Quartz product degreasing and cleaning device

Abstract

A quartz product degreasing and cleaning device, comprising a vessel body (1) and a cover body (2) arranged on the vessel body (1), wherein the vessel body (1) is internally provided with an accommodating cavity (11), the accommodating cavity (11) comprises an accommodating space (112) for accommodating a quartz product and a support space (111) located below the accommodating space (112), a support member (3) for supporting the quartz product is provided in the support space (111), the support member (3) is provided with a plurality of support portions (31) extending in a strip shape on the bottom wall of the accommodating cavity (11), and a collection area (113) for collecting grease is formed between the plurality of support portions (31).

Description

A quartz product degreasing and cleaning device TECHNICAL FIELD

[0001] The application belongs to the field of quartz product cleaning, and particularly relates to a quartz product degreasing and cleaning device. BACKGROUND

[0002] With the development of science and technology, the application field of quartz products is wider and wider. Generally, the quartz products machined will have cutting fluid, adhesive wax and other greases and glue, which will affect the subsequent chemical cleaning process of the quartz products, and the quartz products need to be degreased and cleaned by equipment or tools.

[0003] Generally, a heating tank is used to degrease and clean the quartz products. However, the pollutants separated from the quartz products will sink downward under the action of gravity when the quartz products are directly put into the heating tank for boiling, and sink into the bottom of the heating tank and mix with the quartz products, which is easy to cause the quartz products to be polluted again or the quartz products to be washed again, thereby increasing the cleaning steps of the quartz products.

[0004] In addition, after the liquid medium in the heating tank is heated, the quartz products will produce large displacement and shaking under the driving action of the boiling liquid medium. When the quartz products frequently collide with the bottom wall of the heating tank, the structure of the quartz products may be damaged. Moreover, after the liquid medium in the heating tank is heated and boiled, the liquid medium is rapidly evaporated. When the liquid medium cannot immerse the quartz products, the cleaning of the quartz products in some areas will be imperfect, or the liquid medium in the heating tank needs to be frequently added, thereby increasing the degree of user operation complexity. SUMMARY

[0005] The application provides a quartz product degreasing and cleaning device to solve the problems of quartz product pollution caused by the mixing of pollutants and quartz products after cleaning, and the structure damage of the quartz products caused by the frequent collision of the quartz products with the bottom wall of the heating tank.

[0006] The technical scheme adopted by the application is as follows:

[0007] A quartz product degreasing and cleaning device, comprising a pot body and a cover body arranged in the pot body, the pot body has a containing cavity, the containing cavity comprises a containing space for containing quartz products and a supporting space located below the containing space, a supporting member for supporting the quartz products is arranged in the supporting space, the supporting member has a plurality of strip-shaped supporting portions extending on the bottom wall of the containing cavity, and a collection area for collecting grease is formed between the plurality of supporting portions.

[0008] The quartz product degreasing and cleaning device of the application also has the following additional technical features:

[0009] The support part extends along the radial direction of the pot body, and the cross-sectional height of at least a part of the support part gradually increases along the radial direction of the pot body outward, so as to form an inclined surface on the upper surface of the support part, which is inclined downward toward the axis of the pot body.

[0010] The plurality of support parts are provided with upward limiting protrusions at one end away from the axis of the pot body, and the plurality of limiting protrusions surround the quartz product.

[0011] The support part is provided with a communication port to communicate the plurality of collection areas.

[0012] The support part comprises a fixed end fixed to the bottom wall of the containing cavity and a support end for supporting the quartz product, the support end being above the fixed end, and the hardness of the support end is less than that of the fixed end.

[0013] The radial dimension of the cover body is greater than that of the pot body, and the cover body has a body and a drip part, and the lower edge of the drip part is lower than the lower edge of the body.

[0014] The sidewall of the support space is provided with a drainage hole, the drainage hole is communicated with the collection area, and the pot body is provided with a drainage valve for controlling the drainage hole at the position of the drainage hole.

[0015] The quartz product degreasing and cleaning device further comprises a support frame, the support frame has an equipment cavity therein, the top wall of the support frame is provided with a placing hole communicating with the equipment cavity, the top wall of the equipment cavity is provided with a heating disc, and the pot body passes through the placing hole and abuts against the heating disc from top to bottom.

[0016] The mouth of the placing hole is provided with a sealing gasket, and the upper edge of the sealing gasket is higher than the upper edge of the mouth.

[0017] The equipment cavity is provided with a control member, the control member is electrically connected with the heating disc, the control member is used for controlling the heating disc, the side of the control member is provided with a control button, the support frame comprises an opening and closing part to realize the opening and closing of the equipment cavity, and the control button is towards the opening and closing part.

