Organic material and method for etching si-containing member

Abstract

The present invention provides an organic material that makes it possible to further increase the reactivity of hydrogen fluoride gas to an Si-containing member. Provided is an organic material that exhibits crosslinkability, wherein, when crosslinked into a crosslinked body, the organic material exhibits an effect of increasing the reactivity of hydrogen fluoride gas to an Si-containing member, where the Si-containing member contains silicon (Si) and oxygen (O) and / or nitrogen (N), said organic material has an organic molecule, and the value of a distance dHF between a hydrogen atom and a fluorine atom in a hydrogen fluoride molecule when an adsorption structure is hypothesized, calculated using the 6-31+G(d) basis function and the B3LYP exchange-correlation functional, of said organic molecule is not less than 0.965 (Å).

Description

Method for etching organic materials and Si-containing components

[0001] The present invention relates to a method for etching organic-based materials and Si-containing components.

[0002] Various methods have been proposed and put into practical use as processing techniques capable of forming a recess structure on the surface of a Si-containing member such as quartz glass.

[0003] For example, Patent Document 1 describes that a quartz glass substrate can be locally etched by placing a specific organic compound on a portion of the surface of the quartz glass substrate and exposing the quartz glass substrate to hydrogen fluoride gas.

[0004] WO 2023 / 119899

[0005] The method of Patent Document 1 makes it possible to form minute features on the surface of a quartz glass substrate.

[0006] However, the etching rate of the method of Patent Document 1 for a quartz glass substrate is not sufficiently high, and therefore, a method capable of etching a quartz glass substrate more quickly is desired.

[0007] The present invention has been made in view of the above background, and an object of the present invention is to provide an organic material that can further enhance the reactivity of hydrogen fluoride gas with Si-containing members.

[0008] The present invention provides an organic material exhibiting crosslinkability, wherein the crosslinked product exhibits the effect of increasing the reactivity of hydrogen fluoride gas with a Si-containing member, wherein the Si-containing member contains silicon (Si) and oxygen (O) and / or nitrogen (N), and the organic material has organic molecules, wherein the organic molecules have a distance dHF between a hydrogen atom and a fluorine atom in the hydrogen fluoride molecule, calculated using a 6-31+G(d) basis set and a B3LYP correlation-exchange functional, of 0.965 (Å) or greater when an adsorption structure is assumed.

[0009] The present invention can provide an organic material that can further enhance the reactivity of hydrogen fluoride gas with a Si-containing member.

[0010] 1 is a diagram showing an optimized three-dimensional structure of molecule X obtained by the ETKDG method and atoms with negative Gasteiger charges. 2 is a diagram showing a three-dimensional structure of a structure obtained by the ETKDG method in which a hydrogen atom is added to molecule X. 3 is a diagram showing a schematic diagram of a complex compound formed by adding a fluorine atom to molecule Y. 4 is a diagram showing a structure of molecule Z optimized by DFT calculation. 5 is a graph showing the relationship between the dHF of an organic molecule contained in an organic material according to one embodiment of the present invention and the hydrogen fluoride gas etching rate of quartz glass having a crosslinked body of such an organic material disposed thereon. 6 is a diagram showing a schematic example of a flow when etching a Si-containing member using an organic material according to one embodiment of the present invention. 7 is a graph showing the relationship between the dHF of an organic molecule obtained from the evaluation results of various samples and the etching rate of a quartz glass substrate.

[0011] An embodiment of the present invention will be described below.

[0012] As described above, the etching rate for a quartz glass substrate using the method described in Patent Document 1 is not sufficiently high. Therefore, the inventors of the present application have been conducting extensive research and development into a method that can etch Si-containing members more quickly.

[0013] The present inventors have found that some crosslinkable organic materials have the function of significantly increasing the reactivity of hydrogen fluoride gas with Si-containing components. In particular, they have found that when an organic material containing organic molecules having a "dHF" value of 0.965 (Å) or more is crosslinked and the Si-containing component provided with such a crosslinked material is etched with hydrogen fluoride gas, a significantly high etching rate can be obtained.

[0014] Therefore, one embodiment of the present invention provides an organic material exhibiting crosslinkability, wherein the crosslinked body exhibits the effect of increasing the reactivity of hydrogen fluoride gas with a Si-containing member, wherein the Si-containing member contains silicon (Si) and oxygen (O) and / or nitrogen (N), and the organic material has organic molecules, in which the value of the distance dHF between the hydrogen atom and the fluorine atom in the hydrogen fluoride molecule when assuming an adsorption structure, calculated using 6-31+G(d) basis functions and a B3LYP correlation-exchange functional, is 0.965 (Å) or greater.

[0015] As will be described later, when an etching process of a Si-containing member using hydrogen fluoride gas is performed using an organic material according to one embodiment of the present invention, the Si-containing member can be etched at a significantly higher etching rate.

[0016] Here, the dHF of an organic molecule is calculated by the following procedure.

[0017] First, structural information of a target organic molecule (hereinafter referred to as "molecule X") is obtained from SMILES using the RDKit library, and a three-dimensional structure is generated by the ETKDG method.

[0018] Next, the Gasteiger charge is calculated to determine atoms with negative Gasteiger charge (hereinafter referred to as site atoms P).

[0019] As an example, Figure 1 shows a schematic diagram of the optimized structure of molecule X obtained by the above method and the site atom P defined for molecule X. In this example, molecule X is a primary amine whose general formula is represented by formula (10) described below, and there is only one site atom P. In Figure 1, the large gray spheres represent carbon atoms, the black spheres represent nitrogen atoms, and the smallest white spheres represent hydrogen atoms.

[0020] Next, a conjugate acid compound (hereinafter referred to as "compound Y") is formed by adding an H atom to molecule X according to the following procedure, and the three-dimensional coordinates of compound Y are generated.

[0021] First, using the RDKit library, add 1 to the formal charge of the site atom P of molecule X.

[0022] Next, a hydrogen atom H is bonded to the site atom P of the molecule X, and a three-dimensional structure is generated by the ETKDG method.

[0023] 2 shows a schematic representation of the three-dimensional structure of compound Y, the site atom P, and the added hydrogen atom H. The three-dimensional structure of compound Y thus generated is converted into an sdf file to obtain three-dimensional coordinates.

[0024] Next, a fluorine atom is added to compound Y to form a composite compound (hereinafter referred to as "compound Z"), and the three-dimensional coordinates of compound Z are generated in the following manner.

[0025] First, a new fluorine atom F is placed at a position 1.0 Å away from the added hydrogen atom H, and a three-dimensional structure is generated by the ETKDG method.

[0026] In this case, the site atom P, the hydrogen atom H, and the fluorine atom F must be arranged on a straight line.

