Large-flow-rate gas mixing system and method, and semiconductor process device

Abstract

The present invention relates to a large-flow-rate gas mixing system and method, and a semiconductor process device. The large-flow-rate gas mixing system comprises a first gas input unit, a second gas input unit, at least one first flow rate control unit, at least one second flow rate control unit, a first gas mixing unit, a first concentration analysis unit, a second gas mixing unit, a second concentration analysis unit, a first gas output unit, and a second gas output unit. The present invention has advantages that: the first gas input unit is communicated with a plurality of first flow rate control units, the second gas input unit is communicated with a plurality of second flow rate control units, and the plurality of second flow rate control units are used to simultaneously control a flow rate, thereby improving the control accuracy of the flow rate, and thus improving concentration accuracy; the first gas mixing unit is separately communicated with the first flow rate control units and the second flow rate control units, and a first gas and a second gas are initially mixed by means of the first gas mixing unit, thereby improving the concentration uniformity of the overall system.

Description

A high-flow-rate gas mixing system, method, and semiconductor process equipment Technical Field

[0001] This invention relates to the field of semiconductor process gas mixing technology, and more particularly to a high-flow-rate gas mixing system, method, and semiconductor process equipment. Background Technology

[0002] Gas mixing systems are primarily used to provide precisely proportioned and composed gas mixtures that are crucial for semiconductor device manufacturing processes. They are used in a variety of process steps, including cleaning, annealing, preparative atmospheres, chemical vapor deposition (CVD), etching, vapor phase doping, and high-temperature processes. Gas mixing equipment ensures that the composition, flow rate, and stability of the gas mixture meet the high-precision process requirements, which is essential for manufacturing high-performance semiconductor devices.

[0003] For gas mixtures with a flow rate exceeding 200 L / min, the existing technology involves controlling the flow rate of two gas sources to a certain level using a flow control module, then delivering them to two 100 L buffer tanks, and finally to the process equipment (as shown in Figure 1). Two concentration analyzers are used to detect the concentration before and after entering the buffer tanks. A calibration gas unit uses a mixed gas of a fixed concentration to calibrate the concentration analyzers, and an exhaust unit discharges the waste gas from the system.

[0004] However, existing technologies only use one flow control module, which is prone to large errors and large fluctuations in the concentration of the mixed gas during the process of supplying gas from the gas source to the mixing tank. In addition, existing equipment cannot stabilize the concentration during the initial mixing stage before the mixed gas enters the buffer tank.

[0005] Currently, no effective solutions have been proposed for the problems existing in related technologies, such as large mixing errors, large fluctuations in mixing concentration, and inability to stabilize concentration during the initial mixing stage. Summary of the Invention

[0006] The purpose of this invention is to address the shortcomings of existing technologies by providing a high-flow-rate gas mixing system, method, and semiconductor process equipment to solve problems such as large gas mixing errors, large fluctuations in gas mixing concentration, and inability to stabilize the concentration during the initial mixing stage.

[0007] To achieve the above objectives, the technical solution adopted by the present invention is as follows:

[0008] In a first aspect, the present invention provides a high-flow-rate gas mixing system, comprising:

[0009] A first gas input unit, which is connected to a first gas source, is used to deliver a first gas.

[0010] The second gas input unit is connected to the second gas source and is used to deliver the second gas;

[0011] At least one first flow control unit is connected to the first gas input unit and is located downstream of the first gas input unit, for controlling the flow rate of the first gas;

[0012] At least one second flow control unit is connected to the second gas input unit and is located downstream of the second gas input unit, for controlling the flow rate of the second gas;

[0013] The first gas mixing unit is connected to the first flow control unit and the second flow control unit respectively, and is located downstream of the first flow control unit and the second flow control unit. It is used to initially mix the first gas and the second gas to obtain a first mixed gas.

[0014] A first concentration analysis unit, which is connected to the first gas mixing unit and located downstream of the first gas mixing unit, is used to detect the concentration of the first mixed gas.

[0015] The second gas mixing unit is connected to the first gas mixing unit and is used to finely mix the first gas mixture to obtain the second gas mixture.

[0016] The second concentration analysis unit is connected to the second gas mixing unit and is located downstream of the second gas mixing unit, and is used to detect the concentration of the second mixed gas.

[0017] The first gas output unit is connected to the first gas mixing unit, the second gas mixing unit, the second concentration analysis unit, and the process equipment, and is located downstream of the second gas mixing unit. It is used to deliver the second mixed gas to the process equipment when the second concentration analysis unit detects that the gas meets the standard.

[0018] The second gas output unit is connected to the first concentration analysis unit, the second concentration analysis unit, the first gas output unit, and the waste gas treatment equipment, and is used to transport waste gas.

[0019] In some of these embodiments, it also includes:

[0020] The first gas input unit is connected to the first concentration analysis unit and is used to supply the first gas to the first concentration analysis unit so that the first concentration analysis unit can use the first gas for zero gas calibration.

[0021] The first gas input unit is connected to the second concentration analysis unit and is used to supply the first gas to the second concentration analysis unit so that the second concentration analysis unit can use the first gas for zero gas calibration.

[0022] The third gas input unit is connected to the standard gas source, the first concentration analysis unit, and the second concentration analysis unit, respectively, and is used to calibrate the first concentration analysis unit and the second concentration analysis unit with standard gas.

[0023] In some of these embodiments, it also includes:

[0024] The purging unit is connected to the second gas input unit and the second gas output unit respectively, and is used to purge the entire pipeline and equipment.

[0025] In some of these embodiments, it also includes:

[0026] The pressure relief unit is connected to the first gas mixing unit, the second gas mixing unit, and the second gas output unit, respectively, and is used for pressure relief.

[0027] In some of these embodiments, it also includes:

[0028] A pressure protection unit is connected to the first gas output unit, the second gas output unit, the first gas mixing unit, and the second gas mixing unit, respectively, and is used to protect the pipeline.

[0029] In some of these embodiments, it also includes:

[0030] A backup mixed gas supply unit, which is connected to the first gas output unit, is used to supply gas to the process equipment.

[0031] Secondly, the present invention also provides a high-flow-rate gas mixing method, comprising:

[0032] The first gas input unit acquires the first gas and supplies the first gas to the first flow control unit;

[0033] The first flow control unit acquires the first gas and controls the flow rate of the first gas to the first mixing unit;

[0034] The second gas input unit acquires the second gas and supplies the second gas to the second flow control unit;

[0035] The second flow control unit acquires the second gas and controls the flow rate of the second gas to the first mixing unit;

[0036] The first gas mixing unit acquires a first gas and a second gas, and performs initial mixing on the first gas and the second gas to obtain a first mixed gas;

[0037] The first concentration analysis unit acquires the first mixed gas and detects the concentration of the first mixed gas;

[0038] If the concentration of the first mixed gas detected by the first concentration analysis unit meets the standard, the second gas mixing unit acquires the first mixed gas and performs fine mixing on the first mixed gas to obtain the second mixed gas.

[0039] The second concentration analysis unit acquires the second mixed gas and detects its concentration;

[0040] If the concentration of the second mixed gas detected by the second concentration analysis unit meets the standard, the first gas output unit will deliver the second mixed gas to the process equipment.

[0041] In some of these embodiments, it also includes:

[0042] The first gas input unit supplies the first gas to the first concentration analysis unit and the second concentration analysis unit to achieve zero gas calibration of the first concentration analysis unit and the second concentration analysis unit;

[0043] The third gas input unit supplies standard gas to the first and second concentration analysis units, thereby calibrating the standard gas for the first and second concentration analysis units.

[0044] In some of these embodiments, it also includes:

[0045] The purging unit acquires purging gas and delivers it to the overall pipeline and equipment to purge the entire pipeline and equipment.

[0046] In some of these embodiments, it also includes:

[0047] When the air pressure inside the pipeline exceeds a preset threshold, the pressure relief unit relieves the pressure on the entire pipeline and equipment.

[0048] In some of these embodiments, it also includes:

[0049] If the pressure inside the pipeline exceeds a preset threshold, the pressure protection unit will activate, allowing the pressure inside the pipeline to be discharged through the second gas output unit.

[0050] In some of these embodiments, it also includes:

[0051] In the event of a second mixed gas supply failure, the backup mixed gas supply unit can supply the second mixed gas to the process equipment.

[0052] Thirdly, the present invention also provides a semiconductor process apparatus, comprising:

[0053] The high-flow-rate mixing system as described in the first aspect.

[0054] The present invention adopts the above technical solution and has the following technical effects compared with the prior art:

[0055] This invention discloses a high-flow-rate gas mixing system, method, and semiconductor process equipment. By connecting a first gas input unit to multiple first flow control units and a second gas input unit to multiple second flow control units, the flow rate is simultaneously controlled by multiple second flow control units, thereby improving the flow rate control accuracy and thus the concentration accuracy. By connecting a first gas mixing unit to both the first and second flow control units, the first gas and second gas are pre-mixed, thereby improving the overall system concentration uniformity. By connecting a second gas mixing unit to the first gas mixing unit, the pre-mixed second gas mixture is further finely mixed, further improving the gas mixture concentration uniformity. Attached Figure Description

[0056] Figure 1 is a schematic diagram (a) of a high-flow-rate gas mixing system according to an embodiment of the present invention;

[0057] Figure 2 is a schematic diagram of the first gas input unit and the second gas input unit according to an embodiment of the present invention;

[0058] Figure 3 is a schematic diagram of the first flow control unit and the second flow control unit according to an embodiment of the present invention;

[0059] Figure 4 is a schematic diagram of the first gas mixing unit, the first concentration analysis unit, the second gas mixing unit, and the second concentration analysis unit according to an embodiment of the present invention;

[0060] Figure 5 is a schematic diagram of the first gas output unit and the second gas output unit according to an embodiment of the present invention;

[0061] Figure 6 is a schematic diagram (II) of a high-flow-rate gas mixing system according to an embodiment of the present invention;

[0062] Figure 7 is a schematic diagram of the third gas input unit according to an embodiment of the present invention;

[0063] Figure 8 is a schematic diagram (III) of a high-flow-rate mixing system according to an embodiment of the present invention;

[0064] Figure 9 is a schematic diagram of a purging unit according to an embodiment of the present invention;

[0065] Figure 10 is a schematic diagram (IV) of a high-flow-rate gas mixing system according to an embodiment of the present invention;

[0066] Figure 11 is a schematic diagram of a pressure relief unit according to an embodiment of the present invention;

[0067] Figure 12 is a schematic diagram (V) of a high-flow-rate gas mixing system according to an embodiment of the present invention;

[0068] Figure 13 is a schematic diagram of a pressure protection unit according to an embodiment of the present invention;

[0069] Figure 14 is a schematic diagram (VI) of a high-flow-rate gas mixing system according to an embodiment of the present invention;

[0070] Figure 15 is a schematic diagram of a standby mixed gas supply unit according to an embodiment of the present invention;

[0071] Figure 16 is a specific embodiment of a high-flow-rate gas mixing system according to an embodiment of the present invention. Detailed Implementation

[0072] To make the objectives, technical solutions, and advantages of this application clearer, the application is described and illustrated below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative and not intended to limit the scope of this application. All other embodiments obtained by those skilled in the art based on the embodiments provided in this application without inventive effort are within the scope of protection of this application.

[0073] Obviously, the accompanying drawings described below are merely some examples or embodiments of this application. Those skilled in the art can apply this application to other similar scenarios based on these drawings without any inventive effort. Furthermore, it is understood that although the efforts made in this development process may be complex and lengthy, for those skilled in the art related to the content disclosed in this application, any changes to design, manufacturing, or production based on the technical content disclosed in this application are merely conventional technical means and should not be construed as insufficient disclosure of the content of this application.

[0074] In this application, the reference to "embodiment" means that a specific feature, structure, or characteristic described in connection with an embodiment may be included in at least one embodiment of this application. The appearance of this phrase in various places in the specification does not necessarily refer to the same embodiment, nor is it a separate or alternative embodiment that is mutually exclusive with other embodiments. It will be explicitly and implicitly understood by those skilled in the art that the embodiments described in this application may be combined with other embodiments without conflict.

[0075] Example 1

[0076] This embodiment relates to the high-flow-rate gas mixing system of the present invention.

