Gas processing reactor with a backmixing internal

Abstract

The application discloses a gas treatment reactor with a back-mixing inner part and belongs to the technical field of gas treatment equipment. The gas treatment reactor comprises a cylinder, an upper head connected to the upper end of the cylinder and a lower head connected to the lower end of the cylinder, an exhaust pipe is connected to the upper part of the upper head, a liquid discharge pipe is connected to the lower part of the lower head, a liquid inlet pipe is connected to the upper part of the cylinder below the upper head, a gas inlet pipe is connected to the upper part of the cylinder above the lower head, a back-mixing inner part is installed on the inner wall of the cylinder above the gas inlet pipe, and a defoaming mechanism is also installed on the inner wall of the cylinder. The gas treatment reactor provided by the application is internally provided with the back-mixing inner part, a vortex of liquid phase back-mixing is formed when gas and liquid are contacted at the lower part of the reactor, the mass transfer coefficient is increased, the residence time of the gas-liquid two-phase is increased, meanwhile, the device of the application does not need a large number of tower plates and other components, and the transformation from a gas absorption plate-type tower to a new-type reactor is realized.

Description

TECHNICAL FIELD

[0001] The application belongs to the technical field of gas treatment equipment, and particularly relates to a gas treatment reactor with a back-mixing inner part. BACKGROUND

[0002] With the deterioration of raw material quality in the petroleum and chemical industry, the storage medium contains sulfur compounds, nitrogen compounds and fine particles. In the production process of petroleum and chemical industry, a large amount of toxic gas is inevitably produced. These toxic and harmful substances are not only harmful to human health, but also cause serious damage to the ecological environment. Therefore, a gas absorption device is needed to treat the generated toxic and harmful gas and ensure the operation of the production process.

[0003] The existing gas treatment device is usually a plate tower structure. The absorption tower with this structure usually causes the waste liquid at the bottom to be difficult to drain. In addition, the absorption tower is usually very high and unstable, and the absorption tower is prone to shaking in windy weather, which is not safe. In addition, the mass transfer efficiency of the existing absorption tower is difficult to improve, and the gas-liquid two-phase contact is not sufficient. The whole device has a large resistance drop and a large energy loss.

[0004] In the prior art, patent documents CN110449014B, CN111450719B and CN104826459B all disclose a treatment device containing a Venturi structure, but there is still a problem of complex structure.

[0005] In view of this, the application provides a gas treatment reactor with a back-mixing inner part. SUMMARY

[0006] In view of the deficiencies of the prior art, the purpose of the application is to provide a gas treatment reactor with a back-mixing inner part, which can prolong the residence time by back-mixing and maintain the stability of the bed, so as to solve the problems of low mass transfer efficiency and insufficient gas-liquid two-phase contact in the gas absorption treatment process, and greatly reduce the size and cost of the device.

[0007] In order to achieve the above purpose, the application adopts the following technical scheme:

[0008] A gas treatment reactor with a back-mixing inner part, comprising a cylinder, an upper head connected to the upper end of the cylinder and a lower head connected to the lower end of the cylinder, the upper part of the upper head being connected with an exhaust pipe, the lower part of the lower head being connected with a liquid discharge pipe, the cylinder below the upper head being connected with a liquid inlet pipe, and the cylinder above the lower head being connected with a gas inlet pipe; a back-mixing inner part is installed on the inner wall of the cylinder above the gas inlet pipe; a defoaming mechanism is also installed on the inner wall of the cylinder.

[0009] As a preferred technical scheme of the application, the liquid inlet pipe is located 150-300mm below the upper head.

[0010] Preferably, the distance between the lowermost end of the back-mixing inner part and the air inlet pipe is 200-800 mm.

[0011] Preferably, the back-mixing inner part comprises an inner cylinder and a sieve plate and a distribution plate installed on the inner wall of the inner cylinder from top to bottom.

[0012] Preferably, the diameter of the inner cylinder is smaller than the diameter of the cylinder body, and the height of the inner cylinder is 500-1500 mm.

[0013] Preferably, the distance between the outer wall of the inner cylinder and the inner wall of the cylinder body is 100-200 mm.

