Reflection structure, method for manufacturing reflection structure, and frequency selective reflection plate set

Abstract

In the present disclosure, provided is a reflection structure having a frequency selective reflection plate that reflects an electromagnetic wave of a specific frequency band in a direction different from a regular reflection direction, the reflection structure comprising: a substrate having a first alignment mark; and a plurality of the frequency selective reflecting plates arranged side by side on one surface of the base material, the distance between adjacent frequency selective reflecting plates being less than 1 / 2 of the wavelength of the electromagnetic wave.

Description

Technical Field

[0001] The present disclosure relates to a reflective structure having a frequency selective reflector that reflects electromagnetic waves in a specific frequency band in a direction different from a regular reflection direction. Background Art

[0002] In mobile communication systems, in order to improve the propagation environment and area, the technology of reflect array is being studied (for example, Patent Documents 1-2, Non-Patent Document 1). In particular, in the high frequency used in the fifth generation communication system (5G), since the straightness is strong, the elimination of coverage holes (areas that radio waves cannot reach) is an important issue.

[0003] As a reflect array, it is expected that the electromagnetic wave of a specific frequency incident from a base station in a specified direction can be reflected in a desired direction. As such a reflect array, for example, the following technology has been developed: a plurality of reflective elements are arranged, and the size or shape of the reflective elements is changed to change the resonant frequency of each reflective element, thereby controlling the reflection phase of the electromagnetic wave, thereby controlling the incident direction and reflection direction of the electromagnetic wave.

[0004] Prior art literature

[0005] Patent Literature

[0006] Patent Document 1: Japanese Patent No. 5371633

[0007] Patent Document 2: Japanese Patent No. 5162677

[0008] Non-patent literature

[0009] Non-patent document 1: Mayumi Yoshino et al., "Improvement of received power outside the field of view of L-shaped corridors based on metasurface reflectors", IEICE Technical Report, A·P 2020-5 (2020-04) Summary of the invention

[0010] Problems to be solved by the invention

[0011] In order to make the cover cavity reflect high-intensity electromagnetic waves, a large-area reflective array is required. However, due to the limitations of manufacturing equipment, it is difficult to manufacture a large-area reflective array.

[0012] However, in order to make the reflective array larger in area, for example, a splicing technology of arranging and configuring the reflective arrays can be considered. However, when the reflective arrays are spliced ​​to make the area larger, the offset of the relative positions between the multiple reflective arrays becomes a problem. Due to the offset of the relative positions of the reflective arrays, the reflection intensity of the electromagnetic wave is reduced, or the reflection phase of the electromagnetic wave is changed, so that the desired reflection characteristics cannot be obtained.

[0013] In addition, although it is not a reflective array, the development of splicing technology is being carried out in the field of display devices. However, in display devices, the seams of each display device are an important issue, while in reflective arrays, the relative position accuracy of each reflective array becomes an important issue. In addition, it is conceivable that in reflective arrays, higher position accuracy is required than in display devices. Therefore, it is conceivable that it is difficult to directly apply the splicing technology of display devices to reflective arrays.

[0014] The present disclosure is completed in view of the above actual situation, and its main purpose is to provide a reflection structure as follows: in a reflection structure having a frequency selective reflection plate that reflects electromagnetic waves in a specific frequency band in a direction different from the regular reflection direction, the reflection characteristics are good and a large area can be achieved.

[0015] Means for solving problems

[0016] One embodiment of the present disclosure provides a reflective structure having a frequency selective reflector that reflects electromagnetic waves in a specific frequency band in a direction different from a normal reflection direction, wherein the reflective structure comprises: a substrate having a first alignment mark; and a plurality of the frequency selective reflectors arranged on one surface of the substrate, wherein a distance between adjacent frequency selective reflectors is less than 1 / 2 of a wavelength of the electromagnetic wave.

[0017] Another embodiment of the present disclosure provides a reflective structure, which has a frequency selective reflector that reflects electromagnetic waves in a specific frequency band in a direction different from the normal reflection direction, wherein the reflective structure has: a substrate; and a plurality of the frequency selective reflectors, which are arranged on one surface of the substrate, two adjacent sides of at least one of the frequency selective reflectors are aligned with two adjacent sides of the substrate, and a distance between adjacent frequency selective reflectors is less than 1 / 2 of the wavelength of the electromagnetic wave.

[0018] Another embodiment of the present disclosure provides a reflection structure, which has a frequency selective reflection plate that reflects electromagnetic waves of a specific frequency band in a direction different from the normal reflection direction, wherein the reflection structure comprises: a substrate having a first alignment mark; and the frequency selective reflection plate, which is arranged on one surface of the substrate, the frequency selective reflection plate comprising: a reflection component that reflects the electromagnetic waves, which is arranged on one surface of the substrate; and a plurality of dielectric layers that allow the electromagnetic waves to pass, which are arranged on the surface of the substrate on the side of the reflection component, the distance between adjacent dielectric layers is less than 1 / 2 of the wavelength of the electromagnetic wave, the dielectric layer has a concave-convex structure, the concave-convex structure is configured with a plurality of unit structures, the unit structure has a thickness distribution in which the thickness increases in a specified direction, the unit structure of the dielectric layer has a plurality of unit regions with different thicknesses, and each unit structure in the dielectric layer has a plurality of unit regions with different thicknesses. In the structure, in a curve graph in which the length of the unit structure in the specified direction is set as the horizontal axis, the relative reflection phase when the electromagnetic wave passes through the dielectric layer and is reflected by the reflecting component and passes through the dielectric layer again and is emitted to the incident side of the electromagnetic wave is set as the vertical axis, and the value of the relative reflection phase of the electromagnetic wave exceeds -360 degrees and is below 0 degrees, points corresponding to the center position of each unit area in the specified direction and the relative reflection phase of the electromagnetic wave in each unit area are drawn, and a straight line passing through the point corresponding to the minimum thickness unit area with the minimum thickness is drawn, at this time, each point is on the same straight line, the dielectric layer has at least the first unit structure as the unit structure, and the first unit structure has more than three unit areas with different thicknesses, and the relative reflection phase distribution of the electromagnetic wave is controlled by the thickness distribution of the dielectric layer, thereby controlling the reflection direction of the electromagnetic wave.

[0019] Another embodiment of the present disclosure provides a reflection structure, which has a frequency selective reflection plate that reflects electromagnetic waves of a specific frequency band in a direction different from the normal reflection direction, wherein the reflection structure has: a substrate; and the frequency selective reflection plate, which is arranged on one surface of the substrate, the frequency selective reflection plate has: a reflection component that reflects the electromagnetic waves, which is arranged on one surface of the substrate; and a plurality of dielectric layers that allow the electromagnetic waves to pass, which are arranged on the surface of the substrate on the side of the reflection component, at least two adjacent sides of the dielectric layer are aligned with two adjacent sides of the substrate, the distance between adjacent dielectric layers is less than 1 / 2 of the wavelength of the electromagnetic wave, the dielectric layer has a concave-convex structure, the concave-convex structure is configured with a plurality of unit structures, the unit structure has a thickness distribution with increasing thickness in a specified direction, the unit structure of the dielectric layer has a plurality of unit regions with different thicknesses, In each unit structure of the above-mentioned dielectric layer, the length of the above-mentioned unit structure in the above-mentioned prescribed direction is set as the horizontal axis, the relative reflection phase when the above-mentioned electromagnetic wave passes through the above-mentioned dielectric layer and is reflected by the above-mentioned reflecting component and passes through the above-mentioned dielectric layer again and is emitted to the incident side of the above-mentioned electromagnetic wave is set as the vertical axis, and in a curve graph in which the value of the relative reflection phase of the above-mentioned electromagnetic wave exceeds -360 degrees and is below 0 degrees, points corresponding to the center position of each unit area in the above-mentioned prescribed direction and the relative reflection phase of the above-mentioned electromagnetic wave in each unit area are drawn, and a straight line passing through the point corresponding to the minimum thickness unit area with the minimum thickness is drawn. At this time, each point is on the same straight line, the above-mentioned dielectric layer has at least the first unit structure as the above-mentioned unit structure, and the above-mentioned first unit structure has more than the above-mentioned three unit areas with different thicknesses. The relative reflection phase distribution of the above-mentioned electromagnetic wave is controlled by the thickness distribution of the above-mentioned dielectric layer, thereby controlling the reflection direction of the above-mentioned electromagnetic wave.

[0020] Another embodiment of the present disclosure provides a method for manufacturing a reflective structure, which manufactures a reflective structure having a plurality of frequency selective reflective plates, wherein the frequency selective reflective plates reflect electromagnetic waves in a specific frequency band in a direction different from a normal reflection direction, wherein the method for manufacturing the reflective structure comprises a configuration step, in which the plurality of frequency selective reflective plates are arranged on a surface of a supporting body having a first alignment mark in such a manner that a distance between adjacent frequency selective reflective plates is less than 1 / 2 of a wavelength of the electromagnetic wave.

[0021] Another embodiment of the present disclosure provides a frequency selective reflector group, which has a plurality of frequency selective reflectors that reflect electromagnetic waves in a specific frequency band in a direction different from a normal reflection direction, wherein the plurality of frequency selective reflectors are arranged and configured on a setting surface for use, and the frequency selective reflectors have a second identification mark for identifying the frequency selective reflectors.

[0022] Another embodiment of the present disclosure provides a frequency selective reflector group, which has a plurality of frequency selective reflectors that reflect electromagnetic waves in a specific frequency band in a direction different from a normal reflection direction, wherein the plurality of frequency selective reflectors are arranged and configured on a setting surface for use, the frequency selective reflectors have a reflective component that reflects the electromagnetic waves, a plurality of reflective elements of different sizes are arranged in the reflective component, and arrangements of the reflective elements in the plurality of frequency selective reflectors are different from each other.

[0023] Another embodiment of the present disclosure provides a frequency selective reflector group, which has a plurality of frequency selective reflectors that reflect electromagnetic waves in a specific frequency band in a direction different from a normal reflection direction, wherein the plurality of frequency selective reflectors are arranged and configured on a setting surface for use, and the frequency selective reflectors have, from the setting surface side, a reflective component that reflects the electromagnetic waves, and a dielectric layer that allows the electromagnetic waves to pass therethrough, a plurality of unit regions with different thicknesses are arranged in the dielectric layer, and the arrangements of the unit regions in the plurality of frequency selective reflectors are different from each other.

[0024] Effects of the Invention

[0025] The reflective structure disclosed in the present invention has good reflective properties and can be expanded in area. BRIEF DESCRIPTION OF THE DRAWINGS

[0026] Figure 1 It is a schematic plan view illustrating the reflective structure of the present disclosure.

[0027] Figure 2 It is a schematic plan view illustrating the reflective structure of the present disclosure.

[0028] Figure 3 It is a schematic top view and a cross-sectional view illustrating the reflective structure of the present disclosure.

[0029] Figure 4 These are a schematic plan view and a cross-sectional view illustrating a reflective structure of the present disclosure.

[0030] Figure 5 It is a schematic plan view and a cross-sectional view illustrating the reflection structure of the present disclosure, and is a schematic diagram for explaining the relative reflection phase of electromagnetic waves in each unit area of ​​the unit structure of the dielectric layer in the frequency selective reflector of the present disclosure.

[0031] Figure 6 Schematic diagram illustrating the reflection characteristics of the frequency selective reflection plate of the present disclosure.

[0032] Figure 7 It is a schematic perspective view and a plan view illustrating a unit structure of a dielectric layer in the frequency selective reflector of the present disclosure.

[0033] Figure 8 It is a schematic plan view illustrating a unit structure of a dielectric layer in the frequency selective reflector of the present disclosure.

[0034] Fig. 9 It is a schematic plan view illustrating a frequency selective reflector according to the present disclosure.

[0035] Fig.10 1 is a schematic cross-sectional view illustrating a frequency selective reflector of the present disclosure, and is a schematic diagram for explaining a relative reflection phase of an electromagnetic wave in each unit area of ​​a unit structure of a dielectric layer in the frequency selective reflector of the present disclosure.

[0036] Fig.11 Schematic diagram illustrating the reflection characteristics of the frequency selective reflection plate of the present disclosure.

[0037] Fig.12 It is a schematic plan view illustrating a frequency selective reflector according to the present disclosure.

[0038] Fig.13 1 is a schematic cross-sectional view illustrating a frequency selective reflector of the present disclosure, and is a schematic diagram for explaining a relative reflection phase of an electromagnetic wave in each unit area of ​​a unit structure of a dielectric layer in the frequency selective reflector of the present disclosure.

[0039] Fig.14 Schematic diagram illustrating the reflection characteristics of the frequency selective reflection plate of the present disclosure.

[0040] Fig.15 This is a schematic cross-sectional view illustrating a frequency selective reflector according to the present disclosure.

[0041] Fig.16 1 and 2 are schematic plan views and cross-sectional views of a frequency selective reflector exemplifying the present disclosure.

[0042] Fig.17 1 and 2 are schematic plan views and cross-sectional views of a frequency selective reflector exemplifying the present disclosure.

[0043] Fig.18 This is a schematic cross-sectional view illustrating a frequency selective reflector according to the present disclosure.

[0044] Fig.19 It is a schematic plan view illustrating the reflective structure of the present disclosure.

[0045] Fig. 20 It is a schematic plan view illustrating the reflective structure of the present disclosure.

[0046] Fig.21 It is a schematic plan view illustrating the reflective structure of the present disclosure.

[0047] Fig. 22It is a schematic plan view illustrating the reflective structure of the present disclosure.

[0048] Fig.23 This is a schematic cross-sectional view illustrating the reflective structure of the present disclosure.

[0049] Fig.24 It is a schematic plan view illustrating the reflective structure of the present disclosure.

[0050] Fig.25 It is a schematic plan view illustrating the reflective structure of the present disclosure.

[0051] Fig.26 It is a schematic plan view illustrating the reflective structure of the present disclosure.

[0052] Fig. 27 It is a schematic plan view illustrating the reflective structure of the present disclosure.

[0053] Fig.28 This is a schematic cross-sectional view illustrating the reflective structure of the present disclosure.

[0054] Fig.29 These are a schematic plan view and a cross-sectional view illustrating a reflective structure of the present disclosure.

[0055] Fig.30 It is a schematic plan view illustrating the reflective structure of the present disclosure.

[0056] Fig.31 These are a schematic plan view and a cross-sectional view illustrating a reflective structure of the present disclosure.

[0057] Fig.32 It is a schematic plan view illustrating the reflective structure of the present disclosure.

[0058] Fig.33 3 is a received power distribution diagram showing the simulation results of Comparative Example 1.

[0059] Fig.34 3 is a received power distribution diagram showing the simulation results of Example 1.

[0060] Fig.35 1 is a schematic perspective view showing a simulation model of Reference Example 1, and a graph showing simulation results.

[0061] Fig.36 1 is a schematic perspective view showing a simulation model of Reference Example 2, and a graph showing simulation results.

[0062] Fig.37 is a schematic diagram illustrating an equivalent circuit of a transmission line. DETAILED DESCRIPTION

[0063] Below, the embodiments of the present disclosure are described with reference to the accompanying drawings, etc. However, the present disclosure can be implemented in a variety of different ways, and is not limited to the description of the embodiments illustrated below. In addition, in order to make the description clearer, the drawings sometimes schematically represent the width, thickness, shape, etc. of each part compared to the actual method, but this is just an example and does not limit the interpretation of the present disclosure. In addition, in this specification and each figure, for the figures that have already appeared, the same reference numerals are marked for the elements that are the same as the above-mentioned elements, and the detailed description is sometimes appropriately omitted.

[0064] In this specification, when expressing the configuration of other components on a certain component, if it is simply expressed as "on..." or "below...", unless otherwise specified, it includes the following two cases: the case where other components are configured directly above or directly below the certain component in a manner of contacting the certain component; and the case where another component is further configured above or below the certain component with the other components interposed therebetween. When expressing the configuration of other components above a certain component, if it is simply expressed as "on..." or "below...", unless otherwise specified, it includes any of the following cases: the case where other components are configured directly above or directly below the certain component in a manner of contacting the certain component; the case where another component is further configured above or below the certain component with the other components interposed therebetween; and the case where other components are configured above or below the certain component with a space interposed therebetween. In addition, in this specification, when expressing the form of configuring other components on the surface of a certain component, when it is simply expressed as "on the surface of...", unless otherwise specified, it includes the following two situations: the situation where other components are configured directly above or below a certain component in a manner of being connected to the certain component; and the situation where another component is further configured above or below the certain component through the other components.

[0065] Hereinafter, the reflection structure, the method for manufacturing the reflection structure, and the frequency selective reflection plate set of the present disclosure will be described in detail.

[0066] A. Reflective structure

[0067] The reflective structure disclosed in the present invention has four embodiments. Each embodiment will be described below.

[0068] I. First Embodiment of Reflective Structure

[0069] The first embodiment of the reflective structure disclosed in the present invention is a reflective structure having a frequency selective reflector that reflects electromagnetic waves in a specific frequency band in a direction different from the normal reflection direction, wherein the reflective structure comprises: a substrate having a first alignment mark; and a plurality of the above-mentioned frequency selective reflectors, which are arranged on one surface of the above-mentioned substrate, and the distance between adjacent above-mentioned frequency selective reflectors is less than 1 / 2 of the wavelength of the above-mentioned electromagnetic waves.

[0070] Figure 1 FIG. 1 is a schematic top view showing an example of a reflective structure according to the present embodiment. Figure 1 As shown, the reflective structure 20 has a frequency selective reflector 1 that reflects electromagnetic waves of a specific frequency band in a direction different from the normal reflection direction, and has: a substrate 21 having a first alignment mark 22; and a plurality of frequency selective reflectors 1 arranged on one surface of the substrate 21. The distances d1 and d2 between adjacent frequency selective reflectors 1 are less than 1 / 2 of the wavelength of the electromagnetic waves of the specific frequency band.

[0071] For example, Figure 1 In the embodiment, the substrate 21 has a cross-shaped first alignment mark 22 , and the positions of the edges of the frequency selective reflectors 1 are aligned with reference to the first alignment mark 22 of the substrate 21 , so that the plurality of frequency selective reflectors 1 are aligned.

[0072] Although it is not a reflective array, in a phased array antenna having multiple subarrays arranged therein, in order to align the phases of the electromagnetic waves in each subarray and enhance the intensity of the electromagnetic waves, the distance between adjacent subarrays is usually set to be less than 1 / 2 of the wavelength of the electromagnetic waves.

[0073] Therefore, it can be imagined that even in a reflection structure in which a plurality of frequency selective reflection plates are arranged and configured, for example, in order to make the phases of the reflected waves in each frequency selective reflection plate consistent to enhance the intensity of the reflected waves, thereby suppressing the disorder of the wavefront of the reflected waves in the entire reflection structure, it is preferred to set the distance between adjacent frequency selective reflection plates to be less than 1 / 2 of the wavelength of the electromagnetic wave.

[0074] In this embodiment, by providing the substrate with the first alignment mark, the alignment of multiple frequency selective reflectors can be performed with high precision. Therefore, the accuracy of the distance between adjacent frequency selective reflectors can be ensured. Therefore, multiple frequency selective reflectors can be spliced ​​with high positional accuracy in a manner that the distance between adjacent frequency selective reflectors is less than 1 / 2 of the wavelength of electromagnetic waves in a specific frequency band. Therefore, the disorder of the wavefront of the reflected wave in the entire reflective structure can be suppressed, thereby obtaining the desired reflection characteristics, and the large area of ​​the reflective structure can be achieved.

[0075] Hereinafter, each structure of the reflection structure of this embodiment will be described.

[0076] 1. Substrate

[0077] The base material in this embodiment is a member that supports the frequency selective reflection plate, and has the first alignment mark.

[0078] (1) Base material

[0079] Regarding the substrate, as long as it is a substrate that can support the frequency selective reflector, there is no particular limitation, for example, a resin substrate and a metal substrate can be listed. The resin substrate can be, for example, any of a resin film, a resin sheet and a resin board. In addition, the resin substrate can have a hollow structure like a plastic paperboard, or can also have a multilayer structure. Regarding the metal substrate, for example, a metal plate of aluminum, stainless steel, etc., a plywood such as an aluminum plywood, etc. can be listed.

[0080] The metal substrate is not only excellent in rigidity and durability, but also reflects electromagnetic waves, and therefore is suitable for use in a case where the frequency selective reflector has a ground layer on the surface of the substrate side as described later. In the case where the frequency selective reflector does not have a ground layer, an interference relaxation layer described later may be disposed between the substrate and the frequency selective reflector, or the reflective component of the frequency selective reflector may be designed in consideration of the characteristics of the metal substrate.

[0081] The shape of the substrate is not particularly limited, and is usually rectangular. When a reflective structure is set on a setting surface, the orientation of the surface of the reflective structure in the setting surface is mostly predetermined, but in the design of the reflective structure, when it is difficult to know the orientation of the surface, the substrate may also have a portion indicating the orientation of the surface, such as a chamfered portion formed by cutting off a corner of the substrate, a cut portion such as a so-called notch, or a portion formed by cutting off a portion of a curved portion such as a so-called oriented straight portion. By giving the reflective structure such an asymmetric shape, it is easy to identify the up and down, left and right, and front and back of the reflective structure, so that the reflective structure can be set in the correct orientation.

[0082] The substrate may be light-transmitting or light-opaque. These optical properties of the substrate are appropriately selected according to the detection method of the first alignment mark, the configuration of the first alignment mark, and the like. For example, in the case where the first alignment mark is detected using transmitted light, the substrate is light-transmitting. In addition, for example, in the case where the first alignment mark is detected using reflected light, the substrate may be light-transmitting or light-opaque. In addition, as described later, for example, in the case where the first alignment mark is configured on the surface of the substrate on the opposite side of the frequency selective reflector, the substrate is light-transmitting.

[0083] It should be noted that, in this specification, "light transmissivity" refers to transmissivity to visible light, and "light opacity" refers to opacity to visible light.

[0084] In addition, the base material may have X-ray transparency. When the base material has X-ray transparency, the first alignment mark can be detected by transmitting X-rays.

[0085] The transmittance of the substrate is not particularly limited as long as the first alignment mark can be detected by transmitted light or reflected light, and can be appropriately set according to the material, thickness, etc. of the substrate.

[0086] The resin constituting the resin substrate is not particularly limited, and examples thereof include engineering plastics.

[0087] Furthermore, the resin base material may contain additives such as an ultraviolet absorber, a light stabilizer, an antioxidant, and a colorant as necessary.

[0088] The thickness of the substrate is not particularly limited.

[0089] (2) First alignment mark

[0090] The first alignment mark is a mark for aligning the frequency selective reflection plate.

[0091] The first alignment mark may also be opaque. In addition, the first alignment mark may also be reflective. These optical properties of the first alignment mark are appropriately selected depending on whether the first alignment mark is detected by transmitted light or reflected light. For example, when the first alignment mark is detected by transmitted light, the first alignment mark is opaque. In addition, for example, when the first alignment mark is detected by reflected light, the first alignment mark is reflective.

[0092] In addition, in this specification, "light reflectivity" means reflectivity with respect to visible light.

[0093] In addition, the first alignment mark may have X-ray transparency. When the substrate and the first alignment mark have X-ray transparency, the first alignment mark can be detected by transmitting X-rays.

[0094] The transmittance and reflectance of the first alignment mark are not particularly limited as long as the first alignment mark can be detected by transmitted light or reflected light, and can be appropriately set according to the material, thickness, etc. of the first alignment mark.

[0095] Alternatively, the first alignment mark may be a through hole penetrating the substrate.

[0096] The top view shape of the first alignment mark is not particularly limited and is the same as the top view shape of a general alignment mark. Regarding the top view shape of the first alignment mark, for example, a cross shape, an X shape, a field shape, a well shape, a circle shape, a quadrilateral shape, a triangle shape, a double circle shape, a double quadrilateral shape, a hollow circle shape, a hollow quadrilateral shape, and a combination thereof can be listed.

[0097] The size and line width of the first alignment mark are not particularly limited as long as the first alignment mark can be detected and the distance between adjacent frequency selective reflection plates is not prevented from being set within a predetermined range.

[0098] The number of the first alignment marks is not particularly limited as long as the alignment of a plurality of frequency selective reflection plates can be performed.

[0099] The position of the first alignment mark on the substrate is appropriately set according to the desired positions where the plurality of frequency selective reflectors are to be arranged.

[0100] The first alignment mark may be disposed on the surface of the substrate on the frequency selective reflector side, or on the surface of the substrate on the opposite side of the frequency selective reflector. In addition, a protective layer or other covering layer may be disposed on the first alignment mark as long as it does not hinder the detection of the first alignment mark.

[0101] The thickness of the first alignment mark is not particularly limited as long as it is a thickness that can form the first alignment mark with high accuracy, and can be appropriately adjusted according to the optical characteristics of the first alignment mark and the like.

[0102] The material of the first alignment mark may be, for example, a metal material such as a metal, an alloy, a metal oxide, a metal nitride, or a resin. In the case of a resin, a colorant may be added. Among them, if the influence of the first alignment mark on the reflection of electromagnetic waves is considered, a resin is preferably used.

[0103] The method for forming the first alignment mark is appropriately selected according to the material of the first alignment mark, etc. In the case of a metal material, the method for forming the first alignment mark can be, for example, photolithography, mask evaporation, stripping, and printing. In the case of a resin, the method for forming the first alignment mark can be, for example, photolithography and printing. As the printing method, general methods such as inkjet, screen printing, and transfer can be used.

[0104] (3) First identification mark

[0105] In this embodiment, for example, Figure 2 As shown, the substrate 21 may also have a first identification mark 23 for identifying the position of the frequency selective reflection plate 1. Figure 2 In the embodiment, the substrate 21 has the first identification mark 23 such as "No1", "No2", "No3", and "No4". By providing the substrate with the first identification mark, the position of each frequency selective reflection plate can be easily identified, so each frequency selective reflection plate can be reliably and easily arranged at the correct position. In particular, as described later, this is useful when the reflection characteristics of the plurality of frequency selective reflection plates are different from each other.

[0106] The first identification mark may also be opaque. In addition, the first identification mark may also be reflective. As with the first alignment mark, these optical properties of the first identification mark are appropriately selected depending on whether the first identification mark is detected by transmitted light or reflected light.

[0107] The transmittance and reflectance of the first identification mark are not particularly limited as long as the first identification mark can be detected by transmitted light or reflected light, and can be appropriately set according to the material, thickness, etc. of the first identification mark.

