Ion source with extended charge life
By controlling the vaporizer temperature based on beam current and charge material levels, the ion source's operational life is extended, reducing maintenance and costs, and enhancing throughput in semiconductor processing.
WO2026128166A1 Publication Date: 2026-06-18APPLIED MATERIALS INC
Patent Information
- Authority / Receiving Office
- WO · WO
- Patent Type
- Applications
- Current Assignee / Owner
- APPLIED MATERIALS INC
- Filing Date
- 2025-11-17
- Publication Date
- 2026-06-18
AI Technical Summary
⚠Technical Problem
Ion sources are limited by the amount of charge material they can hold, which restricts their operational time and increases maintenance and operational costs.
⚗Method used
A controller adjusts the temperature of the vaporizer based on the desired beam current and the amount of charge material remaining, using temperature offsets and ramp rates to optimize the vaporizer's operation and extend the life of the charge material.
🎯Benefits of technology
This approach extends the life of the charge material, reducing downtime and operational costs while maintaining the desired beam current, and improves throughput in semiconductor processing.
✦ Generated by Eureka AI based on patent content.
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Abstract
An ion source that is capable of extending the life of a charge material in a vaporizer is disclosed. A controller uses information about the desired beam current and the amount of charge material remaining in the vaporizer to determine the temperature experienced by the vaporizer. The temperature of the vaporizer determines the rate at which the charge material is consumed. By considering both the amount of charge material left, as well as the desired beam current, the temperature of the vaporizer may be maintained at a lower temperature than would otherwise be possible. This serves to extend the life of the charge material, while still supplying the desired beam current.
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