CVD (Chemical Vapor Deposition) coating reaction heating deposition equipment

Abstract

The invention provides CVD (Chemical Vapor Deposition) coating reaction heating deposition equipment which comprises a sectional heating furnace, a reaction deposition chamber arranged in the sectional heating furnace and a rotary air supply mechanism penetrating into the reaction deposition chamber, and a plurality of layers of workpiece carriers and a preheating chamber positioned at the bottom of the workpiece carriers are arranged in the reaction deposition chamber; the rotary air supply mechanism comprises a rotary air supply shaft which axially penetrates into the reaction deposition chamber and is in running fit with the reaction deposition chamber, an air supply pipe which axially penetrates through the workpiece carrier and is in running fit with the workpiece carrier, and a rotary driving part which is connected with the rotary air supply shaft and is used for driving the rotary air supply shaft to rotate; and the rotary air supply shaft is communicated with the air supply pipe through the preheating chamber. The deposition gas is conveyed to the reaction deposition chamber, the rotary gas supply system drives the gas supply pipe to rotate to uniformly inject the deposition gas into the deposition cavity, uniform and stable deposition gas is provided for a to-be-coated workpiece placed in the reaction deposition chamber, and the deposition effect is improved; and the temperature uniformity of the whole deposition chamber is ensured by heating the furnace body in sections and controlling and adjusting the temperature in sections.

Description

Technical Field

[0001] The present invention relates to the technical field of chemical coatings, and in particular to a coating heating deposition device. Background Art

[0002] Hot-wall chemical vapor deposition (HWCVD) forms various CVD coatings and infiltrates on substrates through a chemical reaction between mixed gases within a container at a specific temperature and pressure. This process can significantly improve the service life and performance of mechanical equipment. CVD coatings offer low stress, excellent adhesion, high load-bearing capacity, and outstanding coating uniformity, unaffected by part geometry. They are suitable for coating interior surfaces and complex geometries.

[0003] Common coating preparation methods include slag coating, spraying, and magnetron sputtering. These methods suffer from low control accuracy, poor coating quality, low bonding strength, and high costs, which restrict the application of coating processes and limit the improvement of overall workpiece performance.

[0004] Existing deposition equipment often uses static bottom-injection gas supply systems, relying on the molecular motion of the reactant gas itself for diffusion. This leads to uneven concentration distribution of the reactant gas vertically and radially around the substrate, resulting in incomplete reaction. This makes it difficult to ensure uniform coating results across the substrate. Furthermore, existing equipment struggles to meet the demands of high-temperature metal (Hf, Zr, Mo, V, Ta) composite coatings.

[0005] Korean Patent Publication No. KR100267520B1, published on October 16, 2000, discloses a flow CVD apparatus and method comprising a high-temperature wall reactor tube, one or more reactor gas preheaters, a reactor gas outlet, and a substantially anti-vortex reactor flow control device for conveying the reactor gas from the preheater to the outlet in a substantially laminar flow. The flow control device comprises a tube flange positioned relative to the end of the wafer boat region so as to substantially prevent vortex flow. The flange maintains the reactor gas outside the reactor region or simultaneously maintains the reactor gas in a substantially laminar flow state. To this end, the flange includes a bend extending from the end of the wafer boat region to the outer tube. Each reactor gas preheater includes a first heating tube having a removable baffle having a predetermined surface area to transfer a predetermined amount of heat to the reactor gas passing through the baffle surface. A second reactor gas preheater includes a double-walled cylindrical heater having an inner surface deformation portion. The inner surface deformation portion provides a predetermined surface area to transfer a predetermined amount of heat to the reactor gas passing through the inner surface deformation portion. The double-walled cylindrical heater and heating tube each have multiple gas inlets with central axes positioned to immediately mix the gases injected from the inlets. An optional reaction gas preheater includes a channel formed by a coaxial vacuum chamber and a reaction chamber tube. The method includes preheating the reaction gases, preferably in a separate heating chamber, mixing the heated reaction gases, and passing the mixed reaction gases to the coated wafer in a laminar flow. Any backflow in the reaction zone is eliminated. The reaction gas can also be introduced at the downstream end of the reaction zone to avoid reactant depletion. However, this patent does not achieve uniform gas supply, which affects the deposition effect. Summary of the Invention

[0006] In response to the above technical problems, the present invention proposes a CVD coating reaction heating deposition device to solve the problem that the CVD equipment in the prior art cannot achieve uniform gas supply.

[0007] In order to achieve the above object, the technical solution of the present invention is achieved as follows: A CVD coating reaction heating deposition device includes a segmented heating furnace, a reaction deposition chamber arranged in the segmented heating furnace, and a rotating air supply mechanism penetrating the reaction deposition chamber, wherein the reaction deposition chamber is provided with a multi-layer workpiece carrier and a preheating chamber located at the bottom of the workpiece carrier; the rotating air supply mechanism includes a rotating air supply shaft axially penetrating the reaction deposition chamber and rotating with the reaction deposition chamber, an air supply pipe axially penetrating the workpiece carrier and rotating with the workpiece carrier, and a rotating drive member connected to the rotating air supply shaft for driving the rotating air supply shaft to rotate; the rotating air supply shaft is connected to the air supply pipe through the preheating chamber.