[0108] The first identification mark is not particularly limited as long as it is a mark that can be recognized, and can include, for example, text, symbols, and graphics. Specifically, it can include codes. In addition, the first identification mark can also be data that can be optically recognized (Optical Character Recognition; OCR).

[0109] The size and line width of the first identification mark are not particularly limited as long as the first identification mark can be detected.

[0110] The position of the first identification mark on the substrate is not particularly limited as long as the position of each frequency selective reflector can be identified.

[0111] The first identification mark may be disposed on the surface of the substrate on the frequency selective reflector side, or on the surface of the substrate on the opposite side of the frequency selective reflector. In addition, any covering layer such as a protective layer may be disposed on the first identification mark as long as it does not hinder the detection of the first identification mark.

[0112] The thickness, material, and forming method of the first identification mark are the same as those of the first alignment mark.

[0113] When the material of the first identification mark is the same as that of the first alignment mark, the first alignment mark and the first identification mark can be formed simultaneously.

[0114] 2. Frequency selective reflector

[0115] The frequency selective reflector in this embodiment is a member that reflects electromagnetic waves in a specific frequency band in a direction different from the regular reflection direction.

[0116] (1) Distance between adjacent frequency selective reflectors

[0117] In the present embodiment, the distance between adjacent frequency selective reflectors is less than 1 / 2 of the wavelength of the electromagnetic wave of a specific frequency band, preferably less than 1 / 5, and more preferably less than 1 / 10. By making the distance between adjacent frequency selective reflectors within the above range, the disorder of the wavefront of the reflected wave in the entire reflective structure can be suppressed. As described later, the frequency band of the electromagnetic wave is preferably above 2.5 GHz, and more preferably above 24 GHz. That is, the wavelength of the electromagnetic wave in the air is preferably below 119.92 mm, and more preferably below 12.49 mm. Therefore, specifically, the distance between adjacent frequency selective reflectors is preferably below 59.96 mm, and more preferably below 6.245 mm. In addition, the shorter the distance between adjacent frequency selective reflectors, the more preferred, and the lower limit is not particularly limited.

[0118] (2) Implementation Method of Frequency Selective Reflector

[0119] A frequency selective reflector can be any component that reflects electromagnetic waves of a specific frequency band in a direction different from the normal reflection direction. For example, it may be a reflector having a reflective component that reflects the electromagnetic waves, and the reflector having a reflection phase control function that controls the reflection phase of the electromagnetic waves. Alternatively, it may be a reflector having, from a substrate side, a reflective component that reflects the electromagnetic waves, and a dielectric layer having a concave-convex structure that allows the electromagnetic waves to pass therethrough, wherein the concave-convex structure is configured with a plurality of unit structures having a thickness distribution in which the thickness increases in a specified direction.

[0120] The frequency selective reflector is described below in the first and second modes, wherein in the first mode, the frequency selective reflector has a reflective component for reflecting the electromagnetic wave, and the reflective component has a reflection phase control function for controlling the reflection phase of the electromagnetic wave; and in the second mode, the reflective component for reflecting the electromagnetic wave and a dielectric layer having a concave-convex structure and allowing the electromagnetic wave to pass therethrough are sequentially provided from the substrate side, wherein the concave-convex structure is configured with a plurality of unit structures having a thickness distribution with increasing thickness in a prescribed direction.

[0121] (2-1) First Embodiment of Frequency Selective Reflector

[0122] A first aspect of the frequency selective reflector in the present embodiment includes a reflecting member that reflects the electromagnetic wave, and the reflecting member has a reflection phase control function that controls a reflection phase of the electromagnetic wave.

[0123] (a) Reflective components

[0124] The reflecting member in this embodiment reflects electromagnetic waves in a specific frequency band and has a reflection phase control function for controlling the reflection phase of the electromagnetic waves.

[0125] In this embodiment, the reflecting member generally has a wavelength selection function of reflecting only electromagnetic waves in a specific frequency band. As such a reflecting member, a frequency selective plate can be cited, for example.

[0126] The frequency selective plate has a frequency selective surface (FSS) for controlling reflection and transmission of electromagnetic waves of a specific frequency band, and when it functions as a reflector for electromagnetic waves of a specific frequency band, a plurality of reflective elements (scattering elements) are arranged in the surface. As the frequency selective plate, for example, there can be cited a frequency selective plate having a dielectric substrate and a plurality of reflective elements arranged on the surface of the dielectric substrate on the electromagnetic wave incident side.

[0127] Figure 3 (a) and (b) are a schematic plan view and a cross-sectional view showing an example of a reflection structure having a frequency selective reflection plate of the present embodiment. Figure 3 (b) is Figure 3 (a) AA line cross-sectional view. Figure 3 As shown in (a) and (b), the frequency selective reflection plate 1 has a reflection component 2 for reflecting electromagnetic waves of a specific frequency band, and the reflection component 2 is a component in which a plurality of annular reflection elements 3 are arranged. The reflection component 2 has a dielectric substrate 4 and a plurality of reflection elements 3 arranged on the surface of the dielectric substrate 4 on the opposite side to the base material 21 (the surface on the electromagnetic wave incident side). Figure 3 (a) and (b) are examples where the reflective component 2 is a frequency selective plate. The reflective component 2 has a reflection phase control function for controlling the reflection phase of the electromagnetic wave, for example, Figure 3 In the reflecting component 2 shown in (a) and (b), by changing the size of the reflecting element 3, the resonant frequency of each reflecting element 3 can be changed, so that the reflection phase of the electromagnetic wave as the object can be controlled. Thus, the reflection direction of the electromagnetic wave relative to the specified incident direction can be controlled to an arbitrary direction.

[0128] Figure 4 (a) to (c) are schematic plan views and cross-sectional views showing another example of a reflection structure having a frequency selective reflection plate of the present embodiment. Figure 4 (a) is a top view observed from one surface Sf1 of the frequency selective reflector. Figure 4 (b) is a top view observed from the other surface Sf2 of the frequency selective reflector. Figure 4 (c) is Figure 4 (a) and Figure 4 (b) AA line cross-sectional view. Figure 4As shown in (a) to (c), the frequency selective reflector 1 has a reflecting component 2 for reflecting electromagnetic waves of a specific frequency band, the reflecting component 2 is a component in which a plurality of annular reflecting elements 3 are arranged, and the reflecting component 2 has a dielectric substrate 4, a plurality of reflecting elements 3a arranged on the surface of the dielectric substrate 4 on the opposite side to the substrate 21 (the surface on the electromagnetic wave incident side), and a plurality of reflecting elements 3b arranged on the surface of the dielectric substrate 4 on the substrate 21 side. Figure 4 (a) to (c) are examples where the reflector 2 is a frequency selective plate. The reflector 2 has a reflection phase control function for controlling the reflection phase of the electromagnetic wave, for example, Figure 4 In the reflecting component 2 shown in (a) to (c), by changing the size of the reflecting element 3a, the resonant frequency of each reflecting element 3a can be changed, so that the reflection phase of the electromagnetic wave as the object can be controlled. Thus, the reflection direction of the electromagnetic wave relative to the specified incident direction can be controlled to an arbitrary direction.

[0129] The frequency selective board can be appropriately selected from known frequency selective boards and used.

[0130] The shape of the reflective element forming the frequency selective surface is not particularly limited, and examples thereof include planar patterns such as rings, crosses, squares, rectangles, circles, ellipses, rods, patterns divided into a plurality of adjacent regions, and arbitrary shapes such as three-dimensional structures based on through holes.

[0131] In addition, the reflective element may be, for example, a single layer or a multilayer. In the case where the reflective element is a single layer, the frequency selective plate may be, for example, Figure 3 A frequency selective plate in which a plurality of reflective elements are arranged on a single surface of a dielectric substrate as shown in (a) to (b) of FIG. 1 . In addition, when the reflective element is multilayered, examples of the frequency selective plate include: Figure 4 A frequency selective plate having a plurality of reflection elements arranged on both sides of a dielectric substrate as shown in (a) to (c), a frequency selective plate having a dielectric substrate, a plurality of reflection elements, a dielectric substrate and a plurality of reflection elements arranged in sequence, and a frequency selective plate having a single-sided conductor arranged on the surface farthest from the incident side of the electromagnetic wave. The single-sided conductor has the function of a ground layer described later, but the plurality of reflection elements located on the surface closer to the incident side of the electromagnetic wave than the ground layer are designed on the premise that the ground layer exists.

[0132] In this method, the reflection component has a reflection phase control function for controlling the reflection phase of the electromagnetic wave. In such a reflection component, by changing the size and shape of the reflection element, the resonant frequency of each reflection element can be changed, thereby controlling the reflection phase of the electromagnetic wave, thereby controlling the reflection direction of the electromagnetic wave incident from a specified direction.

[0133] As a reflective member having a reflection phase control function, a general frequency selective surface can be applied. These have their own advantages and disadvantages in design, but they can change the reflection phase of electromagnetic waves by changing the size and shape of the reflective element.

[0134] The different sizes of the reflective element are appropriately selected according to the shape of the reflective element.

[0135] The dielectric substrate may be light-transmissive or light-impermeable.

[0136] (b) Other structures

[0137] The frequency selective reflector of this aspect may have other structures as necessary in addition to the above-mentioned reflecting member.

[0138] (i) Protective components

[0139] The frequency selective reflector of this embodiment may also have a protective component on the surface of the reflector on the opposite side of the substrate. The protective component can protect the reflector. In addition, the protective component can also be used to impart design properties.

[0140] (ii) Ground plane

[0141] The frequency selective reflector of this mode may also have a grounding layer on the surface of the substrate side of the reflector. The grounding layer can block interference with an object on the back of the frequency selective reflector and suppress the generation of noise. As the grounding layer, any conductive layer may be used as long as it has conductivity, for example, a metal layer, a metal mesh, a carbon film, an ITO film or other general conductive layer.

[0142] (iii) Planarization layer

[0143] The frequency selective reflector of this method may also have a flattening layer on the surface of the reflective component on the opposite side of the substrate. In the case where the reflective component is a component in which a plurality of reflective elements are arranged, the flattening layer can flatten the unevenness caused by the reflective elements, and the influence of the unevenness caused by the reflective elements when the protective component is arranged on the reflective component can be suppressed. As the flattening layer, an ionizing radiation cured resin layer arranged in a state of embedding the reflective element can be exemplified. In addition, in the case of a method in which a space is provided between the reflective component and the protective component, the flattening layer can also have the function of protecting the reflective element.

[0144] (2-2) Second Embodiment of Frequency Selective Reflector

[0145] The second mode of the frequency selective reflector in this embodiment has, from the above-mentioned substrate side, a reflective component that reflects the above-mentioned electromagnetic waves, and a dielectric layer having a concave-convex structure and allowing the above-mentioned electromagnetic waves to pass therethrough, wherein the concave-convex structure is configured with a plurality of unit structures having a thickness distribution with increasing thickness in a prescribed direction. In the frequency selective reflection plate of this method, the unit structure of the dielectric layer has a plurality of unit areas with different thicknesses. In each unit structure of the dielectric layer, the length of the unit structure in the specified direction is set as the horizontal axis, the relative reflection phase when the electromagnetic wave passes through the dielectric layer and is reflected by the reflection component and passes through the dielectric layer again and is emitted to the incident side of the electromagnetic wave is set as the vertical axis, and in a curve graph where the value of the relative reflection phase of the electromagnetic wave exceeds -360 degrees and is below 0 degrees, points corresponding to the center position of each unit area in the specified direction and the relative reflection phase of the electromagnetic wave in each unit area are drawn, and a straight line passing through the point corresponding to the minimum thickness unit area with the minimum thickness is drawn, at this time, each point is on the same straight line, the dielectric layer has at least the first unit structure as the unit structure, the first unit structure has more than three unit areas with different thicknesses, the relative reflection phase distribution of the electromagnetic wave is controlled by the thickness distribution of the dielectric layer, thereby controlling the reflection direction of the electromagnetic wave.

[0146] Figure 5 (a) and (b) are a schematic plan view and a cross-sectional view showing an example of a reflection structure having a frequency selective reflection plate of the present embodiment. Figure 5 (b) is Figure 5 (a) AA line cross-sectional view. Figure 5 As shown in (a) and (b), the frequency selective reflector 1 has, from the substrate 21 side, a reflective component 2 that reflects specific electromagnetic waves, and a dielectric layer 5 that has a concave-convex structure and allows specific electromagnetic waves to pass through, and the concave-convex structure is configured with a plurality of unit structures 10 having a thickness distribution with increasing thickness t1 to t6 in a predetermined direction D1. In addition, the frequency selective reflector 1 may have an adhesive layer 6 between the reflective component 2 and the dielectric layer 5. The unit structure 10 of the dielectric layer 5 has a plurality of unit areas 11a to 11f with different thicknesses t1 to t6. For example, in Figure 5In (b), the unit structure 10 of the dielectric layer 5 has a step shape in which the thickness t1 to t6 increases stepwise in a predetermined direction D1, the number of the step shape is 6, and the unit structure 10 of the dielectric layer 5 has 6 unit regions 11a to 11f. In each unit region 11a to 11f of the unit structure 10 of the dielectric layer 5, since the thickness t1 to t6 are different, the reciprocating optical path lengths when the electromagnetic wave passes through the dielectric layer 5 and is reflected by the reflective component 2 and passes through the dielectric layer 5 again and is emitted to the incident side of the electromagnetic wave are different, and the difference in the reciprocating optical path lengths in these dielectric layers, that is, the optical path difference, will produce a difference in the relative reflection phase.

[0147] Here, in this specification, the term "optical path length" is used because the wavelength of the frequency band used as the subject of this disclosure is closer to light than the previous frequency band before LTE, and the straightness is also higher, so it is easier to explain by describing it as an action similar to light. It actually refers to the effective distance when electromagnetic waves pass through the dielectric layer.

[0148] Moreover, in the unit structure 10 of the dielectric layer 5, the length L of the unit structure 10 in the prescribed direction D1 is set as the horizontal axis, the relative reflection phase when the electromagnetic wave passes through the dielectric layer 5 and is reflected by the reflecting component 2 and passes through the dielectric layer 5 again and is emitted to the incident side of the electromagnetic wave is set as the vertical axis, and in a curve graph where the value of the relative reflection phase of the electromagnetic wave exceeds -360 degrees and is below 0 degrees, points corresponding to the center position of each unit area in the prescribed direction D1 and the relative reflection phase of the electromagnetic wave in each unit area are drawn, and a straight line passing through the point corresponding to the minimum thickness unit area with the minimum thickness is drawn, and at this time, each point is on the same straight line.

[0149] Figure 5 (c) is a graph in which the length L of the unit structure 10 of the dielectric layer 5 in the predetermined direction D1 is set as the horizontal axis, and the relative reflection phase when the electromagnetic wave passes through the dielectric layer 5 and is reflected by the reflective component 2 and passes through the dielectric layer 5 again and is emitted to the incident side of the electromagnetic wave is set as the vertical axis, and the value of the relative reflection phase of the electromagnetic wave exceeds -360 degrees and is less than 0 degrees, and is Figure 5 Examples of the relative reflection phase of electromagnetic waves in each unit area of ​​the unit structure of the dielectric layer in the frequency selective reflector shown in (a) and (b). Figure 5As shown in (c), the relative reflection phases of the electromagnetic waves in each unit area 11a to 11f of the unit structure 10 of the dielectric layer 5 are 0 degrees, -60 degrees, -120 degrees, -180 degrees, -240 degrees, and -300 degrees, respectively, and the absolute value of the difference in the relative reflection phases of the electromagnetic waves in adjacent unit areas is 60 degrees. In this case, the thicknesses t1 to t6 of the six unit areas 11a to 11f of the unit structure 10 of the dielectric layer 5 are designed so that the absolute value of the difference in the relative reflection phases of the electromagnetic waves in adjacent unit areas is 360 degrees divided by 6, that is, 60 degrees. And, as Figure 5 As shown in (c), points corresponding to the center positions of each unit area 11a~11f of the unit structure 10 of the dielectric layer 5 in the specified direction D1 and the relative reflection phases of the electromagnetic waves in each unit area 11a~11f are drawn, and a straight line (solid line in the curve graph) passing through the points corresponding to the minimum thickness unit area 11a with the minimum thickness t1 in each unit area 11a~11f is drawn. At this time, each point is on the same straight line.

[0150] Here, in this specification, "reflection phase" refers to the change in phase of the reflected wave relative to the phase of the incident wave incident on a certain surface. However, in the frequency selective reflector having a reflective component and a dielectric layer of this method, "reflection phase" refers to the change in phase of the reflected wave relative to the phase of the incident wave when the incident wave passes through the dielectric layer and is reflected by the reflective component and passes through the dielectric layer again and is emitted.

[0151] In addition, in this specification, "relative reflection phase" refers to the concept that, in one unit structure of the dielectric layer, the reflection phase in the unit region with the least delay in the reflection phase is used as a reference, and the delay of the reflection phase in a certain unit region relative to the reference reflection phase is expressed with a negative sign. For example, in one unit structure of the dielectric layer, when the reflection phase in the unit region with the least delay in the reflection phase is -10 degrees, the relative reflection phase in the unit region with a reflection phase of -40 degrees is -30 degrees.

[0152] In addition, as described later, when the reflecting member has a reflection phase control function, the relative reflection phase of the electromagnetic wave in the unit area is a value obtained by synthesizing the reflection phase in the reflecting member.

[0153] In this specification, a "unit region" refers to a region where the relative reflection phase of electromagnetic waves is the same in a unit structure of a dielectric layer.

[0154] In addition, unless otherwise specified, the reflection phase is within the range of more than -360 degrees and less than 360 degrees, and -360 degrees and +360 degrees return to 0 degrees. In addition, unless otherwise specified, the relative reflection phase is within the range of more than -360 degrees and less than 0 degrees, and -360 degrees returns to 0 degrees.

[0155] In a conventional reflective array in which a plurality of reflective elements are arranged, the reflection phase can be delayed or advanced by adjusting the size and shape of the reflective element, but in the frequency selective reflector of this embodiment, the reflection phase is basically delayed by adjusting the thickness of each unit region of the unit structure of the dielectric layer. Therefore, the relative reflection phase is based on the reflection phase in the unit region with the least delay in the reflection phase.

[0156] In addition, generally, in one unit structure of the dielectric layer, the unit region with the least delay in the reflection phase is the minimum thickness unit region having the minimum thickness in the specified direction of increasing thickness. Therefore, in the above-mentioned curve graph, a straight line passing through the point corresponding to the minimum thickness unit region having the minimum thickness is drawn.

[0157] As described above, in each unit region 11a to 11f of the unit structure 10 of the dielectric layer 5, by changing the thickness t1 to t6, the round-trip optical path length in the dielectric layer 5 changes, and the relative reflection phase of the electromagnetic wave changes. Figure 6 As illustrated, the incident wave W1 of the electromagnetic wave can be reflected in a direction different from the regular reflection (specular reflection) direction. In this case, the incident angle θ1 of the incident wave W1 of the electromagnetic wave is different from the reflection angle θ2 of the reflected wave W2 of the electromagnetic wave.

[0158] Therefore, in the frequency selective reflector of this method, by changing the thickness of each unit area of ​​the unit structure of the dielectric layer, the reciprocating optical path length in the dielectric layer can be changed for each unit area, thereby controlling the reflection phase of the electromagnetic wave. Thus, the reflection direction of the electromagnetic wave relative to the specified incident direction can be controlled to an arbitrary direction.

[0159] In addition, the concave-convex structure of the dielectric layer in this method can be formed by various methods such as cutting, laser processing, shaping using a mold, 3D printer, and joining of small pieces of parts. Therefore, there is no need for a photomask like the photolithography processing of the metal layer in the previous reflective array. Therefore, when the thickness of each unit area of ​​the unit structure of the dielectric layer is designed in a way that the reflection characteristics with the target incident angle and the target reflection angle are formed corresponding to the situation, the desired dielectric layer can be formed in a short period of time at a relatively low cost, so that it is easy to cope with the needs of a small amount of multiple varieties. In addition, regarding the thickness of the dielectric layer that affects the control of the reflection characteristics and the size of the unit structure of the dielectric layer, since the processable range is relatively wide, for example, the incident angle / reflection angle of the electromagnetic wave can also be increased, so that the control area of ​​the reflection characteristics can be expanded. Furthermore, regarding the thickness of the dielectric layer and the spacing of the unit area of ​​the unit structure of the dielectric layer, since the margin of the dimensional processing accuracy used to achieve the desired reflection phase is relatively wide, it is easy to obtain the desired reflection characteristics and the influence of dimensional deviation can also be reduced. Therefore, it is easy to customize the reflection characteristics of the frequency selective reflector.

[0160] In the frequency selective reflector of this embodiment, the reflective member can be a frequency selective reflector that reflects only specific electromagnetic waves. Figure 5 In (a) and (b), the reflective component 2 is a reflective component in which a plurality of annular reflective elements 3 are arranged, and includes a dielectric substrate 4 and the plurality of reflective elements 3 arranged on a surface of the dielectric substrate 4 on the dielectric layer 5 side.

[0161] Furthermore, in the frequency selective reflector of the present method, the reflective component may be a frequency selective plate that reflects only a specific electromagnetic wave, and may be a component having a reflection phase control function that controls the reflection phase of the electromagnetic wave. In such a reflective component, by changing the size and shape of the reflective element, the resonant frequency can be changed for each reflective element, thereby controlling the reflection phase of the electromagnetic wave as the object. In this case, the reflection phase of the electromagnetic wave can be controlled not only by the thickness of the dielectric layer but also by the size or shape of the reflective element, and the design freedom related to the control of the reflection characteristics can be improved.

[0162] Therefore, in the frequency selective reflector of this method, when the above-mentioned reflective component is used, by combining it with the above-mentioned dielectric layer, the degree of freedom of control of the reflection characteristics can be expanded. Therefore, the reflection characteristics of the frequency selective reflector can be customized more easily. For example, the following application is one example: regarding the reflection characteristics in the up and down directions, a plurality of types are prepared in advance in the reflective component, and combined with a dielectric layer that adjusts the reflection characteristics in the horizontal direction.

[0163] In addition, the inventor of the present disclosure uses a frequency selective reflector having a reflective component and a dielectric layer in the present mode as a frequency selective plate having a reflective element that reflects only specific electromagnetic waves. In this case, the reflection characteristics of electromagnetic waves in a specific frequency band are simulated. As a result, it is found that the shift of the reflection phase when the thickness of the unit area of ​​the unit structure of the dielectric layer is changed and the reciprocating optical path length in the dielectric layer is changed according to each unit area is larger than the shift of the reflection phase in the reflective element caused by the dielectric layer approaching the reflective component (frequency selective plate). The design of the actual reflection characteristics can be roughly determined by the design of the concave-convex structure of the dielectric layer. At this time, the resonant frequency of the reflective element varies depending on whether there is a dielectric layer close to it, but if the design is performed under the premise of the existence of the dielectric layer, the practical problem can be eliminated. It is further found that the in-plane configuration of the concave-convex structure of the dielectric layer that realizes the in-plane distribution design of the reflection phase in the frequency selective reflector does not need to be in a fixed positional relationship relative to the in-plane configuration of the reflective element of the reflective component. Even if the concave-convex structure of the dielectric layer is configured in a staggered manner relative to the in-plane configuration of the reflective element, it will not have a significant impact on the reflection characteristics.

[0164] Therefore, in the frequency selective reflector of the present embodiment, when the above-mentioned dielectric layer and the above-mentioned reflecting component are combined together, the dielectric layer and the reflecting component can be independently designed and combined. In this case, a dielectric layer that realizes reflection characteristics corresponding to the use environment can be produced each time, and a plurality of specifications can be prepared in advance. Therefore, the reflection direction design of the frequency selective reflector that changes according to the use environment can be customized more easily, so that it can be easily applied to various situations. In addition, as described above, when the reflection characteristics of the entire frequency selective reflector are adjusted by a combination of the reflection phase distributions of the reflecting component and the dielectric layer, the accuracy of the configuration offset of the reflecting component and the dielectric layer is required according to the required specifications, but when the reflection characteristics of the frequency selective reflector are adjusted only by the reflection phase distribution of the dielectric layer, the accuracy of the configuration offset of the reflecting component and the dielectric layer is hardly required.

[0165] In addition, when a dielectric layer is formed using a 3D printer, for example, a plurality of frequency selective reflectors can be manufactured simultaneously by using a plurality of 3D printers. Therefore, by splicing the frequency selective reflectors, the manufacturing time of the reflective structure can be shortened.

[0166] In addition, the frequency selective reflector of this embodiment has the advantage of greater freedom in the thickness and size of the substrate, compared with the case where the reflective component has a reflective layer arranged in contact with the substrate in the reflective structure of the second embodiment described later, or the case where the reflective component has a plurality of reflective elements arranged in contact with the substrate.

[0167] Hereinafter, each structure of the frequency selective reflector of this embodiment will be described.

[0168] (a) Dielectric layer

[0169] The dielectric layer in this embodiment is a component having a concave-convex structure and allowing electromagnetic waves of a specific frequency band to pass through, and the concave-convex structure is configured with a plurality of unit structures having a thickness distribution with increasing thickness in a specified direction. In addition, the unit structure of the dielectric layer has a plurality of unit regions with different thicknesses. In each unit structure of the dielectric layer, in a graph where the length of the unit structure in a specified direction is set as the horizontal axis, the relative reflection phase when the electromagnetic wave passes through the dielectric layer and is reflected by the reflection component and passes through the dielectric layer again and is emitted to the incident side of the electromagnetic wave is set as the vertical axis, and the value of the relative reflection phase of the electromagnetic wave exceeds -360 degrees and is below 0 degrees, the center position of each unit region in the specified direction and the relative reflection phase of the electromagnetic wave in each unit region are drawn, and a straight line passing through the point corresponding to the minimum thickness unit region with the minimum thickness is drawn, and at this time, each point is on the same straight line. In addition, the dielectric layer has at least a first unit structure as a unit structure, and the first unit structure has more than three unit regions with different thicknesses.

[0170] (i) Structure of dielectric layer

[0171] The dielectric layer has a concavo-convex structure in which a plurality of unit structures are arranged, and the unit structure has a thickness distribution in which the thickness increases in a predetermined direction.

[0172] The unit structure of the dielectric layer has multiple unit areas with different thicknesses. In each unit structure of the dielectric layer, in a curve graph with the length of the unit structure in the above-specified direction as the horizontal axis, the relative reflection phase when the electromagnetic wave passes through the dielectric layer and is reflected by the reflecting component and passes through the dielectric layer again and is emitted to the incident side of the electromagnetic wave as the vertical axis, and the value of the relative reflection phase of the electromagnetic wave exceeds -360 degrees and is below 0 degrees, points corresponding to the center position of each unit area in the above-specified direction and the relative reflection phase of the electromagnetic wave in each unit area are drawn, and a straight line passing through the point corresponding to the minimum thickness unit area with the minimum thickness is drawn, and at this time, each point is on the same straight line.

