Wear resistant transition metal boride coating and applications

Abstract

This invention relates to the field of surface coating materials technology, and in particular to a wear-resistant transition metal boride coating and its application. The wear-resistant transition metal boride coating is prepared by the following steps: (1) placing a clean and dry substrate on a magnetron sputtering deposition site, placing an HfB2 target on an RF target site, and a TiB2 target on a DC target site; then evacuating and heating the equipment chamber, and then introducing Ar gas as the working gas; (2) controlling the atomic ratio of Hf to Ti by adjusting the sputtering power ratio of HfB2 and TiB2 targets to form a (Ti) composite with adjustable composition. 1‑x ,Hf x The B2 coating was deposited at a controlled temperature of 300~600 ℃. The (Ti) coating developed in this invention... 1‑x ,Hf x The B2 coating has advantages such as high hardness, excellent friction performance and wear resistance, and has broad application prospects. It is especially suitable for use as a protective coating for cutting tools.

Description

Technical Field

[0001] This invention relates to the field of surface coating materials technology, and in particular to a wear-resistant transition metal boride coating and its application. Background Technology

[0002] In the wave of rapid development in modern industry, the problems of cutting force, cutting temperature, friction, and wear involved in the use of cutting tools are becoming increasingly severe, directly affecting the service life and operational safety of equipment. Therefore, the requirements for the hardness and wear resistance of material surface coatings are becoming increasingly stringent. As a key method to improve the overall performance of cutting tools, coating technology has become an important way to overcome the performance bottlenecks of cutting tools. At present, the wear-resistant coatings commonly used in industry are mainly titanium nitride, titanium aluminum nitride, and diamond-like carbon. Although these coatings are widely used, their shortcomings are also obvious. Titanium nitride series coatings are prone to softening and oxidation at high temperatures, and their hardness decreases rapidly; diamond-like carbon coatings have poor thermal stability, and their structure will fail at slightly higher temperatures. Moreover, the film is brittle and has insufficient adhesion, making it easy to peel off under harsh working conditions, and it cannot meet the requirements for long-term reliable wear protection. Compared with traditional uncoated or single-layer coated cutting tools, modern multi-component, nanocomposite, and gradient structure coatings have achieved orders of magnitude improvement in hardness, friction, and wear resistance. Therefore, developing new coating systems that combine high hardness and wear resistance is a key way to achieve breakthroughs in high-performance, green, and efficient machining.

[0003] Currently, research on transition metal boride coatings has developed into a relatively systematic field, mainly focusing on the composition design, microstructure control, and performance optimization of transition metal diborides and their multi-component systems. Studies have shown that forming nanocomposite structures or introducing multi-component alloying elements can significantly improve the mechanical properties and thermal stability of coatings. Among them, TiB2 is currently the most widely used transition metal diboride coating material, exhibiting excellent performance in cutting tools due to its superhardness and excellent weld resistance. For example, patent CN104498872A discloses a high-hardness, wear-resistant vanadium boride coating and its preparation method. The vanadium boride coating is prepared by adjusting the sputtering power of the target material, exhibiting a high (001) preferred orientation, but with a hardness of 30-43 GPa and an average friction coefficient of 0.4-0.6. Under a force of 5 N on an Al2O3 grinding ball with a diameter of 6 mm, the average wear rate of the coating is ~10%. -16 m 3 N -1 m -1 Order of magnitude.

[0004] To address the shortcomings of existing wear-resistant coatings in terms of high-temperature performance, as well as the brittleness and weak adhesion of traditional boride coatings, developing a transition metal boride coating that combines high hardness, excellent wear resistance, and stable and reliable preparation has become a key technical problem that urgently needs to be solved in the field of surface engineering. Summary of the Invention

[0005] The purpose of this invention is to provide a high-hardness, wear-resistant transition metal boride coating and its application.

[0006] This invention prepared (Ti) 1-x , Hf x The B2 coating has achieved breakthroughs in friction and mechanical properties.

[0007] This invention achieves precise control of the atomic ratio of Hf, Ti, and B in the coating by adjusting the sputtering power of HfB2 and TiB2 targets, thereby improving the hardness, friction performance, and wear resistance of the coating.

[0008] The specific solution of the present invention is as follows:

[0009] This invention discloses a wear-resistant transition metal boride coating, the preparation of which includes the following steps:

[0010] (1) Place the clean and dry substrate on the magnetron sputtering deposition site, place the HfB2 target on the RF target site, and place the TiB2 target on the DC target site; then evacuate the equipment chamber and heat it, and then introduce Ar gas as the working gas.

