Feeding and discharging device for photomask of lithography machine

Abstract

A feeding and discharging device for photomasks of lithography machines. The feeding and discharging device for photomasks of lithography machines comprises: a support frame (000), a detection platform (100) and a transfer mechanism; the support frame (000) is used for placing a photomask pod (001), the photomask pod (001) being provided with an accommodation cavity (002) and a first opening (003); the detection platform (100) comprises a main platform (101) and photoelectric assemblies arranged on the main platform (101), each photoelectric assembly comprising two photoelectric modules (102) located on two sides of the main platform (101) in a first direction (X) and configured for mutual sensing; the transfer mechanism is used for transferring the photomask pod (001) from the support frame (000) to the detection platform (100), and enabling the first opening (003) to face the main platform (101).

Description

Lithography machine mask loading and unloading device

[0001] CROSS-REFERENCE TO RELATED APPLICATIONS

[0002] This application claims priority to Chinese patent application No. 202420318933.4, filed on February 21, 2024, entitled “Photolithography mask loading and unloading device,” and the entire contents of that application are incorporated herein by reference. Technical Field

[0003] The present application relates to the field of semiconductor lithography technology, and in particular to a mask loading and unloading device for a lithography machine. Background Art

[0004] Photolithography is a key process for fabricating semiconductor structures and integrated circuit micropatterns. It is a type of microfabrication technology that was adopted early and continues to be widely used in the field. During the integrated circuit manufacturing process, numerous photolithography processes are used to create sub-micron or even nanometer-sized patterns, enabling the manufacture of highly integrated integrated circuits.

[0005] In the prior art, masks are usually transported manually, but this consumes a lot of human resources and often results in risks such as "mask loss" and "mask placed upside down", which affects production efficiency.

[0006] Utility Model Content

[0007] An embodiment of the present application provides a photomask loading and unloading device for a lithography machine, aiming to solve the problem of improving the production efficiency of photomask loading and unloading for a lithography machine.

[0008] An embodiment of the first aspect of the present application provides a mask loading and unloading device for a lithography machine, comprising: a support frame, a mask box is provided on the support frame, the mask box has a accommodating cavity for accommodating the mask and a first opening connected to the accommodating cavity; a detection platform, comprising a main platform and an optoelectronic component arranged on the main platform, the optoelectronic component comprising two optoelectronic modules located on both sides of the main platform in a first direction and sensing each other; a transfer mechanism, used to transfer the mask box from the support frame to the detection platform, and to make the first opening face the main platform so that the optoelectronic module can detect the position of the mask.

[0009] According to any one of the aforementioned embodiments of the first aspect of the present application, the number of optoelectronic components is two or more, and the two or more optoelectronic components are spaced apart along the second direction.

[0010] According to any one of the aforementioned implementations of the first aspect of the present application, the maximum distance between the light emitted by the optoelectronic module and the main platform is less than 5 mm.

[0011] According to any of the aforementioned implementations of the first aspect of the present application, the main platform further includes two side edges arranged opposite to each other along the second direction, and the maximum distance from the light emitted by the optoelectronic module to the side edges along the second direction is less than or equal to 5 mm.

[0012] According to any embodiment of the first aspect of the present application, the support frame includes a working area, a table in the working area is used to place the mask box, and a sensor is provided on the side of the support frame away from the table, and the sensor is used to detect whether there is a mask box in the working area.

[0013] According to any one of the aforementioned implementations of the first aspect of the present application, the working area is provided with a detection mechanism, the mask is provided with a structure frame, and the detection mechanism is used to detect position information of the structure frame.

[0014] According to any one of the aforementioned embodiments of the first aspect of the present application, the detection mechanism includes a mounting portion and a rotating portion, the table top is recessed to form a groove, the mounting portion is disposed in the groove, and the rotating portion is rotatable relative to the mounting portion between a first position and a second position.

[0015] Wherein, in the first position, the rotating portion is protruding from the table surface, and in the second position, the rotating portion is located on the side of the mounting portion away from the table surface, and the rotating portion is in contact with the structural frame.

[0016] According to any one of the aforementioned embodiments of the first aspect of the present application, the mounting portion is movably arranged in the groove along the fourth direction.

[0017] According to any embodiment of the first aspect of the present application, the table top is provided with two first limit blocks arranged opposite to each other along a third direction, the first limit blocks include a first segment extending along the third direction and a second segment extending along a fourth direction, the two first segments are located between the two second segments, and two second photoelectric modules are provided on the second segment.

