Current density adjusting method, device and equipment for anode pulse electroplating

Abstract

The invention relates to a current density adjusting method, device and equipment for anode pulse electroplating. The method comprises the following steps: acquiring an anode pulse current of a current time period, and performing periodic reverse modulation on the anode pulse current based on a double-pulse current mode to obtain a reverse pulse current signal; performing closed-loop feedback adjustment processing on the anode pulse current based on the reverse pulse current signal to obtain an adjusted anode pulse current, and obtaining the anode pulse current density based on the electrical characteristics of the adjusted anode pulse current; determining a cathode potential change trend of the cathode region based on an electrical coupling relationship between the anode pulse current density and the cathode region, and performing compensation processing on a time sequence of the anode pulse current density based on the cathode potential change trend to obtain a current density adjustment strategy, and the pulse current density of the anode is kept in a preset dynamic change range in the pulse electroplating period. By adopting the method, the accurate dynamic control of the anode pulse current density can be realized.

Description

Technical Field

[0001] The present application relates to the technical field of pulse electroplating processes, and in particular to a method, device and equipment for adjusting the current density of anodic pulse electroplating. Background Art

[0002] In the field of pulse electroplating technology, it involves adjusting the anode pulse current density to achieve uniformity control of the pulse electroplating process and optimize the coating quality.

[0003] Related current density regulation methods control the anode pulse current density by setting fixed pulse parameters or regulating the current based on a single feedback signal. However, these methods have disadvantages such as uneven current density distribution and inability to adapt to changes in cathode potential in real time, which leads to instability in the metal deposition process, uneven distribution of coating thickness, and reduced anode current efficiency. Summary of the Invention

[0004] Based on this, it is necessary to provide a current density adjustment method, device, computer equipment and computer-readable storage medium for anodic pulse plating to address the above technical problems, so as to achieve precise dynamic control of the anodic pulse current density and improve the plating uniformity and process stability.

[0005] In a first aspect, the present application provides a method for adjusting current density in anodic pulse plating, comprising: Obtaining the anode pulse current of the current period, and performing periodic reverse modulation on the anode pulse current based on a preset dual-pulse current mode to obtain a reverse pulse current signal; performing closed-loop feedback regulation on the anode pulse current based on the reverse pulse current signal to obtain an adjusted anode pulse current, and obtaining an anode pulse current density based on the electrical characteristics of the adjusted anode pulse current; Based on the electrical coupling relationship between the anode pulse current density and the cathode area, the cathode potential change trend of the cathode area is determined, and the time series of the anode pulse current density is compensated based on the cathode potential change trend to obtain a current density adjustment strategy. The current density adjustment strategy is used to maintain the anode pulse current density within a preset dynamic change range during the pulse electroplating cycle.

[0006] In a second aspect, the present application further provides a current density regulating device for anodic pulse plating, comprising: A reverse modulation module is used to obtain the anode pulse current of the current period, and based on a preset double-pulse current mode, periodically reverse modulate the anode pulse current to obtain a reverse pulse current signal; a closed-loop regulation module, configured to perform closed-loop feedback regulation processing on the anode pulse current based on the reverse pulse current signal to obtain an adjusted anode pulse current, and obtain an anode pulse current density based on the electrical characteristics of the adjusted anode pulse current; An analysis module is used to determine the cathode potential change trend of the cathode area based on the electrical coupling relationship between the anode pulse current density and the cathode area, and to compensate the time series of the anode pulse current density based on the cathode potential change trend to obtain a current density adjustment strategy. The current density adjustment strategy is used to maintain the anode pulse current density within a preset dynamic change range during the pulse electroplating cycle.

[0007] In a third aspect, the present application further provides a computer device comprising a memory and a processor, wherein the memory stores a computer program, and the processor implements the above steps when executing the computer program.

[0008] In a fourth aspect, the present application further provides a computer-readable storage medium on which a computer program is stored, and the computer program implements the above steps when executed by a processor.

[0009] The above-mentioned current density regulation method, device, computer equipment and computer-readable storage medium for anodic pulse electroplating periodically reverse modulate the anodic pulse current according to the dual-pulse current mode to obtain a reverse pulse current signal, thereby enabling the anodic pulse current to be regulated in both positive and negative directions within a specific period, optimizing the current distribution and providing a basis for the subsequent precise control of the current density; furthermore, the anodic pulse current is closed-loop feedback regulated according to the reverse pulse current signal, and the anodic pulse current density is calculated based on the electrical characteristics of the regulated anodic pulse current, thereby stabilizing the output of the anodic pulse current within a preset range, and being able to calculate the anodic pulse current density based on stable data to improve the calculation accuracy; furthermore, based on the electrical coupling relationship between the anodic pulse current density and the cathode area, the cathode potential change trend is efficiently determined, and the time series of the anodic pulse current density is dynamically compensated based on the cathode potential change trend, thereby achieving precise dynamic control of the anodic pulse current density and improving the electroplating uniformity and process stability. BRIEF DESCRIPTION OF THE DRAWINGS

[0010] In order to more clearly illustrate the technical solutions in the embodiments of the present application or related technologies, the following briefly introduces the drawings required for use in the embodiments or related technical descriptions. Obviously, the drawings described below are only some embodiments of the present application. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying any creative work.

[0011] Figure 1Schematic diagram of a flow chart of a method for adjusting current density of anodic pulse plating in one embodiment; Figure 2 1 is a structural block diagram of a current density regulating device for anodic pulse plating in one embodiment. DETAILED DESCRIPTION

[0012] In order to make the purpose, technical solutions and advantages of this application more clear, the following further describes this application in detail with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are only used to explain this application and are not intended to limit this application.

[0013] In one embodiment, Figure 1 As shown, a method for adjusting current density for anodic pulse plating is provided. This embodiment uses the method applied to a server as an example for illustration. It is understood that the method can also be applied to a terminal, or to a system including a terminal and a server, and implemented through interaction between the terminal and the server. In this embodiment, the method includes the following steps S101 to S103.

[0014] Step S101 , obtaining the anode pulse current of the current period, and performing periodic reverse modulation on the anode pulse current based on a preset dual-pulse current mode to obtain a reverse pulse current signal.

[0015] The anode pulse current refers to a periodically changing current signal applied to the anode area, which is used to control the current supply to the anode during the electroplating process.

[0016] Among them, the dual-pulse current mode refers to a periodic alternating power supply method including forward pulse current and reverse pulse current, which is used to optimize the coating structure by modulating the forward pulse current and the reverse pulse current to improve the uniformity of electrodeposition. For example, during the electroplating process, a forward pulse current is first applied to promote metal ion deposition, and then a reverse pulse current is applied to remove uneven deposition, thereby improving the coating quality.

[0017] The reverse pulse current signal refers to a current signal formed by periodically reverse-modulating the anode pulse current.

