Washing control method and apparatus, and self-cleaning system and storage medium

Abstract

A self-cleaning device, a washing control method and apparatus, a self-cleaning system and a storage medium, which relate to the field of smart home appliances. The self-cleaning device comprises a cleaning member and a water tank provided with an overflow outlet, wherein water overflowing from the overflow outlet can be in contact with the cleaning member. The washing control method comprises: controlling a device base station to refill a water tank with water for a first preset duration or to a first preset water volume, wherein after the water tank is filled with water, the water overflows from an overflow outlet to a cleaning member to soak the cleaning member, and the device base station is used for docking a self-cleaning device; and performing first washing treatment on the soaked cleaning member. In the present application, during washing a cleaning member, water overflowing from an overflow outlet of a water tank is used for washing, without the need for additional water intake, thereby improving the washing efficiency; and the water overflowing from the overflow outlet can be effectively utilized, thereby improving the utilization rate of the water.

Description

Cleaning control method and device, self-cleaning system, and storage medium

[0001] Cross-reference to related applications

[0002] The present application claims priority to Chinese Patent Application No. 202410865430.3, filed on June 28, 2024, and Chinese Patent Application No. 202421521820.0, filed on June 28, 2024, the contents of which are hereby incorporated by reference in their entirety. TECHNICAL FIELD

[0003] The present application relates to the field of intelligent household appliances, and in particular to a cleaning control method and device, a self-cleaning system, and a readable storage medium. BACKGROUND

[0004] With the continuous development of smart home technology, self-cleaning devices such as floor sweeping machines, floor mopping machines, and sweeping and mopping all-in-one machines are being used more and more frequently in daily household work. For self-cleaning devices involving mopping functions, water is supplied to the cleaning element through a water tank to achieve wet mopping of the floor.

[0005] In related technologies, water is injected into the water tank through a device base station, and after the water tank is full and overflows, the overflowing water will directly flow to the outside of the self-cleaning device for discharge, resulting in insufficient utilization of the water overflowed from the water tank.

[0006] SUMMARY

[0007] Therefore, the present application provides a cleaning control method and device, a self-cleaning system, and a readable storage medium, which utilize the water overflowing from the water tank overflow port to clean the cleaning element, effectively utilize the water overflowing from the overflow port, and improve the utilization rate of water.

[0008] In a first aspect, the embodiments of the present application provide a self-cleaning device, which includes a device main body (100), a cleaning element (200), and a water tank provided with an overflow port, the device main body (100) is provided with a water outlet (101) on one side relative to the cleaning element (200).

[0009] The water outlet (101) is configured to allow the water overflowing from the overflow port of the water tank to contact the cleaning element (200) to wet the cleaning element (200).

[0010] In a second aspect, the embodiments of the present application provide a cleaning control method, the self-cleaning device includes the cleaning element and the water tank provided with the overflow port, and the water overflowing from the overflow port can contact the cleaning element; the method includes:

[0011] The control device base station supplies water to the water tank for a first preset time length or a first preset water volume. After the water tank is filled with water, water overflows from the overflow port to the cleaning piece, thereby wetting the cleaning piece. The device base station is used for parking the self-cleaning device.

[0012] The wetted cleaning piece is subjected to first cleaning treatment.

[0013] In a third aspect, an embodiment of the present application provides a cleaning control device. A self-cleaning device includes a cleaning piece and a water tank provided with an overflow port. Water overflowing from the overflow port can contact the cleaning piece. The device includes:

[0014] A water supply control module is configured to control a device base station to supply water to the water tank for a first preset time length or a first preset water volume. After the water tank is filled with water, water overflows from the overflow port to the cleaning piece, thereby wetting the cleaning piece. The device base station is used for parking the self-cleaning device.

[0015] A cleaning control module is configured to subject the wetted cleaning piece to first cleaning treatment.

[0016] In a fourth aspect, an embodiment of the present application provides a self-cleaning system. The self-cleaning system includes a self-cleaning device and a device base station. The device base station is used for parking the self-cleaning device.

[0017] In a fifth aspect, an embodiment of the present application provides a self-cleaning system. The self-cleaning system includes a self-cleaning device and a device base station. The device base station is used for parking the self-cleaning device. The self-cleaning device includes:

[0018] A cleaning piece;

[0019] A water tank provided with an overflow port. Water overflowing from the overflow port can contact the cleaning piece;

[0020] A memory storing a program or instructions;

[0021] A processor for executing the program or instructions to implement the steps of the method of the first aspect.

[0022] In a sixth aspect, an embodiment of the present application provides a readable storage medium. The readable storage medium stores a program or instructions. The program or instructions are executed by a processor to implement the steps of the method of the first aspect.

[0023] In a seventh aspect, an embodiment of the present application provides a chip. The chip includes a processor and a communication interface. The communication interface and the processor are coupled. The processor is configured to run a program or instructions to implement the method of the first aspect.

[0024] In an eighth aspect, an embodiment of the present application provides a computer program product stored in a storage medium, which is executed by at least one processor to implement the method of the first aspect.

[0025] In the embodiment of the present application, the self-cleaning device comprises a cleaning piece and a water tank provided with a water overflow port, water overflowing from the water overflow port can contact the cleaning piece. The control base station supplies water to the water tank for a first preset time length or a first preset water volume, and after the water tank is filled with water, water overflows from the water overflow port and falls on the cleaning piece to wet the cleaning piece. In response to a cleaning piece cleaning instruction, the cleaning piece wetted by the water overflowing from the water overflow port is subjected to a first cleaning treatment. In the embodiment of the present application, the water overflowing from the water overflow port of the water tank is used for cleaning the cleaning piece, without the need for additional water, which improves the cleaning efficiency and effectively utilizes the water overflowing from the water overflow port, thereby improving the water utilization rate.

[0026] The above description is only a summary of the technical solutions of the present application. In order to more clearly understand the technical means of the present application, the embodiments can be implemented in accordance with the content of the description, and in order to make the above and other purposes, characteristics and advantages of the present application more obvious and easy to understand, the following specific embodiments of the present application are described. BRIEF DESCRIPTION OF DRAWINGS

[0027] The drawings described herein are used to provide further understanding of the present application, and form a part of the present application. The schematic embodiments of the present application and their descriptions are used to explain the present application and do not constitute an improper limitation on the present application. In the drawings:

[0028] FIG. 1 shows a structure diagram of a self-cleaning device according to an embodiment of the present application;

[0029] FIG. 2 shows a structure diagram of a self-cleaning device according to an embodiment of the present application;

[0030] FIG. 3 shows a structure diagram of a self-cleaning device according to an embodiment of the present application;

[0031] FIG. 4 shows a structure diagram of a self-cleaning system according to an embodiment of the present application;

[0032] FIG. 5 shows a structure diagram of a self-cleaning device according to an embodiment of the present application;

[0033] FIG. 6 shows a structure diagram of a self-cleaning system according to an embodiment of the present application;

[0034] FIG. 7 shows a flowchart of a cleaning control method according to an embodiment of the present application;

[0035] FIG. 8 shows a structure block diagram of a cleaning control device according to an embodiment of the present application;

[0036] In the drawings, device main body-100, water outlet-101, cleaning piece-200, water supply joint-300. DETAILED DESCRIPTION

[0037] The technical solutions in the embodiments of the present application will be clearly described below with reference to the drawings in the embodiments of the present application. Obviously, the described embodiments are only some of the embodiments of the present application, rather than all the embodiments of the present application. Based on the embodiments in the present application, all other embodiments obtained by a person of ordinary skill in the art belong to the scope of protection of the present application.