[0173] In addition, each point being on the same straight line means that the difference of each point in the longitudinal direction relative to the straight line is within ±72 degrees. The above-mentioned difference of each point in the longitudinal direction relative to the straight line is preferably within ±54 degrees, more preferably within ±36 degrees, and further preferably within ±18 degrees. It should be noted that in the case where each point contains an offset in the longitudinal direction relative to the above-mentioned straight line and it is difficult to draw a straight line passing through each point, it can be considered to "connect the point corresponding to the minimum thickness unit area with the minimum thickness (the relative reflection phase is 0 degrees) and the point corresponding to the minimum thickness unit area with the minimum thickness in the adjacent unit structure of the unit structure (regarded as having a relative reflection phase of -360 degrees)".

[0174] The unit structure of the dielectric layer has a thickness distribution in which the thickness increases in a predetermined direction. The unit structure of the dielectric layer may have a thickness distribution in which the thickness increases in only one direction, or may have a thickness distribution in which the thickness increases in both a first direction and a second direction perpendicular to the first direction. For example, Figure 7 (a) is an example in which the unit structure 10 of the dielectric layer has a thickness distribution in which the thickness increases only in the first direction D1, Figure 7 (c), (e), Figure 8 (a) is an example in which the unit structure 10 of the dielectric layer has a thickness distribution in which the thickness increases in the first direction D1 and the second direction D2.

[0175] In the case where the unit structure of the dielectric layer has a thickness distribution in which the thickness increases in only one direction, the above points are plotted in the above graph with the length of the unit structure in the one direction as the horizontal axis, and in this case, the points are on the same straight line. In addition, in the case where the unit structure of the dielectric layer has a thickness distribution in which the thickness increases in two directions perpendicular to each other, the above points are plotted in the above graphs with the lengths of the unit structures in the two directions as the horizontal axes, and in this case, the points are on the same straight line in each graph.

[0176] In one unit structure of the dielectric layer, the absolute value of the relative reflection phase difference of the electromagnetic waves in adjacent unit regions is less than 180 degrees, preferably less than 120 degrees, and more preferably less than 60 degrees. The smaller the absolute value of the relative reflection phase difference of the electromagnetic waves in adjacent unit regions, the smoother the wavefront of the reflected wave can be. In addition, the absolute value of the relative reflection phase difference of the electromagnetic waves in adjacent unit regions exceeds 0 degrees.

[0177] In addition, in adjacent unit structures, when a maximum thickness unit region with a maximum thickness in the unit structure of one side and a minimum thickness unit region with a minimum thickness in the unit structure of the other side are adjacent, the relative reflection phase of the electromagnetic wave in the minimum thickness unit region with a minimum thickness in the unit structure of the other side is expressed as a range exceeding -720 degrees and below -360 degrees by an amount offset by one cycle, based on the reflection phase in the unit region with the least delay in the reflection phase in the unit structure of one side. At this time, the absolute value of the difference between the relative reflection phase of the electromagnetic wave in the maximum thickness unit region with a maximum thickness in the unit structure of one side and the relative reflection phase of the electromagnetic wave in the minimum thickness unit region with a minimum thickness in the unit structure of the other side is less than 180 degrees, preferably less than 120 degrees, and more preferably less than 60 degrees. The smaller the absolute value of the difference in the relative reflection phase of the electromagnetic waves in these adjacent unit regions, the smoother the wavefront of the reflected wave can be. In addition, the absolute value of the difference in the relative reflection phase of the electromagnetic waves in these adjacent unit regions exceeds 0 degrees. For example, in Figure 5 In (c), in adjacent unit structures 10a and 10b, the relative reflection phase of the electromagnetic wave in the maximum thickness unit region 11f with the maximum thickness t6 of the unit structure 10a on one side is -300 degrees, and the relative reflection phase of the electromagnetic wave in the minimum thickness unit region 11a with the minimum thickness t1 of the unit structure 10b on the other side is -360 degrees, and the absolute value of the difference between the relative reflection phase of the electromagnetic wave in the maximum thickness unit region 11f with the maximum thickness t6 of the unit structure 10a on one side and the relative reflection phase of the electromagnetic wave in the minimum thickness unit region 11a with the minimum thickness t1 of the unit structure 10b on the other side is 60 degrees.

[0178] In addition, in one unit structure of the dielectric layer, the difference in relative reflection phase of electromagnetic waves in adjacent unit regions is preferably equal. Figure 5 As shown in (b), when the unit structure 10 of the dielectric layer 5 has 6 unit regions, it is preferred that the relative reflection phase difference of the electromagnetic waves in the adjacent unit regions 11a and 11b, the relative reflection phase difference of the electromagnetic waves in the adjacent unit regions 11b and 11c, the relative reflection phase difference of the electromagnetic waves in the adjacent unit regions 11c and 11d, the relative reflection phase difference of the electromagnetic waves in the adjacent unit regions 11d and 11e, and the relative reflection phase difference of the electromagnetic waves in the adjacent unit regions 11e and 11f are respectively equal. For example, in Figure 5 In (c), the absolute values ​​of the differences in relative reflection phases of electromagnetic waves in adjacent unit areas are all equal to 60 degrees.

[0179] In addition, in adjacent unit structures, when a maximum thickness unit region with a maximum thickness in the unit structure of one side is adjacent to a minimum thickness unit region with a minimum thickness in the unit structure of the other side, the relative reflection phase of the electromagnetic wave in the minimum thickness unit region with a minimum thickness in the unit structure of the other side is expressed in a range exceeding -720 degrees and below -360 degrees by an amount offset by one cycle, with the reflection phase in the unit region with the least delay in the reflection phase in the unit structure of one side as a reference. At this time, it is preferred that the difference in the relative reflection phase of the electromagnetic wave in adjacent unit regions, including not only all unit regions in the unit structure of one side but also the minimum thickness unit region with a minimum thickness in the unit structure of the other side, is equal. For example, in Figure 5 In (c), in adjacent unit structures 10a and 10b, the relative reflection phases of electromagnetic waves in each unit area 11a~11f of the unit structure 10a on one side are 0 degrees, -60 degrees, -120 degrees, -180 degrees, -240 degrees, and -300 degrees, respectively, and the relative reflection phase of electromagnetic waves in the minimum thickness unit area 11a with minimum thickness t1 of the unit structure 10b on the other side is -360 degrees. Including all the unit areas 11a~11f in the unit structure 10a on one side and the minimum thickness unit area 11a with minimum thickness t1 in the unit structure 10b on the other side, the absolute values ​​of the differences in the relative reflection phases of electromagnetic waves in adjacent unit areas are all equal to 60 degrees.

[0180] In addition, in a unit structure of the dielectric layer, the absolute value of the difference between the relative reflection phase of the electromagnetic wave in the minimum thickness unit region with the minimum thickness and the relative reflection phase of the electromagnetic wave in the maximum thickness unit region with the maximum thickness is less than 360 degrees. In addition, in a unit structure of the dielectric layer, the absolute value of the difference between the relative reflection phase of the electromagnetic wave in the minimum thickness unit region with the minimum thickness and the relative reflection phase of the electromagnetic wave in the maximum thickness unit region with the maximum thickness needs to be greater than 180 degrees, and more preferably greater than 300 degrees and less than 360 degrees. For example, Figure 5 As shown in (b), in the case where the unit structure 10 of the dielectric layer 5 has 6 unit regions, in one unit structure 10, it is preferred that the absolute value of the difference between the relative reflection phase of the electromagnetic wave in the minimum thickness unit region 11a having the minimum thickness t1 and the relative reflection phase of the electromagnetic wave in the maximum thickness unit region 11f having the maximum thickness t6 is less than 360 degrees. Figure 5In (c), in a unit structure 10 of the dielectric layer 5, the relative reflection phase of the electromagnetic wave in the minimum thickness unit area 11a having the minimum thickness t1 is 0 degree, the relative reflection phase of the electromagnetic wave in the maximum thickness unit area 11f having the maximum thickness t6 is -300 degrees, and the absolute value of the difference between the relative reflection phase of the electromagnetic wave in the minimum thickness unit area 11a having the minimum thickness t1 and the relative reflection phase of the electromagnetic wave in the maximum thickness unit area 11f having the maximum thickness t6 is 300 degrees.

[0181] The size of the unit structure of the dielectric layer, specifically, the length of the unit structure in the specified direction of thickness increase, is appropriately set according to the target reflection characteristics. Since the amount of 1 wavelength is offset according to the length of the unit structure in the specified direction of thickness increase (phase difference: 360 degrees), the reflection angle can be adjusted. For example, by shortening the length of the unit structure in the specified direction of thickness increase, the difference between the reflection angle and the regular reflection angle can be increased. On the other hand, by extending the length of the unit structure in the specified direction of thickness increase, the difference between the reflection angle and the regular reflection angle can be reduced.

[0182] In addition, the cross-sectional shape of the unit structure of the dielectric layer may be, for example, a stepped shape in which the thickness increases in stages in a predetermined direction, or a tapered shape in which the thickness gradually increases in a predetermined direction. Figure 5 (b) is an example in which the unit structure 10 of the dielectric layer 5 has a stepped shape. Fig. 9 This is an example in which the unit structure 10 of the dielectric layer 5 has a tapered shape.

[0183] In addition, the unit structure of the dielectric layer has a plurality of unit regions with different thicknesses, but when the cross-sectional shape of the unit structure of the dielectric layer has a tapered shape, the number of unit regions in the unit structure can be considered to be infinite. In this case, the thickness distribution of the unit structure is also designed in such a way that the relative reflection phase of the electromagnetic wave in each unit region becomes the above-mentioned setting.

[0184] In addition, since a plurality of unit structures having a thickness distribution are arranged in the dielectric layer, the pattern shape of the unit structures in a plan view can be any shape that can be arranged without gaps, such as a rectangle, a regular hexagon, etc. For example, Figure 7 (a)~(f), Figure 8 (a) is an example in which the pattern shape of the unit structure 10 of the dielectric layer is rectangular in a plan view.

[0185] In the unit structure of the dielectric layer, the difference in the reciprocating optical path lengths in adjacent unit areas is designed in such a way that the relative reflection phase of the electromagnetic wave in each unit area becomes the above-mentioned setting, and the thickness of each unit area is set in such a way that the difference in thickness of adjacent unit areas becomes the difference in the reciprocating optical path lengths in the adjacent unit areas. The thickness of each unit area is appropriately set according to the wavelength of the electromagnetic wave, the dielectric constant of the material of the dielectric layer, and the target reflection characteristics. For example, when the effective wavelength of the electromagnetic wave passing through the dielectric is set to λ g When the thickness of the substrate is set to α, the thickness of each unit region is preferably α+0λ g Above and α+2λ g In one unit structure of the dielectric layer, the thickness α of the base can be made equal to the minimum thickness of the minimum thickness unit region having the minimum thickness. The thickness α of the base is appropriately set in consideration of the overall strength, ease of formation, etc., but is generally preferably 0.1λ in consideration of the effect on electromagnetic waves. g Specifically, when the wavelength λ0 of the electromagnetic wave in the air is 10 mm and the relative dielectric constant of the dielectric layer is 2.57, the thickness of each unit area is preferably greater than 0 mm and less than 8.6 mm. In addition, the case where the thickness of the unit area is 0 mm refers to a state where the dielectric layer is not formed in the unit area located on the reflective component.

[0186] Here, the effective wavelength of an electromagnetic wave refers to the wavelength of the electromagnetic wave when it passes through a material other than air, such as a dielectric layer. In addition, when simply referred to as a wavelength, it refers to the wavelength in air.

[0187] In the unit structure of the dielectric layer, the pitch and width of the unit region are appropriately set.

[0188] In addition, when the reflective component is a component in which a plurality of reflective elements are arranged, the spacing of the unit regions of the unit structure of the dielectric layer may be the same as or different from the spacing of the reflective elements of the reflective component. When the spacing of the unit regions of the unit structure of the dielectric layer is the same as the spacing of the reflective elements of the reflective component, the design becomes easy. In addition, for example, by narrowing the spacing of the unit regions of the unit structure of the dielectric layer while maintaining the difference in relative reflection phase of electromagnetic waves in adjacent unit regions, the control domain of the reflection characteristics can be expanded regardless of the spacing of the reflective elements of the reflective component.

[0189] Furthermore, in one unit structure of the dielectric layer, the pitches of the cell regions are preferably equal.

[0190] In addition, the pitch of the cell regions refers to the distance from the center of one cell region to the center of an adjacent cell region.

[0191] In addition, in one unit structure of the dielectric layer, the widths of the cell regions in a predetermined direction in which the thickness increases are preferably equal.

[0192] In the unit structure of the dielectric layer, the pattern shape of the unit area when viewed from above may be, for example, a stripe shape, a shape obtained by dividing concentric squares into four equal parts by straight lines that are parallel to the sides and perpendicular to each other, a microarray shape, a shape obtained by dividing concentric circles into four equal parts by diameters that are perpendicular to each other, i.e., a concentric quadrant shape, a curved staircase shape, etc. For example, Figure 7 (b) is a striped example. Figure 7 (d) is an example of a shape when concentric squares are divided into four equal parts by straight lines that are parallel to the sides and perpendicular to each other. Figure 7 (f), Figure 8 (a) is an example of a microarray. Figure 8 (b) is an example of concentric quadrants. Figure 8 (c) is an example of a curve that is stepped. Figure 7 (b) is Figure 7 (a) is a top view of Figure 7 (d) is Figure 7 (c) is a top view of Figure 7 (f) is Figure 7 In addition, when these exemplified unit structures are arranged without gaps, there is no particular restriction on the direction of arrangement. For example, the rectangular unit structures can be arranged on the entire surface in a state rotated 30 degrees clockwise when viewed from above. It is only necessary to select appropriate angles and appropriate arrangement directions and arrange the unit structures according to the desired reflection characteristics.

[0193] The unit structure of the dielectric layer has a plurality of unit regions. In a unit structure of the dielectric layer, the number of unit regions is, for example, 3 or more, preferably 6 or more. The more unit regions there are in a unit structure of the dielectric layer, the more the difference in relative reflection phase of electromagnetic waves in adjacent unit regions can be reduced, thereby making the wavefront of the reflected wave smoother. In addition, the more unit regions there are in a unit structure of the dielectric layer, the more preferred it is, and the upper limit is not particularly limited. In addition, in the case where the cross-sectional shape of the unit structure is a stepped shape, the number of unit regions is equivalent to the number of steps of the stepped shape. In addition, in the case where the cross-sectional shape of the unit structure is a conical shape, as described above, the conical shape can be regarded as a shape that makes the number of unit regions infinite.

[0194] The dielectric layer has at least a first unit structure as a unit structure, and the first unit structure has three or more unit regions having different thicknesses.

[0195] In addition, the dielectric layer may have only the first unit structure as a unit structure, or may further have a second unit structure different from the first unit structure as a unit structure. That is, the dielectric layer may have only the same unit structure as a unit structure, or may have mutually different unit structures as a unit structure. When the dielectric layer is configured with a plurality of mutually different unit structures, it is possible to affect the overall reflection characteristics of the frequency selective reflector. Specifically, the adjustment of polarization wave characteristics, the influence on beam profile (high directivity, diffusion, multi-beam, etc.) and the like can be exemplified.

[0196] In the first unit structure and the second unit structure, the reflection characteristics can be made different. For example, at least one of the length of the unit structure in the direction of increasing thickness, thickness distribution, the number of unit areas, width, spacing, pattern shape of the unit structure when viewed from above, and pattern shape of the unit area when viewed from above can be made different.

[0197] In addition, when the dielectric layer has mutually different unit structures as unit structures, the number of types of unit structures is not particularly limited.

[0198] In the dielectric layer, the thickness distribution of the dielectric layer is appropriately selected so that the normal vector of the same phase plane of the reflected wave relative to the incident wave incident at a predetermined angle of incidence becomes the desired reflection direction, and a plurality of unit structures are arranged. However, for example, in the case where the incident wave is reflected as a so-called plane wave reflected in a single direction, the dielectric layer is preferably arranged with only a plurality of identical unit structures. More preferably, the unit structures have the same length in the direction of increasing thickness and the pattern shape of the unit area when viewed from above is striped. For example, in Figure 5 In (a) to (c), the dielectric layer 5 has only a plurality of identical unit structures, the unit structures 10a and 10b have the same length L in the predetermined direction D1, and the unit regions 11a to 11f have a stripe-like pattern shape when viewed from above. In this case, Figure 5 As shown in the example, the incident wave W1 incident at a predetermined incident angle θ1 can be reflected at a single reflection angle θ2, and the reflected wave W2 can be made into a plane wave without expansion. Figure 5 (a) shows a configuration in which the long side direction of the stripes in the unit area is parallel to the short side direction of the frequency selective reflector, but this is not limited to this. In an actual frequency selective reflector, the long side direction and short side direction of the stripes in the unit area can be arbitrarily set according to the design of the reflection characteristics.

[0199] In addition, for example, in the case of diffusing electromagnetic waves, that is, reflecting them as cylindrical waves, the dielectric layer is preferably configured with a plurality of different unit structures, and the following forms can be cited: the unit structures have different lengths in the direction of increasing thickness, and the pattern shape of the unit area when viewed from above is striped. Fig.10 In (a), the dielectric layer 5 has three different unit structures 10a, 10b, 10c, and 10d, and in these unit structures 10a, 10b, 10c, and 10d, the lengths L1, L2, and L3 of the unit structures in a predetermined direction D1 are different from each other, and the numbers of unit regions 11a to 11g, 12a to 12f, and 13a to 13e are different from each other. Fig.10 As shown in (b), the relative reflection phases of the electromagnetic waves in each unit area 11a~11g of the unit structure 10a are 0 degree, -51.4 degree, -103 degree, -154 degree, -206 degree, -257 degree, and -309 degree, respectively; the relative reflection phases of the electromagnetic waves in each unit area 12a~12f of the unit structures 10b and 10c are 0 degree, -60 degree, -120 degree, -180 degree, -240 degree, and -300 degree, respectively; the relative reflection phases of the electromagnetic waves in each unit area 13a~13e of the unit structure 10d are 0 degree, -72 degree, -144 degree, -216 degree, and -288 degree, respectively; the reflection characteristics of the unit structures 10a, 10b, 10c, and 10d are different from each other. Although not shown in the figure, the pattern shape of the unit regions 11a to 11g, 12a to 12f, and 13a to 13e when viewed from above is striped. Fig.11 As illustrated, the incident wave W1 incident at a predetermined incident angle θ1 can be reflected at reflection angles θ2, θ2', and θ2" according to the unit structure, and can be reflected in an expanded manner, and the wavefront of the reflected wave W2 can be expanded.

[0200] In addition, when the dielectric layer has different unit structures as unit structures, it is also possible to use a plurality of unit structures with different reflection characteristics, arrange a plurality of unit structures for each type, and arrange the regions where a plurality of unit structures of the same type are arranged in a plane. Fig.12 In the embodiment, two types of unit structures 10a and 10b having different reflection characteristics are used, and a dielectric layer 5 is formed by arranging a first region 5a having a plurality of unit structures 10a of one type and a second region 5b having a plurality of unit structures 10b of the other type in a plane. In this manner, a plurality of cover voids can be handled.

[0201] In addition, for example, when the reflective component described later is a frequency selective plate and has a plurality of frequency selective surfaces (FSS) that selectively reflect electromagnetic waves of different frequency bands, the reflection characteristics of the unit structures may be designed according to the frequency selectivity of these frequency selective surfaces, and the dielectric layer may be provided as a unit structure having unit structures with different reflection characteristics. In this case, it is also possible to set, for example, Fig.12 In this way, it is possible to cope with dual bands or more.

[0202] In addition, when the dielectric layer has different unit structures as unit structures, for example, the relative reflection phase of the electromagnetic wave in each unit area of ​​the n unit structures can be set in a manner that the n unit structures are shifted by n wavelengths (phase difference: n×360 degrees). In addition, n is an integer greater than 2. For example, Fig.13 (a) to (c) are examples in which the dielectric layer 5 has two different unit structures 10a and 10b, and the relative reflection phase of the electromagnetic waves in each unit region 11a to 11c, 12a to 12b of the two unit structures 10a and 10b is set in a manner that the two unit structures 10a and 10b are offset by 2 wavelengths (phase difference: 720 degrees). In addition, Fig.13 (b) is a graph showing the range of the relative reflection phase of the electromagnetic wave as exceeding -360 degrees and below 0 degrees. Fig.13 (c) is a graph in which the relative reflection phase of the electromagnetic wave is set to a range of more than -720 degrees and less than 0 degrees, and the points of substantially the same phase are supplemented with the relative reflection phase shifted by 360 degrees. In these unit structures 10a and 10b, the lengths L1 and L2 of the unit structures in the prescribed direction D1 are different from each other, and the numbers of unit regions 11a to 11c and 12a to 12b are different from each other.

[0203] In the above case, one unit structure 10a has three unit regions 11a to 11c, and the other unit structure 10b has two unit regions 12a and 12b. In this way, when the dielectric layer has different unit structures as unit structures, it is sufficient as long as at least one unit structure has three or more unit regions with different thicknesses. In other types of unit structures, the number of unit regions is not limited to three or more, and may be two.

[0204] In addition, when the incident wave and the reflected wave are set as plane waves, the dielectric layer has a periodic structure in which the unit structure is repeatedly configured. In addition, "periodic structure" refers to a structure in which the unit structure is periodically and repeatedly configured. In the unit structure in the periodic structure, in the unit structure with the same reflection characteristics, the length of the unit structure in the direction of increasing thickness, the thickness distribution, the number of unit areas, the width, the spacing, the pattern shape of the unit structure when viewed from above, the pattern shape of the unit area when viewed from above, etc. can be made the same. In addition, in the case where the dielectric layer has a periodic structure, as described above, unit structures with different reflection characteristics can also be combined together. In this case, the reflection characteristics of the combined unit structure are appropriately designed according to the target reflection characteristics. Specifically, the length of the unit structure in the direction of increasing thickness, the thickness distribution, the number of unit areas, the width, the spacing, the pattern shape of the unit structure when viewed from above, the pattern shape of the unit area when viewed from above, etc. in the combined unit structure are appropriately set according to the target reflection characteristics.

[0205] Generally speaking, in the design of reflection characteristics that make a plane wave reflect as a plane wave in a direction different from the regular reflection direction, for example, the following method can be used to design the reflection characteristics: after decomposing the incident / reflection characteristics in the x direction and the y direction of the reflector, the characteristics are transformed into reflection phase distributions in the x direction and the y direction, and then combined as the thickness distribution of the unit structure. For example, Fig.14 As shown, a part of a frequency selective reflector is used as an example: in this frequency selective reflector, unit areas of the same size that can adjust the reflection phase individually are arranged as 10×10 (i=10, j=10). At this time, it should be noted that the size of the unit area of ​​10×10 is not necessarily the size of the unit structure. in ,φ in ) direction, the plane wave is reflected at an angle (θ out ,φ out ) direction in the case of plane wave reflection, the reflection phase δ is obtained in the unit area at the position (i, j) i，j It is given by the following formula.

[0206] δ i，j =2π{p×i×(sinθ out ×cosφ out -sinθ in ×cosφ in )+

[0207] p×j×(sinθ out ×sinφ out -sinθ in ×sinφ in )} / λ

[0208] Here, in the above formula,

[0209] δ i，j : The reflection phase of the unit area at position (i, j) relative to the phase center (0, 0)

[0210] λ: wavelength of reflected wave [m]

[0211] p: size of the unit area [m]

[0212] θ in : The slope of the incident wave

[0213] φ in : φ tilt of the incident wave

[0214] θ out : The slope of the reflected wave

[0215] φ out : φ slope of the reflected wave.

[0216] The dielectric layer may be, for example, a single layer or a multilayer. In addition, the dielectric layer may also include a substrate layer serving as a base and a concave-convex layer disposed on the substrate layer. In addition, the dielectric layer may also be, for example, a single component in which all unit regions are formed as one, or a component in which each unit region is formed separately and the unit regions are arranged in a block shape.

[0217] (ii) Characteristics of dielectric layer

[0218] The dielectric layer only needs to transmit electromagnetic waves in a specific frequency band, and may transmit electromagnetic waves in other frequency bands, or may not transmit electromagnetic waves in other frequency bands.

[0219] The dielectric loss tangent of the dielectric layer is preferably relatively small. By making the dielectric loss tangent of the dielectric layer smaller, the dielectric loss can be reduced, and the high-frequency loss can be reduced. Specifically, the dielectric loss tangent of the dielectric layer relative to the electromagnetic wave of the target frequency is preferably less than 0.01. In addition, the smaller the dielectric loss tangent of the dielectric layer, the more preferred, and the lower limit is not particularly limited.

[0220] In addition, the dielectric constant of the dielectric layer is preferably relatively high. By making the dielectric constant of the dielectric layer relatively high, it is expected that the thickness of the dielectric layer can be reduced. Specifically, the dielectric constant of the dielectric layer in the electromagnetic wave of the target frequency is preferably 2 or more, more preferably 2.5 or more, and in the case of increasing the difference between the reflection angle and the regular reflection angle, it is further preferably 3 or more.

[0221] Here, the dielectric loss tangent and the dielectric constant of the dielectric layer are measured by a resonator method.

[0222] (iii) Materials of the dielectric layer

[0223] The material of the dielectric layer is not particularly limited as long as it is a dielectric that can transmit a predetermined electromagnetic wave, and for example, resin, glass, quartz, ceramic, etc. can be used. Among them, resin is preferred in consideration of the ease of forming the concavo-convex structure.

[0224] As for the resin, there is no particular limitation as long as it can make the specified electromagnetic wave permeable, but it is preferred that the absorption of the above-mentioned electromagnetic wave is relatively small and the transmittance of the above-mentioned electromagnetic wave is relatively high. In addition, the resin preferably satisfies the above-mentioned dielectric loss tangent, and more preferably satisfies the above-mentioned dielectric constant. As such resin, for example, polycarbonate, acrylic resin, ABS resin, PLA resin, olefin resin or their copolymers etc. can be listed. Among them, polycarbonate is excellent in dimensional stability and has little high-frequency loss, so it is preferred.

