Radio frequency plasma cleaning device

Abstract

The invention discloses a radio frequency plasma cleaning device, which relates to the technical field of plasma cleaning equipment, and comprises a starting system, a vacuum system and a control system, the starting system comprises an outer shell, an airflow regulator, a quartz hollow tube and an inductance driving coil; the outer shell is provided with an inner cavity, the airflow regulator and the quartz hollow tube are arranged in the inner cavity, and the airflow regulator can regulate gas flow; the inductance driving coil is sleeved outside the quartz hollow tube; the vacuum system comprises a vacuum cabin, an objective table and vacuumizing equipment; the objective table is fixed in the vacuum cabin, an extraction opening of vacuumizing equipment is communicated with the interior of the cabin, and a communicating opening, corresponding to the upper portion of the objective table, of the vacuum cabin is communicated with a lower end opening of the quartz hollow tube; the control system comprises a radio frequency power supply which can provide radio frequency energy for the inductance driving coil, the power of the control system is adjustable, and the cleaning gas can be switched into different gases. The device is small in size, light in weight, compact in structure and low in cost.

Description

Technical Field

[0001] The present invention relates to the technical field of plasma cleaning equipment, and in particular to a radio frequency plasma cleaning device. Background Art

[0002] Like solids, liquids, and gases, plasma is a state of matter, also known as the fourth state of matter. Plasma cleaning technology operates primarily by activating cross-linking bonds, a physical process that bombards the material surface and chemically forms new functional groups. It encompasses four main applications: surface cleaning, surface activation, etching, and coating. Compared to traditional solvent cleaning methods, plasma cleaning offers numerous advantages, including environmental friendliness, the absence of a cleaning fluid, high cleaning efficiency, and superior cleaning results. It also activates surfaces, increases surface wettability, and improves adhesion, leading to its widespread application in electronics, aviation, healthcare, textiles, and other fields.

[0003] Existing plasma cleaning devices are large in size and have complex mechanical structures, which increases the system's reliance on high-precision components and increases manufacturing and maintenance costs. Summary of the Invention

[0004] The purpose of the present invention is to provide a radio frequency plasma cleaning device to solve the problems existing in the above-mentioned prior art and to achieve a device with small size, light weight, compact structure and low cost.

[0005] To achieve the above object, the present invention provides the following solutions:

[0006] The present invention provides a radio frequency plasma cleaning device, comprising a starting system, a vacuum system and a control system; the starting system comprises an outer shell, an air flow regulator, a quartz hollow tube and an inductive drive coil; the outer shell has an internal cavity; the air flow regulator and the quartz hollow tube are both arranged in the internal cavity; one end of the air flow regulator is used to introduce cleaning gas, and the other end of the air flow regulator is connected to the upper end opening of the quartz hollow tube, and the air flow regulator can adjust the flow rate of the cleaning gas passing through the air flow regulator; the inductive drive coil is sleeved on the outside of the quartz hollow tube, and the inductive drive coil The generated magnetic field can initiate ionization of the cleaning gas in the quartz hollow tube to form plasma; the vacuum system includes a vacuum chamber, a stage and a vacuum pumping device; the stage is fixedly arranged in the vacuum chamber, and the exhaust port of the vacuum pumping device is connected to the interior of the vacuum chamber; a connecting port is opened on the vacuum chamber above the stage, and the connecting port is connected to and communicates with the lower end opening of the quartz hollow tube; the control system includes a radio frequency power supply, which can provide radio frequency energy to the inductive drive coil; the power of the radio frequency power supply is adjustable, and the cleaning gas can be switched to different gases.

[0007] Preferably, the fixed frequency of the radio frequency power supply is 13.56 MHz.

[0008] Preferably, the starting system further includes a vacuum shut-off valve; the upper end of the outer shell is provided with a cleaning gas input port, and the vacuum shut-off valve and the airflow regulator are sequentially arranged between the cleaning gas input port and the upper end opening of the quartz hollow tube.

[0009] Preferably, a radio frequency connector is fixed to the upper end of the outer shell, and the radio frequency connector is connected to the inductive drive coil; the radio frequency connector is used to connect to the radio frequency power supply.