[0018] Due to the adoption of the above technical scheme, the application has the following beneficial effects:

[0019] 1.The quartz product degreasing cleaning device provided by the application, comprising a kettle body and a cover body, the quartz products to be cleaned are placed in the containing space of the kettle body, and the kettle body and the cover body work together to provide a micro-pressure cleaning environment, and the liquid medium in the kettle body is heated to boiling, which can not only increase the temperature of the liquid medium, but also can improve the solubility of grease, glue and other lipid pollutants at high temperature, so as to improve the cleaning effect of the quartz products to be cleaned. In addition, the bubbles generated after the liquid medium is heated to boiling can pass through the structural gap of the quartz products, so as to clean the quartz products comprehensively and reduce the cleaning dead angle. Thirdly, the cover body covers the kettle body, which can not only provide a micro-pressure environment and increase the boiling temperature of the liquid medium, but also reduce the evaporation of the liquid medium after boiling, so as to reduce the diffusion of steam containing lipid substances, pollute the working environment, cause the cleaning pressure of the working environment, and avoid the problem that the liquid medium in the kettle body is evaporated to reduce the liquid medium, reduce the solubility of lipid pollutants, or cannot submerge the quartz products to reduce the cleaning efficiency and effect of the quartz products.

[0020] On this basis, the containing cavity comprises a containing space for containing quartz products and a supporting space below the containing space, and a supporting member for supporting the quartz products is arranged in the supporting space. The supporting member supports the quartz products to avoid direct contact between the quartz products and the kettle bottom, so as to avoid overheating damage to the quartz products caused by heat conduction between the quartz products and the kettle bottom during heating. Moreover, the supporting member supports the quartz products and limits the displacement of the quartz products, so as to reduce the shaking of the quartz products during boiling of the liquid medium and reduce the structural damage of the quartz products caused by collision with the kettle bottom.

[0021] In addition, the supporting member has a plurality of strip-shaped supporting portions extending on the bottom wall of the containing cavity, and a collection area for collecting grease is formed between the plurality of supporting portions. Some difficult-to-dissolve pollutants are separated from the quartz products and then sink downwardly and fall into the collection area. The supporting portions support the quartz products to reduce the recontact between the pollutants in the collection area and the quartz products, avoid repeated pollution of the quartz products, and thus improve the cleaning effect of the quartz products. In addition, the pollutants are concentrated in the collection area, which is also convenient for the re-cleaning of the kettle body.

[0022] 2. As a preferred embodiment of the present application, the support portion extends along the radial direction of the kettle body, and the cross-sectional height of at least a partial region of the support portion gradually increases along the radial direction of the kettle body outwardly, so as to form an inclined slope on the upper surface of the support portion, which is inclined downwardly toward the axis of the kettle body. When the quartz product is placed into the containing space, the inclined slope of the support portion guides the placement position of the quartz product, and the quartz product can slide along the inclined slope toward the axis of the kettle body, so as to push the quartz product to the central position of the kettle body. In the central position of the kettle body, the heating of the liquid medium is more uniform, thereby improving the uniformity of cleaning of the quartz product.

[0023] In addition, during the boiling of the liquid medium in the kettle body, the inclined slope inclined downwardly toward the axis of the kettle body hinders the horizontal position of the quartz product away from the axis of the kettle body, so as to reduce the horizontal displacement of the quartz product, thereby reducing the structural damage of the quartz product caused by the collision with the side wall of the kettle body. Even if the position of the quartz product is deviated due to the upward floating of the quartz product, the quartz product is guided by the inclined slope to fall back to the central position of the kettle body during the downward sinking of the quartz product under the action of gravity.

[0024] 3. As a preferred embodiment of the present application, the plurality of support portions are provided with upward limiting protrusions at the ends away from the axis of the kettle body, and the plurality of limiting protrusions surround the quartz product. The plurality of limiting protrusions surround the quartz product, limit the placement position of the quartz product, push the quartz product to the central position of the kettle body, and thereby improve the uniformity of cleaning of the quartz product. The plurality of limiting protrusions limit the horizontal displacement of the quartz product, reduce the horizontal shaking of the quartz product caused by the boiling of the liquid medium, reduce the displacement of the quartz product along the flow direction of the liquid medium, and make the boiling liquid medium flow more through the quartz product, thereby improving the cleaning effect of the quartz product.

[0025] In addition, the plurality of limiting protrusions surround the quartz product and are located between the quartz product and the side wall of the kettle body, so as to avoid the collision of the quartz product with the side wall of the kettle body caused by the pushing of the boiling liquid medium, and avoid the structural damage of the quartz product caused by the collision with the side wall of the kettle body.

[0026] 4. As a preferred embodiment of the present application, the radial dimension of the cover body is greater than the radial dimension of the kettle body, and the cover body has a body and a drip portion, and the lower edge of the drip portion is lower than the lower edge of the body. The radial dimension of the cover body is greater than the radial dimension of the kettle body, and the cover body can completely cover the opening of the kettle body, so as to provide a micro-pressure environment for the degreasing of the quartz product. In addition, when the user covers the cover body, the user can reduce the limitation on the covering position of the cover body, reduce the repeated covering attempt operation of the user, facilitate the covering operation of the user, and improve the operation experience of the user.

