Control method for inhibiting cable conduction radiation by carbon dioxide laser

Abstract

The invention relates to the technical field of electromagnetic compatibility, and discloses a control method for suppressing cable conducted radiation by carbon dioxide laser, which is used for solving the problems of discontinuous shielding and high transfer impedance of a cable-connector transition area. A circle of 360-degree continuous conductive skin is formed in situ in a cable-connector transition area, a radial micro through hole array is arranged in the area, and a 360-degree grading ring at the connector end is combined for primary press fitting, so that a stable circumferential fracture-free closed path is formed among a cable shielding layer, the conductive skin, the grading ring and a shell. The structure geometrically eliminates discontinuity caused by shielding gaps and single-point lap joint in a transition area, and meanwhile, uneven contact and batch difference caused by traditional turning, welding or local crimping are avoided in a multi-point parallel connection and integral press fitting mode. On the basis, the structure can realize stable electromagnetic compatibility under the condition of batch assembly, and is suitable for a high-frequency system sensitive to interference and a complex working condition environment.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of electromagnetic compatibility, in particular to a carbon dioxide laser suppression cable conducted radiation control method. BACKGROUND

[0002] With the wide application of high-power lasers, radars and high-speed communication equipment, cables are easy to become the propagation channel of electromagnetic interference when transmitting energy and signals between systems. In order to reduce electromagnetic interference, the prior art generally provides a metal braided shielding layer on the outer layer of the cable, and uses a grounding lead, a shielding sleeve or a ferrite magnetic ring at the cable end. However, these methods have the following disadvantages:

[0003] The transition area between the cable shielding layer and the connector shell often relies on single-point lap joint or lead connection, which is discontinuous in the circumferential direction, resulting in leakage of high-frequency common-mode current at this point, forming a transfer impedance concentration point, and the suppression performance is unstable. Although some documents have proposed to improve the shielding continuity by using a 360° termination structure, this structure still relies on manual folding and crimping during assembly, which is greatly affected by the consistency of the process, and the contact resistance and ground inductance differ significantly between batches, making it difficult to ensure the repeatability of the mass production process. Traditional ferrite magnetic rings, common-mode choke coils and other components are mostly post-mounted concentrator devices, which have limited frequency band coverage and are easy to damage the flexibility of the cable, so they are not suitable for wideband suppression in complex working conditions. Although the wave-absorbing material coating method can provide certain loss, it is difficult to maintain stable attenuation characteristics in the range of 30MHz-1GHz due to the uniformity of the thickness and material distribution.

[0004] In summary, the prior art generally has the problems of shielding discontinuity in the transition area, high transfer impedance, poor structural consistency and insufficient suppression frequency band. SUMMARY

[0005] (I) Technical problems solved

[0006] In view of the deficiencies of the prior art, the present application provides a carbon dioxide laser suppression cable conducted radiation control method, which has the advantages of realizing continuous, low-inductance and batch-consistent shielding path in the cable-connector transition area, and providing wideband stable interference suppression through a distributed loss structure, and solves the problems mentioned in the background art.

[0007] (II) Technical solutions

[0008] To achieve the above-mentioned purpose, the present application provides the following technical solutions: a carbon dioxide laser suppression cable conducted radiation control method, comprising:

[0009] S1, pretreatment and reference positioning, defining the cable-connector transition area, cleaning and establishing the axial and circumferential reference, reserving the shell crimping table;

[0010] S2, conductive skin forming, forming a conductive skin around the outer surface of the transition zone 360° integrally, overlapping with the cable shield end, and reserving an equipotential flange;

[0011] S3, micro-hole parallel conduction, arranging a radial micro-hole array at the conductive skin, penetrating to the shielding and shell contact area and conductive filling, and circumferential misplacement;

[0012] S4, loss grid and insulation dot array, patterning a micro-grid on the outside of the conductive skin, arranging a gradient along the axial direction, and embedding an insulation dot array in the grid; circumferential overlapping is closed in a shingle type to avoid the flange and the hole opening;

[0013] S5, forming continuous closure by one-time pressing, micro-texturing the inner wall of the shell, assembling a 360° equalizing ring, and one-time pressing according to the limiting geometry to make the shielding-skin-equalizing ring-shell circumferential closed without discontinuity;

[0014] S6, outer covering and consistency check, applying a thin covering layer on the outer layer, reserving a test window, and completing the circumferential continuity and assembly position check and traceability identification.

[0015] Further, S1 includes:

[0016] Marking the axial range and circumferential reference line of the transition zone between the connector shell end face and the cable sheath, and setting the end face zero position mark;

[0017] Dust removal, degreasing and drying are performed on the outer surface of the transition zone; if necessary, remove the outermost sheath thin layer to form a patternable substrate;

[0018] Forming an axial reference line and a circumferential alignment point on the outer surface of the cable, and establishing a registration relationship with the end face of the shell;

[0019] Setting an annular crimping platform and a limiting shoulder near the end of the connector shell, and forming a fixed relative position with the transition zone reference.

[0020] Further, S2 includes:

[0021] Forming a conductive skin layer around the outer surface of the transition zone circumferentially and continuously, forming a closed annular covering;

[0022] The conductive skin and the cable shield end form an overlapping lap joint area, and the lap joint boundary is circumferentially closed;

[0023] Reserving an equipotential flange area on the conductive skin near the shell end, aligning the flange boundary with the S1 reference, and maintaining the relative position relationship with the subsequent crimping platform;

[0024] The conductive skin is provided with a transition closing strip away from the shell side, and a predetermined lap joint relationship is formed with the boundary of the subsequent grid layer.

