Apparatus for removing residual monomers

Abstract

The present invention relates to an apparatus for removing residual monomers, being capable of preventing the formation of a dead zone, in which a material being distilled does not flow or the flow rate of the material being distilled decreases, and the formation of foam that causes a reduction in a gas-liquid contact area, thereby increasing the process efficiency of the apparatus. More specifically, the present invention provides an apparatus for removing residual monomers, comprising trays provided with: a spiral flow passage; and spiral baffles, under-sluice-type baffles, weirs, and the like, which form the spiral flow passage.

Description

Residual monomer removal device

[0001] The present invention relates to a residual monomer removal device.

[0002] Polyvinyl chloride (PVC) is generally manufactured by suspension polymerization, emulsion polymerization, or bulk polymerization, but is usually manufactured by suspension polymerization and emulsion polymerization, which have the advantages of easy removal of reaction heat and obtaining a high-purity product. Such suspension polymerization and emulsion polymerization are generally performed by adding vinyl chloride monomer (VCM) and a polymerization initiator together with an aqueous medium, a dispersant, and an emulsifier to a polymerization vessel equipped with a stirrer, stirring the mixture, and maintaining the temperature inside the polymerization vessel to polymerize the VCM. At this time, the polymerization reaction generally does not continue until the VCM is completely converted to PVC, and is terminated at a polymerization conversion rate that provides high production efficiency. After termination, the residual monomer in the polymerization vessel is separated from the PVC slurry through a removal device and then recovered.

[0003] Conventional removal devices have been proposed in various ways to completely remove VCM formed during the polymerization reaction or to reduce the VCM content to an environmentally sanitation-safe level.

[0004] The method and device for removing residual monomers of Korean Patent No. 10-0505907 have a perforated plate (tray) with zigzag-shaped partition walls that form a zigzag-shaped PVC slurry channel. However, in a tray with such a structure, when the PVC slurry flows along the channel formed by the zigzag-shaped partition walls, the PVC slurry collides with the partition walls near the corners, thereby slowing down the flow rate of the flowing PVC slurry or forming a dead zone where no flow occurs. As a result, solid matters in the slurry, such as PVC particles, may precipitate, blocking the holes through which gas is supplied, preventing the slurry from coming into contact with the gas, which may lower production efficiency and deteriorate the quality of the produced PVC. In addition, as the PVC slurry hits the partition wall near the corner, a large amount of foam is generated in the PVC slurry, which reduces the gas-liquid contact area between the PVC slurry and the gas, further reducing the efficiency of the process and potentially contaminating the interior of the device.

[0005] In order to solve the above problems, the inventors of the present invention invented a residual monomer removal device of Korean Patent Publication No. 10-2022-0011960, and developed a residual monomer removal device having a structure capable of further preventing the formation of a dead zone, thereby leading to the present invention.

[0006] The purpose of the present invention is to provide a residual monomer removal device that can prevent the formation of a dead zone and foam in which a distillation target substance does not flow or the flow rate is reduced when gas is supplied to a flowing distillation target substance to remove volatile substances.

[0007] The present invention comprises a body part capable of supplying gas to a distillation target substance accommodated therein;

[0008] A distillation target material supply section provided at the upper part of the above body part and into which the distillation target material is introduced;

[0009] A gas inlet provided at the lower part of the above body portion and into which the gas is introduced;

[0010] A discharge unit provided at the upper part of the body part and discharging volatile substances separated from the distillation target substance by the gas;

[0011] A recovery unit provided at the lower part of the body part and recovering the distillation target material from which the volatile substances have been removed;

[0012] A tray having a plurality of disc-shaped bodies formed with through holes and a spiral-shaped channel formed on the upper surface of the body, provided inside the body;

[0013] A downcomer, which is provided between the trays and is a passage through which the distillation target substance moves from the upper part of the body to the lower part;

[0014] A spiral baffle extending from the center of the upper surface of the tray body toward the edge to form the spiral-shaped flow path; and

[0015] A residual monomer removal device is provided, including an undersluice baffle, which is provided on a portion of the above spiral baffle and has an undersluice-type opening formed therein so that a distillation target substance can flow under the baffle.

