Member for manufacturing thin-film vapor chamber and method for manufacturing thin-film vapor chamber using same

Abstract

Disclosed are a member for manufacturing a thin-film vapor chamber and a method for manufacturing a vapor chamber using the same. According to an embodiment disclosed herein, a member for manufacturing a thin-film vapor chamber having an inner space is provided, the member comprising: a working fluid inlet part formed around a working fluid inlet port between a lower plate and an upper plate which are bonded to each other; a chamber part for forming a vapor chamber; and a channel part for connecting the working fluid inlet part and the chamber part to each other. The vapor chamber can be effectively manufactured if the chamber part filled with working fluid is sealed by bonding the middle of the channel part after injecting the working fluid into the member for manufacturing the thin-film vapor chamber.

Description

A component for manufacturing a thin film vapor chamber and a method for manufacturing a thin film vapor chamber using the same

[0001] The present disclosure relates to a component for manufacturing a thin film vapor chamber and a method for manufacturing a thin film vapor chamber using the same. More specifically, it relates to one or more components for manufacturing a thin film vapor chamber having a structure capable of effectively filling and sealing a working fluid inside the chamber, and a method for manufacturing a thin film vapor chamber using the same.

[0002] The following description merely provides background information related to the present embodiment and does not constitute prior art.

[0003] With the advancement of technology, the capabilities of portable electronic devices such as smartphones and tablet PCs are becoming increasingly sophisticated. Generally, portable electronic devices integrate various components—including CPUs, RAM, batteries, display devices, and circuit boards—within a limited space; as the functionality of each component becomes more advanced, the amount of heat generated within the device also increases. In particular, due to the advancement of wireless communication networks and the development of artificial intelligence technology, the computational load performed by devices installed in portable electronic devices is increasing exponentially, and the amount of heat generated inside the device is also rising rapidly in proportion.

[0004] Since heat generation within portable electronic devices causes various problems regarding device lifespan, performance, and user safety, heat dissipation elements such as vapor chambers are utilized to effectively release internal heat. A vapor chamber is configured to dissipate heat by causing a working fluid filled inside a sealed chamber to repeatedly evaporate, move, and condense in response to heat applied from a heat-generating component within the electronic device. Recently, various thin-film vapor chambers suitable for miniaturized portable electronic devices are being developed and applied.

[0005] The manufacturing process for a typical vapor chamber involves creating a vacuum within the internal space, injecting the working fluid, and then sealing the chamber. Since thin-film vapor chambers are relatively small and thin, there are difficulties in effectively filling the internal space with the working fluid. For example, problems may arise, such as defects occurring during the vacuuming and fluid injection processes, including chamber deformation or breakage, or fluid leakage due to incomplete sealing.

[0006] To address these issues, conventional thin-film vapor chambers fill the working fluid by connecting a separate injection tube to the inlet or forming additional reinforcing structures around the inlet. However, these conventional thin-film vapor chambers require additional processes for fabricating and connecting the injection tube or reinforcing structures, which increases the complexity, time, and cost of the manufacturing process. Furthermore, there remains a risk that defects in the injection tube or reinforcing structures themselves may result in inaccurate injection of the working fluid or imperfect sealing. Therefore, there is a need to develop a new thin-film vapor chamber capable of effectively filling the chamber with working fluid without the need for injection tubes or reinforcing structures.

[0007] According to one embodiment of the present disclosure, a thin film vapor chamber manufacturing member and a method for manufacturing a thin film vapor chamber using the same utilize a thin film vapor chamber manufacturing member comprising a lower plate in the form of a metal thin film and an upper plate in the form of a metal thin film having a space groove formed on its bottom surface, wherein an internal space including a bonded working fluid injection part, a channel part, and a chamber part is formed between the two plates. A thin film vapor chamber including a sealed chamber part can be manufactured by injecting a working fluid into the thin film vapor chamber manufacturing member, sealing the chamber part filled with the working fluid by bonding the middle of the channel part, and then separating the working fluid injection part by cutting the channel part along a preset reference line.

[0008] The problems that the present invention aims to solve are not limited to those mentioned above, and other unmentioned problems will be clearly understood by a person skilled in the art from the description below.

[0009] According to one embodiment of the present disclosure, a member for manufacturing a thin-film vapor chamber is provided, comprising: a lower plate in the form of a metal thin film including a working fluid inlet formed through the center of one end; and an upper plate in the form of a metal thin film having a shape symmetric to the lower plate and having a space groove on its bottom surface for forming a vapor chamber and a path extending from the working fluid inlet to the vapor chamber, wherein when the bottom surface of the upper plate is joined to the upper surface of the lower plate, an internal space is formed between the upper plate and the lower plate, the internal space comprising a working fluid injection part formed around the working fluid inlet by the space groove, a chamber part for forming the vapor chamber, and a channel part for connecting the working fluid injection part and the chamber part to each other.

