Display panel, manufacturing method thereof and display device

Abstract

Embodiments of the present application disclose a display panel, a manufacturing method thereof and a display device. The display panel comprises: an array substrate, the array substrate comprising at least two dams arranged in a non-display area; an insulating layer arranged on the array substrate; and a plurality of touch wires arranged on a side of the insulating layer away from the array substrate. A plurality of grooves are arranged on the insulating layer between the two adjacent dams, and the touch wires in the region between the two adjacent dams are arranged in the corresponding grooves. In this way, in the touch wire patterning process, the photoresist between the two adjacent touch wires in the region between the two adjacent dams can flow into the grooves, so that the thickness of the photoresist between the two adjacent touch wires is small, that is, the effect of effectively reducing the thickness of the photoresist between the two adjacent touch wires is achieved, thereby reducing the energy required for exposure in the touch wire patterning process, shortening the time of the photo-lithography process, and effectively improving the manufacturing capacity of the touch display panel.

Description

Technical Field

[0001] This invention relates to the field of display technology, and more particularly to a display panel, a method for manufacturing the same, and a display device. Background Technology

[0002] With the rapid development of technology, touch display panels with integrated touch devices are widely used as an information input tool in various display products such as mobile phones, tablets, and laptops. Users can operate the electronic device simply by touching the icons on the touch display panel, eliminating the need for other input devices such as keyboards and mice, making human-computer interaction much simpler. Currently, technicians are using a method of directly fabricating the touch device onto the display panel. While this method ensures lower process complexity and manufacturing costs, the production capacity of touch display panels still needs further improvement. Summary of the Invention

[0003] This invention provides a display panel, a method for manufacturing the same, and a display device, which effectively increases the production capacity of touch display panels while ensuring low process complexity and manufacturing cost.

[0004] In a first aspect, embodiments of the present invention provide a display panel having a display area and a non-display area, the display panel comprising: an array substrate, the array substrate including at least two dams disposed in the non-display area; an insulating layer located on the array substrate, the insulating layer covering the at least two dams; a plurality of touch traces located on the side of the insulating layer away from the array substrate; a plurality of grooves disposed on the insulating layer between two adjacent dams, the touch traces located in the region between two adjacent dams being located in the corresponding grooves.

[0005] Optionally, at least a portion of the edge of the groove is zigzag.

[0006] Optionally, the cross-section of the groove is curved; wherein the extension direction of the cross-section is perpendicular to the extension direction of the touch trace.

[0007] Optionally, the insulating layer includes a first inorganic insulating layer and a second inorganic insulating layer;

[0008] The first inorganic insulating layer is located between the array substrate and the second inorganic insulating layer; the groove penetrates the second inorganic insulating layer, or the groove penetrates both the first inorganic insulating layer and the second inorganic insulating layer;

[0009] Preferably, the thickness of both the first inorganic insulating layer and the second inorganic insulating layer is 0.3 μm;

[0010] Preferably, both the first inorganic insulating layer and the second inorganic insulating layer are made of silicon nitride.

[0011] Optionally, it further includes an encapsulation layer; the encapsulation layer is located between the insulating layer and the array substrate; the groove extends through the encapsulation layer but does not penetrate the encapsulation layer;

[0012] Preferably, the thickness of the encapsulation layer is 1 μm.

[0013] Optionally, the depth of the groove is greater than or equal to the thickness of the touch trace;

[0014] Preferably, the width of the groove is the same as the width of the touch trace;

[0015] Preferably, between two adjacent dams, the grooves correspond one-to-one with the touch wiring;

[0016] Preferably, the touch wiring spans across the at least two embankments.

[0017] Secondly, embodiments of the present invention also provide a display device, the display device including the display panel described in the first aspect above; the display device further includes a touch circuit, the touch traces passing sequentially from the display area through the at least two dams and being electrically connected to the touch circuit.

[0018] Thirdly, embodiments of the present invention also provide a method for manufacturing a display panel, the method comprising: providing an array substrate having a display area and a non-display area, the array substrate including at least two dams disposed in the non-display area; forming an insulating layer on the array substrate, the insulating layer covering the at least two dams; forming a plurality of grooves on the insulating layer between two adjacent dams; and forming a plurality of touch traces on the side of the insulating layer away from the array substrate, wherein the touch traces located in the region between two adjacent dams are located in the corresponding grooves.

[0019] Optionally, forming a plurality of grooves on the insulating layer between two adjacent dams includes: forming a first photoresist layer on the insulating layer between two adjacent dams, and sequentially exposing and developing the first photoresist layer to form a first photoresist pattern; etching the insulating layer according to the first photoresist pattern to form a plurality of grooves on the insulating layer.