[0008] Furthermore, the preheating chamber includes a preheating chamber shell and multi-layer partitions arranged in the preheating chamber shell, and adjacent partitions are separated by partition rings; fixing rods are also passed through the multi-layer partitions, and support rings sleeved on the fixing rods are clamped between adjacent partitions.

[0009] Furthermore, the partition includes a partition 1 and a partition 2 that are cross-arranged so that partition 1 is adjacent to partition 2. Partition 1 and partition 2 are respectively provided with air vents that pass through the plate surface. The air vents on the adjacent partitions 1 and 2 are located at positions far away from each other so that the deposition gas can propagate in a "Z" shape in the preheating chamber.

[0010] Furthermore, the preheating chamber shell includes a preheating chamber base and a preheating chamber top plate respectively arranged at the bottom and top of the multi-layer partition, and a preheating chamber body arranged between the preheating chamber base and the preheating chamber top plate and sleeved on the outside of the multi-layer partition. The preheating chamber body is connected to the preheating chamber base and the preheating chamber top plate respectively by bolts, and a sealing ring is provided between the mating surfaces of the preheating chamber body and the preheating chamber base and the preheating chamber top plate.

[0011] Furthermore, an interface for connecting a rotating air supply shaft is provided in the middle of the preheating chamber base; an interface for connecting an air supply pipe is provided in the middle of the preheating chamber top plate; and a support sleeve is provided on the uppermost partition plate, the upper end of the support sleeve extends into the interface of the preheating chamber top plate, and the outer side of the support sleeve is provided with a step surface for supporting the preheating chamber top plate; a plurality of legs are provided at the lower part of the support sleeve that contact the uppermost partition plate so that the deposition gas enters the interface of the preheating chamber top plate from the gap between the legs.

[0012] Furthermore, the workpiece carrier includes multiple layers of workpiece carrier rings stacked in sequence and a perforated plate arranged on each workpiece carrier ring, and adjacent perforated plates are arranged at intervals to form a deposition space; exhaust holes are provided on the side of the workpiece carrier ring, and multiple air holes are provided on the perforated plate; a sealing cover is connected to the top workpiece carrier ring.

[0013] Furthermore, the gas supply pipe is provided with multiple pairs of gas injection holes in sequence, and a pair of gas injection holes corresponds to one deposition space; a pair of gas injection holes are arranged in degrees along the diameter of the gas supply pipe, and the sizes of the pair of gas injection holes are different; the gas injection holes of adjacent deposition spaces are arranged in a spiral manner.

[0014] Furthermore, the reaction deposition chamber includes an annular deposition chamber base and a deposition chamber shell arranged on the deposition chamber base, and there is a gap between the deposition chamber shell and the workpiece carrier for the flow of deposition gas; the bottom of the deposition chamber base is connected to the reaction deposition base, and the reaction deposition base is provided with an exhaust gas output pipe for discharging the deposition gas after deposition; an annular table is provided on the outside of the deposition chamber base, and a heat sink is provided on the annular table, and an annular support block for supporting the segmented heating furnace is connected to the heat sink through a buffer spring, and an insulating ring is provided between the inner side of the annular support block and the deposition chamber shell.

[0015] Furthermore, the lower end of the rotating air supply shaft is fixedly connected to a rotating drive shaft, the upper part of the rotating drive shaft is provided with a cavity communicating with the rotating air supply shaft, and the lower end of the rotating drive shaft is a solid shaft; a positioning sleeve is provided on the outer side of the upper part of the rotating drive shaft, and the rotating drive shaft and the positioning sleeve are rotatably matched; an air inlet pipe for inputting deposition gas is connected to the positioning sleeve; a plurality of air inlet holes that can be aligned with the air inlet pipe are evenly distributed circumferentially on the rotating drive shaft; a sealing sleeve is provided on the outer side of the positioning sleeve, the upper part of the sealing sleeve passes through the opening in the middle of the reaction deposition base and is fixedly connected to the reaction deposition base; the lower part of the sealing sleeve is provided on the outside of the solid shaft, and the solid shaft and the lower end of the sealing sleeve are connected to the output shaft of the rotating drive component through a sealing joint and a coupling.

[0016] Furthermore, the segmented heating furnace shown includes several sections of heating furnace bodies, with thermal insulation gaskets sandwiched between adjacent heating furnace bodies, and guide grooves provided on the outside of the heating furnace bodies, through which guide columns are inserted into the guide grooves to connect the several segmented furnace bodies; each section of the heating furnace body is provided with a thermocouple terminal and two heating wire terminals; a circuit protection cover with a door for protecting the thermocouple terminal and the heating wire terminal is provided on the outside of the segmented heating furnace, a safety protector for connecting the circuit is provided inside the circuit protection cover, and a protector safety pin that can be inserted into the safety protector is provided on the door to ensure that the circuit is conductive when the door is closed.