[0010] Preferably, at least one first cooling fan is fixedly provided in the outer shell at a position corresponding to the inductive drive coil; a second cooling fan is fixedly provided in the outer shell at a position corresponding to the vacuum shut-off valve; and a plurality of cooling holes are provided on the outer shell.

[0011] Preferably, the airflow regulator is a needle valve, and the outer shell is provided with a penetrating communication hole at a position corresponding to the adjustment handle of the needle valve.

[0012] Preferably, a communication interface is provided at the upper end of the outer shell; the control system includes a controller, the controller is communicatively connected to the communication interface, and the communication interface is communicatively connected to the vacuum shut-off valve, each of the first cooling fans and the second cooling fan.

[0013] Preferably, a vacuum gauge is provided in the vacuum chamber.

[0014] Preferably, a flange joint is provided at the lower end of the outer shell, and the flange joint is used to be connected to the communication port of the vacuum chamber.

[0015] Preferably, the outer shell includes an outer cylinder and an inner bracket located inside the outer cylinder; the inner bracket includes a top plate, a middle plate and a bottom plate arranged in sequence; there is a distance between the top plate and the middle plate, and between the middle plate and the bottom plate; the top plate and the middle plate, and between the middle plate and the bottom plate are fixedly connected by a plurality of connecting rods; the air flow regulator and the vacuum shut-off valve are fixedly arranged between the top plate and the middle plate; the quartz hollow tube is fixedly arranged between the middle plate and the bottom plate; a first through hole is opened on the middle plate, and a second through hole is opened on the bottom plate; the quartz hollow tube They are respectively fixedly arranged in the first through hole and the second through hole; the flange joint is provided at the lower end of the bottom plate; an upper sealing member is fixed on the middle plate; the upper sealing member has an upper mounting interface and a lower mounting interface; the upper mounting interface is communicated with the lower mounting interface; the upper mounting interface is communicated with the airflow regulator, and the lower mounting interface is communicated with the upper end opening of the quartz hollow tube; the bottom plate has an upper convex plate and a receiving ring plate; the outer diameter of the upper convex plate and the outer diameter of the top plate are the same as the inner diameter of the outer cylinder, and the outer diameter of the receiving ring plate is the same as the outer diameter of the outer cylinder; the cleaning gas inlet is arranged on the top plate.

[0016] Compared with the prior art, the present invention has achieved the following technical effects:

[0017] The radio frequency plasma cleaning device provided by the present invention centrally houses the airflow regulator, the quartz hollow tube and the inductive drive coil in the internal cavity of the outer shell to form a compact functional unit, thereby avoiding the independent installation space and connecting pipelines required for the dispersed arrangement of the various components and reducing the overall volume of the system; the inductive drive coil is sleeved on the outside of the quartz hollow tube and ionizes the cleaning gas in the tube by magnetic field coupling, which is a non-contact excitation, avoiding contamination or loss caused by direct contact between the coil and the plasma and extending the life of the components; the internal cavity of the outer shell integrates the various components, reducing the interference of the external environment on the core components, while reducing the risk of plasma energy leakage and improving operational safety; the gas The flow regulator precisely controls the cleaning gas flow rate, which can match the ionization characteristics of different gases, ensure the stability of the gas concentration in the tube, and provide uniform "raw materials" for the continuous generation of plasma; the connecting port of the vacuum chamber is directly connected to the lower end opening of the quartz hollow tube, so that the transmission path of the plasma from the generation area (quartz tube) to the action area (the sample surface in the vacuum chamber) is shortened; the energy density of the plasma can be controlled by adjusting the output power, realizing "one machine for multiple uses" and adapting to samples of different materials and different degrees of contamination; the gas can be selected according to the type of pollutant to expand the application scenarios of the device; the RF power supply provides matching RF energy to the inductive drive coil to ensure stable arc ignition and continuous operation of the plasma. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the following briefly introduces the drawings required for use in the embodiments. Obviously, the drawings described below are only some embodiments of the present invention. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying any creative work.

[0019] Figure 1 A schematic diagram of the overall structure of the radio frequency plasma cleaning device provided by the present invention;

[0020] Figure 2 This is a schematic diagram of the overall structure of the ignition system in the radio frequency plasma cleaning device provided by the present invention;

[0021] Figure 3 A schematic diagram of the internal structure of the ignition system in the radio frequency plasma cleaning device provided by the present invention;

[0022] Figure 4 A schematic diagram of the ionization and ignition of the cleaning gas in the quartz hollow tube in the radio frequency plasma cleaning device provided by the present invention;

[0023] Figure 5 This is a schematic diagram of the working procedure of the radio frequency plasma cleaning device provided by the present invention.

