Immersion type glass etching equipment

Abstract

The invention provides soaking type glass etching equipment which comprises a pool body and a flow guide assembly, the flow guide assembly comprises a flow guide shell at the top end and a flow guide piece, the flow guide shell is arranged in the pool body, an etching groove and a flow guide groove are formed in the flow guide shell, the bottom end of the etching groove is communicated with the bottom end of the flow guide groove, a glass plate is placed in the etching groove, and the flow guide piece is arranged in the flow guide groove. And the drainage piece is used for leading out the etching liquid in the drainage groove, so that the liquid flow in the etching groove flows to the drainage groove. Firstly, the etching liquid is put into the pool body, then the glass plate to be etched is placed in the etching groove, the etching liquid in the drainage groove is guided out by the drainage piece, so that the liquid flow in the etching groove flows to the drainage groove, the liquid flow which continuously scours the glass plate is formed in the etching groove, and then products on the surface of the glass plate are continuously removed through the liquid flow. No bubbles contact with the glass plate, so that negative influence of holes generated by the bubbles on etching of the glass plate is avoided.

Description

Technical Field

[0001] This invention relates to the field of glass etching, and more specifically to an immersion glass etching apparatus. Background Technology

[0002] Immersion etching utilizes the chemical reaction between a chemical solution and the material to be etched to selectively remove specific materials and achieve patterning. This process typically involves completely immersing the material in the etching solution, using chemical etching principles to achieve uniform etching. For example, in the processing of LCD glass substrates, etching solutions such as hydrogen fluoride (HF) are commonly used to achieve the desired thinning effect.

[0003] Existing immersion glass etching equipment can be found in patent application number CN201510314348.2, which has a pool for storing etching solution and a support frame for fixing glass plates. The pool has a bubble tube, and the bubbles generated by the bubble tube drive the etching solution to flow. The flowing etching solution then washes the glass plate. However, the bubbles tend to adhere to the glass plate, and the cavities created by the bubbles have a negative impact on the etching of the glass plate.

[0004] Therefore, it is important to avoid the negative impact of voids caused by air bubbles on the etching of glass plates. Summary of the Invention

[0005] The purpose of this invention is to overcome the above-mentioned technical deficiencies and propose an immersion glass etching device to solve the technical problem that the voids generated by bubbles in the prior art have a negative impact on the etching of glass plates.

[0006] To achieve the above-mentioned technical objectives, the present invention adopts the following technical solution: This invention provides an immersion glass etching apparatus, comprising: Pool body; and The flow guiding assembly includes a flow guiding shell at the top and a flow guiding component. The flow guiding shell is built into the pool body, and an etching tank and a flow guiding tank are formed inside the flow guiding shell. The bottom ends of the etching tank and the flow guiding tank are connected to each other. The etching tank is used to place a glass plate. The flow guiding component is built into the flow guiding tank and discharges the etching liquid in the flow guiding tank so that the liquid flow in the etching tank flows to the flow guiding tank.

[0007] In some embodiments, the drainage element includes a bubble tube that passes through the drainage groove in a horizontal direction, and the bubble tube has a plurality of air guide holes along its length.

[0008] In some embodiments, the openings of the vent holes face upwards.

[0009] In some embodiments, the flow guide shell has a communication port, and the bubble tube extends into the flow channel through the communication port.

[0010] In some embodiments, the sidewall of the flow guide shell is provided with a plurality of flow inlet holes, and the plurality of flow inlet holes are connected to the etching tank.

[0011] In some embodiments, the number of inlet holes at the top of the flow guide shell is greater than the number of inlet holes at the bottom of the flow guide shell.

[0012] In some embodiments, the flow guiding assembly further includes a support frame disposed above the pool body, and the top of the flow guiding shell is fixedly connected to the support frame.

[0013] In some embodiments, the pool body has an inlet and an outlet at each end.

[0014] In some embodiments, a positioning groove is formed in the inner wall of the etching tank, and the end of the glass plate is embedded in the positioning groove.

[0015] In some embodiments, there are multiple sets of the flow guiding components, and the multiple sets of the flow guiding components are arranged side by side.

[0016] Compared with the prior art, the immersion glass etching equipment provided by the present invention has the following advantages: First, etching solution is added to the etching tank. Then, the glass plate to be etched is placed in the etching tank. A guide device directs the etching solution from the guide channel, causing the liquid flow in the etching tank to flow into the guide channel. This creates a continuous flow of liquid within the etching tank that washes over the glass plate, thereby continuously removing the deposits on the glass plate surface. Since no air bubbles come into contact with the glass plate, the voids created by air bubbles are prevented from negatively impacting the etching process. Attached Figure Description

[0017] Figure 1 This is a schematic diagram of the structure of the immersion glass etching equipment provided in an embodiment of the present invention; Figure 2 This is a schematic diagram of the immersion glass etching equipment provided in an embodiment of the present invention from another perspective; Figure 3 This is a partial schematic diagram of the inlet hole provided in an embodiment of the present invention.

