Composition, film, optical filter, solid-state imaging element, image display device, infrared sensor, camera module, and compound

Abstract

Provided is a composition containing an infrared absorbing dye (A) having a group represented by formula (1) or formula (2), a curable compound, and a solvent. Also provided are a film, an optical filter, a solid-state imaging element, an image display device, an infrared sensor, and a camera module using the composition. # imgabs0 #

Description

Technical Field

[0001] The present invention relates to a composition containing an infrared absorbing pigment. Furthermore, the present invention relates to a film, an optical filter, a solid-state imaging element, an image display device, an infrared sensor, and a camera module using the composition containing the infrared absorbing pigment. Furthermore, the present invention relates to a compound. Background Art

[0002] Video cameras, digital cameras, mobile phones with camera functions, and the like use solid-state imaging elements (CCDs) or CMOSs ​​(complementary metal oxide semiconductors) to capture color images. These solid-state imaging elements utilize silicon photodiodes, which are sensitive to infrared light, in their light-receiving sections. Therefore, infrared cutoff filters are sometimes used to correct for visibility.

[0003] The infrared cut filter is produced using a composition containing an infrared absorbing pigment. As the infrared absorbing pigment, squarylium pigments and the like are known.

[0004] Patent Document 1 describes the production of an infrared cut filter and the like using a composition containing a squarylium dye as an infrared absorbing dye.

[0005] Previous technical literature

[0006] Patent Literature

[0007] Patent Document 1: International Publication No. 2018 / 100834 Summary of the Invention

[0008] Technical issues to be solved by the invention

[0009] Infrared absorbing dyes tend to have low moisture resistance, and there is a demand for further improvement in the moisture resistance of films obtained using compositions containing infrared absorbing dyes.

[0010] Therefore, an object of the present invention is to provide a composition capable of forming a film having excellent moisture resistance. Another object of the present invention is to provide a film, an optical filter, a solid-state imaging element, an image display device, an infrared sensor, a camera module, and a compound.

[0011] Means for solving technical problems

[0012] The present invention provides the following contents.

[0013] <1> A composition comprising:

[0014] An infrared absorbing pigment (A) having a group represented by formula (1) or formula (2);

[0015] curing compound; and

[0016] solvents,

[0017] [Chemical Formula 1]

[0018]

[0019] In formula (1), R 1 ~R 6 Each independently represents a hydrogen atom or a substituent, R 1 ~R 6 Two adjacent groups in the group may be bonded to form a ring,

[0020] In formula (2), R 11 ~R 16 Each independently represents a hydrogen atom or a substituent, R 11 ~R 16 Two adjacent groups in the group can be bonded to form a ring, R 17 represents a hydrogen atom, an alkyl group, an alkenyl group or an aryl group.

[0021] <2> according to <1> The composition, wherein

[0022] The maximum absorption wavelength of the infrared absorbing dye A is within the wavelength range of 700 to 1500 nm.

[0023] <3> according to <1> or <2> The composition, wherein

[0024] The infrared absorbing dye A is at least one selected from pyrrolopyrrole compounds, squarylium compounds, crotonium compounds, rylene compounds, phthalocyanine compounds, naphthalocyanine compounds, indigo compounds, pyrromethene compounds, oxonol compounds, pyrylium compounds, and azulenium compounds.

[0025] <4> according to <1> or <2> The composition, wherein

[0026] The infrared absorbing pigment A is at least one selected from the group consisting of a compound represented by formula (PP-1), a compound represented by formula (SQ-1), and a compound represented by formula (CR-1).

[0027] [Chemical Formula 2]

[0028]

[0029] In formula (PP-1), R p1 ~R p6 Each independently represents a hydrogen atom or a substituent, R p1 ~R p6 Two adjacent groups in the group may be bonded to form a ring,

[0030] Ap1 represents a heteroaryl group,

[0031] B p1 and B p2 Each independently represents -BR 101 R 102 Ji, R 101 and R 102 Each independently represents a substituent, R 101 With R 102 can bond to each other to form a ring,

[0032] C p1 and C p2 Each independently represents an alkyl group, an aryl group or a heteroaryl group,

[0033] D p1 and D p2 Each independently represents a substituent,

[0034] In formula (SQ-1), R s1 ~R s6 Each independently represents a hydrogen atom or a substituent, R s1 ~R s6 Two adjacent groups in the group may be bonded to form a ring,

[0035] R s7 represents a hydrogen atom, an alkyl group, an alkenyl group or an aryl group,

[0036] R s10 represents a hydrogen atom, an alkyl group or a halogen atom, R s7 With R s10 can bond to form a ring,

[0037] A s1 represents a substituent,

[0038] In formula (CR-1), R c1 ~R c6 Each independently represents a hydrogen atom or a substituent, R c1 ~R c6 Two adjacent groups in the group may be bonded to form a ring,

[0039] R c7 represents a hydrogen atom, an alkyl group, an alkenyl group or an aryl group,

[0040] R c10 represents a hydrogen atom, an alkyl group or a halogen atom, R c7 With R c10 can bond to form a ring,

[0041] A c1 represents a substituent.

[0042] <5> according to <1> to <4> The composition described in any one of the preceding claims, wherein

[0043] The curable compound includes a polymerizable compound.

[0044] The above composition further contains a photopolymerization initiator.

[0045] <6> A membrane which is used <1> to <5> The composition described in any one of the above is obtained.

[0046] <7> A filter having <6> The membrane.

[0047] <8> A solid-state imaging element having <6> The membrane.

[0048] <9> An image display device having <6> The membrane.

[0049] <10> An infrared sensor having <6> The membrane.

[0050] <11> A camera module having <6> The membrane.

[0051] <12> A compound represented by formula (PP-1), formula (SQ-1) or formula (CR-1),

[0052] [Chemical Formula 3]

[0053]

[0054] In formula (PP-1), R p1 ~R p6 Each independently represents a hydrogen atom or a substituent, R p1 ~R p6 Two adjacent groups in the group may be bonded to form a ring,

[0055] A p1 represents a heteroaryl group,

[0056] B p1 and B p2 Each independently represents -BR 101 R 102 Ji, R 101 and R 102 Each independently represents a substituent, R 101 With R 102 can bond to each other to form a ring,

[0057] C p1 and C p2 Each independently represents an alkyl group, an aryl group or a heteroaryl group,

[0058] Dp1 and D p2 Each independently represents a substituent,

[0059] In formula (SQ-1), R s1 ~R s6 Each independently represents a hydrogen atom or a substituent, R s1 ~R s6 Two adjacent groups in the group may be bonded to form a ring,

[0060] R s7 represents a hydrogen atom, an alkyl group, an alkenyl group or an aryl group,

[0061] R s10 represents a hydrogen atom, an alkyl group or a halogen atom, R s7 With R s10 can bond to form a ring,

[0062] A s1 represents a substituent,

[0063] In formula (CR-1), R c1 ~R c6 Each independently represents a hydrogen atom or a substituent, R c1 ~R c6 Two adjacent groups in the group may be bonded to form a ring,

[0064] R c7 represents a hydrogen atom, an alkyl group, an alkenyl group or an aryl group,

[0065] R c10 represents a hydrogen atom, an alkyl group or a halogen atom, R c7 With R c10 can bond to form a ring,

[0066] A c1 represents a substituent.

[0067] Effects of the Invention

[0068] The present invention can provide a composition capable of forming a film having excellent moisture resistance, and can also provide a film, an optical filter, a solid-state imaging element, an image display device, an infrared sensor, a camera module, and a compound. BRIEF DESCRIPTION OF THE DRAWINGS

[0069] Figure 1 This is a schematic diagram showing one embodiment of an infrared sensor. DETAILED DESCRIPTION

[0070] Hereinafter, the contents of the present invention will be described in detail.

[0071] In this specification, “to” is used to mean that the numerical values ​​described before and after it are inclusive as the lower limit and the upper limit.

[0072] In the description of groups (atomic groups) in this specification, descriptions not marked with "substituted" or "unsubstituted" include groups (atomic groups) without substitution as well as groups (atomic groups) with substitution. For example, "alkyl" includes not only alkyl groups without substitution (unsubstituted alkyl groups) but also alkyl groups with substitution (substituted alkyl groups).

[0073] In this specification, "exposure" includes not only exposure using light, but also drawing using a particle beam such as an electron beam or ion beam, unless otherwise specified. Examples of light used for exposure include active light or radiation such as the bright line spectrum of a mercury lamp, far ultraviolet light represented by an excimer laser, extreme ultraviolet light (EUV light), X-rays, and electron beams.

[0074] In this specification, “(meth)acrylate” means both or either acrylate and methacrylate, “(meth)acrylic acid” means both or either acrylic acid and methacrylic acid, and “(meth)acryloyl” means both or either acryloyl and methacryloyl.

[0075] In this specification, the weight average molecular weight and the number average molecular weight are defined as polystyrene equivalent values ​​measured by gel permeation chromatography (GPC).

[0076] In the present specification, Me in the chemical formula represents a methyl group, Et represents an ethyl group, Bu represents a butyl group, and Ph represents a phenyl group.

[0077] In this specification, infrared rays refer to light (electromagnetic waves) with a wavelength of 700 to 2500 nm.

[0078] In this specification, the total solid content refers to the total mass of the components excluding the solvent from all the components of the composition.

[0079] In this specification, the term "process" includes not only independent processes but also processes that cannot be clearly distinguished from other processes as long as the intended effect of the process is achieved.

[0080] <Composition>

[0081] The composition of the present invention is characterized by comprising:

[0082] An infrared absorbing pigment (A) having a group represented by formula (1) or formula (2);

[0083] curing compound; and

[0084] solvent.

[0085] According to the composition of the present invention, a film with excellent moisture resistance can be formed. The reason for obtaining this effect can be speculated as follows. It is speculated that the group represented by formula (1) or formula (2) possessed by the infrared absorbing pigment A has a structure with a broad π conjugated plane. Therefore, by having such a group in the infrared absorbing pigment, the intermolecular interaction of the infrared absorbing pigment becomes stronger, and the infrared absorbing pigment easily forms an association during film formation. Therefore, it is speculated that the composition of the present invention containing the infrared absorbing pigment A having the above-mentioned group can further improve the cohesive force of the film during film formation and form a dense film. Therefore, it is speculated that water can be inhibited from entering the film. It is speculated that, for this reason, by using the composition of the present invention, a film with excellent moisture resistance can be formed.

[0086] The composition of the present invention can be used as a composition for an optical filter. Examples of optical filters include infrared cut filters and infrared transmission filters. The infrared absorbing dye A having a group represented by formula (1) or formula (2) has excellent visible light transmittance and infrared shielding properties, and therefore the composition of the present invention is particularly preferably used as a composition for an infrared cut filter.

[0087] Hereinafter, each component used in the composition of the present invention will be described.

[0088] <<Specific infrared absorbing pigment (infrared absorbing pigment A having a group represented by formula (1) or formula (2))>>

[0089] The composition of the present invention contains an infrared absorbing dye A (hereinafter also referred to as a specific infrared absorbing dye) having a group represented by formula (1) or formula (2).

[0090] [Chemical Formula 4]

[0091]

[0092] In formula (1), R 1 ~R 6 Each independently represents a hydrogen atom or a substituent, R 1 ~R 6 Two adjacent groups in the group may be bonded to form a ring,

[0093] In formula (2), R 11 ~R 16 Each independently represents a hydrogen atom or a substituent, R 11 ~R 16 Two adjacent groups in the group can be bonded to form a ring, R 17 represents a hydrogen atom, an alkyl group, an alkenyl group or an aryl group.

[0094] As R in formula (1) 1 ~R6 The substituent represented by, R 11 ~R 16 The substituent represented by includes the groups listed in the substituent T described later, and is preferably a halogen atom, an alkyl group, an alkenyl group, an alkoxy group, an aryl group, an aryloxy group, a heteroaryl group, a heteroaryloxy group, a thioalkyl group, a sulfo group, or a carboxyl group.

[0095] Examples of the halogen atom include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom.

[0096] The number of carbon atoms in the alkyl group is preferably 1 to 30, more preferably 1 to 20, and even more preferably 1 to 10. The alkyl group may be linear, branched, or cyclic. Furthermore, a cyclic alkyl group may be monocyclic or polycyclic. The alkyl group may have a substituent. Examples of the substituent include those listed below for the substituent T.

[0097] The number of carbon atoms in the alkenyl group is preferably 2 to 30, more preferably 2 to 20, and even more preferably 2 to 10. The alkenyl group may be either linear or branched. The alkenyl group may have a substituent. Examples of the substituent include the groups listed below for the substituent T.

[0098] The number of carbon atoms in the alkoxy group and the sulfanyl group is preferably 1 to 30, more preferably 1 to 20, and even more preferably 1 to 10. The alkoxy group and the sulfanyl group may have a substituent. Examples of the substituent include the groups listed in the substituent T described below.

[0099] The number of carbon atoms in the aryl group and the aryloxy group is preferably 6 to 30, more preferably 6 to 20, and even more preferably 6 to 12. The aryl group and the aryloxy group may have a substituent. Examples of the substituent include the groups listed in the substituent T described below.

[0100] The heteroaryl group and heteroaryloxy group are preferably monocyclic or fused rings having 2 to 8 fused rings, more preferably monocyclic or fused rings having 2 to 4 fused rings. The number of heteroatoms constituting the heteroaryl group and heteroaryloxy group is preferably 1 to 3. The heteroatoms constituting the heteroaryl group and heteroaryloxy group are preferably nitrogen, oxygen, or sulfur atoms. The number of carbon atoms constituting the heterocyclic ring is preferably 2 to 30, more preferably 2 to 18, and even more preferably 2 to 12. The heterocyclic ring is preferably a 5-membered ring or a 6-membered ring. The heteroaryl group and heteroaryloxy group may have a substituent. Examples of the substituent include the groups listed below for the substituent T.

[0101] In formula (1), R 1 ~R 6 Two adjacent groups in the formula (2) may be bonded to form a ring. 11 ~R 16Two adjacent groups in the group may be bonded to form a ring. The ring formed is preferably a 5-membered ring or a 6-membered ring. The ring formed may further have a substituent. As the substituent, the groups listed below for the substituent T may be mentioned, preferably a halogen atom, an alkyl group, an alkenyl group, an alkoxy group, an aryl group, an aryloxy group, a heteroaryl group, a heteroaryloxy group, a thioalkyl group, a sulfo group, or a carboxyl group.

[0102] R in formula (2) 17 represents a hydrogen atom, an alkyl group, an alkenyl group or an aryl group, preferably an alkyl group, an alkenyl group or an aryl group, more preferably an alkyl group or an alkenyl group.

[0103] The number of carbon atoms in the alkyl group is preferably 1 to 30, more preferably 1 to 20, and even more preferably 1 to 10. The alkyl group may be linear, branched, or cyclic. Furthermore, a cyclic alkyl group may be monocyclic or polycyclic. The alkyl group may have a substituent. Examples of the substituent include those listed below for the substituent T, preferably a halogen atom, an alkenyl group, an alkoxy group, an aryl group, an aryloxy group, a heteroaryl group, or a heteroaryloxy group.

[0104] The number of carbon atoms in the alkenyl group is preferably 2 to 30, more preferably 2 to 20, and even more preferably 2 to 10. The alkenyl group may be either linear or branched. The alkenyl group may have a substituent. Examples of the substituent include the groups listed below for the substituent T, preferably a halogen atom, an alkoxy group, an aryl group, an aryloxy group, a heteroaryl group, a heteroaryloxy group, a sulfanyl group, a sulfo group, or a carboxyl group.

[0105] The number of carbon atoms in the aryl group and the aryloxy group is preferably 6 to 30, more preferably 6 to 20, and even more preferably 6 to 12. The aryl group and the aryloxy group may have a substituent. Examples of the substituent include the groups listed below for the substituent T, preferably a halogen atom, an alkyl group, an alkenyl group, an alkoxy group, an aryl group, an aryloxy group, a heteroaryl group, a heteroaryloxy group, a thioalkyl group, a sulfo group, or a carboxyl group.

[0106] The specific infrared absorbing dye may have only one structure represented by formula (1) or formula (2), or may have two or more. The specific infrared absorbing dye preferably has one to four structures represented by formula (1) or formula (2), and more preferably one or two.

[0107] The specific infrared absorbing pigment is preferably at least one selected from pyrrolopyrrole compounds, squarylium compounds, croconium compounds, rylene compounds, phthalocyanine compounds, naphthalocyanine compounds, indigo compounds, pyrromethene compounds, oxocyanine compounds, pyrylium compounds and azulenium compounds, and more preferably at least one selected from pyrrolopyrrole compounds, squarylium compounds and croconium compounds.

[0108] The specific infrared absorbing pigment is preferably at least one selected from the group consisting of a compound represented by formula (PP-1), a compound represented by formula (SQ-1), and a compound represented by formula (CR-1). The compound represented by formula (PP-1) is a pyrrolopyrrole compound, the compound represented by formula (SQ-1) is a squarylium compound, and the compound represented by formula (CR-1) is a crotonium compound. The compounds represented by formula (PP-1), the compounds represented by formula (SQ-1), and the compounds represented by formula (CR-1) are also compounds of the present invention.

[0109] [Chemical Formula 5]

[0110]

[0111] In formula (PP-1), R p1 ~R p6 Each independently represents a hydrogen atom or a substituent, R p1 ~R p6 Two adjacent groups in the group may be bonded to form a ring,

[0112] A p1 represents a heteroaryl group,

[0113] B p1 and B p2 Each independently represents -BR 101 R 102 Ji, R 101 and R 102 Each independently represents a substituent, R 101 With R 102 can bond to each other to form a ring,

[0114] C p1 and C p2 Each independently represents an alkyl group, an aryl group or a heteroaryl group,

[0115] D p1 and D p2 Each independently represents a substituent.

[0116] In formula (SQ-1), R s1 ~R s6 Each independently represents a hydrogen atom or a substituent, R s1 ~R s6 Two adjacent groups in the group may be bonded to form a ring,

[0117] R s7 represents a hydrogen atom, an alkyl group, an alkenyl group or an aryl group,

[0118] R s10 represents a hydrogen atom, an alkyl group or a halogen atom, R s7 With R s10can bond to form a ring,

[0119] A s1 represents a substituent.

[0120] In formula (CR-1), R c1 ~R c6 Each independently represents a hydrogen atom or a substituent, R c1 ~R c6 Two adjacent groups in the group may be bonded to form a ring,

[0121] R c7 represents a hydrogen atom, an alkyl group, an alkenyl group or an aryl group,

[0122] R c10 represents a hydrogen atom, an alkyl group or a halogen atom, R c7 With R c10 can bond to form a ring,

[0123] A c1 represents a substituent.

[0124] -Regarding the compound represented by formula (PP-1)-

[0125] R of formula (PP-1) p1 ~R p6 Each independently represents a hydrogen atom or a substituent. p1 ~R p6 The substituent represented by can be exemplified as R in formula (1): 1 ~R 6 The preferred ranges of the substituents described above are also the same as those of the substituents represented.

[0126] R p1 ~R p6 Two adjacent groups in the group may be bonded to form a ring. The formed ring is preferably a 5-membered ring or a 6-membered ring. The formed ring may further have a substituent. As the substituent, the groups listed below for the substituent T may be mentioned, preferably a halogen atom, an alkyl group, an alkoxy group, an aryl group, an aryloxy group, a heteroaryl group, a heteroaryloxy group, a thioalkyl group, a sulfo group, or a carboxyl group.

[0127] A of formula (PP-1) p1Represents a heteroaryl group. The number of carbon atoms constituting the ring of the heteroaryl group is preferably 1 to 30, more preferably 1 to 12. As the type of heteroatoms constituting the ring of the heteroaryl group, nitrogen atoms, oxygen atoms and sulfur atoms can be mentioned. As the number of heteroatoms constituting the ring of the heteroaryl group, 1 to 3 are preferably used, more preferably 1 to 2. The heteroaryl group is preferably a monocyclic ring or a condensed ring, more preferably a monocyclic ring or a condensed ring with a condensed number of 2 to 8, and further preferably a monocyclic ring or a condensed ring with a condensed number of 2 to 4. The heteroaryl group may have a substituent. As the substituent, the groups listed in the substituent T described later can be mentioned, preferably a halogen atom, an alkyl group, an alkenyl group, an alkoxy group, an aryl group, an aryloxy group, a heteroaryl group, a heteroaryloxy group, a thioalkyl group, a sulfo group or a carboxyl group. A of formula (1) p1 The heteroaryl group represented by is preferably a group represented by formula (1). According to this embodiment, the moisture resistance of the obtained film can be further improved.

[0128] B of formula (PP-1) p1 and B p2 Each independently represents -BR 101 R 102 Ji, R 101 and R 102 Each independently represents a substituent. 101 and R 102 Examples of the substituents represented by include halogen atoms, alkyl groups, alkenyl groups, alkoxy groups, aryl groups, aryloxy groups, heteroaryl groups, and heteroaryloxy groups. Preferably, it is an alkyl group, alkoxy group, aryl group, aryloxy group, heteroaryl group, or heteroaryloxy group, and more preferably, it is an aryl group.

[0129] Examples of the halogen atom include a fluorine atom, a chlorine atom, a bromine atom and an iodine atom, and a fluorine atom is preferred.