[0024] In the picture:

[0025] 10 - Starting system; 11 - Outer shell; 111 - Outer cylinder; 1111 - Heat dissipation hole; 1112 - Communication hole; 112 - Top plate; 1121 - Purge gas inlet; 1122 - Communication interface; 1123 - RF connector; 113 - Middle plate; 114 - Upper seal; 115 - Bottom plate; 1151 - Upper convex plate; 1152 - Receiver ring plate; 1153 - Flange connector; 12 - Vacuum shut-off valve; 13 - Needle valve; 14 - Quartz hollow tube; 15 - Inductor drive coil; 16 - First cooling fan; 17 - Second cooling fan;

[0026] 20-vacuum system; 21-dry pump; 22-exhaust pipe; 23-sealing flange; 24-vacuum chamber; 25-vacuum gauge; 26-stage;

[0027] 30-samples. DETAILED DESCRIPTION

[0028] The following will clearly and completely describe the technical solutions in the embodiments of the present invention in conjunction with the accompanying drawings. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without making creative efforts are within the scope of protection of the present invention.

[0029] The purpose of the present invention is to provide a radio frequency plasma cleaning device to solve the problems existing in the prior art and to achieve a device with small size, light weight, compact structure and low cost.

[0030] In order to make the above-mentioned objects, features and advantages of the present invention more obvious and easy to understand, the present invention is further described in detail below with reference to the accompanying drawings and specific embodiments.

[0031] Example 1

[0032] This embodiment provides a radio frequency plasma cleaning device, such as Figures 1 to 5 As shown, it includes a starting system 10, a vacuum system 20 and a control system; the starting system 10 includes an outer shell 11, an air flow regulator, a quartz hollow tube 14 and an inductive drive coil 15; the outer shell 11 has an internal cavity; the air flow regulator and the quartz hollow tube 14 are both arranged in the internal cavity; one end of the air flow regulator is used to introduce a cleaning gas (such as argon, oxygen, hydrogen, nitrogen, etc.), and the other end of the air flow regulator is connected to the upper end opening of the quartz hollow tube 14, and the air flow regulator can adjust the flow rate of the cleaning gas passing through the air flow regulator; the inductive drive coil 15 is sleeved on the outside of the quartz hollow tube 14, and the inductive drive The magnetic field generated by the coil 15 can ionize the cleaning gas in the quartz hollow tube 14 to form a plasma; the vacuum system 20 includes a vacuum chamber 24, a stage 26 and a vacuum pumping device; the stage 26 is fixedly arranged in the vacuum chamber 24, and the exhaust port of the vacuum pumping device is connected to the interior of the vacuum chamber 24; a connecting port is opened on the vacuum chamber 24 above the stage 26, and the connecting port is connected and communicated with the lower end opening of the quartz hollow tube 14; the control system includes a radio frequency power supply, which can provide radio frequency energy to the inductive drive coil 15; the power of the radio frequency power supply is adjustable, and the cleaning gas can be switched to different gases.

[0033] By centrally accommodating the airflow regulator, the quartz hollow tube 14 and the inductive drive coil 15 in the internal cavity of the outer shell 11, a compact functional unit is formed, which avoids the independent installation space and connecting pipes required for the scattered arrangement of each component, and reduces the overall volume of the system; the inductive drive coil 15 is sleeved on the outside of the quartz hollow tube 14, and the cleaning gas in the tube is ionized by magnetic field coupling, which is a non-contact excitation, avoiding contamination or loss caused by direct contact between the coil and the plasma, and extending the life of the components; the internal cavity of the outer shell 11 integrates the various components, reduces the interference of the external environment on the core components, and at the same time reduces the risk of plasma energy leakage, thereby improving operational safety; the airflow regulator precisely controls The cleaning gas flow rate can match the ionization characteristics of different gases, ensure the stability of the gas concentration in the tube, and provide uniform "raw materials" for the continuous generation of plasma; the connecting port of the vacuum chamber 24 is directly connected to the lower end opening of the quartz hollow tube 14, so that the transmission path of the plasma from the generation area (quartz tube) to the action area (the surface of the sample 30 in the vacuum chamber 24) is shortened; the energy density of the plasma can be controlled by adjusting the output power to achieve "one machine for multiple uses" and adapt to samples 30 of different materials and different degrees of pollution; the gas can be selected according to the type of pollutant to expand the application scenarios of the device; the RF power supply provides matching RF energy to the inductive drive coil 15 to ensure stable arc ignition and continuous operation of the plasma.