[0017] Beneficial effects of the present invention: 1. The present invention places the workpiece to be coated in a reaction deposition chamber, delivers deposition gas to the reaction deposition chamber, and drives the gas supply pipe to rotate through a rotating gas supply system to uniformly inject the deposition gas into the deposition chamber, thereby providing the deposition chamber with uniform and stable deposition gas and improving the deposition effect; 2. The present invention sets the heating furnace system into five sections, which can reduce processing and maintenance costs. In addition, to ensure temperature uniformity throughout the deposition chamber, each heating module uses a thermocouple to measure and calibrate the temperature. During the preheating process, the precise temperature value is output and fed back to the control system for temperature regulation. 3. The present invention can realize high-temperature metal coating by setting a high-temperature metal compound gas supply pipeline, solving the problem that the existing metal coating can no longer meet more stringent working conditions; 4. The present invention provides gas injection holes of different diameters on the gas supply pipe. The gas with a large diameter and slow flow rate is ejected closer to the gas deposition position, while the gas with a small diameter is ejected farther away. This arrangement can improve the uniformity of the deposited gas and improve the coating quality. 5. The coating deposition equipment of the present invention has a simple overall structure and strong controllability, and can achieve precise control over the entire coating deposition process; 6. The coating deposition method used in the present invention is a chemical vapor reaction method, which can achieve full coverage of the workpiece to be coated; 7. The present invention can realize batch production according to the specifications of the workpiece carrier. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the following briefly introduces the drawings required for use in the embodiments or the description of the prior art. Obviously, the drawings described below are only some embodiments of the present invention. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying any creative work.

[0019] Figure 1 It is an exploded schematic diagram of the overall structure of the coating deposition equipment of the present invention; Figure 2 is a cross-sectional schematic diagram of the coating deposition equipment of the present invention in working state; Figure 3 for Figure 2 A partial enlarged schematic diagram of D in the middle; Figure 4 It is a structural schematic diagram of the heating furnace of the present invention; Figure 5 This is a schematic structural diagram of the reaction deposition base of the present invention; Figure 6 Schematic diagram of the explosion structure of the preheating chamber of the present invention; Figure 7 Schematic diagram of the cross-sectional structure of the preheating chamber of the present invention; Figure 8 is a schematic diagram of the airflow path of the preheating chamber of the present invention; Figure 9 It is a structural schematic diagram of the workpiece carrier of the present invention; Figure 10 for Figure 8 Schematic diagram of the cross section of AA; Figure 11 for Figure 8 Schematic cross-section of the middle BB; Figure 12 for Figure 8 Schematic cross-section of the CC; Figure 13 Schematic cross-sectional view of the reaction deposition chamber of the present invention.

[0020] In the figure: 100, segmented heating furnace, 101, protector safety pin, 102, safety protector, 103, thermocouple terminal, 104, heating wire terminal, 105, aluminum strip clamp, 106, line protection cover, 107, top sealing flange, 108, high-temperature hard insulation board, 109, heating furnace wall, 110, upper insulation support, 111, relay group, 112, power supply line, 113, insulation gasket, 114, heating furnace body, 115, positioning groove, 116, insulation board, 117, lower insulation support, 118, position sensor, 119, buffer support, 200, reaction deposition base, 201, exhaust gas output pipe; 202, thermocouple connection port, 203, auxiliary gas input pipeline, 204, cooling water inlet port, 205, cooling water outlet port, 206, gas pressure detection port, 207, reaction gas input Pipeline, 208, high temperature metal compound gas supply pipeline, 300, preheating chamber, 301, preheating chamber bottom plate, 302, sealing ring, 303, preheating chamber body, 304, fixing rod, 305, spacer ring, 306, support ring, 307, partition plate 1, 308, partition plate 2, 309, support sleeve, 310, top plate, 400, workpiece carrier, 401, workpiece carrier ring, 402, exhaust hole, 403, perforated plate, 50 0. Reaction deposition chamber, 501. Deposition chamber base, 502. Buffer spring, 503. Thermal insulation ring, 504. Deposition chamber wall, 600. Rotary tightening cylinder, 700. Support stand, 800. Rotary gas supply mechanism, 801. Gas supply pipe, 8011. Gas injection hole, 802. Rotary gas supply shaft, 803. Air inlet pipe, 804. Rotary drive shaft, 805. Positioning sleeve, 806. Heat dissipation fin, 807. Sealing joint. DETAILED DESCRIPTION

[0021] The following will clearly and completely describe the technical solutions in the embodiments of the present invention in conjunction with the accompanying drawings. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. All other embodiments obtained by ordinary technicians in this field based on the embodiments of the present invention without creative work are within the scope of protection of the present invention.

