Substrate processing system and substrate processing method

Abstract

The invention relates to a substrate processing system and a substrate processing method. A control unit of a substrate processing system controls an elevator to perform a first batch process in which a plurality of substrates in a vertical posture are immersed in a chemical solution in a chemical solution processing tank. The control unit controls the second posture conversion mechanism to rotate the plurality of substrates after the first batch processing around the horizontal axis, thereby reversing the plurality of substrates in the vertical posture up and down. The control unit controls the elevator, and performs a second batch process in which the plurality of substrates, the vertical postures of which are reversed up and down, are immersed in the chemical solution in the chemical solution processing tank.

Description

Technical Field

[0001] The present invention relates to a substrate processing system and a substrate processing method for processing a substrate. Examples of the substrate may include a semiconductor substrate, a substrate for an FPD (Flat Panel Display), a glass substrate for a photomask, a substrate for an optical disc, a substrate for a magnetic disk, a ceramic substrate, a substrate for a solar cell, and the like. Examples of the FPD may include a liquid crystal display device, an organic EL (electroluminescence) display device, and the like. Background Art

[0002] An existing substrate processing apparatus includes a substrate transfer mechanism for transferring a group of substrates that have been processed together, a processing tank for storing a heated phosphoric acid solution, and a lift for holding the group of substrates and immersing the group of substrates in the phosphoric acid solution. When the group of substrates is transferred to the processing tank by the substrate transfer mechanism, the lift receives the group of substrates from the substrate transfer mechanism and immerses the group of substrates in the phosphoric acid solution in the processing tank. Thereby, etching processing is performed on the group of substrates together (for example, refer to Japanese Unexamined Patent Application Publication No. 2004-296823).

[0003] Japanese Unexamined Patent Application Publication No. 2021-064652 discloses a substrate processing system that includes a batch processing unit for processing a plurality of substrates together, a single-substrate processing unit for processing each substrate individually, and an interface unit for transferring substrates between the single-substrate processing unit and the batch processing unit. Summary of the Invention

[0004] Problems to be Solved by the Invention

[0005] A plurality of substrates in a vertical posture are immersed in a phosphoric acid solution in a processing tank. Thereby, etching processing is performed on the plurality of substrates together. At this time, in order to circulate the phosphoric acid solution in the processing tank, for example, at least one of the phosphoric acid solution and the bubbles is caused to flow upward from the bottom of the processing tank. Such etching processing is performed until a preset time (for example, 4 hours) has elapsed. However, perhaps because a fresher phosphoric acid solution acts on the substrates on the bottom side in the processing tank, sometimes the degrees of etching processing of the upper half and the lower half of each substrate in the vertical posture are different.

[0006] The present invention has been completed in view of such circumstances, and an object thereof is to provide a substrate processing system and a substrate processing method capable of suppressing variations in the processing of each substrate.

[0007] Means for Solving the Problems

[0008] To achieve such an object, the present invention adopts the following structure. That is, the substrate processing system for processing a substrate according to the present invention is characterized in that it includes a batch processing device for processing a plurality of substrates together. The batch processing device includes: a first carrier mounting rack for mounting a carrier that accommodates the plurality of substrates in a horizontal posture; a first posture conversion mechanism for converting the plurality of substrates between a horizontal posture and a vertical posture; a substrate operation mechanism for transporting the plurality of substrates between the carrier mounted on the carrier mounting rack and the first posture conversion mechanism; a processing tank for storing a chemical solution; a lift capable of immersing the plurality of substrates in the chemical solution in the processing tank while holding the plurality of substrates in a vertical posture; a second posture conversion mechanism for rotating the plurality of substrates around a horizontal axis orthogonal to the central axis passing through the center of each substrate; a first batch transfer robot for transporting the plurality of substrates between the first posture conversion mechanism, the lift, and the second posture conversion mechanism while holding the plurality of substrates in a vertical posture; and a control unit. The control unit is configured to control the substrate operation mechanism to transport the plurality of substrates in a horizontal posture received from the carrier mounted on the first carrier mounting rack to the first posture conversion mechanism, control the first posture conversion mechanism to convert the plurality of substrates from a horizontal posture to a vertical posture, control the first batch transfer robot to transport the plurality of substrates converted to a vertical posture to the lift, control the lift to perform a first batch process of immersing the plurality of substrates in a vertical posture in the chemical solution in the processing tank, control the first batch transfer robot to transport the plurality of substrates after the first batch process to the second posture conversion mechanism, control the second posture conversion mechanism to rotate the plurality of substrates after the first batch process around the horizontal axis, thereby reversing the plurality of substrates in a vertical posture up and down, control the first batch transfer robot to transport the plurality of substrates after being reversed up and down in a vertical posture to the lift, and control the lift to perform a second batch process of immersing the plurality of substrates after being reversed up and down in a vertical posture in the chemical solution in the processing tank.

[0009] According to the substrate processing system of the present invention, a first batch process and a second batch process of immersing a plurality of substrates in the chemical solution in the processing tank are performed. Here, the second posture conversion mechanism rotates the plurality of substrates after the first batch process around a horizontal axis, thereby reversing the plurality of substrates in a vertical posture up and down. That is, an operation of reversing the plurality of substrates in a vertical posture up and down is performed between the first batch process and the second batch process. Therefore, it is possible to suppress processing deviations generated in the upper and lower parts of each substrate.

[0010] Further, in the above-described substrate processing system, preferably, the second posture conversion mechanism has a reverse chuck that holds the plurality of substrates, and rotates the reverse chuck around the horizontal axis. The operation of turning the plurality of substrates in the vertical posture upside down is performed by rotating the reverse chuck that holds the plurality of substrates around the horizontal axis.

[0011] Further, in the above-described substrate processing system, preferably, the reverse chuck includes two chuck members each having a plurality of pairs of holding grooves, the two chuck members can be opened and closed along the horizontal axis, and each of the plurality of pairs of holding grooves includes a first support portion that prevents the received single substrate from moving in a predetermined direction in the substrate access direction and a second support portion that prevents the received single substrate from moving in the direction opposite to the predetermined direction, and the substrate access direction is orthogonal to the direction in which the two chuck members are opened and closed and along the device surface of the received single substrate.

[0012] In the reverse chuck, the first support portion and the second support portion of each pair of holding grooves can prevent a single substrate from moving in two directions in the substrate access direction. Therefore, the operation of turning the plurality of substrates in the vertical posture upside down can be easily performed.

[0013] Further, the above-described substrate processing system preferably further includes a first horizontal substrate transfer robot that has a first hand for holding a single substrate in a horizontal posture and transfers the single substrate, and the control unit is configured to control the second posture conversion mechanism to rotate the reverse chuck around the horizontal axis while holding the plurality of substrates by the reverse chuck, so as to convert the plurality of substrates after the first batch process from the vertical posture to the horizontal posture, control the first horizontal substrate transfer robot to perform a rearrangement operation of rearranging the plurality of substrates that have been converted to the horizontal posture in the reverse chuck so as to exchange the positions of the outer substrate and the inner substrate in the direction of the arrangement of the plurality of substrates, and control the second posture conversion mechanism to further rotate the reverse chuck around the horizontal axis while holding the plurality of substrates by the reverse chuck, so as to convert the plurality of substrates after the rearrangement operation from the horizontal posture to the vertical posture in such a manner that the plurality of substrates in the vertical posture during the first batch process are turned upside down.

[0014] In addition to performing the operation of turning the plurality of substrates in the vertical posture upside down, a rearrangement operation is also performed. The rearrangement operation is an operation of rearranging the plurality of substrates that have been converted to the horizontal posture in the reverse chuck so as to exchange the positions of the outer substrate and the inner substrate in the direction of the arrangement of the plurality of substrates. Therefore, the processing deviation generated between the outer substrate and the inner substrate in the direction of the arrangement of the plurality of substrates can be suppressed.

[0015] Furthermore, the above-described substrate processing system preferably includes, in addition to the above-described batch processing apparatus, a single-substrate processing apparatus that processes each of the above-described multiple substrates one by one, and a relay apparatus that transports the above-described multiple substrates from the above-described batch processing apparatus to the above-described single-substrate processing apparatus. The above-described relay apparatus includes a first horizontal substrate transfer robot that has a first hand for holding one substrate in a horizontal posture and transports the one substrate. The above-described single-substrate processing apparatus includes: a single-substrate processing chamber that performs single-substrate processing on the one substrate in a horizontal posture; a second carrier mounting rack that mounts the above-described carrier; and a second horizontal substrate transfer robot that has a second hand for holding the above-described one substrate in a horizontal posture and transports the one substrate among the above-described relay apparatus, the above-described single-substrate processing chamber, and the above-described carrier mounted on the above-described second carrier mounting rack. The above-described control unit is configured to control the above-described first batch transfer robot to transport the above-described multiple substrates after the above-described second batch processing to the above-described second posture conversion mechanism, control the above-described second posture conversion mechanism to convert the above-described multiple substrates after the above-described second batch processing from a vertical posture to a horizontal posture, control the above-described first horizontal substrate transfer robot to transport the one substrate converted to the horizontal posture from the above-described second posture conversion mechanism to the above-described single-substrate processing apparatus, control the above-described second horizontal substrate transfer robot to transport the one substrate transported by the above-described first horizontal substrate transfer robot to the above-described single-substrate processing chamber, control the above-described single-substrate processing chamber to perform the above-described single-substrate processing on the above-described one substrate, and control the above-described second horizontal substrate transfer robot to transport the above-described one substrate after the above-described single-substrate processing from the above-described single-substrate processing chamber to the above-described carrier mounted on the above-described second carrier mounting rack.

[0016] In addition to the batch processing apparatus, the substrate processing system further includes a single-substrate processing apparatus and a relay apparatus. The multiple substrates after the second batch processing are sent to the single-substrate processing apparatus via the relay apparatus. Here, in addition to the operation of turning the multiple substrates in the vertical posture upside down, the second posture conversion mechanism also performs the operation of converting the multiple substrates from the vertical posture to the horizontal posture. In other words, in addition to the operation of converting to the horizontal posture, the second posture conversion mechanism also performs the upside-down operation. Therefore, the mechanism for converting to the horizontal posture and the mechanism for performing the upside-down operation may not be provided separately, and thus the structure of the substrate processing system can be made compact.

[0017] Further, in the above-described substrate processing system, preferably, the control unit is configured to control the substrate operation mechanism to transfer the multiple substrates in a horizontal posture received from the first carrier placed on the first carrier placement rack to the first posture conversion mechanism, and to transfer the multiple second substrates in a horizontal posture received from the second carrier placed on the first carrier placement rack to the first posture conversion mechanism, control the first posture conversion mechanism to form a processing substrate group in which the multiple substrates and the multiple second substrates are alternately arranged, and to convert the processing substrate group from a horizontal posture to a vertical posture, control the first batch transfer robot to transfer the processing substrate group in a vertical posture to the elevator, control the elevator to perform the first batch processing of immersing the processing substrate group in the liquid medicine in the processing tank, control the first batch transfer robot to transfer the processing substrate group after the first batch processing to the second posture conversion mechanism, control the second posture conversion mechanism to rotate the multiple substrates in the processing substrate group after the first batch processing around the horizontal axis, and to rotate the multiple second substrates in the processing substrate group after the first batch processing around the horizontal axis, thereby reversing the multiple substrates and the multiple second substrates in a vertical posture up and down, control the first batch transfer robot to transfer the processing substrate group after being reversed up and down in a vertical posture to the elevator, and control the elevator to perform the second batch processing of immersing the processing substrate group after being reversed up and down in a vertical posture in the liquid medicine in the processing tank.

[0018] By reversing the processing substrate group in which multiple substrates and multiple second substrates are alternately arranged up and down, the substrate processing system can suppress the processing deviation generated in the upper half and the lower half of each substrate in the processing substrate group.

[0019] Further, in the above-described substrate processing system, preferably, the second posture conversion mechanism further includes: a standby elevator that holds the processing substrate group in a vertical posture; and a second batch transfer robot that transfers the processing substrate group between the standby elevator and the reversing chuck. The control unit is configured to control the first posture conversion mechanism to form a processing substrate group in which the multiple substrates and the multiple second substrates are alternately arranged and all device surfaces of the multiple substrates are respectively opposed to all device surfaces of the multiple second substrates, and to convert the processing substrate group from a horizontal posture to a vertical posture, and control the second batch transfer robot to transfer the multiple substrates after being reversed up and down and the multiple second substrates after being reversed up and down to the standby elevator in such a manner that all device surfaces of the multiple substrates are respectively opposed to all device surfaces of the multiple second substrates.

[0020] The processed substrate group is formed such that a plurality of substrates and a plurality of second substrates are alternately arranged, and all device surfaces of the plurality of substrates are respectively opposed to all device surfaces of the plurality of substrates. After the processed substrate group is turned upside down, in the direction in which the processed substrate group is arranged, there is a case where two device surfaces of two substrates at both ends do not oppose two device surfaces of two other substrates. In this case, when batch processing is performed, for example, the amount of liquid medicine flowing is different between the substrate whose device surfaces do not oppose and the two substrates whose device surfaces oppose. Therefore, there is a possibility of processing deviation. Thus, after the processed substrate group is turned upside down, all device surfaces of the plurality of substrates are also respectively opposed to all device surfaces of the plurality of second substrates, thereby being able to prevent such processing deviation.

[0021] Moreover, in the above-described substrate processing system, preferably, the batch processing device further includes a batch drying unit that dries the plurality of substrates together. The first batch transfer robot holds the plurality of substrates in a vertical posture and transfers the plurality of substrates between the first posture conversion mechanism, the elevator, the second posture conversion mechanism, and the batch drying unit. The control unit is configured to control the first batch transfer robot to transfer the plurality of substrates after the second batch processing to the batch drying unit, and control the batch drying unit to dry the plurality of substrates after the second batch processing together.

[0022] The substrate processing system can use the batch drying unit to dry the plurality of substrates after the second batch processing together without sending the plurality of substrates after the second batch processing to a single-substrate processing device.

