Anti-migration ultraviolet cut-off photovoltaic adhesive film and photovoltaic module

Abstract

The invention relates to the technical field of photovoltaics, in particular to an anti-migration ultraviolet cut-off photovoltaic adhesive film and application thereof. The anti-migration ultraviolet cut-off photovoltaic adhesive film comprises matrix resin and an ultraviolet cut-off agent, the ultraviolet cut-off agent is a benzotriazole compound with a reactive double bond, and the reactive double bond is selected from one of an olefinic bond, an acrylate bond, a methacrylate bond or a vinyl ester bond; and the absorption wave band of the ultraviolet cut-off agent is 280 to 380 nm. Therefore, the anti-migration ultraviolet cut-off photovoltaic adhesive film has a good cut-off effect and an anti-migration effect and is not prone to yellowing, and a battery assembly adopting the photovoltaic adhesive film has a longer service life.

Description

Technical Field

[0001] The present invention relates to the field of photovoltaics, in particular to an anti-migration UV cut-off photovoltaic adhesive film and a photovoltaic module using the anti-migration UV cut-off photovoltaic adhesive film. Background Art

[0002] During long-term outdoor use, solar photovoltaic modules are susceptible to environmental factors such as light, heat, and oxidation, leading to aging, which reduces the module's service life and photoelectric conversion efficiency. Ultraviolet light is a major cause of module aging. Traditional UV-blocking films absorb UV light by adding inorganic particles (such as carbon black or metal oxides), but this reduces the film's transmittance, impacting the module's photoelectric conversion efficiency. Existing technologies primarily use organic UV absorbers, such as benzophenones, benzotriazoles, triazines, oxalanilides, and cyanoacrylates. Benzotriazole UV absorbers offer a broad absorption spectrum, strong absorption capacity, and high stability, offering significant cost-effectiveness. They are currently the most widely used type of product in the polymer anti-aging field. Traditional benzotriazole UV absorbers (such as UV 384-2) do not contain reactive groups and are freely dispersed within the polymer material. While these UV absorbers function normally under typical operating conditions, absorbing harmful UV rays, slowing aging and ultimately protecting the material. However, under high temperatures and corrosive environmental conditions, traditional UV absorbers can be lost through physical means (volatilization, migration, and dissolution), ultimately failing to protect the material. This can lead to issues such as yellowing of the film and hot spots in the components. Therefore, existing technologies suffer from the problem of UV blocker migration leading to component performance degradation, necessitating the development of a migration-resistant UV blocker film to address this issue. Summary of the Invention

[0003] In order to solve the above-mentioned problems of the prior art, the present invention provides an anti-migration UV cutoff photovoltaic adhesive film and its application. The anti-migration UV cutoff photovoltaic adhesive film has good cutoff effect and anti-migration effect, is not easy to yellow, and can effectively improve the service life of the battery component.

[0004] The present invention provides an anti-migration UV cut-off photovoltaic adhesive film, comprising:

[0005] Base resin and UV cut-off agent,

[0006] The UV cutoff agent is a benzotriazole compound with a reactive double bond and an absorption band of 280-380nm.

[0007] The reactive double bond is selected from one of an olefin bond, an acrylate bond, a methacrylate bond or a vinyl ester bond;

[0008] The benzotriazole compound is represented by the following general formula (1):

[0009] in:

[0010] R1 and R5 are selected from H, OH, C n H 2n+1 ;

[0011] R2 and R4 are selected from H, C n H 2n+1 、 Among them, R x Selected from C n H 2n and R y Selected from C n H 2n+1 ;

[0012] R3 is selected from H, OH, C n H 2n+1 ;

[0013] n is a natural number selected from 1 to 20.

[0014] In a preferred embodiment, the benzotriazole compound is represented by the following general formula (2):

[0015] in:

[0016] R1 is H;

[0017] R2 is C2H5;

[0018] R3 is H;

[0019] R4 is selected from where R x is CH2;

[0020] R5 is OH.

[0021] In a preferred embodiment, the benzotriazole compound is represented by the following general formula (3):

[0022] in:

[0023] R1 is H;

[0024] R2 is C2H5;

[0025] R3 is H;

[0026] R4 is selected from where R x CH2 and R y is CH3;

[0027] R5 is OH.

