Maskless patterning equipment and general-purpose free-form pattern forming system for creative research and development including same

Abstract

Maskless patterning equipment and a general-purpose free-form pattern forming system for creative research and development including same according to one embodiment of the present invention can form a pattern or image on an object by using an exposure unit for irradiating the object with light of a critical wavelength or less, wherein the light reacts with a photosensitizer formed on the surface of the object.

Description

Maskless patterning equipment and a general-purpose free-form pattern forming system for creative research and development including the same

[0001] The present invention relates to a maskless patterning device and a general-purpose freeform pattern forming system for the research and development of a window including the same. More specifically, the invention provides a maskless patterning device capable of simply generating a desired pattern without a photomask using a projector and an optical system, and a general-purpose freeform pattern forming system and method for the research and development of a window including the same.

[0002] Generally, a method for forming a pattern on a substrate (or semiconductor wafer) constituting a Liquid Crystal Display (LCD), Plasma Display Panel (PDP), or Flat Panel Display (FPD) involves first applying a photosensitive material to the substrate and then using a photomask to selectively expose the photosensitive material to light, thereby forming a pattern by selectively removing the parts of the pattern material with altered chemical properties or other parts.

[0003] In addition, when researchers in the field of semiconductors and displays want to construct a desired circuit pattern during circuit or device research, they generally use a mask aligner utilizing a photomask. However, masks cost around 1 million won per sheet, and mask aligners cost between 50 million and 100 million won. Furthermore, lithography equipment without masks is expensive, costing over 200 million won, which limits entry.

[0004] Therefore, there is a growing need for general-purpose maskless patterning technology or equipment that allows R&D professionals to rapidly advance creative research by freely modifying desired patterns and applying them to their studies, while also being relatively cost-effective and time-saving.

[0005] The applicant has proposed the present invention to solve the above-mentioned problems.

[0006] Related prior art is Korean registered patent No. 10-1764169 (Title of invention: Maskless exposure device and beam position measurement method using the same, Registration date: July 27, 2017).

[0007] The present invention, devised to solve the above-mentioned problems, provides a maskless patterning device capable of simply generating a desired circuit pattern without a photomask by utilizing a projector and an optical system, and a general-purpose freeform pattern forming system for creative research and development including the same.

[0008] The present invention provides a maskless patterning device capable of generating micrometer-scale patterns by applying an auto stage, which can be extended to the wafer scale, and a general-purpose freeform pattern forming system for creative research and development including the same.

[0009] The present invention provides a maskless patterning device and a general-purpose freeform pattern forming system for creative research and development including the same, which allows R&D personnel to rapidly advance creative research by freely modifying desired patterns and applying them to research, while being relatively cost-effective and time-saving.

[0010] The problems that the present invention aims to solve are not limited to the problem(s) mentioned above, and other unmentioned problems will be clearly understood by those skilled in the art from the description below.

[0011] A maskless patterning device according to one embodiment of the present invention for achieving the above-mentioned objectives can form a pattern or image on an object by using an exposure unit that irradiates the object with light of a wavelength lower than or equal to a critical wavelength that reacts with a photosensitive material formed on the surface of the object.

[0012] By irradiating the entire surface of the object with light that does not react with the photosensitive material, the position or shape of the exposure on the surface of the object can be confirmed, or the position of the image or video projected or output on the surface of the object can be confirmed.

[0013] Light that does not react with the photosensitive material is irradiated onto the surface of the object as a guide light, and the guide light is irradiated along a pattern formed on the surface of the object, and an alignment key located inside or outside the pattern can be displayed on the surface of the object using the guide light.

[0014] With the guide light aligned with the alignment key, the guide light is irradiated onto the surface of the object along another pattern that overlaps with the pattern formed on the surface of the object, and the exposure unit can perform an exposure process by stopping the irradiation of the guide light and irradiating the light that reacts with the photosensitive material onto the other pattern while the light that reacts with the photosensitive material is aligned with the alignment key.

[0015] To correct the positional difference between the light in the form of an image or video output from the exposure unit and the object, guide light can be irradiated with light of a wavelength exceeding the threshold wavelength.

[0016] The above threshold wavelength refers to the wavelength of light that reacts with the photosensitive material among the wavelengths of light of the image or video output from the exposure unit, and light having a wavelength less than or equal to the threshold wavelength can react with the photosensitive material.

[0017] Based on the guide light having the same position information as the arbitrary layer formed on the object, the object can be moved linearly along the X-axis and Y-axis directions and rotated around the Z-axis to correct the position difference between the arbitrary layer and the guide light.

[0018] The device includes a driving unit that controls the state of light output from the exposure unit and aligns the object, wherein the driving unit may include: a driving unit that linearly moves the exposure unit in the Z-axis direction to control the focus of an image or video output from the exposure unit; a driving unit that rotates the exposure unit around the X-axis and Y-axis to control the distortion of an image or video projected onto the surface of the object; a driving unit that linearly moves the object in the X-axis and Y-axis directions to control the position of the object; and a driving unit that rotates the object around the Z-axis.

[0019] The above drive unit comprises: a first drive unit provided on the upper surface of a base plate and configured to reciprocate linearly along the X-axis direction; a second drive unit provided on the upper part of the first drive unit and configured to reciprocate linearly along the Y-axis direction; a third drive unit provided on a lifting post installed on the base plate and configured to reciprocate linearly along the Z-axis direction; a fourth drive unit provided on the upper part of the second drive unit and configured to rotate about the Z-axis direction, on which the object is placed; a fifth drive unit provided on the third drive unit and configured to tilt the exposure unit within a certain angle range with respect to the X-axis direction; and a sixth drive unit provided on the fifth drive unit and configured to rotate the exposure unit about the Y-axis direction; wherein the object placed on the fourth drive unit can move linearly along the X-axis and Y-axis directions by the first drive unit and the second drive unit, and can rotate about the Z-axis by the fourth drive unit.

