Textile apparatus with offset conductive elements

The textile apparatus with laterally offset conductive threads in light-emitting textiles addresses obstruction issues by diffusing light from adjacent regions, ensuring continuous illumination and cost-effective, durable lighting effects.

WO2026123012A1PCT designated stage Publication Date: 2026-06-11DOTBLISS LLC
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Patent Information

Authority / Receiving Office
WO · WO
Patent Type
Applications
Current Assignee / Owner
DOTBLISS LLC
Filing Date
2025-12-08
Publication Date
2026-06-11

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Abstract

Textile and flexible-substrate apparatuses are disclosed that are configured to generate controlled energy emission or mechanical responses through structures that include conductive and dielectric materials. A textile or flexible substrate may incorporate woven, knitted, non-woven, or printed conductive elements positioned above an energy-emitting or response-generating layer. One or more additional conductive elements are positioned with a spatial offset relative to the overlying conductive structures to establish electric, electromagnetic, or stress-inducing fields within laterally adjacent regions of the functional layer. Activation of these laterally adjacent regions enables illumination, electromagnetic energy, radio-frequency output, or piezoelectric mechanical responses to propagate through the textile or flexible substrate, including regions aligned with non-transmissive conductive structures. These configurations support controlled emission or mechanical actuation while reducing shadowing, field disruption, or mechanical coupling effects typically caused by opaque or rigid conductive materials.
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Description

TEXTILE APPARATUS WITH OFFSET CONDUCTIVE ELEMENTSCROSS-REFERENCE TO RELATED APPLICATIONS

[0001] This application claims the benefit of U.S. Provisional Patent Application No. 63 / 729,059, filed December 6, 202 December 6, 2024, entitled TEXTILEAPPARATUS WITH OFFSET CONDUCTIVE ELEMENTS, the disclosure of which is hereby incorporated herein by reference in its entirety for all purposes.FIELD

[0002] The invention relates to the field of electronics in general, and more particularly, to electronic circuits.BACKGROUND

[0003] Textiles can incorporate functional elements, such as conductive features, positioned above light-emitting layers to form illuminated garments, decorative lighting fabrics, adaptive visual displays, and other photonic textile systems. Conventional light-emitting textile designs often rely on transparent conductive materials placed over an emissive layer to reduce obstruction of emitted light. Although such materials can function in certain constructions, they may introduce considerations related to cost, durability, manufacturability, and compatibility with bending, stretching, or other textile deformations.SUMMARY

[0004] Textile and flexible-substrate apparatuses are disclosed that are configured to generate controlled energy emission or mechanical responses through structures that include conductive and dielectric materials. A textile or flexible substrate may incorporate woven, knitted, non-woven, or printed conductive elements positioned above an energy-emitting or response-generating layer. One or more additional conductive elements are positioned with a spatial offset relative to the overlying conductive structures to establish electric, electromagnetic, or stress-inducing fields within laterally adjacent regions of the functional layer. Activation of these laterally adjacent regions enables illumination, electromagnetic energy, radio-frequency output, or piezoelectric mechanical responses to propagate through the textile or flexible substrate, including regionsaligned with non-transmissive conductive structures. These configurations support controlled emission or mechanical actuation while reducing shadowing, field disruption, or mechanical coupling effects typically caused by opaque or rigid conductive materials.

[0005] Certain illustrative examples are described in the following numbered clauses:

[0001] Clause 1. A textile illumination apparatus, comprising: a textile substrate comprising a plurality of threads including at least one opaque conductive thread and at least one dielectric thread; an energy-emitting layer positioned beneath the textile substrate and configured to emit energy in response to an applied electric field; and a conductive element positioned beneath the energy-emitting layer; wherein the opaque conductive thread and the conductive element are configured to receive respective electrical potentials, and wherein the conductive element is laterally offset from the opaque conductive thread by a spatial offset such that at least one lateral edge of the conductive element is not vertically aligned with a corresponding lateral edge of the opaque conductive thread relative to a stacking direction, wherein a potential difference applied between the opaque conductive thread and the conductive element generates an electric field through the energy-emitting layer, the spatial offset thereby influencing a distribution of the electric field such that the electric field activates a region of the energy-emitting layer located laterally adjacent to the opaque conductive thread, the activation producing emitted energy that propagates into a region corresponding to a footprint of the opaque conductive thread on a side of the textile substrate opposite the energy-emitting layer.

[0002] Clause 2. The apparatus of clause 1, wherein activation of the region of the energyemitting layer located laterally adjacent to the opaque conductive thread reduces formation of a visually perceptible dark region associated with the opaque conductive thread when the textile illumination apparatus is viewed from a side of the textile substrate opposite the energy-emitting layer.

[0003] Clause 3. The apparatus of clause 1, wherein the emitted energy propagating into the region corresponding to the footprint of the opaque conductive thread reduces shadowing caused by the opaque conductive thread such that, when illuminated at part of the activation, the opaque conductive thread exhibits an apparent translucency due to emission entering the viewing region from laterally activated portions of the energy-emitting layer.

[0004] Clause 4. The apparatus of clause 1 , wherein emission from the laterally activated region produces a continuous illumination field across areas occupied by the opaque conductive thread when viewed from a side of the textile substrate opposite the energy-emitting layer.

[0005] Clause 5. The apparatus of clause 1, wherein the emitted energy entering the region corresponding to the footprint of the opaque conductive thread provides illumination at an intensity sufficient to mask opacity-induced discontinuities in emitted energy.

[0006] Clause 6. The apparatus of clause 1, wherein the spatial offset comprises a lateral displacement such that at least one lateral edge of the conductive element is shifted laterally relative to an opposing lateral edge of the opaque conductive thread, thereby defining a lateral space between the conductive element and the opaque conductive thread when viewed along the stacking direction.

[0007] Clause 7. The apparatus of clause 6, wherein the lateral space corresponds to a nonoverlapping region between the conductive element and the opaque conductive thread.

[0008] Clause s. The apparatus of clause 1, wherein the spatial offset comprises a lateral displacement of between 5 micrometers and 10 millimeters between an edge of the opaque conductive thread and an edge of the conductive element.

[0009] Clause 9. The apparatus of clause 1, wherein the spatial offset comprises a minimum lateral spacing of at least 10 micrometers between a lateral edge of the conductive element and a laterally adjacent boundary of the opaque conductive thread.

[0010] Clause 10. The apparatus of clause 1, wherein the opaque conductive thread has an optical transmission of less than 20% for wavelengths emitted by the energy-emitting layer.

[0011] Clause 11. The apparatus of clause 1, wherein the conductive element comprises a printed or deposited conductive layer selected from metallic nanoparticle inks, conductive polymers, carbon-based conductors, or metal-flake inks.

[0012] Clause 12. The apparatus of clause 1, wherein the energy-emitting layer comprises an electroluminescent composition including at least one of phosphor particles, emissive polymers, or quantum-dot materials.

[0013] Clause 13. The apparatus of clause 1, further comprising a dielectric layer positioned between the energy-emitting layer and the conductive element, the dielectric layer defining at least a portion of a vertical separation between the energy -emitting layer and the conductive element.

[0014] Clause 14. The apparatus of clause 1, wherein the region of the energy-emitting layer activated by the influenced electric field extends laterally by at least 50 micrometers beyond a boundary of the opaque conductive thread.

[0015] Clause 15. The apparatus of clause 1, wherein the conductive element comprises a geometric shape selected from a frame, ring, outline, perforated region, tessellated region, or segmented conductive pad.

[0016] Clause 16. The apparatus of clause 1, wherein the textile substrate comprises a woven structure in which the opaque conductive thread alternates between upper and lower surfaces of the textile substrate.

[0017] Clause 17. The apparatus of clause 1, wherein the textile substrate is stretchable or deformable, and the spatial offset substantially maintains lateral electric-field activation under bending, stretching, or shear deformation.

[0018] Clause 18. The apparatus of clause 1, wherein the conductive element is positioned within an interior opening of a frame-shaped conductive region associated with the opaque conductive thread, the spatial offset being defined by separation between the internal boundary of the frame and the perimeter of the conductive element.

[0019] Clause 19. The apparatus of clause 1, wherein the activation of the energy-emitting layer reduces formation of a shadowed region that would otherwise occur beneath the opaque conductive thread in the absence of the spatial offset.

[0020] Clause 20. The apparatus of clause 1, wherein emitted energy from the laterally activated region propagates through one or more dielectric threads toward the side of the textile substrate opposite the energy-emitting layer.

[0021] Clause 21. The apparatus of clause 1, wherein the spatial offset comprises a combination of lateral displacement and vertical separation, producing a compound electric-field redistribution within the energy-emitting layer.

[0022] Clause 22. The apparatus of clause 1, wherein the conductive element is electrically coupled to a lower conductive layer through a vertically oriented conductive interconnect positioned beneath the energy-emitting layer.

[0023] Clause 23. The apparatus of clause 1, wherein the emitted energy is visible light.

[0024] Clause 24. The apparatus of clause 1 , wherein the emitted energy comprises electromagnetic radiation outside the visible spectrum, including one or more of infrared energy, ultraviolet energy, radio-frequency energy, or thermal radiation.

[0025] Clause 25. The apparatus of clause 1, wherein the emitted energy comprises mechanical energy generated by a piezoelectric or electroactive polymer layer.

[0026] Clause 26. The apparatus of clause 1, wherein the emitted energy corresponds to a wavelength band selected from visible, infrared, ultraviolet, or radio-frequency bands.

[0027] Clause 27. The apparatus of clause 1, wherein the at least one dielectric thread has a diameter ranging from approximately 0.01 mm to 0.1 mm.

[0028] Clause 28. The apparatus of clause 1, wherein the at least one opaque conductive thread has a diameter ranging from approximately 0.01 mm to 0.05 mm.

[0029] Clause 29. The apparatus of clause 1 , wherein energy emitted from the energy-emitting layer appears generally uniform across a surface of the textile structure when viewed from a viewing position on a side of the textile structure opposite to the energy-emitting layer.

[0030] Clause 30. The apparatus of clause 1, wherein each conductive thread of the plurality of conductive threads is an opaque conductive thread, and wherein the energy emitted from the energy-emitting layer appears uniform despite the presence of the opaque conductive threads between the viewing position and the energy-emitting layer.

[0031] Clause 31. The apparatus of clause 1, wherein the spatial offset between a particular conductive thread and a corresponding elongated conductive element is generally uniform along a length of the particular conductive thread.

[0032] Clause 32. The apparatus of clause 1, wherein each of the plurality of conductive threads has a smaller diameter than each of the plurality of dielectric threads.

[0033] Clause 33. The apparatus of clause 1, wherein each of the plurality of conductive threads is aligned with a respective one of the plurality of dielectric threads, and wherein the diameter of each dielectric thread is larger than the diameter of the respective conductive thread, such that the spatial offset between each of the plurality of conductive threads and the respective elongated conductive element corresponds to a distance between an edge of the conductive thread and a same edge of the respective elongated conductive element.

[0034] Clause 34. The apparatus of clause 1, wherein the patterned configuration of the plurality of conductive threads and the plurality of dielectric threads comprises a generally uniformgrid pattern, wherein the plurality of conductive threads and the plurality of dielectric threads are positioned at substantially equal intervals.

[0035] Clause 35. The apparatus of clause 1, wherein the emitted energy entering the region corresponding to the footprint of the opaque conductive thread exhibits an intensity and spatial distribution sufficient to compensate for opacity-induced attenuation, thereby masking illumination discontinuities that would otherwise result from the opaque conductive thread blocking direct transmission of emitted energy

[0036] Clause 36. The apparatus of clause 1, wherein activation of the region of the energyemitting layer located laterally adjacent to the opaque conductive thread generates illumination that scatters and diffuses through the textile substrate so as to reduce formation of a visually perceptible dark region associated with the opaque conductive thread when viewed from a side of the textile substrate opposite the energy-emitting layer.

[0037] Clause 37. The apparatus of clause 1, wherein the emitted energy propagating into the region corresponding to the footprint of the opaque conductive thread undergoes scattering or diffusion through dielectric threads of the textile substrate, thereby reducing shadowing caused by the opaque conductive thread such that illumination within the footprint region is maintained despite the opaque conductive thread being substantially non-transmissive.

[0038] Clause 38. The apparatus of clause 1, wherein illumination produced by the laterally activated region propagates through interstitial regions of the textile substrate and combines optically with illumination from adjacent regions to form a substantially continuous illumination field across areas occupied by the opaque conductive thread when viewed from a side of the textile substrate opposite the energy-emitting layer.

[0039] Clause 39. A method for generating emitted energy through a textile substrate comprising an opaque conductive thread, the method comprising: providing a textile illumination apparatus, the textile illumination apparatus comprising: a textile substrate comprising a plurality of threads including at least one opaque conductive thread and at least one dielectric thread, an energy-emitting layer positioned beneath the textile substrate, and a conductive element positioned beneath the energy-emitting layer, the conductive element being laterally offset from the opaque conductive thread by a spatial offset such that at least onelateral edge of the conductive element is not vertically aligned with a corresponding lateral edge of the opaque conductive thread relative to a stacking direction; and applying a first electrical potential to the opaque conductive thread and a second electrical potential to the conductive element so as to establish a potential difference between them, wherein, in response to the applied potential difference, an electric field extends through the energy-emitting layer, wherein the spatial offset influences a distribution of the electric field such that a region of the energy-emitting layer located laterally adjacent to the opaque conductive thread becomes activated, and wherein the activated region emits energy that propagates into a region corresponding to a footprint of the opaque conductive thread on a side of the textile substrate opposite the energy-emitting layer.

