Electron beam generation device
The electron beam generating device addresses thermal expansion-induced deformation by using a guide and tension member to stabilize electron beam emission, ensuring stable operation and reducing damage.
Patent Information
- Authority / Receiving Office
- WO · WO
- Patent Type
- Applications
- Current Assignee / Owner
- DERKWOO ELECTRONICS
- Filing Date
- 2025-10-16
- Publication Date
- 2026-06-18
AI Technical Summary
Thermal expansion of the electron beam emitter causes deformation, leading to issues such as short circuits, open circuits, and unstable electron beam irradiation due to bending and potential damage.
The electron beam generating device employs a guide part and a tension member, composed of cylindrical columns and a bimetal, to restrain and apply tensile force to the electron beam emitting part during thermal expansion, preventing excessive deformation and damage.
The device effectively controls deformation and prevents unnecessary bending of the electron beam emitting part, ensuring stable electron beam irradiation and minimizing damage by applying tensile force in response to temperature changes.
Smart Images
Figure KR2025016395_18062026_PF_FP_ABST
Abstract
Description
electron beam generator
[0001] The present invention relates to an electron beam generating device, and more specifically, to an electron beam generating device for solving the problem caused by deformation of the electron emission part due to thermal expansion.
[0002] The present invention is derived from research conducted as part of the Ministry of Trade, Industry and Energy’s International Joint Technology Development Project (Project No.: 2024175, Project No.: P0027902, Project Management Agency: Korea Institute for Industrial Technology Promotion, Research Project Title: Development of an electron-curtain device to replace membrane-based pellicles in EUVL (Extreme Ultra-Violet Lithography) systems, Project Performing Agency: Deokwoo Electronics Co., Ltd., Research Period: 2024.07.01~2027.06.30).
[0003] An electron beam generator is a device capable of capturing, accelerating, and irradiating electrons separated from the surface of an electron beam emitting part, such as a filament, when heated. In order to separate electrons from the electron beam emitting part, a high-voltage current must be applied to the electron beam emitting part to heat the surface of the electron beam emitting part to a temperature of approximately 2,000°C or higher.
[0004] Therefore, the electron beam emitter inevitably undergoes thermal expansion due to heating, which causes deformation of the electron beam emitter. This deformation of the electron beam emitter can lead to short circuits, open circuits, or unstable conditions of the power supply, and can cause distortion of the electron beam irradiation during electron beam irradiation.
[0005]
[0006] The electron beam generating device according to the present invention is intended to control the deformation of the electron beam emitting part during thermal expansion of the electron beam emitting part.
[0007] In addition, the electron beam generating device according to the present invention is designed to prevent the electron beam emitting part from bending more than necessary by applying tensile force to the electron beam emitting part during thermal expansion of the electron beam emitting part.
[0008] In addition, the electron beam generating device according to the present invention is designed to prevent damage to the electron beam emitting part by applying tensile force in response to the temperature of the electron beam emitting part.
[0009] An electron beam generating device according to one embodiment of the present invention comprises an electron emitting part that emits electrons, a clamp part connected to one end of the electron emitting part, and a guide part disposed on one side of the electron emitting part, wherein the guide part is configured to restrain deformation of the electron emitting part during thermal expansion of the electron emitting part.
[0010] In one embodiment of the present invention, the electron emission part of the electron beam generating device is preferably composed of a filament, and the guide part is preferably composed of a first guide that contacts one side of the filament and a second guide that contacts the other side of the filament.
[0011] According to one embodiment of the present invention, the first guide and the second guide of the electron beam generating device are composed of cylindrical columns, and one end of each cylindrical column is spaced apart from one surface of the electron emission unit base, and a filament is disposed through the space between the cylindrical columns of the first guide and the second guide, and an expansion disk is disposed at the other end of the cylindrical column of the first guide to prevent the filament from detaching, and it is preferable that the first guide is disposed lower than the second guide.
[0012] In the cylindrical columns of the first guide and the second guide of the electron beam generating device according to one embodiment of the present invention, it is preferable to form a concave groove in the inner direction of the cylindrical columns so as to prevent the filament from detaching.
[0013] In accordance with one embodiment of the present invention, a mounting member having a through hole formed therein through which the electron emission part passes is disposed on the other side of the electron emission part of the electron beam generating device, and a tension member providing a tensile force in the direction of the other side of the electron emission part when the electron emission part expands through the through hole is disposed at the other end of the electron emission part through which the electron emission part passes.
[0014] In accordance with one embodiment of the present invention, the base of the electron emission unit of the electron beam generating device is disposed on a base frame, and the tension unit is composed of a bimetal, and one side of the bimetal is connected to the other end of the electron emission unit, and the other side of the bimetal is preferably connected to the base frame.
[0015] In one embodiment of the present invention, the elongated length in the direction of the tensile portion due to thermal expansion of the filament of the electron beam generating device is preferably corresponding to the amount of shortening caused by the deformation of the bimetal.