[0225] In addition, the dielectric layer may further contain a filler. By making the dielectric layer contain a filler, the dielectric constant and mechanical strength of the dielectric layer can be adjusted. The dielectric constant of the filler is preferably higher than the dielectric constant of the resin. Thus, the dielectric constant of the dielectric layer can be increased, and the thickness of the required dielectric layer can be reduced. There is no particular limitation on the filler with a high dielectric constant, and examples thereof include inorganic particles such as glass or silica, or fine fibers.

[0226] The material, shape, size, and content of the filler can be appropriately selected based on the target dielectric constant, mechanical strength, and ease of dispersibility. The size of the filler needs to be sufficiently smaller than the effective wavelength of the electromagnetic wave passing through the dielectric. g In the case of , the diameter of the filler equivalent to a sphere is preferably 0.01λ, for example. g However, if the size of the filler is close to the nanometer level, it tends to be difficult to disperse evenly, so the burden of the processing technology may increase. In addition, the content of the filler in the dielectric layer varies depending on the combination of the dielectric and the filler materials, the shape of the filler, the size of the filler, etc., and can be appropriately adjusted.

[0227] In addition, when the concavo-convex structure of the dielectric layer is formed by shaping using a mold, for example, a release agent, an antistatic agent, etc. may be added to the dielectric layer. For these, common substances may be appropriately selected for use. In addition, the dielectric layer preferably does not contain additives or fillers that impart conductivity, such as carbon black and metal particles.

[0228] The dielectric layer is usually light-transmissive.

[0229] (iv) Method for forming dielectric layer

[0230] The method for forming the dielectric layer is not particularly limited as long as it is a method that can form a specified concave-convex structure, and examples thereof include cutting of a resin sheet, laser processing, molding using a mold or vacuum casting, molding based on a 3D printer, and bonding of small pieces. In the case of a forming method such as cutting, laser processing, and 3D printing that does not use a mold, it is easy to customize according to the target reflection angle, so it can also be applied to the tuning of the design in the case of special settings, or to the tuning of the design in the case of designing and developing large-scale frequency selective reflectors that are difficult to simulate. In the case of molding using a mold, molding can be performed on a substrate composed of a dielectric, and in this case, the substrate and molding resin can be any material that allows the specified electromagnetic waves to pass through, and different materials can be used. In addition, for example, when the reflective component and the dielectric layer are designed and manufactured separately, a plurality of dielectric layers having specified incident angles and reflection angles and having reflective characteristics are prepared in advance, and the type of dielectric layer is selected according to the situation, so that the dielectric layer is rotated within the plane relative to the reflective component with the normal direction as the axis, thereby finely adjusting the reflection direction of the electromagnetic wave. In such a case, it is cost-effective to concentrate on manufacturing dielectric layers of the same specification. In this case, the molding method using a mold is preferred.

[0231] (b) Reflective components

[0232] The reflecting member in this embodiment is a member that reflects electromagnetic waves in a specific frequency band.

[0233] The reflective component is not particularly limited as long as it is a component that reflects electromagnetic waves of a specific frequency band. For example, it may be a component that only reflects electromagnetic waves of a specific frequency band, or it may be a component that not only reflects electromagnetic waves of a specific frequency band but also reflects electromagnetic waves of other frequency bands. The reflective component preferably has a wavelength selection function that only reflects electromagnetic waves of a specific frequency band.

[0234] As a reflective member that reflects not only electromagnetic waves of a specific frequency band but also electromagnetic waves of other frequency bands, for example, a reflective layer disposed on the entire surface of a frequency selective reflector can be cited. Fig.15 This is an example where the reflective component 2 is a reflective layer 7. Fig.15 In the embodiment, the reflection layer 7 is arranged on the entire surface of the frequency selective reflection plate 1 .

[0235] The material of the reflective layer is not particularly limited as long as it is a material that can reflect electromagnetic waves in a specific frequency band, and examples thereof include conductive materials such as metal materials, carbon, and ITO.

[0236] The thickness of the reflective layer is not particularly limited as long as it is a thickness capable of reflecting electromagnetic waves in a specific frequency band, and can be appropriately set.

[0237] Furthermore, as a reflecting member that reflects only electromagnetic waves in a specific frequency band, any member may have a wavelength selection function that reflects only electromagnetic waves in a specific frequency band, and an example thereof may be a frequency selective plate.

[0238] In addition, the frequency selective plate is the same as that described in the first embodiment. For example, Figure 5 (b) is an example in which the reflective member 2 is a frequency selective plate, and the reflective member 2 includes a dielectric substrate 4 and a plurality of reflective elements 3 arranged on a surface of the dielectric substrate 4 on the dielectric layer 5 side.

[0239] In addition, the shape and structure of the reflective element can also be the same as those described in the above-mentioned first embodiment.

[0240] In addition, it is preferred that the frequency selective plate, i.e., the reflective component, has a reflection phase control function for controlling the reflection phase of the electromagnetic wave. In such a reflective component, by changing the size and shape of the reflective element, the resonant frequency can be changed for each reflective element to control the reflection phase of the electromagnetic wave. Therefore, in the case where the frequency selective plate has a reflection phase control function, the reflection phase distribution of the electromagnetic wave is controlled according to the thickness of the dielectric layer and the size and shape of the reflective element, thereby controlling the reflection characteristics of the electromagnetic wave. Therefore, for example, the reflection characteristics of two orthogonal directions (e.g., the x-axis direction and the y-axis direction) within the plane of the frequency selective reflector can be designed separately in the frequency selective plate and the dielectric layer, and the desired reflection characteristics of the electromagnetic wave can be obtained while suppressing the thickness of the dielectric layer.

[0241] As a frequency selective plate having a reflection phase control function, a general frequency selective surface can be applied. These have their own advantages and disadvantages in design, but all of them can change the reflection phase of electromagnetic waves by changing the size and shape of the reflection element.

[0242] The size of the reflective element is appropriately selected according to the shape of the reflective element.

[0243] The dielectric substrate may be light-transmissive or light-impermeable.

[0244] (c) Control of the reflection direction of electromagnetic waves

[0245] In the frequency selective reflector of this method, by changing the thickness of each unit area of ​​the unit structure of the dielectric layer, the reciprocating optical path length in the dielectric layer can be changed for each unit area to control the relative reflection phase of the electromagnetic wave. Thus, by adjusting the size and top view pattern of the unit structure of the dielectric layer, and the number and thickness of the unit areas of the unit structure of the dielectric layer, the reflection direction of the electromagnetic wave incident from a specified direction can be controlled.

[0246] In addition, when the reflecting component is a frequency selective plate and a component with a reflection phase control function, not only can the reciprocating optical path length in the dielectric layer be changed for each unit area by changing the thickness of each unit area of ​​the unit structure of the dielectric layer, but the resonant frequency can also be changed for each reflection element by changing the size and shape of the reflecting element of the reflecting component to control the reflection phase of the electromagnetic wave. This expands the design freedom related to the control of reflection characteristics.

[0247] In this case, the reflection control direction based on the reflection component and the reflection control direction based on the dielectric layer can be separated, and two-dimensional reflection direction control can be performed on the entire frequency selective reflector. In addition, when the reflection control directions based on the reflection component and the dielectric layer are overlapped, for example, the reflection phase distribution reflected in the determined direction can be realized to a certain extent by the reflection component, and then fine-tuned by the dielectric layer. In this case, there is an advantage that the thickness of the dielectric layer can be reduced.

[0248] As the thickness distribution of the dielectric layer and the size distribution of the reflective elements of the reflective member are configured, for example Fig.16 As shown in (a) and (b), the dielectric layer 5 and the reflective member 2 can be arranged in such a manner that as the size of the reflective element 3 of the reflective member 2 increases, the thickness of the unit regions 11a to 11f of the unit structure 10 of the dielectric layer 5 increases. In such a manner, the thickness of the dielectric layer can be suppressed. As a result, the dielectric layer becomes thinner, so that the frequency selective reflector can be made lighter and cheaper. In addition, even when the reflection angle increases, the reflected wave is less likely to hit the surface of the concave-convex structure side of the dielectric layer.

[0249] In addition, as the configuration of the thickness distribution of the dielectric layer and the size distribution of the reflective elements of the reflective member, for example, Fig.17 As shown in (a) and (b), the dielectric layer 5 and the reflecting component 2 may be configured in such a manner that the size of the reflecting element 3 of the reflecting component 2 increases along the direction D2 and the thickness of the unit regions 11a to 11f of the unit structure 10 of the dielectric layer 5 increases along the direction D1 perpendicular to the direction D2.

[0250] In addition, Fig.17 In (a) and (b), the size of the reflective element in one unit area is different, so the relative reflection phase of the electromagnetic wave in one unit area is locally different according to the size of the reflective element. In such a case, when the thickness is increased along the specified direction D1, in the above-mentioned curve diagram, each point is also on the same straight line.

[0251] In addition, in the case where the reflective component and the dielectric layer are designed separately and combined, the reflection direction of the electromagnetic wave can be finely adjusted by rotating the dielectric layer in a plane with the normal direction as the axis relative to the reflective component and adjusting the arrangement direction of the unit areas of the unit structure of the dielectric layer relative to the reflective component.

[0252] In addition, as described above, in the unit structure of the dielectric layer, the reflection characteristics can be controlled by adjusting the length of the unit structure in the predetermined direction of increasing thickness. For example, by shortening the length of the unit structure in the predetermined direction of increasing thickness, the reflection angle of the electromagnetic wave can be increased, and on the other hand, by lengthening the length of the unit structure in the predetermined direction of increasing thickness, the reflection angle of the electromagnetic wave can be reduced.

[0253] In addition, in the unit structure of the dielectric layer, the length of the unit structure in a predetermined direction in which the thickness increases refers to the length of the unit structure in the predetermined direction when the unit structure of the dielectric layer has a thickness distribution in which the thickness increases in the predetermined direction. Fig.15 In the figure, in the unit structure 10 of the dielectric layer 5, the thickness increases in a predetermined direction D1, and the length of the unit structure 10 in the predetermined direction D1 is L.

[0254] In addition, as described above, the in-plane arrangement of the concavo-convex structure of the dielectric layer that realizes the in-plane distribution design of the reflection phase in the frequency selective reflector does not need to be in a fixed positional relationship with respect to the in-plane arrangement of the reflection element of the reflection component, and even if the concavo-convex structure of the dielectric layer is arranged in a staggered manner relative to the in-plane arrangement of the reflection element, it will not have a significant impact on the reflection characteristics. Therefore, in the case where the reflection component is a frequency selective plate and is a component having a reflection phase control function, the dielectric layer and the reflection component can be designed independently.

[0255] (d) Other structures

[0256] The frequency selective reflector of this aspect may have other structures as necessary in addition to the above-mentioned reflective member and dielectric layer.

[0257] (i) Adhesive layer

[0258] The frequency selective reflector of this embodiment may also have an adhesive layer between the reflective component and the dielectric layer. The reflective component and the dielectric layer can be bonded together by the adhesive layer. In addition, when the reflective component is a component in which a plurality of reflective elements are arranged, the adhesive layer can be used to flatten the unevenness caused by the reflective elements, and the influence of the unevenness caused by the reflective elements when the dielectric layer is stacked on the reflective component can be suppressed. For example, Figure 5 In (b), an adhesive layer 6 is disposed between the reflective member 2 and the dielectric layer 5 .

[0259] Regarding the adhesive layer, for example, an adhesive or a bonding agent can be used, and it can be appropriately selected from known adhesives and bonding agents for use. In this case, the adhesive or bonding agent needs to be a non-conductor. In addition, when the adhesive or bonding agent is in a liquid state, it is preferred to have a fluidity that can be evenly spread and can remove the bite of bubbles. In addition, when the adhesive or bonding agent is in a sheet state, it is preferred that the thickness is uniform, and it is preferred to have a softness that can follow the unevenness of the bonding interface and suppress the bite of bubbles.

[0260] The thickness of the adhesive layer is preferably a thickness that can obtain the desired adhesive force and is uniform. In addition, when the reflective component is a component in which a plurality of reflective elements are arranged, the thickness of the adhesive layer is preferably equal to or greater than the thickness of the reflective element from the perspective of flattening. In this case, when the adhesive layer is thicker than the thickness of the reflective element, the reflective element becomes buried in the adhesive layer. In addition, the thickness of the adhesive layer is preferably sufficiently smaller than the effective wavelength of the electromagnetic wave being the object. When the effective wavelength of the electromagnetic wave is set to λ g In the case of g the following.

[0261] (ii) Space

[0262] The frequency selective reflector of this embodiment may also have a space between the reflective member and the dielectric layer. Fig.18 In the embodiment, a space 8 is arranged between the reflective member 2 and the dielectric layer 5 .

[0263] When a space is provided between the reflective member and the dielectric layer, the distance between the reflective member and the dielectric layer is preferably constant, thereby making it possible to make the optical path length in the space uniform.

[0264] (iii) Protective components

[0265] The frequency selective reflector of this embodiment may also have a protective component on the surface of the dielectric layer opposite to the reflective component. The dielectric layer can be protected by the protective component. In addition, the protective component can also be used to give the appearance.

[0266] (iv) Ground plane

[0267] The frequency selective reflector of this mode may also have a ground layer on the surface of the reflector on the opposite side to the dielectric layer. The ground layer can block interference with an object on the back side of the frequency selective reflector and suppress the generation of noise. In addition, the ground layer may also be a part of the reflector without wavelength selectivity. As the ground layer, for example, a general conductive layer such as a metal layer, a metal mesh, a carbon film, an ITO film, etc. can be used.

[0268] (v) Planarization layer

[0269] The frequency selective reflector of this method may also have a flattening layer between the above-mentioned reflective component and the above-mentioned dielectric layer. In the case where the reflective component is a component in which a plurality of reflective elements are arranged, the flattening layer can flatten the unevenness caused by the reflective elements, and can suppress the influence of the unevenness caused by the reflective elements when the dielectric layer is stacked on the reflective component. It should be noted that the flattening layer mentioned here refers to a layer configured separately from the adhesive layer. An ionizing radiation cured resin layer configured in a state of embedding the reflective element can be exemplified. In addition, in the case of a method in which a space is provided between the reflective component and the dielectric layer, the flattening layer can also have the function of protecting the reflective element.

[0270] (vi) Anti-reflection layer

[0271] In the case of high frequencies, the influence of reflection at the interface of the dielectric layer should also be considered. Therefore, in the frequency selective reflector of this method, an anti-reflection layer can be configured at the interface between the dielectric layer and the air as needed. The anti-reflection layer can have, for example, a multilayer structure with different dielectric constants, or a concave-convex structure smaller than the effective wavelength of the electromagnetic wave.

[0272] (3) Alignment of frequency selective reflectors

[0273] In this embodiment, the first alignment mark of the substrate can be used to align the plurality of frequency selective reflectors. For example, the frequency selective reflectors can be aligned by aligning the edge of the frequency selective reflectors with the first alignment mark of the substrate as a reference. In addition, for example, the frequency selective reflectors can have a second alignment mark, and the frequency selective reflectors can be aligned by aligning the second alignment mark of the frequency selective reflectors with the first alignment mark of the substrate as a reference.

[0274] For example, Figure 1 In the embodiment, the substrate 21 has a first alignment mark 22 in a cross shape, and the position of the edge of the frequency selective reflector 1 is aligned with the first alignment mark 22 of the substrate 21 as a reference to align the frequency selective reflector 1. Specifically, when the peripheral area of ​​the frequency selective reflector 1 is opaque, the substrate 21 is translucent, and the first alignment mark 22 is opaque, the first alignment mark 22 of the substrate 21 and the edge of the frequency selective reflector 1 can be detected by using transmitted light, and the frequency selective reflector 1 can be aligned. In addition, when the peripheral area of ​​the frequency selective reflector 1 is reflective and the first alignment mark 22 is reflective, the first alignment mark 22 of the substrate 21 and the edge of the frequency selective reflector 1 can be detected by using reflected light, and the frequency selective reflector 1 can be aligned.

[0275] Regarding the case where the peripheral area of ​​the frequency selective reflector is opaque, for example, in the case of the frequency selective reflector of the first type, the peripheral area of ​​the frequency selective reflector can be made opaque by making the dielectric substrate of the reflective component opaque, or by arranging a grounding layer on the entire surface of the base material side of the reflective component, or by arranging a shading layer containing a metal material or resin on the entire surface of the base material side of the reflective component or only in the peripheral area.

[0276] In addition, regarding the case where the peripheral area of ​​the frequency selective reflector is opaque, for example, in the case of the frequency selective reflector of the second embodiment, the peripheral area of ​​the frequency selective reflector can be made opaque by making the dielectric substrate of the reflective component opaque, or by configuring a grounding layer on the entire surface of the base material side of the reflective component, or by making the reflective component a reflective layer configured on the entire surface of the frequency selective reflector, or by configuring a light shielding layer containing a metal material or a resin on the entire surface of the base material side of the reflective component or only in the peripheral area.

[0277] In addition, regarding the case where the peripheral area of ​​the frequency selective reflector has reflective properties, for example, in the case of the frequency selective reflector of the first type, the peripheral area of ​​the frequency selective reflector can be made reflective by configuring a ground layer on the entire surface of the substrate side of the reflective component, or configuring a shading layer containing a metal material on the entire surface of the substrate side of the reflective component or only in the peripheral area.

[0278] In addition, regarding the case where the peripheral area of ​​the frequency selective reflector has reflective properties, for example, in the case of the frequency selective reflector of the second embodiment, the peripheral area of ​​the frequency selective reflector can be made reflective by configuring a ground layer on the entire surface of the substrate side of the reflective component, or by setting the reflective component as a reflective layer configured on the entire surface of the frequency selective reflector, or by configuring a shading layer containing a metal material on the entire surface of the substrate side of the reflective component or only in the peripheral area.

[0279] In addition, for example, Fig.19In the embodiment, the substrate 21 has a circular first alignment mark 22, and the frequency selective reflector 1 has a hollow circular second alignment mark 24. The position of the second alignment mark 24 of the frequency selective reflector 1 is aligned with respect to the first alignment mark 22 of the substrate 21, so as to align the frequency selective reflector 1. Specifically, when the substrate 21 is light-transmissive, the first alignment mark 22 is light-opaque, the second alignment mark 24 is light-opaque, and the dielectric substrate of the reflective component of the frequency selective reflector 1 is light-transmissive, the first alignment mark 22 of the substrate 21 and the second alignment mark 24 of the frequency selective reflector 1 can be detected by using transmitted light, and the frequency selective reflector 1 can be aligned. In addition, when the first alignment mark 22 is reflective, the second alignment mark 24 is reflective, and the dielectric substrate of the reflective component of the frequency selective reflector 1 is light-transmissive, the first alignment mark 22 of the substrate 21 and the second alignment mark 24 of the frequency selective reflector 1 can be detected by reflected light, and the frequency selective reflector 1 can be aligned.

[0280] In addition, the reflective element constituting the reflective component of the frequency selective reflector is sometimes opaque or reflective. Even in such a case, for example, by making the size of the reflective element greatly different from the size of the first alignment mark and the second alignment mark, it is possible to distinguish the transmitted light or reflected light based on the first alignment mark and the second alignment mark from the transmitted light or reflected light based on the reflective element. In addition, even in the above-mentioned case, for example, in the frequency selective reflector, by not configuring the reflective element around the second alignment mark, it is possible to distinguish the transmitted light or reflected light based on the first alignment mark and the second alignment mark from the transmitted light or reflected light based on the reflective element. Therefore, the frequency selective reflector can be aligned.

[0281] Furthermore, in the frequency selective reflector, when no reflective elements are arranged around the second alignment mark, the total area of ​​the region where no reflective elements are arranged is sufficiently small relative to the entire area of ​​the frequency selective reflector, and thus it is considered that there is almost no influence on the reflection characteristics.

[0282] In addition, for example, Fig. 20In the embodiment, the substrate 21 has a first alignment mark 22 in a cross shape, and the frequency selective reflector 1 has a second alignment mark 24 which is a through hole in a quadrilateral shape. The position of the second alignment mark 24 of the frequency selective reflector 1 is aligned with respect to the first alignment mark 22 of the substrate 21 to align the frequency selective reflector 1. Specifically, when the substrate 21 is light-transmissive and the first alignment mark 22 is opaque, the first alignment mark 22 of the substrate 21 can be detected through the through hole (second alignment mark 24) of the frequency selective reflector 1 to align the frequency selective reflector 1. In addition, when the first alignment mark 22 is light-reflective, the first alignment mark 22 of the substrate 21 can be detected through the through hole (second alignment mark 24) of the frequency selective reflector 1 to align the frequency selective reflector 1.

[0283] In addition, although not shown in the figure, when the substrate has a first alignment mark as a through hole and the frequency selective reflector has a second alignment mark as a through hole, the frequency selective reflector is aligned by aligning the position of the second alignment mark of the frequency selective reflector with the first alignment mark of the substrate as a reference. Specifically, the frequency selective reflector can be aligned by detecting the through hole (second alignment mark) of the frequency selective reflector and the through hole (first alignment mark) of the substrate by transmitted light. In addition, the frequency selective reflector can also be aligned by inserting a pin into the through hole (first alignment mark) of the substrate and embedding the pin into the through hole (second alignment mark) of the frequency selective reflector. In this case, the frequency selective reflector can be fixed to the substrate using a pin.

[0284] In addition, when the second alignment mark is a through hole, in the frequency selective reflector, there is no reflective element at the portion of the second alignment mark. In this case, in the frequency selective reflector, the total area of ​​the through holes as the second alignment mark without the reflective element is sufficiently small relative to the area of ​​the entire frequency selective reflector, and therefore it is considered that there is almost no influence on the reflection characteristics.

[0285] (a) Second alignment mark

[0286] In this embodiment, the frequency selective reflection plate may have a second alignment mark. The second alignment mark is a mark for aligning the frequency selective reflection plate.

[0287] The second alignment mark may also be opaque. In addition, the second alignment mark may also be reflective. These optical properties of the second alignment mark are appropriately selected depending on whether the second alignment mark is detected by transmitted light or reflected light.

[0288] The transmittance and reflectance of the second alignment mark are not particularly limited as long as the second alignment mark can be detected by transmitted light or reflected light, and can be appropriately set according to the material, thickness, etc. of the second alignment mark.

[0289] Alternatively, the second alignment mark may be a through hole penetrating the frequency selective reflection plate.

[0290] The planar shape of the second alignment mark is not particularly limited, and is the same as the planar shape of a general alignment mark. A specific example of the planar shape of the second alignment mark is the same as that of the first alignment mark described above.

[0291] There is no particular limitation on the size and line width of the second alignment mark as long as the second alignment mark can be detected.

[0292] The number of the second alignment marks is not particularly limited as long as the frequency selective reflection plate can be aligned.

[0293] The position of the second alignment mark in the frequency selective reflector is not particularly limited, but the second alignment mark is usually arranged in the outer peripheral area of ​​the frequency selective reflector.

[0294] The second alignment mark may be arranged on the surface of the frequency selective reflector on the substrate side, or may be arranged on the surface of the frequency selective reflector on the side opposite to the substrate.

[0295] The thickness of the second alignment mark is not particularly limited as long as it is a thickness that can form the second alignment mark with high accuracy, and can be appropriately adjusted according to the optical characteristics of the second alignment mark and the like.

[0296] The material and formation method of the second alignment mark are the same as those of the first alignment mark.

[0297] Furthermore, as long as the frequency selective reflector can be positioned, a part of the reflective element of the reflective member constituting the frequency selective reflector may be used as the second alignment mark.

[0298] (b) Second identification mark

[0299] In this embodiment, for example, Figure 2 As shown, the frequency selective reflection plate 1 may also have a second identification mark 25 for identifying the frequency selective reflection plate 1. Figure 2In the embodiment, the frequency selective reflector 1 has the second identification marks 25 of "No1", "No2", "No3", and "No4". By providing the frequency selective reflector with the second identification marks, each frequency selective reflector can be easily identified, and the up and down, left and right, and front and back of the frequency selective reflector can be easily identified, so each frequency selective reflector can be reliably and easily arranged at a correct position. This is particularly useful when the reflection characteristics of a plurality of frequency selective reflectors are different from each other.

[0300] The second identification mark may also be opaque. In addition, the second identification mark may also be reflective. As with the second alignment mark, these optical properties of the second identification mark are appropriately selected based on whether the second identification mark is detected using transmitted light or reflected light.

[0301] The transmittance and reflectance of the second identification mark are not particularly limited as long as the second identification mark can be detected by transmitted light or reflected light, and can be appropriately set according to the material, thickness, etc. of the second identification mark.

[0302] The second identification mark is not particularly limited as long as it is a recognizable mark, and can include, for example, text, symbols, and graphics. Specifically, codes can be listed. In addition, for example, in addition to "No1", "No2", "No3", "No4", "1", "2", "3", and "4", "top", "bottom", "upper right", "upper left", "lower right", "lower left", "UR", "UL", "LR", and "LL" can also be listed. In addition, the second identification mark can also be data that can be subjected to optical character recognition (OCR).

[0303] The size and line width of the second identification mark are not particularly limited as long as the second identification mark can be detected.

[0304] The position of the second identification mark in the frequency selective reflector is not particularly limited as long as each frequency selective reflector can be identified. In addition, the position of the second identification mark in the frequency selective reflector can also be used to identify the top, bottom, left, and right of the frequency selective reflector.

[0305] In addition, if the second identification mark is arranged on the opposite sides of each frequency selective reflector, or arranged at a position close to the corner of each frequency selective reflector, it is possible to easily check or record whether each frequency selective reflector is arranged at the correct position. As an example, when four frequency selective reflectors are arranged in an upper left, upper right, lower left, and lower right configuration, in each frequency selective reflector, by centrally arranging the second identification mark near the corner close to the center of the four frequency selective reflectors as a whole, it is possible to check or record whether each frequency selective reflector is correctly arranged by taking a single photo.

[0306] The second identification mark may be disposed on the surface of the frequency selective reflector on the substrate side, or may be disposed on the surface of the frequency selective reflector on the side opposite to the substrate.

[0307] The thickness, material, and forming method of the second identification mark are the same as the thickness, material, and forming method of the second alignment mark.

[0308] When the material of the second identification mark is the same as that of the second alignment mark, the second alignment mark and the second identification mark can be formed simultaneously.

[0309] In the case where the frequency selective reflector has a second identification mark, the substrate may or may not have the first identification mark. In the case where the number of frequency selective reflectors is small, by using the second identification mark that knows the position of each frequency selective reflector, each frequency selective reflector can be arranged in the correct position even if the substrate does not have the first identification mark. As such a second identification mark, for example, "top", "bottom", "upper right", "upper left", "lower right", "lower left", "UR", "UL", "LR", and "LL" can be listed. In the case where the frequency selective reflector has the second identification mark and the substrate does not have the first identification mark, the number of frequency selective reflectors is preferably less than 3 rows and less than 3 columns.