[0077] An illustrative embodiment of the present invention, as shown in FIG1, includes a high-flow-rate gas mixing system comprising a first gas input unit 100, a second gas input unit 200, at least one first flow control unit 300, at least one second flow control unit 400, a first gas mixing unit 500, a first concentration analysis unit 600, a second gas mixing unit 700, a second concentration analysis unit 800, a first gas output unit 900, and a second gas output unit 1000. The system comprises the following components: a first gas input unit 100 connected to a first gas source for supplying a first gas; a second gas input unit 200 connected to a second gas source for supplying a second gas; a first flow control unit 300 connected to the first gas input unit 100 and located downstream of the first gas input unit 100 for controlling the flow rate of the first gas; a second flow control unit 400 connected to the second gas input unit 200 and located downstream of the second gas input unit 200 for controlling the flow rate of the second gas; a first mixing unit 500 connected to both the first flow control unit 300 and the second flow control unit 400, and located downstream of both, for initially mixing the first and second gases to obtain a first mixed gas; and a first concentration analysis unit 600 connected to the first mixing unit 500 and located downstream of both units. Downstream of the gas mixing unit 500, a second gas mixing unit 700 is used to detect the concentration of the first mixed gas. The second gas mixing unit 700 is connected to the first gas mixing unit 500 and is used to finely mix the first mixed gas to obtain a second mixed gas. The second concentration analysis unit 800 is connected to the second gas mixing unit 700 and located downstream of the second gas mixing unit 700, and is used to detect the concentration of the second mixed gas. The first gas output unit 900 is connected to the first gas mixing unit 500, the second gas mixing unit 700, the second concentration analysis unit 800, and the process equipment, and is located downstream of the second gas mixing unit 700, and is used to supply the second mixed gas to the process equipment if the second concentration analysis unit 800 detects that the mixture meets the standard. The second gas output unit 1000 is connected to the first concentration analysis unit 600, the second concentration analysis unit 800, the first gas output unit 900, and the waste gas treatment equipment, and is used to supply waste gas.

[0078] It should be noted that the first end and the second end in this invention are the two ends in the length direction, respectively.

[0079] As shown in Figure 2, the first gas input unit 100 includes a first gas input element and a first control valve element 101. The first gas input element is connected to a first gas source and a first flow control unit 300, respectively, and is used to deliver the first gas; the first control valve element 101 is disposed on the first gas input element and is used to control the flow of the first gas input element.

[0080] Specifically, the first end of the first gas input element is connected to the first gas source, and the second end of the first gas input element is connected to the first flow control unit 300.

[0081] In some of these embodiments, the first gas input element includes, but is not limited to, a stainless steel tube.

[0082] Specifically, the first control valve element 101 includes a first manual diaphragm valve and a second manual diaphragm valve. The first manual diaphragm valve is disposed on the first gas input element and is used to manually control the flow between the first gas input element and the first gas source; the second manual diaphragm valve is disposed on the first gas input element and is located downstream of the first manual diaphragm valve, and is used to manually control the flow between the first gas input element and the first flow control unit 300.

[0083] In some of these embodiments, the first control valve element 101 includes, but is not limited to, a diaphragm valve.

[0084] Furthermore, the first gas input unit 100 also includes a first pressure regulating element 102 and a first pressure monitoring element 103. The first pressure regulating element 102 is disposed on the first gas input element and is used to regulate the gas pressure inside the first gas input element; the first pressure monitoring element 103 is connected to the first gas input element and is used to monitor the gas pressure upstream and downstream of the first pressure regulating element 102.

[0085] Specifically, the first pressure regulating element 102 is located downstream of the first manual diaphragm valve and upstream of the second manual diaphragm valve.

[0086] In some of these embodiments, the first pressure regulating element 102 includes, but is not limited to, a pressure regulating valve.

[0087] Specifically, the first pressure monitoring element 103 includes a first pressure gauge and a second pressure gauge. The first pressure gauge is connected to the first gas input element, and the connection point between the first pressure gauge and the first gas input element is located downstream of the first manual diaphragm valve and upstream of the first pressure regulating element 102. The second pressure gauge is connected to the first gas input element, and the connection point between the second pressure gauge and the first gas input element is located downstream of the first pressure regulating element 102 and upstream of the second manual diaphragm valve.

[0088] In some of these embodiments, the first pressure monitoring element 103 includes, but is not limited to, a pressure gauge.

[0089] Furthermore, the first gas input unit 100 also includes a second pressure monitoring element 104. The second pressure monitoring element 104 is connected to the first gas input element and is located downstream of the first control valve element 101, and is used to monitor the gas pressure inside the first gas input element.

[0090] Specifically, the second pressure monitoring element 104 includes a first pressure sensor. The first pressure sensor is connected to the first gas input element, and the connection between the first pressure sensor and the first gas input element is located downstream of the second manual diaphragm valve.

[0091] In some of these embodiments, the second pressure monitoring element 104 includes, but is not limited to, a pressure sensor.

[0092] As shown in Figure 2, the second gas input unit 200 includes a second gas input element and a second control valve element 201. The second gas input element is connected to the second gas source and the second flow control unit 400, respectively, and is used to deliver the second gas; the second control valve element 201 is disposed on the second gas input element and is used to control the flow of the second gas input element.

[0093] Specifically, the first end of the second gas input element is connected to the second gas source, and the second end of the second gas input element is connected to the second flow control unit 400.

[0094] In some of these embodiments, the second gas input element includes, but is not limited to, a stainless steel tube.

[0095] Specifically, the second control valve element 201 includes a third manual diaphragm valve and a fourth manual diaphragm valve. The third manual diaphragm valve is disposed on the second gas input element and is used to manually control the flow between the second gas input element and the second gas source; the fourth manual diaphragm valve is disposed on the second gas input element and located downstream of the third manual diaphragm valve, and is used to manually control the flow between the second gas input element and the second flow control unit 400.

[0096] In some of these embodiments, the second control valve element 201 includes, but is not limited to, a diaphragm valve.

[0097] Furthermore, the second gas input unit 200 also includes a second pressure regulating element 202 and a third pressure monitoring element 203. The second pressure regulating element 202 is disposed on the second gas input element and is used to regulate the gas pressure inside the second gas input element; the third pressure monitoring element 203 is connected to the second gas input element and is used to monitor the gas pressure upstream and downstream of the second pressure regulating element 202.

[0098] Specifically, the second pressure regulating element 202 is located downstream of the third manual diaphragm valve and upstream of the fourth manual diaphragm valve.

[0099] In some of these embodiments, the second pressure regulating element 202 includes, but is not limited to, a pressure regulating valve.

[0100] Specifically, the third pressure monitoring element 203 includes a third pressure gauge and a fourth pressure gauge. The third pressure gauge is connected to the second gas input element, and the connection point between the third pressure gauge and the second gas input element is located downstream of the third manual diaphragm valve and upstream of the second pressure regulating element 202; the fourth pressure gauge is connected to the second gas input element, and the connection point between the fourth pressure gauge and the second gas input element is located downstream of the second pressure regulating element 202 and upstream of the fourth manual diaphragm valve.

[0101] In some of these embodiments, the third pressure monitoring element 203 includes, but is not limited to, a pressure gauge.

[0102] Furthermore, the second gas input unit 200 also includes a fourth pressure monitoring element 204. The fourth pressure monitoring element 204 is connected to the second gas input element and is located downstream of the second control valve element 201, and is used to monitor the gas pressure inside the second gas input element.

[0103] Specifically, the fourth pressure monitoring element 204 includes a second pressure sensor. The second pressure sensor is connected to the second gas input element, and the connection between the second pressure sensor and the second gas input element is located downstream of the fourth manual diaphragm valve.

[0104] In some embodiments, the fourth pressure monitoring element 204 includes, but is not limited to, a pressure sensor.

[0105] As shown in Figure 3, the first flow control unit 300 includes at least one first flow pipeline element, at least one first flow control element 301, and at least one third control valve element 302. The first flow pipeline element is connected to both the first gas input unit 100 and the first gas mixing unit 500, and is used to supply first gas to the first gas mixing unit 500. The first flow control element 301 is disposed on the first flow pipeline element and is used to control the flow rate to the first gas mixing unit 500. The third control valve element 302 is disposed on the first flow pipeline element and is used to control the flow through the first flow pipeline element.

[0106] Specifically, the first end of the first flow pipeline element is connected to the second end of the first gas input element, and the second end of the first flow pipeline element is connected to the first gas mixing unit 500.

[0107] In some of these embodiments, the first flow path element includes, but is not limited to, a stainless steel pipe.

[0108] More specifically, there are several first flow pipeline elements, the first ends of the several first flow pipeline elements are connected in parallel with the second ends of the first gas input element, and the second ends of the several first flow pipeline elements are connected in parallel with the first gas mixing unit 500.

[0109] It should be noted that the number of the first flow control element 301 is the same as the number of the first flow pipeline element.

[0110] Specifically, the third control valve element 302 includes a first pneumatic diaphragm valve and a second pneumatic diaphragm valve. The first pneumatic diaphragm valve is disposed on the first flow line element and located upstream of the first flow control element 301, and is used to automatically control the flow between the first flow line element and the first gas input element. The second pneumatic diaphragm valve is disposed on the first flow line element and located downstream of the first flow control element 301, and is used to automatically control the flow between the first flow line element and the first gas mixing unit 500.

[0111] In some of these embodiments, the third control valve element 302 includes, but is not limited to, a diaphragm valve.

[0112] As shown in Figure 3, the second flow control unit 400 includes at least one second flow pipeline element, at least one second flow control element 401, and at least one fourth control valve element 402. The second flow pipeline element is connected to both the second gas input unit 200 and the first gas mixing unit 500, and is used to supply the second gas to the first gas mixing unit 500. The second flow control element 401 is disposed on the second flow pipeline element and is used to control the flow rate to the first gas mixing unit 500. The fourth control valve element 402 is disposed on the second flow pipeline element and is used to control the flow through the second flow pipeline element.

[0113] Specifically, the first end of the second flow pipeline element is connected to the second gas delivery element, and the second end of the second flow pipeline element is connected to the first gas mixing unit 500.

[0114] In some of these embodiments, the second flow conduit element includes, but is not limited to, a stainless steel pipe.

[0115] More specifically, there are several second flow pipeline elements, the first end of several second flow pipeline elements is connected in parallel with the second end of the second gas input element, and the second end of several second flow pipeline elements is connected in parallel with the first gas mixing unit 500.

[0116] It should be noted that the number of the second flow control element 401 is the same as the number of the second flow pipeline elements.

[0117] Specifically, the fourth control valve element 402 includes a third pneumatic diaphragm valve and a fourth pneumatic diaphragm valve. The third pneumatic diaphragm valve is disposed on the second flow line element and located upstream of the second flow control element 401, and is used to automatically control the flow between the second flow line element and the second gas input element. The fourth pneumatic diaphragm valve is disposed on the second flow line element and located downstream of the second flow control element 401, and is used to automatically control the flow between the second flow line element and the first mixing unit 500.

[0118] In some of these embodiments, the fourth control valve element 402 includes, but is not limited to, a diaphragm valve.

[0119] As shown in Figure 4, the first gas mixing unit 500 includes a first gas mixing element 501 and a fifth control valve element 502. The first gas mixing element 501 is connected to a first flow control unit 300, a second flow control unit 400, a first concentration analysis unit 600, a first gas output unit 900, and a second gas mixing unit 700, respectively, and is used to initially mix the first gas and the second gas to obtain a first mixed gas. The fifth control valve element 502 is disposed on the first gas mixing element 501 and is used to control the flow of gas in the first gas mixing element 501.

[0120] Specifically, the first gas mixing element 501 includes a first gas mixing input pipe, a buffer pipe, and a first gas mixing output pipe. The first end of the first gas mixing input pipe is connected to the second end of both the first flow pipe element and the second end of the second flow pipe element; the first end of the buffer pipe is connected to the second end of the first gas mixing pipe; the first end of the first gas mixing output pipe is connected to the second end of the buffer pipe; and the second end of the first gas mixing output pipe is connected to the first gas output unit 900, the first concentration analysis unit 600, and the second gas mixing unit 700.

[0121] In some of these embodiments, the first gas-fuel mixture input line includes, but is not limited to, a stainless steel pipe; the buffer line includes, but is not limited to, a pressure gauge buffer line; and the first gas-fuel mixture output line includes, but is not limited to, a stainless steel pipe.

[0122] Specifically, the fifth control valve element 502 includes a fifth manual diaphragm valve. This fifth manual diaphragm valve is located in the first mixed-gas output line and is used to manually control the flow in the first mixed-gas output line.

[0123] In some of these embodiments, the fifth control valve element 502 includes, but is not limited to, a diaphragm valve.

[0124] As shown in Figure 4, the first concentration analysis unit 600 includes a first concentration pipeline element, a first concentration analysis element 601, and a sixth control valve element 602. The first concentration pipeline element is connected to both the first gas mixing unit 500 and the first gas output unit 900, and is used to transport the first mixed gas. The first concentration analysis element 601 is connected to the first concentration pipeline element and is used to detect the concentration of the first mixed gas. The sixth control valve element 602 is disposed on the first concentration pipeline element and is used to control the flow through the first concentration pipeline element.

