Positive photosensitive resin composition, cured film containing cured product of same, organic el display device, and electronic device

Abstract

The purpose of the present invention is to provide a positive photosensitive resin composition which is capable of forming a pixel division layer and / or a planarization layer that enables the achievement of an organic EL display device which has excellent long-term reliability by suppressing the occurrence of footing. The present invention provides the positive photosensitive resin composition which contains (a) a resin, (b) a photoacid generator, and (c) a solvent, wherein the resin (a) contains a repeating unit represented by a specific formula (3) and / or a repeating unit represented by a specific formula (4) in addition to a repeating unit represented by a specific formula (1) and a repeating unit represented by a specific formula (2).

Description

Positive-type photosensitive resin composition and cured film containing the cured product thereof, organic EL display device, and electronic device

[0001] The present invention relates to a positive photosensitive resin composition, a cured film containing the cured product thereof, an organic EL display device, and an electronic device.

[0002] Organic electroluminescence (EL) display devices are attracting attention as next-generation flat panel displays in fields such as smartphones, tablet PCs, and televisions. Compared to conventional liquid crystal display devices, organic EL display devices have a wider viewing angle and higher contrast, and can also be made thinner and more flexible, so research and development into these devices is currently underway.

[0003] An organic EL display device typically comprises a planarizing layer, which is an underlying insulating layer that has the function of planarizing convex steps resulting from wiring formed on a substrate, as well as a pixel dividing layer, which is an insulating layer that has the function of separating each light-emitting pixel, such as red, blue, or green, and both layers are generally formed by photolithography.

[0004] It is known that pixel division layers and planarization layers significantly affect the long-term reliability of organic EL display devices. Materials for forming the planarization layer and pixel division layer include resin compositions with positive or negative photosensitivity. For example, Patent Document 1 discloses a photosensitive resin composition containing a polyimide resin, a polyimide precursor, a polybenzoxazole precursor, or a polysiloxane resin. It also discloses that by controlling the amount of acid anhydride groups in a pixel division layer formed using these materials within a specific range, pixel shrinkage is less likely to occur and a high pixel light-emitting area ratio can be maintained, resulting in an organic EL display device with excellent long-term reliability.

[0005] Recently, with the aim of developing economically advantageous organic EL display devices, attempts have been made to form pixel division layers and planarization layers using photosensitive resin compositions containing resins composed of repeating units derived from vinyl monofunctional monomers. Generally, vinyl monofunctional monomers are low cost and can be polymerized in low-cost organic solvents using simple methods, making resins composed of repeating units derived from vinyl monofunctional monomers economically advantageous. In particular, positive-tone photosensitivity has attracted attention because, for example, in the event of a malfunction during the manufacturing process, such as misalignment between the substrate and the exposure mask, the film can be easily removed by dissolving in a solvent or alkaline developer before the curing step, thereby enabling the substrate to be reused at least after electrode formation, which is economically advantageous. Furthermore, as designs become more diverse and high transparency is required depending on the layer structure of the display device, positive-tone photosensitive resin compositions that are not colored with pigments or dyes are attracting attention.

[0006] As an example of a resin composition containing a resin composed of repeating units derived from a vinyl-based monofunctional monomer, having positive photosensitivity, and not containing a colorant, a positive photosensitive resin composition for forming an interlayer insulating film of a liquid crystal display is disclosed in Patent Document 2. Patent Document 2 discloses a positive photosensitive resin composition containing only a methacrylate ester copolymer having repeating units containing a benzotriazole skeleton and a phenol skeleton as the resin.

[0007] International Publication No. 2016 / 143740 Japanese Patent Application Laid-Open No. 2023-23224

[0008] However, Patent Document 2 discloses a positive-type photosensitive resin composition containing only a methacrylate ester copolymer having a repeating unit containing a benzotriazole skeleton and a phenol skeleton as the resin, but does not suggest at all its suitability for use as a pixel dividing layer or planarizing layer in an organic EL display device. Therefore, when pixel dividing layers and planarizing layers are formed using the positive-type photosensitive resin composition disclosed in Patent Document 2, there is a problem that footing occurs significantly at the edges, and the linearity of the openings is low, and the brightness of the edges of the emitting pixels is visually lower than that of the center. Furthermore, there is a problem that pixel shrinkage progresses rapidly in the final organic EL display device, which tends to reduce the pixel emitting area ratio, resulting in insufficient long-term reliability.

[0009] In view of the above, there has been a strong demand for a positive-type photosensitive resin composition that contains a resin composed of repeating units derived from a vinyl-based monofunctional monomer and that enables the formation of pixel dividing layers and / or planarizing layers that suppress the occurrence of footing, thereby enabling the production of organic EL display devices with excellent long-term reliability. There has also been a strong demand for an organic EL display device with excellent long-term reliability that contains a cured product of a positive-type photosensitive resin composition that contains a resin composed of repeating units derived from a vinyl-based monofunctional monomer and that is provided with pixel dividing layers and / or planarizing layers that suppress the occurrence of footing.

[0010] In order to solve the above problems, the present invention has the following configuration: [1] A positive photosensitive resin composition containing (a) a resin, (b) a photoacid generator, and (c) a solvent, wherein the resin (a) contains a repeating unit represented by formula (1) and a repeating unit represented by formula (2), as well as a repeating unit represented by formula (3) and / or a repeating unit represented by formula (4).

[0011]

[0012] In formula (1), formula (2), formula (3) and formula (4), * １ , * ２ , * ３ , * ４ , * ５ , * ６, * ７ and * ８ represents a binding site, and R １ and R ５ each independently represents a hydrogen atom or a methyl group, R ２ represents a monovalent group containing a benzotriazole skeleton and a phenol skeleton, R ３ and R ４ does not contain a benzotriazole skeleton, and each independently represents a monovalent group having 1 to 20 carbon atoms or a hydrogen atom; R ６ represents an aryl group having 6 to 15 carbon atoms and not containing a benzotriazole skeleton. [2] The positive photosensitive resin composition according to [1], wherein, in the resin (a), when the total of the number of moles of the repeating unit represented by formula (2), the number of moles of the repeating unit represented by formula (3), and the number of moles of the repeating unit represented by formula (4) is taken as 100.0 mol %, the content of the repeating unit represented by formula (2) is 15.0 to 90.0 mol %. [3] The positive photosensitive resin composition according to [1] or [2], wherein the resin (a) contains (a-1) a copolymer having, in one molecule, a repeating unit represented by formula (3) and / or a repeating unit represented by formula (4) in addition to the repeating unit represented by formula (1) and the repeating unit represented by formula (2), and the content of the repeating unit represented by formula (2) in the component (a-1) is 15.0 to 90.0 mol % when the sum of the number of moles of the repeating unit represented by formula (2), the number of moles of the repeating unit represented by formula (3), and the number of moles of the repeating unit represented by formula (4) is 100.0 mol %. [4] The positive photosensitive resin composition according to any one of [1] to [3], wherein the total content of the repeating unit represented by formula (1), the repeating unit represented by formula (2), the repeating unit represented by formula (3), and the repeating unit represented by formula (4) is 70 to 100 mass% relative to 100 mass% of the (a) resin. [5] The positive photosensitive resin composition according to any one of [1] to [4], wherein the (a) resin contains a repeating unit represented by formula (5) and / or a repeating unit represented by formula (6).

[0013]

[0014] In formula (5) and formula (6), * ９ , * １０ , * １１ and * １２ represents the binding site, R ７ and R １１ are each independently —COO—, —CON(R １５ )-, -CONH- or a single bond, R １５ represents an alkyl group having 1 to 5 carbon atoms, and R ８ and R １２ each independently represents a divalent linking group containing an alkylene group and having 1 to 10 carbon atoms, or a single bond; R ９ and R １４ each independently represents an alkyl group having 1 to 10 carbon atoms substituted with one phenyl group, or an alkyl group having 1 to 10 carbon atoms; n １ and n ４ are integers, each independently representing 0 to 2; R １０ and R １３ each independently represents an alkyl group having 1 to 10 carbon atoms; n ２ and n ３ are integers, each independently representing 0 to 2. １ If is 2, R ９ may be the same group or different groups. ２ If is 2, R １０ may be the same group or different groups. ３ If is 2, R １３ may be the same group or different groups. ４ If is 2, R １４ may be the same group or different groups. [6] The positive photosensitive resin composition according to [3], wherein the component (a-1) further contains a repeating unit represented by formula (7):

[0015]

[0016] In formula (7), * １３ and * １４ represents a binding site, and R １６ and R １７each independently represents a monovalent hydrocarbon group having 1 to 4 carbon atoms or a hydrogen atom; R １８ represents a monovalent group having 1 to 10 carbon atoms, or a hydrogen atom. [7] The positive photosensitive resin composition according to any one of [1] to [6], wherein the repeating unit represented by formula (2) contains a repeating unit having a monovalent group containing an alicyclic hydrocarbon group not containing a cyclic ether structure. [8] A cured film comprising a cured product of the positive photosensitive resin composition according to any one of [1] to [7]. [9] An organic EL display device comprising a substrate, a planarizing layer, a first electrode, a pixel dividing layer, light-emitting pixels, and a second electrode in this order, wherein the pixel dividing layer and / or the planarizing layer contains a cured product of a positive photosensitive resin composition containing (a) a resin, (b) a photoacid generator, and (c) a solvent, and wherein the (a) resin contains a repeating unit represented by formula (3) and / or a repeating unit represented by formula (4) in addition to the repeating unit represented by formula (1) and the repeating unit represented by formula (2).

[0017]

[0018] In formula (1), formula (2), formula (3) and formula (4), * １ , * ２ , * ３ , * ４ , * ５ , * ６ , * ７ and * ８ represents a binding site, and R １ and R ５ each independently represents a hydrogen atom or a methyl group, R ２ represents a monovalent group containing a benzotriazole skeleton and a phenol skeleton, R ３ and R ４ does not contain a benzotriazole skeleton, and each independently represents a monovalent group having 1 to 20 carbon atoms or a hydrogen atom; R ６represents an aryl group having 6 to 15 carbon atoms and not containing a benzotriazole skeleton.

[10] The organic EL display device according to [9], wherein the pixel dividing layer comprises a layer (A) containing a cured product of a negative-type photosensitive pigment composition containing an organic black pigment, and a layer (B) on a surface of the layer (A) containing a cured product of a positive-type photosensitive resin composition containing (a) a resin, (b) a photoacid generator, and (c) a solvent.

[11] An electronic device comprising the organic EL display device according to [9] or

[10] .

[0019] According to the positive photosensitive resin composition of the present invention, a pixel dividing layer and / or a planarizing layer that can provide an organic EL display device with excellent long-term reliability can be formed while suppressing the occurrence of footing.

[0020] 1 is a cross-sectional view of a TFT substrate in an organic EL display device that is a specific example of an embodiment of the present invention; FIG. 2 is a schematic diagram of an end cross-section of a pixel division layer in which footing has occurred at the end; FIG. 3 is an image, taken with a scanning electron microscope, of an end cross-section of a pixel division layer in which footing has occurred at the end; FIG. 4 is a schematic diagram of an emissive pixel section that has an emissive region and no non-emissive region; FIG. 5 is a schematic diagram of an emissive pixel section that has an emissive region and a non-emissive region; FIG. 6 is a cross-sectional view showing a specific example of a substrate on which a pixel division layer made of a laminated film of layer (A) and layer (B) and a spacer layer made of layer (B) are formed;

[0021] The present invention will be described in detail below. A numerical range expressed using "to" means a range that includes the numerical values ​​before and after "to" as the lower and upper limits. The pixel division layer refers to a pixel division layer provided in an organic EL display device and does not include an interlayer insulating film provided in a liquid crystal display device. The planarization layer refers to a planarization layer provided in an organic EL display device and does not include an interlayer insulating film provided in a liquid crystal display device. Visible light refers to light in the wavelength range of 380 nm or more and less than 780 nm, and near ultraviolet light refers to light in the wavelength range of 200 nm or more and less than 380 nm. The weight-average molecular weight (Mw) is a value obtained by analyzing by gel permeation chromatography (GPC) using N-methylpyrrolidone as a carrier and converting using a calibration curve based on standard polystyrene. The resin refers to a compound having a weight-average molecular weight (Mw) of 1,000 or more and a structure in which 10 or more repeating units are bonded in succession. The solid content refers to the components of the positive-type photosensitive resin composition excluding organic solvents and water.

[0022] The inventors of the present invention have verified that when the positive photosensitive resin composition described in Patent Document 2 is used, the footing occurs during the development process and remains after the curing process. Furthermore, it was considered that the resin component is not suitable for achieving sufficient long-term reliability. As a result of extensive research, the inventors of the present invention have found that a positive photosensitive resin composition having the following composition exhibits a particularly remarkable effect in solving the above-mentioned problems.

