LDI machine bionic compliant flight exposure mechanism and exposure method

Abstract

The invention relates to the technical field of maskless digital photoetching equipment, in particular to an LDI machine bionic compliant flight exposure mechanism and an exposure method, the flight exposure mechanism comprises a machine table, a digital exposure system arranged on the machine table and an alignment system used for driving a substrate to move in a three-dimensional space; the piezoelectric actuator and the bionic compliant mechanism are installed on the machine table, the range finder is connected to the digital exposure system, the piezoelectric actuator is connected with the digital exposure system through the bionic compliant mechanism, and the range finder, the alignment system and the piezoelectric actuator are in communication connection with the control system. The distance between the to-be-exposed area and the digital exposure system is monitored in real time through the range finder, the alignment system controls the substrate to move for macroscopic alignment and controls the substrate to ascend and descend for coarse focusing, and meanwhile, the piezoelectric actuator controls the digital exposure system to ascend and descend for fine focusing through the bionic compliant mechanism, so that the focusing precision is improved; and the exposure precision and the yield are effectively improved.

Description

Technical Field

[0001] The present invention relates to the technical field of maskless digital lithography equipment, and more specifically, to a bionic compliant flying exposure mechanism and an exposure method of an LDI machine. Background Art

[0002] LDI (Laser direct-imaging) machine is a maskless digital lithography equipment, which often uses DMD (Digital micro-mirror device) to expose PCB (Printed circuit board). In order to improve the equipment production capacity, flying exposure technology is put into use. However, the depth of field of the digital exposure system is usually less than 0.3mm, and the large-size flexible substrate itself is warped and deformed, the output displacement coupling of the motion system, the vibration of the external environment, the wear of the kinematic pair, etc., which cause the substrate to be out of focus. It is urgent to perform dynamic and precise focusing of the exposure system to ensure the quality of the lithography process. The traditional focusing method uses a mechanically moving alignment platform, which has a slow focusing speed and low precision, and it is difficult to meet the requirements of high bandwidth and high precision.

[0003] The prior art discloses an automatic focusing device, an exposure device, a photolithography device and an exposure method, wherein the automatic focusing device comprises a motion unit, a wafer stage, a displacement sensor detection device and a control system; the wafer stage is arranged on the motion unit, and the wafer stage is configured to carry a substrate; the motion unit is configured to drive the wafer stage to move up and down in a vertical direction, and to rotate along the axial direction of the wafer stage; the displacement sensor detection device is arranged below the substrate on the wafer stage, and is configured to collect the warping amount of the substrate; the control system is configured to control the motion unit to drive the wafer stage to move up and down in a vertical direction according to the warping amount of the substrate, so as to automatically focus the substrate during the exposure process. However, in this scheme, the focus is adjusted by adjusting the position of the substrate in the vertical direction according to the warping amount of the substrate, and the focusing accuracy is low. Summary of the invention

[0004] The purpose of the present invention is to overcome the shortcomings of the prior art in terms of low focusing accuracy, provide a bionic compliant flying exposure mechanism and an exposure method for an LDI machine, coordinate a positioning system and a digital exposure system to perform double focusing, and improve focusing accuracy.

[0005] In order to solve the above technical problems, the technical solution adopted by the present invention is:

[0006] Provided is a bionic compliant flying exposure mechanism for an LDI machine, comprising a machine platform, a digital exposure system and an alignment system installed on the machine platform, wherein the alignment system is used to carry a substrate; and further comprising a rangefinder, a control system, a piezoelectric driver and a bionic compliant mechanism, wherein the rangefinder is connected to the digital exposure system, the bionic compliant mechanism and the piezoelectric driver are installed on the machine platform, the rangefinder, the alignment system and the piezoelectric driver are respectively connected to the control system for communication, the alignment system is used to drive the movement of the substrate in a three-dimensional space, and the output end of the piezoelectric driver is connected to the digital exposure system through the bionic compliant mechanism to drive the digital exposure system to move up and down along the machine platform.

[0007] The LDI machine bionic compliant flight exposure mechanism of the present invention monitors the distance data between the area to be exposed on the substrate and the digital exposure system in real time through a rangefinder, and the control system controls the alignment system and the piezoelectric driver according to the monitored distance data. The alignment system drives the substrate to move in the horizontal plane so that the area to be exposed is aligned with the digital exposure system, and the alignment system drives the substrate to move in the vertical direction for coarse focusing. The piezoelectric driver drives the digital exposure system to move in the vertical direction for fine focusing through the bionic compliant mechanism, and the digital exposure system is used to perform exposure operation on the area to be exposed; the alignment system can be used to drive the substrate to move in the horizontal plane to realize scanning exposure in the two-dimensional direction and realize flight operation. Among them, coarse focusing can reduce the time used for focusing, and combined with fine focusing, the focusing accuracy can be improved, and the accuracy degradation problem caused by defocusing during flight exposure can be avoided, while ensuring exposure efficiency and production capacity, effectively improving exposure accuracy and yield.