[0028] In a preferred embodiment, the benzotriazole compound is represented by the following general formula (4):

[0029] in:

[0030] R1 is OH;

[0031] R2 is CH3;

[0032] R3 is H;

[0033] R4 is selected from where R x is CH2;

[0034] R5 is OH.

[0035] In a preferred embodiment, the benzotriazole compound is represented by the following general formula (5):

[0036] in:

[0037] R1 is OH;

[0038] R2 is CH3;

[0039] R3 is 0H;

[0040] R4 is selected from where R x is CH2;

[0041] R5 is OH.

[0042] In a preferred embodiment, the benzotriazole compound is represented by the following general formula (6):

[0043] in:

[0044] R1 is OH;

[0045] R2 is CH3;

[0046] R3 is H;

[0047] R4 is selected from where R x CH2 and R y is CH3;

[0048] R5 is OH.

[0049] In a preferred embodiment, the benzotriazole compound is represented by the following general formula (7):

[0050] in:

[0051] R1 is OH;

[0052] R2 is CH3;

[0053] R3 is OH;

[0054] R4 is selected from where R x CH2 and R y is CH3;

[0055] R5 is OH.

[0056] In a preferred embodiment, the benzotriazole compound is represented by the following general formula (8):

[0057] in:

[0058] R1 is H;

[0059] R2 is CH3;

[0060] R3 is H;

[0061] R4 is CH=CH2;

[0062] R5 is OH.

[0063] In a preferred embodiment, the benzotriazole compound is represented by the following general formula (9):

[0064] in:

[0065] R1 is H;

[0066] R2 is CH3;

[0067] R3 is H;

[0068] R4 is selected from where R x for C2H4 and R y is CH3;

[0069] R5 is OH.

[0070] In a preferred embodiment, the benzotriazole compound is represented by the following general formula (10): in:

[0071] R1 is H;

[0072] R2 is CH3;

[0073] R3 is H;

[0074] R4 is selected from where R xis C2H4;

[0075] R5 is OH.

[0076] Furthermore, any of the above-mentioned anti-migration UV cut-off photovoltaic adhesive films further includes peroxide, a co-crosslinking agent, a tackifier, a light stabilizer, and an antioxidant.

[0077] Furthermore, in parts by weight, for 100 parts of the base resin, the UV cutoff agent is equivalent to 0.01-2 parts of the base resin, the peroxide is equivalent to 0.1-2 parts of the base resin, the co-crosslinking agent is equivalent to 0.1-5 parts of the base resin, the tackifier is equivalent to 0.1-5 parts of the base resin, the light stabilizer is equivalent to 0.01-5 parts of the base resin, and the antioxidant is equivalent to 0.01-5 parts of the base resin.

[0078] Furthermore, the matrix resin is EVA or POE.

[0079] Another object of the present invention is to provide a photovoltaic module, comprising a photovoltaic cell, a first encapsulating film tightly bonded to one surface of the photovoltaic cell, and a second encapsulating film tightly bonded to the side surface of the photovoltaic cell facing away from the first encapsulating film, wherein the first encapsulating film is the anti-migration UV cutoff photovoltaic film described in any one of the above items, the second encapsulating film is a high-transmittance film, and the anti-migration UV cutoff photovoltaic film includes a base resin grafted with a UV cutoff agent.

[0080] Another object of the present invention is to provide a photovoltaic module, comprising a photovoltaic cell, a first encapsulating film tightly bonded to one surface of the photovoltaic cell, and a second encapsulating film tightly bonded to the side surface of the photovoltaic cell facing away from the first encapsulating film, wherein the second encapsulating film is the anti-migration UV cutoff photovoltaic film described in any one of the above items, the first encapsulating film is a light-converting film, and the anti-migration UV cutoff photovoltaic film includes a base resin grafted with a UV cutoff agent.

[0081] Compared with the prior art, the present invention has the following beneficial effects:

[0082] 1. This invention utilizes a benzotriazole-based UV cutoff agent containing a reactive double bond. During the battery assembly lamination process, the peroxide initiator decomposes to produce free radicals, which preferentially attack the reactive sites of the matrix resin (EVA or POE), forming macromolecular free radicals. Simultaneously, the UV cutoff agent's C=C double bond is activated, undergoing a graft copolymerization reaction with the resin free radicals, covalently fixing the UV cutoff agent to the polymer network, thereby completely inhibiting migration. Testing has shown that the UV cutoff agent's mobility is ≤5%, demonstrating its long-term stability.

