Parameter Error Calibration Method for Electron Probe Microanalysis Instrument

By using atomic lithography technology to prepare grating standard samples and directly calibrate the key parameters of the electron probe microanalysis instrument, the problem of large error accumulation in the existing technology is solved, and higher calibration accuracy and consistency are achieved, which is suitable for the precise measurement of three-dimensional nanostructures.

CN115877037BActive Publication Date: 2025-09-12SHANGHAI METROLOGY & TESTING TECHNOLOGY RESEARCH INSTITUTE CO LTD +1
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Patent Information

Application Number
CN202211365264.8
Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
Filing Date
2022-11-03
Publication Date
2025-09-12
Estimated Expiration
2042-11-03

AI Technical Summary

Technical Problem

Existing calibration methods for electron probe microanalysis instruments have the problem of difficulty in improving accuracy, especially in three-dimensional nanostructure measurements, where errors accumulate significantly, affecting device performance characterization.

Method used

A one-dimensional grating standard sample is prepared based on atomic lithography technology. By calculating the theoretical period value of the grating, the key parameters of the electron probe microanalysis instrument are directly calibrated, including the length measurement indication error and the sample stage repeatability error.

Benefits of technology

It shortens the length of the calibration traceability chain, reduces the error accumulation in the value transfer process, improves the calibration consistency and fusion measurement accuracy between different instruments, is easy to operate, and is suitable for precise measurement at the nanoscale.

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Abstract

The present invention discloses a parameter error calibration method for an electron probe microanalysis instrument. A one-dimensional grating standard template is prepared based on atomic lithography technology, and the theoretical grating period D of the one-dimensional grating standard template is calculated. The one-dimensional grating standard template is placed on the stage of the electron probe microanalysis instrument for a set time to maintain a stable test state. After the electron probe microanalysis instrument is clearly focused, the electron probe microanalysis instrument scans the one-dimensional grating standard template on the stage, captures and measures the grid spacing of the one-dimensional grating standard template, obtains a grating scanning distance measurement value L, and records the magnification at this time. Based on D and L, a calibration factor K at this magnification is calculated. The parameter error calibration method for an electron probe microanalysis instrument of the present invention shortens the traceability chain length for calibrating the instrument, reduces error accumulation in the measurement value transfer process, improves calibration consistency between different instruments, and is easy to operate.
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