[0023] That is, the positive photosensitive resin composition according to the first aspect of the present invention is a positive photosensitive resin composition containing (a) a resin, (b) a photoacid generator, and (c) a solvent, wherein the resin (a) contains a repeating unit represented by formula (1) and a repeating unit represented by formula (2), as well as a repeating unit represented by formula (3) and / or a repeating unit represented by formula (4).

[0024]

[0025] In formula (1), formula (2), formula (3) and formula (4), * １ , * ２ , * ３ , * ４ , *５ , * ６ , * ７ and * ８ represents a binding site, and R １ and R ５ each independently represents a hydrogen atom or a methyl group, R ２ represents a monovalent group containing a benzotriazole skeleton and a phenol skeleton, R ３ and R ４ does not contain a benzotriazole skeleton, and each independently represents a monovalent group having 1 to 20 carbon atoms or a hydrogen atom; R ６ represents an aryl group having 6 to 15 carbon atoms and not containing a benzotriazole skeleton.

[0026] The positive-type photosensitive resin composition of the present invention contains resin (a) as an essential component. The inclusion of resin (a) enables the formation of a pixel dividing layer and a planarizing layer. Furthermore, in the positive-type photosensitive resin composition of the present invention, resin (a) contains, in addition to the repeating unit represented by formula (1) and the repeating unit represented by formula (2), a repeating unit represented by formula (3) and / or a repeating unit represented by formula (4). This allows the pixel dividing layer and / or planarizing layer to be formed while suppressing the occurrence of footing, thereby suppressing the progression of pixel shrinkage and maintaining a high pixel light-emitting area ratio, thereby providing an organic EL display device with excellent long-term reliability.

[0027]

[0028] In formula (1), formula (2), formula (3) and formula (4), * １ , * ２ , * ３ , * ４ , * ５ , * ６ , * ７ and * ８ represents a binding site, and R １ and R ５ each independently represents a hydrogen atom or a methyl group, R ２ represents a monovalent group containing a benzotriazole skeleton and a phenol skeleton, R ３ and R ４does not contain a benzotriazole skeleton, and each independently represents a monovalent group having 1 to 20 carbon atoms or a hydrogen atom; R ６ represents an aryl group having 6 to 15 carbon atoms and not containing a benzotriazole skeleton.

[0029] Here, pixel shrinkage refers to a phenomenon in which, starting from the initial drive of an organic EL display device, the non-light-emitting portion gradually progresses from the edge to the center of the light-emitting pixel over time, reducing the area of ​​the light-emitting portion. The pixel light-emitting area ratio (%) refers to the ratio of the area of ​​the light-emitting portion to the area of ​​the light-emitting pixel. A higher pixel light-emitting area ratio is desirable because it allows the brightness per area of ​​the display portion of the organic EL display device to be maintained at a high level. Excellent long-term reliability means that a high pixel light-emitting area ratio is maintained, and the better the long-term reliability, the higher the value of the organic EL display device. The display portion here refers to the portion that displays text information and images.

[0030] Generally, when an organic EL display device is continuously driven and irradiated with light, the organic EL elements tend to deteriorate more rapidly than when the organic EL display device is not driven and the pixel light-emitting area ratio tends to be lower. Furthermore, the pixel light-emitting area ratio tends to be more susceptible to the influence of the smaller the area per pixel, and tends to be lower. In other words, the technical effect of the present invention is more advantageous for high-definition panels with smaller pixel sizes and superior display quality.

[0031] In the resin (a), when the sum of the number of moles of the repeating unit represented by formula (2), the number of moles of the repeating unit represented by formula (3), and the number of moles of the repeating unit represented by formula (4) is taken as 100.0 mol%, the content of the repeating unit represented by formula (2) is preferably 15.0 to 90.0 mol%, more preferably 40.0 to 80.0 mol%, in order to improve long-term reliability. Furthermore, in order to suppress footing, the content is preferably 15.0 to 90.0 mol%, more preferably 40.0 to 80.0 mol%.

[0032] That is, in the positive photosensitive resin composition of the present invention, when the sum of the number of moles of the repeating unit represented by formula (2), the number of moles of the repeating unit represented by formula (3), and the number of moles of the repeating unit represented by formula (4) in the resin (a) is taken as 100.0 mol %, it is preferable that the content ratio of the repeating unit represented by formula (2) is 15.0 to 90.0 mol %.

[0033] In addition, in order to improve long-term reliability, the total content of the repeating unit represented by formula (1), the repeating unit represented by formula (2), the repeating unit represented by formula (3), and the repeating unit represented by formula (4) is preferably 70 to 100 mass % relative to 100 mass % of the (a) resin.

[0034] That is, in the positive photosensitive resin composition of the present invention, the total content of the repeating unit represented by the formula (1), the repeating unit represented by the formula (2), the repeating unit represented by the formula (3), and the repeating unit represented by the formula (4) is preferably 70 to 100% by mass relative to 100% by mass of the resin (a).

[0035] In order to suppress the tailing, it is preferable that the resin (a) contains an alkali-soluble resin, and that the alkali-soluble resin contains, in addition to the repeating unit represented by formula (1) and the repeating unit represented by formula (2), a repeating unit represented by formula (3) and / or a repeating unit represented by formula (4). The alkali-soluble resin here means a resin having a carboxyl group and / or a hydroxyl group.

[0036] From the viewpoint of economical advantage, the repeating unit represented by formula (1), the repeating unit represented by formula (2), the repeating unit represented by formula (3) and the repeating unit represented by formula (4) are preferably repeating units derived from a vinyl monofunctional monomer. The vinyl monofunctional monomer referred to here is a vinyl group (CH ２ =C(CH ３ )-), or vinyl group (CH ２ (a) refers to a compound that has only one ═CH— group in one molecule and does not belong to a resin.

[0037] The repeating unit represented by formula (1) is soluble in an alkaline developer, has the effect of suppressing electrode deterioration, and is an essential repeating unit for obtaining excellent long-term reliability. ２ is a monovalent group containing a benzotriazole skeleton and a phenol skeleton. The benzotriazole skeleton as used herein includes the skeleton represented by formula (8), the skeleton represented by formula (9), the skeleton represented by formula (10), and the skeleton represented by formula (11), and the structure in which a substituent is bonded to a carbon atom constituting the benzotriazole skeleton is represented by R ２ The phenol skeleton includes the skeleton represented by formula (12). A structure in which a substituent is further bonded to a carbon atom constituting the phenol skeleton is represented by R ２ Examples of the group containing a phenol skeleton include a hydroxyphenylene group, a dihydroxyphenylene group, a hydroxyphenyl group, and a dihydroxyphenyl group. R ２ is preferably a group consisting of only carbon atoms, hydrogen atoms, nitrogen atoms and oxygen atoms in order to improve long-term reliability.

[0038]

[0039] In formulas (8) to (12), * １５ , * １６ , * １７ , * １８ and * ４０ represents the binding site.

[0040] R ２ In order to improve long-term reliability, it is preferable that the group having a benzotriazole skeleton and a phenol skeleton has a skeleton represented by formula (13) or a skeleton represented by formula (14). A structure in which a substituent is further bonded to a carbon atom constituting these skeletons is R ２ may be included in

[0041]

[0042] In formula (13) and formula (14), * １９ and * ２０ represents the binding site.

[0043] As the repeating unit represented by formula (1), a repeating unit represented by formula (15) or a repeating unit represented by formula (16) is preferred in terms of improving long-term reliability.

[0044]

[0045] In formula (15) and formula (16), * ２１ , * ２２ , * ２３ and * ２４ represents the binding site, R １９ and R ２４ each independently represents a hydrogen atom or a methyl group, R ２０ and R ２５ are each independently —COO—, —CON(R ３０ )-, -CONH- or a single bond, R ３０ represents an alkyl group having 1 to 5 carbon atoms, and R ２１ and R ２６ each independently represents a divalent linking group containing an alkylene group and having 1 to 10 carbon atoms, or a single bond; R ２２ and R ２８ each independently represents an alkyl group having 1 to 10 carbon atoms substituted with one phenyl group, or an alkyl group having 1 to 10 carbon atoms; n ５ and n ８ are integers, each independently representing 0 to 2; R ２３ and R ２７ each independently represents an alkyl group having 1 to 10 carbon atoms; n ６ and n ７ are integers, each independently representing 0 to 2. ５ If is 2, R ２２ may be the same group or different groups. ６ If is 2, R ２３ may be the same group or different groups. ７ If is 2, R ２７ may be the same group or different groups. ８ If is 2, R ２８ may be the same group or may be different groups.

[0046] In order to improve the long-term reliability, R in Equation (15) １９ , and R in formula (16) ２４ is more preferably a hydrogen atom. That is, in the positive photosensitive resin composition of the present invention, the (a) resin more preferably contains a repeating unit represented by formula (5) and / or a repeating unit represented by formula (6).

[0047]

[0048] In formula (5) and formula (6), * ９ , * １０ , * １１ and * １２ represents the binding site, R ７ and R １１ are each independently —COO—, —CON(R １５ )-, -CONH- or a single bond, R １５ represents an alkyl group having 1 to 5 carbon atoms, and R ８ and R １２ each independently represents a divalent linking group containing an alkylene group and having 1 to 10 carbon atoms, or a single bond; R ９ and R １４ each independently represents an alkyl group having 1 to 10 carbon atoms substituted with one phenyl group, or an alkyl group having 1 to 10 carbon atoms; n １ and n ４ are integers, each independently representing 0 to 2; R １０ and R １３ each independently represents an alkyl group having 1 to 10 carbon atoms; n ２ and n ３ are integers, each independently representing 0 to 2. １ If is 2, R ９ may be the same group or different groups. ２ If is 2, R １０ may be the same group or different groups. ３ If is 2, R １３ may be the same group or different groups. ４ If is 2, R １４may be the same group or may be different groups.

[0049] Specific examples of the repeating unit represented by formula (1) include a repeating unit represented by formula (17), a repeating unit represented by formula (18), a repeating unit represented by formula (19), a repeating unit represented by formula (20), and a repeating unit represented by formula (21).

[0050]

[0051] In formulas (17) to (21), * ２５ ~* ３４ represents the binding site.

[0052] Examples of the vinyl monofunctional monomer that serves as a source for introducing the repeating unit represented by formula (1) into the (a) resin include a vinyl group having a benzotriazole skeleton and a phenol skeleton and substituted with one methyl group, or a compound having one vinyl group in one molecule.

[0053] Examples of compounds having a benzotriazole skeleton and a phenol skeleton and a vinyl group substituted with one methyl group or a vinyl group in one molecule include compounds represented by formula (22), formula (23), formula (24), formula (25), and formula (26). These compounds can be used alone or in combination.

[0054]

[0055] The content of the repeating unit represented by formula (1) is preferably 1.0 mol% or more, more preferably 3.0 mol% or more, when the total number of moles of all repeating units derived from vinyl monofunctional monomers contained in the (a) resin is taken as 100.0 mol%, in order to improve long-term reliability, and is preferably 20.0 mol% or less, more preferably 15.0 mol% or less in order to suppress tailing.

[0056] From the viewpoint of economical advantage, the repeating unit represented by formula (2) is preferably a repeating unit derived from a compound having one acryloyloxy group in the molecule.３ is preferably a group composed of atoms selected from the group consisting of carbon atoms, hydrogen atoms, nitrogen atoms and oxygen atoms, in order to improve long-term reliability.

[0057] Preferred examples of compounds having one acryloyloxy group in the molecule include acrylate compounds having an acidic group, acrylate compounds having an alkyl group, acrylate compounds having a monovalent group containing an aromatic ring, acrylate compounds having a monovalent group containing an alicyclic hydrocarbon group not containing a cyclic ether structure, and acrylate compounds having a monovalent group containing a cyclic ether structure. By adjusting the type and ratio of these acrylate compounds, it is possible to control the optimal development time in the development step described below and the taper angle described below of the end cross section of each of the pixel dividing layer and the planarizing layer so that they fall within the desired range.

[0058] Examples of acrylate compounds having an acidic group include acrylic acid, 4-(4-acryloyloxy-butyl-1-oxy)benzoic acid, 2-hydroxyethyl acrylate, 4-hydroxybutyl acrylate, and 4-hydroxyphenyl acrylate. Examples of acrylate compounds having an alkyl group include methyl acrylate, ethyl acrylate, propyl acrylate, butyl acrylate, 2-ethylhexyl acrylate, and isostearyl acrylate. Examples of acrylate compounds having a monovalent group containing an aromatic ring include benzyl acrylate and naphthyl acrylate. Examples of acrylate compounds having a monovalent group containing an alicyclic hydrocarbon group that does not contain a cyclic ether structure include cyclohexyl acrylate, dicyclopentanyl acrylate, isobornyl acrylate, and acryloyloxyadamantane. Examples of acrylate compounds having a monovalent group containing a cyclic ether structure include glycidyl acrylate, a compound represented by formula (27), a compound represented by formula (28), and a compound represented by formula (29). These compounds are readily available as commercially available products, and can be used alone or in combination of two or more types.