[0310] (c) Cutting section

[0311] The frequency selective reflector may also have a cut-off portion formed by cutting off a part of the frequency selective reflector. In this case, the frequency selective reflector may have a cut-off portion instead of the second identification mark, or may have a cut-off portion in addition to the second identification mark. The cut-off portion is a mark indicating the orientation of the surface of the frequency selective reflector. By providing the frequency selective reflector with a cut-off portion, it is possible to easily identify the up and down, left and right, and front and back of the frequency selective reflector, and thus it is possible to easily configure each frequency selective reflector in the correct position.

[0312] The cut portion is not particularly limited as long as it is a portion that can indicate the orientation of the surface of the frequency selective reflector by giving the frequency selective reflector an asymmetric shape, and examples thereof include a chamfered portion formed by cutting off a corner of the frequency selective reflector, a cut portion such as a so-called notch, and a portion formed by cutting off a portion of a curved portion such as a so-called directional straight portion. The top view shape of the cut portion is not particularly limited, and examples thereof include a V-shaped or U-shaped shape.

[0313] (d) Concavoconvex part

[0314] In this embodiment, for example, Fig.21 and Fig. 22 As shown, adjacent frequency selective reflection plates 1 may also have concave-convex portions 26 that can be interlocked with each other on the sides facing each other, and the adjacent frequency selective reflection plates 1 are arranged in a manner that the concave-convex portions 26 are interlocked. By interlocking the concave-convex portions, it is possible to easily align a plurality of frequency selective reflection plates. In addition, since the contact area between adjacent frequency selective reflection plates is increased, the strength can be improved.

[0315] In addition, for example, Fig. 22 In the embodiment, the number of the concavoconvex parts 26 is different in each frequency selective reflector 1. In this way, when the number, shape, size, etc. of the concavoconvex parts are different in each frequency selective reflector, the frequency selective reflector can be identified. Therefore, when the reflection characteristics of a plurality of frequency selective reflectors are different, each frequency selective reflector can be easily identified by providing the frequency selective reflector with the second identification mark, and the up, down, left, right, front and back of the frequency selective reflector can be easily identified, so that each frequency selective reflector can be reliably and easily arranged at a correct position.

[0316] The shape of the concave and convex parts is not particularly limited as long as they are fit-able shapes.

[0317] The number and size of the concavo-convex portions are not particularly limited as long as the concavo-convex portions can be formed on the side surface of the frequency selective reflector.

[0318] In adjacent frequency selective reflectors, the thicknesses of the concavo-convex portions are preferably equal. This facilitates the alignment of adjacent frequency selective reflectors.

[0319] Furthermore, on the mutually opposing side surfaces of the adjacent frequency selective reflection plates, the concave and convex parts may not fit together without a gap. That is, there may be a gap between the fitting concave and convex parts.

[0320] (4) Modification

[0321] In the present embodiment, in the case of the frequency selective reflector of the first aspect, the reflective element may not be arranged in the end regions where the adjacent frequency selective reflectors face each other. Fig.23 and Fig.24 In (b), the reflective element 3 is not arranged on the dielectric substrate 4 in the end region 27 where the adjacent frequency selective reflection plates 1 face each other.

[0322] In this way, when the reflective elements are not arranged at the end regions of the adjacent frequency selective reflectors facing each other, the margin of positional deviation when the frequency selective reflectors are arranged on one surface of the substrate can be reduced compared to the case where the reflective elements are arranged at the end regions of the adjacent frequency selective reflectors facing each other. As a result, the positional deviation of the frequency selective reflectors can be suppressed.

[0323] For example Fig.24 (a) is an example in which the reflective element 3 is arranged in the end regions 27 facing each other of the adjacent frequency selective reflectors 1. Fig.24 (b) is an example in which the reflective element 3 is not arranged in the end regions 27 facing each other of the adjacent frequency selective reflectors 1. Fig.24 In (a) and (b), attention is paid to the area where the reflective element 3 is arranged. Fig.24 In (a), the reflective elements 3 are arranged in the end regions 27 of the adjacent frequency selective reflectors 1 facing each other, and the distance between the regions where the reflective elements 3 are arranged in the adjacent frequency selective reflectors 1 is the distance d1, d2 between the adjacent frequency selective reflectors 1. Fig.24 In (b), the reflective element 3 is not arranged in the end regions 27 of adjacent frequency selective reflectors 1 facing each other, and the distances d3 and d4 between the regions of adjacent frequency selective reflectors 1 where the reflective element 3 is arranged are larger than the distances d1 and d2 between adjacent frequency selective reflectors 1.

[0324] In these examples, a case is considered in which the distance between the regions where the reflective elements 3 of adjacent frequency selective reflectors 1 are arranged is designed to be, for example, 1 mm.

[0325] exist Fig.24 In (a), when the distance between the areas where the reflective elements 3 are arranged on adjacent frequency selective reflectors 1, that is, the distances d1 and d2 between adjacent frequency selective reflectors 1 are designed to be, for example, 1 mm, if the adjacent frequency selective reflectors 1 are to be arranged so as not to overlap each other, the frequency selective reflectors 1 can be offset from the designed position to 1 mm.

[0326] In contrast, Fig.24In (b), when the distances d3 and d4 between the regions where the reflective elements 3 of adjacent frequency selective reflectors 1 are arranged are designed to be, for example, 1 mm, if the adjacent frequency selective reflectors 1 are arranged so as not to overlap each other, the margin of positional deviation relative to the designed position is less than 1 mm due to the presence of the end region 27. In this case, when the distances d1 and d2 between the adjacent frequency selective reflectors 1 are designed to be 0.5 mm, if the adjacent frequency selective reflectors 1 are arranged so as not to overlap each other, the frequency selective reflectors 1 can be deviated from the designed position to 0.5 mm.

[0327] Therefore, when the reflective elements are not arranged at the end regions of the adjacent frequency selective reflectors facing each other, the margin of the positional deviation of the frequency selective reflectors relative to the design position can be reduced compared to the case where the reflective elements are arranged at the end regions of the adjacent frequency selective reflectors facing each other. Thus, the positional deviation of the frequency selective reflectors can be suppressed.

[0328] Here, in the case where the reflection characteristics of the plurality of frequency selective reflectors are different from each other, for example, by overlapping the reflected light beams based on the respective frequency selective reflectors, a reflected light beam based on the entire reflective structure can be formed. Therefore, in the case where the reflection characteristics of the plurality of frequency selective reflectors are different from each other, the positional offset of the frequency selective reflectors has a greater influence on the reflected light beam profile of the entire reflective structure than in the case where the reflection characteristics of the plurality of frequency selective reflectors are the same. Therefore, in the case where the reflection characteristics of the plurality of frequency selective reflectors are different from each other, the reflected light beam profile of the entire reflective structure may be disturbed due to the positional offset of the frequency selective reflectors.

[0329] Therefore, when the reflection characteristics of multiple frequency selective reflection plates are different from each other, by not configuring reflection elements in the end regions of adjacent frequency selective reflection plates facing each other, the positional deviation of the frequency selective reflection plates can be suppressed. As a result, the disturbance of the reflected light beam profile caused by the entire reflection structure can be suppressed.

[0330] In the case where the end regions of the adjacent frequency selective reflectors facing each other are not provided with a reflective element, the reflection intensity of the electromagnetic wave in the entire reflective structure is reduced compared to the case where the end regions of the adjacent frequency selective reflectors facing each other are provided with a reflective element. When the reflection intensity of the electromagnetic wave in the reflective structure in which the end regions of the adjacent frequency selective reflectors facing each other are provided with a reflective element is taken as 100%, the reflection intensity of the electromagnetic wave in the reflective structure in which the end regions of the adjacent frequency selective reflectors facing each other are not provided with a reflective element is preferably, for example, more than 85%. Thus, the reduction in the reflection intensity of the electromagnetic wave caused by not providing a reflective element in the end regions can be suppressed.

[0331] (5) Other aspects of frequency selective reflectors

[0332] The size of the frequency selective reflector in the present embodiment can be appropriately selected according to the size of the substrate, the purpose of the reflective structure, etc. Among them, in the case of the frequency selective reflector of the first embodiment, the size of the frequency selective reflector is, for example, preferably 150 mm square or more, and more preferably 200 mm square or more. For example, in the case of the frequency selective reflector of the first embodiment, when the frequency selective reflector is processed into the desired size, the reflective element sometimes has defects at the end. In such a case, by making the size of the frequency selective reflector relatively large as described above, the proportion of the area where the reflective element is defective can be reduced relative to the frequency selective reflector as a whole, and the influence of the defect of the reflective element on the reflection characteristics can be reduced.

[0333] In this embodiment, the reflection characteristics of the plurality of frequency selective reflectors may be the same or different from each other.

[0334] When the reflection characteristics of the plurality of frequency selective reflectors are different from each other, the reflection characteristics of each frequency selective reflector may be designed, for example, in a manner that the electromagnetic wave diffuses or in a manner that the electromagnetic wave converges. In addition, the reflection characteristics of each frequency selective reflector may be designed in a manner that the spherical wave is converted into a plane wave. In addition, the reflection characteristics of each frequency selective reflector may be designed in a manner that the reflection structure becomes a multi-beam.

[0335] In the first aspect of the frequency selective reflector, a plurality of reflective elements of different sizes are arranged in the reflective member. When the arrangement of the reflective elements in the plurality of frequency selective reflectors is different from one another, the reflection characteristics of the plurality of frequency selective reflectors are different from one another.

[0336] For example Fig.25 As shown, the frequency selective reflector 1 has a reflective member 2, and the reflective member 2 has a plurality of annular reflective elements 3 having different outer diameters arranged therein. The arrangement of the reflective elements 3 is different in the four frequency selective reflectors 1. In this case, the reflection characteristics of the plurality of frequency selective reflectors are different from each other.

[0337] In the second aspect of the frequency selective reflector, a plurality of unit regions having different thicknesses are arranged in the dielectric layer, and when the arrangement of the unit regions in the plurality of frequency selective reflectors is different from one another, the reflection characteristics of the plurality of frequency selective reflectors are different from one another.

[0338] Regarding the case where the reflection characteristics of a plurality of frequency selective reflectors are different from each other, reference can be made to International Publication No. 2023 / 027195.

[0339] The frequency selective reflector in this embodiment reflects electromagnetic waves of a specific frequency band in a direction different from the normal reflection direction. The frequency band of the electromagnetic wave is preferably a frequency band above microwaves with strong straightness. The frequency band of the electromagnetic wave is preferably above 2.5 GHz, more preferably above 24 GHz, and further preferably above 24 GHz and below 300 GHz. If the frequency band of the electromagnetic wave is within the above range, the reflective structure of this embodiment can be used in the fifth generation mobile communication system, the so-called 5G.

[0340] The frequency selective reflector in this embodiment can be used as, for example, a frequency selective reflector for communications, and is particularly suitable as a frequency selective reflector for mobile communications.

[0341] 3. Other structures

[0342] The reflective structure of the present embodiment may have other structures as necessary in addition to the frequency selective reflector and the substrate described above.

[0343] (1) Adhesion

[0344] In the reflective structure of this embodiment, for example Fig.26 As shown, bonding portions 28 may be disposed between adjacent frequency selective reflectors 1. The bonding portions reinforce the adjacent frequency selective reflectors 1, thereby improving the strength of the entire frequency selective reflectors.

[0345] For the bonding portion, for example, an adhesive or a pressure-sensitive adhesive may be used, and any of the known adhesives or pressure-sensitive adhesives may be appropriately selected and used. The adhesive or pressure-sensitive adhesive may be in a liquid state or in a sheet state.

[0346] The thickness of the adhesive portion is not particularly limited as long as a desired adhesive force can be obtained.

[0347] (2) Second adhesive layer

[0348] In the reflective structure of this embodiment, a second adhesive layer may be disposed between the substrate and the frequency selective reflector. The second adhesive layer is a layer for directly or indirectly bonding the frequency selective reflector to the substrate. Figure 3 (b) and Figure 4 In (c), the second adhesive layer is omitted.

[0349] For the second adhesive layer, for example, an adhesive or a pressure-sensitive adhesive can be used, and one of the adhesives and pressure-sensitive adhesives can be appropriately selected and used.

[0350] The thickness of the second adhesive layer is not particularly limited as long as a desired adhesive force can be obtained.

[0351] (3) Fixed parts

[0352] When the reflective structure of the present embodiment is mounted on a wall or the like for use, a fixing component may be arranged on the surface of the substrate on the opposite side of the frequency selective reflector, and the fixing component may have a mechanism for mounting the reflective structure. In addition, in order to suppress interference between the fixing component and the frequency selective reflector, a metal layer may be arranged between the fixing component and the frequency selective reflector, and the fixing component may also serve as the metal layer. In addition, when the reflective structure of the present embodiment is mounted on a wall or the like, the fixing component may also have a mechanism for making the angle of the normal direction of the frequency selective reflector variable, so as to be able to correct the deviation between the designed incident direction and reflection direction of the electromagnetic wave and the actual incident direction and reflection direction of the electromagnetic wave.

[0353] (4) Interference mitigation layer

[0354] The reflective structure of this embodiment may have an interference mitigation layer on the surface of the substrate on the opposite side to the frequency selective reflector, and the interference mitigation layer is used to mitigate the characteristic change caused by the interaction with the surface on which the reflective structure is set. The interference mitigation layer is not particularly limited as long as it has a dielectric constant close to that of air and can ensure an appropriate distance to reduce the interaction between the ground plane and the reflective component. For example, a foam such as polyurethane foam having a dielectric constant close to that of air or a plastic cardboard containing a large amount of air can be used.

[0355] In addition, when the frequency selective reflector does not have a ground layer, in order to suppress the interference between the substrate and the frequency selective reflector, an interference relaxation layer may be arranged between the substrate and the frequency selective reflector, or the substrate itself may be used as the interference relaxation layer. When an interference relaxation layer is arranged between the substrate and the frequency selective reflector, in order to prevent interference with the first alignment mark of the substrate, general measures such as adjusting the shape or light transmittance of the interference relaxation layer or arranging an additional alignment mark on the interference relaxation layer may be taken.

[0356] II. Second Embodiment of Reflective Structure

[0357] A second embodiment of the reflective structure disclosed in the present invention is a reflective structure having a frequency selective reflector that reflects electromagnetic waves of a specific frequency band in a direction different from the normal reflection direction, wherein the reflective structure comprises: a substrate having a first alignment mark; and the frequency selective reflector, which is arranged on one surface of the substrate, the frequency selective reflector comprising: a reflective component that reflects the electromagnetic waves, which is arranged on one surface of the substrate; and a plurality of dielectric layers that transmit the electromagnetic waves, which are arranged on the surface of the substrate on the side of the reflective component, the distance between adjacent dielectric layers is less than 1 / 2 of the wavelength of the electromagnetic waves, the dielectric layer having a concave-convex structure, the concave-convex structure having a plurality of unit structures having a thickness distribution with increasing thickness in a prescribed direction, the unit structure of the dielectric layer having a plurality of unit regions with different thicknesses, and in each unit structure of the dielectric layer, In a curve graph in which the length of the unit structure in the specified direction is set as the horizontal axis, the relative reflection phase when the electromagnetic wave passes through the dielectric layer and is reflected by the reflecting component and passes through the dielectric layer again and is emitted to the incident side of the electromagnetic wave is set as the vertical axis, and the value of the relative reflection phase of the electromagnetic wave exceeds -360 degrees and is below 0 degrees, points corresponding to the center position of each unit area in the specified direction and the relative reflection phase of the electromagnetic wave in each unit area are drawn, and a straight line passing through the point corresponding to the minimum thickness unit area with the minimum thickness is drawn. At this time, each point is on the same straight line, the dielectric layer has at least the first unit structure as the unit structure, and the first unit structure has more than three unit areas with different thicknesses. The relative reflection phase distribution of the electromagnetic wave is controlled by the thickness distribution of the dielectric layer, thereby controlling the reflection direction of the electromagnetic wave.

[0358] Fig. 27 FIG. 1 is a schematic top view showing an example of a reflective structure according to the present embodiment. Fig. 27 As shown, the reflective structure 20 has a frequency selective reflector 1 that reflects electromagnetic waves of a specific frequency band in a direction different from the normal reflection direction, and has: a substrate 21 having a first alignment mark 22; and a frequency selective reflector 1 arranged on one surface of the substrate 21. The frequency selective reflector 1 has: a reflective component 2 that reflects electromagnetic waves, which is arranged on one surface of the substrate 21; and a plurality of dielectric layers 5 that transmit electromagnetic waves, which are arranged on the surface of the substrate 21 on the side of the reflective component 2. The distances d5 and d6 between adjacent dielectric layers 5 are less than 1 / 2 of the wavelength of the electromagnetic waves of the specific frequency band.

[0359] For example, Fig. 27 In the embodiment, the substrate 21 has a cross-shaped first alignment mark 22 , and the positions of the edges of the dielectric layers 5 are aligned with reference to the first alignment mark 22 of the substrate 21 , so that the plurality of dielectric layers 5 are aligned.

[0360] Here, as mentioned above, although it is not a reflective array, in a phased array antenna arranged with multiple subarrays, in order to make the phases of the electromagnetic waves in each subarray consistent and enhance the intensity of the electromagnetic waves, usually the distance between adjacent subarrays is less than 1 / 2 of the wavelength of the electromagnetic waves.

[0361] Therefore, even in a reflective structure having a frequency selective reflector having a plurality of dielectric layers arranged in an array, it can be imagined that it is desirable that the distance between adjacent dielectric layers be less than 1 / 2 of the wavelength of the electromagnetic wave in order to, for example, make the phases of the reflected waves in each dielectric layer consistent and thereby enhance the intensity of the reflected waves, thereby suppressing the disorder of the wavefront of the reflected waves in the reflective structure as a whole.

[0362] In this embodiment, by providing the substrate with the first alignment mark, the alignment of the plurality of dielectric layers can be performed with high precision. Therefore, the accuracy of the distance between adjacent dielectric layers can be ensured. Therefore, the plurality of dielectric layers can be spliced ​​with high positional accuracy in a manner that the distance between adjacent dielectric layers is less than 1 / 2 of the wavelength of the electromagnetic wave of a specific frequency band. Therefore, the disorder of the wavefront of the reflected wave in the entire reflective structure can be suppressed, thereby obtaining the desired reflection characteristics, and the large area of ​​the reflective structure can be achieved.

[0363] Hereinafter, each structure of the reflection structure of this embodiment will be described.

[0364] 1. Substrate

[0365] The substrate in this embodiment is a member that supports the frequency selective reflection plate, and has a first alignment mark. The substrate is the same as that in the first embodiment described above.

[0366] The first alignment mark is a mark for aligning the dielectric layer. The first alignment mark is the same as that of the first embodiment.

[0367] As described later, when the reflective member has a reflective layer and the reflective member has a dielectric substrate and a reflective layer arranged on the entire surface of the dielectric substrate, the dielectric substrate may also serve as a base material and the dielectric substrate may have a first alignment mark.

[0368] In addition, as described later, when the reflective component has a plurality of reflective elements, and the reflective component has a dielectric substrate and a plurality of reflective elements arranged on at least one surface of the dielectric substrate, the dielectric substrate may also serve as a base material, and the dielectric substrate may have a first alignment mark.

[0369] In this embodiment, the substrate may also have a third identification mark for identifying the position of the dielectric layer. By providing the substrate with the third identification mark, the position of each dielectric layer can be easily identified, so each dielectric layer can be reliably and easily arranged at the correct position. This is particularly useful in a frequency selective reflector when the reflection characteristics of multiple dielectric layers are different from each other.

[0370] The third identification mark is the same as the first identification mark in the above-mentioned first embodiment.

[0371] 2. Frequency selective reflector

[0372] The frequency selective reflector in this embodiment is a component that reflects electromagnetic waves of a specific frequency band in a direction different from the normal reflection direction. In addition, the frequency selective reflector in this embodiment has: a reflective component that reflects electromagnetic waves, which is arranged on one surface of a substrate; and a plurality of dielectric layers that allow electromagnetic waves to pass through, which are arranged on the surface of the substrate on the side of the reflective component. In this embodiment, the distance between adjacent dielectric layers is less than 1 / 2 of the wavelength of the electromagnetic wave. In addition, in the frequency selective reflection plate of the present embodiment, the dielectric layer has a concave-convex structure, and the concave-convex structure is configured with multiple unit structures. The unit structure has a thickness distribution in which the thickness increases in a specified direction. The unit structure of the dielectric layer has multiple unit areas with different thicknesses. In each unit structure of the dielectric layer, in a curve graph with the length of the unit structure in the specified direction as the horizontal axis, the relative reflection phase when the electromagnetic wave passes through the dielectric layer and is reflected by the reflection component and passes through the dielectric layer again and is emitted to the incident side of the electromagnetic wave as the vertical axis, and the value of the relative reflection phase of the electromagnetic wave exceeds -360 degrees and is below 0 degrees, points corresponding to the center position of each unit area in the specified direction and the relative reflection phase of the electromagnetic wave in each unit area are drawn, and a straight line passing through the point corresponding to the minimum thickness unit area with the minimum thickness is drawn. At this time, each point is on the same straight line, the dielectric layer has at least the first unit structure as the unit structure, and the first unit structure has more than three unit areas with different thicknesses. The relative reflection phase distribution of the electromagnetic wave is controlled by the thickness distribution of the dielectric layer.

[0373] (1) Distance between adjacent dielectric layers

[0374] In the present embodiment, the distance between adjacent dielectric layers is less than 1 / 2 of the wavelength of the electromagnetic wave of a specific frequency band, preferably less than 1 / 5, and more preferably less than 1 / 10. By making the distance between adjacent dielectric layers the above range, the disorder of the wavefront of the reflected wave in the entire reflective structure can be suppressed. As described later, the frequency band of the electromagnetic wave is preferably more than 2.5 GHz, more preferably more than 24 GHz. That is, the wavelength of the electromagnetic wave in the air is preferably less than 119.92 mm, more preferably less than 12.49 mm. Therefore, the distance between adjacent dielectric layers is specifically preferably less than 59.96 mm, more preferably less than 6.245 mm. In addition, the shorter the distance between adjacent dielectric layers, the more preferred, and its lower limit is not particularly limited.

[0375] (2) Dielectric layer

[0376] The dielectric layer is the same as the dielectric layer of the frequency selective reflector of the second aspect in the reflective structure of the first embodiment described above.

[0377] The dielectric layer may be light-transmissive or light-opaque. Alternatively, the dielectric layer may be light-reflective. The optical properties of the dielectric layer are appropriately selected based on the method of aligning the dielectric layer using the first alignment mark.

[0378] When the dielectric layer has light opacity, for example, the dielectric layer can be made light opaque by containing a colorant or a filler. As the colorant and the filler, a substance having no conductivity and no magnetism is used.

[0379] In addition, when the dielectric layer has light reflection, for example, by making the surface of the dielectric layer rough or making the dielectric layer contain particles having a refractive index different from that of the resin constituting the dielectric layer, the dielectric layer can be made light scattering. In addition, in order to align the dielectric layer, light reflection can also be given to a part of the dielectric layer. As a part of the dielectric layer, for example, the outer peripheral part of the dielectric layer or the part near the first alignment mark of the dielectric layer can be listed. As a method of giving light reflection to a part of the dielectric layer, for example, a method of printing white pigment ink or non-conductive metal ink can be listed.

[0380] (3) Reflective components

[0381] The reflecting member is the same as the reflecting member of the frequency selective reflector of the second aspect in the reflecting structure of the first embodiment.

[0382] In the case where the reflective component has a reflective layer, for example, the reflective component may also have a dielectric substrate and a reflective layer arranged on the entire surface of the dielectric substrate in order from the substrate side, or the reflective component may also have a reflective layer arranged in contact with the substrate. In addition, in the case where the reflective component has a dielectric substrate and a reflective layer, the dielectric substrate may be a component different from the substrate, or the dielectric substrate may also serve as the substrate. In the case where the dielectric substrate serves as the substrate, the dielectric substrate can have a first alignment mark. In addition, in the case where the dielectric substrate serves as the substrate, the substrate may also have a dielectric substrate and a supporting substrate supporting a frequency selective reflector in order from the reflective component side. Specifically, it may be that the reflective component has a dielectric substrate and a reflective layer, the dielectric substrate is a component different from the substrate, and a reflective component having a dielectric substrate and a reflective layer is arranged on one surface of the substrate. In addition, it may be that the reflective component has a dielectric substrate and a reflective layer, the dielectric substrate serves as the substrate, the substrate has a dielectric substrate and a supporting substrate, the dielectric substrate has a first alignment mark, and a reflective layer is arranged on the surface of the dielectric substrate side of the substrate having the supporting substrate and the dielectric substrate. Alternatively, a reflective layer may be disposed in contact with the substrate.

[0383] When the reflective component has a dielectric substrate and a reflective layer, and the dielectric substrate is a component different from the base material, the thickness and size of the base material have an advantage of freedom. In addition, in this case, compared with the frequency selective reflector of the second mode in the reflective structure of the first embodiment, the manufacturing process is simpler.

[0384] In addition, in the case where the reflective component has a dielectric substrate and a reflective layer, the dielectric substrate also serves as a substrate, the substrate has a dielectric substrate and a supporting substrate, the dielectric substrate has a first alignment mark, and the reflective layer is arranged on the surface of the dielectric substrate side of the substrate, there is an advantage that the thickness and size of the supporting substrate constituting the substrate have a degree of freedom. In addition, in this case, the manufacturing process is simpler than the frequency selective reflector of the second mode in the reflective structure of the first embodiment described above. In addition, in this case, the reflective layer and the first alignment mark can be arranged on one surface of the dielectric substrate, that is, the reflective layer and the first alignment mark can be arranged on the same plane. Therefore, in this case, the first alignment mark can be arranged in a manner that does not overlap with the reflective layer, so the visual recognizability of the first alignment mark can be improved. In addition, in this case, the same material can be used for the reflective layer and the first alignment mark, and the reflective layer and the first alignment mark can be formed simultaneously on the dielectric substrate.

[0385] In addition, when the reflective component has a reflective layer that is arranged in contact with the substrate, although the degree of freedom of the substrate becomes lower, since a dielectric substrate is not required, the manufacturing process can be further simplified. In addition, in this case, the reflective layer and the first alignment mark can be arranged on one surface of the substrate, that is, the reflective layer and the first alignment mark can be arranged on the same plane. Therefore, in this case, as described above, the first alignment mark can be arranged in a manner that does not overlap with the reflective layer, so the visual recognition of the first alignment mark can be improved. In addition, in this case, the same material can be used for the reflective layer and the first alignment mark, and the reflective layer and the first alignment mark can be formed on the substrate at the same time.

