Fluid control device and fluid mixing device

Abstract

The present invention is for increasing the speed of gas supply without complicating the configuration of a mixing manifold or the like on the downstream side of a fluid control device. The present invention is a fluid control device into which a first fluid and a second fluid are each introduced and which mixes and discharges the first fluid and the second fluid, the fluid control device comprising: a channel block in which are formed a first channel into which the first fluid is introduced, a second channel into which the second fluid is introduced, and a confluence channel to which the first channel and the second channel are connected; a first fluid resistance provided in the first channel; a first control valve provided on the upstream side or the downstream side of the first fluid resistance in the first channel to control the first fluid; a second fluid resistance provided in the second channel; and a second control valve provided on the upstream side or the downstream side of the first fluid resistance in the second channel to control the second fluid.

Description

Fluid control device and fluid mixing device

[0001] The present invention relates to a fluid control device and a fluid mixing device.

[0002] For example, in semiconductor manufacturing processes such as etching, a gas mixing device is used, as shown in Figure 9, to mix multiple process gases and supply them to a process chamber. This gas mixing device comprises multiple mass flow controllers (MFCs) and a mixing manifold that communicates with each of the MFCs to mix the multiple process gases. The gases mixed in the mixing manifold are supplied to the process chamber via a flow splitter.

[0003] In recent semiconductor manufacturing processes, a large flow rate (e.g., 100 sccm) of gas and a small flow rate (e.g., 1 sccm) of gas are sometimes mixed in the mixing manifold of a gas mixing device. In this case, the rate of gas supply to the process chamber is limited by the rate of the small flow rate of gas. As a result, there is a problem in that it is difficult to increase the gas supply rate to the process chamber.

[0004] On the other hand, as shown in Patent Document 1, a gas mixing device has been considered in which a mixing manifold communicating with each of the multiple MFCs is equipped with multiple outlet valves. In this gas mixing device, the delay time of the MFC with the smallest flow rate is minimized by opening the outlet valve closest to the MFC with the smallest flow rate.

[0005] However, if multiple outlet valves are provided in the mixing manifold, not only does the configuration of the mixing manifold become more complex, but piping must also be connected to each of these outlet valves, making the configuration of the fluid mixing device more complex and larger.

[0006] Patent No. 5377513

[0007] Therefore, the present invention has been made to solve the above-mentioned problems, and aims to increase the speed of gas supply without complicating the configuration of the mixing manifold and other components downstream of the fluid control device.

[0008] In other words, the fluid control device according to the present invention is a fluid control device into which a first fluid and a second fluid are introduced, and which mixes and discharges the first fluid and the second fluid, and is characterized by comprising: a flow path block in which a first flow path into which the first fluid is introduced, a second flow path into which the second fluid is introduced, and a confluence flow path to which the first flow path and the second flow path are connected; a first fluid resistor provided in the first flow path; a first control valve provided upstream or downstream of the first fluid resistor in the first flow path for controlling the first fluid; a second fluid resistor provided in the second flow path; and a second control valve provided upstream or downstream of the first fluid resistor in the second flow path for controlling the second fluid.

[0009] In such a fluid control device, the flow path block has a first flow path through which the first fluid is controlled, a second flow path through which the second fluid is controlled, and a merging flow path to which they are connected. As a result, the first and second fluids are mixed and discharged in the merging flow path. Consequently, even if, for example, one of the first or second fluids has a high flow rate and the other has a low flow rate, the low-flow fluid is discharged from the fluid control device together with the high-flow fluid. This prevents the flow rate of the second fluid from becoming the rate-limiting factor, and allows for a faster supply speed to the downstream side of the fluid control device. Furthermore, by forming the first flow path, second flow path, and merging flow path in the flow path block, the volume from the first fluid resistance or first control valve to the merging flow path in the first flow path, or the volume from the second fluid resistance or second control valve to the merging flow path in the second flow path, can be reduced, shortening the time it takes for the first or second fluid to reach the merging flow path. This also allows for a faster supply speed to the downstream side of the fluid control device.