[0008] Furthermore, it also includes a mounting plate, an output block and a flange, the piezoelectric driver and the bionic compliance mechanism are mounted on the mounting plate, the mounting plate is connected to the machine platform, the rangefinder is fixedly connected to the digital exposure system via the flange, and the output end of the bionic compliance mechanism is connected to the flange via the output block.

[0009] Furthermore, the bionic compliant mechanism includes a fixed part, an input part, a bionic bridge, an output part and a plurality of double-sided straight circular flexible hinges, the fixed part is installed on the mounting plate, the two ends of the bionic bridge are respectively connected to the fixed part through the double-sided straight circular flexible hinges, the output part is connected to the middle part of the bionic bridge through the double-sided straight circular flexible hinges, the output block is connected to the top of the output part, the piezoelectric driver is connected to the bionic bridge through the input part, and the piezoelectric driver is used to drive the bionic bridge to bend to drive the output block to rise and fall.

[0010] Further, the bionic bridge includes two groups of half bridges, the input part and the piezoelectric driver are respectively provided with two, each group of the half bridges includes a first amplification rod and a second amplification rod, one end of the first amplification rod is connected to the fixed part through the double-sided straight circular flexible hinge, the other end of the first amplification rod is connected to one end of the second amplification rod through the double-sided straight circular flexible hinge, the other end of the second amplification rod is connected to the output part through the double-sided straight circular flexible hinge, the two input parts are respectively connected between the two ends of the two first amplification rods, and the two piezoelectric drivers are installed between the two input parts.

[0011] Furthermore, the bionic compliant mechanism is provided with four groups, and the output parts of the four groups of the bionic compliant mechanism are respectively connected to the four sides of the output block.

[0012] Furthermore, the control system includes a control unit and a defocus compensation unit, the rangefinder and the control unit are respectively connected to the defocus compensation unit for communication, and the alignment system and the piezoelectric driver are respectively connected to the control unit for communication.

[0013] Furthermore, the alignment system includes a first motion system, a second motion system and a third motion system installed on the machine, the second motion system is installed at the output end of the first motion system, the third motion system is installed at the output end of the second motion system, the substrate is carried at the output end of the third motion system, the third motion system is used to drive the substrate to rise and fall, the second motion system is used to drive the substrate to move laterally, and the first motion system is used to drive the substrate to move in a horizontal plane in a direction perpendicular to the driving direction of the second motion system.

[0014] The present invention also provides a LDI machine bionic compliant flying exposure method, which is applied to the above-mentioned LDI machine bionic compliant flying exposure mechanism, and the method comprises:

[0015] The horizontal and vertical distance data between the area to be exposed and the digital exposure system are monitored in real time by the rangefinder, and the monitored distance data are fed back to the control system;

[0016] The control system sends signals to the alignment system and the piezoelectric actuator respectively;

[0017] The alignment system drives the substrate to move in the horizontal plane so that the area to be exposed of the substrate is aligned with the digital exposure system;

[0018] The alignment system drives the substrate to move in the vertical direction to complete the rough focus, and the piezoelectric driver drives the digital exposure system to move in the vertical direction to complete the fine focus, so that the focus plane of the digital exposure system falls on the area to be exposed on the substrate;

[0019] The digital exposure system is used to expose the area to be exposed.

[0020] The LDI machine bionic compliant flight exposure method of the present invention monitors the distance data between the area to be exposed on the substrate and the digital exposure system in real time through a rangefinder, and the control system controls the alignment system and the piezoelectric driver according to the monitored distance data. The alignment system drives the substrate to move in the horizontal plane so that the area to be exposed is aligned with the digital exposure system, and the alignment system drives the substrate to move in the vertical direction for coarse focusing. The piezoelectric driver drives the digital exposure system to move in the vertical direction for fine focusing through a bionic compliant mechanism, and the digital exposure system is used to perform an exposure operation on the area to be exposed; wherein, the alignment system can be used to drive the substrate to move in the horizontal plane to realize scanning exposure in a two-dimensional direction. In this embodiment, coarse focusing can reduce the time used for focusing, and combined with fine focusing, the focusing accuracy can be improved, and the accuracy degradation problem caused by defocusing during flight exposure can be avoided, while ensuring exposure efficiency and production capacity, effectively improving exposure accuracy and yield.

[0021] Preferably, after obtaining the vertical distance between the area to be exposed and the digital exposure system, the control system processes and linearly fits the distance data:

[0022] Defocus data of each sampling point is determined according to the vertical distance data and the standard focal length value when the digital exposure system is in the initial position, and then the initial P sampling points are selected in sequence as the first fitting group, and the first linear height line with the first point as the starting point is fitted by the least square method according to the scanning direction coordinates and the defocus data of the P sampling points, and the end point of the first sampling line is used as the starting point of the second fitting group, and then (P-1) sampling points, a total of P sampling points, are selected in sequence as the second fitting group, and the second linear height line is fitted by the least square method, and so on until all sampling points are fitted, and all the fitted linear height lines are sequentially connected to form a focus reference line, wherein P is an integer not less than 2;

[0023] The required moving distance y1 of the substrate during coarse focusing and the required moving distance y2 of the digital exposure system during fine focusing are obtained through the focus reference line.