[0038] The terms "first", "second", and the like in the specification and claims of the present application are used to distinguish similar objects, and are not used to describe a specific order or sequence. It should be understood that the data used in this way can be interchanged under appropriate circumstances, so that the embodiments of the present application can be implemented in an order other than that illustrated or described herein, and the objects distinguished by "first", "second", etc. are generally of a kind and do not limit the number of objects, for example, the first object can be one or more. In addition, "and / or" in the specification and claims indicates at least one of the connected objects, and the character " / ", generally indicates that the front and rear associated objects are in a "or" relationship.

[0039] The cleaning control method, device, self-cleaning system and readable storage medium provided by the embodiments of the present application will be described in detail below with reference to the drawings and specific embodiments and their application scenarios.

[0040] The embodiments of the present application provide a cleaning control method applied to a self-cleaning system, the self-cleaning system comprising a self-cleaning device and a device base station for parking the self-cleaning device, the self-cleaning device can be a floor mopping robot, a sweeping and mopping integrated machine, a cleaning robot, an intelligent self-cleaning device, a mopping machine, etc., and can clean by itself without user control. In order to facilitate description, the technical solutions of the present application are described by taking the sweeping and mopping integrated machine as an example. As shown in FIG. 1 and FIG. 2, the self-cleaning device comprises a machine body (or a device main body), the machine body is provided with a driving system, the driving system comprises a driving wheel assembly and a driven wheel, the driving wheel assembly and the driven wheel are controlled based on specific distance and angle information, to realize the running and turning of the self-cleaning device.

[0041] The machine body is also provided with a cleaning system, the cleaning system comprises a cleaning assembly and a water tank, as shown in FIG. 1, the cleaning piece (or the cleaning assembly) can comprise a cleaning piece 200 (mop, cloth, etc.), the cleaning piece can be arranged below the water tank, the water in the water tank is transmitted to the cleaning piece to clean the surface to be cleaned, or the water in the water tank can also be directly sprayed to the surface to be cleaned, the cleaning piece realizes the cleaning of the surface to be cleaned by evenly applying water, the cleaning piece can be a fabric, a sponge, etc. flexible material with water absorption. The cleaning assembly can also comprise a roller brush, the roller brush sweeps the garbage on the ground and sucks it into a dust box.

[0042] In one embodiment, the water tank is provided with several overflow openings, the positions of the overflow openings correspond to the positions of the cleaning pieces, and the water overflowing from the overflow openings can contact the cleaning pieces. After the water tank is filled with water, the water overflows from the overflow openings, and the overflowing water falls on the cleaning pieces through the water outlet to soak the cleaning pieces, thereby improving the utilization rate of water. Preferably, the cleaning pieces are symmetrically arranged on the left and right of the water tank, and the water tank is provided with one overflow opening on the left and one overflow opening on the right. The water overflowing from the overflow opening on the left corresponds to soaking the cleaning pieces on the left, and the water overflowing from the overflow opening on the right corresponds to soaking the cleaning pieces on the right.

[0043] In one embodiment, as shown in FIG. 2, the device body (or machine body) is provided with a water outlet 101, the water outlet 101 is in communication with the overflow openings of the water tank, and the position of the water outlet 101 corresponds to the position of the cleaning piece 200 in FIG. 1. After the water tank is filled with water, the water overflows from the overflow openings, and the overflowing water falls on the cleaning pieces through the water outlet to soak the cleaning pieces, thereby improving the utilization rate of water.

[0044] The specific embodiments, structures, features and effects of a self-cleaning device according to the present application are described in detail below in combination with the accompanying drawings and preferred embodiments.

[0045] As shown in FIGS. 3-6, the embodiments of the present application provide a self-cleaning device, which can also be referred to as a cleaning robot, an intelligent cleaning device, a mopping machine, etc., and can move and clean by itself without user control. The self-cleaning device includes a device main body 100 and a cleaning member 200 connected to the device main body 100 and located below the device main body 100 to interfere with the ground. The device main body 100 is provided with a moving mechanism, a cleaning mechanism, a sensing mechanism, etc., a controller for controlling the functional mechanisms, and a power supply for power supply. The device main body 100 further includes a driver for driving the cleaning member 200 to rotate. The device main body 100 moves by the moving mechanism, and the cleaning member 200 follows the device main body 100 to move and clean while being driven to rotate. The device main body 100 can have various shapes, for example, the outer contour of the device main body 100 can be flat, such as a flat circle or a square. The sensing mechanism can include position sensors, attitude sensors, etc., to provide the controller with position information and attitude information of the device main body 100 to guide the operation of the moving mechanism. The cleaning mechanism is a dry cleaning system, which includes a roller brush, a dust box, a fan, etc. The roller brush interferes with the ground, and the garbage is swept to the suction inlet behind the roller brush by rotating. The dust box is located between the fan and the suction inlet, and the garbage is sucked into the dust box by the fan.

[0046] The self-cleaning device further includes a water tank, and the aforementioned cleaning member 200 and the water tank are part of the wet cleaning system of the self-cleaning device. The water tank can store cleaning fluid, such as water, cleaning agent or other liquid used for cleaning. In the following embodiments, water is taken as an example for convenience. The water tank is provided with a water replenishment opening and a water overflow opening, and an external water supply member is used to fill water into the water tank through the water replenishment opening. When the water level is higher than the water overflow opening, or the water pressure in the water tank is higher than the preset pressure, the water will flow out through the water overflow opening. The number of water replenishment openings and water overflow openings of the water tank can be one, two or more.

[0047] The side of the device body 100 opposite the cleaning piece 200 is provided with a water outlet 101. For example, the device body 100 includes a top wall, a bottom wall, and a surrounding wall. The top wall and the bottom wall are correspondingly arranged. The surrounding wall is located between the top wall and the bottom wall and surrounds a periphery. The cleaning piece 200 is located below the bottom wall. The water outlet 101 can be arranged on the bottom wall. After the water flows out of the water outlet 101, the water will drip onto the cleaning piece 200. The water flowing out of the water tank to the water outlet 101 can be achieved in various ways, which will be described in more detail below.