[0022] like Figure 1As shown, a CVD coating reaction heating deposition apparatus according to Example 1 of the present invention includes a segmented heating furnace 100, a reaction deposition chamber 500 disposed within the segmented heating furnace 100, and a rotary gas supply mechanism 800 extending through the bottom of the reaction deposition chamber 500 and into the interior of the reaction deposition chamber 500 to supply gas. A workpiece carrier 400 is provided within the reaction deposition chamber 500 for loading the workpiece to be deposited. A preheating chamber 300 is also provided within the reaction deposition chamber 500, located at the bottom of the workpiece carrier 400. The rotary gas supply mechanism 800 includes a rotary gas supply shaft 802, a gas supply pipe 801, and a rotary drive member connected to the rotary gas supply shaft 802 for driving the rotary gas supply shaft to rotate. The rotary gas supply shaft 802 axially penetrates the reaction deposition chamber 500 and rotates in conjunction with the reaction deposition chamber 500. The upper end of the rotary gas supply shaft 802 is connected to the preheating chamber 300 to supply deposition gas into the preheating chamber 300 for preheating. The gas supply pipe 801 is axially disposed on the workpiece carrier 400 and rotates with the workpiece carrier 400. The lower section of the gas supply pipe 801 is connected to the preheating chamber 300 and communicates with it, allowing the preheated deposition gas to enter the workpiece carrier 400. The lower end of the rotating gas supply shaft 802 is connected to the output shaft of the rotating drive member, and the upper end of the rotating gas supply shaft 802 is connected to the gas supply pipe 801 through the preheating chamber 300. The rotating drive member drives the rotating gas supply shaft 802, the preheating chamber 300, and the gas supply pipe 801 to rotate and supply gas, making the gas supply more uniform.

[0023] The workpiece carrier 400 is provided with multiple layers of deposition spaces for placing multiple layers of workpieces to be deposited. The multiple layers of deposition spaces are interconnected, allowing deposition gas to flow between the multiple layers of deposition spaces.

[0024] Furthermore, if Figure 13 As shown, the reaction deposition chamber 500 includes an annular deposition chamber base 501 and a deposition chamber shell 504 disposed on the deposition chamber base 501. Figure 2 As shown, there is a gap between the deposition chamber housing 504 and the workpiece carrier 400 for the flow of deposition gas after deposition. Figure 2 As shown, the bottom of the annular deposition chamber base 501 is connected to the reaction deposition base 200 for sealing the reaction deposition chamber 500. The rotary air supply shaft 802 is connected to the reaction deposition base 200.

[0025] Furthermore, if Figure 5As shown, the reaction deposition base 200 is provided with an exhaust gas output pipe 201, which is used not only for vacuuming the reaction deposition chamber 500, but also for exhausting the deposition gas after deposition. The reaction deposition base 200 is also provided with an auxiliary gas input pipeline 203, a high-temperature metal compound gas supply pipeline 208, and a reaction gas input pipeline 207, respectively for introducing different deposition gases. In addition, the reaction deposition base 200 is provided with two detection interfaces: a thermocouple connection port 206 and a gas pressure detection interface 202, which are convenient for connecting thermocouples and pressure detection elements to measure temperature and pressure. The reaction deposition base 200 has an internal cavity for supplying cooling water to cool the reaction deposition base 200. The reaction deposition base 200 is provided with a cooling water inlet port 204 and a cooling water outlet port 205.

[0026] The present invention can provide a deposition gas containing elements such as aluminum, titanium, and silicon for the reaction. The chlorides of these elements vaporize at temperatures above 200°C, allowing for the deposition of aluminum, titanium, and silicon on the workpiece. During the deposition process, auxiliary gas inlet line 203 and high-temperature metal compound gas supply line 208 can also be used to provide chlorides of high-temperature metals such as zirconium (Hf), hafnium (Zr), molybdenum (Mo), vanadium (V), and tantalum (Ta). These substances vaporize at temperatures above 350°C, achieving a coating of metals such as zirconium and hafnium. Furthermore, the reaction gas inlet line 207 can input gases such as nitrogen, hydrogen, methane, hydrogen sulfide, hydrogen chloride, acetonitrile, carbon monoxide, and carbon dioxide.

[0027] Example 2 is different from Example 1 in that Figure 13 As shown, the segmented heating furnace 100 is housed outside the reaction deposition chamber 500. An annular tabletop is provided on the outside of the deposition chamber base 501, on which a multi-layered heat sink is mounted. An annular support block for supporting the segmented heating furnace 100 is connected to the heat sink via a buffer spring 502. Specifically, the lower end of the segmented heating furnace 100 is supported on the annular support block. A thermal insulation ring 503 is provided between the inner side of the annular support block and the deposition chamber housing 504.

[0028] Example 3 is different from Example 1 in that Figure 6 and Figure 7 As shown, the preheating chamber 300 includes a preheating chamber housing and a multi-layered baffle disposed within the housing. The housing includes a preheating chamber base 301, disposed at the bottom and top of the multi-layered baffles, respectively, a preheating chamber top plate 310, and a preheating chamber body 303 disposed between the preheating chamber base 301 and the preheating chamber top plate 310. The preheating chamber body 303 is sleeved onto the outside of the multi-layered baffles. The preheating chamber body 303 is connected to the preheating chamber base 301 and the preheating chamber top plate 310 via bolts, and sealing rings 302 are provided between the mating surfaces of the preheating chamber body 303, the preheating chamber base 301, and the preheating chamber top plate 310.