[0025] Further, S3 includes:

[0026] A plurality of micro-holes are arranged radially on the conductive skin, and the holes pass through the cable shielding layer structure and the connector housing contact area;

[0027] The inside of the through hole is filled with conductive material to form a conductive path from the conductive skin to the shielding layer and then to the housing contact area;

[0028] Each through hole is arranged in a staggered manner in the circumferential direction and distributed in multiple circles, and the through hole opening avoids the conductive flange area and the subsequent pattern boundary.

[0029] Further, S4 includes:

[0030] A micro-grid layer is formed on the outside of the conductive skin in a predetermined pattern, and the grid cells are arranged in a set order in the axial direction;

[0031] The grid is arranged in a gradient in the axial direction according to the set pattern parameters to form different area density distributions;

[0032] An insulating dot matrix is embedded in the grid layer, and the dot matrix is distributed in an array and maintains a fixed relative position with the grid cell boundary;

[0033] The grid layer is closed in a shingle lap manner in the circumferential direction, and the lap joint avoids the micro-hole opening and the equipotential flange;

[0034] A blank ring is provided between the edge of the grid layer close to the housing and the equipotential flange, and the blank ring does not cover the micro-hole protrusion.

[0035] Further, S5 includes:

[0036] The crimping table of the inner wall of the housing is micro-textured, and the texture area covers the contact range of the equalizing ring;

[0037] A 360° equalizing ring is placed at the crimping table position of the housing and coaxially positioned with the equipotential flange;

[0038] The equalizing ring is subjected to a one-time press-fitting action in the axial direction, and the press-fitting stroke is limited by the geometric constraint, and the coaxial fastening of the housing, the equalizing ring, the conductive skin and the shielding layer is completed;

[0039] After the press-fitting is completed, the housing end, the equalizing ring, the equipotential flange and the shielding lap joint area form a continuous closed contact interface in the circumferential direction.

[0040] Further, S6 includes:

[0041] A thin cover layer is covered on the outermost layer of the transition area, and the coverage range includes the exposed area of the conductive skin, the grid layer and the shingle lap joint;

[0042] Test windows and conductive contacts are reserved at predetermined positions, and the window boundary is aligned with the reference mark;

[0043] Geometrically check and record the press-fitting position, circumferential closed state, boundary cutting band and lap joint position;

[0044] Form a traceable mark in the visible area of the outer cover, and the content of the mark is in one-to-one correspondence with the reference.

[0045] Compared with the prior art, the present application provides a carbon dioxide laser suppression cable conducted radiation control method, which has the following beneficial effects:

[0046] 1. By forming a 360° continuous conductive skin in situ in the cable-connector transition area, and arranging a radial micro-hole array in the area, and then combining the 360° equalizing ring at the connector end for one-time press-fitting, a stable circumferential closed path is formed between the cable shielding layer, the conductive skin, the equalizing ring and the shell. This structure geometrically eliminates the discontinuity caused by the shielding gap and single-point lap joint in the transition area, and the multi-point parallel conduction and overall press-fitting method avoids the uneven contact and batch differences caused by traditional reweaving, welding or local press-fitting. On this basis, the structure can realize stable electromagnetic compatibility performance under batch assembly conditions, and is suitable for high-frequency systems sensitive to interference and complex working conditions.

[0047] 2. By arranging a gradient loss grid outside the conductive skin and embedding an insulating dot array, a distributed damping network is formed in the transition area, which can dissipate common-mode interference current in a wide frequency band, avoiding the defects of narrow frequency band and high assembly randomness of concentrated elements such as ferrite and wave-absorbing sleeve, while maintaining the flexibility of the cable and the overall environmental adaptability. BRIEF DESCRIPTION OF DRAWINGS

[0048] Figure 1 It is a flowchart of the carbon dioxide laser suppression cable conducted radiation control method of the present application. DETAILED DESCRIPTION

[0049] The technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the drawings in the embodiments of the present application. Obviously, the described embodiments are only part of the embodiments of the present application, not all. Based on the embodiments in the present application, all other embodiments obtained by those skilled in the art without creative labor are within the scope of protection of the present application.

[0050] Embodiment 1: Figure 1 A carbon dioxide laser suppression cable conducted radiation control method is given, which comprises:

[0051] S1, pretreatment and reference positioning, defining the cable-connector transition area, cleaning and establishing axial and circumferential reference, reserving the shell press-fitting platform;

[0052] S2, conductive skin forming, conductive skin is formed integrally on the outer surface of the transition zone 360°, which overlaps with the shielding end of the cable and keeps the equipotential flange;

[0053] S3, micro-hole parallel conduction, radial micro-hole array is arranged at the conductive skin, which penetrates to the shielding and the housing contact area and is filled with conductive material, and the circumferential position is staggered;

[0054] S4, loss grid and insulation dot array, micro-grid is patterned on the outside of the conductive skin, which is arranged in a gradient along the axial direction, and the grid is embedded with an insulation dot array; the circumferential position is closed in a shingle type, avoiding the flange and the hole;

[0055] S5, continuous closure formed by one-time pressing, the inner wall of the shell is micro-textured, the 360° equalizing ring is assembled, and the shielding-skin-equalizing ring-housing is closed without discontinuity in the circumferential direction by one-time pressing according to the limiting geometry;

[0056] S6, outer covering and consistency check, a thin covering layer is applied to the outer layer, a test window is reserved, and the circumferential continuity and assembly position are checked and traced.