[0024] Preferably, when the bionic compliance mechanism is driven by the piezoelectric driver, the bilateral straight circular flexible hinge between the second amplification rod and the output portion and the bilateral straight circular flexible hinge between the first amplification rod and the second amplification rod are deformed;

[0025] The rotation center of the bilateral straight circular flexible hinge between the second amplifying rod and the output part before deformation is recorded as A, the rotation center of the bilateral straight circular flexible hinge between the first amplifying rod and the second amplifying rod before deformation is recorded as B, the rotation center of the bilateral straight circular flexible hinge between the second amplifying rod and the output part after deformation is recorded as A′, and the rotation center of the bilateral straight circular flexible hinge between the first amplifying rod and the second amplifying rod after deformation is recorded as B′;

[0026] Remember F N is the axial force of the second amplifying rod along the straight line AB, then the two double-sided straight circular flexible hinges at both ends of the second amplifying rod are under the axial force F N Under the action, the axial deformation is ΔL;

[0027] ΔL=F N / k N ;

[0028] Between A and B, the axial extension of the second amplifying rod is also ΔΔL;

[0029] The displacement of the driving input part of each piezoelectric driver is Δx, then the input displacement of each group of bionic compliant mechanisms is 2Δx, the displacement of the output block is 2Δy, and the displacement magnification of the bionic compliant mechanism is λ;

[0030] F A =F B =F N cos a;

[0031]

[0032] l y = l AB sin a;

[0033] F A (l+2r)×tan a=2M A =2M B =2k θ Δa;

[0034] F B Δx=F N ΔL+2M A Δa;

[0035] θ = Δa = a - a1;

[0036] 2Δy=y2;

[0037]

[0038] Where λ represents the displacement magnification of the bionic compliant mechanism; a represents the angle between line segment AB and the horizontal plane; M AM represents the moment of the bilateral straight circular flexible hinge acting between the second amplifying rod and the output part; B represents the torque acting on the bilateral straight circular flexible hinge between the first amplifying rod and the second amplifying rod; a1 represents the angle between the line segment A′B′ and the horizontal plane; Δa represents the change in the angle between the line connecting the two rotation centers and the horizontal plane before and after the deformation of the bionic compliant mechanism; θ represents the rotation angle of the second amplifying rod before and after the deformation; l represents the distance between the bilateral straight circular flexible hinge between the first amplifying rod and the second amplifying rod and the bilateral straight circular flexible hinge between the second amplifying rod and the output part; r represents the arc cutting radius of the bilateral straight circular flexible hinge; l AB represents the length of line segment AB; ly represents the vertical distance between the center of rotation A and the center of rotation B; kθ represents the moment of inertia; k N Indicates stiffness coefficient; F A Indicates the horizontal force acting on the rotation center A; F B It represents the horizontal force on the rotation center B; ΔL represents the axial deformation of the second amplifying rod.

[0039] Compared with the prior art, the present invention has the following beneficial effects:

[0040] 1. The alignment system drives the substrate to move in the horizontal plane for macro alignment, and coordinates the alignment system and the digital exposure system for double focusing to improve the focusing accuracy;

[0041] 2. Bionic compliant mechanisms can reduce dependence on traditional rigid mechanisms, reduce energy consumption, reduce the number of parts and assembly processes, and improve the accuracy and stability of the mechanism. BRIEF DESCRIPTION OF THE DRAWINGS

[0042] Figure 1 It is a structural schematic diagram of the bionic compliant flying exposure mechanism of the LDI machine in an embodiment of the present invention;

[0043] Figure 2 Schematic diagram of the installation of the bionic compliant mechanism in the embodiment of the present invention;

[0044] Figure 3 It is a structural schematic diagram of a bionic compliant mechanism in an embodiment of the present invention;

[0045] Figure 4 It is a three-dimensional diagram of the bionic compliant mechanism in an embodiment of the present invention.

[0046] In the attached drawings: 1-machine; 2-positioning system; 21-first motion system; 22-second motion system; 23-third motion system; 3-digital exposure system; 4-rangefinder; 5-bionic compliant mechanism; 51-fixed part; 52-input part; 53-first magnifying rod; 54-second magnifying rod; 55-output part; 56-double-sided straight circular flexible hinge; 6-mounting plate; 7-output block; 8-flange. DETAILED DESCRIPTION

[0047] The present invention is further described below in conjunction with specific implementation methods. The accompanying drawings are only used for exemplary descriptions and are only schematic diagrams, not actual drawings, and cannot be understood as limiting this patent; in order to better illustrate the embodiments of the present invention, some parts of the accompanying drawings may be omitted, enlarged or reduced, and do not represent the size of the actual product; for those skilled in the art, it is understandable that some well-known structures and their descriptions in the accompanying drawings may be omitted.