[0027] In addition, the cover has a body and a drip part, the lower edge of the drip part is lower than the lower edge of the body. The steam generated by the liquid medium in the accommodating cavity is condensed by the cold water on the lower surface of the cover, and flows downward along the lower surface of the cover to the drip part, thereby dripping back to the accommodating cavity from the drip part. In this way, the condensed water is prevented from dripping from the edge of the cover into the operation platform, thereby reducing the cleaning pressure on the operation platform. Moreover, the drip part protrudes downward towards the accommodating cavity, and the lower edge of the drip part is also lower than the edge of the mouth of the pot body. The drip part and the side wall of the pot body form a limiting action, which can reduce the horizontal displacement of the cover relative to the pot body, prevent the cover from being pushed off the pot body by the boiling gas, and improve the stability of the cover covering the pot body.

[0028] 5. As a preferred embodiment of the present application, the edge of the placement hole is provided with a sealing gasket, and the upper edge of the sealing gasket is higher than the upper edge of the edge. The sealing gasket seals between the pot body and the placement hole, first, the sealing gasket abuts against the outer side wall of the pot body, limiting the displacement of the pot body, and reducing the shaking of the pot body caused by the boiling of the liquid. In addition, the sealing gasket can reduce the water vapor entering the inside of the support frame from the placement hole, avoid pollution to the inside of the support frame, and avoid cleaning difficulties in the inside of the support frame.

[0029] Even if part of the condensed water drips from the edge of the cover, it will not directly fall into the inside of the support frame due to the sealing action of the sealing gasket, but will accumulate on the upper surface of the support frame. The upper edge of the sealing gasket is higher than the upper edge of the edge, which forms a shielding action on the liquid on the upper surface of the support frame, avoiding flowing into the inside of the support frame again. BRIEF DESCRIPTION OF DRAWINGS

[0030] The drawings described herein are used to provide further understanding of the present application, and form a part of the present application. The schematic embodiments of the present application and their descriptions are used to explain the present application, and do not constitute an improper limitation on the present application. In the drawings:

[0031] FIG. 1 is a structural schematic view of the pot body and the cover in an embodiment of the present application, wherein the support member is fixed in the support space;

[0032] FIG. 2 is a top view of the pot body in an embodiment of the present application, wherein the support member is fixed in the support space;

[0033] FIG. 3 is a structural schematic view of the support member in an embodiment of the present application;

[0034] FIG. 4 is a bottom view of the cover in an embodiment of the present application;

[0035] FIG. 5 is a structural schematic view of the quartz product degreasing and cleaning device in an embodiment of the present application;

[0036] Fig. 6 is a schematic view of a structure of the quartz product degreasing and cleaning device according to another embodiment of the present application;

[0037] Fig. 7 is a schematic view of a connection between the control member and the heating disc according to an embodiment of the present application;

[0038] Fig. 8 is a schematic view of a structure of the sealing gasket according to an embodiment of the present application.

[0039] Wherein, 1 pot body; 11 containing cavity; 111 supporting space; 112 containing space; 113 collection area; 12 drain hole; 13 drain valve; 14 operating handle; 2 cover body; 21 body; 22 drip part; 3 supporting member; 31 supporting part; 311 inclined slope; 312 limiting protrusion; 313 fixed end; 314 supporting end; 32 communication port; 4 supporting frame; 41 equipment cavity; 42 placing hole; 421 sealing gasket; 43 opening and closing part; 5 heating disc; 6 control member; 61 control button. DETAILED DESCRIPTION

[0040] In order to more clearly illustrate the overall concept of the present application, the following will be described in detail with reference to the accompanying drawings.

[0041] In the following description, a large number of specific details are set forth in order to provide a thorough understanding of the present application, however, the present application can also be implemented in other ways different from those described herein, therefore, the scope of protection of the present application is not limited by the specific embodiments disclosed below.

[0042] In addition, in the description of the present application, it should be understood that the terms "top", "bottom", "inner", "outer", "axial", "radial", "circumferential" and the like indicate the orientation or positional relationship based on the orientation or positional relationship shown in the drawings, and are only for the convenience of describing the present application and simplifying the description, and do not indicate or imply that the device or element referred to must have a particular orientation, be constructed and operated in a particular orientation, therefore, it cannot be understood as a limitation on the present application.

[0043] In the present application, unless otherwise explicitly specified and limited, the terms "mounting", "connection", "connecting", "fixing" and the like should be understood broadly, for example, it can be fixed connection, or detachable connection, or integral; it can be mechanical connection, or electrical connection, or communication; it can be direct connection, or indirect connection through intermediate medium; it can be the internal communication of two elements or the interaction relationship between two elements. For those skilled in the art, the specific meaning of the above terms in the present application can be understood according to the specific circumstances.