[0029] The outer side of the preheating chamber base 301 is equipped with an upward annular protrusion to support the lowest baffle, creating a gap between the baffle and the preheating chamber base 301 for the flow of deposition gas. The outer side of the preheating chamber top plate 310 is equipped with a downward annular protrusion to support the uppermost baffle, creating a gap between the baffle and the preheating chamber top plate 310 for the flow of deposition gas. Adjacent baffles are separated by spacer rings 305, that is, spacer rings 305 are sandwiched between adjacent baffles, allowing deposition gas to flow through each layer of baffles.

[0030] Example 4 is different from Example 3 in that Figure 6 and Figure 7 As shown, vertical fixing rods 304 are also provided on the multi-layer partitions. The lower end of the fixing rods 304 is embedded in the preheating chamber base 301, and the upper end is inserted into the preheating chamber top plate 310. A support ring 306 is sandwiched between adjacent partitions, and the support ring 306 is sleeved on the fixing rods 304. In this embodiment, Figure 6 As shown, two fixing rods 304 are arranged in the preheating chamber 300 .

[0031] Example 5 is different from Example 4 in that Figure 6 and Figure 7 As shown, the partitions include partitions 1 307 and 2 308 arranged crosswise so that partitions 1 307 and 2 308 are arranged adjacent to each other. That is, from bottom to top, one layer of partition 1 307 is arranged, then one layer of partition 2 308, then one layer of partition 1 307 is arranged, and so on. Alternatively, from bottom to top, one layer of partition 2 308 is arranged, then one layer of partition 1 307, then one layer of partition 2 308 is arranged, and so on.

[0032] Furthermore, if Figure 6 and Figure 7 As shown, the partition plate 1 307 and the partition plate 2 308 are respectively provided with ventilation holes penetrating the plate surface. The ventilation holes on the adjacent partition plates 1 307 and 2 308 are located at positions far away from each other. That is, when the ventilation hole on the partition plate 1 307 is on the right, the ventilation hole on the partition plate 2 308 adjacent to the partition plate 1 307 is set on the left, so that the deposition gas is spread in a "Z" shape in the preheating chamber 300. Figure 8 And, as Figure 6 As shown, the partition plate 1 307 and the partition plate 2 308 are provided with multiple vent holes respectively, and the multiple vent holes are arranged close to each other on one side of the partition plate 1 307 or the partition plate 2 308.

[0033] Example 6 is different from Example 5 in that Figure 6 and Figure 7As shown, the central portion of the preheating chamber base 301 is provided with an interface for connecting to the rotating air supply shaft 802. The central portion of the preheating chamber top plate 310 is provided with an interface for connecting to the air supply pipe 801. Furthermore, a support sleeve 309 is provided on the topmost baffle. The upper end of the support sleeve 309 extends into the interface of the preheating chamber top plate 310. The outer side of the support sleeve 309 is provided with an annular, upward-facing stepped surface for supporting the preheating chamber top plate 310. The lower portion of the support sleeve 309 is provided with several legs that contact the topmost baffle, allowing deposition gas to enter the support sleeve 309 through the gaps between the legs and then enter the interface of the preheating chamber top plate 310.

[0034] Example 7 is different from Example 1 in that Figure 2 and Figure 9 As shown, the workpiece carrier 400 includes multiple layers of workpiece carrier rings 401 stacked in sequence and a perforated plate 403 arranged on each workpiece carrier ring. The longitudinal section of the workpiece carrier ring 401 is a symmetrical L-shaped surface, that is, the workpiece carrier ring 401 includes a wider lower ring and a narrower upper ring, wherein the upper ring and the upper ring are an integrated structure. The outer sides of the upper ring and the lower ring are aligned, and the inner side of the lower ring extends beyond the upper ring to form a table, so that the perforated plate 403 is supported and placed on the table. Since the lower ring has a certain height, the perforated plates 403 are separated, so that adjacent perforated plates 403 are spaced apart to form a deposition space, and there are multiple layers of deposition space in total. The upper end of the top workpiece carrier ring 401 is connected to a cover.

[0035] Furthermore, if Figure 9 As shown, the perforated plate 403 is provided with a plurality of air holes, allowing the deposition gas to sequentially pass through each layer of the perforated plate 403 for deposition on the workpiece placed on the perforated plate 403. The side of the workpiece carrier ring 401 is provided with exhaust holes 402, which can be arranged on the upper ring or the lower ring of the workpiece carrier ring 401. The exhaust holes 402 allow the deposited gas to flow out of the workpiece carrier 400 and into the gap between the outside of the workpiece carrier 400 and the deposition chamber housing 504 for easy discharge from the exhaust gas output pipe 201.

[0036] In another embodiment, the height of the workpiece carrier ring 401 becomes shorter from bottom to top so that the distance between adjacent perforated plates 402, that is, the height of the deposition space, becomes smaller from bottom to top; the size of the air holes on the perforated plates 402 also becomes smaller from bottom to top, and the distance between the air holes also becomes smaller.