[0020] Meanwhile, the present invention may provide a general-purpose freeform pattern forming system and method for the research and development of a window, comprising: the above-described maskless patterning equipment; and a pattern image management terminal that receives an image of a pattern formed by the maskless patterning equipment and controls the operation of the maskless patterning equipment; wherein the maskless patterning equipment selectively irradiates the object with light that does not react with a photosensitive material formed on the surface of the object and light that reacts with the photosensitive material to form a pattern identical to the pattern image on the object.

[0021] Specific details of other embodiments are included in the detailed description and attached drawings.

[0022] A maskless patterning device according to one embodiment of the present invention and a general-purpose freeform pattern forming system for creative research and development including the same enable the rapid execution of creative research by freely forming a desired pattern without a fixed photomask.

[0023] The maskless patterning equipment according to one embodiment of the present invention and the general-purpose freeform pattern forming system for creative research and development including the same can be utilized in creative research by researchers in the field of research and development, such as at domestic and international universities and various research institutes, or in science classes or laboratory educational settings for middle and high school students.

[0024] The maskless patterning equipment according to one embodiment of the present invention and the general-purpose free-form pattern forming system for creative research and development including the same provide a general-purpose pattern forming equipment for conducting various applied and creative research to convergence research and development workers, thereby providing an environment where creative research can be conducted quickly. It can also be used in middle and high school science education settings to demonstrate processes using simple, low-cost, mass-produced semiconductor patterning equipment and to provide interesting education that combines art and science.

[0025] A maskless patterning device according to one embodiment of the present invention and a general-purpose freeform pattern forming system for research and development of windows including the same can form a pattern by utilizing a projector to project a specific wavelength and intensity onto an image without using a fixed photomask.

[0026] A maskless patterning device according to one embodiment of the present invention and a general-purpose freeform pattern forming system for creative research and development including the same can obtain a pattern with a minimum line width of about 2 μm and can form a pattern using design CAD or PowerPoint images.

[0027] A maskless patterning device according to one embodiment of the present invention and a general-purpose free-form pattern forming system for creative research and development including the same can be used for patterning to fabricate semiconductor devices and to verify the electrical properties (current-voltage, resist-temperature, capacitance-voltage) of low-dimensional materials.

[0028] A maskless patterning device according to one embodiment of the present invention and a general-purpose free-form pattern forming system for creative research and development including the same can be used for patterning to verify the characteristics of low-dimensional material devices (thin film transistor, gas sensor, photodetector) and can be used for fabricating devices based on various two-dimensional materials (Graphene, transition metal dichalcogenide, BP, h-BN, etc.).

[0029] A maskless patterning equipment according to one embodiment of the present invention and a general-purpose free-form pattern forming system for the research and development of a window including the same form a pattern using an exposure unit or optical system that irradiates light, such as a beam projector or an imaging device, without using a photomask, so that the formation or modification of a pattern can be done in a short time and at low cost, and is suitable for mass production of semiconductor devices, etc.

[0030] FIG. 1 is a diagram illustrating the configuration of a general-purpose freeform pattern forming system for creative research and development according to one embodiment of the present invention.

[0031] FIGS. 2 to 4 are drawings illustrating a maskless patterning device of the system according to FIG. 1.

[0032] FIG. 5 is a front view illustrating a maskless patterning device of the system according to FIG. 1.

[0033] FIGS. 6 to 10 are drawings for explaining the operation of a general-purpose free-form pattern forming system for creative research and development according to an embodiment of the present invention.

[0034] Hereinafter, embodiments disclosed in this specification will be described in detail with reference to the attached drawings. Identical or similar components are assigned identical or similar reference numerals, and redundant descriptions thereof will be omitted. The suffix "bu" for components used in the following description is assigned or used interchangeably solely for the ease of drafting the specification and does not inherently possess a distinct meaning or role. Furthermore, in describing embodiments disclosed in this specification, if it is determined that a detailed description of related prior art could obscure the essence of the embodiments disclosed in this specification, such detailed description will be omitted. Additionally, the attached drawings are intended only to facilitate understanding of the embodiments disclosed in this specification; the technical concept disclosed in this specification is not limited by the attached drawings, and it should be understood that they include all modifications, equivalents, and substitutions that fall within the spirit and technical scope of the present invention.

[0035] Terms including ordinal numbers, such as first, second, etc., may be used to describe various components, but said components are not limited by said terms. These terms are used solely for the purpose of distinguishing one component from another.

[0036] When it is stated that a component is "connected" to another component, it should be understood that it may be directly connected to that other component, or that there may be other components in between.

[0037] A singular expression includes a plural expression unless the context clearly indicates otherwise.

[0038] In this application, terms such as “comprising” or “having” are intended to specify the existence of the features, numbers, steps, actions, components, parts, or combinations thereof described in the specification, and should be understood as not precluding the existence or addition of one or more other features, numbers, steps, actions, components, parts, or combinations thereof.

[0039] It should be noted that the drawings are schematic and not drawn to scale. The relative dimensions and proportions of parts in the drawings are exaggerated or reduced in size for clarity and convenience, and any dimensions are illustrative only and not limiting. Additionally, the same reference numerals are used to denote similar features for the same structure, element, or part appearing in two or more drawings.

[0040] The embodiments of the present invention specifically illustrate ideal embodiments of the present invention. As a result, various variations of the drawings are expected. Accordingly, the embodiments are not limited to the specific form of the illustrated area and include, for example, variations in form resulting from manufacturing.