[0044] In the present application, unless otherwise explicitly specified and limited, the first feature is "on" or "under" the second feature can be that the first and second features are in direct contact, or the first and second features are indirectly in contact through an intermediate medium. In the description of the present specification, the description referring to the terms "embodiment", "example", "one embodiment", "exemplary" or "specific example" and the like means that the specific features, structures, materials or characteristics described in connection with the embodiment or example are included in at least one embodiment or example of the present application. In the present specification, the illustrative description of the above terms does not necessarily refer to the same embodiment or example. Moreover, the specific features, structures, materials or characteristics described can be combined in any appropriate manner in any one or more embodiments or examples.

[0045] As shown in FIG. 1, FIG. 2 and FIG. 5, a quartz product degreasing cleaning device includes a pot body 1 and a cover body 2 placed on the pot body 1, the pot body 1 has a containing cavity 11, the containing cavity 11 includes a containing space 112 for containing quartz products and a supporting space 111 below the containing space 112, the supporting space 111 is provided with a supporting piece 3 for supporting the quartz products, the supporting piece 3 has a plurality of strip-shaped supporting parts 31 extending on the bottom wall of the containing cavity 11, and a plurality of the supporting parts 31 form a collection area 113 for collecting grease.

[0046] It can be understood that the containing cavity 11 stores liquid medium, and the liquid medium in the pot body 1 is heated, so that the quartz products in the containing space 112 are cleaned by the heated liquid medium. The liquid medium used in the present application can be clean water, which is directly taken from a tap; or a medium that facilitates the dissolution of grease substances can be added to improve the cleaning effect.

[0047] It should be noted that the quartz product degreasing cleaning device in the present application is not only limited to cleaning oil and fat pollutants such as cutting fluid and adhesive wax attached to the quartz products, but is also applicable to cleaning dust and other pollutants.

[0048] As shown in FIG. 1 and FIG. 5, the quartz product degreasing cleaning device comprises a kettle body 1 and a cover body 2, the quartz products to be cleaned are placed in the containing space 112 of the kettle body 1, and the kettle body 1 and the cover body 2 work cooperatively to provide a micro-pressure cleaning environment and heat the liquid medium in the kettle body 1 to boiling. The liquid medium can be heated to a high temperature, and the high-temperature liquid medium can improve the dissolution of grease, glue and other lipid pollutants, thereby improving the cleaning effect on the quartz products to be cleaned. In addition, the bubbles generated after the liquid medium is heated to boiling can pass through the structural gaps of the quartz products, thereby cleaning the quartz products comprehensively and reducing the cleaning dead angle. Furthermore, the cover body 2 covers the kettle body 1, which can not only provide a micro-pressure environment and improve the boiling temperature of the liquid medium, but also reduce the evaporation of the liquid medium after boiling, thereby reducing the diffusion of the steam containing lipid substances, causing pollution of the working environment, and leading to the cleaning pressure on the working environment. In addition, the liquid medium in the kettle body 1 can be prevented from evaporating to reduce the amount of liquid medium, reduce the dissolution of lipid pollutants, or reduce the cleaning efficiency and effect of the quartz products due to the inability to immerse the quartz products.

[0049] The connection mode of the kettle body 1 and the cover body 2 is not limited in the present application. In one embodiment, as shown in FIG. 1 and FIG. 5, the cover body 2 and the kettle body 1 are in a split structure, and the cover body 2 is detachably placed in the kettle body 1. In another embodiment, the cover body 2 is hingedly connected to the kettle body 1, and the cover body 2 can rotate relative to the kettle body 1 to open and close the kettle body 1.

[0050] As shown in FIG. 1 and FIG. 2, the containing cavity 11 comprises a containing space 112 for containing the quartz products and a supporting space 111 below the containing space 112, and the supporting space 111 is provided with a supporting member 3 for supporting the quartz products. The supporting member 3 supports the quartz products to avoid direct contact between the quartz products and the kettle bottom, thereby avoiding overheating damage to the quartz products due to heat conduction between the quartz products and the kettle bottom during heating. Furthermore, the supporting member 3 supports the quartz products and limits the displacement of the quartz products, thereby reducing the shaking of the quartz products during boiling of the liquid medium and reducing the structural damage of the quartz products due to collision with the kettle bottom.

[0051] The formation mode of the supporting member 3 is not limited in the present application. In one embodiment, the upper surface of the bottom wall of the kettle body 1 is raised to form the supporting member 3. In another embodiment, as shown in FIG. 1 to FIG. 3, the supporting member 3 is separately processed and formed and fixed to the upper surface of the bottom wall of the kettle body 1.

[0052] As shown in FIG. 1 and FIG. 2, the support 3 has a plurality of support portions 31 extending in strips on the bottom wall of the accommodating cavity 11, and a collection area 113 for collecting fat is formed between the plurality of support portions 31. The partially insoluble contaminants fall into the collection area 113 after being separated from the quartz products and sinking downward. The support portions 31 support the quartz products, reduce the re-contact of the contaminants in the collection area 113 with the quartz products, avoid repeated contamination of the quartz products, and thus improve the cleaning effect on the quartz products. In addition, the contaminants are concentrated in the collection area 113, which is also convenient for the re-cleaning of the kettle 1.