[0020] Preferably, the area corresponding to the groove in the first photoresist pattern retains a photoresist of a predetermined thickness;

[0021] Preferably, forming multiple touch traces on the side of the insulating layer away from the array substrate includes: forming a metal layer that at least covers the insulating layer between two adjacent dams and the grooves on the insulating layer; forming a second photoresist layer on the metal layer between two adjacent dams, and sequentially exposing and developing the second photoresist layer to form a second photoresist pattern; etching the metal layer according to the second photoresist pattern to remove the metal layer between adjacent grooves, thereby forming the touch traces located within the grooves.

[0022] Optionally, before forming an insulating layer on the array substrate, the method further includes: forming an encapsulation layer on the array substrate, and forming a plurality of initial grooves on the encapsulation layer between two adjacent dams; forming a plurality of grooves on the insulating layer between two adjacent dams includes: the initial grooves are covered by the insulating layer to form the grooves.

[0023] The technical solution of this invention provides a display panel with a display area and a non-display area. The display panel includes an array substrate, an insulating layer, and multiple touch traces. The array substrate includes at least two dams disposed in the non-display area. The insulating layer is located on the array substrate and covers the at least two dams. The touch traces are located on the side of the insulating layer away from the array substrate. By providing the insulating layer between two adjacent dams with multiple grooves, and the touch traces located in the area between two adjacent dams are located in the corresponding grooves, the photoresist between two adjacent touch traces can flow into the grooves in the area between two adjacent dams during the touch trace patterning process. This results in a smaller thickness of the photoresist between two adjacent touch traces, effectively reducing the thickness of the photoresist between two adjacent touch traces. This, in turn, reduces the exposure energy required in the touch trace patterning process, shortens the photolithography process time, and effectively improves the production capacity of the touch display panel. Furthermore, the technical solution of this invention does not add excessive process steps or manufacturing costs, allowing the manufacturing of the touch display panel to maintain a relatively low level of process complexity and manufacturing cost. Furthermore, the embodiments of the present invention effectively reduce the thickness of photoresist between two adjacent touch lines in the area between two adjacent dams. It also helps to avoid residual photoresist between two adjacent touch lines during the touch line patterning process, thereby ensuring that the metal between two adjacent touch lines is completely etched and there is basically no metal residue between two adjacent touch lines, resulting in good performance of the touch lines. Attached Figure Description

[0024] Figure 1 This is a partial top view of a display panel structure in related technologies;

[0025] Figure 2 yes Figure 1A cross-sectional view of the display panel along section line CC'.

[0026] Figure 3 This is a partial top view of a display panel provided in an embodiment of the present invention;

[0027] Figure 4 yes Figure 3 The diagram shows a cross-sectional structure of the display panel along section line CC'.

[0028] Figure 5 This is a partial top view of another display panel provided in an embodiment of the present invention;

[0029] Figure 6 This is a schematic diagram of the cross-sectional structure of another display panel provided in an embodiment of the present invention, with the cross-section taken along the cross-section line DD'.

[0030] Figure 7 This is a schematic diagram of the cross-sectional structure of another display panel provided in an embodiment of the present invention, with the cross-section taken along the cross-section line CC'.

[0031] Figure 8 This is a schematic diagram of the cross-sectional structure of another display panel provided in an embodiment of the present invention, with the cross-section taken along the cross-section line CC'.

[0032] Figure 9 This is a schematic diagram of the cross-sectional structure of another display panel provided in an embodiment of the present invention, with the cross-section taken along the cross-section line CC'.

[0033] Figure 10 This is a flowchart illustrating a method for manufacturing a display panel according to an embodiment of the present invention;

[0034] Figure 11 This is a schematic diagram of a structure involved in the manufacturing method of the display panel provided in the embodiment of the present invention;

[0035] Figure 12 This is another structural schematic diagram involved in the manufacturing method of the display panel provided in the embodiment of the present invention;

[0036] Figure 13 This is another structural schematic diagram involved in the manufacturing method of the display panel provided in the embodiment of the present invention;

[0037] Figure 14 This is another structural schematic diagram involved in the manufacturing method of the display panel provided in the embodiment of the present invention;

[0038] Figure 15 This is another structural schematic diagram involved in the manufacturing method of the display panel provided in the embodiment of the present invention;

[0039] Figure 16 This is another structural schematic diagram involved in the manufacturing method of the display panel provided in the embodiment of the present invention;

[0040] Figure 17 This is another structural schematic diagram involved in the manufacturing method of the display panel provided in the embodiment of the present invention;

[0041] Figure 18 This is another structural schematic diagram involved in the manufacturing method of the display panel provided in the embodiment of the present invention;

[0042] Figure 19 This is another structural schematic diagram involved in the manufacturing method of the display panel provided in the embodiment of the present invention. Detailed Implementation

