Full-automatic metal oxidation treatment production line and control method and device thereof

Abstract

The invention is suitable for the technical field of oxidation treatment, and particularly relates to a full-automatic metal oxidation treatment production line and a control method and device thereof. Monitoring through a concentration sensor to obtain a current concentration value of a specific chemical component of the treatment tank liquid; determining an initial concentration control range of specific chemical components of each treatment tank solution based on process requirements; determining the consumption rate of specific chemical components in the current treatment tank liquid according to the operation state parameters to obtain a concentration change trend value; dynamically adjusting the initial concentration control range based on the concentration change trend value to obtain a concentration control threshold value; obtaining control data according to the current concentration value and a concentration control threshold value; according to the control method for the full-automatic metal oxidation treatment production line, the problem that a uniform film layer cannot be formed in the oxidation process due to insufficient activity of the bath solution and unbalance of actual components of the bath solution can be solved.

Description

TECHNICAL FIELD

[0001] The application belongs to the technical field of oxidation treatment, and particularly relates to a metal full-automatic oxidation treatment production line and a control method and device thereof. BACKGROUND

[0002] Metal oxidation treatment is widely used in the metal processing industry, aiming to improve the corrosion resistance, hardness and aesthetics of the metal. The metal oxidation treatment production line is usually composed of multiple treatment units, including a pretreatment unit, an oxidation treatment unit, a post-treatment unit and the like, each unit undertaking different processing tasks.

[0003] The metal full-automatic oxidation treatment production line will cause the chemical reaction rate of the tank liquid to change by 20%-40% when the ambient temperature fluctuates (for example, the workshop temperature rises to above 35°C in summer and drops to below 10°C in winter), resulting in unstable component consumption rate. In addition, the total surface area of the workpiece carried by the crane changes with batches (for example, the same production line alternately processes small-size bolts and large-size shells, and the surface area difference can be more than 10 times), further exacerbating the fluctuation of component consumption. At the same time, factors such as the natural evaporation of the tank liquid in the treatment tank and the impurities brought in by the workpiece will also continuously affect the concentration stability. These dynamic factors put high requirements on the real-time and adaptability of concentration control.

[0004] In related technologies, the methods for realizing concentration control of the tank liquid mainly include two types of traditional manual control and early automatic control, that is, traditional manual control and early automatic control. For traditional manual control, the operator takes samples every 2-4 hours, detects the concentration by titration method, and then manually operates the metering pump or liquid discharge valve for adjustment. This method has obvious hysteresis, and the concentration deviation within the sampling interval has exceeded the process allowable range. The operation error of manual detection can cause the concentration control error to reach 8%-12%. In addition, frequent manual intervention reduces the automation rate of the production line to below 60%. For early automatic control, a single concentration threshold is set based on fixed process parameters, and simple on-off control is realized through an actuator. For example, in a high-temperature environment, the generation rate of aluminum ions in the oxidation tank increases by 50%, and the fixed threshold cannot be adapted in time, resulting in concentration exceeding the standard, and the product qualification rate fluctuates by more than 15% when multiple varieties are produced. In summary, the activity of the tank liquid in each treatment tank may be insufficient, and the actual components of the tank liquid may be imbalanced, resulting in the inability of the oxidation process to form a uniform film layer. SUMMARY

[0005] The embodiments of the application provide a metal full-automatic oxidation treatment production line and a control method and device thereof, which can solve the problem that the oxidation process cannot form a uniform film layer due to insufficient activity of the tank liquid and imbalance of the actual components of the tank liquid.

[0006] In a first aspect, the embodiments of the application provide a metal full-automatic oxidation treatment production line control method, comprising: obtaining running state parameters of the production line in real time; wherein the running state parameters include current environmental temperature, pH value, and total surface area of the workpiece loaded by the crane of each processing tank liquid; obtaining current concentration values of specific chemical components of the processing tank liquid through a concentration sensor; wherein the specific chemical components are different for different processing tank liquids, including concentration of hydroxyl ions in the degreasing tank, concentration of hydrogen ions in the pickling tank, and concentration of aluminum ions in the oxidation tank; determining initial concentration control ranges of the specific chemical components of each processing tank liquid based on process requirements; wherein the initial concentration control ranges include upper and lower concentration threshold values set based on different workpiece materials and film thickness requirements; determining consumption rates of specific chemical components in the current processing tank liquid according to the running state parameters, to obtain concentration change trend values; dynamically adjusting the initial concentration control ranges based on the concentration change trend values, to obtain concentration control threshold values; obtaining control data according to the current concentration values and the concentration control threshold values; wherein the control data is used to instruct a metering pump to supplement the processing tank liquid or a drain valve to drain part of the processing tank liquid.

[0007] The metal full-automatic oxidation processing production line control method provided in the application obtains running state parameters of the production line in real time, obtains current concentration values of specific chemical components of the processing tank liquid through a concentration sensor, determines initial concentration control ranges of the specific chemical components of each processing tank liquid based on process requirements, determines consumption rates of specific chemical components in the current processing tank liquid according to the running state parameters, to obtain concentration change trend values, dynamically adjusts the initial concentration control ranges based on the concentration change trend values, to obtain concentration control threshold values, and then obtains control data according to the current concentration values and the concentration control threshold values, thereby solving the problem that an oxidation process cannot form a uniform film layer due to insufficient activity of the tank liquid and imbalance of actual components of the tank liquid.

[0008] In a second aspect, the embodiments of the application provide a metal full-automatic oxidation processing production line control device, which comprises: an obtaining unit, configured to obtain running state parameters of the production line in real time; wherein the running state parameters include current environmental temperature, pH value, and total surface area of the workpiece loaded by the crane of each processing tank liquid; a first determining unit, configured to obtain current concentration values of specific chemical components of the processing tank liquid through a concentration sensor; wherein the specific chemical components are different for different processing tank liquids, including concentration of hydroxyl ions in the degreasing tank, concentration of hydrogen ions in the pickling tank, and concentration of aluminum ions in the oxidation tank; The second determining unit is configured to determine an initial concentration control range of the specific chemical component of each of the processing tank solutions based on process requirements, wherein the initial concentration control range comprises an upper concentration threshold and a lower concentration threshold set based on different workpiece materials and film thickness requirements. The third determining unit is configured to determine a consumption rate of the specific chemical component in the current processing tank solution according to the operation state parameters, and obtain a concentration change trend value. The processing unit is configured to dynamically adjust the initial concentration control range based on the concentration change trend value, and obtain a concentration control threshold. The result unit is configured to obtain control data according to the current concentration value and the concentration control threshold, wherein the control data is used to instruct a metering pump to supplement the processing tank solution or a drain valve to drain part of the processing tank solution.

[0009] In a third aspect, an embodiment of the present application provides a metal full-automatic oxidation treatment production line, including a memory, a processor, and a computer program stored in the memory and executable on the processor, and when the computer program is executed by the processor, the method in any one of the above first aspect is implemented.

[0010] In a fourth aspect, an embodiment of the present application provides a computer program product, when the computer program product is executed on a metal full-automatic oxidation treatment production line, the metal full-automatic oxidation treatment production line executes the metal full-automatic oxidation treatment production line control method in any one of the above first aspect.

[0011] It can be understood that the beneficial effects of the above-mentioned second aspect to the fourth aspect can be referred to the related description in the above-mentioned first aspect, and will not be repeated here. BRIEF DESCRIPTION OF DRAWINGS

[0012] In order to more clearly illustrate the technical solutions in the embodiments of the present application, the following will briefly introduce the drawings needed to be used in the embodiments or prior art description. Obviously, the drawings in the following description are only some embodiments of the present application, and other drawings can be obtained by those skilled in the art without creative labor.

[0013] Figure 1 is a flowchart of a metal full-automatic oxidation treatment production line control method provided by an embodiment of the present application; Figure 2 is an implementation flowchart of step S400 in the metal full-automatic oxidation treatment production line control method provided by an embodiment of the present application; Figure 3is a flowchart of implementation of step S430 in the metal full-automatic oxidation treatment production line control method provided by an embodiment of the present application; Figure 4 is a flowchart of implementation of step S600 in the metal full-automatic oxidation treatment production line control method provided by an embodiment of the present application; Figure 5 is a structural diagram of the metal full-automatic oxidation treatment production line control device provided by an embodiment of the present application; Figure 6 is a structural diagram of the metal full-automatic oxidation treatment production line control device provided by an embodiment of the present application. DETAILED DESCRIPTION

[0014] In the following description, specific details are set forth, such as particular system configurations, techniques, etc., in order to provide a thorough understanding of the embodiments of the present application. However, persons skilled in the art will understand that the present application can be practiced without these specific details. In other instances, well-known structures, devices, circuits, and methods have not been described in detail in order to avoid obscuring the description of the present application.

