OAPM-based secondary phase distortion compensation digital holographic microscopy system
By using an OAPM-based digital holographic microscopy system to compensate for secondary phase distortion, the system solves the problems of excessive system size and computational redundancy, and achieves high-resolution phase reconstruction.
Patent Information
- Application Number
- CN202411684454.5
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2024-11-22
- Publication Date
- 2026-01-02
- Estimated Expiration
- Not applicable · inactive patent
AI Technical Summary
Existing methods for compensating for secondary phase distortion result in excessively large system size and increased costs. Furthermore, numerical compensation methods are computationally cumbersome and lack complete prior conditions, limiting their practical application scenarios.
A digital holographic microscopy system based on OAPM for secondary phase distortion compensation is adopted. By using an off-axis planing mirror to concentrate the compensation and reflection effects in the same optical element, combined with a reflective structure, the distortion compensation process is simplified, and high-resolution phase reconstruction is achieved.
This significantly reduces the system size, avoids chromatic aberration, simplifies the compensation process, and achieves higher resolution phase reconstruction results.
Smart Images
Figure CN121254577A_ABST
Abstract
Description
TECHNICAL FIELD
[0001] The application relates to the field of holographic microscopy instruments, in particular to a secondary phase distortion compensation digital holographic microscopy system based on OAPM. BACKGROUND
[0002] The digital holographic microscopy technology is an advanced technology for high-resolution three-dimensional image acquisition, which encodes the phase and amplitude information of a sample into a detector by utilizing the wave nature of light, so that non-contact and label-free imaging of microstructures is realized, and the technology has wide application in the fields of biomedicine, material science and nanotechnology.
[0003] The secondary phase distortion compensation algorithm is used for the relative curvature error introduced by a microscope objective, which seriously affects the resolution of the recovered phase, however, the method for compensating the secondary phase distortion at the present stage is accompanied by the introduction of a new compensation element, which leads to a large system volume and cost increase, and meanwhile, other numerical compensation methods are limited in practical application scenarios due to the complicated numerical calculation process and incomplete prior conditions. SUMMARY
[0004] The purpose of the application is to solve the problem that the method for compensating the secondary phase distortion at the present stage is accompanied by the introduction of a new compensation element, which leads to a large system volume and cost increase, and meanwhile, other numerical compensation methods are limited in practical application scenarios due to the complicated numerical calculation process and incomplete prior conditions.
[0005] The technical scheme is a secondary phase distortion compensation digital holographic microscopy system based on OAPM, which comprises a laser, a collimating and expanding system arranged on the right side of the laser, a half glass plate arranged on the right side of the collimating and expanding system, a polarization beam splitter body arranged on the right side of the half glass plate, an off-axis parabolic mirror arranged on the right side of the polarization beam splitter body, a mirror arranged below the polarization beam splitter body, a non-polarization beam splitter arranged on the right side of the mirror, a quarter glass plate arranged on the right side of the non-polarization beam splitter, and a pixel polarization camera arranged on the right side of the quarter glass plate.
[0006] Further, the system further comprises an observation sample position one and a microscope objective one, which are located between the polarization beam splitter body and the off-axis parabolic mirror.
[0007] Further, the system further comprises an observation sample position two and a microscope objective two, which are located between the mirror and the non-polarization beam splitter.
[0008] Advantages:
[0009] The digital holographic microscopy system based on OAPM-secondary phase distortion compensation proposed in this invention utilizes an off-axis planing mirror to achieve secondary phase distortion compensation, concentrating the compensation and reflection effects in the same optical element, which greatly reduces the size of the digital holographic microscopy system.
[0010] Compared to the transmission structure in traditional digital holographic microscopy, the reflective structure avoids chromatic aberration and simplifies the distortion compensation process, resulting in higher resolution phase reconstruction.
[0011] Based on the principle of off-axis planing mirrors, it is only necessary to have the back focal plane of the microscope objective conjugate with the focal point of the off-axis planing mirror to eliminate secondary phase distortion in the optical path of a digital holographic microscope composed of microscope objectives of arbitrary depth of focus. Attached Figure Description
[0012] Figure 1 This is a schematic diagram of the overall structure of the present invention;
[0013] Figure 2 This is a schematic diagram of the overall structure of the present invention.
[0014] In the figure: 1. Laser; 2. Collimation and beam expansion system; 3. Half-glass slide; 4. Polarizing beam splitter body; 5. Off-axis planing mirror; 6. Mirror; 7. Non-polarizing beam splitter; 8. Quarter-glass slide; 9. Pixel polarizing camera; 10. Observation sample position one; 11. Microscope objective one; 12. Observation sample position two; 13. Microscope objective two. Detailed Implementation
[0015] To make the technical solution of the present invention clearer, the present invention will be further described in detail below with reference to the accompanying drawings and specific embodiments.