[0010] According to another embodiment of the present disclosure, a method for manufacturing a thin film vapor chamber using a thin film vapor chamber manufacturing member according to one embodiment of the present disclosure is provided, comprising the steps of: preparing the thin film vapor chamber manufacturing member by joining the upper edge of a lower plate and the lower edge of an upper plate together; maintaining the internal space of the thin film vapor chamber manufacturing member in a vacuum state and injecting a working fluid into the internal space through the working fluid injector; joining the middle of the channel portion to seal the chamber portion filled with the working fluid; and separating the working fluid injector from the vapor chamber including the chamber portion by cutting along a preset reference line perpendicular to the longitudinal direction of the channel portion on the channel portion.

[0011] The member for manufacturing a thin film vapor chamber according to one embodiment of the present disclosure and the method for manufacturing a thin film vapor chamber using the same enable effective vacuum operation and injection of working fluid without additional injection pipes or reinforcing structures during the manufacturing process of the thin film vapor chamber, thereby reducing the time and cost required for manufacturing the thin film vapor chamber.

[0012] In addition, the member for manufacturing a thin film vapor chamber according to one embodiment of the present disclosure and the method for manufacturing a thin film vapor chamber using the same have the effect of preventing the risk of manufacturing defects in the thin film vapor chamber caused by defects or damage to the injection pipe or the reinforcing structure itself.

[0013] FIG. 1 is a perspective view of a member for manufacturing a steam chamber according to one embodiment of the present disclosure.

[0014] FIG. 2 is an exploded perspective view of a component for manufacturing a steam chamber according to one embodiment of the present disclosure.

[0015] FIG. 3 is a drawing for explaining the structure of the internal space of a member for manufacturing a steam chamber according to one embodiment of the present disclosure.

[0016] FIG. 4 is a partial cutaway view of a member for manufacturing a vapor chamber to explain the internal structure of an operating fluid injection part according to one embodiment of the present disclosure.

[0017] FIG. 5 is a flowchart showing each step of a method for manufacturing a thin film vapor chamber according to one embodiment of the present disclosure.

[0018] FIG. 6 is a drawing for specifically explaining the process of manufacturing a thin film vapor chamber according to one embodiment of the present disclosure.

[0019] FIG. 7 is a partial enlarged view of a component for manufacturing a vapor chamber to specifically explain the process of sealing the chamber part and separating the working fluid injection part during the process of manufacturing the thin film vapor chamber of FIG. 6.

[0020] The advantages and features of the present invention and the methods for achieving them will become clear by referring to the embodiments described below in detail together with the accompanying drawings. However, embodiments of the technical concept of the present invention are not limited to the embodiments disclosed below but can be implemented in various different forms. These embodiments are provided merely to ensure that the disclosure of the present invention is complete and to fully inform those skilled in the art of the scope of the invention, and are defined only by the scope of the claims.

[0021] The terms used herein are for describing the embodiments and are not intended to limit the invention. In this specification, the singular form includes the plural form unless specifically stated otherwise.

[0022] In this specification, terms such as “comprising” or “having” are intended to specify the existence of the features, numbers, steps, actions, components, parts, or combinations thereof described in the specification, and should not be understood as precluding the existence or addition of one or more other features, numbers, steps, actions, components, parts, or combinations thereof.

[0023] Additionally, the embodiments described herein will be explained with reference to cross-sectional and / or plan views, which are exemplary illustrations of the invention. Accordingly, embodiments of the invention are not limited to the specific forms depicted but include variations in form as needed. For example, a region depicted as a right angle may be rounded or have a certain curvature. Accordingly, the regions illustrated in the drawings are schematic in nature, and the shapes of the regions illustrated in the drawings are intended to illustrate specific forms of regions of the device and are not intended to limit the scope of the invention.

[0024] Throughout the entire specification, the same reference numerals refer to the same components. Accordingly, the same or similar reference numerals may be described by referring to other drawings even if they are not mentioned or described in the relevant drawings. Additionally, even if a reference numeral is not indicated, it may be described by referring to other drawings.

[0025] Hereinafter, embodiments of the present invention will be described with reference to the attached drawings.

[0026] FIG. 1 is a perspective view of a member for manufacturing a steam chamber according to one embodiment of the present disclosure, and FIG. 2 is an exploded perspective view of a member for manufacturing a steam chamber according to one embodiment of the present disclosure.

[0027] Referring to FIGS. 1 and 2, the steam chamber manufacturing member (100) is composed of an upper plate (110) and a lower plate (120) joined together. Here, the upper plate (110) and the lower plate (120) may be provided as thin plates of metal material processed into a preset shape, for example, thin plates of SUS material.

[0028] An operating fluid inlet (121) is formed through one end of the lower plate (110), and the upper surface of the lower plate (110) and the lower surface of the upper plate (110) are joined together so that they face each other. Here, a space groove (111) is formed in the upper direction on the lower surface of the upper plate (110), and the space groove (111) forms an internal space between the joined upper plate (110) and lower plate (120) that communicates to the outside only through the operating fluid inlet (121).

[0029] In the vapor chamber manufacturing member (100), one internal space formed by the space groove (111) can be divided into a chamber section (C1), a channel section (C2), and an operating fluid injection section (C3). Here, the chamber section (C1) is a space filled with an operating fluid to form a vapor chamber.

[0030] As illustrated in FIG. 2, a plurality of embos (123) may be formed on the inner surface of the chamber portion (C1). Specifically, on the inner surface of the chamber portion (C1), at least one of a plurality of first embos formed protruding downward from the bottom surface of the upper plate (110) corresponding to the inner surface of the space groove (111), and a plurality of second embos formed protruding upward from the upper surface of the lower plate (120) may be formed.

