction as well as convenient installation and operation.

[0058] While the present invention has been described with reference to the embodiments illustrated in the accompanying drawings, these are merely exemplary, and those skilled in the art will appreciate that various modifications and equivalent embodiments are possible. Accordingly, the true scope of protection of the present invention should be determined solely by the appended claims.

Claims

1. A first shutter installed to open and close the target in front of the sputtering ion source; A first opening / closing device unit to which one end of the first shutter is connected and which operates to open / close the first shutter in a direction orthogonal to the target; and An electric shutter module of a sputtering ion source, characterized in that it includes a first motor that provides power to the first opening / closing device section.

2. In paragraph 1, The above first opening and closing device part is, An electric shutter module of a sputtering ion source, characterized in that the rotational power of the first motor is transmitted to the first shutter, and when power is applied, the first shutter is rotated vertically to open the target, and when power is not applied, the first shutter is rotated horizontally to close the target.

3. A second shutter installed to open and close the target in front of the sputtering ion source; A second opening / closing device unit to which one end of the second shutter is connected and which allows the second shutter to open / close in a direction parallel to the target; and An electric shutter module of a sputtering ion source, characterized in that it includes a second motor that provides power to the second opening / closing device unit.

4. In paragraph 3, The second shutter has a plurality of blades that can slide each other and are installed in an overlapping manner to expand or contract in the sliding direction. The above second opening / closing device unit is characterized in that it includes a power transmission member that converts the rotational motion of the second motor into linear motion and transmits it to the second shutter, and a pulley that rotates in conjunction with the second motor and on which the power transmission member is wound.

5. In paragraph 3, The above second opening and closing device part, An electric shutter module of a sputtering ion source, characterized in that the rotational power of the second motor is transmitted to the second shutter, and when power is applied, the second shutter is horizontally overlapped to open the target, and when power is not applied, the second shutter is horizontally unfolded to close the target.

6. In any one of paragraphs 1 to 5, An electric shutter module of a sputtering ion source, characterized in that the electric shutter module is installed at one end of the body of the sputtering ion source.

7. In any one of paragraphs 1 to 5, An electric shutter module of a sputtering ion source, characterized in that the electric shutter module is installed so as to be positioned in the insertion section of a chamber into which a sputtering ion source is loaded.

8. In any one of paragraphs 1 to 5, An electric shutter module of a sputtering ion source, characterized in that the electric shutter module is installed so as to be positioned on the upper cover of a chamber into which a sputtering ion source is loaded.

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