[0083] 2. The rigid conjugated structure of benzotriazole cut-off agent inhibits photo-oxidation, making it have excellent anti-yellowing performance. Due to the reduction of UV-induced light decay of packaging materials (60kWh / m 2 After irradiation, the transmittance retention rate is ≥90%), which avoids local current mismatch of components and greatly reduces the risk of hot spots.

[0084] 3. The absorption range of the UV cutoff agent precisely matches the requirements of silicon cells:

[0085] Strong absorption region (280-400nm): transmittance <30%, which can block UV damage to batteries and packaging materials;

[0086] High transmittance area (400-1100nm): transmittance > 90%, ensuring efficient utilization of visible-near-infrared light and no loss in component photoelectric conversion efficiency. DETAILED DESCRIPTION

[0087] The technical solutions of the present invention are described one by one in conjunction with the detailed description below, and the following description is non-limiting.

[0088] The specific meanings of the professional terms mentioned in this invention are as follows:

[0089] EVA: the abbreviation of ethylene-vinyl acetate copolymer;

[0090] POE: The abbreviation of ethylene-butene copolymer or ethylene-octene copolymer.

[0091] On the one hand, the anti-migration UV cutoff photovoltaic adhesive film provided by the present invention, in parts by weight, is 100 parts of the base resin, the UV cutoff agent is equivalent to 0.01-2 parts of the base resin, and further includes a peroxide equivalent to 0.1-2 parts of the base resin, a co-crosslinking agent equivalent to 0.1-5 parts of the base resin, a tackifier equivalent to 0.1-5 parts of the base resin, a light stabilizer equivalent to 0.01-5 parts of the base resin, and an antioxidant equivalent to 0.01-5 parts of the base resin.

[0092] Specifically, the UV cutoff agent is a benzotriazole compound having a reactive double bond and having an absorption band of 280-380 nm, wherein the reactive double bond is selected from one of an olefin bond, an acrylate bond, a methacrylate bond, or a vinyl ester bond; the benzotriazole compound is shown in the following general formula (1):

[0093] in:

[0094] R1 and R5 are selected from H, OH, C n H 2n+1 ;

[0095] R2 and R4 are selected from H, Cn H 2n+1 、 R x Selected from C n H 2n and R y Selected from C n H 2n+1 ;

[0096] R3 is selected from H, OH, C n H 2n+1 ;

[0097] n is a natural number selected from 1 to 20.

[0098] In certain embodiments, the matrix resin is selected from EVA or POE.

[0099] The anti-migration UV cutoff photovoltaic adhesive film provided by the present invention adopts a benzotriazole UV cutoff agent containing a reactive double bond. During the battery component lamination process, the peroxide initiator decomposes to generate free radicals, which preferentially attack the reaction sites of the matrix resin (EVA or POE) to form macromolecular free radicals; at the same time, the C=C double bond of the UV cutoff agent is activated and undergoes a graft copolymerization reaction with the resin free radicals, so that the UV cutoff agent is fixed to the polymer network in the form of a covalent bond, thereby completely inhibiting migration.

[0100] In certain embodiments, the peroxide is selected from one or more of tert-butylperoxyisopropyl carbonate, 2,5-dimethyl-2,5-(bis-tert-butylperoxy)hexane, tert-butylperoxy-2-ethylhexyl carbonate, 1,1-bis(tert-butylperoxy)-3,3,5-trimethylcyclohexane, 1,1-bis(tert-amylperoxy)-3,3,5-trimethylcyclohexane, 1,1-bis(tert-amylperoxy)cyclohexane, 1,1-bis(tert-butylperoxy)cyclohexane, 2,2-bis(tert-butylperoxy)butane, tert-amyl peroxy-2-ethylhexyl carbonate, 2,5-dimethyl-2,5-bis(benzoylperoxy)-hexane, tert-amyl peroxycarbonate, and tert-butyl peroxy-3,3,5-trimethylhexanoate.

