Composition containing hexafluoropropene

Abstract

The purpose of the present disclosure is to provide a novel composition containing hexafluoropropene. This composition contains hexafluoropropene.

Description

Compositions containing hexafluoropropene

[0001] The present disclosure relates to compositions containing hexafluoropropene.

[0002] Patent Document 1 discloses a method for etching silicon-based materials such as silicon oxide films and / or silicon-containing low dielectric constant films using hexafluoropropene.

[0003] International Publication No. WO02 / 021586-A1

[0004] The present disclosure aims to provide a novel composition containing hexafluoropropene.

[0005] The present disclosure encompasses the following configurations.

[0006] Item 1. A composition containing hexafluoropropene, comprising: (1) hexafluoropropene; (2) hexafluorocyclopropane; and (3) at least one component selected from the group consisting of oxygen, hydrogen fluoride, and hydrogen chloride, wherein, relative to the total amount of the composition, when the composition contains (3) oxygen, the content of (3) oxygen is 0.05 ppm by volume or more and 10 ppm by volume or less; when the composition contains (3) hydrogen fluoride, the content of (3) hydrogen fluoride is 0.05 ppm by volume or more and 5 ppm by volume or less; or when the composition contains (3) hydrogen chloride, the content of (3) hydrogen chloride is 0.05 ppm by volume or more and 5 ppm by volume or less.

[0007] Item 2. The composition according to Item 1, comprising, relative to the total amount of the composition, 95% by volume to 99.99999% by volume of (1) hexafluoropropene, and 1 ppm by volume to 1,000 ppm by volume of (2) hexafluorocyclopropane.

[0008] Item 3. A method for storing a composition containing hexafluoropropene, the composition containing (1) hexafluoropropene, (2) hexafluorocyclopropane, and (3) at least one component selected from the group consisting of oxygen, hydrogen fluoride, and hydrogen chloride, and wherein, relative to the total amount of the composition, when the composition contains (3) oxygen, the content of (3) oxygen is 0.05 ppm by volume or more and 10 ppm by volume or less, when the composition contains (3) hydrogen fluoride, the content of (3) hydrogen fluoride is 0.05 ppm by volume or more and 5 ppm by volume or less, or when the composition contains (3) hydrogen chloride, the content of (3) hydrogen chloride is 0.05 ppm by volume or more and 5 ppm by volume or less.

[0009] Item 4. The method according to Item 3, wherein the composition contains, relative to the total amount of the composition, (1) hexafluoropropene at 95% by volume to 99.99999% by volume, and (2) hexafluorocyclopropane at 1 ppm by volume to 1,000 ppm by volume.

[0010] Item 5. A method for suppressing a decrease in the purity of hexafluoropropene in a composition containing hexafluoropropene, the composition containing (1) hexafluoropropene, (2) hexafluorocyclopropane, and (3) at least one component selected from the group consisting of oxygen, hydrogen fluoride, and hydrogen chloride, and wherein, relative to the total amount of the composition, when the composition contains (3) oxygen, the content of (3) oxygen is 0.05 ppm by volume or more and 10 ppm by volume or less, when the composition contains (3) hydrogen fluoride, the content of (3) hydrogen fluoride is 0.05 ppm by volume or more and 5 ppm by volume or less, or when the composition contains (3) hydrogen chloride, the content of (3) hydrogen chloride is 0.05 ppm by volume or more and 5 ppm by volume or less.

[0011] Item 6. The method according to Item 5, wherein the composition contains, relative to the total amount of the composition, (1) hexafluoropropene in an amount of 95% by volume to 99.99999% by volume, and (2) hexafluorocyclopropane in an amount of 1 ppm by volume to 1,000 ppm by volume.

[0012] This disclosure discloses a method for stably transporting a composition containing hexafluoropropene (HFP) and hexafluorocyclopropane (c-C3F6). According to this disclosure, by adjusting the oxygen concentration, hydrogen fluoride concentration, or hydrogen chloride concentration in the HFP-containing composition, it is possible to suppress decomposition of HFP or c-C3F6 when the HFP-containing composition is transported in a cylinder or the like, thereby suppressing a decrease in the purity of HFP or c-C3F6 and maintaining the storage stability of the HFP-containing composition.

[0013] The HFP-containing composition of the present disclosure contains c-C3F6 and has improved storage stability. Even under harsh conditions (such as temperature rise during transport) during maritime transport in containers, decomposition of HFP or c-C3F6 is suppressed, enabling stable transport.