[0041] FIG. 1 is a diagram illustrating the configuration of a general-purpose free-form pattern forming system for research and development of a window according to an embodiment of the present invention, FIG. 2 to 4 are diagrams illustrating a maskless patterning device of the system according to FIG. 1, FIG. 5 is a front view illustrating a maskless patterning device of the system according to FIG. 1, and FIG. 6 to 10 are diagrams for explaining the operation of a general-purpose free-form pattern forming system for research and development of a window according to an embodiment of the present invention.

[0042] Referring to FIG. 1, a general-purpose free-form pattern forming system (10) for creative research and development according to one embodiment of the present invention may include a maskless patterning device (100) and a pattern image management terminal (200).

[0043] Here, the maskless patterning equipment (100) is equipment capable of creating an image or patterning by projecting image data of a pattern onto an object (180) by utilizing an exposure unit (170, see FIG. 2) without using a fixed photo-mask (i.e., maskless) and irradiating light of a specific wavelength and intensity.

[0044] As illustrated in FIG. 1, a general-purpose freeform pattern forming system (10) for creative research and development according to one embodiment of the present invention may include: a maskless patterning device (100) for forming a pattern on an object (180, see FIG. 4); and a pattern image management terminal (200) for receiving an image of the pattern formed by the maskless patterning device (100) and controlling the operation of the maskless patterning device (100).

[0045] Here, the maskless patterning equipment (100) can form a pattern identical to the pattern image on the object (180) by selectively irradiating the object (180) with light that does not react with the photoresist formed on the surface of the object (180) and light that reacts with the photoresist.

[0046] A maskless patterning device (100) of a general-purpose freeform pattern forming system (10) for creative research and development according to one embodiment of the present invention may include first to sixth driving units (110, 120, 130, 140, 150, 160) and an exposure unit (170) that irradiates light (light) onto an object (180).

[0047] Additionally, the maskless patterning equipment (100) may include an optical lens unit (191) that controls the intensity or magnification of light irradiated from the exposure unit (170), and an observation unit (196) that observes the pattern or exposure state formed on the object (180).

[0048] A general-purpose free-form pattern forming system (10) for creative research and development according to one embodiment of the present invention enables free pattern formation by using a maskless patterning equipment (100) that includes an exposure unit (170) capable of irradiating light without a mask to realize the shape of an image file of a pattern to be formed on the surface of an object (180).

[0049] Here, the exposure unit (170) can project an image onto an object (180) by irradiating light onto the image data, and can use an image device such as a beam projector.

[0050] Below, the maskless patterning equipment (100) will be described in more detail with reference to FIGS. 1 to 4.

[0051] Referring to FIGS. 2 to 4, the maskless patterning equipment (100) may include a base plate (101), a first drive unit (110) provided on the upper surface of the base plate (101) and configured to move linearly back and forth along the X-axis direction, a second drive unit (120) provided on the upper part of the first drive unit (110) and configured to move linearly back and forth along the Y-axis direction, and a fourth drive unit (140) provided on the upper part of the second drive unit (120) and configured to move rotationally with respect to the Z-axis direction.

[0052] Here, an object (180) can be placed on the fourth drive unit (140).

[0053] Meanwhile, a lifting post (103) may be provided on the base plate (101). The lifting post (103) may be provided at a location away from the first driving unit (110). The lower end of the lifting post (103) may be inserted and fixed to a coupling member (104) that is fixed to the base plate (101).

[0054] A third drive unit (130) that moves in a linear reciprocating motion along the longitudinal direction, i.e., the Z-axis direction, may be provided in the lifting post (103). A fifth drive unit (150) that causes the exposure unit (170) to tilt within a certain angle range relative to the X-axis direction may be provided in the third drive unit (130). A sixth drive unit (160) that causes the exposure unit (170) to rotate relative to the Y-axis direction may be provided in the fifth drive unit (150).

[0055] In this way, the maskless patterning equipment (100) according to one embodiment of the present invention can linearly drive the object (180) in the X-axis direction or Y-axis direction and rotate it with respect to the Z-axis direction while the object (180) is placed therein, linearly drive the exposure unit (170) along the Z-axis direction and rotate it with respect to the Y-axis direction, and drive the exposure unit (170) so that it tilts within a certain angle range with respect to the X-axis direction.

[0056] The object (180) placed on the fourth drive unit (140) can move linearly along the X and Y axis directions by the first and second drive units (110, 120), and can also rotate about the Z axis by the fourth drive unit (140). In addition, the object (180) placed on the fourth drive unit (140) can move linearly along the X and Y axis directions by the first and second drive units (110, 120), and can also rotate about the Z axis by the fourth drive unit (140).

[0057] Thus, the first, second, and fourth drive units (110, 120, 140) are lower drive units for aligning the object (180). The lower drive unit may include first and second drive units (110, 120) that move the object (180) linearly in the X-axis and Y-axis directions to control the position of the object (180) while the object (180) is placed, and a fourth drive unit (140) that rotates the object (180) around the Z-axis.

[0058] The first driving unit (110) may include a power input unit (111), an X-axis stage (112) that moves in a linear reciprocating motion in the X-axis direction by a driving force output from the power input unit (111), and a first plate (118) connected to the upper surface of the X-axis stage (112).

[0059] The power input unit (111) can be operated manually, or it can be operated automatically by applying a motor, etc.

[0060] An X-axis measuring unit (119) for measuring the distance traveled in the X-axis direction may be formed on one side of the X-axis stage (112).