[0125] Specifically, the first concentration pipeline component includes a first concentration input pipeline and a first concentration output pipeline. The first end of the first concentration input pipeline is connected to the second end of the first mixed gas output pipeline, and the second end of the first concentration input pipeline is connected to the first concentration analysis element 601; the first end of the first concentration output pipeline is connected to the first concentration analysis element 601, and the second end of the first concentration output pipeline is connected to the second gas output unit 1000.

[0126] In some of these embodiments, the first concentration input pipeline includes, but is not limited to, a stainless steel pipe; the first concentration output pipeline includes, but is not limited to, a stainless steel pipe.

[0127] Specifically, the first concentration analysis element 601 includes a first analysis line, a first flow meter, a first analyzer, a second analysis line, a second flow meter, and a third analysis line. The first end of the first analysis line is connected to the second end of the first concentration input line; the first flow meter is disposed in the first analysis line and is used to adjust the flow rate of the first mixed gas to match the first analyzer; the first analyzer is connected to the second end of the first analysis line; the first end of the second analysis line is connected to the second end of the first concentration input line, and the second end of the second analysis line is connected to the first end of the first concentration output line; the second flow meter is disposed in the second analysis line and is used to directly discharge excess first mixed gas to the second gas output unit 1000; the first end of the third analysis line is connected to the first analyzer, and the second end of the third analysis line is connected to the first end of the first concentration output line.

[0128] In some of these embodiments, the first analytical line includes, but is not limited to, a stainless steel pipe; the first flow meter includes, but is not limited to, a float flow meter; the first analyzer includes, but is not limited to, a concentration analyzer; the second analytical line includes, but is not limited to, a stainless steel pipe; the second flow meter includes, but is not limited to, a float flow meter; and the third analytical line includes, but is not limited to, a stainless steel pipe.

[0129] Specifically, the sixth control valve element 602 includes a fifth pneumatic diaphragm valve, a first check valve, and a second check valve. The fifth pneumatic diaphragm valve is located in the first concentration input line and is used to automatically control the flow between the first concentration input line and the first mixed gas output line. The first check valve is located in the first concentration input line and downstream of the fifth pneumatic diaphragm valve, and is used to allow unidirectional flow of the first mixed gas inside the first concentration input line. The second check valve is located in the first concentration output line and is used to allow unidirectional flow of the first mixed gas inside the first concentration output line.

[0130] In some of these embodiments, the sixth control valve element 602 includes, but is not limited to, a diaphragm valve and a check valve.

[0131] Furthermore, the first concentration analysis unit 600 also includes a third pressure regulating element 603 and a fifth pressure monitoring element 604. The third pressure regulating element 603 is disposed in the first concentration pipeline element and is used to regulate the gas pressure inside the first concentration pipeline element; the fifth pressure monitoring element 604 is connected to the first concentration pipeline element and is used to monitor the gas pressure inside the first concentration pipeline element.

[0132] Specifically, the third pressure regulating element 603 is disposed in the first concentration input pipeline and located downstream of the first one-way valve, and is used to regulate the gas pressure inside the first concentration input pipeline.

[0133] In some of these embodiments, the third pressure regulating element 603 includes, but is not limited to, a pressure regulating valve.

[0134] Specifically, the fifth pressure monitoring element 604 includes a fifth pressure gauge. The fifth pressure gauge is connected to the first concentration input line, and the connection between the fifth pressure gauge and the first concentration input line is located downstream of the first check valve, for real-time monitoring of the gas pressure inside the first concentration input line.

[0135] In some of these embodiments, the fifth pressure monitoring element 604 includes, but is not limited to, a pressure gauge.

[0136] As shown in Figure 4, the second gas mixing unit 700 includes a plurality of second gas mixing elements 701 and a plurality of seventh control valve elements 702. The plurality of second gas mixing elements 701 are connected in series, with one second gas mixing element 701 located on either side connected to the first gas mixing unit 500, and the other second gas mixing element 701 connected to the first gas output unit 900. Located downstream of the first gas mixing unit 500 and upstream of the first gas output unit 900, these elements are used to finely mix the first mixed gas to obtain a second mixed gas. The plurality of seventh control valve elements 702 are respectively disposed on the corresponding second gas mixing elements 701 and are used to control the flow of the second gas mixing elements 701.

[0137] More specifically, there are three second mixing elements 701, which are connected in series. The two outermost second mixing elements 701 are connected to the first mixing output pipeline and the first gas output pipeline, respectively.

[0138] In some of these embodiments, the second mixing element 701 includes, but is not limited to, a mixing tank.

[0139] In some of these embodiments, the second mixing element 701 includes, but is not limited to, a 29L mixing tank.

[0140] In some embodiments, a plurality of second mixing elements 701 form a plurality of groups of second mixing elements 701. Each group of second mixing elements 701 includes a plurality of second mixing elements 701. Generally, each group of second mixing elements 701 contains the same number of second mixing elements 701. That is, the number of second mixing elements 701 is a = b * c, where a is the total number, b is the number of groups, and c is the number of second mixing elements 701 in each group.

[0141] Specifically, the seventh control valve element 702 includes a sixth manual diaphragm valve. The sixth manual diaphragm valve is located at the inlet and / or outlet of the second mixing element 701.

[0142] In some of these embodiments, the seventh control valve element 702 includes, but is not limited to, a diaphragm valve.

[0143] It should be noted that the number of the seventh control valve element 702 is an integer multiple of the number of the second mixing element 701. For example, the number of the seventh control valve element 702 is equal to the number of the second mixing element 701, or the number of the seventh control valve element 702 is twice the number of the second mixing element 701.

[0144] As shown in Figure 4, the second concentration analysis unit 800 includes a second concentration pipeline element, a second concentration analysis element 801, and an eighth control valve element 802. The second concentration pipeline element is connected to both the first gas output unit 900 and the second gas output unit 1000, and is used to deliver the second mixed gas. The second concentration analysis element 801 is connected to the second concentration pipeline element and is used to detect the concentration of the second mixed gas. The eighth control valve element 802 is disposed on the second concentration pipeline element and is used to control the flow through the second concentration pipeline element.

[0145] Specifically, the second concentration pipeline element includes a second concentration input pipeline and a second concentration output pipeline. The first end of the second concentration input pipeline is connected to the first gas output unit 900, thereby connecting to the second gas mixing unit 700 via the first gas output unit 900. The second end of the second concentration input pipeline is connected to the second concentration analysis element 801. The first end of the second concentration output pipeline is connected to the second concentration analysis element 801, and the second end of the second concentration output pipeline is connected to the second gas output unit 1000.

[0146] In some of these embodiments, the second concentration input pipeline includes, but is not limited to, a stainless steel pipe; the second concentration output pipeline includes, but is not limited to, a stainless steel pipe.

[0147] Specifically, the second concentration analysis element 801 includes a fourth analysis line, a third flow meter, a second analyzer, a fifth analysis line, the fourth flow meter, and a sixth analysis line. The first end of the fourth analysis line is connected to the second end of the second concentration input line; the third flow meter is installed in the fourth analysis line to adjust the flow rate of the second mixed gas to match the second analyzer; the second analyzer is connected to the second end of the fourth analysis line; the first end of the fifth analysis line is connected to the second end of the second concentration input line, and the second end of the fifth analysis line is connected to the first end of the second concentration output line; the third flow meter is installed in the fifth analysis line to directly discharge excess second mixed gas to the second gas output unit 1000; the first end of the sixth analysis line is connected to the second analyzer, and the second end of the sixth analysis line is connected to the first end of the second concentration output line.

[0148] In some embodiments, the fourth analytical line includes, but is not limited to, a stainless steel tube; the third flow meter includes, but is not limited to, a float flow meter; the second analyzer includes, but is not limited to, a concentration analyzer; the fifth analytical line includes, but is not limited to, a stainless steel tube; the fourth flow meter includes, but is not limited to, a float flow meter; and the sixth analytical line includes, but is not limited to, a stainless steel tube.

[0149] Specifically, the eighth control valve element 802 includes a sixth pneumatic diaphragm valve, a third check valve, and a fourth check valve. The sixth pneumatic diaphragm valve is located in the second concentration input line and is used to automatically control the flow between the second concentration input line and the first gas output unit 900. The third check valve is located in the second concentration input line and downstream of the sixth pneumatic diaphragm valve, and is used to allow unidirectional flow of the second mixed gas inside the second concentration input line. The fourth check valve is located in the second concentration output line and is used to allow unidirectional flow of the second mixed gas inside the second concentration output line.

[0150] In some of these embodiments, the eighth control valve element 802 includes, but is not limited to, a diaphragm valve and a check valve.

[0151] Furthermore, the second concentration analysis unit 800 also includes a fourth pressure regulating element 803 and a sixth pressure monitoring element 804. The fourth pressure regulating element 803 is disposed in the second concentration pipeline element and is used to regulate the gas pressure inside the second concentration pipeline element; the sixth pressure monitoring element 804 is connected to the second concentration pipeline element and is used to monitor the gas pressure inside the second concentration pipeline element.

[0152] Specifically, the fourth pressure regulating element 803 is disposed in the second concentration input pipeline and located downstream of the third check valve, and is used to regulate the gas pressure inside the second concentration input pipeline.

[0153] In some of these embodiments, the fourth pressure regulating element 803 includes, but is not limited to, a pressure regulating valve.

[0154] Specifically, the sixth pressure monitoring element 804 includes a sixth pressure gauge. The sixth pressure gauge is connected to the second concentration input line, and the connection between the sixth pressure gauge and the second concentration input line is located downstream of the third check valve, for real-time monitoring of the gas pressure inside the second concentration input line.

[0155] In some of these embodiments, the sixth pressure monitoring element 804 includes, but is not limited to, a pressure gauge.

[0156] As shown in Figure 5, the first gas output unit 900 includes a first gas output element, a ninth control valve element 901, at least one second gas output element, and at least one tenth control valve element 902. The first gas output element is connected to a first gas mixing unit 500, a first concentration analysis unit 600, a second gas mixing unit 700, and a second concentration analysis unit 800, respectively, and is used to deliver a first mixed gas or a second mixed gas. The ninth control valve element 901 is disposed on the first gas output element and is used to control the flow through the first gas output element. The second gas output element is connected to the first gas output element and process equipment, respectively, and is used to deliver a second mixed gas to the process equipment. The tenth control valve element 902 is disposed on the second gas output element and is used to control the flow through the second gas output element.

[0157] Specifically, the first end of the first gas output element is connected to the second end of the first mixed gas output pipeline, and the second end of the first gas output element is connected to the first end of the second gas output element, the second concentration input pipeline, and the second gas output unit 1000.

[0158] In some of these embodiments, the first gas output element includes, but is not limited to, a stainless steel tube.

[0159] Specifically, the ninth control valve element 901 includes a seventh manual diaphragm valve, an eighth manual diaphragm valve, and a seventh pneumatic diaphragm valve. The seventh manual diaphragm valve is located on the first gas output element, downstream of the second mixing element 701 and the first mixing output pipeline, and upstream of the second mixing element 701 and the first gas output element, for controlling the flow between the first mixing output pipeline and the first gas output element. The eighth manual diaphragm valve is located on the first gas output element, downstream of the second mixing element 701 and the first gas output element, and upstream of the connection between the first gas output element and the second gas output unit 1000, for manually controlling the flow between the first gas output element and the second mixing element 701. The seventh pneumatic diaphragm valve is located on the first gas output element, downstream of the connection between the first gas output element and the second gas output unit 1000, for automatically controlling the flow between the first gas output element and the second gas output element.

[0160] In some of these embodiments, the ninth control valve element 901 includes, but is not limited to, a diaphragm valve.

[0161] Specifically, there are several second gas output elements, the first end of several second gas output elements is connected in parallel with the second end of the first gas output element, and the second end of several second gas output elements is connected to the corresponding process equipment.

[0162] In some of these embodiments, the second gas output element includes, but is not limited to, a stainless steel tube.

[0163] It should be noted that the number of second gas output elements is the same as the number of process equipment or the number of air inlets of the process equipment.

[0164] Specifically, the tenth control valve element 902 includes a ninth manual diaphragm valve. This ninth manual diaphragm valve is located on the corresponding second gas output element and is used to manually control the flow between the second gas output element and the process equipment.

[0165] In some of these embodiments, the tenth control valve element 902 includes, but is not limited to, a diaphragm valve.

[0166] It should be noted that the number of the tenth control valve element 902 is the same as the number of the second gas delivery element.