[0016] In one aspect, the supply unit may be formed in multiple units so as to be able to disperse and inject the distillation target material.

[0017] In one aspect, the width of the spiral-shaped euro may be constant.

[0018] In one aspect, the plurality of trays may be spaced apart at equal intervals along the height direction of the body portion.

[0019] In one aspect, the downcomer may be positioned at the edge of the tray or at the center of the tray, but the positions may be alternated along the height direction of the body portion.

[0020] In one aspect, it may further include a weir in the form of a dam for controlling the level of the distillation target material moving to the downcomer.

[0021] In one aspect, the weir may be formed so that the slope can be adjusted to an angle of inclination (θ) of 30 to 90° relative to the upper surface of the tray, in part or in whole.

[0022] In one aspect, the weir may further include a form in which an under-sluice type opening is formed so that the distillation target substance can also flow below the baffle.

[0023] In one aspect, the distillation target material may be characterized by including a polymerization product of suspension polymerization or emulsion polymerization.

[0024] In one aspect, the distillation target material may include a distillable vinyl chloride monomer (VCM).

[0025] Another aspect of the present invention is a method for removing residual monomer using the residual monomer removal device,

[0026] A step in which the distillation target substance is injected into the body part;

[0027] A step in which gas is supplied to the distillation target substance to generate a gas phase containing volatile substances and a distillation target substance from which volatile substances have been removed; and

[0028] A method for removing residual monomers is provided, including a step of removing a distillation target material from which gaseous and volatile substances have been removed from the above-mentioned body.

[0029] The residual monomer removal device according to the present invention is equipped with a tray having a spiral-shaped flow path and a spiral baffle forming the spiral baffle, an under-sluice-shaped baffle, and a weir, thereby preventing the formation of a dead zone or foam occurring in the flow of a distillation target substance within the device, thereby increasing the process efficiency of the device.

[0030] FIG. 1 is a partially cut-away perspective view illustrating a residual monomer removal device according to one embodiment of the present invention.

[0031] FIG. 2 is a plan view of a tray of a residual monomer removal device according to one embodiment of the present invention.

[0032] FIG. 3 is a schematic diagram illustrating a spiral path and a distillation target material flow of a residual monomer removal device according to one embodiment of the present invention.

[0033] FIG. 4 is a schematic diagram of a weir having an adjustable slope of a residual monomer removal device according to one embodiment of the present invention.

[0034] Figure 5 illustrates the internal computational fluid dynamics (CFD) calculation results of an existing residual monomer removal device.

[0035] FIG. 6 illustrates the internal computational fluid dynamics (CFD) calculation results of a residual monomer removal device including an undersluice baffle (22a, 22b) according to one embodiment of the present invention, and can be compared with FIG. 5.

[0036] Figure 7 illustrates the internal computational fluid dynamics (CFD) calculation results of an existing residual monomer removal device including a weir.

[0037] FIG. 8 illustrates the internal computational fluid dynamics (CFD) calculation results of a residual monomer removal device including a slope-formed weir according to one embodiment of the present invention, and can be compared with FIG. 7.

[0038] The present invention will be described in more detail below. However, the following specific examples or examples are merely references for explaining the present invention in detail, and the present invention is not limited thereto, and may be implemented in various forms.

[0039] Additionally, unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention pertains. The terminology used herein is for the purpose of describing specific embodiments only and is not intended to be limiting.

[0040] Additionally, the singular forms used in the specification and the appended claims are intended to include the plural forms as well, unless the context clearly dictates otherwise.

[0041] Additionally, when a part is said to "include" a component, this does not mean that it excludes other components, but rather that it may include other components, unless otherwise specifically stated.

[0042] Additionally, unless otherwise specifically defined in the present invention, when a layer or member is said to be “located on” another layer or member, this includes not only cases where a layer or member is in contact with another layer or member, but also cases where another layer or another member exists between the two layers or two members.