[0023] Moreover, the substrate processing method of the present invention is a substrate processing method of a substrate processing system. The above-mentioned substrate processing system includes a batch processing device for processing multiple substrates together. The above-mentioned batch processing device includes: a carrier mounting rack for mounting a carrier that accommodates multiple substrates in a horizontal posture; a first posture conversion mechanism for converting the above-mentioned multiple substrates between a horizontal posture and a vertical posture; a substrate handling mechanism for transporting the above-mentioned multiple substrates between the carrier mounted on the above-mentioned carrier mounting rack and the above-mentioned first posture conversion mechanism; a processing tank for storing a chemical solution; a lift that can immerse the above-mentioned multiple substrates in the chemical solution in the above-mentioned processing tank while holding the above-mentioned multiple substrates in a vertical posture; and a first batch handling robot for transporting the above-mentioned multiple substrates while holding the above-mentioned multiple substrates in a vertical posture. The substrate processing method is characterized by including the following steps: a first substrate transportation step in which the above-mentioned substrate handling mechanism transports the above-mentioned multiple substrates in a horizontal posture received from the carrier mounted on the above-mentioned first carrier mounting rack to the above-mentioned first posture conversion mechanism; a vertical posture conversion step in which the above-mentioned first posture conversion mechanism converts the above-mentioned multiple substrates from a horizontal posture to a vertical posture; a second substrate transportation step in which the above-mentioned first batch handling robot transports the above-mentioned multiple substrates converted to a vertical posture to the above-mentioned lift; a first batch processing step in which the above-mentioned lift performs a first batch processing of immersing the above-mentioned multiple substrates in a vertical posture in the chemical solution in the above-mentioned processing tank; a third substrate transportation step in which the above-mentioned first batch handling robot transports the above-mentioned multiple substrates after the above-mentioned first batch processing to a second posture conversion mechanism; an up-down inversion step in which the above-mentioned second posture conversion mechanism rotates the above-mentioned multiple substrates after the above-mentioned first batch processing around a horizontal axis orthogonal to the central axis passing through the center of each substrate, thereby inverting the above-mentioned multiple substrates in a vertical posture up and down; a fourth substrate transportation step in which the above-mentioned first batch handling robot transports the above-mentioned multiple substrates in a vertical posture after being inverted up and down to the above-mentioned lift; and a second batch processing step in which the above-mentioned lift performs a second batch processing of immersing the above-mentioned multiple substrates in a vertical posture after being inverted up and down in the chemical solution in the above-mentioned processing tank.

[0024] The effects of the invention are as follows.

[0025] According to the substrate processing system and the substrate processing method of the present invention, it is possible to suppress the deviation in the processing of each substrate. BRIEF DESCRIPTION OF THE DRAWINGS

[0026] For the purpose of illustrating the invention, several currently considered preferred modes are illustrated, but it should be understood that the invention is not limited to the illustrated structures and schemes.

[0027] Figure 1It is a top view showing the schematic structure of the substrate processing system of Embodiment 1.

[0028] Figures 2A - 2C It is a side view for explaining the substrate operating mechanism and the first posture conversion mechanism.

[0029] Figure 3A 、 Figure 3B It is a top view of the standby tank, the standby elevator, and the batch transfer robot.

[0030] Figure 4 It is a longitudinal sectional view of the posture conversion tank and the posture conversion part as viewed from the front.

[0031] Figure 5A It is a front view showing the case where the reverse chuck in the open state supports multiple substrates, Figure 5B It is a cross-sectional view showing the case where a pair of holding grooves of the reverse chuck in the open state support a single substrate in a horizontal posture.

[0032] Figure 6 It is a flowchart for explaining the operation of the substrate processing system.

[0033] Figure 7 It is a flowchart for explaining the operation of the first half of the batch process (chemical solution process and cleaning process).

[0034] Figure 8 It is a flowchart for explaining the operation of the second half of the batch process.

[0035] Figures 9A - 9C It is a side view for explaining the operation of the second posture conversion mechanism.

[0036] Figures 10A - 10C It is a side view for explaining the operation of the second posture conversion mechanism.

[0037] Figures 11A - 11C It is a side view for explaining the operation of the second posture conversion mechanism.

[0038] Figures 12A - 12C It is a side view for explaining the operation of the second posture conversion mechanism.

[0039] Figures 13A - 13C It is a side view for explaining the operation of the second posture conversion mechanism.

[0040] Figure 14A It is a side view for explaining the operation of the horizontal posture conversion of the first substrate group, Figure 14B It is a side view showing the case where the relay hand of the substrate transfer robot approaches the reverse chuck in order to take out a single substrate.

[0041] Figure 15It is a side view for explaining the operation of the horizontal posture conversion of the second substrate group.

[0042] Figure 16 It is a diagram for explaining the effect of the substrate processing system.

[0043] Figure 17 It is a flowchart showing the detailed operation of the up - down inversion of 25 substrates by the inversion chuck of Example 2.

[0044] Figure 18A It is a longitudinal sectional view showing the state before inverting multiple substrates up and down, Figure 18B It is a longitudinal sectional view showing the state after converting multiple substrates from the vertical posture to the horizontal posture, Figure 18C It is a longitudinal sectional view showing the state (the state after up - down inversion) after converting multiple substrates from the horizontal posture to the vertical posture.

[0045] Figures 19A - 19G It is a front view for explaining the rearrangement operation of the substrates in the inversion chuck of Example 2.

[0046] Figure 20 It is a top view showing the schematic structure of another substrate processing system of Example 3.

[0047] Figure 21 It is a flowchart for explaining the operation of the substrate processing system of Example 3.

[0048] Symbol Explanation

[0049] 1 - Substrate processing system, 3 - Batch processing device, 5 - Relay device, 7 - Single - sheet processing device, 17 - Carrier, HTR - Substrate operation mechanism, 23 - First posture conversion mechanism, 35 - Batch drying unit, BT1, BT3 - Chemical liquid processing tank (batch processing tank), LF1, LF3 - Lift, WTR1 - Batch handling robot, WTR2 - Batch handling robot, 43 - Second posture conversion mechanism, LF9 - Standby lift, 53 - Inversion chuck, 55, 56 - Chuck components, 57, 58 - Holding grooves, 105 - Substrate handling robot, 111 - Relay hand, 125 - Carrier, IR - Indexing robot, 127 - Hand, SW1, SW2 - Single - sheet processing chamber, CR - Central robot, 151 - Hand, 180 - Control unit, AX4 - Horizontal axis, C - Carrier, DR1 - Direction, SU1 - First support part, SU2 - Second support part. Detailed Embodiment

[0050]

Example 1

[0051] Hereinafter, Example 1 of the present invention will be described with reference to the accompanying drawings. Figure 1It is a top view showing the schematic structure of the substrate processing system 1 of Embodiment 1.

[0052] In this specification, for ease of explanation, the direction in which the transfer block 19 (described below) and the processing block 21 (described below) are arranged is referred to as the "front-back direction X". The front-back direction X is horizontal. The direction from the processing block 21 towards the transfer block 19 in the front-back direction X, for example, is referred to as "front". The direction opposite to the front is referred to as "rear". The horizontal direction orthogonal to the front-back direction X is referred to as the "width direction Y". One direction of the "width direction Y" is appropriately referred to as "right". The direction opposite to the right is referred to as "left". The direction perpendicular to the horizontal direction is referred to as the "vertical direction Z". In each figure, for reference, the front, rear, right, left, top, and bottom are appropriately shown.

[0053] <1. Overall Structure>

[0054] Refer to Figure 1 The substrate processing system 1 processes the substrate W. The substrate processing system 1, for example, performs liquid chemical treatment, cleaning treatment, drying treatment, etc. on the substrate W. The substrate processing system 1 performs batch processing and single-sheet processing. In batch processing, multiple (for example, 50 sheets or 25 sheets) substrates W are processed together, and in single-sheet processing, multiple substrates W are processed one by one. Therefore, the substrate processing system 1 is referred to as a hybrid substrate processing system 1.

[0055] The substrate processing system 1 includes a storage device 2, a batch processing device 3, a relay device 5, and a single-sheet processing device 7. The batch processing device 3 processes multiple substrates W together. The single-sheet processing device 7 processes multiple substrates W one by one. The single-sheet processing device 7 is disposed on the right side of the batch processing device 3 and is disposed away from the batch processing device 3. The relay device 5 connects the batch processing device 3 and the single-sheet processing device 7.

[0056] <2. Storage Device>

[0057] The storage device 2 stores at least one carrier C. The storage device 2 is adjacent to the front of the batch processing device 3. The carrier C accommodates multiple (for example, 25 sheets) substrates W in a horizontal posture with a predetermined interval (for example, 10 mm) therebetween. In the carrier C, multiple substrates W are arranged in the vertical direction Z or the thickness direction of each substrate W. As the carrier C, for example, a FOUP (Front Opening Unify Pod) is used, but it is not limited thereto.

[0058] The storage device 2 has a plurality (for example, two) of loading ports 9. The two loading ports 9 are arranged in the width direction Y. In the present embodiment, the two loading ports 9 are used for loading and unloading the carrier C. Further, the storage device 2 includes at least one storage rack 11 and a carrier handling robot 13. The storage rack 11 is a rack for storing the carrier C. The carrier C is placed on the storage rack 11.

[0059] The carrier handling robot 13 transports the carrier C between the two loading ports 9, the storage rack 11, and the following placement rack 17. The carrier handling robot 13 includes a gripping portion 15 that grips, for example, a protrusion provided on the upper surface of the carrier C. The carrier handling robot 13 can move the gripping portion 15 in the horizontal direction (front-rear direction X and width direction Y) and the vertical direction Z. The carrier handling robot 13 is driven by one or more electric motors. In addition, the carrier handling robot 13 may include a movable support portion that supports the lower surface of the carrier C instead of the gripping portion 15.

[0060] <3. Batch processing device>

[0061] The batch processing device 3 includes a placement rack 17, a transfer block 19, a processing block 21, and a batch transfer area R1. The placement rack 17 is adjacent to the front of the transfer block 19. The processing block 21 is arranged behind the transfer block 19 via the following posture conversion area R2. The batch transfer area R1 extends rearward from the transfer block 19. The batch transfer area R1 is adjacent to the left of the transfer block 19, the processing block 21, and the posture conversion area R2.

[0062] <3-1. Transfer block>

[0063] The transfer block 19 includes a substrate operation mechanism (robot) HTR and a first posture conversion mechanism 23. The substrate operation mechanism HTR is provided behind the placement rack 17. The substrate operation mechanism HTR horizontally transports a plurality (for example, 25) of substrates W in a horizontal posture between the substrate C placed on the placement rack 17 and the first posture conversion mechanism 23.

[0064] Refer to Figures 2A - 2C . The substrate operation mechanism HTR includes a plurality (for example, 25) of hands 25. Each hand 25 holds one substrate W. In addition, Figures 2A - 2C For ease of illustration, the substrate operation mechanism HTR includes three hands 25. And the following pair of horizontal holding portions 31B and a pair of vertical holding portions 31C hold three substrates W. And the following pusher 33A supports six substrates W.

[0065] The substrate handling mechanism HTR also includes a hand support portion 26, a forward and backward movement portion 27, and a lifting and rotating portion 29. The hand support portion 26 supports a plurality of hands 25. The forward and backward movement portion 27 moves the plurality of hands 25 forward and backward via the hand support portion 26. In order to change the direction of the hands 25, the lifting and rotating portion 29 rotates the forward and backward movement portion 27 about the vertical axis AX1. The lifting and rotating portion 29 is fixed to the floor surface. In addition, the forward and backward movement portion 27 and the lifting and rotating portion 29 each include an electric motor. Further, the substrate handling mechanism HTR may also include a movable hand (not shown) for handling only one substrate W in addition to the hands 25.

[0066] The first posture conversion mechanism 23 includes a posture conversion portion 31 and a pushing mechanism 33. The substrate handling mechanism HTR, the posture conversion portion 31, and the pushing mechanism 33 are arranged in sequence on the left side.

[0067] The posture conversion portion 31 converts a plurality of (e.g., 25) substrates W between a horizontal posture and a vertical posture. For example, the posture conversion portion 31 converts the plurality of substrates W received from the substrate handling mechanism HTR from a horizontal posture to a vertical posture. As Figure 2A shown, the posture conversion portion 31 includes a support table 31A, a pair of horizontal holding portions 31B, a pair of vertical holding portions 31C, and a rotation drive portion 31D. The pair of horizontal holding portions 31B and the pair of vertical holding portions 31C are provided on the support table 31A. When the substrate W is in a horizontal posture, the pair of horizontal holding portions 31B contact the lower surface of each substrate W and support each substrate W from below. And when the substrate W is in a vertical posture, the pair of vertical holding portions 31C hold the substrate W. The rotation drive portion 31D rotates the support table 31A about the horizontal axis AX2.

[0068] As Figure 2C shown, the pushing mechanism 33 includes a pusher 33A, a lifting and rotating portion 33B, a horizontal movement portion 33C, and a rail 33D. The pusher 33A holds the lower portions of a plurality of (e.g., 25 or 50) substrates W converted to a vertical posture by the posture conversion portion 31. The lifting and rotating portion 33B raises and lowers the pusher 33A in the vertical direction Z. And the lifting and rotating portion 33B rotates the pusher 33A about the vertical axis AX3. Thereby, the direction of the device surface of the substrate W shown by the arrow AR1 can be made any direction.

[0069] The horizontal movement portion 33C moves the pusher 33A and the lifting and rotating portion 33B horizontally along the rail 33D. The rail 33D extends in the width direction Y. In addition, the rotation drive portion 31D, the lifting and rotating portion 33B, and the horizontal movement portion 33C each include an electric motor.

[0070] Here, the operation of the first posture conversion mechanism 23 will be described. For example, the following four batch processing slots BT1 to BT4 of the processing block 21 process 50 substrates W corresponding to two carriers C in parallel. Therefore, while converting the postures of 50 substrates W (W1, W2) 25 at a time, 50 substrates W are held by the pusher 33A. The 25 substrates W1 are referred to as the first substrate group. The 25 substrates W2 are referred to as the second substrate group. The 50 substrates W (W1, W2) are referred to as the processing substrate group. When not particularly distinguishing between the substrates W1 and W2, the substrates W1 and W2 are described as the substrate W.

[0071] Refer to Figure 2A . The posture conversion unit 31 receives 25 substrates W1 from the substrate operation mechanism HTR. At this time, the 25 substrates W1 are in a horizontal posture and arranged at a full pitch (for example, at an interval of 10 mm). In addition, the full pitch is also referred to as the normal pitch. And, the device surface of each substrate W1 faces upward. In addition, the device surface of the substrate W is the surface on which the circuit is formed, and also includes the surface in the middle of the circuit formation. The device surface is also referred to as the "front surface" or "main surface". And, the back surface of the substrate W refers to the surface on which the circuit is not formed. The surface on the opposite side of the device surface is the back surface.