[0048] Each cleaning piece 200 corresponds to at least one water outlet 101. When there are two or more cleaning pieces 200, each cleaning piece 200 corresponds to at least one water outlet 101. For example, each cleaning piece 200 can correspond to only one water outlet 101, or each cleaning piece 200 can correspond to two or more water outlets 101, so as to achieve cleaning of each cleaning piece 200. The correspondence between the cleaning piece 200 and the water outlet 101 means that, during use of the self-cleaning device, the cleaning piece 200 and the water outlet 101 have a corresponding relationship in the vertical direction. Alternatively, during use of the self-cleaning device, when the external water supply joint continuously supplies water to the water tank, the water will flow out of the overflow outlet, and then flow to the water outlet 101 connected to the overflow outlet. The water flowing out of the water outlet 101 will drip or spray onto the cleaning piece 200 under the action of gravity, so as to achieve wetting of the cleaning piece 200, cleaning of the cleaning piece 200 in the base station, and cleaning of the cleaning piece 200. In addition, the water outlet 101 is located above the cleaning piece 200, which can achieve wetting of the cleaning piece 200 from above the cleaning piece 200. In combination with the existing wetting of the cleaning piece 200 from below the cleaning piece 200 in the base station, the problem of insufficient water flow above the cleaning piece 200 and poor cleaning effect can be avoided.

[0049] The shape of the water outlet 101 can be various, such as a circular opening, a square opening, a long strip-shaped opening, or a mesh-shaped opening, which can be arranged according to the shape of the cleaning piece 200 and the water outlet requirement. The cross-sectional area of the water outlet 101 in the direction close to the cleaning piece 200 can be uniform, or the cross-sectional area of the water outlet 101 in the direction close to the cleaning piece 200 can increase, so that the water is sprayed outward in the form of spraying, thereby increasing the spraying area and flow rate of the water outlet, and thereby increasing the cleaning effect. The water outlet 101 can be a vertically extending opening, or the water outlet 101 can be an inclined extension.

[0050] The self-cleaning device and the cleaning system provided in the embodiments of the present application are provided with a water outlet corresponding to the cleaning piece below the device body. When the water tank is filled with water, the excess water will overflow, and then the overflow will flow to the cleaning piece through the water outlet, so as to achieve cleaning of the cleaning piece by using the overflow, to make the cleaning of the cleaning piece more thorough, and to achieve full utilization of the overflow of the water tank.

[0051] In an embodiment, the cleaning member 200 corresponds to one water outlet 101, i.e. one cleaning member 200 corresponds to one water outlet 101, or in other words, one water outlet 101 is arranged above the cleaning member 200. Alternatively, in another embodiment, the cleaning member 200 corresponds to at least two water outlets 101, such as two, four, six or eight water outlets 101. In the aforementioned embodiment in which the cleaning member 200 is a roller brush, four water outlets 101 can be arranged along the length of the roller brush. In the aforementioned embodiment in which the cleaning member 200 is a mop, a plurality of water outlets 101 can be arranged around the rotation axis of the mop, such as six water outlets 101 arranged around the rotation axis of the mop, to provide water to the cleaning member 200 at multiple locations and to achieve uniform cleaning of the cleaning member 200. Alternatively, the water outlets 101 can be arranged according to the position and shape of the brush used to clean the cleaning member 200, so that the water outlets 101 correspond to the position of the brush, to provide water to the cleaning member 200 at the cleaning position and to improve the cleaning effect.

[0052] In an embodiment, the cleaning member 200 comprises a support frame and a wiping member, the support frame is connected to the device body 100, and the wiping member is arranged on the support frame. The support frame is provided with an opening, and the water outlet 101 corresponds to the opening.

[0053] The wiping member can be a mop, and the wiping member is made of a flexible and water-absorbing material, such as non-woven fabric, wool felt or thick woven fabric with loops. The wiping member is used to contact the ground and clean the ground by face-to-face abutment and relative movement. The first end of the support frame is used to connect to the device body 100, and the second end of the support frame is connected to and supports the wiping member. In a more specific embodiment, the support frame comprises a connecting disc and a connecting rod connected to the connecting disc. The connecting disc is a flat disc structure, and is used to connect and support the wiping member to maintain the shape of the wiping member. The connecting disc can be circular, square, triangular, etc. The connecting rod is arranged on the other side of the connecting disc opposite to the wiping member, and is generally perpendicular to the connecting disc. The connecting rod is used to connect to the device body 100. For example, the connecting rod can be magnetically connected, clamped, hung, inserted, etc. to the device body 100. The connecting disc is provided with a plurality of openings, and the wiping member covers at least the openings. The water outlet 101 corresponds to the openings, so that the water overflowing from the water outlet 101 will drip through the openings and fall onto the wiping member, thereby wetting the wiping member and assisting in cleaning the wiping member.

[0054] In an embodiment, the self-cleaning device further comprises a filter member covering the water outlet 101.

[0055] The filter member can be a filter screen, filter cotton, etc., such as PP cotton. The filter member is arranged at the water outlet 101 to reduce impurities in the water from dripping onto the cleaning member 200.

[0056] The water outlet 101 can be directly formed on the bottom plate of the device body 100, or in an embodiment, the self-cleaning device further comprises a water outlet member, which is detachably connected with the device body 100, and the water outlet 101 is arranged on the water outlet member.

[0057] The device body 100 is provided with a mounting hole, and the water outlet member is detachably connected with the device body 100, which can be that the water outlet member is inserted through the mounting hole. The water outlet member can be clamped on the mounting hole, for example, the water outlet member can be made of soft rubber material and can be pressed to deform, and a ring of recesses is arranged on the outer periphery of the water outlet member. By pressing the water outlet member, the water outlet member is inserted through the mounting hole, and after the water outlet member is released, the edge of the mounting hole is clamped into the recess of the water outlet member, thereby fixing the water outlet member. Alternatively, the water outlet member can be magnetically connected, hung, interference fitted, etc. with the device body 100. The water outlet member can have various shapes, such as a columnar shape. The end of the water outlet member close to the cleaning member 200 slightly protrudes from the surface of the device body 100, and the end away from the cleaning member 200 protrudes from the surface of the device body 100 by a certain length, such as 5 mm, 10 mm, etc., which can be used to connect the soft tube between the water tank and the water outlet 101. The water outlet member is detachably connected with the device body 100, so that the water outlet member can be replaced according to the use condition, for example, when the water outlet 101 is blocked, or when it is necessary to adjust the size and shape of the water outlet 101, the water outlet member can be replaced to achieve the adjustment.

[0058] The water tank can be connected to the shell of the device body 100 in various ways and can be arranged at various positions of the device body 100. In an embodiment, the device body 100 comprises a containing space, and the water tank is located in the containing space, and the water outlet 101 is in communication with the containing space.