[0014] According to the present disclosure, a new composition containing hexafluoropropene can be provided.

[0015] In this specification, "containing" is a concept that encompasses all of "comprise," "consist essentially of," and "consist only of." In this specification, when a numerical range is expressed as "A to B," it means "A or more, B or less." When parts, % and other expressions are used in this specification, these represent parts by mass, parts by weight, mass%, or weight% (wt%).

[0016] [1] Composition containing hexafluoropropene The composition containing hexafluoropropene (HFP) of the present disclosure contains (1) hexafluoropropene (HFP), (2) hexafluorocyclopropane (c-C3F6), and (3) at least one component selected from the group consisting of oxygen (O2), hydrogen fluoride (HF), and hydrogen chloride (HCl), wherein, relative to the total amount of the composition, when the composition contains the (3) oxygen, the content of the (3) oxygen is 0.05 ppm by volume or more and 10 ppm by volume or less; when the composition contains the (3) hydrogen fluoride, the content of the (3) hydrogen fluoride is 0.05 ppm by volume or more and 5 ppm by volume or less; or when the composition contains the (3) hydrogen chloride, the content of the (3) hydrogen chloride is 0.05 ppm by volume or more and 5 ppm by volume or less.

[0017] The HFP-containing composition of the present disclosure preferably contains, relative to the total amount of the composition, (1) 95% by volume to 99.99999% by volume of the HFP, and (2) 1 ppm by volume to 1,000 ppm by volume of the c-C3F6.

[0018] This disclosure discloses a method for stably transporting a composition containing HFP and c-C3F6. According to this disclosure, by adjusting the oxygen concentration, hydrogen fluoride concentration, or hydrogen chloride concentration in the HFP-containing composition, it is possible to suppress decomposition of HFP or c-C3F6 when the HFP-containing composition is transported in a cylinder or the like, suppress a decrease in the purity of HFP or c-C3F6, and maintain the storage stability of the HFP-containing composition.

[0019] The HFP-containing composition of the present disclosure contains c-C3F6 and has improved storage stability. Even under harsh conditions (such as temperature rise during transport) during maritime transport in containers, decomposition of HFP or c-C3F6 is suppressed, enabling stable transport.

[0020] (1) Hexafluoropropene The HFP-containing composition of the present disclosure contains, as a first component, (1) hexafluoropropene (CF3-CF=CF2, also known as hexafluoropropylene, HFP).

[0021] The HFP-containing composition of the present disclosure contains a first component (1) HFP as a major component. From the viewpoints of improving storage stability and suppressing decomposition of HFP or c-C3F6 and ensuring stable transportation even under harsh conditions (such as temperature increases during transport) during sea transport in containers or the like, the HFP content in the HFP-containing composition is preferably 95% to 99.99999% by volume, more preferably 95% to 99.999% by volume or 96% to 99.99% by volume, even more preferably 97% to 99.95% by volume, and particularly preferably 98% to 99.9% by volume, based on the total amount (gas volume) of the HFP-containing composition.

[0022] (2) Hexafluorocyclopropane The HFP-containing composition of the present disclosure contains (2) hexafluorocyclopropane (c-C3F6) as a second component.

[0023] The HFP-containing composition of the present disclosure contains hexafluorocyclopropane (c-C3F6) as a second component, and therefore has improved storage stability. Decomposition of HFP or its dimer and / or trimer is suppressed, enabling stable transportation even under harsh conditions (such as temperature rise during transportation) during sea transport in containers, etc.

[0024] In a composition containing HFP, from the viewpoint of improving storage stability and suppressing decomposition of HFP or c-C3F6 and ensuring stable transportation even under harsh conditions (such as temperature rise during transportation) during marine transport in containers or the like, the content of c-C3F6 is preferably 1 ppm by volume (ppm volume) to 1,000 ppm by volume (ppm volume), more preferably 5 ppm by volume to 500 ppm by volume, even more preferably 5 ppm by volume to 300 ppm by volume, and particularly preferably 5 ppm by volume to 200 ppm by volume, relative to the total amount (gas volume) of the composition containing HFP.

[0025] (3) Oxygen, Hydrogen Fluoride, and Hydrogen Chloride The HFP-containing composition of the present disclosure contains, as a third component, (3) at least one component selected from the group consisting of oxygen (O), hydrogen fluoride (HF), and hydrogen chloride (HCl).

[0026] (a) Oxygen (O2) The HFP-containing composition of the present disclosure contains (3) oxygen (O2) as a third component.