[0018] According to the implementation scheme of any of the aforementioned first aspects of the present application, the table top is also provided with a second limit block arranged along the fourth direction opposite to the two first limit blocks, the second limit block includes a main body extending along the third direction and a branch located on both sides of the main body along the third direction, the branch extends along the fourth direction and is located on the side of the main body facing the first limit block, and the two first limit blocks and the second limit block enclose a working area for placing the mask.

[0019] In the photolithography machine mask loading and unloading device provided in the embodiment of the present application, the photolithography machine mask loading and unloading device includes: a support frame, a detection platform and a transfer mechanism. The support frame is used to place the mask box, and the mask box has a accommodating cavity and a first opening. The mask can be placed in the accommodating cavity through the first opening. The mask box is used to protect the mask when storing and transferring the mask, reducing the mask from external dust particles and chemical contamination. The detection platform includes a main platform and a photoelectric component arranged on the main platform. The photoelectric component includes two photoelectric modules located on both sides of the main platform in a first direction and sensing each other. The two photoelectric modules emit infrared light to sense whether the bottom of the mask has fallen off. The transfer mechanism is used to transfer the mask box from the support frame to the detection platform, and to make the first opening face the main platform so that the photoelectric module can detect whether the bottom of the mask has fallen off from the first opening. When the bottom of the mask falls off, the light emitted by the two photoelectric modules will be blocked by the bottom of the mask, thereby sensing that the bottom of the mask has fallen off. The photolithography machine mask loading and unloading device provided in the embodiment of the present application detects whether the bottom of the mask has fallen off through the optoelectronic components located on the detection platform, without the need for manual operation, thereby improving the accuracy of mask detection, realizing automation in the loading and unloading process, and thus improving production efficiency. BRIEF DESCRIPTION OF THE DRAWINGS

[0020] In order to more clearly illustrate the technical solutions of the embodiments of the present application, the following is a brief introduction to the drawings required for use in the embodiments of the present application. For ordinary technicians in this field, other drawings can be obtained based on these drawings without any creative work.

[0021] FIG1 is a schematic diagram of a structure of a photomask loading and unloading device for a lithography machine provided in an embodiment of the present application;

[0022] FIG2 is a second structural schematic diagram of a photomask loading and unloading device for a lithography machine provided in an embodiment of the present application;

[0023] FIG3 is a third structural schematic diagram of a photomask loading and unloading device for a lithography machine provided in an embodiment of the present application;

[0024] FIG4 is a fourth structural diagram of a photomask loading and unloading device for a lithography machine provided in an embodiment of the present application;

[0025] FIG5 is a fifth structural schematic diagram of a mask loading and unloading device for a lithography machine provided in an embodiment of the present application.

[0026] Reference numerals:

[0027] 000, support frame; 001, mask box; 002, accommodating cavity; 003, first opening; 004, structural frame; 005, mask bottom;

[0028] 100, detection platform; 101, main platform; 102, photoelectric module; 103, side; 104, light;

[0029] 200, working area; 201, table; 202, sensor; 203, detection mechanism; 204, mounting portion; 205, rotating portion; 206, first stopper; 206a, first segment; 206b, second segment; 207, second stopper; 207a, main body; 207b, segment; 208, second photoelectric module;

[0030] X, first direction; Y, second direction; M, third direction; N, fourth direction. DETAILED DESCRIPTION

[0031] The features and exemplary embodiments of various aspects of the present application will be described in detail below. In the detailed description below, many specific details are set forth in order to provide a comprehensive understanding of the present application. However, it will be apparent to those skilled in the art that the present application can be implemented without some of these specific details. The following description of the embodiments is merely intended to provide a better understanding of the present application by illustrating examples of the present application. In the accompanying drawings and the following description, at least some of the well-known structures and technologies are not shown in order to avoid unnecessary ambiguity in the present application; and, for clarity, the sizes of some structures may be exaggerated. In addition, the features, structures, or characteristics described below may be combined in any suitable manner in one or more embodiments.

[0032] In the description of this application, it should be noted that, unless otherwise specified, "plurality" means more than two; terms such as "upper," "lower," "left," "right," "inner," and "outer" indicating directions or positional relationships are merely for the purpose of facilitating the description of this application and simplifying the description. They do not indicate or imply that the devices or components referred to must have a specific orientation, be constructed, or operate in a specific orientation, and therefore should not be construed as limiting this application. Furthermore, terms such as "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance.

