Method of bathroom purification

Abstract

The bathroom purification method of the present application is a method using a hypochlorous acid gas supply device (30). It includes: a water adhering step (step S11) of adhering water to at least a wall surface (2) of a bathroom (1); a hypochlorous acid gas generating step (step S12) of generating hypochlorous acid gas in the hypochlorous acid gas supply device (30); a hypochlorous acid gas supply step (step S13) of supplying air containing the hypochlorous acid gas into the bathroom (1); and a purification step (step S14) of purifying the bathroom by dissolving the hypochlorous acid gas in the water adhered to the wall surface (2) by maintaining a prescribed time in a state in which the air containing the hypochlorous acid gas is supplied into the bathroom (1).

Description

Technical Field

[0001] This disclosure relates to bathroom purification methods. Background Technology

[0002] Patent Document 1 describes a multifunctional drying device for a bathroom, which has the function of spraying out hypochlorous acid water, which is electrolyzed water obtained by electrolysis, in a mist.

[0003] Existing technical documents

[0004] Patent documents

[0005] Patent Document 1: Japanese Patent Application Publication No. 11-316083 Summary of the Invention

[0006] Hypochlorous acid water, obtained through electrolysis, contains metal ions. When this water is sprayed into a bathroom as a mist, the metal ions remain as solid components after the water evaporates. This poses a risk of corrosion to metal parts and other fixtures in the bathroom due to these residual metal ions.

[0007] This disclosure provides a bathroom purification method for supplying hypochlorous acid gas with reduced metal ion content to the bathroom.

[0008] The bathroom purification method disclosed herein utilizes a hypochlorous acid gas supply device. It includes: a water adhesion step of causing water to adhere to at least the walls of the bathroom in the walls, ceiling, and floor constituting the bathroom; a hypochlorous acid gas generation step of generating hypochlorous acid gas within the hypochlorous acid gas supply device; a hypochlorous acid gas supply step of supplying air containing hypochlorous acid gas into the bathroom; and a purification step of maintaining the state of air containing hypochlorous acid gas supplied to the bathroom for a predetermined time until the hypochlorous acid gas dissolves in the water adhering to at least the walls, thereby purifying the bathroom.

[0009] This disclosure provides a bathroom purification method that supplies hypochlorous acid gas with reduced metal ion content to the bathroom. Attached Figure Description

[0010] Figure 1 This is a schematic front view of the bathroom, which is the object of the bathroom purification method according to Embodiment 1.

[0011] Figure 2 This is a main cross-sectional view of the hypochlorous acid gas supply device used in the bathroom purification method according to Embodiment 1.

[0012] Figure 3 This is a flowchart illustrating a series of processes in the bathroom purification method according to Embodiment 1.

[0013] Figure 4 This is a schematic front view of a bathroom illustrating the water adhesion step of the bathroom purification method according to Embodiment 1.

[0014] Figure 5 This is a schematic front view of a bathroom illustrating the hypochlorous acid gas supply step of the bathroom purification method according to Embodiment 1.

[0015] Figure 6 This is a schematic front view of a bathroom illustrating the purification steps of the bathroom purification method according to Embodiment 1.

[0016] Figure 7 This is a flowchart illustrating a series of processes in the bathroom purification method according to Embodiment 2. Detailed Implementation

[0017] Hereinafter, specific embodiments of the present disclosure will be described in detail with reference to the accompanying drawings.

[0018] Additionally, the xyz coordinates in the diagram are used to illustrate the positional relationships of the constituent elements. Unless otherwise specified, the positive z-axis points vertically upwards. Furthermore, the xy plane is a horizontal plane, and all figures are interconnected.

[0019] <Implementation Method 1>

[0020] The following uses Figure 1 The structure of the bathroom 1, which is the object of the bathroom purification method according to this embodiment, will be described. Figure 2 The hypochlorous acid gas supply device 30 used in the bathroom purification method will be described below. Next, the hypochlorous acid gas supply device 30 will be used... Figure 3 Flowcharts and Figures 4-6 The process of the bathroom purification method involved in this embodiment will be described.

[0021] Figure 1 This is a schematic front view of a bathroom 1, which is the object of purification using the bathroom purification method according to Embodiment 1. Bathroom 1 is a typical household bathroom or toilet, and the general structure of bathroom 1 or toilet can be changed to any other structure. Toilets include, for example, a shower room, a toilet, a bathtub, etc. Bathroom 1 is a hollow, roughly box-shaped structure consisting of a wall 2, a ceiling 3, and a floor 4.

[0022] Wall 2 extends along the positive z-axis and forms the wall of bathroom 1. Wall 2 consists of four faces, with each pair of faces positioned opposite each other. Figure 1In the diagram, the wall surface on the negative side of the y-axis is omitted. The shower 11 is mounted on wall 2 in a manner that allows it to be detached from wall 2. Hot water for the user is dispensed from the shower 11. Wall 2 may also include a counter 12. The counter 12 is used to hold shampoo, shower gel, etc., for the user to wash their hair and body. Furthermore, although not specifically shown, wall 2 is provided with typical bathroom components such as a door / window for user access, a mirror, a faucet for water pipes, a support structure for lowering the shower 11, and a towel rack. Among the components on wall 2, the shower 11, door / window, mirror, faucet for water pipes, support structure for lowering the shower 11, and towel rack are examples of components at least partially made of metal. When hypochlorous acid water is sprayed onto components at least partially made of metal using conventional methods, there is a possibility that the metal components may corrode due to electrolytes such as metal ions remaining in bathroom 1.

[0023] The top surface 3 is an xy plane located on the positive side of the z-axis, and is the surface that constitutes the ceiling of bathroom 1. The top surface 3 includes a water spray device 13 and the inlet 21 and outlet 22 of the bathroom heating and drying machine 20.

[0024] The water spray device 13 is a device capable of spraying water onto the walls 2, ceiling 3, and floor 4 (hereinafter also referred to as "walls 2, etc.") of the bathroom 1. The particle size of the water sprayed by the water spray device 13 can be set to any particle size. Specific examples of "any particle size" include the particle size of mist and water sprayed from a typical shower head. However, the particle size of the sprayed water is preferably set to a size such that the water sprayed into the interior of the bathroom 1 can adhere to the walls 2, ceiling 3, and floor 4. The term "adhesion of water" in this specification includes both the case where water droplets adhere to the walls 2, etc., of the bathroom 1, and the case where a film of water adheres to the walls 2, etc. Furthermore, the term "water at least adheres to the walls 2" includes the case where water adheres only to the walls 2 and the case where water, in addition to adhering to the walls 2, also adheres to either or both of the ceiling 3 and the floor 4.

[0025] The bathroom heating and drying unit 20 is installed by embedding it in the space behind the ceiling, above the top surface 3 (positive side of the z-axis) of the bathroom 1. The bathroom heating and drying unit 20 is capable of heating, circulation, ventilation, drying, and bathroom purification operations. Details of each operation are described later. The bathroom heating and drying unit 20 can be either electric or gas-fired.

[0026] The bathroom heating dryer 20 includes: an inlet 21 and an outlet 22 with an opening in the ceiling 3 of the bathroom 1; a duct 23 configured from the space behind the ceiling toward the outside; and a hypochlorous acid gas supply device 30 for releasing hypochlorous acid gas into the bathroom 1.

[0027] The intake 21 faces the bathroom 1 and draws air from the bathroom 1 into the opening inside the bathroom heating dryer 20. A dust filter or similar device that can collect dust and dirt from the bathroom 1 can also be installed at the intake 21.

[0028] The outlet 22 faces the bathroom 1, and is the opening through which air is blown from the bathroom heating dryer 20 into the bathroom 1. The outlet 22 may also include louvers (not shown) that can change the direction of the blown air. Through the bathroom purification operation described later, hypochlorous acid gas is supplied to the bathroom 1 along with air from the hypochlorous acid gas supply device 30. For details of the hypochlorous acid gas supply device 30, please refer to... Figure 2 This will be explained later.

[0029] Pipe 23 is a cylindrical component with one end connected to the bathroom heating and drying machine 20 and the other end disposed in the outdoor space 0T. Pipe 23 is used to discharge air from the bathroom 1 to the outdoor 0T during the ventilation operation of the bathroom heating and drying machine 20, as described later.

[0030] The following describes the heating operation, circulation operation, ventilation operation, drying operation, and bathroom purification operation of the bathroom heating and drying machine 20 as its operating functions.