[0059]

[0060] Among these, in order to improve long-term reliability, an acrylate compound having a monovalent group containing an alicyclic hydrocarbon group that does not contain a cyclic ether structure is preferred. That is, in the positive photosensitive resin composition of the present invention, the repeating unit represented by formula (2) preferably contains a repeating unit having a monovalent group containing an alicyclic hydrocarbon group that does not contain a cyclic ether structure.

[0061] From the viewpoint of economical advantage, the repeating unit represented by formula (3) is preferably a repeating unit derived from a vinyl monofunctional monomer having one methacryloyloxy group in the molecule. ４ is preferably a group composed of atoms selected from the group consisting of carbon atoms, hydrogen atoms, nitrogen atoms and oxygen atoms, in order to improve long-term reliability.

[0062] When the repeating unit represented by formula (3) is contained, the content ratio thereof is preferably 5.0 mol% or more, more preferably 10.0 mol% or more, when the total number of moles of all repeating units derived from vinyl monofunctional monomers contained in the (a) resin is 100.0 mol%. In order to increase the content ratio of the repeating unit represented by formula (2), the content ratio is preferably 50.0 mol% or less, more preferably 40.0 mol% or less.

[0063] Preferred examples of compounds having one methacryloyloxy group in the molecule include methacrylate compounds having an acidic group, methacrylate compounds having an alkyl group, methacrylate compounds having a monovalent group containing an aromatic ring, methacrylate compounds having a monovalent group containing an alicyclic hydrocarbon group that does not contain a cyclic ether structure, and methacrylate compounds having a monovalent group containing a cyclic ether structure.By adjusting the type and ratio of these methacrylate compounds, it is possible to control the optimal development time in the development step described below and the taper angle described below of the end cross section of each of the pixel dividing layer and the planarizing layer so that they fall within the desired range.

[0064] Examples of methacrylate compounds having an acidic group include methacrylic acid, 4-(4-methacryloyloxy-butyl-1-oxy)benzoic acid, 2-hydroxyethyl methacrylate, 4-hydroxybutyl methacrylate, and 4-hydroxyphenyl methacrylate. Examples of methacrylate compounds having an alkyl group include methyl methacrylate, ethyl methacrylate, propyl methacrylate, butyl methacrylate, 2-ethylhexyl methacrylate, and isostearyl methacrylate. Examples of methacrylate compounds having a monovalent group containing an aromatic ring include benzyl methacrylate and naphthyl methacrylate. Examples of methacrylate compounds having a monovalent group containing an alicyclic hydrocarbon group that does not contain a cyclic ether structure include cyclohexyl methacrylate, dicyclopentanyl methacrylate, isobornyl methacrylate, and methacryloyloxyadamantane. Examples of methacrylate compounds having a monovalent group containing a cyclic ether structure include glycidyl methacrylate, a compound represented by formula (30), a compound represented by formula (31), and a compound represented by formula (32). These compounds are readily available as commercial products, and can be used alone or in combination.

[0065]

[0066] In order to control the solubility in an alkaline developer within an appropriate range, the (a) resin preferably contains, in addition to the phenolic hydroxyl group possessed by the repeating unit represented by formula (1), a repeating unit having a carboxyl group derived from the aforementioned acrylic acid and / or methacrylic acid. The content ratio of the repeating unit having a carboxyl group is preferably 5.0 mol% or more, and more preferably 10.0 mol% or more, when the total number of moles of all repeating units derived from vinyl monofunctional monomers contained in the (a) resin is taken as 100.0 mol%. In order to avoid excessive penetration of the alkaline developer into the developed film and improve the in-plane uniformity of the opening widths of the openings in the pixel dividing layer and the planarizing layer, the content ratio is preferably 30.0 mol% or less, and more preferably 25.0 mol% or less.

[0067] From the viewpoint of economical advantage, the repeating unit represented by formula (4) is preferably a repeating unit derived from a vinyl-based monofunctional monomer, in which a carbon atom constituting a benzene ring contained in an aryl group having 6 to 15 carbon atoms is substituted with one methyl group, or a compound in which one vinyl group is substituted in the molecule. ６ represents an aryl group having 6 to 15 carbon atoms and not containing a benzotriazole skeleton. A structure in which an aryl group having 6 to 15 carbon atoms is directly bonded to the main chain of the resin can more desirably improve long-term reliability. In other words, the positive photosensitive resin composition of the present invention preferably contains a repeating unit represented by formula (4).

[0068] When the repeating unit represented by formula (4) is contained, the content ratio thereof is preferably 5.0 mol% or more, more preferably 10.0 mol% or more, when the total number of moles of all repeating units derived from vinyl monofunctional monomers contained in the (a) resin is taken as 100.0 mol%, and is preferably 35.0 mol% or less, more preferably 25.0 mol% or less, in order to suppress the remaining unreacted raw material monomer and to obtain the (a) resin having a weight average molecular weight (Mw) in the preferred range described below.

[0069] In formula (4), examples of the aryl group having 6 to 15 carbon atoms include a phenyl group, a hydroxyphenyl group, a methylphenyl group, a naphthyl group, and a hydroxynaphthyl group. Note that alkyl groups substituted with aromatic groups, such as a benzyl group, are not included in the aryl group referred to here.

[0070] Examples of vinyl groups in which one methyl group is substituted on a carbon atom constituting a benzene ring contained in an aryl group having 6 to 15 carbon atoms, or compounds in which one vinyl group is substituted within the molecule, include styrene, α-methylstyrene, p-hydroxystyrene, 4-isopropenylphenol, 4-vinylcatechol, 3-acetoxystyrene, 4-(ethoxyethoxy)styrene, 1-vinylnaphthalene, 1-vinyl-2-naphthol, a compound represented by formula (33), and a compound represented by formula (34). These compounds are readily available as commercially available products, and can be used alone or in combination of two or more types.

[0071]

[0072] Among these, in order to improve long-term reliability and obtain appropriate solubility in an alkaline developer, a compound having a phenolic hydroxyl group is preferred, and a compound that serves as a source for introducing a repeating unit represented by formula (35) is more preferred. That is, in the positive photosensitive resin composition of the present invention, it is preferred that the (a) resin contains a repeating unit represented by formula (4), and that the repeating unit represented by formula (4) contains a repeating unit represented by formula (35).

[0073]

[0074] In formula (35), * ３５ , and * ３６ represents the binding site. ２９ represents a hydrogen atom or a methyl group. ９ is an integer and represents 1 or 2.

[0075] The weight average molecular weight (Mw) of all compounds belonging to the (a) resin is preferably 7,000 or more, more preferably 10,000 or more, in order to improve long-term reliability, and is preferably 50,000 or less, more preferably 40,000 or less, in order to suppress tailing.

[0076] In addition to the repeating units represented by formula (1) and (2), the repeating units represented by formula (3) and / or (4) contained in the (a) resin may be derived from a copolymer having these repeating units in one molecule. Alternatively, for example, they may be derived from a mixture of a copolymer composed of repeating units represented by formula (1) and repeating units represented by formula (2) and a copolymer composed of repeating units represented by formula (3) and repeating units represented by formula (4). Among these, in order to improve long-term reliability, it is preferable to use a copolymer having these repeating units in one molecule. Furthermore, the same viewpoints as described above can be applied to the preferred content ratio of the repeating unit represented by formula (2) in a copolymer having these repeating units in one molecule.

[0077] That is, in the positive photosensitive resin composition of the present invention, the (a) resin contains (a-1) a copolymer having, in one molecule, a repeating unit represented by formula (3) and / or a repeating unit represented by formula (4) in addition to the repeating unit represented by formula (1) and the repeating unit represented by formula (2), and when the sum of the number of moles of the repeating unit represented by formula (2), the number of moles of the repeating unit represented by formula (3), and the number of moles of the repeating unit represented by formula (4) in the component (a-1) is 100.0 mol%, it is preferable that the content of the repeating unit represented by formula (2) is 15.0 to 90.0 mol%.

[0078] Hereinafter, a copolymer having a repeating unit represented by formula (1) and a repeating unit represented by formula (2) as well as a repeating unit represented by formula (3) and / or a repeating unit represented by formula (4) in one molecule may be referred to as component (a-1).

[0079] In order to improve long-term reliability, it is preferable that the component (a-1) further contains a repeating unit represented by formula (7).

[0080] That is, in the positive photosensitive resin composition of the present invention, the component (a-1) preferably further contains a repeating unit represented by formula (7).

[0081]

[0082] In formula (7), * １３ and * １４ represents a binding site, and R １６ and R １７ each independently represents a monovalent hydrocarbon group having 1 to 4 carbon atoms or a hydrogen atom; R １８ represents a monovalent group having 1 to 10 carbon atoms or a hydrogen atom. Examples of compounds that can be used as a source for introducing the repeating unit represented by formula (7) include maleimide, a compound represented by formula (36), a compound represented by formula (37), and a compound represented by formula (38).

[0083]

[0084] The content of the repeating unit represented by formula (7) is preferably 3.0 mol % or more in order to improve long-term reliability, and 15.0 mol % or less in order to improve the in-plane uniformity of the film thickness of the pixel dividing layer and the planarizing layer, when the total number of moles of the repeating units derived from the vinyl monofunctional monomer in component (a-1) is taken as 100.0 mol %.

[0085] The content of the (a) resin is preferably 40 to 90 parts by mass per 100 parts by mass of the solid content of the positive photosensitive resin composition, in order to achieve both high resolution of the pixel dividing layer and / or the planarizing layer and excellent long-term reliability.

[0086] The method for incorporating the repeating unit represented by formula (3) and / or the repeating unit represented by formula (4) in addition to the repeating unit represented by formula (1) and the repeating unit represented by formula (2) into resin (a) is not particularly limited. As a specific example, a method for synthesizing component (a-1) will be described.

[0087] The component (a-1) can be obtained by copolymerizing a first monomer, a second monomer, and a third monomer. First monomer: the aforementioned compound having a benzotriazole skeleton and a phenol skeleton, and having a vinyl group substituted with one methyl group, or having one vinyl group per molecule. Second monomer: the aforementioned acrylate compound. Third monomer: the aforementioned methacrylate compound, and / or a vinyl group having a carbon atom constituting a benzene ring contained in an aryl group having 6 to 15 carbon atoms substituted with one methyl group, or a compound having one vinyl group substituted per molecule.

[0088] As the copolymerization method, for example, known methods such as free radical polymerization, living radical polymerization, living anionic polymerization, etc. are applicable. From the viewpoint of economical advantage, it is preferable to adopt the free radical polymerization method.

[0089] An example of a free radical polymerization method is to dissolve the first monomer, the second monomer, and the third monomer in an organic solvent, stir the solution in the presence of a thermal radical polymerization initiator at a liquid temperature of 50 to 120°C for 2 to 50 hours under a nitrogen atmosphere until the desired weight average molecular weight (Mw) is reached, and then cool the solution to terminate the reaction, thereby obtaining a resin solution. The heating temperature and heating time are preferably set with reference to the 10-hour half-life temperature of the thermal radical polymerization initiator used.

[0090] Examples of thermal radical polymerization initiators include azo-based thermal radical polymerization initiators such as AIBN-HP, V-65HP, VR-110, V-40, azobisisobutyronitrile, and V-601 (2,2'-azobis(isobutyrate) dimethyl) (all manufactured by Fujifilm Wako Pure Chemical Industries, Ltd.). The amount of thermal radical polymerization initiator added is preferably 0.5 to 2.0 parts by mass per 100 parts by mass of the total monomers. Low-cost organic solvents such as isopropyl alcohol, propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, methyl lactate, and ethyl lactate can be used. If necessary, alkyl mercaptans such as hexyl mercaptan, dodecyl mercaptan, and n-octyl mercaptan may be used as a molecular weight distribution modifier. The residual amount of the thermal radical polymerization initiator and its decomposition products is preferably 2 parts by mass or less per 100 parts by mass of component (a-1).

[0091] The positive photosensitive resin composition of the present invention may contain other resins as the component (a) of the resin group, as long as the effects of the present invention are not impaired. Examples of such other resins include polyimide precursors, polyimide resins, polysiloxane resins, novolac phenolic resins, and polyether resins.