[0043] The present invention will now be described in further detail with reference to the accompanying drawings and embodiments. It is understood that the specific embodiments described herein are merely illustrative of the invention and not intended to limit it. Furthermore, it should be noted that, for ease of description, the accompanying drawings show only the parts relevant to the invention and not all structures. As mentioned in the background section, the current production capacity of touch display panels still needs further improvement. The inventors have found that the main reasons for the low production capacity of touch display panels are as follows: Organic Light-Emitting Diode (OLED) display panels have the characteristics of self-emissive display, no need for backlighting, fast response speed, low power consumption, and flexible display, making them one of the most promising flat panel display devices. Figure 1 This is a partial top view schematic diagram of a display panel in related technologies. Figure 2 yes Figure 1 A cross-sectional view of the display panel taken along section line CC'. (Combined with...) Figure 1 and Figure 2 A typical OLED touch display panel includes an array substrate 100, light-emitting devices 110 disposed on the array substrate 100, an encapsulation layer 120, a touch layer, and touch traces 150. The light-emitting device 110 is located in the display area AA of the display panel and may include an anode, a cathode, and an organic light-emitting layer disposed between the anode and cathode. The organic light-emitting layer is susceptible to corrosion from moisture and oxygen, which can cause it to fail or degrade in performance. Therefore, an encapsulation layer 120 is needed to encapsulate the light-emitting device 110, isolating it from the external environment to prevent moisture and oxygen from entering.

[0044] The general encapsulation layer 120 may be formed by stacking at least one organic encapsulation layer and at least one inorganic encapsulation layer. Figure 2The illustration shows that the encapsulation layer 120 includes an organic encapsulation layer 122 and two inorganic encapsulation layers 121 (i.e., 121_1 and 121_2), with the organic encapsulation layer 122 disposed between the two inorganic encapsulation layers 121. Typically, the organic encapsulation layer 122 is fluid; to prevent the organic encapsulation layer 122 from overflowing into unwanted areas and causing encapsulation failure, a dam 130 is required to block the overflow of the organic encapsulation layer 122. Figure 2 The illustration shows that two dams 130 (i.e., 130_1 and 130_2) are provided in the non-display area NAA of the display panel, and both dams 130 are arranged around the display area AA of the display panel. The two dams 130 can play a certain role in blocking the overflow of the organic encapsulation layer 122 in the encapsulation layer 120.

[0045] The touch layer is located in the display area AA of the display panel, and is generally located after the encapsulation layer 120. The touch layer may include touch electrode blocks, which are electrically connected to external circuits via touch traces 150. That is, touch traces 150 connect to external circuits from the display area AA through the non-display area NAA, and during the process of touch traces 150 passing through the non-display area NAA, touch traces 150 will sequentially pass through each of the barriers 130 in the non-display area NAA.

[0046] Thus, because the two adjacent dams 130 covered by the inorganic encapsulation layer 121 form a recessed structure 130', during the patterning process of the touch trace 150, the photoresist on top of the dam 130 flows into the recessed structure 130', resulting in a thicker photoresist layer within the recessed structure 130'. In this situation, to ensure the touch trace 150 meets the required structural dimensions, the photomask design linewidth needs to be widened, and higher energy or longer exposure times are required to achieve a stronger exposure, ensuring sufficient and thorough exposure of the thicker photoresist within the recessed structure 130' and avoiding metal residue. However, using higher exposure energy leads to a significant increase in exposure time, severely impacting production capacity.

[0047] In view of this, embodiments of the present invention provide a display panel and a method for manufacturing the same, as well as a display device, to reduce the energy required for exposure in the touch trace patterning process and shorten the photolithography process time while ensuring low process complexity and manufacturing cost, thereby effectively improving the production capacity of touch display panels. Figure 3 This is a partial top view of a display panel according to an embodiment of the present invention. Figure 4 yes Figure 3 The diagram shows a cross-sectional view of the display panel along section line CC', where section line CC' is along the x-direction of a Cartesian coordinate system and section line DD' is along the y-direction. (Combined with...) Figure 3 and Figure 4 The display panel has a display area AA and a non-display area NAA. The display panel includes: an array substrate 100, which includes at least two dams 130 disposed in the non-display area NAA; an insulating layer 140 located on the array substrate 100 and covering the at least two dams; multiple touch traces 150 located on the side of the insulating layer 140 away from the array substrate 100; and multiple grooves 160 disposed on the insulating layer 140 between two adjacent dams 130, with the touch traces 150 located in the area between two adjacent dams 130 located in the corresponding grooves 160.

