A planting method for relieving drought of wheat based on combined application of SiQD seed dressing and halophilic bacillus
By combining SiQDs seed dressing with Bacillus halophilus, the problem of limited wheat growth under drought stress was solved, wheat drought resistance and yield were improved, and more efficient water use was achieved.
Patent Information
- Application Number
- CN202511688566.2
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Filing Date
- 2025-11-18
- Publication Date
- 2026-06-26
- Estimated Expiration
- 2045-11-18
AI Technical Summary
Existing technologies are insufficient to effectively alleviate drought stress in wheat, especially during seed germination and growth, when the demand for water and nutrients is insufficient, resulting in low germination rates, limited growth, and severe oxidative damage caused by drought, which affects yield and water use efficiency.
Seed dressing with silicon quantum dots (SiQDs) combined with application of Bacillus halotolerans GS127 reduces oxidative damage, promotes root development, increases the accumulation of osmotic regulators, and enhances the drought resistance of wheat by regulating multiple mechanisms.
It significantly improves wheat growth and yield under drought conditions, enhances water use efficiency, reduces oxidative damage, strengthens wheat drought resistance, and promotes root development and biomass accumulation.