[0011] (2) The atomic ratio of Hf to Ti is controlled by adjusting the sputtering power ratio of HfB2 and TiB2 targets to form a tunable (Ti) target. 1-x , Hf x B2 coating.

[0012] The cleaned and dried substrate is treated as follows: the substrate is ultrasonically cleaned sequentially with acetone, anhydrous ethanol, and deionized water to remove surface organic contaminants and particulate impurities; it is then dried with nitrogen to improve the adhesion and interface cleanliness of subsequent films. The substrate surface roughness is <0.5μm, removing oxide layers and oil stains to further enhance adhesion.

[0013] The substrate material is selected from at least one of sapphire (Al2O3), silicon (Si), and silicon carbide (SiC). The silicon includes at least one of monocrystalline silicon and polycrystalline silicon.

[0014] Furthermore, in step (1), the vacuum degree of the vacuum treatment is ≤ 6×10⁻⁶. -6 Pa.

[0015] Furthermore, in step (2), the deposition temperature is 300~600 ℃, more preferably 400~600 ℃, and even more preferably 600 ℃.

[0016] Furthermore, in step (2), the deposition gas pressure is 0.3~0.6 Pa, preferably 0.4 Pa, the HfB2 RF sputtering power is 50~200 W, preferably 80~160 W, and more preferably 80 W, and the TiB2 DC sputtering power is 100~300 W, preferably 100~160 W, and more preferably 160 W.

[0017] Research has revealed that for TiB2 materials, DC sputtering can achieve stable glow discharge, with high ion energy utilization and excellent sputtering efficiency, making it suitable for high-speed and stable deposition as the main phase of composite coatings. However, using RF sputtering on TiB2 targets results in significant energy loss, a marked decrease in sputtering efficiency, a reduction in film density, and severe process redundancy, failing to guarantee dense growth of the main phase structure. Furthermore, it was found that when using DC sputtering on HfB2 targets, positive charge accumulation easily occurs on the target surface, causing glow discharge extinction, arcing, and target ablation, making stable sputtering impossible. This invention employs RF sputtering with specific parameter ranges when processing HfB2 targets, relying on a high-frequency alternating electric field to continuously neutralize the accumulated charge on the target surface, ensuring a continuous and stable sputtering process. Using DC sputtering on HfB2 would result in sputtering interruptions, numerous film inclusion defects, uncontrollable elemental content, and excessive internal stress leading to coating detachment.

[0018] The HfB2 RF sputtering power is limited to 50~200W. When the power is below 50W, the plasma energy is insufficient, the sputtering is weak or even fails to ignite, and the Hf element deposition is too small to achieve solid solution strengthening modification. When the power is above 200W, the ion bombardment is too intense, the target material is overheated and ablated, resulting in a large number of particle defects, the internal stress of the film increases sharply, and the excessive Hf element doping exceeds the solid solution limit, resulting in phase segregation precipitation and reducing the overall performance of the coating. The power range of 80~160W is a selectable range, which can achieve stable ignition and uniform and mild doping. The DC sputtering power for TiB2 is limited to 100–300 W. Below 100 W, insufficient plasma density leads to a slow main phase deposition rate, poor film density, and low base hardness. Above 300 W, severe target bombardment and ablation occur, resulting in abnormally coarse columnar crystals in the film, excessive internal stress, and susceptibility to cracking and spalling. Furthermore, a high Ti content inhibits Hf solid solution doping. The optimal power range is 100–160 W. Within this range, the main phase structure is dense and uniform, exhibiting high matching with the HfB2 sputtering rate, allowing for the preparation of TiB2 films with uniform composition and excellent performance. 1-x , Hf x B2 composite solid solution coating.

[0019] In step (2), the (Ti) 1-x , Hf xThe molar ratio of Ti to Hf in the B2 coating is 0.25~0.6:0.75~0.4, more preferably 0.3~0.5:0.7~0.5, and even more preferably 1:1.

[0020] Furthermore, in step (2), the deposition time is 4~8 h, (Ti 1-x , Hf x The thickness of the B2 coating is 700~1100 nm.

[0021] Furthermore, in step (2), the (Ti) 1-x , Hf x The hardness of the B2 coating is 45~55GPa and the elastic modulus is 450~600GPa.