[0031] The heating operation of the bathroom heating dryer 20 involves drawing in air from the inside of the bathroom heating dryer 20 through the inlet 21 and heating it with a heating machine or heat source (not shown) located inside the bathroom heating dryer 20. Through the heating operation, the air heated inside the bathroom heating dryer 20 is blown out from the outlet 22 into the interior of the bathroom 1, thus warming the interior of the bathroom 1.

[0032] The circulation operation of the bathroom heating and drying unit 20 involves drawing air from the bathroom 1 inside the unit through the inlet 21, passing it through an air exchange unit (not shown) equipped with a Sirocco fan (centrifugal fan), and blowing it out of the outlet 22 into the bathroom 1. In other words, the circulation operation is the operation of circulating air within the bathroom 1, also known as cool air operation or air supply operation.

[0033] The ventilation operation of the bathroom heating and drying machine 20 involves expelling moisture-containing air from the bathroom 1 to the outdoor space OT through the inlet 21 and pipe 23. During ventilation operation, the moisture-containing air is exhausted to the outdoor space OT, thereby promoting the drying of moisture adhering to the bathroom 1.

[0034] The drying operation of the bathroom heating dryer 20 is similar to the ventilation operation, which involves discharging the moisture-containing air in the bathroom 1 to the outside space through the inlet 21 and the pipe 23. The difference from the ventilation operation is that in the drying operation, air heated by a heater or heat source (not shown) located inside the bathroom heating dryer 20 is blown into the bathroom 1 through the outlet 22. In other words, the drying operation heats the air in the bathroom 1 and discharges the moisture-containing air to the outside.

[0035] The bathroom purification operation of the bathroom heating and drying unit 20 involves supplying hypochlorous acid gas generated by the hypochlorous acid gas supply device 30 into the bathroom 1 through the outlet 22. This purification operation disinfects and deodorizes the walls 2, ceiling 3, and floor 4. For detailed usage information... Figure 2 This will be explained later.

[0036] Ground 4 is an xy plane located on the negative side of the z-axis, and is the surface that constitutes the floor of bathroom 1. Ground 4 includes a bathtub 14 and a drain outlet 15 placed on ground 4.

[0037] Drain outlet 15 is an opening for draining hot water used in bathroom 1. Furthermore, in Embodiment 2 described later, drain outlet 15 is an opening for draining hypochlorous acid water flushed away by water from wall 2 and the like.

[0038] [Hypochlorous acid gas supply device 30]

[0039] Figure 2 This is a front cross-sectional view of the hypochlorous acid gas supply device 30 used in the bathroom purification method according to Embodiment 1. Figure 2 As shown, the hypochlorous acid gas supply device 30 includes a housing C, an electrolytic cell 40, and a current control unit 60. The hypochlorous acid gas supply device 30 may also include a supply tank 50 and an anion exchange membrane 54. The electrolytic cell 40 and the current control unit 60 are used in the hypochlorous acid gas generation step (step S12), which is part of the bathroom purification method described later. The supply tank 50 and the anion exchange membrane 54 are used in the chloride ion supply step, which is a variation of the hypochlorous acid gas generation step (Example 4), as described later.

[0040] The housing C is a box-shaped component that houses the electrolytic cell 40, the supply tank 50, the anion exchange membrane 54, and the current control unit 60. In other words, the hypochlorous acid gas supply device 30 is an integrated unit of the housing C. The hypochlorous acid gas supply device 30 has a small size that can be housed inside the bathroom heating dryer 20; when the housing C is rectangular, it is, for example, approximately 10cm × 7cm × 4cm.

[0041] The hypochlorous acid gas supply device 30 can be modularized by the housing C and can be detachably installed in any location inside the bathroom heating and drying machine 20, but is not limited thereto. The hypochlorous acid gas supply device 30 can be configured such that hypochlorous acid gas released from the hypochlorous acid gas supply device 30 is supplied to the bathroom 1 through the outlet 22 of the bathroom heating and drying machine 20. Here, the hypochlorous acid gas is released from the outlet 47 (details will be described later) provided by the hypochlorous acid gas supply device 30. When the outlet 47 and the outlet 22 of the bathroom heating and drying machine 20 are not close, a tubular member (not shown) connecting the outlet 47 and the outlet 22 may also be provided.

[0042] Furthermore, the hypochlorous acid gas supply device 30 can also be installed at any location outside the bathroom heating dryer 20. For example, any location outside the bathroom heating dryer 20 could be any location in the space behind the ceiling. When the hypochlorous acid gas supply device 30 is installed at any location outside the bathroom heating dryer 20, a tubular component (not shown) connecting the outlet 47 and the blowout 22 of the hypochlorous acid gas supply device 30 can also be included.

[0043] Alternatively, the hypochlorous acid gas supply device 30 can be detachably configured without being modularized into the housing C, but rather integrated as part of the structure of the bathroom heating and drying unit 20. In other words, the bathroom heating and drying unit 20 and the hypochlorous acid gas supply device 30 can be configured as a single unit.

[0044] [Electrolytic Cell 40]

[0045] Electrolytic cell 40 is a tank used to store a first aqueous solution L1 containing chloride ions. Electrolytic cell 40 has, for example, a box-like shape. Figure 2 The diagram shows the state in which a first aqueous solution L1 is stored in electrolytic cell 40. The first aqueous solution L1 stored in electrolytic cell 40 is, for example, about 2 mL to 10 mL. The first aqueous solution L1 is, for example, an aqueous solution obtained by dissolving an electrolyte with electrical conductivity, i.e., an electrolyte solution; specifically, it is a dilute aqueous chloride solution with a specified chloride ion concentration. More specifically, the first aqueous solution L1 is, for example, a dilute aqueous sodium chloride solution or a dilute aqueous potassium chloride solution.

[0046] The "prescribed chloride ion concentration" of the first aqueous solution L1 includes both a chloride ion concentration within a prescribed numerical range and a chloride ion concentration with a prescribed numerical value. More specifically, the chloride ion concentration of the first aqueous solution L1 can be, for example, 17 mmol / L to 860 mmol / L, or it can be 171 mmol / L. In other words, the concentration of, for example, a dilute sodium chloride aqueous solution or a dilute potassium chloride aqueous solution can be 17 mmol / L to 860 mmol / L, or it can be 171 mmol / L. By setting the prescribed chloride ion concentration to a prescribed numerical range or a prescribed numerical value, hypochlorous acid required for bathroom purification can be generated, while the generation of chlorine that may be generated simultaneously can be suppressed.

[0047] The electrolytic cell 40 includes an electrolytic cell-side anode 41, an electrolytic cell-side cathode 42, an air supply unit 43, an air supply duct 44, an internal space on the electrolytic cell side 45, a water recovery unit 46, and an outlet 47. The electrolytic cell 40 may also include a water level detection unit 48.

[0048] The electrolytic cell-side anode 41 and electrolytic cell-side cathode 42 are a pair of plate-shaped electrodes used for the electrolysis of the first aqueous solution L1. Insoluble electrodes can be used as the electrolytic cell-side anode 41 and electrolytic cell-side cathode 42. More specifically, platinum-iridium-titanium electrodes, platinum electrodes, ruthenium-titanium electrodes, or iridium-titanium oxide electrodes can be used as the electrolytic cell-side anode 41 and electrolytic cell-side cathode 42, for example.

[0049] There is no diaphragm, such as an ion exchange membrane, between the anode 41 and cathode 42 on the electrolytic cell side. That is, the electrolysis of the first aqueous solution L1 using a pair of anodes 41 and cathodes 42 on the electrolytic cell side is diaphragm-free electrolysis. By using the diaphragm-free electrolysis of the first aqueous solution L1 using a pair of anodes 41 and cathodes 42 on the electrolytic cell side, hypochlorous acid gas for purification of bathroom 1 is generated.

[0050] Air supply unit 43 is a blower, such as a blower, that introduces air from the external space R into the electrolysis cell 40. In this specification, "external space R" refers to the exterior of the hypochlorous acid gas supply device 30, i.e., the exterior of the housing C, including the interior of the bathroom heating dryer 20, the space behind the ceiling, and the bathroom 1.

[0051] The air supply duct 44 is a tubular component connecting the air supply unit 43 and the electrolytic cell 40. One end of the air supply unit 43 is disposed in the external space R, and the other end is connected to the air supply duct 44. One end of the air supply duct 44 is connected to the air supply unit 43, and the other end is connected to the electrolytic cell 40. The end of the air supply duct 44 connected to the electrolytic cell 40 is disposed in the electrolytic cell 40 at a position lower (negative z-axis side) than the liquid surface S1 of the first aqueous solution L1 stored in the electrolytic cell 40.