[0072] Refer to Figure 2B . The rotation drive unit 31D of the posture conversion unit 31 rotates a pair of horizontal holding units 31B, etc. by 90 degrees around the horizontal axis AX2 to convert the 25 substrates W1 from the horizontal posture to the vertical posture. After that, the pusher mechanism 33 raises the pusher 33A and receives 25 substrates W1 from the posture conversion unit 31. After that, the pusher mechanism 33 rotates the pusher 33A by 180 degrees around the vertical axis AX3. Thereby, the direction of the device surface of the 25 substrates W1 is changed from the left side to the right side.

[0073] After that, the posture conversion unit 31 receives 25 substrates W2 from the substrate operation mechanism HTR and converts the 25 substrates W2 from the horizontal posture to the vertical posture. After that, the pusher mechanism 33 raises the pusher 33A holding the 25 substrates W1. Thereby, the pusher 33A further receives 25 substrates W2.

[0074] Refer to Figure 2CThe pusher 33A holds 50 substrates W (W1, W2). Twenty-five substrates W1 and twenty-five substrates W2 are alternately arranged. The 50 substrates W are arranged at a half pitch (e.g., 5 mm interval). In addition, the half pitch is an interval that is half of the full pitch. And, the 50 substrates W are arranged in a face-to-face manner. Therefore, the two device faces (or two back faces) of two adjacent substrates W1, W2 face each other. Thereafter, the pusher mechanism 33 moves the pusher 33A holding 50 substrates W along the track 33D to the substrate transfer position PP below the chuck 37 (described below) of the batch transfer robot WTR1 (described below).

[0075] In addition, the posture conversion unit 31 of the first posture conversion mechanism 23 cannot turn over multiple substrates W in the vertical posture up and down. And, the placement rack 17 corresponds to the first carrier placement rack of the present invention.

[0076] <3-2. Processing block>

[0077] The processing block 21 includes a plurality of (e.g., four) batch processing tanks BT1 to BT4 and a batch drying unit 35. The four batch processing tanks BT1 to BT4 are arranged in the front-rear direction X in which the batch processing device 3 extends. The four batch processing tanks BT1 to BT4 respectively perform dipping processing on multiple (e.g., 25 or 50) substrates W collectively. The four batch processing tanks BT1 to BT4 respectively store a processing liquid (e.g., a chemical solution or pure water) for dipping multiple substrates W.

[0078] The four batch processing tanks BT1 to BT4 are constituted by, for example, two chemical solution processing tanks BT1, BT3 and two cleaning processing tanks BT2, BT4. The chemical solution processing tank BT1 and the cleaning processing tank BT2 are taken as a group, and the chemical solution processing tank BT3 and the cleaning processing tank BT4 are taken as another group. In addition, the combination of the chemical solution processing tank and the cleaning processing tank is not limited to this example. And, the number of batch processing tanks is not limited to four, and one or more are sufficient.

[0079] The two chemical solution processing tanks BT1, BT3 respectively perform etching processing using a chemical solution. As the chemical solution, for example, a phosphoric acid solution is used. The chemical solution is heated to a preset temperature. Chemical solution ejection pipes (not shown) are provided at the bottoms inside the chemical solution processing tanks BT1, BT3 respectively. The chemical solution processing tanks BT1, BT3 respectively store the chemical solution supplied from the chemical solution ejection pipes. And, gas supply pipes (not shown) may be provided at the bottoms inside the chemical solution processing tanks BT1, BT3 respectively. The gas supply pipes supply, for example, a bubbly inert gas (e.g., nitrogen) into the chemical solution in the chemical solution processing tank BT1. For example, when dipping multiple substrates W in the chemical solution in the chemical solution processing tank BT1, in order to circulate the chemical solution, at least one of supplying the chemical solution from the chemical solution supply pipe and supplying the bubbly inert gas from the gas supply pipe may be performed.

[0080] Two cleaning treatment tanks BT2 and BT4 respectively perform a cleaning treatment of rinsing the chemical solution adhering to a plurality of substrates W with a cleaning solution (rinsing solution). As the cleaning solution, for example, pure water such as deionized water (DIW) is used. The cleaning treatment tanks BT2 and BT4 respectively store pure water supplied from a pure water spray pipe (not shown).

[0081] Four elevators LF1 to LF4 are respectively provided in the four batch treatment tanks BT1 to BT4. For example, the elevator LF1 includes a plurality (for example, 50) of holding tanks (not shown) arranged in the width direction Y. The elevator LF1 holds, for example, 50 substrates W in a vertical posture arranged at a half pitch (for example, 5 mm interval) as a predetermined interval in 50 holding tanks. In addition, the elevator LF1 may include 51 or more holding tanks in order to hold 50 substrates W.

[0082] The elevator LF1 can immerse 50 substrates W in the chemical solution in the batch treatment tank BT1 while holding 50 substrates W in a vertical posture. The elevator LF1 raises and lowers a plurality of substrates W between the processing position inside the batch treatment tank BT1 and the transfer position above the batch treatment tank BT1. The elevator LF1 includes an electric motor or a cylinder in order to raise and lower a plurality of substrates W. The other three elevators LF2 to LF4 are also configured in the same manner as the elevator LF1.

[0083] The batch drying unit 35 dries a plurality of substrates W together. The batch drying unit 35 is used, for example, when the single-substrate processing device 7 cannot be used. The batch drying unit 35 is provided in front of the four batch treatment tanks BT1 to BT4. That is, the batch drying unit 35 is provided between the transfer block 19 and the four batch treatment tanks BT1 to BT4. The batch drying unit 35 includes an elevator LF7.

[0084] <3-3. Batch transfer area>

[0085] The batch transfer area R1 includes a batch transfer robot WTR1. The batch transfer robot WTR1 transfers a plurality of substrates W in a vertical posture between the first posture conversion mechanism 23 (including the pushing mechanism 33), the four elevators LF1 to LF4, the relay device 5 (the second posture conversion mechanism 43 described below), and the elevator LF7 of the batch drying unit 35 while holding the substrates W in a vertical posture.

[0086] The substrate transfer position PP, the four elevators LF1 to LF4, the elevator LF7 of the batch drying unit 35, and the standby elevator LF9 (described below) are arranged in a line in the front-rear direction X. Therefore, the batch transfer robot WTR1 transfers a plurality of substrates W in a vertical posture in the front-rear direction X.

[0087] The batch transfer robot WTR1 is equipped with a chuck 37 and a guide rail 39. The chuck 37 has two chuck members 41 and 42. The two chuck members 41 and 42 have 50 pairs of holding grooves for holding, for example, 50 substrates W. Accordingly, the first chuck member 41 has 50 holding grooves, and the second chuck member 42 has 50 holding grooves. In addition, the two chuck members 41 and 42 may have 51 or more pairs of holding grooves for holding 50 substrates W, for example. The two chuck members 41 and 42 extend in the width direction Y respectively. The batch transfer robot WTR1 opens and closes the two chuck members 41 and 42. The guide rail 39 extends in the front-rear direction X. The batch transfer robot WTR1 moves the chuck 37 along the guide rail 39. The batch transfer robot WTR1 is driven by an electric motor.

[0088] <4. Relay device (interface device)>

[0089] Describe the outline of the relay device 5. The relay device 5 turns over multiple substrates W in a vertical posture after the first batch process in either of the two chemical solution treatment tanks BT1 and BT3. And the relay device 5 converts the multiple substrates W from a vertical posture to a horizontal posture after the second batch process in either of the two chemical solution treatment tanks BT1 and BT3. The relay device 5 transports, for example, the multiple substrates W converted to a horizontal posture to the single-substrate processing device 7. That is, the relay device 5 transports the multiple substrates W after the second batch process (chemical solution treatment and pure water cleaning process) from the batch processing device 3 to the single-substrate processing device 7.

[0090] Describe the detailed structure of the relay device 5. As Figure 1 shown, the relay device 5 includes a posture conversion area R2 and a relay area R3 arranged in the width direction Y. The relay area R3 extends rightward from the posture conversion area R2. In the front-rear direction X, the posture conversion area R2 is arranged between the first posture conversion mechanism 23 of the transfer block 19 and the four batch processing tanks BT1 to BT4 of the processing block 21. And the left part of the relay area R3 is arranged between the transfer block 19 and the processing block 21.

[0091] <4-1. Second posture conversion mechanism>

[0092] A second posture conversion mechanism 43 is provided in the posture conversion area R2. The second posture conversion mechanism 43 rotates multiple substrates W around a horizontal axis AX4 orthogonal to the central axis CA passing through the center of each substrate W (refer to Figure 4)。In other words, the second posture conversion mechanism 43 rotates a plurality of substrates W around a horizontal axis AX4 extending along the device surface (front surface or main surface) of each substrate W among the plurality of substrates W. Thus, the second posture conversion mechanism 43 has two functions. The first function is to invert the upper and lower positions of a plurality of substrates W in the vertical posture. The second function is to convert a plurality of substrates W from the vertical posture to the horizontal posture.

[0093] The second posture conversion mechanism 43 includes a standby tank 45, a standby elevator LF9, a posture conversion tank 47, a posture conversion unit 49, and a second batch transfer robot WTR2. Figure 3A 、 Figure 3B is a top view of the standby tank 45, the standby elevator LF9, and the batch transfer robot WTR2. In addition, Figure 3A 、 Figure 3B shows, in a cross-sectional view, the following two chuck members 95 and 96 of the batch transfer robot WTR2. And, Figure 3A 、 Figure 3B shows, for the sake of easy illustration, the elevator LF9 holding six substrates W.

[0094] The standby tank 45 stores an immersion liquid in which a plurality of substrates W are immersed. As the immersion liquid, pure water (e.g., DIW) is used. Pure water is supplied from a pure water ejection pipe (not shown).

[0095] The standby elevator LF9 receives a plurality of substrates W from the batch transfer robot WTR1 and holds the plurality of substrates W in the vertical posture. The standby elevator LF9 includes a plurality of (e.g., three) support members 51 extending in the width direction Y. Each of the plurality of support members 51 has a plurality of holding grooves MZ for holding a plurality of substrates W. The number of the holding grooves MZ is set to be larger than the number of substrates W processed together in the batch processing tanks BT1 to BT4. In this case, the number of substrates W is the number when there is no missing part in the column of the substrates W. For example, when there is no missing part and 50 substrates W are processed together in the batch processing tanks BT1 to BT4, the number of the holding grooves MZ is 51 or more. The standby elevator LF9 includes an electric motor or a cylinder for raising and lowering the plurality of support members 51.

[0096] Figure 4 is a longitudinal sectional view of the posture conversion tank 47 and the posture conversion unit 49 as viewed from the front. Figure 5A is a front view showing the case where the inversion chuck 53 in the open state supports a plurality of substrates W in the horizontal posture. In addition, Figure 5A shows, for the sake of easy illustration, the inversion chuck 53 supporting three substrates W. Figure 5B is a cross-sectional view showing the case where a pair of holding grooves 57 and 58 of the inversion chuck 53 in the open state support one substrate W in the horizontal posture.

[0097] Reference Figure 4 The posture conversion tank 47 stores the immersion liquid for immersing a plurality of substrates W. As the immersion liquid, pure water (e.g., DIW) is used. The pure water is supplied from a pure water ejection pipe (not shown). In addition, the posture conversion tank 47 may store an immersion liquid having a different type from the immersion liquid in the standby tank 45.

[0098] The posture conversion unit 49 includes a reverse chuck 53 that holds a plurality of (e.g., 25) substrates W. The posture conversion unit 49 rotates the reverse chuck 53 about the horizontal axis AX4. The reverse chuck 53 includes two chuck members 55, 56. The two chuck members 55, 56 can be opened and closed along the horizontal axis AX4. The horizontal axis AX4 extends in the front-rear direction X. As Figure 5A shown, the two chuck members 55, 56 include a plurality of pairs (e.g., 25 pairs) of holding grooves 57, 58. That is, a plurality of (e.g., 25) holding grooves 57 are provided in the first chuck member 55. And a plurality of (e.g., 25) holding grooves 58 are provided in the second chuck member 56. Each pair of holding grooves 57, 58 are opposed to each other.

[0099] Each of the holding grooves 57, 58 is formed in a V shape such that the depth becomes narrower in the thickness direction of the substrate W. And each of the holding grooves 57, 58 is formed in an arc shape in the direction along the device surface of the substrate W. The arc shape is the shape along the outer edge of the substrate W.

[0100] Figure 5B The direction DR1 shown is the direction orthogonal to the direction in which the two chuck members 55, 56 are opened and closed and along the device surface of one substrate W to be accommodated. The direction DR1 is referred to as the substrate access direction. The direction DR1 is the direction when one substrate W is accommodated in each pair of holding grooves 57, 58 or taken out from each pair of holding grooves 57, 58 when the two chuck members 55, 56 are in the open state. Each of the plurality of pairs of holding grooves 57, 58 includes a first support portion SU1 that prevents the one substrate W to be accommodated from moving in a predetermined direction in the direction DR1, and a second support portion SU2 that prevents the one substrate W to be accommodated from moving in the opposite direction to the predetermined direction.

[0101] In addition to the reverse chuck 53, the posture conversion unit 49 includes a drive mechanism 61. The drive mechanism 61 includes rotating portions 63A, 63B, opening / closing portions 65A, 65B, and lifting portions 67A, 67B. The rotating portions 63A, 63B rotate the reverse chuck 53 about the horizontal axis AX4. The opening / closing portions 65A, 65B open and close the reverse chuck 53 along the horizontal axis AX4. The lifting portions 67A, 67B lift and lower the reverse chuck 53 in the vertical direction Z.

[0102] The rotating section 63A, the opening / closing section 65A, and the lifting section 67A drive the first chuck member 55. In contrast, the rotating section 63B, the opening / closing section 65B, and the lifting section 67B drive the second chuck member 56. The rotating section 63A, the opening / closing section 65A, and the lifting section 67A are configured substantially the same as the rotating section 63B, the opening / closing section 65B, and the lifting section 67B. Therefore, the rotating section 63A, the opening / closing section 65A, and the lifting section 67A will be described as representatives.

[0103] The rotating section 63A includes an arm member 69, a rotating shaft 71, a pulley 73, an electric motor 75, a pulley 77, a belt 79, and a housing 80.

[0104] The arm member 69 supports the chuck member 55 so as to be rotatable about the horizontal axis AX4. The arm member 69 includes a vertical portion 69L extending in the vertical direction Z and a horizontal portion 69U extending in the horizontal direction (front-rear direction X) from the upper end of the vertical member 69L. A pulley 73 is connected to the back surface of the chuck member 55 via the rotating shaft 71. Therefore, the rotating shaft 71 extends in the front-rear direction X. The rotating shaft 71 passes through the vertical portion 69L of the arm member 69.