[0027] 3 shows a schematic representation of the three-dimensional structure of compound Z, site atoms P, hydrogen atoms H, and fluorine atoms F. The dashed arrows indicate the lines they share.

[0028] The three-dimensional structure of compound Z thus generated is used as an initial structure, and structural optimization is performed by DFT calculation. Figure 4 shows the structure of compound Z structurally optimized by DFT calculation.

[0029] From the obtained optimized structure, the distance between the added hydrogen atom H and the fluorine atom F is calculated and determined as dHF.

[0030] When the target compound has a plurality of site atoms, the above procedure is repeated with each atom as a site atom, and the bond length of the largest hydrogen fluoride molecule is determined to be dHF.

[0031] All DFT calculations were performed using the gaussian16 package, and geometry optimization was performed using the DFT method, 6-31+G(d) basis set, B3LYP correlation-exchange functional, default spin, charge ±0, and singlet state. For atomic species with atomic numbers greater than Kr, LanL2DZ basis set was used.

[0032] When the target organic compound has a plurality of site atoms, this procedure is repeated for each site atom, and the largest distance between the hydrogen atom and the fluorine atom is taken as dHF.

[0033] When this molecular calculation is applied to polymer molecules having a repeating structure or molecules with a large molecular weight, it is possible to perform calculations by decomposing the molecules.

[0034] The site of decomposition must be a carbon atom 12 atoms or more away from the atom on which HF is adsorbed, must not be an atom forming a ring with the atom on which HF is adsorbed, and must be a position 12 atoms or more away from the aromatic ring containing the atom on which HF is adsorbed. The cleaved carbon atom is terminated with hydrogen.

[0035] In addition to decomposing the polymer molecules and calculating, it is also possible to estimate the dHF by extracting the repeating structure, and the dHF values ​​of the repeating structure alone and its multimer are in good agreement.

[0036] When performing decomposition and calculations, it is desirable to perform the calculation with a number of atoms other than hydrogen in the range of 15 to 100. If the number of atoms is too small, the necessary intramolecular interactions cannot be reflected, while if the number of atoms is too large, the calculation does not converge. Whether the intramolecular interactions are sufficiently reflected can be evaluated by checking the change in the dHF value when the decomposition point is changed, and if ΔdHF = ±0.002 or less, it can be said that a structure sufficient for evaluating dHF has been extracted.

[0037] Although the location of decomposition is not specified, it is desirable to cleave at the methylene chain or the bond between aromatic rings.

[0038] The organic molecules contained in the organic material according to one embodiment of the present invention are characterized in that the dHF obtained by such calculation is 0.965 Å or more.

[0039] Here, the reason why the reactivity between the Si-containing member and hydrogen fluoride gas increases when an organic material containing organic molecules with dHF of 0.965 (Å) or more is used is considered to be as follows.

[0040] That is, while ordinary organic materials have a weak interaction with HF, when an organic material with a large dHF is used, electrons are donated from the organic material to the antibonding orbital of HF, increasing the H-F bond length. This increases the basicity of F, which in turn increases its nucleophilicity toward nearby Si atoms, which is expected to increase reactivity.

[0041] Figure 5 shows the hydrogen fluoride gas etching rate of quartz glass substrates with various crosslinked organic materials. In Figure 5, the horizontal axis represents dHF, an organic molecule contained in the organic material, and the vertical axis represents the etching rate (expressed as a natural logarithm) of the quartz glass substrate.

[0042] FIG. 5 shows the results obtained from an experiment in which an organic material containing various organic molecules with different dHF values ​​was applied to the surface of a quartz glass substrate, the organic material was crosslinked, and then the substrate was heated to 250° C. and exposed to hydrogen fluoride gas.

[0043] 5, it can be seen that the higher the dHF of the organic molecules contained in the organic material, the higher the etching rate of the silica glass tends to be. In particular, when the dHF of the organic molecules is 0.965 or more, the etching rate of the silica glass is significantly higher.

[0044] In this way, when a crosslinked body obtained by crosslinking the organic material according to one embodiment of the present invention is placed on a Si-containing member and the Si-containing member is etched with hydrogen fluoride gas, the Si-containing member can be etched more quickly.

[0045] Whether or not a target organic material has the "effect of increasing the reactivity of hydrogen fluoride gas with respect to a Si-containing member" can be confirmed by comparing the etching rate of the Si-containing member with hydrogen fluoride gas at 250°C when a crosslinked body of the target organic material is placed on the surface of the Si-containing member and when it is not placed on the surface.

[0046] In other words, if a higher etching rate is observed when a crosslinked organic material is provided than when it is not provided, it can be said that such an organic material has the "function of increasing reactivity" with respect to the Si-containing component.

[0047] The Si-containing member to which the organic material according to the embodiment of the present invention is applied during etching contains silicon (Si), oxygen (O) and / or nitrogen (N). For example, the Si-containing member may be SiO ｘ or SiN ｙ It may contain SiO ｘ The x in the formula is a number that satisfies 0<x, and preferably 1.2≦x≦2. ｙ The y in the formula is a number satisfying 0<y, and preferably 0.8≦y≦4 / 3.

[0048] In particular, SiO ２ The Si-containing member may be silica glass, phosphorus-doped silica glass, or boron-doped silica glass.

[0049] (Organic Material According to One Embodiment of the Present Invention) Next, an organic material according to one embodiment of the present invention will be described in more detail with reference to the drawings.

[0050] The organic material according to one embodiment of the present invention has crosslinkability.

[0051] Here, "having crosslinkability (organic material)" means that a crosslinked body is formed from the target material when light or heat is applied to the target material, or when an acid acts on the target material.

[0052] As described above, the organic material according to one embodiment of the present invention includes at least one organic molecule having a dHF of 0.965 (Å) or more. Two or more types of such organic molecules may be included.

[0053] In one embodiment of the present invention, the organic molecule having a dHF of 0.965 (Å) or greater may be a material that exhibits crosslinkability by itself (hereinafter referred to as a "crosslinkable organic molecule"), or a material that does not exhibit crosslinkability by itself (hereinafter referred to as a "non-crosslinkable organic molecule"). In the latter case, the organic material according to one embodiment of the present invention further comprises a crosslinker.

[0054] However, even in the former case, the organic material according to one embodiment of the present invention may further contain a crosslinking agent, in which case the presence of the crosslinking agent accelerates the conversion of the crosslinkable organic molecules into a crosslinked product.