[0052] Air supply unit 43 supplies air from external space R to the first aqueous solution L1 stored in electrolytic cell 40 via air supply duct 44. The air introduced into the first aqueous solution L1 via air supply unit 43 and air supply duct 44 is released as bubbles B within the first aqueous solution L1. Alternatively, a moisture-permeable and waterproof membrane (not shown) can be installed along the entire diameter of air supply duct 44. This membrane allows the air supplied from external space R and the moisture (water vapor) contained within it to pass through, but not the first aqueous solution L1 as a liquid. By installing this moisture-permeable and waterproof membrane, backflow of the first aqueous solution L1 from electrolytic cell 40 to air supply duct 44 can be prevented.

[0053] The internal space 45 on the electrolytic cell side is the upper space (space on the positive z-axis side) formed above the liquid surface S1 of the first aqueous solution L1 when the electrolytic cell 40 stores the first aqueous solution L1. In other words, the electrolytic cell 40 has the internal space 45 on the electrolytic cell side when the first aqueous solution L1 is not stored on the upper internal surface (xy plane on the positive z-axis side) of the electrolytic cell 40.

[0054] The water recovery unit 46 is a component that recovers moisture contained in the air flowing through the interior of the hypochlorous acid gas supply device 30 and released from the electrolytic cell 40 into the external space R as liquid back into the electrolytic cell 40. The water recovery unit 46 is, for example, a Peltier element that cools the moisture contained in the air to cause it to condense and form water droplets. When the water recovery unit 46 is a Peltier element, the Peltier element includes a heat-dissipating surface and a heat-absorbing surface, and the heat-absorbing surface includes a cooling radiator. The cooling radiator is capable of cooling the moisture contained in the air passing through it to cause it to condense and form water droplets.

[0055] To recover moisture contained in the air flowing through the interior of the hypochlorous acid gas supply device 30, the water recovery unit 46 according to this embodiment is disposed at the outlet 47 through which the air is released into the external space R. By disposing the water recovery unit 46 at the outlet 47, moisture contained in the air flowing through the interior of the hypochlorous acid gas supply device 30 can be efficiently recovered. Alternatively, the water recovery unit 46 can also be disposed at any location within the internal space 45 on the electrolyzer side.

[0056] The outlet 47 is an opening for releasing the mixed air M obtained by mixing the air flowing in from the air supply unit 43 and the hypochlorous acid generated from the first aqueous solution L1 through diaphragm-free electrolysis into the external space R of the housing C. Figure 2In this example, the outlet 47 is located on the upper surface (xy plane on the positive z-axis side) of the electrolytic cell 40, but it can also be located above the liquid surface S1 of the first aqueous solution L1. The outlet 47 is cylindrical in shape, for example, including cylindrical or triangular shapes. When the upper surface (face on the positive z-axis side) of the electrolytic cell 40 is close to the top surface of the shell C, the outlet 47 can also be a hole-like opening provided on a part of the upper surface of the electrolytic cell 40. Furthermore, the outlet 47 and the upper surface (face on the positive z-axis side) of the shell C can also be integrally formed.

[0057] The outlet 47 may also include an openable or removable cover (not shown). The cover may be designed to be closed when the hypochlorous acid gas supply device 30 is being transported, moved, or installed, and to be opened or removed when the hypochlorous acid gas supply device 30 is being used.

[0058] [Purification Operation]

[0059] In the hypochlorous acid gas supply device 30 of this embodiment, air introduced from the external space R flows through the electrolysis cell 40 and is released into the external space R along with hypochlorous acid for purification operation. Figure 2 The airflow path A, indicated by a hollow arrow and an arrow with an upper right slant, is a series of paths through which air supplied from the external space R to the hypochlorous acid gas supply device 30 flows through the electrolytic cell 40 and is released as a mixture of hypochlorous acid-containing air M back into the external space R. Specifically, in airflow path A, air flows sequentially through the external space R, the air supply unit 43, the air duct 44, the first aqueous solution L1 stored in the electrolytic cell 40, the internal space 45 on the electrolytic cell side, the water recovery unit 46, the outlet 47, and finally back to the external space R.

[0060] More specifically, in airflow path A, such as Figure 1 As shown, air introduced from the external space R is released as bubbles B through the air supply unit 43 and the air supply pipe 44 into the first aqueous solution L1 stored in the electrolytic cell 40. In other words, bubbles B are generated by using air introduced from the external space R to foam the first aqueous solution L1. By mixing bubbles B with hypochlorous acid generated by the diaphragmless electrolysis of the first aqueous solution L1, mixed air M is formed.

[0061] Here, the hypochlorous acid generated by the diaphragmless electrolysis of the first aqueous solution L1 contains both hypochlorous acid dissolved in the first aqueous solution L1 and hypochlorous acid gas that evaporates and vaporizes into the internal space 45 of the electrolytic cell. The hypochlorous acid dissolved in the first aqueous solution L1 mixes with bubbles B and is released as mixed air M through the water recovery unit 46 from the outlet 47 to the external space R. The hypochlorous acid gas that evaporates and vaporizes into the internal space 45 of the electrolytic cell mixes with bubbles B mixed with hypochlorous acid and is released as mixed air M through the water recovery unit 46 from the outlet 47 to the external space R. The hypochlorous acid gas released into the external space R is supplied to the bathroom 1. By passing the hypochlorous acid gas (mixed air M) through the water recovery unit 46, the water contained in the hypochlorous acid gas is recovered back to the electrolytic cell 40. Along with the water recovery based on the water recovery unit 46, the electrolyte components contained in the water are also recovered back to the electrolytic cell 40. Therefore, hypochlorous acid gas with a reduced content of electrolyte components can be supplied to bathroom 1.

[0062] The electrolyte contains metal ions. More specifically, these metal ions are sodium, potassium, calcium, or magnesium ions. In other words, as the hypochlorous acid gas (mixed with air M) flows through the water recovery unit 46, the moisture contained in the hypochlorous acid gas is recovered and sent to the electrolytic cell 40. Along with the recovery of moisture based on the water recovery unit 46, metal ions such as sodium ions contained in the moisture of the hypochlorous acid gas are also recovered and sent to the electrolytic cell 40. Therefore, hypochlorous acid gas with a reduced content of metal ions can be supplied to the bathroom 1.

[0063] Bubbles B are generated within the first aqueous solution L1 through buoyancy, causing them to rise towards the liquid surface S1. During this rising process, hypochlorous acid comes into contact with the bubble B, allowing more hypochlorous acid to be drawn into it. In other words, compared to the gas-liquid contact between air and the liquid surface S1 of the first aqueous solution L1, the contact between bubbles B generated within the first aqueous solution L1 and the gas-liquid contact within the first aqueous solution L1 allows more hypochlorous acid to be drawn into the bubble B. Therefore, compared to the gas-liquid contact between air and the liquid surface S1, the contact between bubbles B and the gas-liquid contact within the first aqueous solution L1 allows more mixed air M to be released into the external space R. The mixed air M contains water evaporated from the first aqueous solution L1, and this water is recovered by the water recovery unit 46 and returned to the first aqueous solution L1 as water droplets.

[0064] The bathroom 1, which is the external space R, is purified using a mixture of air M containing hypochlorous acid released from the outlet 47 into the hypochlorous acid gas supply device 30. Details of the purification of the walls 2, etc., of the bathroom 1 are described later. In addition, bacteria, fungi, viruses, or odors contained in the air of the bathroom 1, which is the external space R of the housing C, are removed using the mixture of air M containing hypochlorous acid.

[0065] The electrolytic cell 40 may also include a water level detection unit 48. The water level detection unit 48 detects the position of the liquid level S1 of the first aqueous solution L1. The water level detection unit 48 is, for example, a water level sensor. The water level detection unit 48 is positioned at least above the upper end (positive z-axis side) of the electrolytic cell-side anode 41 and the electrolytic cell-side cathode 42.

[0066] When the hypochlorous acid gas supply device 30 includes a water level detection unit 48, the water recovery unit 46 recovers moisture from the mixed air M and supplies water to the electrolyzer 40 based on the position of the liquid level S1 detected by the water level detection unit 48. More specifically, the water recovery unit 46 supplies water to the electrolyzer 40 at a level not lower than the upper ends (positive z-axis portion) of both the electrolyzer-side anode 41 and the electrolyzer-side cathode 42. Furthermore, the water recovery unit 46 supplies water to the electrolyzer 40 at a level not lower than the upper end (positive z-axis portion) of the air supply duct 44 connected to the electrolyzer 40.