[0048] The same or similar numbers in the drawings of the embodiments of the present invention correspond to the same or similar parts; in the description of the present invention, it should be understood that if the terms "upper", "lower", "left", "right" and the like indicate directions or positional relationships based on the directions or positional relationships shown in the drawings, it is only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific direction, be constructed and operated in a specific direction. Therefore, the terms describing the positional relationship in the drawings are only used for illustrative purposes and cannot be understood as limitations on this patent. For ordinary technicians in this field, the specific meanings of the above terms can be understood according to specific circumstances.

[0049] Embodiment 1

[0050] This embodiment is the first embodiment of the bionic compliant flight exposure mechanism of the LDI machine. Figure 1 , Figure 2 As shown, it includes a machine platform 1 and a digital exposure system 3 and an alignment system 2 installed on the machine platform 1, the alignment system 2 is used to carry a substrate; it also includes a rangefinder 4, a control system, a piezoelectric driver and a bionic compliance mechanism 5, the rangefinder 4 is connected to the digital exposure system 3, the bionic compliance mechanism 5 and the piezoelectric driver are installed on the machine platform 1, the rangefinder 4, the alignment system 2 and the piezoelectric driver are respectively communicated with the control system, the alignment system 2 is used to drive the movement of the substrate in three-dimensional space, and the output end of the piezoelectric driver is connected to the digital exposure system 3 through the bionic compliance mechanism 5 to drive the digital exposure system 3 to move up and down along the machine platform 1.

[0051] The above-mentioned bionic compliant flight exposure mechanism of the LDI machine monitors the distance data between the area to be exposed on the substrate and the digital exposure system 3 in real time through the rangefinder 4. The control system controls the alignment system 2 and the piezoelectric driver according to the monitored distance data. The alignment system 2 drives the substrate to move in the horizontal plane so that the area to be exposed is aligned with the digital exposure system 3. The alignment system 2 drives the substrate to move in the vertical direction for coarse focusing. The piezoelectric driver drives the digital exposure system 3 to move in the vertical direction for fine focusing through the bionic compliant mechanism 5. The digital exposure system 3 is used to perform exposure operation on the area to be exposed; the alignment system 2 can be used to drive the substrate to move in the horizontal plane to realize scanning exposure in the two-dimensional direction and realize flight operation. In this embodiment, coarse focusing can reduce the time used for focusing, and combined with fine focusing, the focusing accuracy can be improved, and the accuracy degradation problem caused by defocusing during flight exposure can be avoided. While ensuring exposure efficiency and production capacity, the exposure accuracy and yield rate are effectively improved.

[0052] like Figure 1 , Figure 2 As shown, it also includes a mounting plate 6, an output block 7 and a flange 8. The piezoelectric driver and the bionic compliance mechanism 5 are mounted on the mounting plate 6. The mounting plate 6 is connected to the machine table 1. The rangefinder 4 is fixedly connected to the digital exposure system 3 through the flange 8. The output end of the bionic compliance mechanism 5 is connected to the flange 8 through the output block 7. The bionic compliance mechanism 5 can reduce the dependence on the traditional rigid mechanism, reduce energy consumption, and reduce the number of parts and assembly process, which can improve the accuracy and stability of the mechanism. When the digital exposure system 3 is driven to move by the flange 8, the rangefinder 4 moves synchronously, and the distance between the area to be exposed and the digital exposure system 3 can be monitored in real time.

[0053] like Figure 2 , Figure 3 and Figure 4 As shown, the bionic compliance mechanism 5 includes a fixed part 51, an input part 52, a bionic bridge, an output part 55 and a plurality of bilateral straight circular flexible hinges 56. The fixed part 51 is mounted on the mounting plate 6. The two ends of the bionic bridge are respectively connected to the fixed part 51 through the bilateral straight circular flexible hinges 56. The output part 55 is connected to the middle of the bionic bridge through the bilateral straight circular flexible hinges 56. The output block 7 is connected to the top of the output part 55. The piezoelectric driver is connected to the bionic bridge through the input part 52. The piezoelectric driver is used to drive the bionic bridge to bend so as to drive the output block 7 to move in the vertical direction. During implementation, the piezoelectric driver is activated to push the input part 52 to squeeze the bionic bridge. The bionic bridge is bent and deformed through the plurality of bilateral straight circular flexible hinges 56, driving the output part 55 and the output block 7. It has the advantages of no gap, no friction and wear.

[0054] Specifically, Figure 2 , Figure 3 and Figure 4As shown, the bionic bridge includes two groups of half bridges, and the input part 52 and the piezoelectric driver are respectively provided with two, and each group of half bridges includes a first amplifying rod 53 and a second amplifying rod 54, one end of the first amplifying rod 53 is connected to the fixed part 51 through a bilateral straight circular flexible hinge 56, the other end of the first amplifying rod 53 is connected to one end of the second amplifying rod 54 through a bilateral straight circular flexible hinge 56, and the other end of the second amplifying rod 54 is connected to the output part 55 through a bilateral straight circular flexible hinge 56, and the two input parts 52 are respectively connected between the two ends of the two first amplifying rods 53, and the two piezoelectric drivers are installed between the two input parts 52. During implementation, the two piezoelectric drivers respectively drive the corresponding input parts 52 to move horizontally, and the first amplifying rod 53 is squeezed by the input part 52 and bends and deforms, driving the second amplifying rod 54 to deform, and the two second amplifying rods 54 act on the output part 55, so that the output part 55 moves in the vertical direction.