[0101] In certain embodiments, the auxiliary crosslinking agent is selected from triallyl isocyanurate, triallyl cyanurate, trimethylolpropane triacrylate, trimethylolpropane trimethacrylate, pentaerythritol triacrylate, tris(2-hydroxyethyl)isocyanurate triacrylate, ethoxylated trimethylolpropane triacrylate, propoxylated trimethylolpropane triacrylate, ethoxylated glycerol triacrylate, propoxylated glycerol triacrylate, pentaerythritol tetraacrylate, ethoxylated pentaerythritol tetraacrylate, trimethylolpropane tetraacrylate, ditrimethylolpropane One or more of the group consisting of tetraacrylate, ditrimethylolpropane tetramethacrylate, propoxylated pentaerythritol tetraacrylate, 2,4,6-tris(2-propenyloxy)-1,3,5-triazine, tricyclodecane dimethanol diacrylate, propoxylated neopentyl glycol diacrylate, ethoxylated bisphenol A diacrylate, ethoxylated bisphenol A dimethacrylate, 2-butyl-2-ethyl-1,3-propanediol diacrylate, diethylene glycol dimethacrylate, triethylene glycol dimethacrylate and polyethylene glycol dimethacrylate.

[0102] In certain embodiments, the adhesion promoter is selected from one or more of vinyltriethoxysilane, vinyltrimethoxysilane, vinyltriacetoxysilane, γ-methacryloxypropyltrimethoxysilane, γ-acryloxypropyltrimethoxysilane, mercaptopropyltrimethoxysilane, γ-aminopropyltriethoxysilane, γ-(2,3-epoxypropoxy)propyltrimethoxysilane, N-(β-aminoethyl)-γ-aminopropyltrimethoxysilane, γ-glycidoxypropyltrimethylsilane, and 3-aminopropyltrimethylsilane.

[0103] In certain embodiments, the light stabilizer is selected from one or more of bis(2,2,6,6-tetramethyl-4-piperidinyl) sebacate, bis(1-octyloxy-2,2,6,6-tetramethyl-4-piperidinyl) sebacate, a graft copolymer obtained by polymerization of 4-(methyl)acryloyloxy-2,2,6,6-tetramethylpiperidine and α-olefin monomers, 4-hydroxy-2,2,6,6-tetramethyl-1-piperidinol, 3,5-di-tert-butyl-4-hydroxy-benzoic acid hexadecyl ester, bis-2,2,6,6-tetramethylpiperidinol sebacate and tris(1,2,2,6,6-pentamethyl-4-piperidinyl) phosphite.

[0104] In certain embodiments, the antioxidant is a hindered phenol compound and / or a phosphite compound. Hindered phenol compounds include but are not limited to 2,6-di-tert-butyl-4-ethylphenol, 2,2'-methylene-bis-(4-methyl-6-tert-butylphenol), 2,2'-methylene-bis-(4-ethyl-6-tert-butylphenol), 4,4'-butylene-bis-(3-methyl-6-tert-butylphenol), octadecyl-3-(3,5-di-tert-butyl-4-hydroxyphenyl) propionate, pentaerythritol-tetrakis[3-(3,5-di-tert-butyl-4-hydroxyphenyl) propionate], 7-octadecyl-3-(4'-hydroxy-3',5' -di-tert-butylphenyl) propionate, tetrakis-[methylene-3-(3',5'-di-tert-butyl-4'-hydroxyphenyl) propionate] methane; phosphite compounds include but are not limited to one or more of tris(2,4-di-tert-butylphenyl) phosphite, bis[2,4-bis(1,1-dimethylethyl)-6-methylphenyl]ethyl ester phosphite, tetrakis(2,4-di-tert-butylphenyl)[1,1-phenylene]-4,4'-diyl bisphosphite and bis(2,4-di-tert-butylphenyl) pentaerythritol diphosphite.

[0105] The present invention is further described in detail below with reference to specific embodiments.

[0106] Examples 1 to 9

[0107] The anti-migration UV cut-off photovoltaic adhesive film provided in Examples 1 to 9 is composed of 100 parts by weight of base resin, 0.5 parts of peroxide, 0.6 parts of auxiliary crosslinking agent, 0.2 parts of tackifier, 0.05 parts of light stabilizer, 0.05 parts of antioxidant, and 0.02 parts of UV cut-off agent. Among them, the base resin is EVA resin, the peroxide is tert-butyl peroxyisopropyl carbonate, the auxiliary crosslinking agent is trimethylolpropane tetraacrylate, the tackifier is vinyl triethoxysilane, the light stabilizer is bis(2,2,6,6-tetramethyl-4-piperidinyl) sebacic acid ester, and the antioxidant is 2,6-di-tert-butyl-4-ethylphenol. The UV cut-off agents in Examples 1 to 9 are shown in Table 1 respectively:

[0108] Table 1 Selection of UV cut-off agents in Examples 1 to 9.