[0130] The number of carbon atoms in the alkyl group is preferably 1 to 10, more preferably 1 to 5. The alkyl group may be linear, branched, or cyclic, preferably linear or branched, and more preferably linear. The alkyl group may or may not be substituted. Examples of substituents include aryl groups, heteroaryl groups, and halogen atoms.

[0131] The number of carbon atoms in the alkenyl group is preferably 2 to 10, more preferably 2 to 5. The alkenyl group is preferably linear or branched, more preferably linear. The alkenyl group may or may not be substituted. Examples of substituents include aryl groups, heteroaryl groups, and halogen atoms.

[0132] The number of carbon atoms in the alkoxy group is preferably 1 to 10, more preferably 1 to 5. The alkoxy group may be straight-chain or branched, preferably straight-chain. The alkoxy group may or may not be substituted. Examples of the substituent include aryl groups, heteroaryl groups, and halogen atoms.

[0133] The number of carbon atoms in the aryl group and the aryloxy group is preferably 6 to 30, more preferably 6 to 20, and even more preferably 6 to 12. The aryl group and the aryloxy group may be substituted or unsubstituted. Examples of the substituent include an alkyl group, an alkoxy group, and a halogen atom.

[0134] The number of carbon atoms constituting the ring of the heteroaryl group and the heteroaryloxy group is preferably 1 to 30, more preferably 1 to 12. Examples of the types of heteroatoms constituting the ring of the heteroaryl group and the heteroaryloxy group include nitrogen atoms, oxygen atoms, and sulfur atoms. The number of heteroatoms constituting the ring of the heteroaryl group and the heteroaryloxy group is preferably 1 to 3, more preferably 1 to 2. The heteroaryl group and the heteroaryloxy group are preferably monocyclic or condensed rings, more preferably monocyclic or condensed rings with 2 to 8 condensed rings, and further preferably monocyclic or condensed rings with 2 to 4 condensed rings. The heteroaryl group and the heteroaryloxy group may have a substituent or may be unsubstituted. Examples of the substituent include an alkyl group, an alkoxy group, a halogen atom, and the like.

[0135] R 101 With R 102 They may be bonded to each other to form a ring. The formed ring is preferably a 5-membered ring or a 6-membered ring. The formed ring may further have a substituent. Examples of the substituent include the groups listed below for the substituent T, preferably a halogen atom, an alkyl group, an alkenyl group, an alkoxy group, an aryl group, an aryloxy group, a heteroaryl group, a heteroaryloxy group, a thioalkyl group, a sulfo group, or a carboxyl group.

[0136] C p1 and C p2 Each independently represents an alkyl group, an aryl group or a heteroaryl group, preferably an alkyl group or an aryl group, more preferably an aryl group.

[0137] The number of carbon atoms in the alkyl group is preferably 1 to 30, more preferably 1 to 20, and even more preferably 1 to 10. The alkyl group may be any of linear, branched, and cyclic, preferably linear or branched. The alkyl group may have a substituent. Examples of the substituent include the groups listed in the substituent T described below, including a halogen atom, a hydroxyl group, an aryl group, and the like. Furthermore, the alkyl group may have a group represented by formula (R-101) as a substituent.

[0138] The number of carbon atoms in the aryl group is preferably 6 to 30, more preferably 6 to 20, and even more preferably 6 to 12. The aryl group may have a substituent. Examples of the substituent include the groups listed below for the substituent T, such as a halogen atom, a hydroxyl group, an alkyl group, an alkoxy group, and an aryl group. Furthermore, the aryl group may have a group represented by formula (R-101) as a substituent.

[0139] The number of carbon atoms constituting the ring of the heteroaryl group is preferably 1 to 30, more preferably 1 to 12. As the type of heteroatoms constituting the ring of the heteroaryl group, nitrogen atoms, oxygen atoms and sulfur atoms can be mentioned. As the number of heteroatoms constituting the ring of the heteroaryl group, 1 to 3 are preferably used, more preferably 1 to 2. The heteroaryl group is preferably a monocyclic ring or a condensed ring, more preferably a monocyclic ring or a condensed ring with a condensed number of 2 to 8, and further preferably a monocyclic ring or a condensed ring with a condensed number of 2 to 4. The heteroaryl group may have a substituent. As the substituent, the groups listed in the substituent T described later can be mentioned, and halogen atoms, hydroxyl groups, alkyl groups, alkoxy groups, aryl groups and the like can be mentioned. In addition, it may have a group represented by formula (R-101) as a substituent.

[0140] -L r101 -R r101 …(R-101)

[0141] In formula (R-101), L r101 represents a single bond or a divalent connecting group, R r101 It represents the group represented by the above-mentioned formula (1).

[0142] As L r101 Examples of the divalent linking group represented by include alkylene, arylene, -CR L11 =CR L12 -, -C≡C-, -O-, -CO-, -COO-, -OCO-, -NHCO-, -NHCOO-, -CONH-, -OCONH-, -S-, -SO2-, -OSO2-, and a group formed by combining two or more of these. L11 and R L12 Each independently represents a hydrogen atom or an alkyl group.

[0143] The number of carbon atoms in the alkylene group is preferably 1 to 10, more preferably 1 to 5. The number of carbon atoms in the arylene group is preferably 6 to 30, more preferably 6 to 20, and even more preferably 6 to 12.

[0144] D of formula (PP-1) p1 and D p2 Each independently represents a substituent. As the substituent, the groups described in the substituent T described later can be cited. p1 and D p2 The substituent represented is preferably a cyano group, an acyl group, an alkoxycarbonyl group, an aryloxycarbonyl group, a sulfamoyl group or a sulfinyl group, and more preferably a cyano group.

[0145] The compound represented by formula (PP-1) is preferably a compound represented by formula (PP-2).

[0146] [Chemical Formula 6]

[0147]

[0148] In formula (PP-2), R p1a ~R p6a 、R p1b ~R p6b Each independently represents a hydrogen atom or a substituent, R p1a ~R p6a Two adjacent groups in the group can be bonded to form a ring, R p1b ~R p6b Two adjacent groups in the group may be bonded to form a ring,

[0149] B p1 and B p2 Each independently represents -BR 101 R 102 Ji, R 101 and R 102 Each independently represents a substituent, R 101 With R 102 can bond to each other to form a ring,

[0150] C p1 and C p2 Each independently represents an alkyl group, an aryl group or a heteroaryl group,

[0151] D p1 and D p2 Each independently represents a substituent.

[0152] R of formula (PP-2) p1a ~R p6a and R p1b ~R p6b The meaning is the same as R in formula (PP-1) p1 ~R p6 The meanings and preferred ranges are the same. p1 、B p2 、C p1 、C p2 、D p1 and D p2 With B of formula (PP-1) p1 、B p2 、C p1 、C p2 、D p1 and D p2 The meanings and preferred ranges are the same.

[0153] -Regarding the compound represented by formula (SQ-1)-

[0154] In formula (SQ-1), R s1 ~R s6 Each independently represents a hydrogen atom or a substituent.s1 ~R s6 The substituent represented by can be exemplified as R in formula (2): 11 ~R 16 The preferred ranges of the substituents described above are also the same as those of the substituents represented.

[0155] R s1 ~R s6 Two adjacent groups in the group may be bonded to form a ring. The ring formed is preferably a 5-membered ring or a 6-membered ring. The ring formed may further have a substituent. As the substituent, the groups listed below for the substituent T may be mentioned, preferably a halogen atom, an alkyl group, an alkenyl group, an alkoxy group, an aryl group, an aryloxy group, a heteroaryl group, a heteroaryloxy group, a thioalkyl group, a sulfo group, or a carboxyl group.

[0156] R in formula (SQ-1) s7 R represents a hydrogen atom, an alkyl group, an alkenyl group or an aryl group, preferably an alkyl group, an alkenyl group or an aryl group, more preferably an alkyl group or an alkenyl group. s7 The preferred ranges of the alkyl, alkenyl and aryl groups represented by 17 The preferred ranges of the alkyl, alkenyl, and aryl groups are the same.

[0157] In formula (SQ-1), R s7 With R s10 The alkyl radicals may be bonded to form a ring. The formed ring is preferably a 5-membered ring or a 6-membered ring. The formed ring may further have a substituent. Examples of the substituent include the groups listed below for the substituent T, preferably a halogen atom, an alkyl group, an alkenyl group, an alkoxy group, an aryl group, an aryloxy group, a heteroaryl group, a heteroaryloxy group, a thioalkyl group, a sulfo group, or a carboxyl group.

[0158] A in formula (SQ-1) s1 A represents a substituent. s1 The substituent represented is preferably an aryl group, a heterocyclic group or a group represented by formula (A-100), and more preferably a group represented by formula (A-100).

[0159] [Chemical Formula 7]

[0160]

[0161] In formula (A-100), * represents a connecting bond,

[0162] Ra 1 ~Ra 3 Each independently represents a hydrogen atom or an alkyl group,

[0163] Ra 4 represents a heterocyclic group,

[0164] n a1 Indicates an integer greater than 0,

[0165] Ra 1 With Ra 2 can bond to each other to form a ring,

[0166] Ra 1 With Ra 4 can bond to each other to form a ring,

[0167] Ra 2 With Ra 3 can bond to each other to form a ring,

[0168] In n a1 When the value is 2 or more, multiple Ra 2 and Ra 3 They can be the same or different.

[0169] A s1 The number of carbon atoms in the aryl group represented is preferably 6 to 48, more preferably 6 to 22, and particularly preferably 6 to 12.

[0170] A s1 and Ra 4 The heterocyclic group represented is preferably a 5-membered or 6-membered heterocyclic group. Furthermore, the heterocyclic group is preferably a monocyclic heterocyclic group or a heterocyclic group having 2 to 8 fused rings, more preferably a monocyclic heterocyclic group or a heterocyclic group having 2 to 4 fused rings, and even more preferably a monocyclic heterocyclic group or a heterocyclic group having 2 or 3 fused rings. The heteroatom constituting the heterocyclic group is preferably a nitrogen atom, an oxygen atom, or a sulfur atom. The number of heteroatoms constituting the heterocyclic group is preferably 1 to 3, more preferably 1 to 2. The number of carbon atoms constituting the heterocyclic group is preferably 1 to 30, more preferably 1 to 18, and even more preferably 1 to 12.

[0171] The aryl group and the heterocyclic group may have a substituent. Examples of the substituent include the substituent T described below.

[0172] Ra of formula (A-100) 1 ~Ra 3 Each independently represents a hydrogen atom or an alkyl group, preferably a hydrogen atom. 1 ~Ra 3 The number of carbon atoms in the alkyl group is preferably 1 to 20, more preferably 1 to 15, and even more preferably 1 to 8. The alkyl group may be linear, branched, or cyclic, and is preferably linear or branched.

[0173] n in formula (A-100) a1 It represents an integer of 0 or greater, preferably an integer of 0 to 2, more preferably 0 or 1, and even more preferably 0.

[0174] In formula (A-100), Ra 1 With Ra2 Can bond to each other to form a ring, Ra 1 With Ra 4 Can bond to each other to form a ring, Ra 2 With Ra 3 They may be bonded to each other to form a ring. The linking group for forming the ring is preferably a divalent linking group selected from the group consisting of -CO-, -O-, -NH-, an alkylene group having 1 to 10 carbon atoms, and combinations thereof. The alkylene group serving as the linking group may be unsubstituted or may have a substituent. Examples of the substituent include the substituent T described below.

[0175] -Regarding the compound represented by formula (Cr-1)-

[0176] In formula (CR-1), R c1 ~R c6 Each independently represents a hydrogen atom or a substituent. c1 ~R c6 The substituent represented by can be exemplified as R in formula (2): 11 ~R 16 The preferred ranges of the substituents described above are also the same as those of the substituents represented.

[0177] R c1 ~R c6 Two adjacent groups in the group may be bonded to form a ring. The ring formed is preferably a 5-membered ring or a 6-membered ring. The ring formed may further have a substituent. As the substituent, the groups listed below for the substituent T may be mentioned, preferably a halogen atom, an alkyl group, an alkenyl group, an alkoxy group, an aryl group, an aryloxy group, a heteroaryl group, a heteroaryloxy group, a thioalkyl group, a sulfo group, or a carboxyl group.

[0178] R in formula (CR-1) c7 R represents a hydrogen atom, an alkyl group, an alkenyl group or an aryl group, preferably an alkyl group, an alkenyl group or an aryl group, more preferably an alkyl group or an alkenyl group. c7 The preferred ranges of the alkyl, alkenyl and aryl groups represented by 17 The preferred ranges of the alkyl, alkenyl, and aryl groups are the same.

[0179] In formula (CR-1), R c7 With R c10 The alkyl radicals may be bonded to form a ring. The formed ring is preferably a 5-membered ring or a 6-membered ring. The formed ring may further have a substituent. Examples of the substituent include the groups listed below for the substituent T, preferably a halogen atom, an alkyl group, an alkenyl group, an alkoxy group, an aryl group, an aryloxy group, a heteroaryl group, a heteroaryloxy group, a thioalkyl group, a sulfo group, or a carboxyl group.

[0180] A of formula (CR-1) c1 A represents a substituent.c1 The substituent represented by is preferably an aryl group, a heterocyclic group or a group represented by formula (A-100), and more preferably a group represented by formula (A-100). The preferred ranges of the aryl group, the heterocyclic group and the group represented by (A-100) are the same as those of A in formula (SQ-1). s1 The preferred ranges of the aryl group and heterocyclic group represented by (A-100) are the same as those of the group represented by (A-100).

[0181] -Regarding the Substituent T-

[0182] Examples of the substituent T include the following groups: aminocarbonylamino, halogen atom (e.g., fluorine atom, chlorine atom, bromine atom, iodine atom), alkyl group (preferably an alkyl group having 1 to 30 carbon atoms), alkenyl group (preferably an alkenyl group having 2 to 30 carbon atoms), alkynyl group (preferably an alkynyl group having 2 to 30 carbon atoms), aryl group (preferably an aryl group having 6 to 30 carbon atoms), heteroaryl group (preferably a heteroaryl group having 1 to 30 carbon atoms), amino group (preferably an amino group having 0 to 30 carbon atoms), alkoxy group (preferably an alkoxy group having 1 to 30 carbon atoms), aryloxy group (preferably an aryloxy group having 6 to 30 carbon atoms), heteroaryloxy group (preferably a heteroaryloxy group having 1 to 30 carbon atoms), acyl group (preferably an acyl group having 2 to 30 carbon atoms), Alkoxycarbonyl (preferably an alkoxycarbonyl group having 2 to 30 carbon atoms), aryloxycarbonyl (preferably an aryloxycarbonyl group having 7 to 30 carbon atoms), heteroaryloxycarbonyl (preferably a heteroaryloxycarbonyl group having 2 to 30 carbon atoms), acyloxy (preferably an acyloxy group having 2 to 30 carbon atoms), acylamino (preferably an acylamino group having 2 to 30 carbon atoms), aminocarbonylamino (preferably an aminocarbonylamino group having 2 to 30 carbon atoms), alkoxycarbonylamino (preferably an alkoxycarbonylamino group having 2 to 30 carbon atoms), aryloxycarbonylamino (preferably an aryloxycarbonylamino group having 7 to 30 carbon atoms), sulfamoyl (preferably a sulfamoyl group having 0 to 30 carbon atoms), sulfamoylamino (preferably a a sulfamoylamino group having 0 to 30 carbon atoms), a carbamoyl group (preferably a carbamoyl group having 1 to 30 carbon atoms), an alkylthio group (preferably an alkylthio group having 1 to 30 carbon atoms), an arylthio group (preferably an arylthio group having 6 to 30 carbon atoms), a heteroarylthio group (preferably a heteroarylthio group having 1 to 30 carbon atoms), an alkylsulfonyl group (preferably an alkylsulfonyl group having 1 to 30 carbon atoms), an alkylsulfonylamino group (preferably an alkylsulfonylamino group having 1 to 30 carbon atoms), an arylsulfonyl group (preferably an arylsulfonyl group having 6 to 30 carbon atoms), an arylsulfonylamino group (preferably an arylsulfonylamino group having 6 to 30 carbon atoms), a heteroarylsulfonyl group (preferably a heteroarylsulfonyl group having 1 to 30 carbon atoms), alkyl), heteroarylsulfonylamino (preferably a heteroarylsulfonylamino group having 1 to 30 carbon atoms), alkylsulfinyl (preferably an alkylsulfinyl group having 1 to 30 carbon atoms), arylsulfinyl (preferably an arylsulfinyl group having 6 to 30 carbon atoms), heteroarylsulfinyl (preferably a heteroarylsulfinyl group having 1 to 30 carbon atoms), urea (preferably a urea group having 1 to 30 carbon atoms), hydroxyl, nitro, carboxyl, sulfo, phosphoric acid, carboxylic acid amide, sulfonic acid amide, imide, phosphino, mercapto, cyano, alkylsulfinyl, arylsulfinyl, arylazo, heteroarylazo, phosphinyl, phosphinyloxy, phosphinylamino, silyl, hydrazine, and imino. When these groups are further substitutable, they may further have a substituent. Examples of the substituent include the groups described in the substituent T above.

[0183] -About specific examples-

[0184] Specific examples of the specific infrared absorbing dye include compounds having the following structures: In the following structural formula, Me represents a methyl group, and Ph represents a phenyl group.

[0185] [Chemical Formula 8]

[0186]

[0187] [Chemical Formula 9]

[0188]

[0189] [Chemical Formula 10]

[0190]

[0191] [Chemical Formula 11]

[0192]

[0193] [Chemical Formula 12]

[0194]

[0195] [Chemical Formula 13]

[0196]

[0197] The maximum absorption wavelength of the specific infrared absorbing dye is more preferably present in the wavelength range of 700 to 1500 nm, more preferably in the wavelength range of 750 to 1500 nm, and even more preferably in the wavelength range of 800 to 1500 nm.

[0198] The content of the specific infrared absorbing pigment in the total solid content of the composition is preferably 0.1% by mass or more, more preferably 0.5% by mass or more, further preferably 3% by mass or more, even more preferably 5% by mass or more, even more preferably 10% by mass or more, and particularly preferably 20% by mass or more. The upper limit of the content of the above-mentioned specific infrared absorbing pigment is preferably 60% by mass or less, more preferably 50% by mass or less, and even more preferably 40% by mass or less. The composition of the present invention may contain only one specific infrared absorbing pigment, or may contain two or more. When containing two or more, their total amount is preferably within the above range.

[0199] Other infrared absorbers

[0200] The composition of the present invention can contain an infrared absorber (hereinafter also referred to as other infrared absorbers) in addition to the above-mentioned specific infrared absorbing pigment. By further containing other infrared absorbers, a film that can shield the infrared rays of a wider wavelength range can be formed. Other infrared absorbers can be dyes or pigments (particles). As other infrared absorbers, pyrrolopyrrole compounds, polymethine compounds, square acid compounds, phthalocyanine compounds, naphthalocyanine compounds, quaterrylene compounds, merocyanine compounds, crotonium compounds, oxocyanine compounds, imine compounds, dithiol compounds, triarylmethane compounds, pyrromethene compounds, azomethine compounds, anthraquinone compounds, dibenzofuranone compounds, disulfide metal complexes, metal oxides, metal borides, etc., preferably at least one selected from square acid compounds and phthalocyanine compounds.

[0201] Examples of the pyrrolopyrrole compound include compounds described in paragraphs 0016 to 0058 of JP-A-2009-263614, compounds described in paragraphs 0037 to 0052 of JP-A-2011-068731, and compounds described in paragraphs 0010 to 0033 of WO 2015 / 166873. Examples of the squaric acid compound include the compounds described in paragraphs 0044 to 0049 of Japanese Patent Application Laid-Open No. 2011-208101, the compounds described in paragraphs 0060 to 0061 of Japanese Patent Application No. 6065169, the compounds described in paragraph 0040 of International Publication No. 2016 / 181987, the compounds described in Japanese Patent Application Laid-Open No. 2015-176046, the compounds described in paragraph 0072 of International Publication No. 2016 / 190162, Compounds described in paragraphs 0196 to 0228 of Japanese Patent Application Laid-Open No. 2016-074649, compounds described in paragraph 0124 of Japanese Patent Application Laid-Open No. 2017-067963, compounds described in International Publication No. 2017 / 135359, compounds described in Japanese Patent Application Laid-Open No. 2017-114956, compounds described in Japanese Patent No. 6197940, compounds described in International Publication No. 2016 / 120166, etc. Examples of the polymethine compound include compounds described in paragraphs 0044 to 0045 of JP-A-2009-108267, compounds described in paragraphs 0026 to 0030 of JP-A-2002-194040, compounds described in JP-A-2015-172004, compounds described in JP-A-2015-172102, compounds described in JP-A-2008-088426, compounds described in paragraph 0090 of International Publication No. 2016 / 190162, compounds described in JP-A-2017-031394, compounds described in JP-A-2021-134350, and compounds described in International Publication No. 2021 / 085372. Examples of the crotonium compound include compounds described in JP-A-2017-082029. Examples of the imine compound include compounds described in JP-A-2008-528706, JP-A-2012-012399, JP-A-2007-092060, and International Publication No. 2018 / 043564, paragraphs 0048 to 0063.Phthalocyanine compounds include compounds described in paragraph 0093 of Japanese Patent Application Laid-Open No. 2012-077153, oxytitanium phthalocyanines described in Japanese Patent Application Laid-Open No. 2006-343631, compounds described in paragraphs 0013 to 0029 of Japanese Patent Application Laid-Open No. 2013-195480, vanadium phthalocyanine compounds described in Japanese Patent Application Laid-Open No. 6081771, and compounds described in International Publication No. 2020 / 071470. Naphthalocyanine compounds include compounds described in paragraph 0093 of Japanese Patent Application Laid-Open No. 2012-077153. Disulfide metal complexes include compounds described in Japanese Patent Application Laid-Open No. 5733804. Metal oxides include, for example, indium tin oxide, antimony tin oxide, zinc oxide, Al-doped zinc oxide, fluorine-doped tin dioxide, niobium-doped titanium dioxide, tungsten oxide, and the like. For details about tungsten oxide, reference can be made to paragraph 0080 of Japanese Patent Application Publication No. 2016-006476, which is incorporated into this specification. Examples of metal borides include lanthanum boride and the like. Examples of commercially available lanthanum boride include LaB6-F (manufactured by Japan New Metals Co., Ltd.). Furthermore, examples of metal borides include compounds described in International Publication No. 2017 / 119394. Examples of commercially available indium tin oxide include F-ITO (manufactured by DOWA HOLDINGS CO., LTD.).