[0040] Clause 40. A printed illumination structure, comprising: a textile substrate; a first conductive layer positioned beneath the textile substrate; a light-emitting layer positioned beneath the first conductive layer and configured to emit energy in response to an applied electric field; a dielectric layer positioned beneath the light-emitting layer; a second conductive layer positioned beneath the dielectric layer; and a lower conductive layer positioned beneath the second conductive layer and electrically coupled to the second conductive layer through a vertically oriented conductive interconnect; wherein the first conductive layer and the second conductive layer are configured to receive respective electrical potentials; wherein the second conductive layer is laterally offset from the first conductive layer by a spatial offset such that at least one lateral edge of the second conductive layer is not vertically aligned with a corresponding lateral edge of the first conductive layer relative to a stacking direction; wherein, in response to a potential difference applied between the first conductive layer and the second conductive layer, an electric field extends through the light-emitting layer; wherein the spatial offset influences a distribution of the electric field such that the electric field activates a region of the light-emitting layer located laterally adjacent to the first conductive layer; andwherein the activated region produces emitted energy that propagates into a region corresponding to a footprint of the first conductive layer on a side of the textile substrate opposite the light-emitting layer.

[0041] Clause 41. The illumination structure of clause 36, wherein the first conductive layer comprises a conductive frame defining an interior opening and the second conductive layer is positioned within the interior opening while remaining laterally spaced from at least a portion of an interior boundary of the conductive frame.

[0042] Clause 42. The illumination structure of clause 36, wherein the first conductive layer has a larger lateral footprint than the second conductive layer such that the spatial offset is produced by a difference in size between the two conductive layers.

[0043] Clause 43. The illumination structure of clause 36, wherein the second conductive layer is intentionally displaced laterally relative to the first conductive layer in at least one direction in the plane of the illumination structure.

[0044] Clause 44. The illumination structure of clause 36, wherein activation of the laterally adjacent region reduces formation of a dark or non-illuminated region associated with the footprint of the first conductive layer when viewed from a side of the textile substrate opposite the lightemitting layer.

[0045] Clause 45. The illumination structure of clause 36, further comprising a second dielectric layer positioned adjacent to or beneath the second conductive layer.

[0046] Clause 46. The illumination structure of clause 41, wherein the second conductive layer is electrically coupled to the lower conductive layer through a printed or deposited conductive interconnect extending through at least one dielectric layer.

[0047] Clause 47. The illumination structure of clause 36, wherein the spatial offset comprises a lateral separation between 5 micrometers and 5 millimeters between a lateral boundary of the first conductive layer and a laterally adjacent boundary of the second conductive layer.

[0048] Clause 48. The illumination structure of clause 36, wherein the first conductive layer comprises a circular conductive frame defining a circular interior opening and the second conductive layer comprises a circular conductive region positioned within the interior opening while remaining circumferentially laterally spaced therefrom to produce a circular spatial offset.

[0049] Clause 49. The illumination structure of clause 36, wherein the illumination structure comprises an array of discrete illumination units, each unit including a first conductive layerformed as a square conductive frame and a second conductive layer positioned within an interior opening of the square conductive frame, the first and second conductive layers of each unit being electrically isolated from corresponding conductive layers of adjacent units to enable independent activation of each illumination unit.

[0050] Clause 50. The illumination structure of clause 36, wherein multiple illumination units are arranged in a linear array such that each unit includes a first conductive layer shaped as a square conductive frame and a second conductive layer positioned within the corresponding frame, the first and second conductive layers of each unit being electrically independent from those of adjacent units to support unit-by-unit activation along the linear array.

[0051] Clause 51. The illumination structure of clause 36, wherein the first conductive layer of each illumination unit includes a conductive tab extending outward from a perimeter of the conductive frame to provide a dedicated routing or connection interface while maintaining electrical isolation between first conductive layers of adjacent units.

[0052] Clause 52. The illumination structure of clause 36, wherein the first conductive layers of multiple illumination units are interconnected by a continuous conductive bar extending across the array, the second conductive layers of the illumination units remaining electrically isolated from one another such that the conductive bar enables simultaneous activation of the illumination units while permitting selective driving of individual lower conductive layers.

[0053] Clause 53. A textile apparatus configured for mechanical response, comprising: a plurality of conductive threads, each of the plurality of conductive threads being configured to contribute to a field; a plurality of dielectric threads, wherein the plurality of conductive threads and the plurality of dielectric threads are arranged in a patterned configuration to form a textile structure; a functional layer positioned adjacent to the textile structure, the functional layer being configured to produce a mechanical response when activated; and an elongated conductive element, the elongated conductive element arranged generally parallel to, and spatially offset from, a conductive thread of the plurality of conductive threads, wherein the field is generated by a potential difference between the elongated conductive element and the corresponding conductive thread, the field interacting with the functional layer to activate the mechanical response,wherein the presence of the spatial offset between the elongated conductive element and the corresponding conductive thread reduces mechanical coupling between the elongated conductive element and the corresponding conductive thread, thereby modifying the stiffness of the textile structure compared to a configuration without a spatial offset, and facilitating the propagation of mechanical waves through the conductive thread in response to the mechanical response.

[0054] Clause 54. A textile apparatus configured for energy emission or mechanical response, comprising: a plurality of conductive threads, each of the plurality of conductive threads being configured to contribute to a field and being substantially non-transmissive to a form of energy; a plurality of dielectric threads, each of the plurality of dielectric threads being configured to influence energy transmission or structural interaction, wherein the plurality of conductive threads and the plurality of dielectric threads are arranged in a patterned configuration to form a textile structure; a functional layer positioned adjacent to the textile structure, the functional layer being configured to produce a predefined response when activated; and at least one elongated conductive element, each of the at least one elongated conductive elements arranged generally parallel to, and spatially offset from, a respective one of the plurality of conductive threads, wherein the field is generated by a potential difference between each conductive thread and the corresponding elongated conductive element, the field interacting with the functional layer to activate the predefined response, wherein the spatial offset between a particular conductive thread and a corresponding elongated conductive element affects a distribution of the field, activating regions of the functional layer near the conductive threads to produce the predefined response, wherein when the functional layer is configured for energy emission, the spatial offset contributes to an appearance that the predefined response originates from or passes through the conductive thread, despite their non-transmissive nature; wherein when the functional layer configured for mechanical response, the spatial offset reduces stiffness in the conductive thread, allowing mechanical waves to propagate through the threads and the functional layer more effectively than with no spatial offset.BRIEF DESCRIPTION OF THE DRAWINGS

[0055] FIGS. 1A, IB, 1C, and ID illustrate example embodiments of a system configured to support the operation of one or more electrically functional devices positioned on or within garments.

[0056] FIGS. 2A, 2B, 2C, 2D, and 2E illustrate example embodiments of a stacked structure configured to provide electrically stable transmission paths on flexible or deformable substrates, showing variations in layer width, thickness, and routing geometry across different cross-sectional and plan-view locations.

[0057] FIG. 3 illustrates an embodiment of a stacked structure that can operate as a shielded or fully encapsulated variant of the stacked structures described previously.

[0058] FIG. 4 illustrates an embodiment of a stacked structure.

[0059] FIGS. 5A, 5B, 5C, and 5D illustrate example embodiments of textile structures that can serve as substrates described herein.

[0060] FIGS. 6A and 6B illustrate embodiments in which woven conductive and dielectric threads are combined with deposited flexible layers to form portions of the transmission paths.

[0061] FIGS. 7A, 7B, and 7C illustrate an example flexible, textile-compatible capacitor structure that can be incorporated into the transmission paths or stacked structures described herein.

[0062] FIG. 7B illustrates a perspective view in which the capacitor array is positioned on a substrate that includes one or more previously deposited layers.

[0063] FIG. 7C illustrates a cross-section of the capacitor structure taken along line C-C'.

[0064] FIG. 8 illustrates an embodiment of a housing structure configured to electrically interface with a textile substrate.

[0065] FIG. 9A illustrates an example textile structure including conductive threads and dielectric threads arranged in a patterned configuration to support electrical connectivity and energy-emitting functionality.

[0066] FIG. 9B illustrates an example cross-sectional view of the textile structure of FIG. 9A, along the Y-Z plane, showing the spatial arrangement of conductive and dielectric threads across the upper and lower surfaces.

[0067] FIG. 10 provides a cross-sectional view of an example textile system configured for energy emission, shown along the Y-Z plane.

[0068] FIG. 1 1A illustrates an exploded view of the illumination structure showing the arrangement of the textile substrate and the printed or deposited layers configured to activate the light-emitting layer.

[0069] FIG. 1 IB illustrates a cross-sectional view of the illumination structure taken along 11B- 11B’.

[0070] FIG. 12A illustrates an example illumination element in which the offset-based activation architecture is implemented using a circular electrode geometry.

[0071] FIG. 12B illustrates an embodiment of an illumination element arranged within a linear or two-dimensional array of discrete illumination units.

[0072] FIG. 12C illustrates an embodiment of an illumination-element array in which multiple illumination units are arranged in a linear configuration.

[0073] FIG. 12D illustrates an example illumination-element array similar to FIG. 12C, except that the upper conductive layers of adjacent units include conductive tabs or lead regions.

[0074] FIG. 12E illustrates an example illumination-element array in which the upper conductive layers of the illumination units are connected by a continuous conductive bar extending along the upper edge of the array.DETAILED DESCRIPTIONIntroduction

[0075] Light-emitting textiles usually have two main layers: a textile layer made of threads on top, and a light-emitting layer underneath. When electricity is applied, the light-emitting layer produces illumination. Conductive threads woven into the textile layer are used to carry the electrical signal needed to activate that light-emitting layer. However, many conductive threads are opaque, meaning they cannot let light pass through. When these opaque threads sit above the light-emitting layer, they can block or interfere with the light coming from below, which can make the illumination look uneven, dim, or disrupted.

[0076] One way to avoid this problem is to use transparent conductive threads instead of opaque ones. Transparent conductive threads can carry electrical signals while also allowing light to pass through them. But these transparent materials come with trade-offs. They are usually more expensive, more difficult to manufacture, and less durable, especially in textiles that need to bend,stretch, or withstand regular wear. Due or these or other limitations, relying on transparent conductive threads can make it harder to create practical, long-lasting light-emitting textiles.

[0077] Some inventive concepts described herein relate to techniques for creating the visual impression that light is not being blocked or interrupted by opaque conductive materials positioned on a textile. In many light-emitting textiles, a textile layer made of conductive and dielectric threads may be arranged above a light-emitting layer that produces illumination when electrically activated. Although opaque conductive threads would normally obstruct or interfere with light coming from the underlying layer, the techniques described herein can generate lighting effects that make the illumination appear continuous and uninterrupted across these opaque regions. In some cases, these effects can be achieved without requiring the conductive threads themselves to transmit light and without relying on transparent conductive materials.

[0078] Some inventive concepts described herein relate to a textile apparatus that includes a patterned arrangement of opaque conductive threads and dielectric threads positioned above a light-emitting layer. The threads provide structural and functional characteristics of the textile, while the light-emitting layer generates illumination when energized. At least some conductive elements are strategically positioned with a spatial offset relative to the opaque conductive threads. This spatial offset allows electric fields to activate the light-emitting layer in regions adjacent to the opaque threads. Illumination produced in these adjacent regions can diffuse outward, creating a visual effect in which light appears to originate directly beneath or near the opaque conductive threads, even though the threads do not transmit light. Such configurations can reduce reliance on transparent conductive materials and may offer benefits such as lower material costs, simplified manufacturing, and improved durability and flexibility for applications including wearable technology, illuminated displays, and decorative fabrics.

[0079] Some inventive concepts described herein can therefore support light-emitting textiles that maintain visually integrated illumination while reducing dependence on transparent conductive materials. By incorporating spatially offset conductive elements together with patterned arrangements of opaque and dielectric threads, the textile can produce controlled and aesthetically consistent lighting effects. These approaches can support durable, flexible, and cost- efficient light-emitting textiles suitable for a wide range of uses, including wearable devices, interactive displays, and decorative or architectural lighting systems.

[0080] As an illustrative example, consider a garment in which a decorative logo is stitched using an opaque conductive thread positioned above a region intended to emit light. Under normal conditions, this opaque thread would block light coming from the underlying light-emitting layer, resulting in a dark, non-illuminated line wherever the thread sits. Using the techniques described herein, the textile can instead be configured so that the opaque conductive thread is arranged in a defined positional relationship with another conductive element within the textile. Because of this positional relationship, the light-emitting layer becomes activated in areas located immediately beside the opaque thread rather than directly underneath it. When these adjacent regions emit light, the illumination spreads and diffuses around the thread. To an external viewer, the lighting can appear smooth and continuous, without the dark interruption that would typically occur. The visual effect can even make the opaque thread appear as though it is glowing or allowing light to pass through it, despite the fact that the thread remains non-transmissive.System Overview

[0081] FIGS. 1 A-1D illustrate example embodiments of a system 100 configured to support the operation of one or more electrically functional devices 6 positioned on or within garments 8A, 8B, 8C, or 8D (individually or collectively referred to as garment 8). The system 100 can include the garment 8, the electrically functional devices 6, and / or one or more transmission paths 9 that electrically couple the electrically functional devices 6 across the garment 8. The system 100 can support sensing, signaling, communication, power distribution, or other electrical functions in wearable or non-wearable textile environments in which the garment 8 can undergo repeated or variable mechanical deformation.