[0167] Furthermore, the first gas output unit 900 also includes a fifth pressure regulating element 903 and a seventh pressure monitoring element 904. The fifth pressure regulating element 903 is disposed on the first gas output element and is used to regulate the gas pressure inside the first gas output element; the seventh pressure monitoring element 904 is connected to the first gas output element and is used to monitor the gas pressure upstream and downstream of the fifth pressure regulating element 903.

[0168] Specifically, the fifth pressure regulating element 903 is located downstream of the eighth manual diaphragm valve and upstream of the connection point between the first gas output element and the second concentration input pipeline.

[0169] In some of these embodiments, the fifth pressure regulating element 903 includes, but is not limited to, a pressure regulating valve.

[0170] Specifically, the seventh pressure monitoring element 904 includes a third pressure sensor and a fourth pressure sensor. The third pressure sensor is connected to the first gas output element, and the connection point between the third pressure sensor and the first gas output element is located downstream of the eighth manual diaphragm valve and upstream of the fifth pressure regulating element 903. The fourth pressure sensor is also connected to the first gas output element, and the connection point between the fourth pressure sensor and the first gas output element is located downstream of the connection point between the first gas output element and the second concentration input element, and upstream of the connection point between the first gas output element and the second gas output unit 1000.

[0171] In some embodiments, the seventh pressure monitoring element 904 includes, but is not limited to, a pressure sensor.

[0172] Furthermore, the first gas output unit 900 also includes a first flow detection element 905 and at least one second flow detection element 906. The first flow detection element 905 is disposed on the first gas output element and is used to detect the flow rate inside the first gas output element; the second flow detection element 906 is disposed on the corresponding second gas output element and is used to detect the flow rate inside the second gas output element.

[0173] Specifically, the first flow detection element 905 is located downstream of the fourth pressure sensor and upstream of the connection between the first gas output element and the second gas output unit 1000; the second flow detection element 906 is located downstream of the ninth manual diaphragm valve.

[0174] In some of these embodiments, the first flow detection element 905 includes, but is not limited to, a flow meter; the second flow detection element 906 includes, but is not limited to, a flow meter.

[0175] As shown in Figure 5, the second gas output unit 1000 includes a third gas output element, an eleventh control valve element 1001, at least one fourth gas output element, and at least one twelfth control valve element 1002. The third gas output element is connected to the first gas output unit 900 and is used to transport waste gas; the eleventh control valve element 1001 is disposed on the second gas output element and is used to control the flow rate of the second gas output element; the fourth gas output element is connected to both the third gas output element and the waste gas treatment equipment and is used to transport waste gas; the twelfth control valve element 1002 is disposed on the fourth gas output element and is used to control the flow rate of the fourth gas output element.

[0176] Specifically, the first end of the third gas output element is connected to the first gas output element, and the connection between the first end of the third gas output element and the first gas output element is located downstream of the first flow detection element 905 and upstream of the seventh pneumatic diaphragm valve. The second end of the third gas output element is connected to the first end of the fourth gas output element.

[0177] In some of these embodiments, the third gas output element includes, but is not limited to, a stainless steel tube.

[0178] Specifically, the eleventh control valve element 1001 includes a tenth manual diaphragm valve. The tenth manual diaphragm valve is disposed on the third gas output element and located upstream of the connection between the third gas output element and the first concentration output pipeline and the second concentration output pipeline, and is used to manually control the flow between the third gas output element and the first gas output element.

[0179] In some of these embodiments, the eleventh control valve element 1001 includes, but is not limited to, a diaphragm valve.

[0180] Specifically, there are several fourth gas output elements, the first end of several fourth gas output elements is connected in parallel with the second end of the third gas output element, and the second end of several fourth gas output elements is connected to the corresponding waste gas treatment equipment.

[0181] In some of these embodiments, the fourth gas output element includes, but is not limited to, a stainless steel tube.

[0182] It should be noted that the number of fourth gas output elements is the same as the number of exhaust gas treatment devices or the number of air inlets on the exhaust gas treatment devices.

[0183] Specifically, the twelfth control valve element 1002 includes an eleventh manual diaphragm valve. This eleventh manual diaphragm valve is located on the fourth gas output element and is used to manually control the connection between the fourth gas output element and the waste gas treatment equipment.

[0184] In some of these embodiments, the twelfth control valve element 1002 includes, but is not limited to, a diaphragm valve.

[0185] It should be noted that the number of the twelfth control valve element 1002 is the same as the number of the fourth gas output element.

[0186] The usage method of this embodiment is as follows:

[0187] The system controls the first and second gas sources to supply the first and second gases to the first and second gas input elements, respectively, and opens the first, second, third, and fourth manual diaphragm valves, the first pressure regulating element 102, and the second pressure regulating element 202, respectively, so that the first and second pressure regulating elements 102 and 202 can adjust the gas pressure inside the first and second gas input elements to appropriate values. After the pressure adjustment is completed, the system opens the first, second, third, and fourth pneumatic diaphragm valves, the first flow control element 301, and the second flow control element 401, thereby controlling the first and second flow pipeline elements to supply the first and second gases to the first mixing element 501 at appropriate flow rates, so that the first mixing element 501 can initially mix the first and second gases to obtain the first mixed gas. The system opens the fifth manual diaphragm valve, the fifth pneumatic diaphragm valve, and the third pressure regulating element 603, so that the pressure of the first mixed gas supplied to the first flow meter meets the standard, and after pressure adjustment... The first mixed gas can be adjusted by the first flow meter to ensure that the flow rate of the first mixed gas supplied to the first analyzer meets the standard, so that the first analyzer can detect the first mixed gas until its concentration meets the standard. When the concentration of the first mixed gas reaches the preset standard, the system closes the fifth pneumatic diaphragm valve and the sixth manual diaphragm valve, and opens the sixth manual diaphragm valve, so that the first mixed gas sequentially enters the second mixing element 701 for mixing to obtain the second mixed gas. The system opens the sixth pneumatic diaphragm valve and the fourth pressure regulating element 803 to ensure that the pressure of the second mixed gas supplied to the third flow meter meets the standard. After pressure regulation, the second mixed gas can be adjusted by the third flow meter to ensure that the flow rate of the second mixed gas supplied to the second analyzer meets the standard, so that the second analyzer can detect the second mixed gas until its concentration meets the standard. When the concentration of the second mixed gas reaches the preset standard, the system opens the seventh pneumatic diaphragm valve and the ninth manual diaphragm valve, so that the second mixed gas can be delivered to the process equipment through the first gas output element and the second gas output element.

[0188] In addition, to discharge excess gas flowing to the first concentration input pipeline, the system opens the sixth manual diaphragm valve, the eighth manual diaphragm valve, the fifth pressure regulating element 903, the tenth manual diaphragm valve, and the eleventh manual diaphragm valve, so that excess first mixed gas can be discharged to the waste gas treatment equipment through the first mixed gas output pipeline, the first gas output element, the third gas output element, and the fourth gas output element; to discharge excess gas flowing to the first flow meter, it can be discharged to the waste gas treatment equipment through the second analysis pipeline, the second flow meter, the first concentration output pipeline, and the fourth gas output element; and the first mixed gas after being detected by the first analyzer can be discharged to the waste gas treatment equipment through the third analysis pipeline, the first concentration output pipeline, and the fourth gas output element.

[0189] In addition, to remove excess gas flowing to the second flow meter, it can be discharged to the waste gas treatment equipment through the fifth analysis pipeline, the fourth flow meter, the second concentration output pipeline, and the fourth gas output element. The second mixed gas, after being detected by the second analyzer, can be discharged to the waste gas treatment equipment through the sixth analysis pipeline, the first concentration output pipeline, and the fourth gas output element.

[0190] The advantages of this embodiment are that by connecting the first gas input unit to multiple first flow control units and the second gas input unit to multiple second flow control units, the flow rate can be controlled simultaneously by multiple second flow control units, thereby improving the flow rate control accuracy and thus improving the concentration accuracy; by connecting the first gas mixing unit to the first flow control unit and the second flow control unit respectively, the first gas mixing unit performs initial mixing of the first gas and the second gas, thereby improving the concentration uniformity of the overall system; by connecting the second gas mixing unit to the first gas mixing unit, the second mixed gas obtained from the initial mixing is further finely mixed, thereby further improving the concentration uniformity of the gas mixture.

[0191] Example 2

[0192] This embodiment is a modified embodiment of embodiment 1.

[0193] As shown in Figure 6, the high-flow-rate gas mixing system also includes a third gas input unit 1100. The first gas input unit 100 is connected to the first concentration analysis unit 600 and is used to supply the first gas to the first concentration analysis unit 600 for zero-gas calibration. The first gas input unit 100 is also connected to the second concentration analysis unit 800 and is used to supply the first gas to the second concentration analysis unit 800 for zero-gas calibration. The third gas input unit 1100 is connected to the standard gas source, the first concentration analysis unit 600, and the second concentration analysis unit 800, respectively, and is used to perform standard gas calibration on the first concentration analysis unit 600 and the second concentration analysis unit 800.

[0194] As shown in Figure 7, the first gas input unit 100 further includes a third gas input element, a thirteenth control valve element 105, a fourth gas input element, a fourteenth control valve element 106, a fifth gas input element, and a fifteenth control valve element 107. The third gas input element is connected to the first gas input element and is used to deliver the first gas. The thirteenth control valve element 105 is disposed on the third gas input element and is used to control the flow of gas through the third gas input element. The fourth gas input element is connected to both the third gas input element and the first concentration analysis unit 600, and is used to deliver the first gas to the first concentration analysis unit 600 to perform zero gas calibration. The fourteenth control valve element is disposed on the fourth gas input element and is used to control the flow of gas through the fourth gas input element. The fifth gas input element is connected to both the third gas input element and the second concentration analysis unit 800, and is used to deliver the first gas to the second concentration analysis unit 800 to perform zero gas calibration. The fifteenth control valve element 107 is disposed on the fifth gas input element and is used to control the flow of gas through the fifth gas input element.

[0195] Specifically, the first end of the third gas input element is connected to the first gas input element at a point downstream of the second pressure monitoring element 104 and upstream of the first gas input element and the first flow pipeline element; the first end of the fourth gas input element is connected to the second end of the third gas input element, and the second end of the fourth gas input element is connected to the first concentration input pipeline; the first end of the fifth gas input element is connected to the second end of the third gas input element, and the second end of the fifth gas input element is connected to the second concentration input pipeline.

[0196] In some of these embodiments, the third gas input element includes, but is not limited to, a stainless steel tube; the fourth gas input element includes, but is not limited to, a stainless steel tube; and the fifth gas input element includes, but is not limited to, a stainless steel tube.

[0197] Specifically, the thirteenth control valve element 105 includes a twelfth manual diaphragm valve and a fifth check valve. The twelfth manual diaphragm valve is located on the third gas input element and is used to manually control the flow between the first gas input element and the third gas input element; the fifth check valve is located on the third gas input element and downstream of the twelfth manual diaphragm valve, and is used to allow unidirectional flow of gas within the third gas input element.

[0198] In some of these embodiments, the thirteenth control valve element 105 includes, but is not limited to, a diaphragm valve and a check valve.

[0199] Specifically, the fourteenth control valve element 106 includes a thirteenth manual diaphragm valve. This thirteenth manual diaphragm valve is located on the fourth gas input element and is used to manually control the flow through the fourth gas input element.

[0200] In some of these embodiments, the fourteenth control valve element 106 includes, but is not limited to, a diaphragm valve.

[0201] Specifically, the fifteenth control valve element 107 includes a fourteenth manual diaphragm valve. The fourteenth manual diaphragm valve is located on the fifth gas input element and is used to manually control the flow through the fifth gas input element.

[0202] In some of these embodiments, the fifteenth control valve element 107 includes, but is not limited to, a diaphragm valve.

[0203] As shown in Figure 7, the third gas input unit 1100 includes a sixth gas input element and a sixteenth control valve element 1101. The sixth gas input element is connected to both the standard gas source and the third gas input element, and is used to supply standard gas to the first concentration analysis unit 600 and the second concentration analysis unit 800 so that the second concentration analysis unit 800 can perform standard gas calibration. The sixteenth control valve element 1101 is disposed on the sixth gas input element and is used to control the flow through the sixth gas input element.

[0204] Specifically, the first end of the sixth gas input element is connected to the standard gas source, the second end of the sixth gas input element is connected to the third gas input element, and the connection between the second end of the sixth gas input element and the third gas input element is located downstream of the fifth check valve.

[0205] In some of these embodiments, the sixth gas input element includes, but is not limited to, a stainless steel tube.

[0206] Specifically, the sixteenth control valve element 1101 includes a fifteenth manual diaphragm valve. The fifteenth manual diaphragm valve is located on the sixth gas input element and is used to manually control the flow through the sixth gas input element.