[0018] Explanation of reference numerals in the attached drawings: pool body 100, inlet 110, outlet 120, flow guiding component 200, flow guiding shell 210, etching groove 211, positioning groove 2111, flow guiding groove 212, connecting port 213, inlet hole 214, flow guiding component 220, bubble tube 221, air guiding hole 2211, support frame 230. Detailed Implementation

[0019] To make the objectives, technical solutions, and advantages of this invention clearer, the invention will be further described in detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative and not intended to limit the invention.

[0020] To address the technical problem of negatively impacting the etching of glass plates by cavities created by air bubbles, this invention provides an immersion-type glass etching device. Since no air bubbles come into contact with the glass plate, the negative impact of air bubbles on the etching of the glass plate is avoided.

[0021] It should be noted that the immersion glass etching equipment of the present invention is used for glass etching. For ease of explanation, the present invention will only use the application of the immersion glass etching equipment to glass etching as an example.

[0022] Please see Figure 1 , Figure 1 This is a schematic diagram of the structure of an immersion glass etching device according to an embodiment of the present invention. The immersion glass etching device includes a pool body 100 and a flow guiding component 200. The flow guiding component 200 includes a flow guiding shell 210 at the top and a flow guiding component 220. The flow guiding shell 210 is built into the pool body 100, and an etching tank 211 and a flow guiding tank 212 are formed inside the flow guiding shell 210. The bottom ends of the etching tank 211 and the flow guiding tank 212 are connected to each other. The etching tank 211 is used to place a glass plate. The flow guiding component 220 is built into the flow guiding tank 212 and the flow guiding component 220 guides the etching liquid in the flow guiding tank 212 so that the liquid flow in the etching tank 211 flows to the flow guiding tank 212.

[0023] In this embodiment, etching solution is first added to the pool 100, and then the glass plate to be etched is placed in the etching tank 211. Since the guide member 220 directs the etching solution from the guide channel 212, the liquid flow in the etching tank 211 flows towards the guide channel 212, creating a continuous flow of liquid that washes over the glass plate within the etching tank 211. This liquid flow continuously removes the deposits from the surface of the glass plate. Because no air bubbles contact the glass plate, the voids created by the air bubbles are prevented from negatively impacting the etching process.

[0024] In some embodiments, the flow guide 220 includes a bubbler tube 221, which is horizontally inserted into the flow channel 212 and has a plurality of air guide holes 2211 along its length. Airflow is introduced into the flow channel 212 through the bubbler tube 221, and this airflow forms bubbles in the flow channel 212. The rising bubbles drive the liquid flow in the flow channel 212 to flow continuously to the outside. Subsequently, the etching solution in the etching tank 211 flows into the flow channel 212, and the etching solution in the pool 100 flows into the flow channel 212, so that a liquid flow that washes the glass plate is formed in the flow channel 212.

[0025] It is understandable that multiple aerator tubes 221 can be sequentially set in the same drainage channel 212, and the multiple aerator tubes 221 can be set side by side. Setting multiple aerator tubes 221 at the same time can accelerate the liquid flow rate in the drainage channel 212.

[0026] In some embodiments, a plurality of air guide holes 2211 open upwards, such that the direction of the airflow discharged by the air guide holes 2211 is consistent with the direction of the bubble rising, so that the bubble has a faster rising speed.

[0027] Based on the above embodiments, in some embodiments, the flow guide shell 210 has a communication port 213, and the bubble tube 221 extends into the flow channel 212 through the communication port 213.

[0028] In some embodiments, the sidewall of the flow guide shell 210 is provided with a plurality of inlet holes 214, which are connected to the etching tank 211. The etching solution in the pool 100 can enter the etching tank 211 through each inlet hole 214, thereby directly rinsing the glass plate in the etching tank 211.

[0029] In some embodiments, the number of inlet holes 214 at the top of the flow guide shell 210 is greater than the number of inlet holes 214 at the bottom of the flow guide shell 210. Due to the influence of water pressure, the liquid flow velocity in the lower-positioned inlet holes 214 is faster. Since the number of inlet holes 214 at the top of the flow guide shell 210 is greater than the number of inlet holes 214 at the bottom of the flow guide shell 210, the liquid flow velocity at the top of the etching tank 211 is approximately the same as the liquid flow velocity at the bottom of the etching tank 211, making the liquid flow velocity in the etching tank 211 more uniform and stable.

[0030] In some embodiments, the flow guiding assembly 200 further includes a support frame 230, which is disposed above the pool body 100. The top of the flow guiding shell 210 is fixed to the support frame 230, thereby suspending the flow guiding shell 210 inside the pool body 100.