[0053] The present application does not limit the extending direction of the support portions 31. In an embodiment, as shown in FIG. 1 to FIG. 3, the support portions 31 extend along the radial direction of the kettle 1, and are fixed to the inner surface of the bottom wall of the kettle 1 to form the support 3. In another embodiment, the support portions 31 extend along the circumferential direction of the kettle 1, and a plurality of support portions 31 are arranged in the radial direction of the kettle 1 at intervals to form the support 3.

[0054] As a preferred embodiment of the present application, as shown in FIG. 1 to FIG. 3, the support portions 31 extend along the radial direction of the kettle 1, and the cross-sectional height of at least a part of the support portions 31 gradually increases outward along the radial direction of the kettle 1 to form an inclined slope 311 inclined downward toward the axis of the kettle 1 on the upper surface of the support portions 31.

[0055] It should be noted that the support portions 31 can extend linearly along the radial direction of the kettle 1, or can extend in a curve along the radial direction of the kettle 1, and the present application does not limit this.

[0056] When the quartz products are placed in the accommodating space 112, the inclined slope 311 of the support portions 31 guides the placement position of the quartz products, and the quartz products can slide along the inclined slope 311 toward the axis of the kettle 1 to push the quartz products to the central position of the kettle 1. In the central position of the kettle 1, the heating of the liquid medium is more uniform, thereby improving the uniformity of the cleaning of the quartz products.

[0057] In addition, during the boiling of the liquid medium in the kettle 1, the inclined slope 311 inclined downward toward the axis of the kettle 1 hinders the horizontal position of the quartz products away from the axis of the kettle 1, thereby reducing the horizontal displacement of the quartz products, and thus reducing the structural damage of the quartz products caused by the collision of the quartz products with the side wall of the kettle 1. Even if the quartz products are offset due to upward floating, the quartz products fall back to the central position of the kettle 1 under the action of gravity during the downward sinking process, and are guided by the inclined slope 311.

[0058] Specifically, as shown in FIG. 1 to FIG. 3, the support part 31 extends linearly along the radial direction of the kettle body 1 and extends from the axis of the kettle body 1 to the inner surface of the side wall of the kettle body 1. Thus, the support area for supporting the quartz product is increased, the space of the kettle body 1 accommodating cavity 11 is fully utilized, and the size of the quartz product degreasing and cleaning device is suitable for the quartz product. The plurality of support parts 31 intersect at the center of the kettle body 1, and after being assembled into a complete support piece 3, they are fixed to the inner surface of the bottom wall of the kettle body 1. Thus, the fixing of the support part 31 in the kettle body 1 is facilitated.

[0059] Alternatively, the support part 31 extends linearly along the radial direction of the kettle body 1 and extends radially outward from the axis of the kettle body 1. The end of the support part 31 away from the axis of the kettle body 1 has a gap with the inner side wall of the kettle body 1. This facilitates the installation of the support piece 3 on the kettle body 1.

[0060] As an embodiment of the present embodiment, as shown in FIG. 3, the end of the plurality of support parts 31 away from the axis of the kettle body 1 is provided with an upward limiting protrusion 312, and the plurality of limiting protrusions 312 surround the quartz product. The plurality of limiting protrusions 312 surround the quartz product, limit the placement position of the quartz product, push the quartz product to be placed at the center of the kettle body 1, and thus improve the uniformity of cleaning the quartz product. The plurality of limiting protrusions 312 limit the horizontal displacement of the quartz product, reduce the horizontal shaking of the quartz product caused by the boiling of the liquid medium, reduce the displacement of the quartz product along the flow direction of the liquid medium, and make the boiling liquid medium flow more through the quartz product, thereby improving the cleaning effect of the quartz product.

[0061] Moreover, the plurality of limiting protrusions 312 surround the quartz product and are located between the quartz product and the side wall of the kettle body 1, which can avoid the collision between the quartz product and the side wall of the kettle body 1 caused by the boiling of the liquid medium, and avoid the structural damage caused by the collision between the quartz product and the side wall of the kettle body 1.

[0062] As another embodiment of the present embodiment, as shown in FIG. 3, the support part 31 is provided with a communication port 32 to connect the plurality of collection areas 113. The communication port 32 connects the plurality of collection areas 113, which facilitates the discharge of the liquid medium in the plurality of collection areas 113, and also facilitates the cleaning of the pollutants in the plurality of collection areas 113, thereby avoiding the cumbersome operation caused by separately discharging the liquid medium and cleaning the pollutants in the collection areas 113.

[0063] Specifically, the support piece 3 is composed of a plurality of support parts 31, and the plurality of support parts 31 have gaps and do not contact each other, and the gaps form the communication port 32.