[0033] The directional words appearing in the following description are all directions shown in the figures, and do not limit the specific structure of the embodiments of this application. In the description of this application, it should also be noted that, unless otherwise clearly specified and limited, the terms "installation" and "connection" should be understood in a broad sense. For example, it can be a fixed connection, a detachable connection, or an integral connection; it can be directly connected or indirectly connected. For ordinary technicians in this field, the specific meanings of the above terms in this application can be understood according to the specific circumstances.

[0034] Photolithography is a major process in the production of integrated circuits. It is a pattern transfer technology that transfers the pattern on the mask to a substrate coated with photoresist and removes specific parts of the thin film on the substrate surface through a series of processes. The general photolithography process involves substrate surface cleaning, drying, primer coating, spin coating of photoresist, soft baking, alignment, exposure, post-baking, development, hard baking, etching, and testing. Among them, the exposure process requires the use of a photomask. During the production process, in order to reduce the exposure of the photomask to external dust particles and chemical contamination, the photomask will be stored in a photomask box 001. When taking and placing the photomask, the bottom 005 of the photomask may fall off. At the same time, when the photomask is stored, whether the position of the storage area is deviated from the preset position, and whether the photomask is placed upside down will affect production efficiency. Therefore, the present application provides a photomask loading and unloading device for a photolithography machine to solve the above problems.

[0035] In order to better understand the present application, the photolithography machine mask loading and unloading device of the embodiment of the present application is described in detail below with reference to Figures 1 to 5.

[0036] Figure 1 is one of the structural schematic diagrams of a photomask loading and unloading device for a lithography machine provided in an embodiment of the first aspect of the present application, Figure 2 is a second structural schematic diagram of a photomask loading and unloading device for a lithography machine provided in an embodiment of the present application, Figure 3 is a third structural schematic diagram of a photomask loading and unloading device for a lithography machine provided in an embodiment of the present application, Figure 4 is a fourth structural schematic diagram of a photomask loading and unloading device for a lithography machine provided in an embodiment of the present application, and Figure 5 is a fifth structural schematic diagram of a photomask loading and unloading device for a lithography machine provided in an embodiment of the present application.

[0037] Please refer to Figures 1 and 2 together. An embodiment of the first aspect of the present application provides a photomask loading and unloading device for a lithography machine, comprising: a support frame 000, a detection platform 100, and a transfer mechanism. A photomask box 001 is provided on the support frame 000, and the photomask box 001 has a receiving cavity 002 for receiving the photomask and a first opening 003 connected to the receiving cavity 002. The detection platform 100 includes a main platform 101 and an optoelectronic component provided on the main platform 101, and the optoelectronic component includes two optoelectronic modules 102 located on both sides of the main platform 101 in a first direction X and sensing each other. The transfer mechanism is used to transfer the photomask box 001 from the support frame 000 to the detection platform 100, and to make the first opening 003 face the main platform 101, so that the optoelectronic module 102 can detect the position of the photomask.

[0038] According to an embodiment of the first aspect of the present application, a photomask loading and unloading device for a lithography machine includes: a support frame 000, an inspection platform 100, and a transfer mechanism. The support frame 000 is used to place a photomask box 001, which has a storage cavity 002 and a first opening 003. The photomask can be placed in the storage cavity through the first opening 003. The photomask box 001 is used to protect the photomask during storage and transfer, reducing the photomask from external dust particles and chemical contamination. The inspection platform 100 includes a main platform 101 and an optoelectronic component disposed on the main platform 101. The optoelectronic component includes two optoelectronic modules 102 located on both sides of the main platform 101 in a first direction X and sensing each other. The two optoelectronic modules 102 emit infrared light to detect whether the bottom 005 of the photomask has fallen off. The transfer mechanism is used to transfer the photomask box 001 from the support frame 000 to the inspection platform 100, with the first opening 003 facing the main platform 101, so that the optoelectronic module 102 can detect whether the bottom 005 of the photomask has fallen off from the first opening 003. When the bottom 005 of the mask falls off, the light emitted by the two optoelectronic modules 102 will be blocked by the bottom 005 of the mask, thereby sensing the fall-off of the bottom 005 of the mask. The photolithography machine mask loading and unloading device provided in the embodiment of the application detects whether the bottom 005 of the mask has fallen off through the optoelectronic components located on the detection platform 100, eliminating the need for manual operation, improving the accuracy of mask detection, and realizing automation in the loading and unloading process, thereby improving production efficiency.