[0061] The second driving unit (120) may include a power input unit (121), a Y-axis stage (122) that moves in a linear reciprocating motion in the Y-axis direction by the driving force output from the power input unit (121), and a second plate (128) connected to the upper surface of the Y-axis stage (122).

[0062] Here, since the second drive unit (120) is mounted on the first plate (118), the second drive unit (120) can move linearly along the X-axis direction as a whole by the first drive unit (110).

[0063] The power input unit (121) can be operated manually, or it can be operated automatically by applying a motor, etc.

[0064] A Y-axis measuring unit (129) for measuring the distance traveled in the Y-axis direction may be formed on one side of the Y-axis stage (122).

[0065] The fourth driving unit (140) may include a power input unit (141), a first rotating stage (142) that rotates and reciprocates about the Z-axis direction by the driving force output from the power input unit (141), and a fourth plate (148) connected to the upper surface of the first rotating stage (142). The first rotating stage (142) may rotate and reciprocate along the direction of arrow A1 shown in FIG. 3.

[0066] Here, since the fourth drive unit (140) is mounted on the second plate (128), the fourth drive unit (140) can move linearly along the Y-axis direction as a whole by means of the second drive unit (120).

[0067] The power input unit (141) can be operated manually, or it can be operated automatically by applying a motor, etc.

[0068] An object (180) is placed on the fourth plate (148). Although not illustrated, the fourth plate (148) may be provided with means for fixing the object (180) or means for releasing the mounting.

[0069] The third drive unit (130) can move up and down along the lifting post (103), that is, move in a straight reciprocating motion in the Z-axis direction.

[0070] The third driving unit (130) may include a power input unit (131), a Z-axis stage (132) that moves linearly back and forth in the Z-axis direction by the driving force output from the power input unit (131), and a third plate (137) connected to the upper surface of the Z-axis stage (132).

[0071] Additionally, the third drive unit (130) may include a mounting plate (138) to which the Z-axis stage (132) is fixed, and a sliding connecting member (105) connecting the mounting plate (138) and the lifting post (103).

[0072] Here, since the third drive unit (130) is mounted on the mounting plate (138), the mounting plate (138) and the third drive unit (130) can move linearly along the Z-axis direction as a whole.

[0073] The power input unit (131) can be operated manually, or it can be operated automatically by applying a motor, etc.

[0074] A Z-axis measuring unit (139) for measuring the distance traveled in the Z-axis direction may be formed on one side of the Z-axis stage (132).

[0075] The fifth driving unit (150) may include a fifth plate (158) mounted on the third plate (137) and a gonio stage (152) mounted on the fifth plate (158).

[0076] The goniometer stage (152) can move to reciprocate within a certain angle range with respect to the X-axis direction. That is, the goniometer stage (152) can move in a reciprocating motion along the direction of arrow A3 shown in FIG. 3. Accordingly, the sixth drive unit (160) mounted on the fifth drive unit (150) and the exposure unit (170) mounted on the sixth drive unit (160) can be tilted integrally within a certain angle range along the direction of arrow A3.

[0077] The sixth drive unit (160) may include a power input unit (161) and a second rotational stage (162) that rotates and reciprocates with respect to the Y-axis direction by means of a driving force output from the power input unit (161). The second rotational stage (162) may rotate and reciprocate along the direction of arrow A2 shown in FIG. 3. The power input unit (161) may be operated manually or may be operated automatically by applying a motor, etc.

[0078] When the exposure unit (170) is mounted on the upper surface of the second rotating stage (162), the fifth driving unit (150) is mounted on the third plate (137), so the fifth driving unit (150), the sixth driving unit (160), and the exposure unit (170) can move linearly along the Z-axis direction as a whole by the third driving unit (130).

[0079] In addition, as described above, the fifth driving unit (150), the sixth driving unit (160), and the exposure unit (170) can move linearly in the Z-axis direction as a whole by means of the third driving unit (130).

[0080] In this way, the third, fifth, and sixth driving units (130, 150, 160) are upper driving units for controlling an image or video output from the exposure unit (170). The upper driving unit may include a third driving unit (130) that moves linearly along the Z-axis direction to control the focus of the image or video output from the exposure unit (170), and fifth and sixth driving units (150, 160) that rotate the exposure unit (170) with respect to the X-axis and Y-axis to control the distortion of the image or video formed or projected on the surface of the object (180).

[0081] In this way, the maskless patterning equipment (100) according to one embodiment of the present invention can accurately form a desired pattern by adjusting the position or orientation of an object (180) using the first, second, and fourth driving units (110, 120, 140) and adjusting the position or orientation of the exposure unit (170) using the third, fifth, and sixth driving units (130, 150, 160), thereby causing light to be irradiated at the precise position of the object (180).

[0082] In addition, a maskless patterning device (100) according to one embodiment of the present invention can adjust the position of an object (180) using first, second, and fourth driving units (110, 120, 140), and adjust the focus or distortion state of an image or video irradiated in the form of light from an exposure unit (170) toward an object (180) using third, fifth, and sixth driving units (130, 150, 160).

[0083] A plurality of horizontal maintaining members (102) may be provided at the bottom of the base plate (101). The base plate (101) can be leveled by adjusting the height of each horizontal maintaining member (102).

[0084] The exposure unit (170) may use a commercial beam projector. For example, a 4K beam projector with 1920 x 1080 pixels may be used. The exposure unit (170) may use not only a beam projector but also any imaging device that emits light. That is, any imaging device capable of emitting light below a critical wavelength that reacts with a photosensitive material in a selective area from the perspective of pattern formation may be used as the exposure unit (170).

[0085] The first to sixth driving units (110 to 160) can precisely align the relative positions of the light source of the exposure unit (170) and the object (180), and can be operated automatically or manually.