[0057] S1, pretreatment and reference positioning, define the cable-connector transition zone, clean and establish the axial and circumferential reference, reserve the shell crimping platform, and the specific implementation is as follows:

[0058] Mark the axial range and circumferential reference line of the transition zone between the connector shell end face and the cable sheath, and set the end face zero mark. The connector shell is clamped on the tool with end face positioning reference, and the shell end face is used as zero reference. The cable to be processed is laid in the V-shaped or circular arc groove tool according to the natural bending radius, and is limited by a soft clamp to avoid leaving marks on the sheath. Starting from the shell end face zero, mark the axial range of the transition zone on the sheath surface along the cable axis with a steel stylus, solvent-resistant ink or low-power laser, forming two closed loop annular lines at the start and end; at the same time, mark the circumferential reference line on the outer circle of the cable with a fine line or laser single point, and preferably align it with the key position, flat position or positioning hole on the shell. The end face zero mark is formed on the shell end face by punch or laser etching, and the corresponding alignment line is set on the tool for subsequent repeated clamping and registration. After marking, the mark position is recorded by photography or code reading, and the relative angle between the shell zero and the cable reference line is recorded in the batch transfer card.

[0059] The outer surface of the transition zone is dusted, degreased and dried; if necessary, the outermost sheath layer is removed to form a patternable substrate. The outer surface of the transition zone is subjected to surface cleaning treatment: first, dust removal is performed with a dust-free cloth in combination with clean gas; then, degreasing is performed using isopropyl alcohol or cyclohexanone solvent, and the cleaning surface is replaced by unidirectional wiping until the cloth surface is not obviously colored; then, drying is performed at room temperature with clean gas or hot air at 40-60°C, and the time is determined according to the absence of visible wet marks on the surface. If the sheath has a printed ink layer or an anti-staining coating layer, the surface layer is first removed by plasma decontamination or low-power laser light sweeping to obtain a uniform roughness surface; when subsequent patterning is required on the sheath material, the outermost sheath layer is selectively removed: a mechanical cutting tool is used in combination with a ring-shaped depth limiting ring to perform circumferential rotary cutting along the axial range of the transition zone, and the cutting depth does not touch the shielding braid; or a scanning laser is used to remove the outermost sheath layer, leaving a 1-2mm safety transition zone outside the start and end boundaries. The surface after removal is checked with a magnifying glass or a microscope to see if there are burrs, scratches and residual flakes, and if necessary, a 1000-mesh or higher abrasive belt is used for light polishing to form a patternable substrate. After completion, the surface is again wiped quickly with solvent and dried to ensure surface cleanliness.

[0060] An axial reference line and a circumferential alignment point are formed on the outer surface of the cable, and a registration relationship is established with the end face of the shell. Alignment elements are established on the patternable substrate: an axial reference line is continuously marked along the length direction of the cable by a pull line or a laser, and the axial reference line penetrates the entire length of the transition zone; circumferential alignment points are arranged on the outer circumference of the cable at equal angular intervals (such as quarter or six equal parts), and each alignment point is indicated by a dash or a dot, and together with the shell end face zero, a set of registration points is formed. The cable and the shell are clamped together in the registration tool, the axial reference line is aligned with the longitudinal scale line of the tool, and the alignment points are aligned with the angle scale on the tool to complete the registration relationship between the cable and the shell. After alignment, a protective boundary is formed outside the start and end boundaries of the transition zone with low-tack masking tape (such as polyimide tape) to prevent solvent or dust from entering the

[0061] An annular crimping platform and a limiting shoulder are arranged near the connector housing end to form a fixed relative position with the transition zone reference. An annular crimping platform and a limiting shoulder are arranged near the connector housing end. For machinable housings, a circular annular step is machined on the inner wall of the housing as a crimping platform by turning or milling, and a limiting shoulder with a height difference of 0.2-0.5mm is formed on the inner side or outer side; the crimping platform surface can be micro-textured (blasting, fine knurling or chemical etching) to improve the fitting stability. For non-machinable or thin-walled housings, a metal or engineering plastic annular insert with matching inner diameter is selected as an assembly type crimping platform: first, the outer circle of the insert is micro-textured, then it is fixed to the specified position of the inner wall of the housing with interference or adhesion, and anti-rotation connection with the housing is established through positioning pin holes or anti-rotation keys. After installation, the fixed relative position of the crimping platform and the limiting shoulder relative to the transition zone reference, including coaxiality, step position and end face distance, is detected by gauge or three-coordinate, and the detection results are recorded. If necessary, a press-fitting stop mark is formed on the outer surface of the housing to identify the end point of the subsequent press-fitting equipment.

[0062] After the completion of each of the above steps, the transition zone mark, the base state, the registration element and the crimping platform / limiting shoulder are reviewed once: check if the annular mark is closed, if the circumferential reference line is consistent with the housing zero position, if the axial reference line is through and not blocked, if the graphical base is continuous, and if the crimping platform and the limiting shoulder are free of burrs and oil. The review results are recorded in the process record together with the tool number, operator, time stamp and batch number, and a removable transparent protective film is attached to the non-working side of the cable to protect the mark and reference until the subsequent conductive layer forming process. The above implementation ensures that the subsequent graphical and assembly steps can be repeatedly performed under a unified reference by specifying the tool, material, decontamination and film removal method, marking and registration means, and the setting process of the crimping platform / limiting shoulder.

[0063] S2, conductive skin forming, forming a conductive skin on the outer surface of the transition zone 360°, overlapping with the cable shielding end, retaining an equipotential flange, specifically implemented as:

[0064] A continuous conductive skin layer is formed around the outer surface of the transition zone in the circumferential direction to form a closed annular cover. After the completion of the cleaning, reference marking and the setting of the crimping station / limiting shoulder of the transition zone in S1, the cable and the connector housing are clamped in the coaxial positioning fixture, so that the housing end face zero is aligned with the cable axial reference line and the circumferential reference line. According to the circumferential reference line, an annular shielding band is arranged on the outer surface of the transition zone to define the outer and inner edge boundaries of the conductive skin. Any of the processes of laser patterning, selective metallization or conductive coating is used to continuously line on the outer surface of the cable in the circumferential direction to complete a closed annular cover from the outer edge to the inner edge; for the possible circumferential start and end seams, a lap allowance is preset in the end area to form overlapping closure of the first and last two sections, so as to avoid forming a straight-through seam. If the conductive coating scheme is used, the primer can be sprayed first to improve adhesion, and then the mask or template is used to limit the coating pattern; if the laser-induced scheme is used, a low-energy pre-scan can be performed first to stabilize the surface state, and then the target energy line is formed; if the selective chemical / electroplating scheme is used, the deposition can be carried out in the predetermined area after the pre-treatment activation. After the process is completed, the shielding band is removed, and the circumferentially closed conductive skin ring is retained.