[0386] In addition, when the reflective component has a reflective layer, the reflective layer may or may not be arranged in the region between adjacent dielectric layers. In addition, even when a reflective layer is arranged in the region between adjacent dielectric layers, since the total area of ​​the region between adjacent dielectric layers is sufficiently small relative to the overall area of ​​the frequency selective reflector, it is considered that there is almost no influence on the reflection characteristics.

[0387] In addition, in the case where the reflecting component has a plurality of reflecting elements, for example, the reflecting component may also have a dielectric substrate, and a plurality of reflecting elements arranged on at least one surface of the dielectric substrate, or the reflecting component may also have a plurality of reflecting elements arranged in contact with the substrate. In addition, in the case where the reflecting component has a dielectric substrate and a plurality of reflecting elements, the dielectric substrate may also be a component different from the substrate, or the dielectric substrate may also serve as the substrate. In the case where the dielectric substrate also serves as the substrate, the dielectric substrate may have a first alignment mark. In addition, in the case where the dielectric substrate also serves as the substrate, the substrate may also have a dielectric substrate and a supporting substrate supporting the frequency selective reflecting plate in sequence from the reflecting component side. For example, as Fig.28 As shown in (a), the reflective component 2 may include a dielectric substrate 4 and a plurality of reflective elements 3, the dielectric substrate 4 is a component different from the base material 21, and the reflective component 2 including the dielectric substrate 4 and the plurality of reflective elements 3 is disposed on one surface of the base material 21. Fig.28 As shown in (b), the reflective member 2 may include a dielectric substrate 4 and a plurality of reflective elements 3, the dielectric substrate 4 also serves as a base material 21, the base material 21 includes a dielectric substrate 4 and a support substrate 21a, the dielectric substrate 4 includes a first alignment mark 22, and the plurality of reflective elements 3 are arranged on a surface of the base material 21 including the support substrate 21a and the dielectric substrate 4 on the dielectric substrate 4 side. Fig.28 As shown in (c) , a plurality of reflective elements 3 may be arranged in contact with the substrate 21 .

[0388] When the reflective component has a dielectric substrate and a plurality of reflective elements, and the dielectric substrate is a component different from the base material, there is an advantage that the thickness and size of the base material have a degree of freedom. In addition, in this case, compared with the frequency selective reflector of the second mode in the reflective structure of the first embodiment, the manufacturing process is simpler.

[0389] In addition, when the reflective component has a dielectric substrate and a plurality of reflective elements, the dielectric substrate also serves as a base material, the base material has a dielectric substrate and a support substrate, the dielectric substrate has a first alignment mark, and the plurality of reflective elements are arranged on the surface of the base material on the dielectric substrate side, there is an advantage that the thickness and size of the support substrate constituting the base material have a degree of freedom. In addition, in this case, the manufacturing process is simpler than the frequency selective reflector of the second mode in the reflective structure of the first embodiment. In addition, in this case, for example, Fig.28 As shown in (b), a plurality of reflective elements 3 and the first alignment mark 22 can be arranged on one surface of the dielectric substrate 4, that is, the plurality of reflective elements 3 and the first alignment mark 22 can be arranged on the same plane. Therefore, in this case, the first alignment mark and the plurality of reflective elements can be arranged so as not to overlap, thereby improving the visual recognizability of the first alignment mark. In addition, in this case, the same material can be used for the plurality of reflective elements and the first alignment mark, and the plurality of reflective elements and the first alignment mark can be formed simultaneously on the dielectric substrate.

[0390] In addition, when the reflective component has a plurality of reflective elements arranged in contact with the substrate, although the degree of freedom of the substrate is reduced, since a dielectric substrate is not required, the manufacturing process can be further simplified. Fig.28 As shown in (c), a plurality of reflective elements 3 and the first alignment mark 22 can be arranged on one surface of the substrate 21, that is, the plurality of reflective elements 3 and the first alignment mark 22 can be arranged on the same plane. Therefore, in this case, as described above, the first alignment mark and the plurality of reflective elements can be arranged so as not to overlap, thereby improving the visual recognizability of the first alignment mark. In addition, in this case, the same material can also be used for the plurality of reflective elements and the first alignment mark, and the plurality of reflective elements and the first alignment mark can be formed on the substrate at the same time.

[0391] In addition, when the reflective component has a plurality of reflective elements, the reflective elements may or may not be arranged in the region between adjacent dielectric layers. In addition, even when the reflective elements are arranged in the region between adjacent dielectric layers, since the total area of ​​the region between adjacent dielectric layers is sufficiently small relative to the area of ​​the entire frequency selective reflector, it can be considered that there is almost no influence on the reflection characteristics.

[0392] (4) Control of the reflection direction of electromagnetic waves

[0393] In the frequency selective reflector of the present embodiment, the control of the reflection direction of the electromagnetic wave is the same as that of the frequency selective reflector of the second aspect in the reflection structure of the first embodiment described above.

[0394] (5) Other structures

[0395] The frequency selective reflector in this embodiment may have other structures as required in addition to the above-mentioned reflective component and dielectric layer. As other structures, for example, an adhesive layer, a space, a protective component, a ground layer, a flattening layer, and an anti-reflection layer can be listed. These structures are the same as the frequency selective reflector in the second mode in the reflective structure of the first embodiment.

[0396] In the frequency selective reflector of the present embodiment, the second adhesive portion may be disposed between adjacent dielectric layers. That is, the frequency selective reflector may have a second adhesive portion between adjacent dielectric layers similar to that in the first embodiment. Fig.26 The second bonding portion is the same as the bonding portion 28 shown. The second bonding portion reinforces the adjacent dielectric layers, thereby improving the overall strength.

[0397] The second bonding portion is the same as the bonding portion in the reflection structure of the first embodiment.

[0398] (6) Alignment of dielectric layers

[0399] In this embodiment, the first alignment mark of the substrate can be used to align the plurality of dielectric layers. For example, the dielectric layers can be aligned by aligning the edges of the dielectric layers with the first alignment mark of the substrate as a reference. In addition, for example, the dielectric layers can have a third alignment mark, and the dielectric layers can be aligned by aligning the third alignment mark of the dielectric layers with the first alignment mark of the substrate as a reference.

[0400] For example, Fig. 27 In the embodiment, the substrate 21 has a cross-shaped first alignment mark 22, and the position of the edge of the dielectric layer 5 is aligned with the first alignment mark 22 of the substrate 21 as a reference to align the dielectric layer 5. Specifically, when the dielectric layer is opaque, the substrate is translucent, and the first alignment mark is opaque, the first alignment mark of the substrate and the edge of the dielectric layer can be detected by using transmitted light, and the dielectric layer can be aligned. In addition, when the dielectric layer is reflective and the first alignment mark is reflective, the first alignment mark of the substrate and the edge of the dielectric layer can be detected by using reflected light, and the dielectric layer can be aligned.

[0401] In addition, for example, the substrate may have a circular first alignment mark, and the dielectric layer may have a hollow circular third alignment mark, and the dielectric layer may be positioned by aligning the third alignment mark of the dielectric layer with reference to the first alignment mark of the substrate.

[0402] In addition, for example, the substrate may have a first alignment mark in the shape of a cross, and the dielectric layer may have a third alignment mark which is a quadrilateral through hole. The dielectric layer may be positioned by aligning the third alignment mark of the dielectric layer with reference to the first alignment mark of the substrate.

[0403] The specific example of the positional alignment of the dielectric layer is the same as the positional alignment of the frequency selective reflector in the reflective structure of the first embodiment described above.

[0404] (a) Third alignment mark

[0405] In this embodiment, the dielectric layer may have a third alignment mark. The third alignment mark is a mark for aligning the dielectric layer.

[0406] The third alignment mark is the same as the second alignment mark of the reflection structure of the first embodiment described above.

[0407] (b) Fourth identification mark

[0408] In this embodiment, the dielectric layer may also have a fourth identification mark for identifying the dielectric layer. By providing the dielectric layer with the fourth identification mark, each dielectric layer can be easily identified, and the top, bottom, left, right, front and back of the dielectric layer can be easily identified, so each dielectric layer can be reliably and easily arranged in the correct position. This is particularly useful in the case where the reflection characteristics of the plurality of dielectric layers are different in the frequency selective reflector.

[0409] The fourth identification mark is the same as the second identification mark of the reflection structure of the first embodiment described above.

[0410] (c) Concavoconvex part

[0411] In this embodiment, adjacent dielectric layers may have concave-convex portions that can fit together on the sides facing each other, and the adjacent dielectric layers may be arranged in such a manner that the concave-convex portions fit together. That is, adjacent dielectric layers may have concave-convex portions that can fit together on the sides facing each other, similar to the first embodiment described above. Fig.21 and Fig. 22 The concave-convex part 26 shown in the figure is the same concave-convex part. By fitting the concave-convex part, the plurality of dielectric layers can be easily aligned. In addition, since the contact area between adjacent dielectric layers is increased, the strength can be improved.

[0412] The concavo-convex portion is the same as the concavo-convex portion of the reflective structure of the first embodiment described above.

[0413] (7) Other aspects of frequency selective reflectors

[0414] In the present embodiment, the size of the dielectric layer is appropriately selected according to the size of the substrate, the purpose of the reflective structure, etc. The size of the dielectric layer is preferably 150 mm square or more, and more preferably 200 mm square or more, for example.

[0415] In this embodiment, the reflection characteristics in the plurality of dielectric layers may be the same or different from each other.

[0416] When the reflection characteristics in a plurality of dielectric layers are different from each other, the reflection characteristics in each dielectric layer may be designed, for example, in a manner that the electromagnetic wave diffuses or in a manner that the electromagnetic wave converges. In addition, the reflection characteristics in each dielectric layer may be designed in a manner that the spherical wave is converted into a plane wave. In addition, the reflection characteristics in each dielectric layer may be designed in a manner that the reflection structure becomes a multi-beam.

[0417] In the dielectric layer, a plurality of cell regions having different thicknesses are arranged. When the arrangement of the cell regions in the plurality of dielectric layers is different from each other, the reflection characteristics in the plurality of dielectric layers are different from each other.

[0418] Regarding the case where the reflection characteristics in multiple dielectric layers are different from each other, reference can be made to International Publication No. 2023 / 027195.

[0419] The frequency selective reflector in this embodiment reflects electromagnetic waves in a specific frequency band in a direction different from the regular reflection direction. The frequency band of the electromagnetic waves is the same as that in the first embodiment described above.

[0420] The frequency selective reflector in this embodiment can be used as, for example, a frequency selective reflector for communications, and is particularly suitable as a frequency selective reflector for mobile communications.

[0421] 3. Other structures

[0422] The reflective structure of this embodiment can also have other structures as required in addition to the above-mentioned frequency selective reflector and substrate. As other structures, for example, a second adhesive layer, a fixing component, and an interference relaxation layer can be listed. About these structures, it is the same as the above-mentioned first embodiment.

[0423] III. Third Implementation Method of Reflective Structure

[0424] The third embodiment of the reflective structure disclosed in the present invention is a reflective structure having a frequency selective reflector that reflects electromagnetic waves in a specific frequency band in a direction different from the normal reflection direction, wherein the reflective structure has a substrate and a plurality of the frequency selective reflectors arranged on one surface of the substrate, two adjacent sides of at least one of the frequency selective reflectors are aligned with two adjacent sides of the substrate, and a distance between adjacent frequency selective reflectors is less than 1 / 2 of the wavelength of the electromagnetic wave.

[0425] Fig.29 (a) is a schematic plan view showing an example of a reflective structure according to the present embodiment, Fig.29 (b) is Fig.29 (a) AA line cross-sectional view. Fig.29 As shown in (a) and (b) of FIG. 1 , the reflection structure 20 has frequency selective reflection plates 1A to 1D that reflect electromagnetic waves of a specific frequency band in a direction different from the regular reflection direction, and the reflection structure 20 has: a substrate 21; and a plurality of frequency selective reflection plates 1A to 1D arranged on one surface of the substrate 21. The distances d1 and d2 between adjacent frequency selective reflection plates 1A to 1D are less than 1 / 2 of the wavelength of the electromagnetic waves of the specific frequency band.

[0426] For example, Fig.29 In (a) and (b), the two adjacent sides Sa1 and Sa2 of the frequency selective reflector 1A are aligned with the two adjacent sides S01 and S02 of the substrate 21. Therefore, for the frequency selective reflector 1A, the positions of the two adjacent sides Sa1 and Sa2 of the frequency selective reflector 1A are aligned with the two adjacent sides S01 and S02 of the substrate 21 as a reference, so as to align the frequency selective reflector 1A.

[0427] Regarding the frequency selective reflection plates 1B to 1D, for example, Fig.30As shown in (a), the frequency selective reflectors 1B to 1D may be aligned by using the side of the substrate as a reference and making the edge of the frequency selective reflector abut against the edge of the adjacent frequency selective reflector. For example, with respect to the frequency selective reflector 1B, the side Sb1 of the frequency selective reflector 1B is aligned by using the side S01 of the substrate 21 as a reference, and making the edge of the frequency selective reflector 1B abut against the edge of the frequency selective reflector 1A adjacent to the frequency selective reflector 1B, so as to align the frequency selective reflector 1B. In this case, of the two adjacent sides Sb1 and Sb2 of the frequency selective reflector 1B, the side Sb1 of the frequency selective reflector 1B is aligned with the side S01 of the substrate 21, and the side Sb2 of the frequency selective reflector 1B is in contact with the side Sa4 of the frequency selective reflector 1A. Regarding the frequency selective reflector 1C, the position of one side Sc2 of the frequency selective reflector 1C is aligned with one side S02 of the substrate 21 as a reference, and the edge of the frequency selective reflector 1C is brought into contact with the edge of the frequency selective reflector 1A adjacent to the frequency selective reflector 1C, so as to align the frequency selective reflector 1C. In this case, of the two adjacent sides Sc1 and Sc2 of the frequency selective reflector 1C, the side Sc2 of the frequency selective reflector 1C is aligned with the side S02 of the substrate 21, and the side Sc1 of the frequency selective reflector 1C is brought into contact with the side Sa3 of the frequency selective reflector 1A. Regarding the frequency selective reflector 1D, the edge of the frequency selective reflector 1D is brought into contact with the edges of the frequency selective reflectors 1B and 1C adjacent to the frequency selective reflector 1D, so as to align the frequency selective reflector 1D. In this case, of the two adjacent sides Sd1 and Sd2 of the frequency selective reflector 1D, the side Sd2 of the frequency selective reflector 1D contacts the side Sc4 of the frequency selective reflector 1C, and the side Sd1 of the frequency selective reflector 1D contacts the side Sb3 of the frequency selective reflector 1B.

[0428] In addition, for the frequency selective reflection plates 1B to 1D, for example Fig.30As shown in (b), the frequency selective reflectors 1B to 1D may be aligned with the sides of the substrate as a reference. For example, with respect to the frequency selective reflector 1B, the positions of the adjacent sides Sb1 and Sb4 of the frequency selective reflector 1B are aligned with the adjacent sides S01 and S04 of the substrate 21 to perform the alignment of the frequency selective reflector 1B. In this case, the adjacent sides Sb1 and Sb4 of the frequency selective reflector 1B are aligned with the adjacent sides S01 and S04 of the substrate 21. With respect to the frequency selective reflector 1C, the positions of the adjacent sides Sc2 and Sc3 of the frequency selective reflector 1C are aligned with the adjacent sides S02 and S03 of the substrate 21 to perform the alignment of the frequency selective reflector 1C. In this case, the adjacent sides Sc2 and Sc3 of the frequency selective reflector 1C are aligned with the adjacent sides S02 and S03 of the substrate 21. The frequency selective reflector 1D is aligned by aligning the positions of the two adjacent sides Sd3 and Sd4 of the frequency selective reflector 1D with reference to the two adjacent sides S03 and S04 of the substrate 21. In this case, the two adjacent sides Sd3 and Sd4 of the frequency selective reflector 1D are aligned with the two adjacent sides S03 and S04 of the substrate 21.

[0429] In addition, although not shown in the figure, the frequency selective reflectors 1B to 1D may each have a second alignment mark, and the second alignment marks of the frequency selective reflectors 1A and 1A are aligned with each other to perform the alignment of the frequency selective reflectors 1B and 1C, based on the second alignment mark of the frequency selective reflector 1A. Furthermore, the second alignment mark of the frequency selective reflectors 1B and 1C is aligned with each other to perform the alignment of the frequency selective reflectors 1D.

[0430] In addition, the frequency selective reflectors 1B to 1D may be aligned by using the second alignment marks of the frequency selective reflectors and by using the edges of the frequency selective reflectors to abut against each other. For example, the frequency selective reflectors 1B and 1C may be aligned with the frequency selective reflector 1A using the second alignment marks of the frequency selective reflectors 1A to 1C, and the frequency selective reflector 1D may be aligned by abutting the edges of the frequency selective reflectors 1B and 1C.

[0431] In the reflection structure of the present embodiment, similarly to the first embodiment of the reflection structure described above, in order to, for example, make the phases of the reflected waves in each frequency selective reflection plate consistent to enhance the intensity of the reflected waves, thereby suppressing the disorder of the wavefront of the reflected waves in the reflection structure as a whole, it can be imagined that it is desirable that the distance between adjacent frequency selective reflection plates is less than 1 / 2 of the wavelength of the electromagnetic wave.

[0432] In the present embodiment, two adjacent sides of at least one frequency selective reflector are aligned with two adjacent sides of the substrate, thereby enabling high-precision alignment of multiple frequency selective reflectors. Therefore, the accuracy of the distance between adjacent frequency selective reflectors can be ensured. Therefore, multiple frequency selective reflectors can be spliced ​​with high positional accuracy in a manner that the distance between adjacent frequency selective reflectors is less than 1 / 2 of the wavelength of electromagnetic waves in a specific frequency band. Therefore, the disorder of the wavefront of the reflected wave in the entire reflective structure can be suppressed, thereby obtaining the desired reflection characteristics, and the large area of ​​the reflective structure can be achieved.

[0433] Hereinafter, each structure of the reflection structure of this embodiment will be described.

[0434] 1. Substrate

[0435] The substrate in this embodiment is a member that supports the frequency selective reflection plate. The substrate is the same as the substrate in the first embodiment described above except that the substrate does not have the first alignment mark.

[0436] In this embodiment, the shape of the substrate is not limited to a rectangle, and may be a polygon such as a triangle or a pentagon. In addition, the shape of the substrate may be a shape having a corner as a reference. If there is a corner as a reference, such as a teardrop shape, a crescent shape, or a shape obtained by cutting off a part of a circle, the contour lines extending from the corner to both sides can be regarded as the adjacent two sides of the substrate.

[0437] In the present embodiment, the size of the substrate is preferably approximately the same as the total size when all frequency selective reflectors are arranged. The size of the substrate being approximately the same as the total size when all frequency selective reflectors are arranged means that the difference in the inner and outer dimensions when the outline of the substrate overlaps with the outline of the outer shape when all frequency selective reflectors are arranged is less than 1 / 2 of the wavelength of the electromagnetic wave in a specific frequency band. The above-mentioned size difference is preferably less than 1 / 5 of the wavelength of the electromagnetic wave in a specific frequency band, and more preferably less than 1 / 10 of the wavelength of the electromagnetic wave in a specific frequency band. It should be noted that the outline of the substrate and the outline of the outer shape when all frequency selective reflectors are arranged are preferably similar in shape, but for example, in terms of design, even if the outline of the substrate is partially protruding outward, there is no particular problem in the configuration of the frequency selective reflectors.

[0438] 2. Frequency selective reflector

[0439] The frequency selective reflector in this embodiment is a member that reflects electromagnetic waves in a specific frequency band in a direction different from the regular reflection direction.

[0440] The distance between adjacent frequency selective reflection plates is the same as that in the first embodiment.

[0441] The embodiment of the frequency selective reflection plate is the same as that of the first embodiment.

[0442] In the present embodiment, the alignment of at least one frequency selective reflector can be performed by aligning the positions of the adjacent two sides of at least one frequency selective reflector with reference to the adjacent two sides of the substrate. After the alignment of at least one frequency selective reflector is performed, for other frequency selective reflectors, for example, the side of the substrate can be used as a reference, and the edge of the frequency selective reflector is abutted against the edge of the adjacent frequency selective reflector, thereby aligning the other frequency selective reflectors. In addition, with respect to other frequency selective reflectors, each frequency selective reflector may have a second alignment mark, and the second alignment mark is used to align the relative positions of each frequency selective reflector. In addition, for other frequency selective reflectors, the alignment achieved based on the second alignment mark of the frequency selective reflector and the alignment achieved based on the abutment of the edges of the frequency selective reflectors can also be used in combination. In addition, for all frequency selective reflectors, the alignment of all frequency selective reflectors can also be performed by aligning the positions of the adjacent two sides of the substrate with reference to the adjacent two sides of the frequency selective reflector.

[0443] The specific example of the positional alignment of the frequency selective reflector is as described above.

[0444] Furthermore, when aligning the frequency selective reflectors, when the edge of a frequency selective reflector is brought into contact with the edge of an adjacent frequency selective reflector, the edge of the frequency selective reflector may be brought into contact with the edge of the adjacent frequency selective reflector via a spacer.

[0445] In the present embodiment, the frequency selective reflection plate may have a second alignment mark. The second alignment mark is a mark for aligning the frequency selective reflection plate, and is a mark for aligning the relative positions of the frequency selective reflection plates.

[0446] The second alignment mark is the same as the first embodiment. The second alignment mark is preferably arranged in the peripheral area of ​​the frequency selective reflector. When the edge of the frequency selective reflector is brought into contact with the edge of the adjacent frequency selective reflector, it is easy to adjust the offset in the direction parallel to the edge of the frequency selective reflector.

[0447] In this embodiment, the frequency selective reflection plate may include a second identification mark for identifying the frequency selective reflection plate. The second identification mark is the same as that in the first embodiment.

[0448] In this embodiment, adjacent frequency selective reflectors may have concave-convex portions that can fit together on the sides facing each other, and the adjacent frequency selective reflectors may be arranged in a manner that the concave-convex portions fit together. By fitting the concave-convex portions together, it is possible to easily align a plurality of frequency selective reflectors. In this case, the concave-convex portions substantially function as the second alignment mark. The concave-convex portions are the same as those of the reflector structure of the first embodiment described above.

[0449] The dimensions of the frequency selective reflector are the same as those of the first embodiment.

[0450] In the present embodiment, as described above, the substrate does not have the first alignment mark, and the positions of the two adjacent sides of the substrate are used as a reference to align the positions of the two adjacent sides of at least one frequency selective reflector to perform the alignment of at least one frequency selective reflector. Therefore, the deviation of the outer dimensions of the frequency selective reflector is preferably less than 1 / 2 of the wavelength of the electromagnetic wave of the specific frequency band, more preferably less than 1 / 5 of the wavelength of the electromagnetic wave of the specific frequency band, and further preferably less than 1 / 10 of the wavelength of the electromagnetic wave of the specific frequency band. For example, it varies depending on the type of material, machine, etc., but generally speaking, the dimensional deviation of the cutting process is about ±1 mm. Therefore, the deviation of the outer dimensions of the frequency selective reflector can meet the requirement of being less than 1 / 2 of the wavelength of the electromagnetic wave of the specific frequency band.

[0451] In this embodiment, the reflection characteristics of the plurality of frequency selective reflection plates may be the same or different from each other. The case where the reflection characteristics of the plurality of frequency selective reflection plates are different from each other is the same as in the first embodiment.

[0452] The frequency selective reflector in this embodiment reflects electromagnetic waves of a specific frequency band in a direction different from the normal reflection direction. Regarding the frequency band of the electromagnetic wave, it is the same as the first embodiment described above. As described above, the deviation of the outer dimensions of the frequency selective reflector is preferably less than 1 / 2 of the wavelength of the electromagnetic wave of a specific frequency band. Therefore, the longer the wavelength of the electromagnetic wave, that is, the shorter the frequency band of the electromagnetic wave, the greater the deviation of the outer dimensions is allowed. Therefore, the frequency band of the electromagnetic wave is preferably lower even within the specified range. Specifically, the frequency band of the electromagnetic wave is preferably above 2.5 GHz and below 149.9 GHz, more preferably above 2.5 GHz and below 60.0 GHz, and further preferably above 2.5 GHz and below 30.0 GHz.

[0453] The frequency selective reflector in this embodiment can be used as, for example, a frequency selective reflector for communications, and is particularly suitable as a frequency selective reflector for mobile communications.

[0454] 3. Other structures

[0455] The reflection structure of the present embodiment can also have other structures as required in addition to the above-mentioned frequency selective reflector and substrate. As other structures, for example, an adhesive portion, a second adhesive layer, a fixing component, and an interference relaxation layer can be listed. About these structures, it is the same as the above-mentioned first embodiment.

[0456] IV. Fourth Embodiment of Reflective Structure

[0457] The fourth embodiment of the reflective structure disclosed in the present invention is a reflective structure having a frequency selective reflector that reflects electromagnetic waves of a specific frequency band in a direction different from the normal reflection direction, wherein the reflective structure has: a substrate; and the above-mentioned frequency selective reflector, which is arranged on one surface of the above-mentioned substrate, and the above-mentioned frequency selective reflector has: a reflective component that reflects the above-mentioned electromagnetic waves, which is arranged on one surface of the above-mentioned substrate; and a plurality of dielectric layers that allow the above-mentioned electromagnetic waves to pass, which are arranged on the surface of the above-mentioned reflective component side of the above-mentioned substrate, at least two adjacent sides of the above-mentioned dielectric layer are aligned with two adjacent sides of the above-mentioned substrate, and the distance between the adjacent above-mentioned dielectric layers is less than 1 / 2 of the wavelength of the above-mentioned electromagnetic wave, and the above-mentioned dielectric layer has a concave-convex structure, and the concave-convex structure is configured with a plurality of unit structures having a thickness distribution with increasing thickness in a specified direction, and the above-mentioned unit structure of the above-mentioned dielectric layer has a plurality of unit areas with different thicknesses, In each unit structure of the dielectric layer, the length of the unit structure in the specified direction is set as the horizontal axis, the relative reflection phase when the electromagnetic wave passes through the dielectric layer and is reflected by the reflecting component and passes through the dielectric layer again and is emitted to the incident side of the electromagnetic wave is set as the vertical axis, and in a curve graph in which the value of the relative reflection phase of the electromagnetic wave exceeds -360 degrees and is below 0 degrees, points corresponding to the center position of each unit area in the specified direction and the relative reflection phase of the electromagnetic wave in each unit area are drawn, and a straight line passing through the point corresponding to the minimum thickness unit area with the minimum thickness is drawn, at this time, each point is on the same straight line, the dielectric layer has at least the first unit structure as the unit structure, and the first unit structure has more than three unit areas with different thicknesses, and the relative reflection phase distribution of the electromagnetic wave is controlled by the thickness distribution of the dielectric layer, thereby controlling the reflection direction of the electromagnetic wave.