[0207] In some of these embodiments, the sixteenth control valve element 1101 includes, but is not limited to, a diaphragm valve.

[0208] The usage method of this embodiment is as follows:

[0209] Before operating the mixed gas, the system needs to perform zero-gas calibration and standard gas calibration on the first concentration analysis unit 600 and the second concentration analysis unit 800 to ensure detection accuracy and improve instrument precision. The system opens the first manual diaphragm valve and the second manual diaphragm valve, so that the first pressure regulating element 102 can adjust the gas pressure inside the first gas input element to a suitable value. The system opens the twelfth manual diaphragm valve and the thirteenth manual diaphragm valve, so that the pressure of the first gas supplied to the first flow meter meets the standard. After pressure adjustment, the first gas can be adjusted by the first flow meter to make the flow rate supplied to the first analyzer meet the standard, thereby achieving zero-gas calibration of the first analyzer. The system opens the fourteenth manual diaphragm valve, so that the pressure of the standard gas supplied to the third flow meter meets the standard. After pressure adjustment, the standard gas can be adjusted by the third flow meter to make the flow rate supplied to the second analyzer meet the standard, thereby achieving zero-gas calibration of the second analyzer.

[0210] In addition, after the first gas and standard gas are used to calibrate the first analyzer, the system opens the eleventh manual diaphragm valve, so that the first gas and standard gas can be discharged to the waste gas treatment equipment through the second analysis pipeline, the second flow meter, the first concentration output pipeline, and the fourth gas output element.

[0211] In addition, after the first gas and standard gas are used to calibrate the second analyzer, the system opens the eleventh manual diaphragm valve, so that the first gas and standard gas can be discharged to the waste gas treatment equipment through the fifth analysis pipeline, the fourth flow meter, the second concentration output pipeline, and the fourth gas output element.

[0212] The advantage of this embodiment is that by connecting the first gas input unit and the third gas input unit with the first concentration analysis unit and the second concentration analysis unit, zero gas calibration and standard gas calibration operations can be performed on the first concentration analysis unit and the second concentration analysis unit to ensure detection accuracy and improve instrument precision.

[0213] Example 3

[0214] This embodiment is a modified embodiment of Embodiments 1 and 2.

[0215] As shown in Figure 8, the high-flow-rate gas mixing system also includes a purging unit 1200. The purging unit 1200 is connected to the second gas input unit 200 and the second gas output unit 1000, respectively, and is used to purge the entire pipeline and equipment.

[0216] As shown in Figure 9, the purging unit 1200 includes a first purging pipeline element, a seventeenth control valve element 1201, a second purging pipeline element, an eighteenth control valve element 1202, a third purging pipeline element, a nineteenth control valve element 1203, a vacuum element 1205, a vacuum pipeline element, a twentieth control valve element 1204, a power gas supply pipeline element, and a twenty-first control valve element 1206. The first purge pipeline element is connected to both the purge gas source and the second gas input unit 200, and is used to deliver purge gas. The seventeenth control valve element 1201 is located on the first purge pipeline element and is used to control the flow within the first purge pipeline element. The second purge pipeline element is connected to both the second gas input unit 200 and the first gas mixing unit 500, and is used to deliver purge gas. The eighteenth control valve element 1202 is located on the second purge pipeline element and is used to control the flow within the second purge pipeline element. The third purge pipeline element is connected to both the first gas mixing unit 500 and the second gas output unit 1000, and is used to deliver purge gas. The nineteenth control valve element 1203 is... The third purge pipeline element is used to control the flow of the third purge pipeline element; the vacuum pipeline element is connected to the second gas output unit 1000 and the waste gas treatment equipment respectively, and is used to transport waste gas; the twentieth control valve element 1204 is set on the vacuum pipeline element and is used to control the flow of the vacuum pipeline element; the vacuum element 1205 is set on the vacuum pipeline element and is used to form a vacuum negative pressure at the end of the second gas input unit 200; the power gas supply pipeline element is connected to the vacuum element 1205 and the power gas source respectively, and is used to transport the power gas source; the twenty-first control valve element 1206 is set on the power supply pipeline element and is used to control the flow of the power gas supply pipeline element.

[0217] Specifically, the first end of the first purge pipeline element is connected to the purge gas source, the second end of the first purge pipeline element is connected to the second gas input element, and the connection between the second end of the first purge pipeline element and the second gas input element is located downstream of the second pressure regulating element 202 and upstream of the fourth manual diaphragm valve; the first end of the second purge pipeline element is connected to the second end of the second gas input element, and the second end of the second purge pipeline element is connected to the first gas mixing element 501; the first end of the third purge pipeline element is connected to the first gas mixing output pipeline, and the connection between the first end of the third purge pipeline element and the first gas mixing output pipeline is... The passage is located upstream of the connection between the first mixed gas output pipeline and the first concentration input pipeline; the second end of the third purging pipeline element is connected to the third gas output element; the first end of the vacuum pipeline element is connected to the second end of the third gas output element, and the second end of the vacuum pipeline element is connected to the waste gas treatment equipment; the vacuum element 1205 is located downstream of the seventeenth manual diaphragm valve and upstream of the eighteenth manual diaphragm valve, and is used to provide vacuum negative pressure to the second end of the third gas input element; the first end of the power gas supply pipeline element is connected to the power gas source, and the second end of the power gas supply pipeline element is connected to the vacuum element 1205.

[0218] In some of these embodiments, the first purging line element includes, but is not limited to, a stainless steel tube; the second purging line element includes, but is not limited to, a stainless steel tube; the third purging line element includes, but is not limited to, a stainless steel tube; the vacuum line element includes, but is not limited to, a stainless steel tube; the vacuum element 1205 includes, but is not limited to, a Venturi vacuum pump; and the power gas supply line element includes, but is not limited to, a stainless steel tube.

[0219] Specifically, the seventeenth control valve element 1201 includes a sixteenth manual diaphragm valve and an eighth pneumatic diaphragm valve. The sixteenth manual diaphragm valve is located in the first purge line element and is used to manually control the flow in the first purge line element; the eighth pneumatic diaphragm valve is located in the first purge line element and downstream of the sixteenth manual diaphragm valve, and is used to automatically control the flow in the first purge line element.

[0220] In some of these embodiments, the seventeenth control valve element 1201 includes, but is not limited to, a diaphragm valve.

[0221] Specifically, the eighteenth control valve element 1202 includes a ninth pneumatic diaphragm valve. The ninth pneumatic diaphragm valve is disposed in the second purge line element and is used to automatically control the flow in the second purge line element.

[0222] In some of these embodiments, the eighteenth control valve element 1202 includes, but is not limited to, a diaphragm valve.

[0223] Specifically, the nineteenth control valve element 1203 includes a tenth pneumatic diaphragm valve and a sixth check valve. The tenth pneumatic diaphragm valve is disposed in the third purge line element and is used to automatically control the flow in the third purge line element; the sixth check valve is disposed in the third purge line element and is located downstream of the tenth pneumatic diaphragm valve, and is used to allow unidirectional flow of gas in the third purge line element.

[0224] In some of these embodiments, the nineteenth control valve element 1203 includes, but is not limited to, a diaphragm valve and a check valve.

[0225] Specifically, the twentieth control valve element 1204 includes a seventeenth manual diaphragm valve and an eighteenth manual diaphragm valve. The seventeenth manual diaphragm valve is located in the vacuum pipeline element and is used to manually control the flow of the vacuum pipeline element; the eighteenth manual diaphragm valve is located in the vacuum pipeline element and downstream of the seventeenth manual diaphragm valve, and is used to manually control the flow of the vacuum pipeline element.

[0226] In some of these embodiments, the twentieth control valve element 1204 includes, but is not limited to, a diaphragm valve.

[0227] Specifically, the twenty-first control valve element 1206 includes a nineteenth manual diaphragm valve. The nineteenth manual diaphragm valve is located in the power gas supply line element and is used to manually control the flow of power gas in the power gas supply line element.

[0228] In some of these embodiments, the twenty-first control valve element 1206 includes, but is not limited to, a diaphragm valve.

[0229] The usage method of this embodiment is as follows:

[0230] To ensure the accuracy of the gas mixing concentration in the high-flow-rate gas mixing system, the entire pipeline of the system needs to be purged before mixing. The system keeps all diaphragm valves closed and opens the sixteenth manual diaphragm valve, the eighth pneumatic diaphragm valve, the ninth pneumatic diaphragm valve, the sixth manual diaphragm valve, the seventh manual diaphragm valve, and the eighth manual diaphragm valve, allowing the purging gas to fill the entire pipeline and maintain pressure for a period of time. Subsequently, the system opens the nineteenth manual diaphragm valve and vacuum element 1205, allowing the power gas supply pipeline to supply power gas to vacuum element 1205, and causing vacuum element 1205 to provide negative pressure at the second end of the third gas input element. Finally, the system opens the tenth pneumatic diaphragm valve, the tenth manual diaphragm valve, the eleventh manual diaphragm valve, the seventeenth manual diaphragm valve, and the eighteenth manual diaphragm valve, allowing the gas in the entire pipeline to be discharged through the third purging pipeline element, the third gas output element, and the vacuum pipeline element.

[0231] The advantage of this embodiment is that by connecting the purging unit with the second gas input unit and the second gas output unit, the entire pipeline of the system can be purged before the high-flow-rate gas mixing system is mixed, thereby ensuring the accuracy of the gas mixing concentration of the high-flow-rate gas mixing system.

[0232] Example 4

[0233] This embodiment is a modified embodiment of embodiments 1 to 3.

[0234] As shown in Figure 10, the high-flow-rate gas mixing system also includes a pressure relief unit 1300. The pressure relief unit 1300 is connected to the first gas mixing unit 500, the second gas mixing unit 700, and the second gas output unit 1000, respectively, and is used for pressure relief.

[0235] As shown in Figure 11, the pressure relief unit 1300 includes a first pressure relief pipeline element, a first pressure relief valve element 1301, a plurality of second pressure relief pipeline elements, and a plurality of second pressure relief valve elements 1302. The first pressure relief pipeline element is connected to the first gas output unit 900 and the second gas output unit 1000, respectively. The first pressure relief valve element 1301 is disposed on the first pressure relief pipeline element and is used to open and relieve pressure when the pressure inside the first pressure relief pipeline element exceeds a preset pressure threshold. The plurality of second pressure relief pipeline elements are connected to the second gas mixing unit 700 and the second gas output unit 1000, respectively. The plurality of second pressure relief valve elements 1302 are disposed on corresponding second pressure relief pipeline elements and are used to open and relieve pressure when the pressure inside the second pressure relief pipeline element exceeds a preset pressure threshold.

[0236] Specifically, the first end of the first pressure relief pipeline element is connected to the first gas mixing output pipeline, and the second end of the first pressure relief pipeline element is connected to the first end of the fourth gas output element; the first end of the second pressure relief pipeline element is connected to the second gas mixing element 701, and the second end of the second pressure relief pipeline element is connected to the third gas output element.

[0237] In some of these embodiments, the first pressure relief pipeline element includes, but is not limited to, a stainless steel pipe; the first pressure relief valve element 1301 includes, but is not limited to, a safety pressure relief valve; and the second pressure relief pipeline element includes, but is not limited to, a stainless steel pipe.

[0238] More specifically, there are six second pressure relief pipeline components, and the first ends of the six second pressure relief pipeline components are respectively connected to the corresponding second gas mixing element 701, and the second ends of the six second pressure relief pipeline components are connected in parallel with the third gas output element.

[0239] It should be noted that the number of the second pressure relief pipeline components is the same as the number of the second mixing components 701.

[0240] Specifically, there are 6 second pressure relief valve elements 1302, and the 6 second pressure relief valve elements 1302 are respectively disposed on the corresponding second pressure relief pipeline elements.

[0241] In some of these embodiments, the second pressure relief valve element 1302 includes, but is not limited to, a safety valve.

[0242] It should be noted that the number of the second pressure relief valve element 1302 is the same as the number of the second pressure relief pipeline element.

[0243] The usage method of this embodiment is as follows:

[0244] When the pressure in the pipeline of the high-flow-rate gas mixing system reaches the threshold of 1 MPa, the gas in the pipeline can be discharged to the waste gas treatment equipment through the first pressure relief valve element 1301 and the second pressure relief valve element 1302.

[0245] The advantage of this embodiment is that by setting a pressure relief unit in the pipeline of the system, automatic pressure relief can be performed when the pressure in the pipeline of the high-flow-rate gas mixing system reaches the threshold of 1 MPa to protect the overall system.

[0246] Example 5

[0247] This embodiment is a modified embodiment of embodiments 1 to 4.