[0065] The conductive skin and the cable shielding end form an overlapping lap area, and the lap boundary is closed in the circumferential direction. At the end of the conductive skin close to the cable, the cable shielding braid is turned up or turned out to the surface of the conductive skin in the predetermined lap area in the axial direction, so that the conductive skin and the shielding layer form a circumferential overlap. The overlap boundary is arranged continuously in the circumferential direction without setting a breakpoint; to ensure the regularity of the overlap area boundary, the lap boundary can be marked on the surface of the conductive skin with a shallow line or dot mark first, and then the turning up and pressing are performed. The edges after overlapping are fixed by using an annular pressing band, a dot type fixing clamp or a local solidified glue, and the fixing members are arranged at equal intervals in the circumferential direction to avoid forming local buckling. If the solder or conductive glue connection method is used, a slight roughening or activation treatment is first performed on the lap surface, and then the connection material is applied and solidified, and the connection material does not exceed the boundary to the subsequent flange and closing band area.

[0066] A potential flange area is reserved on the conductive skin close to the housing end, and the flange boundary is aligned with the S1 reference to maintain the relative position relationship with the subsequent crimping station. A potential flange area is reserved on the conductive skin close to the connector housing end to cooperate with the subsequent crimping station. This area is formed by shielding before the conductive skin is formed or by removing after the conductive skin is formed, and it is kept circumferentially continuous and fixed relative position with the end face zero and the limiting shoulder established in S1. The axial width and circumferential continuity of the potential flange are ensured by a special annular mask or a coaxial rotary tool in the process; to avoid interference with the surrounding structure during the subsequent pressure ring pressing, the flange boundary is finished with a straight edge or a micro-chamfered line, and visible alignment marks are set at the corresponding positions of the circumferential reference line for positioning during pressing. After completion, the flange perimeter is cleaned to ensure that there is no residual coating, no burrs and no particles.

[0067] The transition closing tape is arranged on the side of the conductive skin away from the shell, and forms a predetermined lap joint relationship with the boundary of the subsequent grid layer. The transition closing tape is arranged between the outer edge of the conductive skin and the predetermined boundary of the subsequent loss grid layer, and is arranged in a strip shape along the axial direction and is closed in the circumferential direction. The tape can be formed by: ① reserving a circle of patterned transition tape when the conductive skin is formed; or ② establishing a predetermined lap joint relationship with the boundary of the subsequent grid layer by secondary patterning / secondary coating after forming. In order to ensure the consistency of the boundary of the grid layer, the outer edge of the closing tape is limited by an annular mask or a rotary indexing chuck, and alignment points are arranged at every certain angle position in the circumferential direction, for the grid layer process to be aligned in the axial direction and the circumferential direction. The inner edge of the closing tape and the main body of the conductive skin are transitioned with a continuous curve, without sharp corners; the outer edge and the boundary of the subsequent grid layer are marked with consistent reference numbers in the drawing, so that the tiles are spliced in the order according to the established order when the lap joint is closed in S4.

[0068] After the above four processes are completed, the circumferential closure state, the integrity of the lap joint area, the relative position of the flange and the pressing table, and the corresponding relationship between the closing tape and the grid layer boundary are reviewed according to the process file. The review is completed by visual inspection, magnifying glass inspection and reference ruler alignment; the alignment information that needs to be maintained for a long time is fixed on the visible surface of the cable and the shell with solvent-resistant marks or transparent film. After the review is correct, it is handed over to S3 to open the micro via array and conductive filling.

[0069] S3, micro via parallel conduction, arranging a radial micro via array on the conductive skin, penetrating to the shielding and shell contact area and conductive filling, circumferentially staggered, and specifically implemented as:

[0070] A plurality of micro vias are arranged radially on the conductive skin, and the holes penetrate to the cable shielding layer structure and the connector shell contact area. After the conductive skin is formed and the transition zone reference is established, a micro via arrangement band is determined in the annular area between the conductive skin and the connector shell. According to the axial reference line and the circumferential reference line, a plurality of via positioning lines are marked in the arrangement band, and an avoidance area is arranged between the positioning line and the subsequent patterned boundary; a non-hole ring corresponding to the conductive flange is left on the side close to the connector end, so as to distinguish the pressing contact area and the via area. According to the actual width of the shell contact area and the braid angle of the shielding braid, the stagger rule in the circumferential direction is selected, and the starting point, the end point and the mutual dislocation relationship of each circle of vias are determined.

[0071] The radial holes are formed in the conductive skin by laser drilling or micro-drilling. A detachable support rod or depth-limiting bushing is arranged in the cable before drilling to support the sheath and limit the drilling or ablation depth, avoiding affecting the inner layer material. The outer circle of the conductive skin is used as the entrance during drilling, and the sheath is penetrated along the radial direction to the shielding braid layer, and then extended to the pre-set grounding area of the connector shell or its matching grounding insert, so that the hole communicates with the shielding layer and the grounding area in the radial direction. The entrance and exit edges of each hole are chamfered or slightly deburred to ensure that the hole shape is compatible with the subsequent filling.