[0015] It should be understood that the term "comprises" as used in the specification and the appended claims indicates the presence of the described features, integers, steps, operations, elements, and / or components, but does not preclude the presence or addition of one or more other features, integers, steps, operations, elements, components, and / or groups thereof.

[0016] It should also be understood that the term "and / or" as used in the specification and the appended claims indicates any combination of one or more of the associated listed items and all possible combinations of those items.

[0017] As used in the specification and the appended claims, the term "if" can be interpreted as meaning "when" or "upon" or "in response to a determination" or "in response to a detection" depending on the context. Similarly, the phrase "if determined" or "if detected [the described condition or event]" can be interpreted as meaning "upon a determination" or "in response to a determination" or "upon a detection [of the described condition or event]" or "in response to a detection [of the described condition or event]" depending on the context.

[0018] In addition, in the description of the specification and the appended claims, the terms "first", "second", "third", etc. are only used for differentiation in description, and cannot be understood as indicating or implying relative importance.

[0019] Reference within the specification of this application to "one embodiment" or "some embodiments" means that a particular feature, structure, or characteristic described in connection with the embodiment is included in at least one embodiment of the application. The appearances of the phrase "in one embodiment" or "in some embodiments" in various places within specifications are not necessarily all referring to the same embodiment, however, are meant to signify that "one or more, but not all embodiments" of the application so described are contemplated to develop the application. The terms "including," "comprising," "having," and variations thereof, are meant to encompass the items listed thereafter and equivalents thereof as well as additional items.

[0020] In the related art, the methods for realizing bath liquid concentration control mainly include two types of traditional manual control and early automatic control, that is, traditional manual control and early automatic control. For the traditional manual control, an operator takes a sample every 2-4 hours, detects the concentration by titration, and then manually operates a metering pump or a liquid discharge valve for adjustment. This method has obvious hysteresis, and the concentration deviation within the sampling interval has exceeded the process allowable range (usually ±5%). The operation error of manual detection can cause a concentration control error of 8%-12%. In addition, frequent manual intervention reduces the automation rate of the production line to below 60%, which not only increases labor costs, but also easily causes batch rejection of workpieces due to operation errors. For the early automatic control, a single concentration threshold is set based on fixed process parameters (for example, the concentration of hydroxyl ions in the degreasing tank is fixed at 0.8-1.2 mol / L), and a simple on-off control is realized by an actuator. For example, in a high-temperature environment, the generation rate of aluminum ions in the oxidation tank increases by 50%, and the fixed threshold cannot be timely adapted, resulting in concentration exceeding the standard. At the same time, it does not adjust the control range for different workpiece materials (such as aluminum alloy and magnesium alloy) and different film thickness requirements (such as 5 μm and 15 μm oxidation film), resulting in a product qualification rate fluctuation of more than 15% in multi-species production, which cannot meet the high-quality production demand.

[0021] In addition, the fixed control threshold cannot adapt to the dynamic changes of the working conditions in the production process. For example, when a large number of workpieces enter the tank under the load of a traveling crane, the chemical reaction rate increases rapidly, and the fixed threshold control cannot supplement sufficient chemicals in time, which may cause the concentration to be too low instantaneously. An increase in environmental temperature will accelerate the evaporation of the solvent, resulting in an increase in the concentration of the components, and the fixed threshold control may trigger unnecessary liquid discharge, which not only wastes chemicals but also may introduce new fluctuations. In addition, different materials of workpieces (such as aluminum alloy and magnesium alloy) or different film thickness requirements have different requirements for the optimal process window, and the fixed threshold lacks flexibility and is difficult to achieve fine management.

[0022] Specifically, the applicant also knows whether the concentration control scheme of the chemical reaction kettle, electroplating production line and the like can be applied to the scene. It is found through research that for a closed chemical reaction kettle with relatively stable reaction conditions, its concentration control mostly depends on complex model predictive control (MPC), but the calculation is complex, the sensor precision requirement is extremely high and the cost is high, and it is difficult to be directly transplanted to the open tank body and the oxidizing production line with variable working conditions. For the electroplating production line, the bath composition and consumption mode are relatively more stable, and there is a significant difference from the oxidation treatment (especially the pickling and oxidation of exothermic or volatile bath), the control strategy focus and technical means are not completely the same, so it cannot be applied.

[0023] To solve the above problems, the embodiments of the present application provide a metal full-automatic oxidation treatment production line and a control method and device thereof. In the method, the running state parameters of the production line are obtained in real time; the current concentration value of a specific chemical component of the treatment bath is obtained through monitoring by a concentration sensor; the initial concentration control range of the specific chemical component of each treatment bath is determined based on process requirements, and the initial concentration control range can be determined according to the real-time monitoring data to lay a foundation for subsequent treatment; the consumption rate of the specific chemical component in the current treatment bath is determined according to the running state parameters to obtain a concentration change trend value; the initial concentration control range is dynamically adjusted based on the concentration change trend value to obtain a concentration control threshold value, and then the control data is obtained according to the current concentration value and the concentration control threshold value, which can solve the problem that the oxidation process cannot form a uniform film layer due to insufficient activity of the bath and imbalance of the actual composition of the bath.

[0024] The metal full-automatic oxidation treatment production line control method provided by the embodiments of the present application can be applied to the metal full-automatic oxidation treatment production line. At this time, the metal full-automatic oxidation treatment production line is the execution subject of the metal full-automatic oxidation treatment production line control method provided by the embodiments of the present application, and the embodiments of the present application do not make any limitation on the specific type of the metal full-automatic oxidation treatment production line.

[0025] For example, the metal full-automatic oxidation treatment production line includes control devices, treatment tank bodies, crane systems, concentration sensors, metering pumps, liquid discharge valves, and the like. The treatment tank bodies are the basis of the production line and include degreasing tanks, pickling tanks, oxidation tanks, and the like. Each tank body is designed with a specific volume and structure according to process requirements to accommodate tank liquid of different compositions and complete corresponding treatment processes. The tank bodies are connected through pipelines and valves to enable circulation and renewal of the tank liquid. The crane system is responsible for moving the workpieces to be treated between the various treatment tank bodies, and the load capacity and running stability of the crane system directly affect the treatment efficiency and product quality of the production line. The crane system is usually equipped with precise positioning devices and speed control devices to enable the workpieces to accurately and smoothly enter and exit the various tank bodies. The positioning devices and speed control devices can be motor encoders, laser range finders, or high-precision servo control systems, but are not limited thereto. The crane system can be a single-beam crane, a double-beam crane, or a semi-door crane, and the like. The structure of the single-beam crane can be that one main beam spans above the production line, the crane trolley moves laterally along the main beam, the end beams at both ends of the main beam are connected with the workshop track to realize longitudinal movement, and the lifting mechanism is installed below the trolley. The single-beam crane has a small occupation of the workshop space, a low main beam height, and a lower manufacturing cost than the double-beam crane, and is suitable for small and medium-sized workpieces (load ≤ 10 tons) and production lines with regular tank body arrangement.

[0026] The concentration sensor is a component for real-time monitoring of the concentration of specific chemical components in the treatment tank liquid and can be installed in each treatment tank body. The concentration sensor is in communication connection with the control device and transmits the real-time monitoring concentration data to the control device for analysis and processing. The metering pump and the liquid discharge valve are devices for executing control data. The metering pump accurately supplements the treatment tank liquid according to the control data to keep the concentration of specific chemical components in the tank liquid within a suitable range. The control device can be a tablet computer, a notebook computer, a netbook, a desktop computer, a smart screen, a computing device, or other processing devices connected to a wireless modem, a computer, and the like.

[0027] To better understand the metal full-automatic oxidation treatment production line control method provided by the embodiments of the present application, the specific implementation process of the metal full-automatic oxidation treatment production line control method provided by the embodiments of the present application is exemplarily introduced below.