[0022] Furthermore, in step (2), the (Ti) 1-x , Hf x The average coefficient of friction for the B2 coating is 0.15~0.25, and the average wear rate is 6.4×10⁻⁶. -5 ~ 9.3×10 -5 mm 3 N -1 m -1 .

[0023] Through the synergistic effect of matrix material, preparation process and parameters, this invention can obtain high-quality products with extremely low friction coefficient and extremely low average wear rate.

[0024] The (Ti) designed and prepared in this invention 1-x , Hf x B2 coating can be used as a protective coating for cutting tools. It features high hardness and wear resistance.

[0025] The beneficial effects of this invention are as follows:

[0026] 1. This invention controls the atomic ratio of Hf to Ti by adjusting the sputtering method and the sputtering power ratio of HfB2 and TiB2 targets, thereby forming a Ti-based composite material with tunable composition. 1-x , Hf x The B2 coating showed a significant improvement in hardness after adjustment. Experimental data showed that the coating hardness was about 10 GPa higher than that of the existing boride coating. After further optimization, the coating hardness was greater than or equal to 52 GPa.

[0027] 2. By controlling the deposition time and coating thickness, this invention improves the uniformity and stability of the coating, resulting in a significant enhancement in friction performance. The average coefficient of friction is 0.15~0.25, and the average wear rate is 6.4×10⁻⁶. -5 ~9.3×10-5 mm 3 N -1 m -1 .

[0028] The present invention provides (Ti) 1-x , Hf x B2 coating, applied to tool cutting processes, can significantly improve tool performance and lifespan. Attached Figure Description

[0029] Figure 1 The images show the surface and cross-sectional SEM images of the coatings obtained in Examples 1-3.

[0030] Figure 2 The images show the surface and cross-sectional SEM images of the coatings obtained in Comparative Examples 1-3.

[0031] Figure 1 In the figures, (a) and (d) represent the Ti obtained in Example 1, respectively. 0.5 , Hf 0.5 SEM images of the surface and cross-section of the B2 coating, (b) and (e) are respectively the SEM images of the (Ti) coating obtained in Example 2. 0.4 , Hf 0.6 SEM images of the surface and cross-section of the B2 coating, (c) and (f) are respectively the SEM images of the (Ti) coating obtained in Example 3. 0.3 , Hf 0.7 SEM images of the surface and cross-section of the B2 coating; from Figure 1 It can be seen that the coating surface is dense and the resulting coating is thick and uniform.

[0032] Figure 2 In the image, (a) and (d) are SEM images of the surface and cross-section of the coating obtained in Comparative Example 1, respectively; (b) and (e) are SEM images of the surface and cross-section of the coating obtained in Comparative Example 2, respectively; and (c) and (f) are SEM images of the surface and cross-section of the coating obtained in Comparative Example 3, respectively. Figure 2 The surface quality and coating thickness of the coating can be seen, combined with Figure 1 , Figure 2 It can be seen that, Figure 2 The thickness of the intermediate coating is significantly less than Figure 1 Furthermore, the quality of the cross-section and surface is inferior to that of the previous one. Figure 1 . Detailed Implementation

[0033] The present invention will be further described below with reference to the accompanying drawings and specific embodiments, but the scope of protection of the present invention is not limited thereto.

[0034] In the embodiments and comparative examples of this invention, the hardness and elastic modulus of the coating are measured using nanoindentation technology through an ultramicroindentation system (UMIS).

[0035] Example 1:

[0036] In this embodiment, (Ti) 0.5 , Hf 0.5 Taking the preparation of the B2 coating as an example, the following steps are taken:

[0037] (1) Substrate treatment: A substrate (the material of the substrate is sapphire (Al2O3)) is provided. The substrate is cleaned by ultrasonic cleaning with acetone, anhydrous ethanol and deionized water in sequence for 10 min to remove surface organic contaminants and particulate impurities. Then it is dried with high-purity nitrogen to improve the adhesion of subsequent films and the cleanliness of the interface. The surface roughness of the sapphire substrate is 0.4 μm. The substrate is then fixed on the rotating frame in the magnetron sputtering equipment.

[0038] (2) A transition metal boride coating is formed on the substrate using magnetron sputtering. The HfB2 target is placed at the RF target position, and the TiB2 target is placed at the DC target position; then, the equipment chamber is evacuated until the vacuum level reaches 6 × 10⁻⁶. -6 After Pa, the heating power supply is turned on to heat the vacuum chamber to a deposition temperature of 600 °C, and Ar gas is introduced as the working gas (the working gas flow rate is 33 sccm).

