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3results about How to "Increase gas volume" patented technology

Air separating, cooling and dehumidifying device

ActiveCN224284831Uincrease gas volumeIncrease capture efficiencyMechanical apparatusLighting and heating apparatusHigh humidityAir filter
The utility model discloses an air separating, cooling and dehumidifying device, which belongs to the technical field of air treatment and comprises an air filter, an air cooling dehumidifier and an air compressor. The outlet end of the air filter is connected with the inlet end of the air cooling dehumidifier, and the outlet end of the air cooling dehumidifier is connected with the inlet end of the air compressor; the air cooling dehumidifier comprises an outer shell, a cooler, a baffle plate and a dehumidification filter membrane, the cooler is arranged in the outer shell, the baffle plate is arranged at one end of the cooler, and the dehumidification filter membrane is arranged at one end of the baffle plate. According to the dehumidification and cooling device, rapid dehumidification and cooling can be achieved, the dehumidification and cooling efficiency is improved, air can be rapidly dehumidified and cooled in the environment with the high air humidity and the low outdoor temperature, and it is guaranteed that the whole process can be stably operated.
Owner:SHANDONG HUALU HENGSHENG CHEM IND

Workpiece clamping and holding device

ActiveCN224183080UHighly stable clamping and handlingReduce the clamping forceGripping headsConveyor partsMechanical engineeringPhysics
The utility model provides a workpiece clamping and holding device which comprises a driving piece driven by a movable driving device to lift up and down and move transversely. The clamping pieces are correspondingly connected with the two sides of the driving piece respectively, and the clamping pieces on the two sides are driven by a clamping driving device to clamp oppositely or open oppositely; the air bag is located between the clamping pieces on the two sides and connected with the driving piece, the air bag vertically extends, and the outer diameter of the air bag is smaller than the inner diameter of the through hole; and the extrusion pieces are arranged on the opposite sides of the clamping pieces on the two sides and correspond to the upper portions of the air bags. Through the additional arrangement of the air bag and the extrusion part, the clamping device not only clamps the outer wall of the workpiece through the clamping part, but also clings to the inner wall of the through hole through the lower part of the air bag extruded and bulged by the extrusion part, so that the contact area between the clamping device and the inner wall and the outer wall of the workpiece when the clamping device clamps the workpiece is greatly increased; and when the workpiece is heavy or needs to be transferred for a long distance, high-stability clamping and carrying of the workpiece can be achieved.
Owner:FUJIAN HOWARD SPINNING TECH CO LTD +1

Preparation method of silicon nitride waveguide

The invention provides a preparation method of a silicon nitride waveguide, and relates to the technical field of semiconductors. The preparation method comprises the following steps: depositing a silicon oxide layer on the surface of a substrate; depositing a monocrystalline silicon layer with a preset thickness on the surface of the silicon oxide layer, wherein the preset thickness is any value in the range; photoresist coating, developing treatment and etching treatment are sequentially carried out on the monocrystalline silicon layer, so that the monocrystalline silicon layer with a preset horizontal distance is reserved on the surface of the silicon oxide layer from the edge to the center, and the preset horizontal distance is any one value ranging from 4 micrometers to 6 micrometers; and depositing a silicon nitride layer on the surfaces of the monocrystalline silicon layer and the silicon oxide layer, and sequentially carrying out developing treatment and etching treatment to prepare the silicon nitride waveguide. The stress matching degree between the silicon nitride layer and the silicon oxide layer in the silicon nitride waveguide is improved, the risk of stripping of the silicon nitride layer is reduced, and the product yield is improved.
Owner:SHANGHAI IND U TECH RES INST