[0010] The fluid control device of the present invention further comprises a valve control unit that controls the first control valve and the second control valve, and it is desirable that the valve control unit sets the set flow rate of the second control valve to 1 / 10 or less compared to the set flow rate of the first control valve. With this configuration, the flow rate of the second fluid controlled by the second control valve becomes 1 / 10 of the flow rate of the first fluid controlled by the first control valve, and the effects of the present invention can be made even more pronounced. In other words, the mixed fluid of the first and second fluids can be supplied at high speed to the downstream side of the fluid control device without the flow rate of the second fluid becoming the rate-limiting factor.

[0011] Regarding the specific arrangement of fluid devices provided in each flow path, it is conceivable that the first control valve is provided upstream of the first fluid resistance in the first flow path, and the second control valve is provided upstream of the second fluid resistance in the second flow path. In this configuration, in order to shorten the time it takes for the second fluid, which has a small flow rate, to reach the confluence flow path, it is desirable that the volume from the downstream side of the second fluid resistance in the second flow path to the connection point with the confluence flow path be 1 cc or less.

[0012] Another specific arrangement of the fluid devices provided in each flow path is such that the first control valve is provided downstream of the first fluid resistance in the first flow path, and the second control valve is provided downstream of the second fluid resistance in the second flow path. In this configuration, in order to shorten the time it takes for the small-flow second fluid to reach the confluence flow path, it is desirable that the volume from the downstream side of the second control valve in the second flow path to the connection point with the confluence flow path be 1 cc or less.

[0013] In order to supply the mixed fluid of the first fluid and the second fluid to the downstream side of the fluid control device at high speed, it is desirable that the total volume of the first channel, the second channel, and the confluence channel formed in the channel block be 50 cc or less.

[0014] In terms of specific implementation of the valve control unit, it is desirable that the valve control unit sets the sum of the set flow rate of the first control valve and the set flow rate of the second control valve to 2000 sccm or less.

[0015] In order to prevent backflow into the second channel through which a small flow rate is transmitted, it is desirable that the diameter of the connecting channel portion of the first channel connected to the confluence channel be 1.5 times or more the diameter of the connecting channel portion of the second channel connected to the confluence channel.

[0016] It is desirable that a first upstream pressure sensor is provided upstream of the first fluid resistance, a first downstream pressure sensor is provided downstream of the first fluid resistance, a second upstream pressure sensor is provided upstream of the second fluid resistance, and a second downstream pressure sensor is provided downstream of the second fluid resistance. With this configuration, not only can the differential pressure across the first fluid resistance be accurately measured, but the flow rate of the first fluid flowing through the first channel can also be measured. Furthermore, it is desirable that the differential pressure across the second fluid resistance be accurately measured, and the flow rate of the second fluid flowing through the second channel can also be measured.

[0017] To simplify the configuration of the fluid control device, it is desirable that the first downstream pressure sensor and the second downstream pressure sensor be common pressure sensors provided in the confluence flow path.

[0018] Furthermore, the fluid mixing apparatus according to the present invention is characterized by comprising a mixing manifold having an introduction port into which each of a plurality of fluids is introduced, mixing and discharging the plurality of fluids introduced from these introduction ports, and the above-mentioned fluid control device connected to the introduction ports.

[0019] Thus, according to the present invention, it is possible to increase the speed of gas supply without complicating the configuration of the manifold and other components downstream of the fluid control device.

[0020] This figure schematically shows the configuration of a fluid mixing device according to the first embodiment of the present invention. This is a schematic side view showing the configuration of a fluid mixing control device according to the first embodiment. This is a schematic plan view showing the configuration of a fluid mixing control device according to the first embodiment. This is a cross-sectional view showing the flow path connection portion in the second flow path of the first embodiment. This figure shows the simulation results of the response time in the first embodiment. This figure schematically shows the configuration of a fluid mixing device according to the second embodiment of the present invention. This figure shows the downstream configuration of each fluid resistance in the second embodiment. This figure schematically shows the configuration of a fluid mixing device in a modified embodiment. This figure schematically shows the configuration of a conventional fluid mixing device.

