Exposure compensation method and device, storage medium, electronic equipment and exposure machine

Abstract

The invention provides an exposure compensation method and device, a storage medium, electronic equipment and an exposure machine, and relates to the field of photoetching equipment. The electronic equipment obtains a shape curve of the first guide rail; according to the moving position of the bearing platform on the shape curve and the perpendicularity between the first guide rail and the second guide rail, the pose compensation amount of the photoetching pattern is obtained, and the pose compensation amount is used for adjusting the pose of the photoetching pattern so that the photoetching pattern can be aligned to the target object. Therefore, transverse deviation caused by shape deviation of the first guide rail and angle deviation caused by perpendicularity of the first guide rail and the second guide rail can be effectively compensated, so that a photoetching pattern can still be aligned with an exposed target object even if the exposure machine has deviation, and the exposure precision is improved.

Description

Technical Field

[0001] The present application relates to the field of lithography equipment, and in particular, to an exposure compensation method, device, storage medium, electronic device, and exposure machine. Background Art

[0002] In the field of semiconductor production, exposure equipment is a core tool for lithographically transferring circuit patterns onto circuit boards. However, due to factors such as errors in the equipment itself and changes in the external environment, the exposed pattern may exhibit position deviations (i.e., pattern misalignment). For example, exposure machines based on Laser Direct Imaging (LDI) technology (hereinafter referred to as LDI exposure machines) are widely used in the field of electronic circuit manufacturing. Such devices utilize Digital Micromirror Devices (DMDs) to precisely control the projection direction of laser beams and transfer design images onto circuit boards with high precision, thereby achieving the lithography process.

[0003] Although LDI exposure machines are renowned for their high efficiency and precision, in practical applications, errors in the linearity and straightness of axes, instability of the mechanical structure, and changes in the external environment (such as temperature, vibration, etc.) can all lead to position deviations or shape distortions of the final exposed pattern. These errors not only affect the accuracy of circuit patterns but may also further cause problems in subsequent processes. Summary of the Invention

[0004] To overcome at least one deficiency in the prior art, the present application provides an exposure compensation method, device, storage medium, electronic device, and exposure machine, specifically including:

[0005] In a first aspect, the present application provides an exposure compensation method applied to an exposure machine. The exposure machine includes a first guide rail, a carrier platform that moves along the first guide rail, and a second guide rail orthogonal to the first guide rail. An exposure engine is installed on the second guide rail. The carrier platform is used to carry a target object, and the exposure engine is used to project a lithography pattern onto the target object. The method includes:

[0006] Obtain the shape curve of the first guide rail;

[0007] Based on the moving position of the carrier platform on the shape curve and the perpendicularity between the first guide rail and the second guide rail, obtain the pose compensation amount of the lithography pattern;

[0008] Adjust the pose of the lithography pattern according to the pose compensation amount to align the lithography pattern with the target object.

[0009] In a second aspect, the present application further provides an exposure compensation device, which is applied to an exposure machine. The exposure machine includes a first guide rail, a carrying platform that moves along the first guide rail, and a second guide rail orthogonal to the first guide rail. An exposure engine is installed on the second guide rail. The carrying platform is used to carry a target object, and the exposure engine is used to project a lithography pattern onto the target object. The device includes:

[0010] A guide rail module for obtaining the shape curve of the first guide rail;

[0011] A compensation module for obtaining a pose compensation amount of the lithography pattern according to the moving position of the carrying platform on the shape curve and the perpendicularity between the first guide rail and the second guide rail;

[0012] Adjust the pose of the lithography pattern according to the pose compensation amount so that the lithography pattern is aligned with the target object.

[0013] In a third aspect, the present application further provides a storage medium storing a computer program, which, when executed by a processor, implements the exposure compensation method described above.

[0014] In a fourth aspect, the present application further provides an electronic device, which includes a processor and a memory. The memory stores a computer program, which, when executed by the processor, implements the exposure compensation method described above.

[0015] In a fifth aspect, the present application further provides an exposure machine, which includes the electronic device described above.