[0458] Fig.31 (a) is a schematic plan view showing an example of a reflective structure according to the present embodiment, Fig.31 (b) is Fig.31 (a) AA line cross-sectional view. Fig.31 As shown in (a) and (b) of FIG. 1 , the reflective structure 20 has a frequency selective reflector 1 that reflects electromagnetic waves of a specific frequency band in a direction different from the regular reflection direction, and has a substrate 21 and the frequency selective reflector 1 arranged on one surface of the substrate 21. The frequency selective reflector 1 has: a reflective component 2 that reflects electromagnetic waves, which is arranged on one surface of the substrate 21; and a plurality of dielectric layers 5A to 5D that transmit electromagnetic waves, which are arranged on the surface of the substrate 21 on the side of the reflective component 2. The distances d5 and d6 between adjacent dielectric layers 5A to 5D are less than 1 / 2 of the wavelength of the electromagnetic waves of the specific frequency band.

[0459] For example, Fig.31 In (a) and (b), two adjacent sides Sa11 and Sa12 in the dielectric layer 5A are aligned with two adjacent sides S01 and S02 in the substrate 21. Therefore, for the dielectric layer 5A, the positions of the two adjacent sides Sa11 and Sa12 of the dielectric layer 5A are aligned with the two adjacent sides S01 and S02 of the substrate 21 as a reference to perform the alignment of the dielectric layer 5A.

[0460] For the dielectric layers 5B to 5D, for example Fig.32As shown in (a), the dielectric layers 5B to 5D may be aligned by using the side of the substrate as a reference and making the edge of the dielectric layer abut against the edge of the adjacent dielectric layer. For example, for the dielectric layer 5B, the position of the side Sb11 of the dielectric layer 5B is aligned with the side S01 of the substrate 21 as a reference, and the edge of the dielectric layer 5B is abutted against the edge of the dielectric layer 5A adjacent to the dielectric layer 5B to align the position of the dielectric layer 5B. In this case, of the two adjacent sides Sb11 and Sb12 of the dielectric layer 5B, the side Sb11 of the dielectric layer 5B is aligned with the side S01 of the substrate 21, and the side Sb12 of the dielectric layer 5B is in contact with the side Sa14 of the dielectric layer 5A. Regarding the dielectric layer 5C, the position of one side Sc12 of the dielectric layer 5C is aligned with one side S02 of the substrate 21 as a reference, and the edge of the dielectric layer 5C is brought into contact with the edge of the dielectric layer 5A adjacent to the dielectric layer 5C to perform the alignment of the dielectric layer 5C. In this case, of the two adjacent sides Sc11 and Sc12 of the dielectric layer 5C, the side Sc12 of the dielectric layer 5C is aligned with the side S02 of the substrate 21, and the side Sc11 of the dielectric layer 5C is brought into contact with the side Sa13 of the dielectric layer 5A. Regarding the dielectric layer 5D, the edge of the dielectric layer 5D is brought into contact with the edges of the dielectric layers 5B and 5C adjacent to the dielectric layer 5D to perform the alignment of the dielectric layer 5D. In this case, of the two adjacent sides Sd11 and Sd12 of the dielectric layer 5D, the side Sd12 of the dielectric layer 5D is in contact with the side Sc14 of the dielectric layer 5C, and the side Sd11 of the dielectric layer 5D is in contact with the side Sb13 of the dielectric layer 5B.

[0461] In addition, for the dielectric layers 5B to 5D, for example Fig.32As shown in (b), the dielectric layers 5B to 5D may be aligned with the sides of the substrate as a reference. For example, with respect to the dielectric layer 5B, the positions of the two adjacent sides Sb11 and Sb14 of the dielectric layer 5B are aligned with the two adjacent sides S01 and S04 of the substrate 21 to perform the alignment of the dielectric layer 5B. In this case, the two adjacent sides Sb11 and Sb14 of the dielectric layer 5B are aligned with the two adjacent sides S01 and S04 of the substrate 21. With respect to the dielectric layer 5C, the positions of the two adjacent sides Sc12 and Sc13 of the dielectric layer 5C are aligned with the two adjacent sides S02 and S03 of the substrate 21 to perform the alignment of the dielectric layer 5C. In this case, the two adjacent sides Sc12 and Sc13 of the dielectric layer 5C are aligned with the two adjacent sides S02 and S03 of the substrate 21. The dielectric layer 5D is aligned by aligning the positions of the two adjacent sides Sd13 and Sd14 of the dielectric layer 5D with reference to the two adjacent sides S03 and S04 of the substrate 21. In this case, the two adjacent sides Sd13 and Sd14 of the dielectric layer 5D are aligned with the two adjacent sides S03 and S04 of the substrate 21.

[0462] In addition, although not shown in the figure, each of the dielectric layers 5A to 5D may have a third alignment mark, and the third alignment mark of the dielectric layer 5A is used as a reference to align the positions of the third alignment marks of the dielectric layers 5B and 5C adjacent to the dielectric layer 5A, so as to align the dielectric layers 5B and 5C. In addition, the third alignment mark of the dielectric layers 5B and 5C is used as a reference to align the positions of the third alignment marks of the dielectric layer 5D adjacent to the dielectric layers 5B and 5C, so as to align the dielectric layer 5D.

[0463] In addition, for dielectric layers 5B to 5D, alignment based on the third alignment mark of the dielectric layer and alignment based on the abutment of the edges of the dielectric layer can also be used together. For example, dielectric layers 5B and 5C can be aligned with dielectric layer 5A using the third alignment mark of dielectric layers 5A to 5C, and dielectric layer 5D can be aligned by abutting the edges of dielectric layer 5D with the edges of dielectric layers 5B and 1C.

[0464] In the reflective structure of the present embodiment, similarly to the second embodiment of the reflective structure described above, in order to, for example, make the phases of the reflected waves in each dielectric layer consistent and thereby enhance the intensity of the reflected waves, thereby suppressing the disorder of the wavefront of the reflected waves in the reflective structure as a whole, it can be imagined that it is desirable that the distance between adjacent dielectric layers be less than 1 / 2 of the wavelength of the electromagnetic wave.

[0465] In this embodiment, two adjacent sides in at least one dielectric layer are aligned with two adjacent sides in the substrate, thereby enabling high-precision alignment of multiple dielectric layers. Therefore, the accuracy of the distance between adjacent dielectric layers can be ensured. Therefore, multiple dielectric layers can be spliced ​​with high positional accuracy in a manner that the distance between adjacent dielectric layers is less than 1 / 2 of the wavelength of electromagnetic waves in a specific frequency band. Therefore, the disorder of the wavefront of the reflected wave in the entire reflective structure can be suppressed, thereby obtaining the desired reflection characteristics, and the large area of ​​the reflective structure can be achieved.

[0466] Hereinafter, each structure of the reflection structure of this embodiment will be described.

[0467] 1. Substrate

[0468] The substrate in this embodiment is a member that supports the frequency selective reflection plate. The substrate is the same as the substrate in the third embodiment described above.

[0469] In this embodiment, the size of the substrate is preferably substantially the same as the total size when all dielectric layers are arranged. The size of the substrate is substantially the same as the total size when all dielectric layers are arranged, which means that the difference in the inner and outer dimensions when the outline of the substrate overlaps the outline of the outer shape when all dielectric layers are arranged is less than 1 / 2 of the wavelength of the electromagnetic wave in the specific frequency band. The above-mentioned size difference is preferably less than 1 / 5 of the wavelength of the electromagnetic wave in the specific frequency band, and more preferably less than 1 / 10 of the wavelength of the electromagnetic wave in the specific frequency band.

[0470] 2. Frequency selective reflector

[0471] The frequency selective reflector in this embodiment is a member that reflects electromagnetic waves in a specific frequency band in a direction different from the regular reflection direction.

[0472] The distance between adjacent dielectric layers is the same as that in the second embodiment described above.

[0473] The dielectric layer, the reflective member and other structures are the same as those in the second embodiment. In addition, the control of the reflection direction of the electromagnetic wave is also the same as that in the second embodiment.

[0474] In this embodiment, the position of at least one dielectric layer can be aligned by aligning the positions of the adjacent two sides of at least one dielectric layer with reference to the adjacent two sides of the substrate. After the alignment of at least one dielectric layer is performed, for example, the other dielectric layers can also be aligned by using the edge of the substrate as a reference and making the edge of the dielectric layer abut against the edge of the adjacent dielectric layer. In addition, with respect to other dielectric layers, each dielectric layer can also have a third alignment mark, and the relative position of each dielectric layer can be aligned using the third alignment mark. In addition, with respect to other dielectric layers, the alignment based on the third alignment mark of the dielectric layer and the alignment based on the abutment of the edges of the dielectric layer can also be used in combination. In addition, with respect to all dielectric layers, the positions of the adjacent two sides of the substrate can be aligned with reference to the adjacent two sides of the dielectric layer to perform the alignment of all dielectric layers.

[0475] The specific example of the positioning of the dielectric layer is as described above.

[0476] Furthermore, when the edge of a dielectric layer is brought into contact with the edge of an adjacent dielectric layer during the positioning of the dielectric layers, the edge of the dielectric layer may be brought into contact with the edge of the adjacent dielectric layer via a spacer.

[0477] In this embodiment, the dielectric layer may have a third alignment mark. The third alignment mark is a mark for aligning the dielectric layer and is a mark for aligning the relative positions of the dielectric layers.

[0478] The third alignment mark is the same as the second embodiment. The third alignment mark is preferably arranged in the outer peripheral region of the dielectric layer. When the edge of the dielectric layer is brought into contact with the edge of the adjacent dielectric layer, it is easy to adjust the offset in the direction parallel to the edge of the dielectric layer.

[0479] In this embodiment, the dielectric layer may have a fourth identification mark for identifying the dielectric layer. The fourth identification mark is the same as that in the second embodiment.

[0480] In this embodiment, adjacent dielectric layers may have concave-convex portions that can fit together on mutually opposing sides, and adjacent dielectric layers may be arranged in a manner that the concave-convex portions fit together. By fitting the concave-convex portions together, it is possible to easily align a plurality of dielectric layers. In this case, the concave-convex portions substantially function as the third alignment mark. Regarding the concave-convex portions, they are the same as the concave-convex portions of the reflective structure of the second embodiment described above.

[0481] The dimensions of the dielectric layer are the same as those in the second embodiment described above.

[0482] In this embodiment, as described above, the substrate does not have the first alignment mark, and the positions of the adjacent two sides of the substrate are aligned to align the adjacent two sides of at least one dielectric layer, so as to perform the alignment of at least one dielectric layer. Therefore, the deviation of the outer dimensions of the dielectric layer is preferably less than 1 / 2 of the wavelength of the electromagnetic wave of the specific frequency band, more preferably less than 1 / 5, and further preferably less than 1 / 10. For example, it varies depending on the type of material, machine, etc., but generally speaking, the dimensional deviation of the cutting process is about ±1mm. Therefore, the deviation of the outer dimensions of the dielectric layer can meet the requirement of being less than 1 / 2 of the wavelength of the electromagnetic wave of the specific frequency band.

[0483] In this embodiment, the reflection characteristics of the plurality of dielectric layers may be the same or different from each other. The case where the reflection characteristics of the plurality of dielectric layers are different from each other is the same as in the second embodiment.

[0484] The frequency selective reflector in this embodiment reflects electromagnetic waves of a specific frequency band in a direction different from the normal reflection direction. Regarding the frequency band of the electromagnetic wave, it is the same as the first embodiment described above. As described above, the deviation of the outer dimensions of the dielectric layer is preferably less than 1 / 2 of the wavelength of the electromagnetic wave of the specific frequency band. Therefore, the longer the wavelength of the electromagnetic wave, that is, the shorter the frequency band of the electromagnetic wave, the greater the deviation of the outer dimensions is allowed. Therefore, the frequency band of the electromagnetic wave is preferably lower even within the specified range. Regarding the specific frequency band of the electromagnetic wave, it is the same as the third embodiment described above.

[0485] The frequency selective reflector in this embodiment can be used as, for example, a frequency selective reflector for communications, and is particularly suitable as a frequency selective reflector for mobile communications.

[0486] 3. Other structures

[0487] The reflective structure of this embodiment can also have other structures as required in addition to the above-mentioned frequency selective reflector and substrate. As other structures, for example, a second adhesive layer, a fixing component, and an interference relaxation layer can be listed. About these structures, it is the same as the above-mentioned first embodiment.

[0488] B. Method for manufacturing a reflective structure

[0489] The manufacturing method of a reflective structure disclosed in the present invention is a method for manufacturing a reflective structure, wherein the reflective structure has a plurality of frequency selective reflectors that reflect electromagnetic waves of a specific frequency band in a direction different from a normal reflection direction, wherein the manufacturing method of the reflective structure has a configuration step, in which the plurality of frequency selective reflectors are arranged on a surface of a support body having a first alignment mark in such a manner that a distance between adjacent frequency selective reflectors is less than 1 / 2 of a wavelength of the electromagnetic wave.

[0490] In the present disclosure, the same effects as those of the first embodiment of the above-mentioned reflection structure are achieved.

[0491] The frequency selective reflector is the same as the frequency selective reflector in the first embodiment of the above-mentioned reflection structure.

[0492] The support body is a member that supports the frequency selective reflector and has a first alignment mark. The support body may be the substrate in the first embodiment of the reflective structure, or may be a wall, window, ceiling, floor, billboard, or the like.

[0493] The first alignment mark is the same as the first alignment mark in the first embodiment of the reflective structure. The first alignment mark may be formed directly on the support or a film having the first alignment mark may be disposed on one surface of the support.

[0494] In addition, the planar shape of the first alignment mark may include a horizontal line segment and a vertical line segment. The horizontal line segment and the vertical line segment of the first alignment mark can be regarded as two adjacent sides of the substrate in the third embodiment of the reflective structure.

[0495] The arrangement step is the same as that described in the first embodiment or the third embodiment of the above-mentioned reflection structure.

[0496] C. Frequency selective reflector set

[0497] The frequency selective reflection plate set disclosed in the present invention has three embodiments. Each embodiment will be described below.

[0498] I. First Embodiment of Frequency Selective Reflector Group

[0499] The first embodiment of the frequency selective reflector group disclosed in the present invention is a frequency selective reflector group having multiple frequency selective reflectors that reflect electromagnetic waves in a specific frequency band in a direction different from the normal reflection direction, wherein the multiple frequency selective reflectors are arranged and configured on a setting surface for use, and the frequency selective reflectors have a second identification mark for identifying the frequency selective reflectors.

[0500] In the present disclosure, the same effect as in the first embodiment of the above-mentioned reflection structure where the frequency selective reflection plate has the second identification mark is achieved, or the same effect as in the third embodiment of the above-mentioned reflection structure where the frequency selective reflection plate has the second identification mark is achieved.

[0501] The frequency selective reflector is the same as the frequency selective reflector in the first embodiment of the above-mentioned reflection structure or the frequency selective reflector in the third embodiment of the above-mentioned reflection structure.

[0502] II. Second Embodiment of Frequency Selective Reflector Group

[0503] The second embodiment of the frequency selective reflector group disclosed in the present invention provides a frequency selective reflector group as follows, which has a plurality of frequency selective reflectors that reflect electromagnetic waves in a specific frequency band in a direction different from a normal reflection direction, wherein the plurality of frequency selective reflectors are arranged and configured on a setting surface for use, the frequency selective reflectors have a reflecting component that reflects the electromagnetic waves, a plurality of reflecting elements of different sizes are arranged in the reflecting component, and the arrangements of the reflecting elements in the plurality of frequency selective reflectors are different from each other.

[0504] In the present disclosure, in the first embodiment of the above-mentioned reflection structure, the frequency selective reflection plate is the first mode, and when the reflection characteristics of multiple frequency selective reflection plates are different from each other, or in the third embodiment of the above-mentioned reflection structure, the frequency selective reflection plate is the first mode, which has the same effect as the case where the reflection characteristics of multiple frequency selective reflection plates are different from each other.

[0505] The frequency selective reflector is the same as the frequency selective reflector in the first embodiment of the above-mentioned reflection structure or the frequency selective reflector in the third embodiment of the above-mentioned reflection structure.

[0506] III. Third Embodiment of Frequency Selective Reflector Group

[0507] The third embodiment of the frequency selective reflector group disclosed in the present invention is a frequency selective reflector group having multiple frequency selective reflectors that reflect electromagnetic waves in a specific frequency band in a direction different from the normal reflection direction, wherein the multiple frequency selective reflectors are arranged and configured on a setting surface for use, and the frequency selective reflectors have, from the setting surface side, a reflecting component that reflects the electromagnetic waves, and a dielectric layer that allows the electromagnetic waves to pass through, in sequence, and in the dielectric layer, a plurality of unit areas with different thicknesses are arranged, and the arrangements of the unit areas in the multiple frequency selective reflectors are different from each other.

[0508] In the present disclosure, in the first embodiment of the above-mentioned reflection structure, the frequency selective reflection plate is the second embodiment, and in the case where the reflection characteristics of multiple frequency selective reflection plates are different from each other, or in the third embodiment of the above-mentioned reflection structure, the frequency selective reflection plate is the second embodiment, which achieves the same effect as the case where the reflection characteristics of multiple frequency selective reflection plates are different from each other.

[0509] The frequency selective reflector is the same as the frequency selective reflector in the first embodiment of the above-mentioned reflection structure or the frequency selective reflector in the third embodiment of the above-mentioned reflection structure.

[0510] The present disclosure is not limited to the above-described embodiments. The above-described embodiments are illustrative, and any scheme having substantially the same structure as the technical concept described in the claims of the present disclosure and having the same function and effect is included in the technical scope of the present disclosure.

[0511] Example

[0512] Hereinafter, the present disclosure will be described in detail with reference to examples.

[0513] [Comparative Example 1]

[0514] The reflection characteristics of a reflection structure having a frequency selective reflection plate were simulated. In the simulation, a model of a reflection structure having a frequency selective reflection plate arranged on an A5-sized substrate was used. The frequency selective reflection plate has a structure having a reflection component and a dielectric layer having a predetermined thickness distribution in order from the substrate side. Fig.33 As shown in (a), the reflective structure 20 is placed at the origin, at z out =14.9[m] is calculated from (x in ,y in , z in )=(-9, 2, 8.4)[m], the electromagnetic wave of 28 GHz is incident on (x out ,y out , z out )=(1, -0.5, 14.9) The reflected power at the time of reflection. In addition, the gain of the frequency selective reflector is set to 0 dBi. Fig.33 (b) shows the simulation result of the distribution of received power (dBm).

[0515] [Example 1]

[0516] The reflection characteristics of a reflection structure having a frequency selective reflection plate were simulated. In the simulation, a model of a reflection structure in which two A5-sized frequency selective reflection plates were arranged on an A4-sized substrate was used. In the reflection structure, the distance between adjacent frequency selective reflection plates was set to 1 / 2 of the wavelength of an electromagnetic wave of 28 GHz. In addition, the frequency selective reflection plate has a structure having a reflection component and a dielectric layer having a predetermined thickness distribution in order from the substrate side. In addition, as Fig.33 As shown in (a), the reflective structure 20 is placed at the origin, at z out =14.9[m] is calculated from (x in ,y in , z in )=(-9, 2, 8.4)[m], the electromagnetic wave of 28 GHz is incident on (x out ,y out , zout )=(1, -0.5, 14.9) The reflected power at the time of reflection. In addition, the gain of the frequency selective reflector is set to 0 dBi. Fig.34 The simulation results of the distribution of received power (dBm) are shown.

[0517] Compared with Comparative Example 1, in Example 1, the distance between adjacent frequency selective reflectors is set to 1 / 2 of the wavelength of the electromagnetic wave and a plurality of frequency selective reflectors are spliced ​​together, thereby increasing the power in the main reflection direction by 3 to 6 [dB]. This also includes a change in the power intensity distribution such as "if the area of ​​the frequency selective reflector increases, the power is concentrated in the main reflection direction", which is equivalent to the behavior of the reflected power intensity achieved by metal flat plates with different areas. It can be seen from this that the reflected power corresponding to the area ratio of the frequency selective reflector can be obtained.

[0518] [Reference Example 1]

[0519] The reflection characteristics of the frequency selective reflector were simulated. In the simulation, the unit structure of the dielectric layer is as follows Fig.35 As shown in (a) of FIG. 1 , the thickness distribution increases in one direction, and there are six unit regions with different thicknesses. The dielectric layer uses a model that has a periodic structure in which the unit structure is repeatedly arranged in one direction. In addition, in the simulation, the reflective component is a model in which annular reflective elements are regularly arranged, resonate at the frequency of the incident wave, and reflect electromagnetic waves of the frequency. In addition, the following parameters are used in the simulation.

[0520] Frequency of incident wave: 28 GHz

[0521] Incident angle of incident wave: 0 degrees, -10 degrees

[0522] Desired reflection angle of reflected wave: 27 degrees, 37 degrees

[0523] The relative reflection phase difference between adjacent cell areas: 60 degrees

[0524] Fig.35 (b) shows the simulation results. When the incident angle is 0 degrees, that is, the reflection from the front direction 31 is indicated by the solid line 32, and when the incident angle is -10 degrees, that is, the reflection from the -10 degree direction 33 is indicated by the solid line 34. It can be seen that when the incident angle is 0 degrees, the reflection is from the regular reflection direction to the +27 degree direction, and when the incident angle is -10 degrees, the reflection is from the regular reflection direction to the +37 degree direction.

[0525] [Reference Example 2]

[0526] The reflection characteristics of the frequency selective reflector were simulated. In the simulation, the unit structure of the dielectric layer is as follows Fig.36 As shown in (a) of FIG. 1 , the thickness distribution increases in one direction, and there are 10 unit regions with different thicknesses. The dielectric layer uses a model that has a periodic structure in which the unit structure is repeatedly arranged in one direction. In addition, in the simulation, the reflective component is a model in which the annular reflective elements are regularly arranged, resonate at the frequency of the incident wave, and reflect the electromagnetic wave of the frequency. In addition, the following parameters are used in the simulation.

[0527] Frequency of incident wave: 28 GHz

[0528] Angle of incidence of incident wave: 0 degrees

[0529] Desired reflection angle of reflected wave: 16 degrees

[0530] The relative reflection phase difference between adjacent cell areas: 36 degrees

[0531] Fig.36 (b) shows the simulation results. When the incident angle is 0 degrees, that is, the reflection from the front direction 35 is represented by the solid line 36. It can be seen that: when the incident angle is 0 degrees, it is reflected from the regular reflection direction to the +16 degree direction. In addition, Fig.36 In (b), Fig.35 Compared with (b), the reflection direction is closer to the regular reflection direction. This is because: the unit structure of the dielectric layer is Fig.35 In (a), there are 6 unit regions. In contrast, Fig.36 (a) has 10 unit regions, and the length of the unit structure in a predetermined direction in which the thickness increases is longer.

[0532] [Reference Example 3]

[0533] First, a PET film with copper foil was etched according to the model of the reflective component of Reference Example 1 to produce a reflective component having regularly arranged ring-shaped reflective elements. In addition, a dielectric layer was formed using a 3D printer according to the model of the dielectric layer of Reference Example 1. Next, the dielectric layer was attached to the reflective component to produce a frequency selective reflector.

[0534] The reflection characteristics of the frequency selective reflector were measured using a small-scale measurement system and a network analyzer. The reflection characteristics of the frequency selective reflector of Reference Example 3 were roughly consistent with the simulation results of Reference Example 1.

[0535] [Reference Example 4]

[0536] In the analysis of reflection arrays, the Fig.37The reflection phase is calculated for a frequency selective reflector having a reflection component and a dielectric layer, in which the reflection component has a frequency selective surface (FSS). Fig.37 The numbers in are as follows.

[0537] ZVAC: indicates a transmission line having the characteristic impedance of air. The line length is the length obtained by subtracting the thickness of the dielectric layer from the phase observation plane set at an arbitrary distance farther than the uppermost surface of the dielectric layer.

[0538] ZPC: represents a transmission line with the characteristic impedance of the dielectric layer. The line length is the thickness of the dielectric layer h.

[0539] r: represents the resistance of the ring-shaped reflection element of FSS.

[0540] L: represents the inductance of the ring-shaped reflection element of FSS.

[0541] C: represents the capacitance of the ring-shaped reflection element of FSS.

[0542] ZPET: represents a transmission line with a dielectric constant of a dielectric substrate on which a ring-shaped reflective element of FSS is arranged. The line length is the thickness of the dielectric substrate.

[0543] ZL: represents the characteristic impedance of the space (air) on the back side of the dielectric substrate.

[0544] As a result, it was estimated that the reflection phase change caused by the resonance frequency shift caused by overlapping dielectric layers of different thicknesses is at most several tens of degrees, which is about 25% of the maximum reflection phase of 360 degrees, and the other reflection phase changes are caused by the shortening of the wavelength in the dielectric layer. In addition, even if the positions of the dielectric layer and the reflective member having the frequency selective surface are offset, the offset becomes equal in the entire frequency selective reflector. However, if the following situation is considered: in order to make the reflected wave a plane wave, the reflection phase only needs to be equal to the adjacent unit area, it can be concluded that there is almost no influence on the reflection direction.

[0545] The present disclosure provides the following inventions.

[0546] [1] A reflective structure having a frequency selective reflector that reflects electromagnetic waves in a specific frequency band in a direction different from a regular reflection direction, wherein:

[0547] The above-mentioned reflective structure has:

[0548] a substrate having a first alignment mark; and

[0549] A plurality of the frequency selective reflectors are arranged on one surface of the substrate.

[0550] The distance between adjacent frequency selective reflection plates is less than 1 / 2 of the wavelength of the electromagnetic wave.

[0551] [2] The reflective structure according to [1], wherein:

[0552] The frequency selective reflection plate has a second alignment mark.

[0553] [3] The reflective structure according to [1], wherein:

[0554] The substrate is light-transmissive.

[0555] The frequency selective reflection plate has an outer peripheral region that is light-proof.