[0027] In a composition containing HFP, the oxygen (O2) content is 0.05 volume ppm or more and 10 volume ppm or less, based on the total amount (gas volume) of the composition containing HFP. By adjusting the O2 concentration in the composition containing HFP within this range, decomposition of HFP or c-C3F6 is suppressed when the composition containing HFP is transported in a cylinder or the like, a decrease in the purity of HFP or c-C3F6 in the composition containing HFP is suppressed, and the storage stability of the composition containing HFP can be maintained. The composition containing HFP can be transported stably, suppressing decomposition of HFP or c-C3F6 even under harsh conditions (such as temperature increases during transport) during sea transport in containers or the like.

[0028] In the composition containing HFP, the content of oxygen (O2) is preferably 0.1 ppm by volume (ppm volume) to 10 ppm by volume (ppm volume), and more preferably 0.1 ppm by volume to 5 ppm by volume, relative to the total amount (gas volume) of the composition containing HFP.

[0029] (b) Hydrogen Fluoride (HF) The HFP-containing composition of the present disclosure contains (3) hydrogen fluoride (HF) as a third component.

[0030] In a composition containing HFP, the content of hydrogen fluoride (HF) is 0.05 ppm by volume or more and 5 ppm by volume or less, based on the total amount (gas volume) of the composition containing HFP. By adjusting the HF concentration in the composition containing HFP within this range, decomposition of HFP or c-C3F6 is suppressed when the composition containing HFP is transported in a cylinder or the like, a decrease in the purity of HFP or c-C3F6 in the composition containing HFP is suppressed, and the storage stability of the composition containing HFP can be maintained. The composition containing HFP can be transported stably, suppressing decomposition of HFP or c-C3F6 even under harsh conditions (such as temperature increases during transport) during sea transport in containers or the like.

[0031] In the composition containing HFP, the content of hydrogen fluoride (HF) is preferably 0.1 ppm by volume (ppm volume) to 5 ppm by volume (ppm volume), more preferably 0.1 ppm by volume to 3 ppm by volume, and even more preferably 0.1 ppm by volume to 1 ppm by volume, relative to the total amount (gas volume) of the composition containing HFP.

[0032] (c) Hydrogen Chloride (HCl) The HFP-containing composition of the present disclosure contains (3) hydrogen chloride (HCl) as a third component.

[0033] In a composition containing HFP, the content of hydrogen chloride (HCl) is 0.05 ppm by volume or more and 5 ppm by volume or less, based on the total amount (gas volume) of the composition containing HFP. By adjusting the HCl concentration in the composition containing HFP within this range, decomposition of HFP or c-C3F6 is suppressed when the composition containing HFP is transported in a cylinder or the like, a decrease in the purity of HFP or c-C3F6 in the composition containing HFP is suppressed, and the storage stability of the composition containing HFP can be maintained. The composition containing HFP can be transported stably, suppressing decomposition of HFP or c-C3F6 even under harsh conditions (such as temperature increases during transport) during sea transport in containers or the like.

[0034] In the composition containing HFP, the content of hydrogen chloride (HCl) is preferably 0.1 ppm by volume (ppm by volume) to 5 ppm by volume (ppm by volume), more preferably 0.1 ppm by volume to 3 ppm by volume, and even more preferably 0.1 ppm by volume to 1 ppm by volume, relative to the total amount (gas volume) of the composition containing HFP.

[0035] [2] Method for storing a composition containing hexafluoropropene The present disclosure includes a method for storing a composition containing hexafluoropropene (HFP), and a method for suppressing a decrease in the purity of HFP in a composition containing HFP.

[0036] In a method for storing a composition containing HFP or a method for suppressing a decrease in the purity of HFP, the composition containing HFP contains (1) hexafluoropropene (HFP), (2) hexafluorocyclopropane (c-C3F6), and (3) at least one component selected from the group consisting of oxygen, hydrogen fluoride, and hydrogen chloride, and, relative to the total amount of the composition, when the composition contains (3) oxygen, the content of (3) oxygen is 0.05 volume ppm or more and 10 volume ppm or less; when the composition contains (3) hydrogen fluoride, the content of (3) hydrogen fluoride is 0.05 volume ppm or more and 5 volume ppm or less; or when the composition contains (3) hydrogen chloride, the content of (3) hydrogen chloride is 0.05 volume ppm or more and 5 volume ppm or less.