[0016] Compared with the prior art, the present application has the following beneficial effects:

[0017] The present application provides an exposure compensation method, device, storage medium, electronic device and exposure machine. The electronic device obtains the shape curve of the first guide rail; according to the moving position of the carrying platform on the shape curve and the perpendicularity between the first guide rail and the second guide rail, obtains the pose compensation amount of the lithography pattern, and is used to adjust the pose of the lithography pattern so that the lithography pattern is aligned with the target object. In this way, it is possible to effectively compensate for the lateral offset caused by the shape deviation of the first guide rail and the angular offset caused by the perpendicularity between the first guide rail and the second guide rail, thereby ensuring that even if there are deviations in the exposure machine, the lithography pattern can still be aligned with the target object to be exposed, improving the exposure accuracy. Description of the Drawings

[0018] To more clearly illustrate the technical solutions of the embodiments of the present application, the following will briefly introduce the accompanying drawings required for the embodiments. It should be understood that the following drawings only show some embodiments of the present application and should not be regarded as limiting the scope. For those of ordinary skill in the art, without creative efforts, other related drawings can also be obtained based on these drawings.

[0019] Figure 1 The simplified top view of the LDI exposure machine provided by the embodiment of the present application;

[0020] Figure 2 The schematic flowchart of the exposure compensation method provided by the embodiment of the present application;

[0021] Figure 3 The schematic diagram of the relationship between coordinate systems provided by the embodiment of the present application;

[0022] Figure 4 The schematic diagram of the strip contrast before and after compensation provided by the embodiment of the present application;

[0023] Figure 5 The schematic structural diagram of the exposure compensation device provided by the embodiment of the present application;

[0024] Figure 6 The schematic structural diagram of the electronic device provided by the embodiment of the present application. Detailed implementation manners

[0025] To make the objectives, technical solutions, and advantages of the embodiments of the present application (hereinafter simply referred to as "the present embodiments") clearer, the following will clearly and completely describe the technical solutions in the embodiments of the present application with reference to the accompanying drawings in the embodiments of the present application. Obviously, the described embodiments are some, but not all, of the embodiments of the present application. Usually, the components of the embodiments of the present application described and shown in the accompanying drawings here can be arranged and designed in various different configurations.

[0026] Therefore, the following detailed description of the embodiments of the present application provided in the accompanying drawings is not intended to limit the scope of the present application claimed, but merely represents the selected embodiments of the present application. Based on the embodiments of the present application, all other embodiments obtained by those of ordinary skill in the art without creative efforts belong to the scope of protection of the present application.

[0027] It should be noted that: similar reference numerals and letters indicate similar items in the following drawings. Therefore, once an item is defined in one drawing, it does not need to be further defined and explained in subsequent drawings.

[0028] In the description of the present application, it should be noted that the terms "first", "second", "third", etc. are only used for distinguishing descriptions and cannot be understood as indicating or implying relative importance. In addition, the term "comprising", "including" or any other variant thereof is intended to cover non-exclusive inclusion, so that a process, method, article or device comprising a series of elements not only includes those elements, but also includes other elements not expressly listed, or also includes elements inherent to such process, method, article or device. Without further limitation, an element defined by the statement "comprising one..." does not exclude the existence of additional identical elements in the process, method, article or device comprising the said element.

[0029] Based on the above statement, as introduced in the background art, due to factors such as the error of the device itself and the change of the external environment, the exposure pattern may have a position deviation (i.e., pattern misalignment).

[0030] Exemplarily, the following will be combined with Figure 1 to give a more intuitive illustration of this. Figure 1 shows a simplified top view of an LDI exposure machine, including a carrier platform 11 for carrying a circuit board, an exposure engine 13 for exposing the circuit board, a first guide rail 18 for guiding the movement of the carrier platform 11 close to the exposure engine 13, a second guide rail 15 for guiding the movement of the exposure engine 13, and a fixing rod 16 for mounting an alignment camera 17.