[0059] The containing space protects the water tank and makes the appearance of the self-cleaning device simple. The water tank can have various shapes, such as irregular shapes to adapt to other functional mechanisms in the containing space. The water outlet 101 is in communication with the containing space, thereby realizing communication with the overflow outlet of the water tank in the containing space.

[0060] In an embodiment, the self-cleaning device further comprises a connecting tube, and the water tank and the water outlet 101 are in communication through the connecting tube. The connecting tube can be a soft tube, such as a rubber tube, and the two ends of the soft tube are respectively in communication with the overflow outlet of the water tank and the water outlet 101, so that the overflow of the water tank flows through the soft tube to the water outlet 101, and then drips onto the cleaning member 200. In an embodiment, a connecting column can be arranged on the device body 100, and the water outlet 101 is formed on the connecting column, and the connecting tube can be sleeved on the connecting column to realize communication with the water outlet 101 and facilitate disassembly and assembly of the connecting tube. In the above-mentioned embodiment in which the self-cleaning device comprises a water outlet member, the water outlet member can serve as the connecting column, and the connecting tube can be sleeved on the water outlet member.

[0061] In another embodiment, the self-cleaning device further comprises a connecting pipe, one end of the connecting pipe is in communication with the water tank, and the other end of the connecting pipe is opposite to the bottom wall of the device body 100, and the water outlet 101 is arranged on the bottom wall. The overflow of the water tank flows to the water outlet 101 through the connecting pipe and the bottom wall. The connecting pipe can still be a hose, such as a rubber pipe. One end of the hose is in communication with the overflow of the water tank, and the other end of the hose extends towards the bottom wall of the device body 100. The other end of the hose can be suspended above the bottom wall or can extend to be in contact with the bottom wall. The overflow of the water tank flows to the bottom wall through the connecting pipe, and then flows to the water outlet 101 through the bottom wall and drips onto the cleaning element 200. In some embodiments, a flow channel can be arranged on the bottom wall to guide the overflow to flow to the water outlet 101. In the embodiment in which the overflow of the water tank has two or more, the number of hoses is consistent with the number of overflows of the water tank, and any overflow is connected to a hose.

[0062] In some other embodiments, the connecting pipe can not be arranged, and a flow channel can be arranged in the side wall and the bottom wall of the device body 100. The water tank is in communication with the water outlet 101 through the flow channel in the device body 100. There can be many other embodiments, which will not be enumerated one by one in this application.

[0063] In one embodiment, the self-cleaning device further comprises a water replenishing connector 300, which is in communication with the water tank and is used to be connected to a water source to replenish water to the water tank.

[0064] A water replenishing port is arranged on the water tank, and the water replenishing port is in communication with the water replenishing connector 300. The communication mode can be that the water replenishing port and the water replenishing connector 300 are connected by a hose, or the water replenishing connector 300 directly docks with the water replenishing port after the water tank is installed. When the device body 100 is docked at the base station, the water supply system of the base station is docked with the water replenishing connector 300, and then indirectly communicates with the water replenishing port of the water tank to supply water to the water tank through the water replenishing port.

[0065] In some other embodiments, the water replenishing connector 300 can not be arranged. For example, when the water tank is connected to the device body 100, the water replenishing port of the water tank is exposed. When the device body 100 is docked at the base station, the water supply system of the base station directly docks with the water replenishing port of the water tank, and then the water supply system directly injects water into the water tank through the water replenishing port.

[0066] On the other hand, the embodiments of the present application also provide a self-cleaning system, which comprises the self-cleaning device according to any one of the above embodiments and a base station (or a device base station).

[0067] The base station is used to dock the cleaning device. The base station can charge, replenish water, clean, collect dust, and the like for the docked cleaning device. The movement mechanism of the cleaning device controlled by the master controller can realize control of the cleaning device to move towards the base station and be docked at the base station, or move out of the base station to perform mobile cleaning work.

[0068] As the base station comprises a parking space for parking the self-cleaning device and a water supply system for supplying water to the water tank of the self-cleaning device when the self-cleaning device is parked in the parking space, as in the foregoing embodiment in which the self-cleaning device comprises the water replenishing connector 300, the water replenishing connector 300 is docked with the water supply system of the base station when the self-cleaning device is parked in the parking space. The base station further comprises a brushing member, which can be fixedly arranged, such as a fixed brush, and the movement brushing of the cleaning member 200 relative to the brush is performed by driving the cleaning member 200 to move. Alternatively, the brushing member is movable, and the cleaning member 200 is not moved, and the brushing of the cleaning member 200 is performed by moving the brushing member.

[0069] The water supply system of the base station continuously supplies water to the water tank, and when the water tank is full of water, the overflow port continuously overflows water, which flows to the cleaning member 200 through the water outlet 101, and the cleaning of the cleaning member 200 is performed in cooperation with the brushing member of the base station, so that the cleaning of the cleaning member 200 is more thorough. The cleaning system comprises the self-cleaning device of any one of the foregoing embodiments and has the advantages of the self-cleaning device of any one of the foregoing embodiments, which will not be repeated here.

[0070] The above describes only specific embodiments of the self-cleaning device provided by the present application, but the protection scope of the present application is not limited thereto, and any person skilled in the art can easily think of changes or replacements within the technical range disclosed by the present application, which should be encompassed in the protection scope of the present application. Therefore, the protection scope of the present application should be subject to the protection scope of the claims.

[0071] Further, the self-cleaning device provided by the foregoing embodiments can be used to implement the following cleaning control method:

[0072] The cleaning control method provided by the present application comprises the following steps, as shown in FIG. 7:

[0073] Step 701: controlling the base station of the device to replenish water to the water tank for a first preset time length or a first preset water amount, and after the water tank is full of water, the water overflows from the overflow port to the cleaning member to wet the cleaning member;

[0074] Step 702: performing first cleaning processing on the wet cleaning member.

[0075] In this embodiment, the base station of the device is controlled to replenish water to the water tank for a first preset time length or a first preset water amount, and after the water tank is full of water, the water overflows from the overflow port and falls on the cleaning member to wet the cleaning member. In response to a cleaning instruction of the cleaning member, the first cleaning processing is performed on the cleaning member wetted by the water overflowing from the overflow port. In the present application, the water overflowing from the overflow port is used to clean the cleaning member, and no additional water is needed, which improves the cleaning efficiency and effectively utilizes the water overflowing from the overflow port, thereby improving the water utilization rate.

[0076] In an embodiment of the present application, the first cleaning process of the cleaning element soaked by the water overflowing from the overflow port comprises: rotating the cleaning element soaked by the water overflowing from the overflow port according to a first duty ratio and a first rotating speed to realize the first cleaning process.