[0067] When the hypochlorous acid gas supply device 30 includes a water recovery unit 46 and a water level detection unit 48, the electrolytic cell-side anode 41 and electrolytic cell-side cathode 42 can be maintained immersed in the first aqueous solution L1. Therefore, even if the first aqueous solution L1 decreases, the exposure of the electrolytic cell-side anode 41 and electrolytic cell-side cathode 42 to air can be suppressed, maintaining the electrolysis efficiency of diaphragm-free electrolysis. Alternatively, the supply tank 50 may also include the same water recovery unit and water level detection unit as the electrolytic cell 40.

[0068] [Supply Tank 50]

[0069] The supply tank 50 and anion exchange membrane 54 described below are used as a variation of the hypochlorous acid gas generation step in the chloride ion supply step, as described later in Example 4. The supply tank 50 is a tank used to store a second aqueous solution L2 containing chloride ions and to supply the chloride ions contained in the second aqueous solution L2 to the first aqueous solution L1. Figure 2 The image shows the state in which the second aqueous solution L2 is stored in the supply tank 50.

[0070] To ensure safety in the event of a leak, the solute in the second aqueous solution L2 is preferably a substance with a safety profile equivalent to that of sodium chloride according to the GHS (Globally Harmonized System of Classification and Labelling of Chemicals) classification. Specifically, the second aqueous solution L2 is an aqueous solution of a metal chloride containing both metal ions and chloride ions. Regarding the second aqueous solution L2, through membrane electrolysis via the anion exchange membrane 54 described later, the metal ions contained in the second aqueous solution L2 react with the hydroxide ions generated by the membrane electrolysis to form a precipitate of metal hydroxide. Preferably, the second aqueous solution L2 is a high-concentration magnesium chloride aqueous solution or a saturated magnesium chloride aqueous solution.

[0071] When using an aqueous solution of magnesium chloride as the second aqueous solution L2, the mass percentage concentration of the magnesium chloride aqueous solution is, for example, 1% to 35%. As an example, when the second aqueous solution L2 is an aqueous solution of magnesium chloride, magnesium ions contained in the magnesium chloride aqueous solution react with hydroxide ions generated through membrane electrolysis to form a precipitate of magnesium hydroxide. Furthermore, the "precipitate" of magnesium hydroxide can be hard and sandy, colloidal, slurry-like, or gel-like, and may include a cloudy aqueous solution.

[0072] The supply tank 50 includes a supply tank-side cathode 51, a supply tank-side internal space 52, and an outlet 53. The supply tank-side cathode 51 is a plate-shaped electrode used as a pair with the electrolytic cell-side anode 41 for membrane electrolysis via an anion exchange membrane 54. During membrane electrolysis of the second aqueous solution L2 using the pair of supply tank-side cathodes 51 and electrolytic cell-side anodes 41, chloride ions are supplied from the second aqueous solution L2 to the first aqueous solution.

[0073] Insoluble electrodes can also be used as the cathode 51 on the supply tank side. More specifically, for example, platinum-iridium-titanium electrodes, platinum electrodes, ruthenium-titanium electrodes, or iridium-titanium oxide electrodes can be used.

[0074] The internal space 52 on the supply tank side is the upper space (space on the positive z-axis side) formed above the liquid surface S2 of the second aqueous solution L2 when the supply tank 50 stores the second aqueous solution L2. In other words, the second aqueous solution L2 is not stored to the inner upper surface (xy plane on the positive z-axis side) of the supply tank 50, so the supply tank 50 has the internal space 52 on the supply tank side.

[0075] The outlet 53 is an opening for discharging hydrogen gas generated by the diaphragm electrolysis of the second aqueous solution L2 into the external space R of the housing C. The outlet 53 is, for example, a check valve. When the check valve is used as the outlet 53, hydrogen gas inside the supply tank 50 is discharged into the external space R, but the inflow of gases such as air from the external space R is suppressed. During repeated diaphragm electrolysis of the second aqueous solution L2, hydrogen gas accumulates in the internal space 52 of the supply tank, and the internal pressure of the supply tank 50 increases. The check valve at the outlet 53 opens due to this pressure, and hydrogen gas is discharged into the external space R of the supply tank 50.

[0076] Alternatively, if the supply tank 50 does not have an outlet 53, a ventilation path (not shown) connecting the internal space 45 on the electrolytic cell side and the internal space 52 on the supply tank side can be provided. When a ventilation path is included between the electrolytic cell 40 and the supply tank 50, hydrogen gas can flow sequentially through the internal space 52 on the supply tank side, the ventilation path, the internal space 45 on the electrolytic cell side, and the outlet 47 before being discharged.

[0077] Anion exchange membrane 54 is a membrane-like component that connects electrolytic cell 40 and supply cell 50 by allowing anions to pass through based on a voltage applied between them. More specifically, membrane electrolysis via anion exchange membrane 54 is performed when a voltage is applied between the anode 41 on the electrolytic cell side and the cathode 51 on the supply cell side. Through membrane electrolysis using the anode 41 on the electrolytic cell side and the cathode 51 on the supply cell side, chloride ions contained in the second aqueous solution L2 are supplied to the first aqueous solution L1 through anion exchange membrane 54 (indicated by a thick black arrow in the negative x-axis direction).

[0078] The anion exchange membrane 54 in this embodiment is not the type of anion exchange membrane that allows anions to pass through by osmotic pressure without the use of electricity. Furthermore, the anion exchange membrane 54 does not allow magnesium ions, which are cations, to pass through. More specifically, when chloride ions contained in the second aqueous solution L2 are supplied to the first aqueous solution L1 through the diaphragm electrolysis of the anion exchange membrane 54 via the anode 41 on the electrolytic cell side and the cathode 51 on the supply cell side, magnesium ions, which are cations, do not pass through the anion exchange membrane 54. The anion exchange membrane 54 is, for example, a hydrocarbon-based anion exchange membrane. Specific examples of hydrocarbon-based anion exchange membranes include membranes with selective permeability to monovalent anions, alkali resistance, or heat resistance.

[0079] An anion exchange membrane 54 is disposed between the electrolytic cell 40 and the supply cell 50. When the opposing surfaces of the electrolytic cell 40 and the supply cell 50 are formed by frame-like members, the anion exchange membrane 54 can be embedded in the frame-like members. In other words, the electrolytic cell 40 and the supply cell 50 are connected together in such a way that anions can pass through the anion exchange membrane 54.

[0080] Alternatively, a high-concentration chloride solution supply tank can be provided to supply a high-concentration chloride solution to the second aqueous solution L2 so that the chloride ion concentration of the second aqueous solution L2 is the same as that of the first aqueous solution L1.

[0081] The current control unit 60 includes wiring 61, 62, and 63. Wiring 61, 62, and 63 are wires through which current flows. The electrolytic cell-side anode 41 is electrically connected to the current control unit 60 via wiring 61, the electrolytic cell-side cathode 42 is connected via wiring 62, and the feed cell-side cathode 51 is connected via wiring 63.

[0082] The current control unit 60 controls the current used for diaphragm-free electrolysis and diaphragm electrolysis. More specifically, it controls the first current used for diaphragm-free electrolysis and the second current used for diaphragm electrolysis. In other words, the current control unit 60 controls the chemical reactions that occur due to diaphragm-free electrolysis and diaphragm electrolysis by controlling the first current and the second current. That is, the current control unit 60 controls the two steps: the hypochlorous acid gas generation step (step S12 of the bathroom purification method) and the chloride ion supply step (a variation of step S12) in which chloride ions contained in the second aqueous solution L2 are supplied to the first aqueous solution L1 via the anion exchange membrane 54.

[0083] Bathroom purification methods

[0084] Figure 3 This is a flowchart illustrating a series of processes in the bathroom purification method according to Embodiment 1. In the bathroom purification method according to Embodiment 1, as... Figure 3 As shown, firstly, a water adhesion step is performed, where water adheres to at least the wall surface 2, ceiling surface 3, and floor surface 4 of the bathroom 1 (step S11). Next, a hypochlorous acid gas generation step is performed, where hypochlorous acid gas is generated in the hypochlorous acid gas supply device 30 (step S12). Then, a hypochlorous acid gas supply step is performed, whereby air containing hypochlorous acid gas is supplied to the bathroom 1 (step S13). Next, a purification step is performed, whereby the bathroom 1 is maintained in a state of supplying air containing hypochlorous acid gas for a predetermined time, and the hypochlorous acid gas dissolves into at least the water adhering to the wall surface 2, etc., thereby purifying at least the wall surface 2 (step S14).

[0085] Next, refer to and Figure 3 Part of the flowchart corresponding Figures 4-6 Each step is explained in detail.