[0014] Preferably, the distribution plate is provided with through holes, and the through holes are provided with tubular distributors.

[0015] Preferably, the sieve plate is provided with strip-shaped grids.

[0016] Preferably, the number of the back-mixing inner parts is not less than 1.

[0017] Preferably, the end of the liquid inlet pipe in the cylinder body is provided with an absorbent liquid spray head.

[0018] Preferably, the end of the air inlet pipe in the cylinder body is provided with a bubble diffuser.

[0019] Preferably, the defoaming mechanism is a wire mesh structure, comprising an upper defoamer, a middle defoamer and a lower defoamer.

[0020] Preferably, the upper defoamer is located above the liquid inlet pipe, the wire mesh of the upper defoamer has a pore size of 1-5 mm, a wire diameter of 0.5-2 mm and a thickness of 50-100 mm.

[0021] Preferably, the middle defoamer is located between the liquid inlet pipe and the air inlet pipe, the wire mesh of the middle defoamer has a pore size of 1-5 mm, a wire diameter of 0.5-2 mm and a thickness of 100-200 mm.

[0022] Preferably, the lower defoamer is located below the air inlet pipe, the wire mesh of the lower defoamer has a pore size of 2-8 mm, a wire diameter of 0.5-2 mm and a thickness of 100-200 mm.

[0023] Compared with the prior art, the present application has the following beneficial effects:

[0024] (1) The gas treatment reactor provided by the present application is internally provided with a back-mixing inner part, and when the gas and liquid are contacted at the lower part of the reactor, the liquid phase forms a vortex of back-mixing, thereby increasing the mass transfer coefficient and increasing the residence time of the gas-liquid two phases.

[0025] (2) The reactor device provided by the present application does not need a large number of tray structures and the like, realizes the transformation of the gas absorption plate type tower into a new type of reactor, simplifies the structure of the device, improves the space utilization rate, saves the cost, reduces the pressure drop of the whole device, reduces the energy loss, and improves the safety of the device.

[0026] (3) The gas treatment reactor with a back-mixing inner part provided by the present application is characterized in that, in the gas-liquid contact at the upper part of the reactor, the gas phase is a continuous phase, and the liquid phase is dispersed and sprayed in the gas to be absorbed and treated; in the lower part of the reactor, the liquid phase is a continuous phase, and the gas phase is a dispersed phase; the reactor reasonably utilizes the space of the reactor and improves the mass transfer efficiency. BRIEF DESCRIPTION OF DRAWINGS

[0027] Figure 1 FIG. 1 is a structural schematic diagram of the gas treatment reactor of the present application;

[0028] Figure 2 FIG. 2 is a structural schematic diagram of the back-mixing inner part in the gas treatment reactor of the present application;

[0029] Figure 3 FIG. 3 is a structural schematic diagram of the A-A section of the back-mixing inner part of the present application;

[0030] Figure 4 FIG. 4 is a structural schematic diagram of the B-B section of the back-mixing inner part of the present application;

[0031] Figure 5 FIG. 5 is a schematic diagram of the operation process of the device of the present application;

[0032] Figure 6 FIG. 6 is a structural schematic diagram of the gas treatment device of the present application provided with multiple sets of back-mixing inner parts;

[0033] Figure 7 FIG. 7 is a top view of the absorption liquid spray head of the present application;

[0034] Figure 8 FIG. 8 is a side view of the absorption liquid spray head of the present application.

[0035] In the figure, 1 is an exhaust pipe, 2 is an upper demister, 3 is a liquid inlet pipe, 4 is a middle demister, 5 is a back-mixing inner part, 510 is a distribution disc, 520 is a sieve plate, 530 is an inner cylinder, 6 is an air inlet pipe, 7 is a lower demister, 8 is a liquid outlet pipe, 9 is a bubble diffuser, 10 is an absorption liquid spray head, 101 is a water spraying plate, and 102 is a water spraying port. DETAILED DESCRIPTION

[0036] The technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the embodiments of the present application. Obviously, the described embodiments are only part of the embodiments of the present application, rather than all the embodiments of the present application. Based on the embodiments of the present application, all other embodiments obtained by those skilled in the art without creative work fall within the protection scope of the present application.

