Photosensitive resin composition, method for manufacturing black matrix, and display panel

Abstract

The application discloses a photosensitive resin composition, a manufacturing method of a black matrix, and a display panel. The photosensitive resin composition is used for forming a black matrix and comprises at least a light-shielding material, a photoinitiator and a polymer. The light-shielding material comprises microcapsules wrapped with metal nanomaterials. The photosensitive resin composition has low reflectivity, high optical density, good light absorption performance, and good insulation performance and stability. The black matrix prepared by using the photosensitive resin composition has low film thickness, good light-shielding property, low reflectivity, good anti-static performance and stability.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of display, in particular to a photosensitive resin composition, a black matrix manufacturing method and a display panel. BACKGROUND

[0002] Generally, a liquid crystal display contains a color film, and one of the main functions of the black matrix (BM) is to separate the R, G and B of the predetermined structure in the color film, prevent color bleeding and improve contrast. The early BM material uses metal chromium (Cr), which can have excellent optical density (OD) and linearity at a low thickness (0.1 um), but is gradually replaced by a photosensitive resin composition due to its high reflectivity and environmental unfriendly characteristics.

[0003] The component that plays a role in light shielding in the photosensitive resin composition as the BM material is a black pigment, and a carbon black material with low reflectivity is usually used, but the transmittance of the BM using the carbon black material as the black pigment is difficult to further improve without increasing the film thickness, and it is difficult to achieve the expected light shielding effect; if the film thickness of the BM is increased, the step difference above the edge of the BM will increase, causing problems such as poor surface flatness of the color film. SUMMARY

[0004] The present application provides a photosensitive resin composition, a black matrix manufacturing method and a display panel, and the prepared black matrix has low film thickness, good light shielding property, low reflectivity, good anti-static performance and good stability.

[0005] The present application provides a photosensitive resin composition for forming a black matrix, characterized in that it comprises at least a light shielding material, a photoinitiator and a polymer.

[0006] The light shielding material comprises microcapsules wrapped with metal nanomaterials.

[0007] Optionally, the metal nanomaterials comprise nano-copper; and the material of the microcapsules comprises an organic polymer.

[0008] Optionally, the particle size of the microcapsules is less than 5 microns.

[0009] Optionally, the microcapsules release the metal nanomaterials at a preset temperature range; and the preset temperature range is greater than 200°C.

[0010] The present application also provides a black matrix manufacturing method, comprising the following steps:

[0011] forming a photosensitive resin composition; wherein the photosensitive resin composition is the photosensitive resin composition described above.

[0012] providing a substrate and coating the photosensitive resin composition on the substrate to form a light shielding film; and

[0013] performing a patterning process on the light shielding film to form the black matrix.

[0014] Optionally, the forming photosensitive resin composition comprises the following steps:

[0015] The metal nanomaterial is wrapped in the microcapsule by air suspension, spray drying and original polymerization reaction in sequence to form the light shielding material;

[0016] The light shielding material is mixed with the photoinitiator and the polymer to form the photosensitive resin composition.

[0017] Optionally, the performing a patterning process on the light shielding film to form the black matrix comprises the following steps:

[0018] The light shielding film is sequentially subjected to vacuum drying, pre-baking, exposure, development and baking processes to form the black matrix.

[0019] The application also provides a display panel comprising a first substrate and a second substrate arranged oppositely; the first substrate is provided with a black matrix; and the material of the black matrix comprises the photosensitive resin composition described above.

[0020] Optionally, the display panel further comprises a liquid crystal layer arranged between the first substrate and the second substrate; and the first substrate is a color filter substrate and the second substrate is an array substrate.

[0021] Optionally, the display panel further comprises a liquid crystal layer arranged between the first substrate and the second substrate; and the first substrate is an array substrate and the second substrate is a counter substrate.