[0037] Example 8 is different from Example 7 in that Figure 2As shown, there is a certain distance between the preheating chamber 300 and the reaction deposition base 200. Specifically, a higher support base is provided at the bottom of the workpiece carrier 400, and the support base is an annular structure. The upper end of the support base cooperates with the lower end of the lowest workpiece carrier ring 401. The lower end of the support base is supported on the reaction deposition base 200. The preheating chamber 300 is arranged on the upper part of the support base. And the preheating chamber 300 and the support base are rotatably matched. The bottom of the preheating chamber 300 is at a certain distance from the reaction deposition base 200, so that the lower part of the support base is a cavity, which plays a certain role in heat insulation. The outside of the cavity, that is, the outside of the lower part of the support base, is also provided with heat insulation cotton to increase the heat insulation effect between the deposition chamber and the bottom. The rotating air supply shaft 802 is passed through the cavity.

[0038] Example 9 is different from Example 7 in that Figure 9 As shown, the gas supply pipe 801 is provided with multiple pairs of gas injection holes 8011 from bottom to top, and a pair of gas injection holes 8011 corresponds to one deposition space. Figure 10 、 Figure 11 and Figure 12 As shown, the two gas injection holes 8011 in each pair are arranged 180 degrees along the diameter of the gas supply tube 801. That is, the two gas injection holes 8011 are located on the same diameter and on either side of the gas supply tube 801. Furthermore, the gas injection holes 8011 in each pair are of different sizes, with one hole having a larger diameter and the other having a smaller diameter. Larger-diameter gas, ejected at a slower flow rate, is deposited closer, while smaller-diameter gas is ejected farther away. This arrangement improves the uniformity of the deposited gas and enhances coating quality.

[0039] Furthermore, the gas injection holes 8011 of adjacent deposition spaces are arranged in a 120-degree spiral, that is, multiple pairs of gas injection holes 8011 from bottom to top on the gas supply pipe 801 are arranged in a 120-degree spiral. Figure 9 As shown, and Figures 10 to 12 As shown, the gas injection holes 8011 of the three adjacent gas injection hole sections AA, BB, and CC form an angle of 120 degrees in the top projection.

[0040] Example 10 is different from Example 1 in that Figure 3As shown, the lower end of the rotary air supply shaft 802 is coaxially fixedly connected to the rotary drive shaft 804, and the upper part of the rotary drive shaft 804 is provided with a cavity that communicates with the rotary air supply shaft 802. The upper part of the rotary drive shaft 804 is divided into two sections, the upper section has a larger internal cavity for being sleeved on the outer side of the lower end of the rotary air supply shaft 802, and the lower section has an internal cavity smaller than the upper section, and the internal cavity of the lower section is aligned with the internal gas channel of the rotary air supply shaft 802. The lower end of the rotary drive shaft 804 is a solid shaft, which extends downward along the axial direction of the rotary air supply shaft 802. In addition, a positioning sleeve 805 is sleeved on the outer side of the upper part of the rotary drive shaft 804, and the rotary drive shaft 804 rotates in conjunction with the positioning sleeve 805. The positioning sleeve 805 is connected to an air inlet pipe 803 for inputting deposition gas. The lower section of the upper part of the rotating drive shaft 804 is circumferentially distributed with multiple air inlet holes that can be aligned with the air inlet pipe 803, so that the deposition gas is added to the rotating air supply shaft 802 through the cavity of the rotating drive shaft 804.

[0041] Furthermore, if Figure 3 As shown, a sealing sleeve is mounted on the outer side of the positioning sleeve 805. The upper portion of the sealing sleeve passes through the opening in the middle of the reaction deposition base 200 and is fixedly connected to the reaction deposition base 200. The lower portion of the sealing sleeve is mounted on the outer side of the solid shaft. The solid shaft and the lower end of the sealing sleeve are connected to the output shaft of the rotating drive member via a KF sealing joint and a coupling. The rotating drive member is a motor. The KF sealing joint and coupling are both conventional structures.

[0042] Example 11 is different from Example 1 in that Figure 2 and Figure 4 As shown, the segmented heating furnace 100 includes several heating furnace sections 114. In this embodiment, five heating furnace sections 114 are provided, forming five independent heating and temperature-controlled zones. Each heating furnace section 114 is equipped with a thermocouple terminal 103 and two heating wire terminals 104. Insulating gaskets 113 are sandwiched between adjacent heating furnace sections. Guide grooves 115 are provided on the outside of the heating furnace sections 114. Guide posts are inserted into these grooves to position the multiple segments 114.

[0043] Furthermore, a relay assembly 111 is installed on the outside of the segmented heating furnace 100 and connected to a power supply line 112. The relay controls the on / off state of the power supply line 112, thereby starting and stopping the heating function. Multiple hooks are provided on the inner wall of the segmented heating furnace 100 for hanging heating wires. Aluminum strip clamps 105 are installed on each segment of the heating furnace body 114. The heating wire terminals 104 are connected to the relay assembly 111 through the aluminum strip clamps 105.

[0044] Example 12 is different from Example 11 in that Figure 4As shown, a circuit protection cover 106 is provided on the outside of the segmented heating furnace 100 to protect the thermocouple terminals 103 and the heating wire terminals 104. A door panel is hingedly connected to the circuit protection cover 106. A safety protector 102 for connecting the circuit is installed inside the circuit protection cover 106. The door is equipped with a protector safety pin 101 that can be inserted into the safety protector 102 to ensure the circuit is connected when the door is closed.