[0037] Referring to Figures 1-8 A gas treatment reactor with a back-mixing inner part comprises a cylinder, an upper head connected to the upper end of the cylinder, and a lower head connected to the lower end of the cylinder, an exhaust pipe 1 is connected to the upper part of the upper head, a liquid discharge pipe 8 is connected to the lower part of the lower head, a liquid inlet pipe 3 is connected to the upper part of the cylinder below the upper head, and a gas inlet pipe 6 is connected to the upper part of the cylinder above the lower head; a back-mixing inner part 5 is installed on the inner wall of the cylinder above the gas inlet pipe 6; and a defoaming mechanism is also installed on the inner wall of the cylinder.

[0038] In the above technical solution, the reactor is used for absorbing a certain substance in gas, and the absorption liquid flowing into the reactor is determined according to different gases to be treated. Specifically, the reactor cylinder, the upper head, and the lower head together enclose a reaction chamber for gas absorption. The top of the upper head is provided with an exhaust pipe 1 for discharging clean gas formed after the gas is treated by absorption, and the bottom of the lower head is provided with a liquid discharge pipe 8 for discharging rich liquid after absorption. The reaction chamber has an absorption liquid zone, the absorption liquid zone has a bubble diffuser 9 connected to the gas inlet pipe 6, the back-mixing inner part 5 is located above the bubble diffuser 9, and the absorption liquid zone has an absorption liquid spray head 10 connected to the liquid inlet pipe 3.

[0039] The cylinder of the reactor is provided with a gas inlet (not marked in the figure) and a liquid inlet (not marked in the figure); the liquid inlet is arranged close to the upper head and located 150-300 mm below the upper head, the liquid inlet pipe 3 extends into the center of the reactor interior vertically to the reactor cylinder through the liquid inlet, and the absorption liquid spray head 10 is connected to the liquid outlet end of the liquid inlet pipe 3. Further referring to Figure 7 and Figure 8 The absorption liquid spray head 10 comprises a water spraying plate 101 and a plurality of water spraying ports 102 arranged on the water spraying plate 101; the angle between the water spraying port 102 and the horizontal direction is 40°-50°; the angle is preferably 45°; the cross section of the water spraying plate 101 is circular, the plurality of water spraying ports 102 are arranged on the lower surface of the water spraying plate 101, the plurality of water spraying ports 102 form a ring-shaped water spraying array on the water spraying plate 101, the ring-shaped water spraying array is concentrically distributed with the water spraying plate 101, and the number of the ring-shaped water spraying array is multiple. Of course, it can be understood that the absorption liquid spray head 10 can also select the conventional structure adopted in the prior art.

[0040] In the above technical solution, the inlet pipe 6 enters the reactor interior perpendicular to the reactor sidewall and bends upwards at a 90° angle at the center of the reactor interior. A bubble diffuser 9 is installed at the end of the inlet pipe 6. The bubble diffuser 9 is made of porous material, and its shape can be selected according to requirements, such as tubular, hemispherical, or disc-shaped, preferably spherical or hemispherical to increase the surface area and make the gas more uniformly distributed in all directions. The bubble diffuser 9 can be connected to the inlet pipe 6 by bolts, flanges, etc. The bubble diffuser 9 is made of 316 stainless steel. After passing through the bubble diffuser 9, the gas to be treated forms a large number of bubbles in the absorbent liquid. The bubble diffuser in this reactor can also adopt existing technology; for details, please refer to Chinese Invention Patent No. 201410081189.1, entitled "A Microbubble Generator for Enhanced Hydrogenation Process".