[0072] After the hole is formed, the hole is cleaned and the surface is pretreated. First, the hole is blown with inert gas or clean air to remove dust and debris, and then ultrasonic cleaning or plasma activation is used to clean and activate the hole wall and the exposed metal surface of the shielding braid. If necessary, a primer or adhesion-promoting layer is applied to the hole wall to improve the bonding between the filling material and the sheath material, the conductive skin, and the braided metal wires. For the hole outlet that penetrates the shell grounding area, a shielding sheet or peelable shielding adhesive is used to temporarily cover the shell end opening to prevent subsequent filling from overflowing and contaminating the crimping station.

[0073] The radial holes are formed in the conductive skin by laser drilling or micro-drilling. A detachable support rod or depth-limiting bushing is arranged in the cable before drilling to support the sheath and limit the drilling or ablation depth, avoiding affecting the inner layer material. The outer circle of the conductive skin is used as the entrance during drilling, and the sheath is penetrated along the radial direction to the shielding braid layer, and then extended to the pre-set grounding area of the connector shell or its matching grounding insert, so that the hole communicates with the shielding layer and the grounding area in the radial direction. The entrance and exit edges of each hole are chamfered or slightly deburred to ensure that the hole shape is compatible with the subsequent filling.

[0074] The radial holes are formed in the conductive skin by laser drilling or micro-drilling. A detachable support rod or depth-limiting bushing is arranged in the cable before drilling to support the sheath and limit the drilling or ablation depth, avoiding affecting the inner layer material. The outer circle of the conductive skin is used as the entrance during drilling, and the sheath is penetrated along the radial direction to the shielding braid layer, and then extended to the pre-set grounding area of the connector shell or its matching grounding insert, so that the hole communicates with the shielding layer and the grounding area in the radial direction. The entrance and exit edges of each hole are chamfered or slightly deburred to ensure that the hole shape is compatible with the subsequent filling.

[0075] To coordinate with subsequent patterning processes, after the through-holes are arranged and filled, a temporary masking film or photoresist is applied to the hole opening area, covering the outer edge of the single hole to the safety buffer zone. The conductive skin is then lightly polished or plasma cleaned as necessary to align the through-hole opening with the surrounding conductive skin, ensuring proper alignment and alignment of the outer pattern. The masking film is peeled off after the outer patterning and shingling closure are complete, exposing the conductive surface of the hole opening for subsequent press-fitting and contacting.

[0076] The through-hole exits extending into the shell grounding area are pre-aligned with the shell grounding area, and the two are coaxially aligned using an assembly fixture. Before the press-fit process begins, each circle of through-holes is individually inspected for filling integrity, hole flatness, and channel cleanliness. The starting and ending positions and offset relationships of each circle of through-holes are recorded with identifiers on the cable's outer surface, creating a traceable layout profile. Upon completion of these steps, the geometric and physical connections between the radial microvia array and the conductive skin, shielding layer, and shell grounding area are confirmed, allowing for direct entry into the subsequent shingle splicing, grading ring press-fit, and outer sheath encapsulation processes.

[0077] S4, lossy grid and insulating lattice: A patterned micro-grid is formed on the outside of the conductive skin, arranged in a gradient along the axial direction, with an insulating lattice embedded in the grid; the circumferential direction adopts an imbrication-type overlap closure to avoid flanges and through-hole openings. The specific implementation is as follows:

[0078] A micro-grid layer is formed on the outside of the conductive skin according to a predetermined pattern, and the grid units are arranged in a set order along the axial direction.

[0079] An axial / circumferential coordinate system consistent with the previous reference was established on the conductive skin surface. The mesh layer was divided into several axial sub-regions based on the axial length of the transition zone. The geometric type and arrangement of the mesh cells were preset in each sub-region, and the closed boundary and overlap locations were marked in the circumferential direction. Avoidance zones were marked for the micro-via openings and equipotential flanges within the same coordinate system, forming a hierarchical relationship diagram of "mesh effective domain - avoidance domain - closed zone."

[0080] The conductive skin is patterned according to a predetermined pattern. The grid cells can be honeycomb, square, diamond, or space-filling curve cells. Processing methods include laser engraving, selective coating / development, or screen / inkjet printing. The processing path follows an axial priority and circumferential follow-up trajectory, with cells laid out in each sub-area in a predetermined order from the connector end toward the cable side. The cells maintain the specified row and column alignment and boundary gaps. Alignment is based on the axial reference line and circumferential alignment points to ensure geometric consistency between the grid and the transition zone.

[0081] The grid is arranged in a gradient pattern in the axial direction according to the set pattern parameters, forming different regional density distributions. In each axial sub-zone, the grid pattern parameters (such as cell size, cell spacing, or line width / opening ratio) are changed according to the predetermined gradient scheme, so that the grid density changes in a certain order along the axial direction. The gradient change is stepped in sub-zones, and the sub-zones are connected by transition zones. The cells in the transition zones use interpolation patterns to achieve smooth connection, avoiding axial discontinuity or abrupt boundaries. After the gradient processing is completed, an identifiable partition sequence is formed in the axial direction, and the previously marked closed bands and avoidance bands are kept non-intersecting.

[0082] The insulating lattice is embedded in the grid layer, and the lattice is arranged in an array and has a fixed relative position with the grid cell boundary. The insulating lattice is embedded in the formed grid cell according to the array distribution. The insulating points can be obtained in two ways: (1) pattern voiding: leaving regular void points in the cell during the grid pattern design stage; (2) material embedding: depositing insulating material points in the cell after the grid cell processing is completed. The insulating lattice has a fixed relative position with the grid cell boundary: each insulating point has a consistent geometric offset relative to the reference angle, reference edge, or cell center of the cell it is in; the relative position is consistent in the axial and circumferential directions. The array pitch of the insulating lattice matches the row and column relationship of the grid cell, avoiding overlapping with the cell boundary or crossing the cell connection line.