[0018] For example, the goal of the dual-pulse current mode is to make the current alternate between forward and reverse within a predetermined cycle. Based on this, in the dual-pulse current mode, the reverse switching of the anode pulse current is triggered according to the set cycle, that is, when the forward anode pulse current reaches a predetermined duty cycle or duration, the application of the reverse anode pulse current is triggered, and the amplitude and duration of the reverse anode pulse current must match the forward anode pulse current to ensure the stability of the entire dual-pulse cycle, while avoiding signal distortion or current supply imbalance caused by current mutation. Based on this, a reverse pulse current signal is obtained by periodically reverse modulating the anode pulse current.

[0019] Step S102 , performing closed-loop feedback regulation processing on the anode pulse current based on the reverse pulse current signal to obtain an adjusted anode pulse current, and obtaining an anode pulse current density based on the electrical characteristics of the adjusted anode pulse current.

[0020] Among them, the electrical characteristics of the adjusted anode pulse current represent the electrical parameters of the anode pulse current obtained after closed-loop feedback adjustment, which include current amplitude, frequency, duty cycle, waveform, etc., and are used to reflect the state of the anode pulse current after adjustment.

[0021] Among them, the anode pulse current density represents the size of the anode pulse current per unit area, which is used to measure the current delivery capacity of the anode per unit time.

[0022] For example, in closed-loop control, the role of the reverse pulse current signal is to provide a feedback signal to adjust the output of the anode pulse current. For example, if the amplitude of the reverse pulse current signal is large, it may mean that the output of the anode pulse current is too high. At this time, it is necessary to reduce the amplitude of the anode pulse current or adjust the pulse interval to restore the anode pulse current to the target current range. The adjustment process can be achieved through a PID (Proportional-Integral-Derivative) control algorithm or other adaptive control algorithms.

[0023] Exemplarily, based on the electrical characteristics of the adjusted anode pulse current, such as parameters such as current amplitude, waveform shape, duty cycle and period, the adjusted anode pulse current is integrated in the time domain to calculate the effective current value per unit time; then, based on the effective current value per unit time and the effective surface area of ​​the anode, the anode pulse current density is calculated.

[0024] Step S103, based on the electrical coupling relationship between the anode pulse current density and the cathode area, determine the cathode potential change trend of the cathode area, compensate the time series of the anode pulse current density based on the cathode potential change trend, and obtain a current density adjustment strategy. The current density adjustment strategy is used to maintain the anode pulse current density within a preset dynamic change range during the pulse electroplating cycle.

[0025] The cathode potential change trend of the cathode region represents the dynamic change of the cathode surface potential over time, reflecting the influence of the anode pulse current density on the cathode region.

[0026] Among them, the current density adjustment strategy refers to a control scheme for compensating and optimizing the anode pulse current density during the pulse electroplating cycle, which is used to ensure that the anode pulse current density is always within the preset dynamic change range to improve the coating quality and the stability of the electroplating process.

[0027] For example, the anode pulse current density determines the migration rate of metal ions during the pulse electroplating process, and the deposition rate of metal ions in the cathode region is directly related to the change in cathode potential. Therefore, based on the correlation between the anode pulse current density and the electric field distribution and ion transmission conditions on the cathode surface, the electrical coupling relationship between the anode pulse current density and the cathode region can be determined. For example, the cathode region potential distribution data is obtained through electric field calculation methods or experimental measurements, and then the anode pulse current density and the cathode region potential distribution data are analyzed in time series to observe the change in cathode potential during the pulse electroplating cycle, thereby integrating the electrical coupling relationship between the anode pulse current density and the cathode region. Furthermore, based on the predetermined electrical coupling relationship between the anode pulse current density and the cathode region, the cathode potential change trend of the cathode region at the current time is analyzed by the calculated current anode pulse current density.

[0028] For example, by predetermining the electrical coupling relationship between the anode pulse current density and the cathode area, combined with the current cathode potential change trend of the cathode area, the optimal anode pulse current density timing is calculated. Based on the optimal anode pulse current density timing, the anode pulse current density in the current time series is compensated so that the compensated anode pulse current density time series can provide an appropriate amount of metal ion supply in different time periods; for example, if it is predicted that the cathode potential will show a downward trend at a certain stage, the anode pulse current density can be increased in advance to provide more metal ions to prevent the cathode potential from further decreasing. Based on this, a current density regulation strategy for compensating and optimizing the anode pulse current density during the pulse electroplating cycle is obtained.

[0029] In the above-mentioned current density regulation method for anodic pulse electroplating, the anodic pulse current is periodically reverse-modulated according to the dual-pulse current mode to obtain a reverse pulse current signal, so that the anodic pulse current can be regulated in both positive and negative directions within a specific period, and the current distribution is optimized, providing a basis for the subsequent precise control of the current density; furthermore, the anodic pulse current is closed-loop feedback regulated according to the reverse pulse current signal, and the anodic pulse current density is calculated based on the electrical characteristics of the regulated anodic pulse current, so that the output of the anodic pulse current is stabilized within a preset range, and the anodic pulse current density can be calculated based on stable data to improve the calculation accuracy; furthermore, according to the electrical coupling relationship between the anodic pulse current density and the cathode area, the cathode potential change trend is efficiently determined, and the time series of the anodic pulse current density is dynamically compensated based on the cathode potential change trend, thereby realizing precise dynamic control of the anodic pulse current density and improving the electroplating uniformity and process stability.

[0030] In an exemplary embodiment, based on a preset dual-pulse current mode, the anode pulse current is periodically reverse-modulated to obtain a reverse pulse current signal, including steps S201 to S203.

[0031] Step S201 : performing pulse signal decomposition processing on the anode pulse current based on the time-frequency characteristics of the anode pulse current to obtain transient characteristic parameters of the anode pulse current.

[0032] Among them, the time-frequency characteristics of the anode pulse current represent the distribution characteristics of the anode pulse current in the time domain and frequency domain, which are used to describe the change of the anode pulse current over time and the energy distribution in different frequency ranges.

[0033] Among them, the transient characteristic parameters of the anode pulse current represent the instantaneous change characteristics of the anode pulse current in a short period of time, such as pulse amplitude, pulse width, waveform slope, pulse interval, instantaneous frequency and other parameters. These parameters determine the instantaneous change rate of the anode pulse current and its influence range.

[0034] For example, in terms of time domain characteristic analysis, the time window division method can be used to decompose the entire pulse cycle into multiple short time periods to observe the instantaneous change trend of the anode pulse current, thereby obtaining the transient characteristic parameters of the anode pulse current in terms of time domain characteristic analysis; in terms of frequency domain characteristic analysis, transformation methods such as Fourier transform or wavelet transform can be used to convert the time domain signal to the frequency domain to analyze the main frequency components and harmonic distribution of the signal, thereby obtaining the transient characteristic parameters of the anode pulse current in terms of frequency domain characteristic analysis.