[0031] According to one embodiment, a plurality of embossions (123) may be formed to protrude toward the space groove (111) of the upper plate (110) in a regular pattern on the upper surface of the lower plate (120), but are not limited thereto. For example, the plurality of embossions (123) may be formed such that the first embossions and the second embossions are arranged in an alternating manner. The space of the chamber portion (C1) may be supported vertically by the plurality of embossions (123), and the spaces between the embossions (123) are interconnected to provide a flow path for internal circulation of the working fluid.

[0032] The working fluid injection section (C3) is a space formed around the working fluid injection port (121), and provides a space that allows air in the internal space to be stably discharged through the working fluid injection port (121) or the working fluid to be stably injected into the internal space through the working fluid injection port (121) during the process of performing vacuum work on the internal space of the vapor chamber manufacturing member (100) and injecting the working fluid.

[0033] For example, the working fluid injection part (C3) can form a fluid movement path divided into a gate path around the working fluid injection port (121), an outer path formed spaced apart from the gate path, and a connecting path formed between the gate path and the outer path. Air or working fluid passing through the working fluid injection port (121) can stably move to the inside or outside of the vapor chamber manufacturing member (100) along the fluid movement path formed in the working fluid injection part (C3). The fluid movement path formed in the working fluid injection part (C3) will be explained in more detail below in FIGS. 3 and 4.

[0034] The channel section (C2) is a space that extends long between the chamber section (C1) and the working fluid injection section (C3), and the chamber section (C1) and the working fluid injection section (C3) are connected to each other through the channel section (C2). During the vacuum process for the steam chamber manufacturing member (100), the air inside the chamber section (C1) moves to the working fluid injection section (C3) through the channel section (C2), and the working fluid injected into the working fluid injection section (C3) moves to the chamber section (C1) through the channel section (C2) during the working fluid injection process.

[0035] When the working fluid is sufficiently filled in the chamber section (C1), the middle section of the channel section (C2) is sealed, thereby completely sealing the chamber section (C1) from the outside and operating as a vapor chamber. Here, the channel section (C2) can be formed to have a sufficient length so that a sealing and cutting area can be secured in its middle section. Specifically, the channel section (C2) can be formed to extend to the same length as the width of a joining area forming the outer edge of the chamber section (C1), for example, a joining flange section additionally formed on the outer edge of the chamber section (C1) to join using welding or adhesive means. Subsequently, the middle section of the channel section (C2) is sealed so that the joining area in the middle section of the channel section (C2) connects with the joining area forming the outer edge of the chamber section (C1).

[0036] Hereinafter, the structural features of the internal space of the steam chamber manufacturing member (100) in FIGS. 3 and FIGS. 4 will be described in detail. FIGS. 3 is a drawing showing the steam chamber manufacturing member (100) viewed from above to explain the structure of the internal space of the steam chamber manufacturing member according to one embodiment of the present disclosure, and FIGS. 4 is a partial cutaway view of the steam chamber manufacturing member (100) to explain the internal structure of the working fluid injection part according to one embodiment of the present disclosure.

[0037] Referring to FIG. 3, a chamber section (C1), a channel section (C2), and an operating fluid injection section (C3) are formed inside the steam chamber manufacturing member by a space groove (111) formed on the bottom surface of the upper plate (110). Specifically, the remaining area excluding the space groove (111), which is a recessed area facing upward from the bottom surface of the upper plate (110), is joined in close contact with the upper edge of the lower plate, and as a result, the inner space of the space groove (111) forms an internal space of the steam chamber manufacturing member isolated from the outside.

[0038] In FIG. 3, the chamber section (C1) is formed in a roughly rectangular shape that is extended horizontally, but the shape of the chamber section (C1) can have various shapes depending on the shape of the space secured near the heat source inside the electronic device for installing the vapor chamber. For example, the shape of the chamber section (C1) can have a square, circular, or irregular polygonal shape so that it can be accurately seated in the installation space of the vapor chamber designed inside the electronic device.

[0039] A channel section (C2) and an operating fluid injection section (C3) are connected to one side of the chamber section (C1). Unlike the chamber section (C1), the channel section (C2) and the operating fluid injection section (C3) contribute to effective vacuuming and the injection of operating fluid during the manufacturing process of the vapor chamber, and then are separated from the chamber section (C1) and do not constitute a part of the finally completed vapor chamber; therefore, the shape of the channel section (C2) and the operating fluid injection section (C3) can be determined in any shape and size without considering the shape of the vapor chamber installation space inside the electronic device.

[0040] According to one embodiment, the working fluid injection section (C3) is formed to have an overall circular outer shape centered on the location of the working fluid inlet, and may be divided into a circular gate channel (C31) which is the area surrounding the working fluid inlet, an outer channel (C33) which is formed in a concentric shape spaced apart along the perimeter of the gate channel (C31), and one or more connecting channels (C32) which form a connecting passage between the gate channel (C31) and the outer channel (C33). Here, one side of the outer channel (C33) is in communication with the channel section (C2). As a result, the single internal space formed by the space groove (111) of the vapor chamber manufacturing member forms a series of fluid flow paths leading from the chamber section (C1) - channel section (C2) - outer channel (C33) - connecting channel (C32) - gate channel (C31) - working fluid inlet.