[0086] [Step S11: Water Adhesion Step]

[0087] In step S11, water is made to adhere to at least the wall 2 of the bathroom 1. Figure 4This is a schematic front view of bathroom 1 showing the water adhesion step (step S11) of the bathroom purification method according to Embodiment 1. Figure 4 As shown, a water spray device 13 sprays a mist of water onto at least one of the walls 2, such as the wall surface 2, of the bathroom 1. Figure 4 In the diagram, a black bold dashed line represents the mist-like water sprayed from the water spray device 13. The mist-like water sprayed from the water spray device 13 adheres to the wall surface 2, etc., and becomes water droplets. The mist-like water sprayed from the water spray device 13 can also be sprayed onto the top surface 3 and the ground surface 4, in addition to the wall surface 2. At this time, the water spray device 13 can spray mist-like water while rotating around the z-axis.

[0088] Figure 4 The area enclosed by the single-dotted line is a partially enlarged cross-sectional view of wall surface 2. As shown in the partially enlarged cross-sectional view of wall surface 2, it is in a state where microorganisms BA are attached to a portion of wall surface 2. Water W1 sprayed from water spray device 13 adheres to wall surface 2 and the microorganisms BA attached to wall surface 2. Here, water W1 includes at least one of mist water or water droplet water. In this specification, the term "attachment" to water on wall surface 2, etc., includes both "attached wetting" and "spreading wetting" in the term "wetting". The term "microorganism" in this specification includes fungi such as molds, viruses, bacteria, archaea, and their aerosol forms.

[0089] [Step S12: Hypochlorous acid gas generation step]

[0090] In step S12, a hypochlorous acid gas generation step is performed to generate hypochlorous acid gas within the hypochlorous acid gas supply device 30. Furthermore, in this embodiment, an example of generating hypochlorous acid gas in step S12 after step S11, where water is at least adhered to the wall surface 2, is described. However, step S12 can also be performed before step S11, or it can be performed in parallel with step S11. For example, using... Figure 2 As described above, in this embodiment, hypochlorous acid gas is generated by electrolysis using the hypochlorous acid gas supply device 30. In other words, step S12 includes an electrolysis step of electrolyzing a first aqueous solution L1 containing chloride ions stored in the electrolytic cell 40 to generate hypochlorous acid gas.

[0091] More specifically, in the electrolysis step, chlorine gas (Cl2) is generated at the anode 41 on the electrolytic cell side through the electrolysis of the first aqueous solution L1. The generated chlorine gas (Cl2) undergoes a hydrolysis reaction with the water in the first aqueous solution L1 to produce hydrochloric acid (HCl) and hypochlorous acid (HClO). The hydrochloric acid (HCl) ionizes in the aqueous solution, producing hydrogen ions (H+). ＋ ) and chloride ions (Cl － Hydrochloric acid (HCl) ionizes in aqueous solution, producing hydrogen ions (H+). ＋) and chloride ions (Cl － ) exists. Additionally, hydrogen ions (H+) are present. ＋ ) and hydroxide ions (OH-) generated at cathode 42 on the electrolytic cell side － It reacts to become water.

[0092] Air is introduced into the electrolytic cell 40 from the external space R of the housing C constituting the hypochlorous acid gas supply device 30 via the air supply section 43 and the air supply pipe 44, causing the first aqueous solution L1 to bubble, thereby generating bubbles B. Bubbles B mix with the generated hypochlorous acid and are released as hypochlorous acid-containing air (mixed air M) into the external space R, which is the outside of the hypochlorous acid gas supply device 30. Furthermore, as described above, in this embodiment, "external space R" refers to the outside of the hypochlorous acid gas supply device 30, i.e., the outside of the housing C, including both the interior of the bathroom heating dryer 20 and the bathroom 1.

[0093] [Step S13: Hypochlorous acid gas supply step]

[0094] In step S13, air (mixed air M) containing hypochlorous acid gas generated in step S12 is supplied into bathroom 1. Figure 5 This is a schematic front view of a bathroom illustrating the hypochlorous acid gas supply step of the bathroom purification method according to Embodiment 1. Figure 5 As shown by the dashed arrow, air containing hypochlorous acid gas generated in step S12 is supplied to bathroom 1 through the outlet 22 of bathroom heating dryer 20.

[0095] Hypochlorous acid gas is supplied until the concentration of hypochlorous acid gas in bathroom 1 reaches a predetermined concentration. The "predetermined concentration of hypochlorous acid gas" in this specification refers, for example, to a concentration of 100 ppb to 500 ppb (parts per billion) in bathroom 1. The predetermined concentration of hypochlorous acid gas can be appropriately set according to the volume of bathroom 1 and the purification level. In step S13, the supply of hypochlorous acid gas continues until the predetermined concentration is reached. To determine whether the concentration of hypochlorous acid gas in bathroom 1 is at the predetermined concentration, data relating the concentration of hypochlorous acid gas in bathroom 1 to the supply time of hypochlorous acid gas can be stored in advance in the current control unit 60, etc., and the supply of hypochlorous acid gas to bathroom 1 can be stopped after the predetermined time has elapsed. Alternatively, the concentration of hypochlorous acid gas in bathroom 1 can be measured in real time, and the supply of hypochlorous acid gas can be stopped when the predetermined concentration is reached.

[0096] Figure 5The area enclosed by the single-dotted line is a partially enlarged cross-sectional view of wall 2. As shown in the partially enlarged cross-sectional view of wall 2, air (mixed air M) containing hypochlorous acid gas (HClO) generated in step S12 is supplied to the water W1 that adheres to wall 2 and microorganism BA in step S11.

[0097] Step S13 can also be performed concurrently with the circulation operation (“air supply operation” in the claims) of the bathroom heating dryer 20, which circulates the air within the bathroom 1. The sterilization ability of hypochlorous acid gas is higher in high humidity conditions (around 80% or more) than in low humidity conditions (e.g., below 40%). For example, the sterilization ability of hypochlorous acid gas is highest in high humidity conditions (approximately 100%). Therefore, by circulating the air through the bathroom heating dryer 20 instead of air exchange, the humidity within the bathroom 1 can be maintained, and the hypochlorous acid gas can be diffused throughout the entire bathroom 1.

[0098] [Step S14: Purification Step]

[0099] In step S14, air containing hypochlorous acid gas is supplied to bathroom 1 for a predetermined time, and the bathroom is purified by the dissolution of hypochlorous acid gas in water adhering to the wall surface 2, etc. Step S14 is performed concurrently with step S13. Alternatively, step S14 can continue after step 13 is stopped when the concentration of hypochlorous acid gas in bathroom 1 reaches a predetermined concentration.

[0100] Figure 6 This is a schematic front view of a bathroom illustrating the purification steps of the bathroom purification method according to Embodiment 1. "Bathroom purification" refers to the purification of at least wall surface 2, such as wall surface 2. "Purification" includes sterilization and deodorization of microorganisms BA. The "prescribed time" in step S14 is the time required for hypochlorous acid gas to dissolve in water at least adhering to wall surface 2, thus performing sterilization and deodorization of microorganisms BA. More specifically, in the purification steps, for example, if the humidity in bathroom 1 is approximately 100%, and the concentration of hypochlorous acid gas in bathroom 1 reaches 100 ppb to 500 ppb after the implementation of step S13, this is maintained for approximately 10 to 120 minutes.

[0101] Figure 6 The area enclosed by the single-dotted line is a partially enlarged cross-sectional view of wall 2. As shown in the partially enlarged cross-sectional view of wall 2, it becomes a state where the hypochlorous acid gas (HClO(gas)) supplied in step S13 is dissolved in the water W1 that adhered to wall 2 and microorganisms BA in step S11. In other words, by dissolving the hypochlorous acid gas in the water W1 adhering to wall 2, it becomes a state of hypochlorous acid water W2 (HClO(aqua)). Hypochlorous acid water W2 is used for sterilization and deodorization of microorganisms BA.

[0102] In this embodiment, by supplying hypochlorous acid gas with reduced electrolyte content, such as metal ions, into the bathroom 1, the hypochlorous acid gas dissolves in water W1 adhering to the wall 2 of the bathroom 1, forming hypochlorous acid water W2. Therefore, a bathroom purification method is provided that can supply hypochlorous acid gas with reduced metal ion content into the bathroom 1. Because hypochlorous acid gas with reduced metal ion content can be supplied into the bathroom 1, the amount of metal ions that may remain in the bathroom 1 can be significantly reduced compared to the conventional method of spraying hypochlorous acid water into the bathroom 1. Therefore, according to the bathroom purification method of this embodiment, corrosion of metal components disposed in the bathroom 1 can be suppressed.