[0556] [4] The reflective structure according to any one of [1] to [4], wherein:

[0557] The adjacent frequency selective reflection plates have concave and convex portions that can fit together on the side surfaces facing each other, and the adjacent frequency selective reflection plates are arranged so that the concave and convex portions fit together.

[0558] [5] The reflective structure according to [5], wherein:

[0559] The concave and convex portions of the adjacent frequency selective reflection plates have the same thickness.

[0560] [6] A reflective structure having a frequency selective reflector that reflects electromagnetic waves in a specific frequency band in a direction different from a regular reflection direction, wherein:

[0561] The above-mentioned reflective structure has:

[0562] substrate; and

[0563] A plurality of the frequency selective reflectors are arranged on one surface of the substrate.

[0564] Two adjacent sides of at least one of the frequency selective reflectors are aligned with two adjacent sides of the substrate.

[0565] The distance between adjacent frequency selective reflection plates is less than 1 / 2 of the wavelength of the electromagnetic wave.

[0566] [7] The reflective structure according to any one of [1] to [6], wherein:

[0567] An adhesive portion is disposed between adjacent frequency selective reflection plates.

[0568] [8] The reflective structure according to any one of [1] to [7], wherein

[0569] The frequency selective reflector has a reflective component for reflecting the electromagnetic wave.

[0570] In the above-mentioned reflective component, a plurality of reflective elements of different sizes are arranged.

[0571] The arrangements of the reflective elements in the plurality of frequency selective reflectors are different from each other.

[0572] [9] The reflective structure according to any one of [1] to [7], wherein:

[0573] The frequency selective reflector includes, in order from the substrate side, a reflective member for reflecting the electromagnetic wave and a dielectric layer for transmitting the electromagnetic wave.

[0574] A plurality of unit regions having different thicknesses are arranged in the dielectric layer.

[0575] The arrangement of the unit regions in the plurality of frequency selective reflectors is different from each other.

[0576]

[10] The reflective structure according to any one of [1] to [9], wherein:

[0577] The frequency selective reflector has a second identification mark for identifying the frequency selective reflector.

[0578]

[11] The reflective structure according to any one of [1] to

[10] , wherein:

[0579] The base material has a first identification mark for identifying a position of the frequency selective reflector.

[0580]

[12] The reflective structure according to any one of [1] to

[11] , wherein:

[0581] The frequency selective reflector has, in order from the substrate side:

[0582] A reflecting component for reflecting the electromagnetic waves; and

[0583] a dielectric layer having a concavo-convex structure and transmitting the electromagnetic wave, wherein the concavo-convex structure is configured with a plurality of unit structures, and the unit structures have a thickness distribution in which the thickness increases in a predetermined direction,

[0584] The unit structure of the dielectric layer has a plurality of unit regions having different thicknesses.

[0585] In each unit structure of the dielectric layer, the length of the unit structure in the specified direction is set as the horizontal axis, the relative reflection phase when the electromagnetic wave passes through the dielectric layer and is reflected by the reflecting component and passes through the dielectric layer again and is emitted to the incident side of the electromagnetic wave is set as the vertical axis, and the value of the relative reflection phase of the electromagnetic wave exceeds -360 degrees and is below 0 degrees. Points corresponding to the center position of each unit area in the specified direction and the relative reflection phase of the electromagnetic wave in each unit area are drawn, and a straight line passing through the point corresponding to the minimum thickness unit area with the minimum thickness is drawn. At this time, each point is on the same straight line.

[0586] The dielectric layer has at least a first unit structure as the unit structure, and the first unit structure has three or more unit regions having different thicknesses.

[0587] The relative reflection phase distribution of the electromagnetic wave is controlled by the thickness distribution of the dielectric layer, thereby controlling the reflection direction of the electromagnetic wave.

[0588]

[13] The reflective structure according to

[12] , wherein:

[0589] The above-mentioned reflecting component is a frequency selective plate which reflects only the above-mentioned electromagnetic waves.

[0590]

[14] The reflective structure according to

[13] , wherein:

[0591] The reflecting component has a reflection phase control function of controlling the reflection phase of the electromagnetic wave.

[0592]

[15] The reflective structure according to any one of [1] to

[11] , wherein:

[0593] The frequency selective reflector has a reflective component for reflecting the electromagnetic wave.

[0594] The reflecting component has a reflection phase control function of controlling the reflection phase of the electromagnetic wave.

[0595]

[16] The reflective structure according to

[15] , wherein:

[0596] The reflective member includes a dielectric substrate and a plurality of reflective elements arranged on at least one surface of the dielectric substrate.

[0597] The reflective element is not disposed in end regions where adjacent frequency selective reflectors face each other.

[0598]

[17] The reflective structure according to

[16] , wherein:

[0599] When the reflection intensity of the electromagnetic wave in the reflection structure in which the reflection element is arranged in the end regions where the adjacent frequency selective reflection plates face each other is assumed to be 100%, the reflection intensity of the electromagnetic wave exceeds 85%.

[0600]

[18] A reflective structure having a frequency selective reflector that reflects electromagnetic waves in a specific frequency band in a direction different from a regular reflection direction, wherein:

[0601] The above-mentioned reflective structure has:

[0602] a substrate having a first alignment mark; and

[0603] The frequency selective reflector is disposed on one surface of the substrate.

[0604] The frequency selective reflector has:

[0605] a reflecting component for reflecting the electromagnetic wave, which is disposed on one surface of the substrate; and

[0606] a plurality of dielectric layers that transmit the electromagnetic wave, arranged on the surface of the substrate on the side of the reflective member;

[0607] The distance between adjacent dielectric layers is less than 1 / 2 of the wavelength of the electromagnetic wave.

[0608] The dielectric layer has a concavo-convex structure, the concavo-convex structure is configured with a plurality of unit structures, and the unit structures have a thickness distribution in which the thickness increases in a predetermined direction.

[0609] The unit structure of the dielectric layer has a plurality of unit regions having different thicknesses.

[0610] In each unit structure of the dielectric layer, the length of the unit structure in the specified direction is set as the horizontal axis, the relative reflection phase when the electromagnetic wave passes through the dielectric layer and is reflected by the reflecting component and passes through the dielectric layer again and is emitted to the incident side of the electromagnetic wave is set as the vertical axis, and the value of the relative reflection phase of the electromagnetic wave exceeds -360 degrees and is below 0 degrees. Points corresponding to the center position of each unit area in the specified direction and the relative reflection phase of the electromagnetic wave in each unit area are drawn, and a straight line passing through the point corresponding to the minimum thickness unit area with the minimum thickness is drawn. At this time, each point is on the same straight line.

[0611] The dielectric layer has at least a first unit structure as the unit structure, and the first unit structure has three or more unit regions having different thicknesses.

[0612] The relative reflection phase distribution of the electromagnetic wave is controlled by the thickness distribution of the dielectric layer, thereby controlling the reflection direction of the electromagnetic wave.

[0613]

[19] A reflective structure having a frequency selective reflector that reflects electromagnetic waves in a specific frequency band in a direction different from a regular reflection direction, wherein:

[0614] The above-mentioned reflective structure has:

[0615] substrate; and

[0616] The frequency selective reflector is disposed on one surface of the substrate.

[0617] The frequency selective reflector has:

[0618] a reflecting component for reflecting the electromagnetic wave, which is disposed on one surface of the substrate; and

[0619] a plurality of dielectric layers that transmit the electromagnetic wave, arranged on the surface of the substrate on the side of the reflective member;

[0620] Two adjacent sides of at least one of the dielectric layers are aligned with two adjacent sides of the substrate,

[0621] The distance between adjacent dielectric layers is less than 1 / 2 of the wavelength of the electromagnetic wave.

[0622] The dielectric layer has a concavo-convex structure, the concavo-convex structure is configured with a plurality of unit structures, and the unit structures have a thickness distribution in which the thickness increases in a predetermined direction.

[0623] The unit structure of the dielectric layer has a plurality of unit regions having different thicknesses.

[0624] In each unit structure of the dielectric layer, the length of the unit structure in the specified direction is set as the horizontal axis, the relative reflection phase when the electromagnetic wave passes through the dielectric layer and is reflected by the reflecting component and passes through the dielectric layer again and is emitted to the incident side of the electromagnetic wave is set as the vertical axis, and the value of the relative reflection phase of the electromagnetic wave exceeds -360 degrees and is below 0 degrees. Points corresponding to the center position of each unit area in the specified direction and the relative reflection phase of the electromagnetic wave in each unit area are drawn, and a straight line passing through the point corresponding to the minimum thickness unit area with the minimum thickness is drawn. At this time, each point is on the same straight line.

[0625] The dielectric layer has at least a first unit structure as the unit structure, and the first unit structure has three or more unit regions having different thicknesses.

[0626] The relative reflection phase distribution of the electromagnetic wave is controlled by the thickness distribution of the dielectric layer, thereby controlling the reflection direction of the electromagnetic wave.

[0627]

[20] The reflective structure according to

[18] or

[19] , wherein:

[0628] The reflective member includes a dielectric substrate and a plurality of reflective elements arranged on at least one surface of the dielectric substrate.

[0629] The dielectric substrate is a component different from the base material.

[0630] One of the dielectric substrates is arranged for the base material.

[0631]

[21] The reflective structure according to

[18] or

[19] , wherein:

[0632] The reflective member includes a dielectric substrate and a plurality of reflective elements arranged on at least one surface of the dielectric substrate.

[0633] The dielectric substrate also serves as the base material.

[0634]

[22] The reflective structure according to

[18] or

[19] , wherein:

[0635] The reflective member includes a plurality of reflective elements disposed in contact with the substrate.

[0636]

[23] The reflective structure according to any one of

[18] to

[22] , wherein:

[0637] The dielectric layer has a third alignment mark.

[0638]

[24] The reflective structure according to any one of

[18] to

[23] , wherein:

[0639] A second adhesive portion is disposed between adjacent dielectric layers.

[0640]

[25] The reflective structure according to any one of

[18] to

[24] , wherein:

[0641] The adjacent dielectric layers have concavo-convex portions that can fit together on side surfaces facing each other, and the adjacent dielectric layers are arranged so that the concavo-convex portions fit together.

[0642]

[26] The reflective structure according to

[25] , wherein:

[0643] The concavo-convex portions of the adjacent dielectric layers have the same thickness.

[0644]

[27] The reflective structure according to any one of

[18] to

[26] , wherein:

[0645] The dielectric layer has a fourth identification mark for identifying the dielectric layer.

[0646]

[28] The reflective structure according to any one of

[18] to

[27] , wherein:

[0647] The substrate has a third identification mark for identifying a position of the dielectric layer.

[0648]

[29] The reflective structure according to any one of

[18] to

[28] , wherein:

[0649] The above-mentioned reflecting component is a frequency selective plate which reflects only the above-mentioned electromagnetic waves.

[0650]

[30] The reflective structure according to

[29] , wherein:

[0651] The reflecting component has a reflection phase control function of controlling the reflection phase of the electromagnetic wave.

[0652]

[31] A method for manufacturing a reflective structure, comprising manufacturing a reflective structure having a plurality of frequency selective reflectors, wherein the frequency selective reflectors reflect electromagnetic waves of a specific frequency band in a direction different from a normal reflection direction, wherein:

[0653] The manufacturing method of the above-mentioned reflective structure has a configuration step, in which the above-mentioned multiple frequency selective reflectors are arranged on a surface of a supporting body having a first alignment mark in such a manner that the distance between adjacent frequency selective reflectors is less than 1 / 2 of the wavelength of the above-mentioned electromagnetic wave.

[0654]

[32] The method for manufacturing a reflective structure according to

[31] , wherein:

[0655] The frequency selective reflection plate has a second alignment mark.

[0656]

[33] The method for manufacturing a reflective structure according to

[31] , wherein:

[0657] The support body has light transmittance,

[0658] The frequency selective reflection plate has an outer peripheral region that is light-proof.

[0659]

[34] A frequency selective reflector assembly comprising a plurality of frequency selective reflectors that reflect electromagnetic waves of a specific frequency band in a direction different from a normal reflection direction, wherein:

[0660] The plurality of frequency selective reflectors are arranged on a setting surface for use.

[0661] The frequency selective reflector has a second identification mark for identifying the frequency selective reflector.

[0662]

[35] A frequency selective reflector assembly comprising a plurality of frequency selective reflectors that reflect electromagnetic waves of a specific frequency band in a direction different from a normal reflection direction, wherein:

[0663] The plurality of frequency selective reflectors are arranged on a setting surface for use.

[0664] The frequency selective reflector has a reflective component for reflecting the electromagnetic wave.

[0665] A plurality of reflective elements of different sizes are arranged in the reflective component.

[0666] The arrangements of the reflective elements in the plurality of frequency selective reflectors are different from each other.

[0667]

[36] A frequency selective reflector assembly comprising a plurality of frequency selective reflectors that reflect electromagnetic waves of a specific frequency band in a direction different from a normal reflection direction, wherein:

[0668] The plurality of frequency selective reflectors are arranged on a setting surface for use.

[0669] The frequency selective reflector includes, in order from the installation surface side, a reflective member for reflecting the electromagnetic wave and a dielectric layer for transmitting the electromagnetic wave.

[0670] A plurality of unit regions having different thicknesses are arranged in the dielectric layer.

[0671] The arrangement of the unit regions in the plurality of frequency selective reflectors is different from each other.

[0672] Description of symbols

[0673] 1…Frequency selective reflector;

[0674] 2…reflective components;

[0675] 3…reflective element;

[0676] 4…dielectric substrate;

[0677] 5…dielectric layer;

[0678] 6…adhesive layer;

[0679] 7…reflection layer;

[0680] 8…Space;

[0681] 10, 10a, 10b…Unit structure;

[0682] 11a-11g, 12a-12f, 13a-13e…unit area;

[0683] 20…Reflective structure;

[0684] 21…substrate;

[0685] 22…1st alignment mark;

[0686] 23…1st identification mark;

[0687] 24…second alignment mark;

[0688] 25…Second identification mark;

[0689] 26…concave and convex parts;

[0690] 27…end region;

[0691] 28 ... bonding portion;

[0692] D1… specified direction;

[0693] L…the length of the unit structure in the specified direction of increasing thickness;

[0694] d1, d2…the distances between adjacent frequency selective reflectors;

[0695] d5, d6…distances between adjacent dielectric layers;

[0696] t1, t2, t3, t4, t5, t6…thickness of the unit area.

Claims

1. A reflective structure having a frequency selective reflector that reflects electromagnetic waves of a specific frequency band in a direction different from a regular reflection direction, wherein: The reflective structure has: a substrate having a first alignment mark; and A plurality of frequency selective reflectors are arranged on one surface of the z substrate. The distance between adjacent frequency selective reflection plates is less than 1 / 2 of the wavelength of the electromagnetic wave.

2. The reflective structure according to claim 1, wherein: The frequency selective reflection plate has a second alignment mark.

3. The reflective structure according to claim 1, wherein: The substrate is light-transmissive. The outer peripheral area of ​​the frequency selective reflection plate is light-proof.

4. The reflective structure according to any one of claims 1 to 3, wherein: The adjacent frequency selective reflection plates have concave and convex portions that can fit together on the side surfaces facing each other, and the adjacent frequency selective reflection plates are arranged so that the concave and convex portions fit together.

5. The reflective structure according to claim 4, wherein: The concave and convex portions of the adjacent frequency selective reflection plates have the same thickness.

6. A reflective structure having a frequency selective reflector that reflects electromagnetic waves of a specific frequency band in a direction different from a regular reflection direction, wherein: The reflective structure has: Base material; as well as A plurality of frequency selective reflectors are arranged on one surface of the substrate. Two adjacent sides of at least one of the frequency selective reflection plates are aligned with two adjacent sides of the substrate, and a distance between adjacent frequency selective reflection plates is less than 1 / 2 of the wavelength of the electromagnetic wave.

7. The reflective structure according to claim 1, 2, 3 or 6, wherein: An adhesive portion is disposed between adjacent frequency selective reflection plates.

8. The reflective structure according to claim 1, 2, 3 or 6, wherein: The frequency selective reflector has a reflective component for reflecting the electromagnetic wave. In the reflecting component, a plurality of reflecting elements of different sizes are arranged. Arrangements of the reflective elements in the plurality of frequency selective reflectors are different from each other.

9. The reflective structure according to claim 1, 2, 3 or 6, wherein: The frequency selective reflector includes, in order from the substrate side, a reflective member for reflecting the electromagnetic wave and a dielectric layer for transmitting the electromagnetic wave. A plurality of unit regions having different thicknesses are arranged in the dielectric layer. The arrangement of the unit regions in the plurality of frequency selective reflection plates is different from each other.

10. The reflective structure according to claim 1, 2, 3 or 6, wherein: The frequency selective reflection plate has a second identification mark for identifying the frequency selective reflection plate.

11. The reflective structure according to claim 10, wherein: The base material has a first identification mark for identifying a position of the frequency selective reflection plate.

12. The reflective structure according to claim 1, 2, 3 or 6, wherein: The frequency selective reflection plate has, in order from the substrate side: a reflecting component for reflecting the electromagnetic wave; and a dielectric layer having a concavo-convex structure and transmitting the electromagnetic wave, wherein the concavo-convex structure is configured with a plurality of unit structures, and the unit structures have a thickness distribution in which the thickness increases in a predetermined direction, The unit structure of the dielectric layer has a plurality of unit regions having different thicknesses, In each unit structure of the dielectric layer, the length of the unit structure in the prescribed direction is set as the horizontal axis, the relative reflection phase when the electromagnetic wave passes through the dielectric layer and is reflected by the reflecting component and passes through the dielectric layer again and is emitted to the incident side of the electromagnetic wave is set as the vertical axis, and in a graph where the value of the relative reflection phase of the electromagnetic wave exceeds -360 degrees and is below 0 degrees, points corresponding to the center position of each unit area in the prescribed direction and the relative reflection phase of the electromagnetic wave in each unit area are drawn, and a straight line passing through the point corresponding to the minimum thickness unit area with the minimum thickness is drawn, and at this time, each point is on the same straight line, The dielectric layer has at least a first unit structure as the unit structure, and the first unit structure has three or more unit regions having different thicknesses. The relative reflection phase distribution of the electromagnetic wave is controlled by the thickness distribution of the dielectric layer, thereby controlling the reflection direction of the electromagnetic wave.

13. The reflective structure according to claim 12, wherein: The reflecting member is a frequency selective plate that reflects only the electromagnetic wave.

14. The reflective structure according to claim 13, wherein: The reflecting member has a reflection phase control function of controlling a reflection phase of the electromagnetic wave.

15. The reflective structure according to claim 1, 2, 3 or 6, wherein: The frequency selective reflector has a reflective component for reflecting the electromagnetic wave. The reflecting member has a reflection phase control function of controlling a reflection phase of the electromagnetic wave.

16. The reflective structure according to claim 15, wherein: The reflective member includes a dielectric substrate and a plurality of reflective elements arranged on at least one surface of the dielectric substrate. The reflective element is not arranged in end regions where adjacent frequency selective reflectors face each other.

17. The reflective structure according to claim 16, wherein: When the reflection intensity of the electromagnetic wave in the reflection structure in which the reflection elements are arranged in the end regions where the adjacent frequency selective reflection plates face each other is assumed to be 100%, the reflection intensity of the electromagnetic wave exceeds 85%.

18. A reflective structure having a frequency selective reflector that reflects electromagnetic waves of a specific frequency band in a direction different from a regular reflection direction, wherein: The reflective structure has: a substrate having a first alignment mark; and The frequency selective reflector is arranged on one surface of the substrate. The frequency selective reflector has: a reflective component for reflecting the electromagnetic wave, which is disposed on one surface of the substrate; and a plurality of dielectric layers that transmit the electromagnetic wave, which are arranged on the surface of the substrate on the side of the reflecting component, The distance between adjacent dielectric layers is less than 1 / 2 of the wavelength of the electromagnetic wave. The dielectric layer has a concavo-convex structure, the concavo-convex structure is configured with a plurality of unit structures, and the unit structures have a thickness distribution in which the thickness increases in a predetermined direction, The unit structure of the dielectric layer has a plurality of unit regions having different thicknesses, In each unit structure of the dielectric layer, the length of the unit structure in the prescribed direction is set as the horizontal axis, the relative reflection phase when the electromagnetic wave passes through the dielectric layer and is reflected by the reflecting component and passes through the dielectric layer again and is emitted to the incident side of the electromagnetic wave is set as the vertical axis, and in a graph where the value of the relative reflection phase of the electromagnetic wave exceeds -360 degrees and is below 0 degrees, points corresponding to the center position of each unit area in the prescribed direction and the relative reflection phase of the electromagnetic wave in each unit area are drawn, and a straight line passing through the point corresponding to the minimum thickness unit area with the minimum thickness is drawn, and at this time, each point is on the same straight line, The dielectric layer has at least a first unit structure as the unit structure, and the first unit structure has three or more unit regions having different thicknesses. The relative reflection phase distribution of the electromagnetic wave is controlled by the thickness distribution of the dielectric layer, thereby controlling the reflection direction of the electromagnetic wave.

19. A reflective structure having a frequency selective reflector for reflecting electromagnetic waves of a specific frequency band in a direction different from a regular reflection direction, wherein: The reflective structure has: substrate; and The frequency selective reflector is arranged on one surface of the substrate. The frequency selective reflector has: a reflective component for reflecting the electromagnetic wave, which is disposed on one surface of the substrate; and a plurality of dielectric layers that transmit the electromagnetic wave, which are arranged on the surface of the substrate on the side of the reflecting component, Two adjacent sides of at least one of the dielectric layers are aligned with two adjacent sides of the substrate, The distance between adjacent dielectric layers is less than 1 / 2 of the wavelength of the electromagnetic wave. The dielectric layer has a concavo-convex structure, the concavo-convex structure is configured with a plurality of unit structures, and the unit structures have a thickness distribution in which the thickness increases in a predetermined direction, The unit structure of the dielectric layer has a plurality of unit regions having different thicknesses, In each unit structure of the dielectric layer, the length of the unit structure in the prescribed direction is set as the horizontal axis, the relative reflection phase when the electromagnetic wave passes through the dielectric layer and is reflected by the reflecting component and passes through the dielectric layer again and is emitted to the incident side of the electromagnetic wave is set as the vertical axis, and in a graph where the value of the relative reflection phase of the electromagnetic wave exceeds -360 degrees and is below 0 degrees, points corresponding to the center position of each unit area in the prescribed direction and the relative reflection phase of the electromagnetic wave in each unit area are drawn, and a straight line passing through the point corresponding to the minimum thickness unit area with the minimum thickness is drawn, and at this time, each point is on the same straight line, The dielectric layer has at least a first unit structure as the unit structure, and the first unit structure has three or more unit regions having different thicknesses. The relative reflection phase distribution of the electromagnetic wave is controlled by the thickness distribution of the dielectric layer, thereby controlling the reflection direction of the electromagnetic wave.

20. The reflective structure according to claim 18 or 19, wherein: The reflective member includes a dielectric substrate and a plurality of reflective elements arranged on at least one surface of the dielectric substrate. The dielectric substrate is a component different from the base material, One of the dielectric substrates is arranged for the base material.

21. The reflective structure according to claim 18 or 19, wherein: The reflective member includes a dielectric substrate and a plurality of reflective elements arranged on at least one surface of the dielectric substrate. The dielectric substrate also serves as the base material.

22. The reflective structure according to claim 18 or 19, wherein: The reflective member includes a plurality of reflective elements disposed in contact with the substrate.

23. The reflective structure according to claim 18 or 19, wherein: The dielectric layer has a third alignment mark.

24. The reflective structure according to claim 18 or 19, wherein: A second adhesive portion is disposed between the adjacent dielectric layers.

25. The reflective structure according to claim 18 or 19, wherein: The adjacent dielectric layers have concave-convex portions that can fit together on the side surfaces facing each other, and the adjacent dielectric layers are arranged so that the concave-convex portions fit together.

26. The reflective structure according to claim 25, wherein: The concavo-convex portions of the adjacent dielectric layers have the same thickness.

27. The reflective structure according to claim 18 or 19, wherein: The dielectric layer has a fourth identification mark for identifying the dielectric layer.

28. The reflective structure according to claim 27, wherein: The substrate has a third identification mark for identifying a position of the dielectric layer.

29. The reflective structure according to claim 18 or 19, wherein: The reflecting member is a frequency selective plate that reflects only the electromagnetic wave.

30. The reflective structure according to claim 29, wherein: The reflecting member has a reflection phase control function of controlling a reflection phase of the electromagnetic wave.

31. A method for manufacturing a reflective structure, comprising manufacturing a reflective structure having a plurality of frequency selective reflectors, wherein the frequency selective reflectors reflect electromagnetic waves of a specific frequency band in a direction different from a normal reflection direction, wherein: The manufacturing method of the reflective structure includes a configuration step, in which the plurality of frequency selective reflectors are arranged on a surface of a support having a first alignment mark in such a manner that a distance between adjacent frequency selective reflectors is less than 1 / 2 of a wavelength of the electromagnetic wave.

32. The method for manufacturing a reflective structure according to claim 30, wherein: The frequency selective reflection plate has a second alignment mark.

33. The method for manufacturing a reflective structure according to claim 30, wherein: The support body has light transmittance, The outer peripheral area of ​​the frequency selective reflection plate is light-proof.

34. A frequency selective reflector assembly comprising a plurality of frequency selective reflectors for reflecting electromagnetic waves of a specific frequency band in a direction different from a normal reflection direction, wherein: A plurality of the frequency selective reflectors are arranged on a setting surface for use. The frequency selective reflection plate has a second identification mark for identifying the frequency selective reflection plate.

35. A frequency selective reflector assembly comprising a plurality of frequency selective reflectors for reflecting electromagnetic waves of a specific frequency band in a direction different from a normal reflection direction, wherein: A plurality of the frequency selective reflectors are arranged on a setting surface for use. The frequency selective reflector has a reflective component for reflecting the electromagnetic wave. A plurality of reflective elements of different sizes are arranged in the reflective component. Arrangements of the reflective elements in the plurality of frequency selective reflectors are different from each other.

36. A frequency selective reflector assembly comprising a plurality of frequency selective reflectors for reflecting electromagnetic waves of a specific frequency band in a direction different from a normal reflection direction, wherein: A plurality of the frequency selective reflectors are arranged on a setting surface for use. The frequency selective reflection plate includes, in order from the installation surface side, a reflection member for reflecting the electromagnetic wave and a dielectric layer for transmitting the electromagnetic wave. A plurality of unit regions having different thicknesses are arranged in the dielectric layer. The arrangement of the unit regions in the plurality of frequency selective reflection plates is different from each other.

Images