[0077] In this embodiment, the water overflowing from the overflow port of the water tank soaks the cleaning element. During or after the synchronization of the water overflowing from the overflow port of the water tank, the cleaning element partially soaked or completely soaked is controlled to rotate according to a first duty ratio and a first rotating speed to realize the cleaning process of the cleaning element.

[0078] In an embodiment, the value range of the first duty ratio can be 2% to 15%, preferably 5% to 10%, and more preferably 7%; and the value range of the first rotating speed can be 40 r / min to 60 r / min, preferably 45 r / min to 55 r / min, and more preferably 50 r / min. Rotating the cleaning element according to the above duty ratio and / or rotating speed can help to uniformly distribute water in each part of the cleaning element, ensure that the cleaning element can be uniformly wetted, and improve the cleaning effect of the cleaning element.

[0079] In an embodiment of the present application, water is supplied to the water tank for a first preset time period, and the first preset time period is greater than the time period required for the water tank to be filled with water, which can ensure that the water tank can be filled with water. The part of the first preset time period that exceeds the time period required for the water tank to be filled with water is the water overflowing time period of the overflow port. During the water overflowing time period of the overflow port, the water overflowing from the overflow port flows to the cleaning element to partially or completely soak the cleaning element. In the embodiment of the present application, the water overflowing from the overflow port of the water tank soaks the cleaning element, thereby performing the subsequent cleaning operation of the cleaning element, which can effectively utilize the water overflowing from the overflow port and improve the utilization rate of water.

[0080] In an embodiment, the determination of the first preset time period can be based on the remaining water amount of the water tank, the volume of the water tank, and the water supply speed of the device base station to the water tank, and the device base station is used for parking the self-cleaning device. In actual application, the value range of the first preset time period can be set to 25 s to 45 s, preferably 30 s to 40 s, and more preferably 35 s. By setting the value of the first preset time period, the water tank can be ensured to be filled with water by having a suitable time period for water supply.

[0081] In an embodiment of the present application, before or at the same time as controlling the device base station to supply water to the water tank for a first preset time period or a first preset water amount, the method further comprises: controlling the device base station to supply water to the cleaning element for a second preset time period or a second preset water amount.

[0082] In this embodiment, before the cleaning piece is cleaned by the water overflowing from the overflow opening of the water tank, the device base station controls the water outlet to the cleaning piece for a second preset time length or a second preset water volume to soak the cleaning piece, for example, the device base station sprays water to the cleaning piece through the water outlet pipeline, and then the cleaning piece is soaked by the water overflowing from the overflow opening, so that the cleaning piece is fully soaked and the cleaning effect is improved.

[0083] In one embodiment, the second preset time length ranges from 5s to 25s, preferably from 10s to 20s, and more preferably 15s. By setting the value of the second preset time length, the cleaning piece is soaked for an appropriate time, which can ensure the soaking effect of the cleaning piece.

[0084] In one embodiment of the present application, the method further comprises: before, at the same time as, during or after the water outlet, controlling the cleaning piece to rotate at a second duty cycle and a second rotating speed, the second duty cycle being greater than the first duty cycle, and the second rotating speed being greater than the first rotating speed.

[0085] In this embodiment, before, at the same time as, during or after the water outlet to the cleaning piece for a second preset time length, the cleaning piece is controlled to rotate at a second duty cycle and a second rotating speed. In one embodiment, the second duty cycle is greater than the first duty cycle, and the value of the second duty cycle can range from 15% to 35%, preferably from 20% to 30%, and more preferably 25%; the second rotating speed is greater than the first rotating speed, and the value of the second rotating speed can range from 90r / min to 110r / min, preferably from 95r / min to 105r / min, and more preferably 100r / min.

[0086] In the embodiments of the present application, before the first cleaning treatment of the cleaning piece, the cleaning piece is controlled to rotate at a larger duty cycle and a faster rotating speed, which helps to evenly distribute water to all parts of the cleaning piece, ensures that the cleaning piece is fully soaked, and improves the cleaning effect of the cleaning piece.

[0087] It is worth noting that the process of controlling the cleaning piece to rotate at a second duty cycle and a second rotating speed is also a third cleaning treatment of the cleaning piece, which improves the cleaning effect of the cleaning piece.

[0088] In one embodiment of the present application, before or after the first cleaning treatment of the soaked cleaning piece, the method further comprises: controlling the device base station to outlet water to the cleaning piece for a third preset time length or a third preset water volume, and performing a second cleaning treatment on the cleaning piece.

[0089] In this embodiment, after the cleaning treatment of the soaked cleaning piece, the device base station can continue to outlet water to the cleaning piece for a third preset time length or a third preset water volume to soak the cleaning piece, and then perform a second cleaning treatment on the cleaning piece, i.e., a soaking wash.

[0090] The second cleaning treatment can be performed before or after the first cleaning treatment, and the cleaning effect of the cleaning piece can be improved through at least two cleaning treatments.

[0091] In an embodiment of the present application, the second cleaning treatment of the cleaning piece comprises: controlling the cleaning piece to rotate at a third duty ratio and a third rotating speed before, simultaneously with, in or after water output, to realize the second cleaning treatment, the third duty ratio being greater than the first duty ratio, and the third rotating speed being greater than the first rotating speed.

[0092] In this embodiment, the cleaning piece is controlled to rotate at a third duty ratio and a third rotating speed before, simultaneously with, in or after the third preset time length of water output to the cleaning piece, the third duty ratio being greater than the first duty ratio and the second duty ratio, and the third rotating speed being greater than the first rotating speed and the second rotating speed. In an embodiment, the third preset time length can be in the range of 35s to 55s, preferably 40s to 50s, and more preferably 45s; the third duty ratio is greater than the first duty ratio, and the value of the third duty ratio is in the range of 25% to 45%, preferably 30% to 40%, and more preferably 35%; the third rotating speed is greater than the first rotating speed, and the value of the third rotating speed is in the range of 100r / min to 120r / min, preferably 105r / min to 115r / min, and more preferably 110r / min.

[0093] In an embodiment of the present application, after the first cleaning treatment of the cleaning piece, the second cleaning treatment of the cleaning piece is performed at a larger duty ratio and a faster rotating speed, so that the water outlet of the device base station and the water outlet of the overflow port can be used to clean the cleaning piece together, and the cleaning effect of the cleaning piece can be improved.

[0094] In an embodiment of the present application, whether to perform the second cleaning treatment on the cleaning piece can be determined according to the cleanliness of the cleaning piece after the first cleaning treatment. If the cleaning piece is relatively clean after the first cleaning treatment, the second cleaning treatment is not needed, the cleaning time is reduced, and the cleaning efficiency is improved. If the cleaning piece is still dirty after the first cleaning treatment, the second cleaning treatment is needed, and the cleaning effect is improved.