[0028] Figure 1 A schematic flowchart of the metal full-automatic oxidation treatment production line control method provided by the embodiments of the present application is shown. The metal full-automatic oxidation treatment production line control method includes: S100, acquiring real-time running state parameters of the production line; wherein the running state parameters include current environmental temperature, pH value of each processing tank liquid, and total surface area of the workpieces loaded on the crane.

[0029] It can be understood that real-time acquisition refers to continuous data collection at fixed time intervals (e.g., once every 5 seconds); environmental temperature refers to the real-time air temperature of the workshop where the processing tank liquid is located (which affects the solvent evaporation rate), pH value refers to the acidity or alkalinity of the tank liquid (which indirectly reflects the concentration of specific ions, for example, if the pH value of the alkaline degreasing tank is high, the concentration of hydroxyl ions is high), and the total surface area of the workpieces loaded on the crane refers to the total surface area of all workpieces to be processed on the crane hook (which affects the consumption rate of tank liquid components).

[0030] For example, the environmental temperature can be acquired by installing a digital temperature sensor (e.g., a PT100 platinum resistance sensor) 1 meter above the degreasing tank, pickling tank, and oxidation tank, and connecting the sensor to the control device for automatic temperature data collection (e.g., 25°C, 28°C) once every 5 seconds. The pH value can be acquired by inserting a pH electrode sensor (e.g., a glass electrode pH meter) into each processing tank liquid, and the sensor detects the pH value of the tank liquid in real time (e.g., degreasing tank pH = 13, pickling tank pH = 1.5). The total surface area of the workpieces loaded on the crane can be acquired by first retrieving the single workpiece parameters (work parameters can include length, width, and height) from the production order, then obtaining the number of loaded workpieces (e.g., 5 pieces) through the workpiece counter on the crane, and finally calculating the total surface area by multiplying the single surface area (e.g., 1.6㎡ for an aluminum alloy workpiece with dimensions of 1m x 0.5m x 0.2m) by the number of workpieces.

[0031] By acquiring the three types of parameters in real time, the system provides basic data for subsequent calculation of concentration consumption rate and evaporation rate, avoiding misjudgment of concentration trends due to missing parameters. At the same time, the total surface area is directly related to the consumption of tank liquid components by the workpieces, improving the accuracy of consumption rate calculation.

[0032] S200, obtaining the current concentration value of a specific chemical component in the processing tank liquid through a concentration sensor; wherein the specific chemical component includes different processing tank liquids, such as the concentration of hydroxyl ions in the degreasing tank, the concentration of hydrogen ions in the pickling tank, and the concentration of aluminum ions in the oxidation tank.

[0033] It can be understood that the concentration sensor is a special detection device for specific ions (e.g., ion-selective electrode sensor), which can directly output ion concentration data; the specific chemical component is the key ion that determines the processing effect of the tank liquid, the hydroxyl ions in the degreasing tank are responsible for removing oil stains from the workpieces, the hydrogen ions in the pickling tank are responsible for removing scale, and high concentration of aluminum ions in the oxidation tank can affect the quality of the oxidation film.

[0034] Exemplarily, a hydroxyl ion selective electrode sensor is installed in the degreasing tank, which can output hydroxyl ion concentration data in real time, for example, the current detected hydroxyl ion concentration in the degreasing tank is 1.2 mol / L; a hydrogen ion selective electrode sensor is installed in the pickling tank to obtain the hydrogen ion concentration in the pickling tank in real time, for example, the detected hydrogen ion concentration is 0.01 mol / L; an aluminum ion selective electrode sensor is installed in the oxidation tank to monitor the aluminum ion concentration in the oxidation tank, for example, the current aluminum ion concentration is 0.5 mol / L, and then the current concentration values of the key ions in the tank liquids of the processing tanks can be obtained.

[0035] In a possible implementation, S200, the degreasing tank, the pickling tank and the oxidation tank all have tank liquid circulating pipelines, and the current concentration values of the specific chemical components of the processing tanks are obtained by monitoring through the concentration sensors, including: S210, the concentration sensors are arranged at the outlets of the tank liquid circulating pipelines of the degreasing tank, the pickling tank and the oxidation tank to monitor and obtain concentration data.

[0036] It can be understood that the outlet of the tank liquid circulating pipeline refers to the pipeline position after the tank liquid flows out of the tank body and before entering the circulating pump (for example, the circulating outlet pipe at the right bottom of the degreasing tank); at this position, the tank liquid is more uniform due to the circulating stirring, and local concentration deviation in the tank (for example, concentration deviation caused by impurities at the bottom of the tank) is avoided.

[0037] Exemplarily, the concentration data can be obtained by cutting an installation hole with a diameter matching the sensor probe at the outlet of the circulating pipeline of each tank (for example, 20 mm), and then installing the sensor to obtain the concentration data through the monitoring of the sensor; wherein, the sensor installation can be inserting the probe of the concentration sensor into the pipeline from the installation hole, fixing the probe with a sealing rubber ring so that the probe completely contacts the tank liquid, fixing the sensor cable along the pipeline, and connecting the sensor to the control device in communication. For example, the monitoring of the sensor can be that after starting the circulating pump (so that the tank liquid continuously circulates), the sensor collects the ion concentration raw signal (for example, the hydroxyl sensor outputs 250 mV) of the tank liquid in the pipeline once every 5 seconds, and the concentration data is obtained according to the ion concentration raw signal.

[0038] S220, processing according to the monitored concentration data to obtain the current concentration value.

[0039] Exemplarily, the monitored concentration data is subjected to outlier rejection, calibration conversion, and then current concentration value is obtained after temperature compensation; wherein, the outlier rejection can be to view the original data (for example, 250mV, 252mV, 500mV of the hydroxyl sensor), judge 500mV exceeding the normal range (for example, 200-300mV) as an outlier, and be rejected (due to temporary contact of the sensor with impurities). The calibration conversion can be to call the standard curve table (for example, the millivolt value mol / L corresponding table of hydroxyl ion, that is, 200mV=0.8mol / L, 250mV=1.0mol / L, 300mV=1.2mol / L) pre-stored in the system, and convert the remaining original data (250mV, 252mV) into concentration value (1.0mol / L, 1.02mol / L). The temperature compensation can be to call the current environmental temperature (25℃) of step S100, if the sensor standard curve is calibrated based on 25℃, no compensation is needed; if the temperature is 28℃, the final average current concentration value is obtained by correcting according to the sensor manual; for example, the correction is that the concentration value is corrected by +0.01mol / L for every 1℃ increase in temperature.

[0040] In this way, the error of the original signal (for example, outliers, temperature influence) is eliminated through data processing, and the accurate current concentration value is obtained, avoiding the concentration deviation caused by directly using the original data.

[0041] S300, determining the initial concentration control range of the specific chemical component of each treatment tank liquid based on the process requirements; wherein, the initial concentration control range includes the upper limit threshold and the lower limit threshold of the concentration set based on different workpiece materials and film thickness requirements.

[0042] For example, in the case of oxidation treatment of aluminum alloy workpieces, if the process requires the formation of a 5 μm oxide film, the initial concentration control range of aluminum ions in the oxidation tank is set to 0.3-0.7 mol / L (the lower threshold value of 0.3 mol / L ensures reaction activity, and the upper threshold value of 0.7 mol / L prevents film porosity); if magnesium alloy workpieces are treated and a 15 μm oxide film is required, the initial concentration control range of aluminum ions in the oxidation tank needs to be adjusted to 0.2-0.5 mol / L (the lower limit is lowered to avoid excessive corrosion, and the upper limit is lowered to prevent film brittleness) due to the higher reaction activity of magnesium alloy. At the same time, the initial concentration control range of hydroxide ions in the degreasing tank is set according to the degree of oil contamination of the workpiece, for example, heavy oil contamination of the workpiece is set to 1.0-1.5 mol / L (high concentration to enhance decontamination), and light oil contamination of the workpiece is set to 0.8-1.2 mol / L (low concentration to reduce workpiece corrosion); the initial concentration control range of hydrogen ions in the pickling tank is set according to the thickness of the oxide skin, for example, thick oxide skin workpieces are set to 0.02-0.05 mol / L (high concentration to accelerate decontamination), and thin oxide skin workpieces are set to 0.01-0.03 mol / L (low concentration to prevent over-pickling). By differentiating the initial concentration control range according to different workpiece materials (aluminum alloy / magnesium alloy) and film thickness requirements (5 μm / 15 μm), the composition of the tank solution under each working condition can always be in the best process window, and the problem of fluctuation in the qualified rate caused by traditional fixed threshold values can be solved.