[0055] The crosslinkable organic molecule is a molecule having a crosslinkable group such as an ethylenically unsaturated group, a hydroxy group, a carboxy group, an amino group, an epoxy group, an oxetanyl group, a reactive silyl group, or an isocyanate group. When the crosslinkable organic molecule crosslinks by heat, it preferably exhibits crosslinkability at 300°C or less, and more preferably exhibits crosslinkability at 250°C or less. When the crosslinkable organic molecule crosslinks by light, it preferably exhibits crosslinkability with light having a wavelength of 250 nm to 450 nm, and more preferably exhibits crosslinkability with light having a wavelength of 300 nm to 410 nm. When crosslinking by light, a compound that generates a radical or an acid upon light irradiation may be used as a crosslinking reaction initiator.

[0056] The organic-based material according to one embodiment of the present invention may have other additives in addition to or apart from the crosslinker.

[0057] Each component contained in the organic material according to one embodiment of the present invention will be described in more detail below.

[0058] (Organic Molecule) The organic molecule is selected from those having a dHF of 0.965 (Å) or more.

[0059] The dHF of the organic molecule is preferably 0.97 (Å) or more, and more preferably 0.975 (Å) or more.

[0060] For example, the organic molecule may have at least one of: (i) a structural moiety containing phosphorus (e.g., a linear or cyclic structural moiety containing phosphorus); (ii) a cyclic structural moiety containing at least one of nitrogen and oxygen; (iii) a secondary amine structural moiety; and (iv) a tertiary amine structural moiety.

[0061] Representative examples of organic molecules of type (i) include tris(dimethylamino)phosphine and tris(dimethylamino)phosphine oxide, triallylphosphine oxide, triallylphosphate, triallylphosphine, and alkylphosphonic acid. Representative examples of organic molecules of type (ii) include pyridine, imidazole, pyrrole, and oxazoline. Here, the ring structure moiety containing nitrogen and / or oxygen, i.e., the heterocyclic structure, includes a pyridine ring, an imidazole ring, a benzimidazole ring, a benzoxazole ring, a porphyrin ring, and graphitic carbon nitride. Representative examples of organic molecules of type (iii) include morpholine. Representative examples of organic molecules of type (iv) include trimethylamine and triethanolamine.

[0062] Alternatively, the organic molecule is (v) a primary amine, and the primary amine has an adsorption energy E ａｄｓ may be 0.35 eV or more.

[0063] Here, the adsorption energy E of the primary amine with the HF molecule is ａｄｓ Is E ａｄｓ (eV) = E １ (eV) + E ＨＦ (eV)-E ２ (eV) Calculated from equation (A1).

[0064] Representative examples of such primary amines include, for example, benzylamine, phenylamine, phenylenediamine, and the like.

[0065] Here, E １ is the energy obtained when the three-dimensional structure of the target organic molecule X (see Figure 1) used in the calculation of dHF described above is optimized by DFT calculation, and E ＨＦ is the energy (constant value) of the optimal structure of the HF molecule, and E ２ is the energy of the target organic molecule (see "Compound Y") in which HF molecules are arranged and the structure is optimized, which was used in the calculation of the maximum dHF described above. Among the above (i) to (v), an example of the organic molecule (i) is a compound of the following chemical formula (1):

[0066] The dHF of this organic molecule of chemical formula (1) is 0.9916 Å. Furthermore, this material does not have crosslinkability by itself.

[0067] Other examples include compounds of the formula:

[0068] The dHF of this organic molecule of chemical formula (1-1) is 0.9759 (Å).

[0069] An example of triallylphosphine oxide is the compound of the following chemical formula (1-2): The dHF of this organic molecule is 0.9753 (Å).

[0070]

[0071] An example of triallyl phosphate is the compound (1-3) of the following chemical formula: The dHF of this organic molecule is 0.9684 (Å).

[0072]

[0073] Examples of alkylphosphonic acids include the following compounds (1-4) to (1-6).

[0074] The dHF of this organic molecule of chemical formula (1-4) is 0.9840 (Å).

[0075] The dHF of this organic molecule of chemical formula (1-5) is 0.9811 (Å).

[0076] The dHF of this organic molecule of chemical formula (1-6) is 0.9746 (Å).

[0077] Examples of the organic molecules of (ii) include compounds of the following chemical formulas (2) to (4-4):

[0078]

[0079]

[0080]

[0081]

[0082]

[0083]

[0084] The dHF of the organic molecules of chemical formulas (2) to (4-4) are 0.9688 Å, 0.9787 Å, 0.9824 Å, 0.987 Å, 0.996 Å, 0.9824 Å, and 0.9787 Å, respectively. Of these materials, the materials of chemical formulas (2) to (4-1) are independently crosslinkable. On the other hand, the materials of chemical formulas (4-2) to (4-4) are not independently crosslinkable.

[0085] The material of chemical formula (3) is imidazole, and the materials of chemical formulas (4) to (4-4) are pyridine.

[0086] Compounds having a benzimidazole ring include compounds of the following chemical formulas (4-5) and (4-6):

[0087] The dHF of this compound of chemical formula (4-5) is 0.9851 (Å).

[0088] The dHF of this compound of chemical formula (4-6) is 0.9844 (Å).

[0089] Examples of compounds having a benzoxazole ring include compounds of the following chemical formula (4-7).

[0090] The dHF of this compound of chemical formula (4-7) is 0.9738 (Å).

[0091] Examples of compounds having a porphyrin ring include tetraphenylporphyrin (dHF: 0.9745 Å) represented by the chemical formula (4-8) and tetrapyridylporphyrin (dHF: 0.9809 Å) represented by the chemical formula (4-9).

[0092]

[0093]

[0094] The compound having graphite carbon nitride in its partial structure is g-C represented by the following structural formula (4-10): ３ N ４ (Graphitic carbon nitride) (dHF: 0.9734 Å).

[0095]

[0096] Examples of the organic molecules of (iii) include compounds of the following chemical formulas (5) and (5-1):

[0097] The dHF of the organic molecule of formula (5) is 1.0024 Å. This material is independently crosslinkable.

[0098] The dHF of the organic molecule of the chemical formula (5-1) is 0.9994 .ANG.. The material of the chemical formula (5-1) does not have crosslinkability by itself.

[0099] Examples of the organic molecules of (iv) include compounds of the following chemical formulas (6) to (8):

[0100]

[0101]

[0102] The dHF of the organic molecules of chemical formulas (6) to (8) are 0.9994 Å, 1.0040 Å, and 1.0041 Å, respectively. These materials are independently crosslinkable. The material of chemical formula (6) is morpholine.

[0103] Furthermore, examples of the organic molecules of (v) include compounds of the following chemical formulas (9) to (10-2):

[0104]

[0105]

[0106]

[0107] The dHF of the organic molecules of chemical formulas (9) to (10-2) are 0.975 Å, 0.995 Å, 1.007 Å, and 0.9746 Å, respectively. Of these materials, the organic molecules of chemical formulas (9) to (10) are independently crosslinkable. On the other hand, the organic molecules of chemical formulas (10-1) to (10-2) are not independently crosslinkable.