[0034] Specifically, the active particles (ions, electrons, free radicals, etc.) generated by ionized gas can be used to clean, activate and modify the material surface. Applied to semiconductors, new material batteries, medical and other fields, it can remove impurities such as grease, photoresist residues, dust, etc., improve material cleanliness, eliminate inorganic residues, remove metal oxides (such as hydrogen plasma reduction of metal surfaces) and micro-particle pollutants, and enhance the reliability of subsequent processes; at the same time, it can activate and modify the material surface and improve the material adhesion.

[0035] Specifically, the cleaning gas enters the quartz hollow tube 14 through the cleaning gas input port 1121, the vacuum shut-off valve 12 and the needle valve 13 in sequence, ignites discharge under the action of the magnetic field generated by the inductive drive coil 15 to form plasma, and then is input through the flange joint 1153 to the sample 30 placed on the stage 26 of the vacuum system 20 to complete the cleaning.

[0036] Among them, the relevant setting instructions for Qihui System 10:

[0037] Among the optional solutions of this embodiment, it is more preferred that Figures 1 to 3 As shown, the starting system 10 further includes a vacuum shut-off valve 12 ; the upper end of the outer shell 11 has a cleaning gas input port 1121 , and the vacuum shut-off valve 12 and the airflow regulator are sequentially arranged between the cleaning gas input port 1121 and the upper end opening of the quartz hollow tube 14 .

[0038] Among the optional solutions of this embodiment, it is more preferred that Figure 3 As shown, at least one first cooling fan 16 is fixedly provided in the outer shell 11 at the position corresponding to the inductive drive coil 15 ; a second cooling fan 17 is fixedly provided in the outer shell 11 at the position corresponding to the vacuum shut-off valve 12 ; and a plurality of cooling holes 1111 are opened on the outer shell 11 .

[0039] Specifically, the number of the first cooling fans 16 can be two, and both the first cooling fan 16 and the second cooling fan 17 can be 4010 cooling fans. By providing reasonable cooling holes 1111, the heating problem during the ionization process can be alleviated.

[0040] Among the optional solutions of this embodiment, the more preferred ones are 2 and Figure 3 As shown, a radio frequency connector 1123 is fixed to the upper end of the outer shell 11 , and the radio frequency connector 1123 is connected to the inductive drive coil 15 ; the radio frequency connector 1123 is used to connect to a radio frequency power supply.

[0041] Among the optional solutions of this embodiment, it is more preferred that Figure 2 and Figure 3 As shown, the air flow regulator is a needle valve 13 , and a penetrating communication hole 1112 is opened at the position of the adjustment handle of the needle valve 13 in the outer shell 11 .

[0042] Among the optional solutions of this embodiment, it is more preferred that Figure 2 and Figure 3 As shown, a communication interface 1122 is provided at the upper end of the outer shell 11; the control system includes a controller, which is communicatively connected to the communication interface 1122, and the communication interface 1122 is communicatively connected to the vacuum cut-off valve 12, each first cooling fan 16 and the second cooling fan 17.

[0043] Among the optional solutions of this embodiment, it is more preferred that Figures 1 to 3 As shown, a flange joint 1153 is provided at the lower end of the outer shell 11 , and the flange joint 1153 is used to connect with the communication port of the vacuum chamber 24 .