[0037] The composition containing HFP preferably contains, relative to the total amount of the composition, (1) 95% by volume to 99.99999% by volume of the HFP, and (2) 1 ppm by volume to 1,000 ppm by volume of the c-C3F6.

[0038] For details of the composition containing HFP, the composition containing hexafluoropropene in the previous section [1] is adopted.

[0039] This disclosure discloses a method for stably transporting a composition containing HFP and c-C3F6. According to this disclosure, by adjusting the oxygen (O2) concentration, hydrogen fluoride (HF) concentration, or hydrogen chloride (HCl) concentration in the HFP-containing composition, decomposition of HFP or c-C3F6 can be suppressed when the HFP-containing composition is transported in a cylinder or the like, and a decrease in the purity of HFP or c-C3F6 in the HFP-containing composition can be suppressed, thereby maintaining good storage stability of the HFP-containing composition.

[0040] The HFP-containing composition of the present disclosure contains c-C3F6, and inhibits the generation of HFP-derived decomposition products or c-C3F6-derived decomposition products, improving storage stability. Even under harsh conditions (such as temperature increases during transport) during maritime transport in containers, the decomposition of HFP or c-C3F6 is inhibited, enabling stable transportation.

[0041] [3] Use of the composition containing hexafluoropropene The present disclosure includes a method of etching a substrate for manufacturing a semiconductor using the composition containing hexafluoropropene (HFP) of the present disclosure as an etching gas supplied to generate plasma.

[0042] A silicon-based material having a silicon oxide (SiO2) or silicon nitride (SiN) film formed thereon can be etched using a gas plasma of a composition (etching gas) containing HFP. The silicon-based material to be etched is preferably a substrate used in semiconductor manufacturing.

[0043] When hole etching is performed on silicon-based materials containing silicon oxide (SiO2) or silicon nitride (SiN) films using the gas plasma generated by using a composition containing HFP, etching can be performed with good retention of the processed hole shape. The etching conditions (especially dry etching) can be the same as those of conventional methods.

[0044] The present invention will be specifically described below using examples and comparative examples, but the present invention is not limited to these examples alone.

[0045] [1-1] Storage stability of compositions containing hexafluoropropene (Example 1-1) Hexafluoropropene: HFP Hexafluorocyclopropane: c-C3F6 Oxygen: O2 Compositions containing HFP were prepared by adjusting purified HFP and c-C3F6 to predetermined concentrations (150 volume ppm, 50 volume ppm, and 5 volume ppm) using a conventional method, and adjusting O2 to predetermined concentrations (100 volume ppm, 10 volume ppm, 5 volume ppm, and 1 volume ppm).

[0046] The concentration (ppm by volume) of c-C3F6 in the composition containing HFP was analyzed by gas chromatography (GC analysis).

[0047] The O2 concentration (ppm by volume) in the HFP-containing compositions was analyzed by GC.

[0048] Compositions containing HFP were stored at constant temperatures (20°C and 50°C) for a set period of time (30 days, 90 days, and 180 days), after which the gas phase was extracted and hexafluoropropene (HFP)-derived decomposition products were analyzed by GC (ppm by volume).

[0049]

[0050] In the compositions of the examples containing HFP and c-C3F6 (150 ppm by volume, 50 ppm by volume, and 5 ppm by volume), the production of HFP-derived decomposition products or c-C3F6-derived decomposition products was successfully suppressed even after storage at constant temperatures (20°C and 50°C) for certain periods (30 days, 90 days, and 180 days) by adjusting the O2 concentration (to 10 ppm by volume or less).

[0051] [1-2] Investigation of the lower limit of the oxygen (O2) content in the composition (Example 1-2) A composition containing O2, HFP, and c-C3F6 (5 ppm by volume) was prepared in a conventional manner by adjusting the O2 concentration to a predetermined concentration (0.1 ppm by volume, 0.01 ppm by volume).

[0052] The O2 concentration (ppm by volume) in a composition consisting of HFP and c-C3F6 (5 ppm by volume) was analyzed by GC.

[0053] A composition consisting of HFP and c-C3F6 (5 ppm by volume) was stored at a constant temperature (20°C, 50°C). After a certain period of time (30 days, 90 days, 180 days), the gas phase was extracted and analyzed by GC (ppm by volume).

[0054]

[0055] When the O2 concentration in the composition was 0.1 ppm by volume, no decomposition products were observed. When the O2 concentration in the composition was 0.01 ppm by volume, decomposition products were detected.