[0092] The chemical structure of the (a) resin component and the content ratio of each repeating unit can be analyzed by combining known analytical techniques such as nuclear magnetic resonance (NMR), pyrolysis gas chromatography mass spectrometry (pyrolysis GC-MS), infrared absorption spectrometry, etc., using the positive photosensitive resin composition of the present invention or a concentrate obtained by drying it under reduced pressure without heating as a sample. Furthermore, the (a) resin component and the content ratio of each repeating unit in a cured product of the positive photosensitive resin composition can be analyzed by solid-state nuclear magnetic resonance (solid-state NMR).

[0093] The positive photosensitive resin composition of the present invention contains (b) a photoacid generator (hereinafter, sometimes referred to as "component (b)"). Component (b) is not particularly limited as long as it is a compound that decomposes upon irradiation with light having a wavelength in the range of 200 nm or more and less than 450 nm, generating an acid. The acid generated is preferably a carboxylic acid or a sulfonic acid. The acid referred to here does not include a hydroxyl group.

[0094] By containing component (b), the acid generated has the effect of increasing the solubility of the exposed portion of the film in an alkaline developer relative to the solubility of the unexposed portion of the film in an alkaline developer, thereby enabling positive photolithography in which the exposed portion of the film that has been pattern-exposed through an exposure mask is removed to form a pattern. Furthermore, the amount of acid generated in the film can be controlled by adjusting the exposure dose, and the solubility of the exposed portion of the film that has been exposed with a low exposure dose through a positive halftone exposure mask is reduced relative to the solubility of the exposed portion of the film that has been exposed with a high exposure dose in an alkaline developer, thereby enabling the simultaneous formation of a pixel division layer and a spacer layer (described later) by positive halftone processing.

[0095] Examples of component (b) include quinone diazide compounds, oxime sulfonate compounds, and imide sulfonate compounds. Among these, quinone diazide compounds are preferred because they provide excellent dissolution inhibition to the unexposed film, can increase the difference in dissolution rate between the exposed and unexposed regions, and provide high resolution. Among these, a compound obtained by reacting a compound having two or more phenolic hydroxyl groups in the molecule with 1,2-naphthoquinone-2-diazide-4-sulfonyl chloride (hereinafter sometimes referred to as a "4-naphthoquinone diazide sulfonyl ester compound") and a compound obtained by reacting a compound having two or more phenolic hydroxyl groups in the molecule with 1,2-naphthoquinone-2-diazide-5-sulfonyl chloride (hereinafter sometimes referred to as a "5-naphthoquinone diazide sulfonyl ester compound") are more preferred. That is, in the positive photosensitive resin composition of the present invention, component (b) preferably contains a quinone diazide compound.

[0096] A 4-naphthoquinone diazide sulfonyl ester compound having absorption in the i-line (wavelength 365 nm) region of a mercury lamp and a 5-naphthoquinone diazide sulfonyl ester compound having absorption in a wide range of the i-line, h-line (wavelength 405 nm), and g-line (wavelength 436 nm) regions may be used in combination. Also, a quinone diazide compound having a 4-naphthoquinone diazide sulfonyl group and a 5-naphthoquinone diazide sulfonyl group in the molecule may be contained.

[0097] Examples of the 4-naphthoquinone diazide sulfonyl ester compound and the 5-naphthoquinone diazide sulfonyl ester compound include compounds represented by formula (39), formula (40), and formula (41), and these compounds may be contained alone or in combination. Note that a compound that decomposes upon irradiation with light in a wavelength range of 200 nm or more and less than 450 nm, has the function of generating an acid, and belongs to the resin category, is defined as component (b).

[0098]

[0099] In formulas (39) to (41), Q represents a hydrogen atom, a structure represented by formula (42), or a structure represented by formula (43), provided that in one molecule of each compound, at least one Q is a structure represented by formula (42) or a structure represented by formula (43).

[0100]

[0101] In formula (42) and formula (43), * ３７ and * ３８ represents the bonding site with the oxygen atom.

[0102] Commercially available products include PA-28 (manufactured by Daito ChemiX Co., Ltd.), which is a naphthoquinone diazide compound that generates an acid upon exposure to i-rays; PAG103 and PAG203 (all manufactured by BASF), which are oxime sulfonate compounds that generate an acid upon exposure to i-rays; and NIT, NIN, and ILP-110 (all manufactured by Heraeus), which are imide sulfonate compounds that generate an acid upon exposure to i-rays.

[0103] The content of (b) the photoacid generator is preferably 10 parts by mass or more per 100 parts by mass of the solid content of the positive photosensitive resin composition in order to improve the resolution of the pixel dividing layer and / or the planarizing layer and to achieve excellent long-term reliability, and is preferably 60 parts by mass or less in order to obtain high exposure sensitivity, appropriately shorten the time required for the exposure step described below, and control the takt time to an economically advantageous value.

[0104] The positive photosensitive resin composition of the present invention contains a (c) solvent. The (c) solvent imparts high fluidity to the positive photosensitive resin composition at atmospheric pressure and 23°C, thereby improving thin film coating properties. Examples of the (c) solvent include ether-based solvents, glycol-based solvents, acetate-based solvents, ketone-based solvents, lactone-based solvents, aromatic hydrocarbon-based solvents, and amide-based solvents.

[0105] Examples of ether-based solvents include ethylene glycol monomethyl ether, ethylene glycol mono-n-propyl ether, ethylene glycol mono-n-butyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol mono-n-propyl ether, diethylene glycol mono-n-butyl ether, propylene glycol monomethyl ether (hereinafter referred to as "PGME"), propylene glycol monoethyl ether, propylene glycol mono-n-propyl ether, propylene glycol mono-n-butyl ether, dipropylene glycol monomethyl ether, dipropylene glycol monoethyl ether, dipropylene glycol mono-n-propyl ether, dipropylene glycol mono-n-butyl ether, tripropylene glycol monomethyl ether, and tripropylene glycol monoethyl ether. Examples of glycol-based solvents include ethylene glycol, propylene glycol, diethylene glycol, and dipropylene glycol. Examples of acetate-based solvents include ethylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, diethylene glycol monomethyl ether acetate, diethylene glycol monoethyl ether acetate, propylene glycol monomethyl ether acetate (hereinafter referred to as "PGMEA"), propylene glycol monoethyl ether acetate, methyl lactate, ethyl lactate, and 3-methoxybutyl acetate. Examples of lactone-based solvents include γ-butyrolactone (hereinafter referred to as "GBL") and γ-valerolactone. Examples of amide-based solvents include N-methylpyrrolidone (hereinafter referred to as "NMP"), N,N-dimethylformamide, and N,N-dimethylacetamide. Among these, in order to achieve both coatability and an appropriate drying rate and improve in-plane film thickness uniformity, it is desirable to use a lactone-based solvent in addition to an ether-based solvent and / or an acetate-based solvent.

[0106] The content of the (c) solvent is preferably 60 parts by mass or more per 100 parts by mass of the positive photosensitive resin composition in order to improve the coatability, and more preferably 95 parts by mass or less in order to improve the in-plane uniformity of the thickness of the prebaked film.

[0107] The positive photosensitive resin composition of the present invention may further contain (d) a thermal crosslinking agent (hereinafter, sometimes referred to as "component (d)"). The inclusion of component (d) provides desirable effects such as the effect of suppressing excessive flow of the developed film during the curing process, thereby improving resolution, and improving chemical resistance. As component (d), a compound having two or more alkoxymethyl groups or epoxy groups in the molecule is preferred. Examples of alkoxymethyl groups include methoxymethyl groups, ethoxymethyl groups, propoxymethyl groups, and butoxymethyl groups.

[0108] Examples of compounds having two or more alkoxymethyl groups in the molecule include DML-PC, DML-PEP, DML-OC, DML-POP, HMOM-TPHAP represented by formula (44) (all manufactured by Honshu Chemical Industry Co., Ltd.), and NIKALAC (registered trademark) MX-390, MX-290, MX-280, MX-270, MW-100LM, and MX-750LM (all manufactured by Sanwa Chemical Co., Ltd.).

[0109]

[0110] Examples of compounds having two or more epoxy groups in the molecule include TEPIC (registered trademark)-S, TEPIC (registered trademark)-PAS, TEPIC (registered trademark)-VL, TEPIC (registered trademark)-UC (all manufactured by Nissan Chemical Industries, Ltd.), XD-1000, XD-1000-H, XD-1000-2L, and NC-3000 (all manufactured by Nippon Kayaku Co., Ltd.).

[0111] When the component (d) is contained, the content of the component (d) is preferably 5 to 30 parts by mass per 100 parts by mass of the solid content of the positive photosensitive resin composition.

[0112] The positive photosensitive resin composition of the present invention may further contain (e) an antioxidant (hereinafter, sometimes referred to as "component (e)"). By containing component (e), yellowing of the pixel dividing layer and the planarizing layer can be prevented, and higher transparency can be obtained. Examples of component (e) include a compound represented by formula (45) and a compound represented by formula (46).

[0113]

[0114] The positive photosensitive resin composition of the present invention may contain (f) other additives (hereinafter, sometimes referred to as "component (f)"). Examples of component (f) include a silane coupling agent for improving adhesion to the substrate and a silicone-based leveling agent for improving film thickness uniformity. A colorant such as a pigment or dye may be added for the purpose of fine-tuning the optical properties, as long as the high transparency of the pixel dividing layer and the planarizing layer is not impaired.

[0115] The method for preparing the positive photosensitive resin composition is not particularly limited, but examples thereof include a method in which resin (a), component (b), and component (c) are mixed, and then components (d), (e), and (f) are added as necessary, followed by stirring and filtering.

[0116] The cured film according to a second aspect of the present invention is a cured film containing a cured product of the positive photosensitive resin composition of the present invention. The term "cured film" as used herein refers to a film-like material containing a cured product. The term "cured product" as used herein refers to a film obtained by a method including at least a step of heating the positive photosensitive resin composition at a temperature of 200°C to 400°C under atmospheric pressure for 10 minutes or longer.

[0117] When the cured film of the present invention is used as a pixel division layer, it is preferable to dispose a spacer layer on a portion of the surface of the pixel division layer to reduce the contact area with the vapor deposition mask and improve yield when pattern-depositing an emitting layer on the surface of the openings of the pixel division layer. From an economical perspective, it is desirable to simultaneously form the pixel division layer and the spacer layer by halftone processing using a single positive-type photosensitive resin composition. The thickness of the pixel division layer is preferably 1.0 to 2.0 μm, and the thickness of the spacer layer is preferably 1.0 to 2.0 μm. Therefore, the thickness of the portion where the pixel division layer and the spacer layer are laminated is preferably 2.0 to 4.0 μm. On the other hand, when the cured film of the present invention is used as a planarization layer, the thickness of the planarization layer is preferably 2.0 to 10.0 μm.

[0118] A preferred method for simultaneously forming the pixel dividing layer and the spacer layer includes a coating step of applying a positive photosensitive resin composition to obtain a coating film, a pre-baking step of heating the coating film to obtain a pre-baked film, an exposure step of pattern-exposing the film to actinic rays through a positive half-tone exposure mask to obtain an exposed film having exposed areas, semi-exposed areas, and unexposed areas within its surface, a development step of developing the film using an alkaline developer to remove parts of the exposed and semi-exposed areas to obtain a developed film, and a curing step of thermally curing the film by heating to obtain a cured film.

[0119] As the coating device used in the coating step, a spin coater or a slit coater can be preferably used because of its excellent thin film coating ability.

[0120] In the pre-baking step, the pre-baking temperature is preferably 110 to 140° C., and the pre-baking time is preferably 1 to 5 minutes.

[0121] Examples of exposure devices used in the exposure process include steppers, mirror projection mask aligners (MPAs), and parallel light mask aligners (PLAs). Examples of active actinic rays irradiated in the exposure process include j-lines (wavelength 313 nm), i-lines (wavelength 365 nm), h-lines (wavelength 405 nm), and g-lines (wavelength 436 nm) from an ultra-high pressure mercury lamp. Mixed rays containing at least i-lines are preferred, and mixed rays containing g-lines, h-lines, and i-lines are more preferred. A positive halftone exposure mask preferably has a fully transparent portion, a semi-transparent portion, and a shielding portion within the substrate plane, and is designed so that when the exposure amount in the fully transparent portion is 100% and the exposure amount in the shielding portion is 0%, the exposure amount in the semi-transparent portion is 10 to 50%.

[0122] The exposed portion of the exposed film means the portion that has been pattern-exposed through the fully transparent portion of the exposure mask, the partially exposed portion means the portion that has been pattern-exposed through the semi-transparent portion of the exposure mask, and the unexposed portion means the portion that has not been exposed due to the shielding portion of the exposure mask.