[0048] Specifically, the array substrate 100 may include a substrate and a driving circuit layer located on the substrate. The substrate may be a flexible or non-flexible substrate. The driving circuit layer may include a thin-film transistor (TFT) array, and the driving circuit layer is used to drive the light-emitting device 110 located in the display area AA of the display panel to emit light. The light-emitting device 110 is, for example, an OLED device or an LED device. A dam 130 is disposed around the display area AA, and the dam 130 is used to prevent the overflow of organic material in the encapsulation layer 120 that encapsulates the light-emitting device 110, ensuring that the encapsulation layer 120 effectively encapsulates the light-emitting device 110. The number of dams 130 may be two, three or more, and this embodiment does not specifically limit this. Figure 4 The example illustrates two dams 130, namely the first dam 130_1 and the second dam 130_2. Compared with the second dam 130_2, the first dam 130_1 is set closer to the display area AA.

[0049] In this embodiment, the display panel further includes a touch layer (not shown in the figure). The touch layer is located in the display area AA of the display panel. The touch layer can be disposed after the encapsulation layer 120, and the touch layer may include one or more touch electrode blocks. The insulating layer 140 may be located between the touch electrode blocks and the encapsulation layer 120. On the one hand, it can play a secondary encapsulation role, enhancing the encapsulation effect of the encapsulation layer 120. On the other hand, it can isolate the touch electrode blocks of each layer. The insulating layer 140 may be formed by stacking one or more inorganic thin films. This embodiment does not specifically limit this.

[0050] The touch trace 150 can be located on the side of the insulating layer 140 away from the array substrate 100. The touch trace 150 electrically connects the touch electrode block to the external circuit. That is, the touch trace 150 extends from the display area AA of the display panel, passes through the non-display area NAA to electrically connect to the external circuit, and sequentially passes through each of the dams 130 in the non-display area NAA, meaning the touch trace 150 crosses the dams 130 and intersects with the dams 130. Figure 3 and Figure 4The touch trace 150 extends along the x-direction, extends from the display area AA, and passes through the first dam 130_1 and the second dam 130_2 in sequence. The touch trace 150 intersects with both the first dam 130_1 and the second dam 130_2.

[0051] Based on the above, in this embodiment of the invention, a recessed structure 130' is formed between two adjacent dams 130, and a plurality of grooves 160 are provided on the insulating layer 140 between two adjacent dams 130. The touch wiring 150 located in the area between two adjacent dams 130 is located in the corresponding groove 160. This configuration allows the photoresist on the metal layer (a metal film layer used to fabricate the touch trace 150) and the photoresist layer to flow into the recessed structure 130' after the metal layer (the metal layer being a metal film layer used to fabricate the touch trace 150) and photoresist layer are sequentially formed on the insulating layer 140 during the patterning process of the touch trace 150. However, because the insulating layer 140 between two adjacent dams 130 has a groove 160, i.e., the insulating layer 140 within the recessed structure 130' has a groove 160, the photoresist on the metal layer between two adjacent touch traces 150 can flow onto the metal layer within the groove 160 (the metal layer within the groove 160 is retained to form the touch trace 150 in subsequent processes). This results in a smaller thickness of the photoresist on the metal layer between two adjacent touch traces 150, and consequently, a lower exposure energy is required for the photoresist on the metal layer between two adjacent touch traces 150. According to the embodiments of the present invention, the exposure energy required in the patterning process of touch trace 150 is reduced, the photolithography process time is shortened, thereby effectively improving the production capacity of touch display panels.

[0052] In this embodiment of the invention, by providing a groove 160 on the insulating layer 140 within the recessed structure 130', the photoresist on the metal layer between two adjacent touch traces 150 can flow onto the metal layer within the groove 160 in the area between two adjacent dams 130. This achieves the effect of thinning and reducing the thickness of the photoresist on the metal layer between two adjacent touch traces 150, thereby reducing the exposure energy required for the photoresist on the metal layer between two adjacent touch traces 150. This effectively reduces the exposure energy required in the patterning process of the touch traces 150, shortens the photolithography process time, and effectively improves the production capacity of the touch display panel.

[0053] Furthermore, the technical solution of this embodiment only requires setting the groove 160, without adding new film layer structures or components to the display panel. This minimizes additional process steps and manufacturing costs, maintaining a low level of process complexity and manufacturing cost for the touch display panel. In addition, the technical solution of this embodiment reduces the photoresist thickness on the metal layer between adjacent touch lines 150 by allowing the photoresist to flow from the metal layer between two adjacent touch lines 150 to the metal layer within the groove 160. This also facilitates sufficient and thorough exposure of the photoresist on the metal layer between adjacent touch lines 150 during the patterning process, ensuring that the metal layer between adjacent touch lines 150 is essentially completely etched, leaving no metal residue between them. This avoids the risk of short circuits or open circuits in the touch lines 150, ensuring good performance of the touch lines 150.