[0055] The control system includes a control unit and a defocus compensation unit, the rangefinder 4 and the control unit are respectively connected to the defocus compensation unit for communication, and the alignment system 2 and the piezoelectric driver are respectively connected to the control unit for communication. During implementation, the rangefinder 4 monitors the horizontal and vertical distance data between the area to be exposed and the digital exposure system 3 in real time, the defocus compensation unit calculates the defocus compensation data based on the obtained vertical distance data, the control unit controls the alignment system 2 to move according to the horizontal distance data, and the alignment is achieved by controlling the movement of the substrate through the alignment system 2, and the control unit controls the alignment system 2 and the piezoelectric driver to move according to the defocus compensation data, controls the vertical movement of the substrate through the alignment system 2 to achieve coarse focus, and controls the vertical movement of the digital exposure system 3 through the piezoelectric driver to achieve fine focus.

[0056] like Figure 1 As shown, the alignment system 2 includes a first motion system 21, a second motion system 22 and a third motion system 23 installed on the machine 1, the second motion system 22 is installed at the output end of the first motion system 21, the third motion system 23 is installed at the output end of the second motion system 22, the substrate is carried at the output end of the third motion system 23, the third motion system 23 is used to drive the substrate to move up and down, the second motion system 22 is used to drive the substrate to move horizontally, and the first motion system 21 is used to drive the substrate to move in a horizontal plane along a direction perpendicular to the driving direction of the second motion system 22. During implementation, according to the horizontal distance between the detected area to be exposed and the digital exposure system 3, the first motion system 21 and the second motion system 22 can be used to control the substrate to move in the horizontal plane, so that the area to be exposed of the substrate and the digital exposure system 3 can be macro-aligned, and the third motion system 23 can be used to control the vertical movement of the substrate for coarse focusing.

[0057] Embodiment 2

[0058] This embodiment is the second embodiment of the bionic compliant flight exposure mechanism of the LDI machine. This embodiment is similar to the first embodiment, except that at least three groups of bionic compliant mechanisms 5 are provided. The output block 7 is synchronously driven by at least three groups of bionic compliant mechanisms 5 to ensure the smooth lifting of the output block 7. Specifically, Figure 4 As shown, four groups of bionic compliance mechanisms 5 are provided, and the four groups of bionic compliance mechanisms 5 are surrounded by a hollow rectangular shape for the digital exposure system 3 to pass through. The output parts 55 of the four groups of bionic compliance mechanisms 5 are respectively connected to the four sides of the output block 7, and the digital exposure system 3 is penetrated in the middle of the output block 7. The four groups of bionic compliance mechanisms 5 can ensure the smooth movement of the output block 7 and the digital exposure system 3, and prevent the movement interference between the bionic compliance mechanism 5 and the digital exposure system 3.

[0059] Embodiment 3

[0060] This embodiment is the first embodiment of the LDI machine bionic compliant flying exposure method, comprising:

[0061] The horizontal and vertical distance data between the area to be exposed and the digital exposure system 3 are monitored in real time by the rangefinder 4, and the monitored distance data are fed back to the control system;

[0062] The control system sends signals to the alignment system 2 and the piezoelectric driver respectively;

[0063] The alignment system 2 drives the substrate to move in a horizontal plane so that the area to be exposed of the substrate is aligned with the digital exposure system 3;

[0064] The alignment system 2 drives the substrate to move in the vertical direction to complete the rough focus, and the piezoelectric driver drives the digital exposure system 3 to move in the vertical direction to complete the fine focus, so that the focus plane of the digital exposure system 3 falls on the area to be exposed on the substrate;

[0065] The digital exposure system 3 is used to perform exposure operation on the area to be exposed.

[0066] The above-mentioned LDI machine bionic compliant flight exposure method monitors the distance data between the area to be exposed on the substrate and the digital exposure system 3 in real time through the rangefinder 4, and the control system controls the alignment system 2 and the piezoelectric driver according to the monitored distance data. The alignment system 2 drives the substrate to move in the horizontal plane, so that the area to be exposed is aligned with the digital exposure system 3, and the alignment system 2 drives the substrate to move in the vertical direction for coarse focusing. The piezoelectric driver drives the digital exposure system 3 to move in the vertical direction for fine focusing through the bionic compliant mechanism 5, and the digital exposure system 3 is used to perform exposure operations on the area to be exposed; wherein, the alignment system 2 can drive the substrate to move in the horizontal plane to realize scanning exposure in the two-dimensional direction. In this embodiment, coarse focusing can reduce the time used for focusing, and combined with fine focusing, the focusing accuracy can be improved, and the accuracy degradation caused by defocusing during flight exposure can be avoided. While ensuring exposure efficiency and production capacity, the exposure accuracy and yield rate are effectively improved.