[0043] In addition, the terms “about,” “substantially,” etc. used in this specification are used in a meaning close to or at the numerical value when manufacturing and material tolerances inherent to the meanings mentioned are presented, and are used to prevent unscrupulous infringers from unfairly using the disclosure contents in which exact or absolute values ​​are mentioned to aid in the understanding of the present invention.

[0044] Conventionally, the trays of a residual monomer removal device have a zigzag flow path formed on the upper surface by a partition wall, and the distillation target substance flows along the formed flow path. Therefore, as the distillation target substance collides with the partition wall near the corner of the flow path, the flow rate of the flowing distillation target substance decreases, or a dead zone is formed where no flow occurs. As a result, solid substances of the distillation target substance precipitate, blocking the hole through which gas is supplied. Since the distillation target substance and gas do not come into contact, volatile substances are not sufficiently removed, which may lower production efficiency and the quality of the produced PVC.

[0045] However, the residual monomer removal device of the present invention is equipped with a tray having a spiral-shaped channel formed therein, so that the distillation target substance flows in a spiral shape on the upper surface of the tray, thereby preventing the formation of foam that reduces the dead zone and the gas-liquid contact area. In addition, the present invention provides a residual monomer removal device that can further prevent the dead zone and foam that are formed even in the spiral-shaped channel by applying an under-sluice-type baffle and a weir whose slope can be adjusted to the baffle forming the spiral-shaped channel.

[0046] Hereinafter, the technical idea of ​​the present invention will be described in more detail using the attached drawings.

[0047] The present invention comprises: a body part (10) capable of supplying gas to a distillation target substance accommodated therein; a distillation target substance supply part (30) provided at an upper portion of the body part (10) and into which the distillation target substance is introduced; a gas inlet part (50) provided at a lower portion of the body part and into which the gas is introduced; a discharge part (70) provided at an upper portion of the body part (10) and which discharges a volatile substance separated from the distillation target substance by the gas; a recovery part (90) provided at a lower portion of the body part (10) and which recovers the distillation target substance from which the volatile substance has been removed from the distillation target substance; a plurality of trays (20) provided inside the body part (10), each having a through hole formed therein and a spiral-shaped channel (25) formed therein; a downcomer (40b) provided between the trays (20) and which is a movement path through which the distillation target substance moves from an upper portion of the body part to a lower portion; The above tray (20) provides a residual monomer removal device including a disk-shaped body (21) positioned in a direction that divides the inside of the body into upper and lower parts, a spiral baffle (23) positioned on the upper surface of the body (21) and extending in a rotational direction from the center of the body (21) toward the edge to form the spiral-shaped flow path (25); an undersluice baffle (22) formed on a part of the spiral baffle (23) and having an undersluice-shaped opening formed therein so that the distillation target substance can flow under the baffle; and a weir (24) in the form of a dam that controls the level of the distillation target substance moving to the downcomer (40b).

[0048] In one aspect, the distillation target substance refers to a form in which a residual solvent and a distillable monomer exist inside a polymer powder obtained through suspension polymerization or emulsion polymerization, and for example, it may refer to a suspension polymer (PVC slurry) containing a distillable vinyl chloride monomer (VCM) inside after suspension polymerization of polyvinyl chloride (PVC). PVC is used as an example for suspension polymerization or emulsion polymerization, but is not limited thereto.

[0049] In addition, the gas is for vaporization of residual monomer and residual solvent, etc., and may be a gas or vapor, and specifically, may be water vapor.

[0050] In one embodiment, the body part (10) provides a receiving space capable of supplying gas to a distillation target substance accommodated therein, and may be provided as a cylindrical chamber as illustrated in the drawing, but is not limited to a structure capable of forming a receiving space. The body part (10) is installed vertically on the ground, and the body part (10) accommodates a plurality of trays (20) and downcomers (40a, 40b) therein. The body part (10) can have its interior divided vertically by the trays (20). The distillation target substance is introduced from the upper portion of the body part (10) and gas is introduced from the lower portion of the body part (10).