[0041] During the steam chamber manufacturing process, the interior of the steam chamber manufacturing component must be maintained in a vacuum state while the working fluid is injected. In order to maintain the interior of the steam chamber manufacturing component in a vacuum state, air remaining in the internal space of the steam chamber manufacturing component moves to the working fluid inlet along the aforementioned series of movement paths and is then discharged to the outside. On the other hand, the working fluid injected into the internal space of the steam chamber manufacturing component moves from the working fluid inlet toward the chamber section (C1) along the aforementioned series of movement paths.

[0042] In order for the completed vapor chamber to perform the heat dissipation function accurately, the chamber must be filled with an accurate amount of working fluid, and at the same time, the vacuum level inside must also be maintained at a constant level. For example, as the working fluid undergoes repeated phase changes between liquid and gas inside the chamber, its volume also changes; therefore, if more working fluid than a preset amount is accidentally injected, smooth phase changes of the working fluid may become impossible in the future, and if less working fluid than the preset amount is injected, the amount of heat dissipated may be less than the target amount, and rapid heat dissipation may not be achieved.

[0043] However, since thin-film vapor chambers are very small in size and require only a small amount of working fluid to be injected, it is difficult to precisely maintain the amount of injected working fluid and the vacuum level within the chamber. For example, mechanical force is applied around the working fluid inlet by the injection means to maintain the seal and airtightness at the connection point between the working fluid inlet and the injection means. This can lead to problems such as damage to the area around the inlet, insufficient airtightness resulting in some of the working fluid not being injected or variations in the vacuum level.

[0044] To overcome these difficulties, a method has been proposed in which an additional metal tube is attached to the inlet and the working fluid is injected using the tube to perform vacuum operations. However, not only does the cost and time required to manufacture and attach the additional metal tube increase, but there are still difficulties in precisely maintaining the amount of working fluid injected and the vacuum level of the chamber's internal space. For example, there is still a risk of damage to the area around the working fluid inlet during the process of attaching the metal tube. Furthermore, if the metal tube itself is damaged or deformed, the preset amount of working fluid may not be accurately injected, or the inside of the chamber may have a vacuum level different from the specified vacuum level. If the chamber's internal space is sealed in such a state, there is a risk that the target heat dissipation performance may not be achieved during the subsequent process of heat dissipation as a vapor chamber, or that damage may occur, such as deformation of the vapor chamber or detachment of the attached parts, as the chamber's internal space may be placed in an excessive positive pressure state during the phase change of the working fluid.

[0045] On the other hand, the internal space of the working fluid injection part (C3) according to one embodiment of the present disclosure has a structure spatially divided into a gate passage (C31), a connecting passage (C32), and an outer passage (C33), and these passages are separated by a separation area in which the bottom surface of the upper plate and the top surface of the lower plate are in close contact with each other. Due to this structure of the working fluid injection part (C3), the component for manufacturing the vapor chamber has a certain structural rigidity that is robust against the risk of deformation or breakage that may occur during the manufacturing process.

[0046] Specifically, the working fluid in the working fluid injection section (C3) reaches the channel section (C2) via a path leading from the gate passage (C31) to the connecting passage (C32) to the outer passage (C33), or the residual air in the chamber section (C1) reaches the working fluid injection port via the opposite path. Here, the multi-stage passage leading from the gate passage (C31) to the connecting passage (C32) to the outer passage (C33) provides structural rigidity to the component for manufacturing the vapor chamber made of a thin film, while simultaneously ensuring that the volume of the moving fluid remains constant at all stages.

[0047] In particular, the separation area (112) provides a space where mechanical pressure necessary to maintain airtightness during vacuum operation and working fluid injection processes can be applied without damage or deformation around the working fluid injection port. For example, when a working fluid injection means is coupled to the working fluid injection port, the injection means is coupled upwardly to the working fluid injection port on the bottom surface of the steam chamber manufacturing member, and at the same time, the separation area (112) on the upper surface of the steam chamber manufacturing member is selectively pressurized. Since the upper plate and the lower plate corresponding to the separation area (112) are in close contact with each other and are free from deformation or damage caused by mechanical force applied vertically, the airtightness of the joint between the working fluid injection port and the working fluid injection means can be effectively maintained without deformation or damage around the working fluid injection port.

[0048] Referring to FIG. 4 below, the internal structure of the working fluid injection part (C3) is described in detail. A gate passage (C31) is formed in the center of the working fluid injection part (C3) to which the working fluid injection port is connected. Here, the gate passage (C31) is a circular space having an inner diameter larger than the diameter of the working fluid injection port (121).

[0049] Two or more support ribs (122) are formed at regular intervals along the inner circumference of the working fluid inlet (121) in the direction of the inner side of the gate channel (C31). Here, the support ribs (122) are formed to protrude upward with a length equal to the height of the gate channel (C31) so as to come into contact with the upper inner surface of the gate channel (C31). The support ribs (122) maintain the internal space of the gate channel (C31) by providing support from the working fluid inlet (121) on the lower inner surface of the gate channel (C31) to the upper plate on the upper inner surface.