[0021] The following describes various embodiments of a fluid mixing apparatus using the fluid control device according to the present invention with reference to the drawings. Note that, for clarity, all the following figures are schematic representations, with some details omitted or exaggerated as appropriate. The same components are denoted by the same reference numerals, and their descriptions are omitted as appropriate.

[0022] <First Embodiment> The fluid mixing apparatus 100 of the first embodiment is used, for example, in semiconductor manufacturing processes such as etching. As shown in Figure 1, this fluid mixing apparatus 100 mixes multiple gases and supplies them to the process chamber 10. In Figure 1, the mixed gas supplied from the fluid mixing apparatus 100 is supplied to the process chamber 10 via a flow splitter 5.

[0023] Specifically, as shown in Figure 1, the fluid mixing device 100 comprises a mixing manifold 2 having a plurality of inlet ports P1 to P3, and a plurality of fluid control devices 3A to 3C connected to each of the plurality of inlet ports P1 to P3.

[0024] The mixing manifold 2 mixes multiple gases introduced from multiple inlet ports P1 to P3 and discharges the mixture from outlet port P0. Different gases are introduced into each of the multiple inlet ports P1 to P3. The gases introduced into each inlet port P1 to P3 may be single-component gases or gases that are mixtures of multiple components. The outlet port P0 is connected to the flow splitter 5 via piping 4.

[0025] Multiple fluid control devices 3A to 3C are each connected to different inlet ports P1 to P3. Each fluid control device 3A to 3C may be directly connected to inlet ports P1 to P3, or connected via piping 61 to 63. In this embodiment, one fluid control device 3A (hereinafter also referred to as mixed fluid control device 3A) is configured to control the flow rates of multiple gases, mix them, and supply them to inlet port P1. The other fluid control devices 3B and 3C are configured to control the flow rate of one gas and supply it to inlet ports P2 and P3. The other fluid control devices 3B and 3C are mass flow controllers (MFCs) having fluid control valves and flow sensors.

[0026] <Specific configuration of the mixed fluid control device 3A> The mixed fluid control device 3A receives the first gas and the second gas, mixes them, and outputs the mixture.

[0027] Specifically, the mixed fluid control device 3A is a mass flow controller (MFC), as shown in Figures 1 to 3. The mixed fluid control device 3A includes a flow path block 310 in which a first flow path 31a into which a first gas is introduced, a second flow path 31b into which a second gas is introduced, and a confluence flow path 32 into which the first and second gases are mixed, to which the first and second flow paths 31a and 31b are connected. A first gas port GP1 is provided at the upstream end of the first flow path 31a, and a second gas port GP2 is provided at the upstream end of the second flow path 31b. A mixed gas port GP3 ​​is provided at the downstream end of the confluence flow path 32.

[0028] The flow channel block 310 is a metal block with a rectangular parallelepiped shape. In this flow channel block 310, a first gas port GP1 and a second gas port GP2 are formed on, for example, the lower surface of one end in the longitudinal direction, and a mixing gas port GP3 ​​is formed on, for example, the lower surface of the other end in the longitudinal direction. In addition, in the flow channel block 310, the first flow channel 31a and the second flow channel 31b are formed along the longitudinal direction in a plan view and are arranged side by side in the short direction (see Figures 2 and 3).

[0029] Furthermore, the mixed fluid control device 3A includes a first fluid resistor 33a provided in the first flow path 31a, a first control valve 34a provided downstream of the first fluid resistor 33a in the first flow path 31a for controlling the first gas, a second fluid resistor 33b provided in the second flow path 31b, and a second control valve 34b provided downstream of the second fluid resistor 33b in the second flow path 31b for controlling the second gas.

[0030] The first fluid resistor 33a and the second fluid resistor 33b are resistive elements having resistive flow paths, such as restrictors or orifices, and are arranged side by side in the short direction in the flow path block 310 (see Figure 3). The first control valve 34a and the second control valve 34b are, for example, piezo valves or solenoid valves, and are arranged side by side in the short direction in the flow path block 310 (see Figure 3). The first fluid resistor 33a and the first control valve 34a are arranged in the longitudinal direction along the first flow path 31a. Similarly, the second fluid resistor 33b and the second control valve 34b are arranged in the longitudinal direction along the second flow path 31b.