[0109]

[0110]

[0111] Example 10

[0112] The difference between the anti-migration UV cut-off photovoltaic adhesive film provided in this embodiment and that in embodiment 1 is that the base resin is POE resin.

[0113] Example 11

[0114] The difference between the anti-migration UV cut-off photovoltaic adhesive film provided in this embodiment and that in embodiment 2 is that the base resin is POE resin.

[0115] Comparative Example 1

[0116] The photovoltaic adhesive film provided in this comparative example is different from that in Example 1 in that it does not contain a UV cutoff agent.

[0117] Comparative Example 2

[0118] The photovoltaic adhesive film provided in this comparative example is different from that in Example 1 in that the UV cutoff agent is an inorganic cutoff agent, namely zinc oxide.

[0119] Comparative Example 3

[0120] The photovoltaic film provided in this comparative example is different from that in Example 1 in that the UV cutoff agent is a conventional organic cutoff agent, namely UV328.

[0121] Test method:

[0122] 1. The encapsulating films prepared in the examples and comparative examples were laminated according to a conventional lamination process. After cooling, the transmittance of the films was tested using a Shimadzu UV2600 i ultraviolet spectrophotometer. The transmittance of the films in the range of 280-380 nm was T1, and the transmittance in the range of 400-1100 nm was T2.

[0123] 2. UV aging performance

[0124] Test conditions: sample surface temperature 60±5℃, irradiation dose 60KWh / m 2 Characterization method: Yellowing index (ΔYI) is analyzed according to GB2409-80 "Test method for yellowing index of plastics".

[0125] 3. Module power

[0126] The encapsulation films prepared in the examples and comparative examples were placed on the light-receiving surface of a conventional crystalline silicon solar cell element, and other conventional encapsulation materials were added. A standard assembly was prepared according to a conventional lamination process. At room temperature, the light intensity was 100 mW / cm2 at AM1.5G. 2 The module power test is carried out under the conditions of , and the initial power Pmax is recorded. The test of the present invention adopts a 16-cell module.

[0127] 4. Mobility test

[0128] The encapsulating films and high-transmittance films prepared in the Examples and Comparative Examples, as well as standard samples of UV cutoff film with varying UV cutoff agent contents, were laminated using a conventional lamination process. After physically laminating the encapsulating films prepared in the Examples and Comparative Examples one-on-one with high-transmittance films from the same batch, the films were placed in a 50°C oven for 168 hours. The transmittance of each high-transmittance film in the 280-380nm range was measured and compared with the standard samples to determine the UV cutoff agent migration content in the corresponding encapsulating film and calculate the migration rate M of the encapsulating film. Note: Comparative Example 1 does not require testing because no UV cutoff agent was added.

[0129] The test results of Examples 1 to 11 and Comparative Examples 1 to 3 are shown in Table 2:

[0130] Table 2 Test results

[0131]

[0132]

[0133] As shown in Table 2, the performance data of the examples and comparative examples show that the mobility of the benzotriazole-based UV cutoff agents containing reactive double bonds in the encapsulating film is ≤5%, which is significantly lower than the mobility of traditional inorganic and organic UV cutoff agents in the encapsulating film. The reason is that during the battery assembly lamination process, the peroxide initiator in the encapsulating film prepared by the present invention decomposes to produce free radicals, which preferentially attack the reactive sites of the matrix resin (EVA or POE) to form macromolecular free radicals. At the same time, the C=C double bond of the UV cutoff agent is activated, undergoing a graft copolymerization reaction with the resin free radicals, thereby fixing the UV cutoff agent to the polymer network in the form of a covalent bond, thereby completely inhibiting migration.

[0134] Further, from the performance test data in Table 2, no matter which one of reactive double bond is derived from olefinic bond, acrylate bond, methacrylate bond or vinyl ester bond, as long as reactive double bond is contained in the UV cutoff agent molecule, its mobility in encapsulating film is all≤5%. The mobility of the UV cutoff agent in encapsulating film containing acrylate bond (Example 1, 4 and 6), methacrylate bond (Example 2, 3, 5 and 8) or vinyl ester bond (Example 9) is less than the mobility of the UV cutoff agent in encapsulating film containing olefinic bond (Example 7), because acrylate bond, methacrylate bond or vinyl ester bond contain ester group, and ester group helps to promote the compatibility of UV cutoff agent in matrix resin, and then helps UV cutoff agent to be dispersed more evenly in matrix resin, and also can complete grafting reaction faster in a limited time during lamination. The higher the grafting reaction completion degree, the fewer free UV cutoff agent small molecules are, and the UV cutoff agent that can migrate is naturally even less, and the mobility data obtained by the final test are also smaller.