[0050] Around the gate channel (C31), a connecting channel (C32) and an outer channel (C33) are formed, which are spatially separated by a separation area, and form a fluid movement path between the working fluid inlet (121) and the channel section (C2).

[0051] When describing the structure of the working fluid injection section (C3) focusing on the path through which the working fluid moves during the manufacturing process of the thin film vapor chamber, the working fluid injected at a preset pressure through the working fluid inlet (121) enters the internal space of the gate passage (C31) through the space between the support ribs (122).

[0052] Subsequently, the working fluid moves from the gate channel (C31) to the outer channel (C33) through a plurality of connecting channels (C32) radially connected therefrom. Here, the entire flow of the working fluid is separated into partial flows corresponding to the number of connecting channels (C32), and each partial flows move to the outer channel (C33) along the corresponding connecting channel (C32).

[0053] Multiple connecting channels (C32) are formed radially from the central gate channel (C31) toward the concentric outer channel (C33) formed along its circumference, and the direction or spacing of individual connecting channels can be configured in various ways. Unlike the present embodiment in which connecting channels (C32) are arranged only in the direction corresponding to the semicircular area in the direction of the channel section (C2) among the circular outer channels (C33), they may be arranged so that the angles between all connecting channels (C32) form the same angle. For example, a total of four connecting channels, including one connecting channel formed in the direction of the channel section (C2), may all be arranged so that they form a 90-degree angle with each other.

[0054] The number and shape of the connecting channels (C32) can be determined such that the amount of fluid passing through the multiple connecting channels (C32) is equal to the amount of fluid passing through the gate channel (C31) and the outer channel (C33). For example, the narrower the width of each individual connecting channel, the greater the structural rigidity against deformation caused by external forces can be secured; however, as the width of the individual connecting channels decreases, the total number of connecting channels must increase. The working fluid passing through each connecting channel (C32) reaches the outer channel (C33), which is formed in a circular shape on the outer edge of the gate channel (C31), and then flows into the chamber section (C1) through the channel section (C2) connected to one side of the outer channel (C33). Consequently, the flow of the working fluid injected into the interior maintains a constant speed as it sequentially passes through the multi-stage channels formed inside, and flows into the chamber section (C1).

[0055] A thin-film vapor chamber can be effectively manufactured using the vapor chamber manufacturing component described above. FIG. 5 is a flowchart showing each step of a method for manufacturing a thin-film vapor chamber using a vapor chamber manufacturing component according to one embodiment of the present disclosure.

[0056] Referring to FIG. 5, as a first step of the method for manufacturing a thin film vapor chamber, the upper edge of a lower plate and the lower edge of an upper plate are joined together to provide a member for manufacturing a thin film vapor chamber according to one embodiment of the present disclosure (S510).

[0057] Specifically, the upper edge region of a thin-film lower plate having an operating fluid inlet and the lower edge region of a metal thin-film upper plate having a space groove formed on its bottom surface are joined while in contact with each other. Here, the joining may be performed by laser welding the edge regions, but is not limited thereto. According to another embodiment, the joining may be performed by inserting a brazing adhesive into the contact area between the upper edge of the lower plate and the lower edge of the upper plate and brazing the edge regions at a preset temperature in a vacuum brazing furnace.

[0058] During the process of joining the lower plate and the upper plate, the joining can be performed with a mesh-type sheet interposed between the two plates. Once the lower plate and the upper plate are fully joined, the mesh-type sheet is embedded inside the component for manufacturing a thin-film vapor chamber in a form that adheres closely to the two inner surfaces of the chamber section, namely the bottom surface of the upper plate and the top surface of the lower plate.

[0059] When a component for manufacturing a thin film vapor chamber is prepared in the first step, a second step is performed in which the internal space of the component for manufacturing a thin film vapor chamber is maintained in a vacuum state and a working fluid is injected into the internal space through a working fluid inlet (S520).

[0060] In a component for manufacturing a thin film vapor chamber, an internal space is formed that is enclosed by a space groove in the upper plate and a lower plate. Here, the internal space is a single space divided into a chamber section, a channel section, and an operating fluid injection section, and has a structure in which the operating fluid inlet, the operating fluid injection section, the channel section, and the chamber section are interconnected to form a single flow path.

[0061] First, residual air inside the component for manufacturing the thin-film vapor chamber is removed to create a vacuum in the internal space. In particular, all residual air inside the chamber is drawn out to the outside through the working fluid inlet after passing through the channel section and the working fluid injection section.

[0062] Subsequently, the working fluid is injected into the internal space of the component for manufacturing the thin film vapor chamber under vacuum. The working fluid travels along the flow path inside the component for manufacturing the thin film vapor chamber and fills the chamber section, which is the innermost part of the flow path.

[0063] The second step described above may be performed by first performing a vacuum operation to a target vacuum level as described above and then injecting the working fluid, but is not limited thereto. According to another embodiment, the second step may be performed by first performing a first vacuum operation to a low vacuum level for the injection of the working fluid, and then, once the injection of the working fluid is completed, performing a second vacuum operation to a target vacuum level.