[0039] (3) By adjusting the sputtering power ratio of HfB2 and TiB2 targets, the sputtering power of HfB2 target was controlled at 80 W, the sputtering power of TiB2 target was controlled at 160 W, the sputtering time was 6 h, and the atomic ratio of Hf to Ti was adjusted to form a tunable composition (Ti) 0.5 , Hf 0.5 B2 coating. During deposition, the deposition pressure was controlled at 0.4 Pa.

[0040] The coating thickness is approximately 904 nm. The coating hardness is 52.35 GPa and the elastic modulus is 591.12 GPa. Reciprocating friction tests were conducted at room temperature using a micro-friction and wear testing machine (UMT-3, CERT) with chromium steel balls as the abrasive, a load of 15 N, a friction duration of 15 minutes, and a rotation speed of 120 rpm to evaluate the coating's tribological properties. The average coefficient of friction of the coating is 0.15, and the average wear rate is 6.4 × 10⁻⁶. -5 mm 3 N -1 m -1 .

[0041] Example 2:

[0042] In this embodiment, (Ti) 0.4 , Hf 0.6Taking the preparation of the TiB2 coating as an example, the substrate preparation and equipment control are the same as in Example 1. The difference is that the sputtering power of the HfB2 target is controlled at 120 W, the sputtering power of the TiB2 target is 160 W, the sputtering time is 8 h, and the atomic ratio of Hf to Ti is adjusted to form a TiB2 coating with adjustable composition. 0.4 , Hf 0.6 B2 coating. During deposition, the deposition pressure was controlled at 0.4 Pa.

[0043] The coating thickness is approximately 1037 nm. The coating hardness is 50.52 GPa and the elastic modulus is 552.23 GPa. Reciprocating friction tests were conducted at room temperature using a micro-friction and wear testing machine (UMT-3, CERT) with chromium steel balls as abrasive, a load of 15 N, a friction duration of 15 minutes, and a rotation speed of 120 rpm to evaluate the coating's frictional properties. The average coefficient of friction of the coating is 0.21, and the average wear rate is 7.5 × 10⁻⁶. -5 mm 3 N -1 m -1 .

[0044] Example 3:

[0045] In this embodiment, (Ti) 0.3 , Hf 0.7 Taking the preparation of TiB2 coating as an example, the substrate preparation and equipment control are the same as in Example 1. The difference is that the sputtering power of the HfB2 target is controlled at 160 W, the sputtering power of the TiB2 target is 160 W, the sputtering time is 4 h, and the atomic ratio of Hf to Ti is adjusted to form a TiB2 coating with adjustable composition. 0.3 , Hf 0.6 B2 coating. During deposition, the deposition gas pressure is controlled at 0.5 Pa.

[0046] The coating thickness is approximately 880 nm. The coating hardness is 49.41 GPa and the elastic modulus is 495.12 GPa. Reciprocating friction tests were conducted at room temperature using a micro-friction and wear testing machine (UMT-3, CERT) with chromium steel balls as the abrasive, a load of 15 N, a friction duration of 15 minutes, and a rotation speed of 120 rpm to evaluate the coating's frictional properties. The average coefficient of friction of the coating is 0.25, and the average wear rate is 8.2 × 10⁻⁶. -5 mm 3 N -1 m -1 .

[0047] Example 4:

[0048] In this embodiment, (Ti) 0.5 , Hf 0.5Taking the preparation of the B2 coating as an example, the substrate preparation and equipment control are the same as in Example 1, except that the sputtering substrate is single crystal silicon (Si) and the surface roughness of the substrate is 0.3 μm.

[0049] The coating thickness is approximately 925 nm. The coating hardness is 45.92 GPa and the elastic modulus is 461.38 GPa. Reciprocating friction tests were conducted at room temperature using a micro-friction and wear testing machine (UMT-3, CERT) with chromium steel balls as the abrasive, a load of 15 N, a friction duration of 15 minutes, and a rotation speed of 120 rpm to evaluate the coating's frictional properties. The average coefficient of friction of the coating is 0.23, and the average wear rate is 9.3 × 10⁻⁶. -5 mm 3 N -1 m -1 .