[0031] In some embodiments, the pool body 100 has an inlet 110 and an outlet 120 at both ends, respectively. Etching solution can be introduced into the pool body 100 through the inlet 110 and exported from the pool body 100 through the outlet 120.

[0032] In some embodiments, a positioning groove 2111 is formed on the inner wall of the etching groove 211, and the end of the glass plate is embedded in the positioning groove 2111. The positioning groove 2111 can limit the glass plate so that the glass plate can be fixed in the etching groove 211.

[0033] In some embodiments, there are multiple sets of flow guiding components 200, and the multiple sets of flow guiding components 200 are arranged side by side. Each set of flow guiding components 200 can etch a glass plate. At the same time, multiple sets of flow guiding components 200 can be arranged to etch multiple glass plates simultaneously.

[0034] To better understand this invention, the following is combined with... Figures 1 to 3 The technical solution of the present invention will be described in detail below: Etching solution is introduced into the tank 100 through the inlet 110, thereby storing a certain amount of etching solution in the tank 100. The positioning groove 2111 can limit the glass plate, allowing it to be fixed within the etching tank 211. The guide member 220 guides the etching solution from the guide groove 212, causing the liquid flow in the etching tank 211 to flow towards the guide groove 212. The etching solution in the tank 100 can enter the etching tank 211 through each inlet hole 214, directly rinsing the glass plate within the etching tank 211, and continuously removing the products on the glass plate surface through the liquid flow. Since no air bubbles contact the glass plate, the voids created by air bubbles are prevented from negatively impacting the etching process.

[0035] In the description of this application, it should be noted that the terms "upper" and "lower," etc., indicating the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings, are only for the convenience of describing this application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of this application. Unless otherwise expressly specified and limited, the terms "installed," "connected," and "linked" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; they can refer to the internal communication between two elements. For those skilled in the art, the specific meaning of the above terms in this application can be understood according to the specific circumstances.

[0036] It should be noted that in this application, relational terms such as "first" and "second" are used merely to distinguish one entity or operation from another, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Furthermore, the terms "comprising," "including," or any other variations thereof are intended to cover non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements includes not only those elements but also other elements not expressly listed, or elements inherent to such a process, method, article, or apparatus. Without further limitations, an element defined by the phrase "comprising one..." does not exclude the presence of other identical elements in the process, method, article, or apparatus that includes said element.

[0037] The specific embodiments of the present invention described above do not constitute a limitation on the scope of protection of the present invention. Any other corresponding changes and modifications made in accordance with the technical concept of the present invention should be included within the scope of protection of the claims of the present invention.

Claims

1. A dip-type glass etching apparatus, characterized by, The application relates to a pool body and a flow guide assembly. The pool body comprises: a pool body; and a flow guide assembly, which comprises a top-end flow guide shell and a flow guide piece, the flow guide shell is arranged in the pool body, etching grooves and flow guide grooves are arranged in the flow guide shell, the etching grooves and the flow guide grooves are communicated at bottom ends, glass plates are arranged in the etching grooves, the flow guide piece is arranged in the flow guide grooves, and the flow guide piece guides etching liquid in the flow guide grooves to flow from the etching grooves to the flow guide grooves.

2. The immersion glass etching apparatus of claim 1, wherein, The flow guide piece comprises a bubble tube, the bubble tube is arranged in the flow guide grooves in a horizontal direction, and a plurality of air guide holes are arranged in the bubble tube along the length direction of the bubble tube.

3. The immersion glass etching apparatus of claim 2, wherein, The air guide holes are upwardly open.

4. The immersion glass etching apparatus of claim 2, wherein, The flow guide shell is provided with a communication port, and the bubble tube extends into the flow guide grooves through the communication port.

5. The immersion glass etching apparatus of claim 1, wherein, A plurality of inflow holes are arranged in the side wall of the flow guide shell, and the inflow holes are communicated with the etching grooves.

6. The immersion glass etching apparatus of claim 5, wherein, The number of the inflow holes at the top end of the flow guide shell is larger than that at the bottom end of the flow guide shell.

7. The immersion glass etching apparatus of claim 1, wherein, The flow guide assembly further comprises a support frame, the support frame is arranged above the pool body, and the top end of the flow guide shell is fixed to the support frame.

8. The immersion glass etching apparatus of claim 1, wherein, The pool body is provided with a guide inlet and a guide outlet at two ends respectively.

9. The immersion glass etching apparatus of claim 1, wherein, Positioning grooves are arranged in the inner wall of the etching grooves, and the end of the glass plate is embedded in the positioning grooves.

10. The immersion glass etching apparatus of claim 1, wherein, The flow guide assembly has a plurality of groups, and the groups are arranged side by side.

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