[0035] In step S202 , the anode pulse current is periodically reverse-modulated in combination with the dual-pulse current mode and the transient characteristic parameters to obtain a pulse window in which the forward pulse and the reverse pulse alternate within a preset period.

[0036] The pulse window represents the time distribution structure of the forward pulse and the reverse pulse within a pulse electroplating cycle, and is used to determine the action time period of the forward pulse and the reverse pulse.

[0037] For example, within a preset period, it is necessary to determine the proportional relationship and switching time point of the forward pulse and the reverse pulse based on the transient characteristic parameters of the anode pulse current, that is, calculate their respective action times, and obtain a pulse window in which the forward pulse and the reverse pulse alternate within the preset period, so as to ensure that the forward pulse can provide sufficient current to the anode based on its action time to maintain the effective deposition of metal ions, and the reverse pulse can effectively suppress abnormal deposition or optimize deposition uniformity based on its action time.

[0038] Step S203 , obtaining an initial reverse pulse current signal based on a pulse window of the reverse pulse within a preset period, and adjusting a duty cycle parameter of the initial reverse pulse current signal based on electrode polarization characteristics of the anode region to obtain a reverse pulse current signal.

[0039] Among them, the initial reverse pulse current signal represents a reverse pulse current signal generated according to the pulse window and has not yet been optimized and adjusted; the duty cycle parameter of the initial reverse pulse current signal represents the effective action time ratio of the initial reverse pulse current within one electroplating pulse cycle.

[0040] Among them, the electrode polarization characteristics of the anode region represent the electrochemical response of the anode region under the action of different currents, such as overpotential changes, charge transfer behavior, etc.

[0041] For example, a reverse pulse current is applied within a pulse window of a preset reverse pulse period, and it is necessary to ensure that the rising and falling edges of the reverse pulse current can transition smoothly to avoid abnormal electric field distribution or fluctuations in overpotential on the electrode surface due to current mutation, and the applied reverse pulse current is used as the initial reverse pulse current signal. Furthermore, based on the electrode polarization characteristics of the anode region, the action time of the initial reverse pulse current signal is adjusted to adapt to the characteristics of the anode region, thereby obtaining a reverse pulse current signal with adjusted duty cycle parameters. For example, when the anode polarization is high, the action time of the initial reverse pulse current signal can be appropriately increased to reduce the polarization effect. When the anode polarization is low, the duration of the initial reverse pulse current signal can be reduced to improve energy utilization efficiency.

[0042] In this embodiment, first, the pulse signal of the anode pulse current is decomposed according to its time-frequency characteristics, and the transient characteristic parameters of the anode pulse current are extracted, so that the dynamic change characteristics of the anode pulse current can be accurately characterized; secondly, the dual-pulse current mode and the transient characteristic parameters are combined to perform periodic reverse modulation on the anode pulse current to generate a pulse window in which forward pulses and reverse pulses alternate, thereby ensuring that the current modulation conforms to the dynamic change characteristics of the pulse current; thirdly, based on the pulse window of the reverse pulse within a preset period, an initial reverse pulse current signal is generated, and the duty cycle of the initial reverse pulse current signal is adjusted based on the electrode polarization characteristics of the anode area to obtain a reverse pulse current signal, thereby optimizing the effect of the reverse pulse current signal, ensuring that the electrochemical state of the anode area remains stable, and improving the adaptability of the reverse pulse current signal.

[0043] In an exemplary embodiment, closed-loop feedback regulation is performed on the anode pulse current based on the reverse pulse current signal to obtain the regulated anode pulse current, including steps S301 to S303.

[0044] In step S301, based on the difference between the reverse pulse current signal and the anode pulse current at the electrical parameter level, a deviation value of the anode pulse current is obtained, and the deviation value of the anode pulse current is used as an input variable for PID control.

[0045] Among them, the difference between the reverse pulse current signal and the anode pulse current at the electrical parameter level indicates the difference between the reverse pulse current signal and the anode pulse current in parameters such as the current signal amplitude, duty cycle, frequency, and waveform shape.

[0046] The deviation value of the anode pulse current represents the error between the actual value and the expected value of the anode pulse current.

[0047] Among them, the input variable of PID control represents the input data of the PID control algorithm, and the PID control algorithm represents a closed-loop control algorithm based on error feedback, which is used to continuously adjust the control variable through a combination of three adjustment methods: proportional, integral and differential, so that the controlled object gradually approaches the target value.

[0048] Exemplarily, the electrical parameters of each type of the reverse pulse current signal and the anode pulse current are compared one by one to determine the deviation of the anode pulse current relative to the reverse pulse current signal at different time points, that is, the reverse pulse current signal is used as a feedback signal to obtain the deviation value between the actual value and the expected value of the anode pulse current according to the feedback signal, and further, the deviation value is used as the input variable of the PID control algorithm to achieve closed-loop regulation of the anode pulse current.

[0049] Step S302 , combining a preset PID control algorithm with the input variables of the PID control, performing closed-loop feedback regulation on the anode pulse current, and calculating the proportional regulation amount, integral regulation amount, and differential regulation amount of the anode pulse current.

[0050] Among them, the proportional adjustment amount represents the instantaneous correction amount directly calculated by the PID control algorithm, which is used to quickly adjust the anode pulse current. For example, when the deviation value is large, the proportional adjustment amount will increase accordingly, so that the circuit system will immediately adjust the anode pulse current.

[0051] Among them, the integral adjustment amount represents the long-term correction amount calculated by the PID control algorithm based on the accumulated value of historical errors. It is used to eliminate steady-state deviations caused by persistent errors. For example, when the anode pulse current is lower than the expected value for a long time, the integral adjustment amount will gradually increase to compensate for the long-term error.

[0052] Among them, the differential adjustment amount represents the predicted correction amount calculated by the PID control algorithm based on the error change rate, which is used to adjust the anode pulse current in advance to prevent the system from over-adjusting or oscillating. For example, when the deviation value changes too quickly, the differential adjustment amount will increase to reduce or increase the adjustment force in advance, so that the circuit system can smoothly adjust the anode pulse current.

[0053] For example, in the PID control algorithm, the proportional regulation amount corresponding to the anode pulse current is calculated by the instantaneous value of the deviation value of the anode pulse current at each time point; the integral regulation amount corresponding to the anode pulse current is calculated by the cumulative value of the deviation value of the anode pulse current at each time point; and the differential regulation amount corresponding to the anode pulse current is calculated by the rate of change of the deviation value of the anode pulse current at each time point.