[0056] [2-1] Storage stability of compositions containing hexafluoropropene (Example 2-1) Hexafluoropropene: HFP Hexafluorocyclopropane: c-C3F6 Hydrogen fluoride: HF Compositions containing HFP were prepared by adjusting purified HFP and c-C3F6 to predetermined concentrations (150 volume ppm, 50 volume ppm, and 5 volume ppm) according to a conventional method, and adjusting HF to predetermined concentrations (10 volume ppm, 5 volume ppm, 1 volume ppm, and 0.1 volume ppm).

[0057] The concentration (ppm by volume) of c-C3F6 in the composition containing HFP was analyzed by gas chromatography (GC analysis).

[0058] The concentration (volume ppm) of HF in the composition containing HFP was analyzed using a Fourier transform infrared spectrophotometer (FT-IR) to measure the initial concentration.

[0059] Compositions containing HFP were stored at constant temperatures (20°C and 50°C) for a set period of time (30 days, 90 days, and 180 days), after which the gas phase was extracted and hexafluoropropene (HFP)-derived decomposition products were analyzed by GC (ppm by volume).

[0060]

[0061] In the compositions of the examples containing HFP and c-C3F6 (150 ppm by volume, 50 ppm by volume, and 5 ppm by volume), by adjusting the HF concentration (5 ppm by volume or less), the production of HFP-derived decomposition products or c-C3F6-derived decomposition products could be effectively suppressed even after storage at constant temperatures (20°C and 50°C) for certain periods (30 days, 90 days, and 180 days).

[0062] [2-2] Investigation of the Lower Limit of Hydrogen Fluoride (HF) Content in Composition (Example 2-2) A composition consisting of HFP and c-C3F6 (5 ppm by volume) and a composition containing HF, HFP, and c-C3F6 were prepared by adjusting the HF concentration to a predetermined concentration (0.1 ppm by volume, 0.01 ppm by volume) in a conventional manner.

[0063] The concentration of HF (ppm by volume) in a composition consisting of HFP and c-C3F6 (5 ppm by volume) was analyzed by GC.

[0064] A composition consisting of HFP and c-C3F6 (5 ppm by volume) was stored at a constant temperature (20°C, 50°C). After a certain period of time (30 days, 90 days, 180 days), the gas phase was extracted and analyzed by GC (ppm by volume).

[0065]

[0066] When the HF concentration in the composition was 0.1 ppm by volume, no decomposition products were observed. When the HF concentration in the composition was 0.01 ppm by volume, decomposition products were detected.

[0067] [3-1] Storage stability of compositions containing hexafluoropropene (Example 3-1) Hexafluoropropene: HFP Hexafluorocyclopropane: c-C3F6 Hydrogen chloride: HCl Compositions containing HFP were prepared by adjusting purified HFP and c-C3F6 to predetermined concentrations (150 volume ppm, 50 volume ppm, and 5 volume ppm) according to a conventional method, and adjusting HCl to predetermined concentrations (10 volume ppm, 5 volume ppm, 1 volume ppm, and 0.1 volume ppm).

[0068] The concentration (ppm by volume) of c-C3F6 in the composition containing HFP was analyzed by gas chromatography (GC analysis).

[0069] The concentration (volume ppm) of HCl in the composition containing HFP was analyzed using a Fourier transform infrared spectrophotometer (FT-IR) to measure the initial concentration.

[0070] Compositions containing HFP were stored at constant temperatures (20°C and 50°C) for a set period of time (30 days, 90 days, and 180 days), after which the gas phase was extracted and hexafluoropropene (HFP)-derived decomposition products were analyzed by GC (ppm by volume).

[0071]

[0072] In the compositions of the examples containing HFP and c-C3F6 (150 ppm by volume, 50 ppm by volume, and 5 ppm by volume), the HCl concentration was adjusted (to 5 ppm by volume or less), and the generation of HFP-derived decomposition products or c-C3F6-derived decomposition products was successfully suppressed even after storage at constant temperatures (20°C and 50°C) for certain periods of time (30 days, 90 days, and 180 days).

[0073] [3-2] Investigation of the Lower Limit of Hydrogen Chloride (HCl) Content in the Composition (Example 3-2) A composition containing HFP and c-C3F6 (5 ppm by volume) and HCL was adjusted to a predetermined concentration (0.1 ppm by volume, 0.01 ppm by volume) to prepare a composition containing HCL, HFP, and c-C3F6 in a conventional manner.