[0051] In one embodiment, the supply unit (30) is provided at the upper portion of the body portion (10) and is a pipe through which a distillation target substance is introduced. As the distillation target substance is supplied into the interior of the body portion (10) through the supply unit (30) provided at the upper portion of the body portion (10), the distillation target substance is moved at a flow rate by gravity. Specifically, the supply unit (30) is provided at the upper side of the body portion (10) rather than the uppermost tray (20) so that the introduced distillation target substance can be moved to the upper surface of the uppermost tray (20).

[0052] In one embodiment, the supply unit (30) may be formed in multiple numbers so as to be able to disperse and input the distillation target substance. In addition, it may be positioned between the tray layers so that the distillation target substance is supplied through the middle of the body part (10). Specifically, the multiple supply units (30) may be spaced apart at equal intervals along the inner circumference of the body part (10), and the distillation target substance may be discharged at the same flow rate from each. As the flow rate of the distillation target substance discharged from a single supply unit (30) decreases in inverse proportion to the number of supply units (30), the pressure difference between the supply unit (30) and the body part (10) is reduced, and the generation of foam due to the pressure difference can be prevented. The residual monomer removal device of the present invention as described above can further prevent the formation of foam, thereby maximizing the effect of increasing process efficiency.

[0053] In one embodiment, the gas inlet (50) is a pipe or tube through which gas is introduced, and is provided at the lower portion of the body portion (10) in the opposite direction to the inflow direction of the substance to be distilled. As the gas inlet (50) is provided at the lower portion of the body portion (10), gas rises upward from the lower portion inside the body portion (10).

[0054] In one embodiment, the discharge unit (70) is provided at the upper portion of the body (10) and may be a pipe or tube through which volatile substances separated from the distillation target substance by gas are discharged. Specifically, the volatile substances discharged through the discharge unit (70) may be residual solvents and distillable monomers contained in the distillation target substance.

[0055] In one embodiment, the recovery unit (90) is provided at the lower portion of the body and may be a pipe or tube for recovering the distillation target material from which volatile substances have been removed. Specifically, the distillation target material from which volatile substances have been removed, discharged through the recovery unit (90), may be high-purity PVC from which residual solvents and distillable monomers have been removed.

[0056] In one embodiment, the downcomer (40) is provided between the trays (20) and is a passage through which the distillation target substance moves from the upper part to the lower part of the body part (10). Assuming that the tray (20) located at the upper part among the adjacent trays (20) is the upper tray (20) and the tray (20) located at the lower part thereof is the lower tray (20), the downcomer (40) is located between the upper tray (20) and the lower tray (20) and can move the distillation target substance flowing from the upper tray (20) to the lower tray (20). The downcomer (40) may be provided in multiple numbers as the trays (20) are provided in multiple numbers. At this time, the downcomer (40) may be located at the edge of the tray (20) or the center of the tray (20), but the positions may be alternated along the height direction of the body part (10). Specifically, when the downcomers (40) are sequentially numbered from the top to the bottom of the body, the nth downcomer (40) can extend downward from the edge of the nth tray (20) to move the distillation target substance to the upper surface of the edge of the n+1th tray (20). In addition, the n+1th downcomer (40) can extend downward from the center of the n+1th tray (20) to move the distillation target substance to the upper surface of the center of the n+2th tray (20). In this way, the distillation target substance supplied onto the tray (20) through the downcomer (40) can flow along the spiral path (25) and then move to the next tray (20) located below through the next downcomer (40).

[0057] In one embodiment, the tray (20) is provided in multiple pieces inside the body (10), each having a through hole (21) formed therein and a spiral-shaped flow path formed on the upper surface. Specifically, the tray (20) may be provided with a disk-shaped body (21) positioned in a direction that divides the inside of the body (10) into upper and lower parts, and a spiral baffle (23) positioned on the upper surface of the disk-shaped body (21) to form a spiral-shaped flow path.