[0031] In the first flow path 31a, a first upstream pressure sensor 35a is provided upstream of the first fluid resistance 33a, and a first downstream pressure sensor 36a is provided downstream of the first fluid resistance 33a. The first downstream pressure sensor 36a is provided upstream of the first control valve 34a. The first upstream pressure sensor 35a and the first downstream pressure sensor 36a constitute a flow sensor for measuring the flow rate of the first gas. The first upstream pressure sensor 35a and the first downstream pressure sensor 36a are arranged along the longitudinal direction together with the first fluid resistance 33a and the first control valve 34a (see Figures 2 and 3). The flow rate calculation unit 371 of the control unit 37, which will be described later, calculates the flow rate of the first gas using the upstream pressure of the first fluid resistance 32a detected by the first upstream pressure sensor 35a and the downstream pressure of the first fluid resistance 32a detected by the first downstream pressure sensor 36a.

[0032] Furthermore, in the second flow path 31b, a second upstream pressure sensor 35b is provided upstream of the second fluid resistance 33b, and a second downstream pressure sensor 36b is provided downstream of the second fluid resistance 33b. The second downstream pressure sensor 36b is provided upstream of the second control valve 34b. The second upstream pressure sensor 35b and the second downstream pressure sensor 36b constitute a flow sensor for measuring the flow rate of the second gas. The second upstream pressure sensor 35b and the second downstream pressure sensor 36b are arranged along the longitudinal direction together with the second fluid resistance 33b and the second control valve 34b (see Figures 2 and 3). The flow rate calculation unit 371 of the control unit 37, which will be described later, calculates the flow rate of the second gas using the upstream pressure of the second fluid resistance 32b detected by the second upstream pressure sensor 35b and the downstream pressure of the second fluid resistance 32b detected by the second downstream pressure sensor 36b.

[0033] Furthermore, as shown in Figure 1, the mixed fluid control device 3A includes a control unit 37 that controls the first control valve 34a and the second control valve 34b. The control unit 37 is a so-called computer equipped with, for example, a CPU, memory, A / D / D / A converter, and input / output means, and performs functions as a flow rate calculation unit 371 and a valve control unit 372, etc., by executing a flow rate control program stored in memory and having various devices cooperate.

[0034] As described above, the flow rate calculation unit 371 calculates the flow rate of the first gas using the upstream pressure of the first fluid resistance 32a detected by the first upstream pressure sensor 35a and the downstream pressure of the first fluid resistance 32a detected by the first downstream pressure sensor 36a. The flow rate calculation unit 371 also calculates the flow rate of the second gas using the upstream pressure of the second fluid resistance 32b detected by the second upstream pressure sensor 35b and the downstream pressure of the second fluid resistance 32b detected by the second downstream pressure sensor 36b. Note that the flow rate calculation unit 371 may be provided separately for calculating the flow rate of the first gas and for calculating the flow rate of the second gas.

[0035] The valve control unit 372 performs feedback control on the first control valve 34a so that the deviation between the set flow rate Sa of the first gas and the calculated flow rate Ma of the first gas calculated by the flow rate calculation unit 371 becomes small. Further, the valve control unit 372 performs feedback control on the second control valve 34b so that the deviation between the set flow rate Sb of the second gas and the calculated flow rate Mb of the second gas calculated by the flow rate calculation unit 371 becomes small. Note that the valve control unit 372 may be provided separately for controlling the first control valve 34a and for controlling the second control valve 34b.

[0036] And in the valve control unit 372, the set flow rate Sb of the second control valve 34b is set to 1 / 10 or less compared to the set flow rate Sa of the first control valve 34a (Sb / Sa ≤ 1 / 10). For example, the set flow rate Sa of the first control valve 34a is, for example, 100 to 1000 sccm, and the set flow rate Sb of the second control valve 34b is, for example, 1 to 10 sccm. Therefore, it is conceivable to use a large flow rate type such as 100 to 1000 sccm for the first fluid resistance 33a and a small flow rate type such as 1 to 10 sccm for the second fluid resistance 33b.