[0083] The grid layer is closed in a shingle-like overlapping manner in the circumferential direction, and the overlapping seam has an avoidance relationship with the micro-via and the equipotential flange. In the transition zone circumferential closure boundary, a shingle-like overlapping band is arranged. The overlapping is carried out in a fixed overlapping direction, and the edge band of the next circle covers the edge band of the previous circle. The overlapping sequence follows the process arrangement of "first inside, then outside, first down, then up", ensuring that the overlapping relationship is consistent in the full circumferential range. The position of the overlapping seam is uniformly positioned relative to the circumferential reference line, and an avoidance relationship is established with the projection line of the micro-via and the equipotential flange: the center line of the overlapping seam is offset from the center line of the micro-via; the boundary of the overlapping band does not cross the outer edge line of the equipotential flange; a narrow edge band is arranged between the overlapping band and the grid effective domain, and the edge band is connected with the grid cell but does not pass through the avoidance band. After the overlapping is completed, secondary pattern solidification or secondary calendering is carried out on both sides of the seam position, so that the overlapping band is stably attached to the lower grid layer and maintains a certain geometric shape.

[0084] According to the definition of the avoidance band, the grid pattern leaves a ring-shaped or sector-shaped blank area near the micro-via, and no grid lines or insulating points are laid in the blank area. The area near the equipotential flange also remains blank, and no covering pattern is introduced in the blank range. The boundary relationship between the grid lines, insulating points, overlapping seam, and avoidance band is reviewed through alignment markers and inspection fixtures to ensure that all boundary lines are in the predetermined relative position and there is no cross-border or overlap.

[0085] The edge of the grid layer close to the shell end is provided with a blank ring between the equipotential flange and the micro-via head. A continuous blank ring is provided between the edge of the grid layer close to the shell end and the equipotential flange. The blank ring is closed in the circumferential direction, and the inner edge is in a concentric or coaxial geometric relationship with the outer edge of the equipotential flange, and the outer edge is connected to the grid effective domain through a straight line or a circular arc. No grid lines and insulation points are laid in the blank ring, and no micro-via heads are covered; if the micro-via head is located in the blank ring, a clearance band is reserved around it, and the clearance band and the blank ring form a closing at the same level. After the blank ring is formed, a one-time edge closing treatment is performed on the boundary line, and the edge closing line does not cross the end line of the lap joint band.

[0086] After the grid layer, the insulation point array, the shingle closing, and the blank ring are completed, the surface is subjected to a curing or drying treatment; the lap joint and the boundary line are slightly calendered or scraped to keep the surface layer continuous and flat. Subsequently, through visual magnification inspection, projection measurement or contact measurement, the following geometric items are recorded: the row and column alignment of the grid unit, the axial partition sequence, the relative position of the insulation point and the unit boundary, the relative position of the shingle joint and the avoidance band, and the relative position of the blank ring and the equipotential flange / micro-via port. The inspection records and the previous coordinate mapping files are archived for subsequent compression and overlying process calls.

[0087] The geometric type of the grid unit can be replaced among honeycomb, square, diamond, concentric ring or space-filling curve; the insulation point array can adopt the form of round dot, square dot or groove-shaped short section; the shingling direction of the shingle lap joint can be selected according to the assembly direction; the boundary of the avoidance band and the blank ring can adopt a combination of straight line or broken line and circular arc. The above-mentioned replacements do not change the hierarchical and sequential relationship of "axial partition-circumferential closure-insulation point array-avoidance-blank ring".

[0088] S5, a continuous closing is formed by one-time compression, the inner wall of the shell is micro-textured, a 360° equalizing ring is assembled, and the shield-skin-equalizing ring-shell is closed in the circumferential direction without a break by one-time compression according to the limiting geometry, and the specific implementation is:

[0089] The crimping platform on the inner wall of the shell is micro-textured, and the textured area covers the designed contact range of the equalizing ring. The connector shell is fixed to the clamping fixture so that the crimping platform on the inner wall of the shell is in a machinable position. The surface of the crimping platform is micro-textured by any of the methods such as laser etching, chemical etching, sandblasting or knurling; the texture can be a cross-net pattern, concentric ring pattern or radial fine tooth pattern, and the axial and circumferential boundaries of the textured area are defined by a masking film or a positioning plate. Before texturing, the designed contact range of the equalizing ring is marked on the inner wall of the shell with a reference fixture; during texturing, this range is used as the processing boundary so that the textured area covers the designed contact range of the equalizing ring and forms a clear transition with the non-contact area. After processing, use fiber-free wiping materials and suitable solvents to remove residual dust and etching products, and check the continuity of the texture and the neatness of the boundaries; if necessary, use optical magnification to review the texture uniformity, and record the start and end marks of the texture area on the outside of the shell for press-fit alignment reference.

[0090] Place the 360° equalizing ring on the crimping platform of the shell and position it coaxially with the equipotential flange. Take out the 360° equalizing ring and confirm its circumferential closed state and the chamfer direction of the interface; if it is an open structure, predetermine the circumferential orientation of the opening in the shell. Place the exposed section of the conductive skin at the end of the cable and the equipotential flange in the positioning sleeve, and achieve axial and circumferential alignment through the positioning sleeve and the zero position mark of the shell end face. Place the equalizing ring on the crimping platform of the shell so that its inner chamfered surface faces the outer edge of the equipotential flange; use a pressing mandrel with an inner guide cone to insert it into the inner diameter of the equalizing ring, and complete the initial coaxial positioning of the equalizing ring and the equipotential flange through the cooperation of the mandrel and the outer circle of the equipotential flange. If the opening orientation of the equalizing ring needs to be controlled, a mechanical fit relationship is established between the positioning groove on the inner wall of the shell and the alignment protrusion of the equalizing ring to avoid circumferential rotation during the pressing process.