[0082] The garment 8 can be a flexible or deformable textile structure capable of bending, stretching, compressing, folding, or otherwise changing shape during normal use. The garment 8 can include, but is not limited to, shirts, j ackets, vests, sweaters, gloves, gauntlets, hats, headbands, balaclavas, socks, shoes, boots, belts, wearable harnesses, wearable packs, fanny packs, purses, backpacks, or other textile articles worn or carried. The garment 8 can provide a structural platform that supports distributed placement of the electrically functional devices 6 and the transmission paths 9 while accommodating repeated deformation and maintaining electrical connectivity.

[0083] The garment 8 can be formed from any combination of woven, knitted, laminated, composite, multilayer, or film-backed textile substrates that can support deposition, printing, weaving, knitting, embroidery, or embedding of conductive or dielectric layers used to form thetransmission paths 9. The garment 8 can be configured to tolerate mechanical stresses such as, but not limited to, tension, torsion, shear, compression, or cyclical folding. The garment 8 can be configured to tolerate environmental exposure to moisture, perspiration, ultraviolet radiation, or temperature changes. These or other mechanical and environmental conditions can change impedance, resistance, or capacitive coupling along the transmission paths 9, and the system 100 can maintain stable electrical performance by incorporating textile-integrated structures that regulate these variations. In some embodiments, the transmission paths 9 can be arranged to preserve electrical continuity or stable signal characteristics as the garment 8 deforms so that the system 100 operates effectively across a wide range of wearable textile conditions.

[0084] It will be appreciated that the same technical principles described for garments can also be applied to a wide range of non-wearable textile structures. These can include, but are not limited to, curtains, drapes, upholstery panels, soft-wall partitions, architectural textile panels, canopies, sails, flexible covers, medical wraps, and therapeutic compression textiles. In any context, these textile structures can incorporate the electrically functional devices 6 or the transmission paths 9 to support capabilities such as, but not limited to, sensing, signaling, communication, illumination, interactive displays, or other illuminated fabric systems.

[0085] The electrically functional devices 6 can include textile-compatible electronic components that are suitable for distributed placement on the garment 8 or on other textile structures. The electrically functional devices 6 can include, but are not limited to, sensors, displays, processor circuits, RF transmitter circuits, RF receiver circuits, RF damper structures, RF reflector structures, RF absorber structures, photonic receivers, photonic transmitters, FPGAs, ASICs, data-interface circuits, or power supplies. The electrically functional devices 6 can be arranged to operate individually or in groups and can be positioned across different regions of the garment 8 to support sensing, signaling, communication, illumination, computation, or powermanagement functions. In some embodiments, combinations of electrically functional devices 6 can operate cooperatively so that the system 100 performs coordinated system-level functions, including distributed data acquisition, multi-point communication, environmental monitoring, user interaction, or localized processing distributed across the garment 8. In some embodiments, the electrically functional devices 6 can include or interface with illumination-producing structures integrated into the textile.

[0086] The transmission paths 9 can provide electrical coupling between the electrically functional devices 6 and can distribute signals or power across the garment 8 in a stable and predictable manner. The transmission paths 9 can be arranged to support a wide range of electrical topologies, including point-to-point, daisy-chained, bus, peer-to-peer, star, ring, mesh, tree, or endpoint arrangements. In some embodiments, the transmission paths 9 can operate as passive elements, such as antennas or resonant structures, configured to influence electromagnetic behavior within the garment 8. In some embodiments, the transmission paths 9 can support serial or parallel signaling formats or can facilitate intentional conversion of electrical energy to mechanical energy, such as localized actuation or vibration, where such functionality is desired in the system 100.

[0087] FIG. 1A illustrates an embodiment in which the electrically functional devices 6 are distributed on a sweater-type garment 8A. The transmission paths 9 can extend along regions such as the sleeves, chest, or torso. As the wearer moves, these garment regions can undergo bending, twisting, or stretching that can deform the transmission paths 9. Such deformation can alter impedance or voltage levels. In some embodiments, the transmission paths 9 can include flexible conductive layers, flexible dielectric layers, flexible conductive shield layers, or stacked structures configured to stabilize electrical performance during deformation of the garment 8A.

[0088] FIG. IB illustrates an embodiment in which the garment 8B is a helmet-type structure. The electrically functional devices 6 can be positioned on curved or multi-axis surfaces and the transmission paths 9 can be routed across these surfaces. When the garment 8B is worn, adjusted, removed, or subjected to external forces, localized deformation can occur. The transmission paths 9 can be arranged to preserve signal integrity despite changes in curvature or surface shape.

[0089] FIG. 1C illustrates an embodiment in which the garment 8C is a tent-type textile structure. The electrically functional devices 6 can be distributed across the textile panels of the garment 8C. The transmission paths 9 can extend across regions that undergo folding, unfolding, compression, or tensioning. In some embodiments, the transmission paths 9 can be configured to provide stable electrical behavior despite repeated compaction or large-scale geometric changes associated with deployment or storage of the garment 8C.

[0090] FIG. ID illustrates an embodiment in which the garment 8D is a backpack-type textile structure. The electrically functional devices 6 can be positioned on the panel surfaces of the garment 8D and the transmission paths 9 can extend across regions affected by loading, strapadjustments, or wearer movement. The distributed placement of the electrically functional devices 6 can support sensing, illumination, communication, or power-distribution functions integrated into the garment 8D.

[0091] The distributed placement of the electrically functional devices 6 on the garment 8 can result in different regions of the garment 8 moving relative to one another during normal use. Such movement can deform the transmission paths 9 in multiple dimensions, which can alter electrical characteristics such as impedance or voltage stability. Some aspects of the inventive concepts can employ flexible conductive layers, flexible dielectric layers, flexible conductive shield layers, or stacked structures configured to maintain consistent electrical performance during deformation. These or other features can allow the electrically functional devices 6 to communicate or operate reliably as part of the system 100 while the garment 8 undergoes routine or repeated mechanical manipulation.

[0092] Additional disclosure relating to conductive structures, textile-integrated electrical pathways, or housing configurations suitable for use with the system 100 can be found in U.S. Patent Application Publication No. 2024-0389238 Al, published on November 21, 2024, entitled “CONDUCTIVE STRUCTURES AND HOUSING STRUCTURES FOR TRANSMISSION ON DEFORMABLE SURFACES.” The entirety of U.S. Patent Application Publication No. 2024- 0389238 Al is incorporated herein by reference.

[0093] FIGS. 2A-2E illustrate example embodiments of a stacked structure 10 configured to provide electrically stable transmission paths 9 on flexible, creaseable, or deformable substrates. The stacked structure 10 can operate as part of, or can form, the transmission paths 9 described herein, such as with respect to FIGS. 1 A-1D, where the stacked structure 10 can be integrated onto or within the garment 8 to electrically couple the electrically functional devices 6 distributed across the garment 8. The stacked structure 10 can stabilize electrical performance in environments where conductive patterns, electronic inks, or conductive threads may otherwise undergo impedance drift, voltage fluctuation, or signal distortion due to multi-axis mechanical deformation. Aspects of the inventive concepts can mitigate signal degradation arising from bending, folding, twisting, shear, compression, environmental exposure, or electromagnetic interference so that the system 100 can perform the sensing, signaling, communication, illumination, or power-management functions supported by the transmission paths 9.

[0094] The stacked structure 10 can include a substrate 11 that supports sequentially deposited or otherwise formed electrically functional layers. The substrate 11 can be rigid or flexible and can include materials such as, but not limited to, woven or knitted textiles, non-woven textiles, PET fdms, paper, laminates, composites, or other deformable surfaces. In some embodiments, the substrate 11 can include patterned conductive features configured to interface with or complement the stacked structure 10.

[0095] The stacked structure 10 can include a deposited flexible conductive shield layer 12 formed on the substrate 11. The deposited flexible conductive shield layer 12 can be configured to provide electromagnetic shielding, ground referencing, or noise rejection. Materials suitable for the deposited flexible conductive shield layer 12 can include, but are not limited to, conductive particle-filled polymers, metallic nanoparticle inks, conductive filaments, or other conductive compositions exhibiting suitable conductivity and mechanical flexibility.

[0096] A deposited flexible dielectric layer 13 can be formed on the deposited flexible conductive shield layer 12. The deposited flexible dielectric layer 13 can provide electrical insulation, controlled capacitance, or defined spacing between adjacent conductive layers. Materials suitable for the deposited flexible dielectric layer 13 can include, but are not limited to, polymer inks, elastomeric urethanes, elastomeric silicones, plasticized acrylics, solvent-borne dielectric materials, or high-k or low-k dielectric compositions depending on the desired electrical behavior.

[0097] A deposited flexible conductive layer 14 can be formed on the deposited flexible dielectric layer 13. The deposited flexible conductive layer 14 can operate as a signal trace, power trace, or ground reference and can carry data, control voltages, power currents, or electromagnetic signals. Materials suitable for the deposited flexible conductive layer 14 can include, but are not limited to, conductive inks, silver nanoparticle inks, copper nanoparticle inks, conductive polymers, conductive filaments, or other conductive materials exhibiting bendability and creaseability. The deposited flexible conductive layer 14 can have a width and thickness selected for desired impedance, current-carrying capacity, or resonant behavior.

[0098] A second deposited flexible dielectric layer 15 can be formed on the deposited flexible conductive layer 14. The deposited flexible dielectric layer 15 can define the spacing between the deposited flexible conductive layer 14 and an outer conductive shield. The deposited flexible dielectric layer 15 can include materials similar to, but not limited to, those used for the depositedflexible dielectric layer 13 and can be deposited with controlled width and thickness to regulate capacitance, shielding distance, or mechanical flexibility.

[0099] A second deposited flexible conductive shield layer 16 can be formed on the deposited flexible dielectric layer 15. The deposited flexible conductive shield layer 16 can function as an electromagnetic shield, noise barrier, or supplemental ground plane. In some embodiments, the deposited flexible conductive shield layer 16 can provide electromagnetic protection against environmental interference such as Wi-Fi signals, cellular signals, radar signals, infrared radiation, or ambient electromagnetic fields. In some embodiments, the deposited flexible conductive shield layer 16 can provide moisture resistance or mechanical reinforcement.

[0100] FIG. 2A illustrates an embodiment in which the widths of the layers in the stacked structure 10 decrease with increasing height. FIG. 2A illustrates a cross-section of the stacked structure 10 taken along line 2A-2A' in FIG. 2E. As shown, the deposited flexible conductive shield layer 16 can have the largest width, followed by the deposited flexible dielectric layer 15, the deposited flexible dielectric layer 13, and the deposited flexible conductive layer 14. This stepped profile can be configured to improve mechanical resilience, distribute bending strain, or regulate edge-field behavior that influences impedance and electromagnetic coupling.

[0101] FIG. 2B illustrates a transverse cross-section of the stacked structure 10 taken along line 2B-2B' in FIG. 2E. The layers can be substantially uniform along the Z-axis in regions where the stacked structure 10 experiences consistent dimensional requirements. In some embodiments, the uniformity shown in FIG. 2B can be used for regions requiring consistent impedance, controlled parasitics, or predictable electromagnetic characteristics.

[0102] FIG. 2C illustrates a cross-section of the stacked structure 10 taken along line 2C-2C. At this location, the deposited flexible conductive layer 14 can have a width W2 and a thickness T2 selected for specific electrical requirements. For example, W2 and T2 can be reduced in regions requiring controlled impedance for high-speed signaling or increased in regions requiring greater current-carrying capacity.

[0103] FIG. 2D illustrates a different location along the stacked structure 10 where the deposited flexible conductive layer 14 has a width W3 and thickness T3. This variation demonstrates that the deposited flexible conductive layer 14 can be formed with different widths or thicknesses along its length to achieve desired functional behavior. For example, the deposited flexible conductivelayer 14 can widen near power-distribution regions and narrow near high-frequency routing regions.

[0104] As shown in FIG. 2E, the stacked structure 10 can follow curved, angled, or spiral routing paths along the substrate 11. The stacked structure 10 can remain electrically functional as it bends through bending angles 9 or deforms along compound curves. The stacked structure 10 can be routed along straight portions, acute angles, or continuously varying undulations while maintaining electrical continuity or stable electrical characteristics. These features allow the stacked structure 10 to operate reliably on textiles, flexible sheets, wearable substrates, foldable panels, or other deformable surfaces.

[0105] The stacked structure 10 can accommodate multi-axis deformation without losing its intended electrical capability. The stacked structure 10 can remain functional when wrapped around bending radii less than 2 mm, 1 mm, or 0.5 mm depending on material selection. The stacked structure 10 can maintain electrical performance during repeated bending, twisting, or folding as typically encountered in wearable textiles, collapsible shelters, or portable electronic enclosures.

[0106] The stacked structure 10 can be compatible with printing, deposition, or fabrication processes such as, but not limited to, extrusion printing, inkjet printing, screen printing, additive printing, roll-to-roll printing, lamination, weaving, knitting, or embroidery. These processes can be used individually or in combination to form one or more of the deposited flexible conductive shield layers 12 and 16, the deposited flexible dielectric layers 13 and 15, or the deposited flexible conductive layer 14.