[0041] In the above technical solution, the gas bubbles to be treated are rapidly absorbed in the absorbent liquid zone, and the bubbles rise to the back-mixing internal 5. See further details. Figures 2-4 As shown, in some embodiments, the backmixing internal component 5 consists of a distribution plate 510, a sieve plate 520, and an inner cylinder 530. The distribution plate 510 and the sieve plate 520 are arranged inside the inner cylinder 530 from bottom to top, that is, the distribution plate 510 is located below the sieve plate 520, and the two are arranged in parallel. The outer diameter of the inner cylinder 530 is slightly smaller than the inner diameter of the reactor body. Specifically, the distance between the outer wall of the inner cylinder 530 and the inner wall of the reactor is 100-200 mm, which can be 100 mm, 110 mm, 120 mm, 130 mm, 140 mm, 150 mm, 160 mm, 170 mm, 180 mm, 190 mm, 200 mm, etc. The height of the inner cylinder 530 is 500–1500 mm; preferably, the height of the inner cylinder 530 can be 500 mm, 600 mm, 700 mm, 800 mm, 900 mm, 1000 mm, 1100 mm, 1200 mm, 1300 mm, 1400 mm, 1500 mm, etc. It should be particularly emphasized that the backmixing internal component 5 is installed on the inner wall of the reactor. It can be connected to the inner wall of the reactor via a structure extending from the side of the distribution plate 510, or it can be connected to the inner wall of the reactor via a structure extending from the side of the sieve plate 520. Its protruding structure can be a common internal component installation structure, and its specific form is not described or limited in this invention; it is a conventional technical means possessed by those skilled in the art. In some embodiments, the distance between the lowest end of the backmixing internal component 5 and the air inlet pipe 6 is 200–800 mm.

[0042] In some embodiments, the distribution plate 510 is provided with uniform through holes, and the through holes are provided with tube type distributors. The sieve plate 520 is provided with a strip-shaped grid. Specifically, the distribution plate 510 is used to uniformly distribute and stabilize a large number of bubbles in the absorption liquid. The bubbles enter the back-mixing inner part 5 from the distribution tube of the distribution plate 510, and the sieve plate 520 is further arranged in the back-mixing inner part 5 to stabilize the gas-liquid two-phase flow in the back-mixing inner part. The distribution plate 510 and the sieve plate 520 are arranged in the inner cylinder 530. Due to the upward pushing of the gas, the liquid in the absorption liquid layer forms a back-mixing flow between the inner cylinder and the outer cylinder. The absorption liquid in the inner cylinder 530 flows back through the gap between the inner cylinder and the reactor wall to form a back-mixing area at the entire back-mixing inner part. After the micro-bubbles escape from the absorption liquid area, the continuous phase gas moves to the upper part of the reactor and contacts with the absorption liquid droplets falling from the absorption liquid nozzle 10 on the upper liquid inlet pipe 3, so as to further absorb the gas to be treated components. The cleaned gas after the final treatment is discharged from the exhaust pipe 1 at the top of the device, so as to realize the gas treatment process.

[0043] In some embodiments, the back-mixing inner part 5 is arranged in the absorption liquid area. A plurality of sets of back-mixing inner parts can be arranged in the reactor as needed. The plurality of sets of back-mixing inner parts are arranged in the absorption liquid layer and are vertically and parallelly arranged. The specific number can be 1-4 sets, such as 1 set, 2 sets, 3 sets or 4 sets. Figure 6 As shown in the figure, the gas treatment reactor is provided with a plurality of sets of back-mixing inner parts, and the gas-liquid two-phase flow in the absorption area is subjected to multi-stage back-mixing turbulent flow.

[0044] In some embodiments, the reactor is provided with a defoaming mechanism. The defoaming mechanism can include an upper defoamer 2 arranged above the liquid inlet pipe 3, a middle defoamer 4 arranged between the liquid inlet pipe 3 and the gas inlet pipe 5, and a lower defoamer 7 arranged below the gas inlet pipe 5. The defoaming mechanism is a wire mesh structure arranged horizontally in the reactor tower. The wire mesh aperture of the upper defoamer 2 is 1-5 mm, the wire diameter is 0.5-2 mm, and the thickness is 50-100 mm. It can be understood that the wire mesh aperture of the upper defoamer 2 can be 1 mm, 2 mm, 3 mm, 4 mm or 5 mm, the wire diameter can be 0.5 mm, 1 mm, 1.5 mm or 2 mm, and the thickness can be 50 mm, 60 mm, 70 mm, 80 mm, 90 mm or 100 mm. The upper defoamer 2 is used to remove the foam in the gas phase entering the exhaust pipe 1, so as to ensure that the gas discharged out of the reactor is relatively pure.