[0086] The maskless patterning equipment (100) described above can be operated or controlled by a pattern image management terminal (200).

[0087] The pattern image management terminal (200) may be provided in the form of a computer or the like, and may include a pattern management unit (210), a driving control unit (220), a light selection unit (230), a light control unit (240), an alignment control unit (250), a lens control unit (260), a display unit (270), a data storage unit (280), and a communication unit (290).

[0088] However, the pattern image management terminal (200) is not limited to the configuration shown in FIG. 1.

[0089] The pattern management unit (210) can input or manage pattern images that are to be formed or patterned on the surface of an object (180). Here, the pattern image can be input into the pattern management unit (210) in the form of a design CAD or PowerPoint image. In this way, the general-purpose freeform pattern forming system (10) for creative research and development according to one embodiment of the present invention can form a desired pattern on an object (180) using a CAD file or PowerPoint with a pattern image drawn on it.

[0090] The drive control unit (220) can control the operation of the first to sixth drive units (110 to 160) of the maskless patterning equipment (100). The drive control unit (220) can control the operation of the first to sixth drive units (110 to 160) in conjunction with the operation of the light control unit (240), alignment control unit (250), lens control unit (260), observation unit (196), etc.

[0091] The light selection unit (230) and the light control unit (240) can each select a wavelength range of light irradiated from the exposure unit (170) and control the irradiation state of the light.

[0092] The alignment control unit (250) can control the light so that it is irradiated to the same location or an accurate location when repeatedly irradiating the object (180) with light or changing the type of light. For example, it can control the light to display an alignment key (AK) on the object (180) or to irradiate the alignment key (AK).

[0093] The lens control unit (260) can control the operation or magnification of the optical lens unit (191) of the maskless patterning equipment (100).

[0094] The display unit (270) may be provided as a monitor that shows the state in which light is irradiated on the surface of the object (180) or the state in which a pattern is formed. The video or image shown on the display unit (270) may be transmitted from the observation unit (196) of the maskless patterning equipment (100). In addition, the display unit (270) may show a pattern image input into the pattern management unit (210).

[0095] The observation unit (196) of the maskless patterning equipment (100) is a camera that captures an object (180), transmits the captured data or image to a pattern image management terminal (200), and the pattern image management terminal (200) can provide the captured data or image to a user through a display unit (270).

[0096] The data storage unit (280) of the pattern image management terminal (200) may store various data, commands, or signals, including data regarding the operation of the maskless patterning equipment (100) and data regarding the pattern image. The pattern image management terminal (200) may retrieve data stored in the data storage unit (280) and use it for the operation or control of the maskless patterning equipment (100).

[0097] The pattern image management terminal (200) can be connected to the maskless patterning equipment (100) via a wired or wireless connection through the communication unit (290). The communication unit (290) can connect the pattern image management terminal (200) and the maskless patterning equipment (100) through various known communication methods.

[0098] FIG. 5 is a front view of a maskless patterning equipment (100) of a general-purpose freeform pattern forming system (10) for creative research and development according to FIG. 1. The maskless patterning equipment (100) shown in FIG. 5 uses a commercial beam projector as an exposure unit (170).

[0099] Hereinafter, with reference to FIGS. 6 to 10, the operation of a maskless patterning equipment (100) and a general-purpose free-form pattern forming system (10) for the research and development of a window according to one embodiment of the present invention will be described.

[0100] A maskless patterning device (100) according to one embodiment of the present invention can freely form a desired pattern on an object (180) without a photomask by selectively irradiating the object (180) with light that does not react with the photosensitive material formed on the surface of the object (180) and light that reacts with the photosensitive material.

[0101] A maskless patterning device (100) according to one embodiment of the present invention can freely form a desired pattern or image on an object (180) without a photomask by selectively irradiating the object (180) with light exceeding a threshold wavelength that does not react with the photosensitive material formed on the surface of the object (180) and light below a threshold wavelength that reacts with the photosensitive material.

[0102] Here, the critical wavelength refers to the wavelength of light that reacts with the photosensitive material formed on the surface of the object (180) among the wavelengths of light of the image or video output from the exposure unit (170), and only light having a wavelength less than or equal to the critical wavelength reacts with the photosensitive material.

[0103] A general-purpose freeform pattern forming system (10) for creative research and development according to one embodiment of the present invention can implement or form a desired pattern or image on the surface of an object (180) without a photomask by selecting the type of light irradiated from the exposure unit (170) of the maskless patterning equipment (100).

[0104] A general-purpose free-form pattern forming system (10) for creative research and development according to one embodiment of the present invention can cause light that does not react with the photosensitive material to be irradiated in the exposure unit (170) by means of a light selection unit (230), or light that reacts with the photosensitive material to be irradiated.

[0105] A photosensitive material may be applied or formed on the surface of the object (180). For example, a photosensitive material such as AZ GXR 601_PR may be formed on the surface of the object (180).

[0106] A general-purpose free-form pattern forming system (10) for creative research and development according to one embodiment of the present invention can form a desired pattern without a photomask by dividing the process steps during exposure and selectively irradiating light irradiated from the exposure unit (170) of the maskless patterning equipment (100).

[0107] A general-purpose free-form pattern forming system (10) for creative research and development according to one embodiment of the present invention can divide the process steps during exposure and project light (Red or Yellow light) of a wavelength range (570 nm or higher) that does not react with the photosensitive material onto an object (180) to perform alignment using guide light that can identify the actual position and shape to be exposed, and then during the actual exposure process, expose using light of a wavelength range that reacts with the photosensitive material (White or Blue light) to pattern the object (180) in a desired shape at a desired location.