[0022] The photosensitive resin composition, the manufacturing method of the black matrix and the display panel provided by the application are composed of the light shielding material wrapped with the metal nanomaterial, which has low reflectivity, high optical density, good light absorption performance, good insulation performance and stability, so that the black matrix prepared has good light shielding property, low reflectivity, good anti-static performance and good stability while having a small film thickness; in addition, the light shielding material of the application has good dispersibility and is easy to be stored and transported, and will not deteriorate with the change of process parameters. BRIEF DESCRIPTION OF DRAWINGS

[0023] The technical solutions and other beneficial effects of the application will become apparent from the following detailed description of the specific embodiments of the application, taken in conjunction with the accompanying drawings.

[0024] Figure 1 A flowchart of a manufacturing method of a black matrix provided by an embodiment of the present application.

[0025] Figure 2 A structural diagram of a manufacturing method of a black matrix provided by an embodiment of the present application.

[0026] Figure 3 A structural diagram of a display panel provided by an embodiment of the present application. DETAILED DESCRIPTION

[0027] The technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the drawings in the embodiments of the present application. Obviously, the described embodiments are only a part of the embodiments of the present application, rather than all the embodiments of the present application. Based on the embodiments in the present application, all other embodiments obtained by a person of ordinary skill in the art without creative work fall within the scope of protection of the present application.

[0028] In the description of the present application, it should be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "upper", "lower", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", "counterclockwise" and the like indicate the orientation or positional relationship based on the orientation or positional relationship shown in the drawings, and are only for the purpose of facilitating the description of the present application and simplifying the description, and do not indicate or imply that the device or element referred to must have a particular orientation, be constructed and operated in a particular orientation, and therefore cannot be understood as a limitation on the present application. In addition, the terms "first", "second" are only for the purpose of description, and cannot be understood as indicating or implying relative importance or implicitly indicating the number of the technical features indicated. Therefore, the features limited by "first", "second" can explicitly or implicitly include one or more of the features. In the description of the present application, the meaning of "multiple" is two or more, unless otherwise explicitly specified and limited.

[0029] In the present application, unless otherwise explicitly specified and limited, "on" or "under" of a first feature to a second feature can include that the first and second features are in direct contact, or that the first and second features are not in direct contact but are in contact through another feature between them. Moreover, "on", "above" and "above" of the first feature to the second feature include that the first feature is directly above and obliquely above the second feature, or only indicates that the horizontal height of the first feature is higher than that of the second feature. "Below", "under" and "under" of the first feature to the second feature include that the first feature is directly below and obliquely below the second feature, or only indicates that the horizontal height of the first feature is less than that of the second feature.

[0030] The following disclosure provides many different embodiments, or examples, for implementing different structures of the present application. For the purpose of simplifying the present application, components and settings of specific examples are described below. Of course, they are only examples, and the purpose is not to limit the present application. In addition, the present application can repeatedly refer to numbers and / or letters in different examples, and such repetition is for the purpose of simplification and clarity, which does not indicate the relationship between the various embodiments and / or settings discussed. In addition, the present application provides examples of various specific processes and materials, but those skilled in the art can realize the application of other processes and / or the use of other materials.

[0031] The embodiment of the present application provides a photosensitive resin composition for forming a black matrix (BM). Specifically, the photosensitive resin composition at least includes a light shielding material, a photoinitiator and a polymer; wherein the light shielding material includes a microcapsule wrapped with a metal nanomaterial. Of course, the photosensitive resin composition can also include other additives, which are not limited here.

[0032] Specifically, the particle size range of the microcapsule is less than 5 microns; when the particle size of the microcapsule is less than 5 microns, it is not easy to aggregate due to the intensification of Brownian motion, so the microcapsule in the present application can replace the conventional dispersant, playing the role of dispersant. It can be understood that the photosensitive resin composition in the embodiment of the present application does not need to add additional dispersant.

[0033] It can be understood that the focus of the present application is to improve the light shielding material, and the photoinitiator and the polymer are not changed, and the photoinitiator and the polymer can use conventional materials, which are not specifically described here.

[0034] Specifically, the material of the microcapsule includes an organic polymer, and the microcapsule is composed of an organic polymer film. The material of the microcapsule is not limited and can be adjusted according to the production situation.