[0050] Example 5:

[0051] In this embodiment, (Ti) 0.5 , Hf 0.5 Taking the preparation of the B2 coating as an example, the substrate preparation and equipment control are the same as in Example 1. The difference is that in the step of depositing the coating using magnetron sputtering technology, the deposition temperature is 400 ℃.

[0052] The coating thickness is approximately 949 nm. The coating has a hardness of 48.04 GPa and an elastic modulus of 487.47 GPa. Reciprocating friction tests were conducted at room temperature using a micro-friction and wear testing machine (UMT-3, CERT) with chromium steel balls as the abrasive, a load of 15 N, a friction duration of 15 minutes, and a rotation speed of 120 rpm to evaluate the coating's tribological properties. The average coefficient of friction of the coating was 0.22, and the average wear rate was 8.8 × 10⁻⁶. -5 mm 3 N -1 m -1 .

[0053] Example 6:

[0054] In this embodiment, (Ti) 0.5 , Hf 0.5Taking the preparation of the B2 coating as an example, the substrate preparation and equipment control were the same as in Example 1, except that the deposition gas pressure was 0.5 Pa in the magnetron sputtering deposition step. The coating thickness was approximately 897 nm. The coating hardness was 48.43 GPa and the elastic modulus was 546.23 GPa. Reciprocating friction tests were conducted at room temperature using a micro-friction and wear testing machine (UMT-3, CERT), using chromium steel balls as abrasives, with a load of 15 N, a friction duration of 15 minutes, and a rotation speed of 120 rpm, to evaluate the coating's frictional performance. The average coefficient of friction of the coating was 0.18, and the average wear rate was 7.9 × 10⁻⁶. -5 mm 3 N -1 m -1 .

[0055] Comparative Example 1:

[0056] In this comparative example, the substrate preparation and equipment control were the same as in Example 1. The difference lay in the deposition of the coating using magnetron sputtering technology. The sputtering power of the HfB2 target was controlled at 40 W, the sputtering power of the TiB2 target was 40 W, and the sputtering time was 6 h. The coating thickness was approximately 324 nm. The coating hardness was 27.26 GPa, and the elastic modulus was 323.58 GPa. The average coefficient of friction was 0.55, and the average wear rate was 18 × 10⁻⁶. -5 mm 3 N -1 m -1 .

[0057] Comparative Example 2:

[0058] In this comparative example, the substrate preparation and equipment control were the same as in Example 1. The difference was that in the step of depositing the coating using magnetron sputtering technology, the HfB2 target was mounted on a DC power supply, and sputtering was performed solely on the HfB2 target. The DC sputtering power of the HfB2 target was 160 W. During the sputtering process, sputtering was interrupted, the glow discharge was extinguished, and stable sputtering could not be achieved, resulting in a sputtering deposition time of only 2 hours. The coating thickness was approximately 458 nm. The coating hardness was 31.66 GPa, and the elastic modulus was 422.47 GPa. The average coefficient of friction of the coating was 0.34, and the average wear rate was 12 × 10⁻⁶. -5 mm 3 N -1 m -1 .

[0059] Comparative Example 3:

[0060] In this comparative example, the substrate preparation and equipment control were the same as in Example 1. The difference was that in the step of depositing the coating using magnetron sputtering, the TiB2 target was mounted on the RF power supply, and sputtering was performed on the TiB2 target alone. The RF sputtering power of the TiB2 target was 160 W. The sputtering deposition time was 6 h. The coating thickness was approximately 537 nm. The coating hardness was 32.18 GPa, and the elastic modulus was 401.21 GPa. The average coefficient of friction of the coating was 0.45, and the average wear rate was 13 × 10⁻⁶. -5 mm 3 N -1 m -1 .

[0061] Comparative Example 4

[0062] All other conditions are the same as in Example 1, except that:

[0063] In step (2), a transition metal boride coating is formed on the substrate using magnetron sputtering. The TiB2 target is placed at the RF target position, and the HfB2 target is placed at the DC target position; then, the equipment chamber is evacuated until the vacuum level reaches 6 × 10⁻⁶. -6 After Pa, the heating power supply is turned on to heat the vacuum chamber to a deposition temperature of 600 ℃. Ar gas is introduced as the working gas at a flow rate of 33 sccm. During deposition, the deposition gas pressure is controlled at 0.4 Pa.