[0123] Examples of development methods used in the development step include showering, dipping, and puddling, and include a method in which the exposed film is immersed for 10 seconds to 3 minutes. Puddle development is preferred to improve the uniformity of the opening widths of the openings in the pixel dividing layer and the planarizing layer. A 0.4 to 2.5% by mass aqueous solution of tetramethylammonium hydroxide (hereinafter referred to as "TMAH") is preferred as the alkaline developer, and a commercially available product such as 2.38% by mass TMAH (manufactured by Tama Chemicals Co., Ltd.) may be used. After the development step, a cleaning process using a shower of deionized water and / or a water-removing process using air injection, or a middle bake process may be added. When a middle bake process is performed, a temperature of 100 to 150°C is preferred, and a heating time of 1 to 10 minutes is preferred.

[0124] In the curing step, the developed film is thermally cured by heating, and the developer and moisture remaining in the film are evaporated to obtain a cured film. Examples of heating devices include a hot air oven and an IR oven, and the heating atmosphere can be nitrogen or air. The heating temperature is preferably 200 to 350°C under atmospheric pressure, more preferably 220 to 280°C.

[0125] An organic EL display device according to a third aspect of the present invention is as follows: The organic EL display device of the present invention is an organic EL display device comprising, in this order, a substrate, a planarizing layer, a first electrode, a pixel dividing layer, light-emitting pixels, and a second electrode, wherein the pixel dividing layer and / or the planarizing layer contains a cured product of a positive photosensitive resin composition containing (a) a resin, (b) a photoacid generator, and (c) a solvent, and the (a) resin contains, in addition to the repeating unit represented by formula (1) and the repeating unit represented by formula (2), a repeating unit represented by formula (3) and / or a repeating unit represented by formula (4).

[0126]

[0127] In formula (1), formula (2), formula (3) and formula (4), * １ , * ２ , * ３ , * ４ , * ５ , * ６ , * ７ and *８ represents a binding site, and R １ and R ５ each independently represents a hydrogen atom or a methyl group, R ２ represents a monovalent group containing a benzotriazole skeleton and a phenol skeleton, R ３ and R ４ does not contain a benzotriazole skeleton, and each independently represents a monovalent group having 1 to 20 carbon atoms or a hydrogen atom; R ６ represents an aryl group having 6 to 15 carbon atoms and not containing a benzotriazole skeleton.

[0128] The organic EL display device of the present invention has the technical features that the occurrence of footing at the edges of the openings of the pixel dividing layer and / or the planarizing layer is suppressed, thereby suppressing a decrease in brightness at the edges of the light-emitting pixels and resulting in excellent display characteristics, and that the openings of the planarizing layer can be configured to have contact holes 7 described below, that the pixel light-emitting area ratio can be maintained high, and that long-term reliability is excellent.Furthermore, since the (a) resin contains, in addition to the repeating unit represented by formula (1) and the repeating unit represented by formula (2), the repeating unit represented by formula (3) and / or the repeating unit represented by formula (4), the manufacturing cost is low and it is economically advantageous.

[0129] The same aspects as those of the above-described preferred embodiments of the positive photosensitive resin composition according to the first aspect of the present invention can be applied to a preferred embodiment of the positive photosensitive resin composition containing a specific (a) resin, (b) a photoacid generator, and (c) a solvent, which is a component of the organic EL display device according to the third aspect of the present invention.

[0130] As a specific example of the first, second, and third aspects of the present invention, a cross-sectional view of a TFT (Thin-film transistor) substrate in an organic EL display device is shown in FIG.

[0131] Bottom-gate or top-gate TFTs 1 are arranged in a matrix on the surface of a substrate 6, and a TFT insulating layer 3 is formed to cover the TFTs 1 and the wiring 2 connected to the TFTs 1. Examples of the TFTs 1 include TFTs made of oxide semiconductors such as In—Ga—Zn—O (IGZO) and Ga—Zn—Sn, or low-temperature polysilicon (LTPS). Furthermore, a planarization layer 4 is formed on the surface of the TFT insulating layer 3, and contact holes 7 are formed in the planarization layer 4 to open the wiring 2. The contact holes 7 may be, for example, circular openings. First electrodes 5 are patterned on the surface of the planarization layer 4 and connected to the wiring 2. A pixel dividing layer 8 is disposed on the surface of the first electrodes 5, partially exposing the surfaces of the first electrodes 5, and a spacer layer 9 is disposed on a portion of the surface of the pixel dividing layer 8. An opening is provided in the pixel division layer 8, and a light-emitting pixel 10 containing an organic EL light-emitting material is formed in the opening. A second electrode 11 is disposed so as to cover the pixel division layer 8, the spacer layer 9, and the light-emitting pixel 10. The shape of the opening in the pixel division layer 10 is not particularly limited and may be square, rectangular, circular, or elliptical. The taper angle of the edge of the cross section of the opening in the pixel division layer 10 is preferably 18 to 40°, and more preferably 20 to 35°, in order to achieve both pixel division function and film formability of the second electrode 11. The taper angle here refers to the angle between the inclined portion at the edge of the cross section of the opening in the pixel division layer, excluding the skirting portion, and the surface of the first electrode 5.

[0132] The size and shape of the light-emitting pixel 10 are determined by the size and shape of the opening of the pixel dividing layer 8. The area per light-emitting pixel is, for example, 50 to 30,000 μm ２ is.

[0133] When a TFT substrate having the above-described laminated structure is sealed under vacuum and a voltage is applied to the light-emitting pixel portion, the display device can be driven as an organic EL display device, and light can be emitted from the light-emitting pixel portion.

[0134] The organic EL display device of the present invention is not particularly limited and may be a bottom-emission organic EL display device in which light emitted from the light-emitting pixels 10 is extracted to the substrate side through the substrate 6, or a top-emission organic EL display device in which light is extracted to the opposite side of the substrate 6 through the second electrode 11. In order to suppress reflection of external light and improve visibility, a polarizing plate may be further provided on the light extraction side. The light transmittance of the polarizing plate at a wavelength of 560 nm is, for example, 40 to 60%.

[0135] Examples of the substrate 6 include glass substrates such as OA-10G and OA-11 (all manufactured by Nippon Electric Glass Co., Ltd.) and AN-100 (manufactured by Asahi Glass Co., Ltd.).

[0136] To further improve long-term reliability, the organic EL display device of the present invention preferably has a pixel dividing layer comprising a layer (A) containing a cured product of a negative-tone photosensitive pigment composition containing an organic black pigment, and a layer (B) containing a cured product of a positive-tone photosensitive resin composition containing a specific (a) resin, (b) a photoacid generator, and (c) a solvent, on the surface of the layer (A). The layers (A) and (B) herein are films containing the cured product, i.e., cured films. Figure 7 shows a specific example of a cross section of a substrate having a pixel dividing layer formed of a laminated film of layers (A) and (B) and a spacer layer formed of layer (B). Depending on the design and configuration of the organic EL display device, areas requiring high transparency of layer (B) may be left unformed by the light-blocking layer (A).

[0137] Examples of components contained in layer (A) other than the cured product of the negative photosensitive pigment composition containing an organic black pigment include ionic components and adsorbed water derived from electrodes and the like, which are introduced during the layer (A) formation process. The content of the cured product of the negative photosensitive pigment composition containing the organic black pigment is preferably 99% by mass or more in layer (A) to improve long-term reliability. Examples of components contained in layer (B) other than the cured product of the positive photosensitive resin composition containing a specific (a) resin, (b) photoacid generator, and (c) solvent include ionic components and adsorbed water derived from electrodes and the like, which are introduced during the layer (B) formation process. The content of the cured product of the positive photosensitive resin composition containing a specific (a) resin, (b) photoacid generator, and (c) solvent is preferably 99% by mass or more in layer (B) to improve long-term reliability.

[0138] The electronic device of the present invention, a fourth aspect of the present invention, is an electronic device equipped with the organic EL display device of the present invention. In addition to the above-mentioned technical features, the electronic device of the present invention is useful from the same perspective by being equipped with an organic EL display device that has the advantageous feature of low manufacturing cost and economical advantage. Here, an electronic device equipped with an organic EL display device refers to an apparatus that includes at least an organic EL display device, a driving circuit, and a power supply, and is capable of independently displaying text information, images, and / or video. Specific examples of embodiments of the electronic device of the present invention include personal computers, foldable smartphones, non-foldable rigid smartphones, wristwatches, table clocks, eyeglasses, in-vehicle monitors, car navigation systems, gaming monitors, portable game consoles, televisions, and head-mounted displays.

[0139] The present invention will be described in detail below with reference to examples and comparative examples, but the aspects of the present invention are not limited to these. First, the evaluation methods used in each example and comparative example will be described.

[0140] <Measurement of Minimum Required Exposure Amount (Exposure Sensitivity)> A silver alloy film (an alloy consisting of 99.00 mass % silver and 1.00 mass % copper) was formed on the entire surface of an alkali-free glass substrate measuring 150 mm in length and 150 mm in width by a sputtering method. An ITO (indium-tin oxide) film was then formed on the entire surface by a sputtering method, thereby obtaining a glass substrate having a silver alloy film / ITO film on the entire surface of the alkali-free glass substrate.

[0141] In Examples 1 to 12 and Comparative Examples 1 to 5, the positive photosensitive resin compositions 1 to 17 were applied to the ITO surface of a glass substrate having a silver alloy film / ITO film using a spin coater, with the rotation speed adjusted so that the final thickness of the pixel division layer was 1.5 μm and the maximum thickness of the portion where the pixel division layer and spacer layer were laminated was 3.0 μm, to obtain a coating film. On the other hand, in Example 13 and Comparative Example 7, the positive photosensitive resin compositions 1 and 14 were applied to the ITO surface of a glass substrate having a silver alloy film / ITO film using a spin coater, with the rotation speed adjusted so that the final thickness of the layer (B) was 0.75 μm and the thickness of the spacer layer was 1.5 μm, to obtain a coating film.

[0142] The coating film was then prebaked at 110°C for 120 seconds under atmospheric pressure using a hot plate to obtain a prebaked film. Next, using a double-sided alignment single-sided exposure device, the coating film was exposed to 30 to 200 (mJ / cm) of light through a positive half-tone exposure mask (a mask in which 100 fully transparent portions of 100 μm long and 100 μm wide squares are arranged, and which is designed so that the exposure amount in the semi-transparent portions is 30% when the exposure amount in the fully transparent portions is 100% and the exposure amount in the shielding portions is 0%). ２ : i-line standard) within the range of 10 mJ / cm ２ The prebaked film was pattern-exposed to a mixture of g, h, and i rays from an ultra-high pressure mercury lamp, with the exposure dose being varied stepwise within the surface of the prebaked film for each exposure, to obtain an exposed film having exposed, semi-exposed, and unexposed areas within its surface. The pattern exposure was carried out by contacting a positive half-tone exposure mask with the surface of the prebaked film.

[0143] Next, in the development step, development was performed using a small photolithography developing device (AD-1200; manufactured by Takizawa Sangyo Co., Ltd.) and a 2.38% by mass aqueous solution of tetramethylammonium hydroxide as an alkaline developer, using a paddle method. The paddle method here refers to a method in which the alkaline developer is shower-applied to the surface of the exposed film for 10 seconds, and then allowed to stand until a predetermined development time is reached, followed by development. The development time was the time required for film loss to fall within the range of 0.4 to 0.7 μm. The film loss here refers to the value obtained by subtracting the film thickness of the unexposed portion of the developed film from the film thickness of the pre-baked film. The substrate was then rinsed using a shower method with deionized water for 30 seconds, and then dried by idling at 200 rpm for 30 seconds, yielding a developed film-formed substrate.

[0144] Next, as a curing step, the developed film was heated in a high-temperature inert gas oven (INH-9CD-S; manufactured by Koyo Thermo Systems Co., Ltd.) at 250°C under a nitrogen atmosphere for 1 hour to obtain a substrate for measuring the minimum required exposure dose on which a patterned cured film was formed.

[0145] The patterned cured film was observed using an FPD inspection microscope (MX-61L; manufactured by Olympus Corporation), and the exposure dose when the film was collectively formed so that the average opening width of 10 openings in the portions corresponding to the half-exposed portions of the exposed film was within the range of 100±1 μm, the film thickness of the pixel dividing layer was 1.5 μm, and the maximum film thickness of the portion where the pixel dividing layer and the spacer layer were stacked was 3.0 μm was determined as the minimum required exposure dose (mJ / cm). ２ When footing was observed at the edge of the pattern, the width of the footing was excluded and the opening widths of 10 openings in the pixel dividing layer were measured.

[0146] For the negative-type photosensitive resin composition 1 obtained in Comparative Example 6, the minimum required exposure dose was measured in the same manner as described above, except that the conditions regarding the exposure mask and the development time were changed as described below.