[0043] S400, determining the consumption rate of a specific chemical component in the current treatment tank solution according to the operating state parameters, to obtain a concentration change trend value.

[0044] It can be understood that the consumption rate refers to the amount of a specific component consumed per unit time due to workpiece reaction (for example, 0.05 mol / h); the concentration change trend value refers to the net change in concentration per unit time, which needs to be calculated in combination with the consumption rate (which causes a decrease in concentration) and the evaporation rate (which causes an increase in concentration), and reflects the future change direction of the concentration.

[0045] For example, according to the total surface area of the workpiece under the crane load, the ambient temperature, the pH value and the current concentration of the hydroxyl ion, the current consumption rate and the evaporation rate are obtained, and then the concentration trend value is calculated by the evaporation rate and the consumption rate. Specifically, taking the treatment of aluminum alloy workpieces in the degreasing tank as an example, for example, the total surface area of the workpiece under the crane load is 8 m2 (5 pieces x 1.6 m2 / piece), the ambient temperature is 25℃, the pH value is 13, and the current concentration of the hydroxyl ion is 1.2 mol / L. According to the process requirements, the hydroxyl ion consumption rate empirical model of the aluminum alloy workpiece degreasing can be 0.02 mol / (h·㎡), then the current consumption rate is 0.02 mol / (h·㎡) x 8 m2 = 0.16 mol / h, and the evaporation rate is 0.005 mol / h, so the concentration trend value = evaporation rate - consumption rate = 0.005 mol / h - 0.16 mol / h = -0.155 mol / h (negative value indicates that the concentration is decreasing). Similarly, when the thick oxide skin workpiece is treated in the pickling tank, the hydrogen ion consumption rate model can be 0.003 mol / (h·㎡), and if the total surface area of the workpiece under the crane load is 10 m2, the consumption rate is 0.003 mol / (h·㎡) x 10 m2 = 0.03 mol / h; If the evaporation rate is determined to be 0.008 mol / h when the ambient temperature is 30℃, then the concentration trend value = 0.008 mol / h - 0.03 mol / h = -0.022 mol / h. When the magnesium alloy workpiece is treated in the oxidation tank, the aluminum ion consumption rate model can be 0.015 mol / (h·㎡), and if the total surface area of the workpiece under the crane load is 6 m2, then the consumption rate = 0.015 mol / (h·㎡) x 6 m2 = 0.09 mol / h; If the evaporation rate is determined to be 0.003 mol / h when the ambient temperature is 28℃, then the concentration trend value 0.003 mol / h - 0.09 mol / h = -0.087 mol / h. By combining the workpiece surface area (reflecting the reaction consumption), the ambient temperature (affecting the evaporation) and the current concentration, the concentration trend value of each tank liquid can be accurately calculated, which provides a basis for dynamically adjusting the control threshold value and avoids the problem that the traditional fixed threshold value cannot adapt to the working condition changes.

[0046] In one possible implementation, please refer to Figure 2 , S400, determining the consumption rate of a specific chemical component in the current processing tank liquid according to the operating state parameters, to obtain the concentration trend value, comprising: S410, obtaining the theoretical consumption rate of the specific chemical component according to the total surface area of the workpiece under the crane load and the unit area reaction consumption of the workpiece in the corresponding tank liquid.

[0047] Exemplarily, the theoretical consumption rate is obtained by obtaining the total surface area and the unit area consumption, and then calculating according to the total surface area and the unit area consumption. The unit area consumption can be obtained by consulting a manual, and the unit area consumption of hydroxyl ions of the aluminum alloy workpiece in the 50℃ degreasing tank is 0.006 mol / m2·h. The theoretical consumption rate can be obtained by the product of the total surface area and the unit area consumption, that is, X mol of hydroxyl ions is consumed by the workpiece per hour.

[0048] S420, determining a theoretical evaporation rate based on the ambient temperature and the solvent evaporation constant.

[0049] It can be understood that the solvent evaporation constant refers to the evaporation rate benchmark of the tank liquid solvent (for example, the degreasing tank solvent is water) under standard conditions (20℃, 1atm) (for example, 0.02L / (h·℃), which means that for every 1℃ increase in temperature, 0.02L is evaporated per hour); the theoretical evaporation rate refers to the volume of solvent evaporated per unit time, and the higher the temperature, the faster the evaporation.

[0050] Exemplarily, the theoretical evaporation rate is obtained by determining the solvent evaporation constant, and then determining the temperature difference and the additional evaporation amount to obtain the theoretical evaporation rate. The solvent evaporation constant can be obtained by consulting a solvent evaporation characteristic table or experiment, that is, the evaporation constant of water under normal pressure is 0.015L / (h·℃), and the evaporation rate under standard 20℃ is 0.3L / h. The temperature difference can be determined by the difference between the current temperature and the standard temperature; the additional evaporation amount can be obtained according to the product of the temperature difference and the evaporation constant; and the theoretical evaporation rate can be obtained by summing the standard evaporation rate and the additional evaporation amount.

[0051] In one possible implementation, please refer to Figure 2 , S420, determining a theoretical evaporation rate based on the ambient temperature and the solvent evaporation constant, comprising: S421, obtaining the real-time airflow speed of the processing tank liquid surface.

[0052] Exemplarily, the real-time airflow speed of the processing tank liquid surface can be obtained by installing an air speed sensor above the tank liquid surface. The sensor can monitor and output the airflow speed data at the liquid surface in real time, for example, the current detected liquid surface airflow speed is 0.5m / s. Since the airflow speed affects the evaporation rate of the tank liquid surface, the faster the airflow speed, the faster the evaporation generally.

[0053] S422, determining an evaporation rate mapping table based on the ambient temperature, the airflow speed and the solvent evaporation constant; wherein the evaporation rate mapping table is established according to experimental data, and is used to reflect the evaporation rate relationship under different ambient temperatures, airflow speeds and solvent evaporation constants.

[0054] Exemplarily, the evaporation rate mapping table is a two-dimensional table, i.e., the horizontal axis is temperature, the vertical axis is airflow speed, and the cell is evaporation rate. For example, the evaporation rate mapping table can be established by experiment. The establishment process can be as follows: under the conditions of different environmental temperatures (such as 20℃, 25℃, 30℃, etc.), different airflow speeds (such as 0.1m / s, 0.5m / s, 1m / s, etc.), and known solvent evaporation constants, the evaporation rate of the tank liquid is measured, and then a corresponding relationship table between environmental temperature, airflow speed, solvent evaporation constant, and evaporation rate, i.e., the evaporation rate mapping table, is established. For example, when the environmental temperature is 25℃, the airflow speed is 0.5m / s, and the solvent evaporation constant is 0.015L / (h·℃), the corresponding evaporation rate is 0.35L / h, and these data are recorded in the mapping table. Through the mapping table, when the mapping table is obtained, the control device can quickly query the corresponding evaporation rate by only inputting the current environmental temperature, airflow speed, and known solvent evaporation constant. In addition, other evaporation rate mapping tables can also be determined according to the environmental temperature, airflow speed, and solvent evaporation constant.

[0055] S423, determining the theoretical evaporation rate according to the evaporation rate mapping table.

[0056] Exemplarily, the environmental temperature 10cm above the processing tank opening can be measured by using a temperature sensor (the precision can be ±0.5℃), the relative humidity at the same position can be measured by using a humidity sensor (the precision can be ±3% RH), the wind speed at the center of the tank opening can be measured by using a wind speed sensor (the precision can be ±0.1m / s), the tank liquid surface area is calculated, and the corresponding value in the evaporation rate mapping table is located. If the corresponding evaporation rate in the table is 0.5L / h for this combination, it is determined that the current theoretical evaporation rate is 0.5L / h. If there is a slight deviation between the actual factors and the data in the table, the theoretical evaporation rate is calculated according to the linear interpolation rule mentioned in the table (for example, the evaporation rate increases by 0.02L / h under the humidity and wind speed when the temperature increases by 1℃, so the evaporation rate at 25.2℃ is 0.5L / h+0.02L / h×0.2=0.504L / h).

[0057] S430, obtaining the concentration change trend value of the specific chemical component according to the theoretical consumption rate and the theoretical evaporation rate.

