Semiconductor chip
By introducing dielectric mirrors and thin contact layers into semiconductor chips, the problems of uneven carrier injection and low light extraction efficiency are solved, achieving more uniform radiative emission and higher light extraction efficiency, and improving the thermal stability of the chip.
Patent Information
- Application Number
- CN202480029373.3
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Priority Date
- 2023-05-04
- Filing Date
- 2024-04-24
- Publication Date
- 2025-12-02
AI Technical Summary
Semiconductor chips suffer from problems such as non-uniform radiation emission due to uneven carrier injection and reduced light extraction efficiency due to the structure of the metal current diffuser.
The semiconductor chip structure employs a dielectric mirror, which consists of alternating sequences of low-refractive-index and high-reflectivity dielectric layers. Current injection is controlled through an opening configuration. Thin contact layers and graphene or metal contact layers are used to reduce lateral current diffusion. Radiation is reflected through a distributed Bragg reflector to improve light extraction efficiency.
This achieves uniformity in carrier injection and radiation output, improves light extraction efficiency, reduces absorption loss within the contact layer, and enhances the chip's thermal stability and optical coupling output.