[0147] (1) Evaluation of Footing For the positive-type photosensitive resin compositions 1 to 17 obtained in Examples 1 to 13, Comparative Examples 1 to 5, and Comparative Example 7, and the negative-type photosensitive resin composition 1 obtained in Comparative Example 6, images of five randomly selected locations on the cross section of the opening of the pixel dividing layer at the site formed with the minimum required exposure dose on the substrate for measuring the minimum required exposure dose prepared when measuring the minimum required exposure dose were observed using a scanning electron microscope (magnification: 10,000x). The maximum width W (μm) of the footing observed within one image of the end of the opening cross section was measured, and the average value of the five locations was rounded to one decimal place to obtain the width average (hereinafter abbreviated as "Wa"). The smaller the value, the better the result. Evaluation was based on the following criteria, with A to C being considered acceptable and D to F being considered unacceptable. If the taper angle of the edge in the cross section of the opening of the pixel division layer was outside the range of 18 to 40°, the evaluation was rated F regardless of the value of Wa. For reference, a schematic diagram of the cross section of an opening of the pixel division layer where footing occurred at the edge is shown in Figure 2. Also, a scanning electron microscope image of the cross section of the opening of the pixel division layer where footing occurred at the edge is shown in Figure 3. In Figure 2, "θ" represents the taper angle of the edge in the cross section of the opening of the pixel division layer. In Figures 2 and 3, "W" represents the maximum width of the footing observed in the schematic diagram or in a single image. A: No footing is observed. B: The footing width Wa is greater than 0.0 μm and less than 0.3 μm. C: The footing width Wa is 0.3 μm or more and less than 0.5 μm. D: The footing width Wa is 0.5 μm or more. E: Significant development residue is observed on the surface of the opening, making it difficult to properly evaluate the footing width Wa. F: The taper angle θ of the end of the cross section of the opening is outside the range of 18 to 40°.

[0148] (2) Evaluation of Long-Term Reliability of Organic EL Display Devices The organic EL display devices fabricated in Examples 1 to 13 and Comparative Examples 1 to 7 were placed on a hot plate with the light-emitting surface facing up and the surface temperature maintained at 85°C, and subjected to DC drive (10 mA / cm ２ The light-emitting surface of the organic EL display device was kept in a luminous state, and the light was emitted from a xenon lamp as a light source, which was used as simulated sunlight containing near-ultraviolet rays, at a wavelength of 420 nm and an illuminance of 3.0 W / cm. ２The organic EL display device was continuously irradiated with light of 100 lux. After 100 hours of irradiation, the circular polarizer was temporarily removed, and the pixel emission area ratio (%) of the organic EL display device was evaluated. The circular polarizer was reattached to the light-emitting surface, and after another 1,400 hours of irradiation at the same illuminance (i.e., a total of 1,500 hours), the circular polarizer was removed, and the pixel emission area ratio (%) of the organic EL display device was evaluated again. The "emission surface" here refers to the surface on the light-extraction side of the region where the light-emitting pixels are arranged. The pixel emission area ratio of the organic EL display device was calculated by measuring the pixel emission area ratio (%) of each pixel at 20 light-emitting pixel regions located in the center of the light-emitting surface, enlarging the display at 100x magnification on a monitor, and rounding the average to the nearest whole number. The smaller the area of ​​non-light-emitting regions in the light-emitting pixel region and the higher the pixel emission area ratio maintained, the better the organic EL display device. Evaluation was based on the following criteria, with AA and A to C being considered acceptable, and D to F being considered unacceptable. For reference, Figure 4 shows a schematic diagram of a light-emitting pixel unit having a light-emitting portion 18 and no non-light-emitting portion. Figure 5 also shows a schematic diagram of a light-emitting pixel unit having a light-emitting portion 19 and a non-light-emitting portion 20, as an example of a case where a non-light-emitting portion occurs. AA: The pixel light-emitting area ratio of the organic EL display device is 95% or more. A: The pixel light-emitting area ratio of the organic EL display device is 90% or more and less than 95%. B: The pixel light-emitting area ratio of the organic EL display device is 85% or more and less than 90%. C: The pixel light-emitting area ratio of the organic EL display device is 80% or more and less than 85%. D: The pixel light-emitting area ratio of the organic EL display device is 50% or more and less than 80%. E: The pixel light-emitting area ratio of the organic EL display device is less than 50%. F: One or more non-illuminating light-emitting pixel units (pixel light-emitting area ratio 0%), which are defective portions, are observed.

[0149] Synthesis Example 1: Synthesis of naphthoquinone diazide compound a) Under a dry nitrogen stream, 91.91 g (0.30 mol) of the compound represented by formula (47) (manufactured by Honshu Chemical Industry Co., Ltd.) and 161.20 g (0.60 mol) of 1,2-naphthoquinone-2-diazide-5-sulfonyl chloride were added to 2 kg of 1,4-dioxane and stirred at a liquid temperature of 20°C for 1 hour. Furthermore, 303.57 g of a mixed liquid (triethylamine:1,4-dioxane = mass ratio 20:80) was added dropwise, and the mixture was stirred at a liquid temperature of 30°C for 3 hours. The triethylamine salt was filtered off, and the filtrate was poured into deionized water to collect the precipitate that formed. The precipitate was washed three times with deionized water, filtered, and dried under reduced pressure to obtain naphthoquinone diazide compound a represented by formula (48), which is component (b), in powder form.

[0150]

[0151] In formula (48), * ３９ represents the bonding site with the oxygen atom, and 1:2 represents the molar ratio.

[0152] Synthesis Example 2 Synthesis of Resin Solution 1 A flask equipped with a condenser and a stirrer was charged with 750.00 g of PGME, and 46.71 g of dimethyl 2,2-azobis(isobutyrate) (manufactured by Fujifilm Wako Pure Chemical Industries, Ltd.) was added and dissolved. Next, 64.67 g of the compound represented by formula (23) (manufactured by Tokyo Chemical Industry Co., Ltd.), 92.53 g of cyclohexyl acrylate (manufactured by Tokyo Chemical Industry Co., Ltd.), 82.52 g of dicyclopentanyl acrylate (manufactured by Tokyo Chemical Industry Co., Ltd.), 86.09 g of methyl acrylate (manufactured by Tokyo Chemical Industry Co., Ltd.), 36.44 g of 3,4-epoxycyclohexylmethyl acrylate (manufactured by Tokyo Chemical Industry Co., Ltd.), 51.65 g of methacrylic acid (manufactured by Tokyo Chemical Industry Co., Ltd.), 134.18 g of 4-isopropenylphenol (manufactured by Mitsui Chemicals, Inc.), and 35.84 g of N-cyclohexylmaleimide (manufactured by Nippon Shokubai Co., Ltd.) were added and the mixture was placed under a nitrogen atmosphere. The solution was heated to 80°C and heated until the weight average molecular weight (Mw) reached a range of 20,000±1,000, and then cooled to 23°C to obtain a resin solution. The required heating time was 7 hours. The solution was diluted with PGME to a solids content of 30.00% by mass, and this was designated Resin Solution 1. Table 1 shows the blending amounts of each raw material, and Table 2 shows the content ratios of each repeating unit. １３ Analysis by C-NMR and pyrolysis GC-MS confirmed that Resin Solution 1 contained component (a-1), which is a random polymer represented by formula (49). The weight average molecular weight (Mw) was 20,000.

[0153]

[0154] In formula (49), each integer represents the content (mol %) of each repeating unit when the total is 105 mol %.

[0155]

[0156]

[0157] Synthesis Example 3: Synthesis of Resin Solution 2 Resin solutions 2-1 and 2-2 were synthesized by the following method, and then the two resin solutions were mixed to prepare Resin Solution 2.

[0158] A flask equipped with a condenser and a stirrer was charged with 690.90 g of PGME, and 43.15 g of 2,2-azobis(isobutyrate)dimethyl was added and dissolved. Next, 64.67 g of the compound represented by formula (23), 185.05 g of cyclohexyl acrylate, 137.74 g of methyl acrylate, 72.89 g of 3,4-epoxycyclohexylmethyl acrylate, 43.24 g of acrylic acid (Tokyo Chemical Industry Co., Ltd.), and 35.84 g of N-cyclohexylmaleimide were added and placed under a nitrogen atmosphere. The solution temperature was raised to 80°C, and then the stirring was maintained while heating until the weight average molecular weight (Mw) reached a range of 20,000 ± 1,000. The solution was then cooled to a temperature of 23°C, yielding a resin solution. The required heating time was 6 hours. The solution was diluted with PGME to a solids content of 30.00% by mass, and designated resin solution 2-1.

[0159] Separately, 800.00 g of PGME was placed in a separate flask equipped with a condenser and a stirrer, and 49.58 g of 2,2-azobis(isobutyrate)dimethyl was added and dissolved. Next, 64.67 g of the compound represented by formula (23), 46.54 g of methacrylic acid, 36.08 g of methyl methacrylate, 160.53 g of 4-hydroxyphenyl methacrylate (Tokyo Chemical Industry Co., Ltd.), 158.78 g of dicyclopentanyl methacrylate (Tokyo Chemical Industry Co., Ltd.), 120.88 g of 4-isopropenylphenol, and 32.29 g of N-cyclohexylmaleimide were added and placed under a nitrogen atmosphere. The solution was heated to 80°C, and then stirred until the weight-average molecular weight (Mw) reached a range of 20,000±1,000. The mixture was then cooled to 23°C, yielding a resin solution. The required heating time was 8 hours. The solution was diluted with PGME to a solids content of 30.00% by mass, yielding resin solution 2-2. 100.0 g of resin solution 2-1 and 126.21 g of resin solution 2-2 were mixed to obtain resin solution 2, which had a solids content of 30.00% by mass and did not contain component (a-1). The weight-average molecular weight (Mw) was 20,000. The amounts of each raw material used are shown in Table 1, and the content ratios of each repeating unit are shown in Table 2.

[0160] (Synthesis Example 4: Synthesis of Resin Solution 3) Resin solution 3 having a solid content of 30.00 mass% was synthesized in the same manner as in Synthesis Example 2, except that the compound represented by formula (23) was replaced with a compound represented by formula (24) (manufactured by Otsuka Chemical Co., Ltd.) in the amounts shown in Table 3. The weight average molecular weight (Mw) was 20,000. The amounts of each raw material are shown in Table 3, and the content ratios of each repeating unit are shown in Table 4.

[0161]

[0162]

[0163] (Synthesis Example 5: Synthesis of Resin Solution 4) Resin solution 4 having a solid content of 30.00 mass% was synthesized in the same manner as in Synthesis Example 2, except that the compound represented by formula (50) (manufactured by Sigma-Aldrich) was used instead of the compound represented by formula (23) in the amounts shown in Table 3. The weight average molecular weight (Mw) was 20,000. The content ratio of each repeating unit is shown in Table 4.

[0164]

[0165] (Synthesis Example 6: Synthesis of Resin Solution 5) Resin solution 5 having a solid content of 30.00 mass % was synthesized in the same manner as in Synthesis Example 2, except that the compound represented by formula (51) (manufactured by Sigma-Aldrich) was used instead of the compound represented by formula (23) in the amounts shown in Table 3. The weight average molecular weight (Mw) was 20,000. The content ratio of each repeating unit is shown in Table 4.

[0166]

[0167] (Synthesis Example 7: Synthesis of Resin Solution 6) Resin solution 6 having a solids content of 30.00 mass% was synthesized in the same manner as in Synthesis Example 2, except that N-cyclohexylmaleimide was not used and the blending amounts shown in Table 5 were used. The weight average molecular weight (Mw) was 20,000. The content ratio of each repeating unit is shown in Table 6.

[0168]

[0169]

[0170] (Synthesis Example 8: Synthesis of Resin Solution 7) Resin solution 7 having a solids content of 30.00 mass% was synthesized in the same manner as in Synthesis Example 2, except that cyclohexyl methacrylate was used instead of cyclohexyl acrylate, methyl methacrylate was used instead of methyl acrylate, and dicyclopentanyl methacrylate was used in the amounts shown in Table 5. The weight average molecular weight (Mw) was 20,000. The content ratio of each repeating unit is shown in Table 6.

[0171] (Synthesis Example 9: Synthesis of Resin Solution 8) Resin solution 8 having a solids content of 30.00 mass% was synthesized in the same manner as in Synthesis Example 2, except that phenyl acrylate was used instead of cyclohexyl acrylate and dicyclopentanyl acrylate in the amounts shown in Table 5. The weight average molecular weight (Mw) was 20,000. The content ratio of each repeating unit is shown in Table 6.

[0172] (Synthesis Example 10: Synthesis of Resin Solution 9) Resin solution 9 having a solids content of 30.00 mass% was synthesized in the same manner as in Synthesis Example 2, except that acrylic acid was used instead of methacrylic acid and the blending amounts shown in Table 7 were used. The weight average molecular weight (Mw) was 20,000. The content ratio of each repeating unit is shown in Table 8.