[0108] In addition, the organic molecules of the chemical formulas (9) to (10-2) have an adsorption energy E ａｄｓ are 0.51 eV, 0.71 eV, 0.73 eV, and 0.55 eV, respectively.

[0109] The organic molecules described above may be monomers or polymers as long as they have a dHF value of 0.965 (Å) or more. Polymers can be obtained by polymerizing organic molecules having a dHF value of 0.965 (Å) or more with organic molecules having reactive functional groups such as (meth)acryloyl groups, vinyl groups, epoxy groups, oxetane groups, thiol groups, carbonyl groups, and amino groups through radical, cationic, or condensation polymerization. Polymers can also be obtained by copolymerizing a monomer having an organic molecule having a dHF value of 0.965 (Å) or more with a monomer not having such an organic molecule.

[0110] The organic molecules contained in the organic material according to one embodiment of the present invention do not necessarily have to be of one type, and the organic molecules contained in the organic material according to one embodiment of the present invention may include a second organic molecule having a dHF of 0.965 (Å) or more, and further may include a third organic molecule having a dHF of 0.965 (Å) or more.

[0111] (Crosslinking Agent) As described above, the organic-based material according to one embodiment of the present invention may contain a crosslinking agent.

[0112] When the organic material is composed solely of the aforementioned organic molecules, faster etching is possible.

[0113] When the organic material contains a cross-linking agent, it is possible to directly pattern the object to be processed.

[0114] Examples of crosslinking agents include, but are not limited to, TADT (N,N',N''-triacryloydiethylenetriamine) (manufactured by Fujifilm Wako Pure Chemical Industries, Ltd.), MT3041 (manufactured by Toagosei Co., Ltd.), EX512 (manufactured by Nagase ChemteX Corporation), PETA (Pentaerythritol triacrylate; manufactured by Shin-Nakamura Chemical Co., Ltd.), and TAAA (N-[Tris(3-acrylamidopropoxymethyl)methyl]acrylamide; manufactured by Fujifilm Wako Pure Chemical Industries, Ltd.).

[0115] TADT and PETA are represented by the following structural formulas (11) and (12), respectively.

[0116]

[0117] The amount of the crosslinking agent to be added is not particularly limited. For example, the crosslinking agent may be added in a range of 0 mol % to 90 mol % with respect to the total amount of the organic molecules and the crosslinking agent.

[0118] (Additives) The organic material according to one embodiment of the present invention may contain various additives.

[0119] The additive may be, but is not limited to, a photoradical initiator, a photoacid generator, a photobase generator, a thermal acid generator, or a thermal base generator.

[0120] The amount of the additive added may be, for example, in the range of 0.1 mol % to 40 mol %, and preferably in the range of 0.1 mol % to 30 mol %, based on the total amount of the organic material according to one embodiment of the present invention. Alternatively, the amount of the additive added may be, for example, in the range of 0.1 wt % to 30 wt %, and preferably in the range of 0.1 wt % to 20 wt %, based on the total amount of the organic material according to one embodiment of the present invention.

[0121] In order to increase the etching rate, it is preferable that the organic molecules are present in the organic material at 10 mol % or more.

[0122] In the latter case, the organic material may contain a solvent, a binder, and / or fine particles, etc. The method for applying the organic material is not particularly limited.

[0123] (Etching Method Using Organic Material According to One Embodiment of the Present Invention) The organic material according to one embodiment of the present invention having the above-described characteristics can be applied to hydrogen fluoride gas etching of Si-containing members.

[0124] An example of an etching method using an organic material according to one embodiment of the present invention will be described below with reference to FIG.

[0125] FIG. 6 is a schematic diagram showing the flow of a method for etching a Si-containing member using an organic material according to one embodiment of the present invention (hereinafter referred to as "first method").

[0126] As shown in FIG. 6 , the first method includes: (1) a step of placing an organic material on at least a part of the surface of a Si-containing member (step S110); (2) a step of cross-linking the organic material to form a cross-linked body (step S120); and (3) a step of exposing the Si-containing member on which the cross-linked body is placed to hydrogen fluoride gas (step S130).

[0127] Each step will be described below.

[0128] (Step S110) First, a Si-containing member to be etched is provided.

[0129] The Si-containing component includes silicon (Si) and oxygen (O) and / or nitrogen (N). For example, the Si-containing component may be SiO ｘ , SiN ｙ , SiON, SiOC, SiCN, and SiC.

[0130] In particular, SiO ２ The Si-containing member may be quartz glass, boron-containing quartz glass, or phosphorus-containing quartz glass.

[0131] The form of the Si-containing member is not particularly limited, and various shapes such as a plate, a thin film, or a block may be used.

[0132] Next, an organic material is applied to part or all of the processed surface of the Si-containing member.

[0133] The organic material is selected from the organic materials according to one embodiment of the present invention having the characteristics described above.

[0134] The organic material may be applied to the surface to be processed by, for example, a coating method, a printing method, a spin coating method, a spray method, etc. Therefore, the organic material may contain a solvent and / or a binder, etc.

[0135] (Step S120) Next, the organic material is crosslinked to form a crosslinked body.

[0136] The method for crosslinking the organic material is not particularly limited, but in general, the organic material is crosslinked by light irradiation (for example, UV irradiation) or heat application.

[0137] (Step S130) Next, the Si-containing member on which the crosslinker is provided is exposed to hydrogen fluoride gas, thereby selectively etching the portion of the surface of the Si-containing member on which the crosslinker is provided (hereinafter referred to as the "covered region").

[0138] The concentration of the hydrogen fluoride gas may be in the range of, for example, 0.1 vol % to 100 vol %, and the temperature of the etching process may be in the range of, for example, 80°C to 500°C.

[0139] By performing the etching process on the Si-containing member under these conditions, the coated region can be selectively etched, forming a recessed structure in the coated region. Furthermore, if the coated region covers the entire surface of the Si-containing member, the Si-containing member can be thinned (slimmed).

[0140] Examples will be described below. In the following description, Examples 1 to 14 and Examples 31 and 32 are Examples, and Examples 21 to 24 and Example 41 are Comparative Examples.

[0141] Example 1 An evaluation sample was prepared by the following method.

[0142] (Preparation of Organic Material) First, an organic material was prepared by the following method.

[0143] To 1.0 g of methyl ethyl ketone as a solvent, the organic molecule and an additional cross-linking agent (hereinafter simply referred to as "cross-linking agent") were added so that the total amount was 1.0 g, and further, 0.03 g of a photoradical initiator (Omnirad 651; manufactured by IGM Resins B.V.) was added and thoroughly mixed to prepare a mixed solution.