[0045] The wire mesh of the middle demister 4 has a diameter of 1mm-5mm, a wire diameter of 0.5mm-2mm, and a thickness of 100-200mm. It can be understood that the wire mesh of the middle demister 4 can have a diameter of 1mm, 2mm, 3mm, 4mm, 5mm, etc., the wire diameter can be 0.5mm, 1mm, 1.5mm, 2mm, and the thickness can be 100mm, 110mm, 120mm, 130mm, 140mm, 150mm, 160mm, 170mm, 180mm, 190mm, 200mm, etc. The middle demister 4 can eliminate the foam entrained in the upward moving gas phase in the device, preventing the influence on the spraying effect of the liquid phase inlet.

[0046] The wire mesh of the lower demister 7 has a diameter of 2mm-8mm, a wire diameter of 0.5mm-2mm, and a thickness of 100-200mm. It can be understood that the wire mesh of the lower demister 7 can have a diameter of 2mm, 3mm, 4mm, 5mm, 6mm, 7mm, 8mm, the wire diameter can be 0.5mm, 1mm, 1.5mm, 2mm, and the thickness can be 100mm, 110mm, 120mm, 130mm, 140mm, 150mm, 160mm, 170mm, 180mm, 190mm, 200mm, etc. The lower demister 7 is located inside the lower head of the reactor and can eliminate the foam in the liquid phase leaving from the bottom of the reactor.

[0047] Further referring to Figure 5 The working process of the gas treater of the present application is described in detail as follows:

[0048] S1, turn on the absorption liquid spray head 10 to pass a certain amount of absorption liquid into the reactor, and accumulate a certain liquid layer in the reactor to form an absorption liquid zone, the liquid level of the absorption liquid zone is higher than the gas bubble diffuser 9 connected on the gas inlet pipe 6 and the internal refluxing part 5, and the specific height is 200mm above the uppermost internal refluxing part to the demister 4;

[0049] S2: open the valve of the gas inlet pipe 5, and the gas to be treated enters the reactor through the gas inlet pipe 6 and the gas diffuser 9, the gas forms a bubble flow in the absorption liquid zone at the lower part of the reactor through the gas diffuser 9, the gas-liquid two phases contact to carry out the first reaction of gas absorption treatment, and the gas bubbles of the treated gas move upward due to the factor of buoyancy; then the gas phase moves upward in the absorption liquid and passes through the internal refluxing part 5; first, the bubbles pass through the distribution plate 510 located at the lowermost part of the internal refluxing part 5, the bubbles are uniformly distributed and continue to rise to stabilize the fluid in the internal refluxing part 5 through the sieve plate to reduce disturbance; after the gas phase leaves the sieve plate 520, the absorption liquid is disturbed and refluxed from the center to the periphery, and the gas-liquid two phases flow downward between the inner cylinder 530 and the reactor, and flow around to the lower part of the internal refluxing part 5;

[0050] S3: After the gas leaving the absorption liquid zone, the continuous phase gas keeps rising; at this time, the absorption liquid sprayed by the absorption liquid nozzle 10 is sprayed downward in the continuous phase gas, and is contacted with the continuous gas phase in countercurrent to carry out secondary reaction on the gas;

[0051] S4: After the secondary reaction, the gas passes through the upper demister 2, and leaves the reactor from the gas discharge pipe 1 at the top of the reactor to enter the subsequent process, and the absorption liquid is discharged from the liquid discharge pipe 7 at the bottom of the reactor.