[0064] When a predetermined amount of working fluid is filled inside the thin film vapor chamber manufacturing member, a third step is performed to seal the chamber filled with working fluid by joining the channel portion of the thin film vapor chamber manufacturing member (S530).

[0065] First, a flat region is formed by applying vertical pressure to the middle section of the channel portion of the component for manufacturing a thin-film vapor chamber. Here, the flat region refers to an area that is deformed to be flat, unlike the rest of the channel portion, by applying pressure to a part of the middle section of the channel portion until the upper surface of the lower plate and the lower surface of the upper plate are in close contact vertically.

[0066] According to one embodiment, a flat region may be formed by compressing the upper surface area of ​​an upper plate corresponding to the middle of the channel section with a punch. The flat region formed by pressing with a punch having a predetermined width in the longitudinal and perpendicular directions of the channel section, that is, in the direction crossing the channel section, blocks and isolates the chamber section on one side and the working fluid injection section on the other side from each other. Subsequently, laser welding is performed along a straight line in the direction crossing the channel section on the flat region to completely seal the chamber section.

[0067] Finally, a fourth step is performed to separate the working fluid injection part from the vapor chamber including the chamber part by cutting along a preset reference line perpendicular to the longitudinal direction of the channel part on the channel part (S540).

[0068] With the joint surface formed on the flat area by laser welding in the third step above as a boundary, a chamber section and a part of the channel section on one side are sealed from the outside, and a part of the channel section and the working fluid injection section on the other side form a separate space connected to the outside through the working fluid injection port.

[0069] Among the two regions on the flat area separated by the joint surface, a reference line perpendicular to the longitudinal direction of the channel is established on the region on the working fluid injection side, and the member for manufacturing the thin-film vapor chamber is cut along the reference line to separate the working fluid injection part and complete the vapor chamber.

[0070] According to the method for manufacturing a thin film vapor chamber according to an embodiment of the present disclosure, a thin film vapor chamber is finally formed by sealing a portion corresponding to the chamber part in a member for manufacturing a thin film vapor chamber filled with a working fluid. To this end, instead of sealing the working fluid inlet of the member for manufacturing a thin film vapor chamber as in a conventional method for manufacturing a vapor chamber, the middle of the channel part is joined to completely isolate the interior of the chamber part from the outside. Subsequently, by cutting and separating the remaining part excluding the vapor chamber part containing the chamber part, a thin film vapor chamber suitable for a target portable electronic device can be finally obtained.

[0071] FIG. 6 is a drawing for specifically explaining the process of manufacturing a thin film vapor chamber according to one embodiment of the present disclosure.

[0072] Referring to FIG. 6(a), an upper plate (110) and a lower plate (120) are joined to form a member (100) for manufacturing a thin film vapor chamber according to one embodiment of the present disclosure. Here, the upper plate (110) and the lower plate (120) can be formed by press-forming a metal thin film, respectively. For example, the upper plate (110) can be formed by stamping a space groove having the shape of a single internal space including a chamber portion, a channel portion, and an operating fluid injection portion on the bottom surface of the metal thin film.

[0073] The upper plate (110) and the lower plate (120) may be ultra-thin plates having a thickness of about 0.05 mm to 0.20 mm made of various thermally conductive materials such as copper or aluminum, but are not limited thereto. According to other embodiments, they may be provided as thin plates made of stainless steel.

[0074] Specifically, a mesh-type sheet (140) having a shape that can be embedded inside the chamber portion within the space groove of the upper plate (110) is interposed between the two plates, and the bottom surface of the upper plate (110) and the top surface of the lower plate (120) facing each other are brought into close contact. At this time, the portion of the bottom surface of the upper plate (110) excluding the space groove portion comes into contact with the edge of the lower plate (120).

[0075] Subsequently, laser welding is performed along the edge portion of the upper plate (110), for example, the outer edge of the space groove, to join the upper plate (110) and the lower plate (120), thereby completing the thin film vapor chamber manufacturing member (100). Inside the thin film vapor chamber manufacturing member (100), an internal space is formed surrounded by the inner surface of the space groove of the upper plate (110) and the upper surface of the lower plate (120). Here, a mesh-type sheet (140) is embedded in the chamber portion of the internal space. The internal space is completely sealed and communicates with the outside only through the working fluid inlet.

[0076] Referring to Fig. 6(b), a vacuum operation is performed to remove residual air (10) in the internal space of the thin film vapor chamber manufacturing member (100).

[0077] A press block (300) is pressed downwardly against the upper surface of the part corresponding to the working fluid injection part of the thin film vapor chamber manufacturing member (100), and a sealing is installed so as to be pressed upwardly against the perimeter of the working fluid injection port on the lower surface. Here, the press block (300) has a bottom surface corresponding to the shape of a separation region that spatially separates the gate flow path and the outer flow path of the working fluid injection part, and supports the thin film vapor chamber manufacturing member (100) downwardly by selectively applying an external force only to the part corresponding to the separation region among the upper surfaces of the working fluid injection part. Accordingly, the airtightness around the working fluid injection port on the lower surface can be stably formed without the risk of mechanical deformation occurring in the part protruding from the upper surface of the working fluid injection part to form an internal flow path.