[0031] Continuing to refer to Figure 1 , the first guide rail 18 should ideally be in a straight state, meaning that the movement trajectory of the carrier platform 11 along the first guide rail 18 should be the straight first trajectory line 12 in the figure. However, limited by the linearity and straightness errors of the first guide rail 18, the instability of the mechanical structure, and the influence of the external environment, the actual movement trajectory of the carrier platform 11 along the first guide rail 18 is the curved second trajectory line 14 in the figure. It can be understood that the shape of the second trajectory line 14 is consistent with the shape of the projection of the first guide rail 18 on the horizontal plane. Since the actual movement trajectory of the carrier platform 11 is a curve, this will cause the circuit board on the carrier platform 11 to have a lateral left-right offset when moving along the first guide rail 18. And the exposure engine 13 is installed on the second guide rail 15, making the exposure position on the carrier platform 11 unable to be fixed, which may lead to problems such as pattern offset or deformation, thus affecting the lithography quality of the circuit board.

[0032] In addition, continuing to refer to Figure 1, since the exposure engine 13 is installed on the second guide rail 15, the perpendicularity between the first guide rail 18 and the second guide rail 15 will also cause the angle of the lithography pattern to shift. It can be understood that when the first guide rail and the second guide rail are not completely perpendicular, the angle of the lithography pattern on the exposure engine 13 will deflect synchronously with the second guide rail 15.

[0033] Based on the discovery of the above technical problems, the following technical solutions are proposed through creative labor to solve or improve the above problems. It should be noted that the defects existing in the above solutions in the prior art are all the results obtained after practice and careful research. Therefore, the process of discovering the above problems and the solutions proposed by the embodiments of the present application below for the above problems should be regarded as contributions made to the present application during the invention creation process, rather than being understood as well-known technical content in the art.

[0034] In view of this, this embodiment provides an exposure compensation method, which is applied to an exposure machine. The exposure machine can be Figure 1 the LDI exposure machine shown in the figure, or other types of exposure machines. This embodiment does not make specific limitations on this. The exposure machine includes a first guide rail and a carrier platform that moves along the first guide rail. The carrier platform is used to carry a target object (for example, a circuit board). As Figure 2 shown in the figure, the method includes:

[0035] S1, obtain the shape curve of the first guide rail.

[0036] S2, obtain the pose compensation amount of the lithography pattern according to the moving position of the carrier platform on the shape curve and the perpendicularity between the first guide rail and the second guide rail.

[0037] S3, adjust the pose of the lithography pattern according to the pose compensation amount so that the lithography pattern is aligned with the target object.

[0038] In this way, by obtaining the actual shape curve of the first guide rail and adjusting the pose of the lithography pattern based on this shape curve and the perpendicularity between the first guide rail and the second guide rail, it is possible to effectively compensate for the lateral offset caused by the shape deviation of the first guide rail and the angle offset caused by the perpendicularity between the first guide rail and the second guide rail, thereby ensuring that even when there are deviations in the exposure machine, the lithography pattern can still be aligned with the target object to be exposed, improving the exposure accuracy.

[0039] In this embodiment, the electronic device implementing the exposure compensation method may be, but is not limited to, a controller integrated with an exposure machine, or a host computer communicatively connected to the controller. The host computer may be, but is not limited to, a mobile terminal, a tablet computer, a laptop computer, a desktop computer, etc. Taking a desktop computer as an example, the desktop computer is responsible for obtaining the shape curve data of the first guide rail. By analyzing the shape curve of the first guide rail, the desktop computer can accurately calculate the compensation amount required when the bearing platform is at different moving positions, and apply the calculated compensation amount to adjust the pose of the lithography pattern.

[0040] To make the solution provided in this embodiment clearer, the following is based on Figure 1 the LDI exposure machine, and taking the LDI controller as the electronic device implementing this method, each step of Figure 2 the method shown will be elaborated in detail. However, it should be understood that the operations in the flowchart may not be implemented in sequence, and steps without logical context relationships may be reversed or implemented simultaneously. In addition, those skilled in the art can add one or more other operations to the flowchart or remove one or more operations from the flowchart under the guidance of the content of this application. Continuing to refer to Figure 2 , the method includes:

[0041] S1. Obtain the shape curve of the first guide rail.

[0042] In this embodiment, calibration points are set on the bearing platform, and the role of the calibration points is to provide accurate reference points during movement. When the bearing platform moves along the first guide rail 18, the alignment camera continuously takes pictures of the calibration points to form a series of image data. By processing and analyzing these image data, the spatial position change information of the calibration points relative to the alignment camera can be extracted. Since the calibration points are located on the bearing platform, and the bearing platform moves along the first guide rail 18, the spatial position change of the calibration points actually reflects the shape characteristics of the first guide rail 18 itself. Further, by fitting or mathematical modeling the extracted spatial position change information, the shape curve of the first guide rail 18 can be obtained.