[0095] In an embodiment of the present application, the cleanliness of the cleaning piece after the first cleaning treatment can be determined by the dirtiness of the sewage discharged after the first cleaning treatment. That is, the device base station is controlled to output water to the cleaning piece for a third preset time length or a third preset water amount, and the second cleaning treatment of the cleaning piece comprises: obtaining the dirtiness of the sewage discharged after the first cleaning treatment; and if the dirtiness is greater than or equal to a preset threshold, the device base station is controlled to output water to the cleaning piece for a third preset time length or a third preset water amount, and the second cleaning treatment of the cleaning piece is performed.

[0096] In the embodiment, the cleaning sewage is discharged after the first cleaning treatment, and the dirt degree of the discharged cleaning sewage is detected. When the dirt degree is greater than or equal to a preset threshold, it indicates that the cleaning piece is still in a dirty state, and then the device base station is controlled to output water to the cleaning piece for a third preset time length, and the second cleaning treatment is performed on the cleaning piece. When the dirt degree is less than the preset threshold, it indicates that the cleaning piece is relatively clean, and the second cleaning treatment is not needed, so that the cleaning time is reduced and the cleaning efficiency is improved.

[0097] The embodiment of the application can accurately determine the cleanliness of the cleaning piece by detecting the dirt degree of the cleaning sewage discharged after the first cleaning treatment, and continue to perform the second cleaning treatment when the cleaning piece is still in a dirty state, so that the cleaning effect of the cleaning piece is improved.

[0098] In an embodiment of the application, the method further includes: obtaining a cleaning piece cleaning mode set by a user; if the cleaning piece cleaning mode is a first cleaning mode, performing the first cleaning treatment and the second cleaning treatment on the cleaning piece; and if the cleaning piece cleaning mode is a second cleaning mode, performing the first cleaning treatment on the cleaning piece.

[0099] In the embodiment, the first cleaning treatment is performed on the cleaning piece alone or the first cleaning treatment and the second cleaning treatment are performed on the cleaning piece according to the cleaning needs of the user, the cleaning mode of the cleaning piece includes the first cleaning mode (i.e., a mixed cleaning mode) and the second cleaning mode (i.e., a single cleaning mode), the first cleaning mode refers to cleaning by cooperation of the first cleaning treatment and the second cleaning treatment, and the second cleaning mode refers to cleaning by the first cleaning treatment.

[0100] The cleaning mode of the cleaning piece set by the user is obtained, when the cleaning mode of the cleaning piece set by the user is the first cleaning mode, the first cleaning treatment is performed first and then the second cleaning treatment is performed, or the second cleaning treatment is performed first and then the first cleaning treatment is performed, so as to meet the demand of the user for a higher cleanliness of the cleaning piece. When the cleaning mode of the cleaning piece set by the user is the second cleaning mode, only the first cleaning treatment is performed, so as to meet the demand of the user for quick cleaning of the cleaning piece.

[0101] The embodiment of the application can select the cleaning mode of the cleaning piece according to the needs of the user, so that the cleaning flexibility of the cleaning piece is improved, and the cleaning needs of the user for the cleaning piece are met.

[0102] In an embodiment of the application, the method further includes: after the cleaning is completed, controlling the cleaning piece to rotate at a fourth duty ratio and a fourth rotating speed to spin dry the cleaning piece, the fourth duty ratio is greater than the first duty ratio, and the fourth rotating speed is greater than the first rotating speed.

[0103] In the embodiment, after the first cleaning process is completed, or after the second cleaning process is completed, the cleaning member is controlled to rotate at a fourth duty ratio and a fourth rotating speed to spin off the excess water of the cleaning member. The fourth duty ratio is greater than the first duty ratio, the second duty ratio and the third duty ratio, and the fourth rotating speed is greater than the first rotating speed, the second rotating speed and the third rotating speed.

[0104] In one embodiment, the value range of the fourth duty ratio can be 45% to 50%, and the value range of the fourth rotating speed can be 120 r / min to 150 r / min. The cleaning member is controlled to rotate at a higher duty ratio and a higher rotating speed to ensure the spin-drying effect and efficiency of the cleaning member.

[0105] In one embodiment of the present application, the self-cleaning device returns to the device base station when the cleaning member needs to be cleaned. A cleaning control method of the embodiment of the present application includes:

[0106] (1) The device base station discharges water for 15 s to wet the cleaning member, and the cleaning member is controlled to rotate at a duty ratio of 25% and a rotating speed of 100 r / min.

[0107] (2) The device base station supplies water to the water tank for 35 s, and after the water tank is filled with water, the water overflowing from the overflow port of the water tank flows onto the cleaning member, and the cleaning member is controlled to rotate at a duty ratio of 7% and a rotating speed of 50 r / min.

[0108] (3) The device base station discharges water for 45 s (which can be 3 intervals of 15 s), and starts to soak and wash the cleaning member. At this time, the cleaning member is controlled to rotate at a duty ratio of 35% and a rotating speed of 110 r / min.

[0109] (4) The cleaning member is controlled to rotate at a duty ratio of 45% to 50% and a rotating speed of 120 r / min to 150 r / min to achieve spin-drying of the cleaning member.

[0110] In the embodiment of the present application, the overflow port of the water tank corresponds to the cleaning member, and the overflowing water falls onto the cleaning member to achieve cleaning of the cleaning member, thereby improving the utilization rate of water. In addition, the device base station discharges water and the overflow port discharges water to cooperatively clean the cleaning member, thereby improving the cleaning effect of the cleaning member.

[0111] Further, as a specific implementation of the above cleaning control method, the embodiment of the present application provides a cleaning control device. The self-cleaning device includes a cleaning member and a water tank provided with an overflow port, and water overflowing from the overflow port can contact the cleaning member. As shown in FIG. 8, the cleaning control device 800 includes a water supply control module 801 and a cleaning control module 802.

[0112] The water supply control module 801 is configured to control the device base station to supply water to the water tank for a first preset time or a first preset water amount. After the water tank is filled with water, the water overflowing from the overflow port falls onto the cleaning member to soak the cleaning member, and the device base station is used to dock the self-cleaning device.

[0113] The washing control module 802 is configured to perform first cleaning processing on the cleaning element soaked by the water overflowing from the overflow port.

[0114] In this embodiment, the control device base station supplies water to the water tank for a first preset time length or a first preset water volume. After the water tank is filled with water, the water overflows from the overflow port and falls on the cleaning element to soak the cleaning element. In response to the cleaning element cleaning instruction, the first cleaning processing is performed on the cleaning element soaked by the water overflowing from the overflow port. In the embodiment of the present application, the water overflowing from the overflow port of the water tank is used to clean the cleaning element, without the need for additional water, which improves the cleaning efficiency and effectively utilizes the water overflowing from the overflow port, thereby improving the water utilization rate.