[0035] It should be noted that the metal nanomaterial in the light shielding material plays a role in shielding light. In a specific embodiment, the metal nanomaterial includes nano-copper; nano-copper has excellent light absorption performance and insulation performance compared with carbon black and copper, that is, nano-copper has low reflectivity, high optical density, and excellent insulation performance, which provides a prerequisite for subsequent ultra-thin anti-static black matrix manufacturing.

[0036] Specifically, the microcapsule will release the metal nanomaterial (such as nano-copper) only at a predetermined temperature range. In a specific embodiment, the predetermined temperature range is greater than 200°C and less than 300°C; in another specific embodiment, the predetermined temperature range is greater than or equal to 300°C. It can be understood that the light shielding material of the present application is resistant to high temperature, that is, it has strong stability.

[0037] In the embodiment of the present application, the light shielding material in the photosensitive resin composition is a microcapsule wrapped with metal nanomaterial (for example, nanocopper); on the one hand, the microcapsule has small particle size and is not easy to aggregate, and the microcapsule releases metal nanomaterial (for example, nanocopper) only at ultrahigh temperature, so that the photosensitive resin composition has strong dispersibility and stability, is easy to store and transport, and will not deteriorate with the change of process parameters; on the other hand, the metal nanomaterial (for example, nanocopper) has excellent properties such as low reflectivity, high optical density, and insulation, which is beneficial to the production of ultra-thin anti-static black matrix; therefore, the photosensitive resin composition in the embodiment of the present application has wide application prospect.

[0038] As shown in Figure 1 and Figure 2 The embodiment of the present application provides a method for manufacturing a black matrix, and the manufacturing method comprises steps S101-S103.

[0039] Step S101: forming a photosensitive resin composition comprising at least a light shielding material, a photoinitiator and a polymer; wherein the light shielding material comprises a microcapsule wrapped with metal nanomaterial.

[0040] Specifically, the photosensitive resin composition in the embodiment of the present application is the photosensitive resin composition in the foregoing embodiment, and for details, reference can be made to the foregoing embodiment, which will not be described here.

[0041] Specifically, step S201 comprises the following steps:

[0042] The metal nanomaterial is wrapped in the microcapsule by air suspension, spray drying and original polymerization reaction in sequence to form the light shielding material; and

[0043] The light shielding material is mixed with the photoinitiator and the polymer to form the photosensitive resin composition.

[0044] Step S102: providing a substrate and coating the photosensitive resin composition on the substrate to form a light shielding film.

[0045] Specifically, the substrate is usually a glass substrate, and the photosensitive resin composition prepared in step S101 can be coated on the glass substrate by means of blade coating.

[0046] For the convenience of description, the light shielding material in the embodiment of the present application is taken as an example of a microcapsule wrapped with nanocopper; as shown in Figure 2 The substrate 1 is coated with the photosensitive resin composition to form a light shielding film 2, and each microcapsule 3 in the light shielding film is wrapped with nanocopper 4.

[0047] Since the nano-copper 4 has good optical density, compared with the black pigment carbon black, if the same optical density black matrix is formed, the use amount of the photosensitive resin composition in the present application is only 40% to 70% of the prior art; therefore, the photosensitive resin composition of the present application is used to make the black matrix, which can save materials and make the black matrix with high optical density and low film thickness. It can be understood that the black matrix prepared by the present application has good light shielding performance and small film thickness, which does not affect the flatness of the color film.

[0048] Step S103: patterning the light shielding film to form a black matrix.

[0049] Specifically, step S103 includes the following steps:

[0050] The light shielding film is sequentially subjected to vacuum drying (VCD), pre-baking (HP), exposure, development, and baking (Oven) treatment to form a black matrix.

[0051] As shown in Figure 2 , the light shielding film 2 is subjected to patterning treatment to form a black matrix 10.

[0052] Since the microcapsules in the present application have good dispersion performance and maintain stability at high temperature, the number of small black dots of photosensitive resin in the black matrix formed in the present application is only about 10% of the prior art. It can be understood that the light shielding material in the present application is not prone to aggregation.