[0108] A general-purpose freeform pattern forming system (10) and maskless patterning equipment (100) for creative research and development according to one embodiment of the present invention can irradiate the guide light with a wavelength exceeding a critical wavelength in order to confirm the position of an image or video projected or output on the surface of an object (180) and to correct the position difference between the light in the form of an image or video output from an exposure unit (170) and the object (180) while performing a plurality of processes.

[0109] Here, the guide light may also be output in the form of an image.

[0110] Meanwhile, to correct the position difference, the position difference between the arbitrary layer and the guide light can be corrected by moving the object (180), on which an arbitrary layer is formed, linearly along the X-axis and Y-axis directions and rotating it around the Z-axis based on a guide light having the same position information as the arbitrary layer. That is, the position difference between the arbitrary layer and the guide light can be corrected by using the first and second driving units (110, 120) to move the object (180) linearly along the X-axis and Y-axis based on a guide light (guide image) having the same position correction as the arbitrary layer, on which an arbitrary layer is formed or patterned, and by using the fourth driving unit (140) to rotate the object (180) around the Z-axis.

[0111] FIGS. 6 to 9a are drawings for explaining an observation process that irradiates light that does not react with a photosensitive material, and FIG. 9b is a drawing for explaining an exposure process that irradiates light that reacts with a photosensitive material.

[0112] The light control unit (240) can control exposure conditions including the light exposure time, wavelength of light, or intensity of light.

[0113] As described above, among the light irradiated from the exposure unit (170), it is preferable that the wavelength of the light that does not react with the photosensitive material is longer than the wavelength of the light that reacts with the photosensitive material. For example, Red light or Yellow light with a wavelength range of 570 nm or more may be used as the light that does not react with the photosensitive material, and White light or Blue light with a wavelength range shorter than 570 nm may be used as the light that reacts with the photosensitive material.

[0114] The light selection unit (230) can control whether light that does not react with the photosensitive material or light that reacts with the photosensitive material is irradiated from the exposure unit (170).

[0115] A general-purpose free-form pattern forming system (10) for creative research and development according to one embodiment of the present invention may operate or control the operation of a maskless patterning equipment (100) so that light that does not react with a photosensitive agent is irradiated over the entire surface of an object (180) to observe or verify the surface of an object (180).

[0116] A maskless patterning device (100) of a general-purpose free-form pattern forming system (10) for creative research and development according to one embodiment of the present invention can irradiate yellow light that does not react with a photosensitive material formed on the surface of an object (180), as shown in FIG. 6.

[0117] Referring to FIG. 6, the square (Y) is filled with yellow light irradiated from the exposure unit (170), and the square (Y) can be seen as representing the entire surface of the object (180). Since yellow light does not react with the photosensitive material formed on the object (180), the surface of the object (180) can be checked through the irradiation of yellow light.

[0118] As illustrated in FIG. 6, it may be displayed on the display unit (270) of the pattern image management terminal (200).

[0119] In addition, the maskless patterning equipment (100) of the general-purpose freeform pattern forming system (10) for creative research and development according to one embodiment of the present invention can determine the position or shape of the exposure on the surface of the object (180) by irradiating light that does not react with the photosensitive material onto the object (180).

[0120] As illustrated in FIG. 6, the maskless patterning equipment (100) can determine the actual location and shape to be exposed by irradiating the surface of the object (180) with light of a wavelength range that does not react with the photosensitive material during the exposure process (Yellow light).

[0121] FIG. 6 illustrates the process of observing the state of an object (180) containing a wafer or sample coated with a photosensitive material (photoresist) by irradiating a yellow light onto the object (180) to confirm the position and shape to be exposed. The yellow light is irradiated over the entire object (180). The surface of the object (180) containing the wafer or sample can be seen, but the photosensitive material is not exposed or changed. This process is simply the process of observing (viewing) the object (180) while irradiating with yellow light.

[0122] Referring to Fig. 7a, a rectangular shape, which is a virtual sample, is drawn in the center of the area where yellow light is irradiated. The rectangular shape is a specimen, and the pattern to be formed by exposure and development can be matched with the specimen.

[0123] Yellow light (i.e., light that does not react with the photosensitive material) can be irradiated from the exposure unit (170) of the maskless patterning equipment (100) to identify the surface of the object (180) or the sample (Virtual Sample) on the surface of the object (180).

[0124] FIG. 7a shows a state in which a maskless patterning device (100) irradiates light of a wavelength range that does not react with the photosensitive material (Red light) during the process of performing exposure to check the shape or position of a specimen (e.g., an electrode). A process of adjusting the position or angle of the specimen (XYZ stage or gonio stage adjustment) can be performed using guide light (Red light). Additionally, a process of reducing the magnification can be performed through an optical lens unit (196).

[0125] As shown in FIG. 7a, after determining the location or shape of the exposure on the surface of the object (180) by irradiating with yellow light or red light, the irradiation of yellow light and red light is stopped. When the irradiation of yellow light and red light is stopped, the state as shown in FIG. 7b, that is, the surface of the object (180) becomes a dark state (B). In FIG. 7b, "No exposure" indicates a state in which no light is irradiated to the rectangle (B).

[0126] In the state of Fig. 7b, the photosensitive material does not react because no light is irradiated from the exposure unit (170).

[0127] A maskless patterning device (100) of a general-purpose free-form pattern forming system (10) for creative research and development according to one embodiment of the present invention may, after stopping the irradiation of light (Yellow light) that does not react with the photosensitive material (see FIG. 7b), irradiate guide light (Red light) that does not react with the photosensitive material onto the surface of an object (180), irradiate the guide light along a pattern formed on the surface of the object, and use the guide light to display an Align Key (AK) located inside or outside the pattern on the surface of the object (180).