[0054] In step S303, the electrical parameters of the anode pulse current are adjusted in a closed loop by combining the proportional adjustment amount, the integral adjustment amount and the differential adjustment amount of the anode pulse current until the adjusted anode pulse current matches the dynamic characteristics of the reverse pulse current signal, and the adjusted anode pulse current is used as the adjusted anode pulse current.

[0055] Among them, the dynamic characteristics of the reverse pulse current signal represent the electrical characteristics such as amplitude, frequency, waveform shape, etc. exhibited by the reverse pulse current signal during time change, which are used as the target state of the closed-loop regulation of the anode pulse current.

[0056] Exemplarily, the electrical parameters of the anode pulse current are closed-loop adjusted based on the proportional adjustment amount, integral adjustment amount and differential adjustment amount of the anode pulse current, that is: first, the instantaneous amplitude of the anode pulse current is directly corrected by the proportional adjustment amount so that it can quickly approach the expected value; secondly, the long-term deviation of the anode pulse current is compensated by the integral adjustment amount to ensure that the current output can be maintained within a stable set range; thirdly, the changing trend of the anode pulse current is predicted by the differential adjustment amount, and adjustments are made in advance to avoid large deviations or oscillations in the circuit system.

[0057] For example, during the closed-loop regulation process, it is necessary to continuously monitor the changes in the anode pulse current and continuously update the input variables of the PID control so as to adjust the parameters of the PID control algorithm in real time and improve the accuracy and stability of the regulation. Ultimately, if the dynamic characteristics of the adjusted anode pulse current match the reverse pulse current signal, it means that the circuit system has reached a stable state, and the adjusted anode pulse current can be used as the adjusted anode pulse current.

[0058] In this embodiment, first, the deviation value of the anode pulse current is calculated based on the difference in electrical parameters between the reverse pulse current signal and the anode pulse current, and is used as the input variable of the PID control, so that the degree of deviation between the anode pulse current and the expected value can be quantified in real time, providing accurate error information for closed-loop feedback regulation; secondly, the proportional regulation amount, integral regulation amount and differential regulation amount of the anode pulse current are calculated in combination with the PID control algorithm and the input deviation value, and the electrical parameters of the anode pulse current are dynamically adjusted, so that the current error, historical error and error change trend can be comprehensively considered, so that the adjustment process can respond quickly and avoid overshoot and steady-state errors; thirdly, the electrical parameters of the anode pulse current are continuously adjusted until its dynamic characteristics match the reverse pulse current signal, thereby achieving high-precision adaptive regulation of the anode pulse current.

[0059] In an exemplary embodiment, based on the electrical coupling relationship between the anode pulse current density and the cathode region, determining the cathode potential variation trend of the cathode region includes steps S401 to S403.

[0060] In step S401 , correlation analysis is performed on the anode pulse current density and the cathode region at the electrical parameter level to obtain the effect characteristics of the anode pulse current density on the cathode region.

[0061] The effect characteristics of the anode pulse current density on the cathode region represent the relationship between the influence of the change of the anode pulse current density on the cathode electric field distribution and the metal deposition rate in the cathode region.

[0062] For example, the correlation analysis method can be used to compare the changing trends between the anode pulse current density and the electrical parameters of the cathode region to determine how the anode pulse current density affects the electrical state of the cathode region, thereby extracting the effect characteristics of the anode pulse current density on the cathode region, that is, the effect characteristics include how the change of the anode pulse current density affects the potential distribution of the cathode region, and how the dynamic adjustment of the anode pulse current density at different time points changes the charge transfer situation in the cathode region.

[0063] Step S402 , according to the action characteristics of the anode pulse current density, in a preset dynamic calculation equation based on cathode potential change, the cathode potential change rate of the cathode region in a preset time period is calculated.

[0064] Among them, the dynamic calculation equation based on the change of cathode potential represents a mathematical model used to describe the change of cathode potential over time. For example, this dynamic calculation equation can consider how the anode pulse current density affects the charge accumulation at the electrode interface, thereby calculating the instantaneous change of cathode potential.

[0065] For example, first, a dynamic calculation equation based on the change of cathode potential is constructed in advance based on factors such as electrochemical reaction kinetics, electrode polarization, ion diffusion, and solution conductivity; secondly, the action characteristics of the anode pulse current density are input into the dynamic calculation equation for data processing, so as to combine the influence of the anode pulse current density on the cathode potential and comprehensively solve the rate of change of the cathode potential at different time points, that is, the rate of change of the cathode potential in the cathode area during a preset time period.

[0066] Step S403 , combining the cathode polarization process of the cathode region with the physical characteristics of the metal deposition process, performing trend fitting processing on the cathode potential change rate of the cathode region in a preset period of time to obtain the cathode potential change trend of the cathode region.

[0067] Among them, the physical characteristics of the cathodic polarization process and the metal deposition process in the cathode region represent the electrochemical mechanisms involved in the cathodic polarization process and the deposition of metal ions on the cathode surface, including electrode surface reaction kinetics, diffusion process, charge transfer effect and other characteristics.

[0068] Exemplarily, based on the cathode potential change rate of the cathode region in a preset time period, a time series of the cathode potential change rate is preliminarily constructed, and the cathode potential change rate of the cathode potential is smoothed to eliminate the influence of instantaneous noise; furthermore, on the basis of the preliminarily constructed time series of the cathode potential change rate, the time series of the cathode potential change rate can be regressed and analyzed by a curve fitting method in combination with the cathode polarization process of the cathode region and the physical characteristics of the metal deposition process to further obtain the cathode potential change trend of the cathode region, namely: on the one hand, the influence of the cathode polarization process on the cathode potential change needs to be considered, such as introducing polarization impedance and metal ion diffusion effect, to ensure that the cathode potential change trend after fitting can accurately reflect the actual cathode polarization process; on the other hand, the influence of the cathode metal deposition process on the cathode potential change needs to be considered, such as introducing the kinetic characteristics of the metal deposition process, to ensure that the cathode potential change trend after fitting can accurately reflect the actual deposition process.

[0069] In this embodiment, first, the correlation between the anode pulse current density and the cathode area at the electrical parameter level is analyzed to obtain the effect characteristics of the anode pulse current density on the cathode area, so that the influence of the anode pulse current density on the cathode area potential can be accurately quantified; secondly, based on the effect characteristics of the anode pulse current density, the cathode potential change rate of the cathode area in a preset time period is calculated in the dynamic calculation equation, so that the dynamic change of the cathode potential can be obtained in real time, thereby improving the accuracy of the cathode potential prediction; thirdly, combining the cathode polarization process with the physical characteristics of metal deposition, the cathode potential change rate is trend fitted, thereby optimizing the change trend of the cathode potential, so that the cathode potential change trend is more matched with the cathode characteristics in the pulse electroplating process.

[0070] In an exemplary embodiment, compensation processing is performed on the time series of the anode pulse current density based on the cathode potential variation trend to obtain a current density adjustment strategy, including steps S501 to S503.