[0103] Furthermore, if step S14 is performed after stopping step S13, the circulation of the bathroom heating dryer 20 can continue or be stopped. Continuing the circulation of the bathroom heating dryer 20 promotes the diffusion of hypochlorous acid gas supplied to the bathroom 1, thereby promoting the dissolution of water adhering to the wall surface 2, etc. On the other hand, stopping the circulation of the bathroom heating dryer 20 stops the airflow from it. Here, the higher the humidity in the bathroom 1, the higher the sterilization ability of the hypochlorous acid gas. Therefore, compared to the case of continuous circulation, the decrease in humidity in the bathroom 1 caused by the airflow from the bathroom heating dryer 20 can be reduced, and the sterilization effect of the hypochlorous acid gas can be maintained at a higher level.

[0104] The following effects can be enjoyed according to the bathroom purification method described in Embodiment 1.

[0105] The bathroom purification method described in this embodiment is a bathroom purification method using a hypochlorous acid gas supply device 30. It includes: a water adhesion step (step S11) in which water adheres to at least the wall surface 2 of the bathroom 1, which constitutes the wall surface 2, ceiling surface 3, and floor 4; a hypochlorous acid gas generation step (step S12) in which hypochlorous acid gas is generated within the hypochlorous acid gas supply device 30; a hypochlorous acid gas supply step (step S13) in which air containing hypochlorous acid gas is supplied to the bathroom 1; and a purification step (step S14) in which, while supplying air containing hypochlorous acid gas to the bathroom 1, the supply is maintained for a predetermined time required for the hypochlorous acid gas to dissolve in the water adhering to at least the wall surface 2, thereby purifying the bathroom.

[0106] According to the above method, the bathroom 1 is purified by supplying hypochlorous acid gas to the bathroom 1. That is, at least the wall 2 of the bathroom 1, such as the wall surface 2, is purified by supplying hypochlorous acid gas to the bathroom 1. In the bathroom purification method according to this embodiment, hypochlorous acid gas can be supplied without spraying water containing electrolyte components, including metal ions such as sodium ions, into the bathroom 1. Therefore, a bathroom purification method can be provided that supplies hypochlorous acid gas with a reduced content of metal ions into the bathroom 1. Because hypochlorous acid gas with a reduced content of metal ions can be supplied into the bathroom 1, the amount of metal ions that may remain in the bathroom 1 can be significantly reduced compared to the conventional method of spraying hypochlorous acid water into the bathroom 1. Therefore, according to the bathroom purification method according to this embodiment, corrosion of metal components disposed in the bathroom 1 can be suppressed.

[0107] In the water adhesion step (step S11) of the bathroom purification method according to this embodiment, water is adhered to at least the wall surface 2 of the bathroom 1 by spraying mist-like water into the bathroom 1.

[0108] According to the above method, water free of electrolytes such as metal ions can adhere to the wall surface 2 of the bathroom 1. Therefore, in the subsequent hypochlorous acid gas supply step (step S13) and purification step (step S14), hypochlorous acid water with reduced metal ion content can be generated for sterilization of the wall surface 2. Furthermore, water also adheres to the surface of microorganisms, and by supplying hypochlorous acid gas to the water, it becomes hypochlorous acid water. This state of close contact between the hypochlorous acid water and microorganisms further enhances the sterilization ability.

[0109] The hypochlorous acid gas supply device 30 used in the bathroom purification method according to this embodiment also includes a water recovery unit 46 capable of recovering the moisture contained in the gas as a liquid. In the hypochlorous acid gas supply step (step S12), the hypochlorous acid gas flows through the water recovery unit 46 and is supplied into the bathroom 1.

[0110] According to the above method, the moisture contained in the hypochlorous acid gas is recovered by the water recovery unit 46 to the electrolytic cell 40, and the sodium or potassium ions contained in the moisture in the hypochlorous acid gas are also recovered to the electrolytic cell 40. Therefore, hypochlorous acid gas with a reduced content of metal ion components (electrolyte components) can be supplied to the bathroom 1. Because hypochlorous acid gas with a reduced metal ion content can be supplied to the bathroom 1, the amount of metal ion components that may remain in the bathroom 1 can be significantly reduced compared to the conventional method of spraying hypochlorous acid water into the bathroom 1. Therefore, according to the bathroom purification method of this embodiment, corrosion of metal components disposed in the bathroom 1 can be suppressed.

[0111] In the hypochlorous acid gas supply step (step S12) of the bathroom purification method according to this embodiment, the air supply operation (circulation operation) that circulates the air containing hypochlorous acid gas in the bathroom 1 is also performed.

[0112] According to the above method, the humidity in bathroom 1 can be maintained by air supply operation, and hypochlorous acid gas can be diffused throughout bathroom 1. Therefore, the diffusion of hypochlorous acid gas into bathroom 1 can be carried out more effectively.

[0113] <Implementation Method 2>

[0114] The bathroom purification method in Embodiment 2, in addition to the bathroom purification method (steps S11 to S14) in Embodiment 1, also includes a cleaning step (step S15) and a ventilation step (step S16). Steps S11 to S14, which are identical to those in Embodiment 1, are omitted. Figure 7 Steps S15 and S16, which differ from those in Implementation Method 1, will be described.

[0115] Figure 7 This is a flowchart illustrating a series of processes in the bathroom purification method according to Embodiment 2. In the bathroom purification method according to Embodiment 2, as... Figure 7 As shown, after performing the same steps S11 to S14 as the bathroom purification method according to Embodiment 1, a cleaning step is performed to rinse the hypochlorous acid water adhering to the wall surface 2, etc. (step S15). Next, a ventilation step is performed to dry the residual water and hypochlorous acid water adhering to the wall surface 2, etc. by ventilation (step S16).

[0116] [Step S15: Cleaning Step]

[0117] In step S15, water is sprayed from the water spray device 13 to rinse the hypochlorous acid water W2 that adhered to the wall surface 2, etc., in step S14. By implementing step S15, corrosion of metal parts and the like in the bathroom 1 caused by the residual hypochlorous acid water W2 on the wall surface 2, etc., can be suppressed. Furthermore, by implementing step S15, the hypochlorous acid water W2 rinsed off from the wall surface 2, etc., flows to the drain outlet 15, which can also perform sterilization and deodorization of the drain outlet 15.

[0118] [Step S16: Ventilation Step]

[0119] In step S16, residual water W1 and hypochlorous acid water W2 adhering to the wall surface 2 are dried by ventilation. More specifically, air and moisture containing residual hypochlorous acid gas in the bathroom 1 drawn in from the suction port 21 of the bathroom heater dryer 20 are discharged to the outdoor space OT through the suction port 21 and pipe 23. During the ventilation operation of the bathroom heater dryer 20, the drying of moisture adhering to the bathroom 1 is promoted by the discharge of moisture-containing air to the outdoor space OT. By reducing the concentration of hypochlorous acid gas in the bathroom 1 and lowering the humidity, the growth of microorganisms such as mold spores BA can be inhibited even after the purification step (step S14).

[0120] In step 16, in addition to ventilation, a drying step based on a drying operation may also be performed, wherein the drying operation includes blowing out heated air from the bathroom heating dryer 20. When the drying step is performed in step 16, the moisture adhering to the bathroom 1 can be dried in a shorter time.

[0121] The bathroom purification method described in Embodiment 2 provides the following benefits.

[0122] The bathroom purification method according to this embodiment includes a cleaning step (step S15) after the purification step (step S14), spraying mist-like water onto at least the wall surface 2 of the bathroom 1 to clean hypochlorous acid water W2, which is water containing dissolved hypochlorous acid gas.

[0123] According to the above method, corrosion of components in bathroom 1 caused by residual hypochlorous acid water on wall surface 2 can be suppressed. Furthermore, even if, after flowing through the water recovery unit 46, a certain amount of metal ions are supplied to bathroom 1 along with hypochlorous acid gas and remain on wall surface 2, the above method can also suppress corrosion of components in bathroom 1 caused by the residual metal ions on wall surface 2. Furthermore, the hypochlorous acid water W2 rinsed off from wall surface 2 flows to drain outlet 15, enabling sterilization and deodorization of drain outlet 15.

[0124] The bathroom purification method described in this embodiment includes a ventilation step (step S16) after the purification step (step S14) to exhaust the air containing residual hypochlorous acid gas in the bathroom 1.

[0125] According to the above method, by expelling moisture-containing air to the outdoor space OT, the drying of moisture adhering to the bathroom 1 can be promoted. By reducing the concentration of hypochlorous acid gas and lowering the humidity in the bathroom 1, the growth of microorganisms such as mold spores can be inhibited even after the purification step (step S14).