[0067] After obtaining the vertical distance between the area to be exposed and the digital exposure system 3, the control system processes and linearly fits the distance data:

[0068] Defocus data of each sampling point is determined according to the vertical distance data and the standard focal length value when the digital exposure system 3 is in the initial position, and then the initial P sampling points are selected in sequence as the first fitting group, and the first linear height line with the first point as the starting point is fitted by the least square method according to the scanning direction coordinates and the defocus data of the P sampling points, and the end point of the first sampling line is used as the starting point of the second fitting group, and then (P-1) sampling points, a total of P sampling points, are selected in sequence as the second fitting group, and the second linear height line is fitted by the least square method, and so on until all the sampling points are fitted, and all the fitted linear height lines are connected in sequence to form a focusing reference line, wherein P is an integer not less than 2; it should be noted that the linear height line of each group of sampling points can also be obtained directly according to the height data of the sampling points, and then the continuous linear height lines are translated as a whole according to the standard focal length value when the rangefinder 4 is in the initial position to obtain the adjustment reference line.

[0069] The defocus compensation data is obtained through the focus reference line: the required moving distance y1 of the substrate during coarse focusing and the required moving distance y2 of the digital exposure system 3 during fine focusing.

[0070] When the bionic compliance mechanism 5 is driven by the piezoelectric driver, the bilateral straight circular flexible hinge 56 between the second amplifying rod 54 and the output portion 55 and the bilateral straight circular flexible hinge 56 between the first amplifying rod 53 and the second amplifying rod 54 are deformed;

[0071] The rotation center of the double-sided straight circular flexible hinge 56 between the second amplifying rod 54 and the output part 55 before deformation is recorded as A, the rotation center of the double-sided straight circular flexible hinge 56 between the first amplifying rod 53 and the second amplifying rod 54 before deformation is recorded as B, the rotation center of the double-sided straight circular flexible hinge 56 between the second amplifying rod 54 and the output part 55 after deformation is recorded as A′, and the rotation center of the double-sided straight circular flexible hinge 56 between the first amplifying rod 53 and the second amplifying rod 54 after deformation is recorded as B′;

[0072] Remember F N is the axial force of the second amplifying rod 54 along the straight line AB, then the two double-sided straight circular flexible hinges 56 at both ends of the second amplifying rod 54 are under the axial force F N Under the action, the axial deformation is ΔL;

[0073] ΔL=F N / k N ;

[0074] Between A and B, the axial extension of the second amplifying rod is also ΔL;

[0075] The displacement of each piezoelectric driver driving input part 52 is Δx, then the input displacement of each group of bionic compliance mechanisms 5 is 2Δx, the displacement of the output block 7 is 2Δy, and the displacement magnification of the bionic compliance mechanism 5 is λ;

[0076] F A =F B =F N cos a;

[0077]

[0078] l y = l AB sin a;

[0079] F A (l+2r)×tan a=2M A =2M B =2k θ Δa;

[0080] F B Δx=F N ΔL+2M A Δa;

[0081] θ = Δa = a - a1;

[0082] 2Δy=y2;

[0083]

[0084] Where, λ represents the displacement magnification of the bionic compliant mechanism 5; a represents the angle between the line segment AB and the horizontal plane; M A M represents the moment of the bilateral straight circular flexible hinge 56 acting between the second amplifying rod 54 and the output portion 55; B represents the torque acting on the bilateral straight circular flexible hinge 56 between the first amplifying rod 53 and the second amplifying rod 54; a1 represents the angle between the line segment A′B′ and the horizontal plane; Δa represents the change in the angle between the line connecting the two rotation centers of the bionic compliant mechanism 5 before and after deformation and the horizontal plane; θ represents the rotation angle of the second amplifying rod 54 before and after deformation; l represents the distance between the bilateral straight circular flexible hinge 56 between the first amplifying rod 53 and the second amplifying rod 54 and the bilateral straight circular flexible hinge 56 between the second amplifying rod 54 and the output part 55; r represents the arc cutting radius of the bilateral straight circular flexible hinge 56; l AB represents the length of line segment AB; ly represents the vertical distance between the center of rotation A and the center of rotation B; k θ represents the moment of inertia; k N Indicates stiffness coefficient; F A Indicates the horizontal force acting on the rotation center A; F B represents the horizontal force on the rotation center B; ΔL represents the axial deformation of the second amplifying rod 54.

[0085] The bionic compliant mechanism 5 is selected according to the required displacement of the output block 7, and the displacement of the piezoelectric driver driving input part 52 when the digital exposure system 3 moves a distance y2 is calculated. The alignment system 2 and the piezoelectric driver are controlled by the control system to make the substrate move a distance y1 in the vertical direction and the digital exposure system 3 move a distance y2.

[0086] In the specific contents of the above-mentioned specific implementation methods, the various technical features can be combined in any non-contradictory manner. In order to make the description concise, not all possible combinations of the above-mentioned technical features are described. However, as long as there is no contradiction in the combination of these technical features, they should be considered to be within the scope of this specification.