[0064] Alternatively, as shown in FIG. 3, the support 3 is composed of a plurality of support portions 31 which are spliced to form the support portion 31. The support portion 31 is provided with a communication gap. The upper edge of the communication gap is lower than the upper edge of the body of the support portion 31. The plurality of collection areas 113 are communicated through the communication gap.

[0065] As another embodiment of the present application, as shown in FIG. 3, the support portion 31 comprises a fixed end 313 fixed to the bottom wall of the accommodating cavity 11 and a support end 314 for supporting the quartz product, the support end 314 is located above the fixed end 313, and the hardness of the support end 314 is lower than that of the fixed end 313. The fixed end 313 fixed to the bottom wall of the pot body 1 has high hardness, thereby facilitating the fixing operation with the bottom wall of the pot body 1 and avoiding the inclination caused by the deformation during the fixing process. The support end 314 for supporting the quartz product has relatively low hardness, and the quartz product is shaken by the pushing of the boiling liquid medium, and in the process of colliding with the support end 314, the quartz product can be protected from structural damage.

[0066] Specifically, as shown in FIG. 3, the support portion 31 has a two-layer splicing structure, the lower layer structure is made of metal material such as stainless steel to form the fixed end 313. The lower layer structure is made of material such as nylon and heat-resistant rubber to form the support end 314.

[0067] As a preferred embodiment of the present application, as shown in FIG. 1 and FIG. 5, the radial dimension of the cover body 2 is greater than the radial dimension of the pot body 1, the cover body 2 has a body 21 and a drip portion 22, and the lower edge of the drip portion 22 is lower than the lower edge of the body 21. The radial dimension of the cover body 2 is greater than the radial dimension of the pot body 1, and the cover body 2 can completely cover the opening of the pot body 1, thereby providing a micro-pressure environment for the degreasing of the quartz product. Moreover, when the user covers the cover body 2, the user can reduce the limitation on the covering position of the cover body 2, reduce the repeated covering attempt operation of the user, facilitate the covering operation of the user, and improve the operation experience of the user.

[0068] In addition, as shown in FIG. 4, the cover 2 has a body 21 and a drip part 22, the lower edge of the drip part 22 is lower than the lower edge of the body 21. The steam generated by the liquid medium in the accommodating cavity 11 is condensed on the lower surface of the cover 2 when it encounters cold water, and flows downward along the lower surface of the cover 2 to the drip part 22, and then drips back into the accommodating cavity 11 from the drip part 22. In this way, the condensed water is prevented from dripping from the edge of the cover 2 and falling into the operation platform, reducing the cleaning pressure on the operation platform. Moreover, the drip part 22 protrudes downward towards the accommodating cavity 11, and the lower edge of the drip part 22 is also lower than the edge of the mouth of the pot body 1. The drip part 22 forms a limiting action with the side wall of the pot body 1, which can reduce the horizontal displacement of the cover 2 relative to the pot body 1, prevent the cover 2 from being pushed off the pot body 1 by the boiling gas, and improve the stability of the cover 2 covering the pot body 1.

[0069] As a preferred embodiment of the present application, as shown in FIG. 1 and FIG. 2, a drain hole 12 is arranged on the side wall of the support space 111, the drain hole 12 is in communication with the collection area 113, and the pot body 1 is provided with a drain valve 13 for controlling the drain hole 12 at the position of the drain hole 12. The drain hole 12 is arranged on the side wall of the support space 111, located on the lower side of the side wall of the pot body 1, which facilitates the discharge of the liquid medium in the accommodating cavity 11 through the drain hole 12, and avoids the operation of lifting and tilting the pot body 1, making the operation of the quartz product degreasing and cleaning device more labor-saving. The drain hole 12 is in communication with the collection area 113, which avoids the obstruction of the support part 31 to the drain hole 12 and causes poor drainage. The drain valve 13 controls the drain hole 12, which facilitates the user to set the drainage time and drainage speed, and avoids the liquid medium dripping downward along the drain hole 12 to the operation platform, which causes cleaning annoyance. The control of the drainage speed can also avoid the splashing of the water flow caused by the too fast drainage speed.

[0070] Specifically, as shown in FIG. 2 and FIG. 5, the pot body 1 is provided with two operation handles 14 on the two sides of the radial direction of the side wall, and in the downward projection, the drain hole 12 is arranged separately from the two operation handles 14, i.e. the drain hole 12 and the two operation handles 14 are not located on the same radial direction. Preferably, the two operation handles 14 are oppositely arranged along the first radial direction of the pot body 1, and the drain hole 12 is located on any one side of the two sides of the second radial direction of the pot body 1, and the first radial direction is perpendicular to the second radial direction. In this way, the user can lift the pot body 1 by operating the operation handles 14, and tilt the pot body 1 to the direction of the drain hole 12, which facilitates the discharge of the liquid medium through the drain hole 12, is more in line with the operation habit of the user, and can avoid the splashing of the discharged liquid medium to the clothes of the user.

[0071] Specifically, the height of the pot body 1 is 300 mm, and the center of the drain hole 12 is 50 mm away from the bottom wall of the pot body 1, which facilitates the replacement of the liquid medium.