[0126] The bathroom purification method described in this embodiment includes a drying step that dries the bathroom 1 after the purification step (step S14).

[0127] According to the above method, in addition to the ventilation step (step S16), a drying step based on drying operation is also performed, wherein the drying operation includes blowing heated air from the bathroom heating dryer 20. Therefore, moisture adhering to the bathroom 1 can be dried in a shorter time. By reducing humidity in a short time, even if mold spores or other microorganisms (BA) remain after bathroom cleaning, the growth of these microorganisms can be inhibited.

[0128] Hereinafter, we will describe variations 1 and 2 of the water adhesion step (step S11) in Embodiment 1 and Embodiment 2, and variations 3 and 4 of the hypochlorous acid gas generation step (step S12).

[0129] <Variation Example 1>

[0130] In the water adhesion step (step S11), water can adhere to at least one of the wall surfaces 2 of the bathroom 1 by the user using the shower 11 while bathing in the bathroom 1 and by applying hot water stored in the bathtub 14 to the user's body in a washbasin, etc. In this variation, the water adhesion step can be water adhesion caused solely by the user's bathing, or it can be actively achieved by applying water or hot water to the wall surface 2 after the user has bathed, such as by using the shower 11. When performing a water adhesion step based on the user's bathing, a hypochlorous acid gas supply step (step S13) is performed within a predetermined time after the user leaves the bathroom 1. The "predetermined time" in Variation 1 refers to the time during which the water adhering to the wall surface 2 does not evaporate due to the water adhesion step. More specifically, it is the time before the temperature in the bathroom 1 reaches, for example, approximately 25°C and the humidity becomes, for example, less than approximately 80%. The “prescribed time” may vary depending on the outside temperature and humidity of bathroom 1, but it is preferred to start the hypochlorous acid gas supply step (step S13) for example, within about 60 minutes after the shower ends.

[0131] It is conceivable that water splashed from the user's body during bathing may adhere to the wall surface 2. Here, it is foreseeable that the water splashed from the user's body and adhering to the wall surface 2 may contain stains from the user's body. By performing a hypochlorous acid gas supply step (step S13) and a purification step (step S14) on the water containing such stains, the generation of microorganisms such as mold and bacteria (BA) can be inhibited in advance.

[0132] In the bathroom purification method described in Modification 1, the following effects can be enjoyed.

[0133] In the bathroom purification method described in Modification 1, the water adhesion step involves applying water to at least the wall surface 2 of the bathroom 1 through the user's bathing. The hypochlorous acid gas supply step (step S12) begins after the water adhesion step.

[0134] According to the above method, water without electrolyte components can adhere to at least the wall surface 2 of the bathroom 1. Since there is no spraying (spraying) of an electrolyte containing metal ions such as sodium ions into the bathroom 1, a bathroom purification method can be provided that supplies hypochlorous acid gas with a reduced metal ion content to the bathroom 1. Because hypochlorous acid gas with a reduced metal ion content can be supplied to the bathroom 1, the amount of metal ions that may remain in the bathroom 1 can be significantly reduced compared to the conventional method of spraying hypochlorous acid water into the bathroom 1. Therefore, according to the bathroom purification method of this embodiment, corrosion of metal components disposed in the bathroom 1 can be suppressed.

[0135] <Variation Example 2>

[0136] The water adhesion step (step S11) can also be performed after the user has showered in the bathroom 1, while water vapor remains in the bathroom 1. This cools the walls 2 of the bathroom 1, causing the water vapor in the bathroom 1 to condense on the surface of the walls 2, etc., so that water adheres to the walls 2. The cooling of the walls 2, etc. can also be performed using a cooling device (not shown) disposed on the outside of the bathroom 1.

[0137] Here, the surfaces of wall 2, ceiling 3, and floor 4 are referred to as the interior surfaces of bathroom 1. By causing water vapor in bathroom 1 to condense on the interior surfaces of bathroom 1, water can be made to adhere to the entire interior surface of bathroom 1. By performing the hypochlorous acid gas supply step (step S13) and the purification step (step S14) while the interior surface of bathroom 1 is completely covered with water, the entire interior surface of bathroom 1 can be purified.

[0138] Furthermore, it is known that hypochlorous acid gas is more soluble in water at low temperatures than at high temperatures. More specifically, for example, hypochlorous acid gas is more soluble in cool water (10°C to 20°C) that adheres to the interior surface of bathroom 1 after a shower, compared to the relatively hot water (35°C to 45°C) that adheres to the surface when the interior is cooled and condenses. Therefore, the sterilization effect can be improved, and bathroom purification can be carried out more efficiently across the entire interior surface of bathroom 1.

[0139] In the bathroom purification method described in Modification 2, the following effects can be enjoyed.

[0140] In the water adhesion step of the bathroom purification method involved in Modification 2, the wall 2 of the bathroom 1 is cooled after the user takes a shower, causing condensation to form on the wall of the bathroom 1, thereby allowing water to adhere to at least the wall 2 of the bathroom 1.

[0141] According to the above method, by performing the hypochlorous acid gas supply step (step S13) and the purification step (step S14) while water is adhering to the entire interior surface of the bathroom 1, purification can be achieved throughout the entire interior surface of the bathroom 1. Furthermore, by causing water vapor in the bathroom 1 to condense on the surfaces such as the wall 2, the water adheres to the wall 2, etc., at a temperature that makes hypochlorous acid gas more readily soluble, thus improving the sterilization effect. Therefore, more efficient bathroom purification can be achieved throughout the entire interior surface of the bathroom 1.

[0142] <Variation Example 3>

[0143] In the hypochlorous acid gas generation step (step S12), the electrolytic cell 40 and the supply tank 50 may be omitted, and a hypochlorous acid gas supply device including a storage tank (not shown) may be used. For example, in the hypochlorous acid gas generation step, air can be bubbled through hypochlorous acid water or sodium hypochlorite aqueous solution stored in the storage tank, thereby releasing hypochlorous acid gas from the outlet 47. Alternatively, a gel-like material containing hypochlorous acid may be placed in the storage tank, and air can be circulated through the gel-like material to cause hypochlorous acid gas to evaporate from the surface of the gel-like material and be released from the outlet 47.

[0144] In the bathroom purification method described in Modification 3, the following effects can be enjoyed.

[0145] In the hypochlorous acid gas generation step of the bathroom purification method according to Modification 3, since the electrolyte containing metal ions such as sodium ions is not sprayed into the bathroom 1, a bathroom purification method that supplies hypochlorous acid gas with a reduced metal ion content into the bathroom 1 can be provided. Because hypochlorous acid gas with a reduced metal ion content can be supplied into the bathroom 1, the amount of metal ions that may remain in the bathroom 1 can be significantly reduced compared to the conventional method of spraying hypochlorous acid water into the bathroom 1. Therefore, the bathroom purification method according to this embodiment can suppress the corrosion of metal components disposed in the bathroom 1.

[0146] <Variation Example 4>

[0147] In the hypochlorous acid gas generation step (step S12), in addition to the electrolysis step, a chloride ion supply step may also be included.

[0148] In the chloride ion supply step, the current control unit 60 controls the first current to allow chloride ions contained in the second aqueous solution L2 to pass through the anion exchange membrane 54 and be supplied to the first aqueous solution L1, thereby compensating for the reduction in chloride ions contained in the first aqueous solution L1 due to diaphragm-free electrolysis. The current control unit 60 ensures that the first current and the second current flow in a predetermined ratio to compensate for the reduction in chloride ions in the first aqueous solution L1 and to maintain the hypochlorous acid concentration of the first aqueous solution L1 at a predetermined concentration.

[0149] The following reaction equation 1 represents the equilibrium reaction for the formation of hypochlorous acid.

[0150] ... (Reaction Formula 1)

[0151] According to the Cl supplied from the second aqueous solution L2 to the first aqueous solution L1 － The increase or decrease of the concentration may cause the equilibrium state to shift to the right or to the left. The current control unit 60 maintains the concentration of hypochlorous acid in the first aqueous solution L1 stored in the electrolytic cell 40 at a predetermined concentration, that is, the concentration of Cl in the electrolytic cell 40 is maintained at a predetermined concentration. － Current control is performed in a way that appears to remain unchanged.

[0152] In the bathroom purification method described in Variation Example 4, the following effects can be enjoyed.