[0105] The electric motor 75 is provided on the upper surface of the horizontal portion 69U of the arm member 69. A pulley 77 is connected to the output shaft of the electric motor 75. The belt 79 is wound around the two pulleys 73 and 77. If the electric motor 75 rotates the pulley 77 about the horizontal axis AX5, the pulley 73 and the chuck member 55 rotate about the horizontal axis AX4. The horizontal axis AX5 extends in the front-rear direction X. In addition, the housing 80 is configured such that when the substrate W is immersed in the immersion liquid in the posture conversion tank 47, the immersion liquid does not enter the housing 80.

[0106] The opening / closing section 65A includes a guide rail 81, an opening / closing drive section 83, and a moving piece 85. The guide rail 81 and the opening / closing drive section 83 are provided on the upper surface of the following lifting member 87. The guide rail 81 extends in the front-rear direction X, which is the direction in which the two chuck members 55 and 56 open and close. The horizontal portion 69U of the arm member 69 is connected to the lifting member 87 via the guide rail 81 and can move along the guide rail 81 in the front-rear direction X.

[0107] The opening / closing drive section 83 includes, for example, a cylinder, but may also include an electric motor. The opening / closing drive section 83 moves the moving piece 85 in the front-rear direction X. The moving piece 85 is fixed to the horizontal portion 69U. Thus, if the opening / closing drive section 83 pushes out the moving piece 85, the chuck member 55 is pushed out toward the substrate W via the arm member 69. And if the opening / closing drive section 83 pulls the moving piece 85, the chuck member 55 moves away from the substrate W via the arm member 69.

[0108] The lifting unit 67A includes a lifting member 87 and a lifting drive unit 89. The lifting drive unit 89 moves the lifting member 87 up and down in the vertical direction Z. The lifting drive unit 89 includes, for example, an electric motor, a threaded shaft, a guide rail, and a slider (all not shown). The lifting drive unit 89 may also include a cylinder instead of an electric motor or the like.

[0109] Refer to Figure 3A , Figure 3B . The second batch transfer robot WTR2 transfers multiple (e.g., 25) substrates W between the standby elevator LF9 and the reverse chuck 53 of the posture conversion unit 49. For example, the standby elevator LF9 holds 50 substrates W (W1, W2) in which 25 substrates W1 and 25 substrates W2 are alternately arranged. The second batch transfer robot WTR2 can selectively extract one of 25 substrates W1 and 25 substrates W2 from 50 substrates W, for example.

[0110] The second batch transfer robot WTR2 includes an extraction chuck 91 and a drive mechanism 93. The extraction chuck 91 can move in the width direction Y and can be opened and closed. The extraction chuck 91 includes a pair of chuck members 95, 96. The pair of chuck members 95, 96 includes multiple pairs (e.g., 25 pairs) of holding grooves 97, 98 and multiple pairs (e.g., 26 pairs) of passing grooves 101, 102. The 25 pairs of holding grooves 97, 98 and the 26 pairs of passing grooves 101, 102 are alternately arranged.

[0111] That is, 25 holding grooves 97 and 26 passing grooves 101 are alternately arranged in the first chuck member 95. And 25 holding grooves 98 and 26 passing grooves 102 are alternately arranged in the second chuck member 96. Each pair of holding grooves 97, 98 is opposed, and each pair of passing grooves 101, 102 is opposed.

[0112] The drive mechanism 93 moves the extraction chuck 91 in the width direction Y. And the drive mechanism 93 moves the two chuck members 95, 96 in the front-rear direction X to open and close the extraction chuck 91. In addition, Figure 3A shows the closed state of the extraction chuck 91, Figure 3B shows the open state of the extraction chuck 91. When the extraction chuck 91 is in the open state, the two chuck members 95, 96 open wider than the diameter of each substrate W. The drive mechanism 93 includes at least one of an electric motor and a cylinder, for example.

[0113] <4-2. Relay transfer robot>

[0114] Refer to Figure 1。In the relay area R3, a substrate transfer robot 105 and a substrate placement unit PS1 are provided. The substrate transfer robot 105 uses a relay hand 111 to transfer a plurality of substrates W that have been converted into a horizontal posture by the second posture conversion mechanism 43. The relay area R3 is isolated from the external atmosphere by a housing 109.

[0115] The substrate transfer robot 105 includes a relay hand 111, a reciprocating unit 113, a rotating unit 115, and a horizontal moving unit 117. In addition, the substrate transfer robot 105 corresponds to the first horizontal substrate transfer robot of the present invention. The relay hand 111 corresponds to the hand of the present invention.

[0116] The relay hand 111 holds a single substrate W in a horizontal posture and is movable. The reciprocating unit 113 moves the relay hand 111 forward and backward. The rotating unit 115 rotates the relay hand 111 and the reciprocating unit 113 about a vertical axis AX6 set in the rotating unit 115. The horizontal moving unit 117 moves the relay hand 111, the reciprocating unit 113, and the rotating unit 115 in the width direction Y. The reciprocating unit 113, the rotating unit 115, and the horizontal moving unit 117 are each driven by an electric motor. The substrate placement unit PS1 can place one or more substrates W.

[0117] <5. Single - sheet processing device>

[0118] Refer to Figure 1 。The single - sheet processing device 7 performs a preset single - sheet process on each of the plurality of substrates W received from the relay device 5, and transfers the plurality of substrates W after the single - sheet process to a carrier C placed on any one of the four carriers 125.

[0119] The single - sheet processing device 7 includes an indexing block 121 and a processing block 123. The indexing block 121 includes a plurality of (for example, four) carriers 125 and an indexing robot IR. The four carriers 125 are arranged in the width direction Y. The four carriers 125 are arranged in front of the indexing robot IR. A carrier C is placed on each carrier 125.

[0120] The indexing robot IR includes a hand 127, a multi - joint arm 129, and a lifting table 131. The hand 127 holds a single substrate W in a horizontal posture. The multi - joint arm 129 is constituted by, for example, a SCARA (selective compliance assembly robot arm) type robot arm. The base end portion of the multi - joint arm 129 is mounted on the lifting table 131. And, the front end portion of the multi - joint arm 129 is connected to the hand 127. The multi - joint arm 129 and the lifting table 131 each include an electric motor.

[0121] The indexing robot IR transports the substrate W between the four carriers C respectively placed on the four carrier racks 125 and the following substrate placement unit PS2. For example, the indexing robot IR receives the substrate W from the following substrate placement unit PS2 and transports the substrate W to the carrier C placed on any one of the four carrier racks 125.

[0122] In addition, the indexing robot corresponds to the second horizontal substrate transfer robot of the present invention. The hand 127 corresponds to the second hand of the present invention. The carrier rack 127 corresponds to the second carrier rack of the present invention.

[0123] The processing block 123 is adjacent to the rear of the indexing block 121. The processing block 123 includes a substrate transfer area R4 and, for example, four towers TW1 to TW4. The substrate transfer area R4 extends rearward from the indexing block 121. That is, the substrate transfer area R4 extends in the front-rear direction X. The four towers TW1 to TW4 are arranged along the substrate transfer area R4. The two towers TW1 and TW2 are arranged opposite to the two towers TW3 and TW4 via the substrate transfer area R4. The tower TW2 is provided behind the tower TW1. The tower TW4 is provided behind the tower TW3.

[0124] The tower TW1 includes three single-sheet processing chambers SW1 arranged in the vertical direction Z. The tower TW3 includes two single-sheet processing chambers SW1 arranged in the vertical direction Z. In the tower TW3, the substrate placement unit PS1 of the relay device 5 is arranged between the two single-sheet processing chambers SW1. The two towers TW2 and TW4 respectively include three single-sheet processing chambers SW2 arranged in the vertical direction Z. The 11 single-sheet processing chambers SW1 and SW2 respectively process one substrate W in a horizontal posture.

[0125] In addition, the number of the single-sheet processing chambers SW1 and SW2 is not limited to 11. And the number of the single-sheet processing chambers SW1 is not limited to five, as long as it is more than one. Further, the number of the single-sheet processing chambers SW2 is not limited to six, as long as it is more than one.

[0126] The single-sheet processing chamber SW1 includes, for example, a holding and rotating part 141 and a nozzle 143. The holding and rotating part 141 includes a rotating chuck that holds one substrate W in a horizontal posture and an electric motor that rotates the rotating chuck around a vertical axis passing through the center of the substrate W. The nozzle 143 supplies a processing liquid onto the substrate W held by the holding and rotating part 141. As the processing liquid, for example, pure water (such as DIW) and IPA (isopropyl alcohol) are used. The single-sheet processing chamber SW1, for example, forms a liquid film of IPA on the upper surface of the substrate W after cleaning the substrate W with pure water.

[0127] The single-sheet processing chamber SW2 performs drying processing using, for example, a supercritical fluid. As the fluid, for example, carbon dioxide is used. When the fluid is carbon dioxide, a supercritical state is obtained at a critical temperature of 31°C and a critical pressure of 7.38 MPa. By performing drying processing using a supercritical fluid, pattern collapse in the substrate W can be hardly generated.

[0128] The single-sheet processing chamber SW2 includes a chamber body (container) 145, a support tray 147, and a lid portion. The chamber body 145 includes a processing space provided inside, an opening for placing the substrate W into the processing space, a supply port, and an exhaust port. The substrate W is supported by the support tray 147 and stored in the processing space. The lid portion seals the opening of the chamber body 145. For example, each single-sheet processing chamber SW2 makes the fluid into a supercritical state and supplies the supercritical fluid from the supply port to the processing space inside the chamber body 145. Drying processing of one substrate W is performed using the supercritical fluid supplied to the processing space.

[0129] A central robot CR and a substrate placement unit PS2 are provided in the substrate transfer area R4. The substrate placement unit PS2 is arranged between the indexing robot IR and the central robot CR. One or more substrates W are placed on the substrate placement unit PS2.

[0130] The central robot CR includes, for example, two hands 151, a forward / backward movement unit 153, and a lifting / rotating unit 155. The two hands 151 hold one substrate W in a horizontal posture respectively. The forward / backward movement unit 153 makes the two hands 151 move forward and backward independently. The lifting / rotating unit 155 lifts the two hands 151 and the forward / backward movement unit 153. And, the lifting / rotating unit 155 rotates the two hands 151 and the forward / backward movement unit 153 around the vertical axis AX7 in order to change the direction of the two hands 151. The forward / backward movement unit 153 and the lifting / rotating unit 155 each include an electric motor.

[0131] The central robot CR transports one substrate W in a horizontal posture, for example, between the substrate placement units PS1, PS2 and the 11 single-sheet processing chambers SW1, SW2. For example, the central robot CR receives one substrate transported by the substrate transfer robot 105 of the relay device 5 and transports the received one substrate W to any one of the five single-sheet processing chambers SW1.

[0132] <6. Control Unit>

[0133] The substrate processing system 1 includes a control unit 180 (refer to Figure 1) and a storage unit (not shown). The control unit 180 controls each structure of the substrate processing system 1. That is, the control unit 180 controls each structure of the batch processing device 3, each structure of the relay device 5, and each structure of the single-sheet processing device 7. The control unit 180 includes, for example, one or more processors such as a central processing unit (CPU). The storage unit includes, for example, at least one of a ROM (Read-Only Memory), a RAM (Random-Access Memory), and a hard disk. The storage unit stores computer programs required to control each structure of the substrate processing system 1.

[0134] <7. Operation of the Substrate Processing System>

[0135] Next, with reference to Figure 6 the flowchart, the operation of the substrate processing system 1 will be described.

[0136] [Step S01] Take out the substrate from the carrier

[0137] With reference to Figure 1 . An external transfer robot (not shown) transfers two carriers C to two loading ports 9. The carrier transfer robot 13 of the storage device 2 transfers the first carrier C from the loading port 9 to the carrier rack 17. At this time, 25 substrates W1 before processing are accommodated in the first carrier C. In addition, the external transfer robot transfers the carrier C along the Figure 1 transfer path RT shown.

[0138] After that, the substrate handling mechanism HTR of the batch processing device 3 transfers 25 substrates W1 (first substrate group) in a horizontal posture received from the first carrier C placed on the carrier rack 17 to the posture conversion unit 31 of the first posture conversion mechanism 23. That is, the substrate handling mechanism HTR takes out 25 substrates W1 from the first carrier C placed on the carrier rack 17 and transfers the taken-out 25 substrates W1 to the posture conversion unit 31 in a horizontal posture.

[0139] After that, the carrier transfer robot 13 transfers the first carrier C (empty carrier) after taking out 25 substrates W1 from the carrier rack 17 to the loading port 9. After that, the carrier transfer robot 13 transfers the second carrier C from the loading port 9 to the carrier rack 17. At this time, 25 substrates W2 before processing are accommodated in the second carrier C. After that, the substrate handling mechanism HTR transfers 25 substrates W2 (second substrate group) in a horizontal posture received from the second carrier C placed on the carrier rack 17 to the posture conversion unit 31 of the first posture conversion mechanism 23.

[0140] After that, the carrier transfer robot 13 transfers the second carrier C (empty carrier) after taking out 25 substrates W2 from the placement rack 17 to the loading port 9. The external transfer robot sequentially transfers two carriers C (two empty carriers) from the loading port 9 to any two of the four placement racks 125 of the single-sheet processing device 7.

[0141] [Step S02] Vertical posture conversion

[0142] The first posture conversion mechanism 23 forms a set of 50 substrates W1 and W2 (processing substrate group) in which 25 substrates W1 and 25 substrates W2 are alternately arranged and all the device surfaces of the 25 substrates W1 are opposed to all the device surfaces of the 25 substrates W2 respectively. Further, the first posture conversion mechanism 23 converts the 50 substrates W1 and W2 from the horizontal posture to the vertical posture. Hereinafter, the 50 substrates W1 and W2 are appropriately referred to as "50 substrates W".

[0143] Specifically, as Figures 2A - 2C shown, the posture conversion unit 31 converts 25 substrates W1 from the horizontal posture to the vertical posture, and converts 25 substrates W2 from the horizontal posture to the vertical posture. And, the pusher 33A of the pushing mechanism 33 holds the 50 substrates W in which 25 substrates W1 and 25 substrates W2 are alternately arranged in the vertical posture. After that, the pushing mechanism 33 transfers the 50 substrates W to the substrate transfer position PP.