[0037] Furthermore, in the valve control unit 372, the sum (Sa + Sb) of the set flow rate Sa of the first control valve 34a and the set flow rate Sb of the second control valve 34b is set to 2000 sccm or less (Sa + Sb ≤ 2000 sccm). Note that these set flow rates Sa and Sb are set by, for example, an external higher-level control device (not shown) that controls the semiconductor manufacturing process.

[0038] Also, in the flow path block 310 of the present embodiment, as shown in FIG. 4, in the second flow path 31b through which the small flow rate second gas flows, the volume on the downstream side of the second control valve 34b is set to 1 cc or less. That is, in the second flow path 31b, the volume from the downstream side of the second control valve 34b to the connection portion 31x to the confluence flow path 32 is set to 1 cc or less. Thereby, the arrival time of the second fluid with a small flow rate to the confluence flow path 32 can be shortened.

[0039] Specifically, a recess 310M for housing the valve body member or valve seat member of the second control valve 34b is formed in the flow path block 310 so as to divide the second flow path 31b. In the second flow path 31b having this configuration, the volume from the downstream side of the recess 310M to the connection portion 32x with the confluence flow path 32, that is, the volume of the connection flow path portion 31b1 connecting the recess 310M and the confluence flow path 32 is set to 1 cc or less.

[0040] Further, the total volume of the first flow path 31a, the second flow path 31b, and the confluence flow path 32 formed in the flow path block 310 is 50 cc or less. The volume of the flow path block 310 is 300 cc or less. Furthermore, the diameter of the connection flow path portion 31a1 of the first flow path 31a connected to the confluence flow path 32 is 1.5 times or more the diameter of the connection flow path portion 31b1 of the second flow path 31b connected to the confluence flow path 32. Thereby, backflow to the second flow path 31b through which a small flow rate flows can be prevented.

[0041] <Simulation Results of the First Embodiment> Next, the simulation results in the fluid mixing device 100 of the first embodiment and a conventional fluid mixing device (see FIG. 9) are shown in FIG. 5.

[0042] Here, a simulation was performed in a configuration where tungsten fluoride (WF ６ ), hexafluoro-1,3-butadiene (C ４ F ６ ), and argon (Ar) are mixed. In the conventional fluid mixing device, each of the above three gases was introduced into the mixing manifold alone. On the other hand, in the fluid mixing device 100 of the first embodiment, tungsten fluoride (WF ６ ) and argon (Ar) were introduced into the mixed fluid control device 3A, and then the mixed gas was introduced into the mixing manifold.

[0043] Here, the flow rates of C ４ F ６ and Ar were kept constant at 100 sccm or 400 sccm. Also, WF ６The flow rate was ramped, and the changes were from 0.1 to 1 sccm, from 1 to 10 sccm, from 1 to 0.1 sccm, or from 10 to 1 sccm, and the change time intervals were 100 ms. The response time Tr was defined as the time it took for the molar concentration of WF at the outlet of the mixing manifold 2 to stabilize within 1% of the steady-state value. ６ It is defined as the time it takes for the molar concentration of WF at the outlet of the mixing manifold 2 to stabilize within 1% of the steady-state value.

[0044] In Fig. 5, the horizontal axis shows the value (Smin / Ssum) obtained by dividing the minimum flow rate Smin (the flow rate of WF ６ ) by the total sum Ssum of all gas flow rates (the total sum of the flow rates of C ４ F ６ , Ar, WF ６ ). Also, the minimum flow rate Smin was the average of the ramp values of WF for step-up and twice the value of the flow rate (sccm) at the end of the ramp for step-down. The vertical axis in Fig. 5 is the value (Tr ｐｒｉｏｒ ａｒｔ / Trproposed design) obtained by dividing the response time Tr of the conventional fluid mixing device by the response time Trproposed design of the fluid mixing device of this embodiment. ｐｒｉｏｒ ａｒｔ by the response time Trproposed design of the fluid mixing device of this embodiment (Tr ｐｒｉｏｒ ａｒｔ / Trproposed design).