[0016] Example 1
[0017] like Figure 1 As shown, a digital holographic microscopy system based on OAPM with secondary phase distortion compensation is provided, including a laser 1, a collimating beam expanding system 2 disposed to the right of the laser 1, a half-glass slide 3 disposed to the right of the collimating beam expanding system 2, a polarizing beam splitter body 4 disposed to the right of the half-glass slide 3, an off-axis planing mirror 5 disposed to the right of the polarizing beam splitter body 4, a reflecting mirror 6 disposed below the polarizing beam splitter body 4, a non-polarizing beam splitter 7 disposed to the right of the reflecting mirror 6, a quarter-glass slide 8 disposed to the right of the non-polarizing beam splitter 7, a pixel polarizing camera 9 disposed to the right of the quarter-glass slide 8, and also including an observation sample position 10 and a microscope objective 11, which are located between the polarizing beam splitter body 4 and the off-axis planing mirror 5;
[0018] After the P-polarized transmitted light is transmitted through the observation sample position one 10 after being split by the polarizing beam splitter prism body 4, the object scattered light propagates as object light, converges and diverges at the back focal plane after passing through the microscopic objective lens one 11. At this time, the divergent light carries a relative wavefront phase curvature error, i.e. quadratic phase aberration, which will seriously affect the reconstruction effect of the recovered phase. In order to compensate for this relative curvature error and improve the resolution of the reconstructed phase, the focal point of the off-axis mirror 5 is placed on the central axis of the microscopic objective lens one 11, and the focal point of the off-axis mirror 5 coincides with the back focal plane. According to the reflection principle of the off-axis mirror 5, the relative wavefront phase curvature in the reflected object light is compensated, thereby canceling the quadratic phase aberration of the object light and the reference light on the interference recording surface. After being combined by the non-polarizing beam splitter 7, it is recorded by the pixel polarization camera 9, and a clear recovered phase can be obtained.
[0019] Embodiment 2
[0020] As shown in Figure 2 , an OAPM-based quadratic phase aberration compensation digital holographic microscopy system is provided, which comprises a laser 1, a collimating beam expander system 2 is arranged on the right side of the laser 1, a half-wave plate 3 is arranged on the right side of the collimating beam expander system 2, a polarizing beam splitter prism body 4 is arranged on the right side of the half-wave plate 3, an off-axis mirror 5 is arranged on the right side of the polarizing beam splitter prism body 4, a mirror 6 is arranged below the polarizing beam splitter prism body 4, a non-polarizing beam splitter 7 is arranged on the right side of the mirror 6, a quarter-wave plate 8 is arranged on the right side of the non-polarizing beam splitter 7, and a pixel polarization camera 9 is arranged on the right side of the quarter-wave plate 8. The system further comprises an observation sample position two 12 and a microscopic objective lens two 13, and the observation sample position two 12 and the microscopic objective lens two 13 are located between the mirror 6 and the non-polarizing beam splitter 7.
[0021] After the P-polarized transmitted light is transmitted through the observation sample position two 12 after being reflected and transmitted by the mirror 6 after being split by the polarizing beam splitter prism body 4, the object scattered light propagates as object light, converges and diverges at the back focal plane after passing through the microscopic objective lens two 13. At this time, the divergent light carries a relative wavefront phase curvature error, i.e. quadratic phase aberration, which will seriously affect the reconstruction effect of the recovered phase. In order to compensate for this relative curvature error and improve the resolution of the reconstructed phase, the off-axis mirror 5 is placed in the reference light path, and the focal point center axis is perpendicular to and equal in height to the central axis of the microscopic objective lens two 13. The same spherical aberration distance is introduced into the non-polarizing beam splitter 7 before the object light path and the reference light path, which can compensate for the relative wavefront phase curvature error introduced by the microscopic objective lens two 13, thereby canceling the quadratic phase aberration of the object light and the reference light on the interference recording surface. After being combined by the non-polarizing beam splitter 7, it is recorded by the pixel polarization camera 9, and a clear recovered phase can be obtained.
[0022] The above embodiments only express several implementation manners of the present application, and the description is more specific and detailed, but it should not be understood as a limitation on the patent scope of the present application. It should be noted that for ordinary skilled persons in the art, without departing from the concept of the present application, several modifications and improvements can be made, which are all within the protection scope of the present application. Therefore, the protection scope of the patent of the present application should be subject to the appended claims.
Claims
1. A digital holographic microscopy system based on OAPM for secondary phase distortion compensation, comprising a laser (1), characterized in that: A collimation and beam expansion system (2) is provided on the right side of the laser (1). A half-glass slide (3) is provided on the right side of the collimation and beam expansion system (2). A polarizing beam splitter body (4) is provided on the right side of the half-glass slide (3). An off-axis planing mirror (5) is provided on the right side of the polarizing beam splitter body (4). A reflecting mirror (6) is provided below the polarizing beam splitter body (4). A non-polarizing beam splitter (7) is provided on the right side of the reflecting mirror (6). A quarter-glass slide (8) is provided on the right side of the non-polarizing beam splitter (7). A pixel polarizing camera (9) is provided on the right side of the quarter-glass slide (8).
2. The digital holographic microscopy system based on OAPM with secondary phase distortion compensation according to claim 1, characterized in that: It also includes an observation sample position (10) and a microscope objective (11), which are located between the polarizing beam splitter body (4) and the off-axis planing mirror (5).
3. The digital holographic microscopy system based on OAPM with secondary phase distortion compensation according to claim 1, characterized in that: It also includes a second observation sample position (12) and a second microscope objective (13), which are located between the mirror (6) and the non-polarizing beam splitter (7).