[0043] S2. Adjust the position of the lithography pattern and the perpendicularity between the first guide rail and the second guide rail according to the shape curve to obtain the pose compensation amount of the lithography pattern.

[0044] In this embodiment, by dynamically updating the compensation amount, it is ensured that the position of the lithography pattern can be adjusted in real time as the bearing platform moves. Therefore, the key lies in dividing the entire compensation process into multiple fine small steps. For each step, the corresponding pose compensation amount is calculated according to the moving position of the bearing platform on the shape curve and the perpendicularity, and the pose of the lithography pattern is adjusted accordingly. Based on this concept, the specific implementation manner of step S2 may include:

[0045] S2-1, obtain the moving distance of the bearing platform on the first guide rail.

[0046] In this embodiment, the first guide rail is driven by a linear motor. Therefore, the moving distance of the bearing platform on the first guide rail can be obtained by reading the encoder of the linear motor.

[0047] S2-2, determine the moving position on the shape curve according to the moving distance.

[0048] Since the shape curve of the first guide rail has been obtained in advance, a corresponding relationship between multiple moving distances and multiple moving positions can be constructed in advance. Only by matching the current moving distance can the corresponding moving position be obtained.

[0049] S2-3, obtain the pose compensation amount according to the moving position and the perpendicularity.

[0050] In this embodiment, the pose compensation amount includes a position compensation amount and an attitude compensation amount, according to the moving position and the perpendicularity. Among them, the position compensation amount is used to compensate for the curvature of the first guide rail, and the attitude compensation amount is used to compensate for the perpendicularity between the first guide rail and the second guide rail.

[0051] In the specific implementation manner, the controller can obtain the original position of the moving position in the base coordinate system; determine the first pose of the original position in the ideal coordinate system according to the first mapping relationship between the base coordinate system and the ideal coordinate system; determine the second pose of the original in the actual coordinate system according to the second mapping relationship between the base coordinate system and the actual coordinate system, where the perpendicularity is recorded in the first mapping relationship and the second mapping relationship; obtain the position compensation amount and the attitude compensation amount according to the first pose and the second pose.

[0052] It can be understood that for the attitude compensation amount required by the perpendicularity, in this embodiment during calibration, it is solidified in the mapping relationship between the two coordinate systems, so that only by substituting the current original position can the corresponding attitude compensation amount be automatically calculated.

[0053] Exemplarily, based on Figure 1 the top view shown, as Figure 3 shown, the reference coordinate system constructed based on the initial position of the bearing platform 11 in the figure is represented as X p Y p , the ideal coordinate system is constructed based on the first guide rail 18 in the ideal state and is represented as X e Y e , the actual coordinate system is constructed based on the second guide rail 15 on which the exposure engine 13 is installed (in the figure, the second guide rail is actually not completely straight and is not completely perpendicular to the first guide rail), and is represented as The mapping relationship between these coordinate systems is obtained through prior calibration. Using the mapping relationship obtained from calibration, the same position can be mapped into two different coordinate systems, and the difference between the two is actually the positional relationship between the two coordinate systems.

[0054] Since the role of the base coordinate system is to provide a unified reference framework for describing the states of various positions of the bearing platform during the entire movement process. Therefore, when the bearing platform moves to a specific position, it is necessary to clearly record the original position of this position in the base coordinate system (denoted as P p ).

[0055] The ideal coordinate system assumes that there are no shape deviations or errors. Therefore, the mapping relationship (denoted as T pe ) between the base coordinate system and the ideal coordinate system obtained through prior calibration can be used to transform the original position from the base coordinate system to the ideal coordinate system, so as to obtain the first pose P e = T pe (P p ) under ideal conditions.