[0202] As other infrared absorbers, the squarylium compounds described in Japanese Patent Application Laid-Open No. 2017-197437, the squarylium compounds described in Japanese Patent Application Laid-Open No. 2017-025311, the squarylium compounds described in International Publication No. 2016 / 154782, the squarylium compounds described in Japanese Patent No. 5884953, the squarylium compounds described in Japanese Patent No. 6036689, The squarylium compound described in Japanese Patent No. 5810604, the squarylium compound described in paragraphs 0090 to 0107 of International Publication No. 2017 / 213047, the pyrrole ring-containing compound described in paragraphs 0019 to 0075 of Japanese Patent Application Laid-Open No. 2018-054760, the pyrrole ring-containing compound described in paragraphs 0078 to 0082 of Japanese Patent Application Laid-Open No. 2018-040955, the The pyrrole ring-containing compound described in paragraphs 0043 to 0069 of JP-A-2018-002773, the squarylium compound having an aromatic ring at the amide α position described in paragraphs 0024 to 0086 of JP-A-2018-041047, the amide-linked squarylium compound described in JP-A-2017-179131, the pyrrole bi-type squarylium compound described in JP-A-2017-141215 Compounds having an acid skeleton or a crotonate skeleton, dihydrocarbazole bis-type square acid compounds described in Japanese Patent Application Laid-Open No. 2017-082029, asymmetric compounds described in paragraphs 0027 to 0114 of Japanese Patent Application Laid-Open No. 2017-068120, pyrrole ring-containing compounds (carbazole type) described in Japanese Patent Application Laid-Open No. 2017-067963, phthalocyanine compounds described in Japanese Patent Application No. 6251530, etc.

[0203] As another infrared absorber, tungsten oxide represented by the following formula described in paragraph 0025 of European Patent No. 3628645 can also be used.

[0204] M 1 a M 2 b W c O d (P(O) n R m ) e

[0205] M 1 、M 2 represents an ammonium cation or a metal cation, a is 0.01 to 0.5, b is 0 to 0.5, c is 1, d is 2.5 to 3, e is 0.01 to 0.75, n is 1, 2 or 3, m is 1, 2 or 3, and R represents a hydrocarbon group which may have a substituent.

[0206] The total content of the specific infrared absorbing pigment and other infrared absorbers in the total solids content of the composition is preferably 0.1% by mass or more, more preferably 0.5% by mass or more, even more preferably 3% by mass or more, even more preferably 5% by mass or more, even more preferably 10% by mass or more, and particularly preferably 20% by mass or more. The upper limit of this content is preferably 60% by mass or less, more preferably 50% by mass or less, and even more preferably 40% by mass or less.

[0207] When the composition of the present invention contains other infrared absorbers, the content of the other infrared absorbers is preferably 1 to 1000 parts by mass, more preferably 3 to 500 parts by mass, and even more preferably 5 to 300 parts by mass, relative to 100 parts by mass of the specific infrared absorbing pigment described above. The composition of the present invention may contain only one other infrared absorber or two or more. When containing two or more, their total amount is preferably within the above range.

[0208] The composition of the present invention preferably contains substantially no other infrared absorbers. Substantially containing no other infrared absorbers means that the content of other infrared absorbers in the total solid content of the composition is 0.01% by mass or less, and preferably contains no other infrared absorbers.

[0209] Curing Compounds

[0210] The composition of the present invention contains a curable compound. As a curable compound, a polymerizable compound, a resin, etc. can be mentioned. The resin can be a non-polymerizable resin (a resin without a polymerizable group) or a polymerizable resin (a resin with a polymerizable group). As a polymerizable group, a group containing an ethylenically unsaturated bond, a cyclic ether group, a hydroxymethyl group, an alkoxymethyl group, etc. can be mentioned. As a group containing an ethylenically unsaturated bond, a vinyl group, a vinylphenyl group, a (meth)allyl group, a (meth)acryloyl group, a (meth)acryloyloxy group, a (meth)acrylamide group, etc. can be mentioned, preferably a (meth)allyl group, a (meth)acryloyl group and a (meth)acryloyloxy group, more preferably a (meth)acryloyloxy group. As a cyclic ether group, an epoxy group, an oxetane group, etc. can be mentioned, preferably an epoxy group.

[0211] As the curable compound, it is preferred to use a curable compound containing at least a resin. Furthermore, when the composition of the present invention is used as a photolithography composition, it is preferred to use a resin and a polymerizable compound (preferably a polymerizable monomer as a monomer-type polymerizable compound) as the curable compound, and it is more preferred to use a resin and a polymerizable monomer having a group containing an ethylenically unsaturated bond (a monomer-type polymerizable compound).

[0212] (Polymerizable compound)

[0213] Examples of polymerizable compounds include compounds having an ethylenically unsaturated bond-containing group, compounds having a cyclic ether group, compounds having a hydroxymethyl group, and compounds having an alkoxymethyl group. Compounds having an ethylenically unsaturated bond-containing group can be preferably used as free radical polymerizable compounds. Furthermore, compounds having a cyclic ether group can be preferably used as cationically polymerizable compounds.

[0214] Examples of the resin-type polymerizable compound include resins containing a repeating unit having a polymerizable group.

[0215] The molecular weight of the monomer-type polymerizable compound (polymerizable monomer) is preferably less than 2,000, more preferably 1,500 or less. The lower limit of the molecular weight of the polymerizable monomer is preferably 100 or more, more preferably 200 or more. The weight average molecular weight (Mw) of the resin-type polymerizable compound is preferably 2,000 to 2,000,000. The upper limit of the weight average molecular weight is preferably 1,000,000 or less, more preferably 500,000 or less. The lower limit of the weight average molecular weight is preferably 3,000 or more, more preferably 5,000 or more.

[0216] The compound having an ethylenically unsaturated bond-containing group as a polymerizable monomer is preferably a tri- to penta-functional (meth)acrylate compound, and more preferably a tri- to hexa-functional (meth)acrylate compound. Specific examples include compounds described in paragraphs 0095 to 0108 of JP-A-2009-288705, paragraph 0227 of JP-A-2013-029760, paragraphs 0254 to 0257 of JP-A-2008-292970, paragraphs 0034 to 0038 of JP-A-2013-253224, paragraph 0477 of JP-A-2012-208494, JP-A-2017-048367, Japanese Patent No. 6057891, Japanese Patent No. 6031807, and Japanese Patent No. 2017-194662, the contents of which are incorporated into this specification.

[0217] Examples of the compound having an ethylenically unsaturated bond-containing group include dipentaerythritol tri(meth)acrylate (commercially available as KAYARAD D-330; manufactured by Nippon Kayaku Co., Ltd.), dipentaerythritol tetra(meth)acrylate (commercially available as KAYARAD D-320; manufactured by Nippon Kayaku Co., Ltd.), dipentaerythritol penta(meth)acrylate (commercially available as KAYARAD D-310; manufactured by Nippon Kayaku Co., Ltd.), dipentaerythritol hexa(meth)acrylate (commercially available as KAYARAD DPHA; manufactured by Nippon Kayaku Co., Ltd.; NK ESTER A-DPH-12E; manufactured by SHIN-NAKAMURA CHEMICAL Co., Ltd.), and compounds having a structure in which the (meth)acryloyl groups of these compounds are bonded via ethylene glycol and / or propylene glycol residues (for example, compounds manufactured by SARTOMER). Company, Inc.'s commercially available SR454, SR499) and the like. In addition, as the compound having a group containing an ethylenically unsaturated bond, diglycerol EO (ethylene oxide)-modified (meth)acrylate (commercial product: M-460; manufactured by TOAGOSEI Co., Ltd.), pentaerythritol tetraacrylate (NK ESTER A-TMMT manufactured by SHIN-NAKAMURA CHEMICAL Co., Ltd.), 1,6-hexanediol diacrylate (KAYARAD HDDA manufactured by Nippon Kayaku Co., Ltd.), RP-1040 (manufactured by Nippon Kayaku Co., Ltd.), ARONIX TO-2349 (manufactured by TOAGOSEI Co., Ltd.), NK Oligo UA-7200 (manufactured by SHIN-NAKAMURA CHEMICAL Co., Ltd.), 8UH-1006, 8UH-1012 (manufactured by Taisei Fine Chemical Co., Ltd.), LIGHT ACRYLATE POB-A0 (manufactured by KYOEISHA CHEMICAL Co., LTD.), etc.

[0218] Furthermore, as compounds having a group containing an ethylenically unsaturated bond, trifunctional (meth)acrylate compounds such as trimethylolpropane tri(meth)acrylate, trimethylolpropane propylene oxide-modified tri(meth)acrylate, trimethylolpropane ethylene oxide-modified tri(meth)acrylate, isocyanurate ethylene oxide-modified tri(meth)acrylate, and pentaerythritol tri(meth)acrylate are also preferably used. Examples of commercially available trifunctional (meth)acrylate compounds include ARONIX M-309, M-310, M-321, M-350, M-360, M-313, M-315, M-306, M-305, M-303, M-452, and M-450 (manufactured by Toagosei Co., Ltd.), NK Ester A9300, A-GLY-9E, A-GLY-20E, A-TMM-3, A-TMM-3L, A-TMM-3LM-N, A-TMPT, and TMPT (manufactured by Shin-Nakamura Chemical Co., Ltd.), KAYARAD GPO-303, TMPTA, THE-330, TPA-330, and PET-30 (manufactured by Nippon Kayaku Co., Ltd.).

[0219] As the compound having a group containing an ethylenically unsaturated bond, a compound having a group containing an ethylenically unsaturated bond and a carbamate bond (hereinafter also referred to as a polymerizable compound having a carbamate bond) is also preferably used. By using such a compound, the heat resistance of the obtained film can be further improved. It can be inferred that the reason for obtaining such an effect is that the carbamate bond portion forms a physical crosslinked structure based on intermolecular hydrogen bonds.

[0220] Examples of the polymerizable compound having a urethane bond include urethane (meth)acrylates obtained by reacting a polyfunctional isocyanate with a (meth)acrylate having a hydroxyl group, and urethane (meth)acrylates obtained by reacting a polyfunctional isocyanate with a polyol and then reacting a (meth)acrylate having a hydroxyl group.

[0221] Examples of the (meth)acrylate having a hydroxyl group include 2-hydroxyethyl (meth)acrylate, 4-hydroxybutyl (meth)acrylate, trimethylolpropane di(meth)acrylate, pentaerythritol tri(meth)acrylate, ditrimethylolpropane tri(meth)acrylate, dipentaerythritol penta(meth)acrylate, dipentaerythritol ethylene oxide-modified penta(meth)acrylate, dipentaerythritol propylene oxide-modified penta(meth)acrylate, dipentaerythritol caprolactone-modified penta(meth)acrylate, glycerol acrylate methacrylate, glycerol dimethacrylate, 2-hydroxy-3-acryloylpropyl methacrylate, a reaction product of an epoxy-containing compound and a carboxyl (meth)acrylate, and a hydroxyl-containing polyol polyacrylate.

[0222] Examples of the polyfunctional isocyanate include aliphatic diisocyanates such as trimethylene diisocyanate, tetramethylene diisocyanate, and hexamethylene diisocyanate; alicyclic diisocyanates such as isophorone diisocyanate; aromatic diisocyanates such as toluene diisocyanate, diphenylmethylene diisocyanate, and xylene diisocyanate; biuret forms thereof, isocyanate urea forms thereof, and trimethylolpropane adducts thereof.

[0223] As the polymerizable compound having a urethane bond, the compounds described in paragraphs 0308 to 0315 of JP-A-2022-173080 can also be used.

[0224] The compound having an ethylenically unsaturated bond-containing group may further have an acid group such as a carboxyl group, a sulfo group, or a phosphoric acid group. Commercially available products of such compounds include ARONIX M-305, M-510, M-520, and ARONIX TO-2349 (manufactured by TOAGOSEI CO., LTD.).

[0225] As the compound having a group containing an ethylenically unsaturated bond, a compound having a caprolactone structure can also be used. Regarding compounds having a caprolactone structure, reference can be made to paragraphs 0042 to 0045 of JP-A-2013-253224, which are incorporated herein by reference. Examples of compounds having a caprolactone structure include DPCA-20, DPCA-30, DPCA-60, and DPCA-120, which are commercially available as a series from Nippon Kayaku Co., Ltd.

[0226] As the compound having a group containing an ethylenically unsaturated bond, a compound having a group containing an ethylenically unsaturated bond and an alkyleneoxy group can also be used. Such a compound is preferably a compound having a group containing an ethylenically unsaturated bond and an ethyleneoxy group and / or a propyleneoxy group, more preferably a compound having a group containing an ethylenically unsaturated bond and an ethyleneoxy group, and even more preferably a tri- to hexafunctional (meth)acrylate compound having 4 to 20 ethyleneoxy groups. Commercially available products include, for example, SR-494, a tetrafunctional (meth)acrylate having 4 ethyleneoxy groups manufactured by Sartomer Company, Inc., and KAYARAD TPA-330, a trifunctional (meth)acrylate having 3 isobutyleneoxy groups manufactured by Nippon Kayaku Co., Ltd.

[0227] As the compound having an ethylenically unsaturated bond-containing group, a polymerizable compound having a fluorene skeleton can also be used, and commercially available products include OGSOL EA-0200 and EA-0300 (a (meth)acrylate monomer having a fluorene skeleton, manufactured by Osaka Gas Chemicals Co., Ltd.).

[0228] As the compound having an ethylenically unsaturated bond-containing group, it is also preferable to use a compound that does not substantially contain environmentally regulated substances such as toluene. Commercially available products of such a compound include KAYARAD DPHA LT and KAYARAD DPEA-12LT (manufactured by Nippon Kayaku Co., Ltd.).

[0229] Examples of compounds having a cyclic ether group include compounds having an epoxy group and compounds having an oxetane group, and compounds having an epoxy group are preferred. Examples of compounds having an epoxy group include compounds having 1 to 100 epoxy groups per molecule. The upper limit of the number of epoxy groups can be, for example, 10 or less, or 5 or less. The lower limit of the number of epoxy groups is preferably 2 or more.

[0230] The compound having a cyclic ether group may be a low molecular weight compound (e.g., a molecular weight of less than 1000) or a macromolecular compound (e.g., a molecular weight of 1000 or greater, or a weight average molecular weight of 1000 or greater in the case of a polymer). The weight average molecular weight of the cyclic ether group is preferably 200 to 100,000, more preferably 500 to 50,000. The upper limit of the weight average molecular weight is preferably 10,000 or less, more preferably 5,000 or less, and even more preferably 3,000 or less.

[0231] As the compound having a cyclic ether group, compounds described in paragraphs 0034 to 0036 of JP-A-2013-011869, compounds described in paragraphs 0147 to 0156 of JP-A-2014-043556, compounds described in paragraphs 0085 to 0092 of JP-A-2014-089408, and compounds described in JP-A-2017-179172 can also be used.

[0232] Examples of commercially available compounds having a cyclic ether group include DENACOL EX-212L, EX-212, EX-214L, EX-214, EX-216L, EX-216, EX-321L, EX-321, EX-850L, and EX-850 (all manufactured by Nagase ChemteX Corporation), ADEKA RESIN EP-4000S, EP-4003S, EP-4010S, and EP-4011S (all manufactured by ADEKA Corporation), NC-2000, NC-3000, NC-7300, XD-1000, EPPN-501, and EPPN-502 (all manufactured by ADEKA Corporation), CELLOXIDE 2021P, CELLOXIDE 2081, CELLOXIDE 2083, and CELLOXIDE 2085, EHPE3150, EPOLEAD PB 3600, PB 4700 (all manufactured by Daicel Corporation), CYCLOMER P ACA200M, ACA 230AA, ACA Z250, ACA Z251, ACA Z300, ACA Z320 (all manufactured by Daicel Corporation), jER1031S, jER157S65, jER152, jER154, jER157S70 (all manufactured by Subishi Chemical Corporation), ARON OXETANE OXT-121, OXT-221, OX-SQ, PNOX (all manufactured by TOAGOSEI CO., LTD.), ADEKA GLYCIROL ED-505 (epoxy-containing monomer manufactured by ADEKA CORPORATION), Marproof G-0150M, G-0105SA, G-0130SP, G-0250SP, G-1005S, G-1005SA, G-1010S, G-2050M, G-01100, G-01758 (epoxy-containing polymers manufactured by NOF CORPORATION), OXT-101, OXT-121, OXT-212, OXT-221 (these are oxetane-containing monomers manufactured by TOAGOSEICO, LTD.), OXE-10, OXE-30 (these are oxetane-containing monomers manufactured by OSAKA ORGANIC CHEMICAL INDUSTRY LTD.), etc.

[0233] As the compound with a methylol group (hereinafter also referred to as a methylol compound), a compound in which a methylol group is bonded to a nitrogen atom or a carbon atom forming an aromatic ring can be enumerated. Furthermore, as the compound with an alkoxymethyl group (hereinafter also referred to as an alkoxymethyl compound), a compound in which an alkoxymethyl group is bonded to a nitrogen atom or a carbon atom forming an aromatic ring can be enumerated. As the compound in which an alkoxymethyl group or a methylol group is bonded to a nitrogen atom, preferably alkoxymethylated melamine, methylolated melamine, alkoxymethylated benzoguanamine, methylolated benzoguanamine, alkoxymethylated glycoluril, methylolated glycoluril, alkoxymethylated urea and methylolated urea etc. can be used. Furthermore, the compounds described in paragraphs 0134 to 0147 of Japanese Patent Application Laid-Open No. 2004-295116 and paragraphs 0095 to 0126 of Japanese Patent Application Laid-Open No. 2014-089408 can also be used.

[0234] (resin)

[0235] The composition of the present invention can use a resin as a curable compound. The curable compound preferably contains at least a resin. For example, the resin is blended for the purpose of dispersing pigments, etc., in the composition, or for the purpose of acting as an adhesive. Furthermore, resins primarily used to disperse pigments, etc., in the composition are also referred to as dispersants. However, this use of the resin is merely an example, and the resin can also be used for purposes other than this. Furthermore, resins having polymerizable groups also correspond to polymerizable compounds.

[0236] The weight average molecular weight of the resin is preferably 3,000 to 2,000,000. The upper limit is preferably 1,000,000 or less, more preferably 500,000 or less. The lower limit is preferably 4,000 or more, more preferably 5,000 or more.

[0237] As resin, can enumerate (meth) acrylic resin, epoxy resin, ene-thiol resin, polycarbonate resin, polyether resin, polyarylate resin, polysulfone resin, polyethersulfone resin, polyphenylene resin, polyarylene ether phosphine oxide resin, polyimide resin, polyamide resin, polyamideimide resin, polyolefin resin, cyclic olefin resin, polyester resin, styrene resin, vinyl acetate resin, polyvinyl alcohol resin, polyvinyl acetal resin, polyurethane resin, polyurea resin etc..In these resins, can use 1 kind alone, can also mix and use 2 or more kinds.As cyclic olefin resin, from the viewpoint of improving heat resistance, preferably norbornene resin.As the commercial product of norbornene resin, for example, can enumerate JSR Corporation system ARTON series (for example, ARTON F4520) etc. Furthermore, as the resin, the resin described in the examples of International Publication No. 2016 / 088645, the resin described in Japanese Patent Application Laid-Open No. 2017-057265, the resin described in Japanese Patent Application Laid-Open No. 2017-032685, the resin described in Japanese Patent Application Laid-Open No. 2017-075248, the resin described in Japanese Patent Application Laid-Open No. 2017-066240, the resin described in Japanese Patent Application Laid-Open No. 2017-167513, the resin described in Japanese Patent Application Laid-Open No. 2017-173787, the resin described in Japanese Patent Application Laid-Open No. 2017-206689, and the resin described in Japanese Patent Application Laid-Open No. 2017-004 The resins described in paragraphs 1 to 0060, the resins described in paragraphs 0022 to 0071 of Japanese Patent Application No. 2018-010856, the blocked polyisocyanate resins described in Japanese Patent Application No. 2016-222891, the resins described in Japanese Patent Application No. 2020-122052, the resins described in Japanese Patent Application No. 2020-111656, the resins described in Japanese Patent Application No. 2020-139021, and the resins described in Japanese Patent Application No. 2017-138503. The resins having a structural unit with a ring structure on the main chain and a structural unit with a biphenyl group on the side chain. In addition, as a resin, a resin with a fluorene skeleton can also be preferably used. Regarding the resin with a fluorene skeleton, reference can be made to the description of U.S. Patent Application Publication No. 2017 / 0102610, which is incorporated into this specification. Furthermore, as the resin, the resins described in paragraphs 0199 to 0233 of Japanese Patent Application Laid-Open No. 2020-186373, the alkali-soluble resins described in Japanese Patent Application Laid-Open No. 2020-186325, the resin represented by Formula 1 described in Korean Patent Application Laid-Open No. 10-2020-0078339, the resins described in Japanese Patent Application Laid-Open No. 2021-134350, and the resins described in Japanese Patent Application Laid-Open No. 2022-174597 can also be used.