[0054] In the above embodiments, the number of grooves 160 on the insulating layer 140 between two adjacent dams 130 can be the same as or different from the number of touch traces 150 in the area between two adjacent dams 130. Optionally, combined with Figure 3 and Figure 4 The number of grooves 160 on the insulating layer 140 between two adjacent dams 130 is the same as the number of touch traces 150 in the area between the two adjacent dams 130. Each groove 160 corresponds to a touch trace 150, with the touch trace 150 located within its corresponding groove 160. This significantly reduces the energy required for exposure during the patterning process of the touch traces 150, thereby maximizing the production capacity of the touch display panel. Furthermore, based on the above embodiments, to further reduce the thickness of the photoresist on the metal layer between two adjacent touch traces 150 and further improve the production capacity of the touch display panel, this invention further studies the specific shape and structure of the grooves 160. Several examples are described below, but these are not intended to limit the invention.

[0055] Figure 5 This is a partial top view structural diagram of another display panel provided in an embodiment of the present invention. (Reference) Figure 5In one embodiment of the present invention, optionally, at least a portion of the edge of the groove 160 is zigzag-shaped, which may be the extension direction y of the touch trace 150. Setting the edge of the groove 160 to be zigzag-shaped increases the length of the groove 160, thereby increasing its volume. The groove 160 can accommodate more photoresist, allowing more photoresist on the metal layer between adjacent touch traces 150 to flow onto the metal layer within the groove 160. This further thins and reduces the photoresist thickness on the metal layer between adjacent touch traces 150, further reducing the exposure energy required in the patterning process of the touch traces 150, further shortening the photolithography process time, and further improving the production capacity of the touch display panel. Furthermore, in this embodiment, the shape of the touch trace 150 in the area between two adjacent dams 130 is substantially the same as the shape of the corresponding groove 160.

[0056] Figure 6 This is a schematic cross-sectional view of another display panel provided in an embodiment of the present invention, taken along section line DD'. (See reference) Figure 6 In another embodiment of the invention, optionally, the cross-section of the groove 160 is curved, which can be along the direction y of the display AA around the dam 130. The cross-section of the groove 160 is curved, that is, the extension direction y of the cross-section is perpendicular to the extension direction x of the touch trace 150. Setting the cross-section of the groove 160 to be curved facilitates the formation of undulating, curved valleys and tops 161 along the direction y on the insulating layer 140 between two adjacent dams 130. The groove 160 forms the valleys, and the insulating layer 140 between two adjacent touch traces 150 forms the tops 161. (Comparison) Figure 6 and Figure 3 The presence of the curved top 161 makes it easier for the photoresist on the metal layer between two adjacent touch traces 150 to flow onto the metal layer in the groove 160, thereby further thinning and reducing the thickness of the photoresist on the metal layer between two adjacent touch traces 150, which in turn further reduces the exposure energy required in the patterning process of the touch traces 150, further shortens the photolithography process time, and further improves the production capacity of the touch display panel.

[0057] In the above embodiments, the insulating layer 140 may be formed by stacking one or more inorganic thin films. To ensure a better encapsulation effect of the enhanced encapsulation layer 120 and to better isolate the touch electrode blocks, refer to... Figure 7 , Figure 7This is a cross-sectional structural diagram of another display panel provided by an embodiment of the present invention, with the cross-section taken along the cross-section line CC'. In one embodiment of the present invention, optionally, the insulating layer 140 includes a first inorganic insulating layer 140_1 and a second inorganic insulating layer 140_2; the first inorganic insulating layer 140_1 is located between the array substrate 100 and the second inorganic insulating layer 140_2.

[0058] The first inorganic insulating layer 140_1 is located above and at the edge of the encapsulation layer 120, thereby enhancing the encapsulation effect of the encapsulation layer 120 on the light-emitting device 110. The second inorganic insulating layer 140_2 can be located between two adjacent touch electrode blocks to isolate them. Optionally, the thickness of both the first inorganic insulating layer 140_1 and the second inorganic insulating layer 140_2 is 0.2μm to 0.4μm, preferably 0.3μm. Optionally, both the first inorganic insulating layer 140_1 and the second inorganic insulating layer 140_2 are made of silicon nitride.