[0052] Obviously, the gas treatment reactor provided by the present application has the following specific features:

[0053] The present application uses two different forms in the gas-liquid two-phase mass transfer process. In the absorption liquid zone at the lower part of the device, the concentration of the components to be absorbed in the gas is the highest, the absorption liquid is the continuous phase, and the gas is the dispersed phase. The absorption liquid is in the form of a large number of bubbles in the absorption liquid, the contact area between the gas and the absorption liquid is large, the mass transfer efficiency is high, the gas is subjected to primary reaction with the absorption liquid, and the components to be absorbed in the gas are rapidly reacted. A group or multiple groups of back-mixing internals are arranged in the absorption liquid zone to make the absorption liquid zone flow in a back-mixing manner, increase the residence time for mass transfer, and improve the degree of turbulence. At the upper part of the device, the absorption liquid droplets are sprayed by the absorption liquid nozzle 10 to further absorb the continuous gas phase, and at this time, the components to be treated are subjected to secondary reaction.

[0054] At the same time, the gas entering the reactor contains a high concentration of components to be treated, which is reacted and absorbed by the absorption liquid in the absorption liquid zone. After the gas escapes from the absorption liquid zone, the content of the components to be treated has been reduced, and the absorption liquid droplets are used for reaction and absorption. Therefore, the present application not only fully absorbs a certain component in the gas and improves the mass transfer efficiency, but also reasonably utilizes the space of the device. Compared with the plate column structure in the prior art, the present application simplifies the structure of the device, does not need to set up a column structure, and reduces the operating residence time pressure.

[0055] In addition, a set or multiple sets of back-mixing internals are arranged in the absorption liquid layer, and the upward pushing force of the gas is used to make the absorption liquid layer flow in a back-mixing manner once or multiple times, increase the gas-liquid phase contact time, increase the degree of turbulence, improve the mass transfer coefficient, and make the mass transfer more sufficient. At the same time, the bed layer can be maintained stable to ensure the controllability of the reaction.

[0056] The following further describes one kind of gas treatment reactor with back-mixing internals according to the present application with specific embodiments.

[0057] Example 1

[0058] The gas treatment reactor with a back-mixing inner part comprises a cylinder, an upper head connected to the upper end of the cylinder, and a lower head connected to the lower end of the cylinder, an exhaust pipe 1 connected to the upper part of the upper head, a liquid discharge pipe 8 connected to the lower part of the lower head, a liquid inlet pipe 3 connected to the upper part of the cylinder below the upper head, and a gas inlet pipe 6 connected to the upper part of the cylinder above the lower head; a back-mixing inner part 5 is installed on the inner wall of the cylinder above the gas inlet pipe 6; and a defoaming mechanism is installed on the inner wall of the cylinder.

[0059] In the embodiment, the liquid inlet pipe 3 is located 200 mm below the upper head.

[0060] In the embodiment, the distance between the lowermost end of the back-mixing inner part 5 and the gas inlet pipe 6 is 500 mm.

[0061] In the embodiment, the back-mixing inner part 5 comprises an inner cylinder 530 and a sieve plate 520 and a distribution disc 510 installed on the inner wall of the inner cylinder 530 from top to bottom.

[0062] In the embodiment, the diameter of the inner cylinder 530 is smaller than the diameter of the cylinder, and the height of the inner cylinder 530 is 1000 mm.

[0063] In the embodiment, the distance between the outer wall of the inner cylinder 530 and the inner wall of the cylinder is 150 mm.

[0064] In the embodiment, the distribution disc 510 is provided with through holes, and the through holes are provided with tubular distributors.

[0065] In the embodiment, the sieve plate 520 is provided with strip-shaped grids.

[0066] In the embodiment, the number of the back-mixing inner part 5 is one group.

[0067] In the embodiment, the end of the liquid inlet pipe 3 in the cylinder is provided with an absorbent liquid spray head 10.

[0068] In the embodiment, the end of the gas inlet pipe 6 in the cylinder is provided with a bubble diffuser 9.

[0069] In the embodiment, the defoaming mechanism is a wire mesh structure, comprising an upper defoamer 2, a middle defoamer 4, and a lower defoamer 7; the upper defoamer 2 is located above the liquid inlet pipe 3, and the wire mesh has a hole diameter of 1 mm, a wire diameter of 1 mm, and a thickness of 70 mm; the middle defoamer 4 is located between the liquid inlet pipe 3 and the gas inlet pipe 6, and the wire mesh has a hole diameter of 2 mm, a wire diameter of 1 mm, and a thickness of 120 mm; and the lower defoamer 7 is located below the gas inlet pipe 6, and the wire mesh has a hole diameter of 3 mm, a wire diameter of 1 mm, and a thickness of 150 mm.