[0115] Further, the washing control module 802 is specifically configured to control the cleaning element soaked by the water overflowing from the overflow port to rotate at a first duty ratio and a first rotating speed to achieve the first cleaning processing.

[0116] The value range of the first duty ratio is 2% to 15%, and the value range of the first rotating speed is 40 r / min to 60 r / min.

[0117] Further, the value range of the first preset time length is 25 s to 45 s.

[0118] Further, the device further includes a water outlet control module configured to control the control device base station to supply water to the cleaning element for a second preset time length or a second preset water volume before or at the same time as the control device base station supplies water to the water tank for the first preset time length or the first preset water volume. The value range of the second preset time length is 5 s to 25 s.

[0119] Further, the washing control module 802 is further configured to control the cleaning element to rotate at a second duty ratio and a second rotating speed before, at the same time as, during or after the water outlet, the second duty ratio being greater than the first duty ratio, and the second rotating speed being greater than the first rotating speed.

[0120] The value range of the second duty ratio is 15% to 35%, and the value range of the second rotating speed is 90 r / min to 110 r / min.

[0121] Further, the water outlet control module is further configured to control the control device base station to supply water to the cleaning element for a third preset time length or a third preset water volume after the first cleaning processing is performed on the cleaning element soaked by the water overflowing from the overflow port, and the washing control module 401 is further configured to perform second cleaning processing on the cleaning element.

[0122] Further, the cleaning control module 802 is specifically configured to control the cleaning member to rotate according to a third duty ratio and a third rotating speed before, synchronously with, during or after water output, so as to implement second cleaning processing. The third duty ratio is greater than the first duty ratio, and the third rotating speed is greater than the first rotating speed.

[0123] The third preset time length is in a range of 35s to 55s, the third duty ratio is in a range of 25% to 45%, and the third rotating speed is in a range of 100r / min to 120r / min.

[0124] Further, the apparatus further includes a first acquisition module configured to acquire a dirt degree of sewage discharged after the first cleaning processing, and a water output control module configured to control the device base station to output water to the cleaning member for a third preset time length or a third preset water volume if the dirt degree is greater than or equal to a preset threshold.

[0125] Further, the apparatus further includes a second acquisition module configured to acquire a cleaning member cleaning mode set by a user, and a cleaning control module 802 configured to sequentially implement the first cleaning processing and the second cleaning processing on the cleaning member if the cleaning member cleaning mode is a first cleaning mode, and implement the first cleaning processing on the cleaning member if the cleaning member cleaning mode is a second cleaning mode.

[0126] Further, the cleaning control module 802 is further configured to control the cleaning member to rotate according to a fourth duty ratio and a fourth rotating speed after the cleaning is completed, so as to spin dry the cleaning member. The fourth duty ratio is greater than the first duty ratio, and the fourth rotating speed is greater than the first rotating speed.

[0127] The fourth duty ratio is in a range of 45% to 50%, and the fourth rotating speed is in a range of 120r / min to 150r / min.

[0128] The cleaning control apparatus in the embodiments of the present application can be a self-cleaning device, or a component in the self-cleaning device, for example, an integrated circuit or a chip, or an apparatus including the self-cleaning device. The cleaning control apparatus provided in the embodiments of the present application can implement each process implemented by the cleaning control method embodiments of FIG. 1 and FIG. 7, and thus details are not repeated here.

[0129] The embodiments of the present application further provide a self-cleaning system including the cleaning control apparatus provided in the above embodiments and a device base station.

[0130] The device base station is configured to dock the self-cleaning device in the cleaning control apparatus.

[0131] The embodiments of the present application further provide a self-cleaning system including a self-cleaning device and a device base station. The device base station is configured to dock the self-cleaning device. The self-cleaning device includes:

[0132] cleaning piece;

[0133] a water tank, the water tank being provided with a water overflow opening, water overflowing from the water overflow opening being capable of contacting the cleaning piece;

[0134] a memory, the memory storing a program or instructions;

[0135] a processor, the processor implementing each step of the above cleaning control method embodiments when executing the program or instructions, and achieving the same technical effects, and thus, details are not repeated here.

[0136] The memory can be used to store software programs and various data. The memory can mainly include a first storage area storing programs or instructions and a second storage area storing data, wherein the first storage area can store an operating system, application programs or instructions required by at least one function (such as a sound playing function, an image playing function, etc.), and the like. In addition, the memory can include a volatile memory or a non-volatile memory, or the memory can include both volatile and non-volatile memories. The non-volatile memory can be a Read-Only Memory (ROM), a Programmable ROM (PROM), an Erasable PROM (EPROM), an Electrically EPROM (EEPROM), or a flash memory. The volatile memory can be a Random Access Memory (RAM), a Static RAM (SRAM), a Dynamic RAM (DRAM), a Synchronous DRAM (SDRAM), a Double Data Rate SDRAM (DDR SDRAM), an Enhanced SDRAM (ESDRAM), a Synch link DRAM (SLDRAM), and a Direct Rambus RAM (DRRAM). The memory in the embodiments of the present application includes but is not limited to these and any other suitable types of memories.

[0137] The processor can include one or more processing units; optionally, the processor integrates an application processor and a modem processor, wherein the application processor mainly processes operations related to an operating system, a user interface, and an application program, and the modem processor mainly processes a wireless communication signal, such as a baseband processor. It can be understood that the above-mentioned modem processor can also not be integrated into the processor.

[0138] The embodiment of the present application further provides a readable storage medium, and the readable storage medium stores a program or instructions, the program or instructions are executed by a processor to realize the processes of the above-mentioned cleaning control method embodiments, and the same technical effects can be achieved, to avoid repetition, which will not be described here.

[0139] The embodiment of the present application further provides a chip, and the chip includes a processor and a communication interface, the communication interface is coupled with the processor, and the processor is used to run a program or instructions to realize the processes of the above-mentioned cleaning control method embodiments, and the same technical effects can be achieved, to avoid repetition, which will not be described here.

[0140] It should be understood that the chip mentioned in the embodiment of the present application can also be referred to as a system-level chip, a system chip, a chip system, or a system-on-chip, etc.

[0141] The embodiment of the present application further provides a computer program product, and the program product is stored in a storage medium, the program product is executed by at least one processor to realize the processes of the above-mentioned cleaning control method embodiments, and the same technical effects can be achieved, to avoid repetition, which will not be described here.

[0142] It should be noted that in this document, the terms "comprising", "including", or any other variant thereof are intended to cover non-exclusive inclusion, so that processes, methods, articles, or devices including a series of elements not only include those elements, but also include other elements not explicitly listed, or further include elements inherent to such processes, methods, articles, or devices. Without more limitations, the element defined by the statement "including a" does not exclude the presence of additional identical elements in the process, method, article, or device including the element. In addition, it should be pointed out that the scope of the methods and devices in the embodiments of the present application is not limited to the order of performing the functions as shown or discussed, and can also include performing the functions in a substantially simultaneous manner or in a reverse order, for example, the described method can be performed in an order different from the described order, and various steps can be added, omitted, or combined. In addition, the features described with reference to certain examples can be combined in other examples.