[0074] The concentration of HCl (ppm by volume) in a composition consisting of HFP and c-C3F6 (5 ppm by volume) was analyzed by GC.

[0075] A composition consisting of HFP and c-C3F6 (5 ppm by volume) was stored at a constant temperature (20°C, 50°C). After a certain period of time (30 days, 90 days, 180 days), the gas phase was extracted and analyzed by GC (ppm by volume).

[0076]

[0077] When the HCl concentration in the composition was 0.1 ppm by volume, no decomposition products were observed. When the HCl concentration in the composition was 0.01 ppm by volume, decomposition products were detected.

[0078] [4] Industrial Applicability This disclosure discloses a method for stably transporting a composition containing HFP and c-C3F6. According to this disclosure, by adjusting the oxygen (O2), hydrogen fluoride (HF), or hydrogen chloride (HCl) concentration in the HFP-containing composition, it is possible to suppress decomposition of HFP or c-C3F6 when the HFP-containing composition is transported in a cylinder or the like, thereby suppressing a decrease in the purity of HFP or c-C3F6 in the HFP-containing composition and maintaining good storage stability of the HFP-containing composition.

[0079] The HFP-containing composition of the present disclosure contains hexafluorocyclopropane (c-C3F6), inhibits the production of HFP-derived decomposition products or c-C3F6-derived decomposition products, and has improved storage stability.Even under harsh conditions (such as temperature increases during transport) during maritime transport in containers, the decomposition of HFP or c-C3F6 is inhibited, enabling stable transportation.

Claims

1. A composition containing hexafluoropropene, comprising: (1) hexafluoropropene; (2) hexafluorocyclopropane; and (3) at least one component selected from the group consisting of oxygen, hydrogen fluoride, and hydrogen chloride, wherein, relative to the total amount of the composition, when the composition contains (3) oxygen, the content of (3) oxygen is 0.05 volume ppm or more and 10 volume ppm or less; when the composition contains (3) hydrogen fluoride, the content of (3) hydrogen fluoride is 0.05 volume ppm or more and 5 volume ppm or less; or when the composition contains (3) hydrogen chloride, the content of (3) hydrogen chloride is 0.05 volume ppm or more and 5 volume ppm or less.

2. The composition according to claim 1, comprising, relative to the total amount of the composition, (1) hexafluoropropene in an amount of 95% by volume to 99.99999% by volume, and (2) hexafluorocyclopropane in an amount of 1 ppm by volume to 1,000 ppm by volume.

3. A method for storing a composition containing hexafluoropropene, the composition containing (1) hexafluoropropene, (2) hexafluorocyclopropane, and (3) at least one component selected from the group consisting of oxygen, hydrogen fluoride, and hydrogen chloride, wherein, relative to the total amount of the composition, when the composition contains (3) oxygen, the content of (3) oxygen is 0.05 ppm by volume or more and 10 ppm by volume or less, when the composition contains (3) hydrogen fluoride, the content of (3) hydrogen fluoride is 0.05 ppm by volume or more and 5 ppm by volume or less, or when the composition contains (3) hydrogen chloride, the content of (3) hydrogen chloride is 0.05 ppm by volume or more and 5 ppm by volume or less.

4. The method according to claim 3, wherein the composition contains, relative to the total amount of the composition, (1) hexafluoropropene in an amount of 95% by volume to 99.99999% by volume, and (2) hexafluorocyclopropane in an amount of 1 ppm by volume to 1,000 ppm by volume.

5. A method for suppressing a decrease in the purity of hexafluoropropene in a composition containing hexafluoropropene, the composition comprising: (1) hexafluoropropene, (2) hexafluorocyclopropane, and (3) at least one component selected from the group consisting of oxygen, hydrogen fluoride, and hydrogen chloride, wherein, relative to the total amount of the composition, when the composition contains (3) oxygen, the content of (3) oxygen is 0.05 ppm by volume or more and 10 ppm by volume or less; when the composition contains (3) hydrogen fluoride, the content of (3) hydrogen fluoride is 0.05 ppm by volume or more and 5 ppm by volume or less; or when the composition contains (3) hydrogen chloride, the content of (3) hydrogen chloride is 0.05 ppm by volume or more and 5 ppm by volume or less.

6. The method according to claim 5, wherein the composition contains, relative to the total amount of the composition, (1) hexafluoropropene in an amount of 95% by volume to 99.99999% by volume, and (2) hexafluorocyclopropane in an amount of 1 ppm by volume to 1,000 ppm by volume.

Images