[0056] The actual coordinate system reflects the real state during the actual operation of the device. Similarly, through the mapping relationship (denoted as ) obtained through prior calibration, the original position can be transformed from the base coordinate system to the actual coordinate system, so as to obtain the second pose

[0057] The calculation of the compensation amount is based on the difference between the first pose P e in the ideal coordinate system and the second pose in the actual coordinate system. Specifically, the compensation amount defined at point P p is This compensation amount represents the adjustment amount of position and pose that needs to be carried out to align the actual lithography pattern with the target object.

[0058] Based on the above explanation of the compensation amount in the embodiment, Figure 2 the method shown also includes:

[0059] S3. Adjust the pose of the lithography pattern according to the pose compensation amount so that the lithography pattern is aligned with the target object.

[0060] In this regard, continue to refer to Figure 1 , Figure 1 The exposure engine shown includes a plurality of light sources 19. Each light source 19 can be used to lithographically transfer the lithography pattern into the circuit board by laser, and the position of the exposed lithography pattern can be adjusted. Therefore, the position and pose of the lithography pattern can be adjusted according to the compensation amount.

[0061] Exemplarily, as Figure 4As shown in the figure, as the carrier platform moves, the photolithography pattern will form a stripe pattern after continuous exposure. When no compensation is performed, the exposure pattern is always exposed at the same position, so the stripe pattern formed is straight. When it is necessary to compensate for the error of the guide rail and the verticality between the guide rails, the photolithography pattern will adjust its position and posture following the position of the carrier platform, so the stripe pattern formed is curved. In addition, the two ends of the stripe after compensation are not horizontal, because when compensating for the posture of the photolithography pattern, its angle needs to be rotated appropriately.

[0062] Based on the same inventive concept as the exposure compensation method provided in this embodiment, this embodiment also provides an exposure compensation device, which is applied to an exposure machine, and the exposure machine includes a first guide rail and a carrying platform moving along the first guide rail, and the carrying platform is used to carry a target object. The device includes at least one software function module that can be stored in a memory or fixed in an electronic device in the form of software. The processor in the electronic device is used to execute the executable module stored in the memory. For example, the software function module and computer program included in the device. Please refer to Figure 5 , from a functional perspective, the device may include:

[0063] A guide rail module, used for obtaining a shape curve of a first guide rail;

[0064] The compensation module is used to obtain the posture compensation amount of the lithography pattern according to the moving position of the carrying platform on the shape curve and the verticality between the first guide rail and the second guide rail; according to the posture compensation amount, the posture of the lithography pattern is adjusted to align the lithography pattern with the target object.

[0065] In this embodiment, the guide rail module is used to implement Figure 2 In step S1, the compensation module is used to achieve Figure 2 Therefore, for the detailed description of the above modules, please refer to the specific implementation methods of the corresponding steps.

[0066] Optionally, the compensation module is further specifically used for:

[0067] Obtaining the moving distance of the carrying platform on the first guide rail;

[0068] According to the moving distance, the moving position on the shape curve is determined;

[0069] The posture compensation amount is obtained according to the moving position and verticality.

[0070] Optionally, the posture compensation includes a position compensation and a posture compensation, and the compensation module is further specifically used for:

[0071] Get the original position of the moving position in the base coordinate system;

[0072] Determine the first pose of the original position in the ideal coordinate system according to the first mapping relationship between the base coordinate system and the ideal coordinate system;

[0073] Determine the second pose of the original in the actual coordinate system according to the second mapping relationship between the base coordinate system and the actual coordinate system, wherein the perpendicularity is recorded in the first mapping relationship and the second mapping relationship;

[0074] Obtain the position compensation amount and the attitude compensation amount according to the first pose and the second pose.

[0075] In addition, each functional module in each embodiment of the present application may be integrated together to form an independent part, or each module may exist alone, or two or more modules may be integrated to form an independent part.

[0076] It should also be understood that if the above implementation manner is implemented in the form of a software functional module and sold or used as an independent product, it may be stored in a computer-readable storage medium. Based on such an understanding, the technical solution of the present application, in essence, or the part that contributes to the prior art, or a part of the technical solution, may be embodied in the form of a software product. The computer software product is stored in a storage medium and includes several instructions for causing a computer device (which may be a personal computer, a server, or a network device, etc.) to execute all or part of the steps of the methods described in each embodiment of the present application.