[0087] Obviously, the above embodiments of the present invention are merely examples for clearly illustrating the present invention, and are not intended to limit the embodiments of the present invention. For those skilled in the art, other different forms of changes or modifications can be made based on the above description. It is not necessary and impossible to list all the embodiments here. Any modifications, equivalent substitutions and improvements made within the spirit and principles of the present invention should be included in the protection scope of the claims of the present invention.

Claims

1. A bionic compliant flying exposure mechanism for an LDI machine, comprising a machine platform (1) and a digital exposure system (3) and a positioning system (2) installed on the machine platform (1), wherein the positioning system (2) is used to carry a substrate; characterized in that: The invention also comprises a rangefinder (4), a control system, a piezoelectric driver and a bionic compliance mechanism (5); the rangefinder (4) is connected to the digital exposure system (3); the bionic compliance mechanism (5) and the piezoelectric driver are installed on the machine platform (1); the rangefinder (4), the alignment system (2) and the piezoelectric driver are respectively connected to the control system for communication; the alignment system (2) is used to drive the movement of the substrate in three-dimensional space; the output end of the piezoelectric driver is connected to the digital exposure system (3) through the bionic compliance mechanism (5) to drive the digital exposure system (3) to move up and down along the machine platform (1).

2. The LDI machine bionic compliant flying exposure mechanism according to claim 1, characterized in that: It also comprises a mounting plate (6), an output block (7) and a flange (8); the piezoelectric driver and the bionic compliance mechanism (5) are mounted on the mounting plate (6); the mounting plate (6) is connected to the machine platform (1); the rangefinder (4) is fixedly connected to the digital exposure system (3) via the flange (8); and the output end of the bionic compliance mechanism (5) is connected to the flange (8) via the output block (7).

3. The LDI machine bionic compliant flying exposure mechanism according to claim 2, characterized in that: The bionic compliant mechanism (5) comprises a fixed part (51), an input part (52), a bionic bridge, an output part (55) and a plurality of double-sided straight circular flexible hinges (56); the fixed part (51) is mounted on the mounting plate (6); the two ends of the bionic bridge are respectively connected to the fixed part (51) via the double-sided straight circular flexible hinges (56); the output part (55) is connected to the middle part of the bionic bridge via the double-sided straight circular flexible hinges (56); the output block (7) is connected to the top of the output part (55); the piezoelectric driver is connected to the bionic bridge via the input part (52); the piezoelectric driver is used to drive the bionic bridge to bend so as to drive the output block (7) to rise and fall.

4. The LDI machine bionic compliant flying exposure mechanism according to claim 3, characterized in that: The bionic bridge comprises two groups of half bridges, the input part (52) and the piezoelectric driver are respectively provided with two, each group of the half bridge comprises a first amplification rod (53) and a second amplification rod (54), one end of the first amplification rod (53) is connected to the fixed part (51) through the double-sided straight circular flexible hinge (56), the other end of the first amplification rod (53) is connected to one end of the second amplification rod (54) through the double-sided straight circular flexible hinge (56), the other end of the second amplification rod (54) is connected to the output part (55) through the double-sided straight circular flexible hinge (56), the two input parts (52) are respectively connected between the two ends of the two first amplification rods (53), and the two piezoelectric drivers are installed between the two input parts (52).

5. The LDI machine bionic compliant flying exposure mechanism according to claim 4, characterized in that: The bionic compliant mechanisms (5) are provided with four groups, and the output parts (55) of the four groups of bionic compliant mechanisms (5) are respectively connected to the four sides of the output block (7).

6. The LDI machine bionic compliant flying exposure mechanism according to any one of claims 1 to 5, characterized in that: The control system comprises a control unit and a defocus compensation unit, the rangefinder (4) and the control unit are respectively connected in communication with the defocus compensation unit, and the alignment system (2) and the piezoelectric driver are respectively connected in communication with the control unit.

7. The LDI machine bionic compliant flying exposure mechanism according to any one of claims 1 to 5, characterized in that: The alignment system (2) comprises a first motion system (21), a second motion system (22) and a third motion system (23) installed on the machine (1); the second motion system (22) is installed at the output end of the first motion system (21); the third motion system (23) is installed at the output end of the second motion system (22); the substrate is carried at the output end of the third motion system (23); the third motion system (23) is used to drive the substrate to rise and fall; the second motion system (22) is used to drive the substrate to move laterally; and the first motion system (21) is used to drive the substrate to move in a horizontal plane along a direction perpendicular to the driving direction of the second motion system (22).