[0045] As can be seen from Fig. 5, the response time of the fluid mixing device of this embodiment is shortened by 2 to 20 times compared to the response time of the conventional fluid mixing device. The shortening of the response time is more significant for step-down (8 to 20 times) than for step-up (2 to 7 times). Also, the shortening of the response time is more significant for small flow rates (7 to 20 times) than for large flow rates (2 to 11 times). In particular, in this embodiment, the response time can be further shortened when the minimum flow rate Smin < 0.1 × total sum Ssum.

[0046] <Effects of the First Embodiment> In the fluid mixing device 100 of the first embodiment, the flow path block 310 is formed with a first flow path 31a through which the first fluid is controlled, a second flow path 31b through which the second fluid is controlled, and a confluence flow path 32 through which they are connected. As a result, the first fluid and the second fluid are mixed in the confluence flow path 32 and then discharged. As a result, even if, for example, one of the first or second fluids has a large flow rate and the other has a small flow rate, the fluid with the small flow rate is discharged from the fluid control device 3A together with the fluid with the large flow rate, and the supply speed to the downstream side of the fluid control device 3A can be increased. Furthermore, by forming a first flow path 31a, a second flow path 31b, and a confluence flow path 32 in the flow path block 310, the volume from the first fluid resistance 33a or the first control valve 34a to the confluence flow path 32 in the first flow path 31a, or the volume from the second fluid resistance 33b or the second control valve 34b to the confluence flow path 32 in the second flow path 31b, can be reduced, thereby shortening the time it takes for the first or second fluid to reach the confluence flow path 32. This also allows for a higher supply speed to the downstream side of the fluid control device 3A.

[0047] <Second Embodiment> Next, a second embodiment of the fluid mixing apparatus according to the present invention will be described. The same reference numerals will be used to describe components identical to those in the first embodiment.

[0048] The fluid mixing device 100 of the second embodiment differs from the first embodiment in the configuration of the fluid mixing control device 3A. Specifically, in the fluid mixing control device 3A of the second embodiment, as shown in Figure 6, the first control valve 34a is provided upstream of the first fluid resistance 33a in the first flow path 31a, and the second control valve 34b is provided upstream of the second fluid resistance 33b in the second flow path 31b.

[0049] Furthermore, in the mixed fluid control device 3A of the second embodiment, the first downstream pressure sensor 36a and the second downstream pressure sensor 36b are common pressure sensors provided in the confluence flow path 32.

[0050] Furthermore, in the flow path block 310 of the second embodiment, in the second flow path 31b through which the second gas flows at a low flow rate, the volume downstream of the second fluid resistance 33b is set to 1 cc or less. In other words, in the second flow path 31b, the volume from the downstream side of the second fluid resistance 33b to the connection part 31x with the confluence flow path 32 is set to 1 cc or less. This makes it possible to shorten the time it takes for the second fluid, which flows at a low flow rate, to reach the confluence flow path 32.

[0051] Here, the configuration of the first fluid resistance 33a and the second fluid resistance 33b downstream up to the confluence channel 32 may be such that they are connected to the confluence channel 32 via connecting channel sections 31a1 and 31b1, as shown in Figure 7, or the downstream openings of each fluid resistance 33a and 33b may be directly connected to the confluence channel 32 without going through connecting channel sections 31a1 and 31b1.

[0052] <Effects of the Second Embodiment> The fluid mixing device 100 in the second embodiment can achieve the same effects as in the first embodiment.

[0053] <Other Embodiments> For example, in the above embodiment, for the sake of simplicity, the mixed fluid control device 3A was configured to mix two gases, but as shown in Figure 8, it may also be configured to mix three or more types of gases (for example, six types from gas A to gas F). Even in this case, it is desirable that the flow path for a large flow rate gas and the flow path for a small flow rate gas are adjacent to each other and merge into a confluence flow path. Also, in the configuration of Figure 8, the valve control unit 372 sets the minimum set flow rate (S) among a plurality of set flow rates. ｍｉｎ =min(Sa, Sb, ..., Sf)) is the sum of multiple set flow rates (S ｓｕｍ The sum of the multiple set flow rates (S) should be within 1 / 10 of the value of S. ｓｕｍ Let the ratio (= Sa + Sb + ... + Sf) be less than or equal to 2000 sccm.