[0077] Therefore, this embodiment also provides a storage medium, which is a computer-readable storage medium. The storage medium stores a computer program, and when the computer program is executed by a processor, the exposure compensation method provided by this embodiment is implemented. Among them, the storage medium may be various media such as a USB flash drive, a mobile hard disk, a read-only memory (ROM, Read-Only Memory), a random access memory (RAM, Random Access Memory), a magnetic disk, or an optical disc that can store program codes.

[0078] This embodiment also provides an electronic device for implementing the exposure compensation method. As Figure 6 shown, the electronic device may include a processor 32 and a memory 31. And, the memory 31 stores a computer program, and the processor realizes the exposure compensation method provided by this embodiment by reading and executing the computer program corresponding to the above implementation manner in the memory 31.

[0079] Continue to refer to Figure 6 , the electronic device further includes a communication unit 33. Each element of the memory 31, the processor 32, and the communication unit 33 is directly or indirectly electrically connected through a system bus 34 to realize data transmission or interaction.

[0080] Among them, the memory 31 can be an information recording device based on any electronic, magnetic, optical, or other physical principles, and is used to record execution instructions, data, etc. In some embodiments, the memory 31 can be, but is not limited to, a volatile memory, a non-volatile memory, a storage drive, etc.

[0081] In some embodiments, the volatile memory can be a Random Access Memory (RAM); in some embodiments, the non-volatile memory can be a Read Only Memory (ROM), a Programmable Read-Only Memory (PROM), an Erasable Programmable Read-Only Memory (EPROM), an Electric Erasable Programmable Read-Only Memory (EEPROM), a flash memory, etc.; in some embodiments, the storage drive can be a disk drive, a solid-state drive, any type of storage disk (such as an optical disk, a DVD, etc.), or a similar storage medium, or a combination thereof, etc.

[0082] The communication unit 33 is used to send and receive data through a network. In some embodiments, the network can include a wired network, a wireless network, an optical fiber network, a telecommunication network, an intranet, the Internet, a Local Area Network (LAN), a Wide Area Network (WAN), a Wireless Local Area Networks (WLAN), a Metropolitan Area Network (MAN), a Wide Area Network (WAN), a Public Switched Telephone Network (PSTN), a Bluetooth network, a ZigBee network, or a Near Field Communication (NFC) network, etc., or any combination thereof. In some embodiments, the network can include one or more network access points. For example, the network can include a wired or wireless network access point, such as a base station and / or a network switching node, and one or more components of the service request processing system can be connected to the network through the access point to exchange data and / or information.

[0083] The processor 32 may be an integrated circuit chip with signal processing capabilities, and the processor may include one or more processing cores (e.g., a single-core processor or a multi-core processor). By way of example only, the above-mentioned processor may include a Central Processing Unit (CPU), an Application Specific Integrated Circuit (ASIC), an Application Specific Instruction-set Processor (ASIP), a Graphics Processing Unit (GPU), a Physics Processing Unit (PPU), a Digital Signal Processor (DSP), a Field Programmable Gate Array (FPGA), a Programmable Logic Device (PLD), a controller, a microcontroller unit, a Reduced Instruction Set Computing (RISC), or a microprocessor, etc., or any combination thereof.

[0084] It can be understood that Figure 5 The structure shown is only schematic. The electronic device 100 may also have more or fewer components than Figure 5 shown, or have a different configuration from Figure 5 that shown. Figure 5 Each of the components shown may be implemented using hardware, software, or a combination thereof.

[0085] In addition, this embodiment also provides an exposure machine, which includes the electronic device provided in this embodiment. For example, the exposure machine may be an LDI exposure machine.

[0086] It should be understood that the devices and methods disclosed in the above embodiments can also be implemented in other ways. The device embodiments described above are merely illustrative. For example, the flowcharts and block diagrams in the accompanying drawings show the possible architectures, functions, and operations of devices, methods, and computer program products according to multiple embodiments of the present application. In this regard, each block in the flowchart or block diagram may represent a module, a program segment, or a part of code, and the module, program segment, or part of code contains one or more executable instructions for implementing the specified logical function. It should also be noted that in some alternative implementations, the functions marked in the blocks may occur in a different order from that marked in the accompanying drawings. For example, two consecutive blocks may actually be executed substantially in parallel, and they may sometimes be executed in the reverse order, depending on the functions involved. It should also be noted that each block in the block diagram and / or flowchart, and the combination of blocks in the block diagram and / or flowchart, can be implemented by a dedicated hardware-based system for performing the specified functions or actions, or can be implemented by a combination of dedicated hardware and computer instructions.