[0064] Sputtering was interrupted during the process, the glow discharge was extinguished, and stable sputtering could not be achieved, resulting in a sputtering deposition time of only 3 hours. The coating thickness was approximately 489 nm. The coating hardness was 34.75 GPa and the elastic modulus was 445.38 GPa. The average coefficient of friction of the coating was 0.39, and the average wear rate was 15 × 10⁻⁶. -5 mm 3 N -1 m -1 .

[0065] Table 1 Comparison of performance parameters of the coatings obtained in the examples and comparative examples.

[0066]

[0067] The (Ti) prepared in the example 1-x , Hf x The comprehensive performance of the B2 coating was tested, and the results showed that the coating thickness was between 500-1000 nm. The (Ti) content was measured using nanoindentation technology with an ultramicroindentation system (UMIS). 1-x , Hf xThe B2 coating has a hardness greater than 45 GPa and an elastic modulus of 450-560 GPa. Reciprocating friction tests were conducted at room temperature using a micro-friction and wear testing machine (UMT-3, CERT) with chromium steel balls as abrasive, a load of 15 N, a friction duration of 15 minutes, and a rotation speed of 120 rpm to evaluate the coating's frictional properties. (Ti) 1-x , Hf x The average coefficient of friction for the B2 coating is 0.15~0.25, and the average wear rate is 6.4×10⁻⁶. -5 – 9.3×10 -5 mm 3 N -1 m -1 .

[0068] The above description is merely a preferred embodiment of the present invention and is not intended to limit the invention. Any technical means and implementation schemes that can be obtained by those skilled in the art based on the concept of the present invention through conventional logical analysis, reasonable deduction, or a small number of experiments should fall within the protection scope defined by the claims of the present invention.

Claims

1. A wear-resistant transition metal boride coating, characterized in that: The method for preparing a wear-resistant transition metal boride coating includes the following steps; (1) Place the clean and dry substrate on the magnetron sputtering deposition site, place the HfB2 target on the RF target site, and place the TiB2 target on the DC target site; then evacuate the equipment chamber and heat it, and then introduce Ar gas as the working gas. (2) The atomic ratio of Hf to Ti is controlled by adjusting the sputtering power ratio of HfB2 and TiB2 targets to form a tunable (Ti) target. 1-x , Hf x B2 coating, the deposition temperature is controlled at 300~600℃; In step (2), the deposition gas pressure is 0.3~0.6 Pa, the HfB2 RF sputtering power is 50~200 W, and the TiB2 DC sputtering power is 100~300 W.

2. The wear-resistant transition metal boride coating according to claim 1, characterized in that: The substrate is made of at least one of sapphire, silicon, and silicon carbide.

3. The wear-resistant transition metal boride coating according to claim 1, characterized in that: In step (1), the vacuum degree of the vacuum treatment is ≤ 6×10⁻⁶. -6 Pa.

4. The wear-resistant transition metal boride coating according to claim 1, characterized in that: In step (2), the deposition temperature is 400~600℃.

5. The wear-resistant transition metal boride coating according to claim 1, characterized in that: In step (2), the deposition gas pressure is 0.4 Pa, the HfB2 RF sputtering power is 80~160 W, and the TiB2 DC sputtering power is 100~160 W.

6. The wear-resistant transition metal boride coating according to claim 1, characterized in that: In step (2), the deposition gas pressure is 0.4 Pa, the HfB2 RF sputtering power is 80 W, and the TiB2 DC sputtering power is 160 W.

7. The wear-resistant transition metal boride coating according to claim 1, characterized in that: The (Ti) 1-x ,Hf x The molar ratio of Ti to Hf in the B2 coating is 0.25~0.6:0.75~0.

4.

8. The wear-resistant transition metal boride coating according to claim 1, characterized in that: In step (2), the deposition time is 4-8 h, (Ti 1-x , Hf x The thickness of the B2 coating is 700~1100 nm.

9. The wear-resistant transition metal boride coating according to claim 1, characterized in that: In step (2), (Ti) 1-x , Hf x The hardness of the B2 coating is 45~55GPa, and the elastic modulus is 450~600GPa. (Ti 1-x , Hf x The average coefficient of friction for the B2 coating is 0.15~0.25, and the average wear rate is 6.4×10⁻⁶. -5 ~ 9.3×10 -5 mm 3 N -1 m -1 .

10. The application of a wear-resistant transition metal boride coating as described in any one of claims 1-9, characterized in that: It is used as a protective coating for cutting tools.

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