[0144] [Step S03] Batch processing

[0145] In this embodiment, the batch processing (liquid medicine processing) performed on 50 substrates W together is divided into two processes, the first half and the second half. Further, between the first batch processing and the second batch processing, a vertical inversion operation is performed on the 50 substrates W. Thereby, the processing deviation of each substrate W occurring in the upper half and the lower half of each substrate is suppressed. The vertical inversion operation is performed for 25 substrates W1 and 25 substrates W2.

[0146] Next, with reference to Figure 7 、 Figure 8 the specific operations of the batch processing in step S03 will be described. Figure 7 The steps S13 to S17 shown are the descriptions of the operations performed on 25 substrates W1 as the first substrate group. And, Figure 8 the steps S18 to S22 shown are the descriptions of the operations performed on 25 substrates W2 as the second substrate group. In addition, for example, Figure 9A the black triangle marks shown indicate the device surfaces (front surfaces or main surfaces) of the substrates W and their directions.

[0147] [Step S11] First batch processing

[0148] The batch transfer robot WTR1 receives 50 substrates W in a vertical posture from the pushing mechanism 33 at the substrate transfer position PP and transfers the 50 substrates W to one of the two elevators LF1 and LF3 of the two chemical solution treatment tanks BT1 and BT3.

[0149] For example, the batch transfer robot WTR1 transfers 50 substrates W (processing substrate group) in a vertical posture to the elevator LF1. The elevator LF1 receives 50 substrates W at a position above the chemical solution treatment tank BT1. The elevator LF1 immerses the 50 substrates W in a phosphoric acid solution as the chemical solution in the chemical solution treatment tank BT1. Thereby, the first batch process (etching process) is performed.

[0150] The first batch process is performed until a time that is half of the normal processing time (for example, 2 hours). After the first batch process, the elevator LF1 lifts 50 substrates W from the phosphoric acid solution in the chemical solution treatment tank BT1. In addition, in the case where the 50 substrates W are transferred to the elevator LF3 of the other chemical solution treatment tank BT3, the same process as that for the chemical solution treatment tank BT1 is also performed.

[0151] After that, the batch transfer robot WTR1, for example, receives 50 substrates W in a vertical posture from the elevator LF1 and transfers the 50 substrates W to the elevator LF2 of the cleaning treatment tank BT2. The elevator LF2 receives 50 substrates W at a position above the cleaning treatment tank BT2. The elevator LF2 immerses the 50 substrates W in pure water in the cleaning treatment tank BT2. Thereby, the cleaning process (batch process) is performed.

[0152] In addition, in the case where the batch transfer robot WTR1 receives 50 substrates W in a vertical posture from the elevator LF3, the batch transfer robot WTR1 transfers the 50 substrates W to the elevator LF4 of the cleaning treatment tank BT4. The elevator LF4 immerses the 50 substrates W in pure water in the cleaning treatment tank BT4.

[0153] [Step S12] Transfer the processing substrate group and immersion to the second posture conversion mechanism

[0154] After that, the batch transfer robot WTR1 receives 50 substrates W that have been subjected to the cleaning process in one of the two batch treatment tanks BT2 and BT4. That is, the batch transfer robot WTR1 receives 50 substrates W that have been subjected to the cleaning process from one of the two elevators LF2 and LF4. When transferring the 50 substrates W, for example, the elevator LF2 lifts 50 substrates W from the pure water in the cleaning treatment tank BT2. After that, the batch transfer robot WTR1 transfers the 50 substrates W (processing substrate group) after the first batch process (etching process, etc.) to the second posture conversion mechanism 43.

[0155] When the batch transfer robot WTR1 moves 50 substrates W above the standby slot 45 of the second posture conversion mechanism 43 and the standby elevator LF9, the standby elevator LF9 raises the support member 51 to hold 50 substrates W held by the batch transfer robot WTR1 from below. After that, when the chuck 37 of the batch transfer robot WTR1 is opened, 50 substrates W are handed over to the standby elevator LF9. After that, as Figure 9A shown, the standby elevator LF9 immerses 50 substrates W in pure water in the standby slot 45 to prevent the substrates W from drying.

[0156] [Step S13] Withdraw the first substrate group by the extraction chuck

[0157] Refer to Figure 9B . After that, the standby elevator LF9 raises 50 substrates W to lift 50 substrates W from the pure water in the standby slot 45. And the standby elevator LF9 raises 50 substrates W to a position higher than the extraction chuck 91 of the batch transfer robot WTR2. At this time, the extraction chuck 91 is in an open state. Therefore, 50 substrates W rise between the two chuck members 95 and 96 of the extraction chuck 91.

[0158] After that, the batch transfer robot WTR2 moves the extraction chuck 91 to a preset position in the arrangement direction (width direction Y) of 50 substrates W in order to withdraw 25 substrates W1 (the first substrate group or the odd-numbered substrate group). After that, the batch transfer robot WTR2 makes the two chuck members 95 and 96 approach each other to make the extraction chuck 91 in a closed state. And the reverse chuck 53 of the posture conversion unit 49 rises to the upper position H1.

[0159] Refer to Figure 9C . After that, the standby elevator LF9 lowers the support member 51. Thus, the extraction chuck 91 of the batch transfer robot WTR2 withdraws 25 substrates W1 from 50 substrates W (W1, W2). Specifically, 25 pairs of holding grooves 97 and 98 of the extraction chuck 91 hold 25 substrates W1. And the 26th pair of through grooves 101 and 102 of the extraction chuck 91 allows 25 substrates W2 to pass through. Therefore, 25 substrates W1 are held by the extraction chuck 91, and 25 substrates W2 remain on the standby elevator LF9. After that, the standby elevator LF9 immerses 25 substrates W2 in pure water in the standby slot 45 to prevent the substrates W2 from drying.

[0160] [Step S14] Transfer the first substrate group to the reverse chuck

[0161] After that, the batch transfer robot WTR2 advances 25 substrates W1 held by the extraction chuck 91 to a preset handover position below the reverse chuck 53 (or above the posture conversion slot 47).

[0162] Reference Figure 10A After that, 25 substrates W1 are respectively stored in 25 pairs of holding grooves 57 and 58, and the elevating parts 67A and 67B of the posture conversion part 49 ( Figure 4 ) lower the reversing chuck 53 to the transfer height position H2. After that, the opening and closing parts 65A and 65B of the posture conversion part 49 ( Figure 4 ) close the reversing chuck 53 by approaching the two chuck members 55 and 56 of the reversing chuck 53 to each other. Thus, the reversing chuck 53 holds 25 substrates W1.

[0163] Reference Figure 10B After that, the batch transfer robot WTR2 separates the two chuck members 95 and 96 from each other to open the extraction chuck 91. After that, the batch transfer robot WTR2 moves the extraction chuck 91 backward in the width direction Y until it reaches the position above the standby groove 45.

[0164] [Step S15] Upside-down reversal of the first substrate group by the reversing chuck

[0165] After that, the posture conversion part 49 rotates the 25 substrates W1 after the first batch process around the horizontal axis AX4. Thus, the 25 substrates W1 in the vertical posture are reversed upside down. Specifically, the two electric motors 75 of the rotating parts 63A and 63B shown in Figure 4 are rotated to rotate the two chuck members 55 and 56 of the reversing chuck 53 by 180 degrees (degrees) around the horizontal axis AX4. Thus, the 25 substrates W1 held by the reversing chuck 53 are rotated by 180 degrees. In addition, the upside-down reversal operation can also be performed in a state where the 25 substrates are immersed in pure water in the posture conversion tank 47. And, at least one of before and after performing the upside-down reversal operation, the posture conversion part 49 can also immerse the 25 substrates W1 held by the chuck 53 in pure water in the posture conversion tank 47 in order to prevent the substrates W1 from drying.

[0166] [Step S16] Transfer the first substrate group to the extraction chuck

[0167] Reference Figure 10C After performing the upside-down reversal operation on the 25 substrates W1 (the first substrate group), the batch transfer robot WTR2 advances the extraction chuck 91 to a preset transfer position below the reversing chuck 53. At this time, the extraction chuck 91 is in an open state. In addition, even if the extraction chuck 91 moves in the width direction Y, the open extraction chuck 91 does not interfere with the 25 substrates W1 held by the reversing chuck 53.

[0168] After that, the batch transfer robot WTR2 closes the extraction chuck 91 to hold 25 substrates W1 from below with the extraction chuck 91. After that, the posture conversion unit 49 moves the two chuck members 55, 56 of the reverse chuck 53 away from each other to open the reverse chuck 53. Thus, the 25 substrates W1 are held only by the extraction chuck 91.

[0169] [Step S17] Transfer the first substrate group to the standby elevator

[0170] Refer to Figure 11A . After that, the posture conversion unit 49 raises the reverse chuck 53 to the upper position H1 where it does not interfere with the 25 substrates W1. After that, the batch transfer robot WTR2 moves the 25 substrates W1 after the up-down inversion operation backward from the transfer position to a position above the standby elevator LF9. At this time, the batch transfer robot WTR2 deviates from the extraction position (original position) of the standby elevator LF9 by a pitch so that the device surfaces of the substrates W1 after the up-down inversion of the 50 substrates W1, W2 face a substrate W2 of the second substrate group. The pitch in this case is the interval between the 25 substrates W1 (for example, 10 mm).

[0171] For example, before the up-down inversion operation, the standby elevator LF9 holds 25 substrates W1 (the first substrate group) in the holding grooves MZ of No. 1, No. 3, No. 5, …, No. 45, No. 47, No. 49. After the up-down inversion operation, the batch transfer robot WTR2 adjusts the position of the 25 substrates W1 held by the extraction chuck 91 in the width direction Y so that the standby elevator LF9 holds the 25 substrates W1 in the holding grooves of No. 3, No. 5, No. 7, …, No. 47, No. 49, No. 51. In addition, the holding groove MZ of No. 1 and the holding groove MZ of No. 3 are provided on the base end side of the support member 51, and the holding groove MZ of No. 49 and the holding groove MZ of No. 51 are provided on the front end side of the support member 51.

[0172] Refer to Figure 11B . After the 25 substrates W1 are moved to a preset position above the standby elevator LF9, the standby elevator LF9 raises the support member 51 holding the 25 substrates W2 (the second substrate group). Thus, in addition to the 25 substrates W2, the standby elevator LF9 also holds 25 substrates W1 from below. The standby elevator LF9 raises the support member 51 to a position higher than the extraction chuck 91.

[0173] In addition, Figure 11B in order to facilitate the illustration, the standby elevator LF9 holds three substrates W1 and three substrates W2 and has holding grooves MZ numbered from 1 to 7. Figure 9BAmong them, the standby elevator LF9 holds three substrates W1 in the holding grooves MZ at positions 1, 3, and 5. After performing the up-and-down inversion operation, as Figure 11B shown, the standby elevator LF9 holds three substrates W1 in the holding grooves MZ at positions 3, 5, and 7. Figure 9B , Figure 11B Among them, the holding grooves MZ at positions 1, 3, 5, and 7 are denoted by symbols MZ1, MZ3, MZ5, and MZ7.

[0174] [Step S18] Withdrawal of the second substrate group by the extraction chuck

[0175] Next, the operation on the 25 substrates W2 as the second substrate group will be described. In addition, the descriptions that overlap with Steps S13 to S17 will be appropriately omitted.

[0176] Refer to Figure 11C . The standby elevator LF9 holds 50 substrates W including the 25 substrates W1 after the up-and-down inversion operation. The batch transfer robot WTR2 moves the extraction chuck 91 to a preset position in the arrangement direction (width direction Y) of the 50 substrates W in order to withdraw 25 substrates W2 (the second substrate group or the even-numbered substrate group). In addition, the extraction chuck 91 is in a closed state.

[0177] Refer to Figure 12A . After that, the standby elevator LF9 lowers the 50 substrates W. As a result, 25 substrates W2 are held by the extraction chuck 91, and 25 substrates W1 remain on the standby elevator LF9. After that, the standby elevator LF9 immerses the 25 substrates W1 in pure water in the standby tank 45.

[0178] [Step S19] Transfer the second substrate group to the inversion chuck

[0179] After that, the batch transfer robot WTR2 advances the 25 substrates W2 held by the extraction chuck 91 to the handover position below the inversion chuck 53. After that, the posture conversion unit 49 lowers the inversion chuck 53 to the handover height position H2. After that, the posture conversion unit 49 closes the inversion chuck 53. As a result, the inversion chuck 53 holds 25 substrates W2.

[0180] Refer to Figure 12B . After that, the batch transfer robot WTR2 opens the extraction chuck 91. After that, the batch transfer robot WTR2 retracts the extraction chuck 91 in the width direction Y until it reaches the position above the standby elevator LF9.

[0181] [Step S20] Up-and-down inversion of the second substrate group by the inversion chuck

[0182] After that, the posture conversion unit 49 rotates the 25 substrates W2 after the first batch process around the horizontal axis AX4. Thereby, the 25 substrates W2 in the vertical posture are turned upside down.

[0183] [Step S21] Transport the second substrate group to the extraction chuck

[0184] Refer to Figure 12C . After the upside-down operation of the 25 substrates W2 (second substrate group), the batch transfer robot WTR2 advances the extraction chuck 91 to the transfer position below the inversion chuck 53. At this time, the extraction chuck 91 is in the open state.

[0185] After that, the batch transfer robot WTR2 closes the extraction chuck 91 to hold the 25 substrates W1 from below by the extraction chuck 91. After that, the posture conversion unit 49 opens the inversion chuck 53. Thereby, the 25 substrates W1 are held only by the extraction chuck 91.

[0186] [Step S22] Transport the second substrate group to the standby elevator

[0187] Refer to Figure 13A . After that, the posture conversion unit 49 raises the inversion chuck 53 to the upper position H1. After that, the batch transfer robot WTR2 retreats the 25 substrates W2 after the upside-down operation from the transfer position to a position above the standby elevator LF9.

[0188] At this time, the batch transfer robot WTR2 adjusts the position of the 25 substrates W2 in the width direction Y (the arrangement direction of the substrates) so as to return to the holding grooves MZ held before the upside-down operation. For example, before the upside-down operation, the standby elevator LF9 holds the 25 substrates W2 (second substrate group) in the holding grooves MZ of No. 2, No. 4, No. 6, …, No. 46, No. 48, No. 50. After the upside-down operation, the batch transfer robot WTR2 adjusts the position of the 25 substrates W2 held by the extraction chuck 91 in the width direction Y so that the standby elevator LF9 holds the 25 substrates W2 in the holding grooves MZ of No. 2, No. 4, No. 6, …, No. 46, No. 48, No. 50.