[0078] When the residual air (10) inside is drawn out to the outside through the working fluid inlet, the residual air (10) moves sequentially to the outside through the flow path formed in the internal space of the thin film vapor chamber manufacturing member (100), and the inside becomes a vacuum.

[0079] Referring to FIG. 6 (c), a working fluid (20) is injected into the internal space of a thin film vapor chamber manufacturing member (100) while maintaining a vacuum state. Here, the working fluid (20) may be water, but is not limited thereto, and various substances such as ammonia, methanol, and ethanol may be used instead or together.

[0080] The working fluid (20) travels along a path leading from the working fluid inlet to the gate path, the connecting path, the outer path, the channel section, and the chamber section, and is filled into the internal space of the thin film vapor chamber manufacturing member (100).

[0081] Once the injection of the working fluid is complete, a process of sealing the chamber filled with the working fluid is performed. First, referring to (d) of FIG. 6, a flat area is formed by pressing the middle of the channel portion of the thin film vapor chamber manufacturing member (100) with a punch (400).

[0082] The internal space of the component (100) for manufacturing a vapor chamber filled with working fluid is divided into a chamber section on one side and a working fluid injection section on the other side, with the flat area as the boundary. Afterwards, as shown in FIG. 6 (e), laser welding is performed on the flat area along a straight line crossing the channel section, and the chamber section on one side is completely sealed.

[0083] Referring to (f) of FIG. 6, the working fluid injection part is separated by cutting the vapor chamber manufacturing member (100) along a reference line in the direction of the working fluid injection part from the laser-welded joint in the flat area on the channel part.

[0084] The remaining portion of the thin film vapor chamber manufacturing member (100), from which the working fluid injection portion has been separated and removed, is entirely sealed from the outside by a portion additionally joined across the outer joint of the chamber portion and the channel portion, and constitutes a vacuum chamber comprising a single internal space filled with a working fluid.

[0085] FIG. 7 is a partial enlarged view of a component for manufacturing a vapor chamber to specifically explain the process of sealing the chamber part and separating the working fluid injection part during the process of manufacturing the thin film vapor chamber of FIG. 6.

[0086] Referring to FIG. 7(a), in the working fluid injection process, the working fluid moves along the flow path inside the working fluid injection section (C3) and then fills the chamber section (C1) through the channel section (C2). Here, the working fluid is filled in an amount determined by the volume of the internal space of the chamber section (C1) and the type of working fluid. For example, the working fluid may be injected to fill 20% to 30% of the total internal space of the chamber section (C1), but is not limited thereto. When the working fluid injection process is completed, as shown in FIG. 7(b), a flat area (701) is formed by pressing the middle of the channel section (C2) using a punch having a flat bottom surface arranged in a direction crossing the channel section (C2) and having a constant width in the longitudinal direction of the channel section (C2). The inner surface of the channel section (C2) corresponding to the flat area (701) is such that the upper plate and the lower plate are constricted against each other, and the connection between the chamber section (C1) and the working fluid injection section (C3), which are connected left and right through the channel section (C2), is severed.

[0087] Next, as shown in FIG. 7 (c), a joint (702) is formed by laser welding the middle of the flat area (701) in a direction across the channel portion (C2). Due to the joint (702), the chamber portion (C1) is completely sealed from the outside. Here, the joint (702) is formed in a straight line shape that crosses the center of the flat area (701), but according to other embodiments, it is also possible to form the joint (702) thickly. For example, the entire area extending from the left boundary of the flat area (701) to the center of the flat area (701) can be laser welded to more firmly seal the chamber portion (C1).

[0088] Finally, as shown in FIG. 7 (d), the thin film vapor chamber can be completed by cutting the member for manufacturing the thin film vapor chamber along a reference line crossing the middle of the right flat area (701) of the joint (702) to separate the part including the working fluid injection part (C3). Since the part of the working fluid injection part (C3) only contributes to the efficient injection of the working fluid and does not function as a vapor chamber, cutting and removing this part allows for a smaller thin film vapor chamber to be obtained.

[0089] The positions of the flattened area (701), the joint (702), and the reference line for cutting may be determined differently depending on the fixed installation space inside the portable electronic device where the thin film vapor chamber is installed. For example, when manufacturing a thin film vapor chamber using the thin film vapor chamber manufacturing member of the present disclosure, if it is required that the shape of the vapor chamber be a perfect rectangle, the flattened area can be pressed so that it extends from a virtual line that makes the chamber part (C1) form a perfect rectangle at the boundary point between the chamber part (C1) and the channel part (C2) toward the working fluid injection part (C3). After creating a joint on this flattened area so as to be close to the chamber part (C1), the remaining part including a significant portion of the working fluid injection part (C3) and the channel part (C2) is cut and removed so that the overall shape of the outer edge of the vapor chamber is a rectangle, a long rectangular thin film vapor chamber can be obtained.

[0090] As described above, the overall size of the completed thin film vapor chamber can be reduced by cutting and removing the portion including the working fluid injection part (C3), but according to another embodiment, it may be installed inside a portable electronic device without cutting the working fluid injection part (C3). For example, if the chamber part (C1) is sealed by sealing the chamber part (C1) by applying pressure with a punch so that the remaining parts excluding the chamber part (C1) in the thin film vapor chamber manufacturing member are all flat, and the remaining parts are connected in a form where two thin film plates are stacked and compressed on one side of the chamber part (C1) which performs a heat dissipation function, the thin film vapor chamber is completed.