[0058] It can be understood that the theoretical consumption rate refers to the rate (the unit is usually g / h or mg / min) at which a specific chemical component (for example, phosphate in phosphating solution or zinc ion in plating solution) is consumed when the workpiece reacts with the processing tank liquid, which is determined by process parameters such as workpiece processing amount and reaction equivalent ratio; the concentration change trend value refers to the change direction (increasing / decreasing / unchanged) and specific change amplitude (the unit is usually mg / L·h) of the concentration of the specific chemical component per unit time (such as per hour).

[0059] For example, the concentration trend value of the specific chemical component can be determined by obtaining the theoretical consumption rate, taking the theoretical evaporation rate, measuring the current total volume of the tank liquid by the liquid level sensor, sampling and detecting the current concentration of the specific chemical component to calculate the total mass of the specific chemical component, obtaining the influence of consumption on the concentration and the influence of evaporation on the concentration, and superimposing the two.

[0060] In this way, the actual concentration change rule can be comprehensively reflected by considering the theoretical consumption rate and the theoretical evaporation rate, the trend misjudgment can be avoided, the concentration change direction and amplitude can be determined, the precise basis can be provided for subsequent dynamic adjustment of the concentration control range, and the concentration control can be adapted to the actual process requirements.

[0061] In one possible implementation, refer to Figure 3 S430, obtaining the concentration trend value of the specific chemical component according to the theoretical consumption rate and the theoretical evaporation rate, including: S431, obtaining the reduction amount of the specific chemical component per unit time caused by the chemical reaction of the workpiece based on the theoretical consumption rate.

[0062] It can be understood that the chemical reaction of the workpiece refers to the chemical action between the workpiece and the processing tank liquid, which consumes the specific chemical component; and the reduction amount per unit time refers to the mass of the specific chemical component reduced per hour (or per minute) due to the reaction.

[0063] For example, the theoretical consumption rate is obtained according to the reaction consumption amount of the workpiece per unit area in the specific tank liquid, and the theoretical consumption rate represents the reduction amount of the specific chemical component per unit time caused by the chemical reaction of the workpiece; if it needs to be converted into mass unit, the molar mass of the chemical component can be further multiplied to obtain the mass reduced per hour (or per minute).

[0064] S432, obtaining the concentration increase amount of the specific chemical component per unit time caused by the volume reduction of the processing tank liquid due to solvent evaporation based on the theoretical evaporation rate.

[0065] It can be understood that the concentration increase amount refers to the numerical value (such as grams / liter / hour) of the concentration of the specific chemical component rising per unit time after the volume of the tank liquid is reduced due to solvent evaporation.

[0066] Exemplarily, the environmental temperature, the tank liquid surface area and other parameters are collected by the sensor, and the theoretical evaporation rate is calculated by combining the evaporation rate calculation formula. For example, the initial tank liquid volume is 100 liters, the total mass of the specific chemical component is 500 grams (the initial concentration is 5 grams / liter), and after 1 hour, the volume is reduced by 0.5 liters due to evaporation (99.5 liters), at this time, the total mass of the specific chemical component does not change (still 500 grams), and the concentration becomes 500 ÷ 99.5 ≈ 5.025 grams / liter, so the concentration increase per unit time (1 hour) is 5.025-5=0.025 grams / liter·hour.

[0067] S433, obtaining the comprehensive value of the net change amount of the specific chemical component per unit time according to the reduction amount per unit time and the concentration increase per unit time.

[0068] It can be understood that the comprehensive value of the net change amount refers to the actual change value of the concentration of the specific chemical component per unit time.

[0069] Exemplarily, if the specific chemical component is reduced (the reduction amount is negative) per unit time due to the chemical reaction of the workpiece, and the concentration is increased due to the evaporation of the solvent, the comprehensive value of the net change amount is obtained by adding the reduction amount of the specific chemical component and the concentration increase, and by calculating the comprehensive value, the change direction and amplitude of the concentration can be accurately quantified, providing a quantitative basis for dynamically adjusting the control parameters. For example, when the comprehensive value is -0.05 grams / liter·hour, the system can predict that the concentration will drop to the lower limit of the control 0.5 hours in advance, so as to trigger the operation of adding the reagent, thereby avoiding the fluctuation of the processing quality caused by the too low concentration. Compared with the judgment based on the relevant experience, the quantitative analysis method can improve the concentration control accuracy and the process stability.

[0070] S434, determining the concentration change trend value according to the comprehensive value.

[0071] Exemplarily, when the concentration change trend value is determined according to the comprehensive value, if the comprehensive value is positive, it indicates that the concentration of the specific chemical component is rising, at this time, the operation of reducing the reagent addition or increasing the drainage is triggered to prevent the concentration from being too high; if the comprehensive value is negative, it indicates that the concentration of the specific chemical component is decreasing, and the operation of adding the reagent is triggered to maintain the concentration within the optimal process window; if the comprehensive value is close to zero, it indicates that the current concentration change is relatively stable, and the existing operation parameters are maintained. Through this method of dynamically determining the concentration change trend value according to the comprehensive value, the precise control of the tank liquid concentration can be realized, and the processing quality and stability of the metal full-automatic oxidation treatment production line can be effectively improved.

[0072] S500, dynamically adjusting the initial concentration control range based on the concentration change trend value to obtain the concentration control threshold.

[0073] Exemplarily, when the initial concentration control range is dynamically adjusted based on the concentration change trend value, the concentration change trend value is compared with the initial concentration control range. If the trend value shows that the concentration will continue to rise and approach the initial upper limit, the upper limit of the concentration control threshold is lowered, for example, from 5.0 g / L to 4.8 g / L, and the detection period is shortened to 10 minutes / time; if the trend value shows that the concentration will continue to decrease and approach the initial lower limit, the lower limit of the concentration control threshold is raised, for example, from 3.0 g / L to 3.2 g / L. During the dynamic adjustment process, the trend value is weighted and smoothed by combining historical data to avoid misadjustment caused by instantaneous fluctuations. For example, when the trend value is -0.05 g / L·h is detected for three times in succession, it is confirmed that the concentration decreasing trend is valid, and at this time the initial control range [3.0, 5.0] g / L is dynamically adjusted to [3.2, 4.8] g / L. The dynamic adjustment mechanism enables the concentration control range to adapt to the working condition changes in real time, and compared with the fixed threshold control mode, the concentration fluctuation range can be reduced and the stability of the treatment quality can be improved.

[0074] In a possible implementation, S500, the initial concentration control range is dynamically adjusted based on the concentration change trend value to obtain a concentration control threshold, including: S510, the change of the concentration of the specific chemical component in a unit of time is judged according to the concentration change trend value to obtain change result data; wherein the change result data is used to indicate the change state and amplitude of the concentration in a unit of time.

[0075] Exemplarily, according to the concentration change trend value, if the concentration change trend value is positive and exceeds a preset threshold, it is determined that the concentration presents a rapid rising trend; if the value is negative and lower than the preset threshold, it is determined that the concentration presents a rapid decreasing trend; if the value fluctuates within ±0.01 g / L·h, it is determined that the concentration change is stable. At the same time, the change amplitude value is recorded as the change result data. For example, when the system detects that the concentration change trend value of phosphate ions in a certain tank liquid is -0.04 g / L·h, it can be immediately determined that the concentration of the component is decreasing at a rate of 0.04 g / L per hour, and at this time the change result data is rapid decrease and the amplitude is 0.04 g / L·h.

[0076] S520, the upper limit threshold and the lower limit threshold of the initial concentration control range are adjusted based on the change state and amplitude indicated by the change result data to obtain a modified concentration range; wherein the modified concentration range is obtained after the initial concentration control range is adjusted.

[0077] Exemplarily, when the change result data indicates that the concentration presents a rapid rising trend and a large amplitude, the initial upper concentration threshold is adjusted downward by a certain percentage; if the concentration presents a rapid falling trend, the initial lower concentration threshold is adjusted upward. During the adjustment process, the optimal modification range can be obtained by combining historical concentration data, workpiece processing amount, and bath replacement cycle parameters, so that the modified concentration range can avoid the decline in processing quality caused by concentration exceeding the limit, and reduce the operation cost caused by frequent adjustment. For example, the adjustment amplitude can be calculated by using a weighted average algorithm based on the concentration fluctuation range, the current workpiece processing rate, and the remaining service life of the bath. For example, when the historical data shows that the concentration under similar working conditions rises by 0.2 g / L every 2 hours, the current processing amount causes 0.15 g / L of chemical components to be consumed every hour, and the remaining life of the bath corresponds to a maximum allowable concentration deviation of 0.3 g / L, the optimal modification range of adjusting the upper limit from 5.0 g / L to 4.7 g / L and the lower limit from 3.0 g / L to 3.3 g / L is obtained by comprehensive calculation. This dynamic adjustment mechanism not only considers the real-time working condition changes, but also ensures that the adjustment amplitude is within a safe range through historical data verification, effectively balancing the processing quality stability and operation economy.