[0059] Along the direction z perpendicular to the array substrate 100, the deeper the groove 160, the larger its volume, and the more photoresist it can hold. Based on this, exemplarily, referring to... Figure 7 The groove 160 can penetrate (i.e., pass through) the second inorganic insulating layer 140_2 to ensure that the groove 160 can accommodate more photoresist, thereby effectively thinning and reducing the photoresist thickness on the metal layer between two adjacent touch traces 150; further exemplarily, referring to Figure 8 , Figure 8 This is a cross-sectional view of another display panel provided in this embodiment of the invention, with the groove 160 extending through the first inorganic insulating layer 140_1 and the second inorganic insulating layer 140_2. This ensures that the groove 160 can accommodate more photoresist, thereby better thinning and reducing the photoresist thickness on the metal layer between two adjacent touch traces 150. Of course, the groove 160 can also extend only through a portion of the second inorganic insulating layer 140_2, or the groove 160 can extend through a portion of the first inorganic insulating layer 140_1 and the second inorganic insulating layer 140_2. The depth of the groove 160 can be selected according to actual needs, and this embodiment does not specifically limit it in this way.

[0060] Figure 9 This is a schematic diagram of a cross-sectional structure of another display panel provided in an embodiment of the present invention, with the cross-section taken along the section line CC'. (Refer to...) Figure 9In one embodiment of the present invention, optionally, the display panel further includes an encapsulation layer 120; the encapsulation layer 120 is located between the insulating layer 140 and the array substrate 100. The encapsulation layer 120 encapsulates the light-emitting device 110, isolating the light-emitting device 110 from the outside environment to prevent external moisture and oxygen from entering the light-emitting device 110. The encapsulation layer 120 may be formed by stacking at least one organic encapsulation layer and at least one inorganic encapsulation layer. Figure 9 The illustration shows that the encapsulation layer 120 includes an organic encapsulation layer 122 and two inorganic encapsulation layers 121 (i.e., 121_1 and 121_2), with the organic encapsulation layer 122 disposed between the two inorganic encapsulation layers 121. In this embodiment of the invention, optionally, the thickness of the encapsulation layer 120 is approximately 1 μm. Based on this, refer to... Figure 9 In this embodiment of the invention, the groove 160 is also configured to only penetrate a portion of the thickness of the encapsulation layer 120, without penetrating the entire thickness of the encapsulation layer 120, so that the groove 160 has sufficient depth to ensure that the groove 160 can accommodate enough photoresist, thereby better thinning and reducing the thickness of the photoresist on the metal layer between two adjacent touch traces 150, without affecting the encapsulation effect.

[0061] Furthermore, in one embodiment of the present invention, optionally, the depth of the groove 160 is greater than or equal to the thickness of the touch trace 150, thereby ensuring that along the direction z perpendicular to the array substrate 100, the height of the metal layer within the groove 160 is always lower than the height of the metal layer between two adjacent touch traces 150. This also allows more photoresist on the metal layer between two adjacent touch traces 150 to flow onto the metal layer within the groove 160, thereby better thinning and reducing the photoresist thickness on the metal layer between two adjacent touch traces 150. Additionally, optionally, the width of the groove 160 is the same as the width of the touch trace 150, which helps to ensure that the metal layer between two adjacent touch traces 150 can be substantially completely etched, preventing metal residue between adjacent touch traces 150, avoiding the risk of short circuits or open circuits in the touch traces 150, and ensuring that the touch traces 150 have good performance.

[0062] This invention also provides a display device, such as an OLED flexible touch display device. The display device includes the display panel of any of the above embodiments, and further includes a touch circuit. Touch traces 150 sequentially pass through at least two dams 130 from the display area AA and are electrically connected to the touch circuit. The touch layer, touch traces 150, and touch circuit constitute the touch device of the touch display panel, realizing the touch function of the touch display panel. The display device and display panel provided in this invention belong to the same inventive concept and can achieve the same technical effects; repeated details will not be elaborated here.

[0063] This invention also provides a method for manufacturing a display panel, which can be used to manufacture the display panel of any of the above embodiments. Figure 10 This is a flowchart illustrating a method for manufacturing a display panel according to an embodiment of the present invention. (Refer to...) Figure 10 The manufacturing methods for the display panel include:

[0064] S10. An array substrate is provided, the array substrate having a display area and a non-display area, the array substrate including at least two dams disposed in the non-display area. S11. An insulating layer is formed on the array substrate, the insulating layer covering the at least two dams. S12. A plurality of grooves are formed on the insulating layer between two adjacent dams. S13. A plurality of touch traces are formed on the side of the insulating layer away from the array substrate, wherein the touch traces located in the region between two adjacent dams are located in corresponding grooves.

[0065] The manufacturing method of the display panel provided in this embodiment of the invention belongs to the same inventive concept as the display panel, and the two can achieve the same technical effect. The repeated content will not be repeated here.

[0066] Based on the above technical solution, in one embodiment of the present invention, optionally, step S12, forming a plurality of grooves on the insulating layer between two adjacent dams, includes:

[0067] S121. A first photoresist layer is formed on the insulating layer between two adjacent dams, and the first photoresist layer is exposed and developed sequentially to form a first photoresist pattern.

