topography machine
CN310025136SActive Publication Date: 2026-06-09JIANGSU MINGYUE PHOTOELECTRICS TECH
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Patent Information
- Application Number
- CN202530705066.X
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- Filing Date
- 2025-11-28
- Publication Date
- 2026-06-09
- Estimated Expiration
- 2040-11-28
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Figure 000007_ABST
Abstract
1. The name of the design product: topography of refraction. 2. The use of the design product: for contactless measurement of the refraction of the center and peripheral locations of the human eye. 3. The design points of the design product: in shape. 4. The picture or photo that best indicates the design points: perspective view 1.
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