[0071] Step S501 : Based on a cathode steady-state potential reference preset in the cathode region, a deviation calculation process is performed on the cathode potential variation trend to obtain a dynamic deviation of the cathode potential.

[0072] Among them, the cathode steady-state potential reference represents the reference potential value when the cathode area maintains an electrochemically stable state during the pulse electroplating process, and is used to evaluate whether the real-time change of the cathode potential deviates from the optimal working state.

[0073] The dynamic deviation of the cathode potential represents the degree of deviation of the cathode potential from the cathode steady-state potential reference at different time points.

[0074] For example, first, the cathode steady-state potential reference in the cathode region can be determined based on the electrochemical stability of the cathode region to reflect the potential level that the cathode region should maintain under optimal deposition conditions; secondly, the cathode steady-state potential reference is compared with the cathode potential change trend at different time points, and the deviation between the two is calculated to obtain the dynamic deviation of the cathode potential in the period corresponding to the cathode potential change trend.

[0075] Step S502 , calculating the compensation coefficient of the anode pulse current density according to the dynamic deviation of the cathode potential, and performing segmented compensation processing on the time series of the anode pulse current density in combination with the preset segmented interpolation algorithm and the compensation coefficient to obtain the compensated anode pulse current density.

[0076] The compensation coefficient of the anode pulse current density represents the adjustment ratio of the anode pulse current density calculated according to the dynamic deviation of the cathode potential, and is used to adjust the anode pulse current density at different pulse time points.

[0077] The segmented interpolation algorithm represents a mathematical method for smoothly calculating the changes in the anode pulse current density in different time periods, and is used to optimize the continuity and stability of the anode pulse current density.

[0078] For example, based on the electrical coupling relationship between the anode pulse current density and the cathode area, the compensation coefficient of the anode pulse current density is calculated from the dynamic deviation of the cathode potential. That is, while ensuring that the compensated anode pulse current density can effectively offset the dynamic deviation of the cathode potential within the specified time period, the compensation coefficient of the anode pulse current density in different time windows within the specified time period is calculated. Furthermore, the time series of the anode pulse current density is divided into anode pulse current density data of multiple time windows, and then an interpolation calculation method is used to perform segmented compensation processing on the anode pulse current density data of the corresponding time windows based on the compensation coefficients of the anode pulse current density in different time windows, so as to ensure that the compensated anode pulse current density can adapt to the fluctuation characteristics of the cathode potential at different time points.

[0079] Step S503 , using the optimal distribution of the compensated anode pulse current density within the pulse electroplating cycle as a current density adjustment strategy.

[0080] For example, based on the optimal spatial distribution of the compensated anode pulse current density during the pulse electroplating cycle, it is possible to ensure that the anode pulse current density changes stably in different sub-areas of the anode area, thereby determining the current density adjustment strategy so that the entire anode surface can adaptively and stably participate in the current supply, avoiding deposition defects caused by obvious local current mutations.

[0081] In this embodiment, first, the deviation of the cathode potential change trend is calculated based on the cathode steady-state potential reference to obtain the dynamic deviation of the cathode potential, so that the fluctuation of the cathode potential can be accurately quantified; secondly, the compensation coefficient of the anode pulse current density is calculated based on the dynamic deviation of the cathode potential, and the time series of the anode pulse current density is compensated using a segmented interpolation algorithm, so as to ensure that the anode pulse current density can dynamically adapt to the changes in the cathode potential and optimize the current supply state; thirdly, the optimal distribution mode of the compensated anode pulse current density within the pulse electroplating cycle is used as the current density adjustment strategy, so as to optimize the current distribution within the pulse electroplating cycle and achieve a reasonable configuration of the anode pulse current in spatial distribution.

[0082] In an exemplary embodiment, the optimal distribution of the compensated anode pulse current density within the pulse electroplating cycle is used as a current density adjustment strategy, including steps S601 to S603.

[0083] Step S601 : determining the distribution weights of the compensated anode pulse current density in different sub-regions of the anode region based on the variation characteristics of the compensated anode pulse current density during the pulse electroplating cycle.

[0084] Among them, the change characteristics represent the fluctuation characteristics of the compensated anodic pulse current density during the pulse electroplating cycle, such as the time change trend, instantaneous fluctuation, maximum value, minimum value, change rate and other parameters of the anodic pulse current density, to reflect the possible sudden change or drastic fluctuation of the anodic pulse current density.

[0085] The distribution weight is used to measure the degree of influence of the anode pulse current density on different sub-regions of the anode region at the level of change characteristics.

[0086] For example, first, a time series analysis is performed on the compensated anodic pulse current density to obtain the time variation trend, instantaneous fluctuation, maximum value, minimum value, and variation rate of the compensated anodic pulse current density during the pulse plating cycle. These variation characteristics can reflect the drastic changes that may occur in the compensated anodic pulse current density in certain time periods. Furthermore, based on the degree of influence of the variation characteristics of the compensated anodic pulse current density on different sub-regions of the anodic region, the distribution weights of the compensated anodic pulse current density in different sub-regions of the anodic region are calculated. For example, in a certain time period, for sub-regions where the current density increases sharply, there may be a phenomenon of high current density load. In this case, a lower distribution weight should be assigned to these sub-regions to drive the current density of these sub-regions to decrease according to the lower distribution weight, thereby ensuring the stability of the current supply. On the contrary, for sub-regions where the current density is relatively stable, a more balanced distribution weight should be assigned to these sub-regions to maintain a balanced change in the current density of these sub-regions as a whole, thereby ensuring the balance of the current supply.

[0087] Step S602: Based on the distribution weights of the compensated anode pulse current density in different sub-regions of the anode region, a current density distribution matrix corresponding to the compensated anode pulse current density is generated, where each element value in the current density distribution matrix represents the expected current density value of the corresponding sub-region.

[0088] Among them, the current density distribution matrix represents a matrix that quantitatively expresses the current density values ​​expected to be distributed in each sub-region of the anode region. Each element in the matrix corresponds to a sub-region, and each element value corresponds to the anode pulse current density that should be applied to the corresponding sub-region, that is, the expected current density value.

[0089] Exemplarily, based on the distribution weights of the compensated anode pulse current density in different sub-regions of the anode region, the expected current density values ​​corresponding to each sub-region are determined. For example, within a certain time period, if a sub-region is assigned a higher distribution weight, the current current density value of the sub-region can be increased accordingly, so that the increased current density value can be used as the expected current density value corresponding to the sub-region, that is, the expected current density value is used as the optimal setting of the current density value of the sub-region within the time period, so as to adapt to the optimal adjustment made to the current density value of the sub-region based on the changing characteristics of the anode pulse current density in the sub-region within the time period.