[0045] Example 13 is different from Example 12 in that Figure 4 As shown, a lower insulation support 117 is provided at the lower end of the segmented heating furnace 100 for supporting the segmented heating furnace body 114, and an annular upper insulation support 110 is provided at the upper end of the heating furnace body 114. A high-temperature hard insulation board 108 is provided on the top of the upper insulation support 110, and a heating furnace top sealing flange 107 is provided on the top of the high-temperature hard insulation board 108 to prevent the loss of temperature radiation in the furnace.

[0046] In addition, there is a heat insulation board 116 on the outside of the heating furnace wall to reduce the impact of the heating furnace wall 109 on the surrounding environment. At the same time, a buffer support 119 and a position sensor 118 are provided at the bottom of the heating furnace for buffering and positioning indication when the heating furnace falls.

[0047] Example 14 is different from Example 13 in that Figure 1 and Figure 2 As shown, the apparatus further includes a support frame 700, on which are mounted several rotary tightening cylinders 600, evenly distributed around the reaction deposition chamber 500. The working ends of the rotary tightening cylinders 600 press against the deposition chamber base 501. The lower end of the buffer support 119 at the bottom of the segmented heating furnace 100 is supported on the support frame 700.

[0048] Working principle of the present invention: The workpiece substrate to be coated is placed on the workpiece carrier 400 within the reaction deposition chamber 500. The preheating chamber 300, gas supply pipe 801, and workpiece carrier 400 are then installed sequentially above the deposition base 200. The reaction deposition chamber 500 and segmented heating furnace 100 are then lowered, and the entire reaction deposition chamber 500 is evacuated via the exhaust gas output pipe 201. The preheating chamber 300 and gas supply rod 801 rotate via a rotating gas supply system 800. Deposition gas is delivered to the workpiece carrier 400 via an air inlet pipe 803 and a rotating gas supply shaft 802. During the process, the deposition gas is heated in the preheating chamber 300 and then uniformly injected into the deposition chamber via the gas supply pipe 801. The deposition gas uses metal chloride as a coating precursor. The evaporated precursor material forms a thin film on the workpiece substrate, achieving metal coating deposition. After the deposited deposition gas enters the reaction deposition chamber 500 from the workpiece carrier 400, it is gradually withdrawn via the exhaust gas output pipe 201. Furthermore, the coating precursor is continuously fed into the reaction zone and the by-products are continuously removed, thereby maintaining a stable reaction environment.

[0049] The above description is only a preferred embodiment of the present invention and is not intended to limit the present invention. Although the present invention has been described in detail with reference to the aforementioned embodiments, those skilled in the art should understand that any modification to the technical solutions described in the aforementioned embodiments, or any equivalent replacement of some or all of the technical features thereof, within the spirit and principles of the present invention, does not deviate the essence of the corresponding technical solutions from the scope of the technical solutions of the embodiments of the present invention, and should all be included in the scope of protection of the present invention.

Claims

1. A CVD coating reaction heating deposition device, characterized in that: The invention comprises a segmented heating furnace (100), a reaction deposition chamber (500) arranged in the segmented heating furnace (100), and a rotary air supply mechanism (800) penetrating the reaction deposition chamber (500), wherein the reaction deposition chamber (500) is provided with a multi-layer workpiece carrier (400) and a preheating chamber (300) located at the bottom of the workpiece carrier (400); the rotary air supply mechanism (800) comprises a rotary air supply shaft (802) axially penetrating the reaction deposition chamber (500) and rotatingly cooperating with the reaction deposition chamber (500), an air supply pipe (801) axially penetrating the workpiece carrier (400) and rotatingly cooperating with the workpiece carrier (400), and a rotary driving member connected to the rotary air supply shaft (802) for driving the rotary air supply shaft to rotate; the rotary air supply shaft (802) is connected to the air supply pipe (801) through the preheating chamber (300).

2. The CVD coating reaction heating deposition equipment according to claim 1, characterized in that: The preheating chamber (300) comprises a preheating chamber shell and a multi-layer partition plate arranged in the preheating chamber shell, and adjacent partition plates are separated by a partition ring (305); a fixing rod (304) is also passed through the multi-layer partition plate, and a support ring (306) sleeved on the fixing rod (304) is clamped between adjacent partition plates.

3. The CVD coating reaction heating deposition equipment according to claim 2, characterized in that: The partition includes a partition one (307) and a partition two (308) arranged crosswise so that the partition one (307) and the partition two (308) are arranged adjacent to each other, and the partition one (307) and the partition two (308) are respectively provided with ventilation holes penetrating the plate surface, and the ventilation holes on the adjacent partition one (307) and the partition two (308) are located at positions far away from each other so that the deposition gas can propagate in a "Z" shape in the preheating chamber (300).