[0107] In some embodiments, the stacked structure 10 can be used to electrically couple integrated circuits, chiplets, sensors, emitters, or other electrically functional devices 6 through housing structures configured to align conductive features with the deposited flexible conductive layer 14. The stacked structure 10 can provide electrical coupling, environmental protection, or mechanical strain relief for the electrically functional devices 6.

[0108] In some embodiments, the stacked structure 10 can serve as a passive electromagnetic element, including, but not limited to, an antenna, a resonant structure, a capacitive coupler, or a shielding barrier. The widths, thicknesses, or relative positions of the layers can be selected to tune resonant frequencies, reduce noise coupling, or stabilize voltage levels.

[0109] Aspects of the inventive concepts can therefore allow the stacked structure 10 to support stable signal propagation, predictable electrical behavior, or reliable coupling to electrically functional devices 6 despite deformation of the substrate 11 or exposure to diverse environmental conditions.

[0110] FIG. 3 illustrates an embodiment of a stacked structure 30 that can operate as a shielded or fully encapsulated variant of the stacked structures 10 described with respect to FIGS. 2A-2E, and that can likewise be used as part of the transmission paths 9 described with respect to FIGS. 1A-1D. The stacked structure 30 can include a substrate 31 that can be an embodiment of the substrate 11. The substrate 31 can be rigid or flexible and can include materials such as woven or knitted textiles, non-woven textiles, PET fdms, paper, laminates, composites, or other deformable surfaces capable of supporting deposited flexible layers. The layers formed on the substrate 31 can each define a respective width in the X-direction and a respective thickness in the Y-direction, and the relative dimensions shown in FIG. 3 are not necessarily to scale.

[0111] According to FIG. 3, a deposited flexible dielectric layer 33 can be formed to fully surround a deposited flexible conductive layer 34 so that the deposited flexible conductive layer 34 is encapsulated on all sides. A deposited flexible conductive shield layer 32 can be formed to fully surround the deposited flexible dielectric layer 33 and thereby fully surround the deposited flexible conductive layer 34. This configuration can provide a fully shielded, environmentally protected conductive pathway suitable for integration into the system 100. In some embodiments, the deposited flexible dielectric layer 33 can include a piezoelectric material to support sensing, actuation, or other functional behavior while remaining compatible with deformation of the substrate 31.

[0112] FIG. 4 illustrates an embodiment of a stacked structure 40 that be an embodiment of the stacked structures 10 and 30 described herein, such as with respect to FIGS. 2A-2E and FIG. 3, or that can be used to form at least a portion of the transmission paths 9 described herein, such as with respect to FIGS. 1A-1D. The stacked structure 40 can include a substrate 41 that can be an embodiment of the substrate 11 and can be rigid or flexible. The substrate 41 can include textile or non-textile materials such as woven or knitted fabrics, non-woven textiles, PET films, paper, laminates, or composites capable of supporting deposited flexible layers. Each layer in FIG. 4 can define a respective width in the X-direction and a respective thickness in the Y-direction, and the relative dimensions are not necessarily shown to scale.

[0113] According to FIG. 4, a deposited flexible conductive shield layer 42 can be formed on the substrate 41. A deposited flexible dielectric layer 43 can be formed on the deposited flexible conductive shield layer 42 and can support formation of a deposited flexible conductive layer 44 thereon to provide an electrical signal path. A deposited flexible dielectric layer 43 can be formed to fully or at least partially surround the deposited flexible conductive layer 44, such as by covering an upper surface and at least a portion of the opposing sidewalls of the conductive layer to stabilize the electric field distribution around the conductor. A deposited flexible conductive shield layer 45 can be formed on the deposited flexible dielectric layer 43 so that the deposited flexible conductive layer 44 is enclosed between the deposited flexible conductive shield layer 42 and the deposited flexible conductive shield layer 45. In some embodiments, the deposited flexible dielectric layer 43 can have a width greater than the respective widths of the deposited flexible conductive shield layer 42 and the deposited flexible conductive shield layer 45 to further isolate the conductor from deformation-induced dimensional changes and external electromagnetic interference. In some embodiments, any or all of the deposited flexible dielectric layers can include a piezoelectric material configured to support sensing, actuation, or other electrical functions while remaining compatible with deformation of the substrate 41. The geometric proportions of layers 42, 43, 44, and 45 may vary along the length of the stacked structure 40, for example to tune impedance, capacitance, or other electrical characteristics useful for maintaining stable signal transmission under bending or stretching.

[0114] FIGS. 5A-5D illustrate example embodiments of textile structures that can serve as the substrate 11, the substrate 31, or the substrate 41 described herein, such as with respect to FIGS. 2A-2E, FIG. 3, and FIG. 4. These textile structures can form part of the garment 8 shown in FIGS. 1A-1D or can form part of other textile structures described herein. The embodiments shown in FIGS. 5A-5D demonstrate how conductive threads or non-woven conductive elements can be integrated into woven, knitted, or non-woven textile architectures to support formation of the transmission paths 9 or to interface with the stacked structures 10, the stacked structure 30, or the stacked structure 40.

[0115] FIG. 5 A illustrates an embodiment in which a conductive thread 241 is woven into the garment 8 alongside a plurality of dielectric threads 50 and dielectric threads 51. In this embodiment, the conductive thread 241 alternates between the upper surface and the lower surface of directly adjacent dielectric threads to form an integrated conductive path within the woventextile. For example, the conductive thread 241 can pass beneath the dielectric thread 50 along the lower surface of the garment 8 and then pass over the adjacent dielectric thread 51 along the upper surface of the garment 8. This arrangement is shown in enlarged form in FIG. 5B and can provide a mechanically compliant conductive pathway that maintains continuity while the garment 8 bends, stretches, or folds as described herein.

[0116] FIG. 5B illustrates a cross-sectional schematic taken along line A-A' of FIG. 5A. The conductive thread 241 is shown alternating between the upper surface and the lower surface of the dielectric threads 50 and dielectric threads 51 to create a woven interlace pattern. This configuration can provide a resilient conductive pathway that can cooperate with the stacked structures 10, the stacked structure 30, or the stacked structure 40, for example by serving as a ground reference, a signal conductor, or a distributed sensing element.

[0117] FIG. 5C illustrates an embodiment in which a knitted fabric includes one or more conductive threads integrated among a plurality of dielectric threads. The knitted architecture can provide enhanced extensibility relative to woven structures and can allow the conductive threads to remain electrically functional under multi-axis deformation. In some embodiments, the knitted structure shown in FIG. 5C can be used to support transmission paths 9 within highly stretchable regions of the garment 8 such as cuffs, waistbands, headwear bands, or joint-adjacent textile zones.

[0118] FIG. 5D illustrates an embodiment in which one or more non-woven conductive threads or conductive fdaments are embedded within a fabric having a woven inlay of dielectric threads. The non-woven conductive elements can form continuous or semi-continuous conductive pathways that can interface with one or more of the stacked structures described herein. The multilayer textile architecture shown in FIG. 5D can provide enhanced mechanical isolation, electromagnetic stability, or environmental protection, and can be used in applications where the garment 8 or other textile structure undergoes repeated compaction, expansion, or loading.

[0119] FIGS. 6A and 6B illustrate embodiments in which woven conductive and dielectric threads, such as those shown in FIGS. 5A-5D, are combined with deposited flexible layers to form portions of the transmission paths 9, such as those described with respect to FIGS. 1A-1D. These configurations integrate textile-embedded conductors with printed dielectric or shield layers so that the woven pathway can maintain stable electrical behavior while the garment 8 or other textile substrate bends, folds, stretches, or undergoes repeated deformation.

[0120] Referring to FIG. 6A, deposited flexible dielectric and conductive shield layers are applied to opposite surfaces of the textile substrate 8 that contains the woven conductive thread 241 and adjacent dielectric threads 50 and 51. On the upper surface, a deposited flexible dielectric layer 245 can be formed, followed by a deposited flexible conductive shield layer 246, and then a deposited flexible dielectric layer 247. On the lower surface, a deposited flexible dielectric layer 243 can be formed, followed by a deposited flexible conductive shield layer 244 and a deposited flexible dielectric layer 248. This creates a multilayer, shielded textile-printed structure in which the woven conductive thread 241 is enclosed between upper and lower dielectric-shield stacks. Such an arrangement can regulate impedance, suppress electromagnetic coupling, and stabilize signal levels during garment motion or environmental interaction.

[0121] FIG. 6B depicts an embodiment in which only deposited flexible dielectric layers are applied to the opposing surfaces of the textile substrate 8. A deposited flexible dielectric layer 245 can be formed on the upper surface, and a deposited flexible dielectric layer 243 can be formed on the lower surface. This configuration provides electrical insulation, spacing control, and environmental protection for the woven conductive thread 241 without incorporating conductive shield layers. The dielectric layers can be deposited directly onto the textile or fabricated separately and attached to the textile surface. In some embodiments, the deposited flexible dielectric layers can have a thickness between about 0.005 mm and about 4 mm.

[0122] FIGS. 7A-7C illustrate an example flexible, textile-compatible capacitor structure 700 that can be incorporated into the transmission paths 9 or the stacked structures described herein. These capacitive elements can provide distributed filtering, coupling, tuning, or energy-storage functionality on deformable substrates and can be fabricated using the same deposited flexible conductive, dielectric, and shield layers previously described.

[0123] FIG. 7A illustrates a plan view of a series of capacitors 700 formed by alternating deposited flexible conductive layers 701 and deposited flexible dielectric layers 702 arranged along a substrate. Each conductive layer 701 overlaps a corresponding dielectric layer 702 to define an individual capacitor, and adjacent capacitors can be arranged in a linear or curvilinear sequence. The pattern can be configured so that the capacitor array follows the deformed or contoured routing paths used by the stacked structures of FIGS. 2A-2E.

[0124] FIG. 7B illustrates a perspective view in which the capacitor array 700 is positioned on a substrate 261 that can include one or more previously deposited layers such as a flexibleconductive shield layer 262 and a flexible dielectric layer 263. An upper dielectric layer 265 and an upper conductive shield layer 266 can be deposited over the capacitor array to form an encapsulated multilayer structure. This arrangement can provide electromagnetic shielding, environmental resistance, and stable parasitic behavior even when the textile substrate bends, folds, or stretches as described herein.

[0125] FIG. 7C illustrates a cross-section of the capacitor structure 700 taken along line C-C' of FIG. 7A. Here, the deposited flexible conductive layers 701 extend over one deposited flexible dielectric layer 702 and curve downward beneath an adjacent dielectric layer 702. This alternating “over-and-under” routing allows the capacitors 700 to be coupled in series along the length of the structure. The dielectric layers 702 can include polymeric dielectrics, gel electrolytes, or other flexible dielectric media compatible with repeated textile deformation. The surrounding shield and dielectric layers (such as layers 263, 265, and 266) can regulate electric-field containment, reduce interference from adjacent transmission paths 9, and preserve stable capacitance values through mechanical manipulation of the substrate.

[0126] FIG. 8 illustrates an embodiment of a housing structure 251 configured to electrically interface with a textile substrate that includes one or more woven conductive threads 241 arranged among dielectric threads 50 and 51, such as those described with respect to FIGS. 5A-5D. The textile substrate can further include deposited flexible dielectric layers 245, 247, 243, and 248, and deposited flexible conductive shield layers 246 and 244, formed on the upper and lower surfaces of the textile, respectively, as described with respect to FIGS. 6A and 6B. These deposited layers can regulate impedance, electromagnetic behavior, and environmental isolation while maintaining compatibility with multi-axis deformation of the textile structure.

[0127] As shown in FIG. 8, the woven conductive thread 241 can be positioned at a location below a pad 215 of the housing structure 251. The pad 215 can include a tapered or stepped portion configured to extend through the deposited flexible dielectric layers 247 and 245 and through portions of the deposited flexible conductive shield layer 246. This tapered portion can establish electrical contact with the woven conductive thread 241 so that a signal carried by the conductive thread 241 is electrically coupled to a lead 216 of a packaged integrated circuit device 250 or other electrically functional device secured within the housing structure 251.

[0128] In some embodiments, the geometry of the pad 215 and the configuration of the deposited flexible dielectric and shield layers can be selected to provide mechanical strain relief, stableimpedance, and controlled electric-field distribution during bending, stretching, compression, or shear of the textile substrate. In some embodiments, the deposited flexible dielectric layers can include piezoelectric materials to support sensing or actuation functions while remaining compatible with the deformation of the textile. The arrangement shown in FIG. 8 can therefore support reliable signal transfer, device attachment, or localized processing functions within the system 100 while the surrounding textile undergoes routine or repeated mechanical manipulation. Textile illumination structures

[0129] Textile illumination structures can be implemented using various thread-based configurations depending on weaving style, mechanical flexibility, or desired illumination behavior. In some embodiments, illumination functionality is provided through a textile layer composed of conductive threads and dielectric threads arranged above a light-emitting layer. Such arrangements can include patterned placements of opaque conductive threads, thread interlacing sequences, and intervening dielectric regions that cooperate with the underlying light-emitting material to produce illumination suitable for integration into flexible textile surfaces.