[0091] The equalizing ring is pressed once in the axial direction. The pressing stroke is limited by geometric constraints to complete the coaxial fastening of the shell, equalizing ring, conductive skin and shielding layer. Place the assembly under the vertical pressing equipment or the manual press with displacement control, and select a pressing head that matches the outer diameter of the equalizing ring. The end face of the head is provided with a guide chamfer that transitions with the inner diameter of the shell, and the end face is parallel to the end face of the shell. According to the process regulations, the exposed surface of the equipotential flange and the contact point of the pressing core shaft are subjected to the interface treatment allowed by the process (such as cleaning or dry lubrication), and then the equalizing ring is pressed in a single axial feed. The pressing stroke is constrained by the limiting shoulder or end face stop structure provided in the shell; when the head contacts the limiting structure, the feed is stopped and the pressure is maintained for a short time to complete the fitting of the bonding surface. During the entire press-fitting process, an external support sleeve is used to fix the cable segment to prevent axial displacement or circumferential torsion of the cable relative to the housing. The press-fitting displacement curve is recorded by displacement sensing or a travel gauge, and after the press-fitting is completed, it is compared with the travel mark on the tooling to confirm that the press-fitting depth meets the preset geometric position.

[0092] After the end of the press-fitting, the housing end, the equalizing ring, the equipotential flange and the shielding overlap area form a continuous closed contact interface in the circumferential direction. After the end of the press-fitting, the mandrel and the bearing sleeve are removed, and the relative positional relationship of the housing end, the equalizing ring, the equipotential flange and the shielding overlap area along the housing end edge is checked. An annular gauge or a flexible gauge is attached to the end in the circumferential direction to confirm the circumferential continuous fit of the equalizing ring in the housing and the full circumferential contact state of the equipotential flange; for an open equalizing ring, the combination boundary of the two sides of the open end, the inner wall of the housing and the equipotential flange is observed to see whether it is consistent with the predetermined orientation. The debris and oil marks generated during the press-fitting process are cleaned up, a temporary shielding tape is laid at the junction between the housing inner opening and the cable outer surface, and then local cleaning and drying are performed on the exposed part of the press-fitting interface. According to the process requirements, a press-fitting completion mark and a trace code are printed on the reserved marking area on the outside of the housing or the outer surface of the cable, and a test tool is placed at the test window reserved in the transition area to facilitate the connection of the subsequent overcoating and consistency check procedures. At this point, the end press-fitting process is completed, and the micro-texture area of the housing press joint station forms a closed contact interface with the outside of the equalizing ring and the shielding overlap area of the equipotential flange in the circumferential direction, which is consistent with the previous reference positioning, providing a stable base for subsequent overcoating and detection

[0093] S6, overcoating and consistency check, applying a thin coating to the outer layer, retaining a test window, completing the circumferential continuity and assembly position check and trace identification, which is implemented as follows:

[0094] A thin coating is applied to the outermost layer in the transition area, covering the conductive skin exposed area, the grid layer and the shingle overlap. After completing the assembly of the transition area structure, surface cleaning and shielding treatment are performed on the area. According to the axial and circumferential reference, a continuous coating area is provided outside the conductive skin exposed area, the grid layer and the shingle overlap joint. A thin coating material compatible with the base layer (such as one of fluorine-containing polymer coating, Parylene type vapor deposition coating or UV cured transparent coating) is selected to form a continuous thin coating by spraying, dipping or vapor deposition. Before coating, peelable masking tape, window template or release film is used to define the coating boundary, and the thin coating does not extend beyond the extension line of the reference mark and the cutting boundary of the non-coating area. After coating, curing or standing according to the material process is performed, the shielding member is removed, and the visual continuity of the coating boundary and the shingle overlap joint is reviewed.

[0095] The test window and the conductive contact are retained at the predetermined position, and the window boundary is aligned with the reference mark. The window and the conductive contact are set at the predetermined test position. With the end face zero mark as the reference, a test window is reserved by shielding the opening before or during the outer covering is formed. The window shape can be circular or rectangular and aligned with the circumferential reference line. A hard frame ring or a thin-walled reinforcement ring is attached or fixed around the window, and the boundary overlaps with the outer covering to form a clear boundary. Conductive contact positions are set in the window: a local area of ​​the conductive skin can be directly exposed, or a prefabricated conductive gasket (such as a coated metal sheet or a conductive polymer sheet) can be embedded in the exposed area. The conductive gasket is fixed with low-temperature adhesive or mechanical limiters. If necessary, a detachable protective cover or flip cover is placed above the window. The flip cover and the outer covering adopt a hinged or tear-off structure to facilitate reset and shielding.

[0096] The press-fit position, circumferential closure state, boundary demarcation band and lap joint position are geometrically checked and recorded. The press-fit position, circumferential closure state, boundary demarcation band and lap joint position are geometrically checked and recorded. Place the assembly on a check fixture or a rotating fixture, and use a calibration camera, a reading microscope or a portable measuring arm to take images and measurements: confirm the relative position of the equalizing ring and the shell limit shoulder, and record the spacing between the press-fit end line and the axial reference; photograph the shingled overlap closure line and the demarcation band position at equally divided circumferential angles (for example, every 30°), and check the relative angular relationship with the circumferential reference line; photograph the alignment of the conductive contact and the outer covering boundary near the test window. Archive the measurement image and readings with the part number as the index, and establish a one-to-one correspondence with the reference mark; record the inspection station, fixture number and timestamp in the record sheet, and attach a sketch of the coverage range.