[0039] Optionally, as shown in FIG. 2 , the support frame 000 is a storage area for the mask box 001 . The support frame 000 usually has multiple layers, and multiple mask boxes 001 are placed at intervals on each layer.

[0040] Optionally, the transfer mechanism may be a robotic arm, a gripper, etc. for transferring the mask box.

[0041] In some optional embodiments, the number of the optoelectronic components is more than two, and the more than two optoelectronic components are arranged at intervals along the second direction Y.

[0042] In these optional embodiments, two or more optoelectronic components may be spaced apart along the second direction Y. When the reticle box 001 tilts and falls, the optoelectronic module 102 on one side cannot sense the fallen reticle bottom 005, while the optoelectronic module 102 on the other side can sense the fallen reticle bottom 005, thereby reducing the possibility of misjudging that the reticle bottom 005 has not fallen off when the reticle box 001 tilts and falls.

[0043] Optionally, there are two optoelectronic components, and two optoelectronic modules 102 are provided on both sides of the main platform 101 in the first direction X. The two optoelectronic modules 102 on one side are spaced apart along the second direction Y.

[0044] In some optional embodiments, the maximum distance between the light 104 emitted by the optoelectronic module 102 and the main platform 101 is less than 5 mm. For example, the maximum distance between the light 104 emitted by the optoelectronic module 102 and the surface of the main platform 101 facing the reticle box is less than 5 mm.

[0045] In these optional embodiments, the maximum distance between the light 104 emitted by the photoelectric module 102 and the main platform 101 is less than 5 mm, so that the light 104 is located between the gap between the mask box 001 and the main platform 101, and will not touch the bottom 005 of the mask that has not fallen off, thereby reducing the possibility of misjudgment.

[0046] In some optional embodiments, the main platform 101 further includes two side edges 103 oppositely arranged along the second direction Y, and the maximum distance between the light 104 emitted by the optoelectronic module 102 and the side edges 103 along the second direction Y is less than or equal to 5 mm.

[0047] In these optional embodiments, the maximum distance between the light 104 emitted by each photoelectric module 102 and the side edge 103 adjacent to the light 104 in the second direction Y is less than or equal to 5 mm. This reduces the possibility that when the photoelectric module 102 is too far from the side edge 103 when the photoelectric cassette 001 tilts and falls off, it may fail to sense the fallen photomask bottom 005. Alternatively, the maximum distance between the light 104 emitted by the photoelectric module 102 and the side edge 103 along the second direction Y may be equal to 3 mm.

[0048] In some optional embodiments, as shown in Figures 3, 4 and 5, the support frame 000 includes a working area 200, a table 201 of the working area 200 is used to place the mask box 001, and a sensor 202 is provided on the side of the support frame 000 facing away from the table 201, and the sensor 202 is used to emit infrared light to sense whether the mask box 001 is placed in the working area 200.

[0049] Optionally, the working area 200 is an area on the support frame 000 where various detection operations are performed, including the table 201 and the space above the table 201 .

[0050] The optional lithography machine mask loading and unloading device further includes a detection module, which is used to receive information from the sensor 202 and determine the placement of the mask box 001.

[0051] In these optional embodiments, the support frame 000 includes a work area 200, which is provided with a sensor 202. When a reticle pod 001 is placed on the table 201 of the work area 200, the sensor 202 detects the presence of the reticle pod 001 in the work area 200. The detection module receives the information from the sensor 202 and determines that the reticle pod 001 is placed in the work area 200. When the reticle pod 001 is not placed on the table 201, the sensor 202 detects that the reticle pod 001 is not placed in the work area 200. The detection module receives the information from the sensor 202 and determines that the reticle pod 001 is not placed in the work area 200.

[0052] In some optional embodiments, the working area 200 is provided with a detection mechanism 203 , and the bottom 005 of the mask is provided with a structure frame 004 . The detection mechanism 203 is used to detect position information of the structure frame 004 .

[0053] In these optional embodiments, the detection module can also receive information from the detection mechanism 203 and determine the orientation of the reticle box 001. The reticle is provided with a structure frame 004. The detection mechanism 203 detects the position of the structure frame 004 to determine whether the reticle is oriented correctly. If the detection mechanism 203 does not detect the structure frame 004, the detection module receives the information from the detection mechanism 203 and determines that the reticle is oriented incorrectly. If the detection mechanism 203 detects the structure frame 004, the detection module receives the information from the detection mechanism 203 and determines that the reticle is oriented correctly.