[0068] For example, Figure 11 This is a schematic diagram of a structure involved in the manufacturing method of the display panel provided in an embodiment of the present invention. Figure 12 This is another structural schematic diagram involved in the manufacturing method of the display panel provided in the embodiment of the present invention. (See reference...) Figure 11 A first photoresist layer 170 is formed on the insulating layer 140 between two adjacent dams 130, as shown in the reference. Figure 12 The first photoresist layer 170 is exposed and developed sequentially to form a first photoresist pattern 170' on the insulating layer 140 between two adjacent dams 130.

[0069] S122. The insulating layer is etched according to the first photoresist pattern to form multiple grooves on the insulating layer.

[0070] For example, Figure 13 This is another structural schematic diagram involved in the manufacturing method of the display panel provided in the embodiment of the present invention. (See reference...) Figure 13The insulating layer 140 is etched according to the first photoresist pattern 170' on the insulating layer 140 between two adjacent dams 130, and then the first photoresist pattern 170' is removed, thereby forming a plurality of grooves 160 on the insulating layer 140 between two adjacent dams 130.

[0071] Optionally, in step S121, a preset thickness of photoresist may be retained in the area corresponding to the groove in the first photoresist pattern to avoid completely etching through the encapsulation layer in step S122. That is, the depth of the groove can be controlled by retaining a preset thickness of photoresist in the area corresponding to the groove in the first photoresist pattern, and the preset thickness corresponds to the depth of the groove.

[0072] Based on this, optionally, step S13, forming multiple touch traces on the side of the insulating layer away from the array substrate, includes:

[0073] S131. Form a metal layer that at least covers the insulation layer between two adjacent dams and the grooves on the insulation layer.

[0074] For example, Figure 14 This is another structural schematic diagram involved in the manufacturing method of the display panel provided in the embodiment of the present invention. (See reference...) Figure 14 A metal layer 150' is formed on the side of the insulating layer 140 away from the encapsulation layer 120. The metal layer 150' is a metal film layer used to make the touch trace 150. Therefore, the metal layer 150' at least covers the insulating layer 140 between two adjacent dams 130 and the groove 160 on the insulating layer 140.

[0075] S132. A second photoresist layer is formed on the metal layer between two adjacent dams, and the second photoresist layer is exposed and developed sequentially to form a second photoresist pattern.

[0076] For example, Figure 15 This is another structural schematic diagram involved in the manufacturing method of the display panel provided in the embodiment of the present invention. Figure 16 This is another structural schematic diagram involved in the manufacturing method of the display panel provided in the embodiment of the present invention. (See reference...) Figure 15 A second photoresist layer 180 is formed on the metal layer 150' between two adjacent dams 130. Due to the groove 160 on the insulating layer 140 between the two adjacent dams 130, the photoresist on the metal layer 150' between the two adjacent touch traces 150 can flow onto the metal layer 150' within the groove 160. The thickness of the photoresist on the metal layer 150' between the two adjacent touch traces 150 is reduced, allowing for exposure of the second photoresist layer 180 with lower exposure energy. Following development, the desired result can be obtained. Figure 16The second photoresist pattern 180' is shown. This embodiment of the invention effectively reduces the exposure energy required in the patterning process of the touch trace 150, shortens the photolithography process time, and effectively increases the production capacity of touch display panels.

[0077] S133. The metal layer is etched according to the second photoresist pattern to remove the metal layer between adjacent grooves, thereby forming touch traces located in the grooves.

[0078] For example, Figure 17 This is another structural schematic diagram involved in the manufacturing method of the display panel provided in the embodiment of the present invention. (See reference...) Figure 17 The metal layer 150' is etched according to the second photoresist pattern 180' to remove the metal layer 150' between adjacent grooves 160, and then the second photoresist pattern 180' is removed to obtain the touch trace 150 located in the groove 160.

[0079] Based on the above technical solution, in another embodiment of the present invention, optionally, step S11, before forming an insulating layer on the array substrate, further includes:

[0080] S101. An encapsulation layer is formed on the array substrate, and multiple initial grooves are formed on the encapsulation layer between two adjacent dams.

[0081] For example, Figure 18 This is another structural schematic diagram involved in the manufacturing method of the display panel provided in the embodiment of the present invention. Figure 19 This is another structural schematic diagram involved in the manufacturing method of the display panel provided in the embodiment of the present invention. (See reference...) Figure 18 In this embodiment of the invention, during the fabrication of the encapsulation layer 120, multiple initial grooves 160' can be formed on the encapsulation layer 120 between two adjacent dams 130. Optionally, step S12, forming multiple grooves on the insulating layer between two adjacent dams, includes: S121', where the initial grooves are covered by the insulating layer to form grooves. (See reference...) Figure 19 An insulating layer 140 is formed on the encapsulation layer 120, and the initial groove 160' is covered by the insulating layer 140 to form the following configuration: Figure 13 The groove 160 is shown.