[0053] Specifically, the black matrix prepared in the present application can be applied in the color film of the display panel, used for spacing the red color resistance, green color resistance and blue color resistance (of course, not limited to the listed color resistance), and plays a role of light shielding and improving contrast.

[0054] In the present application, the prepared black matrix 10 has low film thickness, good light shielding property, low reflectivity, good anti-static property, and good stability.

[0055] As shown in Figure 3 , the present application also provides a display panel 20, which comprises a first substrate 5 and a second substrate 6 arranged oppositely; wherein the first substrate 5 is provided with the black matrix described in the foregoing embodiments; the material of the black matrix comprises the photosensitive resin composition in the foregoing embodiments, which is not repeated here.

[0056] Specifically, the method for making the black matrix comprises the method for making the black matrix in the foregoing embodiments.

[0057] In one embodiment, the display panel 20 further comprises a liquid crystal layer 7 between the first substrate 5 and the second substrate 6; wherein the first substrate 5 is a color film substrate, and the second substrate 6 is an array substrate; in another embodiment, the first substrate 5 is an array substrate, and the second substrate 6 is a counter substrate. It can be understood that when the first substrate 5 is an array substrate, the display panel is a COA type display panel, i.e. the color film is formed on the array substrate.

[0058] Of course, in other embodiments, the display panel 20 can also be other types of display panels with black matrixes, not limited to the several types listed in the embodiments of the present application.

[0059] In the embodiments of the present application, the black matrix in the display panel 20 has low film thickness, good light shielding property, low reflectivity, good anti-static property, and good stability, which is conducive to the flatness of the color film.

[0060] In the above embodiments, the description of each embodiment has its own focus, and the parts not described in detail in a certain embodiment can be referred to the related description of other embodiments.

[0061] The above describes in detail the photosensitive resin composition, the manufacturing method of the black matrix, and the display panel provided in the embodiments of the present application. The principles and implementation manners of the present application are described by applying specific examples in this paper, and the above description of the embodiments is only used to help understand the technical solutions and core ideas of the present application; those skilled in the art should understand that they can still modify the technical solutions recorded in the above embodiments, or make equivalent replacement for part of the technical features; and these modifications or replacements do not make the essence of the corresponding technical solutions deviate from the scope of the technical solutions of the embodiments of the present application.

Claims

1. A photosensitive resin composition for forming a black matrix, characterized in that, At least comprising shading material, photo initiator and polymer; The shading material comprises microcapsules coated with metal nanomaterial, the particle size of the microcapsules is less than 5 microns, the microcapsules release the metal nanomaterial at a preset temperature range, the preset temperature range is greater than 200 DEG C; the metal nanomaterial comprises nano-copper; the material of the microcapsules comprises organic polymer.

2. A method for manufacturing a black matrix, characterized by, Comprising the following steps: Forming a photosensitive resin composition; wherein the photosensitive resin composition is the photosensitive resin composition of claim 1; Providing a substrate and coating the photosensitive resin composition on the substrate to form a shading film; and Patterning the shading film to form the black matrix.

3. The method for producing a black matrix according to claim 2, wherein The forming photosensitive resin composition comprises the following steps: The metal nanomaterial is coated in the microcapsules by air suspension, spray drying and original flavor polymerization reaction in sequence to form the shading material; The shading material is mixed with the photo initiator and the polymer to form the photosensitive resin composition.

4. The method for producing a black matrix according to claim 2, wherein The patterning the shading film to form the black matrix comprises the following steps: The shading film is sequentially subjected to vacuum drying, pre-baking, exposure, development and baking to form the black matrix.

5. A display panel, characterized by, Comprising oppositely arranged first substrate and second substrate; the first substrate is provided with a black matrix; the material of the black matrix comprises the photosensitive resin composition of claim 1.

6. The display panel of claim 5, wherein, The display panel further comprises a liquid crystal layer arranged between the first substrate and the second substrate; and the first substrate is a color filter substrate, and the second substrate is an array substrate.

7. The display panel of claim 5, wherein, The display panel further comprises a liquid crystal layer arranged between the first substrate and the second substrate; and the first substrate is an array substrate, and the second substrate is an opposed substrate.

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