[0238] As the resin, a resin having an acid group is preferably used. Examples of the acid group include a carboxyl group, a phosphoric acid group, a sulfonic acid group, and a phenolic hydroxyl group. These acid groups may be one or more. A resin having an acid group can also be used as a dispersant. The acid value of the resin having an acid group is preferably 30 to 500 mgKOH / g. The lower limit is preferably 50 mgKOH / g or more, more preferably 70 mgKOH / g or more. The upper limit is preferably 400 mgKOH / g or less, more preferably 200 mgKOH / g or less, further preferably 150 mgKOH / g or less, and most preferably 120 mgKOH / g or less.

[0239] As the resin, a resin having a polymerizable group is also preferably used. The polymerizable group is preferably a group containing an ethylenically unsaturated bond and a cyclic ether group, and more preferably a group containing an ethylenically unsaturated bond.

[0240] As the resin, a resin having a cyclic structure in its main chain is preferably used. By using such a resin, a film having better heat resistance can be formed.

[0241] The resin having a cyclic structure in its main chain is preferably a resin having repeating units derived from compounds represented by formulae (C-1) to (C-3).

[0242] [Chemical Formula 14]

[0243]

[0244] In formula (C-1), Rc 1 and Rc 2 Each independently represents a hydrogen atom or a hydrocarbon group having 1 to 20 carbon atoms which may have a substituent. 1 and Rc 2 Specific examples include methyl, ethyl, n-propyl, isopropyl, n-butyl, tert-butyl, tert-amyl, stearyl, lauryl, cyclohexyl, ethylhexyl, methoxyethyl, ethoxyethyl and benzyl, and preferably methyl, ethyl, cyclohexyl or benzyl.

[0245] In formula (C-2), Rc 3 represents a hydrogen atom or a hydrocarbon group having 1 to 25 carbon atoms which may have a substituent. 3 Examples include linear or branched alkyl groups such as methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, tert-butyl, tert-amyl, stearyl, lauryl, and 2-ethylhexyl; aryl groups such as phenyl; alicyclic groups such as cyclohexyl, tert-butylcyclohexyl, dicyclopentadienyl, tricyclodecanyl, isobornyl, adamantyl, and 2-methyl-2-adamantyl; alkyl groups substituted with alkoxy groups such as 1-methoxyethyl and 1-ethoxyethyl; alkyl groups substituted with aryl groups such as benzyl (aralkyl groups); etc., and preferably, it is methyl, ethyl, cyclohexyl, or benzyl.

[0246] In formula (C-3), Rc 4 represents a hydrocarbon group having 1 to 20 carbon atoms which may have a substituent. 4 Specific examples of include phenyl, benzyl, naphthyl, cyclohexyl, methyl, ethyl, and propyl, and benzyl is preferred.

[0247] The content of the repeating unit derived from the compound represented by formulae (C-1) to (C-3) in the resin having a cyclic structure in the main chain is preferably 5 to 50 mol%.

[0248] The resin having a cyclic structure in the main chain preferably further comprises a repeating unit having an acid group. Examples of the acid group include a carboxyl group, a phosphoric acid group, a sulfonic acid group, and a phenolic hydroxyl group, with a carboxyl group being preferred. The content of the repeating unit having an acid group in the resin having a cyclic structure in the main chain is preferably 5 to 30 mol%.

[0249] The resin having a cyclic structure in its main chain is preferably an alkali-soluble resin. The acid value of the resin having a cyclic structure in its main chain is preferably 20 to 300 mgKOH / g, more preferably 50 to 200 mgKOH / g. The weight-average molecular weight of the resin having a cyclic structure in its main chain is preferably 10,000 to 100,000, more preferably 10,000 to 80,000. Furthermore, the number-average molecular weight is preferably 5,000 to 50,000.

[0250] The resin having a cyclic structure in its main chain may contain repeating units having a polymerizable group. The content of repeating units having a polymerizable group in the resin having a cyclic structure in its main chain is preferably 50 mol% or less, more preferably 40 mol% or less, and even more preferably 30 mol% or less. The lower limit can be 1 mol% or more, and can also be 5 mol% or more.

[0251] As the resin, a resin containing a repeating unit derived from a compound represented by formula (X) is also preferably used.

[0252] [Chemical Formula 15]

[0253]

[0254] Where R 1 represents a hydrogen atom or a methyl group, R 21 and R 22 Each independently represents an alkylene group, and n represents an integer of 0 to 15. 21 and R 22The number of carbon atoms in the alkylene group is preferably 1 to 10, more preferably 1 to 5, further preferably 1 to 3, and particularly preferably 2 or 3. n represents an integer of 0 to 15, preferably an integer of 0 to 5, more preferably an integer of 0 to 4, and further preferably an integer of 0 to 3.

[0255] Examples of the compound represented by formula (X) include ethylene oxide- or propylene oxide-modified (meth)acrylates of p-cumylphenol, and examples of commercially available products include ARONIX M-110 (manufactured by TOAGOSEI CO., LTD.).

[0256] The resin also preferably contains a resin that serves as a dispersant. Examples of the dispersant include acidic dispersants (acidic resins) and alkaline dispersants (alkaline resins). Here, the acidic dispersant (acidic resin) refers to a resin in which the amount of acid groups is greater than the amount of alkaline groups. As the acidic dispersant (acidic resin), when the total amount of the amount of acid groups and the amount of alkaline groups is set to 100 mol%, a resin in which the amount of acid groups is preferably 70 mol% or more. The acid group possessed by the acidic dispersant (acidic resin) is preferably a carboxyl group. The acid value of the acidic dispersant (acidic resin) is preferably 10 to 105 mgKOH / g. Furthermore, the alkaline dispersant (alkaline resin) refers to a resin in which the amount of alkaline groups is greater than the amount of acid groups. As the alkaline dispersant (alkaline resin), when the total amount of the amount of acid groups and the amount of alkaline groups is set to 100 mol%, a resin in which the amount of alkaline groups exceeds 50 mol%. The basic group possessed by the alkaline dispersant is preferably an amino group.

[0257] The resin used as the dispersant is also preferably a grafted resin. For details of the grafted resin, reference can be made to paragraphs 0025 to 0094 of JP-A-2012-255128, which are incorporated herein by reference.

[0258] The resin used as a dispersant is also preferably a polyimine-based dispersant containing a nitrogen atom in at least one of the main chain and the side chain. As a polyimine-based dispersant, a resin having a main chain and a side chain and having a basic nitrogen atom in at least one of the main chain and the side chain is preferred, wherein the main chain contains a partial structure having a functional group with a pKa of 14 or less, and the number of atoms in the side chain is 40 to 10,000. There is no particular limitation on the basic nitrogen atom as long as it is a basic nitrogen atom. Regarding polyimine-based dispersants, reference can be made to paragraphs 0102 to 0166 of Japanese Patent Application Publication No. 2012-255128, which is incorporated into this specification.

[0259] The resin used as a dispersant is also preferably a resin having a structure in which multiple polymer chains are bonded to the core. Examples of such resins include dendritic polymers (including star polymers). Specific examples of dendritic polymers include polymer compounds C-1 to C-31 described in paragraphs 0196 to 0209 of JP-A-2013-043962.

[0260] The resin used as a dispersant is also preferably a resin containing repeating units having a group containing an ethylenically unsaturated bond in its side chain. The content of repeating units having a group containing an ethylenically unsaturated bond in its side chain is preferably 10 mol% or more, more preferably 10 to 80 mol%, and even more preferably 20 to 70 mol% of all repeating units in the resin.

[0261] As the dispersant, the resin described in Japanese Patent Application Laid-Open No. 2018-087939, the block copolymers (EB-1) to (EB-9) described in paragraphs 0219 to 0221 of Japanese Patent Application No. 6432077, the polyethyleneimine having a polyester side chain described in International Publication No. 2016 / 104803, the block copolymer described in International Publication No. 2019 / 125940, the block polymer having an acrylamide structural unit described in Japanese Patent Application Laid-Open No. 2020-066687, the block polymer having an acrylamide structural unit described in Japanese Patent Application Laid-Open No. 2020-066688, the dispersant described in International Publication No. 2016 / 104803, etc. can also be used.

[0262] Dispersants are also commercially available, and specific examples thereof include the DISPERBYK series manufactured by BYK-Chemie GmbH, the SOLSPERSE series manufactured by Japan Lubrizol Corporation, the Efka series manufactured by BASF, and the Ajispar series manufactured by Ajinomoto Fine-Techno Co., Inc. Furthermore, the products described in paragraph 0129 of Japanese Patent Application Laid-Open No. 2012-137564 and the products described in paragraph 0235 of Japanese Patent Application Laid-Open No. 2017-194662 can also be used as dispersants.

[0263] The content of the curable compound in the total solids content of the composition is preferably 1 to 95% by mass. The lower limit is preferably 2% by mass or more, more preferably 5% by mass or more, further preferably 7% by mass or more, and particularly preferably 10% by mass or more. The upper limit is preferably 94% by mass or less, more preferably 90% by mass or less, further preferably 85% by mass or less, and particularly preferably 80% by mass or less.

[0264] When the composition of the present invention contains a polymerizable compound as a curable compound, the content of the polymerizable compound in the total solids content of the composition is preferably 1 to 85% by mass. The lower limit is preferably 2% by mass or more, more preferably 3% by mass or more, and even more preferably 5% by mass or more. The upper limit is preferably 80% by mass or less, more preferably 70% by mass or less.

[0265] When the composition of the present invention contains a polymerizable monomer as a curable compound, the content of the polymerizable monomer in the total solids content of the composition is preferably 1 to 50% by mass. The lower limit is preferably 2% by mass or more, more preferably 3% by mass or more, and even more preferably 5% by mass or more. The upper limit is preferably 30% by mass or less, more preferably 20% by mass or less.

[0266] When the composition of the present invention contains a compound having a group containing an ethylenically unsaturated bond as a curable compound, the content of the compound having a group containing an ethylenically unsaturated bond in the total solids content of the composition is preferably 1 to 70% by mass. The lower limit is preferably 2% by mass or more, more preferably 3% by mass or more, and even more preferably 5% by mass or more. The upper limit is preferably 65% ​​by mass or less, more preferably 60% by mass or less.

[0267] When the composition of the present invention contains a compound having a cyclic ether group as a curable compound, the content of the compound having a cyclic ether group in the total solids content of the composition is preferably 1 to 95% by mass. The lower limit is preferably 2% by mass or more, more preferably 3% by mass or more, and even more preferably 5% by mass or more. The upper limit is preferably 80% by mass or less, more preferably 70% by mass or less, and even more preferably 60% by mass or less.

[0268] When the composition of the present invention contains a resin as a curable compound, the content of the resin in the total solid content of the composition is preferably 1 to 85% by mass. The lower limit is preferably 2% by mass or more, more preferably 5% by mass or more, further preferably 7% by mass or more, and particularly preferably 10% by mass or more. The upper limit is preferably 80% by mass or less, more preferably 75% by mass or less, further preferably 70% by mass or less, and particularly preferably 40% by mass or less.

[0269] When the composition of the present invention contains a resin as a dispersant, the content of the resin as a dispersant in the total solids of the composition is preferably 0.1 to 40% by mass. The upper limit is preferably 25% by mass or less, more preferably 20% by mass or less. The lower limit is preferably 0.5% by mass or more, more preferably 1% by mass or more. Furthermore, the content of the resin as a dispersant is preferably 1 to 100 parts by mass per 100 parts by mass of the pigment. The upper limit is preferably 80 parts by mass or less, more preferably 75 parts by mass or less. The lower limit is preferably 2.5 parts by mass or more, more preferably 5 parts by mass or more.

[0270] The composition of the present invention may contain only one curable compound or two or more. When containing two or more curable compounds, the total amount thereof is preferably within the above range.

[0271] Solvent

[0272] The composition of the present invention preferably contains a solvent. Examples of the solvent include water and organic solvents, with organic solvents being preferred. Examples of organic solvents include ester solvents, ketone solvents, alcohol solvents, amide solvents, ether solvents, and hydrocarbon solvents. For details, reference can be made to paragraph 0223 of International Publication No. 2015 / 166779, which is incorporated herein. Furthermore, cyclic alkyl-substituted ester solvents and cyclic alkyl-substituted ketone solvents are also preferably used. Specific examples of the organic solvent include polyethylene glycol monomethyl ether, dichloromethane, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, ethyl cellosolve acetate, ethyl lactate, diethylene glycol dimethyl ether, butyl acetate, methyl 3-methoxypropionate, 2-heptanone, 2-pentanone, 3-pentanone, 4-heptanone, cyclohexanone, 2-methylcyclohexanone, 3-methylcyclohexanone, 4-methylcyclohexanone, cycloheptanone, cyclooctanone, cyclohexyl acetate, cyclopentanone, ethyl carbitol acetate, butyl carbitol acetate, propylene glycol monomethyl ether ... alcohol monomethyl ether acetate, 3-methoxy-N,N-dimethylpropionamide, 3-butoxy-N,N-dimethylpropionamide, propylene glycol diacetate, 3-methoxybutanol, methyl ethyl ketone, γ-butyrolactone, sulfolane, anisole, 1,4-diacetoxybutane, diethylene glycol monoethyl ether acetate, 1,3-butanediol diacetate, dipropylene glycol methyl ether acetate, diacetone alcohol (also known as diacetone alcohol, 4-hydroxy-4-methyl-2-pentanone), 2-methoxypropyl acetate, 2-methoxy-1-propanol, isopropyl alcohol, etc. However, for environmental reasons, it may be preferable to reduce the amount of aromatic hydrocarbons (benzene, toluene, xylene, ethylbenzene, etc.) as organic solvents (for example, the amount can be reduced to 50 mass ppm (parts per million) or less, 10 mass ppm or less, or 1 mass ppm or less relative to the total amount of the organic solvent).

[0273] In the present invention, it is preferred to use an organic solvent with a low metal content. A preferred metal content of the organic solvent is, for example, 10 parts per billion (ppb) or less. If necessary, organic solvents with a ppt (parts per trillion) content can be used. These organic solvents are provided, for example, by TOYO Gosei Co., Ltd. (Chemical Industry Daily, November 13, 2015).

[0274] Examples of methods for removing impurities such as metals from organic solvents include distillation (molecular distillation or thin film distillation) or filtration using a filter. The pore size of the filter used for filtration is preferably 10 μm or less, more preferably 5 μm or less, and even more preferably 3 μm or less. The filter is preferably made of polytetrafluoroethylene, polyethylene, or nylon.

[0275] The organic solvent may contain isomers (compounds having the same atomic number but different structures). The isomers may be present in one type or in a plurality of types.

[0276] The peroxide content in the organic solvent is preferably 0.8 mmol / L or less, and more preferably substantially no peroxide is contained.

[0277] The content of the solvent in the composition is preferably 10 to 97% by mass. The lower limit is preferably 30% by mass or more, more preferably 40% by mass or more, further preferably 50% by mass or more, further preferably 60% by mass or more, and particularly preferably 70% by mass or more. The upper limit is preferably 96% by mass or less, more preferably 95% by mass or less. The composition may contain only one solvent or two or more. When containing two or more solvents, their total amount is preferably within the above range.

[0278] Pigment Derivatives

[0279] The composition of the present invention may contain a pigment derivative. The pigment derivative may be used as a dispersing aid. A dispersing aid is a material used to improve the dispersibility of the pigment in the composition.

[0280] Examples of the pigment derivative include compounds having at least one structure selected from the group consisting of a pigment structure and a triazine structure, and an acid group or a basic group.

[0281] Examples of the pigment structure include a squaric acid pigment structure, a pyrrolopyrrole pigment structure, a diketopyrrolopyrrole pigment structure, a quinacridone pigment structure, anthraquinone pigment structure, a dianthraquinone pigment structure, a benzisoindole pigment structure, a thiazine indigo pigment structure, an azo pigment structure, a quinophthalone pigment structure, a phthalocyanine pigment structure, a naphthalocyanine pigment structure, a dioxazine pigment structure, a perylene pigment structure, a perinone pigment structure, a benzimidazolone pigment structure, a benzothiazole pigment structure, a benzimidazole pigment structure, and a benzoxazole pigment structure. Preferred are the squaric acid pigment structure, the pyrrolopyrrole pigment structure, the diketopyrrolopyrrole pigment structure, the phthalocyanine pigment structure, the quinacridone pigment structure, and the benzimidazolone pigment structure, and more preferred are the squaric acid pigment structure and the pyrrolopyrrole pigment structure.

[0282] Examples of the acid group possessed by the pigment derivative include carboxyl, sulfonic, phosphoric, boric, carboxylic acid amide, sulfonic acid amide, imidic acid, and salts thereof. Examples of the atom or atomic group constituting the salt include alkali metal ions (Li + 、Na + , K + etc.), alkaline earth metal ions (Ca 2+ Mg 2+ etc.), ammonium ion, imidazolium ion, pyridinium ion, phosphonium ion, etc. As the carboxylic acid amide group, -NHCOR X1 As the sulfonic acid amide group, -NHSO2R X2 As the imidic acid group, preferably -SO2NHSO2R X3 、-CONHSO2R X4 、-CONHCOR X5 or-SO2NHCOR X6 The group represented by -SO2NHSO2R X3 . R X1 ~R X6 R and R are independently an alkyl group or an aryl group. X1 ~R X6 The alkyl group and aryl group represented by the above-mentioned group may have a substituent, and the substituent is preferably a halogen atom, more preferably a fluorine atom.

[0283] Examples of the basic group possessed by the pigment derivative include amino, pyridyl and its salts, ammonium salts, and phthalimidomethyl groups. Examples of the atom or atomic group constituting the salt include hydroxide ions, halogen ions, carboxylic acid ions, sulfonic acid ions, and phenoxide ions.

[0284] Specific examples of pigment derivatives include compounds described in paragraphs 0037 to 0054 of International Publication No. 2016 / 035695, compounds described in paragraphs 0061 to 0086 of International Publication No. 2017 / 146092, compounds described in paragraphs 0017 to 0068 of International Publication No. 2018 / 230387, compounds described in paragraphs 0085 to 0099 of International Publication No. 2020 / 054718, compounds described in paragraph 0099 of International Publication No. 2020 / 054718, compounds described in paragraph 0124 of International Publication No. 2022 / 085485, benzimidazolone compounds or salts thereof described in Japanese Patent Application Laid-Open No. 2018-168244, and compounds having an isoindoline skeleton described in general formula (1) of Japanese Patent No. 6996282.

[0285] The content of the pigment derivative is preferably 1 to 50 parts by mass per 100 parts by mass of the pigment. The lower limit is preferably 3 parts by mass or more, more preferably 5 parts by mass or more. The upper limit is preferably 40 parts by mass or less, more preferably 30 parts by mass or less. A single pigment derivative may be used, or two or more may be used. When two or more pigment derivatives are used, the total amount is preferably within the above range.

[0286] Photopolymerization Initiator

[0287] When the composition of the present invention contains a polymerizable compound, it is preferred that the composition of the present invention further contain a photopolymerization initiator. The photopolymerization initiator is not particularly limited and can be appropriately selected from known photopolymerization initiators. For example, compounds that are photosensitized to light in the ultraviolet to visible regions are preferred. The photopolymerization initiator is preferably a photoradical polymerization initiator.