[0082] Note that the above description is merely a preferred embodiment of the present invention and the technical principles employed. Those skilled in the art will understand that the present invention is not limited to the specific embodiments described herein, and various obvious changes, readjustments, and substitutions can be made without departing from the scope of protection of the present invention. Therefore, although the present invention has been described in detail through the above embodiments, the present invention is not limited to the above embodiments, and may include many other equivalent embodiments without departing from the concept of the present invention, the scope of which is determined by the scope of the appended claims.

Claims

1. A display panel, characterized in that, The display panel has a display area and a non-display area, and the display panel includes: An array substrate, the array substrate including at least two dams disposed in the non-display area; An insulating layer is located on the array substrate, the insulating layer covering the at least two dams; Multiple touch traces are located on the side of the insulating layer away from the array substrate; Multiple grooves are provided on the insulating layer between two adjacent dams, and the touch wiring located in the area between two adjacent dams is located in the corresponding groove; The depth of the groove is greater than or equal to the thickness of the touch trace; At least a portion of the edge of the groove is zigzag-shaped; The insulating layer includes a first inorganic insulating layer and a second inorganic insulating layer; The first inorganic insulating layer is located between the array substrate and the second inorganic insulating layer; the groove penetrates the second inorganic insulating layer, or the groove penetrates both the first inorganic insulating layer and the second inorganic insulating layer; It also includes an encapsulation layer; the encapsulation layer is located between the insulating layer and the array substrate; the groove extends through the encapsulation layer but does not penetrate the encapsulation layer.

2. The display panel according to claim 1, characterized in that, The groove has a curved cross-section; wherein the extension direction of the cross-section is perpendicular to the extension direction of the touch trace.

3. The display panel according to claim 1, characterized in that, The thickness of both the first inorganic insulating layer and the second inorganic insulating layer is 0.3 μm.

4. The display panel according to claim 1, characterized in that, Both the first inorganic insulating layer and the second inorganic insulating layer are made of silicon nitride.

5. The display panel according to claim 1, characterized in that, The thickness of the encapsulation layer is 1 μm.

6. The display panel according to claim 1, characterized in that, The width of the groove is the same as the width of the touch trace.

7. The display panel according to claim 1, characterized in that, Between two adjacent dams, the grooves correspond one-to-one with the touch wiring.

8. The display panel according to claim 1, characterized in that, The touch control wiring spans the at least two embankments.

9. A display device, characterized in that, The display device includes a display panel as described in any one of claims 1-8; the display device further includes a touch circuit, wherein the touch traces pass sequentially from the display area through the at least two dams and are electrically connected to the touch circuit.

10. A method for manufacturing a display panel, used to manufacture the display panel as described in any one of claims 1-8, characterized in that, include: An array substrate is provided, the array substrate having a display area and a non-display area, the array substrate including at least two dams disposed in the non-display area; An insulating layer is formed on the array substrate, the insulating layer covering the at least two dams; Multiple grooves are formed on the insulating layer between two adjacent dams; Multiple touch traces are formed on the side of the insulating layer away from the array substrate, wherein the touch traces located in the region between two adjacent dams are located in the corresponding grooves.

11. The method for manufacturing a display panel according to claim 10, characterized in that, The formation of multiple grooves on the insulating layer between two adjacent dams includes: A first photoresist layer is formed on the insulating layer between two adjacent dams, and the first photoresist layer is exposed and developed sequentially to form a first photoresist pattern. The insulating layer is etched according to the first photoresist pattern to form a plurality of grooves on the insulating layer.

12. The method for manufacturing a display panel according to claim 11, characterized in that, The area corresponding to the groove in the first photoresist pattern retains a photoresist of a predetermined thickness.

13. The method for manufacturing a display panel according to claim 11, characterized in that, The formation of multiple touch traces on the side of the insulating layer away from the array substrate includes: A metal layer is formed, which at least covers the insulating layer between two adjacent dams and the groove on the insulating layer; A second photoresist layer is formed on the metal layer between two adjacent dams, and the second photoresist layer is exposed and developed sequentially to form a second photoresist pattern. The metal layer is etched according to the second photoresist pattern to remove the metal layer between adjacent grooves, thereby forming the touch trace located in the groove.

14. The method for manufacturing a display panel according to claim 10, characterized in that, Before forming the insulating layer on the array substrate, the method further includes: An encapsulation layer is formed on the array substrate, and a plurality of initial grooves are formed on the encapsulation layer between two adjacent dams; Forming multiple grooves on the insulating layer between two adjacent dams includes: the initial groove being covered by the insulating layer to form the groove.

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