[0078] S530, determining a concentration control threshold according to the upper limit and the lower limit of the modified concentration range.

[0079] Exemplarily, the upper limit of the modified concentration range to the lower limit can form a range interval, and the range interval is determined as the concentration control threshold.

[0080] In this way, by dynamically adjusting the initial concentration control range based on the concentration change trend value, the actual change of the bath concentration during the workpiece processing process can be reflected in real time. When the concentration presents a rapid rising trend, the upper concentration threshold is adjusted downward in time, which can prevent the decline in processing quality caused by excessively high concentration; when the concentration presents a rapid falling trend, the lower concentration threshold is adjusted upward in time, which can avoid the impact on processing effect caused by excessively low concentration. Compared with fixed threshold control, this dynamic adjustment method can better adapt to the processing requirements under different working conditions, so that the concentration control range is always within the optimal process window. At the same time, the optimal modification range is determined by combining historical data, workpiece processing amount, and bath replacement cycle parameters, which not only ensures the scientificity of the adjustment, but also improves the stability and reliability of the system.

[0081] S600, obtaining control data according to the current concentration value and the concentration control threshold; wherein the control data is used to instruct the control of the metering pump to supplement the processing bath or the control of the drain valve to discharge part of the processing bath.

[0082] Exemplarily, the control instruction is generated according to the comparison result of the current concentration value and the concentration control threshold value: when it is detected that the current concentration value exceeds the upper limit of the concentration control threshold value, a metering pump start signal is triggered, the concentrated medicament is supplemented into the processing tank according to a preset supplement amount, and the supplement number and time stamp are recorded; when it is detected that the current concentration value is lower than the lower limit of the concentration control threshold value, a drain valve control circuit is activated, part of the tank liquid is discharged at a set drainage rate, and the remaining volume is monitored in real time through a liquid level sensor. For example, when the real-time concentration is 5.2 g / L which exceeds the upper limit of the threshold value 4.8 g / L, the control data includes starting the metering pump, the supplement amount 50 ml, the execution time 14:30:00, etc.; when the concentration decreases to 2.8 g / L which is lower than the lower limit 3.2 g / L, the control instruction of opening the drain valve, the drainage rate 2 L / min, and the duration 3 min is generated.

[0083] In this way, the problem that the oxidation process cannot form a uniform film layer due to insufficient activity of the tank liquid and imbalance of the actual composition of the tank liquid can be solved, so as to improve the quality of metal oxidation treatment, avoid the subjectivity and hysteresis of manual judgment, and improve the consistency and traceability of operation through quantitative control instruction.

[0084] In a possible implementation, please refer to Figure 4 , S600, control data is obtained according to the current concentration value and the concentration control threshold value, including: S610, the current concentration value is compared with the concentration control threshold value, and first comparison data is generated when the current concentration value continuously falls below the lower limit of the concentration control threshold value; wherein the first comparison data includes the type of medicament to be supplemented, the supplement amount calculated based on the concentration deviation amount, and is converted into the pulse frequency and duration of controlling the start of the metering pump, and the current concentration value is compared with the upper limit and the lower limit of the concentration control threshold value respectively.

[0085] For example, comparing the current concentration value with the concentration control threshold can be understood as comparing the current concentration value with the upper and lower limits of the concentration control threshold separately. This can be understood as comparing the current concentration with the upper limit and the current concentration with the lower limit. When the current concentration value is consistently lower than the lower limit of the concentration control threshold, the type of drug solution that needs to be replenished is identified. Then, based on the concentration deviation, i.e., the difference between the current concentration value and the lower limit of the threshold, combined with the tank liquid volume and the content of the active ingredient of the drug, the dosage of the drug to be replenished is calculated using the formula: replenishment amount = deviation amount × tank liquid volume ÷ active ingredient content of the drug. The calculation results can be converted into metering pump control parameters by converting the 80ml replenishment volume into 800 pulses based on the pump's flow characteristics (e.g., 0.1ml discharged per pulse); combined with the pump's maximum operating frequency (e.g., 20Hz), the pulse frequency is set to 15Hz to avoid overload, and replenishment is performed based on the duration (e.g., 800 pulses ÷ 15Hz ≈ 53.3 seconds); at the same time, the current concentration value is compared with the upper and lower thresholds respectively. If the current concentration is lower than the lower limit and does not exceed the upper limit, only the replenishment operation is triggered; if it has exceeded the upper limit, the drainage operation is performed first.

[0086] S620, control data is obtained based on the first comparison data.

[0087] For example, when generating control data based on the first comparison data, the calculated replenishment amount, pulse frequency, and duration can be integrated into a standard control command. For instance, when the system detects that the current concentration is 2.8 g / L (below the lower threshold of 3.2 g / L), the first comparison data includes the type of phosphate reagent to be replenished, the 80 ml replenishment amount calculated by the formula, the metering pump control parameters converted to 800 pulses, the pulse frequency set to 15 Hz, and the duration of 53.3 seconds.

[0088] In one possible implementation, please refer to Figure 4 S600, the method also includes: S601, when the current concentration value is continuously higher than the upper limit of the concentration control threshold, generate second comparison data. The second comparison data includes the volume of the treatment tank liquid to be discharged, calculated based on the excess concentration and the total amount of treatment tank liquid, and convert it into the opening degree and opening duration of the control drain valve.

[0089] Exemplarily, when it is detected that the current concentration value continuously exceeds the upper limit of the concentration control threshold, for example, the real-time concentration is 5.5 g / L which exceeds the threshold upper limit 4.8 g / L, according to the product of the over-limit concentration (the difference between the current concentration value and the threshold upper limit, i.e. 5.5-4.8=0.7 g / L) and the total amount of treatment bath liquid (such as 100 L), combined with the medicament concentration conversion coefficient (for example, 0.2 L of bath liquid needs to be discharged for each gram of over-limit concentration), the calculated volume of the discharged treatment bath liquid is 0.7*100*0.2=14 L, the calculation result is converted into the drain valve control parameter, according to the flow characteristics of the drain valve (for example, 0.5 L is discharged per second), the opening degree is set to 70% (corresponding to the flow rate 3.5 L / s) and the discharge amount is controlled by the opening time (14 L ÷ 3.5 L / s=4 seconds); at the same time, if the current concentration exceeds the upper limit and is not lower than the lower limit at the same time, the drain operation is preferentially performed to avoid the decrease of the treatment quality caused by the over-high concentration, and the replenishment operation is restored after the concentration falls within the threshold range, thereby effectively solving the membrane layer quality fluctuation problem caused by the over-limit concentration in the related technical method.

[0090] S602, obtaining control data according to the second comparison data.

[0091] Exemplarily, when the control data is generated according to the second comparison data, the calculated volume of the treatment bath liquid to be discharged, the opening degree of the drain valve and the opening time can be integrated into the standard control instruction. For example, when the system detects that the current concentration value is 5.5 g / L (which exceeds the threshold upper limit 4.8 g / L), the second comparison data includes the volume of 14 L of the bath liquid to be discharged, the drain valve control parameter converted into the opening degree of 70%, and the opening time set to 4 seconds. By converting the quantitative relationship between the over-limit concentration and the total amount of the bath liquid into specific valve action, the concentration can be quickly reduced to the safe range, and the imbalance of the bath liquid composition caused by excessive drainage can be reduced. Compared with the fixed-time or fixed-amount drainage method, the dynamic drainage control based on the over-limit amount of the real-time concentration can more accurately maintain the process stability while reducing the need for human intervention.

[0092] In this way, the accuracy and response speed of the concentration control in the metal oxidation treatment process can be improved. By monitoring the current concentration value in real time and comparing it with the dynamically adjusted concentration control threshold, control instructions including parameters such as replenishment amount, pulse frequency, duration, drainage volume, opening degree, opening time, etc. can be obtained. Not only the subjectivity and hysteresis of manual judgment are reduced, but also the consistency and traceability of the operation are improved through standardized instructions. The dynamic adjustment mechanism can be combined with historical data, workpiece treatment amount and bath liquid replacement period, etc. to stably adjust the amplitude and improve the process stability.

