A processing method for a micro-nano optical array structure

Abstract

The present invention relates to the field of micro-nano optics, and discloses a method for processing a micro-nano optical array structure, comprising the following steps: Step 1, processing a plurality of openings on the surface of a hydrophobic flat plate; Step 2, placing the hydrophobic flat plate above a photoresist and bringing it into contact with the photoresist, and using the capillary phenomenon of the openings to form a spherical protrusion at each position corresponding to the openings on the surface of the photoresist; Step 3, curing the photoresist; Step 4, after the curing is completed, removing the hydrophobic flat plate; Step 5, performing an ion beam etching treatment using the photoresist. Compared with the traditional ultra-precision cutting processing method, the method for processing a micro-nano optical array structure provided by the present invention has a lower cost and a shorter processing time.

Description

Technical Field

[0001] The present invention relates to the field of micro-nano optics, and in particular to a method for processing a micro-nano optical array structure. Background Art

[0002] In recent years, micro-nano optical array structures have been widely used in aerospace, laser communications, medical imaging, and weapons manufacturing. This has led to a focus on how to quickly and efficiently manufacture micro-nano optical array structures that meet these requirements—that is, optimizing the manufacturing cycle and processing difficulty while ensuring the required processing accuracy. Traditionally, micro-nano optical array structures have been manufactured using ultra-precision cutting techniques, which require expensive ultra-precision machining equipment, resulting in high production costs and extremely lengthy processing times.

[0003] Therefore, how to provide a micro-nano optical array structure processing method with short processing time and low production cost has become a problem that urgently needs to be solved by those skilled in the art. Summary of the Invention

[0004] In order to solve the above technical problems, the present invention provides a method for processing a micro-nano optical array structure with short processing time and low production cost.

[0005] To achieve the above object, the present invention provides the following solutions:

[0006] The present invention provides a method for processing a micro-nano optical array structure, comprising the following steps:

[0007] Step 1: machining multiple openings on the surface of the horizontal plate;

[0008] Step 2: placing the hydrophobic plate above the photoresist and contacting the photoresist, and utilizing the capillary phenomenon of the openings to form a spherical protrusion on the surface of the photoresist corresponding to the position of each opening;

[0009] Step three, curing the photoresist;

[0010] Step 4: After curing is completed, remove the hydrophobic plate;

[0011] Step five: performing ion beam etching processing using the photoresist.

[0012] Optionally, the photoresist is SU-8 negative photoresist.

[0013] Optionally, the inner diameter of the opening is less than or equal to 1 mm.

[0014] Optionally, in step three, ultraviolet curing technology is used to cure the photoresist.

[0015] Optionally, in step 1, a plurality of openings are processed on the surface of the hydrophobic plate by laser ablation.

[0016] Optionally, all the openings are evenly distributed on the horizontal plate.

[0017] Optionally, the hydrophobic plate is made of hydrophobic material.

[0018] Compared with the prior art, the present invention has achieved the following technical effects:

[0019] The present invention provides a method for fabricating a micro-nano optical array structure, comprising the following steps: Step 1: machining multiple openings on the surface of a hydrophobic plate; Step 2: placing the hydrophobic plate above a photoresist, contacting the plate with the photoresist, and utilizing the capillary action of the openings to form a spherical protrusion on the photoresist surface corresponding to each opening; Step 3: curing the photoresist; Step 4: removing the hydrophobic plate after curing; and Step 5: performing ion beam etching on the photoresist. Compared to traditional ultra-precision cutting methods, the method for fabricating a micro-nano optical array structure provided by the present invention is lower in cost and takes less time to fabricate. BRIEF DESCRIPTION OF THE DRAWINGS

[0020] In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the following briefly introduces the drawings required for use in the embodiments. Obviously, the drawings described below are only some embodiments of the present invention. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying any creative work.

[0021] Figure 1 This is a schematic diagram corresponding to step 1 of the micro-nano optical array structure processing method provided in an embodiment of the present invention;

[0022] Figure 2 This is a schematic diagram corresponding to step 2 of the micro-nano optical array structure processing method provided in an embodiment of the present invention;

[0023] Figure 3 This is a schematic diagram corresponding to step 4 of the micro-nano optical array structure processing method provided in an embodiment of the present invention;

[0024] Figure 4 This is a schematic diagram corresponding to step five of the micro-nano optical array structure processing method provided in an embodiment of the present invention.

[0025] Figures 1 - 4 Explanation of the accompanying reference numerals: 1. hydrophobic plate; 101. opening; 2. photoresist; 201. spherical protrusion; 3. target substrate; 301. micro-nano structure. DETAILED DESCRIPTION

[0026] Next, the technical solutions in the embodiments of the present invention will be clearly and completely described in conjunction with the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only a part of the embodiments of the present invention, rather than all the embodiments. All other embodiments obtained by those of ordinary skill in the art based on the embodiments of the present invention without creative efforts shall fall within the protection scope of the present invention.

[0027] The object of the present invention is to provide a method for fabricating a micro-nano optical array structure with short processing time and low production cost.

[0028] To make the above objects, features, and advantages of the present invention more obvious and understandable, the present invention will be further described in detail below in conjunction with the accompanying drawings and specific embodiments.