[0070] The technical concept of the present application is illustrated by the above-mentioned examples, but the present application is not limited to the above-mentioned examples, i.e. it does not mean that the present application must rely on the above-mentioned examples to be implemented. It should be understood by those skilled in the art that any improvement of the present application, equivalent replacement of individual raw materials of the product of the present application, addition of auxiliary ingredients, selection of specific modes, etc. fall within the protection scope and disclosure scope of the present application.

Claims

1. A gas processing reactor with a back-mixed internal, comprising a shell, an upper head connected to an upper end of the shell, and a lower head connected to a lower end of the shell, characterized in that, The upper end of the upper head is connected with an exhaust pipe (1), the lower end of the lower head is connected with a liquid discharge pipe (8), the cylinder below the upper head is connected with a liquid inlet pipe (3), and the cylinder above the lower head is connected with an air inlet pipe (6); a return mixing inner part (5) is installed on the inner wall of the cylinder above the air inlet pipe (6); a defoaming mechanism is also installed on the inner wall of the cylinder; The return mixing inner part (5) comprises an inner cylinder (530) and a sieve plate (520) and a distribution disc (510) installed on the inner wall of the inner cylinder (530) from top to bottom; The diameter of the inner cylinder (530) is smaller than the diameter of the cylinder; the height of the inner cylinder (530) is 500-1500 mm; The distance between the outer wall of the inner cylinder (530) and the inner wall of the cylinder is 100-200 mm; A through hole is formed in the distribution disc (510), and a tubular distributor is arranged in the through hole; A strip-shaped grid is formed in the sieve plate (520); The distribution disc (510) and the sieve plate (520) are arranged in the inner cylinder (530), and due to the upward pushing of the gas, the liquid in the absorption liquid layer will form a return flow between the inner cylinder and the outer cylinder, and the absorption liquid in the inner cylinder (530) will flow back through the gap between the inner cylinder and the reactor wall to form a return mixing area in the entire return mixing inner part.

2. A gas processing reactor with a backmixing internal according to claim 1, characterized in that, The liquid inlet pipe (3) is located 150-300 mm below the upper head.

3. A gas processing reactor with a backmixing internal according to claim 1, characterized in that, The distance between the lowermost end of the return mixing inner part (5) and the air inlet pipe (6) is 200-800 mm.

4. A gas processing reactor with a backmixing internal according to claim 1, characterized in that, The number of the return mixing inner parts (5) is not less than 1.

5. A gas processing reactor with a backmixing internal according to claim 1, characterized in that, The end of the liquid inlet pipe (3) located in the cylinder is provided with an absorption liquid spray head (10).

6. A gas processing reactor with a backmixing internal according to claim 1, characterized in that, The end of the air inlet pipe (6) located in the cylinder is provided with a bubble diffuser (9).

7. A gas processing reactor with a backmixing internal according to claim 1, characterized in that, The defoaming mechanism is a wire mesh structure, comprising an upper defoamer (2), a middle defoamer (4) and a lower defoamer (7).

8. A gas processing reactor with a backmixing internal according to claim 7, characterized in that The upper defoamer (2) is located above the liquid inlet pipe (3), the wire mesh aperture of the upper defoamer (2) is 1-5 mm, the wire diameter is 0.5-2 mm, and the thickness is 50-100 mm.

9. A gas processing reactor with a backmixing internal according to claim 7, characterized in that, The middle defoamer (4) is located between the liquid inlet pipe (3) and the air inlet pipe (6), the wire mesh aperture of the middle defoamer (4) is 1-5 mm, the wire diameter is 0.5-2 mm, and the thickness is 100-200 mm.

10. A gas processing reactor with a backmixing internal according to claim 7, characterized in that, The lower defoamer (7) is located below the air inlet pipe (6), the wire mesh aperture of the lower defoamer (7) is 2-8 mm, the wire diameter is 0.5-2 mm, and the thickness is 100-200 mm.

Images