[0128] As illustrated in FIG. 8a, the maskless patterning equipment (100) can irradiate guide light (Red light, see part marked in red in FIG. 8a) that does not react with the photosensitive material onto the surface of the object (180) to irradiate guide light along the pattern to be formed on the surface of the object (180).

[0129] Red light, that is, guide light, which does not react with the photosensitive material, can be irradiated not only along the pattern but also on the alignment key (AK). Referring to FIG. 8a, the alignment key (AK) is marked at the vertices of the square shape, the middle between the vertices, and the middle of the square shape. Here, the alignment key (AK) marked at the middle of the square shape is located inside the pattern (B, rectangular shape).

[0130] FIG. 8a shows the process of irradiating the surface of an object (180) with guide light (Red light) in a maskless patterning device (100) to virtually draw a sample (Virtual sample) and displaying an alignment key (AK) to match the irradiated light. When aligning, the alignment key (AK) is set using yellow light or red light that does not react with the photosensitive material.

[0131] A maskless patterning device (100) of a general-purpose freeform pattern forming system (10) for creative research and development according to one embodiment of the present invention can irradiate a guide light (Red light) onto the surface of an object (180) along another pattern (P, dotted line portion indicated as Confirmation of Pattern alignment) that overlaps with the specimen (rectangular portion indicated as Virtual sample) while the guide light (Red light) is aligned with the alignment key (AK), as shown in FIG. 8b.

[0132] The maskless patterning equipment (100) irradiates the alignment key (AK) and the virtual sample using guide light (red light), and then irradiates another pattern (P) while aligned with the alignment key (AK) using guide light (red light). In this way, by irradiating the guide light (red light) while aligned with the alignment key (AK), the pattern corresponding to the virtual sample and the other pattern (P) can be matched with each other.

[0133] FIG. 8b shows the process of indicating another pattern (P) to be formed in alignment with a sample (Virtual sample) in a maskless patterning device (100) according to the present invention. At this time, the other pattern (P) to be formed is indicated while the alignment key (AK) is aligned with a guide light (Red light).

[0134] When the virtual sample is excluded from the state shown in FIG. 8b, the state becomes as shown in FIG. 9a. FIG. 9a shows a state in which, in a maskless patterning device (100) according to the present invention, after aligning the pattern (P) with the alignment key (AK), guide light (Red light) is irradiated onto the pattern to be formed (P, the dotted line portion indicated as Confirmation of Pattern alignment).

[0135] As illustrated in FIGS. 6 to 9a, the maskless patterning equipment (100) of the general-purpose freeform pattern forming system (10) for the research and development of a window according to one embodiment of the present invention can perform an observation process to confirm the pattern to be exposed by irradiating the surface of an object (180) with yellow light or red light that does not react with a photosensitive material.

[0136] A maskless patterning equipment (100) of a general-purpose freeform pattern forming system (10) for creative research and development according to one embodiment of the present invention can perform an exposure process by irradiating light (White light or Blue light) that reacts with a photosensitive material to another pattern (P) while the light that reacts with the photosensitive material (White light or Blue light) is aligned with the alignment key (AK) after stopping the irradiation of guide light (Red light).

[0137] FIG. 9b shows a state in which, in a maskless patterning device (100) according to the present invention, White light (W) that reacts with a photosensitive material is irradiated to align with an alignment key (AK), and then light of a wavelength range that reacts with the photosensitive material (White light) is irradiated onto a portion formed by guide light to perform exposure. In FIG. 9b, the portion marked in white (Real beam exposure) indicates the portion that reacts with the photosensitive material and is exposed.

[0138] After exposure by irradiating light (White light) that reacts with the photosensitive material as shown in FIG. 9b, the irradiation of White light is stopped. When the irradiation of White light is stopped, the surface of the object (180) becomes dark, as shown in FIG. 7b. In FIG. 7b, "No exposure" indicates a state where no light is irradiated.

[0139] In the state of Fig. 7b, the photosensitive material does not react because no light is irradiated from the exposure unit (170).

[0140] The light control unit (240) can control the irradiation or interruption of light (Yellow light or Red light) that does not react with the photosensitive material in the exposure unit (170), or control the irradiation or interruption of light (White light or Blue light) that reacts with the photosensitive material.

[0141] A desired pattern (P) can be finally obtained by developing the exposed object (180) in a developer solution as shown in FIG. 9b. AZ 300 MIF-Developer, etc., can be used as the developer solution.

[0142] It may include an exposure unit (170) that selectively outputs light that does not react with the photosensitive material, the guide, and / or light that reacts with the photosensitive material.

[0143] FIG. 10 shows a state in which, in a maskless patterning device (100) according to the present invention, light of a wavelength range that does not react with the photosensitive material (Yellow light or Red light) is irradiated to check whether the sample (Virtual sample) and the exposed pattern (P, the dotted line portion indicated as Confirmation of Pattern alignment) match. At this time, when the alignment key (AK) is set with Red light, it can be confirmed that the sample (Virtual sample) and the exposed pattern (P) overlap accurately.

[0144] The alignment control unit (250) can control the first to sixth driving units (110 to 160) or the driving control unit (220) so that the light irradiated from the exposure unit (170) aligns with the alignment key (AK). Additionally, the alignment control unit (250) can adjust the shape, position, or number of the alignment key (AK).

[0145] Meanwhile, when a pattern image is projected onto the surface of an object (180), image distortion phenomena such as aliasing may occur depending on the image processing method.

[0146] Since aliasing can cause a decrease in resolution when forming a microstructure, the general-purpose freeform pattern forming system (10) and maskless patterning equipment (100) for creative research and development according to one embodiment of the present invention can prevent aliasing or image distortion by excluding raster image files and using vector scan images.