[0144] The organic molecule used was an organic substance represented by the above-mentioned chemical formula (1). The dHF of this organic molecule was 0.9916 Å.

[0145] EX512 was used as the cross-linking agent.

[0146] The ratio of the crosslinking agent to the total of the organic molecules and the crosslinking agent was set to 27 mol %.

[0147] (Preparation of Evaluation Sample) Next, a crosslinked body was formed on a substrate to prepare an evaluation sample. A quartz glass substrate was used as the substrate. The dimensions of the substrate were 50 mm long x 50 mm wide x 0.5 mm thick.

[0148] First, the mixed solution prepared by the above method was spin-coated onto a first surface of a substrate (one surface measuring 50 mm long x 50 mm wide) at 1250 rpm for 30 seconds, and then the substrate was baked at 80°C for 60 seconds.

[0149] Next, the substrate is irradiated with 3000 mJ / cm using a light source with a wavelength of 365 nm. ２ The organic material was exposed to light at a dose of 1000 .mu.m to form a crosslinked body.

[0150] Thereafter, the substrate having the crosslinked body formed on the first surface thereof was baked at 180° C. for 60 minutes to form a coating film on the first surface of the substrate.

[0151] The obtained substrate was cut into a size of 50 mm length x 10 mm width to obtain an evaluation sample (hereinafter referred to as "Sample 1").

[0152] Example 2 An evaluation sample (hereinafter referred to as "Sample 2") was prepared in the same manner as in Example 1.

[0153] However, in Example 2, the organic molecule used was the material shown in the above-mentioned chemical formula (2). The dHF of this material was 0.9688. Methanol was used as the solvent, and MT3041 was used as the cross-linking agent.

[0154] The ratio of the crosslinking agent to the total of the organic molecules and the crosslinking agent was set to 23 mol %.

[0155] Example 3 An evaluation sample (hereinafter referred to as "Sample 3") was prepared in the same manner as in Example 1.

[0156] However, in Example 3, the organic molecule used was the material shown in the aforementioned chemical formula (9). The dHF of this material was 0.9746. Methanol was used as the solvent, and TADT, shown in the aforementioned chemical formula (11), was used as the cross-linking agent.

[0157] The ratio of the crosslinking agent to the total of the organic molecules and the crosslinking agent was set to 23 mol %.

[0158] Example 4 An evaluation sample (hereinafter referred to as "Sample 4") was prepared in the same manner as in Example 1.

[0159] However, in Example 4, the organic molecule used was the material shown in the aforementioned chemical formula (3). The dHF of this material was 0.9787. Methanol was used as the solvent, and TADT, shown in the aforementioned chemical formula (11), was used as the cross-linking agent.

[0160] The ratio of the crosslinking agent to the total of the organic molecules and the crosslinking agent was set to 23 mol %.

[0161] Example 5 An evaluation sample (hereinafter referred to as "Sample 5") was prepared in the same manner as in Example 4.

[0162] However, in Example 5, methanol was used as the solvent and MT3041 was used as the crosslinking agent.

[0163] The ratio of the crosslinking agent to the total of the organic molecules and the crosslinking agent was set to 23 mol %.

[0164] Example 6 An evaluation sample (hereinafter referred to as "Sample 6") was prepared in the same manner as in Example 1.

[0165] However, in Example 6, the organic molecule used was the material shown in the aforementioned chemical formula (4). The dHF of this material was 0.9824. Methanol was used as the solvent, and PETA, shown in the aforementioned chemical formula (12), was used as the cross-linking agent.

[0166] The ratio of the crosslinking agent to the total of the organic molecules and the crosslinking agent was set to 23 mol %.

[0167] Example 7 An evaluation sample (hereinafter referred to as "Sample 7") was prepared in the same manner as in Example 1.

[0168] However, in Example 7, the organic molecule used was the material shown in the aforementioned chemical formula (10). The dHF of this material was 0.9954. Methanol was used as the solvent, and TADT, shown in the aforementioned chemical formula (11), was used as the cross-linking agent.

[0169] The ratio of the crosslinking agent to the total of the organic molecules and the crosslinking agent was set to 23 mol %.

[0170] Example 8 An evaluation sample (hereinafter referred to as "Sample 8") was prepared in the same manner as in Example 1.

[0171] However, in Example 8, the organic molecule used was the material shown in the above-mentioned chemical formula (6). The dHF of this material was 0.9994. Methanol was used as the solvent, and PETA was used as the cross-linking agent.

[0172] The ratio of the crosslinking agent to the total of the organic molecules and the crosslinking agent was set to 23 mol %.

[0173] Example 9 An evaluation sample (hereinafter referred to as "Sample 9") was prepared in the same manner as in Example 1.

[0174] However, in Example 9, the organic molecule used was the material shown in the aforementioned chemical formula (5). The dHF of this material was 1.0024. Methanol was used as the solvent, and TADT, shown in the aforementioned chemical formula (11), was used as the cross-linking agent.

[0175] The ratio of the crosslinking agent to the total of the organic molecules and the crosslinking agent was set to 23 mol %.

[0176] Example 10 An evaluation sample (hereinafter referred to as "Sample 10") was prepared in the same manner as in Example 1.

[0177] However, in Example 10, the material shown in the above-mentioned chemical formula (7) was used as the organic molecule. The dHF of this material was 1.0040. Methanol was used as the solvent, and PETA was used as the cross-linking agent.

[0178] The ratio of the crosslinking agent to the total of the organic molecules and the crosslinking agent was set to 23 mol %.

[0179] Example 11 An evaluation sample (hereinafter referred to as "Sample 11") was prepared in the same manner as in Example 1.

[0180] However, in Example 11, the material shown in the above-mentioned chemical formula (8) was used as the organic molecule. The dHF of this material was 1.0041. Methanol was used as the solvent, and PETA was used as the cross-linking agent.

[0181] The ratio of the crosslinking agent to the total of the organic molecules and the crosslinking agent was set to 23 mol %.

[0182] Example 12 An evaluation sample (hereinafter referred to as "Sample 12") was prepared in the same manner as in Example 1.

[0183] However, in Example 12, the material shown in the above-mentioned chemical formula (4-1) was used as the organic molecule. The dHF of this material was 0.987. Furthermore, methyl ethyl ketone was used as the solvent, and the solution concentration was 20 wt %. Note that no crosslinking agent was used.

[0184] Example 13 An evaluation sample (hereinafter referred to as "Sample 13") was prepared in the same manner as in Example 1.

[0185] However, in Example 13, the material represented by the above-mentioned chemical formula (10-1) was used as the organic molecule. The dHF of this material was 1.007.