[0091] Although the technical concept of the present invention has been described above together with the accompanying drawings, this is merely an illustrative description of the best embodiment of the present invention and is not intended to limit the invention.

[0092] Accordingly, the present invention is not limited to the specific preferred embodiments described above, and anyone with ordinary knowledge in the art to which the invention pertains can make various modifications without departing from the essence of the invention as claimed in the claims, and such modifications will be within the scope of the claims.

Claims

1. A lower plate in the form of a metal thin film including a working fluid inlet formed through the center of one end; and It includes an upper plate in the form of a metal thin film having a shape symmetric to the lower plate and having a vapor chamber on the bottom surface and a space groove for forming a path extending from the working fluid inlet to the vapor chamber, When the bottom surface of the upper plate is joined to the upper surface of the lower plate, an internal space is formed between the upper plate and the lower plate, the internal space comprising an operating fluid injection part formed around the operating fluid injection port by the space groove, a chamber part for forming the vapor chamber, and a channel part for connecting the operating fluid injection part and the chamber part to each other. A component for manufacturing a thin film vapor chamber.

2. In Paragraph 1, The above-mentioned thin film vapor chamber manufacturing component is, A member for manufacturing a thin film vapor chamber, further comprising a mesh-type sheet interposed within the chamber portion and in close contact with the bottom surface of the upper plate and the upper surface of the lower plate.

3. In Paragraph 1, The above space groove is, A member for manufacturing a thin film vapor chamber, formed by press-forming the upper plate, which is in the form of a single thin film.

4. In Paragraph 1, The above working fluid injection unit is, A gate channel formed in the peripheral area of ​​the above-mentioned working fluid inlet; An outer channel formed separately and spaced apart along the perimeter of the gate channel, with one side connected to the channel portion; and A member for manufacturing a thin film vapor chamber, comprising one or more connecting passages forming a connecting passage between the gate passage and the outer passage.

5. In Paragraph 4, The above working fluid injection unit is, A member for manufacturing a thin film vapor chamber, wherein the bottom surface of the upper plate and the top surface of the lower plate are in close contact with each other between the gate channel and the outer channel, and a separation region is formed to spatially separate the gate channel and the outer channel.

6. In Paragraph 5, The above gate channel is a circular space having an inner diameter larger than the diameter of the above working fluid inlet, and A member for manufacturing a thin film vapor chamber, wherein the above connecting channel is one or more spaces formed radially from the gate channel to the outer channel.

7. In Paragraph 1, The above working fluid injection unit is, A member for manufacturing a thin film vapor chamber, having a length equal to the height of the working fluid injection part and including two or more support ribs formed at regular intervals along the inner circumference of the working fluid injection port in the direction inward of the working fluid injection part.

8. In Paragraph 1, The above chamber part is, A plurality of first embos formed protruding downward on an inner surface corresponding to the bottom surface of the upper plate; and A member for manufacturing a thin film vapor chamber, comprising at least one of a plurality of second embos formed protruding upwardly on an inner surface corresponding to the bottom surface of the lower plate.

9. In Paragraph 1, The above channel section is, A member for manufacturing a thin-film vapor chamber, wherein the lower plate and the upper plate are joined together to form a length between the chamber portion and the working fluid injection portion equal to the width of the area forming the outer edge of the chamber portion.

10. A method for manufacturing a thin film vapor chamber using a member for manufacturing a thin film vapor chamber according to any one of claims 1 to 9, A step of preparing a member for manufacturing a thin film vapor chamber by joining the upper edge of the lower plate and the lower edge of the upper plate together; A step of maintaining the internal space of the above-mentioned thin film vapor chamber manufacturing member in a vacuum state and injecting a working fluid into the internal space through the working fluid inlet port; A step of sealing the chamber portion filled with the working fluid by joining the interruption of the above channel portion; and A step of separating the working fluid injection part from the vapor chamber including the chamber part by cutting along a preset reference line perpendicular to the longitudinal direction of the channel part on the channel part. including Method for manufacturing a thin film vapor chamber.

11. In Paragraph 10, The step of sealing the chamber portion filled with the working fluid by joining the interruption of the channel portion is A step of forming a flat area by applying vertical pressure to the middle of the channel section so that the upper surface of the lower plate forming the inner surface of the middle of the channel section and the lower surface of the upper plate are in close contact vertically, thereby isolating the chamber section and the working fluid injection section from each other; and A method for manufacturing a thin film vapor chamber, comprising the step of welding the flat area so that the chamber portion is sealed.

12. In Paragraph 11, The step of forming a flat area by applying vertical pressure to the interruption of the channel section above is: A method for manufacturing a thin film vapor chamber, comprising the step of compressing the upper surface area of ​​the upper plate corresponding to the interruption of the channel portion with a punch.

13. In Paragraph 11 The step of welding the flat area so that the above chamber portion is sealed is, A method for manufacturing a thin film vapor chamber, comprising the step of performing laser welding in a direction across the interruption of the channel portion on the flat area.

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