[0153] The hypochlorous acid gas generation step in the bathroom purification method described in Modification 4 includes an electrolysis step and a chloride ion supply step. The hypochlorous acid gas supply device 30 includes an electrolytic cell 40 and a supply tank 50. In the electrolysis step, a first aqueous solution L1 containing chloride ions stored in the electrolytic cell 40 is electrolyzed to generate hypochlorous acid gas. In the chloride ion supply step, a membrane electrolysis is performed via an anion exchange membrane 54 disposed between the electrolytic cell 40 and the supply tank 50, allowing chloride ions contained in a second aqueous solution L2 stored in the supply tank 50 to pass through the anion exchange membrane 54 and be supplied to the first aqueous solution L1 stored in the electrolytic cell 40 to compensate for the reduction of chloride ions contained in the first aqueous solution L1 due to electrolysis.

[0154] According to the above method, the desired amount of hypochlorous acid gas can be stably generated without a long-term supply of an aqueous solution containing chloride ions from the outside.

[0155] Furthermore, this disclosure is not limited to the above-described embodiments and can be appropriately modified without departing from the spirit of the invention.

[0156] A summary of one embodiment of this disclosure is as follows.

[0157] (Project 1)

[0158] A bathroom purification method, which uses a hypochlorous acid gas supply device, includes:

[0159] The water adhesion step involves adhering water to at least the walls, ceiling, and floor of the bathroom.

[0160] The hypochlorous acid gas generation step involves generating hypochlorous acid gas within the hypochlorous acid gas supply device.

[0161] The hypochlorous acid gas supply step involves supplying air containing the hypochlorous acid gas into the bathroom; and

[0162] The purification step involves supplying air containing the hypochlorous acid gas into the bathroom and purifying the bathroom for a predetermined time until the hypochlorous acid gas dissolves at least in the water adhering to the walls.

[0163] (Project 2)

[0164] The bathroom purification method as described in Project 1, wherein, in the water adhesion step, water is adhered to at least the walls of the bathroom by spraying a mist of water into the bathroom.

[0165] (Project 3)

[0166] As described in Project 1, the bathroom purification method involves the water adhesion step whereby water adheres to at least the walls of the bathroom through the user's bathing.

[0167] The hypochlorous acid gas supply step begins after the water adhesion step.

[0168] (Project 4)

[0169] The bathroom purification method as described in Project 1, wherein, in the water adhesion step, the bathroom wall is cooled after the user enters the bathroom, causing condensation to form on the bathroom wall so that water adheres to at least the bathroom wall.

[0170] (Project 5)

[0171] The bathroom purification method as described in any one of items 1 to 4, wherein the hypochlorous acid gas supply device further includes a water recovery unit capable of recovering the moisture contained in the gas as a liquid.

[0172] In the hypochlorous acid gas supply step, the hypochlorous acid gas is supplied to the bathroom after flowing through the water recovery unit.

[0173] (Project 6)

[0174] In the bathroom purification method described in Project 1, during the hypochlorous acid gas supply step, an air supply operation is performed to circulate air containing the hypochlorous acid gas within the bathroom.

[0175] (Project 7)

[0176] The bathroom purification method as described in Project 1 includes a cleaning step after the purification step, in which mist of water is sprayed onto at least the walls of the bathroom to clean the water containing the dissolved hypochlorous acid gas.

[0177] (Project 8)

[0178] The bathroom purification method as described in Project 1 or 7 includes a ventilation step after the purification step, in which the air containing the hypochlorous acid gas remaining in the bathroom is discharged.

[0179] (Project 9)

[0180] The bathroom purification method as described in Project 8 includes a drying step that dries the bathroom after the purification step.

[0181] (Project 10)

[0182] As described in Project 1, the bathroom purification method includes an electrolysis step and a chloride ion supply step in the hypochlorous acid gas generation step.

[0183] The hypochlorous acid gas supply device includes an electrolytic cell and a supply cell.

[0184] In the electrolysis step,

[0185] The hypochlorous acid gas is generated by electrolyzing a first aqueous solution containing chloride ions stored in an electrolytic cell.

[0186] In the chloride ion supply step,

[0187] Membrane electrolysis is performed by an anion exchange membrane disposed between the electrolytic cell and the supply cell, so that chloride ions contained in the second aqueous solution stored in the supply cell are supplied to the first aqueous solution stored in the electrolytic cell through the anion exchange membrane, thereby compensating for the reduction of chloride ions contained in the first aqueous solution due to the electrolysis.

[0188] Symbol Explanation

[0189] 1 Bathroom

[0190] 2 wall

[0191] 3. Top surface

[0192] 4. Ground

[0193] 11 Shower

[0194] 12 storage table

[0195] 13 Water spray device

[0196] 14 bathtub

[0197] 15 Drainage outlet

[0198] 20 Bathroom heating and drying machines

[0199] 21 suction port

[0200] 22. Blowout

[0201] 23 Pipelines

[0202] 30 Hypochlorous Acid Gas Supply Unit

[0203] 40 Electrolytic Cell

[0204] 41 Electrolytic cell side anode

[0205] 42 Electrolytic cell side cathode

[0206] 43 Air Supply Department

[0207] 44 Air supply duct

[0208] 45. Internal space of the electrolytic cell side

[0209] 46 Water Recycling Department

[0210] 47. Release the outlet

[0211] 48 Water Level Monitoring Department

[0212] 50 supply tanks

[0213] 51 Supply tank side cathode

[0214] 52. Internal space of the supply tank side

[0215] 53 Discharge outlet

[0216] 54 Anion exchange membrane

[0217] 60 Current Control Unit

[0218] 61 Wiring

[0219] 62 wiring

[0220] 63 Wiring

[0221] A airflow path

[0222] B bubbles

[0223] BA Microbiology

[0224] C. Shell

[0225] L1 First aqueous solution

[0226] L2, second aqueous solution

[0227] M Mixed Air

[0228] ОT outside

[0229] R external space

[0230] S1 liquid level

[0231] S2 liquid level

[0232] W1 Water

[0233] W2 hypochlorous acid water.

Claims

1. A bathroom purification method using a hypochlorous acid gas supply device, characterized in that, include: The water adhesion step involves adhering water to at least the walls of the bathroom, including the walls, ceiling, and floor. The hypochlorous acid gas generation step involves generating hypochlorous acid gas within the hypochlorous acid gas supply device. The hypochlorous acid gas supply step involves supplying air containing the hypochlorous acid gas into the bathroom; and The purification step involves supplying air containing the hypochlorous acid gas into the bathroom and purifying the bathroom for a predetermined time until the hypochlorous acid gas dissolves at least in the water adhering to the walls.

2. The bathroom purification method as described in claim 1, characterized in that, In the water adhesion step, water is adhered to at least the walls of the bathroom by spraying a mist of water into the bathroom.

3. The bathroom purification method as described in claim 1, characterized in that, In the water adhesion step, water is adhered to at least the walls of the bathroom by the user showering. The hypochlorous acid gas supply step begins after the water adhesion step.

4. The bathroom purification method as described in claim 1, characterized in that, In the water adhesion step, the bathroom walls are cooled after the user showers, causing condensation to form on the bathroom walls and water to adhere to at least the bathroom walls.

5. The bathroom purification method according to any one of claims 1 to 4, characterized in that, The hypochlorous acid gas supply device also includes a water recovery unit capable of recovering the moisture contained in the gas as a liquid. In the hypochlorous acid gas supply step, the hypochlorous acid gas is supplied to the bathroom after flowing through the water recovery unit.

6. The bathroom purification method as described in claim 1, characterized in that, During the hypochlorous acid gas supply step, an air supply operation is also performed to circulate the air containing the hypochlorous acid gas within the bathroom.

7. The bathroom purification method as described in claim 1, characterized in that, The process includes a cleaning step, after which, a mist of water is sprayed onto at least the walls of the bathroom to clean the water containing dissolved hypochlorous acid gas.

8. The bathroom purification method as described in claim 1 or 7, characterized in that, The process includes a ventilation step, in which the air containing the hypochlorous acid gas remaining in the bathroom is vented after the purification step.

9. The bathroom purification method as described in claim 8, characterized in that, The process includes a drying step, which dries the bathroom after the purification step.

10. The bathroom purification method as described in claim 1, characterized in that, The hypochlorous acid gas generation step includes an electrolysis step and a chloride ion supply step. The hypochlorous acid gas supply device includes an electrolytic cell and a supply cell. In the electrolysis step, The hypochlorous acid gas is generated by electrolyzing the first aqueous solution containing chloride ions stored in the electrolytic cell. In the chloride ion supply step, Membrane electrolysis is performed by an anion exchange membrane disposed between the electrolytic cell and the supply cell, so that chloride ions contained in the second aqueous solution stored in the supply cell are supplied to the first aqueous solution stored in the electrolytic cell through the anion exchange membrane, thereby compensating for the reduction of chloride ions contained in the first aqueous solution due to the electrolysis.

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