[0147] Since vectors are based on formulas, vector images can be resized with virtually no limitations and at high resolution. For example, if you have a business logo saved in vector format, there is no problem scaling it up to fit a billboard or scaling it down so it can be printed on small objects such as ballpoint pens or business cards.

[0148] In addition, when the general-purpose freeform pattern forming system (10) and maskless patterning equipment (100) for creative research and development according to one embodiment of the present invention use an automatic or manual driving unit (110-160) equipped with a high-performance optical encoder (not shown), patterning is possible not only for small specimens in the form of pieces but also for large scales in the form of wafers by repeating the exposure process in a matrix manner.

[0149] As described above, a general-purpose freeform pattern forming system (10) for creative research and development according to one embodiment of the present invention may include: a maskless patterning device (100); and a pattern image management terminal (200) that receives an image of a pattern formed by the maskless patterning device (100) and controls the operation of the maskless patterning device (100).

[0150] The maskless patterning equipment (100) can form a pattern identical to a pattern image on the object (180) by selectively irradiating the object (180) with light that does not react with the photosensitive material formed on the surface of the object (180) and light that reacts with the photosensitive material.

[0151] As described above, an embodiment of the present invention has been explained with specific details such as specific components, limited embodiments, and drawings; however, this is provided merely to aid in a more comprehensive understanding of the present invention, and the present invention is not limited to the above embodiments. A person skilled in the art to which the present invention pertains can make various modifications and variations from this description. Accordingly, the scope of the present invention should not be limited to the described embodiments, and all things equivalent to or having equivalent variations to the claims set forth below, as well as the claims themselves, shall be considered to fall within the scope of the concept of the present invention.

Claims

1. A maskless patterning apparatus characterized by forming a pattern or image on an object using an exposure unit that irradiates the object with light of a wavelength lower than or equal to the critical wavelength that reacts with a photosensitive material formed on the surface of the object.

2. In Paragraph 1, A maskless patterning device characterized by irradiating light that does not react with the photosensitive material over the entire surface of the object to confirm the position or shape of the exposure on the surface of the object, or to confirm the position of the image or video projected or output on the surface of the object.

3. In Paragraph 2, Light that does not react with the photosensitive material is irradiated onto the surface of the object as a guide light, and the guide light is irradiated along a pattern formed on the surface of the object. Maskless patterning equipment characterized by using the guide light to display an alignment key located inside or outside the pattern on the surface of the object.

4. In Paragraph 3, With the guide light aligned with the alignment key, the guide light is irradiated onto the surface of the object along another pattern that overlaps with the pattern formed on the surface of the object, and The maskless patterning equipment is characterized by the above exposure unit performing an exposure process by stopping the irradiation of the guide light and irradiating the light that reacts with the photosensitive material to the other pattern while the light that reacts with the photosensitive material is aligned with the alignment key.

5. In Paragraph 4, A maskless patterning apparatus characterized by irradiating a guide light with a wavelength exceeding the threshold wavelength to correct the positional difference between the light in the form of an image or video output from the exposure unit and the object.

6. In Paragraph 5, The above critical wavelength refers to the wavelength of light that reacts with the photosensitive material among the wavelengths of light of the image or video output from the exposure unit, and Maskless patterning equipment characterized by light having a wavelength lower than or equal to the above threshold wavelength reacting with the above photosensitive agent.

7. In Paragraph 6, A maskless patterning apparatus characterized by correcting the position difference between the arbitrary layer and the guide light by moving the object linearly along the X-axis and Y-axis directions and rotating it around the Z-axis, based on the guide light having the same position information as the arbitrary layer, on the object on which the arbitrary layer is formed.

8. In Paragraph 4, It includes a driving unit that controls the state of light output from the exposure unit and aligns the object, and The above driving unit is, A driving unit that linearly moves the exposure unit in the Z-axis direction to control the focus of the image or video output from the exposure unit; A driving unit that rotates the exposure unit based on the X-axis and Y-axis to control the distortion of the image or video projected onto the surface of the object; A driving unit that moves the object linearly in the X-axis and Y-axis directions to control the position of the object; and Maskless patterning equipment characterized by including a driving unit that rotates the object around the Z-axis.

9. In Paragraph 8, The above driving unit is, A first driving unit provided on the upper surface of a base plate and configured to perform linear reciprocating motion along the X-axis direction; A second drive unit provided on the upper part of the first drive unit and configured to perform linear reciprocating motion along the Y-axis direction; A third drive unit configured to reciprocate linearly along the Z-axis direction and configured on a lifting post installed on the base plate; A fourth drive unit provided on the upper part of the second drive unit, configured to rotate about the Z-axis direction, and on which the object is placed; A fifth driving unit provided in the third driving unit and causing the exposure unit to tilt within a certain angle range with respect to the X-axis direction; and It includes a sixth driving unit provided in the fifth driving unit and which rotates the exposure unit with respect to the Y-axis direction, and A maskless patterning equipment characterized in that the object placed on the fourth driving unit moves linearly along the X-axis and Y-axis directions by the first driving unit and the second driving unit, and rotates about the Z-axis by the fourth driving unit.

10. Maskless patterning equipment pursuant to paragraph 9; and It includes a pattern image management terminal that receives an image of a pattern formed by the maskless patterning equipment and controls the operation of the maskless patterning equipment. The above maskless patterning equipment is a general-purpose freeform pattern forming system for creative research and development, characterized by selectively irradiating the object with light that does not react with the photosensitive material formed on the surface of the object and light that reacts with the photosensitive material to form a pattern identical to the pattern image on the object.

Images