[0186] The ratio of the crosslinking agent to the total of the organic molecules and the crosslinking agent was set to 56 mol %.

[0187] Example 14 An evaluation sample (hereinafter referred to as "Sample 14") was prepared in the same manner as in Example 1.

[0188] However, in Example 14, the material shown in the above-mentioned chemical formula (4-2) was used as the organic molecule. The dHF of this material was 0.996. Furthermore, methyl ethyl ketone was used as the solvent, and EX512 was used as the cross-linking agent.

[0189] The ratio of the crosslinking agent to the total of the organic molecules and the crosslinking agent was set to 56 mol %.

[0190] Example 21 An evaluation sample (hereinafter referred to as "Sample 21") was prepared in the same manner as in Example 1.

[0191] However, in Example 21, the organic molecule used was a material (novolac) shown in the following chemical formula (13). The dHF of this material was 0.9559. In addition, butyl acetate was used as the solvent, and the solution concentration was 20 wt %. In addition, diazonaphthoquinone was used as the cross-linking agent.

[0192] The ratio of the crosslinking agent to the total of the organic molecules and the crosslinking agent was set to 10 mol %.

[0193] Example 22 An evaluation sample (hereinafter referred to as "Sample 22") was prepared in the same manner as in Example 1.

[0194] In Example 22, the organic molecule used was a material represented by the following chemical formula (14): The dHF of this material was 0.9612. Furthermore, methanol was used as the solvent, and MT3041 was used as the cross-linking agent.

[0195] The ratio of the crosslinking agent to the total of the organic molecules and the crosslinking agent was set to 23 mol %.

[0196] Example 23 An evaluation sample (hereinafter referred to as "Sample 23") was prepared in the same manner as in Example 1.

[0197] In Example 23, the organic molecule used was a material represented by the following chemical formula (15): The dHF of this material was 0.9617. Furthermore, methanol was used as the solvent, and MT3041 was used as the cross-linking agent.

[0198] The ratio of the crosslinking agent to the total of the organic molecules and the crosslinking agent was set to 23 mol %.

[0199] Example 24 An evaluation sample (hereinafter referred to as "Sample 24") was prepared in the same manner as in Example 1.

[0200] In Example 24, the organic molecule used was a material represented by the following chemical formula (16): The dHF of this material was 0.9617. Furthermore, methanol was used as the solvent, and PETA was used as the cross-linking agent.

[0201] The ratio of the crosslinking agent to the total of the organic molecules and the crosslinking agent was set to 23 mol %.

[0202] Table 1 below summarizes the organic molecules, added crosslinkers, and dHF of the organic molecules used in each example.

[0203] (Evaluation) Etching treatment was carried out using each sample.

[0204] Specifically, each sample was placed in a reactor maintained at 250°C, and a mixture of hydrogen fluoride and nitrogen (HF:N ２ The substrate was etched by supplying a mixture of HCl and HCl (20:80 vol%) into the furnace for 300 seconds.

[0205] After the etching process, the sample was removed from the reactor and the etching rate of the substrate was evaluated.

[0206] The etching rate was calculated from the weight loss per unit area of ​​the substrate. Specifically, the etching rate v (μm / min) of the substrate was calculated using the following formula: v (μm / min) = (ΔW) / {(ρ×S) / t)}×10 ４ where ΔW is the weight loss (g) of the substrate before and after treatment, and ρ is the density of the substrate (g / cm ３), and S is the area of ​​the substrate coverage (cm ２ ) and t is the etching time (minutes).

[0207] The weight of the coating film placed on the substrate was extremely small compared to the total weight, and therefore the weight of the coating film was not taken into consideration in the calculation of ΔW.

[0208] Furthermore, when a similar etching treatment was carried out without providing a coating film on the surface of the quartz glass substrate, almost no weight loss was observed, and therefore, it was found that the etching rate was zero.

[0209] The "etching rate" column in Table 1 above shows the evaluation results of the etching rate obtained in each example.

[0210] 7 shows the relationship between the dHF of the organic molecules and the etching rate obtained from the evaluation results of each sample. In Fig. 7, the horizontal axis represents the dHF of the organic molecules contained in the organic material, and the vertical axis represents the etching rate of the substrate (expressed as a natural logarithm).

[0211] In addition, in FIG. 7, the symbol ◯ represents plots of samples 1 to 14, and the symbol Δ represents plots of samples 21 to 24.

[0212] The results show that Samples 1 to 14 have significantly improved etching rates for the quartz glass substrate compared to Samples 21 to 24.

[0213] Comparing Sample 4 and Sample 5, it can be seen that due to the difference in the crosslinking agent, Sample 5 has a higher etching rate. This is thought to be due to the difference in activity of the crosslinking agent itself, but if the dHF value of the crosslinking agent itself is significantly smaller than that of the organic molecules and the amount added is small, there is no significant effect on the reaction rate order.

[0214] (Samples 31, 32, 41) (Example 31) An evaluation sample (hereinafter referred to as "Sample 31") was prepared in the same manner as in Example 2 above.

[0215] However, in Example 31, a substrate in which a 3 μm SiN film was formed on a Si substrate was used as the substrate. Furthermore, the material shown in the above-mentioned chemical formula (4) was used as the organic molecule. The dHF of this material was 0.9824. Methyl ethyl ketone was used as the solvent.

[0216] The ratio of the crosslinking agent to the total of the organic molecules and the crosslinking agent was set to 23 mol %.

[0217] Example 32 An evaluation sample (hereinafter referred to as "Sample 32") was prepared in the same manner as in Example 31.

[0218] However, in Example 32, the material represented by the above-mentioned chemical formula (5) was used as the organic molecule. The dHF of this material was 1.0024.

[0219] Example 41 An evaluation sample (hereinafter referred to as "Sample 41") was prepared in the same manner as in Example 31.

[0220] However, in Example 41, the organic molecule used was a material represented by the following chemical formula (13): The dHF of this material was 0.9559 Å. Also, butyl acetate was used as the solvent, and diazonaphthoquinone was used as the cross-linking agent.

[0221] The ratio of the crosslinking agent to the total of the organic molecules and the crosslinking agent was set to 10 mol %.

[0222] Table 2 below summarizes the organic molecules, crosslinkers, and dHF of the organic molecules used in each example.

[0223] The above-described evaluation was carried out using Samples 31, 32 and 41.

[0224] As a result, it was found that the etching rate of the SiN substrate was significantly improved in Samples 31 and 32 compared to Sample 41.