[0090] Exemplarily, based on the physical position relationship between the sub-regions of the anode region, each sub-region is mapped to each element position of the current density distribution matrix according to the corresponding physical position relationship, and the current density distribution matrix corresponding to each sub-region is used as the element value at the corresponding element position.

[0091] Step S603, based on the preset current control criterion, the current density distribution matrix is ​​constrained and solved to obtain the anode pulse current density that meets the current control criterion, and the distribution of the anode pulse current density that meets the current control criterion within the pulse electroplating cycle is used as the current density adjustment strategy.

[0092] Among them, the current control criterion represents the control rules and optimization objectives that need to be met when optimizing and solving the constraints of the current density distribution matrix. It is used to ensure that the final anode pulse current density distribution meets the current supply requirements and avoids local current overload or shortage problems.

[0093] For example, in the current control criterion, the constraints of the current density distribution matrix can be solved based on multiple aspects such as current uniformity requirements, electrode polarization control targets, current supply stability, and energy efficiency optimization. The current density values ​​in the current density distribution matrix can be adjusted based on linear programming or nonlinear optimization algorithms, that is, based on the expected current density values ​​of each sub-region, the adjustable range corresponding to the current density values ​​of each sub-region is determined (such as the numerical range between the current current density value and the expected current density value of a sub-region can be used as the adjustable range corresponding to the current density value of the sub-region), and then based on the current control criterion, the current density value of each sub-region is adjusted within the adjustable range corresponding to the current density value of each sub-region to obtain the anode pulse current density that meets the current control criterion within a certain time period, and then based on the anode pulse current density that meets the current control criterion in each time period within the pulse electroplating cycle, the current density adjustment strategy is obtained.

[0094] In this embodiment, first, the distribution weights of the compensated anode pulse current density in different sub-regions of the anode region are determined based on the variation characteristics of the anode pulse current density during the pulse electroplating cycle, so that the dynamic impact of the anode pulse current density on each sub-region can be accurately measured, and the spatial distribution of the current in the anode region can be optimized; secondly, a current density distribution matrix is ​​generated based on the distribution weights, so that each element in the matrix corresponds to the expected current density value of the sub-region, so that the current supply demand of each sub-region can be quantified; thirdly, the current density distribution matrix is ​​constrained and solved according to the current control criterion to obtain the anode pulse current density that meets the current control criterion, so that the final distribution of the anode pulse current density can be optimized, so that the current distribution meets the stability requirements.

[0095] In an exemplary embodiment, based on a preset current control criterion, a constraint solving is performed on a current density distribution matrix to obtain an anode pulse current density that satisfies the current control criterion, including steps S701 and S702.

[0096] Step S701 : determining the constraints in the current control criterion, where the constraints include the total current density limit, the spatial uniformity requirement, and the dynamic balance requirement of the anode and cathode potentials.

[0097] The total current density limit means that the total supply of the anode pulse current density must be controlled within a specific range to ensure that the overall current load does not exceed the design capacity.

[0098] The spatial uniformity requirement means that the anode pulse current density should be distributed as evenly as possible in different sub-regions of the anode region to avoid excessive or low local current concentration.

[0099] Among them, the dynamic balance requirement of the potential between the anode and the cathode means that the distribution of the anode pulse current density must keep the potential between the anode and the cathode within a reasonable range to avoid the unstable electric field distribution affecting the stability of the electroplating process.

[0100] Step S702 , combining the constraint conditions with the matrix elements in the current density distribution matrix, generating a current density constraint equation group corresponding to the current density distribution matrix, optimizing and solving the current density constraint equation group, and obtaining the anode pulse current density that meets the current control criterion.

[0101] For example, first, when constructing a set of current density constraint equations, it is necessary to convert the total current density limit, the spatial uniformity requirement, and the dynamic balance requirement of the anode and cathode potential into mathematical expressions and associate them with the matrix elements in the current density distribution matrix, wherein: first, under the constraint conditions corresponding to the total current density limit, the total current density constraint equation can be set to adjust the current density value of each sub-region within an adjustable range to ensure that the sum of the current densities of each sub-region is equal to the set total current supply, and ensure that the total amount does not exceed the upper limit of the current supply capacity; secondly, under the constraint conditions corresponding to the spatial uniformity requirement, the spatial uniformity constraint equation of current density can be set to adjust the current density value of each sub-region within an adjustable range to adjust the current density difference between adjacent sub-regions and avoid uneven coating thickness due to local current density mutations; thirdly, under the constraint conditions corresponding to the dynamic balance requirement of the anode and cathode potential, the current density value of each sub-region can be adjusted within an adjustable range by setting the dynamic balance equation of the anode and cathode potential to ensure that the current supply of the anode region does not cause large fluctuations in the cathode potential, thereby maintaining the electrochemical stability of the anode region and the cathode region. After constructing the current density constraint equation groups corresponding to the respective constraint conditions, each current density constraint equation group is optimized and solved to obtain the anode pulse current density that simultaneously satisfies the constraint conditions corresponding to each current density constraint equation group.

[0102] In this embodiment, the constraints in the current control criterion are combined with the matrix elements in the current density distribution matrix to generate a set of current density constraint equations corresponding to the current density distribution matrix and optimize and solve them to obtain the anode pulse current density that meets the current control criterion, thereby achieving precise regulation of the anode pulse current density, improving the balance of the current supply, optimizing the coating quality, and ensuring the stable operation of the electroplating process.

[0103] It should be understood that, although the various steps in the flowcharts involved in the various embodiments described above are displayed in sequence according to the instructions of the arrows, these steps are not necessarily executed in sequence in the order indicated by the arrows. Unless otherwise specified herein, there is no strict order restriction on the execution of these steps, and these steps can be executed in other orders. Moreover, at least a portion of the steps in the flowcharts involved in the various embodiments described above can include multiple steps or multiple stages, and these steps or stages are not necessarily executed and completed at the same time, but can be executed at different times, and the execution order of these steps or stages is not necessarily to be carried out in sequence, but can be executed in turn or alternately with other steps or at least a portion of steps or stages in other steps.

[0104] Based on the same inventive concept, the present application also provides an anodic pulse plating current density regulating device for implementing the above-mentioned anodic pulse plating current density regulating method. The solution provided by the device is similar to the solution described in the above-mentioned method. Therefore, the specific limitations of one or more embodiments of the anodic pulse plating current density regulating device provided below can be found in the above-mentioned limitations of the anodic pulse plating current density regulating method, and will not be repeated here.