[0044] Among the optional solutions of this embodiment, it is more preferred that Figures 1 to 3As shown, the outer shell 11 includes an outer cylinder 111 and an inner bracket located inside the outer cylinder 111; the inner bracket includes a top plate 12, a middle plate 113 and a bottom plate 115 arranged in sequence; there is a gap between the top plate 12 and the middle plate 113, and between the middle plate 113 and the bottom plate 115; the top plate 12 and the middle plate 113, and between the middle plate 113 and the bottom plate 115 are fixedly connected by multiple connecting rods; the air flow regulator and the vacuum shut-off valve 12 are fixedly arranged between the top plate 12 and the middle plate 113; the quartz hollow tube 14 is fixedly arranged between the middle plate 113 and the bottom plate 115; a first through hole is formed on the middle plate 113, and a second through hole is formed on the bottom plate 115; the quartz hollow tube 14 is fixedly inserted into the first through hole and the second through hole respectively; the lower end of the bottom plate 115 has a flange joint 1153; An upper sealing member 114 is fixed on the middle plate 113; the upper sealing member 114 has an upper mounting interface and a lower mounting interface; the upper mounting interface is connected to the lower mounting interface; the upper mounting interface is connected to the airflow regulator, and the lower mounting interface is connected to the upper end opening of the quartz hollow tube 14; the bottom plate 115 has an upper convex plate 1151 and a receiving ring plate 1152; the outer diameter of the upper convex plate 1151 and the outer diameter of the top plate 12 are the same as the inner diameter of the outer cylinder 111, and the outer diameter of the receiving ring plate 1152 is the same as the outer diameter of the outer cylinder 111 (the outer cylinder 111 is mounted on the inner bracket from the side of the top plate 12 of the inner bracket, the bottom of the outer cylinder 111 is supported by the top surface of the receiving ring plate 1152, and the top side wall of the outer cylinder 111 is fixedly connected to the side wall of the top plate 12 by multiple connecting screws); the cleaning gas inlet 1121 is arranged on the top plate 12.

[0045] Specifically, the outer cylinder 111 is made of aluminum alloy, which is beautiful, easy to install, and can prevent the internal magnetic field from leaking and affecting the normal operation of external equipment; the heat dissipation holes 1111 set can increase the air flow inside the device, manage the heat generated by ionization, especially the temperature generated by electron excitation, thereby reducing the temperature of the device, increasing the plasma energy, and increasing the reliability of the device.

[0046] Specifically, when the inner diameter of the quartz hollow tube 14 is 20 mm, the wall thickness is 2.5 mm, and the inductance driving coil 15 has 9 turns, the arc starting is most stable. Based on this, the length of the quartz hollow tube 14 is determined to be 100 mm.

[0047] Specifically, the needle valve 13 cooperates with the vacuum cut-off valve 12 to lock the optimal air intake volume, simplifying operation, reducing costs, and avoiding the risk of vacuum chamber pressure fluctuation (>5%) caused by frequent adjustments.

[0048] Specifically, the starting system 10 integrates various components into one, and the overall vertical layout design is conducive to the flow of the incoming cleaning gas at various positions; the top plate 12 of the outer shell 11 is integrated with a cleaning gas input port 1121, a radio frequency connector 1123 and a communication connector; the overall structure is compact, solving the layout space, and a trumpet-shaped flange connector 1153 is reserved, which can be connected to the customized adapter flange of a scanning electron microscope, a mainstream Raman spectrometer, and an X-ray diffractometer.

[0049] Among them, the relevant setting instructions for the vacuum system 20 are as follows:

[0050] Among the optional solutions of this embodiment, it is more preferred that Figure 1 As shown, a vacuum gauge 25 is provided in the vacuum chamber 24 .

[0051] Specifically, the effective establishment and maintenance of the vacuum system 20 provides a vacuum environment for ignition ionization.

[0052] Specifically, the vacuum equipment includes a dry pump 21, an exhaust pipe 22 and a sealing flange 23; the suction port of the dry pump 21 is connected and communicated with one end of the exhaust pipe 22, a sealing flange 23 is provided on the vacuum chamber 24, and the other end of the exhaust pipe 22 is fixedly provided with a sealing flange 23.

[0053] Among them, the relevant settings of the control system are as follows:

[0054] In the optional solutions of this embodiment, it is more preferred that the fixed frequency of the RF power supply is 13.56 MHz.

[0055] Specifically, in order to achieve an organic combination of physical bombardment and chemical reaction during the cleaning process, a 13.56MHz radio frequency power supply is selected; this radio frequency power supply provides appropriate ion energy and concentration between direct current and microwaves, achieving a harmonious unity of physical and chemical cleaning effects.