[0288] Examples of the photopolymerization initiator include halogenated hydrocarbon derivatives (e.g., compounds having a triazine skeleton, compounds having an oxadiazole skeleton, etc.), acylphosphine compounds, hexaarylbiimidazole compounds, oxime compounds, organic peroxides, sulfur compounds, ketone compounds, aromatic onium salts, α-hydroxyketone compounds, α-aminoketone compounds, etc. From the viewpoint of exposure sensitivity, the photopolymerization initiator is preferably a trihalomethyltriazine compound, a benzyldimethylketal compound, an α-hydroxyketone compound, an α-aminoketone compound, an acylphosphine compound, a phosphine oxide compound, a metallocene compound, an oxime compound, a hexaarylbiimidazole compound, an onium compound, a benzothiazole compound, a benzophenone compound, an acetophenone compound, a cyclopentadiene-benzene-iron complex, a halomethyloxadiazole compound, and a 3-aryl-substituted coumarin compound. More preferably, it is a compound selected from the group consisting of an oxime compound, an α-hydroxyketone compound, an α-aminoketone compound, and an acylphosphine compound, and even more preferably an oxime compound. Examples of the photopolymerization initiator include the compounds described in paragraphs 0065 to 0111 of JP-A-2014-130173, the compounds described in JP-A-6301489, and MATERIAL STAGE 37-60p, vol. 19, No. 3, 2019, a peroxide-based photopolymerization initiator, a photopolymerization initiator described in International Publication No. 2018 / 221177, a photopolymerization initiator described in International Publication No. 2018 / 110179, a photopolymerization initiator described in Japanese Patent Application Laid-Open No. 2019-043864, a photopolymerization initiator described in Japanese Patent Application Laid-Open No. 2019-044030, a peroxide-based initiator described in Japanese Patent Application Laid-Open No. 2019-167313, an aminoacetophenone-based initiator having an oxazolidinyl group described in Japanese Patent Application Laid-Open No. 2020-055992, an oxime-based photopolymerization initiator described in Japanese Patent Application Laid-Open No. 2013-190459, and a photopolymerization initiator described in Japanese Patent Application Laid-Open No. 2020-1 The polymers described in Gazette No. 72619, the compound represented by formula 1 described in International Publication No. 2020 / 152120, the compound described in Japanese Patent Application Publication No. 2021-181406, the photopolymerization initiator described in Japanese Patent Application Publication No. 2022-013379, the compound represented by formula (1) described in Japanese Patent Application Publication No. 2022-015747, the fluorine-containing fluorene oxime ester photoinitiator described in Japanese Patent Application Publication No. 2021-507058, the initiator described in the specification of Chinese Patent Application Publication No. 110764367, the initiator described in Japanese Patent Application Publication No. 2022-518535, the initiator described in International Publication No. 2021 / 175855, etc., are incorporated into this specification.

[0289] Specific examples of the hexaarylbiimidazole compound include 2,2',4-tris(2-chlorophenyl)-5-(3,4-dimethoxyphenyl)-4,5-diphenyl-1,1'-biimidazole and the like.

[0290] Examples of commercially available α-hydroxyketone compounds include Omnirad 184, Omnirad 1173, Omnirad 2959, and Omnirad 127 (all manufactured by IGM Resins BV), and Irgacure 184, Irgacure 1173, Irgacure 2959, and Irgacure 127 (all manufactured by BASF). Examples of commercially available α-aminoketone compounds include Omnirad 907, Omnirad 369, Omnirad 369E, and Omnirad 379EG (all manufactured by IGM Resins B.V.), and Irgacure 907, Irgacure 369, Irgacure 369E, and Irgacure 379EG (all manufactured by BASF). Examples of commercially available acylphosphine compounds include Omnirad 819 and Omnirad TPO (both manufactured by IGM Resins BV), Irgacure 819 and Irgacure TPO (both manufactured by BASF).

[0291] Examples of the oxime compound include the compound described in paragraph 0142 of International Publication No. 2022 / 085485, the compound described in Japanese Patent No. 5430746, the compound described in Japanese Patent No. 5647738, the compound represented by the general formula (1) or the compound described in paragraphs 0022 to 0024 of Japanese Patent Application Laid-Open No. 2021-173858, the compound represented by the general formula (1) or the compound described in paragraphs 0117 to 0120 of Japanese Patent Application Laid-Open No. 2021-170089, and the like. Specific examples of oxime compounds include 3-benzoyloxyiminobutan-2-one, 3-acetoxyiminobutan-2-one, 3-propionyloxyiminobutan-2-one, 2-acetoxyiminopentan-3-one, 2-acetoxyimino-1-phenylpropan-1-one, 2-benzoyloxyimino-1-phenylpropan-1-one, 3-(4-toluenesulfonyloxy)iminobutan-2-one, 2-ethoxycarbonyloxyimino-1-phenylpropan-1-one, 1-[4-(phenylthio)phenyl]-3-cyclohexane-propane-1,2-dione-2-(O-acetoxime), and the like. Examples of commercially available products include Irgacure OXE01, Irgacure OXE02, Irgacure OXE03, and Irgacure OXE04 (all manufactured by BASF), TR-PBG-301, TR-PBG-304, and TR-PBG-327 (manufactured by TRONLY), and Adeka Optomer N-1919 (manufactured by ADEKA CORPORATION, a photopolymerization initiator 2 described in JP-A-2012-014052). Furthermore, as the oxime compound, it is also preferred to use a non-coloring compound or a compound that is highly transparent and resistant to discoloration. Examples of commercially available products include ADEKA ARKLS NCI-730, NCI-831, and NCI-930 (all manufactured by ADEKA CORPORATION).

[0292] As photopolymerization initiators, oxime compounds having a fluorene ring, oxime compounds having a carbazole ring in which at least one benzene ring is a naphthalene ring skeleton, oxime compounds having a fluorine atom, oxime compounds having a nitro group, oxime compounds having a benzofuran skeleton, oxime compounds having a substituent having a hydroxyl group bonded to the carbazole skeleton, and compounds described in paragraphs 0143 to 0149 of International Publication No. 2022 / 085485 can also be used.

[0293] Specific examples of the oxime compound that can be preferably used in the present invention are shown below, but the present invention is not limited to these.

[0294] [Chemical Formula 16]

[0295]

[0296] [Chemical Formula 17]

[0297]

[0298] [Chemical Formula 18]

[0299]

[0300] The oxime compound is preferably a compound having a maximum absorption wavelength in the range of 350 to 500 nm, more preferably a compound having a maximum absorption wavelength in the range of 360 to 480 nm. Furthermore, from the viewpoint of sensitivity, the oxime compound preferably has a high molar absorptivity at a wavelength of 365 nm or a wavelength of 405 nm, more preferably 1000 to 300,000, further preferably 2000 to 300,000, and particularly preferably 5000 to 200,000. The molar absorptivity of the compound can be determined using a known method. For example, it is preferably measured using an ethyl acetate solvent at a concentration of 0.01 g / L using a spectrophotometer (Cary-5 spectrophotometer manufactured by Varian).

[0301] As a photopolymerization initiator, a difunctional or trifunctional or higher photoradical polymerization initiator can be used. By using such a photoradical polymerization initiator, two or more free radicals are generated from one molecule of the photoradical polymerization initiator, so that good sensitivity can be obtained. In addition, when a compound with an asymmetric structure is used, the crystallinity decreases and the solubility in solvents etc. increases, and it becomes difficult to precipitate over time, thereby improving the temporal stability of the composition. As specific examples of difunctional or trifunctional or higher photoradical polymerization initiators, the compounds described in paragraph 0148 of International Publication No. 2022 / 065215 can be cited.

[0302] The content of the photopolymerization initiator in the total solids content of the composition is preferably 0.1 to 40% by mass, more preferably 0.5 to 35% by mass, and even more preferably 1 to 30% by mass. The composition may contain only one type of photopolymerization initiator or two or more types. When containing two or more types, their total amount is preferably within the above range.

[0303] Curing Agent

[0304] In the case where the composition of the present invention contains a compound with a cyclic ether group, it is preferably further contained a curing agent. As a curing agent, for example, an amine compound, an acid anhydride compound, an amide compound, a phenolic compound, a polycarboxylic acid, a thiol compound, etc. can be mentioned. As a specific example of a curing agent, succinic acid, trimellitic acid, pyromellitic acid, N, N-dimethyl-4-aminopyridine, pentaerythritol tetrakis (3-mercaptopropionic acid) etc. can be mentioned. The curing agent can also use the compounds described in paragraphs 0072 to 0078 of Japanese Patent Application Laid-Open No. 2016-075720 and the compounds described in Japanese Patent Application Laid-Open No. 2017-036379. The content of the curing agent is preferably 0.01 to 20 parts by mass relative to 100 parts by mass of the compound with a cyclic ether group, more preferably 0.01 to 10 parts by mass, and further preferably 0.1 to 6.0 parts by mass.

[0305] Color Colorants

[0306] The composition of the present invention may contain a colorant. Examples of the colorant include red, green, blue, yellow, violet, and orange. The colorant may be a pigment or a dye. Pigments and dyes may be used in combination. The pigment may be either an inorganic pigment or an organic pigment. Furthermore, the pigment may be a material in which a portion of an inorganic pigment or an organic-inorganic pigment is replaced with an organic chromophore. By replacing an inorganic pigment or an organic-inorganic pigment with an organic chromophore, hue design can be facilitated.

[0307] The average primary particle size of the pigment is preferably 1 to 200 nm. The lower limit is preferably 5 nm or more, more preferably 10 nm or more. The upper limit is preferably 180 nm or less, more preferably 150 nm or less, and further preferably 100 nm or less. In addition, in this specification, the primary particle size of the pigment can be obtained by observing the primary particles of the pigment under a transmission electron microscope and based on the obtained photographs. Specifically, the projected area of ​​the primary particles of the pigment is obtained, and the equivalent circle diameter corresponding thereto is calculated as the primary particle size of the pigment. In addition, the average primary particle size in this specification is set as the arithmetic mean of the primary particle sizes of 400 primary particles of the pigment. In addition, the primary particles of the pigment refer to independent particles that are not agglomerated.

[0308] The coloring agent preferably contains a pigment. The content of the pigment in the coloring agent is preferably 50% by mass or more, more preferably 70% by mass or more, further preferably 80% by mass or more, and particularly preferably 90% by mass or more. Examples of the pigment include the following.

[0309] Color Index (CI) Pigment Yellow 1, 2, 3, 4, 5, 6, 10, 11, 12, 13, 14, 15, 16, 17, 18, 20, 24, 31, 32, 34, 35, 35:1, 36, 36:1, 37, 37:1, 40, 42, 43, 53, 55, 60, 61, 62, 63, 65, 73, 74, 77, 81, 83, 86, 93, 94, 95, 97, 98, 100, 101, 104, 106, 108, 109, 110, 113, 114, 115, 116, 117, 118, 119, 120, 123, 125, 126, 127, 128 、129、137、138、139、147、148、150、151、152、153、154、155、156、161、162、164、166、167、168、169、170、171、172、173、174、175、176、177、179、180、181、182、185、187、188、193、194、199、213、214、215、228、231、232(methine series), 233(quinoline series), 234(aminoketone series), 235(aminoketone series), 236(aminoketone series), etc. (the above are yellow pigments),

[0310] CI Pigment Orange 2, 5, 13, 16, 17: 1, 31, 34, 36, 38, 43, 46, 48, 49, 51, 52, 55, 59, 60, 61, 62, 64, 71, 73, etc. (the above are orange pigments),

[0311] CI Pigment Red 1, 2, 3, 4, 5, 6, 7, 9, 10, 14, 17, 22, 23, 31, 38, 41, 48:1, 48:2, 48:3, 48:4, 49, 49:1, 49:2, 52:1, 52:2, 53:1, 57:1, 60:1, 63:1, 66, 67, 81:1, 81:2, 81:3, 83, 88, 90, 105, 112, 119, 122, 123, 144, 146, 149, 150, 155, 166, 168, 169, 170, 171, 172, 175, 176, 177, 178, 179, 184, 185, 187, 188, 190, 200, 202, 206, 207, 208, 209, 210, 216, 220, 224, 226, 242, 246, 254, 255, 264, 269, 270, 272, 279, 291, 294 (xanthenes, Organo Ultramarine, Bluish Red), 295 (monoazo), 296 (diazo), 297 (aminoketone), etc. (all red pigments)

[0312] CI Pigment Green 7, 10, 36, 37, 58, 59, 62, 63, 64 (phthalocyanine series), 65 (phthalocyanine series), 66 (phthalocyanine series), etc. (the above are green pigments),

[0313] CI Pigment Violet 1, 19, 23, 27, 32, 37, 42, 60 (triarylmethane series), 61 (xanthenes), etc. (the above are purple pigments),

[0314] CI Pigment Blue 1, 2, 15, 15:1, 15:2, 15:3, 15:4, 15:6, 16, 22, 29, 60, 64, 66, 79, 80, 87 (monoazo series), 88 (methine series), etc. (the above are blue pigments).

[0315] As a green colorant, a zinc phthalocyanine halogenide pigment having an average of 10 to 14 halogen atoms, an average of 8 to 12 bromine atoms, and an average of 2 to 5 chlorine atoms per molecule can also be used. Specific examples include compounds described in International Publication No. 2015 / 118720. Furthermore, as a green colorant, compounds described in paragraph 0029 of International Publication No. 2022 / 085485, aluminum phthalocyanine compounds described in Japanese Patent Application Laid-Open No. 2020-070426, and diarylmethane compounds described in Japanese Patent Application Laid-Open No. 2020-504758 can also be used.

[0316] As a blue colorant, an aluminum phthalocyanine compound having a phosphorus atom can also be used. Specific examples include the compounds described in paragraphs 0022 to 0030 of JP-A-2012-247591 and paragraph 0047 of JP-A-2011-157478.

[0317] As the yellow colorant, the compounds described in paragraphs 0031 to 0033 of International Publication No. 2022 / 085485, the methine dyes described in JP-A-2019-073695, and the methine dyes described in JP-A-2019-073696 can be used.

[0318] As the red colorant, the compound described in paragraph 0034 of International Publication No. 2022 / 085485 and the brominated diketopyrrolopyrrole compound described in Japanese Patent Application Laid-Open No. 2020-085947 can also be used.

[0319] Color coloring agent can also use dye.As dye, there is no particular restriction, can use known dye.For example can enumerate pyrazole azo dye, anilino azo dye, triarylmethane dye, anthraquinone dye, anthrapyridone dye, benzylidene dye, oxonol dye, pyrazolotriazole azo dye, pyridone azo dye, cyanine dye, phenothiazine dye, pyrrolopyrazole azoimine dye, xanthene dye, phthalocyanine dye, benzopyran dye, indigo dye, pyrromethene dye etc.And dye also can use the thiazole compound of recording in Japanese Unexamined Patent Publication No. 2012-158649, the azo compound of recording in Japanese Unexamined Patent Publication No. 2011-184493, the azo compound of recording in Japanese Unexamined Patent Publication No. 2011-145540.

[0320] As color colorants, triarylmethane dye polymers described in Korean Patent Publication No. 10-2020-0028160, xanthene compounds described in Japanese Patent Application Laid-Open No. 2020-117638, phthalocyanine compounds described in International Publication No. 2020 / 174991, isoindoline compounds or salts thereof described in Japanese Patent Application Laid-Open No. 2020-160279, and phthalocyanine compounds described in Korean Patent Application Laid-Open No. 10-2020-0069442 can also be used. The compound represented by formula 1, the compound represented by formula 1 described in Korean Patent Publication No. 10-2020-0069730, the compound represented by formula 1 described in Korean Patent Publication No. 10-2020-0069070, the compound represented by formula 1 described in Korean Patent Publication No. 10-2020-0069067, the compound represented by formula 1 described in Korean Patent Publication No. 10-2020-0069062, the compound represented by formula 1 described in Japanese Patent No. Halogenated zinc phthalocyanine pigments described in JP-A-2020-180176, isoindoline compounds described in JP-A-2021-187913, halogenated zinc phthalocyanine pigments described in International Publication No. 2022 / 004261, halogenated zinc phthalocyanine pigments described in International Publication No. 2021 / 250883, quinophthalocyanine pigments represented by formula 1 in Korean Patent Publication No. 10-2020-0030759, Compounds, polymer dyes described in Korean Patent Publication No. 10-2020-0061793, colorants described in Japanese Patent Application Publication No. 2022-029701, isoindoline compounds described in International Publication No. 2022 / 014635, aluminum phthalocyanine compounds described in International Publication No. 2022 / 024926, compounds described in Japanese Patent Application Publication No. 2022-045895, and compounds described in International Publication No. 2022 / 050051. The color colorant may be a rotaxane, and the pigment skeleton may be used for the cyclic structure of the rotaxane, the rod-shaped structure, or both the cyclic and rod-shaped structures.

[0321] When the composition of the present invention contains a colorant, the content of the colorant in the total solid content of the composition is preferably 1 to 50% by mass. When the composition of the present invention contains two or more colorants, the total amount thereof is preferably within the above range.

[0322] When the composition of the present invention is used as an infrared cut filter, it is preferred that the composition of the present invention contain substantially no colorant. Furthermore, "substantially no colorant" in the composition of the present invention means that the content of the colorant in the total solids content of the composition is 0.5% by mass or less, preferably 0.1% by mass or less, and more preferably contains no colorant.

[0323] Pigments that transmit infrared rays and block visible light

[0324] The composition of the present invention may also contain a colorant that transmits infrared rays and blocks visible light (hereinafter also referred to as a visible light blocking colorant). A composition containing a visible light blocking colorant can be preferably used as a composition for forming an infrared transmission filter.

[0325] The visible light-blocking colorant preferably absorbs light in the violet to red wavelength range. Furthermore, the visible light-blocking colorant preferably blocks light in the 450-650 nm wavelength range. Furthermore, the visible light-blocking colorant preferably transmits light in the 900-1500 nm wavelength range. The visible light-blocking colorant preferably satisfies at least one of the following requirements (A) and (B).

[0326] (A): Contains two or more coloring agents, and the combination of the two or more coloring agents forms black.

[0327] (B): Contains an organic black colorant.

[0328] Examples of color colorants include those mentioned above. Examples of organic black colorants include bisbenzofuranone compounds, azomethine compounds, perylene compounds, and azo compounds, with bisbenzofuranone compounds and perylene compounds being preferred. Examples of bisbenzofuranone compounds include compounds described in JP-A-2010-534726, JP-A-2012-515233, and JP-A-2012-515234, and are available as "Irgaphor Black" manufactured by BASF. Examples of perylene compounds include compounds described in paragraphs 0016 to 0020 of JP-A-2017-226821, and CI Pigment Black 31 and 32. Examples of the azomethine compound include compounds described in Japanese Patent Application Laid-Open No. 01-170601 and Japanese Patent Application Laid-Open No. 02-034664. For example, it is available as "CHROMO FINE BLACK A1103" manufactured by Dainichiseika Color & Chemicals Mfg. Co., Ltd.

[0329] When two or more coloring agents are combined to form black, for example, the following embodiments (1) to (8) can be mentioned.

[0330] (1) A method containing a yellow colorant, a blue colorant, a purple colorant, and a red colorant.

[0331] (2) A method containing a yellow colorant, a blue colorant, and a red colorant.

[0332] (3) A method containing a yellow colorant, a purple colorant, and a red colorant.

[0333] (4) A method containing a yellow colorant and a purple colorant.

[0334] (5) A method containing a green colorant, a blue colorant, a purple colorant, and a red colorant.

[0335] (6) A form containing a purple colorant and an orange colorant.

[0336] (7) A method containing a green colorant, a purple colorant, and a red colorant.

[0337] (8) A method containing a green colorant and a red colorant.

[0338] When the composition of the present invention contains a colorant that blocks visible light, the content of the colorant that blocks visible light in the total solids content of the composition is preferably 1 to 50% by mass. The lower limit is preferably 5% by mass or more, more preferably 10% by mass or more, further preferably 20% by mass or more, and particularly preferably 30% by mass or more.

[0339] When the composition of the present invention is used as an infrared cut filter, it is preferred that the composition of the present invention be substantially free of a colorant that blocks visible light. Furthermore, the fact that the composition of the present invention is substantially free of a colorant that blocks visible light means that the content of the colorant that blocks visible light in the total solids content of the composition is 0.5% by mass or less, preferably 0.1% by mass or less, and more preferably contains no colorant that blocks visible light.

[0340] Antioxidants

[0341] The compositions of the present invention can contain an antioxidant.

[0342] Examples of antioxidants include antioxidants containing at least one phosphorus atom in the molecule (hereinafter also referred to as phosphorus-based antioxidants), phenol-based antioxidants, amine-based antioxidants, and sulfur-based antioxidants. Phosphorus-based antioxidants are preferred. Combination use of a phosphorus-based antioxidant and a phenol-based antioxidant is also preferred.

[0343] Examples of the phosphorus-based antioxidant include compounds having a structure represented by formula (p), and compounds represented by formulas (p-1) to (p-3) are preferred.

[0344] [Chemical Formula 19]

[0345]

[0346] In formula (p), * is a connecting bond.

[0347] [Chemical Formula 20]

[0348]

[0349] Where R p1 ~R p5 Each independently represents a hydrogen atom; a halogen atom; a hydrocarbon group having 1 to 30 carbon atoms which may have a linking group containing an oxygen atom, a sulfur atom, a nitrogen atom or a silicon atom; or a polar group, n represents an integer of 0 to 5, and m is 0 or 1.

[0350] Specific examples of phosphorus-based antioxidants include the compounds described in paragraph 0053 of JP-A-2021-039369, tris[2-[[2,4,8,10-tetrakis(1,1-dimethylethyl)dibenzo[d,f][1,3,2]dioxaphosphin-6-yl]oxy]ethyl]amine, tris[2-[(4,6,9,11-tetrakis-tert-butyldibenzo[d,f][1,3,2]dioxaphosphin-2-yl)oxy]ethyl]amine, bis(2,4-di-tert-butyl-6-methylphenyl)ethyl phosphite, and tris(2,4-di-tert-butylphenyl)phosphite.

[0351] Examples of phenolic antioxidants include hindered phenol compounds. Phenolic antioxidants are preferably compounds having a substituent at a position adjacent to the phenolic hydroxyl group (ortho position). The substituent is preferably a substituted or unsubstituted alkyl group having 1 to 22 carbon atoms.