[0105] In an exemplary embodiment, Figure 2 As shown, a current density regulating device for anodic pulse plating is provided, comprising: a reverse modulation module 201, a closed-loop regulation module 202 and an analysis module 203, wherein: The reverse modulation module 201 is used to obtain the anode pulse current of the current period, and perform periodic reverse modulation on the anode pulse current based on a preset double pulse current mode to obtain a reverse pulse current signal; A closed-loop regulation module 202 is configured to perform closed-loop feedback regulation on the anode pulse current based on the reverse pulse current signal to obtain an adjusted anode pulse current, and obtain an anode pulse current density based on the electrical characteristics of the adjusted anode pulse current; The analysis module 203 is used to determine the cathode potential change trend of the cathode area based on the electrical coupling relationship between the anode pulse current density and the cathode area, and to compensate the time series of the anode pulse current density based on the cathode potential change trend to obtain a current density adjustment strategy. The current density adjustment strategy is used to maintain the anode pulse current density within a preset dynamic change range during the pulse electroplating cycle.

[0106] In an exemplary embodiment, the reverse modulation module 201 is also used to: perform pulse signal decomposition processing on the anode pulse current based on the time-frequency characteristics of the anode pulse current to obtain transient characteristic parameters of the anode pulse current; perform periodic reverse modulation on the anode pulse current in combination with the dual-pulse current mode and the transient characteristic parameters to obtain a pulse window in which the forward pulse and the reverse pulse alternate within a preset period; obtain an initial reverse pulse current signal based on the pulse window of the reverse pulse within the preset period, and adjust the duty cycle parameters of the initial reverse pulse current signal based on the electrode polarization characteristics of the anode region to obtain a reverse pulse current signal.

[0107] In an exemplary embodiment, the closed-loop regulation module 202 is also used to: obtain a deviation value of the anode pulse current based on the difference between the reverse pulse current signal and the anode pulse current at the electrical parameter level, and use the deviation value of the anode pulse current as the input variable of the PID control; perform closed-loop feedback regulation on the anode pulse current in combination with the preset PID control algorithm and the input variable of the PID control, and calculate the proportional regulation amount, integral regulation amount and differential regulation amount of the anode pulse current; perform closed-loop adjustment on the electrical parameters of the anode pulse current in combination with the proportional regulation amount, integral regulation amount and differential regulation amount of the anode pulse current until the adjusted anode pulse current matches the dynamic characteristics of the reverse pulse current signal, and use the adjusted anode pulse current as the adjusted anode pulse current.

[0108] In an exemplary embodiment, the analysis module 203 is also used to: perform correlation analysis on the anode pulse current density and the cathode area at the electrical parameter level to obtain the effect characteristics of the anode pulse current density on the cathode area; according to the effect characteristics of the anode pulse current density, in a preset dynamic calculation equation based on the cathode potential change, calculate the cathode potential change rate of the cathode area in a preset time period; combine the cathode polarization process of the cathode area with the physical characteristics of the metal deposition process, perform trend fitting processing on the cathode potential change rate of the cathode area in the preset time period, and obtain the cathode potential change trend of the cathode area.

[0109] In an exemplary embodiment, the analysis module 203 is also used to: perform deviation calculation processing on the cathode potential change trend based on the cathode steady-state potential reference preset in the cathode area to obtain the dynamic deviation of the cathode potential; calculate the compensation coefficient of the anode pulse current density according to the dynamic deviation of the cathode potential, and perform segmented compensation processing on the time series of the anode pulse current density in combination with the preset segmented interpolation algorithm and the compensation coefficient to obtain the compensated anode pulse current density; and use the optimal distribution mode of the compensated anode pulse current density within the pulse electroplating cycle as the current density adjustment strategy.

[0110] In an exemplary embodiment, the analysis module 203 is also used to: determine the distribution weights of the compensated anode pulse current density in different sub-regions of the anode region based on the change characteristics of the compensated anode pulse current density during the pulse electroplating cycle; generate a current density distribution matrix corresponding to the compensated anode pulse current density based on the distribution weights of the compensated anode pulse current density in different sub-regions of the anode region, wherein each element value in the current density distribution matrix represents the expected current density value of the corresponding sub-region; based on a preset current control criterion, perform constraint solving on the current density distribution matrix to obtain the anode pulse current density that meets the current control criterion, and use the distribution mode of the anode pulse current density that meets the current control criterion during the pulse electroplating cycle as the current density adjustment strategy.

[0111] In an exemplary embodiment, the analysis module 203 is also used to: determine the constraints in the current control criterion, the constraints including the total current density limit, the spatial uniformity requirement, and the dynamic balance requirement of the potential between the anode and the cathode; combine the constraints with the matrix elements in the current density distribution matrix to generate a current density constraint equation group corresponding to the current density distribution matrix, optimize and solve the current density constraint equation group to obtain the anode pulse current density that meets the current control criterion.

[0112] Each module in the above-mentioned current density adjustment device for anodic pulse plating can be implemented in whole or in part through software, hardware, or a combination thereof. Each module can be embedded in or independent of a processor in a computer device in the form of hardware, or can be stored in the memory of the computer device in the form of software, so that the processor can call and execute the corresponding operations of each module.

[0113] In an exemplary embodiment, a computer device is provided, including a memory and a processor. The memory stores a computer program, and the processor implements the steps in any of the above embodiments when executing the computer program.

[0114] In one embodiment, a computer-readable storage medium is provided, on which a computer program is stored. When the computer program is executed by a processor, the steps in any of the above embodiments are implemented.

[0115] Those skilled in the art will appreciate that all or part of the processes in the above-mentioned embodiments can be implemented by instructing the relevant hardware through a computer program. The computer program can be stored in a non-volatile computer-readable storage medium. When the computer program is executed, it can include the processes of the above-mentioned embodiments. In particular, any reference to memory, database, or other media used in the embodiments provided in this application can include at least one of non-volatile and volatile memory. Non-volatile memory can include read-only memory (ROM), magnetic tape, floppy disk, flash memory, optical memory, high-density embedded non-volatile memory, resistive random access memory (ReRAM), magnetic random access memory (MRAM), ferroelectric random access memory (FRAM), phase change memory (PCM), graphene memory, etc. Volatile memory can include random access memory (RAM) or external cache memory, etc. By way of illustration and not limitation, RAM can take various forms, such as static random access memory (SRAM) or dynamic random access memory (DRAM). The databases involved in the various embodiments provided herein may include at least one of a relational database and a non-relational database. Non-relational databases may include, but are not limited to, distributed databases based on blockchains. The processors involved in the various embodiments provided herein may be, but are not limited to, general-purpose processors, central processing units (CPUs), graphics processing units (GPUs), digital signal processors (DSPs), programmable logic devices (PLDs), data processing logic devices based on quantum computing, and the like.

[0116] The technical features of the above embodiments can be combined arbitrarily. In order to make the description concise, not all possible combinations of the technical features in the above embodiments are described. However, as long as there is no contradiction in the combination of these technical features, they should be considered to be within the scope of this specification.