[0056] Specifically, a dedicated RF power supply is customized and developed based on the coil impedance characteristics of the starting system 10, abandoning the traditional general-purpose power supply to reduce costs. The core requirements are stable arc starting capability and accurate and reliable power output.

[0057] Specifically, the control system also includes a controller (the controller includes but is not limited to a communication connection with the inductive drive coil 15, and all electrically controlled components can be controlled by the controller, such as the dry pump 21, etc.). The inherent impedance of the inductive drive coil 15 (determined by the number of turns, material, and geometric dimensions) and the output impedance of the power supply are basically matched during the design phase to ensure the initial impedance consistency under standard operating conditions (such as rated power and conventional gas types) and reduce energy reflection; and the controller has a built-in voltage and current detection module, which can collect the voltage and current signals in the RF transmission line in real time, and obtain the actual impedance of the current coil (including the dynamic impedance after the plasma load) by calculation to provide data basis for automatic matching; the control system is also provided with a touch screen, which is communicated with the controller; if the arc cannot be started or the plasma is unstable, the following operations can be performed: click the matching icon on the touch screen to enter the matching setting page> click the "Auto Adjust" button> wait for the matching process to be completed> click the "Auto Save" button to save the matching parameters; the power supply will work according to the new matching parameters. Through "hardware pre-matching + software dynamic adjustment", efficient transmission of RF energy from the power supply to the coil (including plasma load) is achieved, avoiding energy waste, plasma instability or equipment damage caused by impedance imbalance, and ultimately ensuring the consistency and stability of the cleaning effect.

[0058] Specifically, the controller may be integrated with an adaptive PID algorithm, which can adaptively adjust the flow rate and radio frequency power of the cleaning gas to increase the plasma density and energy.

[0059] Specifically, the controller of the control system mainly controls the output power of the RF power supply, the ignition time and the gas path switch (i.e., the gas path through which the cleaning gas enters) to ensure the controllability and accuracy of the cleaning.

[0060] Among them, regarding other related instructions:

[0061] Specifically, the RF plasma cleaning device of this embodiment can achieve RF power matching output of 0-300W of the RF power supply; and the cleaning gas flow rate can be injected at 0-200ml / min, providing different cleaning process possibilities for different materials. It has strong applicability and can be used for cleaning materials observed under different microscopes (lens, electron microscope, light microscope).

[0062] Specifically, such as Figure 5 As shown, the steps for use are as follows:

[0063] Step 1: Remove the blind plate on the electron microscope chamber (or other vacuum equipment) and install the customized transition flange on the electron microscope chamber;

[0064] Step 2: Use kf25 clamp and sealing ring to connect the starting system 10 (i.e. Figure 5The flange connector 1153 of the plasma cleaning instrument is connected to the transition flange, and the electrical cables such as the radio frequency line, control line, and communication line are connected (i.e., the radio frequency connector 1123, the communication interface 1122, etc.);

[0065] Step 3: Start the dry pump 21 to pump air from the vacuum chamber 24 to a certain vacuum degree below 100 Pa;

[0066] Step 4: Open the working gas inlet valve (i.e., the control valve on the cleaning gas supply device and the cleaning gas input port 1121), set the gas flow rate for ionization ignition, and ensure that the pressure difference is below 50Pa;

[0067] Step 5: Set the RF power and turn on the RF switch (i.e., the RF power switch). The cleaning gas introduced is ionized and ignited in the quartz hollow tube 14, generating high-energy plasma to undergo physical and chemical reactions such as activation, thereby stripping the contaminants (hydrocarbons) from the workpiece sample 30 to achieve the purpose of cleaning.

[0068] The present invention uses specific examples to illustrate the principles and implementation methods of the present invention. The above examples are only intended to help understand the method and core concept of the present invention. At the same time, those skilled in the art will find that the specific implementation methods and application scopes may vary based on the concept of the present invention. In summary, the contents of this specification should not be construed as limiting the present invention.