[0189] Refer to Figure 13B . After adjusting the position of the 25 substrates W2 in the width direction Y, the standby elevator LF9 raises the support member 51 holding the 25 substrates W1 to further hold the 25 substrates W2. After that, the extraction chuck 91 becomes open. According to such an operation, as Figure 13CAs shown, the up-and-down inversion operation of 50 substrates W is performed. In addition, 25 substrates W1 after up-and-down inversion and 25 substrates W2 after up-and-down inversion are transported by the batch transfer robot WTR2 to the standby elevator LF9 in such a way that all device surfaces of the 25 substrates W1 and all device surfaces of the 25 substrates W2 are opposed to each other. After that, the standby elevator LF9 immerses 50 substrates W in pure water in the standby tank 45, for example, to prevent the drying of the substrates W.

[0190] [Step S23] Transfer the substrate group to the chemical solution treatment tank

[0191] The batch transfer robot WTR1 transfers 50 substrates W after vertical up-and-down inversion from the standby elevator LF9 to either of the two elevators LF1 and LF3. Specifically, the batch transfer robot WTR1 receives 50 substrates W after vertical up-and-down inversion from the standby elevator LF9. At this time, the standby elevator LF9 lifts 50 substrates W from the pure water in the standby tank 45. After that, the batch transfer robot WTR1 transfers 50 substrates W after up-and-down inversion to either of the two elevators LF1 and LF3. For example, the batch transfer robot WTR1 transfers 50 substrates W in a vertical posture to the elevator LF1. At this time, the elevator LF1 receives 50 substrates W at a position above the chemical solution treatment tank BT1.

[0192] [Step S24] Second batch processing

[0193] The elevator LF1 immerses 50 substrates W in a phosphoric acid solution as a chemical solution in the chemical solution treatment tank BT1. Thus, the second batch processing (etching processing) is performed. Similar to the first batch processing, the second batch processing is performed until half of the normal processing time (for example, 2 hours). After the second batch processing, the elevator LF1 lifts 50 substrates W from the phosphoric acid solution in the chemical solution treatment tank BT1.

[0194] After that, the batch transfer robot WTR1, for example, receives 50 substrates W in a vertical posture from the elevator LF1 and transfers 50 substrates W to the elevator LF2 of the cleaning treatment tank BT2. The elevator LF2 receives 50 substrates W at a position above the cleaning treatment tank BT2. The elevator LF2 immerses 50 substrates W in pure water in the cleaning treatment tank BT2. Thus, the cleaning treatment (batch processing) is performed.

[0195] Also, when the batch transfer robot WTR1 receives 50 substrates W in a vertical posture from the lift LF3, the batch transfer robot WTR1 transfers the 50 substrates W to the lift LF4 of the cleaning treatment tank BT4. In addition, when the 50 substrates W are transferred to the lift LF3, the chemical solution treatment tank BT3 performs the same treatment as the chemical solution treatment tank BT1. And when the 50 substrates W are transferred to the lift LF4, the cleaning treatment tank BT4 performs the same treatment as the cleaning treatment tank BT2.

[0196] [Step S04] Horizontal Posture Conversion

[0197] Return to Figure 6 Explanation of the flowchart. The batch transfer robot WTR1 receives 50 substrates W that have undergone the second batch process (etching process and cleaning process) from either the lift LF2 or LF4. At this time, for example, the lift LF2 lifts 50 substrates W from the pure water in the cleaning treatment tank BT2. The batch transfer robot WTR1 transfers the 50 substrates W that have undergone the second batch process to the second posture conversion mechanism 43. The standby lift LF9 receives 50 substrates W from the batch transfer robot WTR1 at the upper position above the standby tank 45 and immerses the 50 substrates W in the pure water in the standby tank 45.

[0198] After that, the batch transfer robot WTR2 extracts 25 substrates W1 (the first substrate group) from the 50 substrates W held by the standby lift LF9 and transfers the extracted 25 substrates W1 to the reversing chuck 53. As Figure 7 in steps S13 and S14. After transferring the 25 substrates W1 to the reversing chuck 53, the posture conversion unit 49 lowers the reversing chuck 53 holding the 25 substrates W1, so that the 25 substrates W1 are immersed in the pure water in the posture conversion tank 47.

[0199] Refer to Figure 14A . After that, the posture conversion unit 49 rotates the reversing chuck 53 around the horizontal axis AX4 to convert the 25 substrates W1 after the second batch process from the vertical posture to the horizontal posture. At this time, the posture conversion unit 49 rotates the reversing chuck 53 holding the 25 substrates W1 so that the device surfaces of the respective substrates W1 face upward. For example, Figure 14A in, the reversing chuck 53 rotates 90 degrees clockwise around the horizontal axis AX4.

[0200] Refer to Figure 14B. When transporting the substrate W1 to the single-sheet processing device 7, the posture conversion unit 49 raises the reverse chuck 53 to lift the substrate W1 at the highest position held in a horizontal posture by the reverse chuck 53 from the pure water in the posture conversion groove 47. After the substrate transfer robot 105 provided in the relay area R3 inserts the relay hand 111 into the reverse chuck 53, it takes out the substrate W in a horizontal posture lifted from the pure water while lifting. In addition, when taking out the substrate W from the reverse chuck 53, the reverse chuck 53 becomes an open state. And the substrate transfer robot 105 transports the taken-out substrate W1 to the substrate placement unit PS1( Figure 1 ). Similarly, the substrate transfer robot 105 transports each of the remaining substrates W1 one by one in a horizontal posture from the reverse chuck 53 to the substrate placement unit PS1.

[0201] After transporting all the substrates W1 (the first substrate group) out of the reverse chuck 53, the batch transfer robot WTR2 receives 25 substrates W2 remaining on the standby elevator LF9 and transports the 25 substrates W2 to the reverse chuck 53. This operation is performed as in Figure 8 steps S18 and S19. After transporting the 25 substrates W2 to the reverse chuck 53, the posture conversion unit 49 immerses the 25 substrates W2 in the pure water in the posture conversion groove 47.

[0202] Refer to Figure 15 . The posture conversion unit 49 converts the 25 substrates W2 after the second batch processing from a vertical posture to a horizontal posture with the device surface of each substrate W2 facing upward. For example, Figure 15 in, the reverse chuck 53 rotates 90 degrees counterclockwise around the horizontal axis AX4.

[0203] After that, the posture conversion unit 49 lifts the 25 substrates W2 in a horizontal posture one by one from the pure water in the posture conversion groove 47. Correspondingly, the substrate transfer robot 105 transports the lifted substrates W2 from the reverse chuck 53 to the substrate placement unit PS1.

[0204] [Step S05] First single-sheet processing

[0205] Refer to Figure 1 . The central robot CR uses the first hand 151 of the two hands 151 to receive one wet substrate W placed on the substrate placement unit PS1 and transports the one substrate W to any one of the five single-sheet processing chambers SW1 of the two towers TW1 and TW3. The holding and rotating unit 141 of each single-sheet processing chamber SW1 rotates the substrate W with the device surface facing upward while keeping it in a horizontal posture. And each single-sheet processing chamber SW1 supplies pure water from the nozzle 143 to the device surface (upper surface) of the rotating substrate W, and then supplies IPA from the nozzle 143 to the device surface. Thus, the pure water on the substrate W is replaced with IPA.

[0206] [Step S06] Second single-sheet processing

[0207] The central robot CR uses the first hand 151 to receive a substrate W that has been subjected to replacement processing using IPA and is wet from any one of the five single-sheet processing chambers SW1, and transports the substrate W to any one of the six single-sheet processing chambers SW2. Each single-sheet processing chamber SW2 dries a substrate W using supercritical carbon dioxide (supercritical fluid). According to the drying process using supercritical fluid, pattern collapse on the pattern surface (device surface) of the substrate W is suppressed.

[0208] [Step S07] Transport the substrate to the carrier

[0209] The central robot CR uses the second hand 151 to receive a substrate W that has been dried from any one of the six single-sheet processing chambers SW2, and transports the substrate W to the substrate placement unit PS2. A total of 50 substrates W1 and W2 that have been dried are sequentially transported to the substrate placement unit PS2.

[0210] The indexing robot IR uses the hand 127 to transport the substrate W1 of the first substrate group placed on the substrate placement unit PS2 to the first carrier C placed on the carrier rack 125. When 25 substrates W1 that have been dried are transported to the first carrier C, an external transfer robot (not shown) transfers the first carrier C from the carrier rack 125 to the next destination.

[0211] The indexing robot IR uses the hand 127 to transport the substrate W2 of the second substrate group placed on the substrate placement unit PS2 to the second carrier C placed on the carrier rack 125. When 25 substrates W2 that have been dried are transported to the second carrier C, the external transfer robot transfers the second carrier C from the carrier rack 125 to the next destination.

[0212] According to this embodiment, a first batch process and a second batch process are performed in which a plurality of substrates W are immersed in the liquid medicine in the liquid medicine treatment tank BT1. Here, the second posture conversion mechanism 43 rotates the plurality of substrates W that have undergone the first batch process around the horizontal axis AX4, thereby reversing the plurality of substrates W in the vertical posture up and down. That is, an operation of reversing the plurality of substrates W in the vertical posture up and down is performed between the first batch process and the second batch process. Therefore, it is possible to suppress processing deviations generated in the upper and lower parts of each substrate W.

[0213] Also, for example, in the case where the substrate W is not turned upside down by the second posture conversion mechanism 43, the following operation is considered. That is, the substrate W after the first batch process is dried, and then the substrate W is returned to the carrier C. The substrate W is turned upside down by other devices of the substrate processing system 1. After that, in the substrate processing system 1, the second batch process is performed on the substrate W that has been turned upside down. In this case, the substrate W is dried in order to be turned upside down by other devices. Therefore, there is a possibility that the pattern of the substrate W collapses due to drying. Also, due to transportation to other devices, etc., there is a possibility that particles adhere to the substrate W, and there is a possibility that an oxide film adheres. In the case where an oxide film adheres, there is a possibility that a process for removing the oxide film is required. However, according to the present embodiment, since the upside-down operation of the substrate W is performed within the substrate processing system 1, the above possibilities can be avoided.

[0214] Also, the operation of turning upside down a plurality of substrates W in the vertical posture is performed by rotating the inversion chuck 53 that holds the plurality of substrates W around the horizontal axis AX4.

[0215] In the inversion chuck 53, as Figure 5B shown, the first support portion SU1 and the second support portion SU1 of each pair of holding grooves 57, 58 can prevent one substrate W from moving in two directions in the substrate access direction DR1. Therefore, the operation of turning upside down a plurality of substrates W in the vertical posture can be easily performed.

[0216] In addition to the batch processing device 3, the substrate processing system 1 further includes a single-substrate processing device 7 and a relay device 5. The plurality of substrates W after the second batch process are sent to the single-substrate processing device 7 via the relay device 5. Here, in addition to the operation of turning upside down a plurality of substrates W in the vertical posture, the second posture conversion mechanism 43 also performs the operation of converting the plurality of substrates W from the vertical posture to the horizontal posture. In other words, in addition to the operation of converting to the horizontal posture, the second posture conversion mechanism 43 also performs the upside-down operation. Therefore, it is not necessary to separately provide a mechanism for converting to the horizontal posture and a mechanism for performing the upside-down operation, and thus the structure of the substrate processing system 1 can be made compact.

[0217] The substrate processing system 1 turns upside down a processing substrate group (50 substrates W1, W2) in which 25 substrates W1 and 25 substrates W2 are alternately arranged, and can suppress processing deviations generated in the upper half and the lower half of each substrate W in the processing substrate group.

[0218] The processing substrate group (50 substrates W) is formed such that 25 substrates W1 and 25 substrates W2 are alternately arranged, and all the device surfaces of the 25 substrates W1 and all the device surfaces of the 25 substrates W2 face each other. Refer to Figure 16。After the processing substrate group (50 substrates W) is turned upside down, in the direction in which the processing substrate group is arranged, there is a case where the two device surfaces of the two substrates W at both ends do not face the two device surfaces of the other two substrates W. In this case, when batch processing is performed, for example, the amount of liquid medicine flowing is different between the substrate W with non-facing device surfaces and the two substrates W with facing device surfaces.

[0219] For example, as Figure 16 shown by the symbol FW1, a certain space is formed between the two substrates W1 and W2 with facing device surfaces. In contrast, as shown by the symbol FW2, the substrate W2 with non-facing device surfaces does not form the certain space shown by the symbol FW1. Therefore, for example, the amount of liquid medicine flowing into the spaces shown by the symbols FW1 and FW2 is different. As a result, there is a possibility of processing deviation. Thus, after the processing substrate group is turned upside down, all the device surfaces of the 25 substrates W1 are also made to face all the device surfaces of the 25 substrates W2 respectively, thereby preventing such processing deviation.

[0220]

Example 2

[0221] Next, Example 2 of the present invention will be described with reference to the accompanying drawings. In addition, the description that is sufficient for Example 1 is omitted.

[0222] In Example 1, the posture conversion unit 49 rotates the inversion chuck 53 by 180 degrees around the horizontal axis AX4, for example, to turn 25 substrates W1 upside down at once. In this regard, in Example 2, the posture conversion unit 49 converts the 25 substrates W1 from the vertical posture to the horizontal posture, and then converts the 25 substrates W1 from the horizontal posture to the vertical posture. Thus, the 25 substrates W1 are turned upside down. Here, a rearrangement operation of the 25 substrates W1 in the inversion chuck 53 is performed between the two posture conversions.

[0223] To perform the rearrangement operation, the inversion chuck 53 has a plurality of pairs (for example, 27 pairs) of holding grooves 57 and 58 that are more than the plurality of (for example, 25) substrates W1 held by the inversion chuck 53.

[0224] Figure 17 is a flowchart showing the detailed upside-down operation of the 25 substrates W1 (the first substrate group) performed by the inversion chuck 53 in Example 2. Figure 18A is a longitudinal sectional view showing the state before the 25 substrates W1 are turned upside down. Figure 18B is a longitudinal sectional view showing the state where the 25 substrates W1 are converted from the vertical posture to the horizontal posture. Figure 18C is a longitudinal sectional view showing the state (the state after being turned upside down) where the 25 substrates W1 are converted from the horizontal posture to the vertical posture.

[0225] As Figure 7 、Figure 8 As shown, the up-and-down inversion operation is performed on 25 substrates W, and the up-and-down inversion operation is performed on 25 substrates W2. The up-and-down inversion operation performed on 25 substrates W1 is carried out in substantially the same manner as the up-and-down inversion operation performed on 25 substrates W2. Therefore, the up-and-down inversion operation performed on 25 substrates W1 will be described as a representative. As Figure 17 shown, Figure 7 The step S15 shown has three steps S15A, S15B, and S15C.