[0135] Further, from the performance test data in Table 2, the mobility of the benzotriazole type ultraviolet cut-off agent containing reactive double bond in POE adhesive film (embodiment 10 and 11) used in the present invention is significantly greater than the mobility in EVA adhesive film (embodiment 1 and 2). It may be because the compatibility of ultraviolet cut-off agent in POE resin is lower than the compatibility in EVA resin, causing the grafting reaction completion degree to be slightly low, free ultraviolet cut-off agent small molecules are more, and the ultraviolet cut-off agent that can migrate is also more, causing the mobility of the benzotriazole type ultraviolet cut-off agent containing reactive double bond in POE adhesive film to be slightly higher, but still far below the mobility of traditional ultraviolet cut-off agent in EVA adhesive film. Based on the above description, it can be reasonably inferred that the mobility of the benzotriazole type ultraviolet cut-off agent containing reactive double bond in POE adhesive film is also far below the mobility of traditional ultraviolet cut-off agent in POE adhesive film.

[0136] Further, from the performance data of Table 2, it can be seen that the addition of the ultraviolet cutoff agent (Examples 1 to 11) used in the encapsulation film relative to the initial optical performance of the traditional cutoff film (Comparative Example 3) (see T1 and T2 data) does not significantly deteriorate, specifically, the encapsulation film prepared by the present invention has a transmittance of less than 10% in the range of 280-380nm, which can effectively block the damage of ultraviolet light to the battery and packaging materials, and the transmittance in the range of 400-1100nm is greater than 90%, ensuring efficient utilization of visible-near infrared light and no loss of component photoelectric conversion efficiency. In this way, it is shown that the ultraviolet cutoff agent used in the present invention does not affect the initial optical performance of the encapsulation film. And the initial power (see Pmax data) of the battery assembly made of the encapsulation film prepared by the present invention is also not significantly deteriorated, further showing that the ultraviolet cutoff agent used in the present invention does not affect the initial optical performance of the encapsulation film.

[0137] Moreover, it can be seen from the performance data of the examples and comparative examples in Table 2 that the higher the mobility of the UV cutoff agent in the encapsulating film, the more severe the yellowing of the encapsulating film after UV aging, the more likely it will cause local current mismatch in the component, and the greater the possibility of causing hot spot hazards in the battery component. The rigid conjugated structure of the benzotriazole cutoff agent itself has an inhibitory effect on photooxidation, making it have excellent anti-yellowing performance. The selection of benzotriazole UV cutoff agents containing reactive double bonds can be grafted onto the matrix resin macromolecule of the encapsulating film, which is more conducive to the encapsulating film to exert its long-term and stable photooxidation inhibitory effect, more effectively protect the battery, and ensure the long-term stability of the battery component power generation.

[0138] On the other hand, the photovoltaic module provided by the present invention includes a photovoltaic cell, a first encapsulation film tightly bonded to the surface of one side of the photovoltaic cell, and a second encapsulation film tightly bonded to the surface of the other side of the photovoltaic cell, the first encapsulation film is any one of the anti-migration UV cut-off photovoltaic films provided by the present invention, the second encapsulation film is a high-transmittance film, and the anti-migration UV cut-off photovoltaic film includes a base resin grafted with a UV cut-off agent.

[0139] On the other hand, the photovoltaic module provided by the present invention includes a photovoltaic cell, a first encapsulation film tightly bonded to the surface of one side of the photovoltaic cell, and a second encapsulation film tightly bonded to the surface of the other side of the photovoltaic cell, the second encapsulation film is any one of the anti-migration UV cut-off photovoltaic films provided by the present invention, the first encapsulation film is a light-converting film, and the anti-migration UV cut-off photovoltaic film includes a base resin grafted with a UV cut-off agent.

[0140] The above are all preferred embodiments of the present invention, and are not intended to limit the scope of protection of the present invention. Therefore, any equivalent changes made based on the structure, shape, and principle of the present invention should be included in the scope of protection of the present invention.