[0058] In one embodiment, since a plurality of such trays (20) are provided inside the body (10), the inside of the body (10) can be partitioned into multiple layers. More specifically, the trays (20) can be arranged at equal intervals along the height direction of the body (10) perpendicular to the ground. When the trays (20) arranged at equal intervals are arbitrarily adjacent to each other, and the tray (20) located at the upper end is assumed to be the upper tray (20) and the tray (20) located at the lower end thereof is assumed to be the lower tray, since the heights moving from the upper tray to the lower tray are the same, the flow rate of the distillation target substance determined by potential energy can be the same in each layer formed by each tray (20). Accordingly, the flow rate of the distillation target substance inside the body (10) can be easily controlled during process design. As shown in the drawing, the uppermost tray (20) may have the supply part (30) positioned at the edge position and the downcomer (40b) positioned at the center position, but alternatively, the supply part (30) or the downcomer (40a) may be positioned at the center position and the downcomer (40b) may be positioned at the edge position.

[0059] In one embodiment, the body (21) of the tray (20) may be formed with a plurality of through holes (21a) penetrating in the upper and lower directions of the main body. The through holes (21a) may be formed over the entire surface of the body (21), and preferably, the distillation target substance may be arranged so as to be concentrated on the movement path, i.e., the bottom surface of the spiral-shaped channel (25). At this time, the lower surface of the body (21) may have a spiral pattern corresponding to the spiral-shaped channel (25) formed due to the through holes (21). The diameter of the through holes (21a) perforated in the body (21) may be 10 mm or less, preferably 1 to 5 mm, and more preferably 1 to 3 mm, but is not limited thereto. The opening ratio of the body (21) (total area of ​​the through hole (21a) / area of ​​the upper surface of the body (21)) may be 0.01 to 30%, preferably 0.02 to 10%, but is not limited thereto.

[0060] In one embodiment, the spiral baffle (23) extends from the center of the body (21) toward the edge to form a spiral path (25), so that the distillation target substance can flow in a spiral shape on the upper surface of the tray (20) by the spiral baffle (23). The spiral baffle (23) can extend at various angles to form various widths of the spiral path (25) on the upper surface of the body (21) of the tray (20), but preferably, it can extend at various angles to form a constant width of the spiral path (25) along the extension direction of the spiral baffle (23). Since the spiral path (25) is formed with a constant width in such a spiral baffle (23), a constant amount of the distillation target substance can flow through the path. Accordingly, the flow rate of the distillation target substance can be easily controlled when designing a process.

[0061] As shown in FIGS. 2 and 3, the spiral baffle (23) may be rotated and extended in a curved shape to form a spiral flow path (25), but may also include an acceleration section (23a) in which a portion of the upper surface of the body (21) of the tray (20) is extended in a straight shape, so that a portion of the spiral flow path (25) is formed in a straight shape. The acceleration section (23a) may be formed in a fan-shaped area with a central angle of 10° to 90°, preferably 20° to 80°, and more preferably 30° to 60°, centered on the center of the tray (20). As the acceleration section (23a) is formed in such a fan-shaped area, the flow rate of the distillation target substance can be further prevented from decreasing due to friction generated during flow and contact with the gas supplied from the through hole (21) of the body (21).

[0062] In one embodiment, the undersluice baffle is formed on a portion of the spiral baffle, and is a baffle having an undersluice-type opening formed therein so that the distillation target substance can flow under the baffle. The height of the opening may be 0.02 to 0.1 m, preferably 0.05 m, and the width may extend to the position of the supply portion, but is not limited thereto as long as the flow rate of the distillation target substance is not hindered. In the case of the undersluice baffle (22a) of the weir portion, the height of the opening is the same as that of the undersluice baffle (22b) of the supply portion, and the width is the same as that of the weir (24).