[0072] As a preferred embodiment of the present application, as shown in FIG. 5 and FIG. 6, the quartz product degreasing and cleaning device further comprises a support frame 4, the support frame 4 has an equipment cavity 41 inside, the top wall of the support frame 4 is provided with a placing hole 42 communicating with the equipment cavity 41, and the top wall of the equipment cavity 41 is provided with a heating disc 5, the pot body 1 passes through the placing hole 42 and abuts against the heating disc 5 from top to bottom. The support frame 4 can elevate the pot body 1, thereby facilitating the operation and observation of the user on the pot body 1. The support frame 4 has the equipment cavity 41 inside, and the top wall of the equipment cavity 41 is provided with the heating disc 5, which can avoid the misoperation or miscontact of the user on the heating disc 5, and also can avoid the damage of the heating disc 5 caused by the collision with the external structure.

[0073] The pot body 1 passes through the placing hole 42 and abuts against the heating disc 5 from top to bottom, and the placing hole 42 limits the placement position of the pot body 1. The pot body 1 is placed at the position corresponding to the placing hole 42, so that the abutment and heating of the pot body 1 and the heating disc 5 can be realized. Thus, the problem that part of the heating area of the heating disc 5 cannot heat the pot body 1 due to the mispositioning of the pot body 1 and the heating disc 5, and the problem that the heating efficiency of the heating disc 5 cannot be fully utilized can be avoided. In addition, the problem that the cleaning of the quartz product is uneven due to the uneven heating of the pot body 1 by the heating disc 5 can also be avoided.

[0074] Specifically, the heating disc 5 is selected to be an integrated heating disc. Not only can the integrated heating disc prevent the damage of the heating disc 5 caused by the collision of the article with the upper surface of the heating disc 5 through the placing hole 42, but also can reduce the damage of the heating disc 5 caused by the invasion of water vapor into the circuit part of the heating disc 5, so that the heating disc 5 is more durable and waterproof. In addition, when the heating disc 5 is damaged, the overall replacement and maintenance of the heating disc 5 is also facilitated.

[0075] As an embodiment of the present embodiment, as shown in FIG. 5, FIG. 6 and FIG. 8, the mouth of the placing hole 42 is provided with a sealing gasket 421, and the upper edge of the sealing gasket 421 is higher than the upper edge of the mouth. The sealing gasket 421 forms a seal between the pot body 1 and the placing hole 42. First, the sealing gasket 421 abuts against the outer side wall of the pot body 1, which limits the displacement of the pot body 1 and can reduce the shaking of the pot body 1 caused by the boiling of the liquid. In addition, the sealing gasket 421 can reduce the entry of water vapor from the placing hole 42 into the inside of the support frame 4, avoid the pollution of the inside of the support frame 4, and avoid the difficulty in cleaning the inside of the support frame 4.

[0076] Even if part of the condensed water drips from the edge of the cover body 2, it will not directly fall into the inside of the support frame 4 due to the sealing effect of the sealing gasket 421, but will accumulate on the upper surface of the support frame 4. The upper edge of the sealing gasket 421 is higher than the upper edge of the mouth, which forms a shielding effect on the liquid on the upper surface of the support frame 4, thereby avoiding the reflow into the inside of the support frame 4.

[0077] Specifically, as shown in FIG. 8, the upper surface of the sealing gasket 421 is formed with a radial outward and downward inclined surface. In this way, the contact area between the sealing gasket 421 and the kettle body 1 is increased, and the supporting effect on the kettle body 1 is improved, so as to avoid the shaking of the kettle body 1 due to the boiling of the liquid. In addition, for the condensed water falling on the upper surface of the sealing gasket 421, it can also flow outward along the inclined surface and flow into the upper surface of the support frame 4, without flowing into the support frame 4 through the placing hole 42.

[0078] The sealing gasket 421 is made of a heat-resistant rubber material. Under the extrusion of the kettle body 1, the heat-resistant rubber can be deformed, so as to facilitate the kettle body 1 to pass through the placing hole 42 from top to bottom, and avoid the structural collision between the kettle body 1 and the kettle body 1. In addition, after the kettle body 1 is placed in place, the heat-resistant rubber is extruded to the kettle body 1 under the elastic force, so as to improve the sealing effect of the placing hole 42. Moreover, the heat-resistant rubber can withstand high temperature, avoid aging caused by contact with the heated kettle body 1, and improve the service life of the sealing gasket 421.