Claims

1. An anti-migration UV cut-off photovoltaic film, characterized in that: Included: Base resin and UV cut-off agent, The UV cutoff agent is a benzotriazole compound with a reactive double bond and an absorption band of 280-380nm. The reactive double bond is selected from one of an olefin bond, an acrylate bond, a methacrylate bond or a vinyl ester bond; The benzotriazole compound is represented by the following general formula (1): in: R1 and R5 are selected from H, OH, C n H 2n+1 ; R2 and R4 are selected from H, C n H 2n+1 、 Among them, R x Selected from C n H 2n and R y Selected from C n H 2n+1 ; R3 is selected from H, OH, C n H 2n+1 ; n is a natural number selected from 1 to 20.

2. The anti-migration UV cut-off photovoltaic adhesive film according to claim 1, characterized in that: The benzotriazole compound is represented by the following general formula (2): in: R1 is H; R2 is C2H5; R3 is H; R4 is selected from where R x is CH2; R5 is OH.

3. The anti-migration UV cut-off photovoltaic adhesive film according to claim 1, characterized in that: The benzotriazole compound is represented by the following general formula (3): in: R1 is H; R2 is C2H5; R3 is H; R4 is selected from where R x CH2 and R y is CH3; R5 is OH.

4. The anti-migration UV cut-off photovoltaic adhesive film according to claim 1, characterized in that: The benzotriazole compound is represented by the following general formula (4): in: R1 is OH; R2 is CH3; R3 is H; R4 is selected from where R x is CH2; R5 is OH.

5. The anti-migration UV cut-off photovoltaic adhesive film according to claim 1, characterized in that: The benzotriazole compound is represented by the following general formula (5): in: R1 is OH; R2 is CH3; R3 is 0H; R4 is selected from where R x is CH2; R5 is OH.

6. The anti-migration UV cut-off photovoltaic adhesive film according to claim 1, characterized in that: The benzotriazole compound is represented by the following general formula (6): in: R1 is OH; R2 is CH3; R3 is H; R4 is selected from where R x CH2 and R y is CH3; R5 is OH.

7. The anti-migration UV cut-off photovoltaic adhesive film according to claim 1, characterized in that: The benzotriazole compound is represented by the following general formula (7): in: R1 is OH; R2 is CH3; R3 is OH; R4 is selected from where R x CH2 and R y is CH3; R5 is OH.

8. The anti-migration UV cut-off photovoltaic adhesive film according to claim 1, characterized in that: The benzotriazole compound is represented by the following general formula (8): in: R1 is H; R2 is CH3; R3 is H; R4 is CH=CH2; R5 is OH.

9. The anti-migration UV cut-off photovoltaic adhesive film according to claim 1, characterized in that: The benzotriazole compound is represented by the following general formula (9): in: R1 is H; R2 is CH3; R3 is H; R4 is selected from where R x for C2H4 and R y is CH3; R5 is OH.

10. The anti-migration UV cut-off photovoltaic adhesive film according to claim 1, characterized in that: The benzotriazole compound is represented by the following general formula (10): in: R1 is H; R2 is CH3; R3 is H; R4 is selected from where R x is C2H4; R5 is OH.

11. The anti-migration UV cut-off photovoltaic adhesive film according to any one of claims 1 to 10, characterized in that: It also includes peroxides, cross-linking agents, tackifiers, light stabilizers, and antioxidants.

12. A photovoltaic module comprising a photovoltaic cell, a first encapsulating film tightly bonded to a surface of the photovoltaic cell, and a second encapsulating film tightly bonded to a surface of the photovoltaic cell facing away from the first encapsulating film, wherein: The first encapsulating film is the anti-migration UV cutoff photovoltaic film according to any one of claims 1 to 11, the second encapsulating film is a high-transmittance film, and the anti-migration UV cutoff photovoltaic film comprises a base resin grafted with a UV cutoff agent.

13. A photovoltaic module comprising a photovoltaic cell, a first encapsulating film tightly bonded to one surface of the photovoltaic cell, and a second encapsulating film tightly bonded to a surface of the photovoltaic cell facing away from the first encapsulating film, wherein: The second encapsulating film is the anti-migration UV cutoff photovoltaic film according to any one of claims 1 to 11, the first encapsulating film is a light-converting film, and the anti-migration UV cutoff photovoltaic film comprises a base resin grafted with a UV cutoff agent.

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