Thin-film solar cell two-dimensional code etching device and etching method
CN117620443BActive Publication Date: 2026-08-28TRIUMPH PHOTOVOLTAIC MATERIAL CO LTD
Patent Information
- Application Number
- CN202311689841.3
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Filing Date
- 2023-12-09
- Publication Date
- 2026-08-28
- Estimated Expiration
- 2043-12-09
AI Technical Summary
Technical Problem
[0006]但是上述专利中公开的“激光扫描刻蚀制造二维码方法及其装置”无法适用与薄膜太阳能电池上,而且不能做到不脱落、不褪色的效果
Benefits of technology
[0035]1、对产品表面无损伤,不会引起产品发生物理化学变化,不会影响玻璃基板镀膜效果,减少破片风险;
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Figure CN117620443B_ABST
Abstract
The application provides a thin-film solar cell two-dimensional code etching device, and provides a thin-film solar cell two-dimensional code etching device, which comprises a laser optical system, a material receiving reel, a material feeding reel, a tape sensor, a plurality of tensioning directional wheels and the like, and has the advantages of simple and compact structure and continuous operation capability. The device can edit the layout of the required mark in a self-defined mode, and can sputter the two-dimensional code information and the required mark information onto the surface of the glass by etching, so that the glass product is not damaged. The application also provides a thin-film solar cell two-dimensional code etching method, in which the near-infrared laser with a pulse width of nanoseconds is integrated and focused by using an optical system, and the high-temperature-resistant high-molecular material coated on PET or PEF is transferred to the surface of the glass by using a vibrating mirror scanning technology, so that the two-dimensional code and the related mark characters are obtained. The method has the characteristics of fast processing speed, stable process, easy maintenance, simple tape replacement and cost saving.
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Citation Information
Patent Citations
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