[0093] In a possible implementation, after obtaining the control data according to the current concentration value and the concentration control threshold, the method comprises: S610A, when in load operation or the workpiece is being processed in the tank, the execution of the dosing or liquid discharge operation instruction task is suspended, and the generated control data is stored in the suspended queue.

[0094] It can be understood that the load operation or the workpiece being processed in the tank refers to the workpiece being electroplated, cleaned or processed in the tank.

[0095] Exemplarily, when the system detects that the production line is in a load operation state or the workpiece is being processed in a critical processing procedure in the tank, the suspended execution mechanism is triggered. At this time, the control module stores the generated metering pump start instruction or liquid discharge valve opening instruction in the suspended queue, and records the current time stamp and workpiece processing stage identifier. For example, when the concentration exceeds the threshold signal overlaps with the workpiece oxide film formation period, the process continuity is prioritized, the liquid discharge instruction (e.g., the tank liquid needs to be discharged) is delayed for execution, and the suspended instruction is processed within 5 minutes through the queue priority, reducing the workpiece surface film defects caused by immediate operation. The suspended queue can use a first-in, first-out management method to achieve precise matching of instructions and specific workpieces through the workpiece tracking number, so that the concentration adjustment operation can be completed within the process safety window.

[0096] S610B, when it is monitored that it is in an idle, standby or empty state, the control data is extracted from the suspended queue and executed.

[0097] Exemplarily, when it is monitored that the production line is in an idle, standby or empty state, the instruction state in the suspended queue is checked. At this time, according to the queue priority (e.g., the instructions stored first are executed first) and the workpiece processing stage correlation, the suspended metering pump start instruction or liquid discharge valve opening instruction is extracted in turn. For example, if there is a liquid discharge instruction (the tank liquid needs to be discharged) in the suspended queue that was delayed 5 minutes ago due to the workpiece oxide film formation period, the instruction will be automatically executed in the empty state, the liquid discharge valve will be opened to a set opening degree and for a set time to complete the drainage operation, and the actual drainage volume and time stamp will be recorded. At the same time, the queue management module will clear the executed instructions, update the queue state, and enable subsequent instructions to be processed in the order required by the process, i.e., to reduce the operation interference in the critical process and to complete the concentration adjustment within the process safety window, effectively balancing the processing quality and production efficiency.

[0098] In this way, the concentration adjustment is completed during the idle time of the equipment without affecting the workpiece processing, which improves the production continuity, reduces the concentration deviation from the threshold for a long time, and realizes the cooperation of production and control; at the same time, the workpiece surface film defects caused by immediate operation are reduced.

[0099] It should be understood that the size of the serial number of each step in the above embodiments does not mean the order of execution, and the execution order of each process should be determined according to its function and internal logic, and should not constitute any limitation on the implementation process of the embodiments of the present application.

[0100] Corresponding to the metal full-automatic oxidation treatment production line control method described in the above embodiments, the embodiments of the present application also provide a metal full-automatic oxidation treatment production line control system. Each unit of the system can implement each step of the metal full-automatic oxidation treatment production line control method. Figure 5 A structural block diagram of the metal full-automatic oxidation treatment production line control system provided by the embodiments of the present application is shown. For ease of illustration, only the parts related to the embodiments of the present application are shown.

[0101] Referring to Figure 5 The metal full-automatic oxidation treatment production line control device includes: An acquisition unit is configured to acquire the running state parameters of the production line in real time. The running state parameters include the current environmental temperature, pH value, and total surface area of the workpiece carried by the travelling crane of each treatment tank liquid. A first determination unit is configured to obtain the current concentration value of the specific chemical component of the treatment tank liquid through the concentration sensor monitoring. The specific chemical component includes the concentration of hydroxyl ions in the degreasing tank, the concentration of hydrogen ions in the pickling tank, and the concentration of aluminum ions in the oxidation tank. A second determination unit is configured to determine the initial concentration control range of the specific chemical component of each treatment tank liquid based on the process requirements. The initial concentration control range includes the upper concentration threshold and the lower concentration threshold set based on different workpiece materials and film thickness requirements. A third determination unit is configured to determine the consumption rate of the specific chemical component in the current treatment tank liquid according to the running state parameters, and obtain the concentration change trend value. A processing unit is configured to dynamically adjust the initial concentration control range based on the concentration change trend value, and obtain the concentration control threshold. A result unit is configured to obtain control data according to the current concentration value and the concentration control threshold. The control data is used to instruct the control metering pump to supplement the treatment tank liquid or control the drain valve to discharge part of the treatment tank liquid.

[0102] It should be noted that the information interaction, execution process, etc. between the above-mentioned system / units, since based on the same concept as the method embodiments of the present application, the specific functions and the resulting technical effects can be referred to the method embodiments part, and will not be repeated here.

[0103] Those skilled in the art can clearly understand that, for the convenience and brevity of description, only the above-mentioned division of each functional unit and module is exemplified, and in actual application, the above-mentioned functions can be completed by different functional units and modules according to needs, that is, the internal structure of the system is divided into different functional units or modules to complete all or part of the functions described above. Each functional unit and module in the embodiment can be integrated in one processing unit, or each unit can be physically present separately, or two or more units can be integrated in one unit. The integrated unit can be realized in the form of hardware or software. In addition, the specific names of each functional unit and module are only for easy distinction, and do not limit the protection scope of the present application. The specific working process of the unit and module in the system can refer to the corresponding process in the foregoing method embodiment, which will not be described here.

[0104] Figure 6 The structural schematic diagram of the control device provided by an embodiment of the present application is shown in the figure. As shown in the figure, the control device 6 of the embodiment includes at least one processor 60 (only one is shown in the figure), at least one memory 61 (only one is shown in the figure), and a computer program 62 stored in the at least one memory 61 and executable on the at least one processor 60. When the processor 60 executes the computer program 62, the control device 6 implements the steps in any of the above-mentioned various metal full-automatic oxidation treatment production line control method embodiments, or the control device 6 implements the functions of each module / unit in the above-mentioned various system embodiments. Figure 6 Figure 6 Figure 6

[0105] Exemplarily, the computer program 62 can be divided into one or more modules / units, which are stored in the memory 61 and executed by the processor 60 to complete the present application. The one or more modules / units can be a series of computer program instruction segments capable of completing a specific function, which are used to describe the execution process of the computer program 62 in the control device 6.

[0106] The control device 6 can be a desktop computer, a notebook computer, etc. The control device can include, but is not limited to, the processor 60, the memory 61. Those skilled in the art can understand that, Figure 6 The control device 6 is only an example and does not constitute a limitation on the control device 6, and can include more or fewer components than shown, or combine certain components, or different components, for example, can also include input / output devices, network access devices, buses, etc.

[0107] ​​​The processor 60 can be a central processing unit (CPU), and can also be other general-purpose processors, a digital signal processor (DSP), an application specific integrated circuit (ASIC), a field-programmable gate array (FPGA) or other programmable logic devices, discrete gate or transistor logic devices, discrete hardware components, etc. The general-purpose processor can be a microprocessor or the processor can also be any conventional processor.

[0108] The memory 61 can be an internal storage unit of the control device 6 in some embodiments, for example, a hard disk or a memory of the control device 6. The memory 61 can also be an external storage device of the control device 6 in other embodiments, for example, a plug-in hard disk, a smart media card (SMC), a secure digital (SD) card, a flash card, etc. Further, the memory 61 can include both an internal storage unit and an external storage device of the control device 6. The memory 61 is used to store an operating system, an application program, a boot loader, data, and other programs, for example, program codes of the computer program, etc. The memory 61 can also be used to temporarily store data that has been output or will be output.

[0109] The embodiments of the present application further provide a computer readable storage medium, which stores a computer program. The computer program is executed by a processor to implement the steps in any of the above method embodiments.

[0110] The embodiments of the present application provide a computer program product. When the computer program product is run on the metal full-automatic oxidation treatment production line, the metal full-automatic oxidation treatment production line implements the steps in any of the above method embodiments.