[0226] The batch transfer robot WTR2 transfers 25 substrates W1 extracted by the extraction chuck 91 to the posture conversion unit 49 in a vertical posture. The posture conversion unit 49 receives 25 W1s in a vertical posture from the batch transfer robot WTR2 using the inversion chuck 53. In addition, the inversion chuck 53 becomes a closed state, and the inversion chuck 53 holds 25 substrates W1.

[0227] [Step S15A] Horizontal Posture Conversion

[0228] After that, the posture conversion unit 49 lowers the inversion chuck 53 to immerse 25 substrates W1 in pure water in the posture conversion tank 47. After that, while holding 25 substrates W1 with the inversion chuck 53, the posture conversion unit 49 rotates the inversion chuck 53 around the horizontal axis AX4, so that 25 substrates W1 after the first batch process are converted from a vertical posture to a horizontal posture. At this time, 25 substrates W1 are converted to a horizontal posture with the device surface of each substrate W1 facing upward. For the rotation of the inversion chuck 53, as Figure 18A , Figure 18B shown, it is rotated 90 degrees counterclockwise, but it can also be rotated 270 degrees clockwise.

[0229] [Step S15B] Rearrangement of Substrates in the Inversion Chuck

[0230] Figures 19A - 19G is a front view for explaining the rearrangement operation of the substrates W in the inversion chuck 53. Figures 19A - 19G In, for the convenience of illustration, seven substrates W1 are accommodated in the inversion chuck 53. And, to distinguish the seven substrates W1, the seven substrates W1 are shown by the symbols W1-1, W1-2, W1-3, W1-4, W1-5, W1-6, and W1-7. And, Figures 19A - 19G In, the inversion chuck 53 has, for example, nine pairs of holding grooves 57, 58 that are more than the seven substrates W1. In the inversion chuck 53, to distinguish the nine pairs of holding grooves 57, 58, the positions of the nine pairs of holding grooves 57, 58 are shown by the symbols SL1 to SL9.

[0231] First, as Figure 5A , Figure 5BAs shown, in order to take in and out the substrate W1 with respect to the reverse chuck 53, the posture conversion unit 49 opens the reverse chuck 53. After that, the substrate transfer robot 105 in the relay area R3 performs a rearrangement operation of rearranging 25 substrates W1 converted into a horizontal posture in the reverse chuck 53, so as to exchange the positions of the outer substrate W1 and the inner substrate W1 in the direction (vertical direction Z) in which the 25 substrates W1 are arranged.

[0232] Specifically describe this operation. Figure 19A The state before the rearrangement operation of the substrate W1 is shown. As Figure 19A shown by the single dotted line LN, the rearrangement operation is performed in two areas. In the direction in which the 25 substrates W1 are arranged, a single dotted line LN is preset approximately in the center of the 25 substrates W1. Refer to Figure 19B . The substrate transfer robot 105 uses the relay hand 111 to move the 3rd substrate W1-3 from the position SL4 to the position SL1. And the substrate transfer robot 105 uses the relay hand 111 to move the 4th substrate W1-4 from the position SL5 to the position SL9.

[0233] In addition, the rearrangement operation is performed by combining the lifting and lowering operation of the reverse chuck 53 performed by the posture conversion unit 49 with the forward and backward movement of the relay hand 111 performed by the substrate transfer robot 105. In addition, when lifting and lowering the reverse chuck 53, the reverse chuck 53 can also be in a closed state. And the substrate transfer robot 105 can also be provided with a lifting unit (having an electric motor) capable of lifting and lowering the relay hand 111 and the advancing and retreating unit 113.

[0234] Refer to Figure 19C . After that, the substrate transfer robot 105 moves the 1st substrate W1-1 from the position SL2 to the position SL4. And the substrate transfer robot 105 moves the 7th substrate W1-7 from the position SL8 to the position SL5.

[0235] Refer to Figure 19D . After that, the substrate transfer robot 105 moves the 3rd substrate W1-3 from the position SL1 to the position SL2. Thus, the rearrangement of the three substrates W1 above the single dotted line LN is completed. In addition, in the case of the arrangement of the seven substrates W1 in Figure 19A , the 2nd substrate W1-2 at the position SL3 does not move. And Figure 19D in, the substrate transfer robot 105 moves the 5th substrate W1-5 from the position SL6 to the position SL8.

[0236] Refer to Figure 19E . After that, the substrate transfer robot 105 moves the 6th substrate W1-6 from the position SL7 to the position SL6. Refer to Figure 19FAfter that, the substrate W1-5 of No. 5 is moved from the position SL8 to the position SL7. Refer to Figure 19G After that, the substrate W1-4 of No. 4 is moved from the position SL9 to the position SL8. Thus, the rearrangement operation of the four substrates W1 below the single-dot chain line LN is completed, and the rearrangement operation of the seven substrates W1 is completed. Figure 19G The positions of the outer substrate W1 and the inner substrate W1 shown relative to Figure 19A the substrate W1 shown are exchanged.

[0237] In addition, the rearrangement of the four substrates W1-4, W1-5, W1-6, and W1-7 can also be performed after the rearrangement of the three substrates W1-1, W1-2, and W1-3. Also, the rearrangement of the three substrates W1-1, W1-2, and W1-3 can be performed after the rearrangement of the four substrates W1-4, W1-5, W1-6, and W1-7.

[0238] [Step S15C] Vertical posture conversion

[0239] After that, the posture conversion unit 49 closes the reverse chuck 53. After that, the posture conversion unit 49 further rotates the reverse chuck 53 around the horizontal axis AX4 while holding 25 substrates W1 with the reverse chuck 53. For example, Figure 18C in, the posture conversion unit 49 rotates the reverse chuck 53 counterclockwise by 90 degrees, but the reverse chuck 53 can also be rotated clockwise by 270 degrees. Thus, the posture conversion unit 49 converts the 25 substrates W1 in the horizontal posture after the rearrangement operation into the vertical posture by turning the 25 substrates W1 in the vertical posture after the first batch process upside down.

[0240] That is, as Figure 18C shown, the Figure 18A 25 substrates W1 shown are turned upside down. The same rearrangement operation as the 25 substrates W1 of the first substrate group is also performed on the 25 substrates W2 of the second substrate group.

[0241] After that, in the Figure 6 horizontal posture conversion process (step S04) shown, the arrangement of the 25 substrates W1 and the 25 substrates W2 remains unchanged in the state after the rearrangement operation. Therefore, for example, after the posture conversion unit 49 converts the 25 substrates W1 into the horizontal posture, it becomes Figure 19G the state shown. The substrate transfer robot 105 of the relay device 5 uses the relay hand 111 to transfer the substrates W1 one by one from the reverse chuck 53 to the substrate placement unit PS1 in the order of the substrates W1-1, W1-2, W1-3, W1-4, W1-5, W1-6, and W1-7. The same applies to the 25 substrates W2 after the rearrangement operation.

[0242] According to this embodiment, in addition to the operation of turning the 25 substrates W in the vertical posture upside down, a rearrangement operation is also performed. The rearrangement operation is an operation of rearranging the 25 substrates converted into the horizontal posture within the inversion chuck 53 in order to exchange the positions of the outer substrate W and the inner substrate W in the direction of the arrangement of the 25 substrates W. Therefore, it is possible to suppress the processing deviation generated in the outer substrate W and the inner substrate W in the direction of the arrangement of the 25 substrates W.

[0243]

Embodiment 3

[0244] Next, Embodiment 3 of the present invention will be described with reference to the accompanying drawings. In addition, the descriptions repeated with Embodiments 1 and 2 are omitted.

[0245] In Embodiments 1 and 2, the single-sheet processing device 7 dries the 50 substrates W after the second batch processing (chemical liquid processing and pure water cleaning processing). In Embodiment 3, the batch processing device 3 may also dry the 50 substrates W after the second batch processing.

[0246] As Figure 1 shown, the substrate processing system 1 of this embodiment may also include a storage device 2, a batch processing device 3, a relay device 5, and a single-sheet processing device 7. And, as Figure 20 shown, the substrate processing system 1 of this embodiment may not include the single-sheet processing device 7, but may include the storage device 2 and the batch processing device 3. In this case, the batch processing device 3 may also include a second posture conversion mechanism 43 and a substrate transfer robot 105 in the area R9 between the transfer block 19 and the processing block 21.

[0247] Figure 20 In, the standby tank 45, the posture conversion tank 47, and the substrate transfer robot 105 are arranged in sequence on the right. The substrate transfer robot 105 may not include Figure 1 the shown rotation part 115 and the horizontal movement part 117.

[0248] As Figure 1 and Figure 20 shown, the batch processing device 3 includes a batch drying unit 35 for drying a plurality of (for example, 50) substrates W together. The batch transfer robot WTR1 transfers the 50 substrates W between the first posture conversion mechanism 23, the four elevators LF1 to LF4, the second posture conversion mechanism 43, and the elevator LF7 of the batch drying unit 35 while holding the 50 substrates W in the vertical posture.

[0249] Describe the detailed structure of the batch dryer 35. The batch dryer 35 includes a treatment tank 35A, a chamber 35B that houses the treatment tank 35A, and a lift LF7. The treatment tank 35A stores pure water such as DIW ejected from an ejection pipe (not shown). The lift LF7 moves up and down. The lift LF7 is equipped with an electric motor or a cylinder to lift and lower multiple substrates W. The lift LF7 has a plurality of (for example, 50 or more than 51) holding grooves arranged in the width direction Y to hold multiple (for example, 50) substrates W in a vertical posture. A movable lid is provided at the upper part of the chamber 35B. A solvent nozzle and a water repellent agent nozzle are provided inside the chamber 35B. The inside of the chamber 35B is configured to be depressurized by a vacuum pump.

[0250] Here, describe the operation of the batch dryer 35. After multiple substrates W that have undergone pure water cleaning treatment in one of the cleaning treatment tanks BT2 and BT4 are transported by the batch transfer robot WTR1 above the lift LF7 of the batch dryer 35. The lift LF7 rises, receives multiple substrates W from the batch transfer robot, and descends to immerse the multiple substrates W in the pure water inside the treatment tank 35A. After that, the movable lid is closed, and the inside of the chamber 35B is depressurized by a vacuum pump. After that, as a solvent, for example, vapor of isopropyl alcohol (IPA) is ejected from the solvent nozzle. Thus, the inside of the chamber 35B becomes an atmosphere of IPA vapor.

[0251] After that, inside the chamber 35B, the lift LF7 lifts multiple substrates W from the pure water inside the treatment tank 35A. Thus, the pure water attached to each substrate W is replaced with IPA. After that, vapor of the water repellent agent is ejected from the water repellent agent nozzle. Thus, the IPA attached to each substrate W is replaced with the water repellent agent. The water repellent agent modifies the surface of the substrate W to be water repellent. After that, IPA vapor is ejected again from the solvent nozzle. Thus, the water repellent agent attached to each substrate is replaced with IPA. After that, the ejection of IPA vapor from the solvent nozzle is stopped. Thus, inside the depressurized chamber 35B, the IPA attached to each substrate W volatilizes, and drying of each substrate W is performed. After the drying process, the chamber 35B returns to atmospheric pressure.

[0252] Next, refer to Figure 21 the flowchart of Figure 21 to describe the operation of the substrate processing system 1 of this embodiment. Since Figure 6 the descriptions of steps S01 to S03 shown in

[0253] [Step S31] Drying process (batch process)

[0254] The batch transfer robot WTR1 receives 50 substrates W after the second batch process (liquid medicine process and cleaning process) from either of the elevators LF2 and LF4. Then, the batch transfer robot WTR1 transfers the 50 substrates W after the second batch process to the batch drying unit 35. The batch drying unit 35 dries the 50 substrates W together.

[0255] [Step S32] Horizontal posture conversion

[0256] After the drying process by the batch drying unit 35, the upper part of the chamber 35B is opened by the movable cover. Then, the elevator FL7 raises the 50 substrates W after the drying process above the chamber 35B. The batch transfer robot WTR1 receives the 50 substrates W from the elevator FL7 and transfers the 50 substrates W to the substrate transfer position PP. The pushing mechanism 33 of the first posture conversion mechanism 23 receives the 50 substrates W after the drying process from the batch transfer robot WTR1 using the pusher 33A.

[0257] The posture conversion unit 31 of the first posture conversion mechanism 23, for example, extracts 25 substrates W1 of the first substrate group from the 50 substrates W held by the pusher 33A. As Figure 13C shown, the 25 substrates W1 face left. Therefore, the posture conversion unit 31 does not rotate the 25 substrates W1 180 degrees around the vertical axis AX3 but converts the 25 substrates W1 from the vertical posture to the horizontal posture. Thus, the device surfaces of the 25 substrates W1 converted to the horizontal posture face upward. The substrate operation mechanism HTR receives the 25 substrates W1 from the posture conversion unit 31.

[0258] Then, the posture conversion unit 31 receives the 25 substrates W2 of the second substrate group held by the pusher 33A from the pusher 33A. As Figure 13C shown, the 25 substrates W2 face right. Therefore, the posture conversion unit 31 rotates the 25 substrates W2 180 degrees around the vertical axis AX3 so that the device surfaces of the 25 substrates W2 face left. Then, the posture conversion unit 31 converts the 25 substrates W2 from the vertical posture to the horizontal posture.

[0259] [Step S33] Transfer the substrate to the carrier

[0260] The carrier transfer robot 13 transfers the first carrier C (empty carrier) from the storage rack 11 to the placement rack 17. The substrate operation mechanism HTR transfers the received 25 substrates W1 to the first carrier on the placement rack 17. Then, the carrier transfer robot 13 transfers the first carrier C containing the 25 substrates W1 after the drying process to the loading port 9.

[0261] After the carrier handling robot 13 transports the first carrier C that accommodates 25 substrates W1 after the drying process from the placement rack 17, the carrier handling robot 13 transports the second carrier C (empty carrier) from the storage rack 11 to the placement rack 17. The substrate handling mechanism HTR transports 25 substrates W2 that have been converted to a horizontal posture from the posture conversion unit 31 to the second carrier C on the placement rack 17. After that, the carrier handling robot 13 transports the second carrier C that accommodates 25 substrates W2 after the drying process to the loading port 9.

[0262] After that, the external handling mechanism sequentially transports the two carriers C from the loading port 9 to the next destination.

[0263] According to this embodiment, the substrate processing system 1 does not send, for example, 50 substrates W after the second batch process to the single-substrate processing device 7, but uses the batch drying unit 35 to dry 50 substrates after the second batch process together.