Claims

1. A radio frequency plasma cleaning device, characterized in that: Including starting system, vacuum system and control system; The ignition system includes an outer shell, an air flow regulator, a quartz hollow tube, and an inductive drive coil; the outer shell has an internal cavity; the air flow regulator and the quartz hollow tube are both disposed within the internal cavity; one end of the air flow regulator is used to introduce a cleaning gas, and the other end of the air flow regulator is connected to an upper end opening of the quartz hollow tube, and the air flow regulator is capable of adjusting the flow rate of the cleaning gas passing through the air flow regulator; the inductive drive coil is sleeved outside the quartz hollow tube, and the magnetic field generated by the inductive drive coil is capable of ionizing the cleaning gas in the quartz hollow tube to form a plasma; The vacuum system includes a vacuum chamber, a stage, and a vacuum pumping device; the stage is fixedly disposed in the vacuum chamber, and the vacuum pumping device has an air extraction port that communicates with the interior of the vacuum chamber; a communication port is provided on the vacuum chamber above the stage, and the communication port is connected to and communicates with the lower end opening of the hollow quartz tube; The control system includes a radio frequency power supply, which can provide radio frequency energy to the inductive drive coil; the power of the radio frequency power supply is adjustable, and the cleaning gas can be switched to different gases.

2. The radio frequency plasma cleaning device according to claim 1, characterized in that: The fixed frequency of the radio frequency power supply is 13.56 MHz.

3. The radio frequency plasma cleaning device according to claim 1, characterized in that: The starting system also includes a vacuum shut-off valve; The upper end of the outer shell is provided with a cleaning gas input port, and the vacuum cut-off valve and the airflow regulator are sequentially arranged between the cleaning gas input port and the upper end opening of the quartz hollow tube.

4. The radio frequency plasma cleaning device according to claim 1, characterized in that: A radio frequency connector is fixed to the upper end of the outer shell, and the radio frequency connector is connected to the inductive drive coil; the radio frequency connector is used to connect to the radio frequency power supply.

5. The radio frequency plasma cleaning device according to claim 3, characterized in that: At least one first cooling fan is fixedly provided in the outer shell at a position corresponding to the inductive drive coil; a second cooling fan is fixedly provided in the outer shell at a position corresponding to the vacuum cut-off valve; and a plurality of cooling holes are provided on the outer shell.

6. The radio frequency plasma cleaning device according to claim 1, characterized in that: The airflow regulator is a needle valve, and the outer shell is provided with a penetrating communication hole at a position corresponding to the adjustment handle of the needle valve.

7. The radio frequency plasma cleaning device according to claim 5, characterized in that: A communication interface is provided at the upper end of the outer shell; The control system includes a controller, the controller is communicatively connected to the communication interface, and the communication interface is communicatively connected to the vacuum cut-off valve, each of the first cooling fans, and the second cooling fan.

8. The radio frequency plasma cleaning device according to claim 1, characterized in that: A vacuum gauge is provided in the vacuum chamber.

9. The radio frequency plasma cleaning device according to claim 3, characterized in that: A flange joint is provided at the lower end of the outer shell, and the flange joint is used to be connected to the communication port of the vacuum chamber.

10. The radio frequency plasma cleaning device according to claim 9, characterized in that: The outer shell includes an outer cylinder and an inner bracket located inside the outer cylinder; The inner bracket includes a top plate, a middle plate, and a bottom plate arranged in sequence; there is a gap between the top plate and the middle plate, and between the middle plate and the bottom plate; the top plate and the middle plate, and between the middle plate and the bottom plate, are fixedly connected by a plurality of connecting rods; the air flow regulator and the vacuum shut-off valve are fixedly arranged between the top plate and the middle plate; the quartz hollow tube is fixedly arranged between the middle plate and the bottom plate; The middle plate is provided with a first through hole, and the bottom plate is provided with a second through hole; the hollow quartz tubes are fixedly inserted into the first through hole and the second through hole respectively; the lower end of the bottom plate is provided with the flange joint; An upper sealing member is fixed to the middle plate; the upper sealing member has an upper mounting interface and a lower mounting interface; the upper mounting interface is in communication with the lower mounting interface; the upper mounting interface is in communication with the airflow regulator, and the lower mounting interface is in communication with the upper end opening of the quartz hollow tube; The bottom plate has an upper convex plate and a receiving ring plate; the outer diameter of the upper convex plate and the outer diameter of the top plate are both the same as the inner diameter of the outer cylinder, and the outer diameter of the receiving ring plate is the same as the outer diameter of the outer cylinder; The cleaning gas input port is arranged on the top plate.

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