[0063] The above undersluice baffle can help discharge PVC particles that accumulate on the tray due to the formation of a dead zone or backflow in which the distillation target substance is not sufficiently mixed or flowed on the spiral path. If the PVC particles remain on the tray for a long time, they can block the tray holes, hindering the transfer of substances and reducing the stripping efficiency, so this must be prevented.

[0064] One embodiment in which the above-mentioned undersluice baffle is formed in the above-mentioned spiral baffle is that, as shown in FIGS. 2 and 3, when the location of the supply section (30) is located downstream of the downcomer (Inlet) (40a) with respect to the flow direction of the distillation target substance, the flow of the distillation target substance discharged from the upstream downcomer (Inlet) (40a) may stagnate, forming a dead zone. At this time, by forming an opening in the lower part of the baffle where the dead zone is formed, that is, by arranging the undersluice baffle (22b), the stagnant distillation target substance may be discharged undersluice, thereby eliminating the dead zone.

[0065] Another aspect of the present invention may be a residual monomer removal device further including a weir in the form of a dam for controlling the level of the distillation target material moving to the downcomer.

[0066] In one aspect, the weir (24) may be provided on the spiral-shaped flow path (25) and may be a baffle in the form of a dam that controls the level of the distillation target substance.

[0067] The above weir allows the distillate to accumulate until it reaches a certain level, after which it overflows. The turbulence generated during this process may serve to maintain a residence time for mass transfer between the liquid and the gas. The level of the distillate can be determined by adjusting the height of the weir, thereby controlling the residence time of the distillate.

[0068] The above weir is provided on the spiral path before moving to the downcomer (40b) so as to control the flow of the distillation target material from the upper tray to the lower tray, as shown in Fig. 2.

[0069] In one embodiment, the weir may have a shape of an underslew baffle (22a). That is, it may have a shape that allows the distillation target substance to flow to the lower part of the weir through the underslew baffle. Since the weir is formed so that the distillation target substance flows only through a specific location of the weir, i.e., the upper part of the weir, stagnation of the distillation target substance may occur at the lower part of the weir. To solve this problem, an underslew shape may be introduced at the lower part of the weir so that some of the distillation target substance can flow to the lower part of the weir, thereby preventing the formation of a dead zone.

[0070] In one embodiment, the weir may be formed such that a part or all of the weir has a slope (θ) adjusted to 10 to 90° based on the upper surface of the tray, as shown in FIG. 4. More preferably, the slope may be formed to 20°, but the slope angle may be adjusted depending on the distillation target substance or flow conditions. This can cause changes in the flow rate and flow rate by installing the weir so that the slope angle can be adjusted compared to the existing weir, thereby resolving stagnation of the distillation target substance occurring at the bottom of the weir. In addition, solid substances such as PVC particles can pass the weir well along the slope, thereby preventing sedimentation of the solid substances.

[0071] Accordingly, the first aspect of the above-mentioned weir may be a weir having an adjustable slope, the second aspect may be a weir having an undersluice shape, and the third aspect may be a weir having both the adjustable slope shape of the first aspect and the undersluice shape of the second aspect.

[0072] A first aspect of the residual monomer removal device of the present invention is a residual monomer removal device having a spiral-shaped channel including the undersluice baffle, a second aspect is a residual monomer device further including a weir in the first aspect, a third aspect is a residual monomer device in which the weir of the second aspect is of an undersluice shape, a fourth aspect is a residual monomer device in which the weir of the second aspect is of a slope shape, and a fifth aspect is a residual monomer removal device including both the third and fourth aspects.

[0073] Another aspect of the present invention provides a method for removing residual monomer, comprising: a step of introducing the distillation target material into the body; a step of supplying gas to the distillation target material to generate a gas phase containing volatile substances and a distillation target material from which the volatile substances have been removed; and a step of removing the distillation target material from which the gas phase and the volatile substances have been removed from the body.