[0130] The spatial relationship between the conductive threads, the dielectric threads, and the underlying light-emitting layer can influence how electric fields form across the textile and where illumination is initiated within the emissive material. A defined spatial offset between a conductive thread and a corresponding conductive element positioned beneath the textile can establish regions of electric-field activation laterally adj acent to portions of the opaque conductive thread rather than only in vertically aligned regions. Illumination generated in these adjacent regions can pass between or through the dielectric threads, diffuse within the textile structure, and create a visual impression that illumination extends across areas occupied by the opaque conductive threads, even though the conductive threads do not transmit light. These textile-integrated illumination architectures can be incorporated into garments, flexible panels, or woven and knitted structures to support lighting features compatible with bending, stretching, draping, or other forms of textile deformation.

[0131] FIG. 9A illustrates an example textile structure 900 including conductive threads 950, 941 and dielectric threads 951, 943 arranged in a patterned configuration to support electrical connectivity and energy-emitting functionality. The textile structure 900 can be implemented within the garment 9 of the textile system 100 or within any other textile-based system described herein.

[0132] The textile structure 900 can include a combination of conductive threads 950, 941 and dielectric threads 951, 943, which can be woven into a pattern configured to support controlled energy emission, including visible light, infrared, ultraviolet, or radio waves. In some cases, the conductive threads 950, 941 can be configured to establish electrical pathways throughout the textile structure 900. These conductive threads 950, 941 may be generally non-transmissive to the relevant form of energy, for example allowing less than approximately 10% to 20% of incident light to pass through. In some cases, the dielectric threads 951, 943 can provide structural integrity and serve as a medium for energy emission. This design flexibility allows the textile 9 to adapt to various energy-emission requirements, such as optical displays, infrared signaling, or radio frequency communication, while preserving durability and adaptability for wearable and nonwearable applications. Although visible illumination is frequently described, the textile structure 900 can support activation of energy-emitting or signal-emitting layers across a range of wavelengths.

[0133] The conductive threads 950, 941 can be made of electrically conductive materials such as, but not limited to, carbon fibers, metal-coated filaments, or copper nanoparticles. In some cases, these conductive threads can be generally opaque, meaning they substantially prevent the transmission of energy, for example allowing less than approximately 10% to 20% of incident light to pass through. The conductive threads 950, 941 can be incorporated into the garment 9 in a woven or knitted pattern that can provide reliable electrical connectivity. In some cases, the use of opaque or generally opaque conductive threads can enhance the durability and strength of the textile structure 900. In some cases, one or more of the conductive threads 950, 941 can be translucent or semi-transparent.

[0134] As shown in FIG. 9 A, the conductive thread 941 can be woven into the garment 9 by alternatingly passing over and under adjacent conductive and dielectric threads to create a stable, interconnected structure. For example, the conductive thread 941 can pass beneath the conductive thread 950 on the lower surface of the garment 9 and then pass over the adjacent dielectric thread 951 on the upper surface of the garment 9. This alternating pattern of conductive and dielectric threads can enhance electrical connectivity throughout the textile while preserving flexibility, enabling the textile structure 900 to adapt to various shapes and movements.

[0135] The dielectric threads 951, 943 can be made of materials such as, but not limited to, nylon or polyester. In some cases, one or more of the dielectric threads 951, 943 can be transparent,translucent, or semi-transparent. Transparent materials can allow the transmission of at least approximately 100% of incident light, translucent materials can scatter light while allowing the transmission of approximately 50% to 100% of incident light, and semi-transparent materials can allow the transmission of approximately 30% to 70% of incident light. In some cases, one or more of the dielectric threads 951, 943 can be opaque or generally opaque.

[0136] It will be appreciated that different configurations or patterns may be used. For example, in some cases, all threads along one axis of the textile structure 900 may be dielectric threads, with fewer or no conductive threads along that axis. Such variations can provide design flexibility to suit specific application needs while maintaining the textile’s energy-emitting functionality.

[0137] FIG. 9B illustrates an example cross-sectional view of the textile structure 900 of FIG. 9A, along the Y-Z plane, showing the spatial arrangement of conductive threads and dielectric threads across the upper and lower surfaces. The conductive threads 950, 941 and dielectric threads 951 can be arranged along the Z-axis and positioned relative to an energy-emitting material (not shown) or a response-generating material (e.g., a piezoelectric layer, not shown) positioned beneath the textile structure 900. The conductive thread 941 is shown alternating between the upper surface and lower surface of the textile structure 900, passing beneath dielectric thread 951 on the lower surface and over the conductive thread 950 on the upper surface. This arrangement of the conductive threads 950, 941 and dielectric threads 951 can facilitate interaction with the energy-emitting material while maintaining the overall structure and functionality of the textile system 1000 or garment 9.

[0138] FIG. 10 provides a cross-sectional view of an example textile system 1000 configured for energy emission, shown along the Y-Z plane. The textile system 1000 can be an embodiment of the textile system 100 of FIG. 1. The textile system 1000 can include a textile structure that can be an embodiment of the textile structure 900 of FIG. 9A. The textile structure can include a plurality of conductive threads 950, 941 and dielectric threads 951 arranged in a patterned configuration to form the textile layer of the garment 9, as described with respect to FIG. 9A. The textile structure can be incorporated into systems that include multiple energy-emitting or response-generating zones distributed across a garment or other textile article, with such zones interconnected through conductive pathways or routing threads configured to support coordinated activation across the system.

[0139] It will be appreciated that the textile system 1000 can include different or additional layers configured to facilitate controlled energy emission. For example, the textile system 1000 can include an energy-emitting material, such as an energy-emitting layer 954. The energyemitting material can include, but is not limited to, phosphor nanoparticles, organic light-emitting compounds, emissive polymers, quantum-dot materials, or other suitable energy-emitting compositions. As shown, the energy-emitting layer 954 can be positioned adjacent to the textile structure, allowing activation of the energy-emitting material by an electric field generated within the multilayer arrangement.

[0140] The textile system 1000 can include conductive elements 1052 that are elongated and arranged generally parallel to the conductive threads 950. Due to the flexibility of the garment 9 and natural deformation of textile substrates, the conductive elements 1052 may not maintain perfect parallelism with the conductive threads 950 but can remain positioned with an approximately consistent spatial relationship. For example, an alignment tolerance of up to approximately 5%, 10%, 15%, or 20% deviation from exact parallelism can accommodate textile movement, bending, stretching, or changes in thread spacing. In some embodiments, each conductive element 1052 can extend across the full length of a corresponding conductive thread 950, while in other embodiments a conductive element 1052 extends only across a portion of that length, depending on garment design or the intended illumination or emission pattern.

[0141] A conductive element 1052 can be spatially offset from its corresponding conductive thread 950 by a spatial offset 1056. The spatial offset 1056 can facilitate formation of an electric field between the conductive thread 950 and the conductive element 1052, thereby activating the energy-emitting layer 954 positioned adjacent to the textile structure. The spatial offset 1056 can support a visual effect in which energy appears to emanate from areas directly beneath or adjacent to the opaque conductive threads 950. Because the electric field extends laterally across the energyemitting layer 954, illumination can originate from regions near the boundaries of the opaque conductive threads 950, and can diffuse outward through the textile structure. This diffusion can create a visual impression in which the opaque conductive threads 950 appear illuminated, partially transmissive, or visually integrated with the surrounding illuminated regions, even though the conductive threads 950 do not transmit energy.

[0142] Although the examples herein frequently discuss illumination or visible-light effects, the spatial-offset architecture is not limited to optical implementations. The lateral electric-fieldactivation enabled by the spatial offset 1056 can be applied to any energy-emitting layer, including infrared-, ultraviolet-, radio-frequency-, or other electromagnetic-emission materials. In such embodiments, the emitted energy can propagate through the textile structure or interact with surrounding materials in a manner analogous to the optical cases described, even though the resulting output may not be visible to the human eye.

[0143] In some embodiments, the spatial offset 1056 corresponds to the relative positioning between the conductive threads 950 and the conductive elements 1052 along the Y-axis. For example, the spatial offset 1056 may correspond to an offset between the left edges of a conductive thread 950 and its corresponding conductive element 1052, or an offset between their right edges. In other embodiments, the spatial offset 1056 may define a lateral distance between the left edge of a conductive thread 950 and the right edge of its corresponding conductive element 1052, or vice versa.

[0144] In some configurations, the conductive threads 950 and the conductive elements 1052 may partially overlap or may be center-aligned while still exhibiting a spatial offset due to differences in width. For example, the conductive elements 1052 may be wider than the conductive threads 950, such that one or both edges of a conductive element 1052 extend beyond the edges of the corresponding conductive thread 950. This dimensional difference can create a spatial offset 1056 along one or more edges, supporting lateral electric-field formation across the energyemitting layer 954.

[0145] In some embodiments, the spatial offset 1056 can include a horizontal displacement of the conductive element 1052 relative to the conductive thread 950, with distances ranging from approximately 0.05 millimeters to 5 millimeters, 0.05 millimeters to 9 millimeters, or specific values such as 0.05, 0.1, 0.15, 0.2, 0.25, 0.3, 0.4, 0.5, 0.6, or 0.65 millimeters (± manufacturing tolerances). The spatial offset 1056 may vary along the length of the conductive thread 950, with localized offsets in certain regions, or may transition gradually along the thread length, creating non-uniform patterns that support dynamic electric-field behavior. In some embodiments, the spatial offset 1056 includes displacement along the X-axis, Y-axis, or Z-axis. For example, along the Z-axis, the spatial offset 1056 may correspond to the vertical separation between the conductive thread 950 and the conductive element 1052, defined at least in part by the thickness of the energyemitting layer 954 or other intervening materials.

[0146] Although FIG. 10 and the associated discussion focus primarily on the functionality of an energy-emitting layer, similar structural configurations can be applied to a response-generating layer, such as a piezoelectric material configured to generate mechanical responses. In such embodiments, the energy-emitting layer can be replaced or supplemented with a responsegenerating layer configured to produce vibrations, taps, compressions, or other mechanical effects when energized by an electric field influenced by the spatial offset 1056 between the conductive threads and the conductive elements.

[0147] In configurations without a spatial offset — such as where the conductive threads and conductive elements fully overlap — the ability of the conductive threads to flex or move can be constrained. Reduced thread flexibility can limit the propagation of mechanical waves generated by a piezoelectric layer, potentially reducing mechanical effectiveness. By introducing a spatial offset 1056, the conductive threads can more readily accommodate mechanical motion, including the propagation of mechanical waves, while maintaining structural integrity of the textile.

[0148] For example, in a wearable garment, a piezoelectric layer may generate a vibration or tapping response intended to interact with the wearer. Such functionality may be used in fitness garments that produce tactile cues, or in safety garments that provide localized haptic alerts. The spatial offset 1056 can enhance these effects by allowing the conductive threads to flex and move along with the mechanical outputs, supporting reliable and responsive operation of the responsegenerating layer.Printed or Deposited Illumination Structures

[0149] Textile illumination systems can be implemented using various structural arrangements depending on fabrication preferences, mechanical behavior, or desired visual characteristics. In some embodiments, illumination functionality is provided through a multilayer printed or deposited stack positioned beneath a textile substrate. Such arrangements can include patterned conductive layers, dielectric materials, or light-emitting compositions that cooperate to produce illumination suitable for integration with flexible textile surfaces.

[0150] The spatial relationship between these layers can influence how electric fields form within the stack or where energy emission originates within the light-emitting or energy-emitting material. A defined spatial offset between conductive layers can position regions of electric-field activation laterally adjacent to opaque conductive elements rather than directly beneath them. Illumination generated in these adjacent regions can travel through the textile substrate or diffusewithin its fibrous structure in a manner that can create a visual impression that illumination extends across areas where the opaque conductive elements reside, even though those elements do not transmit light. These printed illumination architectures can be incorporated into garments, flexible substrates, or textile panels to support lighting features compatible with bending, folding, stretching, or other forms of textile deformation.

[0151] FIGS. 11A and 11B illustrate an example illumination structure 1100 that includes a multilayer printed or deposited stack positioned beneath a textile substrate 1153 and configured to activate a light-emitting layer 1154 using spatially offset conductive elements, such as conductive layers 1151, 1152, arranged in defined positional relationships with one another. The illumination structure 1100 can include the textile substrate 1153, the conductive layer 1151, the light-emitting layer 1154, a dielectric layer 1155 positioned beneath the light-emitting layer 1154, the conductive layer 1152 positioned beneath the dielectric layer 1155, a dielectric layer 1157 positioned adjacent to and / or coplanar with the conductive layer 1152, a dielectric layer 1158 positioned beneath the conductive layer 1152, a conductive layer 1161 positioned beneath or as part of the conductive layer 1152 and / or coplanar with the dielectric layer 1158, and a conductive layer 1159 positioned beneath the dielectric layer 1158 and the conductive layer 1152. The illumination structure 1100 is arranged such that there is a spatial offset 1156 between portions of the upper conductive element 1151 and the conductive layer 1152.

[0152] The illumination structure 1100 may be an embodiment of the electrically functional devices 6 described herein, and / or may be incorporated into the system 100 on a garment 8 or other textile structure. In some such embodiments, the illumination structure 1100 can function as an illumination-producing device positioned beneath the textile substrate 1153 and can cooperate with the transmission paths 9 or other conductive pathways described herein. The printed or deposited multilayer arrangement shown for the illumination structure 1100 can therefore serve as an example implementation of an illumination-capable device suitable for integration within the broader textile-based systems and architectures described throughout this disclosure.