[0117] The above-described embodiments merely represent several implementation methods of the present application. While the descriptions are relatively specific and detailed, they should not be construed as limiting the scope of the present application. It should be noted that a person of ordinary skill in the art may make various modifications and improvements without departing from the spirit of the present application, and these modifications and improvements fall within the scope of protection of the present application. Therefore, the scope of protection of the present application shall be determined by the appended claims.

Claims

1. A method for adjusting current density of anodic pulse plating, characterized in that: The method comprises: Obtaining the anode pulse current of the current period, and performing periodic reverse modulation on the anode pulse current based on a preset dual-pulse current mode to obtain a reverse pulse current signal; performing closed-loop feedback regulation on the anode pulse current based on the reverse pulse current signal to obtain an adjusted anode pulse current, and obtaining an anode pulse current density based on the electrical characteristics of the adjusted anode pulse current; Based on the electrical coupling relationship between the anode pulse current density and the cathode area, the cathode potential change trend of the cathode area is determined, and the time series of the anode pulse current density is compensated based on the cathode potential change trend to obtain a current density adjustment strategy. The current density adjustment strategy is used to maintain the anode pulse current density within a preset dynamic change range during the pulse electroplating cycle.

2. The method according to claim 1, characterized in that The step of periodically reverse-modulating the anode pulse current based on a preset dual-pulse current mode to obtain a reverse pulse current signal includes: Based on the time-frequency characteristics of the anode pulse current, the anode pulse current is subjected to pulse signal decomposition processing to obtain transient characteristic parameters of the anode pulse current; Combining the dual-pulse current mode with the transient characteristic parameters, the anode pulse current is periodically reverse-modulated to obtain a pulse window in which forward pulses and reverse pulses alternate within a preset period; An initial reverse pulse current signal is obtained based on a pulse window of the reverse pulse within the preset period, and a duty cycle parameter of the initial reverse pulse current signal is adjusted based on the electrode polarization characteristics of the anode region to obtain a reverse pulse current signal.

3. The method according to claim 1, characterized in that The performing closed-loop feedback regulation processing on the anode pulse current based on the reverse pulse current signal to obtain the regulated anode pulse current includes: Based on the difference in electrical parameters between the reverse pulse current signal and the anode pulse current, a deviation value of the anode pulse current is obtained, and the deviation value of the anode pulse current is used as an input variable for PID control; Combining a preset PID control algorithm with the input variables of the PID control, performing closed-loop feedback regulation processing on the anode pulse current, and calculating the proportional regulation amount, integral regulation amount, and differential regulation amount of the anode pulse current; Combined with the proportional adjustment amount, integral adjustment amount and differential adjustment amount of the anode pulse current, the electrical parameters of the anode pulse current are closed-loop adjusted until the adjusted anode pulse current matches the dynamic characteristics of the reverse pulse current signal, and the adjusted anode pulse current is used as the adjusted anode pulse current.

4. The method according to claim 1, wherein The determining of the cathode potential change trend of the cathode region based on the electrical coupling relationship between the anode pulse current density and the cathode region includes: Performing a correlation analysis between the anode pulse current density and the cathode region at the electrical parameter level to obtain the effect characteristics of the anode pulse current density on the cathode region; According to the action characteristics of the anode pulse current density, the cathode potential change rate of the cathode region in a preset time period is calculated in a preset dynamic calculation equation based on the cathode potential change; Combining the physical characteristics of the cathode polarization process and the metal deposition process of the cathode region, a trend fitting process is performed on the cathode potential change rate of the cathode region in a preset time period to obtain the cathode potential change trend of the cathode region.

5. The method according to claim 1, wherein The compensating process for the time series of the anode pulse current density based on the cathode potential variation trend to obtain a current density regulation strategy includes: Based on a cathode steady-state potential reference preset in the cathode region, performing deviation calculation processing on the cathode potential change trend to obtain a dynamic deviation of the cathode potential; Calculating the compensation coefficient of the anode pulse current density according to the dynamic deviation of the cathode potential, and performing segmented compensation processing on the time series of the anode pulse current density in combination with a preset segmented interpolation algorithm and the compensation coefficient to obtain a compensated anode pulse current density; The optimal distribution mode of the compensated anode pulse current density within the pulse electroplating cycle is used as the current density adjustment strategy.

6. The method according to claim 5, characterized in that The optimal distribution of the compensated anode pulse current density within the pulse electroplating cycle is used as a current density adjustment strategy, including: determining distribution weights of the compensated anodic pulse current density in different sub-regions of the anodic region based on a variation characteristic of the compensated anodic pulse current density during the pulse electroplating cycle; generating a current density distribution matrix corresponding to the compensated anode pulse current density based on the distribution weights of the compensated anode pulse current density in different sub-regions of the anode region, wherein each element value in the current density distribution matrix represents an expected current density value of the corresponding sub-region; Based on the preset current control criterion, the current density distribution matrix is ​​constrained and solved to obtain the anode pulse current density that meets the current control criterion. The distribution of the anode pulse current density that meets the current control criterion within the pulse electroplating cycle is used as the current density adjustment strategy.

7. The method according to claim 6, characterized in that The method of performing constraint solving on the current density distribution matrix based on a preset current control criterion to obtain an anode pulse current density that satisfies the current control criterion includes: Determining constraints in the current control criterion, wherein the constraints include a total current density limit, a spatial uniformity requirement, and a dynamic balance requirement of the potentials of the anode and cathode; Combining the constraint conditions with the matrix elements in the current density distribution matrix, a current density constraint equation group corresponding to the current density distribution matrix is ​​generated, and the current density constraint equation group is optimized and solved to obtain the anode pulse current density that meets the current control criterion.

8. A current density regulating device for anodic pulse plating, characterized in that: The device comprises: A reverse modulation module is used to obtain the anode pulse current of the current period, and based on a preset double-pulse current mode, periodically reverse modulate the anode pulse current to obtain a reverse pulse current signal; a closed-loop regulation module, configured to perform closed-loop feedback regulation processing on the anode pulse current based on the reverse pulse current signal to obtain an adjusted anode pulse current, and obtain an anode pulse current density based on the electrical characteristics of the adjusted anode pulse current; An analysis module is used to determine the cathode potential change trend of the cathode area based on the electrical coupling relationship between the anode pulse current density and the cathode area, and to compensate the time series of the anode pulse current density based on the cathode potential change trend to obtain a current density adjustment strategy. The current density adjustment strategy is used to maintain the anode pulse current density within a preset dynamic change range during the pulse electroplating cycle.

9. A computer device comprising a memory and a processor, wherein the memory stores a computer program, wherein: When the processor executes the computer program, the steps of the method according to any one of claims 1 to 7 are implemented.

10. A computer-readable storage medium having a computer program stored thereon, characterized in that: When the computer program is executed by a processor, the steps of the method according to any one of claims 1 to 7 are implemented.

Images