Multi-element synergetic doped ATO target material and preparation method thereof
Through the preparation method of multivariate collaborative doping ATO target, the problem of difficulty in taking into account both densification and conductivity of ATO targets is solved, and high density and low resistance ATO targets are realized, which are suitable for the application of high-performance transparent conductive films.
Patent Information
- Application Number
- CN202510773761.9
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2025-06-11
- Publication Date
- 2025-08-15
AI Technical Summary
The existing ATO targets are difficult to take into account both densification and conductivity. Although single doping can increase density, the resistivity increases, and abnormal discharge is easily caused during sputtering.
Using a multivariate synergistic doping method, high-valent oxides such as tantalum pentoxide, niobium pentoxide, vanadium pentoxide, gallium trioxide, tungsten trioxide and low-valent oxides such as zinc oxide, copper oxide, cobalt oxide, manganese oxide, cerium oxide, ATO targets are prepared by spray-drying granulation and mold forming cold isostatic pressing, combining two-stage heat treatment and three-stage sintering process.
ATO targets with high density (relative density >98.5%) and low resistivity (<5×10-3Ω·cm) were prepared, which is suitable for magnetron sputtering coating process of high-performance transparent conductive films.