8. A bionic compliant flying exposure method for an LDI machine, characterized in that: The bionic compliant flying exposure mechanism of the LDI machine as claimed in claim 5 comprises: The horizontal and vertical distance data between the area to be exposed and the digital exposure system (3) are monitored in real time by a distance meter (4), and the monitored distance data are fed back to the control system; The control system sends signals to the alignment system (2) and the piezoelectric driver respectively; The alignment system (2) drives the substrate to move in a horizontal plane so that the area to be exposed of the substrate is aligned with the digital exposure system (3); The alignment system (2) drives the substrate to move in a vertical direction to complete rough focusing, and the piezoelectric driver drives the digital exposure system (3) to move in a vertical direction to complete fine focusing, so that the focus plane of the digital exposure system (3) falls on the area to be exposed on the substrate; A digital exposure system (3) is used to perform exposure operation on the area to be exposed.

9. The LDI machine bionic compliant flying exposure method according to claim 8, characterized in that: After obtaining the vertical distance between the area to be exposed and the digital exposure system (3), the control system processes the distance data and performs linear fitting: Defocus data of each sampling point is determined according to the vertical distance data and the standard focal length value when the digital exposure system (3) is in the initial position, and then the initial P sampling points are selected in sequence as the first fitting group, and the first linear height line with the first point as the starting point is fitted using the least square method according to the scanning direction coordinates and the defocus data of the P sampling points, and the end point of the first sampling line is used as the starting point of the second fitting group, and then (P-1) sampling points, a total of P sampling points, are selected in sequence as the second fitting group, and the second linear height line is fitted using the least square method, and so on until all the sampling points are fitted, and all the fitted linear height lines are sequentially connected to form a focus reference line, wherein P is an integer not less than 2; The required moving distance y1 of the substrate during coarse focusing and the required moving distance y2 of the digital exposure system (3) during fine focusing are obtained through the focus reference line.

10. The LDI machine bionic compliant flying exposure method according to claim 9, characterized in that: When the bionic compliance mechanism (5) is driven by the piezoelectric driver, the bilateral straight circular flexible hinge (56) between the second amplifying rod (54) and the output portion (55) and the bilateral straight circular flexible hinge (56) between the first amplifying rod (53) and the second amplifying rod (54) are deformed; The rotation center of the double-sided straight circular flexible hinge (56) between the second amplifying rod (54) and the output part (55) before deformation is recorded as A, the rotation center of the double-sided straight circular flexible hinge (56) between the first amplifying rod (53) and the second amplifying rod (54) before deformation is recorded as B, the rotation center of the double-sided straight circular flexible hinge (56) between the second amplifying rod (54) and the output part (55) after deformation is recorded as A′, and the rotation center of the double-sided straight circular flexible hinge (56) between the first amplifying rod (53) and the second amplifying rod (54) after deformation is recorded as B′; Remember F N is the axial force of the second amplifying rod (54) along the straight line AB, then the two double-sided straight circular flexible hinges (56) at both ends of the second amplifying rod (54) are under the axial force F N Under the action, the axial deformation is ΔL; ΔL=FN / k N ; Between A and B, the axial extension of the second amplifying rod is also αL; The displacement of each piezoelectric driver driving input part (52) is Δx, the input displacement of each group of bionic compliant mechanisms (5) is 2αx, the displacement of the output block (7) is 2αy, and the displacement magnification factor of the bionic compliant mechanism (5) is λ; F A =F B =F N cos a; the y =l AB until; <h2 style=";text-align:left;direction:ltr">F<h2 style=";text-align:left;direction:ltr"> A <h2 style=";text-align:left;direction:ltr"> (l+2r)×tan a = 2M<h2 style=";text-align:left;direction:ltr"> A <h2 style=";text-align:left;direction:ltr"> <2M<h2 style=";text-align:left;direction:ltr"> B <h2 style=";text-align:left;direction:ltr"> <2k<h2 style=";text-align:left;direction:ltr"> θ <h2 style=";text-align:left;direction:ltr"> Δa; F B Δx=F N ΔL+2M A Δa; θ = αa = a-a1; 2Δy=y2; Where λ represents the displacement magnification of the bionic compliant mechanism (5); a represents the angle between the line segment AB and the horizontal plane; M A M represents the moment of force acting on the bilateral straight circular flexible hinge (56) between the second amplifying rod (54) and the output portion (55); B represents the torque acting on the bilateral straight circular flexible hinge (56) between the first amplifying rod (53) and the second amplifying rod (54); a1 represents the angle between the line segment A′B′ and the horizontal plane; Δa represents the change in the angle between the line connecting the two rotation centers of the bionic compliant mechanism (5) and the horizontal plane before and after deformation; θ represents the rotation angle of the second amplifying rod (54) before and after deformation; l represents the distance between the bilateral straight circular flexible hinge (56) between the first amplifying rod (53) and the second amplifying rod (54) and the bilateral straight circular flexible hinge (56) between the second amplifying rod (54) and the output part (55); r represents the arc cutting radius of the bilateral straight circular flexible hinge (56); l AB represents the length of line segment AB; ly represents the vertical distance between the center of rotation A and the center of rotation B; k θ represents the moment of inertia; k N Indicates stiffness coefficient; F A Indicates the horizontal force acting on the rotation center A; F B represents the horizontal force exerted on the rotation center B; ΔL represents the axial deformation of the second amplifying rod (54).

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