[0153] FIG. 11A illustrates an exploded view of the illumination structure 1100 showing the arrangement of the textile substrate 1153 and the printed or deposited layers configured to activate the light-emitting layer 1154. FIG. 11B illustrates a cross-sectional view of the illumination structure 1100 taken along 11B-10B’ of FIG. 11A.

[0154] The textile substrate 1153 is shown as the uppermost layer of the illumination structure 1100. The textile substrate 1153 can be an embodiment of any textile or flexible substrate described herein, including woven, knitted, non-woven, laminated, composite, or film-backed constructions. In some embodiments, the textile substrate 1153 can be breathable, stretchable, rigid, semi-rigid, or coated with one or more films or surface treatments. The textile substrate 1153 can permit emitted illumination to pass through its fibers or openings, diffuse within its structure, or scatter across its surface.

[0155] The conductive layer 1151 is positioned beneath the textile substrate 1153. The conductive layer 1151 can be implemented as a printed or deposited conductor of any shape suitable for interacting with the underlying functional layers, such as continuous regions, patterned outlines, partial rings, closed or open loops, perforated conductive planes, conductive meshes, conductive lattices, polygonal frames, or irregular conductive boundaries. In some embodiments, the conductive layer 1151 can include one or more apertures, slots, windows, or non-conductive regions that define interior openings. Examples include, but are not limited to, circular frames, hexagonal frames, rectangular frames, multi-segment conductive arcs, or hybrid shapes combining curved and linear portions. In the illustrated embodiment, the conductive layer 1151 is implemented as a square conductive frame having a square interior opening, but this should not be construed as limiting.

[0156] The light-emitting layer 1154 is positioned beneath the conductive layer 1151. The lightemitting layer 1154 can include any photonic material, electroluminescent material, emissive composite, or energy-responsive medium suitable for producing illumination in response to an electric field. Examples include, but are not limited to, electroluminescent phosphor compositions, organic or inorganic photonic films, doped polymers, quantum-dot layers, micro-structured emissive matrices, or multi-phase emissive inks. The light-emitting layer 1154 can be continuous, patterned, segmented, or arranged in discrete islands. In the illustrated embodiment, the lightemitting layer 1154 is a continuous photonic layer positioned to emit light upward toward the textile substrate 1153.

[0157] The dielectric layer 1155 is positioned beneath the light-emitting layer 1154. In some cases, the dielectric layer 1155 can control electric-field spacing, regulate field distribution, reduce unintended coupling, or provide mechanical separation between conductive elements. The dielectric layer 1155 can include, but is not limited to, polymeric dielectrics, elastomericdielectrics, ceramic-enhanced films, nano-composite dielectrics, or flexible dielectric coatings. In some cases, the dielectric layer 1155 can include multiple sub-layers or gradient-thickness regions to shape electric-field strength or activation area. In the illustrated embodiment, the dielectric layer 1155 is implemented as a generally uniform dielectric film.

[0158] The conductive layer 1152 is positioned beneath the dielectric layer 1155. The conductive layer 1152 can be implemented using any printed or deposited conductive material suitable for forming functional electrodes within a multilayer illumination stack, including, but not limited to, metallic nanoparticle inks, conductive polymers, carbon-based conductors, metallic flake inks, cermet films, or hybrid conductive composites.

[0159] The conductive layer 1152 can be formed using a wide range of geometric configurations selected to support desired electric-field behavior, optical effects, or structural compatibility with the overlying conductive layer 1151. For example, the conductive layer 1152 can include solid conductive regions, perforated regions, segmented regions, outlines, rings, partial loops, tessellated patterns, continuous traces, or combinations of these configurations. Additional examples include circular pads, oval regions, polygonal regions, rectangles, multi-lobed shapes, grid-derived shapes, fractal-like shapes, or irregular outlines defined by manufacturing, aesthetic, or functional criteria. These shapes can be scaled, rotated, repeated, or patterned across a surface to cooperate with the conductive layer 1151 for intentional shaping of electric-field distribution within the illumination structure 1100. In the illustrated embodiment, the conductive layer 1152 is implemented as a smaller square conductive region sized to reside within the interior opening of the conductive layer 1151 when viewed along the stacking direction, but the relative size relationship can vary widely in other embodiments.

[0160] The conductive layer 1151 and the conductive layer 1152 can operate as electrode structures configured to receive an applied electrical potential. When a potential difference is applied between the conductive layer 1151 and the conductive layer 1152, an electric field is established within the layers positioned between them, including within the light-emitting layer 1154. The distribution of this electric field is influenced by the spatial offset 1156. Because the conductive layer 1151 and the conductive layer 1152 occupy laterally displaced positions, portions of the electric field extend laterally across the light-emitting layer 1154 rather than being confined to a region vertically aligned with either electrode. This lateral distribution of the electric fieldactivates regions of the light-emitting layer 1154 positioned beside the conductive layer 1 151 , thereby supporting the offset-based activation behavior described herein.

[0161] The spatial offset 1156 positions portions of the electric field formed between the conductive layer 1151 and the conductive layer 1152 so that these portions extend laterally within the light-emitting layer 1154. As the light-emitting layer 1154 responds to these laterally distributed electric-field regions, illumination can originate from areas located adjacent to the conductive layer 1151. Illumination generated in these adjacent regions can propagate upward through the textile substrate 1153 or can disperse within the fibrous structure of the textile substrate 1153, producing a visual effect in which illumination appears to extend across the area occupied by the conductive layer 1151 and visually integrates with the surrounding illuminated regions.

[0162] The spatial offset 1156 can be defined by the relative lateral positioning of the conductive layer 1151 and the conductive layer 1152. The spatial offset 1156 can occur when at least one lateral boundary, edge, vertex, contour, or perimeter region of the conductive layer 1152 is not vertically aligned with the corresponding boundary of the conductive layer 1151. This lack of vertical alignment can create a lateral separation between the two conductive layers when viewed normal to the plane of the illumination structure 1100. In this arrangement, the conductive layer 1151 and the conductive layer 1152 occupy distinct lateral positions within the stack rather than sharing a common projected footprint. In some embodiments, the spatial offset 1156 corresponds to the lateral spacing between the inner perimeter of the conductive layer 1151 and the outer perimeter of the conductive layer 1152 (or an associated conductive extension), such that the conductive layer 1152 resides within the interior opening of the conductive layer 1151 while remaining laterally separated from the interior boundary of the conductive layer 1151.

[0163] The spatial offset 1156 can be produced in a variety of ways. In some embodiments, the conductive layer 1151 has a larger footprint than the conductive layer 1152, producing an offset due to size differences even when the elements are nominally centered. In some embodiments, the conductive layer 1152 can be intentionally displaced in the X- or Y-direction relative to the conductive layer 1151, creating a defined lateral shift. Additional configurations can include edge staggering, in which only a portion of a boundary is offset, or rotational misalignment, in which the conductive layer 1152 is rotated at any angle relative to the conductive layer 1151 so that some edges become laterally displaced.

[0164] The spatial offset 1 156 can arise when the conductive layer 1 1 1 includes an interior cutout or opening that is generally complementary to an outward-facing shape of the conductive layer 1152. In some such embodiments, the conductive layer 1152 can reside within the cutout of the conductive layer 1151 while remaining laterally spaced from at least one portion of the interior boundary of the cutout. In some cases, a spatial offset 1156 is established around portions, or all, of the perimeter of the conductive layer 1152. In some cases, the cutout and internal shape can be square, circular, polygonal, irregular, or any other geometry selected for desired field behavior, manufacturability, or visual effect.

[0165] The spatial offset 1156 positions regions of electric-field interaction within the lightemitting layer 1154 laterally adjacent to portions of the conductive layer 1151 rather than solely in regions directly beneath it. As the light-emitting layer 1154 responds to these laterally shifted electric-field regions, illumination can originate from areas that are offset from the opaque conductive layer 1151. Illumination generated in these adjacent regions can propagate upward through the textile substrate 1153 or diffuse within its fibrous structure. This diffusion can reduce, soften, or visually mask the shadowing effects that would typically occur when an opaque conductive layer is positioned above a light-emitting material.

[0166] The spatial offset 1156 can be uniform or non-uniform. In some embodiments, the offset 1156 is consistent along the perimeter of the conductive layer 1152. In some embodiments, the spatial offset 1156 varies locally, such as through stepped offsets, curved offsets, asymmetric offsets, or composite patterns combining multiple offset modes. Any of these arrangements can support offset-based activation within the light-emitting layer 1154. These offset configurations can contribute to producing illumination that appears to extend across, around, or visually blend with regions occupied by the conductive layer 1151, even though the conductive layer 1151 itself does not transmit light.

[0167] The spatial offset 1156 can be implemented across a wide range of lateral separations depending on, for example, material selection, printing resolution, dielectric thickness, desired illumination profile, or other design considerations. In some embodiments, the spatial offset 1156 can be on the order of micrometers, such as between approximately 5 micrometers and 500 micrometers. In some embodiments, the spatial offset 1156 can extend into sub-millimeter or millimeter ranges, such as between approximately 0.05 millimeters and 5 millimeters, including about 0.05, 0.1, 0.2, 0.25, 0.3, 0.4, 0.5, 0.75, 1.0, 1.25, 1.5, 2.0, 3.0, 4.0, 5.0, 5.0, 6.0, 7.0, 8.0, 9.0,or 10 millimeters (± tolerances determined by fabrication). In some embodiments, the spatial offset 1156 can vary along the perimeter of the conductive layer 1152, transitioning between different offset magnitudes in different regions. The spatial offset 1156 can include compound or multi-axis components, such as combined X-axis and Y-axis displacement or rotational components measured as angular offsets. Any of these values or combinations can support formation of laterally positioned electric-field regions within the light-emitting layer 1154 and can contribute to the offset-based illumination behavior described herein.

[0168] The dielectric layer 1157 is positioned adjacent to the conductive layer 1152. The dielectric layer 1157 can provide electrical insulation, mechanical support, stress distribution, or structural stabilization for the conductive layer 1152 and for the surrounding printed or deposited layers. The dielectric layer 1157 can be formed as a continuous dielectric region, a patterned dielectric region, or a selectively applied dielectric region. In some embodiments, the dielectric layer 1157 can include compliant dielectric materials configured to accommodate textile deformation, thermal expansion, localized strain, or repeated bending associated with wearable or flexible substrates.

[0169] The dielectric layer 1158 is positioned beneath the conductive layer 1152 and beneath the dielectric layer 1157. The dielectric layer 1158 can contribute additional electrical insulation, mechanical layering, environmental protection, or field-shaping characteristics within the illumination structure 1100. The dielectric layer 1158 can include elastomeric dielectrics, thermoplastic films, laminated dielectric sheets, or printed dielectric coatings deposited to achieve a desired thickness or stiffness profile. In some embodiments, the dielectric layer 1157 and the dielectric layer 1158 can collectively function as different portions of a single dielectric structure, and can include an engineered opening, recess, or through-dielectric region configured to receive a vertically oriented conductive interconnect. This configuration allows the conductive layer 1152 to electrically interface with the conductive layer 1159 while maintaining controlled dielectric spacing in surrounding regions.

[0170] The conductive layer 1159 is positioned beneath the dielectric layer 1158. The conductive layer 1159 can function as a conductive substrate, a reference conductor, a grounding conductor, or a distributed conductive base for the illumination structure 1100. The conductive layer 1159 can be implemented as a continuous conductive sheet, a segmented conductive region, a perforated conductive pattern, or a shaped conductive region selected to tune electrical behavior,field distribution, or mechanical support of the multilayer assembly. In some embodiments, the conductive layer 1159 is electrically coupled to the conductive layer 1152 through a conductive interconnect 1161 extending vertically through the dielectric layers 1157 and 1158. The conductive interconnect 1161 can include a printed conductive column, a conductive post, a conductive pillar, a plated-through connection, a deposited conductive stud, a stacked printed via, or any vertically oriented conductive feature configured to establish electrical continuity between the conductive layer 1152 and the conductive layer 1159. In some embodiments, the conductive layer 1159 can be combined with one or more dielectric layers to form an integrated lower electrode-dielectric assembly configured to provide field shaping, mechanical reinforcement, or environmental protection within the illumination structure 1100.

[0171] In an illustrative example of operation, an electrical drive signal is applied to the conductive layer 1151 while a corresponding return signal is applied to the conductive layer 1159. The conductive layer 1152 is electrically coupled to the conductive layer 1159 through the vertically oriented conductive interconnect 1161 that extends through the dielectric layer 1157 and the dielectric layer 1158. When the potential difference is established between the conductive layer1151 and the conductive layer 1152, an electric field forms across the intervening layers, including across the light-emitting layer 1154. Because the conductive layer 1151 and the conductive layer1152 are laterally offset relative to one another, portions of the electric field extend laterally through the light-emitting layer 1154 and activate regions that lie beside the conductive layer 1151. The activated portions of the light-emitting layer 1154 generate illumination that propagates upward toward the textile substrate 1153. As the illumination diffuses through or across the fibrous structure of the textile substrate 1153, the emitted light can create a visual appearance in which illumination appears to originate from regions aligned with the conductive layer 1151, from regions adjacent to it, or across the combined footprint of both regions. This behavior can visually blend illumination across areas where the conductive layer 1151 is located, producing an effect in which the conductive layer 1151 appears integrated into an illuminated zone without visibly interrupting or blocking the transmitted light.