[0029] Referring to Figures 1 - 4 as shown, the method for fabricating a micro-nano optical array structure provided in this embodiment includes the following steps:

[0030] Step 1, process a plurality of openings 101 on the surface of the hydrophobic flat plate 1;

[0031] Step 2, place the hydrophobic flat plate 1 above the photoresist 2 and make it in contact with the photoresist 2. Utilize the capillary phenomenon of the openings 101 to form a spherical protrusion 201 at the position corresponding to each opening 101 on the surface of the photoresist 2;

[0032] Step 3, cure the photoresist 2;

[0033] Step 4, after curing is completed, remove the hydrophobic flat plate 1;

[0034] Step 5, perform ion beam etching treatment using the photoresist 2.

[0035] Compared with the traditional ultra-precision cutting processing method, the method for fabricating a micro-nano optical array structure provided by the present invention has lower cost and shorter processing time.

[0036] As Figure 4 shown, the micro-nano optical array structure includes a plurality of micro-nano structures 301. The depth of the openings 101 on the hydrophobic flat plate 1 is affected by the height of the micro-nano structures 301. The depth of the openings 101 needs to be greater than the height of the micro-nano structures 301, generally 1.5 times the height of the micro-nano structures 301.

[0037] Specifically, as Figure 2 shown, under the control of capillary force in Step 2, the photoresist 2 will spontaneously gather into the openings 101. Subsequently, due to the hydrophobic property of the hydrophobic flat plate 1, the liquid surface of the photoresist 2 will bulge upward to form a spherical protrusion 201. In Step 3, when curing the photoresist 2, the hydrophobic flat plate 1 is not removed. In Step 4, after the photoresist 2 is cured, according to Figure 3Remove the hydrophobic flat plate 1 in the direction of the arrow shown, and a convex spherical array appears on the surface of the photoresist 2, corresponding to the position of the opening 101. In step five, as Figure 4 shown, the spherical array formed in step three is proportionally replicated onto the target surface of the target substrate 3 using an ion beam etching technique. The specific etching method belongs to the prior art and will not be elaborated here. Additionally, the proportion of the spherical array replicated onto the target surface depends on the etching rate ratio of the ion beam etching on the photoresist 2 and the target substrate 3.

[0038] In another embodiment of the present invention, the photoresist 2 is an SU-8 negative photoresist. The SU-8 negative photoresist has good thermal and chemical stability. It should be noted that the photoresist 2 is not limited to the SU-8 negative photoresist, and other types of photoresists can also be selected.

[0039] In another embodiment of the present invention, the inner diameter of the opening 101 is less than or equal to 1 mm. There is an obvious capillary phenomenon in the pipeline with an inner diameter within 1 mm.

[0040] In another embodiment of the present invention, in order to further improve the processing efficiency, in step three, an ultraviolet curing technique is used to cure the photoresist 2.

[0041] In another embodiment of the present invention, in step one, a plurality of openings 101 are machined on the surface of the hydrophobic flat plate 1 by means of laser ablation. Of course, the machining method of the opening 101 is not limited to laser ablation, and other machining methods can also be used.

[0042] In another embodiment of the present invention, all the openings 101 are evenly arranged on the hydrophobic flat plate 1. The specific arrangement method of the openings 101 on the hydrophobic flat plate 1 depends on the arrangement method of the micro-nano structures 301 in the micro-nano optical array structure, and the two arrangement methods are consistent.

[0043] In another embodiment of the present invention, the hydrophobic flat plate 1 is made of a hydrophobic material, and the specific material used is determined according to actual needs.

[0044] Specific examples are used in this specification to elaborate on the principles and implementation manners of the present invention. The descriptions of the above embodiments are only used to help understand the method and its core idea of the present invention; at the same time, for those of ordinary skill in the art, according to the idea of the present invention, there will be changes in the specific implementation manners and application scopes. In summary, the content of this specification should not be construed as a limitation to the present invention.

Claims

1. A processing method for a micro-nano optical array structure, characterized in that It includes the following steps: Step 1, machining a plurality of openings on the surface of the hydrophobic flat plate; Step 2, placing the hydrophobic flat plate above the photoresist and in contact with the photoresist, and making a spherical protrusion form at the position of the photoresist surface corresponding to each of the openings by using the capillary phenomenon of the openings; Step 3, curing the photoresist; Step 4, removing the hydrophobic flat plate after the curing is completed; Step 5, performing an ion beam etching treatment by using the photoresist.

2. The processing method of the micro-nano optical array structure according to claim 1, characterized in that The photoresist is an SU-8 negative photoresist.

3. The processing method of the micro-nano optical array structure according to claim 1, characterized in that The inner diameter of the opening is less than or equal to 1 mm.

4. The processing method of the micro-nano optical array structure according to claim 1, characterized in that In the step 3, the ultraviolet curing technology is adopted to cure the photoresist.

5. The method for fabricating the micro-nano optical array structure according to claim 1, wherein In the step 1, a plurality of the openings are machined on the surface of the hydrophobic flat plate by using a laser ablation method.

6. The method for fabricating the micro-nano optical array structure according to claim 1, wherein All the openings are uniformly arranged on the hydrophobic flat plate.

7. The processing method of the micro-nano optical array structure according to claim 1, characterized in that The hydrophobic flat plate is made of a hydrophobic material.

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