[0352] Examples of commercially available antioxidants include ADEKA STAB AO-20, ADEKA STAB AO-30, ADEKA STAB AO-40, ADEKA STAB AO-50, ADEKA STAB AO-50F, ADEKA STAB AO-60, ADEKA STAB AO-60G, ADEKA STAB A0-80, ADEKA STAB AO-330, ADEKA STAB AO-412S, ADEKA STAB 2112, ADEKA STAB PEP-8, ADEKA STAB PEP-36, ADEKA STAB HP-10, ADEKA STAB 2112, ADEKA STAB 2112RG, ADEKA STAB 1178, ADEKA STAB 1500, ADEKA STAB C, ADEKA STAB 135A, ADEKA STAB 3010, and ADEKA STAB TPP (all manufactured by ADEKA CORPORATION), JP-650 (manufactured by JOHOKU CHEMICAL CO., LTD.), and the like.

[0353] As the antioxidant, compounds described in paragraphs 0023 to 0048 of Japanese Patent No. 6268967, compounds described in International Publication No. 2017 / 006600, compounds described in International Publication No. 2017 / 164024, and compounds described in Korean Patent Publication No. 10-2019-0059371 can also be used.

[0354] The content of the antioxidant in the total solid content of the composition is preferably 0.01 to 20% by mass, more preferably 0.3 to 15% by mass. The composition may contain only one antioxidant or two or more. When containing two or more antioxidants, their total amount is preferably within the above range.

[0355] Surfactants

[0356] The composition of the present invention may contain a surfactant. Examples of surfactants include fluorochemical surfactants, nonionic surfactants, cationic surfactants, anionic surfactants, and silicone surfactants. The surfactant is preferably a silicone surfactant or a fluorochemical surfactant. For surfactants, reference may be made to the surfactants described in paragraphs 0238 to 0245 of International Publication No. 2015 / 166779, which are incorporated herein by reference.

[0357] As the fluorine-based surfactant, the compounds described in paragraphs 0167 to 0173 of International Publication No. 2022 / 085485 can be used.

[0358] Examples of the nonionic surfactant include compounds described in paragraph 0174 of International Publication No. 2022 / 085485.

[0359] Examples of the silicone surfactant include SH8400, SH8400 FLUID, FZ-2122, 67 Additive, 74 Additive, M Additive, and SF 8419OIL (all manufactured by Dow Corning Toray Co., Ltd.), TSF-4440, TSF-4300, TSF-4445, TSF-4460, and TSF-4452 (all manufactured by Momentive Performance Materials Inc.), KP-341, KF-6000, KF-6001, KF-6002, and KF-6003 (all manufactured by Shin-Etsu Chemical). Co., Ltd.), BYK-307, BYK-322, BYK-323, BYK-330, BYK-3760, BYK-UV3510 (all manufactured by BYK-Chemie GmbH), etc. As the silicone surfactant, compounds with the following structures can also be used.

[0360] [Chemical Formula 21]

[0361]

[0362] The content of the surfactant in the total solid content of the composition is preferably 0.001 to 1% by mass, more preferably 0.001 to 0.5% by mass, and even more preferably 0.001 to 0.2% by mass. The composition may contain only one surfactant or two or more. When containing two or more surfactants, their total amount is preferably within the above range.

[0363] Inhibitors

[0364] The composition of the present invention may contain a polymerization inhibitor. Examples of the polymerization inhibitor include hydroquinone, p-methoxyphenol, di-tert-butyl-p-cresol, gallol, tert-butylcatechol, benzoquinone, 4,4'-thiobis(3-methyl-6-tert-butylphenol), 2,2'-methylenebis(4-methyl-6-tert-butylphenol), N-nitrosophenylhydroxylamine salts (ammonium salts, cerium salts, etc.), preferably p-methoxyphenol. The content of the polymerization inhibitor in the total solids content of the composition is preferably 0.0001 to 5% by mass. The composition may contain only one polymerization inhibitor or two or more. When containing two or more, their total amount is preferably within the above range.

[0365] Silane coupling agent

[0366] The composition of the present invention can contain a silane coupling agent. The silane coupling agent is preferably a silane compound having a hydrolyzable group, more preferably a silane compound having a hydrolyzable group and a functional group other than the hydrolyzable group. The hydrolyzable group refers to a substituent that is directly bonded to a silicon atom and can produce a siloxane bond through at least one of a hydrolysis reaction and a condensation reaction. As the hydrolyzable group, for example, a halogen atom, an alkoxy group, an acyloxy group, etc. can be mentioned, preferably an alkoxy group. The silane coupling agent is preferably a compound having an alkoxysilyl group. And, as the functional group other than the hydrolyzable group, for example, a vinyl group, a styryl group, a (meth)acryloyl group, a thiol group, an epoxy group, an oxetane group, an amino group, a urea group, a thioether group, an isocyanate group, a phenyl group, etc. can be mentioned, preferably a (meth)acryloyl group and an epoxy group. Examples of silane coupling agents include the compounds described in paragraphs 0018 to 0036 of JP-A-2009-288703 and the compounds described in paragraphs 0056 to 0066 of JP-A-2009-242604. The content of the silane coupling agent in the total solids content of the composition is preferably 0.01 to 15.0% by mass, more preferably 0.05 to 10.0% by mass. The composition may contain only one silane coupling agent or two or more. When containing two or more silane coupling agents, their total amount is preferably within the above range.

[0367] Ultraviolet absorbers

[0368] The composition of the present invention may contain an ultraviolet absorber. Examples of the ultraviolet absorber include conjugated diene compounds, aminodiene compounds, salicylate compounds, benzophenone compounds, benzotriazole compounds, acrylonitrile compounds, hydroxyphenyltriazine compounds, indole compounds, triazine compounds, and dibenzoyl compounds. Specific examples of such compounds include those described in paragraphs 0038 to 0052 of Japanese Patent Application Laid-Open No. 2009-217221, paragraphs 0052 to 0072 of Japanese Patent Application Laid-Open No. 2012-208374, paragraphs 0317 to 0334 of Japanese Patent Application Laid-Open No. 2013-068814, paragraphs 0061 to 0080 of Japanese Patent Application Laid-Open No. 2016-162946, paragraphs 0052 and 0074 of International Publication No. 2021 / 131355, and paragraphs 0022 to 0024 of International Publication No. 2021 / 132247, the contents of which are incorporated herein. Commercially available ultraviolet absorbers include the Tinuvin series and Uvinul series manufactured by BASF. Moreover, as benzotriazole compounds, MIYOSHI OIL&FAT CO., LTD. MYUA series (Chemical Industry Daily, February 1, 2016) can be cited. Ultraviolet absorbers can also use compounds described in paragraphs 0049 to 0059 of Japanese Patent No. 6268967, compounds described in paragraphs 0059 to 0076 of International Publication No. 2016 / 181987, thioaryl-substituted benzotriazole type ultraviolet absorbers described in International Publication No. 2020 / 137819, and reactive triazine ultraviolet absorbers described in Japanese Patent Laid-Open No. 2021-178918. The content of the ultraviolet absorber in the total solid content of the photosensitive composition is preferably 0.01 to 30% by mass, more preferably 0.05 to 25% by mass. The photosensitive composition may contain only one ultraviolet absorber or may contain two or more. When containing two or more, it is preferred that their total amount is within the above range.

[0369] Other ingredients

[0370] The composition of the present invention may also contain sensitizers, fillers, thermosetting accelerators, plasticizers and other auxiliary agents (e.g., conductive particles, defoamers, flame retardants, leveling agents, peeling accelerators, fragrances, surface tension modifiers, chain transfer agents, potential antioxidants, etc.) as needed. By appropriately containing these ingredients, properties such as film properties can be adjusted. These ingredients can use the compounds described in paragraph 0182 of International Publication No. 2022 / 085485.

[0371] <Storage Container>

[0372] The container for storing the composition of the present invention is not particularly limited, and a known container can be used. In addition, the container described in paragraph 0187 of International Publication No. 2022 / 085485 can be used.

[0373] <Method for Preparing Composition>

[0374] The composition of the present invention can be prepared by mixing the above-mentioned components. When preparing the composition, all the components can be dissolved or dispersed in a solvent at the same time to prepare the composition. Alternatively, two or more solutions or dispersions containing the components can be prepared in advance as needed and mixed at the time of use (during application).

[0375] When preparing the composition, a process for dispersing the pigment may be included. In the process for dispersing the pigment, compression, extrusion, impact, shearing, pitting, etc. may be cited as mechanical forces for dispersing the pigment. As specific examples of these processes, bead mills, sand mills, roller mills, ball mills, paint agitators, microfluidizers, high-speed impellers, sand mixers, jet mixers, high-pressure wet micronization, ultrasonic dispersion, etc. may be cited. Furthermore, the pigment is preferably pulverized in a sand mill (bead mill) under conditions that improve pulverization efficiency by using microbeads with a small diameter or increasing the filling rate of the microbeads. Furthermore, after the pulverization process, coarse particles are preferably removed by filtration, centrifugation, etc. Furthermore, regarding the pigment dispersion process and disperser, preferably, the process and disperser described in "Complete Collection of Dispersion Technology, Published by JOHOKIKO CO., LTD., July 15, 2005" or "Comprehensive Data Collection of Dispersion Technology and Practical Industrial Applications Focusing on Suspensions (Solid / Liquid Dispersion Systems), Published by the Business Development Center Publishing Department, October 10, 1978," or in paragraph 0022 of Japanese Patent Application Publication No. 2015-157893 can be used. Furthermore, in the pigment dispersion process, the pigment can be micronized by a salt milling process. For the materials, apparatus, and processing conditions used in the salt milling process, reference can be made to the descriptions of Japanese Patent Application Publication No. 2015-194521 and Japanese Patent Application Publication No. 2012-046629, for example. Examples of the microbead material used for dispersion include zirconium dioxide, agate, quartz, titanium dioxide, tungsten carbide, silicon nitride, aluminum oxide, stainless steel, and glass. Furthermore, microbeads may also be made of inorganic compounds having a Mohs hardness of 2 or higher. The composition may contain the microbeads in an amount of 1 to 10,000 ppm.

[0376] When preparing the composition, it is preferred to filter the composition with a filter for the purpose of removing foreign matter, reducing defects, etc. Examples of the type of filter used for filtration and the filtration method include the filters and filtration methods described in paragraphs 0196 to 0199 of International Publication No. 2022 / 085485.

[0377] <Film>

[0378] Next, the film of the present invention is described. The film of the present invention is a film obtained from the composition of the present invention described above. The film of the present invention can be preferably used as an optical filter. The use of the optical filter is not particularly limited, and examples include infrared cutoff filters, infrared transmission filters, and the like. As infrared cutoff filters, for example, infrared cutoff filters on the light receiving side of a solid-state imaging element (for example, infrared cutoff filters for wafer-level lenses, etc.), infrared cutoff filters on the back side (the side opposite to the light receiving side) of a solid-state imaging element, infrared cutoff filters for ambient light sensors (for example, an illumination sensor that senses the illuminance and hue of the environment in which the information terminal device is placed and adjusts the hue of the display, a color correction sensor that adjusts the hue), and the like can be cited. In particular, it can be preferably used as an infrared cutoff filter on the light receiving side of a solid-state imaging element. As infrared transmission filters, filters that block visible light and can selectively transmit infrared rays above a specific wavelength can be cited.

[0379] The film of the present invention may have a pattern or may be a film without a pattern (flat film). Furthermore, the film of the present invention may be used by being laminated on a support or by being peeled from the support.

[0380] The support is not particularly limited and can be appropriately selected according to the intended use. For example, a transparent substrate, a silicon substrate, etc. can be mentioned. A charge coupled device (CCD), a complementary metal oxide semiconductor (CMOS), a photoelectric conversion layer, a transparent conductive film, etc. can be formed on the silicon substrate. In addition, sometimes a partition wall is formed on the silicon substrate to isolate each pixel. As the partition wall, metals, metal oxides, black matrices, etc. can be mentioned. In addition, in order to improve the adhesion with the upper layer, prevent the diffusion of substances or flatten the surface of the substrate, a base layer can be provided on the silicon substrate. When measured with diiodomethane, the surface contact angle of the base layer is preferably 20 to 70°. And, when measured with water, it is preferably 30 to 80°. As the transparent substrate, there is no particular limitation as long as it is composed of a material that can at least transmit visible light. For example, a substrate composed of a material such as glass and resin can be mentioned. As resin, polyester resins such as polyethylene terephthalate and polybutylene terephthalate, polyolefin resins such as polyethylene, polypropylene, and ethylene vinyl acetate copolymer, acrylic resins such as norbornene resin, polyacrylate, and polymethyl methacrylate, urethane resins, vinyl chloride resins, fluororesins, polycarbonate resins, polyvinyl butyral resins, and polyvinyl alcohol resins can be enumerated. As glass, soda-lime glass, borosilicate glass, alkali-free glass, quartz glass, and copper-containing glass can be enumerated. As copper-containing glass, copper-containing phosphate glass and copper-containing fluorophosphate glass can be enumerated. Commercially available products can also be used for copper-containing glass. Commercially available products of copper-containing glass include NF-50 (AGC TECHNO GLASS Co., Ltd. system).

[0381] The thickness of the film of the present invention can be appropriately adjusted depending on the intended purpose. The thickness of the film can be set to 200 μm or less, 150 μm or less, 120 μm or less, 20 μm or less, 10 μm or less, or 5 μm or less. The lower limit of the film thickness is preferably 0.1 μm or more, more preferably 0.2 μm or more.

[0382] When the film of the present invention is used as an infrared cut filter, it preferably has a maximum absorption wavelength within the wavelength range of 650 to 1500 nm (preferably 660 to 1200 nm, more preferably 660 to 1000 nm).

[0383] Furthermore, the average transmittance in the wavelength range of 700 to 720 nm is preferably 10% or less, more preferably 7% or less, further preferably 4% or less, and particularly preferably 2% or less.

[0384] Furthermore, the average transmittance within the wavelength range of 420 to 550 nm is preferably 86% or higher, more preferably 89% or higher, further preferably 92% or higher, and particularly preferably 95% or higher. Furthermore, the transmittance within the entire wavelength range of 420 to 550 nm is preferably 50% or higher, more preferably 70% or higher, and even more preferably 80% or higher.

[0385] Furthermore, the transmittance at at least one point within the wavelength range of 650 to 1500 nm (preferably 660 to 1200 nm, more preferably 660 to 1000 nm) is preferably 10% or less, more preferably 7% or less, further preferably 4% or less, and particularly preferably 2% or less.

[0386] Furthermore, when the absorbance at the maximum absorption wavelength is defined as 1, the average absorbance of the film of the present invention in the wavelength range of 420 to 550 nm is preferably less than 0.030, more preferably less than 0.025.

[0387] When the film of the present invention is used as an infrared transmission filter, the film of the present invention preferably has any one of the following spectral characteristics (i1) to (i3), for example.

[0388] (i1): A filter having a maximum transmittance of 20% or less (preferably 15% or less, more preferably 10% or less) within the wavelength range of 400 to 850 nm and a minimum transmittance of 70% or more (preferably 75% or more, more preferably 80% or more) within the wavelength range of 1000 to 1500 nm. A film having such spectral characteristics can block light within the wavelength range of 400 to 850 nm while transmitting light exceeding a wavelength of 950 nm.

[0389] (i2): A filter having a maximum transmittance of 20% or less (preferably 15% or less, more preferably 10% or less) within the wavelength range of 400 to 950 nm and a minimum transmittance of 70% or more (preferably 75% or more, more preferably 80% or more) within the wavelength range of 1100 to 1500 nm. A film having such spectral characteristics can block light within the wavelength range of 400 to 950 nm while transmitting light exceeding a wavelength of 1050 nm.

[0390] (i3): A filter having a maximum transmittance of 20% or less (preferably 15% or less, more preferably 10% or less) within the wavelength range of 400 to 1050 nm and a minimum transmittance of 70% or more (preferably 75% or more, more preferably 80% or more) within the wavelength range of 1200 to 1500 nm. A film having such spectral characteristics can block light within the wavelength range of 400 to 1050 nm while transmitting light exceeding a wavelength of 1150 nm.

[0391] The film of the present invention can also be used in combination with a color filter comprising a color colorant. The color filter can be manufactured using a coloring composition comprising a color colorant. When the film of the present invention is used as an infrared cutoff filter and the film of the present invention and the color filter are used in combination, the color filter is preferably configured on the optical path of the film of the present invention. For example, the film of the present invention is preferably stacked with a color filter and used as a laminate. In the laminate, the film of the present invention and the color filter may be adjacent or non-adjacent in the thickness direction. When the film of the present invention and the color filter are not adjacent in the thickness direction, the film of the present invention may be formed on a support different from the support on which the color filter is formed, or other components constituting a solid-state imaging element (for example, a microlens, a flattening layer, etc.) may be sandwiched between the film of the present invention and the color filter.

[0392] The film of the present invention can be used in various devices such as CCI (charge coupled device), CMOS (complementary metal oxide semiconductor) and other solid-state imaging elements (in addition to Si, the imaging part can also use compound semiconductors such as InGaAs, organic semiconductors, quantum dots, etc.), infrared sensors, light-emitting elements, optical communication elements (including transceivers), image display devices, etc.

[0393] <Method for producing film>

[0394] The film of the present invention can be produced through a step of applying the composition of the present invention.

[0395] As a support, the above-mentioned support can be mentioned. As a coating method of the composition, a known method such as a spin coating method can be utilized. For example, the coating method described in paragraph 0207 of International Publication No. 2022 / 085485 can be used.

[0396] The composition layer formed by applying the composition can be dried (prebaked). When prebaking, the prebaking temperature is preferably 150°C or less, more preferably 120°C or less, and further preferably 110°C or less. The lower limit can be, for example, 50°C or more, or 80°C or more. The prebaking time is preferably 10 seconds to 3000 seconds, more preferably 40 to 2500 seconds, and further preferably 80 to 220 seconds. Drying can be performed using a hot plate, an oven, or the like.

[0397] The film manufacturing method may further include a patterning step. Examples of patterning methods include photolithography and dry etching, with photolithography being preferred. Furthermore, when the film of the present invention is used as a flat film, the patterning step may not be performed. The patterning step is described in detail below.

[0398] (When patterning is performed using photolithography)

[0399] The pattern forming method using photolithography preferably includes a step of exposing the composition layer formed by applying the composition of the present invention in a patterned manner (exposure step) and a step of developing and removing the unexposed portion of the composition layer to form a pattern (development step). If necessary, a step of baking the developed pattern (post-baking step) may be provided. Each step is described below.

[0400] In the exposure step, the composition layer is exposed in a pattern. For example, a stepper or scanner is used to expose the composition layer through a mask having a predetermined mask pattern. This allows the exposed portion to be cured.

[0401] Examples of radiation (light) that can be used for exposure include g-rays and i-rays. Furthermore, light with a wavelength of 300 nm or less (preferably light with a wavelength of 180 to 300 nm) can also be used. Examples of light with a wavelength of 300 nm or less include KrF rays (wavelength 248 nm) and ArF rays (wavelength 193 nm), with KrF rays (wavelength 248 nm) being preferred. Furthermore, light sources with a long wavelength of 300 nm or more can also be used.

[0402] Furthermore, during exposure, light can be irradiated continuously or pulsed (pulse exposure). Pulse exposure refers to an exposure method in which light irradiation and pauses are repeated in a short (e.g., milliseconds or less) cycle to perform exposure.

[0403] The irradiation dose (exposure dose) is preferably, for example, 0.03 to 2.5 J / cm 2 , more preferably 0.05 to 1.0 J / cm 2 The oxygen concentration during exposure can be appropriately selected. In addition to being performed in the atmosphere, exposure can also be performed in a low oxygen atmosphere with an oxygen concentration of 19% by volume or less (for example, 15% by volume, 5% by volume, or substantially oxygen-free), or in a high oxygen atmosphere with an oxygen concentration exceeding 21% by volume (for example, 22% by volume, 30% by volume, or 50% by volume). Furthermore, the exposure illuminance can be appropriately set, typically from 1000 W / m 2 ~100000W / m 2 (For example, 5000W / m 2 、15000W / m 2 or 35000W / m 2 The oxygen concentration and exposure illuminance can be appropriately combined, for example, the oxygen concentration can be set to 10% by volume and the illuminance can be set to 10000 W / m 2 , oxygen concentration 35% by volume and illumination 20,000 W / m 2 wait.

[0404] Next, the unexposed portion of the composition layer after exposure is removed by development to form a pattern. The unexposed portion of the composition layer can be removed by development using a developer. As a result, the unexposed portion of the composition layer in the exposure step is dissolved into the developer, and only the photocured portion remains on the support. The temperature of the developer is preferably, for example, 20 to 30°C. The development time is preferably 20 to 180 seconds. In addition, in order to improve the residue removability, the following process can be repeated multiple times: the developer is discarded every 60 seconds, and a new developer is supplied.

[0405] Examples of the developer include organic solvents and alkaline developers, and alkaline developers are preferably used. Regarding the developer and the cleaning (rinsing) method after development, the developer and cleaning method described in paragraph 0214 of International Publication No. 2022 / 085485 can be used.