[0074] In the present invention, the distillation target material includes a polymerization product of suspension polymerization or emulsion polymerization, and specifically, may include a suspension polymerization product or emulsion polymerization product of PVC. Examples of polymerizable monomers that can react with VCM for polymerization include, but are not limited to, carboxylic acid esters of vinyl alcohol (e.g., vinyl acetate), vinyl ethers (e.g., alkyl vinyl ethers), unsaturated carboxylic acid esters (e.g., acrylates and methacrylates), vinylidene halides (e.g., vinylidene chloride and vinylidene fluoride), unsaturated nitriles (e.g., acrylonitrile), and olefins (e.g., ethylene and propylene).

[0075] In the present invention, the distillation target material may preferably refer to a liquid dispersion (PVC slurry) containing PVC that has undergone a polymerization reaction, unreacted residual monomers, and an aqueous medium mainly containing water, and may contain a small amount of a dispersant such as polyvinyl alcohol or hydroxypropylmethyl cellulose in addition to a buffer, particle size regulator, scale adhesion inhibitor, antifoaming agent, etc., as needed.

[0076] Specifically, in the step where the distillation target substance is introduced into the body, the slurry concentration of the distillation target substance, i.e., the concentration of the PVC slurry, is preferably 5 to 50 wt%, more preferably 10 to 40 wt%. If the concentration of the distillation target substance exceeds 50 wt%, the fluidity is greatly reduced, and if the concentration is less than 5 wt%, the removal efficiency of the residual monomer may be significantly reduced.

[0077] In the step where gas is supplied to the distillation target substance and a vapor phase containing volatile substances and a distillation target substance from which volatile substances have been removed are generated, the amount of gas (steam) emitted may be 500 to 3000 kg / hr, 1000 to 2000 kg / h, more preferably 1200 to 1500 kg / h, but is not limited thereto. At this time, the temperature and amount of gas emitted may be adjusted so that the temperature of the distillation target substance flowing on the uppermost tray is 50 to 150°C, specifically 70 to 120°C, more specifically 80 to 110°C, but is not limited thereto.

[0078] In the step of removing the distillation target substance from which the vapor and volatile substances have been removed from the body, the volatile substances are discharged through the discharge unit, and the distillation target substance from which the volatile substances have been removed is discharged to the recovery unit. The distillation target substance from which the volatile substances have been removed may be high-purity PVC from which the residual monomer, VCM, has been removed. In this way, the method for removing residual monomer using the residual monomer removal device described above has excellent process efficiency, and thus can produce a high-purity product.

[0079] Tables 1 through 3 below quantitatively summarize improvements to the device, as demonstrated through CFD flow analysis and an acrylic experimental device (pilot scale). The residual monomer removal device according to one embodiment of the present invention is compared with a conventional residual monomer removal device (Korean Patent Publication No. 10-2022-0011960), showing the flow rates in the undersluice baffle and weir sections. Higher flow rates reduce the dead zone area, preventing PVC particles from settling and accumulating.

[0080] Residual monomer removal device of the first embodiment of the flow rate agent in the undersluice baffle 0.01 m / s Conventional residual monomer removal device 0 m / s (PVC particles stagnate downstream)

[0081] 3-stage residual monomer removal device in the undersluice baffle 0.08 m / s Conventional residual monomer removal device 0 m / s (PVC particles stagnate without passing the weir)

[0082] 4-stage residual monomer removal device when passing over a weir 0.1 m / s Conventional residual monomer removal device 0.001 m / s

[0083] Comparing the flow velocity of the existing residual monomer removal device (Korean Patent Publication No. 10-2022-0011960) of FIG. 5 and the residual monomer removal device according to the third aspect of the present invention of FIG. 6, it was confirmed that the flow velocity increases (red part) when the undersluice baffle exists in the supply section (22b) and the weir section (22a).

[0084] In addition, looking at the existing residual monomer removal device of FIG. 7 (Korean Patent Publication No. 10-2022-0011960) and the residual monomer removal device according to the fourth aspect of the present invention, FIG. 8, it can be seen that in the case of the existing residual monomer removal device, the weir is installed perpendicular to the tray surface, so the flow is not smooth, whereas in the case of the slope-shaped weir, the flow can be smooth because the flow can follow the slope.