[0143] The embodiments of the present application are described above with reference to the accompanying drawings, but the present application is not limited to the specific embodiments described above, and the specific embodiments described above are merely illustrative rather than restrictive, and a person of ordinary skill in the art can make many forms under the inspiration of the present application without departing from the purpose of the present application and the scope protected by the claims.

Claims

1. A self-cleaning device, characterized in that, The self-cleaning device includes a device body (100), a cleaning component (200), and a water tank with an overflow outlet. The device body (100) has an outlet (101) on the side opposite to the cleaning component (200). The outlet (101) is used so that water overflowing from the overflow outlet of the water tank can come into contact with the cleaning component (200) to wet the cleaning component (200).

2. The self-cleaning device according to claim 1, characterized in that, The self-cleaning device also includes: The cleaning component (200) is connected to the device body (100), and the device body (100) is used to drive the cleaning component (200) to move and clean. Each cleaning component (200) corresponds to at least one of the water outlets (101).

3. The self-cleaning device according to claim 2, characterized in that, The cleaning component (200) corresponds one-to-one with the water outlet (101). Alternatively, the cleaning component (200) may correspond to at least two of the water outlets (101).

4. The self-cleaning device according to claim 2, characterized in that, The cleaning component (200) corresponds to a plurality of water outlets (101), and the plurality of water outlets (101) are arranged around the rotating shaft of the cleaning component (200).

5. The self-cleaning device according to claim 2, characterized in that, The cleaning component (200) includes a support frame and a mopping component. The support frame is connected to the main body of the equipment (100). The mopping component is disposed on the support frame. The support frame has a perforation. The water outlet (101) corresponds to the perforation.

6. The self-cleaning device according to claim 2, characterized in that, The self-cleaning device also includes: A filter element that covers the outlet (101).

7. The self-cleaning device according to claim 2, characterized in that, The self-cleaning device also includes: The water outlet is detachably connected to the main body of the equipment (100), and the water outlet (101) is provided on the water outlet.

8. The self-cleaning device according to claim 2, characterized in that, The main body of the equipment (100) includes a receiving space, the water tank is located in the receiving space, and the water outlet (101) is connected to the receiving space.

9. The self-cleaning device according to claim 2, characterized in that, The self-cleaning device also includes: The water tank and the water outlet (101) are connected by a connecting pipe.

10. The self-cleaning device according to claim 9, characterized in that, The self-cleaning device also includes: A connecting pipe is provided, one end of which is connected to the water tank and the other end of which is opposite to the bottom wall of the main body of the equipment (100). The water outlet (101) is located on the bottom wall. The overflow water from the water tank flows to the water outlet (101) through the connecting pipe and the bottom wall.

11. The self-cleaning device according to claim 1, characterized in that, The self-cleaning device also includes: A water supply connector (300) is connected to the water tank and is used to connect to a water source to supply water to the water tank.

12. A cleaning control method, characterized in that, The self-cleaning device includes a cleaning component and a water tank with an overflow outlet, wherein water overflowing from the overflow outlet can contact the cleaning component; the method includes: The control equipment base station replenishes water to the water tank for a first preset time or a first preset amount of water. After the water tank is full, water overflows from the overflow port to the cleaning component, wetting the cleaning component. The equipment base station is used to dock the self-cleaning device. The already wetted cleaning parts undergo a first cleaning process.

13. The method according to claim 12, characterized in that, The first cleaning process for the wetted cleaning component includes: The cleaning component, wetted by water overflowing from the overflow outlet, rotates according to a first duty cycle and a first rotation speed to achieve a first cleaning process.

14. The method according to claim 12, characterized in that, Before or simultaneously with the control device base station replenishing water to the water tank for a first preset time period or a first preset water volume, the method further includes: The device base station is controlled to supply water to the cleaning component for a second preset duration or a second preset amount of water.

15. The method according to claim 14, characterized in that, The method further includes: Before, during, or after water discharge, the cleaning component is controlled to rotate according to a second duty cycle and a second rotation speed, wherein the second duty cycle is greater than the first duty cycle and the second rotation speed is greater than the first rotation speed.

16. The method according to claim 12, characterized in that, After performing the first cleaning treatment on the wetted cleaning component, the method further includes: The device base station is controlled to discharge water to the cleaning component for a third preset time or a third preset amount of water, and the cleaning component is subjected to a second cleaning process.

17. The method according to claim 16, characterized in that, The second cleaning process for the cleaning component includes: Before, during, or after water discharge, the cleaning component is controlled to rotate according to a third duty cycle and a third rotation speed to achieve a second cleaning process. The third duty cycle is greater than the first duty cycle, and the third rotation speed is greater than the first rotation speed.

18. The method according to claim 16, characterized in that, The control of the device base station to supply water to the cleaning component for a third preset time or a third preset water volume, and to perform a second cleaning process on the cleaning component, includes: Obtain the degree of dirtiness of the wastewater discharged after the first cleaning treatment; If the degree of dirtiness is greater than or equal to a preset threshold, the device base station is controlled to supply water to the cleaning component for a third preset duration or a third preset amount of water, and the cleaning component is subjected to a second cleaning process.

19. A cleaning control device, characterized in that, The self-cleaning device includes a cleaning component and a water tank with an overflow outlet, wherein water overflowing from the overflow outlet can contact the cleaning component. The device includes: The water replenishment control module is used to control the equipment base station to replenish water to the water tank for a first preset time or a first preset amount of water. After the water tank is full, water overflows from the overflow port to the cleaning component, wetting the cleaning component. The equipment base station is used to dock the self-cleaning device. The cleaning control module is used to perform a first cleaning process on the cleaning component that has been wetted by water overflowing from the overflow outlet.

20. A self-cleaning system, characterized in that, Includes the self-cleaning device as described in any one of claims 1 to 11, and a device base station; The equipment base station is used to dock the self-cleaning equipment.

21. A self-cleaning system, characterized in that, It includes a self-cleaning device and a device base station, wherein the device base station is used to dock the self-cleaning device; the self-cleaning device includes: Cleaning parts; A water tank, wherein the water tank is provided with an overflow outlet, and water overflowing from the overflow outlet can come into contact with the cleaning component; A memory that stores programs or instructions; A processor that, when executing the program or instructions, implements the steps of the cleaning control method as described in any one of claims 12 to 18.

22. A readable storage medium having a program or instructions stored thereon, characterized in that, When the program or instructions are executed by the processor, they implement the steps of the cleaning control method as described in any one of claims 12 to 18.

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