[0406] Preferably, after development, additional exposure treatment and heating treatment (post-baking) are performed after drying. Additional exposure treatment or post-baking is a curing treatment after development for complete curing. The heating temperature in the post-baking is preferably, for example, 100 to 240°C, more preferably 200 to 240°C. The developed film can be post-baked in a continuous or intermittent manner using a heating mechanism such as a hot plate or a convection oven (hot air circulation dryer), a high-frequency heater, etc. in a manner that meets the above conditions. When performing the additional exposure treatment, the light used for exposure is preferably light with a wavelength of less than 400nm. In addition, the additional exposure treatment can be performed by the method described in Korean Patent Publication No. 10-2017-0122130.

[0407] (When patterning is performed by dry etching)

[0408] When forming a pattern by dry etching, the following method can be used: a composition layer formed by coating the above-mentioned composition on a support is cured to form a cured layer, a patterned photoresist layer is formed on the cured layer, and then the cured layer is dry-etched using an etching gas using the patterned photoresist layer as a mask. When forming the photoresist layer, a pre-baking treatment is preferably performed. For details on forming a pattern by dry etching, reference can be made to paragraphs 0010 to 0067 of Japanese Patent Application Laid-Open No. 2013-064993, which is incorporated into this specification.

[0409] <Optical filter>

[0410] The optical filter of the present invention includes the above-mentioned film of the present invention. Examples of the types of optical filters include infrared cut filters and infrared transmission filters.

[0411] In addition to the film of the present invention described above, the optical filter of the present invention may further include a copper-containing layer, a dielectric multilayer film, an ultraviolet absorption layer, and the like. As the ultraviolet absorption layer, for example, the absorption layer described in paragraphs 0040 to 0070 and 0119 to 0145 of International Publication No. 2015 / 099060 can be cited. As the dielectric multilayer film, the dielectric multilayer film described in paragraphs 0255 to 0259 of Japanese Patent Application Laid-Open No. 2014-041318 can be cited. As the copper-containing layer, a glass substrate composed of copper-containing glass (copper-containing glass substrate) or a layer containing a copper complex (copper-containing complex layer) can also be used. As the copper-containing glass substrate, copper-containing phosphate glass, copper-containing fluorophosphate glass, and the like can be cited. As commercially available products containing copper glass, NF-50 (AGC TECHNO GLASS Co., Ltd. system), BG-60, BG-61 (above, Schott AG system), CD5000 (HOYA CORPORATION system) etc. can be mentioned. As preferred substrates, transparent substrates composed of materials such as glass and resin can be mentioned, and it is also preferred to directly form a film on various elements. As resins, polyester resins such as polyethylene terephthalate and polybutylene terephthalate, polyolefin resins such as polyethylene, polypropylene, and ethylene vinyl acetate copolymer, norbornene resins, polyacrylates, acrylic resins such as polymethyl methacrylate, carbamate resins, vinyl chloride resins, fluororesins, polycarbonate resins, polyvinyl butyral resins, polyvinyl alcohol resins etc. can be mentioned. As glass, soda-lime glass, borosilicate glass, alkali-free glass, quartz glass, copper-containing glass etc. can be mentioned.

[0412] <Solid-state imaging device>

[0413] The solid-state imaging device of the present invention comprises the film of the present invention described above. The structure of the solid-state imaging device is not particularly limited as long as it comprises the film of the present invention and functions as a solid-state imaging device. For example, the following structures can be cited.

[0414] The above structure is a structure in which a transfer electrode composed of a plurality of photodiodes and polysilicon, etc., constituting a light receiving area of ​​a solid-state imaging element is provided on a support, a light shielding film composed of tungsten, etc., which is opened only in the light receiving portion of the photodiode, is provided on the photodiode and the transfer electrode, a device protection film composed of silicon nitride, etc. formed in a manner covering the entire light shielding film and the light receiving portion of the photodiode is provided on the light shielding film, and a film of the present invention is provided on the device protection film. Furthermore, it can also be a structure in which a focusing mechanism (for example, a microlens, etc., the same below) is provided on the device protection film and below the film of the present invention (close to the support side), or a structure in which a focusing mechanism is provided on the film of the present invention. In addition, the color filter can also have a structure in which, for example, a film forming each pixel is embedded in a space divided into a grid shape by a partition wall. Preferably, the refractive index of the partition wall at this time is lower than that of each pixel. As examples of imaging devices having such a structure, devices described in Japanese Patent Application Publication No. 2012-227478 and Japanese Patent Application Publication No. 2014-179577 can be cited.

[0415] <Image Display Device>

[0416] The image display device of the present invention has the film of the present invention. As the image display device, a liquid crystal display device, an organic electroluminescent (organic EL) display device, etc. can be cited. The definition and details of the image display device are recorded in, for example, "Electronic Display Device (written by Akio Sasaki, Kogyo Chosakai Publishing Co., Ltd., published in 1990)", "Display Device (written by Junsho Ibuki, Sangyo Tosho Publishing Co., Ltd., published in 1989)", etc. In addition, regarding the liquid crystal display device, it is recorded in, for example, "Next Generation Liquid Crystal Display Technology (edited by Tatsuo Uchida, Kogyo Chosakai Publishing Co., Ltd., published in 1994)". There is no particular limitation on the liquid crystal display device to which the present invention can be applied. For example, it can be applied to liquid crystal display devices of various types described in the above-mentioned "Next Generation Liquid Crystal Display Technology". The image display device can have a white organic EL element. As the white organic EL element, a tandem structure is preferred. The series structure of organic EL elements is described in Japanese Patent Application Publication No. 2003-045676, edited by Akiyoshi Mikami, "The Cutting Edge of Organic EL Technology Development - High Brightness, High Precision, Long Life, Technology Collection", TECHNICAL INFORMATION INSTITUTE CO., LID., pp. 326-328, 2008. The spectrum of white light emitted by the organic EL element preferably has strong maximum emission peaks in the blue region (430-485 nm), the green region (530-580 nm) and the yellow region (580-620 nm). More preferably, in addition to these emission peaks, it further has a maximum emission peak in the red region (650-700 nm). The film of the present invention can also be used as an infrared-transmitting film provided in an opening for infrared communication formed in a frame portion of a protective plate for a display device.

[0417] <Infrared Sensor>

[0418] The infrared sensor of the present invention comprises the film of the present invention described above. The structure of the infrared sensor is not particularly limited as long as it functions as an infrared sensor. An embodiment of the infrared sensor of the present invention is described below using the accompanying drawings.

[0419] exist Figure 1In the figure, reference numeral 110 denotes a solid-state imaging element. An infrared cut filter 111 and an infrared transmission filter 114 are disposed on the imaging area of ​​the solid-state imaging element 110. Furthermore, a color filter 112 is disposed on the infrared cut filter 111. A microlens 115 is disposed on the incident light hv side of the color filter 112 and the infrared transmission filter 114. A planarization layer 116 is formed to cover the microlens 115.

[0420] The infrared cut-off filter 111 can be formed using the composition of the present invention. The color filter 112 is a color filter formed with pixels that transmit and absorb light of a specific wavelength in the visible region. It is not particularly limited, and a color filter for pixel formation known in the past can be used. For example, a color filter formed with pixels of red (R), green (G), and blue (B) can be used. For example, reference can be made to the records of paragraphs 0214 to 0263 of Japanese Patent Publication No. 2014-043556, which are incorporated into this specification. The infrared transmission filter 114 can select its characteristics according to the emission wavelength of the infrared LED used. The infrared transmission filter 114 can be formed using the composition of the present invention.

[0421] exist Figure 1 In the infrared sensor shown, an infrared cutoff filter (another infrared cutoff filter) different from the infrared cutoff filter 111 may be further disposed on the planarization layer 116. Examples of other infrared cutoff filters include those having a copper-containing layer and / or a dielectric multilayer film. Details of these filters are as described above. Furthermore, a dual-bandpass filter may be used as the other infrared cutoff filter.

[0422] <Camera Module>

[0423] The camera module of the present invention has the above-mentioned film of the present invention. The structure of the camera module is not particularly limited as long as it has the structure of the film of the present invention and functions as a camera module. For example, as a camera module, a structure having a solid-state imaging element, a lens, and a circuit for processing the image obtained from the solid-state imaging element can be cited. As the lens used in the camera module and the above-mentioned circuit for processing the image obtained from the solid-state imaging element, known circuits can be used. As examples of camera modules, reference can be made to the camera modules described in Japanese Patent Application Publication No. 2016-006476 and Japanese Patent Application Publication No. 2014-197190, and these contents are incorporated into this specification.

[0424] <Light-emitting element>

[0425] The film of the present invention can also be used in a light-emitting element. As the structure of the light-emitting element, as long as it is a structure that can function as a light-emitting element, there is no particular limitation, and examples include light-emitting diodes (LEDs), organic light-emitting diodes (OLEDs), quantum dot light-emitting diodes (QLEDs), vertical cavity surface-emitting lasers (VICSELs), etc. The film of the present invention can be formed directly on the light-emitting element or configured on the light-emitting path.

[0426] <Optical Communication Components>

[0427] The film of the present invention can also be used in optical communication components. The structure of the optical communication component is not particularly limited as long as it can function as an optical communication component, and can be a transmitting component or a receiving component. Examples of optical communication components include infrared remote controls, infrared transceivers, optical interposers, and optical interconnects. The film of the present invention can be formed directly on a receiving component or a transmitting component, and can also be arranged on a transmitting and receiving path.

[0428] Example

[0429] Below, give embodiment and the present invention is further described in detail.The materials, usage amount, ratio, processing content, processing sequence etc. shown in the following examples can be appropriately changed as long as they do not depart from the gist of the present invention.In addition, Me in the structural formula shown below represents methyl, Et represents ethyl, and Ph represents phenyl.

[0430] (Synthesis Example 1) Synthesis Example of Compound ppb-1

[0431] Compound ppb-1 was synthesized according to the following scheme.

[0432] [Chemical Formula 22]

[0433]

[0434] -Synthesis process of compound a-

[0435] In a reaction vessel, 5 parts by mass of 1-ethanonaphthone was stirred in 400 parts by mass of dichloromethane and 100 parts by mass of methanol. 15.5 parts by mass of trimethylammonium tribromide was added dropwise and stirred at room temperature for 24 hours. After cooling the reaction solution, the solvent was distilled off under reduced pressure. The resulting solid was stirred in methanol for 30 minutes and then filtered to obtain 4.5 parts by mass of Compound A.

[0436] -Synthesis process of compound b-

[0437] In a reaction vessel, 5 parts by mass of 2-cyanothioacetamide was stirred in 180 parts by mass of isopropyl alcohol. After heating to an external temperature of 60°C, 12.3 parts by mass of Compound A was added dropwise and stirred for 30 minutes. After completion of the reaction, the reaction vessel was cooled to an internal temperature of 25°C, the precipitated crystals were filtered, and washed with 180 parts by mass of isopropyl alcohol. The resulting crystals were dried with air at 50°C to obtain 10 parts by mass of Compound B.

[0438] -Synthesis process of compound c-

[0439] Compound c was synthesized using 4-(1-methylhexyloxy)benzonitrile as a starting material according to the method described in US Pat. No. 5,969,154.

[0440] -Synthesis process of compound d-

[0441] In a reaction vessel, 7 parts by mass of compound c and 7.5 parts by mass of compound b were stirred in 140 parts by mass of toluene, 12 parts by mass of phosphorus oxychloride were added dropwise, and heated under reflux for 3.5 hours. After the reaction was completed, the internal temperature was cooled to 25°C, and 210 parts by mass of methanol were added dropwise over 60 minutes while maintaining the internal temperature below 30°C. After the addition was completed, the mixture was stirred at room temperature for 30 minutes, the precipitated crystals were filtered out, and washed with 140 parts by mass of methanol. 100 parts by mass of methanol were added to the obtained crystals, heated under reflux for 30 minutes, naturally cooled to 30°C, and the crystals were filtered out. The obtained crystals were air-dried at 50°C to obtain 6 parts by mass of compound d.

[0442] -PPB-1 Synthesis Process-

[0443] In a reaction vessel, 17 parts by mass of 2-aminoethyl diphenylborate (DPBA) was stirred in 120 parts by mass of 1,2-dichlorobenzene, and 18 parts by mass of titanium tetrachloride were added dropwise at an external temperature of 40°C over 10 minutes, and stirred for 30 minutes. 6 parts by mass of compound d were added, the temperature was raised to an external temperature of 125°C and heated for 60 minutes. Naturally cooled to an internal temperature of 30°C, 120 parts by mass of methanol were added dropwise while maintaining the internal temperature below 30°C. After the addition, the mixture was stirred for 30 minutes, the crystals were filtered out, and washed with 60 parts by mass of methanol. 100 parts by mass of methanol were added to the obtained crystals, heated to reflux for 30 minutes, naturally cooled to 30°C, and the crystals were filtered out. The obtained crystals were air-dried at 50°C to obtain 6 parts by mass of compound ppb-1.

[0444] The following shows the details of the identification documents.

[0445] MALDI (Matrix Assisted Laser Desorption / Ionization) TOF-MS (Time of Flight Mass Spectrometry): Calc. for [M+H]+ 1109.3, found 1109.3

[0446] (Synthesis Example 2) Synthesis Example of Compound sq-1

[0447] Compound sq-1 was synthesized according to the following scheme.

[0448] [Chemical Formula 23]

[0449]

[0450] Synthesis of Compound E

[0451] In a reaction vessel, 3.8 parts by mass of thioacetamide was stirred in 180 parts by mass of isopropyl alcohol (IPA). After heating to an external temperature of 60°C, 12.3 parts by mass of Compound a was added dropwise and stirred for 30 minutes. After cooling the reaction solution, the solvent was distilled off under reduced pressure, and the resulting solid was purified by silica gel column chromatography (developing solvent: a mixed solvent of ethyl acetate and hexane) to obtain 4.5 parts by mass of Compound e.

[0452] Synthesis of Compound f

[0453] In a reaction vessel, 4.0 parts by mass of compound e and 8 parts by mass of iodoethane were stirred in 20 parts by mass of acetonitrile, heated to an external set point temperature of 110°C, and refluxed for 24 hours. After the reaction, the reaction was cooled to an internal temperature of 25°C, and the precipitated crystals were filtered and washed with 50 parts by mass of isopropyl alcohol. The resulting crystals were air-dried at 50°C to obtain 2.2 parts by mass of compound f.

[0454] Synthesis of Sq-1

[0455] In a reaction vessel, 2.0 parts by mass of compound f, 0.27 parts by mass of squelinic acid, and 1.4 parts by mass of pyridine were subjected to azeotropic dehydration in a mixed solution of 20 parts by mass of n-butanol (n-BuOH) and 80 parts by mass of toluene, and heated under reflux for 6 hours. After cooling the reaction solution, 200 parts by mass of methanol were added and stirred for 30 minutes. The precipitate was filtered to obtain a crude product. After the crude product was stirred in a mixed solution of 60 parts by mass of methanol and 20 parts by mass of water for 30 minutes, 0.6 parts by mass of compound sq-1 were obtained by suction filtration.

[0456] The following shows the details of the identification documents.

[0457] ·MALDI TOF-MS:Calc.for[M+H] + 581.1, found: 581.2

[0458] <Synthesis Example of Compound cr-1>

[0459] Compound cr-1 was synthesized according to the following scheme.

[0460] [Chemical Formula 24]

[0461]

[0462] In a reaction vessel, 2.0 parts by mass of compound f and 0.34 parts by mass of crotonic acid compound were stirred in triethylamine / pyridine (2.0 parts by mass / 50 parts by mass) at 100° C. for 12 hours. 80 parts by mass of hexane were added to the reaction solution and stirred for 30 minutes. The precipitate was filtered to obtain a crude product. The crude product was purified by silica gel column chromatography (developing solvent: chloroform / methanol). After removing the solvent by reduced pressure distillation, the mixture was stirred in methanol / water (20 parts by mass / 80 parts by mass) for 30 minutes, and 0.7 parts by mass of compound cr-1 were obtained by suction filtration of the solid.

[0463] The following shows the details of the identification documents.

[0464] ·MALDI TOF-MASS:Calc.for[M+H] + :609.1

[0465] Found: 609.1

[0466] <Production of Dispersion>

[0467] The infrared absorbers, pigment derivatives, dispersing resins, and solvents listed in the table below were mixed in the parts by mass listed in the table. 117 parts by mass of zirconia beads with a diameter of 0.3 mm were added, and the mixture was dispersed for 5 hours using a paint shaker. The beads were then separated by filtration to produce a dispersion. In addition, an infrared absorber was used that had undergone the following kneading and milling process.

[0468] (Mixing and grinding conditions)

[0469] 10.6 parts by mass of an infrared absorber, 149.4 parts by mass of a grinding agent, and 28 parts by mass of a binder were added to a Laboplastmill (manufactured by Toyo Seiki Seisaku-sho, Ltd.). The temperature of the kneaded material in the apparatus was controlled to 70°C, and kneaded for 2 hours. Neutral anhydrous Glauber's salt E (average particle size (50% diameter (D50) based on volume) = 20 μm, manufactured by MITAJIRI Chemical Industry Co., Ltd.) was used as the grinding agent, and diethylene glycol was used as the binder. The kneaded material after kneading and grinding was washed with 20 L of 24°C water to remove the grinding agent and binder, and then heated in a heating oven at 80°C for 24 hours.

[0470] [Table 1]

[0471]

[0472] The materials in the above table are as follows.

[0473] (Infrared absorber)

[0474] ppb-1 to ppb-8: Compounds ppb-1 to ppb-8 listed in the specific examples of specific infrared absorbing pigments (pyrrolopyrrole compounds, which are infrared absorbing pigments having a maximum absorption wavelength within the wavelength range of 700 to 1500 nm)

[0475] sq-1 to sq-9: Compounds sq-1 to sq-9 shown in the specific examples of specific infrared absorbing pigments (infrared absorbing pigments having a maximum absorption wavelength in the range of 700 to 1500 nm, i.e., squaric acid compounds)

[0476] Cr-1 to Cr-6: Compounds Cr-1 to Cr-6 listed in the specific examples of specific infrared absorbing pigments (infrared absorbing pigments having a maximum absorption wavelength within the wavelength range of 700 to 1500 nm, i.e., crotonium compounds)

[0477] IR-1~IR-2: Compounds with the following structures

[0478] [Chemical Formula 25]

[0479]

[0480] Comparative compound A: Compound with the following structure

[0481] [Chemical Formula 26]

[0482]

[0483] Comparative compound B: Compound with the following structure

[0484] [Chemical Formula 27]

[0485]

[0486] (Pigment derivatives)

[0487] F-1 to F-5: Compounds with the following structures

[0488] [Chemical Formula 28]

[0489]

[0490] (Dispersion resin)

[0491] E-1: Resin having the following structure (acid value = 99.1 mgKOH / g, weight average molecular weight = 38000): The numerical values ​​attached to the main chain represent the molar ratio of the repeating units, and the numerical values ​​attached to the side chains represent the number of repeating units.

[0492] E-2: Resin having the following structure (acid value = 87.0 mgKOH / g, weight average molecular weight = 18000): The numerical values ​​attached to the main chain represent the molar ratio of the repeating units, and the numerical values ​​attached to the side chains represent the number of repeating units.

[0493] E-3: Resin having the following structure (acid value = 85.0 mgKOH / g, weight average molecular weight = 22000): The numerical values ​​attached to the main chain represent the molar ratio of the repeating units, and the numerical values ​​attached to the side chains represent the number of repeating units.

[0494] E-4: Resin having the following structure (acid value = 43 mgKOH / g, weight average molecular weight = 9000). The numerical values ​​attached to the side chains represent the molar ratio of the repeating units.

[0495] E-5: Block resin having the following structure (amine value = 90 mgKOH / g, quaternary ammonium salt value = 30 mgKOH / g, weight average molecular weight = 9800). The numerical values ​​attached to the main chain represent the molar ratio of the repeating units.

[0496] E-6: Resin with the following structure (acid value = 32.3 mgKOH / g, amine value = 45.0 mgKOH / g, weight average molecular weight = 22900). The numerical values ​​attached to the main chain represent the molar ratio of the repeating units, and the numerical values ​​attached to the side chains represent the number of repeating units.

[0497] [Chemical Formula 29]

[0498]

[0499] [Chemical formula 30]

[0500]

[0501] (Solvent)

[0502] D-1: Propylene glycol monomethyl ether acetate (PGMEA)

[0503] <Manufacturing of Composition>

[0504] (Examples 1 to 73, Comparative Examples 1 and 2)

[0505] The components described in the following table were mixed in the parts by mass described in the table, and filtered through a nylon filter having a pore size of 0.45 μm (manufactured by Nihon Pall Ltd.) to produce each composition.

[0506] [Table 2]

[0507]

[0508] [Table 3]

[0509]

[0510] [Table 4]

[0511]

[0512] [Table 5]

[0513]

[0514] (Examples 101 to 108, Comparative Examples 101 to 102)

[0515] The materials were mixed at the ratio shown below, and the mixture was filtered through a nylon filter (manufactured by Nihon Pall Ltd.) having a pore size of 0.45 μm to produce each composition.

[0516] Infrared absorbers listed in the table below... Parts by mass listed in the table below

[0517] Epoxy compounds listed in the following table: 95.0 parts by mass

[0518] Curing agent listed in the following table (if listed in the table) ···1.5 parts by mass

[0519] Surfactants listed in the following table···0.01 parts by mass

[0520] Antioxidants listed in the following table: 3.3 parts by mass

[0521] Solvents listed in the following table: 200.0 parts by mass

[0522] [Table 6]

[0523]

[0524] (Examples 201 to 207, Comparative Examples 201 to 202)

[0525] The materials were mixed at the ratio shown below, and the mixture was filtered through a nylon filter (manufactured by Nihon Pall Ltd.) having a pore size of 0.45 μm to produce each composition.