[0079] As another embodiment of the present embodiment, as shown in FIGS. 5 to 7, the device cavity 41 is provided with a control member 6, the control member 6 is electrically connected with the heating disc 5, the control member 6 is used for controlling the heating disc 5, the side of the control member 6 is provided with a control button 61, the support frame 4 includes an opening and closing part 43 to realize the opening and closing of the device cavity 41, and the control button 61 faces the opening and closing part 43. The heating disc 5 is controlled by the control member 6, the heating temperature, heating time, constant temperature control, timing reminder and the like are set, the quantitative control of the degreasing and cleaning of the quartz product is improved, and the error caused by the artificial judgment of the cleaning effect is reduced. When the cleaning effect is artificially judged, not only the surface of the quartz product cannot be observed due to the shielding of the liquid medium, but also the cleaning effect of the lower surface and internal structure gap of the quartz product cannot be observed due to the shielding of the quartz product itself, and the error probability of the artificial observation and judgment of the cleaning effect is relatively large.

[0080] The control member 6 is arranged in the device cavity 41, so as to avoid the mistaken contact operation of the control member 6 and reduce the interruption of the degreasing and cleaning process caused by the error. The control button 61 faces the opening and closing part 43, the opening and closing part 43 is closed to realize the closing of the device cavity 41, and the opening and closing part 43 is opened, so as to facilitate the observation and operation of the user on the operation button.

[0081] It should be noted that the degreasing and cleaning device for quartz product in the application realizes the heating of the kettle body 1 through the heating disc 5 and the control member 6 which are separate from the kettle body 1, so as to realize the degreasing and cleaning of the quartz product. When the user uses the degreasing and cleaning device for quartz product, the user can arbitrarily select an ordinary kettle body 1 for use.

[0082] The application can also integrate the heating disc 5 and the control member 6 in the pot body 1, and realize the heating and heating control of the internal liquid medium through the integrated pot body 1. The support frame 4 only provides an operation platform and supports the integrated pot body 1. The application does not limit this implementation mode.

[0083] The places not mentioned in the application can be realized by using or referring to the existing technology.

[0084] Each embodiment in the specification is described in a progressive manner, and the same or similar parts between each embodiment can be referred to each other. Each embodiment mainly describes the difference from other embodiments.

[0085] The above only describes the embodiments of the application and is not used to limit the application. The application can have various changes and modifications for those skilled in the art. Any modification, equivalent replacement, improvement, etc. within the spirit and principle of the application shall be included in the scope of claims of the application.

Claims

1. A device for degreasing and cleaning a quartz product, characterized by, The quartz product degreasing and cleaning device comprises a kettle body and a cover body arranged on the kettle body, the kettle body has a containing cavity, the containing cavity comprises a containing space for containing quartz products and a supporting space below the containing space, the supporting space is provided with a supporting member for supporting the quartz products, the supporting member has a plurality of strip-shaped supporting portions extending on the bottom wall of the containing cavity, and a plurality of the supporting portions form a collection area for collecting fat.

2. The quartz product degreasing and cleaning device according to claim 1, wherein the supporting portions extend along the radial direction of the kettle body, and the cross-sectional height of at least a part of the supporting portions gradually increases along the radial direction of the kettle body outward, so as to form an inclined surface on the upper surface of the supporting portions, which is inclined downward and towards the axis of the kettle body.

3. The quartz product degreasing and cleaning device according to claim 2, wherein the end of the plurality of supporting portions away from the axis of the kettle body is provided with an upward limiting protrusion, and a plurality of the limiting protrusions surround the quartz products.

4. The quartz product degreasing and cleaning device according to claim 1, wherein the supporting portions are provided with a communication port, so that a plurality of the collection areas are in communication.

5. The quartz product degreasing and cleaning device according to claim 1, wherein the supporting portions comprise a fixed end fixed to the bottom wall of the containing cavity and a supporting end for supporting the quartz products, the supporting end is above the fixed end, and the hardness of the supporting end is less than that of the fixed end.

6. The quartz product degreasing and cleaning device according to claim 1, wherein the radial dimension of the cover body is greater than that of the kettle body, the cover body has a body and a drip part, and the lower edge of the drip part is lower than that of the body.

7. The quartz product degreasing and cleaning device according to claim 1, wherein the side wall of the supporting space is provided with a drain hole in communication with the collection area, and the kettle body is provided with a drain valve for controlling the drain hole at the position of the drain hole.

8. The quartz product degreasing and cleaning device according to claim 1, wherein the quartz product degreasing and cleaning device further comprises a supporting frame, the supporting frame has an equipment cavity, the top wall of the supporting frame is provided with a placing hole in communication with the equipment cavity, and the top wall of the equipment cavity is provided with a heating disc, and the kettle body passes through the placing hole and abuts against the heating disc from top to bottom.

9. The quartz product degreasing and cleaning device according to claim 8, wherein the rim of the placing hole is provided with a sealing gasket, and the upper edge of the sealing gasket is higher than that of the rim.

10. The quartz product degreasing and cleaning device according to claim 8, wherein the equipment cavity is provided with a control member, the control member is electrically connected with the heating disc, the control member is used for controlling the heating disc, the side of the control member is provided with a control button, the supporting frame comprises an opening and closing part to realize the opening and closing of the equipment cavity, and the control button is towards the opening and closing part. ​ ​ ​ ​ ​ ​ ​ ​ ​

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