[0248] As shown in Figure 12, the high-flow-rate gas mixing system also includes a pressure protection unit 1400. The pressure protection unit 1400 is connected to the first gas output unit 900, the second gas output unit 1000, the first gas mixing unit 500, and the second gas mixing unit 700, respectively, and is used to protect the pipeline.

[0249] As shown in Figure 13, the pressure protection unit 1400 includes a pressure protection pipeline element, a twenty-second control valve element 1401, a first protection element 1402, a second protection element 1403, and an eighth pressure monitoring element 1404. The pressure protection pipeline element is connected to the first gas output unit 900 and the second gas output unit 1000 respectively, and the connection between the pressure protection pipeline element and the first gas output unit 900 is located between the second gas mixing unit 700 and the second concentration analysis unit 800, for conveying gas; the twenty-second control valve element 1401 is disposed on the pressure protection pipeline element for controlling the flow of the pressure protection pipeline element; the first protection element 1402 is disposed on the pressure protection pipeline element and is located downstream of the twenty-second control valve element 1401, for opening when the gas flow in the pipeline is too large; the second protection element 1403 is disposed on the pressure protection pipeline element and is located downstream of the first protection element 1402, for opening when the gas pressure in the pipeline is too large; the eighth pressure monitoring element 1404 is connected to the pressure protection pipeline element and is located downstream of the second protection element 1403, for monitoring the gas pressure inside the pressure protection pipeline element.

[0250] Specifically, the first end of the pressure protection pipeline element is connected to the first gas output element, and the second end of the pressure protection pipeline element is connected to the second pressure relief pipeline element.

[0251] In some of these embodiments, the pressure protection piping components include, but are not limited to, stainless steel pipes; the first protection element 1402 includes, but is not limited to, a needle valve; and the second protection element 1403 includes, but is not limited to, a back pressure valve.

[0252] Specifically, the twenty-second control valve element 1401 includes an eleventh pneumatic diaphragm valve. The eleventh pneumatic diaphragm valve is located in the pressure protection pipeline element and is used to automatically control the flow through the pressure protection pipeline element.

[0253] In some of these embodiments, the twenty-second control valve element 1401 includes, but is not limited to, a diaphragm valve.

[0254] Specifically, the eighth pressure monitoring element 1404 includes a fifth pressure sensor. This fifth pressure sensor is connected to a pressure protection pipeline element and is used to monitor the gas pressure passing through the second protection element 1403 in real time.

[0255] In some of these embodiments, the eighth pressure monitoring element 1404 includes, but is not limited to, a pressure sensor.

[0256] The usage method of this embodiment is as follows:

[0257] To prevent excessively high conveying pressure from affecting the downstream equipment, this system is equipped with a pressure protection unit 1400. The eleventh pneumatic diaphragm valve is normally open. The first protection element 1402 is adjusted to a suitable flow rate, and the second protection element 1403 is adjusted to the protection pressure. When the pressure is higher than the protection pressure, the gas will pass through the eleventh pneumatic diaphragm valve, the first protection element 1402, the second protection element 1403, and finally be discharged from the fourth gas output element.

[0258] The advantage of this embodiment is that by connecting the pressure protection unit with the first gas output unit and the second gas output unit, the gas can be automatically discharged to the second output unit when the gas pressure delivered by the first gas output unit is too high, thereby protecting the pipeline of the entire system.

[0259] Example 6

[0260] This embodiment is a modified embodiment of embodiments 1 to 5.

[0261] As shown in Figure 14, the high-flow-rate gas mixing system also includes a backup mixed gas supply unit 1500. The backup mixed gas supply unit 1500 is connected to the first gas output unit 900 and is used to supply gas to the process equipment.

[0262] As shown in Figure 15, the backup mixed gas supply unit 1500 includes a backup gas supply pipeline element, a twenty-third control valve element 1501, a ninth pressure monitoring element 1502, and a third flow detection element 1503. The backup gas supply pipeline element is connected to a backup gas source and a first gas output unit 900, respectively, for supplying mixed gas to the process equipment; the twenty-third control valve element 1501 is located in the backup gas supply pipeline element and is used to control the flow within the backup gas supply pipeline element; the ninth pressure monitoring element 1502 is connected to the backup gas supply pipeline element and is used to monitor the gas pressure inside the backup gas supply pipeline element; the third flow detection element 1503 is located in the backup gas supply pipeline element and is used to detect the flow rate inside the backup gas supply pipeline element.

[0263] Specifically, the first end of the backup gas supply pipeline element is connected to the backup gas source, and the second end of the backup gas supply pipeline element is connected to the second gas output element.

[0264] In some of these embodiments, the backup gas supply piping components include, but are not limited to, stainless steel pipes.

[0265] Specifically, the twenty-third control valve element 1501 includes a twentieth manual diaphragm valve and a twelfth pneumatic diaphragm valve. The twentieth manual diaphragm valve is installed in the backup gas supply pipeline element and is used to manually control the flow of the backup gas supply pipeline element; the twelfth pneumatic diaphragm valve is installed in the backup gas supply pipeline element and is located downstream of the twentieth manual diaphragm valve, and is used to automatically control the flow of the backup gas supply pipeline element.

[0266] In some of these embodiments, the twenty-third control valve element 1501 includes, but is not limited to, a diaphragm valve.

[0267] Specifically, the ninth pressure monitoring element 1502 includes a sixth pressure sensor. The sixth pressure sensor is connected to the backup gas supply line element and is located downstream of the nineteenth manual diaphragm valve and upstream of the twelfth pneumatic diaphragm valve.

[0268] In some embodiments, the ninth pressure monitoring element 1502 includes, but is not limited to, a pressure sensor.

[0269] Specifically, the third flow detection element 1503 is located downstream of the twelfth pneumatic diaphragm valve.

[0270] In some of these embodiments, the third flow meter includes, but is not limited to, a flow meter.

[0271] The usage method of this embodiment is as follows:

[0272] In the event of a system failure and gas supply interruption, the system opens the twentieth manual diaphragm valve, allowing gas from the backup gas tank to flow to the backup gas supply pipeline components. If the gas pressure monitored by the twelfth pressure sensor meets the requirements, the system opens the twelfth pneumatic diaphragm valve, thus ensuring that subsequent process equipment can operate normally in the event of a system failure and gas supply interruption.

[0273] The advantage of this embodiment is that by connecting the backup mixed gas supply unit to the first gas output unit, the normal operation of subsequent process equipment can be guaranteed in the event of a system failure and interruption of the mixed gas supply.

[0274] Example 7

[0275] This embodiment relates to the process equipment of the present invention.

[0276] A semiconductor process apparatus includes a high-flow-rate gas mixing system as described in Examples 1 to 6.

[0277] In addition, a semiconductor process apparatus also includes a first gas supply device, a second gas supply device, a purge gas supply device, a standard gas supply device, a waste gas treatment device, a power gas supply device, and a backup gas supply device. The first gas supply device is connected to a first gas input unit 100; the second gas supply device is connected to a second gas input unit 200; the purge gas supply device is connected to a purge unit 1200; the standard gas supply device is connected to a third gas input unit 1100; the waste gas treatment device is connected to a second gas output unit 1000; the power gas supply device is connected to the vacuum element 1205 of the purge unit 1200; and the backup gas supply device is connected to a backup mixed gas supply unit 1500.

[0278] The usage method of this embodiment is basically the same as that of embodiments 1 to 6, and will not be repeated here.

[0279] The technical effects of this embodiment are basically the same as those of embodiments 1 to 6, and will not be repeated here.

[0280] Example 8

[0281] This embodiment relates to the high-flow-rate gas mixing method of the present invention.

[0282] A high-flow-rate gas mixing method, applied to the high-flow-rate gas mixing system as described in Examples 1 to 6 or the semiconductor process equipment as described in Example 7, includes:

[0283] The first gas input unit 100 acquires the first gas and supplies the first gas to the first flow control unit 300;

[0284] The first flow control unit 300 acquires the first gas and controls the flow rate of the first gas to the first mixing unit 500;

[0285] The second gas input unit 200 acquires the second gas and supplies the second gas to the second flow control unit 400;

[0286] The second flow control unit 400 acquires the second gas and controls the flow rate of the second gas to the first mixing unit 500;

[0287] The first gas mixing unit 500 acquires a first gas and a second gas and performs initial mixing on the first gas and the second gas to obtain a first mixed gas.

[0288] The first concentration analysis unit 600 acquires the first mixed gas and detects the concentration of the first mixed gas;

[0289] If the concentration of the first mixed gas detected by the first concentration analysis unit 600 meets the standard, the second gas mixing unit 700 acquires the first mixed gas and performs fine mixing on the first mixed gas to obtain the second mixed gas.

[0290] The second concentration analysis unit 800 acquires the second mixed gas and detects the concentration of the second mixed gas;

[0291] If the concentration of the second mixed gas detected by the second concentration analysis unit 800 meets the standard, the first gas output unit 900 delivers the second mixed gas to the process equipment.

[0292] Specifically, the above-described high-flow-rate gas mixing method can be referred to the usage method in Example 1.

[0293] Furthermore, high-flow-rate mixing methods also include:

[0294] The first gas input unit 100 supplies the first gas to the first concentration analysis unit 600 and the second concentration analysis unit 800 to achieve zero gas calibration of the first concentration analysis unit 600 and the second concentration analysis unit 800;

[0295] The third gas input unit 1100 supplies standard gas to the first concentration analysis unit 600 and the second concentration analysis unit 800 to calibrate the standard gas of the first concentration analysis unit 600 and the second concentration analysis unit 800.

[0296] Specifically, the above-described high-flow-rate gas mixing method can be referred to the usage method in Example 2.

[0297] Furthermore, high-flow-rate mixing methods also include:

[0298] The purging unit 1200 acquires purging gas and delivers it to the overall pipeline and equipment to purge the overall pipeline and equipment.

[0299] Specifically, the above-described high-flow-rate gas mixing method can be referred to the usage method in Example 3.

[0300] Furthermore, high-flow-rate mixing methods also include:

[0301] If the air pressure inside the pipeline exceeds a preset threshold, the pressure relief unit 1300 will relieve the pressure on the entire pipeline and equipment.

[0302] Specifically, the above-described high-flow-rate gas mixing method can be referred to the usage method in Example 4.

[0303] Furthermore, high-flow-rate mixing methods also include:

[0304] If the pressure inside the pipeline exceeds a preset threshold, the pressure protection unit 1400 will be activated, allowing the pressure inside the pipeline to be discharged through the second gas output unit 1000.

[0305] Specifically, the above-described high-flow-rate gas mixing method can be referred to the usage method in Example 5.

[0306] Furthermore, high-flow-rate mixing methods also include:

[0307] In the event of a second gas mixture supply failure, the backup gas mixture supply unit 1500 can supply the second gas mixture to the process equipment.

[0308] Specifically, the above-described high-flow-rate gas mixing method can be referred to in the usage method of Example 6.

[0309] The technical effects of this embodiment are basically the same as those of embodiments 1 to 6, and will not be repeated here.

[0310] Example 9

[0311] This embodiment relates to a specific implementation of the high-flow-rate gas mixing system and method of the present invention.