[0264] In addition, the drying process of the batch drying unit 35 is performed by supplying IPA vapor and waterproofing agent vapor into the chamber 35, but it can also be performed by supplying supercritical fluid into the chamber.

[0265] The present invention is not limited to the above-described embodiments and can be modified and implemented as follows.

[0266] (1) In the above-described Embodiments 1 and 2, the batch drying unit 35 is provided. In the case of not using the batch drying unit 35, the batch drying unit 35 may not be provided.

[0267] (2) In the above-described embodiments and modification (1), the central robot CR transports the substrate W to the indexing robot IR via the substrate placement unit PS2. In this regard, the central robot CR may also directly transport the substrate W to the indexing robot IR without passing through the substrate placement unit PS2. In addition, the central robot CR may also directly receive the substrate W from the substrate handling robot 105 without passing through the substrate placement unit PS1.

[0268] (3) In the above-described embodiments and each modification, the single-substrate processing device 7 includes the indexing robot IR and the central robot CR as the second horizontal substrate handling robots. The indexing robot IR and the central robot CR share the work of transporting a single substrate W between the substrate placement unit PS1 of the relay device 5, the 11 single-substrate processing chambers SW1 and SW2, and the carriers C placed on the respective placement racks 125. In this regard, it may also be that one second horizontal substrate handling robot transports a single substrate W between the substrate placement unit PS1 of the relay device 5, the 11 single-substrate processing chambers SW1 and SW2, and the carriers C placed on the respective placement racks 125.

[0269] Further, it is also possible that a plurality of (not limited to two) second horizontal substrate transfer robots share the transfer of a single substrate W between the substrate placement section PS1 of the relay device 5, the 11 single-sheet processing chambers SW1 and SW2, and the carriers C placed on the respective placement racks 125.

[0270] (4) In each of the above-described embodiments and each modification, the four batch processing tanks BT1 to BT4 are composed of two chemical liquid processing tanks BT1 and BT3 and two cleaning processing tanks BT2 and BT4. In this regard, each of the four batch processing tanks BT1 to BT4 may also be a processing tank that sequentially performs chemical liquid processing and cleaning processing.

[0271] (5) In each of the above-described embodiments and each modification, as Figure 1 shown, four elevators LF1 to LF4 are respectively provided in the four batch processing tanks BT1 to BT4. In this regard, for example, it is also possible that the elevator LF1 is used for two batch processing tanks BT1 and BT2, and the elevator LF3 is used for two batch processing tanks BT3 and BT4. In this case, the two elevators LF2 and LF4 are not provided. The elevator LF1 may also include, for example, a forward and backward movement section including an electric motor so as to be able to move in the forward and backward direction X between the two batch processing tanks BT1 and BT2. The elevator LF3 is also configured in the same manner as the elevator LF1 so as to be able to move in the forward and backward direction X between the two batch processing tanks BT3 and BT4.

[0272] (6) In each of the above-described embodiments and each modification, the single-sheet processing chamber SW2 uses a supercritical fluid to perform a drying process on the substrate W. In this regard, the single-sheet processing chamber SW2 may also be provided with a rotary processing section 141 and a nozzle 143 in the same manner as the single-sheet processing chamber SW1. In this case, each of the 11 single-sheet processing chambers SW1 and SW2, for example, performs a drying process (rotary drying) on the substrate W after sequentially supplying pure water and IPA to the substrate W.

[0273] (7) In each of the above-described embodiments and each modification, the chemical liquid processing tanks BT1 and BT3 perform chemical liquid processing on 50 substrates W taken out from the two carriers C at once. In this regard, the chemical liquid processing tanks BT1 and BT3 may also perform chemical liquid processing on a plurality of (for example, 25) substrates W taken out from one carrier C and arranged at full pitch (for example, at an interval of 10 mm) at once.

[0274] (8)In each of the above-described embodiments and variations, the liquid chemical treatment tanks BT1 and BT3 perform liquid chemical treatment on a total of 50 substrates (treatment substrate group) alternately arranged with 25 substrates W1 and 25 substrates W2. Here, the device surface of the 25 substrates W1 faces a direction opposite to the direction of the device surface of the 25 substrates W2. In this regard, the device surface of the 25 substrates W1 may also face the same direction as the direction of the device surface of the 25 substrates W2.

[0275] (9)In each of the above-described embodiments and variations, the posture conversion unit 49 performs an up-down inversion operation and a horizontal posture conversion operation on every 25 substrates out of the 50 substrates W. In this regard, the posture conversion unit 49 may also perform an up-down inversion operation and a horizontal posture conversion operation on the 50 substrates W all at once.

[0276] The present invention can be implemented in other specific forms without departing from its spirit or essence. Therefore, the scope of the invention should be indicated by referring to the appended claims rather than the above description.

Claims

1. A substrate processing system for processing a substrate, characterized in that: A batch processing device for processing multiple substrates at once. The batch processing device comprises: A first carrier loading rack, which loads the carriers for accommodating the plurality of substrates in a horizontal position; a first posture conversion mechanism for converting the plurality of substrates between a horizontal posture and a vertical posture; a substrate handling mechanism for conveying the plurality of substrates between the carrier mounted on the carrier mounting frame and the first posture conversion mechanism; a treatment tank storing the chemical solution; an elevator capable of holding the plurality of substrates in a vertical position while immersing the plurality of substrates in the chemical solution in the treatment tank; a second posture conversion mechanism for rotating the plurality of substrates around a horizontal axis orthogonal to a central axis passing through the center of each substrate; a first batch transport robot that holds the plurality of substrates in a vertical posture and transports the plurality of substrates between the first posture conversion mechanism, the elevator, and the second posture conversion mechanism; and a control unit, The control unit is composed of: controlling the substrate handling mechanism to transfer the plurality of substrates in a horizontal posture received from the carrier mounted on the first carrier mounting rack to the first posture conversion mechanism, controlling the first posture conversion mechanism to convert the plurality of substrates from a horizontal posture to a vertical posture, controlling the first batch transfer robot to transfer the plurality of substrates in a vertical posture to the lift; The lifting machine is controlled to perform a first batch process by immersing the plurality of substrates in a vertical posture in the chemical solution in the processing tank. controlling the first batch transfer robot to transfer the plurality of substrates after the first batch processing to the second posture conversion mechanism; The second posture conversion mechanism is controlled to rotate the plurality of substrates after the first batch processing about the horizontal axis, thereby turning the plurality of substrates in the vertical posture upside down. controlling the first batch transfer robot to transfer the plurality of substrates which are reversed in the vertical position to the lift; The lift is controlled to perform a second batch process in which the plurality of substrates whose vertical postures are reversed upside down are immersed in the chemical solution in the process tank.

2. The substrate processing system according to claim 1, characterized in that: The second posture conversion mechanism includes a reversal chuck that holds the plurality of substrates, and is configured to rotate the reversal chuck around the horizontal axis.

3. The substrate processing system according to claim 2, characterized in that: The above-mentioned reverse chuck has two chuck components with multiple pairs of holding grooves. The two chuck components can be opened and closed along the horizontal axis. The above-mentioned multiple pairs of retaining grooves respectively have a first supporting part for preventing a stored substrate from moving in a predetermined direction in the substrate entry and exit direction and a second supporting part for preventing the above-mentioned stored substrate from moving in the opposite direction of the above-mentioned predetermined direction. The above-mentioned substrate entry and exit direction is orthogonal to the direction of opening and closing of the above-mentioned two chuck components and is along the device surface of the above-mentioned stored substrate.

4. The substrate processing system according to claim 2, characterized in that: The invention also comprises a first horizontal substrate transport robot having a first hand portion holding a substrate in a horizontal posture and transporting the substrate. The control unit is composed of: The second posture conversion mechanism is controlled to rotate the inversion chuck around the horizontal axis while holding the plurality of substrates by the inversion chuck, so that the plurality of substrates after the first batch processing are converted from a vertical posture to a horizontal posture. The horizontal substrate transport robot is controlled to perform a rearrangement operation of rearranging the plurality of substrates converted into a horizontal posture in the inverted chuck so as to exchange positions of outer substrates and inner substrates in the direction in which the plurality of substrates are arranged, The second posture conversion mechanism is controlled to hold the plurality of substrates by the inversion chuck while further rotating the inversion chuck around the horizontal axis, thereby causing the plurality of substrates that have been in the vertical posture during the first batch processing to be reversed upside down so that the plurality of substrates that have undergone the rearrangement operation are converted from the horizontal posture to the vertical posture.

5. The substrate processing system according to claim 1, characterized in that: In addition to the batch processing device, it also includes a single-sheet processing device for processing the plurality of substrates one by one and a relay device for transporting the plurality of substrates from the batch processing device to the single-sheet processing device. The relay device includes a first horizontal substrate transport robot having a first hand that holds a substrate in a horizontal posture and transports the substrate. The single sheet processing device has: A single-sheet processing chamber for performing single-sheet processing on the above-mentioned substrate in a horizontal position; A second carrier loading rack for loading the carrier; and a second horizontal substrate transport robot having a second hand holding the substrate in a horizontal position, and transporting the substrate between the relay device, the single-sheet processing chamber, and the carrier mounted on the second carrier mounting rack; The control unit is composed of: controlling the first batch transfer robot to transfer the plurality of substrates after the second batch processing to the second posture conversion mechanism; controlling the second posture conversion mechanism to convert the plurality of substrates after the second batch processing from a vertical posture to a horizontal posture, controlling the first horizontal substrate transport robot so that the substrate converted into a horizontal posture is transported from the second posture conversion mechanism to the single-sheet processing device, controlling the second horizontal substrate transport robot to transport the substrate transported by the first horizontal substrate transport robot to the single substrate processing chamber, controlling the single-sheet processing chamber to perform the single-sheet processing on the substrate; The second horizontal substrate transport robot is controlled to transport the single substrate after the single-substrate processing from the single-substrate processing chamber to the carrier mounted on the second carrier mounting rack.

6. The substrate processing system according to claim 1, characterized in that: The control unit is composed of: controlling the substrate handling mechanism so that the plurality of substrates in a horizontal posture received from the first carrier mounted on the first carrier mounting rack are conveyed to the first posture conversion mechanism, and so that the plurality of second substrates in a horizontal posture received from the second carrier mounted on the first carrier mounting rack are conveyed to the first posture conversion mechanism, controlling the first posture conversion mechanism to form a processing substrate group in which the plurality of substrates and the plurality of second substrates are alternately arranged, and converting the processing substrate group from a horizontal posture to a vertical posture, controlling the first batch transfer robot to transfer the processed substrate group in a vertical posture to the elevator, controlling the lift to perform the first batch treatment by immersing the treated substrate group in the chemical solution in the treatment tank, controlling the first batch transfer robot to transfer the processed substrate group after the first batch processing to the second posture conversion mechanism, The second posture conversion mechanism is controlled to rotate the plurality of substrates in the processing substrate group after the first batch processing around the horizontal axis, and the plurality of second substrates in the processing substrate group after the first batch processing around the horizontal axis, thereby turning the plurality of substrates in the vertical posture and the plurality of second substrates upside down, controlling the first batch transport robot to transport the processed substrate group after the vertical posture is reversed to the elevator, The lift is controlled to perform a second batch process in which the processed substrate group, which has been reversed in the vertical posture, is immersed in the chemical solution in the processing tank.

7. The substrate processing system according to claim 6, characterized in that: The second posture conversion mechanism further comprises: a standby elevator that holds the processed substrate group in a vertical position; and a second batch transport robot that transports the processed substrate group between the standby elevator and the reversing chuck; The control unit is composed of: controlling the first posture conversion mechanism to form a processing substrate group in which the plurality of substrates and the plurality of second substrates are alternately arranged and all device surfaces of the plurality of substrates are respectively opposite to all device surfaces of the plurality of second substrates, and converting the processing substrate group from a horizontal posture to a vertical posture, The second batch transfer robot is controlled to transfer the upside-down multiple substrates and the upside-down multiple second substrates to the standby elevator in a manner that all device surfaces of the multiple substrates are opposed to all device surfaces of the multiple second substrates.

8. The substrate processing system according to claim 1, characterized in that: The batch processing device further comprises a batch drying section for drying the plurality of substrates at once. The first batch transfer robot holds the plurality of substrates in a vertical posture while transferring the plurality of substrates between the first posture conversion mechanism, the elevator, the second posture conversion mechanism, and the batch drying section. The control unit is composed of: controlling the first batch transport robot to transport the plurality of substrates after the second batch processing to the batch drying section, The batch drying section is controlled to dry the plurality of substrates after the second batch processing at one time.

9. A substrate processing method, which is a substrate processing method of a substrate processing system, wherein the substrate processing system includes a batch processing device for processing a plurality of substrates at a time. The batch processing device comprises: A carrier loading frame, which carries a carrier for accommodating a plurality of substrates in a horizontal position; a first posture conversion mechanism for converting the plurality of substrates between a horizontal posture and a vertical posture; a substrate handling mechanism for conveying the plurality of substrates between the carrier mounted on the carrier mounting frame and the first posture conversion mechanism; a treatment tank storing the chemical solution; an elevator capable of immersing the plurality of substrates in the chemical solution in the processing tank while holding the plurality of substrates in a vertical posture; and The first batch transport robot transports the plurality of substrates while holding the plurality of substrates in a vertical position. The above substrate processing method is characterized in that it includes the following steps: a first substrate conveying step in which the substrate handling mechanism conveys the plurality of substrates in a horizontal posture received from the carrier mounted on the first carrier mounting rack to the first posture conversion mechanism; a vertical posture conversion step, in which the first posture conversion mechanism converts the plurality of substrates from a horizontal posture to a vertical posture; a second substrate transporting step, in which the first batch transport robot transports the plurality of substrates converted into a vertical posture to the lift; a first batch treatment step in which the plurality of substrates in a vertical position are immersed in the chemical solution in the treatment tank by the lifter for first batch treatment; a third substrate transporting step, in which the first batch transport robot transports the plurality of substrates after the first batch processing to a second posture conversion mechanism; a vertical inversion step in which the plurality of substrates after the first batch processing are rotated by the second posture conversion mechanism about a horizontal axis orthogonal to a central axis passing through the center of each substrate, thereby vertically inverting the plurality of substrates in a vertical posture; a fourth substrate transporting step, in which the first batch transport robot transports the plurality of substrates which are reversed in a vertical position to the lift; as well as The second batch treatment step is a step in which the plurality of substrates are subjected to a second batch treatment by the lifter after being reversed in the vertical posture and immersed in the chemical solution in the treatment tank.

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