[0016] The electron beam generating device according to the present invention has the effect of controlling the deformation of the electron beam emitting part during thermal expansion of the electron beam emitting part.
[0017] In addition, the electron beam generating device according to the present invention has the effect of preventing the electron beam emitting part from bending more than necessary by installing a tension member on the side of the electron beam emitting part during thermal expansion of the electron beam emitting part.
[0018] In addition, the electron beam generating device according to the present invention has the effect of preventing excessive deformation and damage to the electron beam emitting part by installing a tension member composed of a bimetal so as to apply tensile force in response to the temperature of the electron beam emitting part.
[0019] FIG. 1 is a perspective view of an electron beam generating device according to one embodiment of the present invention.
[0020] Figure 2 is a partially exploded perspective view of the electron beam generator shown in Figure 1.
[0021] FIG. 3 is a perspective view of the main part of the electron beam generator shown in FIG. 1.
[0022] Figure 4 is a general electron beam generator and a conceptual diagram of the operation of the electron beam generator shown in Figure 1.
[0023] FIG. 5 is a partially exploded perspective view of an electron beam generating device according to another embodiment of the present invention.
[0024] Figure 6 is a conceptual diagram of the operation of the electron beam generator shown in Figure 5.
[0025] Preferred embodiments according to the present invention will be described in detail with reference to the attached drawings, provided that identical or similar components are given the same reference number regardless of the drawing symbols, and redundant descriptions thereof will be omitted.
[0026] Furthermore, in describing the present invention, detailed descriptions of related prior art are omitted if it is determined that such descriptions could obscure the essence of the invention. Additionally, it should be noted that the attached drawings are intended only to facilitate an understanding of the concept of the present invention and should not be interpreted as limiting the concept of the present invention.
[0027]
[0028] Hereinafter, the electron beam generating device according to the present invention will be described in detail with reference to the drawings.
[0029]
[0030] Referring to FIG. 1, which is a perspective view of an electron beam generating device according to one embodiment of the present invention, the electron beam generating device is composed of an electron emission unit (100), a clamp unit (200), and a guide unit (300).
[0031] The electron emission unit (100) emits electrons from the surface when the temperature rises to a high temperature and is composed of a resistor formed in various shapes such as a band shape, a wire shape, or a coil shape.
[0032] The clamp part (200) fixes the electron emission part (100) described above onto the electron emission part base (110) of the electron beam generating device and is positioned on the left and right sides of the electron emission part (100) as shown in FIGS. 1 and 2.
[0033] A guide portion (300) is positioned on one side of the electron emission portion (300) to limit excessive bending when the electron emission portion (300) is bent due to thermal expansion.
[0034]
[0035] As shown in FIG. 2, it is preferable to form a certain space between the electron emission part (100) and the guide part (300) so as to secure a space for slight deformation when the electron emission part (100) is bent. If such a space is not formed, the electron emission part (100) may come into contact with the guide part (300) during thermal expansion, thereby applying an excessive load to the electron emission part (100) and potentially causing damage to the electron emission part (100). Therefore, it is preferable to form a certain space between the guide part (300) and the electron emission part (100).
[0036]
[0037] As explained above, the electron emission unit (100) is preferably made of a filament, and when made of a filament, it is preferably composed of a first guide (310) that contacts one side of the filament and a second guide (320) that contacts the other side of the filament.
[0038] It is preferable that the first guide (310) and the second guide (320) be spaced apart from each other so that the electron emission unit (100) can be positioned between them, as shown in FIG. 3, which is a perspective view of the main part of the electron beam generating device shown in FIG. 1.
[0039] Since these first guide (310) and second guide (320) come into contact with the high-temperature electron emission part (100), it is preferable that they be made of a heat-resistant material such as ceramic.
[0040]
[0041] Referring to FIG. 3, the first guide (310) and the second guide (320) may be composed of cylindrical columns (312, 322), and the left ends of the cylindrical columns (312, 322) are spaced apart from each other on one surface of the electron emission unit base (110) based on FIG. 2. A filament (100) is disposed through the cylindrical columns (312, 322) of the first guide (310) and the second guide (320) as shown in FIG. 3.
[0042] As explained above, since a certain space is formed between the filament (100), the first guide (310), and the second side (320), the filament (100) can escape between the first guide (310) and the second guide (320). Therefore, an expansion disk (314) is placed at the right end of the cylindrical column (312) of the first guide (310), which is positioned at the lower part of the first guide (310) and the second side (320), to prevent the filament (100) from escaping.
[0043]
[0044] Furthermore, although not shown in the drawing, the cylindrical columns (312, 322) of the first guide (310) and the second guide (320) may be configured to have a concave groove formed in the inner direction of the cylindrical columns (312, 322) to prevent the filament (100) from coming off.