[0225] (Samples 51 to 53) (Example 51) A recessed structure was formed on the first surface of a quartz glass substrate by the same method as in Example 1. However, in Example 51, the organic substance (dHF0.9759 (Å)) shown in the above-mentioned chemical formula (1-1) was used as the catalyst material. Furthermore, methanol was used as the solvent, and crosslinking agent EX512 was mixed in. The ratio of the crosslinking agent to the total of the organic molecules and crosslinking agent was 27 mol%.

[0226] The processed body obtained after the etching process is referred to as "Sample 51."

[0227] The etching rate of sample 51 was 1.6 μm min －１ It was.

[0228] Example 52 A recessed structure was formed on the first surface of a substrate by the same method as in Example 1. However, in Example 52, the catalyst material used was an organic substance (dHF0.9753 (Å)) represented by the aforementioned chemical formula (1-2). Furthermore, methanol was used as the solvent, and crosslinker EX512 was mixed in. The ratio of the crosslinker to the total of the organic molecules and the crosslinker was 27 mol %.

[0229] The processed body obtained after the etching process is referred to as "sample 52."

[0230] The etching rate of sample 52 was 1.4 μm min －１ It was.

[0231] Example 53 A recessed structure was formed on the first surface of a substrate by the same method as in Example 1. However, in Example 53, the organic substance (dHF0.9684 (Å)) represented by the aforementioned chemical formula (1-3) was used as the catalyst material. Methanol was used as the solvent, and crosslinker EX512 was mixed in. The ratio of the crosslinker to the total of the organic molecules and crosslinker was 27 mol %.

[0232] The processed body obtained after the etching process is referred to as "Sample 53."

[0233] The etching rate of sample 53 was 1.3 μm min －１ It was.

[0234] Table 2 below summarizes the organic molecules, crosslinkers, and dHF of the organic molecules used in each example.

[0235]

[0236] The results show that Samples 51 to 53 have significantly improved etching rates for the quartz glass substrate compared to Samples 21 to 24.

[0237] (Samples 61 to 69) (Example 61) A recessed structure was formed on the first surface of a quartz glass substrate by the same method as in Example 1. However, in Example 61, the organic substance (dHF 0.9840 (Å)) represented by the aforementioned chemical formula (1-4) was used as the catalyst material. Methanol was used as the solvent, and crosslinker EX512 was mixed in. The ratio of the crosslinker to the total of the organic molecules and crosslinker was 27 mol%.

[0238] The processed body obtained after the etching process is referred to as "Sample 61."

[0239] The etching rate of sample 61 was 1.4 μm min －１ It was.

[0240] Example 62: A recessed structure was formed on the first surface of a quartz glass substrate by the same method as in Example 1. However, in Example 62, the catalyst material used was an organic substance (dHF0.9811 (Å)) represented by the aforementioned chemical formula (1-5). Furthermore, methanol was used as the solvent, and crosslinker EX512 was mixed in. The ratio of the crosslinker to the total of the organic molecules and the crosslinker was 27 mol %.

[0241] The processed body obtained after the etching process is referred to as "sample 62."

[0242] The etching rate of sample 62 was 1.6 μm min －１ It was.

[0243] Example 63: A recessed structure was formed on the first surface of a quartz glass substrate by the same method as in Example 1. However, in Example 63, the organic substance (dHF0.9746 (Å)) represented by the aforementioned chemical formula (1-6) was used as the catalyst material. Methanol was used as the solvent, and crosslinker EX512 was mixed in. The ratio of the crosslinker to the total of the organic molecules and crosslinker was 27 mol%.

[0244] The processed body obtained after the etching process is referred to as "Sample 63."

[0245] The etching rate of sample 63 was 1.3 μm min －１ It was.

[0246] Example 64: A recessed structure was formed on the first surface of a quartz glass substrate using a method similar to that of Example 1. However, in Example 64, a polymer compound synthesized by the following method was used as the catalyst material, dimethylacetamide was used as the solvent, and crosslinker EX512 was mixed. The ratio of crosslinker to the total of organic molecules and crosslinker was 10 wt %. <Polymer Compound> First, isophthalic acid chloride, metaphenylenediamine, and 5-amino-2-(4-aminophenyl)benzimidazole were mixed with dimethylacetamide in a molar ratio of 2:1:1 and stirred at room temperature for 30 minutes. After dispersing the mixture in methanol, the precipitate was filtered and dried in vacuum at 150°C for one day. This resulted in a polymer compound represented by chemical formula (18), which has a monomer of the organic substance (dHF0.9851 (Å)) represented by chemical formula (4-5) as a partial structure.

[0247]

[0248] The processed body obtained after the etching process is referred to as "Sample 64."

[0249] The etching rate of sample 64 was 2.1 μm min －１ It was.

[0250] Example 65: A recessed structure was formed on the first surface of a quartz glass substrate using a method similar to that of Example 1. However, in Example 65, a polymer compound synthesized by the following method was used as the catalyst material, dimethylacetamide was used as the solvent, and crosslinker EX512 was mixed. The ratio of crosslinker to the total of organic molecules and crosslinker was 10 wt %. <Polymer Compound> First, isophthalic acid chloride, metaphenylenediamine, and 5,3'-diamino-2-phenylbenzimidazole were mixed with dimethylacetamide in a molar ratio of 2:1:1 and stirred at room temperature for 30 minutes. The solution was dispersed in methanol, and the precipitate was filtered and dried in vacuum at 150°C for one day. This resulted in a polymer compound represented by chemical formula (19), which has a monomer of the organic substance (dHF0.9844 (Å)) represented by chemical formula (4-6) in its partial structure.

[0251]

[0252] The processed body obtained after the etching process is referred to as "Sample 65."

[0253] The etching rate of sample 65 was 2.0 μm min －１ It was.

[0254] Example 66: A recessed structure was formed on the first surface of a quartz glass substrate using a method similar to that of Example 1. However, in Example 66, a polymer compound synthesized by the following method was used as the catalyst material, dimethylacetamide was used as the solvent, and crosslinker EX512 was mixed. The ratio of crosslinker to the total of organic molecules and crosslinker was 10 wt %. <Polymer Compound> First, isophthalic acid chloride, metaphenylenediamine, and 5-amino-2-(4-aminophenyl)benzoxazole were mixed with dimethylacetamide in a molar ratio of 2:1:1 and stirred at room temperature for 30 minutes. The solution was dispersed in methanol, and the precipitate was filtered and dried in vacuum at 150°C for one day. This resulted in a polymer compound represented by chemical formula (20), which has a monomer of the organic substance (dHF0.9738 (Å)) represented by chemical formula (4-7) as a partial structure.

[0255]

[0256] The processed body obtained after the etching process is referred to as "Sample 66."

[0257] The etching rate of sample 66 was 1.3 μm min －１ It was.