[0173]

[0174]

[0175] (Synthesis Example 11: Synthesis of Resin Solution 10) Resin solution 10 having a solids content of 30.00 mass% was synthesized in the same manner as in Synthesis Example 2, except that cyclohexyl methacrylate was used instead of cyclohexyl acrylate, dicyclopentanyl methacrylate was used instead of dicyclopentanyl acrylate, methyl methacrylate was used instead of methyl acrylate, and 3,4-epoxycyclohexylmethyl methacrylate was used instead of 3,4-epoxycyclohexylmethyl acrylate, and the blending amounts were as shown in Table 7. The weight average molecular weight (Mw) was 20,000. The content ratio of each repeating unit is shown in Table 8.

[0176] (Synthesis Example 12: Synthesis of Resin Solution 11) Resin solution 11 having a solid content of 30.00 mass% was synthesized in the same manner as in Synthesis Example 2, except that the compound represented by formula (23) was not used and the blending amounts shown in Table 7 were used. The weight average molecular weight (Mw) was 20,000. The content ratio of each repeating unit is shown in Table 8.

[0177] Synthesis Example 13: Synthesis of Polymer A-8 Solution Polymer A-8 solution was synthesized using the same method as the synthesis method for polymer A-8 solution disclosed in Patent Document 2. A flask equipped with a condenser and a stirrer was charged with 13 parts by mass of 2,2-azobis(isobutyrate)dimethyl and 200 parts by mass of diethylene glycol ethyl methyl ether. Subsequently, 10 parts by mass of 2-[2-hydroxy-5-[2-(methacryloyloxy)ethyl]phenyl]-2H-benzotriazole (manufactured by Tokyo Chemical Industry Co., Ltd.; the same compound as the compound represented by formula (23)), 8 parts by mass of methacrylic acid, 30 parts by mass of glycidyl methacrylate, 12 parts by mass of p-isopropenylphenol (the same compound as the aforementioned 4-isopropenylphenol), 22 parts by mass of methyl methacrylate, and 18 parts by mass of N-cyclohexylmaleimide, and the atmosphere was replaced with nitrogen. Thereafter, while gently stirring the solution in the flask, the temperature of the solution was raised to 80°C, and after maintaining this temperature for 5 hours, the liquid temperature was lowered to 23°C, thereby obtaining a polymer solution. The solution was diluted with diethylene glycol ethyl methyl ether to give a solution with a solids content of 30.00 mass%, which was named Polymer A-8 solution. １３ Analysis by C-NMR and pyrolysis GC-MS confirmed that the polymer A-8 solution did not contain the repeating unit represented by formula (2). Table 9 shows the blending amounts of each raw material, and Table 10 shows the content ratios of each repeating unit.

[0178]

[0179]

[0180] Synthesis Example 14: Synthesis of Polymer A-9 Solution Polymer A-9 solution was synthesized using the same method as the synthesis method for polymer A-9 solution disclosed in Patent Document 2. A flask equipped with a condenser and a stirrer was charged with 13 parts by mass of 2,2-azobis(isobutyrate)dimethyl and 200 parts by mass of diethylene glycol ethyl methyl ether. Subsequently, 10 parts by mass of 2-[2-hydroxy-5-[2-(methacryloyloxy)ethyl]phenyl]-2H-benzotriazole (manufactured by Tokyo Chemical Industry Co., Ltd.), 8 parts by mass of methacrylic acid, 30 parts by mass of glycidyl methacrylate, 10 parts by mass of 3-methacryloyloxymethyl-3-ethyloxetane, and 42 parts by mass of methyl methacrylate, and the atmosphere was replaced with nitrogen. Thereafter, while gently stirring the solution in the flask, the temperature of the solution was raised to 80°C, and this temperature was maintained for 5 hours, after which the liquid temperature was reduced to 23°C, to obtain a polymer solution. The solution was diluted with diethylene glycol ethyl methyl ether to a solids content of 30.00% by mass, which was used as a polymer A-9 solution. １３ Analysis by C-NMR and pyrolysis GC-MS confirmed that the polymer A-9 solution did not contain the repeating unit represented by formula (2). Table 9 shows the blending amounts of each raw material, and Table 10 shows the content ratios of each repeating unit.

[0181] Example 1 Under yellow light, 27.99 g of resin solution 1, 1.20 g of naphthoquinone diazide compound a, 2.40 g of HMOM-TPHAP (manufactured by Honshu Chemical Industry Co., Ltd.), and 0.07 g of a silicone surfactant as a leveling agent, BYK-333 (manufactured by BYK Japan Co., Ltd.), a 5 mass% solids PGME solution, were added to 68.34 g of a mixed solvent (PGME: ethyl lactate: GBL = mass ratio 60:30:10), and the mixture was stirred for 30 minutes to prepare a positive photosensitive resin composition 1. The solids content of the positive photosensitive resin composition 1 was 12.00 mass%. The blending amounts of each raw material are shown in Table 11.

[0182] The evaluation of (1) footing was carried out by the above-mentioned method using the positive photosensitive resin composition 1. The evaluation results are shown in Table 12.

[0183]

[0184]

[0185] Next, a planarizing layer, a pixel dividing layer, and a spacer layer each made of a cured film containing the cured product of the positive-type photosensitive resin composition 1 were formed by the following method, and an organic EL display device having these layers was fabricated. The fabrication process for an organic EL display device, including the steps of forming the planarizing layer, the pixel dividing layer, and the spacer layer, is shown in Figure 6.

[0186] The positive photosensitive resin composition 1 was applied to the surface of a 100 mm long x 100 mm wide alkali-free glass substrate (21 in Figure 6) using a spin coater, adjusting the rotation speed so that the thickness of the planarization layer obtained after the curing process would be 2.0 μm, to obtain a coating film. The coating film was then prebaked at 110°C under atmospheric pressure for 120 seconds using a hot plate to obtain a prebaked film. Using a double-sided alignment single-sided exposure device, the prebaked film was pattern-exposed using a positive exposure mask at the minimum required exposure dose measured by the method described above to obtain an exposed film. The developed film was then developed, rinsed, and dried in the same manner as when evaluating the minimum required exposure dose, to obtain a developed film. The developed film was heated in a high-temperature inert gas oven at 250°C under a nitrogen atmosphere for 1 hour to obtain a planarization layer-formed substrate with a 30 mm long x 30 mm wide planarization layer (22 in Figure 6) formed in the center of the substrate. A silver alloy film (an alloy consisting of 99% by mass of silver and 1% by mass of copper) was formed over the entire surface by sputtering. Using an alkali-soluble novolac-based positive resist, the substrate was immersed in a silver alloy etching solution SEA-1 at a solution temperature of 30°C and etched to obtain a patterned silver alloy film with a thickness of 50 nm. Furthermore, an ITO film was formed over the entire surface by sputtering. Using an alkali-soluble novolac-based positive resist, the substrate was immersed in a 5% by mass aqueous oxalic acid solution at a solution temperature of 50°C for 5 minutes, shower-washed with deionized water for 2 minutes, dried with an air blower, and the resist was peeled off to obtain a patterned ITO film with a thickness of 10 nm. Through the above steps, a first electrode-forming substrate was obtained in which a first electrode (23 in FIG. 6 ) consisting of a laminated pattern of a silver alloy film / ITO film was formed on the surface of the alkali-free glass substrate.

[0187] The positive photosensitive resin composition 1 was applied to the entire surface of the first electrode-forming substrate using a spin coater, adjusting the rotation speed so that the thickness of the pixel division layer obtained after the curing process was 1.5 μm and the total thickness of the pixel division layer and spacer layer was 3.0 μm, to obtain a coating film. The coating film was then prebaked at 110°C for 120 seconds under atmospheric pressure using a hot plate to obtain a prebaked film. Using a double-sided alignment single-sided exposure device, the prebaked film was pattern-exposed to the minimum required exposure dose determined by the above-mentioned method through a positive halftone exposure mask (a mask with an arrangement of 100 fully transparent square portions, each 100 μm long and 100 μm wide, designed so that when the exposure dose in the fully transparent portions is 100% and the exposure dose in the shielding portions is 0%), an exposed film was obtained. The pattern exposure was performed by contacting the positive halftone exposure mask with the surface of the prebaked film. Next, development, rinsing, and drying were carried out in the same manner as in the evaluation of the minimum required exposure dose, thereby obtaining a patterned developed film. The developed film was heated in a high-temperature inert gas oven at 250°C under a nitrogen atmosphere for 1 hour, thereby obtaining a pixel division layer / spacer layer-forming substrate having 100 openings arranged in an area of ​​30 mm length x 30 mm width at the center of the first electrode-forming substrate, a pixel division layer with a film thickness of 1.5 µm, and a spacer layer (24 in Figure 6) with a film thickness of 1.5 µm on a part of the surface of the pixel division layer.

[0188] Next, an organic EL layer (25 in FIG. 6) including a light-emitting layer is formed in the opening of the pixel dividing layer by vacuum deposition. －３ Under evaporation conditions of 0.1 Pa or less, the pixel dividing layer / spacer layer-forming substrate was rotated relative to the evaporation source, and first, a 10 nm thick film of compound (HT-1) represented by formula (52) was formed as a hole injection layer, and a 50 nm thick film of compound (HT-2) represented by formula (53) was formed as a hole transport layer. Next, a 40 nm thick film of compound (GH-1) represented by formula (54) was deposited as a host material and a 40 nm thick film of compound (GD-1) represented by formula (55) was deposited on the emitting layer. Next, a 1:1 volume ratio of compound (ET-1) represented by formula (56) and compound (LiQ) represented by formula (57) were deposited as electron transport materials to a thickness of 40 nm.

[0189]

[0190] Next, a 2-nm thick compound (LiQ) was vapor-deposited, followed by vapor deposition of a silver / magnesium alloy (volume ratio 10:1) to a thickness of 150 nm to form a second electrode (26 in Figure 6). Next, under a low-humidity / nitrogen atmosphere, a cap-shaped glass plate was sealed by bonding it with an epoxy resin adhesive. A circular polarizer (CP42HE CIRCULAR POLARIZER manufactured by Edmund Optics) was then attached to the light-emitting surface to obtain an organic EL display device. Since each layer constituting the organic EL layer is very thin and a stylus-type film thickness measurement device cannot achieve high measurement accuracy, each layer was measured using a quartz crystal oscillator film thickness monitor, which is suitable for thin films of less than 100 nm. The film thickness was determined by rounding the average value of three in-plane measurements to the nearest tenth.

[0191] The organic EL display devices thus fabricated were used to evaluate the long-term reliability of the organic EL display devices according to the method described above (2). The evaluation results are shown in Table 12.

[0192] Examples 2 to 10: Positive-type photosensitive resin compositions 2 to 10 were prepared using resin solutions 2 to 9 instead of resin solution 1, and TR4020G in the amounts shown in Tables 11 and 13. Evaluations of (1) bottoming and (2) long-term reliability of organic EL display devices were performed using the same methods as in Example 1. The evaluation results are shown in Table 12. Note that TR4020G (manufactured by Asahi Organic Chemicals Co., Ltd.) is a granular cresol novolac phenolic resin with a solids content of 100% by mass, which does not contain any of the repeating units represented by formulas (1) to (4). The content ratio of the compounds constituting the resin (a) contained in positive-type photosensitive resin composition 10 was 65:35 by mass (solids in resin solution 1:TR4020G).

[0193]

[0194] (Comparative Examples 1 to 3) Using resin solutions 10 and 11 instead of resin solution 1, positive photosensitive pigment compositions 11 to 13 were prepared in the amounts shown in Table 14, and (1) footing and (2) long-term reliability of the organic EL display device were evaluated in the same manner as in Example 1. The evaluation results are shown in Table 12. In Table 14, JF-832 (manufactured by Johoku Chemical Co., Ltd.) is a compound represented by formula (58), and is a low-molecular-weight compound that does not belong to the (a) resin category.

[0195]

[0196]

[0197] Comparative Example 4 Under yellow light, 83.33 g of the polymer A-8 solution and 5.00 g of the radiation-sensitive compound B-1 (i.e., a condensate of 4,4'-[1-[4-[1-[4-hydroxyphenyl]-1-methylethyl]phenyl]ethylidene]bisphenol (1.0 mol) and 1,2-naphthoquinone diazide-5-sulfonic acid chloride (2.0 mol)) disclosed in Patent Document 2 were added to 11.67 g of diethylene glycol ethyl methyl ether, and the mixture was stirred for 30 minutes to prepare a positive-type photosensitive resin composition 14. The solids content of the positive-type photosensitive resin composition 14 was 30.00 mass%. The blending amounts of each raw material are shown in Table 14. Using the positive-type photosensitive resin composition 14, (1) footing and (2) long-term reliability of the organic EL display device were evaluated in the same manner as in Example 1. The evaluation results are shown in Table 12.