[0054] The mixed fluid control device 3A in the above embodiment was a differential pressure type MFC that measures the gas flow rate using an upstream pressure sensor and a downstream pressure sensor. However, it may also be a thermal type MFC that measures the gas flow rate using electrical signals obtained from an upstream heating resistor and a downstream heating resistor in a bypass flow path that bypasses fluid resistance.

[0055] Furthermore, various modifications and combinations of the embodiments are permitted, as long as they do not contradict the spirit of the present invention.

[0056] According to the present invention, the gas supply can be accelerated without complicating the configuration of the mixing manifold and other components downstream of the fluid control device.

[0057] 100... Fluid mixing device P1-P3... Inlet port 2... Mixing manifold 3A-3C... Fluid control device 31a... First flow path 31b... Second flow path 32... Confluence flow path 310... Flow path block 33a... First fluid resistance 34a... First control valve 33b... Second fluid resistance 34b... Second control valve 372... Valve control unit 31x... Connection part 35a... First upstream pressure sensor 36a... First downstream pressure sensor 35b... Second upstream pressure sensor 36b... Second downstream pressure sensor

Claims

1. A fluid control device for introducing a first fluid and a second fluid, mixing the first fluid and the second fluid, and discharging them, comprising: a flow path block having a first flow path through which the first fluid is introduced, a second flow path through which the second fluid is introduced, and a confluence flow path to which the first flow path and the second flow path are connected; a first fluid resistor provided in the first flow path; a first control valve provided upstream or downstream of the first fluid resistor in the first flow path for controlling the first fluid; a second fluid resistor provided in the second flow path; and a second control valve provided upstream or downstream of the second fluid resistor in the second flow path for controlling the second fluid.

2. The fluid control device according to claim 1, further comprising a valve control unit that controls the first control valve and the second control valve, wherein the valve control unit sets the set flow rate of the second control valve to 1 / 10 or less compared to the set flow rate of the first control valve.

3. The fluid control device according to claim 2, wherein the first control valve is provided upstream of the first fluid resistance in the first flow path, the second control valve is provided upstream of the second fluid resistance in the second flow path, and the volume from the downstream side of the second fluid resistance in the second flow path to the connection point with the confluence flow path is 1 cc or less.

4. The fluid control device according to claim 2, wherein the first control valve is provided downstream of the first fluid resistance in the first flow path, the second control valve is provided downstream of the second fluid resistance in the second flow path, and the volume from the downstream side of the second control valve in the second flow path to the connection point with the merging flow path is 1 cc or less.

5. The fluid control device according to claim 1, wherein the total volume of the first channel, the second channel, and the merging channel formed in the channel block is 50 cc or less.

6. The fluid control device according to claim 2, wherein the valve control unit sets the sum of the set flow rate of the first control valve and the set flow rate of the second control valve to 2000 sccm or less.

7. The fluid control device according to claim 2, wherein the diameter of the connecting channel portion of the first channel connected to the confluence channel is 1.5 times or more the diameter of the connecting channel portion of the second channel connected to the confluence channel.

8. The fluid control device according to claim 1, wherein a first upstream pressure sensor is provided upstream of the first fluid resistance, a first downstream pressure sensor is provided downstream of the first fluid resistance, a second upstream pressure sensor is provided upstream of the second fluid resistance, and a second downstream pressure sensor is provided downstream of the second fluid resistance.

9. The fluid control device according to claim 8, wherein the first downstream pressure sensor and the second downstream pressure sensor are common pressure sensors provided in the confluence flow path.

10. A fluid mixing device comprising: a mixing manifold having an introduction port into which each of a plurality of fluids is introduced, and mixing and discharging the plurality of fluids introduced from the introduction ports; and a fluid control device according to any one of claims 1 to 9 connected to the introduction port.

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