[0045] Referring to FIG. 4(a), which is a conceptual diagram of the operation of a general electron beam generating device, and FIG. 4(b), which is a conceptual diagram of the operation of an electron beam generating device shown in FIG. 1, when power is applied to the electron emitting unit (100) and the electron emitting unit (100) undergoes thermal expansion, if the guide unit is not positioned as in FIG. 4(a), the electron emitting unit (100) may be excessively deformed, but if the guide unit (300) is positioned as in FIG. 4(b), the electron emitting unit (100) comes into contact with the guide unit (300) and is not excessively deformed.
[0046]
[0047] Referring to FIG. 5, which is a partially exploded perspective view of an electron beam generating device according to another embodiment of the present invention, and FIG. 6, which is a conceptual diagram of the operation of the electron beam generating device shown in FIG. 5, a clamp (200) is disposed on the left side of the electron emitting unit (100), and a mounting unit (330) is disposed on the right side, having a through hole (332) through which the electron emitting unit (100) passes. Accordingly, the electron emitting unit (100) is fixed to the clamp (200) on the left side and can be deformed and moved in the right direction during thermal expansion.
[0048] A filament (400) is disposed at the right end of the electron emission part (100) that penetrates through the through hole (332) to provide tensile force in the right direction of the electron emission part (100) during thermal expansion of the electron emission part (300).
[0049] Therefore, when the electron emission part (100) undergoes thermal expansion, it is stretched in the right direction by the filament (400), so the electron emission part (100) is not excessively bent.
[0050]
[0051] These filaments (400) may be composed of springs, but if they are composed of springs, the electron emission part (100) may be damaged because it must continuously generate tensile force. Therefore, as shown in FIGS. 5 and 6, it is preferable that the tension part (400) be composed of bimetal.
[0052]
[0053] FIG. 6(a) is a drawing of the electron emission unit (100) in a state where it is not thermally expanded, and FIG. 6(b) is a drawing of the electron emission unit in a state where it is thermally expanded. In the state of FIG. 6(a), the electron emission unit (100) is fixed to the left clamp (200) of the electron emission unit (100), and the right end is fixed to the bimetal (400) in a state where it is penetrated by the penetration part (332) of the mounting unit (330).
[0054] The clamp (200) is placed on the electron emission unit base (110), and the electron emission unit base (110) is placed on the base frame (130) via the insulating unit (120). The right end of the base frame (130) is bent upward, and the right end of the bimetal (400) is connected to the right end of the base frame (130) that is bent upward.
[0055] Therefore, when power is applied to the electron emission unit (100), heat is generated in the electron emission unit (100), and the heat generated in the electron emission unit (100) is transferred to the bimetal (400) and deformed as shown in Fig. 6 (b), thereby stretching the electron emission unit (100) in the right direction and minimizing the bending of the electron emission unit (100).
[0056] It is preferable to select and arrange a bimetal having a shortening amount that corresponds to the shortening amount caused by the deformation of the bimetal, such that the length extended in the direction of the bimetal (400) by the thermal expansion of the filament is equal to the shortening amount caused by the deformation of the bimetal.
[0057]
[0058] Although the present invention has been described in detail using preferred embodiments, the scope of the invention is not limited to specific embodiments and should be interpreted by the appended claims. Furthermore, those skilled in the art will understand that many modifications and variations are possible without departing from the scope of the invention.
Claims
1. An electron-emitting part that emits electrons; A clamp part connected to one end of the above-mentioned electron emission part; It includes a guide portion disposed on one side of the above-mentioned electron emission portion, and An electron beam generating device characterized in that the above guide portion restrains the deformation of the electron emission portion during thermal expansion of the electron emission portion.
2. In Paragraph 1, The above electron emission unit is made of a filament, and The electron beam generating device is characterized in that the guide portion comprises a first guide that contacts one side of the filament and a second guide that contacts the other side of the filament.
3. In Paragraph 2, The first guide and the second guide are composed of cylindrical columns, and one end of the cylindrical column is spaced apart from one side of the electron emission unit base. The filament is disposed through the cylindrical column between the first guide and the second guide, and An expansion disc is disposed at the other end of the cylindrical column of the first guide to prevent the filament from coming off, and An electron beam generating device characterized in that the first guide is positioned lower than the second guide.
4. In Paragraph 3, An electron beam generating device characterized by having a concave groove formed in the inner direction of the cylindrical columns of the first guide and the second guide to prevent the filament from coming off.
5. In Paragraph 3, On the other side of the above electron emission part, a mounting part is disposed having a through hole formed therein through which the electron emission part passes, and An electron beam generating device characterized by having a tension member disposed at the other end of the electron emitting part penetrating the above-mentioned through hole, which provides a tensile force in the direction of the other end of the electron emitting part during thermal expansion of the electron emitting part.
6. In Paragraph 5, The above electron emission unit base is placed on a base frame, and An electron beam generating device characterized in that the above tension member is composed of a bimetal, one side of the bimetal is connected to the other end of the electron emission member, and the other side of the bimetal is connected to the base frame.
7. In Paragraph 6, An electron beam generating device characterized in that the elongated length in the direction of the tensile portion due to thermal expansion of the filament corresponds to the amount of shortening caused by deformation of the bimetal.