[0198] (Comparative Example 5) A positive-type photosensitive resin composition 15 was prepared in the same manner as in Comparative Example 4, except that the polymer A-9 solution was used instead of the polymer A-8 solution, in the blending amounts shown in Table 14. Using the positive-type photosensitive resin composition 15, (1) footing and (2) long-term reliability of the organic EL display device were evaluated in the same manner as in Example 1. The evaluation results are shown in Table 12.

[0199] (Comparative Example 6) Under yellow light, 30.39 g of resin solution 1 was added to 66.66 g of a mixed solvent (PGME: ethyl lactate: GBL = mass ratio 60:30:10) and, as a photosensitizer for imparting negative photosensitivity, 0.48 g of a photopolymerization initiator, Irgacure (registered trademark) OXE01 (manufactured by BASF), and 1.80 g of a photopolymerizable tetrafunctional monomer, pentaerythritol tetraacrylate (manufactured by Shin-Nakamura Chemical Co., Ltd.). Furthermore, 0.60 g of HMOM-TPHAP and 0.07 g of a 5% by mass PGME solution of BYK-333 solids were added and stirred for 30 minutes to prepare a negative photosensitive resin composition 1. The solids content of negative photosensitive resin composition 1 was 12.00% by mass. The blending amounts of each raw material are shown in Table 14.

[0200] Using negative-type photosensitive resin composition 1, evaluations of (1) footing and (2) long-term reliability of organic EL display devices were performed using the same method as in Example 1. The evaluation results are shown in Table 12. However, in the evaluation of the minimum required exposure dose and the fabrication of the organic EL display devices, a negative-type half-tone exposure mask (an inverted mask with an array of 100 square shielding portions, each 100 μm long and 100 μm wide, designed so that when the exposure dose in the fully transparent portions is 100% and the exposure dose in the shielding portions is 0%) was used in the exposure step, instead of the positive-type half-tone exposure mask described above, the exposure time in the development step was calculated by multiplying the time it takes for the film in the unexposed portions to be dissolved and removed by 1.5.

[0201] Synthesis Example 15: Synthesis of resin solution 12 Resin solution 12 having a solids content of 30.00 mass % was synthesized in the same manner as in Synthesis Example 2, except that cyclohexyl methacrylate was used instead of cyclohexyl acrylate and methyl methacrylate was also used in the blending amounts shown in Table 15. The content ratio of each repeating unit is shown in Table 16.

[0202]

[0203]

[0204] Synthesis Example 16: Synthesis of resin solution 13 Resin solution 13 having a solids content of 30.00 mass % was synthesized in the same manner as in Synthesis Example 2, except that acrylic acid was used instead of methacrylic acid, and 4-hydroxyphenyl methacrylate was used instead of 4-isopropenylphenol, and the blending amounts were as shown in Table 15. The content ratio of each repeating unit is shown in Table 16.

[0205] (Examples 11 and 12) Using resin solutions 12 and 13 instead of resin solution 1, positive-type photosensitive resin compositions 16 and 17 were prepared in the amounts shown in Table 17, and (1) footing and (2) long-term reliability of the organic EL display device were evaluated in the same manner as in Example 1. The evaluation results are shown in Table 18.

[0206]

[0207]

[0208] (Example 13) Negative photosensitive composition 2 disclosed in Example 2 of WO 2021 / 111860 was prepared and designated as negative photosensitive black composition 1. Negative photosensitive black composition 1 contains a benzodifuranone-based black pigment as an organic black pigment.

[0209] A 0.75 μm-thick layer (A) was patterned using negative-type photosensitive black composition 1, and then a 0.75 μm-thick layer (B) and a 1.5 μm-thick spacer layer were simultaneously patterned and laminated using positive-type photosensitive resin composition 1 so as to cover the entire surface of layer (A). A pixel division layer and a spacer layer were obtained, each consisting of a laminate of layers (A) and (B). The same procedures as in Example 1 were used to evaluate (1) the footing and (2) the long-term reliability of the organic EL display device. The evaluation results are shown in Table 18. In the evaluation of the minimum required exposure dose of negative-type photosensitive black composition 1 and the fabrication of the organic EL display device, a negative-type exposure mask (an inverted mask with an array of 100 square shielding portions, each 100 μm long and 100 μm wide, designed to provide 100% exposure in all transparent portions and 0% exposure in the shielding portions) was used in the exposure step instead of the positive-type halftone exposure mask described above. In the development step, the development time was set so that the average opening width of 10 openings in the pixel division layer obtained after the curing step would be 104 μm, so that the edges of the openings in layer (A) would be completely covered with layer (B). After the formation of layer (A), no footing was observed at the edges of the openings in layer (A).

[0210] Comparative Example 7 Evaluations of (1) footing and (2) long-term reliability of the organic EL display device were performed in the same manner as in Example 13, except that the layer (B) and the spacer layer were simultaneously patterned using positive photosensitive resin composition 14 instead of positive photosensitive resin composition 1. The evaluation results are shown in Table 18.

[0211] (Reference Example) In Examples 1 to 12 and Comparative Examples 1 to 6, one additional developed film-formed substrate was prepared in the course of measuring the required minimum exposure dose of each of the positive-type photosensitive resin compositions 1 to 17 and the negative-type photosensitive resin composition 1 by the above-mentioned method. In the second exposure step, a double-sided alignment single-sided exposure device was used to irradiate the entire surface of the patterned developed film of each of the positive-type photosensitive resin compositions 1 to 15 with a mixed ray of g, h, and i from an ultra-high pressure mercury lamp at 500 (mJ / cm ２The substrates were exposed to an exposure dose of 1000 uV (based on i-line). The substrates were then immersed for 1 hour in a glass container containing a 2.38% by mass aqueous solution of tetramethylammonium hydroxide, an alkaline developer, and then washed with deionized water for 1 minute using a small photolithography developing device in a shower. Observation of the surfaces of the substrates revealed that the patterned developed films of positive-type photosensitive resin compositions 1 to 17 could be removed by the second exposure, which made it possible to reuse the substrates and was considered to be economically advantageous. On the other hand, the patterned developed film of negative-type photosensitive resin composition 1 was difficult to remove because it did not redissolve in the alkaline developer.

[0212] The above results demonstrate that the positive photosensitive resin composition, cured film, and organic EL display device of the present invention are useful.

[0213] The positive-type photosensitive resin composition of the present invention can be preferably used as a material for forming pixel dividing layers, spacer layers, and planarizing layers of organic EL display devices, and is particularly preferably used in applications that require not only economical advantages but also excellent long-term reliability.

[0214] 1: TFT 2: Wiring 3: TFT insulating layer 4: Planarizing layer 5: First electrode 6: Substrate 7: Contact hole 8: Pixel division layer 9: Spacer layer 10: Light-emitting pixel 11: Second electrode 12: Pixel division layer 13: Footing 14: First electrode 15: Alkali-free glass substrate 16: Pixel division layer 17: Footing 18: Light-emitting area 19: Light-emitting area 20: Non-light-emitting area 21: Alkali-free glass substrate 22: Planarizing layer 23: First electrode 24: Pixel division layer and spacer layer 25: Organic EL layer 26: Second electrode 27: First electrode 28: Alkali-free glass substrate 29: Layer (A) 30: Layer (B) 31: Spacer layer

Claims

1. A positive-type photosensitive resin composition containing (a) a resin, (b) a photoacid generator, and (c) a solvent, wherein the (a) resin contains a repeating unit represented by formula (1) and a repeating unit represented by formula (2), as well as a repeating unit represented by formula (3) and / or a repeating unit represented by formula (4). (In formula (1), formula (2), formula (3) and formula (4), * １ , * ２ , * ３ , * ４ , * ５ , * ６ , * ７ and * ８ represents a binding site, and R １ and R ５ each independently represents a hydrogen atom or a methyl group, R ２ represents a monovalent group containing a benzotriazole skeleton and a phenol skeleton, R ３ and R ４ does not contain a benzotriazole skeleton, and each independently represents a monovalent group having 1 to 20 carbon atoms or a hydrogen atom; R ６ represents an aryl group having 6 to 15 carbon atoms and not containing a benzotriazole skeleton.

2. The positive photosensitive resin composition according to claim 1, wherein, in the resin (a), when the sum of the number of moles of the repeating unit represented by formula (2), the number of moles of the repeating unit represented by formula (3), and the number of moles of the repeating unit represented by formula (4) is taken as 100.0 mol %, the content of the repeating unit represented by formula (2) is 15.0 to 90.0 mol %.

3. The positive photosensitive resin composition according to claim 1, wherein the resin (a) contains (a-1) a copolymer having, in one molecule, a repeating unit represented by formula (3) and / or a repeating unit represented by formula (4) in addition to the repeating unit represented by formula (1) and the repeating unit represented by formula (2), and the content of the repeating unit represented by formula (2) in the component (a-1) is 15.0 to 90.0 mol % when the sum of the number of moles of the repeating unit represented by formula (2), the number of moles of the repeating unit represented by formula (3), and the number of moles of the repeating unit represented by formula (4) is 100.0 mol %.

4. The positive photosensitive resin composition according to claim 1, wherein the total content of the repeating unit represented by formula (1), the repeating unit represented by formula (2), the repeating unit represented by formula (3), and the repeating unit represented by formula (4) is 70 to 100 mass % relative to 100 mass % of the resin (a).

5. The positive photosensitive resin composition according to claim 1, wherein the resin (a) contains a repeating unit represented by formula (5) and / or a repeating unit represented by formula (6). (In formula (5) and formula (6), * ９ , * １０ , * １１ and * １２ represents the binding site, R ７ and R １１ are each independently —COO—, —CON(R １５ )-, -CONH- or a single bond, R １５ represents an alkyl group having 1 to 5 carbon atoms, and R ８ and R １２ each independently represents a divalent linking group containing an alkylene group and having 1 to 10 carbon atoms, or a single bond; R ９ and R １４ each independently represents an alkyl group having 1 to 10 carbon atoms substituted with one phenyl group, or an alkyl group having 1 to 10 carbon atoms; n １ and n ４ are integers, each independently representing 0 to 2; R １０ and R １３ each independently represents an alkyl group having 1 to 10 carbon atoms; n ２ and n ３ are integers, each independently representing 0 to 2. １ If is 2, R ９ may be the same group or different groups. ２ If is 2, R １０ may be the same group or different groups. ３ If is 2, R １３ may be the same group or different groups. ４ If is 2, R １４ may be the same group or different groups.) 6. The positive photosensitive resin composition according to claim 3, wherein the component (a-1) further contains a repeating unit represented by formula (7). (In formula (7), * １３ and * １４ represents a binding site, and R １６ and R １７ each independently represents a monovalent hydrocarbon group having 1 to 4 carbon atoms or a hydrogen atom; R １８ represents a monovalent group having 1 to 10 carbon atoms or a hydrogen atom.

7. The positive photosensitive resin composition according to claim 1, wherein the repeating unit represented by formula (2) contains a repeating unit having a monovalent group containing an alicyclic hydrocarbon group that does not contain a cyclic ether structure.

8. A cured film comprising a cured product of the positive photosensitive resin composition according to any one of claims 1 to 7.

9. An organic EL display device comprising a substrate, a planarizing layer, a first electrode, a pixel dividing layer, a light-emitting pixel, and a second electrode in this order, wherein the pixel dividing layer and / or the planarizing layer contains a cured product of a positive-type photosensitive resin composition containing (a) a resin, (b) a photoacid generator, and (c) a solvent, and the (a) resin contains a repeating unit represented by formula (1) and a repeating unit represented by formula (2), as well as a repeating unit represented by formula (3) and / or a repeating unit represented by formula (4). (In formula (1), formula (2), formula (3) and formula (4), * １ , * ２ , * ３ , * ４ , * ５ , * ６ , * ７ and * ８ represents a binding site, and R １ and R ５ each independently represents a hydrogen atom or a methyl group, R ２ represents a monovalent group containing a benzotriazole skeleton and a phenol skeleton, R ３ and R ４ does not contain a benzotriazole skeleton, and each independently represents a monovalent group having 1 to 20 carbon atoms or a hydrogen atom; R ６ represents an aryl group having 6 to 15 carbon atoms and not containing a benzotriazole skeleton.

10. The organic EL display device according to claim 9, wherein the pixel dividing layer comprises a layer (A) containing a cured product of a negative-type photosensitive pigment composition containing an organic black pigment, and a layer (B) on the surface of the layer (A) containing a cured product of a positive-type photosensitive resin composition containing (a) a resin, (b) a photoacid generator, and (c) a solvent.

11. An electronic device comprising the organic EL display device according to claim 9 or 10.

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