4. The CVD coating reaction heating deposition equipment according to claim 2 or 3, characterized in that: The preheating chamber shell comprises a preheating chamber base (301) and a preheating chamber top plate (310) respectively arranged at the bottom and top of the multi-layer partition plate, and a preheating chamber body (303) arranged between the preheating chamber base (301) and the preheating chamber top plate (310) and sleeved on the outside of the multi-layer partition plate. The preheating chamber body (303) is connected to the preheating chamber base (301) and the preheating chamber top plate (310) respectively by bolts, and a sealing ring (302) is provided between the mating surfaces of the preheating chamber body (303) and the preheating chamber base (301) and the preheating chamber top plate (310).

5. The CVD coating reaction heating deposition equipment according to claim 4, characterized in that: The middle portion of the preheating chamber base (301) is provided with an interface for connecting to a rotating air supply shaft (802); the middle portion of the preheating chamber top plate (310) is provided with an interface for connecting to an air supply pipe (801); and a support sleeve (309) is provided on the uppermost partition plate, the upper end of the support sleeve (309) extends into the interface of the preheating chamber top plate (310), and the outer side of the support sleeve (309) is provided with a step surface for supporting the preheating chamber top plate (310); the lower portion of the support sleeve (309) is provided with a plurality of legs in contact with the uppermost partition plate so that the deposition gas enters the interface of the preheating chamber top plate (310) through the gap between the legs.

6. The CVD coating reactive heating deposition equipment according to any one of claims 1 to 3 and 5, characterized in that: The workpiece carrier (400) comprises a plurality of workpiece carrier rings (401) stacked in sequence and a perforated plate (403) arranged on each workpiece carrier ring (401), wherein adjacent perforated plates (403) are arranged at intervals to form a deposition space; exhaust holes (402) are provided on the side of the workpiece carrier ring (401), and a plurality of air holes are provided on the perforated plate (403); and a cover is connected to the top workpiece carrier ring (401).

7. The CVD coating reaction heating deposition equipment according to claim 6, characterized in that: The air supply pipe (801) is provided with a plurality of pairs of air injection holes (8011) in sequence, and a pair of air injection holes (8011) corresponds to one deposition space; the pair of air injection holes (8011) are arranged at 180 degrees along the diameter of the air supply pipe (801), and the sizes of the pair of air injection holes (8011) are different; the air injection holes (8011) of adjacent deposition spaces are arranged in a 120-degree spiral.

8. The CVD coating reactive heating deposition equipment according to any one of claims 1 to 3, 5 and 7, characterized in that: The reaction deposition chamber (500) includes an annular deposition chamber base (501) and a deposition chamber shell (504) arranged on the deposition chamber base (501), and a gap is provided between the deposition chamber shell (504) and the workpiece carrier (400) for the flow of deposition gas; the bottom of the deposition chamber base (501) is connected to the reaction deposition base (200), and the reaction deposition base (200) is provided with an exhaust gas output pipe (201) for discharging the deposition gas after deposition; an annular table is provided on the outer side of the deposition chamber base (501), and a heat sink is provided on the annular table, and an annular support block for supporting the segmented heating furnace (100) is connected to the heat sink through a buffer spring (502), and an insulation ring (503) is provided between the inner side of the annular support block and the deposition chamber shell (504).

9. The CVD coating reaction heating deposition equipment according to claim 8, characterized in that: The lower end of the rotary air supply shaft (802) is fixedly connected to a rotary drive shaft (804); the upper portion of the rotary drive shaft (804) is provided with a cavity communicating with the rotary air supply shaft (802); the lower end of the rotary drive shaft (804) is a solid shaft; a positioning sleeve (805) is sleeved on the outer side of the upper portion of the rotary drive shaft (804), and the rotary drive shaft (804) and the positioning sleeve (805) are rotatably matched; the positioning sleeve (805) is connected to an air inlet pipe (803) for inputting deposition gas. The rotating drive shaft (804) is evenly distributed with a plurality of air inlet holes that can be aligned with the air inlet pipe (803) on the circumference; a sealing sleeve is provided on the outer side of the positioning sleeve (805), and the upper part of the sealing sleeve passes through the opening in the middle of the reaction deposition base (200) and is fixedly connected to the reaction deposition base (200); the lower part of the sealing sleeve is sleeved on the outer side of the solid shaft, and the outer side of the lower part of the sealing sleeve is provided with a heat dissipation fin (806); and the lower ends of the solid shaft and the sealing sleeve are connected to the output shaft of the rotating drive member through a sealing joint and a coupling.

10. The CVD coating reactive heating deposition equipment according to any one of claims 1 to 3, 5, 7 and 9, characterized in that: The segmented heating furnace (100) shown includes several segments of heating furnace bodies (114), with heat insulating gaskets (113) sandwiched between adjacent heating furnace bodies, and a guide groove (115) is provided on the outside of the heating furnace body (114), and the several segmented furnace bodies (114) are connected by inserting a guide column into the guide groove (115); each segment of the heating furnace body (114) is provided with a thermocouple terminal (103) and two heating wire terminals (104); a circuit protection cover (106) with a door for protecting the thermocouple terminal (103) and the heating wire terminal (104) is provided on the outside of the segmented heating furnace (100), a safety protector (102) for connecting the circuit is provided in the circuit protection cover (106), and a protector safety pin (101) that can be inserted into the safety protector (102) is provided on the door to ensure that the circuit is connected when the door is closed.

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