[0526] Infrared absorbers listed in the following table: Mass parts listed in the table

[0527] Resins listed in the following table: 95.0 parts by mass

[0528] Antioxidants listed in the following table: 3.3 parts by mass

[0529] Solvents listed in the following table: 200.0 parts by mass

[0530] [Table 7]

[0531]

[0532] The materials listed in the above table are as follows.

[0533] (Dispersion)

[0534] Dispersions 1 to 37: Dispersions 1 to 37 described above

[0535] (Infrared absorber)

[0536] ppb-9, ppb-10: Compounds ppb-9 and ppb-10 listed in the specific examples of specific infrared absorbing pigments (pyrrolopyrrole compounds, which are infrared absorbing pigments having a maximum absorption wavelength within the wavelength range of 700 to 1500 nm)

[0537] sq-1, sq-10: Compounds sq-1 and sq-10 shown as specific examples of specific infrared absorbing pigments (squaric acid compounds, which are infrared absorbing pigments having a maximum absorption wavelength within the wavelength range of 700 to 1500 nm)

[0538] Cr-1, Cr-7: Compounds Sq-1 and Sq-10 listed in the specific examples of specific infrared absorbing pigments (infrared absorbing pigments having a maximum absorption wavelength within the wavelength range of 700 to 1500 nm, i.e., crotonium compounds)

[0539] Comparative compound A, Comparative compound B: the above-mentioned comparative compound A, comparative compound B

[0540] (resin)

[0541] G-1: Resin having the following structure (acid value = 69.2 mgKOH / g, weight average molecular weight = 10000). The numerical values ​​attached to the main chain represent the molar ratio of the repeating units.

[0542] G-2: Resin having the following structure (acid value = 91.3 mgKOH / g, weight average molecular weight = 41000). The numerical values ​​attached to the main chain represent the molar ratio of the repeating units.

[0543] G-3: Resin having the following structure (acid value = 76.8 mgKOn / g, weight average molecular weight = 17000). The numerical values ​​attached to the main chain represent the molar ratio of the repeating units.

[0544] G-4: Resin having the following structure (acid value = 110 mgKOH / g, weight average molecular weight = 10000). The numerical values ​​attached to the main chain represent the molar ratio of the repeating units.

[0545] G-5: Resin having the following structure (acid value = 184 mgKOH / g, weight average molecular weight = 9700). The numerical values ​​attached to the main chain represent the molar ratio of the repeating units.

[0546] [Chemical Formula 31]

[0547]

[0548] G-6: Resin with the following structure (weight average molecular weight 137,000, number average molecular weight 32,000, glass transition temperature 165°C)

[0549] [Chemical Formula 32]

[0550]

[0551] T 1 , T 2 =CH3 or C5H 11

[0552] G-7: Resin with the following structure (weight average molecular weight 188,000, number average molecular weight 75,000, glass transition temperature 285°C)

[0553] [Chemical Formula 33]

[0554]

[0555] G-8: Resin with the following structure (glass transition temperature 310°C, logarithmic viscosity 0.87)

[0556] [Chemical Formula 34]

[0557]

[0558] U=U 1 or U 2 , U 1 / U 2 =80 / 20mol%

[0559]

[0560] (Polymerizable compound)

[0561] B-1: A mixture of compounds of the following structures (the molar ratio of the left-hand compound to the right-hand compound is 7:3)

[0562] B-2: Compound with the following structure

[0563] B-3: A mixture of compounds of the following structures (containing 55 to 63 mol% of the left-hand compound)

[0564] B-4: Compound with the following structure

[0565] [Chemical Formula 35]

[0566]

[0567] (Photopolymerization initiator)

[0568] C-7, C-8, C-13, C-22, C-23: Compounds C-7, C-8, C-13, C-22, C-23 having the structures shown in the specific examples of the above-mentioned oxime compounds

[0569] (UV absorber)

[0570] H-1 to H-6: Compounds with the following structures

[0571] [Chemical Formula 36]

[0572]

[0573] (Antioxidant)

[0574] I-1 to I-6: Compounds with the following structures

[0575] [Chemical Formula 37]

[0576]

[0577] (additive)

[0578] L-1 to L-3: Compounds with the following structures

[0579] [Chemical Formula 38]

[0580]

[0581] (Surfactant)

[0582] J-1: Compound having the following structure (weight average molecular weight = 14000, in the following formula, % indicating the ratio of repeating units is mol %)

[0583] [Chemical Formula 39]

[0584]

[0585] J-2: FTX-218D (manufactured by Neos Corporation, fluorine-based surfactant)

[0586] J-3: MEGAFACE F-554 (manufactured by DIC Corporation, fluorine-based surfactant)

[0587] (Polymerization Inhibitor)

[0588] K-1: p-Methoxyphenol

[0589] (Epoxy Compound)

[0590] E-1: Resin with the following structure (the values ​​of the repeating units are mass ratios, weight average molecular weight 20,000, number average molecular weight 8,300, epoxy equivalent 284 g / eq, acid value 130 mgKOH / g, glass transition temperature 136°C)

[0591] [Chemical Formula 40]

[0592]

[0593] E-2: Resin with the following structure (the values ​​of the repeating units are mass ratios, weight average molecular weight 26100, number average molecular weight 8600, epoxy equivalent 355 g / eq, acid value 163 mgKOH / g, glass transition temperature 133°C)

[0594] [Chemical Formula 41]

[0595]

[0596] E-3: Resin with the following structure (the values ​​of the repeating units are mass ratios, weight average molecular weight 21100, number average molecular weight 8500, epoxy equivalent 355 g / eq, acid value 130 mgKOH / g, glass transition temperature 157°C)

[0597] [Chemical Formula 42]

[0598]

[0599] E-4: Resin with the following structure (the values ​​of the repeating units are mass ratios, weight average molecular weight 18300, number average molecular weight 9100, epoxy equivalent 284 g / eq, acid value 98 mgKOH / g, glass transition temperature 134°C)

[0600] [Chemical Formula 43]

[0601]

[0602] E-5: Resin with the following structure (the values ​​of the repeating units are mass ratios, weight average molecular weight 22900, number average molecular weight 8800, epoxy equivalent 316 g / eq, acid value 130 mgKOH / g, glass transition temperature 124°C)

[0603] [Chemical Formula 44]

[0604]

[0605] (Curing Agent)

[0606] P-1: trimellitic acid

[0607] P-2: 2-ethyl-4-methylimidazole

[0608] P-3: Methyltetrahydrophthalic anhydride

[0609] (Solvent)

[0610] D-1: Propylene glycol monomethyl ether acetate (PGMEA)

[0611] D-2: Propylene glycol monomethyl ether (PGME)

[0612] D-3: Cyclopentanone

[0613] D-6: Methyl 3-methoxypropionate

[0614] D-7: Dichloromethane

[0615] D-8: Dimethylacetamide

[0616] <Film Production>

[0617] (Manufacturing Example 1) Method for manufacturing films using the compositions of Examples 1 to 73 and Comparative Examples 1 to 2

[0618] Each composition was applied to a glass substrate by spin coating and heated at 100°C for 2 minutes on a hot plate to obtain a composition layer. The obtained composition layer was exposed to light using an i-ray stepper FPA-3000i5+ (manufactured by Canon Inc.) at a irradiation rate of 1000 mJ / cm 2The entire surface was exposed with an exposure dose of 1.0 μm. Subsequently, heating was performed at 180° C. for 5 minutes using a hot plate to produce a film having a thickness of 1.0 μm.

[0619] (Manufacturing Example 2) Method for manufacturing a film using the compositions of Examples 101 to 108 and Comparative Examples 101 to 102

[0620] Each composition was applied on a glass substrate by spin coating, and then cured by heating at 100° C. for 2 minutes and then at 200° C. for 8 minutes using a hot plate to obtain a film having a thickness of 1.0 μm.

[0621] (Manufacturing Example 3) Method for manufacturing a film using the compositions of Examples 201 to 207 and Comparative Examples 201 to 202

[0622] Each composition was cast on a glass substrate, dried at 20° C. for 8 hours, and then peeled from the glass substrate. The peeled coating film was further dried at 100° C. under reduced pressure for 8 hours to obtain a film having a thickness of 0.1 mm, a length of 60 mm, and a width of 60 mm.

[0623] <Evaluation>

[0624] (Spectral characteristics)

[0625] The obtained film was measured for spectrophotometry using a spectrophotometer (U-4100, manufactured by Hitachi High-Tech Corporation), and the absorption spectrum in the wavelength range of 400 to 1500 nm was measured. The maximum absorbance (Absλmax) at a wavelength of 700 to 1500 nm was measured, and the "average absorbance at 400 to 550 nm" when this maximum absorbance was set to 1 was evaluated according to the following evaluation criteria. The evaluation results are shown in the table below. It can be said that the smaller the average absorbance at 400 to 550 nm, the steeper the spectral shape, and the better the spectral characteristics, which achieve both high transparency in the visible light region and high colorability in the near-infrared region.

[0626] -Evaluation Criteria-

[0627] A: less than 0.05

[0628] B: 0.05 or more and less than 0.1

[0629] C: 0.1 or more and less than 0.2

[0630] D: 0.2 or more

[0631] (moisture resistance)

[0632] The resulting film was placed at 110°C and 85% relative humidity for 100 hours and subjected to a humidity test. For each film before and after the humidity test, a spectrophotometer (U-4100, manufactured by Hitachi High-Technologies Corporation) was used to measure the maximum absorbance (Absλmax) at a wavelength of 700 to 1500 nm and the minimum absorbance (Absλmin) at a wavelength of 400 to 550 nm. The absorbance ratio, expressed as "Absλmax / Absλmin," was calculated. The absorbance ratio change rate, expressed as the following formula, was then calculated from the absorbance ratio before and after the humidity test, and humidity resistance was evaluated according to the following evaluation criteria. The evaluation results are shown in the table below.

[0633] Absorbance ratio change rate = {(absorbance ratio of the film before the humidity test - absorbance ratio of the film after the humidity test) / absorbance ratio of the film before the humidity test} × 100 (%)

[0634] -Evaluation Criteria-

[0635] A: Absorbance ratio change rate ≤ 2%

[0636] B: 2%<absorbance ratio change rate≤4%

[0637] C: 4% < absorbance ratio change ≤ 7%

[0638] D: 7% < absorbance ratio change ≤ 10%

[0639] E: 10% <absorbance ratio change rate

[0640] [Table 8]

[0641]

[0642] [Table 9]

[0643]

[0644] As shown in the above table, the films obtained using the compositions of Examples were excellent in moisture resistance and spectral characteristics.

[0645] The film obtained using the composition of the Example can be preferably used for an optical filter, a solid-state imaging element, an infrared sensor, and a camera module.

[0646] <Manufacturing of Infrared Transmitting Filter Forming Composition>

[0647] (Example 301)

[0648] After mixing and stirring the respective materials in the ratio of the following formulation, the mixture was filtered through a nylon filter (manufactured by Nihon Pall Ltd.) having a pore size of 0.45 μm to produce an infrared transmission filter-forming composition of Example 301.

[0649] (formula)

[0650] Composition of Example 1: 36.99 parts by mass

[0651] Pigment dispersion 1-1 prepared as follows: 46.5 parts by mass

[0652] Pigment dispersion 1-2 prepared as follows: 37.1 parts by mass

[0653] Using the infrared-transmitting filter-forming composition of Example 301, moisture resistance and spectral characteristics were evaluated in the same manner as in Example 1, and the same effects as in Example 1 were obtained. Furthermore, the cured film obtained using the infrared-transmitting filter-forming composition of Example 301 was capable of shielding light with wavelengths in the visible region and transmitting at least a portion of light with wavelengths in the near-infrared region (near-infrared rays).

[0654] (Example 302)

[0655] After mixing and stirring the respective materials in the following ratio, the mixture was filtered through a nylon filter (manufactured by Nihon Pall Ltd.) having a pore size of 0.45 μm to produce an infrared transmission filter-forming composition of Example 302.

[0656] (formula)

[0657] Composition of Example 9: 36.99 parts by mass

[0658] Pigment dispersion 1-1 prepared as follows: 46.5 parts by mass

[0659] Pigment dispersion 1-2 prepared as follows: 37.1 parts by mass

[0660] Using the infrared-transmitting filter-forming composition of Example 302, moisture resistance and spectral characteristics were evaluated in the same manner as in Example 1, and the same effects as in Example 1 were obtained. Furthermore, the cured film obtained using the infrared-transmitting filter-forming composition of Example 302 was capable of shielding light with wavelengths in the visible region and transmitting at least a portion of light with wavelengths in the near-infrared region (near-infrared rays).

[0661] (Example 303)

[0662] After mixing and stirring the respective materials in the ratio of the following formulation, the mixture was filtered through a nylon filter (manufactured by Nihon Pall Ltd.) having a pore size of 0.45 μm to produce a composition for forming an infrared transmission filter of Example 303.

[0663] (formula)

[0664] Composition of Example 2: 22.67 parts by mass

[0665] Pigment dispersion 2-1 prepared as follows: 51.23 parts by mass

[0666] Using the infrared-transmitting filter-forming composition of Example 303, moisture resistance and spectral characteristics were evaluated in the same manner as in Example 1, and the same effects as in Example 1 were obtained. Furthermore, the cured film obtained using the infrared-transmitting filter-forming composition of Example 303 was capable of shielding light with wavelengths in the visible region and transmitting at least a portion of light with wavelengths in the near-infrared region (near-infrared rays).

[0667] (Example 304)

[0668] After mixing and stirring the respective materials in the ratio shown below, the mixture was filtered through a nylon filter (manufactured by Nihon Pall Ltd.) having a pore size of 0.45 μm to produce an infrared transmission filter-forming composition of Example 304.

[0669] (formula)

[0670] Composition of Example 18: 22.67 parts by mass

[0671] Pigment dispersion 2-1 prepared as follows: 51.23 parts by mass

[0672] Using the infrared-transmitting filter-forming composition of Example 304, moisture resistance and spectral characteristics were evaluated in the same manner as in Example 1, and the same effects as in Example 1 were obtained. Furthermore, the cured film obtained using the infrared-transmitting filter-forming composition of Example 304 was capable of shielding light with wavelengths in the visible region and transmitting at least a portion of light with wavelengths in the near-infrared region (near-infrared rays).

[0673] 《Manufacturing of Pigment Dispersion 1-1》

[0674] A mixture of the materials in the following proportions was mixed using zirconia beads having a diameter of 0.3 mm using a bead mill (high-pressure disperser NANO-3000-10 with a pressure reducing mechanism (manufactured by Nippon BEE Co., Ltd.)) and dispersed for 3 hours to produce pigment dispersion 1-1.

[0675] (formula)

[0676] Red pigment (CI Pigment Red 254: 8.1 parts by mass

[0677] Yellow pigment (CI Pigment Yellow 139): 3.7 parts by mass

[0678] Resin (Disperbyk-111, manufactured by BYK Chemie): 9.1 parts by mass

[0679] Propylene glycol monomethyl ether acetate (PGMEA): 79.1 parts by mass

[0680] Pigment Dispersion 1-2

[0681] A mixture of the materials in the following proportions was mixed and dispersed for 3 hours using zirconia beads with a diameter of 0.3 mm using a bead mill (high-pressure disperser NANO-3000-10 with a pressure reducing mechanism (manufactured by Nippon BEE Co., Ltd.)) to produce pigment dispersion 1-2.

[0682] (formula)

[0683] Blue pigment (CI Pigment Blue 15:6): 10.1 parts by mass

[0684] Violet pigment (CI Pigment Violet 23): 2.5 parts by mass

[0685] Resin (Disperbyk-111, manufactured by BYK Chemie): 2.0 parts by mass

[0686] Resin G-3: 3.3 parts by mass

[0687] Cyclohexanone: 31.2 parts by mass

[0688] PGMEA: 50.9 parts by mass

[0689] Pigment Dispersion 2-1

[0690] 60 parts by mass of CI Pigment Black 32, 20 parts by mass of CI Pigment Blue 15:6, 20 parts by mass of CI Pigment Yellow 139, 80 parts by mass of SOLSPERSE 76500 (manufactured by Lubrizol Japan Limited., solid content concentration: 50% by mass), 120 parts by mass of a PGMEA solution having a solid content of 35% by mass of Resin G-5, and 700 parts by mass of PGMEA were mixed and dispersed using a paint shaker for 8 hours to produce pigment dispersion 2-1.

[0691] Explanation of symbols

[0692] 110 - solid-state imaging element, 111 - infrared cut filter, 112 - color filter, 114 - infrared transmission filter, 115 - microlens, 116 - planarization layer.

Claims

1. A composition comprising: An infrared absorbing pigment A having a group represented by formula (1) or formula (2); curing compound; and solvents, In formula (1), R 1 ~R 6 Each independently represents a hydrogen atom or a substituent, R 1 ~R 6 Two adjacent groups in are optionally bonded to form a ring, In formula (2), R 11 ~R 16 Each independently represents a hydrogen atom or a substituent, R 11 ~R 16 Two adjacent groups in the group are optionally bonded to form a ring, R 17 represents a hydrogen atom, an alkyl group, an alkenyl group or an aryl group.

2. The composition according to claim 1, wherein The maximum absorption wavelength of the infrared absorbing dye A exists in the wavelength range of 700 nm to 1500 nm.

3. The composition according to claim 1 or 2, wherein The infrared absorbing pigment A is at least one selected from pyrrolopyrrole compounds, squarylium compounds, crotonium compounds, rylene compounds, phthalocyanine compounds, naphthalocyanine compounds, indigo compounds, pyrromethene compounds, oxonol compounds, pyrylium compounds, and azulenium compounds.

4. The composition according to claim 1 or 2, wherein The infrared absorbing pigment A is at least one selected from the group consisting of a compound represented by formula (PP-1), a compound represented by formula (SQ-1), and a compound represented by formula (CR-1). In formula (PP-1), R p1 ~R p6 Each independently represents a hydrogen atom or a substituent, R p1 ~R p6 Two adjacent groups in are optionally bonded to form a ring, A p1 represents a heteroaryl group, B p1 and B p2 Each independently represents -BR 101 R 102 Ji, R 101 and R 102 Each independently represents a substituent, R 101 With R 102 are optionally bonded to each other to form a ring, C p1 and C p2 Each independently represents an alkyl group, an aryl group or a heteroaryl group, D p1 and D p2 Each independently represents a substituent, In formula (SQ-1), R s1 ~R s6 Each independently represents a hydrogen atom or a substituent, R s1 ~R s6 Two adjacent groups in are optionally bonded to form a ring, R s7 represents a hydrogen atom, an alkyl group, an alkenyl group or an aryl group, R s10 represents a hydrogen atom, an alkyl group or a halogen atom, R s7 With R s10 are optionally bonded to form a ring, A s1 represents a substituent, In formula (CR-1), R c1 ~R c6 Each independently represents a hydrogen atom or a substituent, R c1 ~R c6 Two adjacent groups in are optionally bonded to form a ring, R c7 represents a hydrogen atom, an alkyl group, an alkenyl group or an aryl group, R c10 represents a hydrogen atom, an alkyl group or a halogen atom, R c7 With R c10 are optionally bonded to form a ring, A c1 represents a substituent.

5. The composition according to claim 1 or 2, wherein The curable compound includes a polymerizable compound, The composition further contains a photopolymerization initiator.

6. A film obtained using the composition according to claim 1 or 2. An optical filter comprising the film according to claim 6 . A solid-state imaging element comprising the film according to claim 6 . 9 . An image display device comprising the film according to claim 6 . 10 . An infrared sensor comprising the film according to claim 6 . 11 . A camera module comprising the film according to claim 6 .

12. A compound represented by formula (PP-1), formula (SQ-1) or formula (CR-1), In formula (PP-1), R p1 ~R p6 Each independently represents a hydrogen atom or a substituent, R p1 ~R p6 Two adjacent groups in are optionally bonded to form a ring, A p1 represents a heteroaryl group, B p1 and B p2 Each independently represents -BR 101 R 102 Ji, R 101 and R 102 Each independently represents a substituent, R 101 With R 102 are optionally bonded to each other to form a ring, C p1 and C p2 Each independently represents an alkyl group, an aryl group or a heteroaryl group, D p1 and D p2 Each independently represents a substituent, In formula (SQ-1), R s1 ~R s6 Each independently represents a hydrogen atom or a substituent, R s1 ~R s6 Two adjacent groups in are optionally bonded to form a ring, R s7 represents a hydrogen atom, an alkyl group, an alkenyl group or an aryl group, R s10 represents a hydrogen atom, an alkyl group or a halogen atom, R s7 With R s10 are optionally bonded to form a ring, A s1 represents a substituent, In formula (CR-1), R c1 ~R c6 Each independently represents a hydrogen atom or a substituent, R c1 ~R c6 Two adjacent groups in are optionally bonded to form a ring, R c7 represents a hydrogen atom, an alkyl group, an alkenyl group or an aryl group, R c10 represents a hydrogen atom, an alkyl group or a halogen atom, R c7 With R c10 are optionally bonded to form a ring, A c1 represents a substituent.

Images