[0054] Optionally, the reticle box 001 has multiple structural frames 004 at its bottom. When the reticle box 001 is placed in the workspace 200, the structural frames 004 on either side of the reticle along the fourth direction N are at different distances from the reticle box 001. Therefore, a detection mechanism 203 can be provided vertically spaced from the structural frames 004 on one side of the reticle box 001 in the workspace 200. If the reticle box 001 is placed upside down, as shown in FIG3 , the structural frames 004 on the other side will not come into contact with the detection mechanism 203. Therefore, the detection module cannot detect the structural frames 004 on one side, allowing the detection module to receive information from the detection mechanism 203 and determine that the reticle is placed in the wrong orientation. Therefore, whether the detection mechanism 203 detects the structural frame 004 can be used to determine whether the reticle box 001 is placed upside down.

[0055] In some optional embodiments, the detection mechanism 203 includes a mounting portion 204 and a rotating portion 205. The table 201 is recessed to form a groove, and the mounting portion 204 is disposed in the groove. The rotating portion 205 is rotatable relative to the mounting portion 204 between a first position and a second position. In the first position, the rotating portion 205 protrudes from the table 201. In the second position, the rotating portion 205 is located on a side of the mounting portion 204 facing away from the table 201, and the rotating portion 205 is in contact with the structural frame 004.

[0056] In these optional embodiments, the detection mechanism 203 includes a mounting portion 204 and a rotating portion 205. The mounting portion 204 is positioned in a recessed groove formed in the table 201. The rotating portion 205 is rotatable relative to the mounting portion 204 between a first position and a second position. Initially, the rotating portion 205 is in the first position, protruding from the table 201. When a reticle pod 001 is placed on the table 201, if the reticle pod 001 is correctly oriented, as shown in FIG4 , the structural frame 004 presses the rotating portion 205 downward and rotates it to the second position. In the second position, the rotating portion 205 is located on the side of the mounting portion 204 facing away from the table 201, and the rotating portion 205 and the structural frame 004 are in contact. If the reticle pod 001 is placed in the incorrect orientation, the rotating portion 205 is not pressed downward by the structural frame 004 and remains in the first position.

[0057] In some optional embodiments, the mounting portion 204 is movably disposed along the fourth direction N in the groove.

[0058] In these optional embodiments, the mounting portion 204 is movably arranged in the groove along the fourth direction N so that the detection mechanism 203 can adapt to the structural frames 004 at different positions corresponding to the reticle boxes 001 of different sizes.

[0059] In some optional embodiments, as shown in Figure 5, the table top 201 is provided with two first limit blocks 206 arranged relatively along the third direction M, the first limit block 206 includes a first segment 206a extending along the third direction M and a second segment 206b extending along the fourth direction N, the two first segments 206a are located between the two second segments 206b, and two second optoelectronic modules 208 are provided on the second segment 206b.

[0060] In these optional embodiments, the table 201 is provided with two first limit blocks 206 arranged opposite each other along the third direction M. The first limit blocks 206 include a first segment 206a extending along the third direction M and a second segment 206b extending along the fourth direction N. The two first segments 206a are located between the two second segments 206b. The reticle pod 001 can be placed between the two first limit blocks 206, and the first limit blocks 206 can limit the displacement of the reticle pod 001 in the third direction M. Simultaneously, two second photoelectric modules 208 are provided on the second segments 206b to detect whether the current position of the reticle pod 001 deviates from a preset position.

[0061] Optionally, when the second photoelectric module 208 does not sense the reticle box 001, the detection module receives information from the second photoelectric module 208 and determines that there is a deviation between the current position of the reticle box 001 and the preset position. When the second photoelectric module 208 senses the reticle box 001, the detection module receives information from the second photoelectric module 208 and determines that the current position of the reticle box 001 is consistent with the preset position.

[0062] In some optional embodiments, the table 201 is further provided with a second limit block 207 arranged opposite to the two first limit blocks 206 along the fourth direction N, the second limit block 207 includes a main body 207a extending along the third direction M and a branch 207b located on both sides of the main body 207a along the third direction M, the branch 207b extends along the fourth direction N and is located on the side of the main body 207a facing the first limit block 206, and the two first limit blocks 206 and the second limit block 207 enclose a working area 200 for placing the mask.