[0087] As described above, the above are only various embodiments of the present application, but the protection scope of the present application is not limited thereto. Any person skilled in the art within the technical scope disclosed in the present application can easily think of changes or substitutions, which should all be covered within the protection scope of the present application. Therefore, the protection scope of the present application should be subject to the protection scope of the claims.

Claims

1. An exposure compensation method, characterized in that, Applied to an exposure machine, the exposure machine includes a first guide rail, a carrying platform that moves along the first guide rail, and a second guide rail orthogonal to the first guide rail. An exposure engine is installed on the second guide rail. The carrying platform is used to carry a target object, and the exposure engine is used to project a lithography pattern onto the target object. The method includes: Obtain the shape curve of the first guide rail; According to the moving position of the carrying platform on the shape curve and the perpendicularity between the first guide rail and the second guide rail, obtain the pose compensation amount of the lithography pattern; According to the pose compensation amount, adjust the pose of the lithography pattern so that the lithography pattern is aligned with the target object.

2. The exposure compensation method according to claim 1, wherein According to the moving position of the carrying platform on the shape curve and the perpendicularity between the first guide rail and the second guide rail, obtaining the pose compensation amount of the lithography pattern includes: Obtain the moving distance of the carrying platform on the first guide rail; Determine the moving position on the shape curve according to the moving distance; Obtain the pose compensation amount according to the moving position and the perpendicularity.

3. The exposure compensation method according to claim 2, wherein The pose compensation amount includes a position compensation amount and an attitude compensation amount. According to the moving position and the perpendicularity, obtaining the pose compensation amount includes: Obtain the original position of the moving position in the base coordinate system; Determine the first pose of the original position in the ideal coordinate system according to the first mapping relationship between the base coordinate system and the ideal coordinate system; Determine the second pose of the original in the actual coordinate system according to the second mapping relationship between the base coordinate system and the actual coordinate system, where the perpendicularity is recorded in the first mapping relationship and the second mapping relationship; Obtain the position compensation amount and the attitude compensation amount according to the first pose and the second pose.

4. The exposure compensation method according to claim 3, wherein The base coordinate system is constructed based on the initial position of the carrying platform; The ideal coordinate system is constructed based on the first guide rail in an ideal state; The actual coordinate system is constructed based on the second guide rail where the exposure engine is installed.

5. The exposure compensation method according to claim 3, wherein The mapping relationship between the base coordinate system and the ideal coordinate system is obtained through prior calibration; The mapping relationship between the base coordinate system and the actual coordinate system is obtained through prior calibration.

6. The exposure compensation method according to any one of claims 1-5, characterized in that The exposure machine is a laser direct imaging (LDI) exposure machine.

7. An exposure compensation device, characterized in that, Applied to an exposure machine, the exposure machine includes a first guide rail, a carrying platform that moves along the first guide rail, and a second guide rail orthogonal to the first guide rail. An exposure engine is installed on the second guide rail. The carrying platform is used to carry a target object, and the exposure engine is used to project a lithography pattern onto the target object. The device includes: A guide rail module for obtaining the shape curve of the first guide rail; A compensation module for obtaining the pose compensation amount of the lithography pattern according to the moving position of the carrying platform on the shape curve and the perpendicularity between the first guide rail and the second guide rail; According to the pose compensation amount, adjust the pose of the lithography pattern so that the lithography pattern is aligned with the target object.

8. A storage medium, characterized in that, The storage medium stores a computer program, which, when executed by a processor, implements the exposure compensation method according to any one of claims 1-6.

9. An electronic device, characterized in that, The electronic device includes a processor and a memory. The memory stores a computer program, which, when executed by the processor, implements the exposure compensation method according to any one of claims 1-6.

10. An exposure machine, characterized in that, The exposure machine includes the electronic device according to claim 9.

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