[0111] The integrated unit, if implemented in the form of a software function unit and sold or used as an independent product, can be stored in a computer readable storage medium. Based on such understanding, the present application can implement all or part of the processes in the above-mentioned embodiment methods through a computer program to instruct relevant hardware to complete, and the computer program can be stored in a computer readable storage medium. When the computer program is executed by a processor, the steps of each method embodiment described above can be implemented. The computer program includes computer program code, which can be in the form of source code, object code, executable files, or some intermediate forms. The computer readable medium at least includes any entity or device capable of carrying the computer program code to the metal full-automatic oxidation treatment production line, recording medium, computer memory, read-only memory (ROM), random access memory (RAM), electrical carrier signal, telecommunication signal, and software distribution medium. For example, U disk, mobile hard disk, magnetic disk or optical disk, etc.

[0112] In the above embodiments, the description of each embodiment has its own focus, and the parts not described or recorded in detail in a certain embodiment can be referred to the relevant description of other embodiments.

[0113] Those of ordinary skill in the art can understand that the units and algorithm steps of the examples described in combination with the embodiments disclosed herein can be implemented by electronic hardware or a combination of computer software and electronic hardware. Whether the functions are implemented in hardware or software depends on the specific application and design constraints of the technical solution. Professionals can use different methods to implement the described functions for each specific application, but such implementation should not be considered beyond the scope of the present application.

[0114] In the embodiments provided in the present application, it should be understood that the disclosed metal full-automatic oxidation treatment production line control device, metal full-automatic oxidation treatment production line and metal full-automatic oxidation treatment production line control method can be implemented in other ways. For example, the above-described metal full-automatic oxidation treatment production line control device and metal full-automatic oxidation treatment production line embodiments are merely illustrative, for example, the division of the modules or units is only a logical function division, and actual implementation can have another division manner, for example, multiple units or components can be combined or integrated into another system, or some features can be ignored or not executed. In addition, the coupling or direct coupling or communication connection between the displayed or discussed each other can be indirect coupling or communication connection through some interfaces, devices or units, and can be electrical, mechanical or other forms.

[0115] The units described as separate components may or may not be physically separate, and the components displayed as units may or may not be physical units, that is, may be located in one place, or may also be distributed to multiple network units. Part or all of the units can be selected to achieve the purpose of the embodiment scheme according to actual needs.

[0116] The above embodiments are only used to illustrate the technical solutions of the present application, but not limit them; although the present application has been described in detail with reference to the foregoing embodiments, those skilled in the art should understand that the technical solutions recorded in the foregoing embodiments can still be modified, or some technical features can be replaced by equivalents; and these modifications or replacements do not make the essence of the corresponding technical solutions deviate from the spirit and scope of the technical solutions of the embodiments of the present application, and should be included in the protection scope of the present application.

Claims

1. A method for controlling a metal fully automatic oxidation treatment production line, characterized in that, include: The operating status parameters of the production line are acquired in real time; wherein, the operating status parameters include the current ambient temperature, pH value, and total surface area of ​​the workpieces loaded by the crane in each processing tank. The current concentration value of a specific chemical component in the treatment tank solution is obtained by monitoring with a concentration sensor; wherein the specific chemical component is different in the treatment tank solution, including hydroxide ion concentration in the degreasing tank, hydrogen ion concentration in the pickling tank, and aluminum ion concentration in the oxidation tank. The initial concentration control range of the specific chemical components in each of the treatment tank solutions is determined based on process requirements; wherein, the initial concentration control range includes an upper concentration threshold and a lower concentration threshold set based on different workpiece materials and film thickness requirements; The consumption rate of a specific chemical component in the current treatment tank solution is determined based on the operating status parameters, and the concentration change trend value is obtained. The initial concentration control range is dynamically adjusted based on the concentration change trend value to obtain the concentration control threshold. Control data is obtained based on the current concentration value and the concentration control threshold; wherein, the control data is used to instruct the metering pump to replenish the treatment tank liquid or to control the drain valve to discharge part of the treatment tank liquid.

2. The control method for a fully automated metal oxidation production line as described in claim 1, characterized in that, The step of determining the consumption rate of a specific chemical component in the current treatment tank solution based on the operating status parameters, and obtaining the concentration change trend value, includes: The theoretical consumption rate of the specific chemical component is obtained based on the total surface area of ​​the workpiece under the crane load and the unit area of ​​the workpiece in the corresponding bath solution. The theoretical evaporation rate is determined based on the ambient temperature and solvent evaporation constant. The concentration change trend value of the specific chemical component is obtained based on the theoretical consumption rate and the theoretical evaporation rate.

3. The control method for a fully automated metal oxidation production line as described in claim 2, characterized in that, The determination of the theoretical evaporation rate based on the ambient temperature and solvent evaporation constant includes: Obtain the real-time airflow velocity at the liquid surface of the treatment tank; An evaporation rate mapping table is determined based on the ambient temperature, the airflow velocity, and the solvent evaporation constant; wherein the evaporation rate mapping table is established based on experimental data and is used to reflect the relationship of evaporation rates under different ambient temperatures, airflow velocities, and solvent evaporation constants. The theoretical evaporation rate is determined based on the evaporation rate mapping table.

4. The control method for a fully automated metal oxidation production line as described in claim 2, characterized in that, The process of obtaining the concentration change trend value of the specific chemical component based on the theoretical consumption rate and the theoretical evaporation rate includes: Based on the theoretical consumption rate, the amount of reduction of a specific chemical component per unit time caused by the chemical reaction of the workpiece is obtained; Based on the theoretical evaporation rate, the increase in concentration of a specific chemical component per unit time caused by the volume reduction of the treatment tank liquid due to solvent evaporation is obtained. The combined value of the net change in a specific chemical component per unit time is obtained based on the decrease per unit time and the increase in concentration per unit time. The concentration change trend value is determined based on the comprehensive value.

5. The control method for a fully automated metal oxidation production line as described in claim 2, characterized in that, The degreasing tank, the pickling tank, and the oxidation tank are all equipped with tank solution circulation pipelines. The current concentration value of a specific chemical component in the treatment tank is monitored and obtained through a concentration sensor, including: Concentration sensors are installed at the outlets of the circulation pipelines of the degreasing tank, the pickling tank, and the oxidation tank to monitor and obtain concentration data; The current concentration value is obtained by processing the monitored concentration data.

6. The control method for a fully automated metal oxidation production line as described in claim 1, characterized in that, The step of dynamically adjusting the initial concentration control range based on the concentration change trend value to obtain the concentration control threshold includes: Based on the concentration change trend value, the change in concentration of the specific chemical component within a unit time is determined to obtain change result data; wherein, the change result data is used to indicate the state and magnitude of concentration change within a unit time. Based on the change state and magnitude indicated by the change result data, the upper and lower concentration thresholds of the initial concentration control range are adjusted to obtain a modified concentration range; wherein, the modified concentration range is obtained after adjusting the initial concentration control range; The concentration control threshold is determined based on the upper and lower limits of the modified concentration range.

7. The control method for a fully automated metal oxidation production line as described in claim 1, characterized in that, The step of obtaining control data based on the current concentration value and the concentration control threshold includes: The current concentration value is compared with the concentration control threshold, and when the current concentration value is continuously lower than the lower limit of the concentration control threshold, first comparison data is generated; wherein, the first comparison data includes the type of medicine solution to be replenished, the replenishment amount calculated based on the concentration deviation, and the pulse frequency and duration for controlling the start of the metering pump, and the comparison between the current concentration value and the concentration control threshold is a comparison between the current concentration value and the upper and lower limits of the concentration control threshold respectively; The control data is obtained based on the first comparison data.

8. The control method for a fully automated metal oxidation production line as described in claim 7, characterized in that, The method further includes: When the current concentration value continues to be higher than the upper limit of the concentration control threshold, second comparison data is generated. The second comparison data includes the volume of the treatment tank liquid to be discharged, calculated based on the excess concentration and the total amount of the treatment tank liquid, as well as the opening degree and opening duration of the control drain valve. The control data is obtained based on the second comparison data.

9. The control method for a fully automated metal oxidation production line as described in claim 1, characterized in that, After obtaining the control data based on the current concentration value and the concentration control threshold, the process includes: When the system is under load or the workpiece is being processed in the tank, the system receives a task to temporarily suspend the execution of the dosing or draining operation, and stores the generated control data in the temporary queue. When an idle, standby, or unloaded state is detected, the control data is extracted from the deferred queue and executed.

10. A fully automated metal oxidation production line, comprising a memory, a processor, and a computer program stored in the memory and executable on the processor, characterized in that, When the processor executes the computer program, it implements the method as described in any one of claims 1 to 9.

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