[0172] It will be appreciated that the multilayer printed or deposited stack described herein can be configured to activate a wide range of energy-emitting or response-generating materials. For example, the stack may be implemented with visible-light emissive materials, infrared-emissive materials, ultraviolet-emissive materials, radio-frequency radiating materials, thermal-emissioncoatings, piezoelectric layers, electroactive polymers, or other functional media configured to generate optical, electromagnetic, thermal, or mechanical outputs when subjected to an applied electric field. Accordingly, the spatially offset conductive architecture can support diverse forms of energy emission or response generation without being limited to any particular emission modality or material system.

[0173] FIG. 12A illustrates an example illumination element 1200A in which the offset-based activation architecture described herein is implemented using a circular electrode geometry. The illumination element 1200A includes an upper conductive layer 1251 A formed as a circular conductive frame defining a circular interior opening. The light-emitting layer 1254A is positioned beneath the upper conductive layer 1251 A within a multilayer printed or deposited stack.

[0174] A lower conductive layer 1252A is positioned beneath the light-emitting layer 1254A. The lower conductive layer 1252A is implemented as a smaller circular conductive region located within the interior opening of the upper conductive layer 1251 A when viewed along the stacking direction. A spatial offset 1256A is defined between the inner boundary of the upper conductive layer 1251 A and the outer boundary of the lower conductive layer 1252A, thereby establishing a circumferential region of lateral separation between the two conductive layers.

[0175] This circular spatial offset 1256A can support lateral electric-field formation within the light-emitting layer 1254A, enabling illumination to originate from regions positioned adjacent to portions of the upper conductive layer 1251 A.

[0176] FIG. 12B illustrates an embodiment of an illumination element 1200B arranged within a linear or two-dimensional array of discrete illumination units. Each illumination unit includes an upper conductive layer 125 IB, a light-emitting layer 1254B, and a lower conductive layer 1252B, arranged according to the offset-based multilayer architecture described herein.

[0177] The upper conductive layer 125 IB is implemented as a square conductive frame defining an interior opening. The lower conductive layer 1252B is implemented as a smaller square conductive region positioned within the interior opening of the upper conductive layer 125 IB when viewed along the stacking direction. A spatial offset 1256B is defined between the inner boundary of the upper conductive layer 125 IB and the outer boundary of the lower conductive layer 1252B, creating a lateral separation around at least a portion of the perimeter of the lower conductive layer 1252B.

[0178] Each illumination unit shown in FIG. 12B is electrically separate and not intrinsically interconnected with the adjacent units. Each square illumination element can therefore be individually driven, independently controlled, or selectively activated, depending on the electrical routing applied to its associated conductive layers. The separateness of the illumination units enables localized lighting patterns, per-element modulation, segmented displays, or dynamic lighting effects.

[0179] FIG. 12B demonstrates that the offset-based activation architecture can be replicated across an array of separate illumination elements, enabling scalable, patterned, or distributed lighting functionality while preserving the spatial offset relationships that influence electric-field distribution and illumination behavior.

[0180] FIG. 12C illustrates an embodiment of an illumination-element array 1200C in which multiple illumination units are arranged in a linear configuration. Each illumination unit includes an upper conductive layer 1251C, a light-emitting layer 1254C positioned beneath the upper conductive layer 1251C, and a lower conductive layer 1252C positioned beneath the light-emitting layer 1254C. The upper conductive layer 1251C of each illumination unit is implemented as a square conductive frame having a square interior opening, and the lower conductive layer 1252C is implemented as a square conductive region positioned within the interior footprint of the corresponding conductive frame. A spatial offset is formed between each pair of upper and lower conductive layers (e g., between conductive layer 1251C and conductive layer 1252C) consistent with the offset relationships described herein.

[0181] The illumination units shown in FIG. 12C are electrically independent, such that conductive layers 1251C and conductive layers 1252C in adjacent units do not share continuous conductive regions. Each unit can therefore receive a separate activation signal, allow per-unit control, or operate in a mode in which the illumination pattern varies across the linear array.

[0182] FIG. 12D illustrates an example illumination-element array 1200D similar to the embodiment shown in FIG. 12C, except that the upper conductive layers 125 ID of adjacent illumination units are configured to include conductive tabs or lead regions extending therefrom.

[0183] FIG. 12E illustrates an example illumination-element array 1200E in which the upper conductive layers 125 IE of the illumination units are connected by a continuous conductive bar extending along the upper edge of the array. Each illumination unit includes an upper conductive layer 125 IE, a light-emitting layer 1254E beneath the upper conductive layer 125 IE, and a lowerconductive layer 1252E positioned beneath the light-emitting layer 1254E. As with the other embodiments, each pair of conductive layers (115 IE, 1252E) exhibits a spatial offset consistent with the offset-based activation described previously.

[0184] In the embodiment of FIG. 12E, the upper conductive layer 125 IE of each unit is electrically continuous with the upper conductive layer 125 IE of adjacent units through the shared conductive bar. The lower conductive layers 1252E remain non-connected and electrically independent. This configuration allows for simultaneous activation of multiple illumination units through a shared upper electrode, while allowing the lower electrodes 1252E to be driven individually, grouped, or patterned to generate dynamic illumination effects. The shared conductive bar can support row-based addressing, simplified routing, or coordinated dimming or pulsing effects across the linear array.Terminology

[0185] Conjunctive language such as the phrase “at least one of X, Y and Z,” unless specifically stated otherwise, is otherwise understood with the context as used in general to convey that an item, term, etc. may be either X, Y or Z. Thus, such conjunctive language is not generally intended to imply that certain embodiments require at least one of X, at least one of Y and at least one of Z to each be present.

[0186] Conditional language, such as, among others, “can,” “could,” “might,” or “can,” unless specifically stated otherwise, or otherwise understood within the context as used, is generally intended to convey that certain embodiments include, while other embodiments do not include, certain features, elements, and / or steps. Thus, such conditional language is not generally intended to imply that features, elements and / or steps are in any way required for one or more embodiments or that one or more embodiments necessarily include logic for deciding, with or without user input or prompting, whether these features, elements and / or steps are included or are to be performed in any particular embodiment.

[0187] Unless the context clearly requires otherwise, throughout the description and the claims, the words “comprise,” “comprising,” and the like are to be construed in an inclusive sense, as opposed to an exclusive or exhaustive sense; that is to say, in the sense of “including, but not limited to.” As used herein, the terms “connected,” “coupled,” or any variant thereof means any connection or coupling, either direct or indirect, between two or more elements; the coupling or connection between the elements can be physical, logical, or a combination thereof. Additionally,the words “herein,” “above,” “below,” and words of similar import, when used in this application, refer to this application as a whole and not to any particular portions of this application. Where the context permits, words in the above detailed description using the singular or plural number can also include the plural or singular number respectively. The word “or” in reference to a list of two or more items, covers all of the following interpretations of the word: any one of the items in the list, all of the items in the list, and any combination of the items in the list. Likewise, the term “and / or” in reference to a list of two or more items, covers all of the following interpretations of the word: any one of the items in the list, all of the items in the list, and any combination of the items in the list.

[0188] Depending on the embodiment, certain operations, acts, events, or functions of any of the algorithms described herein can be performed in a different sequence, can be added, merged, or left out altogether (for example, not all are necessary for the practice of the algorithms). Moreover, in certain embodiments, operations, acts, functions, or events can be performed concurrently, for example, through multi -threaded processing, interrupt processing, or multiple processors or processor cores or on other parallel architectures, rather than sequentially.

[0189] Systems and modules described herein can comprise software, firmware, hardware, or any combination(s) of software, firmware, or hardware suitable for the purposes described herein. Software and other modules can reside and execute on servers, workstations, personal computers, computerized tablets, PDAs, and other computing devices suitable for the purposes described herein. Software and other modules can be accessible via local memory, via a network, via a browser, or via other means suitable for the purposes described herein. Data structures described herein can comprise computer files, variables, programming arrays, programming structures, or any electronic information storage schemes or methods, or any combinations thereof, suitable for the purposes described herein. User interface elements described herein can comprise elements from graphical user interfaces, interactive voice response, command line interfaces, and other suitable interfaces.

[0190] Further, the processing of the various components of the illustrated systems can be distributed across multiple machines, networks, and other computing resources. In addition, two or more components of a system can be combined into fewer components. Various components of the illustrated systems can be implemented in one or more virtual machines, rather than in dedicated computer hardware systems and / or computing devices. Likewise, the data storagedevices shown can represent physical and / or logical data storage, including, for example, storage area networks or other distributed storage systems. Moreover, the connections between the components shown can represent possible paths of data flow, rather than actual connections between hardware. While some examples of possible connections are shown, any of the subset of the components shown can communicate with any other subset of components in various implementations.

[0191] Embodiments are also described above with reference to flow chart illustrations and / or block diagrams of methods, apparatus (systems) and computer program products. Each block of the flow chart illustrations and / or block diagrams, and combinations of blocks in the flow chart illustrations and / or block diagrams, can be implemented by computer program instructions. Such instructions can be provided to a processor of a general purpose computer, special purpose computer, specially-equipped computer (for example, comprising a high-performance database server, a graphics subsystem, etc.) or other programmable data processing apparatus to produce a machine, such that the instructions, which execute via the processor(s) of the computer or other programmable data processing apparatus, create means for implementing the acts specified in the flow chart and / or block diagram block or blocks.

[0192] These computer program instructions can also be stored in a non-transitory computer- readable memory that can direct a computer or other programmable data processing apparatus to operate in a particular manner, such that the instructions stored in the computer-readable memory produce an article of manufacture including instruction means which implement the acts specified in the flow chart and / or block diagram block or blocks. The computer program instructions can also be loaded onto a computing device or other programmable data processing apparatus to cause a series of operations to be performed on the computing device or other programmable apparatus to produce a computer implemented process such that the instructions which execute on the computer or other programmable apparatus provide steps for implementing the acts specified in the flow chart and / or block diagram block or blocks.

[0193] Any patents and applications and other references noted above, including any that can be listed in accompanying filing papers, are incorporated herein by reference. Aspects of the disclosure can be modified, if necessary, to employ the systems, functions, and concepts of the various references described above to provide yet further implementations of the disclosure.

[0194] These and other changes can be made in light of the above detailed description. While the above description describes certain examples of the disclosure, and describes the best mode contemplated, no matter how detailed the above appears in text, the disclosure can be practiced in many ways. Details of the system can vary considerably in its specific implementation, while still being encompassed by the disclosure disclosed herein. As noted above, particular terminology used when describing certain features or aspects of the disclosure should not be taken to imply that the terminology is being redefined herein to be restricted to any specific characteristics, features, or aspects of the disclosure with which that terminology is associated. In general, the terms used in the following claims should not be construed to limit the disclosure to the specific examples disclosed in the specification, unless the above detailed description section explicitly defines such terms. Accordingly, the actual scope of the disclosure encompasses not only the disclosed examples, but also all equivalent ways of practicing or implementing the disclosure under the claims.

Claims

WHAT TS CLAIMED:

1. A textile illumination apparatus, comprising: a textile substrate comprising a plurality of threads including at least one opaque conductive thread and at least one dielectric thread; an energy-emitting layer positioned beneath the textile substrate and configured to emit energy in response to an applied electric field; and a conductive element positioned beneath the energy-emitting layer; wherein the opaque conductive thread and the conductive element are configured to receive respective electrical potentials, and wherein the conductive element is laterally offset from the opaque conductive thread by a spatial offset such that at least one lateral edge of the conductive element is not vertically aligned with a corresponding lateral edge of the opaque conductive thread relative to a stacking direction, wherein a potential difference applied between the opaque conductive thread and the conductive element generates an electric field through the energy-emitting layer, the spatial offset thereby influencing a distribution of the electric field such that the electric field activates a region of the energy-emitting layer located laterally adjacent to the opaque conductive thread, the activation producing emitted energy that propagates into a region corresponding to a footprint of the opaque conductive thread on a side of the textile substrate opposite the energy-emitting layer.

2. The apparatus of Claim 1, wherein activation of the region of the energy-emitting layer located laterally adjacent to the opaque conductive thread reduces formation of a visually perceptible dark region associated with the opaque conductive thread when the textile illumination apparatus is viewed from a side of the textile substrate opposite the energy-emitting layer.

3. The apparatus of Claim 1, wherein the emitted energy propagating into the region corresponding to the footprint of the opaque conductive thread reduces shadowing caused by the opaque conductive thread such that, when illuminated at part of the activation, the opaque conductive thread exhibits an apparent translucency due to emission entering the viewing region from laterally activated portions of the energy-emitting layer.

4. The apparatus of Claim 1, wherein emission from the laterally activated region produces a continuous illumination field across areas occupied by the opaque conductive thread when viewed from a side of the textile substrate opposite the energy-emitting layer.

5. The apparatus of Claim 1, wherein the emitted energy entering the region corresponding to the footprint of the opaque conductive thread provides illumination at an intensity sufficient to mask opacity-induced discontinuities in emitted energy.

6. The apparatus of Claim 1, wherein the spatial offset comprises a lateral displacement such that at least one lateral edge of the conductive element is shifted laterally relative to an opposing lateral edge of the opaque conductive thread, thereby defining a lateral space between the conductive element and the opaque conductive thread when viewed along the stacking direction.

7. The apparatus of Claim 6, wherein the lateral space corresponds to a nonoverlapping region between the conductive element and the opaque conductive thread.

