A series-parallel hybrid six-degree-of-freedom mechanism for nanoimprint lithography

Abstract

This invention relates to the field of lithography technology, specifically to a hybrid series-parallel six-degree-of-freedom mechanism for nanoimprint lithography. It employs a top-down hybrid configuration: the upper part is a high-rigidity ZRxRy parallel micro-motion mechanism, providing linear motion in the vertical direction (Z) and rotational motion around the horizontal axis (Rx, Ry), exhibiting high rigidity, high precision, and high dynamic response; the lower part is a large-stroke XYRz series macro-motion mechanism, providing large-stroke linear motion in the X and Y directions within a plane and rotational motion around the vertical axis (Rz). The substrate support assembly is mounted on top of the parallel mechanism via a three-point connection surface integration. This invention combines the advantages of a large workspace of a series mechanism and the high precision and high rigidity of a parallel mechanism, providing an ideal precision motion solution for nanoimprint lithography equipment.

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