Stereolithography device and platform

WO2026140384A1PCT designated stage Publication Date: 2026-07-02FUJIKURA LTD
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Patent Information

Authority / Receiving Office
WO · WO
Patent Type
Applications
Current Assignee / Owner
FUJIKURA LTD
Filing Date
2025-09-17
Publication Date
2026-07-02

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Abstract

To suppress unintended stereolithography of a stereolithography product, a platform (10) of a stereolithography device (1) has a reflection reduction region (light transmission region (11)) that comprises an insulator at at least a portion of a surface (101) that is irradiated with an exposure beam.
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