[0097] A traceability mark is formed in the visible area of ​​the outer covering, and a one-to-one correspondence is established between the mark content and the reference. A traceability mark is formed in the visible area of ​​the outer covering. The mark carrier can be one of laser marking, spray-printed QR code / alphanumeric combination or embedded transparent nameplate, and the position has a fixed geometric relationship with the axial reference line and the circumferential reference line (for example, it is located directly above the axial reference line and at a fixed distance from the end face zero position). The mark content includes product part number, process batch, equipment number and measurement record index, etc., and corresponding entries are established in the manufacturing execution system. After the mark is formed, a layer of transparent protective varnish or film layer is covered on its surface, and the boundary of the protective layer does not cover the test window and the conductive contact area. Finally, the clarity, readability and positioning consistency of the mark are reviewed, and after confirming that it is consistent with the previously recorded information, the process step is completed.

[0098] While embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that various changes, modifications, substitutions, and variations may be made to these embodiments without departing from the principles and spirit of the invention, and that the scope of the invention is defined by the appended claims and their equivalents.

Claims

1. A carbon dioxide laser suppression cable conduction radiation control method, characterized in that: include: S1. Pre-processing and benchmark positioning: define the cable-connector transition area, clean and establish axial and circumferential benchmarks, and reserve the shell crimping station; S2, conductive skin forming, the conductive skin is formed integrally on the outer surface of the transition zone at 360 degrees, overlapped with the cable shield end, and the equipotential flange is retained; S3, micro-vias are connected in parallel, and a radial micro-via array is arranged at the conductive skin, penetrating to the shield and shell contact area and conductively filled, with circumferential staggering; S4, lossy grid and insulating dot matrix, a patterned micro-grid is formed on the outside of the conductive skin, arranged in a gradient along the axial direction, and an insulating dot matrix is ​​embedded in the grid; The circumference is closed with shingle-type overlap to avoid flanges and through-hole openings; S5. Press-fit in one go to form a continuous closure. The inner wall of the shell is micro-textured, and a 360° equalizing ring is assembled. Press-fit in one go according to the limiting geometry to ensure that the shield-skin-equalizing ring-shell circumferential closure is achieved without any break. S6. Covering and consistency inspection: apply a thin coating on the outer layer, retain the test window, and complete the circumferential continuity and assembly position inspection and traceability identification.

2. The carbon dioxide laser suppression cable conducted radiation control method according to claim 1, characterized in that: S1 includes: Mark the axial range and circumferential reference line of the transition zone between the connector housing end face and the cable sheath, and set the end face zero mark; The outer surface of the transition zone is dusted, degreased and dried; if necessary, the outermost sheath layer is removed to form a patternable base; An axial reference line and a circumferential alignment point are formed on the outer surface of the cable, and a registration relationship is established with the end face of the shell; An annular crimping platform and a limiting shoulder are provided near the end of the connector housing to form a fixed relative position with the transition zone reference.

3. A carbon dioxide laser suppression cable conduction radiation control method according to claim 1, characterized in that S2 include: forming a conductive skin layer continuously in a circumferential direction around the outer surface of the transition zone to form a closed ring-shaped covering; The conductive skin and the cable shield end form an overlapping area, and the overlapping boundary is closed along the circumference; An equipotential flange area is reserved on the conductive skin near the shell end, and the flange boundary is aligned with the S1 reference to maintain the relative position relationship with the subsequent crimping station; A transition band is provided on the side of the conductive skin away from the shell, forming a predetermined overlapping relationship with the boundary of the subsequent mesh layer.

4. A carbon dioxide laser suppression cable conduction radiation control method according to claim 1, characterized in that S3 include: A plurality of micro-through holes are provided radially on the conductive skin, and the holes penetrate to the contact area between the cable shielding layer structure and the connector housing; Fill the through hole with conductive material to build a conductive path from the conductive skin to the shielding layer and then to the grounding area of ​​the shell; The through holes are staggered in the circumferential direction and distributed in multiple circles, and the through hole openings avoid the conductive flange area and the subsequent pattern boundary.

5. A carbon dioxide laser suppression cable conduction radiation control method according to claim 1, characterized in that S4 include: A micro-grid layer is formed on the outside of the conductive skin according to a predetermined pattern, with the grid units arranged in a set order along the axial direction; The grid is arranged in a gradient in the axial direction according to the set graphic parameters to form density distribution in different areas; An insulating lattice is embedded in the grid layer, and the lattice is distributed in an array and maintains a fixed relative position with the grid unit boundary; The grid layer is closed in the circumferential direction by an imbrication-type overlap method, and the overlap seams form an avoidance relationship with the micro-through holes and equipotential flanges; A blank annular band is arranged between the edge of the grid layer close to the shell end and the equipotential flange, and the blank annular band does not cover the exposed micro-through holes.

6. A carbon dioxide laser suppression cable conduction radiation control method according to claim 1, characterized in that S5 include: The crimping platform on the inner wall of the shell is micro-textured, and the textured area covers the contact area of ​​the pressure equalizing ring design; Place the 360° equalizing ring on the shell crimping platform and position it coaxially with the equipotential flange; The pressure-equalizing ring is pressed once in the axial direction. The pressing stroke is limited by the geometric constraints to complete the coaxial fastening of the shell, pressure-equalizing ring, conductive skin and shielding layer. After the press-fitting is completed, the shell end, the pressure-equalizing ring, the equipotential flange and the shield overlap area form a continuous and closed contact interface in the circumferential direction.

7. The method for controlling cable-conducted radiation suppression using carbon dioxide laser according to claim 1, wherein S6 include: A thin covering layer is applied to the outermost layer of the transition zone, covering the exposed area of ​​the conductive skin, the mesh layer and the lap joints of the shingles; Keep the test window and the conductive contacts at the predetermined positions, with the window border aligned with the fiducial mark; Conduct geometric review and record of the press-fit position, circumferential closure status, boundary trimming zone and lap joint position; A traceability mark is formed in the visible area of ​​the outer covering layer, and a one-to-one correspondence is established between the mark content and the benchmark.

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