[0258] Example 67: A recessed structure was formed on the first surface of a quartz glass substrate by the same method as in Example 1. However, in Example 67, the catalyst material used was an organic substance (dHF0.9745 (Å)) represented by the aforementioned chemical formula (4-8). Chloroform was used as the solvent, and crosslinker EX512 was mixed in. The ratio of the crosslinker to the total of the organic molecules and crosslinker was 30 mol %.

[0259] The processed body obtained after the etching process is referred to as "Sample 67."

[0260] The etching rate of sample 67 was 1.8 μm min －１ It was.

[0261] Example 68: A recessed structure was formed on the first surface of a quartz glass substrate by the same method as in Example 1. However, in Example 68, the catalyst material was an organic substance (dHF0.9809 (Å)) represented by the aforementioned chemical formula (4-9). Chloroform was used as the solvent, and crosslinker EX512 was mixed in. The ratio of the crosslinker to the total of the organic molecules and crosslinker was 30 mol %.

[0262] The processed body obtained after the etching process is referred to as "Sample 68."

[0263] The etching rate of sample 68 was 1.9 μm min －１ It was.

[0264] Example 69: A recessed structure was formed on the first surface of a quartz glass substrate by the same method as in Example 1. However, in Example 69, the catalyst material used was an organic substance (dHF0.9734 (Å)) represented by the aforementioned chemical formula (4-10). Furthermore, methanol was used as the solvent, and crosslinking agent EX512 was mixed in. The ratio of the crosslinking agent to the total of the organic molecules and crosslinking agent was 30 wt %.

[0265] The processed body obtained after the etching process is referred to as "Sample 69."

[0266] The etching rate of sample 69 was 1.6 μm min －１ Table 4 below shows the organic molecules used in each example, the type and ratio of the crosslinking agent, the dHF of the organic molecules, and the etching rate.

[0267]

[0268] The results show that Samples 61 to 69 also have significantly improved etching rates for the quartz glass substrate compared to Samples 21 to 24.

[0269] (Aspects of the Invention) One aspect of the invention will be described below.

[0270] (Aspect 1) An organic material exhibiting crosslinkability, wherein the crosslinked body exhibits the effect of increasing the reactivity of hydrogen fluoride gas with a Si-containing member, wherein the Si-containing member contains silicon (Si) and oxygen (O) and / or nitrogen (N), and the organic material has organic molecules, the organic molecules having a distance dHF between a hydrogen atom and a fluorine atom in the hydrogen fluoride molecule when assuming an adsorption structure, calculated using 6-31+G(d) basis functions and a B3LYP correlation-exchange functional, of 0.965 (Å) or greater.

[0271] (Aspect 2) The organic material according to aspect 1, wherein the organic molecule independently exhibits crosslinkability.

[0272] (Aspect 3) The organic material according to aspect 1, wherein the organic molecule does not exhibit crosslinkability by itself, and the organic material further comprises a crosslinker.

[0273] (Aspect 4) The organic material according to any one of Aspects 1 to 3, wherein the organic molecule has at least one of: (i) a structural portion containing phosphorus; (ii) a ring structural portion containing nitrogen and / or oxygen; (iii) a secondary amine structural portion; and (iv) a tertiary amine structural portion.

[0274] (Aspect 5) The organic molecule is a primary amine, and the primary amine has an adsorption energy E ａｄｓ 4. The organic material according to any one of aspects 1 to 3, wherein the .lambda.

[0275] (Aspect 6) The Si-containing member is SiO ｘ or SiN ｙ 6. The organic material according to any one of aspects 1 to 5, comprising:

[0276] (Aspect 7) The organic material according to any one of Aspects 1 to 6, wherein the Si-containing member is silica glass.

[0277] (Aspect 8) A method for etching a Si-containing member, the method comprising: (1) a step of disposing an organic material on at least a part of a surface of the Si-containing member, the Si-containing member containing silicon (Si) and oxygen (O) and / or nitrogen (N); (2) a step of cross-linking the organic material to form a cross-linked body; and (3) a step of contacting the Si-containing member on which the cross-linked body is disposed with hydrogen fluoride gas, wherein the organic material is the organic material according to any one of Aspects 1 to 7; and after the step (3), the surface of the Si-containing member on which the organic material is disposed is selectively etched.

[0278] (Aspect 9) The method according to aspect 8, wherein the step (3) is carried out at a temperature of 80°C to 500°C.

[0279] (Aspect 10) The Si-containing member is SiO ｘ or SiN ｙ 10. The method of claim 8 or 9, comprising:

[0280] This application claims priority based on Japanese Patent Application No. 2024-105340, filed on June 28, 2024, the disclosure of which is incorporated herein in its entirety by reference.

Claims

1. An organic material exhibiting crosslinkability, wherein the crosslinked product exhibits the effect of increasing the reactivity of hydrogen fluoride gas with a Si-containing member, wherein the Si-containing member contains silicon (Si) and oxygen (O) and / or nitrogen (N), and the organic material has organic molecules, wherein the value of the distance dHF between the hydrogen atom and the fluorine atom in the hydrogen fluoride molecule when assuming an adsorption structure, calculated using the 6-31+G(d) basis set and the B3LYP correlation-exchange functional, is 0.965 (Å) or greater.

2. The organic material according to claim 1, wherein the organic molecule exhibits crosslinkability by itself.

3. The organic material according to claim 1, wherein the organic molecule does not exhibit crosslinkability by itself, and the organic material further comprises a crosslinking agent.

4. The organic material according to claim 1, wherein the organic molecule has at least one of: (i) a structural portion containing phosphorus; (ii) a ring structural portion containing nitrogen and / or oxygen; (iii) a secondary amine structural portion; and (iv) a tertiary amine structural portion.

5. The organic molecule is a primary amine, and the primary amine has an adsorption energy E ａｄｓ The organic material according to claim 1 , wherein the .lambda.

6. The Si-containing member is SiO ｘ or SiN ｙ The organic-based material of claim 1 , comprising:

7. The organic material according to claim 6, wherein the Si-containing member is silica glass.

8. A method for etching a Si-containing member, comprising: (1) a step of disposing an organic material on at least a portion of a surface of the Si-containing member, the Si-containing member containing silicon (Si) and oxygen (O) and / or nitrogen (N); (2) a step of cross-linking the organic material to form a cross-linked body; and (3) a step of contacting the Si-containing member on which the cross-linked body has been disposed with hydrogen fluoride gas, wherein the organic material is the organic material defined in claim 1; and after step (3), the surface of the Si-containing member on which the organic material has been disposed is selectively etched.

9. The method of claim 8, wherein step (3) is carried out at a temperature of 80°C to 500°C.

10. The Si-containing member is SiO ｘ or SiN ｙ The method of claim 8, comprising:

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