8. The apparatus of Claim 1, wherein the spatial offset comprises a lateral displacement of between 5 micrometers and 10 millimeters between an edge of the opaque conductive thread and an edge of the conductive element.

9. The apparatus of Claim 1, wherein the spatial offset comprises a minimum lateral spacing of at least 10 micrometers between a lateral edge of the conductive element and a laterally adjacent boundary of the opaque conductive thread.

10. The apparatus of Claim 1, wherein the opaque conductive thread has an optical transmission of less than 20% for wavelengths emitted by the energy-emitting layer.

11. The apparatus of Claim 1, wherein the conductive element comprises a printed or deposited conductive layer selected from metallic nanoparticle inks, conductive polymers, carbonbased conductors, or metal-flake inks.

12. The apparatus of Claim 1, wherein the energy-emitting layer comprises an electroluminescent composition including at least one of phosphor particles, emissive polymers, or quantum-dot materials.

13. The apparatus of Claim 1, further comprising a dielectric layer positioned between the energy-emitting layer and the conductive element, the dielectric layer defining at least a portion of a vertical separation between the energy-emitting layer and the conductive element.

14. The apparatus of Claim 1, wherein the region of the energy-emitting layer activated by the influenced electric field extends laterally by at least 50 micrometers beyond a boundary of the opaque conductive thread.

15. The apparatus of Claim 1, wherein the conductive element comprises a geometric shape selected from a frame, ring, outline, perforated region, tessellated region, or segmented conductive pad.

16. The apparatus of Claim 1 , wherein the textile substrate comprises a woven structure in which the opaque conductive thread alternates between upper and lower surfaces of the textile substrate.

17. The apparatus of Claim 1, wherein the textile substrate is stretchable or deformable, and the spatial offset substantially maintains lateral electric-field activation under bending, stretching, or shear deformation.

18. The apparatus of Claim 1, wherein the conductive element is positioned within an interior opening of a frame-shaped conductive region associated with the opaque conductive thread, the spatial offset being defined by separation between the internal boundary of the frame and the perimeter of the conductive element.

19. The apparatus of Claim 1, wherein the activation of the energy-emitting layer reduces formation of a shadowed region that would otherwise occur beneath the opaque conductive thread in the absence of the spatial offset.

20. The apparatus of Claim 1, wherein emitted energy from the laterally activated region propagates through one or more dielectric threads toward the side of the textile substrate opposite the energy-emitting layer.

21. The apparatus of Claim 1, wherein the spatial offset comprises a combination of lateral displacement and vertical separation, producing a compound electric-field redistribution within the energy-emitting layer.

22. The apparatus of Claim 1, wherein the conductive element is electrically coupled to a lower conductive layer through a vertically oriented conductive interconnect positioned beneath the energy-emitting layer.

23. The apparatus of Claim 1, wherein the emitted energy is visible light.

24. The apparatus of Claim 1, wherein the emitted energy comprises electromagnetic radiation outside the visible spectrum, including one or more of infrared energy, ultraviolet energy, radio-frequency energy, or thermal radiation.

25. The apparatus of Claim 1 , wherein the emitted energy comprises mechanical energy generated by a piezoelectric or electroactive polymer layer.

26. The apparatus of Claim 1 , wherein the emitted energy corresponds to a wavelength band selected from visible, infrared, ultraviolet, or radio-frequency bands.

27. The apparatus of Claim 1, wherein the at least one dielectric thread has a diameter ranging from approximately 0.01 mm to 0.1 mm.

28. The apparatus of Claim 1, wherein the at least one opaque conductive thread has a diameter ranging from approximately 0.01 mm to 0.05 mm.

29. The apparatus of Claim 1, wherein energy emitted from the energy-emitting layer appears generally uniform across a surface of the textile structure when viewed from a viewing position on a side of the textile structure opposite to the energy-emitting layer.

30. The apparatus of Claim 1, wherein each conductive thread of the plurality of conductive threads is an opaque conductive thread, and wherein the energy emitted from the energy-emitting layer appears uniform despite the presence of the opaque conductive threads between the viewing position and the energy-emitting layer.

31. The apparatus of Claim 1 , wherein the spatial offset between a particular conductive thread and a corresponding elongated conductive element is generally uniform along a length of the particular conductive thread.

32. The apparatus of Claim 1, wherein each of the plurality of conductive threads has a smaller diameter than each of the plurality of dielectric threads.

33. The apparatus of Claim 1, wherein each of the plurality of conductive threads is aligned with a respective one of the plurality of dielectric threads, and wherein the diameter of each dielectric thread is larger than the diameter of the respective conductive thread, such that the spatial offset between each of the plurality of conductive threads and the respective elongated conductive element corresponds to a distance between an edge of the conductive thread and a same edge of the respective elongated conductive element.

34. The apparatus of Claim 1, wherein the patterned configuration of the plurality of conductive threads and the plurality of dielectric threads comprises a generally uniform grid pattern, wherein the plurality of conductive threads and the plurality of dielectric threads are positioned at substantially equal intervals.

35. The apparatus of Claim 1, wherein the emitted energy entering the region corresponding to the footprint of the opaque conductive thread exhibits an intensity and spatial distribution sufficient to compensate for opacity-induced attenuation, thereby maskingillumination discontinuities that would otherwise result from the opaque conductive thread blocking direct transmission of emitted energy36. The apparatus of Claim 1, wherein activation of the region of the energy-emitting layer located laterally adjacent to the opaque conductive thread generates illumination that scatters and diffuses through the textile substrate so as to reduce formation of a visually perceptible dark region associated with the opaque conductive thread when viewed from a side of the textile substrate opposite the energy-emitting layer.

37. The apparatus of Claim 1, wherein the emitted energy propagating into the region corresponding to the footprint of the opaque conductive thread undergoes scattering or diffusion through dielectric threads of the textile substrate, thereby reducing shadowing caused by the opaque conductive thread such that illumination within the footprint region is maintained despite the opaque conductive thread being substantially non-transmissive.

38. The apparatus of Claim 1, wherein illumination produced by the laterally activated region propagates through interstitial regions of the textile substrate and combines optically with illumination from adjacent regions to form a substantially continuous illumination field across areas occupied by the opaque conductive thread when viewed from a side of the textile substrate opposite the energy-emitting layer.

39. A method for generating emitted energy through a textile substrate comprising an opaque conductive thread, the method comprising: providing a textile illumination apparatus, the textile illumination apparatus comprising: a textile substrate comprising a plurality of threads including at least one opaque conductive thread and at least one dielectric thread, an energy-emitting layer positioned beneath the textile substrate, and a conductive element positioned beneath the energy-emitting layer, the conductive element being laterally offset from the opaque conductive thread by a spatial offset such that at least one lateral edge of the conductive element is not vertically aligned with a corresponding lateral edge of the opaque conductive thread relative to a stacking direction; and applying a first electrical potential to the opaque conductive thread and a second electrical potential to the conductive element so as to establish a potential difference between them,wherein, in response to the applied potential difference, an electric field extends through the energy-emitting layer, wherein the spatial offset influences a distribution of the electric field such that a region of the energy-emitting layer located laterally adjacent to the opaque conductive thread becomes activated, and wherein the activated region emits energy that propagates into a region corresponding to a footprint of the opaque conductive thread on a side of the textile substrate opposite the energy-emitting layer.

40. A printed illumination structure, comprising: a textile substrate; a first conductive layer positioned beneath the textile substrate; a light-emitting layer positioned beneath the first conductive layer and configured to emit energy in response to an applied electric field; a dielectric layer positioned beneath the light-emitting layer; a second conductive layer positioned beneath the dielectric layer; and a lower conductive layer positioned beneath the second conductive layer and electrically coupled to the second conductive layer through a vertically oriented conductive interconnect; wherein the first conductive layer and the second conductive layer are configured to receive respective electrical potentials; wherein the second conductive layer is laterally offset from the first conductive layer by a spatial offset such that at least one lateral edge of the second conductive layer is not vertically aligned with a corresponding lateral edge of the first conductive layer relative to a stacking direction; wherein, in response to a potential difference applied between the first conductive layer and the second conductive layer, an electric field extends through the light-emitting layer; wherein the spatial offset influences a distribution of the electric field such that the electric field activates a region of the light-emitting layer located laterally adjacent to the first conductive layer; and wherein the activated region produces emitted energy that propagates into a region corresponding to a footprint of the first conductive layer on a side of the textile substrate opposite the light-emitting layer.

41. The illumination structure of Claim 36, wherein the first conductive layer comprises a conductive frame defining an interior opening and the second conductive layer ispositioned within the interior opening while remaining laterally spaced from at least a portion of an interior boundary of the conductive frame.

42. The illumination structure of Claim 36, wherein the first conductive layer has a larger lateral footprint than the second conductive layer such that the spatial offset is produced by a difference in size between the two conductive layers.

43. The illumination structure of Claim 36, wherein the second conductive layer is intentionally displaced laterally relative to the first conductive layer in at least one direction in the plane of the illumination structure.

44. The illumination structure of Claim 36, wherein activation of the laterally adjacent region reduces formation of a dark or non-illuminated region associated with the footprint of the first conductive layer when viewed from a side of the textile substrate opposite the light-emitting layer.

45. The illumination structure of Claim 36, further comprising a second dielectric layer positioned adjacent to or beneath the second conductive layer.

46. The illumination structure of Claim 41, wherein the second conductive layer is electrically coupled to the lower conductive layer through a printed or deposited conductive interconnect extending through at least one dielectric layer.

47. The illumination structure of Claim 36, wherein the spatial offset comprises a lateral separation between 5 micrometers and 5 millimeters between a lateral boundary of the first conductive layer and a laterally adjacent boundary of the second conductive layer.

48. The illumination structure of Claim 36, wherein the first conductive layer comprises a circular conductive frame defining a circular interior opening and the second conductive layer comprises a circular conductive region positioned within the interior opening while remaining circumferentially laterally spaced therefrom to produce a circular spatial offset.

49. The illumination structure of Claim 36, wherein the illumination structure comprises an array of discrete illumination units, each unit including a first conductive layer formed as a square conductive frame and a second conductive layer positioned within an interior opening of the square conductive frame, the first and second conductive layers of each unit being electrically isolated from corresponding conductive layers of adjacent units to enable independent activation of each illumination unit.

50. The illumination structure of Claim 36, wherein multiple illumination units are arranged in a linear array such that each unit includes a first conductive layer shaped as a square conductive frame and a second conductive layer positioned within the corresponding frame, the first and second conductive layers of each unit being electrically independent from those of adjacent units to support unit-by-unit activation along the linear array.

51. The illumination structure of Claim 36, wherein the first conductive layer of each illumination unit includes a conductive tab extending outward from a perimeter of the conductive frame to provide a dedicated routing or connection interface while maintaining electrical isolation between first conductive layers of adjacent units.

52. The illumination structure of Claim 36, wherein the first conductive layers of multiple illumination units are interconnected by a continuous conductive bar extending across the array, the second conductive layers of the illumination units remaining electrically isolated from one another such that the conductive bar enables simultaneous activation of the illumination units while permitting selective driving of individual lower conductive layers.

53. A textile apparatus configured for mechanical response, comprising: a plurality of conductive threads, each of the plurality of conductive threads being configured to contribute to a field; a plurality of dielectric threads, wherein the plurality of conductive threads and the plurality of dielectric threads are arranged in a patterned configuration to form a textile structure; a functional layer positioned adjacent to the textile structure, the functional layer being configured to produce a mechanical response when activated; and an elongated conductive element, the elongated conductive element arranged generally parallel to, and spatially offset from, a conductive thread of the plurality of conductive threads, wherein the field is generated by a potential difference between the elongated conductive element and the corresponding conductive thread, the field interacting with the functional layer to activate the mechanical response, wherein the presence of the spatial offset between the elongated conductive element and the corresponding conductive thread reduces mechanical coupling between the elongated conductive element and the corresponding conductive thread, thereby modifying the stiffness of the textile structure compared to a configuration without a spatial offset, and facilitating thepropagation of mechanical waves through the conductive thread in response to the mechanical response.

54. A textile apparatus configured for energy emission or mechanical response, comprising: a plurality of conductive threads, each of the plurality of conductive threads being configured to contribute to a field and being substantially non-transmissive to a form of energy; a plurality of dielectric threads, each of the plurality of dielectric threads being configured to influence energy transmission or structural interaction, wherein the plurality of conductive threads and the plurality of dielectric threads are arranged in a patterned configuration to form a textile structure; a functional layer positioned adjacent to the textile structure, the functional layer being configured to produce a predefined response when activated; and at least one elongated conductive element, each of the at least one elongated conductive elements arranged generally parallel to, and spatially offset from, a respective one of the plurality of conductive threads, wherein the field is generated by a potential difference between each conductive thread and the corresponding elongated conductive element, the field interacting with the functional layer to activate the predefined response, wherein the spatial offset between a particular conductive thread and a corresponding elongated conductive element affects a distribution of the field, activating regions of the functional layer near the conductive threads to produce the predefined response, wherein when the functional layer is configured for energy emission, the spatial offset contributes to an appearance that the predefined response originates from or passes through the conductive thread, despite their non-transmissive nature; wherein when the functional layer configured for mechanical response, the spatial offset reduces stiffness in the conductive thread, allowing mechanical waves to propagate through the threads and the functional layer more effectively than with no spatial offset.