[0312] As shown in Figure 16, the first gas input unit 100 includes manual diaphragm valves (MV1N, MV2NA, MV0F, MV2F, MV3F), a pressure regulating valve (REG1), a check valve (CV4), pressure gauges (PG1, PG3), and a pressure sensor (PT1); the second gas input unit 200 includes manual diaphragm valves (MV1H, MV2HA), a pressure regulating valve (REG2), pressure gauges (PG2, PG4), and a pressure sensor (PT2); the first flow control unit 300 includes pneumatic diaphragm valves (AV2NA, AV3NA) and flow controllers (MFC1, MFC2); the second flow control unit 400 includes pneumatic diaphragm valves (AV2HA, AV3HA) and flow controllers (MFC3, MFC4); and the first gas mixing unit 500 includes a buffer tube. The first concentration analysis unit 600 includes a pneumatic diaphragm valve (AV1F), a check valve (CV2, CV3), a pressure regulating valve (REG3), a pressure gauge (PG5), and an analyzer (GRD-3000-1); the second gas mixing unit 700 includes a gas mixing tank (Buffer). The first gas output unit 900 includes manual diaphragm valves (TV1, TV2, TV3, TV4, TV5, TV6, TV7, TV8, TV9, TV10, TV11, TV12); the second concentration analysis unit 800 includes pneumatic diaphragm valves (AV2F), check valves (CV5, CV6), pressure regulating valves (REG4), pressure gauges (PG6), and analyzers (GRD-3000-2); the first gas output unit 900 includes manual diaphragm valves (BYPASS2, MV3H, MV5M1, MV5M2, MV5M3), pneumatic diaphragm valves (AV4M), pressure regulating valves (pan, PRV1M), pressure sensors (PT3, PT4), and flow meters (MFM1, MFM2, MFM3, MFM4); the second gas output unit 1000 includes manual diaphragm valves (TV1, TV2, TV3, TV4, TV5, TV6, TV7, TV8, TV9, TV10, TV11, TV12); the second concentration analysis unit 800 includes pneumatic diaphragm valves (AV2F), check valves (CV5, CV6), pressure regulating valves (REG4), pressure gauges (PG6), and analyzers (GRD-3000-2); the second gas output unit 1000 includes manual diaphragm valves (TV1, TV2, TV3, TV4, TV5, TV6, TV7, TV8, TV9, TV10, TV11, TV12); the third gas output unit 900 includes manual diaphragm valves (Vessel, AV2F, CV5, CV6), pneumatic diaphragm valves (AV4M), pressure regulating valves (pan, PRV1M), pressure sensors (PT3, PT4), and flow meters (MFM1, MFM2, MFM3, MFM4); the fourth gas output unit The gas supply unit 1100 includes a gas cylinder (CYL) and a manual diaphragm valve (MV1F); the purging unit 1200 includes a manual diaphragm valve (MV1P, VGO1, VGI1, PVS), a pneumatic diaphragm valve (APP-2, BYPASS1, AV0F), a check valve (CV1), and a Venturi vacuum pump (VG); the pressure relief unit 1300 includes pressure relief valves (RV1, RV2, RV3, RV4, RV5, RV6, RV7); the pressure protection unit 1400 includes a pneumatic diaphragm valve (BKV), a needle valve (MCV), a back pressure valve (BPR1V), and a pressure sensor (PT5); the backup mixed gas supply unit 1500 includes a manual diaphragm valve (MV5M4), a pneumatic diaphragm valve (AV5M), and a pressure sensor (PT6).

[0313] Specifically, the high-flow-rate gas mixing method in this embodiment is as follows:

[0314] (a) Pre-mixing purging operation

[0315] The system keeps all diaphragm valves closed and opens MV1P, APP-2, MV2HA, BYPASS1, MV3S, BYPASS2, and MV3M to fill the pipelines throughout the system with purge gas and maintain the pressure for a period of time. The system opens VGI1 and VG to supply motive gas to the vacuum element 1205 through the motive gas supply pipeline element, and to provide negative pressure at the second end of the third gas input element of the vacuum element 1205. The system opens AV0F, TV2V, PVS, and VG01, so that the gas in the entire pipeline is discharged through the third purge pipeline element, the third gas output element, and the vacuum pipeline element.

[0316] (II) Mixed Gas Calibration Operation

[0317] The system activates MV1N and MV2NA, allowing REG1 to adjust the internal pressure of the first gas input element to a suitable value. The system activates MV0F and MV3F, with REG3 performing pressure regulation to ensure the pressure of the first gas supplied to the first flow meter meets the standard. The regulated first gas can then be adjusted by the first flow meter to ensure the flow rate to GRD-3000-1 meets the standard, thus achieving zero-gas calibration of GRD-3000-1. The system activates MV2F and REG4 to regulate the pressure of the calibration gas supplied to the third flow meter, ensuring the pressure meets the standard. The regulated calibration gas can then be adjusted by the third flow meter to ensure the flow rate to GRD-3000-1 meets the standard. The flow rate of 00-2 meets the standard, thus achieving zero gas calibration of GRD-3000-2; after the first gas and standard gas are used to calibrate GRD-3000-1, the system activates VAU1 and VAU2, allowing the first gas and standard gas to be discharged to the waste gas treatment equipment through the second analysis pipeline, the second flow meter, the first concentration output pipeline, and the fourth gas output element; after the first gas and standard gas are used to calibrate GRD-3000-2, the system activates VAU1 and VAU2, allowing the first gas and standard gas to be discharged to the waste gas treatment equipment through the fifth analysis pipeline, the fourth flow meter, the second concentration output pipeline, and the fourth gas output element.

[0318] (III) Gas mixing operation

[0319] The system controls the first and second gas sources to supply the first and second gases to the first and second gas input elements, respectively, and activates MV1N, MV2NA, MV1H, MV2HA, REG1, and REG2, allowing REG1 and REG2 to adjust the internal gas pressure of the first and second gas input elements to appropriate values. After pressure adjustment, the system activates AV2NA, AV3NA, AV2HA, AV3HA, MFC1, MFC2, MFC3, and MFC4, thereby controlling the first and second flow pipeline elements to supply the first and second gases at appropriate flow rates to the first mixing element 501, enabling the first mixing element 501 to... The first gas and the second gas are initially mixed to obtain a first mixed gas. The system activates MV3S, AV1F, and REG3 to ensure that the pressure of the first mixed gas supplied to the first flow meter meets the standard. After pressure adjustment, the first mixed gas can be adjusted by the first flow meter to ensure that the flow rate of the first mixed gas supplied to GRD-3000-1 meets the standard, thus allowing GRD-3000-1 to detect the first mixed gas until its concentration meets the standard. To discharge excess gas flowing to the first concentration input pipeline, the system activates BYPASS2, MV3M, TV2V, VAU1, and VAU2, allowing excess first mixed gas to pass through the first mixed gas output pipeline, the first gas output element, and the third gas... The first mixed gas, after being detected by GRD-3000-1, is discharged to the waste gas treatment equipment via the second analysis pipeline, the second flow meter, the first concentration output pipeline, and the fourth gas output element. When the concentration of the first mixed gas reaches the preset standard, the system closes AV1F and BYPASS2, and opens TV1, TV2, TV3, TV4, TV5, TV6, TV7, TV8, TV9, TV10, TV11, and TV12, allowing the first mixed gas to enter the waste gas treatment equipment sequentially. The second mixing element 701 mixes gases to obtain a second mixed gas. The system activates MV3M, AV2F, and REG4 to adjust the gas pressure, ensuring that the pressure of the second mixed gas supplied to the third flow meter meets the standard. After pressure adjustment, the flow rate of the second mixed gas supplied to GRD-3000-2 can be adjusted by the third flow meter to meet the standard, allowing GRD-3000-2 to detect the second mixed gas until its concentration meets the standard. When the concentration of the second mixed gas reaches the preset standard, the system activates MFM1, MFM2, MFM3, and MFM4, allowing the second mixed gas to be delivered to the process equipment through the first and second gas output elements.To remove excess gas flowing to the second flow meter, it can be discharged to the waste gas treatment equipment via the fifth analysis line, the fourth flow meter, the second concentration output line, and the fourth gas output element. The second mixed gas, after being detected by the GRD-3000-2, can be discharged to the waste gas treatment equipment via the sixth analysis line, the first concentration output line, and the fourth gas output element.

[0320] (iv) Pressure relief operation

[0321] Once the pressure in the pipeline of the high-flow-rate gas mixing system reaches the threshold of 1 MPa, the gas in the pipeline can be discharged to the waste gas treatment equipment through RV1, RV2, RV3, RV4, RV5, RV6, and RV7.

[0322] (v) Overvoltage protection

[0323] BKV is normally open. Adjust MCV to a suitable flow rate. Adjust BPR1V to the protection pressure. When the pressure is higher than the protection pressure, the gas will pass through BKV, MCV, and BPR1V, and finally be discharged from the fourth gas output element.

[0324] (vi) Gas supply backup

[0325] In the event of a system failure and gas supply interruption, the system activates MV5M4, allowing gas from the backup gas tank to flow to the backup gas supply pipeline components. If the gas pressure monitored by PT6 meets the requirements, the system activates AV5M, thus ensuring that subsequent process equipment can operate normally even if the gas supply is interrupted due to a system failure.

[0326] The technical features of the above embodiments can be combined in any way. For the sake of brevity, not all possible combinations of the technical features in the above embodiments are described. However, as long as there is no contradiction in the combination of these technical features, they should be considered to be within the scope of this specification.

[0327] The embodiments described above are merely illustrative of several implementation methods of this application, and while the descriptions are relatively specific and detailed, they should not be construed as limiting the scope of the invention patent. It should be noted that those skilled in the art can make various modifications and improvements without departing from the concept of this application, and these all fall within the protection scope of this application. Therefore, the protection scope of this patent application should be determined by the appended claims.