[0063] In these optional embodiments, the table 201 is further provided with a second stopper 207 disposed opposite the two first stoppers 206 along the fourth direction N. The second stopper 207 and the first stopper 206 can limit the displacement of the reticle pod 001 in the fourth direction N. The second stopper 207 includes a main portion 207a extending along the third direction M and sub-portions 207b located on either side of the main portion 207a along the third direction M. The sub-portions 207b extend along the fourth direction N and are located on the side of the main portion 207a facing the first stopper 206. The two first stoppers 206 and the second stopper 207 together form a working area 200 for placing the reticle. The main portion 207a and the first sub-portion 206a can limit the displacement of the reticle pod 001 in the fourth direction N, and the two sub-portions 207b and the second sub-portion 206b can further limit the displacement of the reticle pod 001 in the third direction M.

[0064] Optionally, when the sensor 202 senses that a mask box 001 is placed on the workbench, and the detection mechanism 203 senses that the mask box 001 is placed in the correct direction, and at the same time the second photoelectric module 208 located on the first limit block 206 senses that the placement position of the mask box 001 is consistent with the preset position, the detection module determines that the placement of the mask box 001 is completed, and then automatically loads and unloads the mask to ensure the effectiveness and accuracy of the automatic loading and unloading of the mask.

[0065] The above description is only a specific embodiment of the present application. Those skilled in the art will clearly understand that for the convenience and brevity of description, the specific working processes of the systems, modules and units described above can refer to the corresponding processes in the aforementioned method embodiments, and will not be repeated here. It should be understood that the scope of protection of the present application is not limited thereto. Any person skilled in the art can easily think of various equivalent modifications or replacements within the technical scope disclosed in the present application, and these modifications or replacements should be included in the scope of protection of the present application.

Claims

1. A photomask loading and unloading device for a photolithography machine, wherein: include: A support frame, wherein a mask box is provided on the support frame, and the mask box has an accommodating cavity for accommodating the mask and a first opening communicating with the accommodating cavity; The detection platform includes a main platform and a photoelectric component disposed on the main platform, wherein the photoelectric component includes two photoelectric modules located on both sides of the main platform in a first direction and sensing each other; The transfer mechanism is used to transfer the mask box from the support frame to the detection platform, and to make the first opening face the main platform so that the photoelectric module can detect the position of the mask.

2. The photomask loading and unloading device for a photolithography machine according to claim 1, wherein: The number of the optoelectronic components is more than two, and the more than two optoelectronic components are spaced apart along the second direction.

3. The photomask loading and unloading device for a photolithography machine according to claim 1, wherein: The maximum distance between the light emitted by the photoelectric module and the main platform is less than 5 mm.

4. The photomask loading and unloading device for a photolithography machine according to claim 1, wherein: The main platform further includes two side edges arranged opposite to each other along a second direction, and a maximum distance from the light emitted by the photoelectric module to the side edges along the second direction is less than or equal to 5 mm.

5. The photomask loading and unloading device for a photolithography machine according to claim 1, wherein: The support frame includes a working area, a table top of the working area is used to place the mask box, and a sensor is provided on a side of the support frame away from the table top, and the sensor is used to detect whether there is a mask box in the working area.

6. The photomask loading and unloading device for a lithography machine according to claim 5, wherein: The working area is provided with a detection mechanism, the light mask is provided with a structure frame, and the detection mechanism is used to detect position information of the structure frame.

7. The photomask loading and unloading device for a photolithography machine according to claim 6, wherein: The detection mechanism includes a mounting portion and a rotating portion. The table top is recessed to form a groove. The mounting portion is disposed in the groove. The rotating portion is rotatable relative to the mounting portion between a first position and a second position. Wherein, in the first position, the rotating portion is protruding from the table surface, and in the second position, the rotating portion is located on the side of the mounting portion away from the table surface, and the rotating portion is in contact with the structural frame.

8. The photomask loading and unloading device for a photolithography machine according to claim 7, wherein: The mounting portion is movably arranged in the groove along a fourth direction.

9. The photomask loading and unloading device for a lithography machine according to claim 5, wherein: The table top is provided with two first limit blocks arranged opposite to each other along the third direction, the first limit blocks include a first segment extending along the third direction and a second segment extending along the fourth direction, the two first segments are located between the two second segments, and two second optoelectronic modules are provided on the second segments.

10. The photomask loading and unloading device for a photolithography machine according to claim 9, wherein: The table top is also provided with a second limit block arranged along the fourth direction opposite to the two first limit blocks, the second limit block includes a main body extending along the third direction and branches located on both sides of the main body along the third direction, the branches extend along the fourth direction and are located on the side of the main body facing the first limit block, the two first limit blocks and the second limit block enclose the working area for placing the mask.

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