[0085] As described above, the present invention has been described with specific details and limited examples and drawings, but these are provided only to help a more general understanding of the present invention, and the present invention is not limited to the above examples, and those skilled in the art to which the present invention pertains can make various modifications and variations based on this description.

[0086] Therefore, the idea of ​​the present invention should not be limited to the described embodiments and drawings, and all things that are equivalent or equivalent to the claims described below as well as the claims are considered to fall within the scope of the idea of ​​the present invention.

[0087] Description of the symbol

[0088] 10: Body

[0089] 20: Tray

[0090] 21: Body

[0091] 21a: Through hole

[0092] 22: Undersluis baffle

[0093] 22a: Underslung baffle (weir area)

[0094] 22b: Underslung baffle (supply section)

[0095] 23: Spiral baffle

[0096] 23a: Acceleration section

[0097] 24: Weir

[0098] 25: Spiral Euro

[0099] 30: Feed

[0100] 40: Downcomer

[0101] 40a: Downcomer (Nozzle of existing supply unit; Inlet)

[0102] 40b: Downcomer (Outlet)

[0103] 50: Gas inlet

[0104] 70: Exhaust

[0105] 90: Recovery Department

Claims

1. A body part capable of supplying gas to the distillation target substance contained inside; A distillation target material supply section provided at the upper part of the above body part and into which the distillation target material is introduced; A gas inlet provided at the lower part of the above body portion and into which the gas is introduced; A discharge unit provided at the upper part of the body part and discharging volatile substances separated from the distillation target substance by the gas; A recovery unit provided at the lower part of the body part and recovering the distillation target material from which the volatile substances have been removed; A tray having a plurality of disc-shaped bodies formed with through holes and a spiral-shaped channel formed on the upper surface of the body, provided inside the body; A downcomer, which is provided between the trays and is a passage through which the distillation target substance moves from the upper part of the body to the lower part; A spiral baffle extending from the center of the upper surface of the tray body toward the edge to form the spiral-shaped flow path; and A residual monomer removal device including an undersluice baffle, which is provided on a portion of the above spiral baffle and has an undersluice-type opening formed therein so that a distillation target substance can flow under the baffle.

2. In paragraph 1, A residual monomer removal device in which the supply section is formed in multiple units so as to be able to disperse and inject the distillation target material.

3. In paragraph 1, A residual monomer removal device in which the width of the spiral-shaped euro is constant.

4. In paragraph 1, A residual monomer removal device in which a plurality of the above trays are spaced at equal intervals along the height direction of the above body portion.

5. In paragraph 1, A residual monomer removal device in which the downcomer is positioned at the edge of the tray or at the center of the tray, but the positions are alternated along the height direction of the body part.

6. In paragraph 1, A residual monomer removal device further comprising a weir in the form of a dam for controlling the level of the distillation target material moving to the above downcomer.

7. In paragraph 6, The above-mentioned weir is a residual monomer removal device in which a part or all of the weir is formed so that the slope (θ) can be adjusted to 30 to 90° based on the upper surface of the tray.

8. In paragraph 6, A residual monomer removal device wherein the above weir further includes a form in which an under-sluice type opening is formed so that the distillation target substance can also flow below the baffle.

9. In paragraph 1, A residual monomer removal device characterized in that the distillation target material includes a polymerization product of suspension polymerization or emulsion polymerization.

10. In paragraph 9, A residual monomer removal device wherein the distillation target substance includes a distillable vinyl chloride monomer (VCM).

11. In a method for removing residual monomer using a residual monomer removal device selected from any one of clauses 1 to 10, A step in which the distillation target substance is injected into the body part; A step in which gas is supplied to the distillation target substance to generate a gas phase containing volatile substances and a distillation target substance from which volatile substances have been removed; and A method for removing residual monomer, comprising: a step of removing a distillation target material from which gaseous and volatile substances have been removed from the above body.

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