Claims

A large flow gas mixing system characterized in that, include: A first gas input unit, which is connected to a first gas source, is used to deliver a first gas. The second gas input unit is connected to the second gas source and is used to deliver the second gas; At least one first flow control unit is connected to the first gas input unit and is located downstream of the first gas input unit, for controlling the flow rate of the first gas; At least one second flow control unit is connected to the second gas input unit and is located downstream of the second gas input unit, for controlling the flow rate of the second gas; The first gas mixing unit is connected to the first flow control unit and the second flow control unit respectively, and is located downstream of the first flow control unit and the second flow control unit. It is used to initially mix the first gas and the second gas to obtain a first mixed gas. A first concentration analysis unit, which is connected to the first gas mixing unit and located downstream of the first gas mixing unit, is used to detect the concentration of the first mixed gas. The second gas mixing unit is connected to the first gas mixing unit and is used to finely mix the first gas mixture to obtain the second gas mixture. The second concentration analysis unit is connected to the second gas mixing unit and is located downstream of the second gas mixing unit, and is used to detect the concentration of the second mixed gas. The first gas output unit is connected to the first gas mixing unit, the second gas mixing unit, the second concentration analysis unit, and the process equipment, and is located downstream of the second gas mixing unit. It is used to deliver the second mixed gas to the process equipment when the second concentration analysis unit detects that the gas meets the standard. The second gas output unit is connected to the first concentration analysis unit, the second concentration analysis unit, the first gas output unit, and the waste gas treatment equipment, and is used to transport waste gas. The large flow gas mixing system according to claim 1, characterized in that, The first gas input unit includes: A first gas input element is connected to a first gas source and a first flow control unit, respectively, and is used to deliver a first gas. A first control valve element, disposed on the first gas input element, is used to control the flow through the first gas input element; and / or The second gas input unit includes: The second gas input element is connected to the second gas source and the second flow control unit respectively, and is used to deliver the second gas. A second control valve element, disposed on the second gas input element, is used to control the flow through the second gas input element; and / or The first flow control unit includes: At least one first flow line element, the first flow line element being connected to the first gas input unit and the first gas mixing unit respectively, for supplying the first gas to the first gas mixing unit; At least one first flow control element is disposed on the first flow pipeline element and is used to control the flow rate to the first mixing unit; At least one third control valve element, the third control valve element being disposed on the first flow line element, for controlling the flow in the first flow line element; and / or The second flow control unit includes: At least one second flow line element, the second flow line element being connected to the second gas input unit and the first gas mixing unit respectively, for supplying the second gas to the first gas mixing unit; At least one second flow control element is disposed on the second flow pipeline element for controlling the flow rate to the first mixing unit; At least one fourth control valve element, the fourth control valve element being disposed in the second flow line element, for controlling the flow in the second flow line element; and / or The first mixing unit includes: The first gas mixing element is connected to the first flow control unit, the second flow control unit, the first concentration analysis unit, the first gas output unit, and the second gas mixing unit, respectively, and is used to initially mix the first gas and the second gas to obtain a first mixed gas. A fifth control valve element, disposed on the first mixing element, is used to control the flow through the first mixing element; and / or The first concentration analysis unit includes: The first concentration pipeline element is connected to the first gas mixing unit and the first gas output unit respectively, and is used to transport the first mixed gas; A first concentration analysis element, which is connected to a first concentration pipeline element, is used to detect the concentration of a first mixed gas; A sixth control valve element, disposed on the first concentration pipeline element, is used to control the flow in the first concentration pipeline element; and / or The second mixing unit includes: A plurality of second gas mixing elements are connected in series, and any one of the second gas mixing elements on both sides is connected to the first gas mixing unit, and the other second gas mixing element is connected to the first gas output unit and is located downstream of the first gas mixing unit and upstream of the first gas output unit, for fine mixing of the first mixed gas to obtain the second mixed gas. A plurality of seventh control valve elements, each of which is respectively disposed on a corresponding second mixing element, are used to control the flow of the second mixing element; and / or The second concentration analysis unit includes: The second concentration pipeline element is connected to the first gas output unit and the second gas output unit respectively, and is used to transport the second mixed gas; The second concentration analysis element is connected to the second concentration pipeline element and is used to detect the concentration of the second mixed gas; The eighth control valve element, disposed in the second concentration pipeline element, is used to control the flow in the second concentration pipeline element; and / or The first gas output unit includes: A first gas output element is connected to the first gas mixing unit, the first concentration analysis unit, the second gas mixing unit, and the second concentration analysis unit, respectively, and is used to deliver a first mixed gas or a second mixed gas. A ninth control valve element is disposed on the first gas output element and is used to control the flow of the first gas output element; At least one second gas output element is connected to the first gas output element and the process equipment, respectively, for conveying the second mixed gas to the process equipment; At least one tenth control valve element, the tenth control valve element being disposed on the second gas output element for controlling the flow through the second gas output element; and / or The second gas output unit includes: A third gas output element, which is connected to the first gas output unit, is used to transport waste gas; The eleventh control valve element is disposed on the second gas output element and is used to control the flow of the second gas output element; At least one fourth gas output element is connected to the third gas output element and the waste gas treatment equipment, respectively, for conveying waste gas; At least one twelfth control valve element is disposed on the fourth gas output element for controlling the flow of the fourth gas output element. The large flow gas mixing system according to claim 2, characterized in that, The first gas input unit further includes: A first pressure regulating element is disposed on the first gas input element and is used to regulate the gas pressure inside the first gas input element; A first pressure monitoring element, connected to the first gas input element, is used to monitor the gas pressure upstream and downstream of the first pressure regulating element; and / or The first gas input unit further includes: A second pressure monitoring element, connected to the first gas input element and located downstream of the first control valve element, is used to monitor the gas pressure inside the first gas input element; and / or The second gas input unit further includes: The second pressure regulating element is disposed on the second gas input element and is used to regulate the gas pressure inside the second gas input element; A third pressure monitoring element, connected to the second gas input element, is used to monitor the gas pressure upstream and downstream of the second pressure regulating element; and / or The second gas input unit further includes: A fourth pressure monitoring element, which is connected to the second gas input element and located downstream of the second control valve element, is used to monitor the gas pressure inside the second gas input element; and / or The first concentration analysis unit further includes: A third pressure regulating element is disposed on the first concentration pipeline element and is used to regulate the gas pressure inside the first concentration pipeline element; A fifth pressure monitoring element, which is connected to the first concentration pipeline element, is used to monitor the gas pressure inside the first concentration pipeline element; and / or The second concentration analysis unit also includes: A fourth pressure regulating element is disposed in the second concentration pipeline element and is used to regulate the gas pressure inside the second concentration pipeline element; A sixth pressure monitoring element, connected to the second concentration pipeline element, is used to monitor the gas pressure inside the second concentration pipeline element; and / or The first gas output unit further includes: A fifth pressure regulating element is disposed on the first gas output element and is used to regulate the gas pressure inside the first gas output element; A seventh pressure monitoring element, connected to the first gas output element, is used to monitor the gas pressure upstream and downstream of the fifth pressure regulating element; and / or The first gas output unit further includes: A first flow detection element is disposed on the first gas output element and is used to detect the flow rate inside the first gas output element; At least one second flow detection element is disposed on the corresponding second gas output element for detecting the flow rate inside the second gas output element. The large flow gas mixing system according to any one of claims 1-3, characterized in that Also includes: The first gas input unit is connected to the first concentration analysis unit and is used to supply the first gas to the first concentration analysis unit so that the first concentration analysis unit can use the first gas for zero gas calibration. The first gas input unit is connected to the second concentration analysis unit and is used to supply the first gas to the second concentration analysis unit so that the second concentration analysis unit can use the first gas for zero gas calibration. The third gas input unit is connected to the standard gas source, the first concentration analysis unit, and the second concentration analysis unit, respectively, and is used to perform standard gas calibration on the first concentration analysis unit and the second concentration analysis unit. and / or A purging unit, which is connected to the second gas input unit and the second gas output unit respectively, is used to purge the entire pipeline and equipment; and / or A pressure relief unit, which is connected to the first gas mixing unit, the second gas mixing unit, and the second gas output unit respectively, is used for pressure relief; and / or A pressure protection unit, which is connected to the first gas output unit, the second gas output unit, the first gas mixing unit, and the second gas mixing unit respectively, is used to protect the pipeline; and / or A backup mixed gas supply unit, which is connected to the first gas output unit, is used to supply gas to the process equipment. The large flow gas mixing system according to claim 4, characterized in that, The first gas input unit further includes: A third gas input element, which is connected to the first gas input element, is used to deliver the first gas; The thirteenth control valve element is disposed on the third gas input element and is used to control the flow of the third gas input element; A fourth gas input element is connected to the third gas input element and the first concentration analysis unit, respectively, and is used to supply the first gas to the first concentration analysis unit so that the first concentration analysis unit can perform zero gas calibration. The fourteenth control valve element is disposed on the fourth gas input element and is used to control the flow of the fourth gas input element; A fifth gas input element is connected to the third gas input element and the second concentration analysis unit, respectively, and is used to supply the first gas to the second concentration analysis unit so that the second concentration analysis unit can perform zero gas calibration. A fifteenth control valve element, disposed on the fifth gas input element, is used to control the flow through the fifth gas input element; and / or The third gas input unit includes: A sixth gas input element is connected to a standard gas source, the first concentration analysis unit, and the second concentration analysis unit, respectively, and is used to supply standard gas to the first concentration analysis unit and the second concentration analysis unit so that the second concentration analysis unit can perform standard gas calibration. A sixteenth control valve element, disposed on the sixth gas input element, is used to control the flow through the sixth gas input element; and / or The purging unit includes: The first purging pipeline element is connected to the purging gas source and the second gas input unit respectively, and is used to deliver purging gas; The seventeenth control valve element is disposed on the first purge pipeline element and is used to control the flow of the first purge pipeline element. The second purging pipeline element is connected to the second gas input unit and the first gas mixing unit respectively, and is used to deliver purging gas; The eighteenth control valve element is disposed on the second purge pipeline element and is used to control the flow of the second purge pipeline element; The third purging pipeline element is connected to the first gas mixing unit and the second gas output unit respectively, and is used to deliver purging gas; The nineteenth control valve element is disposed on the third purge pipeline element and is used to control the flow of the third purge pipeline element; Vacuum pipeline components are connected to the second gas output unit and the waste gas treatment equipment respectively, and are used to transport waste gas; The twentieth control valve element is disposed on the vacuum pipeline element and is used to control the flow of the vacuum pipeline element; A vacuum element, disposed in the vacuum pipeline element, is used to create a vacuum negative pressure at the end of the second gas input unit; A power gas supply pipeline component, which is connected to the vacuum component and the power gas source respectively, for conveying the power gas source; The twenty-first control valve element, disposed in the power supply pipeline element, is used to control the flow of gas in the power supply pipeline element; and / or The pressure relief unit includes: The first pressure relief pipeline element is connected to the first gas output unit and the second gas output unit respectively; The first pressure relief valve element is disposed on the first pressure relief pipeline element and is used to open and relieve pressure when the pressure inside the first pressure relief pipeline element exceeds a preset pressure threshold. A plurality of second pressure relief pipeline components, wherein the plurality of second pressure relief pipeline components are respectively connected to the second gas mixing unit and the second gas output unit; A plurality of second pressure relief valve elements, each disposed in a corresponding second pressure relief pipeline element, are used to open and release pressure when the pressure inside the second pressure relief pipeline element exceeds a preset pressure threshold; and / or The pressure protection unit includes: A pressure protection pipeline element is connected to the first gas output unit and the second gas output unit respectively, and the connection between the pressure protection pipeline element and the first gas output unit is located between the second gas mixing unit and the second concentration analysis unit, for conveying gas; The 22nd control valve element is disposed on the pressure protection pipeline element and is used to control the flow of the pressure protection pipeline element; The first protective element is disposed in the pressure protection pipeline element and located downstream of the 22nd control valve element, and is used to open when the gas flow in the pipeline is too large. The second protection element is disposed in the pressure protection pipeline element and located downstream of the first protection element, and is used to open when the gas pressure in the pipeline is too high. An eighth pressure monitoring element, which is connected to the pressure protection pipeline element and located downstream of the second protection element, is used to monitor the air pressure inside the pressure protection pipeline element; and / or The backup mixed gas supply unit includes: A backup gas supply pipeline component is connected to a backup gas source and the first gas output unit, respectively, and is used to deliver mixed gas to the process equipment; The 23rd control valve element is disposed in the backup gas supply pipeline element and is used to control the flow of the backup gas supply pipeline element; A ninth pressure monitoring element, which is connected to the backup gas supply pipeline element, is used to monitor the gas pressure inside the backup gas supply pipeline element; A third flow detection element is disposed in the backup gas supply pipeline element and is used to detect the flow rate inside the backup gas supply pipeline element. A semiconductor process apparatus characterized by comprising: include: The high-flow-rate gas mixing system as described in any one of claims 1 to 5. A large flow gas mixing method, characterized in that, Applied to the high-flow-rate gas mixing system as described in any one of claims 1 to 5 or the semiconductor process equipment as described in claim 6, comprising: The first gas input unit acquires the first gas and supplies the first gas to the first flow control unit; The first flow control unit acquires the first gas and controls the flow rate of the first gas to the first mixing unit; The second gas input unit acquires the second gas and supplies the second gas to the second flow control unit; The second flow control unit acquires the second gas and controls the flow rate of the second gas to the first mixing unit; The first gas mixing unit acquires a first gas and a second gas, and performs initial mixing on the first gas and the second gas to obtain a first mixed gas; The first concentration analysis unit acquires the first mixed gas and detects the concentration of the first mixed gas; If the concentration of the first mixed gas detected by the first concentration analysis unit meets the standard, the second gas mixing unit acquires the first mixed gas and performs fine mixing on the first mixed gas to obtain the second mixed gas. The second concentration analysis unit acquires the second mixed gas and detects its concentration; If the concentration of the second mixed gas detected by the second concentration analysis unit meets the standard, the first gas output unit will deliver the second mixed gas to the process equipment. The large flow gas mixing method according to claim 7, wherein Also includes: The first gas input unit supplies the first gas to the first concentration analysis unit and the second concentration analysis unit to achieve zero gas calibration of the first concentration analysis unit and the second concentration analysis unit; The third gas input unit supplies standard gas to the first concentration analysis unit and the second concentration analysis unit to calibrate the standard gas of the first concentration analysis unit and the second concentration analysis unit; and / or The purging unit acquires purging gas and delivers it to the overall pipeline and equipment to purge the entire pipeline and equipment; and / or When the air pressure inside the pipeline exceeds a preset threshold, the pressure relief unit relieves pressure on the entire pipeline and equipment; and / or If the pressure inside the pipeline exceeds a preset threshold, the pressure protection unit activates, allowing the pressure inside the pipeline to be discharged through the second gas output unit; and / or In the event of a second mixed gas supply failure, the backup mixed gas supply unit can supply the second mixed gas to the process equipment. The large flow gas mixing method according to claim 7 or 8, characterized in that, Also includes: The first gas input element acquires the first gas and delivers the first gas to the first flow pipeline element; The first flow pipeline element obtains the first gas and controls the flow rate of the first gas to the first mixing element through the first flow control element; The second gas input element acquires the second gas and delivers the second gas to the second flow pipeline element; The second flow pipeline element obtains the second gas and controls the flow rate of the second gas to the first mixing element through the second flow control element; The first gas mixing element acquires the first gas and the second gas and performs initial mixing on the first gas and the second gas to obtain the first mixed gas; The first concentration pipeline element acquires the first mixed gas and delivers it to the first concentration analysis element to detect the concentration of the first mixed gas; If the concentration of the first mixed gas detected by the first concentration analysis element meets the standard, the second mixing element acquires the first mixed gas and performs fine mixing on the first mixed gas to obtain the second mixed gas; The second concentration pipeline element acquires the second mixed gas and delivers it to the second concentration analysis element to detect the concentration of the second mixed gas; If the concentration of the second mixed gas detected by the second concentration analysis element meets the standard, the first gas output element and the second gas output element will deliver the second mixed gas to the process equipment. The large flow gas mixing method according to claim 9, wherein Also includes: The first gas input element supplies the first gas to the first concentration analysis element and the second concentration analysis element to achieve zero gas calibration of the first concentration analysis element and the second concentration analysis element; The fifth gas input element supplies standard gas to the first concentration analysis element and the second concentration analysis element to achieve standard gas calibration of the first concentration analysis element and the second concentration analysis element; and / or The purging pipeline components obtain purging gas and deliver the purging gas to the entire pipeline and equipment to achieve purging of the entire pipeline and equipment; and / or If the air pressure inside the pipeline exceeds a preset threshold, the first and second pressure relief pipeline components will be opened to relieve pressure on the entire pipeline and equipment; and / or If the pressure inside the pipeline exceeds a preset threshold, the first pressure protection pipeline element and the second pressure protection pipeline element are activated, allowing the pressure inside the pipeline to be discharged through the second gas output unit; and / or In the event of a second gas mixture supply failure, the backup gas supply piping components can deliver the second gas mixture to the process equipment.

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