A polishing apparatus and a polishing method for a silicon carbide wafer
By designing an automated silicon carbide wafer polishing device, the automatic fixing and simultaneous polishing of both sides of the silicon carbide wafers were achieved, solving the problem of inconvenience caused by the need for manual flipping of traditional devices, and improving processing efficiency and stability.
Patent Information
- Application Number
- CN202610148130.2
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Filing Date
- 2026-02-03
- Publication Date
- 2026-04-28
- Estimated Expiration
- 2046-02-03
AI Technical Summary
Traditional silicon carbide wafer polishing equipment can only polish the bottom surface, requiring manual flipping, which is inconvenient and time-consuming, affecting processing efficiency.
A silicon carbide wafer polishing device was designed, comprising a support assembly and a clamping assembly. It utilizes a precision cylinder and an electric push rod to automatically fix and flip the silicon carbide wafer. Combined with the synchronous rotation of the polishing ring and the polishing disc, it achieves simultaneous polishing of both sides. The polishing slurry is treated by a spraying device and a filtration system.
It enables automated fixing and flipping of silicon carbide wafers, improves polishing efficiency, reduces manual operation time, ensures polishing uniformity and stability, and simplifies the loading and unloading process.