Vacuum Gauge Using Ionisation Effects TRIZ Cases

Two opposing diaphragms and a piezoelectric detector improve low-to-high vacuum measurement while reducing temperature and gas-species error.

A double-plasma cold cathode gauge measures residual vacuum near the substrate, improving leak detection and reducing gauge maintenance in thin-film lines.

A layered optical-electrical vacuum feedthrough enables compact, durable DBD plasma sensors with stable discharge measurement across wide pressure ranges.

Plasma current becomes ambiguous at higher vacuum pressures, so this case adds two emission-line intensity signals for wider, precise sensing.

A concave-convex through-hole structure in the gauge cartridge suppresses particle film buildup and maintains discharge inducing performance.

A replaceable cartridge and wave passage boost photoelectron emission and sustain ionization gauge discharge despite electrode deposition.

A partitioned light-source layout introduces electromagnetic waves into the discharge space to stabilize startup and reduce cathode fouling.

Simultaneous overlap-range readings calibrate a gas-dependent pressure sensor, extending accurate measurement across a broad pressure range.

Simultaneous readings from overlapping pressure sensors calibrate gas-dependent errors and extend accurate vacuum measurement range.

Overlapping indirect pressure sensors identify gas type from calibrated signals to correct gas dependence and derive a gas-independent pressure.

A carbon nanotube field emission cathode replaces hot tungsten filaments in ionization vacuum gauges to enable stable electron generation.

Reducing anode grid voltage from 180V to 80V during high-pressure operation minimizes sputtering yields and extends gauge operational life.

Electrical circuit detects leakage currents on feedthrough insulators to correct pressure signals and remove contamination without breaking vacuum.

A miniaturized pressure sensor merges capacitive diaphragm and ionization detection mechanisms into a single chip for wide-range measurement.

Magnetic materials in the measuring chamber retain flakes on pole disks, preventing short circuits and extending lifespan.

Dynamic emission current control minimizes cathode sputtering and degradation while maintaining accurate pressure measurement across varying vacuum levels.

A movable local plasma source generates emission spectra through a vacuum chamber window to measure partial pressure distribution.

A single-fiber laser-induced breakdown spectroscopy probe transmits laser energy and collects plasma emission signals.

Spiral screw shields block scattered particles to maintain measurement precision and extend service life.

Conformal elastic protection member prevents insulative film adhesion while maintaining discharge space size and reducing backlash.

Reversing voltage polarity cancels parasitic capacitance drift and electrode contamination, maintaining measurement sensitivity in ionized gas detectors.

A cold cathode ionization vacuum gauge incorporates a discharge trigger electrode plate with projections directed toward the anode to induce rapid electron emission.

A shield generates a repulsive electric field to stop electron loss at the anode-insulator transition, restoring sensitivity and linearity at low pressures.

Fusion bonding a sacrificial silicon substrate allows precise etching and automated pressure-controlled separation, resolving manual handling risks.

A device measures mean free path by detecting charged particle decay at distinct flight distances.

Nonvolatile memory stores unique calibration parameters for vacuum gauge sensors to maintain measurement accuracy.

A beryllium cathode in a helium sensor ion getter pump binds light helium atoms through atomic mass matching.

Microchannel plate cold emitter replaces hot cathode filaments to eliminate chemical degradation and extend operational lifetime.

Replaceable measuring chamber modules shield feedthroughs from contamination, extending operational time for ionization vacuum measuring cells.

Integrated device merges capacitive and ionization gauges to measure pressures from 10^-13 to 10^4 mbar, eliminating complex multi-device systems.

Ionization monitoring detects gas accumulation in the sealed reference vacuum cavity, preventing zero point shifts and maintaining measurement integrity.

A polymer layer deposits on an oxide-nitride-oxide stack to define planar surfaces for subsequent processing steps.

Ionization gauge electron source protected by intermediary shades blocking sputtered atoms from collector, preventing premature failure at high pressures.

A plasmon generator manufacturing method uses a segmented etching mask to create precise accommodation parts for sub-40 nm structures.

Auxiliary discharge starting electrode plate concentrates electric field to emit electrons for rapid vacuum gauge ignition.

A pressure measuring device pairs a gas friction gauge with a Pirani sensor for precise vacuum readings.

A varactor and inductor form a resonant circuit where ionized gas plasma alters capacitance to determine the oscillation frequency.

An electrostatic ion pump confines electrons using electric potentials between inner and outer electrodes.

Dynamic threshold adjustment reduces unnecessary sensor switching frequency, extending hot cathode sensor service life and improving measurement accuracy.

Segmented cathodes stabilize plasma discharge to measure pressures from 10^-11 Torr to atmospheric levels without output discontinuities.

Transistor circuit controls cathode bias voltage and electron emission current independently in a hot cathode ionization pressure gauge.

Fourier transform mass spectrometry uses gas pressure variation to determine collision cross-sections without ion isolation.

Plasma etching with reflectance monitoring controls erosion rates to maintain pattern critical dimensions in nano-fabrication.

Cold field-effect emission eliminates X-ray generation noise, enabling accurate measurement of very low pressures down to 10^-13 mbar.

Recessed transparent features in a silicon substrate enable horizontal light transmission for compact atomic clocks.

Multi-layer grid assemblies with optimized thicknesses control ion beam uniformity in etching systems.

Carbon nanotube field emission eliminates heat dissipation and material evaporation, enabling accurate pressure measurement in sensitive high vacuum systems.